JPH01177346A - Method for supplying component to plating bath - Google Patents

Method for supplying component to plating bath

Info

Publication number
JPH01177346A
JPH01177346A JP155688A JP155688A JPH01177346A JP H01177346 A JPH01177346 A JP H01177346A JP 155688 A JP155688 A JP 155688A JP 155688 A JP155688 A JP 155688A JP H01177346 A JPH01177346 A JP H01177346A
Authority
JP
Japan
Prior art keywords
plating
plating bath
components
bath
concentration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP155688A
Other languages
Japanese (ja)
Inventor
Ichirou Tanoguchi
一郎 田野口
Takao Ikenaga
池永 孝雄
Kazuaki Hamada
浜田 一明
Katsuhiko Iwanuma
岩沼 克彦
Tetsuya Kiyasu
喜安 哲也
Tetsuya Kohama
小浜 哲也
Michio Kondo
近藤 道生
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Original Assignee
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Steel Corp filed Critical Kawasaki Steel Corp
Priority to JP155688A priority Critical patent/JPH01177346A/en
Publication of JPH01177346A publication Critical patent/JPH01177346A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To inhibit fluctuations in the concentration of the component in a plating bath and to stably obtain superior plating quality by supplying required components from plural hoppers filled with the metal grains of supplementary components, respectively, to a plating bath containing plural components. CONSTITUTION:A steel strip 6 fed through a snout 7 is dipped into a molten metal 2 for plating containing Zn and Al in a plating bath tank 1 and is allowed to travel through the above molten metal 2 via a sink roll 3, a correcting roll 4, a stabilizing roll 5, etc., to undergo hot dipping. At this time, required amounts of Zn grains 10 and Al-Zn grains 13 as supplementary components are discharged respectively from hoppers 8, 11 via rotary feeders 9, 12 according to required supplementary concentrations and the amount of the plating bath 1 reduced, and then, they are supplied by means of a conveyor 14. It is preferable that the above required supplementary concentrations and the amount of the plating bath reduced are determined according to plating conditions.

Description

【発明の詳細な説明】 〈産業上の利用分野〉 本発明は、溶融金属めっきにおけるめっき浴への成分補
給方法に関する。
DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to a method for replenishing components to a plating bath in hot-dip metal plating.

く先行技術とその問題点〉 連続溶融めっきは、溶融状態のめっき金属の浴に連続的
に走行する鋼帯を所定時間浸漬し、次いでめっき浴から
引き上げた銅帯の表面にガスワイピングを施して所定の
めっき目付量に調整することにより銅帯の表面に所望の
めっきを施すめっき法であり、その代表的なものに溶融
亜鉛めっきがある。
Prior art and its problems Continuous hot-dip plating involves immersing a continuously running steel strip in a bath of molten plating metal for a predetermined period of time, and then applying gas wiping to the surface of the copper strip removed from the plating bath. It is a plating method in which desired plating is applied to the surface of a copper strip by adjusting the coating weight to a predetermined coating weight, and hot-dip galvanizing is a typical example.

本来、亜鉛めっき鋼板は、耐食性に優れるため建材用、
家電用および自動車用鋼板として広く用いられているが
、溶融亜鉛めっきは、電気亜鉛めっきに比べ、現状では
表面品質は劣るものの、消費エネルギーが少なく、めっ
き液のコストが安く、また容易に厚目付が可能であるた
め、亜鉛めっき鋼板を量産する上で注目されている。
Originally, galvanized steel sheets were used as building materials due to their excellent corrosion resistance.
Widely used as steel sheets for home appliances and automobiles, hot-dip galvanizing currently has inferior surface quality compared to electrogalvanizing, but it consumes less energy, the cost of the plating solution is lower, and it can be easily coated with thick coatings. Because it is possible, it is attracting attention for mass production of galvanized steel sheets.

ところで、連続溶融亜鉛めっきにおいては、純亜鉛浴を
用いる他、亜鉛と素地鋼との界面に固くてもろいFe−
Znの合金層(r層:Fes Zn2□)の成長を抑制
し、めっき密着性を向上させるために亜鉛浴中にAfl
を添加する場合がある。 即ち、めっき層と素地鋼との
界面にA℃富化層(Fe2 Aus )を形成すること
により亜鉛と素地鋼との界面のFe−Znの合金層を適
度に抑制し、めっき層の剥離を防止するものである。
By the way, in continuous hot-dip galvanizing, in addition to using a pure zinc bath, hard and brittle Fe-
Afl was added to the zinc bath to suppress the growth of the Zn alloy layer (r layer: Fes Zn2□) and improve plating adhesion.
may be added. That is, by forming an A°C enriched layer (Fe2Aus) at the interface between the plating layer and the base steel, the Fe-Zn alloy layer at the interface between the zinc and the base steel is moderately suppressed, and the peeling of the plating layer is prevented. It is intended to prevent

また、上記Anの添加に加え、めっき表面にスパングル
(華模様)を形成するために小量のpbを添加する場合
もあり、これらA1やpbの添加率は亜鉛めっき鋼板の
用途等によっても異なっている。
In addition to the addition of An mentioned above, a small amount of PB may be added to form a spangle (flower pattern) on the plating surface, and the addition rate of A1 and PB varies depending on the purpose of the galvanized steel sheet. ing.

このような連続溶融亜鉛めっきにおいては、めっき浴中
の成分(Zn、An、Pb)は、■銅帯表面に付着した
めっき層による持ち出し、■浮上ドロスの生成およびそ
のめっき浴外への排除により減少するため、減少した成
分をめっき浴へ補給する必要がある。
In such continuous hot-dip galvanizing, the components (Zn, An, Pb) in the plating bath are 1) carried out by the plating layer adhering to the surface of the copper strip, and 2) generated floating dross and removed to the outside of the plating bath. Therefore, it is necessary to replenish the plating bath with the reduced components.

従来行われている、めっき浴への成分補給方法を以下に
説明する。
A conventional method of replenishing components to a plating bath will be explained below.

まず、溶融亜鉛めっき浴の組成および補給成分(インゴ
ット)を下記表1に示す。 なお、溶融亜鉛めっき鋼板
とは、一般に純亜鉛のめつき浴のみならず、表1に示す
ような浴組成の鋼板をも含む。
First, the composition and supplementary components (ingot) of the hot-dip galvanizing bath are shown in Table 1 below. Note that hot-dip galvanized steel sheets generally include not only pure zinc plating baths but also steel sheets having bath compositions as shown in Table 1.

