JPH01178258A - Ophthalmic operation apparatus - Google Patents

Ophthalmic operation apparatus

Info

Publication number
JPH01178258A
JPH01178258A JP63001766A JP176688A JPH01178258A JP H01178258 A JPH01178258 A JP H01178258A JP 63001766 A JP63001766 A JP 63001766A JP 176688 A JP176688 A JP 176688A JP H01178258 A JPH01178258 A JP H01178258A
Authority
JP
Japan
Prior art keywords
slit
optical system
lens
light
luminous flux
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP63001766A
Other languages
Japanese (ja)
Other versions
JP2665916B2 (en
Inventor
Nobuyuki Yano
矢野 信幸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nidek Co Ltd
Original Assignee
Nidek Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nidek Co Ltd filed Critical Nidek Co Ltd
Priority to JP63001766A priority Critical patent/JP2665916B2/en
Publication of JPH01178258A publication Critical patent/JPH01178258A/en
Application granted granted Critical
Publication of JP2665916B2 publication Critical patent/JP2665916B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To synthesize a slit projection optical system and a light irradiation optical system on the same axis by a simple mechanism by arranging a luminous flux splitting means between the slit of a slit projection system and the eye of an examinee while arranging a luminous flux direction altering member between the luminous flux splitting means and the eye of the examinee. CONSTITUTION:The lamp 1 of a slit projection optical system is allowed to light to illuminate a slit 3 from the back. The illumination beam converted to parallel luminous flux by a slit projection lens 5 is split into two beams by luminous flux splitting prisms 6, 7 and the split beams pass the outside of a mirror 18 and the peripheral part of an image forming lens 8 to be reflected by a mirror 9 and passes through a contact lens 11 to illuminate the interior of the eye of an examinee. An operator operates a binocular stereoscopic microscope so as to form a slit image in the vicinity of a region to be treated or adjusts the whole of the slit projection optical system by revolving the same around a vertical axis V to form the slit image on the retina. Next, a laser beam source is operated. The spot size of laser beam is changed by moving a variation lens 15 in an optical axis direction and moving a compensation lens 14 in order to optically compensate said lens 15.

Description

【発明の詳細な説明】 [産業上の利用分野コ 本発明は、スリットランプ顕微鏡付きの眼科用手術装置
、詳しくは、眼底・硝子体・虹彩等を局部的に凝固又は
切開するために使用する眼科用手術装置に関するもので
ある。
[Detailed Description of the Invention] [Industrial Field of Application] The present invention relates to an ophthalmic surgical device equipped with a slit lamp microscope, specifically, a device used for locally coagulating or incising the fundus, vitreous body, iris, etc. The present invention relates to an ophthalmological surgical device.

[従来技術] スリットランプ顕微鏡付きの眼科用手術装置は当初、ス
リット投影光学系とレーザ等の照射光学系とを別系統と
して上下に対向して配置し、両系統の同軸化は、スリッ
ト投影光学系中の最終のミラーを2分割し、その間から
照射光を通し、スリット像の結像位置近傍に照射光のス
ポットを形成することによって実現していた。
[Prior art] Initially, an ophthalmological surgical device equipped with a slit lamp microscope had a slit projection optical system and an irradiation optical system such as a laser placed as separate systems facing each other vertically. This was achieved by dividing the final mirror in the system into two parts, passing the irradiation light through the two, and forming a spot of the irradiation light near the position where the slit image was formed.

このようにスリット投影光学系と照射光学系とを別系統
として配置するのは、装置が必然的に大型化してしまう
等の問題があった。
In this way, arranging the slit projection optical system and the irradiation optical system as separate systems has the problem of inevitably increasing the size of the apparatus.

そこで、近時おいては、スリット投影光学系中に照射光
を導く方式が一般化してきた。
Therefore, in recent years, a method of guiding irradiation light into a slit projection optical system has become common.

