JPH01219833A - Photosensitive resin composition - Google Patents
Photosensitive resin compositionInfo
- Publication number
- JPH01219833A JPH01219833A JP4674388A JP4674388A JPH01219833A JP H01219833 A JPH01219833 A JP H01219833A JP 4674388 A JP4674388 A JP 4674388A JP 4674388 A JP4674388 A JP 4674388A JP H01219833 A JPH01219833 A JP H01219833A
- Authority
- JP
- Japan
- Prior art keywords
- polymer
- photosensitive resin
- parts
- resin composition
- acrylate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011342 resin composition Substances 0.000 title claims description 16
- 229920000642 polymer Polymers 0.000 claims abstract description 37
- 239000004215 Carbon black (E152) Substances 0.000 claims abstract description 13
- 229930195733 hydrocarbon Natural products 0.000 claims abstract description 13
- 239000000460 chlorine Substances 0.000 claims abstract description 12
- 229920001477 hydrophilic polymer Polymers 0.000 claims abstract description 12
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910052801 chlorine Inorganic materials 0.000 claims abstract description 11
- 239000003999 initiator Substances 0.000 claims abstract description 7
- 230000009477 glass transition Effects 0.000 claims abstract description 5
- -1 diene hydrocarbon Chemical class 0.000 claims description 23
- 229920001971 elastomer Polymers 0.000 abstract description 17
- 239000005060 rubber Substances 0.000 abstract description 13
- 229920005989 resin Polymers 0.000 abstract description 10
- 239000011347 resin Substances 0.000 abstract description 10
- 150000002430 hydrocarbons Chemical class 0.000 abstract description 5
- 230000001771 impaired effect Effects 0.000 abstract description 5
- 239000000463 material Substances 0.000 abstract description 3
- 125000001309 chloro group Chemical group Cl* 0.000 abstract description 2
- 239000000178 monomer Substances 0.000 abstract 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 17
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- 239000000203 mixture Substances 0.000 description 13
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 12
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 12
- 150000001875 compounds Chemical class 0.000 description 12
- 229920001577 copolymer Polymers 0.000 description 11
- 239000000243 solution Substances 0.000 description 11
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 8
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 8
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 6
- 239000003431 cross linking reagent Substances 0.000 description 6
- 229920005558 epichlorohydrin rubber Polymers 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 5
- 239000004372 Polyvinyl alcohol Substances 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- 125000006182 dimethyl benzyl group Chemical group 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 229920002451 polyvinyl alcohol Polymers 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000000806 elastomer Substances 0.000 description 4
- 229920006267 polyester film Polymers 0.000 description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 4
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 3
- 239000004709 Chlorinated polyethylene Substances 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Natural products CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 3
- 239000004743 Polypropylene Substances 0.000 description 3
- 244000028419 Styrax benzoin Species 0.000 description 3
- 235000000126 Styrax benzoin Nutrition 0.000 description 3
- 235000008411 Sumatra benzointree Nutrition 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- NTXGQCSETZTARF-UHFFFAOYSA-N buta-1,3-diene;prop-2-enenitrile Chemical compound C=CC=C.C=CC#N NTXGQCSETZTARF-UHFFFAOYSA-N 0.000 description 3
- ISAOCJYIOMOJEB-UHFFFAOYSA-N desyl alcohol Natural products C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 3
- 235000019382 gum benzoic Nutrition 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 229920001155 polypropylene Polymers 0.000 description 3
- 239000004814 polyurethane Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- 229920013646 Hycar Polymers 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 150000004056 anthraquinones Chemical class 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- 239000012965 benzophenone Substances 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 230000014759 maintenance of location Effects 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 229920005575 poly(amic acid) Polymers 0.000 description 2
- 229920000162 poly(ureaurethane) Polymers 0.000 description 2
- 229920002401 polyacrylamide Polymers 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L sodium carbonate Substances [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- DNIAPMSPPWPWGF-VKHMYHEASA-N (+)-propylene glycol Chemical compound C[C@H](O)CO DNIAPMSPPWPWGF-VKHMYHEASA-N 0.000 description 1
- LGPAKRMZNPYPMG-UHFFFAOYSA-N (3-hydroxy-2-prop-2-enoyloxypropyl) prop-2-enoate Chemical compound C=CC(=O)OC(CO)COC(=O)C=C LGPAKRMZNPYPMG-UHFFFAOYSA-N 0.000 description 1
- YPFDHNVEDLHUCE-UHFFFAOYSA-N 1,3-propanediol Substances OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- SJLLJZNSZJHXQN-UHFFFAOYSA-N 1-dodecylpyrrole-2,5-dione Chemical compound CCCCCCCCCCCCN1C(=O)C=CC1=O SJLLJZNSZJHXQN-UHFFFAOYSA-N 0.000 description 1
- PTBDIHRZYDMNKB-UHFFFAOYSA-N 2,2-Bis(hydroxymethyl)propionic acid Chemical compound OCC(C)(CO)C(O)=O PTBDIHRZYDMNKB-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 1
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- FPKCTSIVDAWGFA-UHFFFAOYSA-N 2-chloroanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3C(=O)C2=C1 FPKCTSIVDAWGFA-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- LKVFCSWBKOVHAH-UHFFFAOYSA-N 4-Ethoxyphenol Chemical compound CCOC1=CC=C(O)C=C1 LKVFCSWBKOVHAH-UHFFFAOYSA-N 0.000 description 1
- JHWGFJBTMHEZME-UHFFFAOYSA-N 4-prop-2-enoyloxybutyl prop-2-enoate Chemical compound C=CC(=O)OCCCCOC(=O)C=C JHWGFJBTMHEZME-UHFFFAOYSA-N 0.000 description 1
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 1
- MWMBMDKWXVQCHY-UHFFFAOYSA-N C.OC(=O)C=C Chemical compound C.OC(=O)C=C MWMBMDKWXVQCHY-UHFFFAOYSA-N 0.000 description 1
- YJDZIRWAZWFZRC-UHFFFAOYSA-N C1=CC=CC=2SC3=CC=CC=C3C(C12)=O.[Cl] Chemical compound C1=CC=CC=2SC3=CC=CC=C3C(C12)=O.[Cl] YJDZIRWAZWFZRC-UHFFFAOYSA-N 0.000 description 1
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- 229920000181 Ethylene propylene rubber Polymers 0.000 description 1
- 229920000663 Hydroxyethyl cellulose Polymers 0.000 description 1
- 239000004354 Hydroxyethyl cellulose Substances 0.000 description 1
- 229920002153 Hydroxypropyl cellulose Polymers 0.000 description 1
- HEFNNWSXXWATRW-UHFFFAOYSA-N Ibuprofen Chemical compound CC(C)CC1=CC=C(C(C)C(O)=O)C=C1 HEFNNWSXXWATRW-UHFFFAOYSA-N 0.000 description 1
- OWYWGLHRNBIFJP-UHFFFAOYSA-N Ipazine Chemical compound CCN(CC)C1=NC(Cl)=NC(NC(C)C)=N1 OWYWGLHRNBIFJP-UHFFFAOYSA-N 0.000 description 1
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- GHAZCVNUKKZTLG-UHFFFAOYSA-N N-ethyl-succinimide Natural products CCN1C(=O)CCC1=O GHAZCVNUKKZTLG-UHFFFAOYSA-N 0.000 description 1