表     1 上記表1中の品種Gl、GAについて代表的に説明する
と、めっき浴の液面が低下すると、約1 tonの0.
3〜0.5wt%A j2− Z n合金のインゴット
をめっき浴中に没入し、数時間ピッチで浴成分を分析し
た結果、An濃度が減少してくると、1つが10〜30
kg程度の10wt%An−Zn合金のインゴットを適
当数めっき浴中に投入するという方法で成分補給を行っ
ていた。
Table 1 To explain representatively the types Gl and GA in Table 1 above, when the liquid level of the plating bath decreases, about 1 ton of 0.
As a result of immersing an ingot of 3~0.5wt% Aj2-Zn alloy in a plating bath and analyzing the bath components over several hours, it was found that as the An concentration decreased, one
Ingredients were replenished by placing an appropriate number of 10 wt % An-Zn alloy ingots weighing approximately 1 kg into the plating bath.

なお、浴成分の目* A 11 ?R度よりもAJ2濃
度の高いAjZ−Zn合金インゴットを投入する理由は
、前述したAJZ富化層(Fe2AJ:L5)の生成お
よび浮上ドロスの生成によりめつき浴中のZnの減少率
よりもAJ2の減少率の方が大きいからである。
In addition, the number of bath ingredients * A 11? The reason for introducing an AjZ-Zn alloy ingot with a higher AJ2 concentration than the R degree is that the AJ2 This is because the rate of decrease is greater.

しかるに、上記インゴットの投入による補給方法では、
めっき浴へ投入されたインゴットが浴中で溶融し拡散し
て、均一なめつき浴になるまでに時間がかかり(インゴ
ットの重量が多いほど長時間を要する)、またインゴッ
トが全て溶融、拡散してから次回投入時までは浴中のA
u濃度は減少し続けるため、第4図の比較例に示すよう
に10wt%AfL−Zn合金インゴットを投入するピ
ッチ(数時間間隔)でめっき浴中のへ1濃度が大きく変
動する。
However, in the above replenishment method using ingots,
It takes time for the ingot put into the plating bath to melt and spread in the bath to form a uniform plating bath (the heavier the ingot, the longer it takes), and it takes time for the ingot to melt and spread in the bath to form a uniform plating bath. A in the bath until the next injection.
Since the U concentration continues to decrease, the He1 concentration in the plating bath fluctuates greatly depending on the pitch at which 10 wt% AfL-Zn alloy ingots are introduced (at intervals of several hours), as shown in the comparative example in FIG.

このようにめっき洛中のAIL濃度が変動すると、前述
したAIL富化層の均一性が損われ、安定しためっき品
質を得ることができず、また連続溶融亜鉛めっきにおい
てはめつき浴中のAu濃度が目標値より外れた状態での
めっき部分が多くなり、めっき品質の低下を招く。
If the AIL concentration in the plating bath fluctuates in this way, the uniformity of the AIL-enriched layer described above will be impaired, making it impossible to obtain stable plating quality, and in continuous hot-dip galvanizing, the Au concentration in the plating bath will change. The number of plated areas that deviate from the target value increases, leading to a decrease in plating quality.

また、上記従来の成分補給方法では、めっき条件との関
係は考慮されておらず、しかもA℃含有率が一定のA℃
−Zn合金インゴットを投入するため、任意のA℃濃度
での成分補給が不可能であり、めっき浴中のA1濃度を
微妙に調整することができない。
In addition, in the conventional component replenishment method described above, the relationship with plating conditions is not taken into account, and moreover, the A℃ content is constant.
- Since the Zn alloy ingot is charged, it is impossible to replenish the components at an arbitrary A°C concentration, and it is not possible to finely adjust the A1 concentration in the plating bath.

近年、溶融亜鉛めっき鋼板は、製造コストが安いため、
大量生産される自動車外板への適用が期待されているが
、そのためにはプレス成形による深絞り加工に対しても
優れためっき密着性を有していなければならず、よって
前述した適正なAJ2富化層の形成が不可欠となってい
る。 従って、めっき洛中のA℃濃度の管理をよりi格
に行う必要がある。
In recent years, hot-dip galvanized steel sheets have become popular due to their low manufacturing costs.
It is expected that it will be applied to mass-produced automobile exterior panels, but for this purpose, it is necessary to have excellent plating adhesion even during deep drawing processing by press forming. The formation of an enriched layer has become essential. Therefore, it is necessary to manage the A° C. concentration during plating in a more i-class manner.

このような点を考慮した場合、従来のインゴットの投入
による成分補給法では、A℃濃度の変動を小さくするに
は限界があり、満足するめつき品質を安定的に得ること
はできなかった。
Taking these points into consideration, the conventional component replenishment method by charging ingots has a limit in reducing fluctuations in the A.degree. C. concentration, and has not been able to stably obtain satisfactory plating quality.

〈発明の目的〉 本発明の目的は、上述した従来技術の欠点を解消し、め
っき浴中の成分の濃度変動を抑制し、良好なめっき品質
を安定的に得ることができるめっき浴への成分補給方法
を提供することにある。
<Object of the Invention> The object of the present invention is to solve the above-mentioned drawbacks of the prior art, to suppress concentration fluctuations of the components in the plating bath, and to provide components for the plating bath that can stably obtain good plating quality. The purpose is to provide a replenishment method.

〈発明の構成〉 このような目的は、以下の本発明によって達成される。<Structure of the invention> Such objects are achieved by the present invention as described below.

即ち、本発明は、複数の成分を含むめっき浴にて溶融め
っきを行う際のめっき浴への成分補給方法において、補
給成分の金属粒を入れた複数個のホッパーを用い、必要
な補給濃度およびめっき浴の減少量に対応するよう前記
ホッパーから成分を補給することを特徴とするめっき浴
への成分補給方法を提供するものである。
That is, the present invention provides a method for replenishing components into a plating bath when performing hot-dip plating in a plating bath containing a plurality of components, using a plurality of hoppers containing metal grains as replenishment components, and adjusting the required replenishment concentration and The present invention provides a method for replenishing components to a plating bath, characterized in that components are replenished from the hopper so as to correspond to the amount of decrease in the plating bath.

また、前記必要な補給濃度およびめっき浴の減少量はめ
っき条件により決定されるものであるのが好ましい。
Further, it is preferable that the necessary replenishment concentration and the amount of decrease in the plating bath are determined by the plating conditions.