第2図は上記スリット投影光学系中に照射光を導く方式
の従来装置の1光学系(観察系は省略)の概略図である
FIG. 2 is a schematic diagram of one optical system (the observation system is omitted) of a conventional apparatus that guides irradiation light into the slit projection optical system.

従来のスリット投影系中にミラー18を配置することに
より、スリット投影光学系と光照射光学系が同軸に合成
されている。照射光のスポットの移動は結像レンズ8を
移動させることによってこれを行う。
By arranging the mirror 18 in a conventional slit projection system, the slit projection optical system and the light irradiation optical system are coaxially combined. The spot of the irradiation light is moved by moving the imaging lens 8.

また、特開昭62−90153N記戎されている第3図
に示す光学系が提案されている。
Furthermore, an optical system shown in FIG. 3, published in Japanese Patent Application Laid-Open No. 62-90153N, has been proposed.

この装置においては、スリット投影系のスリットの光源
側に偏角プリズム27を入れ光束を2分割し、分割され
た光束間にプリズム28を配置し、ここからレーザ光を
入れスリット投影光学系とレーザ照射光学系が同軸に合
成されている。更に、最終のミラーを9a、9b、9c
に3分割し、3分割ミラーの上下のミラー9b、9cに
より分割されたスリット投影光束を反射し、真ん中のミ
ラー9aでレーザ照射光束を反射し、真ん中のミラーを
振ることによってレーザスポットの移動を行う。
In this device, a deflection prism 27 is placed on the light source side of the slit of the slit projection system to divide the light beam into two, and a prism 28 is placed between the divided beams, from which a laser beam is input and connected to the slit projection optical system and the laser beam. The irradiation optical system is coaxially combined. Furthermore, the final mirrors 9a, 9b, 9c
The slit projection beam is reflected by the upper and lower mirrors 9b and 9c of the 3-split mirror, and the laser irradiation beam is reflected by the middle mirror 9a, and the movement of the laser spot is controlled by shaking the middle mirror. conduct.

[従来技術の問題点] しかしながら、前者の第2図の装置においては、スリッ
ト投影光学系と光照射光学系を同軸に合成するために、
投影光学系に配置されたミラー1Bの大きさの分だけ投
影光束がけられ、照明が暗くなってしまう。
[Problems with the prior art] However, in the former device shown in FIG. 2, in order to combine the slit projection optical system and the light irradiation optical system coaxially,
The projection light beam is eclipsed by the size of the mirror 1B disposed in the projection optical system, and the illumination becomes dark.

また、ミラーの大きさも照明光束のけられの関係から大
きくすることができないため、レーザ光束の太さにも制
限がある。
Further, since the size of the mirror cannot be increased due to the vignetting of the illumination beam, there is also a limit to the thickness of the laser beam.

更に、レーザスポットの移動は結像レンズ8を移動させ
ることにより行っているので、レンズ8の移動量はレー
ザスポットの移動量と同じで、これを大きく動かすには
レンズの移動量を大きくする必要があるが、構造上限界
がある。
Furthermore, since the movement of the laser spot is performed by moving the imaging lens 8, the amount of movement of the lens 8 is the same as the amount of movement of the laser spot, and in order to move this large amount, it is necessary to increase the amount of lens movement. However, there are structural limitations.

後者の装置においては、これらの欠点は解決されている
が、最終ミラーを3分割にしているので複雑な構造とな
る。また、スリット投影光学系のスリット3の光源側に
偏角プリズム27を配置しているため、市販のスリット
顕微鏡を使用するときは、大幅な変更が必要となるとい
う不都合がおる。
In the latter device, these drawbacks are solved, but the final mirror is divided into three parts, resulting in a complicated structure. Furthermore, since the deflection prism 27 is disposed on the light source side of the slit 3 of the slit projection optical system, there is an inconvenience that major changes are required when using a commercially available slit microscope.

