JPH01183361A - Curved surface polishing device - Google Patents
Curved surface polishing deviceInfo
- Publication number
- JPH01183361A JPH01183361A JP63009044A JP904488A JPH01183361A JP H01183361 A JPH01183361 A JP H01183361A JP 63009044 A JP63009044 A JP 63009044A JP 904488 A JP904488 A JP 904488A JP H01183361 A JPH01183361 A JP H01183361A
- Authority
- JP
- Japan
- Prior art keywords
- polisher
- workpiece
- film
- magnetic fluid
- polishing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 30
- 239000011553 magnetic fluid Substances 0.000 claims abstract description 24
- 230000005291 magnetic effect Effects 0.000 claims abstract description 20
- 239000000696 magnetic material Substances 0.000 claims 1
- 229920001971 elastomer Polymers 0.000 description 23
- 238000007789 sealing Methods 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000005489 elastic deformation Effects 0.000 description 3
- 238000003754 machining Methods 0.000 description 3
- 239000006061 abrasive grain Substances 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 241000277269 Oncorhynchus masou Species 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000003302 ferromagnetic material Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229920000126 latex Polymers 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野1
この発明は広く曲面形状を有する被加工物の研摩加工を
行うための研摩装置に関するものである〔従来の技術1
第3図は例えば特開昭58−77447号公報に示され
た従来の磁性流体を用いた表面研摩装置を示す図であり
、図において、(11)は回転可能な加工盤、(13)
はポリシャであるゴム板、(14)および(15)はゴ
ム板(13)を固定するための円環である。(12)は
加工盤(11)に設けられたみぞに満たされ、加工盤(
11)とゴム板(13)に密閉された磁性流体である。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application 1] The present invention relates to a polishing device for polishing workpieces having a wide range of curved shapes [Prior Art 1] It is a diagram showing a conventional surface polishing device using magnetic fluid disclosed in Publication No. 58-77447, in which (11) is a rotatable processing plate, (13) is a rotatable processing plate;
is a rubber plate which is a polisher, and (14) and (15) are rings for fixing the rubber plate (13). (12) is filled in the groove provided in the processing board (11), and the processing board (
11) and a magnetic fluid sealed between a rubber plate (13) and a rubber plate (13).
(28)と(29)は電磁石コイル、(33)と(41
)は電磁石鉄心である。上部の電磁石鉄心(33)には
被加工物(38)が接着される。(19)は研摩剤であ
る。被加工物(38)および加工盤(11)はそれぞれ
プーリ(37)および(27)で回転駆動され、同じ回
転方向に同じ回転速度で回転するものである。(28) and (29) are electromagnetic coils, (33) and (41)
) is the electromagnetic core. A workpiece (38) is bonded to the upper electromagnet core (33). (19) is an abrasive. The workpiece (38) and the processing plate (11) are rotationally driven by pulleys (37) and (27), respectively, and rotate in the same rotational direction and at the same rotational speed.
次に第4図および第5図にもとづいて従来の研摩装置(
第3図)の動作を説明する0図において、回転可能な加
工盤(11)に設けられたみぞ内に磁性流体(12)を
充填し、この磁性流体をポリシャであるゴム板(13)
の下に封じ込め、ゴム板(13)上に形成した加工室に
研摩剤(19)を収容し、研摩剤(19)と磁性流体(
12)をゴム板(13)で仕切る。被加工物(38)を
加工室の研摩剤中に浸漬しその被加工面をゴム板(13
)に接触またはす、きまを置いて対面させる、電磁石コ
イル(28)と(29)に電流を流すことにより被加工
物(38)に対向するみぞ部分の磁性流体に点線で示す
磁束φの径路を形成するように磁場を印加すると、みぞ
内の磁性流体(12)は磁束形成部に引き寄せられて磁
性流体の液面が盛り上がり、ゴム板(13)は点線で示
すように膨出し、研摩剤(19)をはさんで被加工物(
38)の被加工面に押し付けられる。そこでゴム板(1
3)と被加工物(38)の両者を回転させつつ相対運動
させて被加工物の表面研摩を行うものである。Next, based on Fig. 4 and Fig. 5, the conventional polishing device (
3), a groove provided in a rotatable processing plate (11) is filled with a magnetic fluid (12), and the magnetic fluid is transferred to a rubber plate (13) which is a polisher.
