JPH01176863A - Liquid supply valve device - Google Patents

Liquid supply valve device

Info

Publication number
JPH01176863A
JPH01176863A JP33576187A JP33576187A JPH01176863A JP H01176863 A JPH01176863 A JP H01176863A JP 33576187 A JP33576187 A JP 33576187A JP 33576187 A JP33576187 A JP 33576187A JP H01176863 A JPH01176863 A JP H01176863A
Authority
JP
Japan
Prior art keywords
liquid
container
supply
valve
valve body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP33576187A
Other languages
Japanese (ja)
Other versions
JP2628056B2 (en
Inventor
Shigetaka Fujikawa
重隆 藤川
Sannosuke Inomata
猪俣 三之助
Yoshiaki Shiraki
白木 善紹
Hideaki Kimura
英昭 木村
Hiroshi Shimizu
博 清水
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP33576187A priority Critical patent/JP2628056B2/en
Publication of JPH01176863A publication Critical patent/JPH01176863A/en
Application granted granted Critical
Publication of JP2628056B2 publication Critical patent/JP2628056B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Multiple-Way Valves (AREA)

Abstract

PURPOSE:To immediately flush a supply system in its entirety by communicating a discharge port with a chamber in a valve housing at a position where a valve member is moved to the outside of a container. CONSTITUTION:A valve element 4 disposed reciprocally in a valve housing 3 is moved inward of a container 2 so as to allow liquid to flow from a dis charge port 30a of a supply passage 30 in the valve element 4 toward the sur face of the inner wall 2a of the container 2, and accordingly, the liquid flows down along the surface of the inner wall and is therefore fed. Accordingly, it is possible to restrain gas from being mixed with the liquid. When the supply of the liquid is completed, the valve element 4 is moved outside of the container 2 so that the discharge port 30a of the passage 30 in the valve element 4 is communicated with a chamber 10 in the valve housing 3 so as to be communicat ed with a flushing system while being isolated from the container 2.

Description

【発明の詳細な説明】 (産業上の利用分野) この発明は液体供給弁装置に係り、詳しくは液体を容器
に供給する際に液体の壁面流下を簡単な構造で可能とし
、しかも確実な洗浄ができる液体供給弁装置に関する。
[Detailed Description of the Invention] (Industrial Application Field) This invention relates to a liquid supply valve device, and more specifically, when supplying liquid to a container, it enables liquid to flow down the wall surface with a simple structure, and also ensures reliable cleaning. This invention relates to a liquid supply valve device capable of

(従来の技術) 例えば、化学工業の生産工程においては、液体の移送、
貯溜等は全般的に欠くべからざる操作である。殊に、生
産工程がバッチ方式で進められている場合には、反応、
混合、溶解及び貯溜等の用途に供する容器に原材料液等
の液体を供給する際に、密閉された容器に供給する場合
がある。
(Prior art) For example, in the production process of the chemical industry, liquid transfer,
Storage etc. are generally indispensable operations. Especially when the production process is carried out in batch mode, the reaction,
When supplying a liquid such as raw material liquid to a container for purposes such as mixing, dissolving, and storage, it may be supplied to a sealed container.

このような場合に、第10図に示すように、密閉された
容器100の上部にホース設定装置101を備えたもの
がある。このものでは液体を供給する場合に、蓋開閉シ
リンダ102で容器100の1i103を開き、ホース
設定シリンダ104を作動させて、供給系105のホー
ス106に設けた供給ノズル10フを排水パケット10
8の位置から開口部に移動させ、供給液容器109から
液体を容器100に供給する。液体の供給が完了すると
、ホース設定シリンダ104を作動して、供給ノズル1
07を排水パケット108側へ移動させ、容器100の
蓋103を閉じる。そして、供給系105を洗浄する場
合には、バルブ1!0を作動させて洗浄液を、噴射ノズ
ル111から供給液容器109に噴射し、供給系105
の洗浄を行なうようになっている。
In such a case, as shown in FIG. 10, there is a container equipped with a hose setting device 101 on the top of a sealed container 100. In this case, when supplying liquid, the lid opening/closing cylinder 102 opens 1i 103 of the container 100, the hose setting cylinder 104 is activated, and the supply nozzle 10 provided on the hose 106 of the supply system 105 is connected to the drain packet 10.
8 to the opening, and the liquid is supplied from the supply liquid container 109 to the container 100. When the supply of liquid is completed, the hose setting cylinder 104 is actuated to supply the supply nozzle 1.
07 to the drainage packet 108 side and close the lid 103 of the container 100. When cleaning the supply system 105, the valve 1!0 is operated to inject the cleaning liquid from the injection nozzle 111 into the supply liquid container 109.
It is designed to perform cleaning.