以下、本発明のめっき浴への成分補給方法を添付図面に
示す好適実施例について詳細に説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The method of replenishing components to a plating bath according to the present invention will be described in detail below with reference to preferred embodiments shown in the accompanying drawings.

第1図は、本発明のめっき浴への成分補給方法を実施す
る設備の構成例を模式的に示す側面図である。
FIG. 1 is a side view schematically showing an example of the configuration of equipment for carrying out the method of replenishing components to a plating bath according to the present invention.

めっき浴1においては、スナウト7から出た焼鈍済の鋼
帯6はジンクロール3により金属めっき用溶融金属(例
えば溶融亜鉛)2中に浸漬され、次いでコレクティング
ロール4により、湾曲(C反り)を矯正され、スタビラ
イジングロール5により揺動を停止しバス芯が安定され
、めっき用溶融金属2から引き上げられた後ガスワイピ
ング(図示せず)により所定のめつき目付量に調整され
る。 このようにして、鋼帯6に溶融金属めりきが連続
的になされる。
In the plating bath 1, the annealed steel strip 6 coming out of the snout 7 is immersed in a molten metal for metal plating (for example, molten zinc) 2 by a zinc roll 3, and then bent (C-warped) by a collecting roll 4. is corrected, the bath core is stabilized by stopping the swinging by the stabilizing roll 5, and after being lifted from the molten metal 2 for plating, it is adjusted to a predetermined plating area weight by gas wiping (not shown). In this way, the steel strip 6 is continuously plated with molten metal.

溶融亜鉛めっきを行う場合、前述したように、めっき密
着性を向上するためにめっき浴へA℃を添加し、あるい
は、さらにめっき表面にスパングルを形成するために小
量のpbを添加することが行われる。 従って、めっき
用溶融金属2の組成は、Al1−Zn系またはAl2−
Pb−Zn系等であり、Aflやpbの添加率も製造す
る亜鉛めっき鋼板の用途、種類等によって適宜決定され
る。
When performing hot-dip galvanizing, as mentioned above, it is possible to add A°C to the plating bath to improve plating adhesion, or to add a small amount of PB to form spangles on the plating surface. It will be done. Therefore, the composition of the molten metal 2 for plating is Al1-Zn-based or Al2-
It is a Pb-Zn type, etc., and the addition rate of Afl and Pb is appropriately determined depending on the use, type, etc. of the galvanized steel sheet to be manufactured.

例えば、i)めっき用溶融金属の組成が0.0f  〜
 0.2wむ% Pb−0,1〜0.  2wt%Af
1.−Zn合金である亜鉛めっき鋼板または合金化処理
亜鉛めっき鋼板(Gl、GA)、if)めっき用溶融金
属の組成が5wt%A℃−Zn合金である亜鉛−アルミ
ニウム合金めっき鋼板(GALFAN)、あるいは 1ii)めっき用溶融金属の組成が1.4wt%St−
55wt%AJZ−43.6wt%Znの亜鉛−アルミ
ニウム合金めっき鋼板(GALVALUME)等がある
For example, i) the composition of the molten metal for plating is 0.0f ~
0.2w% Pb-0.1~0. 2wt%Af
1. - Zn alloy galvanized steel sheet or alloyed galvanized steel sheet (Gl, GA), if) the composition of the molten metal for plating is 5 wt% A℃ - Zn alloy coated steel sheet (GALFAN), or 1ii) The composition of the molten metal for plating is 1.4wt%St-
Examples include 55 wt% AJZ-43.6 wt% Zn zinc-aluminum alloy plated steel sheet (GALVALUME).

i)の用途は主に建材用、家電製品用、自動車内板用で
あり、it) 、 1ff)の用途は主に建材用である
The uses of i) are mainly for building materials, home appliances, and automobile interior panels, and the uses of it) and 1ff) are mainly for building materials.

このような連続溶融亜鉛めっきでは、鋼帯6の表面に付
着しためっき層による持ち出しや、浮上ドロスが生成し
、これをめつき浴外へ排除することによりめっき用溶融
金属2の液面レベルが低下する。 従って、液面レベル
を一定に保ち、かつめっき用溶融金属の組成を目標値に
一定に保つように補給を行う必要がある。 なお、浮上
ドロスの主成分は、鋼帯6から溶出したFeがめつき用
溶融金属2中のAj!と結合してFe2Au5となり、
これがめつき浴面へ浮上(め)き用溶融金属より比重が
小さい)したものである。
In such continuous hot-dip galvanizing, the plating layer adhering to the surface of the steel strip 6 generates carryover and floating dross, and by removing this from the plating bath, the liquid level of the molten metal 2 for plating is lowered. descend. Therefore, it is necessary to replenish so as to keep the liquid level constant and the composition of the molten metal for plating constant at the target value. The main component of the floating dross is Aj! in the Fe molten metal for plating 2 eluted from the steel strip 6! Combines with to become Fe2Au5,
This floats to the surface of the plating bath (its specific gravity is lower than that of the molten metal for plating).

また、めっき用溶融金属2の減少は、めっき用溶融金属
の各成分(Zn、An、Pb)がその含有率(濃度)に
比例して減少するのではない。 即ち、A1の減少に関
しては、素地鋼とめつき層との界面にAl富化層(Fe
2A15)が形成されることから、持ち出しにおけるA
!濃度がめつき用溶融金属2のA℃濃度よりも高く、ま
ためっき浴外へ排除される浮上ドロスの組成はAjZ濃
度0.1〜0.2wt%のめっき用溶融金属2において
、Au=Fe=2〜4wt%、残部Znであるため、め
っき用溶融金属中のA℃濃度の低下は、他の成分に比べ
て著しい。 従って、めっき浴への成分の補給はめっき
用溶融金属2の組成と等しい濃度で行うのではなく、液
面レベルが目標値になるような量補給した結果、めっき
用溶融金属2の組成も目標値となるように行う必要があ
る(なお、成分の補給は、目標値とほぼ等しい濃度で行
う場合もある)。
Further, the reduction in the molten metal for plating 2 does not result from a decrease in each component (Zn, An, Pb) of the molten metal for plating in proportion to the content (concentration) thereof. That is, regarding the reduction of A1, an Al-enriched layer (Fe
2A15) is formed, so A in taking out
! The composition of the floating dross that is higher than the A°C concentration of the molten metal 2 for plating and is removed to the outside of the plating bath is Au=Fe= Since Zn accounts for 2 to 4 wt% and the remainder is Zn, the decrease in the A°C concentration in the molten metal for plating is more significant than for other components. Therefore, instead of replenishing the components to the plating bath at a concentration equal to the composition of the molten metal 2 for plating, the components are replenished in such an amount that the liquid level reaches the target value, and as a result, the composition of the molten metal 2 for plating also reaches the target value. (Note that supplementation of components may be performed at a concentration approximately equal to the target value).