The abrasive (19) is contained in a processing chamber formed on the rubber plate (13), and the abrasive (19) and magnetic fluid (
12) is partitioned with a rubber plate (13). The workpiece (38) is immersed in the abrasive in the processing chamber, and the surface to be processed is covered with a rubber plate (13).
), the path of the magnetic flux φ shown by the dotted line in the magnetic fluid in the groove facing the workpiece (38) is created by passing current through the electromagnetic coils (28) and (29), which face each other with a gap. When a magnetic field is applied to form a magnetic field, the magnetic fluid (12) in the groove is attracted to the magnetic flux forming part, the liquid level of the magnetic fluid rises, the rubber plate (13) swells as shown by the dotted line, and the abrasive (19) across the workpiece (
38) is pressed against the processed surface. There, the rubber plate (1
3) and the workpiece (38) are both rotated and moved relative to each other to polish the surface of the workpiece.
〔発明が解決しようとする問題点]
従来の装置は以上のように構成されており、この研摩装
置により曲面形状の被加工物を研摩する場合、次に示す
ような問題が生じる。従来の装置ではポリシャとしてゴ
ム板を用いており、研摩剤の砥粒はゴム板に対してなじ
みが悪いためゴム板と被加工物の間に砥粒が入りにくく
加工速度が遅い、また、曲面形状の被加工物を研摩する
場合、ゴム板の膜圧が厚いためゴム板の変形抵抗が大き
く、曲面形状の被加工物の加工面全面にゴム板が接触し
ないことや、あるいは接触しても圧力が不均一になるた
め、被加工物の形状誤差が大きくなる場合が生じる。ま
た、加工盤(11)を上下からはさむ電磁石(33)、
(41)がそれぞれ独立しているため、電磁石コイルに
電流を流しても、磁力が小さく、加工速度が遅い、そし
て、被加工物を研摩する際、被加工物(38)が上の電
磁石鉄心に単に接着されているだけであるため、被加工
物のエツジ部が研摩時にポリシャであるゴム板にひっか
かり、スムーズに研摩が行われない。[Problems to be Solved by the Invention] The conventional apparatus is configured as described above, and when this polishing apparatus polishes a curved workpiece, the following problems occur. Conventional equipment uses a rubber plate as a polisher, and since the abrasive grains of the abrasive do not fit well with the rubber plate, it is difficult for the abrasive grains to enter between the rubber plate and the workpiece, slowing down the processing speed. When polishing a shaped workpiece, the rubber plate has a thick film thickness, so the deformation resistance of the rubber plate is large, and the rubber plate does not come into contact with the entire surface of the curved workpiece, or even if it comes into contact with it, Since the pressure becomes non-uniform, errors in the shape of the workpiece may become large. In addition, electromagnets (33) that sandwich the processing machine (11) from above and below,
(41) are independent, so even if current is passed through the electromagnet coil, the magnetic force is small and the machining speed is slow. Since the edge of the workpiece gets caught on the rubber plate that is the polisher during polishing, polishing cannot be performed smoothly.