(発明が解決しようとする問題点) ところで、このホース設定装置101によって供給する
場合には、供給液容器109に洗浄液を注入することに
よって、供給系105の全部を通水洗浄することが可能
であるが、液体の供給に際して高所からの吐出注入とな
り、液体への空気の混入、発泡及び飛散は避けることが
できない。
(Problems to be Solved by the Invention) By the way, when supplying with this hose setting device 101, by injecting the cleaning liquid into the supply liquid container 109, it is possible to wash the entire supply system 105 with water. However, when the liquid is supplied, it is discharged and injected from a high place, and it is impossible to avoid mixing of air into the liquid, foaming, and scattering.

従って、引火点の低い原料液等の供給や容器内での発泡
が好ましくない系での使用には適当でない。また、供給
及び洗浄終了後の供給ノズル107の待機においても、
供給系105の周辺環境に開放状態であり、系のクリー
ン化にも問題がある。さらに、液体の供給中、容器10
0のM2O3が開放になり、容器100の密閉化が無理
である。
Therefore, it is not suitable for supplying raw material liquids having a low flash point or for use in systems where foaming within a container is undesirable. Also, when the supply nozzle 107 is on standby after supply and cleaning are completed,
The supply system 105 is open to the surrounding environment, and there is also a problem in keeping the system clean. Furthermore, during the supply of liquid, the container 10
0 M2O3 becomes open, making it impossible to seal the container 100.

このため、第11図に示すように、固定式ベントノズル
を用いたものがあり、このものは容器100の側面にベ
ントノズル112を備え、内壁に沿って液体を流下させ
、供給後は分岐3方弁113を切換えることにより、供
給系105の洗浄を行なっている。このものはベントノ
ズル112によりて液体の壁面に沿った供給が可能であ
るため、ホース設定装置が有する問題点である供給時に
気体の混入や発泡は防止できる。このように、壁面流下
は液中供給に代る唯一の手段であるが、供給系の洗浄を
考慮すると、ベントノズル部の洗浄ができない、従って
、供給終了後すぐに洗浄ができないことから、供給する
液体の物性によっては、次回からの正常な供給系として
の使用に支障を来すことにもなる。特に、感光材料製造
におけるゼラチン含有の添加液等の場合には、供給系の
洗浄不能のため、コンタミとなりバクテリアの発生がお
こり、ひいては塗布液としても性能を低下させることに
もなる。
For this reason, as shown in FIG. 11, there is a device that uses a fixed vent nozzle, which is equipped with a vent nozzle 112 on the side of the container 100, and allows the liquid to flow down along the inner wall, and after supplying, the liquid is By switching the direction valve 113, the supply system 105 is cleaned. Since this type of liquid can be supplied along the wall surface of the liquid through the vent nozzle 112, it is possible to prevent mixing of gas and foaming during supply, which are problems associated with hose setting devices. In this way, wall flow is the only alternative to submerged supply, but when considering the cleaning of the supply system, it is not possible to clean the vent nozzle part, and therefore it is not possible to clean the vent nozzle immediately after supply is finished. Depending on the physical properties of the liquid, it may be difficult to use it as a normal supply system from the next time onwards. In particular, in the case of gelatin-containing additive liquids used in the production of photosensitive materials, the supply system cannot be cleaned, leading to contamination and the generation of bacteria, which in turn reduces the performance of the coating liquid.