この発明の目的は、上記従来装置の欠点に鑑み、簡単な
機構でしかも制作が容易な、スリット投影光学系と光照
射光学系を同軸に合成する装置を提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a device that coaxially combines a slit projection optical system and a light irradiation optical system, which has a simple mechanism and is easy to manufacture, in view of the drawbacks of the conventional devices.

更に、これに加えるに治療用の照射光のスポットの移動
を容易に行うことができる装置を提供することにある。
In addition to this, it is an object of the present invention to provide an apparatus that can easily move the spot of therapeutic irradiation light.

[発明の構成] 本発明は、上記目的を達成するために、双眼実体顕微鏡
光学系と、眼球内にスリット像を投影するスリット投影
系と、眼球内に治療用の光束を照射する光束照射系とを
有する眼科用手術装置において、スリット投影系のスリ
ットと技術老眼との間に光束分割手段を、前記光束分割
手段と技術老眼の間に光束の方向を変える光束方向変更
部材を配置して、治療用の光束を光束方向変更部材を介
し分割されたスリット光束の間に入れ、スリット投影光
学系と治療用の光束を照射する光束照射光学系とを同軸
に合成している。
[Structure of the Invention] In order to achieve the above object, the present invention provides a binocular stereoscopic microscope optical system, a slit projection system that projects a slit image into the eyeball, and a light beam irradiation system that irradiates a therapeutic light beam into the eyeball. In the ophthalmic surgery apparatus, a beam splitting means is arranged between the slit of the slit projection system and the technical presbyopia, and a beam direction changing member for changing the direction of the light beam is arranged between the beam splitting means and the technical presbyopia, A therapeutic light beam is passed between the divided slit light beams via a light beam direction changing member, and a slit projection optical system and a light beam irradiation optical system that irradiates the therapeutic light beam are coaxially combined.

また、上記構成に加え、更に前記光束方向変更部材を操
作する手段を設け、これを操作することにより治療用の
光束のスポットを移動させる。
In addition to the above configuration, a means for operating the light flux direction changing member is further provided, and by operating this, the spot of the therapeutic light flux is moved.

[実施例〕 以下、本発明の1実施例を図面に基づいて説明する。[Example〕 Hereinafter, one embodiment of the present invention will be described based on the drawings.

第1図は本発明の1実施例の光学系の配置略図である。FIG. 1 is a schematic layout diagram of an optical system according to an embodiment of the present invention.

この光学系は双眼実体顕微鏡光学系と、スリット投影光
学系と、治療用の光束投射光学系とからなる。
This optical system consists of a binocular stereoscopic microscope optical system, a slit projection optical system, and a therapeutic light beam projection optical system.

スリット投影光学系 1はスリット3の照明用のランプで、ランプ1を出射し
た光束はコンデンサレンズ2で集光された後、スリット
3を背後から照明する。4はフィルタで、コバルトフィ
ルタを含む数種の交換可能なフィルタからなり、通常は
光路外に待機している。
The slit projection optical system 1 is a lamp for illuminating the slit 3, and the luminous flux emitted from the lamp 1 is condensed by a condenser lens 2, and then illuminates the slit 3 from behind. A filter 4 is made up of several types of replaceable filters including a cobalt filter, and is usually placed on standby outside the optical path.

フィルタを透過した光束はスリット投影レンズ5により
平行光束となり、光束分割プリズム6゜7で2光束に分
割される。分割された2光束は結像レンズ8の周辺部を
通り、ミラー9で反射した後、被術者用10に装着され
たコンタクトレンズ11を介し被術者用10を照明する
The light beam transmitted through the filter becomes a parallel light beam by the slit projection lens 5, and is split into two light beams by the light beam splitting prism 6.7. The two divided light beams pass through the periphery of the imaging lens 8, are reflected by the mirror 9, and then illuminate the patient 10 through the contact lens 11 attached to the patient 10.

