JPH01222493A - Excimer laser device - Google Patents
Excimer laser deviceInfo
- Publication number
- JPH01222493A JPH01222493A JP4826288A JP4826288A JPH01222493A JP H01222493 A JPH01222493 A JP H01222493A JP 4826288 A JP4826288 A JP 4826288A JP 4826288 A JP4826288 A JP 4826288A JP H01222493 A JPH01222493 A JP H01222493A
- Authority
- JP
- Japan
- Prior art keywords
- laser
- gas
- moisture
- case
- adsorbent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000006096 absorbing agent Substances 0.000 claims abstract description 8
- 239000007789 gas Substances 0.000 abstract description 41
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract description 13
- 229910001873 dinitrogen Inorganic materials 0.000 abstract description 9
- 229910052736 halogen Inorganic materials 0.000 abstract description 9
- 150000002367 halogens Chemical class 0.000 abstract description 9
- 239000002250 absorbent Substances 0.000 abstract description 8
- 230000002745 absorbent Effects 0.000 abstract description 8
- 238000000034 method Methods 0.000 abstract description 3
- 229910052757 nitrogen Inorganic materials 0.000 abstract description 2
- 230000010355 oscillation Effects 0.000 abstract description 2
- 239000003463 adsorbent Substances 0.000 abstract 4
- 238000001179 sorption measurement Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- 230000001007 puffing effect Effects 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 239000002808 molecular sieve Substances 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明はエキシマレーザ、特に希ガスハロゲンエキシ
マレーザ装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an excimer laser, particularly to a rare gas halogen excimer laser device.
（従来の技術〕
希ガスハロゲンエキシマレーザはレーザガスとして、ク
リプトン（以下【と記す）、キセノン（。(Prior art) A rare gas halogen excimer laser uses krypton (hereinafter referred to as [)] and xenon (hereinafter referred to as [)] as the laser gas.
以下Ｘｅと記す）、アルゴン（以下Ａｒと記す）などの
希ガスと、フッ素（以下Ｆ、と記す）、塩化水素（以下
ＭＣＩと記す）などのハロゲンと、希釈ガスとしてヘリ
ウム（以下上と記す）やネオン（以下Ｎｅと記す）を用
いる。それぞれの濃度は、希ガスが数％、ハロゲンがパ
ーセントオーダで小数点以下、希釈ガスが残り九十数パ
ーセントである。halogens such as fluorine (hereinafter referred to as F) and hydrogen chloride (hereinafter referred to as MCI), and helium (hereinafter referred to as above) as a diluent gas. ) or neon (hereinafter referred to as Ne). The respective concentrations are several percent for the rare gas, the halogen on the order of percent below the decimal point, and the remaining 90-odd percent for the diluent gas.
以下、説明のために、ＫｒＦエキシマレーザを例にとり
、七濃度が１％、Ｆ雪濃度がα２％、七濃度が９＆８％
であるとする。For the sake of explanation, below, taking KrF excimer laser as an example, the 7 concentration is 1%, the F snow concentration is α2%, and the 7 concentration is 9 & 8%.
Suppose that
第３図は、レーザ装置を稼動させた場合のレーザ出力の
経時変化を示したものであり、曲線いはレーザ装置を稼
動させずに長時間放置後、最初に稼動させた場合、曲線
頓〜に）はレーザ出力が８０％低下したとξろでレーザ
ガスを全量交換し、再び稼動させた場合を示している。Figure 3 shows the change in laser output over time when the laser device is operated. 2) shows the case where the laser output was reduced by 80%, the entire amount of laser gas was replaced, and the operation was restarted.