- HDFGOPSGAURCEO-UHFFFAOYSA-N N-ethylmaleimide Chemical compound CCN1C(=O)C=CC1=O HDFGOPSGAURCEO-UHFFFAOYSA-N 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000002202 Polyethylene glycol Chemical group 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- WOHZYEVISRQVQX-UHFFFAOYSA-N [Cl].C(C1=CC=CC=C1)(=O)C1=CC=CC=C1 Chemical compound [Cl].C(C1=CC=CC=C1)(=O)C1=CC=CC=C1 WOHZYEVISRQVQX-UHFFFAOYSA-N 0.000 description 1
- 150000008062 acetophenones Chemical class 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 229920000800 acrylic rubber Polymers 0.000 description 1
- 238000012644 addition polymerization Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 239000011260 aqueous acid Substances 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- VDETZMGKOHNVOT-UHFFFAOYSA-N butane;styrene Chemical compound CCCC.C=CC1=CC=CC=C1 VDETZMGKOHNVOT-UHFFFAOYSA-N 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- PMMYEEVYMWASQN-IMJSIDKUSA-N cis-4-Hydroxy-L-proline Chemical compound O[C@@H]1CN[C@H](C(O)=O)C1 PMMYEEVYMWASQN-IMJSIDKUSA-N 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- JBSLOWBPDRZSMB-FPLPWBNLSA-N dibutyl (z)-but-2-enedioate Chemical compound CCCCOC(=O)\C=C/C(=O)OCCCC JBSLOWBPDRZSMB-FPLPWBNLSA-N 0.000 description 1
- 229920003244 diene elastomer Polymers 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- IEPRKVQEAMIZSS-AATRIKPKSA-N diethyl fumarate Chemical compound CCOC(=O)\C=C\C(=O)OCC IEPRKVQEAMIZSS-AATRIKPKSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- MHCLJIVVJQQNKQ-UHFFFAOYSA-N ethyl carbamate;2-methylprop-2-enoic acid Chemical compound CCOC(N)=O.CC(=C)C(O)=O MHCLJIVVJQQNKQ-UHFFFAOYSA-N 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 125000003827 glycol group Chemical group 0.000 description 1
- 229920006158 high molecular weight polymer Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 235000019447 hydroxyethyl cellulose Nutrition 0.000 description 1
- 239000001863 hydroxypropyl cellulose Substances 0.000 description 1
- 235000010977 hydroxypropyl cellulose Nutrition 0.000 description 1
- 239000001866 hydroxypropyl methyl cellulose Substances 0.000 description 1
- 229920003088 hydroxypropyl methyl cellulose Polymers 0.000 description 1
- UFVKGYZPFZQRLF-UHFFFAOYSA-N hydroxypropyl methyl cellulose Chemical compound OC1C(O)C(OC)OC(CO)C1OC1C(O)C(O)C(OC2C(C(O)C(OC3C(C(O)C(O)C(CO)O3)O)C(CO)O2)O)C(CO)O1 UFVKGYZPFZQRLF-UHFFFAOYSA-N 0.000 description 1
- 235000010979 hydroxypropyl methyl cellulose Nutrition 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229960003505 mequinol Drugs 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- VSXGXPNADZQTGQ-UHFFFAOYSA-N oxirane;phenol Chemical compound C1CO1.OC1=CC=CC=C1 VSXGXPNADZQTGQ-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920002755 poly(epichlorohydrin) Polymers 0.000 description 1
- 229920001495 poly(sodium acrylate) polymer Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001223 polyethylene glycol Chemical group 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920000166 polytrimethylene carbonate Polymers 0.000 description 1
- 229920003225 polyurethane elastomer Polymers 0.000 description 1
- 229920003226 polyurethane urea Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- NNMHYFLPFNGQFZ-UHFFFAOYSA-M sodium polyacrylate Chemical compound [Na+].[O-]C(=O)C=C NNMHYFLPFNGQFZ-UHFFFAOYSA-M 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明はゴム弾性を自し、かつ水系現象iiJ能な感光
性樹脂組成物に関し、特にフレキソ印刷版に応用される
感光性樹脂組成物に関する。Detailed Description of the Invention (Industrial Application Field) The present invention relates to a photosensitive resin composition that has rubber elasticity and is capable of aqueous phenomena, and particularly relates to a photosensitive resin composition that is applied to flexographic printing plates. .
(従来の技術)
従来のフレキソ印刷用感光性樹脂板としては有機溶剤で
現象するものが知られているが、これらの印刷版は13
kP1、引火V1・など人体および環境への安全性に問
題があった。(Prior art) Conventional photosensitive resin plates for flexographic printing are known to react with organic solvents, but these printing plates
There were safety problems for the human body and the environment, such as kP1 and flammability V1.
そのためこれに代わるものとして、水系現象l−11能
な感光シ1樹脂組成物か提案されている。Therefore, as an alternative to this, a photosensitive resin composition capable of a water-based phenomenon has been proposed.
たとえば、共役ジエン系炭化水素とα、β−エチレン性
不飽和カルボン酸を必須成分とし、これにモノオレフィ
ン系不飽和化合物とを含むノ(重合体と光市合性不飽和
弔M体、光増感剤を含有する感光性樹脂組成物を用いる
方法(特開昭52−134855号)や、共役ジエン系
炭化水素重合体又は共役ジエン系炭化水素とモノオレフ
ィン系不飽和化合物との共重合体と親水性高分子化合物
、非気体状エチレン性不飽和化合物および光重合開始剤
を必須成分として含有してなる感光性エラストマー組成
物(特開昭60−211451シづ)等がある。ところ
が+lif記組成物は水系現象液、例えばアルカリ水溶
液又はアルカリ水−有機溶剤系による現像がIIJ能で
あるが、ベースか共役ジエン系炭化水素であるため、フ
レキソ印刷版として7背な耐オゾン性、耐候性、耐酸化
性か不1分であるという問題点をイj−シていた。For example, a polymer containing a conjugated diene hydrocarbon and an α,β-ethylenically unsaturated carboxylic acid as essential components, and a monoolefinically unsaturated compound (a polymer and a photocommercially unsaturated compound, A method using a photosensitive resin composition containing a sensitizer (JP-A-52-134855), a conjugated diene hydrocarbon polymer or a copolymer of a conjugated diene hydrocarbon and a monoolefinic unsaturated compound There are photosensitive elastomer compositions (JP-A-60-211451) which contain a hydrophilic polymer compound, a non-gaseous ethylenically unsaturated compound, and a photopolymerization initiator as essential components. The composition can be developed with an aqueous developing solution, such as an alkaline aqueous solution or an alkaline water-organic solvent system, but since it is based on a conjugated diene hydrocarbon, it has poor ozone resistance and weather resistance as a flexographic printing plate. However, the problem of poor oxidation resistance has been addressed.
そこで、本発明者らはエピクロルヒドリンゴムと親水性
ポリマーとエチレン性不飽和化合物および光1刊合開始
剤を3自する感光性樹脂組成物を見出し、前記問題点を
克服した。Therefore, the present inventors have discovered a photosensitive resin composition containing epichlorohydrin rubber, a hydrophilic polymer, an ethylenically unsaturated compound, and a photopolymerization initiator, and have overcome the above-mentioned problems.
(発明が解決しようとする課題)
しかしながら前記組成物中のエチレン性不飽和化合物と
して、汎用の多官能低分子’ Fd化合物を用いた場合
、その硬化物の硬度が過剰に高く、かつゴム弾性が低い
ためにフレキソ印刷版には不向きであるという問題点が
生した。(Problems to be Solved by the Invention) However, when a general-purpose polyfunctional low molecular Fd compound is used as the ethylenically unsaturated compound in the composition, the hardness of the cured product is excessively high and the rubber elasticity is low. A problem arose in that it was unsuitable for flexo printing plates due to its low temperature.
なお硬度とゴム弾性たけであればポリエステルウレタン
アクリレート、ポリエーテルウレタンアクリレート等の
汎用オリゴアクリレート類の中には11!1足できるも
のもあるか、これらは耐水系インキ性に劣るためフレキ
ソ印刷版には不向きであり、さらに分J’ ttt 6
000〜10000のオリゴブタジェンアクリレートを
使用する提案(特開昭62−165843号公報)もあ
るが、これは自機溶剤現像型であった。As far as hardness and rubber elasticity are concerned, there are some general-purpose oligoacrylates such as polyester urethane acrylate and polyether urethane acrylate that can hold up to 11!1, but these are not suitable for flexo printing plates because they have poor water-resistant ink properties. is unsuitable, and furthermore, J' ttt 6
There is also a proposal to use oligobutadiene acrylate of 000 to 10,000 (Japanese Unexamined Patent Publication No. 165843/1983), but this was of an in-house solvent development type.