この発明はこのような実状に鑑みてなされたもので、液
体の供給を容器の内壁面を流下させて行なうことによっ
て、気体の混入、発泡及び飛散を防止すると共に、液体
の供給後に容器と供給系が密閉状態で隔離でき、供給系
の全体をすみやかに洗浄することが可能な液体供給弁装
置を提供することを目的とする。
This invention was made in view of the above-mentioned circumstances, and by supplying liquid by flowing down the inner wall surface of the container, it is possible to prevent gas mixture, foaming, and scattering, and to prevent the supply of liquid from occurring between the container and the supply after supplying the liquid. It is an object of the present invention to provide a liquid supply valve device in which a system can be isolated in a hermetically sealed state and the entire supply system can be quickly cleaned.

(問題点を解決するための手段) この発明は前記問題点を解決するために、液体を容器の
内壁面に沿って流下させて供給する液体供給弁装置にお
いて、前記容器に洗浄系と連通ずるチャンバを有する弁
箱を備え、この弁箱に容器内に液体を供給する供給流路
を有する弁体を往復動可能に設け、この供給流路の吐出
口は容器の内壁面に向って流出するように形成され、こ
の吐出口は弁体の容器内側への移動位置で容器の内壁面
に接し、弁体の容器外側への移動位置で前記弁箱のチャ
ンバと連通ずるように構成されることを特徴としている
(Means for Solving the Problems) In order to solve the above-mentioned problems, the present invention provides a liquid supply valve device that supplies liquid by flowing it down along the inner wall surface of a container, in which the container is connected to a cleaning system. A valve box having a chamber is provided, and a valve body having a supply channel for supplying liquid into the container is reciprocatably provided in the valve box, and a discharge port of the supply channel flows out toward the inner wall surface of the container. The discharge port is configured to be in contact with the inner wall surface of the container at a position where the valve body moves to the inside of the container, and to communicate with the chamber of the valve body at a position where the valve body moves to the outside of the container. It is characterized by

(作用) この発明では、弁箱に往復動可能に設けられた弁体を容
器内側へ移動させて、弁体の供給流路の吐出口から液体
を容器の内壁面に向って流出させると、液体は内壁面に
沿って流下して供給される。このため、液体に気体が混
入したり、没入動作による液体の発泡や飛散を抑えるこ
とができる。さらに、液体の供給が終了すると、弁体を
容器外側へ移動させる。これにより、弁体の供給流路の
吐出口が弁箱のチャンバと連通し洗浄系と接続され、容
器内とは隔離される。このように容器と隔離されている
から、供給系に洗浄液を供給して、供給系の全体を洗浄
することができる。
(Function) In this invention, when the valve body provided in the valve box so as to be reciprocally movable is moved inside the container and the liquid is caused to flow out from the discharge port of the supply channel of the valve body toward the inner wall surface of the container, The liquid is supplied by flowing down along the inner wall surface. Therefore, it is possible to suppress the mixing of gas into the liquid and the bubbling and scattering of the liquid due to the immersion operation. Further, when the supply of liquid is finished, the valve body is moved to the outside of the container. Thereby, the discharge port of the supply channel of the valve body is communicated with the chamber of the valve box, connected to the cleaning system, and isolated from the inside of the container. Since it is isolated from the container in this way, the entire supply system can be cleaned by supplying the cleaning liquid to the supply system.

(実施例) 次に、添付図面に基づいてこの発明の実施例を詳細に説
明する。
(Example) Next, an example of the present invention will be described in detail based on the accompanying drawings.

第1図乃至第3図はこの発明の一実施例を示す液体供給
弁装置で、第1図は供給時の断面図、第2図は第1図の
II −II断面図、第3図は洗浄時の断面図である。
1 to 3 show a liquid supply valve device showing an embodiment of the present invention, in which FIG. 1 is a sectional view during supply, FIG. 2 is a sectional view taken along line II-II in FIG. 1, and FIG. FIG. 3 is a cross-sectional view during cleaning.

図において、符号1は液体供給弁装置で、液体を容器2
の側壁2aの内壁面に沿って流下させて供給するもので
、弁箱3と弁体4とを有している。弁箱3は洗浄系に連
結されるチャンバ部5と、弁体4の駆動機構を構成する
シリンダ部6とを有している。
In the figure, reference numeral 1 is a liquid supply valve device that supplies liquid to a container 2.
It is supplied by flowing down along the inner wall surface of the side wall 2a, and has a valve box 3 and a valve body 4. The valve box 3 has a chamber portion 5 connected to a cleaning system and a cylinder portion 6 that constitutes a drive mechanism for the valve body 4.