特に、被加工物が曲面である場合はゴム板の弾性変形抵
抗を小さくするためゴム板の膜圧を更に薄くする必要が
あり、被加工物のエツジ部にポリシャであるゴム板がひ
っかかり、なめらかな研摩が行われないばかりか、時に
はゴム板がやぶれることもある。また、被加工物を直接
電磁石鉄心に接触しているため、加工後取りはずすのが
不便であり、加工が非能率的である0以上述べたとおり
、特に曲面形状を有する被加工物を従来の研摩装置を用
いて曲面研摩することは非常に困難なものである。 ゛
この発明は上記のような問題点を解消するためになされ
たもので、曲面形状を有する被加工物の表面を精密にし
かも効率よく研摩できる装置な得ることを目的とする。In particular, when the workpiece is a curved surface, it is necessary to further reduce the film thickness of the rubber plate in order to reduce the elastic deformation resistance of the rubber plate. Not only is proper polishing not possible, but the rubber plate sometimes breaks. In addition, since the workpiece is in direct contact with the electromagnet core, it is inconvenient to remove it after processing, making the processing inefficient. It is very difficult to polish curved surfaces using this equipment. The present invention has been made to solve the above-mentioned problems, and its object is to provide an apparatus that can precisely and efficiently polish the surface of a workpiece having a curved shape.
[問題点を解決するための手段1
この発明に係る曲面研摩装置は、ポリシャの下の部分に
磁性流体を封じ込め、加工物の被加工面を前記ポリシャ
の表面に対面させ、ポリシャと被加工物の両者を相対運
動させ、磁性流体に磁場を付加することにより前記ポリ
シャを被加工面に押し付ける研摩法において、前記ポリ
シャ部分を、磁性流体を密封させるために張られた柔軟
で変形自在の膜状のフィルムと、前記フィルムの上に張
られた研摩用の柔軟な膜状のポリシャとに分離した構成
にするとともに、前記ポリシャ部の磁場を付加する部分
だけを開いた環状の磁気回路に電磁石を構成し、さらに
、研摩時、被加工物のエツジ部が露出しないように被加
工物を埋め込む穴をもち、エツジ部の形状がなめらかな
円弧状である、前記被加工物を前記電磁石鉄心に装着す
るための治具を用いたものである。[Means for Solving the Problems 1] The curved surface polishing apparatus according to the present invention confines a magnetic fluid in the lower part of the polisher, makes the surface of the workpiece face the surface of the polisher, and connects the polisher and the workpiece. In a polishing method in which the polisher is pressed against the workpiece surface by moving both of them relative to each other and applying a magnetic field to the magnetic fluid, the polisher portion is formed of a flexible and deformable film-like material stretched to seal the magnetic fluid. The film is separated into a flexible film-like polisher for polishing stretched over the film, and an electromagnet is installed in a ring-shaped magnetic circuit that is open only in the part of the polisher section where a magnetic field is applied. The workpiece is attached to the electromagnet core, and further has a hole in which the workpiece is embedded so that the edge part of the workpiece is not exposed during polishing, and the edge part has a smooth arc shape. A jig is used to do this.
(作用〕
この発明における曲面研摩装置は、従来の装置のポリシ
ャであるゴム板を、磁性流体を密封させるために張られ
た流体を通さない柔軟で変形自在の膜状のフィルムと、
前記フィルムの上に張られた研摩用の柔軟な膜状のポリ
シャとに分離させたものに置き変えることにより、加工
速度が向上され、また、電磁石の構成においては、磁場
が付加されるポリシャ部分だけを開くように磁性体のア
ームを設け、環状の磁気回路にすることにより、磁力を
構成させることができて加工速度が向上するとともに曲
面形状の被加工物の被加工面に上記ポリシャが接触しや
すくなり、更に、被加工物のエツジ部が露出しないよう
に被加工物をうめ込む様式の治具を設けて電磁石鉄心に
装着し、その治具のエツジ部を滑らかな円弧状の形状に
することにより、被加工物のエツジ部にポリシャがひっ
かからなくなりスムーズに安定して研摩が進行され、こ
のことにより、更によりうすく弾性変形抵抗の小さいポ
リシャを用いることができ、そして被加工物の取りはす
しが容易になり、総合的に、曲面研摩を効率よく円滑に
行うことができる。(Function) The curved surface polishing device of the present invention replaces the rubber plate, which is the polisher of the conventional device, with a flexible and deformable membrane-like film that is not permeable to fluid and is stretched to seal the magnetic fluid.