(課題を解決するための1段)
そこで木発明者らは鋭、こ(検討の結果、エチレン性不
飽和J1(を未9;んあるいは側鎖に有する共役ツエン
系炭化水素3自オリゴマーまたはポリマーを用いること
により前記問題点を解決するとともに、耐水系インク性
をも向1−させた。すなわち本発明は(A)塩素r(自
iit ;’)’ 10〜50 市:rt % テ、か
つガラス転移温度が5℃以ドのポリマー、(B)j3!
水性ポリマー、(C)エチレン性不飽和基を末端あるい
は側鎖に有する共役ジエン系炭化水素含有オリゴマーま
たはポリマーおよび(1))光重合開始剤を含有するこ
とを特徴とする感光性樹脂組成物である。(The first step to solving the problem) Therefore, the inventors of the present invention discovered that the inventors of the present invention have developed the following research: As a result of their investigation, they found that conjugated tsene-based hydrocarbon 3-auto oligomers or polymers having ethylenically unsaturated J1( By using the above-mentioned problem, the water-resistant ink was improved.In other words, the present invention solves the above-mentioned problems and improves the waterproof ink resistance.That is, the present invention solves the above problems and improves the waterproof ink resistance. Polymer with a glass transition temperature of 5°C or higher, (B)j3!
A photosensitive resin composition comprising an aqueous polymer, (C) a conjugated diene hydrocarbon-containing oligomer or polymer having an ethylenically unsaturated group at the terminal or side chain, and (1) a photopolymerization initiator. be.
本発明における(A)成分である塩素含有率が50〜1
0 市ttt%で、かつガラス転移を温度(以ドTgと
いう)が5℃以ドのポリマーとしては、塩素1京rを含
イrする中i、1体の小会、又は塩素原rを含有する中
;1体とへ小会し得る他のjlj i1体とのへ市会か
ら得られる。又、塩素又は塩素を含むt1η性物質と塩
素原rを含有しない・重合体を反応することからも得ら
れる。具体的にはド記のものを挙げることができる。エ
ピクロルヒドリン重合体、エピクロルヒドリン−エチレ
ンオキシド共重合体、エピクロルヒドリン−プロピレン
オキシド」(重合体および、又はこれらとアリルグリシ
ジルエーテルの共重合体であるエピクロルヒドリンゴム
〔大阪費達[業「唱製エビクロマ−、Goodvich
@旬製HYDRIN、 r1本ゼ、t 71121製
GEC)IRON 、ゼオスハン、Hevcules
ll製HERCLORl) 、塩素化ポリエチレン〔昭
和上−[−相製 エラスレン、大阪曹達T、業)旬製ダ
イソラック、Hoechst n’jiJ製 HORT
ALITZ 1Dow Chemjca1913製 D
OW CPE ) 、塩化ビニル共重合体、塩化ビニリ
デン、塩素化ポリプロピレン、塩素化エチレン−プロピ
レンゴムなどが挙ケラれ、これらのポリマーは?11−
独でも、二種以1ユ組合せて用いてもよい。The chlorine content of component (A) in the present invention is 50 to 1
Polymers with a glass transition temperature (hereinafter referred to as Tg) of 5°C or lower include a polymer containing 1 trillion chlorine, 1 small group, or a chlorine source. Contains: Obtained from a meeting with another jlj i1 that can be assembled with one. It can also be obtained by reacting chlorine or a t1η substance containing chlorine with a polymer that does not contain a chlorine source r. Specifically, the following can be mentioned. Epichlorohydrin polymer, epichlorohydrin-ethylene oxide copolymer, epichlorohydrin-propylene oxide (polymer and/or epichlorohydrin rubber, which is a copolymer of these and allyl glycidyl ether)
@Shun made HYDRIN, r1honze, t71121 made GEC) IRON, Zeoshan, Hevcules
HERCLORl manufactured by Ill), chlorinated polyethylene (Elasuren manufactured by Showa J-[-Ai, Osaka Soda T, industry) Daisolac manufactured by Shun, HORT manufactured by Hoechst n'jiJ
ALITZ 1Dow Made by Chemjca1913 D
OW CPE), vinyl chloride copolymer, vinylidene chloride, chlorinated polypropylene, chlorinated ethylene-propylene rubber, etc. What are these polymers? 11-
It may be used alone or in combination of two or more.
本発明において(A)ポリマーの塩素含有率は、10〜
50屯晴%であり、この範囲をはずれると、その柔軟性
が損なわれたり、熱安定性が悪くなって、感光シ1樹脂
組成物が硬すぎたり、着色が生じ易くなるので好ましく
ない。なお塩素原r−を含むノ(役ジエン系炭化水素屯
合体又はその共重合体はIE鎖中に炭素不飽和結合を3
打するので、耐候性などの化学安定性か飽和結合のみの
場合より劣る欠点がある。また光Q((射後の感光性樹
脂組成物の物性は本発明における(A)成分の性質に大
きく依イjするので、(A)成分が木質的にゴム弾性体
であることか好ましい。そのため、そのTgは5℃以ド
が必“易であり、特に−10℃以ドが好ましい。In the present invention, the chlorine content of the polymer (A) is 10 to
If it is outside this range, its flexibility will be impaired, its thermal stability will deteriorate, the photosensitive resin composition will be too hard, and it will be more likely to be colored, which is not preferable. Note that diene-based hydrocarbon polymers or their copolymers containing chlorine atoms r- have 3 carbon unsaturated bonds in the IE chain.
Because of this, it has the disadvantage that chemical stability such as weather resistance is inferior to the case with only saturated bonds. In addition, since the physical properties of the photosensitive resin composition after irradiation with light Q(() largely depend on the properties of the component (A) in the present invention, it is preferable that the component (A) is a woody rubber elastic body. Therefore, its Tg is necessarily 5°C or lower, and particularly preferably -10°C or lower.
なお本発明では、前記(A)成分であるポリマーのみな
らずこれと相容性の良好かつ耐オゾン性のあるエラスト
マー、たとえばアクリルゴム、ポリウレタン系エラスト
マーなどをブレンドしてもよい。In the present invention, in addition to the polymer as component (A), an elastomer having good compatibility with the polymer and having ozone resistance, such as acrylic rubber or polyurethane elastomer, may be blended.
本発明における(A)成分の全組成物中の含有率は、印
刷版としての物性および形状保持性を4廖して20千i
i1%以[0、特に30IT+′量%以l−が好ましく
、また光重合性の点からみて、80屯晴%以ド、特に7
01T!、: !it%以ドが好ましい。In the present invention, the content of component (A) in the entire composition is 20,000 i after considering the physical properties and shape retention properties as a printing plate.
It is preferably 1% or more [0, especially 30IT+'% by weight or less, and from the viewpoint of photopolymerizability, it is preferably 80IT+'% or more, especially 7
01T! , : ! Preferably it is less than or equal to it%.
本発明の(B)成分である親水性ポリマーとは水、また
は水を1:、成分として、アルカリ性水溶液、酸性水溶
酸、何機溶剤、又は界面活性剤等を含む現像液にtiJ
溶あるいは膨潤(分散)するポリマーを意味する。The hydrophilic polymer which is the component (B) of the present invention is water, or a developer containing 1:1 water, an alkaline aqueous solution, an acidic aqueous acid, a solvent, or a surfactant as a component.
A polymer that dissolves or swells (disperses).