チャンバ部5にはチャンバ取付体7とチャンバ筒体8と
を締付ボルト9で連結してチャンバ10が形成されてい
る。このチャンバ取付体7は容器2の側壁2aに溶接さ
れたブラケット11に、ガスケット12を介して当てが
われ、締付ボルト13で締付固定されている。チャンバ
筒体8にはチャンバ10と連通ずる連通路10aが形成
され、この連通路10aには接続管14が圧入され、こ
の接続管14を介して洗浄系が接続される。
A chamber 10 is formed in the chamber portion 5 by connecting a chamber mounting body 7 and a chamber cylindrical body 8 with a tightening bolt 9. This chamber attachment body 7 is applied to a bracket 11 welded to the side wall 2a of the container 2 via a gasket 12, and is tightened and fixed with a tightening bolt 13. A communication passage 10a communicating with the chamber 10 is formed in the chamber cylindrical body 8, and a connection pipe 14 is press-fitted into this communication passage 10a, and a cleaning system is connected through this connection pipe 14.

前記シリンダ部6にはシリンダ取付体15とシリンダ筒
体16とを締付ボルト17で連結してシリンダ18が形
成されている。このシリンダ取付体15はチャンバ部5
のチャンバ筒体8に環状体19を介して締付ボルト20
で締付固定され、シリンダ筒体16の反対側には環状体
21が締付ボルト22で固定され、ガイドリング23の
抜は止めをしている。
A cylinder 18 is formed in the cylinder portion 6 by connecting a cylinder mounting body 15 and a cylinder cylindrical body 16 with a tightening bolt 17. This cylinder mounting body 15 is a chamber part 5
A tightening bolt 20 is attached to the chamber cylindrical body 8 through the annular body 19.
An annular body 21 is fixed on the opposite side of the cylinder body 16 with a tightening bolt 22 to prevent the guide ring 23 from being removed.

このように形成された弁箱3には弁体4が往復動可能に
挿通され、弁体4のピストン部4aはシリンダ18に摺
動可能に設けられ、このピストン部4aで液圧室24,
25が区画される。この−方の液圧室24はシリンダ取
付体15に形成された通路26から、また他方の液圧N
25はシリンダ筒体16に形成された通路27から圧液
が供給され、これにより弁体4が往復動する。
A valve body 4 is inserted into the valve box 3 formed in this manner so as to be reciprocally movable, and a piston portion 4a of the valve body 4 is slidably provided in the cylinder 18.
25 are divided. This - side hydraulic pressure chamber 24 is connected to the other side hydraulic pressure N from a passage 26 formed in the cylinder mounting body 15.
Pressure fluid is supplied to 25 from a passage 27 formed in the cylinder body 16, thereby causing the valve body 4 to reciprocate.

弁体4の頭部4bは容器2内に突出し、その頭部4bに
は環状シール部材28を有するキャップ29が螺着され
ている。環状シール部材28は例えばポリ四ふっ化エチ
レン等の合成樹脂で形成され、その一部28aが容器2
の側壁2Bの内壁面方向へ向かフて突出しており、第3
図に示すように、弁体4が容器2の側HJ 2 aの内
壁面に圧接して位置規制を行なうと共にシールし、容器
2の内部と弁体4の供給流路30とを遮断するようにな
っている。
The head 4b of the valve body 4 protrudes into the container 2, and a cap 29 having an annular seal member 28 is screwed onto the head 4b. The annular seal member 28 is made of synthetic resin such as polytetrafluoroethylene, and a portion 28a of the annular seal member 28 is made of a synthetic resin such as polytetrafluoroethylene.
It protrudes toward the inner wall surface of the side wall 2B, and the third
As shown in the figure, the valve body 4 presses against the inner wall surface of the HJ 2 a on the side of the container 2 to regulate the position and seal, thereby blocking the inside of the container 2 and the supply flow path 30 of the valve body 4. It has become.