Processing speed can be improved by replacing the flexible film-like polisher stretched over the film with a separate polisher, and in an electromagnet configuration, the polisher part to which the magnetic field is applied is By providing a magnetic arm so as to open only a circular magnetic circuit, it is possible to create a magnetic force, which improves processing speed and allows the polisher to come into contact with the surface of the curved workpiece. In addition, a jig that embeds the workpiece so that the edge of the workpiece is not exposed is installed on the electromagnet core, and the edge of the jig is shaped into a smooth arc. By doing this, the polisher does not get caught on the edges of the workpiece, and polishing progresses smoothly and stably. This makes it possible to use a thinner polisher with less elastic deformation resistance, and it is easier to remove the workpiece. Scraping becomes easier, and overall curved surface polishing can be performed efficiently and smoothly.
以下、この発明の一実施例を図について説明する。第1
図において、(33)と(41)は電磁石鉄心、(28
)と(29)は電磁石コイル、(3)は磁気を閉回路に
するためのアーム、(1)は被加工物(38)を電磁石
鉄心(33)に装着するための被加工物装着治具、(2
)は上記治具(1)を凹面形状(すなわち曲面形状)を
有する被加工物(38)とともに取り付けるための治具
固定ネジ、(11)は加工盤、(12)は加工盤に設け
た溝に満たされる磁性流体、(13a)は磁性流体(1
2)を密封するための厚さ0.1mmの柔軟な膜状のラ
テックスゴム製のフィルム、(13b)は曲面形状を有
する被加工物(38)を研摩するための厚さ0.4mm
である薄くて柔軟なポリシャ、(14)と(15)は上
記フィルム(13a)とポリシャ(13b)を固定する
ためのポリシャ固定板、(19)は研摩剤である。加工
盤(11)と被加工物(38)は同方向に同速度で回転
させる。An embodiment of the present invention will be described below with reference to the drawings. 1st
In the figure, (33) and (41) are electromagnet cores, (28
) and (29) are electromagnetic coils, (3) is an arm for making the magnetism into a closed circuit, and (1) is a workpiece mounting jig for mounting the workpiece (38) on the electromagnet core (33). ,(2
) is a jig fixing screw for attaching the jig (1) together with a workpiece (38) having a concave shape (that is, a curved surface), (11) is a processing plate, and (12) is a groove provided in the processing plate. The magnetic fluid (13a) is filled with magnetic fluid (1
(13b) is a 0.4 mm thick flexible latex rubber film for sealing the workpiece (38) having a curved surface shape.
(14) and (15) are polisher fixing plates for fixing the film (13a) and the polisher (13b), and (19) is an abrasive. The processing plate (11) and the workpiece (38) are rotated in the same direction and at the same speed.