例えば、水酸基、カルボキシル基、アミノ基、スルホン
酸基等の親水性基および/あるいはポリエチレングリコ
ール鎖を有するポリマーが挙げられ、具体的にはポリビ
ニルアルコール、カルボキンメチルセルロース、ヒドロ
キシエチルセルロース、水溶性ポリウレタン、水溶性ポ
リウレアウレタン、水溶性ポリエステル水溶性エポキシ
化合物カルボキシル基含有アクリロニトリル−ブタジェ
ンコポリマー、カルボキシル基含有スチレン・ブタジェ
ン・コポリマー、カルボキシル基含有ポリブタツエン、
ポリアクリルアミド、ポリアクリル酸ナトリウム、カル
ボキシル基等の親水性基を有するポリウレタン、カルボ
キシル基含有ポリウレアウレタン、ポリアミド酸3が使
用できるが、これらに限定されるものではない。なお前
記力ルボキンルノ人はアルカリ金属、アルカリ土類金属
、アルミニウム、アミン、アノモニウt1なとで塩を形
成していてもよい。Examples include polymers having hydrophilic groups such as hydroxyl groups, carboxyl groups, amino groups, and sulfonic acid groups and/or polyethylene glycol chains. Specific examples include polyvinyl alcohol, carboxyl methyl cellulose, hydroxyethyl cellulose, water-soluble polyurethane, and polyurea urethane, water-soluble polyester water-soluble epoxy compound, carboxyl group-containing acrylonitrile-butadiene copolymer, carboxyl group-containing styrene-butadiene copolymer, carboxyl group-containing polybutatsuene,
Polyacrylamide, sodium polyacrylate, polyurethane having a hydrophilic group such as a carboxyl group, polyurea urethane containing a carboxyl group, and polyamic acid 3 can be used, but are not limited to these. Incidentally, the above-mentioned metal salt may form a salt with an alkali metal, alkaline earth metal, aluminum, amine, aluminum t1, or the like.
(B)成分の全組成物中の含有率は、水系現像性や耐水
系インク性を4旗して、5〜50 iTCtJ%、特に
7〜40屯1□1%が好ましい。The content of component (B) in the entire composition is preferably 5 to 50 iTCtJ%, particularly 7 to 40 tons 1□1%, taking into account water-based developability and water-based ink resistance.
本発明における(C)成分のエチレン性不飽和基を末端
あるいは側鎖に打する共役ツエン系炭化水素含有オリゴ
マーまたはポリマーは少なくとも1個の末端エチレン性
基を含有するものであり、分子!A300〜10000
、特に1000〜5000が好ましく、遊離ラジカル開
始された連鎖生長付加重合によりさらに高分子重合体を
形成しtiJるものである。具体的には例えば、オリゴ
ブタジェン(メタ)アクリレート、オリゴスチレンブタ
ジェン(メタ)アクリレート、オリゴニトリルブタンエ
ン(メタ)アクリレート、オリゴイソプレン(メタ)ア
クリレート、オリゴブタジェンウレタン(メタンアクリ
レート、オリゴスチレンブタジェンウレタン(メタ)ア
クリレート、オリゴブタジェンアミドアクリレートなど
が挙げられ、これらは単独でも組合せて用いてもよいが
、これらに限定されるものではない。In the present invention, the conjugated tenne hydrocarbon-containing oligomer or polymer having an ethylenically unsaturated group attached to the end or side chain of component (C) contains at least one terminal ethylenically group, and is a molecule! A300~10000
, particularly preferably 1,000 to 5,000, in which a high molecular weight polymer is further formed by free radical initiated chain growth addition polymerization. Specifically, for example, oligobutadiene (meth)acrylate, oligostyrene butanene (meth)acrylate, oligonitrile butanene (meth)acrylate, oligoisoprene (meth)acrylate, oligobutadiene urethane (methane acrylate, oligostyrene butanene (meth)acrylate, Genurethane (meth)acrylate, oligobutadienamide acrylate, etc. may be used alone or in combination, but are not limited thereto.
本発明において、(C)成分として前記オリゴマーまた
はポリマー以外に従来より公知のエチレン性不飽和化合
物を併用してもよく、適当なエチレン性不飽和化合物と
してはポリオール類の不飽和エステル、特にα−メチレ
ンカルボン酸とのかかるエステル類であり、例えばエチ
レングリコールジ(メタ)アクリレート、ジエチレング
リコールジ(メタ)アクリレート、グリセロールジアク
リレート、1,3−プロパンジオールジ(メタ)アクリ
レート、1,4−ブタンジオールジ(メタ)アクリレ−
)、1,2.4−ブタントリオールトリ(メタ)アクリ
レ−)、1.4−シクロヘキサンジオールジ(メタ)ア
クリレート、■、6−ヘキサンシオールジ(メタ)アク
リレート、トリメチロールプロパントリ(メタ)アクリ
レートジアリルフタレート、フマル酸ジエチルエステル
、マレイン酸ジブチルエステルなどが挙げられ、またN
−メチルマレイミド、N−エチルマレイミド、N−ラウ
リルマレイミドなどのN置換マレイミド化合物、などが
挙げられ、これらはり1独でも組合せて用いてもよい。In the present invention, as component (C), conventionally known ethylenically unsaturated compounds may be used in combination with the above-mentioned oligomers or polymers. Suitable ethylenically unsaturated compounds include unsaturated esters of polyols, especially α- Such esters with methylene carboxylic acid, such as ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, glycerol diacrylate, 1,3-propanediol di(meth)acrylate, 1,4-butanediol diacrylate, (Meta)acrylate
), 1,2,4-butanetrioltri(meth)acrylate), 1,4-cyclohexanediol di(meth)acrylate, ■,6-hexanethiol di(meth)acrylate, trimethylolpropane tri(meth)acrylate Examples include diallyl phthalate, fumaric acid diethyl ester, maleic acid dibutyl ester, and N
Examples include N-substituted maleimide compounds such as -methylmaleimide, N-ethylmaleimide, and N-laurylmaleimide, and these may be used alone or in combination.
(C)成分の全組成物中の含有率は1〜50市ニル%が
好ましく、lセ撤%より少ないと光重合性に支障が出る
ため、現像後に画像が残らなくなる。The content of component (C) in the entire composition is preferably from 1 to 50%, and if it is less than 1%, photopolymerizability will be impaired and no image will remain after development.
逆に50 ’[< in%より多いと形状保持性に支障
が出る。また光照射後の阪か硬く、脆くなるため、フレ
キソ印刷用版材としては不向きになるので好ましくない
。さらに望ましくは5〜40重(11%である。On the other hand, if the amount is more than 50'[< in%, shape retention will be impaired. Furthermore, the plates become hard and brittle after irradiation with light, making them unsuitable as flexo printing plates, which is not preferable. More preferably, it is 5 to 40 weights (11%).
本発明における(r))成分の光重合開始剤としては、
例えばベンゾフェノン類、ベンゾイン類、アセトフェノ
ン類、ベンジル類、ベンゾイン拳アルキル・エーテル類
、ペンジルアルキルケタール類、アントラキノン類、チ
オキサントン類等が挙げられる。具体的には、ベンゾフ
ェノン、クロル・ベンゾフェノン、ベンゾイン、アセト
フェノン、ベンジル、ベンゾイン類
ジイン舎エチル書エーテル、ベンツイン・インプロピル
・エーテル、ベンゾイン・イソブチルエーテル、ベンノ
ル・ジメチルケタール、ベンンル拳ンエチルΦケタール
、ベンジル嗜シ・イソプロピル拳ケタール、アントラキ
ノン、2−クロルアントラキノン、チオキサントン、2
−クロル・チオキサントン等がある。As the photopolymerization initiator of component (r) in the present invention,
Examples include benzophenones, benzoins, acetophenones, benzyls, benzoin alkyl ethers, penzylalkyl ketals, anthraquinones, thioxanthones, and the like. Specifically, benzophenone, chlor benzophenone, benzoin, acetophenone, benzyl, benzoin derivatives ethyl ether, benzine impropyl ether, benzoin isobutyl ether, benol dimethyl ketal, benzyl ethyl Φ ketal, benzyl Isopropyl fist ketal, anthraquinone, 2-chloroanthraquinone, thioxanthone, 2
-There are chlor thioxanthone, etc.