なあ、スリット投影光学系は垂直軸Vを中心に旋回可能
に配置され、これを旋回させ双眼実体顕微鏡光学系の光
路に出入させることができる。
The slit projection optical system is arranged so as to be able to rotate about the vertical axis V, and can be rotated to enter and exit the optical path of the binocular stereomicroscope optical system.

また、スリットの幅・長さやランプの光量は図示なきノ
ブによりそれぞれ調節可能になっている。
Further, the width and length of the slit and the amount of light from the lamp can be adjusted using knobs (not shown).

治療用 束桑射光学系 12は図示なきレーザヘッドからレーザ光を導くための
ファイバである。13はファイバ12を出射したレーザ
光を平行光束にするためのコリメーティングレンズであ
る。
The therapeutic beam radiation optical system 12 is a fiber for guiding laser light from a laser head (not shown). A collimating lens 13 converts the laser beam emitted from the fiber 12 into a parallel beam.

14はコンペンセイタレンズである。15はバリエータ
レンズで光軸方向に移動して、レーザ光のスポットサイ
ズを変えることができる。
14 is a compensator lens. A variator lens 15 can be moved in the optical axis direction to change the spot size of the laser beam.

16はレーザ光の反則ミラーで、17はレーザ光を再び
平行光束にするコリメーティングレンズである。
Reference numeral 16 is a mirror for redirecting the laser beam, and reference numeral 17 is a collimating lens that converts the laser beam into a parallel beam of light again.

スリット投影光学系の光軸中心側に位置するミラーでス
リット投影光学系とレーザ照射光学系を同軸に合成する
。レーザ光のスポット位置は図示なき装置外部のレバー
を操作してミラー18を動かすことにより移動させる。
A mirror located on the optical axis center side of the slit projection optical system combines the slit projection optical system and the laser irradiation optical system coaxially. The spot position of the laser beam is moved by operating a lever (not shown) outside the device to move the mirror 18.

双眼実体顕微鏡 19は対物レンズ、20はガリレオ系変倍しンズ群で構
成される変倍機構でおる。
The binocular stereomicroscope 19 has an objective lens, and 20 has a variable magnification mechanism composed of a group of variable magnification lenses of the Galilean type.

21は治療用のシー11光から術老眼26を保護するた
めの保護フィルタである。
Reference numeral 21 denotes a protective filter for protecting presbyopia 26 from the treatment light 11.

22はリレーレンズ、23はポロプリズムである。24
は視野絞り、25は接眼レンズである。
22 is a relay lens, and 23 is a Porro prism. 24
25 is a field stop, and 25 is an eyepiece.

双眼実体顕微鏡光学系は垂直軸Vを中心に旋回可能に配
置されている。
The binocular stereomicroscope optical system is arranged so as to be pivotable about a vertical axis V.

以上のような光学系の構成の実施例において、 ′以下
その動作を説明する。
In the embodiment of the optical system configuration as described above, its operation will be explained below.

被術者用10に適切なコンタクトレンズ11を装着させ
る等必要な準備を行った後、装置と被術者用との位置合
せをし、図示なき固視灯を被術者用10に固禍させる。
After making necessary preparations such as attaching an appropriate contact lens 11 to the patient 10, align the device and the patient, and place a fixation lamp (not shown) on the patient 10. let

次にスリット投影光学系のランプ1を点灯し、スリット
3を背後から照明する。スリット投影レンズ5により平
行光束とされた照明光は光束分割プリズム6.7により
2光束に分割される。分割された光束はミラー18の外
側、結像レンズ8の周辺部を通ったのち、ミラー9によ
り反射され、コンタクトレンズ11を通過し、被術者用
10のなかを照明する。
Next, the lamp 1 of the slit projection optical system is turned on to illuminate the slit 3 from behind. The illumination light that has been made into a parallel beam by the slit projection lens 5 is split into two beams by the beam splitting prism 6.7. The divided light flux passes through the outside of the mirror 18 and the periphery of the imaging lens 8, is reflected by the mirror 9, passes through the contact lens 11, and illuminates the inside of the patient 10.