本発明において、めっき浴への成分の補給は次のように
して行われる。 第1図に示すように、めっき浴1の側
方には、ホッパー8および11が設置されており、ホッ
パー8にはZn粒9、ホッパー11にはAjZ−Zn合
金粒13が貯留されている。
In the present invention, components are replenished into the plating bath as follows. As shown in FIG. 1, hoppers 8 and 11 are installed on the side of the plating bath 1, and the hopper 8 stores Zn grains 9, and the hopper 11 stores AjZ-Zn alloy grains 13. .

各ホッパー8および11の下端開口部には、それぞれロ
ータリーフィーダー9および12が設置され、成分補給
時には、これらを作動させ、ホッパー8および11から
Zn粒9およびAl1−Zn合金粒13をそれぞれ所定
量切り出し、コンベア14により搬送してめっき浴1中
へ投入する。
Rotary feeders 9 and 12 are installed at the lower end openings of each hopper 8 and 11, respectively, and when replenishing ingredients, these are operated to feed a predetermined amount of Zn grains 9 and Al1-Zn alloy grains 13 from the hoppers 8 and 11, respectively. It is cut out, transported by a conveyor 14, and thrown into the plating bath 1.

このような成分の補給は、前述した必要な補給濃度およ
びめっき浴の減少量に対応するようにそれぞれのホッパ
ー8.11からのめつき浴への投入量を調整して行う。
The replenishment of such components is carried out by adjusting the amount charged into the plating bath from each hopper 8.11 so as to correspond to the necessary replenishment concentration and the amount of reduction in the plating bath as described above.

 なお、めっき用溶融金属2が二元系合金の場合、必要
な補給濃度およびめっき浴の減少量に対応するよう成分
を補給するためには、少なくとも2つのホッパーがあれ
ばよい。 各ホッパー8.11からのZn粒9およびA
l1−Zn合金粒13の投入量の調整は、各ロータリー
フィーダー9.12の切り出し量の調整等により行えば
よい。
In addition, when the molten metal 2 for plating is a binary alloy, at least two hoppers are sufficient in order to replenish the components to correspond to the required replenishment concentration and the amount of decrease in the plating bath. Zn grains 9 and A from each hopper 8.11
The input amount of the l1-Zn alloy grains 13 may be adjusted by adjusting the cutout amount of each rotary feeder 9.12.

なお、本発明では、ホッパーからの金属粒の切り出しを
ロータリーフィーダーを用いない他の方法によって行っ
てもよく、また、ホッパーから切り出された金属粒をコ
ンベアにより搬送せず、直接めっき浴へ投入してもよい
In addition, in the present invention, the metal particles may be cut out from the hopper by other methods that do not use a rotary feeder, and the metal particles cut out from the hopper may be directly thrown into the plating bath without being conveyed by a conveyor. You can.

また、補給の形態は、めっきを行っている間随時補給を
行う連続的補給、あるいは所定の間隔をおいて補給を行
う間欠的な補給のいずれでもよく、また、各ホッパー毎
にこれらの補給形態が異っていてもよい。 なお、間欠
的な補給を行う場合には、その補給ピッチがなるべく短
い方が、めっき用溶融金属2の濃度変動が少なくなり好
ましい。
Furthermore, the form of replenishment may be either continuous replenishment, in which replenishment is performed at any time during plating, or intermittent replenishment, in which replenishment is performed at predetermined intervals. may be different. In addition, when performing intermittent replenishment, it is preferable that the replenishment pitch be as short as possible, since concentration fluctuations in the molten metal 2 for plating will be reduced.

ホッパー8.11内の金属粒10.13が減少した場合
には、そのホッパー8.11へそれぞれの金属粒10.
13を投入し、減少量を補う。
If the number of metal grains 10.13 in the hopper 8.11 decreases, the respective metal grains 10.13 are transferred to that hopper 8.11.
13 to make up for the decrease.

なお、ベルトコンベア14の投入部141はめフき浴1
中の第1図に示す箇所に配置する場合に限らず、鋼帯6
の近傍に配置してもよく、また、複数の投入部141を
めっき浴1の各所に配置してもよい。 このようにする
ことにより、めっき浴1中のめっき用溶融金属2の濃度
の均一化が促進され好ましい。
Note that the feeding section 141 of the belt conveyor 14 is
The steel strip 6 is not limited to the location shown in Figure 1 in the
Alternatively, a plurality of input portions 141 may be placed at various locations in the plating bath 1. This is preferable because it promotes uniformity of the concentration of the molten metal 2 for plating in the plating bath 1.

このように、めフき浴1への成分の補給を、金属粒の投
入という形式で行う場合、従来のインゴットの投入によ
る方法に比べ、めっき浴への投入後の溶融が速やかに行
われ、めっき用溶融金属の濃度が目欅値に到達するまで
の時間が短いという利点がある。
In this way, when replenishing the components to the plating bath 1 by adding metal particles, the melting after the addition to the plating bath takes place more quickly than in the conventional method of adding ingots. It has the advantage that it takes a short time for the concentration of molten metal for plating to reach the target key value.

なお、めっき浴1のAn成分の補給をA1−Zn合金粒
13として行なう理由は次の通りである。 めっき浴1
の浴温は、めっき用溶融金属の組成が0.1〜5wt%
AJ!−Zn合金の場合、約450〜480℃であるが
、A141体はその融点が880℃であるため、へ1粒
をめっき浴1へ投入してもめっき浴1中で溶融しない。
The reason why the An component of the plating bath 1 is replenished as A1-Zn alloy grains 13 is as follows. Plating bath 1
The bath temperature is such that the composition of the molten metal for plating is 0.1 to 5 wt%.
AJ! - In the case of Zn alloy, the temperature is about 450 to 480°C, but since the melting point of A141 body is 880°C, even if one grain is put into the plating bath 1, it will not melt in the plating bath 1.