これらは組成物中、0.01〜5 ’RPi1%含有さ
れる。0.01%より少ないと光小会開始能に支障が出
る。5%より多いと、自らの遮光により硬化深度が得ら
れなくなり、現像により画像が欠は易くなるので好まし
くない。さらに望ましくは0.1〜3重id%である。These are contained in the composition in an amount of 0.01 to 1% of 5' RPi. If it is less than 0.01%, the ability to start a light session will be impaired. If it exceeds 5%, it is not preferable because the curing depth cannot be obtained due to its own light shielding, and the image is likely to be chipped during development. More preferably, it is 0.1 to 3 id%.
本発明において、光架橋反応を抑制することなく、弔に
熱重合のみを防11・するために、前記要件(A)〜(
D)以外に、(E)熱小会禁11剤を0.001〜5
m j=%含有させてもよい。有用な熱千合禁山剤とし
ては例えば、ハイドロキノン、ハイドロキノンモノエチ
ルエーテル、カテコール、p−t−ブチルカテコール、
2,6−ジーも一ブチルーp−タレソールなとが挙げら
れる。In the present invention, in order to prevent only thermal polymerization without suppressing the photo-crosslinking reaction, the requirements (A) to (11) are as follows.
In addition to D), (E) 0.001 to 5
You may contain mj=%. Useful thermal inhibitors include, for example, hydroquinone, hydroquinone monoethyl ether, catechol, pt-butylcatechol,
2,6-di also includes monobutyl-p-talesol.
本発明の感光性樹脂組成物には他にi+J塑剤として、
液状ポリブタンエンゴム、液状ポリアクリロニトリルブ
タジェンゴム、l夜状ポリスチレンブタノエンゴム、液
状インプレンゴム3・の、液状ゴムや、ポリビニルクロ
ライド、塩素化ポリエチレン、塩素化ポリプロピレン、
等の比較的低分子 fitのエラストマー、シリカ、硅
藻L′yPの微粉体等を3自することかできる。In addition, the photosensitive resin composition of the present invention includes i+J plasticizers,
Liquid polybutane rubber, liquid polyacrylonitrile butadiene rubber, nightly polystyrene butanoene rubber, liquid imprene rubber, polyvinyl chloride, chlorinated polyethylene, chlorinated polypropylene,
It is possible to use relatively low-molecular-weight elastomers such as silica, fine powder of silica L'yP, etc.
本発明の感光性樹脂組成物を用いてフレキソ印刷原版を
作成するh法としては、1);I記名組成分を任こ(の
順序により適当な溶剤、例えばテトラヒドロフラン、ジ
オキサン、メチルエチルケトン、ンクロヘキサノン、ク
ロロホルム智に溶解し溶剤を除去して、その後適当な支
持体、例えばポリエステル、ポリエチレン、ポリプロピ
レンなどのフィルムに加熱、圧着することにより作成す
ることが出来る。また支持体と異なる面に同じ様なフィ
ルムあるいは水系現像液に=I溶なポリビニルアルコー
ル、ポリアクリルアミド、ヒドロキシプロピルセルロー
ス等の薄層をコーティング又はラミネートしたフィルム
を設けてもよい。The method of preparing a flexographic printing original plate using the photosensitive resin composition of the present invention is as follows: 1); Input the named components in (in this order) and use a suitable solvent, such as tetrahydrofuran, dioxane, methyl ethyl ketone, cyclohexanone, It can be prepared by dissolving it in chloroform and removing the solvent, and then heating and press-bonding it to a suitable support, such as a film made of polyester, polyethylene, polypropylene, etc. Also, a similar film can be formed on a different side from the support. Alternatively, a film coated or laminated with a thin layer of polyvinyl alcohol, polyacrylamide, hydroxypropyl cellulose, etc. which is soluble in an aqueous developer may be provided.
本発明組成物を用いた感光性樹脂板を硬化させる際に使
用される紫外線は150〜500mμの波長、特に30
0〜400早の波長領域のものが有効であり、使用され
る光源としては低圧水銀灯、高IF水銀灯、カーボンア
ーク灯、紫外線けい先月、ケミカルランプ、キセノンラ
ンプ、ジルコニウムランプが望ましい。本発明組成物よ
りなる感光性樹脂板はlt記光源を用いて透明画像を有
するネガフィルムを当てて紫外線を照射し画像露光させ
た後、露光されない非画像部を現像液を用いて除去し、
レリーフ画像が得られる。The ultraviolet rays used when curing the photosensitive resin plate using the composition of the present invention have a wavelength of 150 to 500 mμ, particularly 30 mμ.
Those in the wavelength range of 0 to 400 m are effective, and the light sources used are preferably low pressure mercury lamps, high IF mercury lamps, carbon arc lamps, ultraviolet rays, chemical lamps, xenon lamps, and zirconium lamps. The photosensitive resin plate made of the composition of the present invention is image-exposed by applying ultraviolet rays to a negative film having a transparent image using the light source described above, and then removing the non-image areas that are not exposed using a developer,
A relief image is obtained.
前記現像液としては、水道水を1:、成分として、水酸
化ナトリウム、炭酸ナトリウム等のアルカリ性化合物、
界面活性剤、水溶性4T機溶剤等を含有できる。The developing solution contains 1:1 tap water, alkaline compounds such as sodium hydroxide and sodium carbonate as components,
It can contain a surfactant, a water-soluble 4T solvent, etc.
なお現像液は25℃〜45℃で用いられるのが好ましい
。Note that the developer is preferably used at a temperature of 25°C to 45°C.
本発明組成物によって得られた感光性樹脂板はゴム弾性
を自し、フレキソ印刷版として有用である。また耐イン
ク性、インクの転移性耐刷性にも優れている。なお、本
発明の感光性樹脂組成物は、1:にフレキソ印刷版とし
て有用であるか、フォトレノスト用、サンドブラスト用
にも適用でき、他に紫外線によって硬化するエラストマ
ーとしての用途例えば接着剤、フィルム、塗料、その他
にも使用することが出来る。The photosensitive resin plate obtained using the composition of the present invention exhibits rubber elasticity and is useful as a flexographic printing plate. It also has excellent ink resistance, ink transfer properties, and printing durability. The photosensitive resin composition of the present invention is useful as a flexographic printing plate, and can also be applied to photorenost and sandblasting, and can also be used as an elastomer that is cured by ultraviolet rays, such as adhesives, films, etc. It can also be used for paints and other purposes.
(作用)
本発明組成物は架橋剤として、エチレン性不飽和基を末
端あるいは側鎖にイfする共役ジエン系炭化水素含イ1
゛オリゴマーまたはポリマーを使用しているため、従来
より汎用されている多官能低分Y(1架橋剤に比へて快
化後の硬度が過剰に大きくなく、かつ岐化後には共役ジ
エン系ゴムとなるためゴム弾性に優れ、製版後の耐水系
インキ性にも優れることから、フレキソ印刷版に最適で
ある。(Function) The composition of the present invention contains, as a crosslinking agent, a conjugated diene hydrocarbon having an ethylenically unsaturated group at the terminal or side chain.
゛Because oligomers or polymers are used, the hardness after curing is not excessively large compared to the conventionally widely used polyfunctional low molecular weight Y (1 crosslinking agent), and after branching, it can be used as a conjugated diene rubber. Therefore, it has excellent rubber elasticity and excellent waterproof ink resistance after plate making, making it ideal for flexo printing plates.