図より明らかなように、ガスの全量交換を行うたびに、
レーザ出力の寿命は長くなっている。これは、長時間放
置している間化、レーザ筐体の部分、もしくは、レーザ
ガス導入のための配゛管部分等から空気が混入し、該空
気中の水分がレーザ筐体内壁に付着するため、レーザ稼
動時にレーザガスを充填すると、レーザガス中のＦ、が
、該水分と反応してＨＦとなり、Ｆ２濃度が減少するた
めに起こる現象であり、何度かレーザガスを交換する間
に、該水分がな（なり（ＨＦの形に全量置き換わる）、
Ｆ、濃度の減少が少なくなる結果、レーザ出力の寿命が
除々に改蕾されるものである。（例えば雑誌（Ａｐｐｌ
、 Ｐｈｙｓ。As is clear from the figure, each time the entire amount of gas is replaced,
The lifetime of laser output is increasing. This is because air gets mixed in from the laser casing or piping for introducing laser gas when left unused for a long time, and moisture in the air adheres to the inner wall of the laser casing. This phenomenon occurs because when the laser gas is filled during laser operation, F in the laser gas reacts with the moisture to become HF, reducing the F2 concentration. (totally replaced by HF form),
F. As a result of the decrease in concentration, the lifetime of the laser output is gradually improved. (For example, magazines (Appl.
, Phys.
Ｌｅｔｔ、 ３４（１）、 Ｉ Ｊａｎｕａｒｙ ｔｅ
７ｓ） ｉｃ記載。）〔発明が解決しようとする課題〕
従来の希ガスハロゲンエキシマレーザ装置は以上のよう
に構成されているので、レーザ装置を長時間放置した後
、再び稼動させようとする場合には、レーザの連続運転
とレーザガス交換の手順を幾度かくり返して、レーザ筐
体内部のパッシベイシ冒ンを行なう必要があり、操作が
わずられしいとともに、ガス消費量も多いという問題点
があった。Lett, 34(1), I January te
7s) IC description. ) [Problems to be Solved by the Invention] Since the conventional rare gas halogen excimer laser device is configured as described above, when the laser device is left unused for a long time and is to be restarted, it is necessary to It is necessary to repeat the steps of continuous operation and laser gas exchange several times to remove the passivity inside the laser housing, which poses problems in that the operation is cumbersome and the amount of gas consumed is large.
この発明は、上記のような問題点を解消するためになさ
れたもので、レーザ装置を長時間放置した後も、簡易に
レーザ筐体内部のパフシベイシロンが行こなえ、かつ、
このためのガス消費量も少ないレーザ装置を得ることを
目的とする。This invention was made to solve the above-mentioned problems, and it is possible to easily perform puffing inside the laser casing even after the laser device has been left unattended for a long time, and
The object of the present invention is to obtain a laser device that consumes less gas for this purpose.
仁の発明に係るエキシマレーザ装置は、該装置に水分吸
着もしくは吸収剤を付設するとともに、レーザガス未充
填時には、該吸着もしくは吸収剤とレーザ筐体内部が連
通され、レーザガス充填時には、連通されない構造とし
たものである。The excimer laser device according to Jin's invention has a structure in which a moisture adsorbing or absorbing agent is attached to the device, and when the laser gas is not filled, the adsorbing or absorbing agent communicates with the inside of the laser casing, but when the laser gas is filled, the excimer laser device does not communicate with the inside of the laser casing. This is what I did.
この発明におけるエキシマレーザ装置は、レーザガス未
充填時にレーザ筐体内部と水分吸着もしくは吸収剤が連
結されることによりレーザ筐体内部の水分が除去され、
レーザガス充填時にＦ、の減少がないため、繁雑なパフ
シベイシ四ンが不要であり、このためのガス消費も抑え
られる。In the excimer laser device of the present invention, moisture inside the laser housing is removed by connecting the inside of the laser housing with a moisture adsorbing or absorbing agent when the laser gas is not filled.
Since there is no decrease in F when filling the laser gas, there is no need for a complicated puffing process, and gas consumption for this purpose can also be suppressed.
以下、この発明の一実施例を図について説明する。第１
図において、（１）はレーザ筐体、（２）はレーザガス
ボンベ、（３）は真空ポンプ、（４）はレーザガス、（
５）は排気レーザガス、（６）はバルブ、（７）はシリ
ガゲル又はモレキュラーシーブ等の水分吸着もしくは吸
収剤、（８）は該吸着もしくは吸収剤を収容する容器、
（９）は窒素ガスボンベ、ａＱは窒素ガスである。An embodiment of the present invention will be described below with reference to the drawings. 1st
In the figure, (1) is the laser housing, (2) is the laser gas cylinder, (3) is the vacuum pump, (4) is the laser gas, (
5) is an exhaust laser gas, (6) is a valve, (7) is a moisture adsorption or absorption agent such as silica gel or molecular sieve, and (8) is a container containing the adsorption or absorption agent.