 これに対し、A11−Zn合金粒とすればその融点が
低くなり(fowt%A11−Zn合金の融点430・
℃)、めっき浴へ投入後直ちに溶融し、上記不都合が生
じない。 従って、本発明においては、浴温よりも高い
融点を有する金属の成分を補給する場合には、その金属
と他の金属、特に主成分となる金属(本実施例では亜鉛
)との合金とし、融点を降下せしめ、好ましくはその融
点が浴温以下になるようにして、めっき浴へ投入するの
が好ましい。
On the other hand, if A11-Zn alloy particles are used, the melting point will be lower (fowt%A11-Zn alloy melting point 430.
°C), it melts immediately after being put into the plating bath, and the above-mentioned disadvantages do not occur. Therefore, in the present invention, when replenishing a metal component having a melting point higher than the bath temperature, an alloy of the metal and another metal, especially the main component metal (zinc in this example), is used. It is preferable to lower the melting point, preferably below the bath temperature, before adding it to the plating bath.

ただし、本発明では溶融AA粒を入れたホッパーを設け
、AIt単体で補給を行うことを妨げるものではない。
However, the present invention does not preclude the provision of a hopper containing molten AA grains and replenishing AIt alone.

第2図は、本発明のめっき浴への成分補給方法を実施す
る設備の他の構成例を模式的に示す側面図である。 同
図に示す設備では、前記と同様のホッパー8および11
と、他の補給成分の金属粒(例えば、pb粒、Pb−Z
n合金粒等)17を入れたホッパー15が設置され、前
記と同様にしてホッパー8および11から、それぞれZ
n粒9およびAIL−Zn合金粒13がめつき浴1へ投
入されるとともに、ホッパー15から所定量の金属粒1
7がめつき浴1へ投入される。 ホッパー15の下端開
口部にはロータリーフィーダー16が設置され、このロ
ータリーフィーダー16の作動によりホッパー内の金属
粒が定量切り出しされ、めっき浴1へ投入されるように
なっている。 なお、ホッパー8.11と同様に、ホッ
パー15をめっき浴から相当距離離間した位置に設置し
、ホッパー15から切り出された金属粒17をコンベア
により搬送し、めつき浴1へ投入するようにしてもよい
FIG. 2 is a side view schematically showing another example of the configuration of equipment for carrying out the method of replenishing components to a plating bath according to the present invention. In the equipment shown in the figure, hoppers 8 and 11 similar to those described above are used.
and other supplementary component metal particles (e.g. PB particles, Pb-Z
A hopper 15 containing Z alloy grains, etc.) 17 is installed, and in the same manner as above, Z
The n grains 9 and AIL-Zn alloy grains 13 are charged into the plating bath 1, and a predetermined amount of metal grains 1 are also removed from the hopper 15.
7 is put into the plating bath 1. A rotary feeder 16 is installed at the opening at the lower end of the hopper 15, and the operation of the rotary feeder 16 cuts out a fixed amount of metal grains in the hopper and feeds them into the plating bath 1. In addition, similar to hopper 8.11, the hopper 15 is installed at a position separated from the plating bath by a considerable distance, and the metal particles 17 cut out from the hopper 15 are conveyed by a conveyor and thrown into the plating bath 1. Good too.

溶融亜鉛めっきにおいては、前述したようにめっき表面
にスパングルを形成するためにめっき用溶融金属2中に
小量のpbを添加することがある。 即ち、めっき用溶
融金属の組成はPb−A11−Zn合金となっており、
とのpb酸成分補給をpb粒による金属粒17の投入に
より行えばよい。
In hot-dip galvanizing, a small amount of PB may be added to the molten metal 2 for plating in order to form spangles on the plating surface, as described above. That is, the composition of the molten metal for plating is a Pb-A11-Zn alloy,
PB acid component may be replenished by introducing metal particles 17 using PB particles.

なおpbの融点は327℃であり、めっき浴1の浴温(
450〜480℃)より低いため、めっき浴1へ投入さ
れたpb粒は速やかに溶融し、拡散する。
The melting point of pb is 327°C, and the bath temperature of plating bath 1 (
(450 to 480°C), the PB particles introduced into the plating bath 1 quickly melt and diffuse.

本発明において、金属粒10,13.17の粒径は特に
限定されないが、好ましくは1〜50mm程度がよい。
In the present invention, the particle size of the metal particles 10, 13.17 is not particularly limited, but is preferably about 1 to 50 mm.

  1 mm未満であると浴中を微小の粒が浮遊し鋼帯
6に付着しやすくなり、また50mmを超えると濃度調
整の精度が荒くなるからである。 よって粒径の下限は
1 mm、上限は50mm程度とするのが適切である。
If it is less than 1 mm, minute particles will float in the bath and will tend to adhere to the steel strip 6, and if it exceeds 50 mm, the accuracy of concentration adjustment will become rough. Therefore, it is appropriate that the lower limit of the particle size is 1 mm and the upper limit is about 50 mm.

 なお、金属粒17はpb粒に限らず、Pb−Zn合金
の粒、またはその他の金属、合金の粒状物でもよい。
Note that the metal grains 17 are not limited to PB grains, but may also be grains of Pb-Zn alloy, or grains of other metals or alloys.

次に、めフき浴の組成に応じた本発明による補給例を説
明する。
Next, an example of replenishment according to the present invention according to the composition of the scrubbing bath will be explained.

例えば、6個のホッパーA〜Fを設け、各ホッパー内の
金属粒の組成を下記表2に示すものとする場合に、めっ
き浴の組成に対する各ホッパーからのめっき浴への補給
例を下記表3に示す。
For example, when six hoppers A to F are provided and the composition of metal particles in each hopper is shown in Table 2 below, the table below shows an example of replenishment from each hopper to the plating bath according to the composition of the plating bath. Shown in 3.

表     2 表     3 本発明において、成分の補給量の決定は、例えば、浴成
分を適時分析し、その分析値に基づいて行う方法、また
は、経験的に判断される推定値に基づいて行う方法等に
より行うことも可能であるが、好ましくは、以下に述べ
るように、必要な補給濃度およびめっき浴の減少量をめ
っき条件より決定し、これに基づいて成分の補給を行う
のがよい。
Table 2 Table 3 In the present invention, the amount of component replenishment can be determined by, for example, a method of timely analyzing bath components and based on the analyzed value, or a method of determining based on an estimated value determined empirically. However, as described below, it is preferable to determine the necessary replenishment concentration and the amount of decrease in the plating bath from the plating conditions, and replenish the components based on this.