なお共役ツエン系ゴムの欠点である耐オゾン性について
は、ペースポリマーとしてl:、鎖に一屯結合をもたな
いエピクロルヒドリンゴムを組合わせることにより克服
できている。The ozone resistance, which is a drawback of conjugated tsene rubber, can be overcome by combining l: and epichlorohydrin rubber, which does not have a single bond in the chain, as a pace polymer.
(実施例)
以ド実施例により本発明を具体的に説明するか、本発明
はこれらの実施例に限定されるものではない。(Examples) The present invention will be specifically explained below with reference to Examples, but the present invention is not limited to these Examples.
なお実施例中、部とあるのは重量部を意味する。In the examples, parts mean parts by weight.
また本発明組成物より得られるフレキソ印刷版の硬度、
反発弾性、耐エタノール性および耐水性は以ドの方法で
測定した。Furthermore, the hardness of the flexographic printing plate obtained from the composition of the present invention,
Repulsion resilience, ethanol resistance and water resistance were measured using the following methods.
硬 度: J I S−に6301に準するスプリ
ング式快さ試験(A形)法により
20℃で測定した。Hardness: Measured at 20°C by a spring type comfort test (type A) method according to JIS-6301.
反発弾性率:φ10m/m(重さ4.leg)の鋼鉄製
ボールを200.の高さより落
ドさせ、跳ね戻る高さ(a)を読み
とり、(a/20)X100%表示
とした。Resilience modulus: A steel ball with a diameter of 10 m/m (weight 4.leg) was rolled at 200. It was dropped from a height of , and the height (a) at which it bounced back was read and expressed as (a/20) x 100%.
耐エタノール性、耐水性: 50X20X 1−の絶乾
破化物試料片をエタノールまたは
水に20℃で24時間浸漬前後の質
:、髪を測定してその質−1増加率で、1<シた。Ethanol resistance, water resistance: 50 x 20 .
実施例1
ヘキサメ千し/ンイソンア不−ト21.lIS、ジメチ
ロールプロピオン酸15.lH、ポリテトラメチレング
リコール(P G −1001−1本ポリウレタン1−
業!)力製)7.EISをメチルエチルケトン100部
に溶解した溶液を撹拌機の付いた11フラスコに入れる
。別の容器で、末端アミ7基含自アクリロニトリル・ブ
タジェンオリゴマー(Hycar ATBNX 130
0 X 1 B 宇部興産(11j’!lり55.3
ffl<をメチルエチルケトン100部に溶解して調整
した溶液をL記のIQフラスコ内に室温ドで撹拌しなが
ら添加する。ジラウリン酸/−n−ブチルスズ1.0部
を加え、撹拌を続けながらこのフラスコを70℃で3時
間加熱した。得られたポリマー溶液を減圧乾燥してメチ
ルエチルケトノを除去し、数・14均分子;iが45,
000の親水性ポリマー[I]を得た。Example 1 Hexame Senshi/Nison Abut 21. lIS, dimethylolpropionic acid 15. lH, polytetramethylene glycol (PG-1001-1 polyurethane 1-
Work! ) made by force) 7. A solution of EIS in 100 parts of methyl ethyl ketone is placed in a flask No. 11 equipped with a stirrer. In a separate container, acrylonitrile butadiene oligomer containing 7 terminal amino groups (Hycar ATBNX 130
0 X 1 B Ube Industries (11j'!lri55.3
A solution prepared by dissolving ffl< in 100 parts of methyl ethyl ketone is added to the IQ flask labeled L with stirring at room temperature. 1.0 part of dilauric acid/-n-butyltin was added and the flask was heated at 70° C. for 3 hours with continued stirring. The obtained polymer solution was dried under reduced pressure to remove methyl ethyl ketone, and the number 14 homogeneous molecules; i was 45,
000 hydrophilic polymer [I] was obtained.
1−記親水Mポリマー[I] 15部、塩素含イ1ポリ
マーとしてポリエピクロルヒドリン(エビクロマ−H大
阪曹達a薄製)50都、スチレン・ブタンエンゴム(S
BR1507日木合成ゴムa慟製)10都、ブタジェン
オリゴアクリレート(A−3025、出光石油化学1@
製)28.5部、ベンノルジメチルケタール(イルガキ
ュア651、チバガイギー11製)1部およびハイドロ
キノン七ツメチルエーテル0.5部を加熱ニーダ−を用
いて105℃で混練し脱泡後、得られた感光性樹脂組成
物をヒートプレス機で105℃、loOkg/cJの圧
力で、125μ漕厚みのポリエステルフィルムト、同じ
ポリエステルフィルム上に2 prsのポリビニルアル
コールを片面にコートしたポリエステルフィルム間で、
ポリビニルアルコールコート層が感光性樹脂と接するよ
う1分間加熱加圧して厚さ2.8■のシートを作成した
。1- Hydrophilic M polymer [I] 15 parts, 50 parts of polyepichlorohydrin (Ebichroma-H manufactured by Osaka Soda A Thin) as chlorine-containing 1 polymer, styrene-butane rubber (S
BR1507 (manufactured by wood synthetic rubber a) 10 cities, butadiene oligoacrylate (A-3025, Idemitsu Petrochemical 1@
), 1 part of benyl dimethyl ketal (manufactured by Irgacure 651, Ciba Geigy 11), and 0.5 part of hydroquinone methyl ether were kneaded at 105°C using a heating kneader, and after defoaming, the resulting photosensitive material The resin composition was heated in a heat press at 105°C and a pressure of loOkg/cJ between a 125μ thick polyester film and a polyester film coated on one side with 2 prs of polyvinyl alcohol on the same polyester film.
A sheet having a thickness of 2.8 cm was prepared by heating and pressing for 1 minute so that the polyvinyl alcohol coating layer was in contact with the photosensitive resin.
最り層のポリエステルフィルムを剥離して感光性樹脂層
−1−にポリビニルアルコール膜を残し、画像を有する
ネガフィルl、をそのl−に密行して水銀幻(大II本
スクリーン社製)で、艮(1度25W/−F根、5分間
露光を11つだ。ネガフィルムを除いた後、0 、5
’毛:1t%の水酸化ナトリウム水溶液で40℃10分
間、プランによる現像を行ったところ、レリーフの深度
1.2.、の画像パターンか得られた。この1+l+i
像パターンは使用したネガフィルムの画像を忠実に+1
現していた。The polyester film of the last layer was peeled off to leave a polyvinyl alcohol film on the photosensitive resin layer -1-, and a negative film 1 having an image was secretly placed on the film 1- and a mercury film (manufactured by Dai II Hon Screen Co., Ltd.) was applied. , 11 exposures for 5 minutes at 25W/-F once. After removing the negative film, 0.5
'Hair: When developed according to a plan for 10 minutes at 40°C with a 1t% sodium hydroxide aqueous solution, the relief depth was 1.2. , an image pattern was obtained. This 1+l+i
The image pattern is faithful to the image of the negative film used +1
It was appearing.
実施例2
末端アミ7)、(含有プロピレンオキシドオリゴマー(
ジェファーミン D−2000三片テキサコケミカル■
M)20m<をテトラヒドロフラン30部に溶解した溶
液を、無水ピロメリット酸4.4部をテトラヒドロフラ
ン20部にr・め溶解した溶液中に撹+↑しながら室温
ドで加えた。Example 2 Terminal amine 7), (containing propylene oxide oligomer (
Jeffamine D-2000 Mikata Texaco Chemical■
A solution of M) 20m< in 30 parts of tetrahydrofuran was added at room temperature to a solution of 4.4 parts of pyromellitic anhydride dissolved in 20 parts of tetrahydrofuran with stirring.