次に、作用について説明する。従来の装置のポリシャで
あるゴム板を、磁性流体を密封させるための膜状のフィ
ルム(13a)と、前記フィルムの上に張られた研摩用
の柔軟な膜状のポリシャ(13b)との゛二層からなる
ものに置き換えることにより、加工速度が従来のものに
比べ著しく向上した。また、電磁石の構成においては、
磁場が付加されるポリシャ部分だけを開くように磁性体
のアーム(3)を設け、環状の磁気回路にすることによ
り、より磁力を向上させることができ、加工速度が向上
するとともに、曲面形状の被加工物の被加工面(38a
)に上記ポリシャ(13b)が接触しやすくなり、更に
、被加工物(38)のエツジ部(1b)が露出しないよ
うに被化工物をうめ込む様式の治具(1)を設けて、電
磁石鉄心(33)に治具固定ネジ(2)で装着し、その
治具(1)のエツジ部(IC)をなめらかな円弧状の形
状にすることにより、被加工物のエツジ部(1b)にポ
リシャがひっかかることなくスムーズに安定して研摩が
進行され、このことにより、更により薄く弾性変形抵抗
の小さいポリシャを用いることができ、そして、被加工
物の取りはすしが容易になり、総合的に、曲面研摩を効
率よく円滑に行うことができる。Next, the effect will be explained. The rubber plate, which is the polisher of the conventional device, is replaced with a film-like film (13a) for sealing the magnetic fluid, and a flexible film-like polisher (13b) for polishing stretched over the film. By replacing it with a two-layered one, processing speed was significantly improved compared to the conventional one. In addition, in the configuration of the electromagnet,
By providing a magnetic arm (3) so as to open only the part of the polisher to which the magnetic field is applied, and creating a ring-shaped magnetic circuit, the magnetic force can be further improved, machining speed is increased, and curved surface shapes can be improved. Processed surface of the workpiece (38a
), the polisher (13b) can easily come into contact with the electromagnet. By attaching the jig fixing screw (2) to the iron core (33) and making the edge part (IC) of the jig (1) into a smooth arc shape, it can be attached to the edge part (1b) of the workpiece. Polishing proceeds smoothly and stably without the polisher getting caught. This makes it possible to use a polisher that is thinner and has less resistance to elastic deformation, and it is easier to remove the workpiece, which improves overall performance. In addition, curved surface polishing can be performed efficiently and smoothly.
なお、上記実施例では、磁性流体を密封するために厚さ
0.1mmの膜状のゴム製のフィルム(13a)を、ま
たポリシャの層(13b)としてロデールニツタ側製の
0.4mmの研摩用パッドを用いたが、これらは曲面形
状の被化工物に抵抗なく接触する薄くて柔軟なものなら
ば何でもよい、また、電磁石の電極やアームに鉄を用い
たが強磁性体ならば何でもよい、なお、上記実施例では
被化工物の形状は凹型のものであったが、凸型であって
もよいことは言うまでもない、その場合、被化工物の形
状に応じて治具の形状は変わりつる。In the above example, a 0.1 mm thick rubber film (13a) was used to seal the magnetic fluid, and a 0.4 mm polishing layer (13b) manufactured by Rodel Nitsuta was used as the polisher layer (13b). Although pads were used, any thin and flexible material that contacts the curved workpiece without resistance may be used. Also, although iron was used for the electrodes and arms of the electromagnet, any ferromagnetic material may be used. In the above example, the shape of the workpiece is concave, but it goes without saying that it may be convex. In that case, the shape of the jig will change depending on the shape of the workpiece. .
〔発明の効果1
以上のように、この発明によれば磁性流体を密封させる
ための柔軟で変形自在の膜状のフィルムと、前記フィル
ムの上に張られた研摩用の柔軟な膜状のポリシャとの二
重の構成にし、前記ポリシャ部に磁場を付加する部分だ
けを開いた環状の磁気回路に電磁石を構成し、更に、研
摩時に被加工物のエツジが露出しないように被加工物を
埋め込む穴をもつ被加工物固定用治具を用い、その治具
のエツジ部の形状がなめらかな円弧状にしたので、曲面
形状を有する被加工物の高速研摩が可能となり、しかも
、加工精度が向上し、曲面形状を有する被加工物の研摩
が有効に行われる効果がある[Effect of the invention 1 As described above, the present invention provides a flexible and deformable film for sealing a magnetic fluid, and a flexible film-like polisher for polishing stretched over the film. The electromagnet is configured in a ring-shaped magnetic circuit with only the part that applies the magnetic field to the polisher section open, and the workpiece is further embedded so that the edges of the workpiece are not exposed during polishing. A jig with holes for fixing the workpiece is used, and the edges of the jig are shaped into smooth arcs, making it possible to polish workpieces with curved surfaces at high speed, while also improving machining accuracy. This has the effect of effectively polishing a workpiece having a curved surface shape.