(9) is a nitrogen gas cylinder, and aQ is nitrogen gas.
次に動作について説明する。Next, the operation will be explained.
レーザ筐体（１）を、長時間稼動させることなしに放置
した後、レーザ発振を再開する際に、まず真空ポンプ（
３）によって、レーザ筐体（１）内のガスを排気する。After leaving the laser housing (1) without operating for a long time, when restarting laser oscillation, first turn on the vacuum pump (
3) exhausts the gas inside the laser housing (1).
次いで窒素ボンベ（９）より窒素ガスＱＱをレーザ筐体
（１）内に充填した後、バルブ（６）を開けて、容器（
８）とレーザ筐体（１）とを連結する。レーザ筐体等に
付着していた水分は、窒素ガス中に脱着し、窒素ガス中
の水分は水分吸着もしくは吸収剤（７）によって除去さ
れるというプロセスで、レーザ筐体（１）内の水分が完
全に脱着される。この後、レーザ筐体（１）内の窒素ガ
スを真空ポンプ（３）で排気し、次いでバルブ（６）を
閉じた後、レーザガスボンベ（２）からレーザガス（４
）をレーザ筐体内に充填する。仁の時、バルブ（６）を
閉じないとレーザガス中のハロゲンが水分吸着もしくは
吸収剤と反応し、レーザガス中からハロゲンが減少して
しまうため、レーザ出力が著しく低下する。第２図は上
記の操作を行なった場合のレーザ出力の経時変化を示し
たものであり、Ｌ！１Ｘ１０＠シ璽ット後もレーザ出力
はわずか２０％減少するにとどまっており、この発明の
効果は明らかである。Next, after filling the laser housing (1) with nitrogen gas QQ from the nitrogen cylinder (9), the valve (6) is opened and the container (
8) and the laser housing (1). Moisture attached to the laser casing etc. is desorbed into nitrogen gas, and the moisture in the nitrogen gas is removed by moisture adsorption or absorbent (7). is completely removed. After this, the nitrogen gas in the laser housing (1) is exhausted by the vacuum pump (3), and then the valve (6) is closed, and then the laser gas (4
) is filled into the laser housing. If the valve (6) is not closed when the laser gas is on, the halogen in the laser gas adsorbs moisture or reacts with the absorbent, reducing the amount of halogen in the laser gas, resulting in a significant decrease in laser output. Figure 2 shows the change in laser output over time when the above operations are performed, and L! Even after 1×10@shut, the laser output decreased by only 20%, and the effect of this invention is clear.
なお、上記実施例では、容器（８）とレーザ筐体（１）
とを連結し、水分の除去を行う際に、その除去効率を高
めるために窒素ガスを充填したが、特に、これに限られ
るものではなく、乾燥空気、ヘリウム、アルゴン等、ハ
ロゲン以外の、かつ反応性の少ないガスを充填しさえす
ればよい。また、除去効率は低くなるが、特に、これら
のガスを充填することなく、水分吸着もしくは吸収剤（
７）とレーザ筐体（１）とを連結するだけでもよい。In addition, in the above embodiment, the container (8) and the laser housing (1)
In order to increase the removal efficiency when removing moisture by connecting the All you need to do is fill it with a less reactive gas. In addition, the removal efficiency will be low, but especially if moisture adsorption or absorbent (
7) and the laser housing (1) may be simply connected.
さらに、上記実施例では、水分吸着もしくは吸収剤（７
）をレーザ筐体（１）の外部にある容器（８）に納めた
が、特にξれに限られるものではなく、レーザ筐体内部
に設けてもよく、レーザガスがレーザ筐体内に導入され
ていないときにレーザ筐体内部雰囲気と水分吸着もしく
は吸収剤とを開通させ、し−ザガスがレーザ筐体内に導
入されているときには閉鎖できる構造でありさえすれば
、特に構造上の制限はない。Furthermore, in the above embodiment, the moisture adsorption or absorbent (7
) is housed in the container (8) outside the laser housing (1), but it is not limited to ξ, and may be placed inside the laser housing, and the laser gas may be introduced into the laser housing. There are no particular structural limitations as long as the structure allows communication between the interior atmosphere of the laser casing and the moisture adsorbing or absorbing agent when the laser casing is not in use, and can be closed when laser gas is introduced into the laser casing.