末端アミ7基含イ1アクリロニトリル・ブタジェンオリ
ゴ? −(Hycar ATBNX 1300 X 1
6 宇r’?(’、 興産9(1)製)36部をテト
ラヒドロフラン100部とメタノール50部の4シ合溶
剤に溶解して得た溶液に室温ドで撹拌しなから、l−記
のプロピレンオキシドオリゴマーと無水ピロメリ・ソト
酸の反応溶液を添加して、ポリアミド酸の溶液を7ツた
。この溶液をキャスティングした後、誠バー乾燥して溶
剤を除き、浅水性ポリマー[II]を得た。Acrylonitrile-butadiene oligo containing 7 terminal amino groups? -(Hycar ATBNX 1300 X 1
6 ur'? (', manufactured by Kosan 9 (1)) in a 4-part solvent of 100 parts of tetrahydrofuran and 50 parts of methanol, and stirred at room temperature. The reaction solution of pyromelli-sothoic acid was added to make 7 portions of the polyamic acid solution. After casting this solution, the solvent was removed by drying with a Makoto bar to obtain a shallow water polymer [II].
1゜記親水性ポリマー[■コ20都、エピクロルヒドリ
ンゴム(エビクロマ−1(大阪曹V 123 製)50
部、ブタンエンオリゴアクリレート(A−3025、出
光石油化学9唱製)28.5部、ペンノルメチルケター
ル1部およびハイドロキノンモノメチルエーテル0.5
部を実施例1と同様にしてレリーフパターンを得たとこ
ろ、ネガフィルムの画像を忠実に:I¥現した、レリー
フ深度1 +wwのレリーフパターンが得られた。1° hydrophilic polymer [■ 20%, epichlorohydrin rubber (Ebichroma-1 (manufactured by Osaka So V 123) 50%
1 part, butane oligoacrylate (A-3025, manufactured by Idemitsu Petrochemical Co., Ltd.) 28.5 parts, pennolmethyl ketal 1 part, and hydroquinone monomethyl ether 0.5 parts
When a relief pattern was obtained in the same manner as in Example 1, a relief pattern with a relief depth of 1 + ww, which faithfully represented the image of the negative film, was obtained.
実施例3
実施例1で得られた親水性ポリマー[IF5.5部、エ
ピクロルヒドリンゴム(エビクロマ−H,大阪曹達俸嘲
製)52.5部、エピクロルヒドリンオリゴマー(L−
1大阪・11■辻!)勺製)15部、ブタジェンオリゴ
アクリレート(A−3025出光石油化学1薄製)23
.5部、ジメチルベンジルケタール1部およびハイドロ
キノンモノメチルエーテル0.5都を実施例1と同様に
してレリーフパターンを得たところ、ネガフィルl、の
画像を忠実に+Ig現したレリーフ深度0.9m。Example 3 Hydrophilic polymer obtained in Example 1 [5.5 parts of IF, 52.5 parts of epichlorohydrin rubber (Ebichroma-H, manufactured by Osaka Sodaho Co., Ltd.), epichlorohydrin oligomer (L-
1 Osaka・11 ■Tsuji! ) 15 parts (manufactured by Idemitsu Petrochemical) 15 parts, butadiene oligoacrylate (A-3025 manufactured by Idemitsu Petrochemical 1 Thin) 23
.. A relief pattern was obtained in the same manner as in Example 1 using 5 parts of dimethyl benzyl ketal, 1 part of dimethyl benzyl ketal, and 0.5 parts of hydroquinone monomethyl ether, and the relief depth was 0.9 m, which faithfully represented the image of negative film 1 at +Ig.
のレリーフパターンヲ得り。Obtained relief pattern.
実施例4
実施例2において、塩素含f+ポリマーとしてエピクロ
ルヒドリン共重合体(エピクロルヒドリン92モル%、
アリルグリンンルエーテル8モル%共Φ゛合体、エビク
ロマ−HG大阪曹達株製)、ブタジェンオリゴアクリレ
ートの替りにオリゴブタジェンウレタンメタクリレート
(Nl5SO−PB TE−200Fl木凹辻停勺製)
を用いた以外は全て実施例2き同様にしてレリーフパタ
ーンを得たところ、ネガフィルムの画像を忠実に11現
したレリーフが?υられた。Example 4 In Example 2, epichlorohydrin copolymer (epichlorohydrin 92 mol%,
Allyl green ether 8 mol% coΦ゛ combination, Ebichroma-HG Osaka Soda Co., Ltd.), oligobutadiene urethane methacrylate instead of butadiene oligoacrylate (Nl5SO-PB TE-200Fl, manufactured by Kikutsu Tsuji Stop Co., Ltd.)
A relief pattern was obtained in the same manner as in Example 2, except that a relief pattern was obtained that faithfully reproduced the negative film image. I was rejected.
実施例5
イソブチレンと無水マレイン酸の共重合体(イソパンl
) −4、クラレイソプレンケミカル[+力)200部
とメタノール400部および2−メチルイミダゾール3
部を還流冷却器と撹IT機つきのフラスコに入れ、64
℃で8時間反応した。反応溶液をキャスティングし、減
圧乾燥して親水性ポリマー[■コをjIIた。Example 5 Copolymer of isobutylene and maleic anhydride (isopane
) -4, 200 parts of clareisoprene chemical [+ strength], 400 parts of methanol and 2-methylimidazole 3
Place 1 part in a flask equipped with a reflux condenser and stirrer, and add 64
The reaction was carried out at ℃ for 8 hours. The reaction solution was cast and dried under reduced pressure to form a hydrophilic polymer.
L記親水性ポリマー[■コ15部、エビクロルヒトリン
ゴt、(エビクロマ−H大阪曹達aカ製)55部、オリ
ゴブタジェンウレタンアクリレート(Po1ybd A
CR−LC出光石油化学!)21)20ffl<、ヘキ
サメチレンジアクリレート8.5部、ジメチルベンジル
ケタール1部およびハイドロキノンモノメチルエーテル
0.5)■を実施例1と同様にしてレリーフパターンを
得た。この場合の現像液としては、水酸化ナトリウム/
2− (2−ブトキシエトキン)エタノール/水溶液(
水酸化ナトリウム0.4ffi<、2− (2−ブトキ
シエトキシ)エタノール15m、水84.6ffi<)
を用いた以外は実施例1と同様である。L hydrophilic polymer [■ 15 parts, Ebichlor Hitolino T, (Ebichroma-H manufactured by Osaka Soda Ka) 55 parts, oligobutadiene urethane acrylate (Polybd A
CR-LC Idemitsu Petrochemical! ) 21) 20ffl<, 8.5 parts of hexamethylene diacrylate, 1 part of dimethylbenzyl ketal and 0.5 parts of hydroquinone monomethyl ether) A relief pattern was obtained in the same manner as in Example 1. In this case, the developer is sodium hydroxide/
2-(2-Butoxyethquin) ethanol/aqueous solution (
Sodium hydroxide 0.4ffi<, 2-(2-butoxyethoxy)ethanol 15m, water 84.6ffi<)
This is the same as in Example 1 except that .
実施例6
親水性ポリマーとしてヒドロキシプロピルメチルセルロ
ース(TC−5R信越化学0慟製)20部、エピクロル
ヒドリン共重合体(エピクロルヒドリンとエチレンオキ
サイドのτモル共重合体、11木ゼオ71E製、)Iy
drin 200) 50部、アクリロニトリル・ブ
タジェンオリゴアクリレート()[YCARVTBNX
1300 X 23 宇部興産■製)とフェノール
エチレンオキサイド付加物のモノアクリレート(アロニ
ソクス M 102 東1ib 合成化学C力裂)
の等市;辻混合物28.5部、ジメチルベンジルケター
ル1部およびハイドロキノンモノメチルエーテル0.5
部を実施例1と同様にしてレリーフパターンを得たとこ
ろ、ネガフィルムの画像を忠実に+Tf現したレリーフ
が得られた。Example 6 As a hydrophilic polymer, 20 parts of hydroxypropyl methylcellulose (manufactured by TC-5R Shin-Etsu Chemical Co., Ltd.), epichlorohydrin copolymer (τ mol copolymer of epichlorohydrin and ethylene oxide, manufactured by 11 Ki Zeo 71E, Iy)
drin 200) 50 parts, acrylonitrile butadiene oligoacrylate () [YCARVTBNX
1300 x 23 Ube Industries ■) and monoacrylate of phenol ethylene oxide adduct (Alonisox M 102 Higashi 1ib Synthetic Chemistry C)
Notoichi; 28.5 parts of Tsuji mixture, 1 part of dimethylbenzyl ketal and 0.5 parts of hydroquinone monomethyl ether
When a relief pattern was obtained in the same manner as in Example 1, a relief that faithfully represented the negative film image at +Tf was obtained.