第1図はこの発明の実施例による曲面研摩装置を示す図
である。第2図は電磁石鉄心に被加工物を被加工物装着
治具を介して取り付けたものを示す断面図である。第3
図は従来の表面研摩装置を示す図、第4図は従来の装置
の原理を示す図、第5図は従来の装置を一部断面図で示
す正面図、である。
図において(1)は被加工物装着治具、(2)は治具固
定ネジ、(3)はアーム、(11)は加工盤、(12)
は磁性流体、(13a)は磁性流体封止用フィルム、(
13b)はポリシャ、(19)は研摩剤、(28)と(
29)は電磁石コイル、(33)と(41)は電磁石鉄
心、(38)は被加工物、(14)と(15)はポリシ
ャ固定板である。
なお、図中同一符号は同一、または相当部分を示す。
代理人 弁理士 大 岩 増 離業2図
第3図FIG. 1 is a diagram showing a curved surface polishing apparatus according to an embodiment of the present invention. FIG. 2 is a sectional view showing a workpiece attached to the electromagnet core via a workpiece mounting jig. Third
The figure shows a conventional surface polishing device, FIG. 4 is a diagram showing the principle of the conventional device, and FIG. 5 is a partially sectional front view of the conventional device. In the figure, (1) is the workpiece mounting jig, (2) is the jig fixing screw, (3) is the arm, (11) is the processing plate, (12)
is a magnetic fluid, (13a) is a magnetic fluid sealing film, (
13b) is a polisher, (19) is an abrasive, (28) and (
29) is an electromagnetic coil, (33) and (41) are electromagnetic cores, (38) is a workpiece, and (14) and (15) are polisher fixing plates. Note that the same reference numerals in the figures indicate the same or equivalent parts. Agent: Masu Oiwa, Patent Attorney, Figure 2, Figure 3
Claims (1)
被加工面を前記ポリシャの表面に対面させ、ポリシャと
被加工物の両者を相対運動させ、磁性流体に磁場を付加
することにより前記ポリシャを被加工面に押し付ける曲
面研摩装置において、前記ポリシャの部分が、磁性体を
密封させるために張られた柔軟な膜状のフィルムと、前
記フィルムの上に張られた研摩用の柔軟な膜状のポリシ
ャとの二層により構成されることを特徴とする曲面研摩
装置。(1) Confining the magnetic fluid in the polisher part, making the processed surface of the workpiece face the surface of the polisher, moving both the polisher and the workpiece relative to each other, and applying a magnetic field to the magnetic fluid. In a curved surface polishing device that presses a polisher onto a surface to be processed, the polisher portion includes a flexible membrane-like film stretched to seal the magnetic material, and a flexible membrane-like film stretched over the film for polishing. A curved surface polishing device characterized by comprising two layers: a polisher and a polisher.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63009044A JPH0739073B2 (en) | 1988-01-18 | 1988-01-18 | Curved surface polishing equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63009044A JPH0739073B2 (en) | 1988-01-18 | 1988-01-18 | Curved surface polishing equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01183361A true JPH01183361A (en) | 1989-07-21 |
JPH0739073B2 JPH0739073B2 (en) | 1995-05-01 |
Family
ID=11709643
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63009044A Expired - Lifetime JPH0739073B2 (en) | 1988-01-18 | 1988-01-18 | Curved surface polishing equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0739073B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108436745A (en) * | 2018-05-21 | 2018-08-24 | 浙江工业大学 | A kind of blade liquid metal burnishing device that magnetic field electric field changes simultaneously |
-
1988
- 1988-01-18 JP JP63009044A patent/JPH0739073B2/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108436745A (en) * | 2018-05-21 | 2018-08-24 | 浙江工业大学 | A kind of blade liquid metal burnishing device that magnetic field electric field changes simultaneously |
Also Published As
Publication number | Publication date |
---|---|
JPH0739073B2 (en) | 1995-05-01 |
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