以上のように、この発明によれば、レーザ筐体内部雰囲
気と水分吸着もしくは吸収剤を、レーザガス導入時以外
に開通させ、レーザガス導入時には閉鎖するように構成
したので、レーザガス中のハロゲンを消耗することなく
、レーザ筐体中の残留水分を除去でき、レーザの長寿命
連続運転を可能にする効果がある。As described above, according to the present invention, the interior atmosphere of the laser casing and the moisture adsorption or absorbent are opened at times other than when the laser gas is introduced, and are closed when the laser gas is introduced, so that the halogen in the laser gas is consumed. This has the effect of removing residual moisture in the laser casing without causing any damage, and enabling long-life continuous operation of the laser.
第１図は仁の発明の一実施例によるエキシマレーザ装置
を示す構成図、第２図はこの発明の一実施例によるエキ
シマレーザ装置のレーザ出力経時変化を示す特性図、及
び第３図は、従来装置におけるレーザ出力の経時変化を
示す特性図である。
図において、（１）はレーザ筐体、（４）はレーザガス
、（６）はバルブ、（７）は水分吸着もしくは吸収剤、
（８）は容器である。
ｔ：ｌ−１に１本
４ ： Ｌ−“す″グ゛又
６：バルブ”
７：水分味）ｊ（ｔ、ａｓ咳喧列
ざ路藷
Ｌ−ザ′士ノフネ目文寸（直 （０／−）し−ザ出力相
ｆ寸イ直（％）FIG. 1 is a configuration diagram showing an excimer laser device according to an embodiment of Jin's invention, FIG. 2 is a characteristic diagram showing changes in laser output over time of the excimer laser device according to an embodiment of the invention, and FIG. FIG. 2 is a characteristic diagram showing changes in laser output over time in a conventional device. In the figure, (1) is the laser housing, (4) is the laser gas, (6) is the valve, (7) is the moisture adsorption or absorbent,
(8) is a container. t: 1 bottle per l-1 4: L-“su” Gui Mata 6: Valve” 7: Water taste) 0/-) The output phase f dimension is correct (%)
Claims (1)
着もしくは吸収剤の入った容器を有し、かつ上記レーザ
ガスが上記レーザ筐体内に導入されている状態では上記
水分吸着もしくは吸収剤とレーザ筐体内部が連通せず、
上記レーザガスが上記レーザ筐体内にない状態において
は、上記水分吸着もしくは吸収剤とレーザ筐体内部とを
連通する手段とを備えてなるエキシマレーザ装置。It has a container that is connected to the laser casing into which the laser gas is introduced and contains a moisture adsorbing or absorbing agent, and when the laser gas is introduced into the laser casing, the moisture adsorbing or absorbing agent and the laser casing are connected to the laser casing. There is no communication inside,
An excimer laser device comprising means for communicating the moisture adsorbing or absorbing agent with the inside of the laser housing when the laser gas is not present in the laser housing.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4826288A JPH01222493A (en) | 1988-02-29 | 1988-02-29 | Excimer laser device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4826288A JPH01222493A (en) | 1988-02-29 | 1988-02-29 | Excimer laser device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01222493A true JPH01222493A (en) | 1989-09-05 |
Family
ID=12798524
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4826288A Pending JPH01222493A (en) | 1988-02-29 | 1988-02-29 | Excimer laser device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01222493A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1999066609A3 (en) * | 1998-06-16 | 2000-01-27 | Tuilaser Ag | Light source with a cavity including a gas |
-
1988
- 1988-02-29 JP JP4826288A patent/JPH01222493A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1999066609A3 (en) * | 1998-06-16 | 2000-01-27 | Tuilaser Ag | Light source with a cavity including a gas |
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