術者は双眼実体顕微鏡を観察することによって、スリッ
ト像が要治療部位近傍に結像するように図示なきジョイ
ステックを操作し、あるいはスリット投影光学系全体を
垂直軸■を軸に回動させて、調整する。眼底凝固におい
ては、網膜上にスリット像を結像させる。
By observing the binocular stereomicroscope, the surgeon operates a joystick (not shown) so that the slit image is focused near the area to be treated, or rotates the entire slit projection optical system around the vertical axis ■. ,adjust. In fundus coagulation, a slit image is formed on the retina.

このようにしてスリット像を要治療部位近傍に結像させ
たのち、レーザ光源を作動させる。
After the slit image is formed in the vicinity of the treatment area in this manner, the laser light source is activated.

次に、レーザ光のスポットサイズを調整する。Next, the spot size of the laser beam is adjusted.

レーザ光のスポットサイズを変えるには、バリエータレ
ンズ15を光軸方向に移動する。バリエータレンズ15
の移動に伴い、これを光学的に補償するためコンペンセ
イタレンズ14を移動する。
To change the spot size of the laser beam, the variator lens 15 is moved in the optical axis direction. Variator lens 15
As the lens moves, the compensator lens 14 is moved to optically compensate for this movement.

本実施例においては可視レーザを用いているので、凝固
用レーザを照準光としても使用することができる。この
ため治療光投射光路中にアッテネータ(図示せず)を挿
入し、減衰させることによって照準光として使用する。
Since a visible laser is used in this embodiment, the coagulation laser can also be used as aiming light. For this reason, an attenuator (not shown) is inserted into the therapeutic light projection optical path to attenuate the therapeutic light and use it as aiming light.

レーザ光のスポット位置の移動は図示なき装置外部のレ
バーを操作しミラー18を動かすことによりこれを行う
。照射部位が定められたのを確認し、図示なき照射スイ
ッチを押すと、アッテネータ(図示せず)が光路外に脱
出する。レーザヘッドから出射したレーザ光はファイバ
12に導かれる。ファイバ12の先端から出射したレー
ザ光はコリメーティングレンズにより平行光束になる。
The spot position of the laser beam is moved by operating a lever (not shown) outside the device and moving the mirror 18. After confirming that the irradiation area has been determined and pressing the irradiation switch (not shown), the attenuator (not shown) escapes from the optical path. Laser light emitted from the laser head is guided to fiber 12. The laser beam emitted from the tip of the fiber 12 is converted into a parallel beam by a collimating lens.

レンズ14.15により光束を拡大させたのち、レンズ
17により再度平行光束となり、ミラー18で反射され
、スリット投影光学系と同軸に合成される。スリット投
影光学系と同軸に合成された光束は結像レンズ8の中心
部を通り、ミラー9で反射した後、被術者眼10に装着
されたコンタクトレンズ11@介し被術者眼10の所定
部位を照射する。
After the light beam is expanded by the lenses 14 and 15, it becomes a parallel light beam again by the lens 17, reflected by the mirror 18, and combined coaxially with the slit projection optical system. The light beam combined coaxially with the slit projection optical system passes through the center of the imaging lens 8, is reflected by the mirror 9, and then passes through the contact lens 11 attached to the patient's eye 10 to a predetermined position on the patient's eye 10. Irradiate the area.

[発明の効果コ 以上の説明から明らかなように、本発明によれば、スリ
ット投影光学系と光照射光学系を同軸に合成し移動させ
る機構が、簡単となりしかも制作が容易となる。
[Effects of the Invention] As is clear from the above description, according to the present invention, the mechanism for coaxially combining and moving the slit projection optical system and the light irradiation optical system becomes simple and easy to manufacture.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の1実施例の光学系の配置略図、第2図
、第3図はスリット投影光学系中に照射光を導く方式の
従来装置の光学系(観察系は省略)の概略図である。
Figure 1 is a schematic diagram of the arrangement of the optical system in one embodiment of the present invention, and Figures 2 and 3 are schematic diagrams of the optical system (observation system is omitted) of a conventional device that guides irradiation light into a slit projection optical system. It is a diagram.