実施例7
メタクリル酸番アクリロニトリル・ブタジェン共重合体
にポール1072 11木ゼオン悸唱製)25部、エピ
クロルヒドリンゴム(エビクロマ−H1大阪曹jfi1
111)50ffi、オリゴブタジェンアミドアクリレ
ート(共栄社浦脂■試供品)13.5部、ヘキサメチレ
ンジアクリレート10部、ジメチルベンジルケタール1
部ハイドロキノンモノメチルエーテル0.5部を実施例
1と同様にしてレリフパターンを得た。この場合の現像
液としては実施例5と同様に、水酸化す) IJウム/
2− (2−ブトキシエトキン)エタノール/水溶液(
水酸化ナトリウム0.4部、2−(2−ブトキシエトキ
ン)エタノール15都、水84.E39+S)を用いて
、深度1 msのレリーフ両像はネガフィルムの両像を
忠実に再現した。Example 7 Methacrylic acid number Acrylonitrile-butadiene copolymer, 25 parts of Paul 1072 (manufactured by Zeon Yusho), epichlorohydrin rubber (Ebichroma-H1 Osaka Sojfi1)
111) 50ffi, oligobutadienamide acrylate (Kyoeisha Urashi ■sample) 13.5 parts, hexamethylene diacrylate 10 parts, dimethylbenzyl ketal 1
A relief pattern was obtained in the same manner as in Example 1 using 0.5 parts of hydroquinone monomethyl ether. In this case, the developer used is hydroxide, as in Example 5.
2-(2-Butoxyethquin) ethanol/aqueous solution (
Sodium hydroxide 0.4 parts, 2-(2-butoxyethquine) ethanol 15 parts, water 84 parts. E39+S), both relief images at a depth of 1 ms faithfully reproduced both images of the negative film.
比較例1〜3
実施例1においてブタジェンオリゴアクリレートの代わ
りに第1表に示す架橋剤をそれぞれ23.5部を用いた
以外は全て実施例1と同様の操作で感光性樹脂組成物の
シートを得た。以下同様の操作でレリーフを作成しよう
としたが、鮮明な両像が形成できなかった。Comparative Examples 1 to 3 Sheets of photosensitive resin compositions were prepared in the same manner as in Example 1 except that 23.5 parts of each of the crosslinking agents shown in Table 1 were used instead of butadiene oligoacrylate in Example 1. I got it. An attempt was made to create a relief using the same procedure, but clear images could not be formed.
参考例
前記実施例1〜7と比較例1〜3で得られたレリーフの
硬1貧、反発弾性、耐エタノール性および耐水性の測定
結束を表−1に示す
以下余白
(発明の効果)
本発明感光性樹脂組成物は前記表−1からも明らかなよ
うに架橋剤としてエチレン性不飽和基を末端あるいは側
鎖に有する共役ジエン系炭化水素含有オリゴマーまたは
ポリマーを用いるため、従来の低置−F−頃架橋剤に比
べて、その硬化物の硬度が過剰に高くならす、かつゴム
弾性に優れ、また耐水系インキ性にも優れており、フレ
キソ版剤に最適である。Reference Example The measurements of hardness, impact resilience, ethanol resistance and water resistance of the reliefs obtained in Examples 1 to 7 and Comparative Examples 1 to 3 are shown in Table 1. As is clear from Table 1, the photosensitive resin composition of the invention uses a conjugated diene hydrocarbon-containing oligomer or polymer having an ethylenically unsaturated group at the terminal or side chain as a crosslinking agent, so it cannot be used as a crosslinking agent. Compared to the F-crosslinking agent, it makes the hardness of the cured product excessively high, has excellent rubber elasticity, and is also excellent in water-based ink resistance, making it ideal for flexographic printing plates.
特許出願人 東t1紡績株式会社Patent applicant: Tot1bo Co., Ltd.
Claims (1)
移温度が5℃以下のポリマー、(B)親水性ポリマー、
(C)エチレン性不飽和基を末端あるいは側鎖に有する
共役ジエン系炭化水素含有オリゴマーまたはポリマーお
よび(D)光重合開始剤を含有することを特徴とする感
光性樹脂組成物。(A) a polymer with a chlorine content of 10 to 50% by weight and a glass transition temperature of 5°C or less, (B) a hydrophilic polymer,
A photosensitive resin composition comprising (C) a conjugated diene hydrocarbon-containing oligomer or polymer having an ethylenically unsaturated group at the terminal or side chain, and (D) a photopolymerization initiator.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63046743A JP2958954B2 (en) | 1988-02-29 | 1988-02-29 | Photosensitive resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63046743A JP2958954B2 (en) | 1988-02-29 | 1988-02-29 | Photosensitive resin composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01219833A true JPH01219833A (en) | 1989-09-01 |
JP2958954B2 JP2958954B2 (en) | 1999-10-06 |
Family
ID=12755815
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63046743A Expired - Fee Related JP2958954B2 (en) | 1988-02-29 | 1988-02-29 | Photosensitive resin composition |
Country Status (1)
Country | Link |
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JP (1) | JP2958954B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001025323A1 (en) * | 1999-10-05 | 2001-04-12 | The Procter & Gamble Company | Elastic articles and uses thereof |
JP2015187750A (en) * | 2010-05-20 | 2015-10-29 | 日立化成株式会社 | Photosensitive resin composition, photosensitive film, rib pattern formation method, hollow structure and formation method for same, and electronic component |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60211451A (en) * | 1984-04-05 | 1985-10-23 | Asahi Chem Ind Co Ltd | Photosensitive elastomer composition |
JPS62165643A (en) * | 1986-01-17 | 1987-07-22 | Hayakawa Rubber Co Ltd | Photosensitive gum composition for flexographic printing plate |
JPS63186232A (en) * | 1987-01-28 | 1988-08-01 | Toyobo Co Ltd | Photosensitive resin composition |
-
1988
- 1988-02-29 JP JP63046743A patent/JP2958954B2/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60211451A (en) * | 1984-04-05 | 1985-10-23 | Asahi Chem Ind Co Ltd | Photosensitive elastomer composition |
JPS62165643A (en) * | 1986-01-17 | 1987-07-22 | Hayakawa Rubber Co Ltd | Photosensitive gum composition for flexographic printing plate |
JPS63186232A (en) * | 1987-01-28 | 1988-08-01 | Toyobo Co Ltd | Photosensitive resin composition |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001025323A1 (en) * | 1999-10-05 | 2001-04-12 | The Procter & Gamble Company | Elastic articles and uses thereof |
JP2015187750A (en) * | 2010-05-20 | 2015-10-29 | 日立化成株式会社 | Photosensitive resin composition, photosensitive film, rib pattern formation method, hollow structure and formation method for same, and electronic component |
US9625814B2 (en) | 2010-05-20 | 2017-04-18 | Hitachi Chemical Company, Ltd. | Photosensitive resin composition, photosensitive film, rib pattern formation method, hollow structure and formation method for same, and electronic component |
Also Published As
Publication number | Publication date |
---|---|
JP2958954B2 (en) | 1999-10-06 |
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