本発明者らは、めっき浴組成0.05〜0.20wt%
An−Znによる溶融亜鉛めっきについてAl成分の減
少量とめつき条件との関係を調べるために実験、考察を
行った結果、以下の知見を得た。
The present inventors have determined that the plating bath composition is 0.05 to 0.20 wt%
As a result of conducting experiments and discussions to investigate the relationship between the amount of decrease in Al component and plating conditions regarding hot-dip galvanizing using An-Zn, the following findings were obtained.

■ 素地鋼とめっき層との界面にA1富化層(Fe2 
AJ2s )が形成されるため、めっき層中のA JZ
 a度はめっき浴中のAl濃度より高くなっている。 
さらにめっき層中のA1濃度はめっき付着量に対し常に
一定ではなく、第3図に示すようにめっき付着量の関数
となっている。 従って、めっき付着量より/lILの
持ち出しによる減少量を知ることができる。
■ An A1-enriched layer (Fe2
AJZ) in the plating layer is formed.
The a degree is higher than the Al concentration in the plating bath.
Furthermore, the A1 concentration in the plating layer is not always constant with respect to the amount of plating deposited, but is a function of the amount of plating deposited, as shown in FIG. Therefore, the amount of reduction in /lIL due to carry-over can be known from the amount of plating deposited.

■ 浮上ドロスの主成分は、銅帯から溶出したFeとめ
つき浴中の八2とが結合してFe2A 11 sとなっ
たものであり、このドロスの成分を分析した結果AjZ
=Fe=2〜4wt%、残部Znであることがわかった
。 よって浮上ドロス生成によるAn成分の減少量は銅
帯からのFeの溶出量に等しく、これを把握すれば浮上
ドロスによるA1の減少量を知ることができる。
■ The main component of the floating dross is Fe2A 11 s, which is formed by the combination of Fe eluted from the copper strip and 82 in the plating bath.As a result of analyzing the components of this dross, AjZ
It was found that Fe=2 to 4 wt%, and the balance was Zn. Therefore, the amount of decrease in the An component due to the generation of floating dross is equal to the amount of Fe eluted from the copper strip, and by understanding this, it is possible to know the amount of decrease in A1 due to the floating dross.

上記■、■より、めっき浴中のZnおよびAlの合計減
少量は、次式で示される。
From the above (1) and (2), the total decrease in Zn and Al in the plating bath is expressed by the following formula.

AJ2合計減少量=f (V、B、C,θ、w)Zn合
計減少量=g (V、B、C,θ、w)Vニライン速度 B:板 幅 C:浴中Al濃度 θ:侵入板温 W:めっき付着量 以上より、めっき浴中のZnとAl2の減少量およびZ
n、AJ:tの各減少割合はめつき条件(め)き付着量
、板幅、ライン速度、板温等)により決定することがで
きることがわかった。
AJ2 total decrease amount = f (V, B, C, θ, w) Zn total decrease amount = g (V, B, C, θ, w) V Ni line speed B: Plate Width C: Al concentration in bath θ: Penetration Board temperature W: From the amount of plating deposited or above, the amount of decrease in Zn and Al2 in the plating bath and Z
It has been found that the respective reduction ratios of n and AJ:t can be determined by the plating conditions (plating amount, plate width, line speed, plate temperature, etc.).

従来では、めっき洛中のAj2濃度より高いAλ濃度(
含有率)のAIL−Zn合金インゴットをめっき浴へ投
入するだけであり、めっき条件に応じて、AjZの補給
濃度を変えるということは行っていなかった。 これに
対し、めっき条件より必要な浴成分の補給濃度およびめ
っき浴の減少量を決定する本発明では、より適正な成分
の補給が可能となり、めっき浴中の各成分の濃度管理を
より狭い範囲に限定することができ、また、めっき条件
(めっき付着量、板幅、ライン速度、板温等)が変った
場合でも、それに対応することができる。
Conventionally, the Aλ concentration (
In this method, an AIL-Zn alloy ingot with an AJZ content (concentration) was simply put into a plating bath, and the replenishment concentration of AJZ was not changed depending on the plating conditions. In contrast, with the present invention, which determines the necessary replenishment concentration of bath components and the amount of reduction in the plating bath based on the plating conditions, it is possible to replenish the components more appropriately, and the concentration of each component in the plating bath can be controlled within a narrower range. Furthermore, even if the plating conditions (plating amount, plate width, line speed, plate temperature, etc.) change, it can be accommodated.

一般に、n個(n≧2)のブリメルトボットがあり、C
nをn番目のブリメルトボット中の特定成分の濃度、Q
nをn番目のブリメルトボットからの補給量とすると、
必要補給量Q“および必要濃度C8は次式で示される。
In general, there are n Brimeltbots (n≧2), and C
n is the concentration of the specific component in the nth Brimeltbot, Q
If n is the supply amount from the nth Brimeltbot, then
The required replenishment amount Q'' and the required concentration C8 are expressed by the following equation.

Q′″ = Q +  + Q 2  + ” ” Q
 nこのQ”、C″は前記めっき条件から決定され、そ
のQ″、CMの値となるようにQl〜Qnを調整して補
給を行えばよい。
Q′″ = Q + + Q 2 + ” ”Q
n These Q'' and C'' are determined from the above-mentioned plating conditions, and replenishment may be performed by adjusting Ql to Qn so that the values of Q'' and CM become the same.

以上、本発明のめつき浴への成分補給方法をAJZ成分
を含む溶融亜鉛めっきについて代表的に説明したが、本
発明では溶融亜鉛めフきに限らず、例えば溶融錫めっき
、錫−鉛合金めっき、溶融アルミニウムめっき等、あら
ゆる溶融金属めっきに適用することができる。
Above, the method of replenishing components to a plating bath according to the present invention has been typically explained for hot-dip galvanizing containing AJZ components, but the present invention is not limited to hot-dip galvanizing, for example, hot-dip tin plating, tin-lead alloy It can be applied to all types of molten metal plating, such as plating and hot-dip aluminum plating.

〈実施例〉 (本発明例1) 第1図に示す構成の設備を用い、下記条件にて溶融亜鉛
めっきを行フた。
<Example> (Example 1 of the present invention) Hot-dip galvanizing was carried out under the following conditions using the equipment configured as shown in FIG.