Claims (2)

【特許請求の範囲】[Claims] (1) 双眼実体顕微鏡光学系と、眼球内にスリット像
を投影するスリット投影系と、眼球内に治療用の光束を
照射する光束照射系とを有する眼科用手術装置において
、 スリット投影系のスリットと被術者眼との間に光束分割
手段を、前記光束分割手段と被術者眼の間に光束の方向
を変える光束方向変更部材を配置し、治療用の光束を光
束方向変更部材を介し分割されたスリット光束の間に入
れたことを特徴とする眼科用手術装置。
(1) In an ophthalmological surgical device having a binocular stereoscopic microscope optical system, a slit projection system that projects a slit image into the eyeball, and a light beam irradiation system that irradiates a therapeutic light beam into the eyeball, the slit of the slit projection system A beam splitting means is disposed between the beam splitting means and the subject's eye, and a beam direction changing member for changing the direction of the beam is disposed between the beam splitting means and the subject's eye, and the therapeutic light beam is directed through the beam direction changing member. An ophthalmic surgical device characterized by being inserted between divided slit light beams.
(2) 双眼実体顕微鏡光学系と、眼球内にスリット像
を投影するスリット投影系と、眼球内に治療用の光束を
照射する光束照射系とを有する眼科用手術装置において
、 スリット投影系のスリットと被術者眼との間に光束分割
手段を、前記光束分割手段と被術者眼の間に光束の方向
を変える光束方向変更部材を配置し、治療用の光束を光
束方向変更部材を介し分割されたスリット光束の間に入
れるとともに、更に前記光束方向変更部材を操作する手
段を設け、光束方向変更部材を移動させることにより、
治療用の光束のスポットを移動させることを特徴とする
眼科用手術装置。
(2) In an ophthalmological surgical device having a binocular stereoscopic microscope optical system, a slit projection system that projects a slit image into the eyeball, and a light beam irradiation system that irradiates a therapeutic light beam into the eyeball, the slit of the slit projection system A beam splitting means is disposed between the beam splitting means and the subject's eye, and a beam direction changing member for changing the direction of the beam is disposed between the beam splitting means and the subject's eye, and the therapeutic light beam is directed through the beam direction changing member. By inserting the light beam between the divided slit light beams and further providing a means for operating the light beam direction changing member to move the light beam direction changing member,
An ophthalmic surgical device characterized by moving a spot of a therapeutic light beam.
JP63001766A 1988-01-07 1988-01-07 Ophthalmic surgery device Expired - Fee Related JP2665916B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63001766A JP2665916B2 (en) 1988-01-07 1988-01-07 Ophthalmic surgery device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63001766A JP2665916B2 (en) 1988-01-07 1988-01-07 Ophthalmic surgery device

Publications (2)

Publication Number Publication Date
JPH01178258A true JPH01178258A (en) 1989-07-14
JP2665916B2 JP2665916B2 (en) 1997-10-22

Family

ID=11510703

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63001766A Expired - Fee Related JP2665916B2 (en) 1988-01-07 1988-01-07 Ophthalmic surgery device

Country Status (1)

Country Link
JP (1) JP2665916B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7347553B2 (en) * 2004-09-24 2008-03-25 Canon Kabushiki Kaisha Ophthalmic image sensing apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7347553B2 (en) * 2004-09-24 2008-03-25 Canon Kabushiki Kaisha Ophthalmic image sensing apparatus
US8506081B2 (en) 2004-09-24 2013-08-13 Canon Kabushiki Kaisha Ophthalmic image sensing apparatus

Also Published As

Publication number Publication date
JP2665916B2 (en) 1997-10-22

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