めっき浴組成: 0.15±0.01冑t%Aλ(目標イ直)残部Zn 第1ホッパー貯溜物:純Zn粒 (平均粒径 5mm) 第2ホッパー貯溜物:2wt%An−Zn合金粒(平均
粒径 5mm) めっき条件 板  厚    :0.7mm 板  幅    :1200mm ライン速度: 120  m/min めっき付着量(片面):90g/rrf’このめっき条
件から計算すると、補給すべきA文濃度は0.6wt%
、補給量(めっき浴の減少量)は30 kg/ min
である。 従って、第1ホツパーから純Zn粒を21 
kg/ min 。
Plating bath composition: 0.15±0.01 t% Aλ (target straight) remaining Zn 1st hopper storage: Pure Zn grains (average particle size 5 mm) 2nd hopper storage: 2wt% An-Zn alloy grains (Average particle size 5mm) Plating conditions Plate thickness: 0.7mm Plate width: 1200mm Line speed: 120 m/min Plating deposition amount (one side): 90g/rrf' Calculating from this plating condition, the A concentration to be replenished is 0.6wt%
, replenishment amount (decreased amount of plating bath) is 30 kg/min
It is. Therefore, 21 pure Zn grains are collected from the first hopper.
kg/min.

第2ホツパーから2wt%An−Zn合金粒を9kg/
win補給した。 なお、補給の形態は、平均的に前記
補給量となるように純Zn粒:630kg、2wt%A
11−Zn合金粒:270kgをピッチ30分で間欠的
に行った。
9kg/2wt% An-Zn alloy grains from the second hopper
I resupplied win. The form of replenishment was as follows: Pure Zn grains: 630 kg, 2 wt% A
11-Zn alloy grains: 270 kg were tested intermittently at a pitch of 30 minutes.

(本発明例2) 第1図に示す構成の設備を用い、本発明例1と同条件に
て溶融亜鉛めっきを行った。
(Example 2 of the present invention) Hot-dip galvanizing was performed under the same conditions as Example 1 of the present invention using equipment configured as shown in FIG.

ホッパーからのめっき浴への補給形態は、第1ホツパー
から純Zn粒を21 kg/ min 、第2ホツパー
から2wt%AjZ−Zn合金粒を9 kg/minで
連続的に補給した。
The plating bath was supplied from the hopper with pure Zn grains at a rate of 21 kg/min from the first hopper, and with 2 wt% AjZ-Zn alloy grains from the second hopper at a rate of 9 kg/min.

(本発明例3) 第2図に示す構成の設備を用い、下記条件にて溶融亜鉛
めきを行った。
(Example 3 of the present invention) Hot-dip galvanizing was carried out under the following conditions using equipment having the configuration shown in FIG.

めっき浴組成:0.15±0.01wt%A10101
〜0.02wt%pb 残部Zn 第1ホッパー貯溜物:純Zn粒 (平均粒径 5mm) 第2ホッパー貯溜物:2wt%AJ2−Zn合金粒(平
均粒径 5mm) 第3ホッパー貯留物:Pb粒 (平均粒径 5mm) めっき条件 板  厚    :0.7mm 板  幅    +1200mm ライン速度: 120  m/min めっき付着量(片面):90g/rn’このめっき条件
から計算すると、補給すべきAj2濃度は0.8wt%
、補給量(めっき浴の減少ff1)は30 kg/ m
inである。 ホッパーからめっき浴への補給形態は、
第1ホツパーから純Zn粒を21 kg/ lll1n
 、第2ホツパーから2wt%AIL−Zn合金粒を9
kg/minで連続的に補給した。 また、pbの減少
量は0.2k g / h rであり、その補給の形態
は、第3ホツパーからpb粒を5時間ピッチで1kgづ
つ間欠的に行った。
Plating bath composition: 0.15±0.01wt%A10101
~0.02wt%pb Balance Zn First hopper storage: Pure Zn grains (average particle size 5mm) Second hopper storage: 2wt% AJ2-Zn alloy grains (average grain size 5mm) Third hopper storage: Pb grains (Average particle size 5 mm) Plating conditions Plate thickness: 0.7 mm Plate width +1200 mm Line speed: 120 m/min Plating deposition amount (one side): 90 g/rn' Calculating from these plating conditions, the Aj2 concentration to be replenished is 0. 8wt%
, the replenishment amount (decrease in plating bath ff1) is 30 kg/m
It is in. The replenishment form from the hopper to the plating bath is as follows:
21 kg/ll1n of pure Zn grains from the first hopper
, 9 2wt% AIL-Zn alloy grains from the second hopper
It was continuously replenished at a rate of kg/min. In addition, the amount of decrease in PB was 0.2 kg/hr, and the form of replenishment was such that PB grains were intermittently supplied from the third hopper at a rate of 1 kg at a pitch of 5 hours.

(比較例) めっき浴組成およびめっき条件を本発明例1と同様とし
、重量1 tonの0.4wt%A℃−Znインゴット
を約33分ピッチで、重量20kgの10wt%Aj2
−Znインゴットを約8時間ピッチで、めっき浴へ間欠
的に投入して成分の補給を行った。
(Comparative Example) The plating bath composition and plating conditions were the same as those in Inventive Example 1, and a 0.4 wt% A℃-Zn ingot weighing 1 ton was heated at a pitch of about 33 minutes, and a 10 wt% Aj2 ingot weighing 20 kg was heated.
- Zn ingots were intermittently introduced into the plating bath for about 8 hours to replenish the components.

上記本発明例1.2.3および比較例についてめっき浴
中のA1濃度の経時的変化を調べた。 その結果を第4
図のグラフに示す。 このグラフから明らかなように、
本発明例1.2および3は、比較例に比べめっき洛中の
AJZ濃度の変動が少なく、特に連続的な補給を行った
本発明例2および3では、A1濃度の目標値からの変動
がほとんどなく、よって、所望のめっき品質が安定して
得られることがわかフた。
Changes in A1 concentration in the plating bath over time were investigated for the above-mentioned Inventive Examples 1.2.3 and Comparative Examples. The result is the fourth
Shown in the graph of figure. As is clear from this graph,
Examples 1, 2 and 3 of the present invention have less variation in the AJZ concentration during plating compared to the comparative example, and especially in Examples 2 and 3 of the present invention in which continuous replenishment was performed, there was almost no variation in the A1 concentration from the target value. Therefore, it was found that the desired plating quality could be stably obtained.

また、浴中のpb濃度についても同様であり、本発明例
3のpbの補給形態によると濃度変動がほとんどなくな
りめっき品質が安定することがわかった。
The same holds true for the PB concentration in the bath, and it was found that the PB replenishment method of Example 3 of the present invention almost eliminates concentration fluctuations and stabilizes the plating quality.

〈発明の効果〉 本発明のめっき浴への成分補給方法によれば、複数個の
ホッパーからの成分の補給により、補給する成分の濃度
および補給量を任意に選定することができ、よって、め
フき浴中の成分の濃度変動を抑制することができ、良好
なめっき品質を安定的に得ることができる。
<Effects of the Invention> According to the method for replenishing components to a plating bath of the present invention, by replenishing components from a plurality of hoppers, the concentration and amount of replenishing components can be arbitrarily selected. Fluctuations in the concentration of components in the cleaning bath can be suppressed, and good plating quality can be stably obtained.

特に、成分の必要な補給濃度およびめっき浴の減少量を
めっき条件より決定する場合には、より適正な成分の補
給が可能となり、また、めっき条件が変化した場合でも
その変化に対応することができ、よってめっき浴中の成
分の厳格な濃度管理が可能となる。
In particular, when determining the necessary replenishment concentration of components and the reduction amount of the plating bath from the plating conditions, it becomes possible to replenish the components more appropriately, and even if the plating conditions change, it is possible to respond to the changes. This makes it possible to strictly control the concentration of components in the plating bath.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図および第2図は、それぞれ本発明のめっき浴への
成分の補給方法を実施するための設備の構成例を模式的
に示す線図的側面図である。 第3図は、めっき付着量とめっき層中のAIL濃度との
関係を示すグラフである。 第4図は、めっき浴中のAfl濃度の経時的変化を示す
グラフである。 符号の説明 1・・・めっき浴、 2・・・めっき用溶融金属、 3・・・ジンクロール、 4・・・コレクティングロール、 5・・・スタビラインジンゲロール、 6・・・銅帯、 7・・・スナウト、 8.11・・・ホッパー、 9.12・・・ロータリーフィーダー、10・・・Zn
粒、 13− A A −Z n合金粒、 14・・・コンベア、 15・・・ホッパー、 16・・・ロータリーフィーダー、 17・・・金属粒(pb粒) −m FIG、3 め、5(付倉量(g/m”)
1 and 2 are diagrammatic side views each schematically showing a configuration example of equipment for carrying out the method of replenishing components to a plating bath according to the present invention. FIG. 3 is a graph showing the relationship between the amount of plating deposited and the AIL concentration in the plating layer. FIG. 4 is a graph showing the change in Afl concentration in the plating bath over time. Explanation of symbols 1... Plating bath, 2... Molten metal for plating, 3... Zinc roll, 4... Correcting roll, 5... Stabilizing gingerol, 6... Copper strip, 7 ...Snout, 8.11...Hopper, 9.12...Rotary feeder, 10...Zn
grain, 13-A A-Zn alloy grain, 14... conveyor, 15... hopper, 16... rotary feeder, 17... metal grain (pb grain) -m FIG, 3 second, 5 ( Storage capacity (g/m”)

Claims (2)

【特許請求の範囲】[Claims] (1) 複数の成分を含むめっき浴にて溶融めっきを行
う際のめつき浴への成分補給方法において、 補給成分の金属粒を入れた複数個のホッパーを用い、必
要な補給濃度およびめっき浴の減少量に対応するよう前
記ホッパーから成分を補給することを特徴とするめっき
浴への成分補給方法。
(1) In a method of replenishing components to a plating bath when performing hot-dip plating in a plating bath containing multiple components, multiple hoppers containing metal grains of replenishment components are used to determine the required replenishment concentration and plating bath. A method for replenishing components into a plating bath, comprising replenishing components from the hopper to correspond to a decrease in the amount of components.
(2) 前記必要な補給濃度およびめっき浴の減少量は
めっき条件により決定されるものである請求項1に記載
のめっき浴への成分補給方法。
(2) The method for replenishing components to a plating bath according to claim 1, wherein the necessary replenishment concentration and the amount of reduction in the plating bath are determined by plating conditions.
JP155688A 1988-01-07 1988-01-07 Method for supplying component to plating bath Pending JPH01177346A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP155688A JPH01177346A (en) 1988-01-07 1988-01-07 Method for supplying component to plating bath

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP155688A JPH01177346A (en) 1988-01-07 1988-01-07 Method for supplying component to plating bath

Publications (1)

Publication Number Publication Date
JPH01177346A true JPH01177346A (en) 1989-07-13

Family

ID=11504799

Family Applications (1)

Application Number Title Priority Date Filing Date
JP155688A Pending JPH01177346A (en) 1988-01-07 1988-01-07 Method for supplying component to plating bath

Country Status (1)

Country Link
JP (1) JPH01177346A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1995342A1 (en) * 2007-05-22 2008-11-26 Snecma Method and device for coating fibres with metal in a liquid medium
JP2021095597A (en) * 2019-12-16 2021-06-24 Jfeスチール株式会社 Variation amount prediction method of bath surface position of hot dip metal bath and manufacturing method of hot dip metal plated steel plate

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53114734A (en) * 1977-03-18 1978-10-06 Sumitomo Metal Ind Ltd Controlling method for molten zing bath in molten zing plating method
JPS57192240A (en) * 1981-05-19 1982-11-26 Nippon Mining Co Ltd Zinc base iron alloy for plating shot mass and zinc base alloy plating shot mass

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53114734A (en) * 1977-03-18 1978-10-06 Sumitomo Metal Ind Ltd Controlling method for molten zing bath in molten zing plating method
JPS57192240A (en) * 1981-05-19 1982-11-26 Nippon Mining Co Ltd Zinc base iron alloy for plating shot mass and zinc base alloy plating shot mass

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1995342A1 (en) * 2007-05-22 2008-11-26 Snecma Method and device for coating fibres with metal in a liquid medium
FR2916453A1 (en) * 2007-05-22 2008-11-28 Snecma Sa METHOD AND DEVICE FOR METALLIC FIBER COATING BY LIQUID WAY
US8084099B2 (en) 2007-05-22 2011-12-27 Snecma Process and device for coating fibers with a metal by a liquid method
US8166910B2 (en) 2007-05-22 2012-05-01 Snecma Process and device for coating fibers with a metal by a liquid method
RU2469123C2 (en) * 2007-05-22 2012-12-10 Снекма Method and device of liquid application of metal coating to fibres
JP2021095597A (en) * 2019-12-16 2021-06-24 Jfeスチール株式会社 Variation amount prediction method of bath surface position of hot dip metal bath and manufacturing method of hot dip metal plated steel plate

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