弁体4を容器2内方へ移動する際の位置規制は、環状保
持部材31で弁体4に保持された環状シール部材32を
チャンバ取付体7に圧接して行なわれ、かつこの状態で
環状シール部材32はシールしチャンバ10と容器2内
とを遮断する。
The position of the valve body 4 when moving inside the container 2 is controlled by pressing the annular seal member 32 held on the valve body 4 by the annular holding member 31 against the chamber attachment body 7, and in this state, the annular The sealing member 32 seals and isolates the chamber 10 from the inside of the container 2 .

この環状シール部材32も同様に、例えば、ポリ四ふっ
化エチレン等の合成樹脂で形成される。
The annular seal member 32 is also made of synthetic resin such as polytetrafluoroethylene.

なお、弁体4を往復摺動させる機構は、摺動の終点及び
得点間を滑かに作動し、且つ環状シール部材32.28
がそれぞれシール壁面に確実に繰返し密接しつる機構で
あれば、どんな構造でもよい。また、駆動力は、手動で
もmf4約4的或電動駆動によってもよい。例えば、前
記液圧ピストン式の外に、油圧ピストン方式、圧縮空気
ピストン方式、圧縮空気もしくは油圧と復元力としてス
プリング等の付勢部材の組合せ方式、電動もしくは手動
のクランク方式、ビニオン・ラック方式実体カム・往復
杆方式等任意に採用しつる。
The mechanism for reciprocating the valve body 4 operates smoothly between the end point and the point of sliding, and the annular seal member 32.28
Any structure may be used as long as it is a mechanism that allows each of the seals to repeatedly and repeatedly hang in close contact with the seal wall surface. Further, the driving force may be manual, about MF4, or electric drive. For example, in addition to the above-mentioned hydraulic piston type, there are hydraulic piston type, compressed air piston type, combination of compressed air or oil pressure and a biasing member such as a spring as restoring force, electric or manual crank type, and binion rack type. Any method such as cam or reciprocating rod method can be used.

弁体4の供給流路30は軸芯より上方へ変位させた位置
で軸方向に形成されており、弁体4の後端部は図示しな
い供給系に接続される。弁体4の頭部4bに形成された
吐出口30aは供給流路30を所定角度屈曲し、容器2
の側92aの内壁面に向って液体を温圧するように形成
されている。
The supply channel 30 of the valve body 4 is formed in the axial direction at a position displaced upward from the axis, and the rear end of the valve body 4 is connected to a supply system (not shown). The discharge port 30a formed in the head 4b of the valve body 4 bends the supply channel 30 at a predetermined angle, and
The liquid is heated and pressurized toward the inner wall surface of the side 92a.

この吐出口30aは弁体4が容器2内へ移動した第1図
に示す前進位置で、容器2の側壁2aの内壁面に接触し
、弁体4が容器2から外側へ移動した第2図に示す後進
位置で前記チャンバ10と連通ずるようになっている。
This discharge port 30a contacts the inner wall surface of the side wall 2a of the container 2 in the forward position shown in FIG. 1 when the valve body 4 has moved into the container 2, and as shown in FIG. It communicates with the chamber 10 in the reverse position shown in FIG.

この吐出口30aの口径、容器2の側壁2aの内壁面に
対する角度α、吐出口の長さしは液体の粘度、供給流量
等によって、液体が壁面に沿って流下する範囲で任意に
設定される。また、この液体供給弁装置1の取付位置も
側壁2aに限らず、液体が壁面に沿って流下できる範囲
において任意の位置に取付可能である。
The diameter of the discharge port 30a, the angle α of the side wall 2a of the container 2 with respect to the inner wall surface, and the length of the discharge port are arbitrarily set depending on the viscosity of the liquid, the supply flow rate, etc., within a range in which the liquid flows down along the wall surface. . Further, the mounting position of the liquid supply valve device 1 is not limited to the side wall 2a, but can be mounted at any position within the range where the liquid can flow down along the wall surface.

従って、第1図に示すように、弁箱3のシリンダ部6の
液圧室25に連通路27を介して圧液を供給すると、弁
体4が容器2の内側方向へ移動−し、弁体4の頭部4b
が容器2内に突出する。このとき弁体4の供給流路30
の吐出口30aが容器2の側壁2aの内壁面に接触した
状態になり、一方弁体4の環状シール部材32がチャン
バ取付体7に当接してシールし、容器2内とチャンバ1
0とを遮断している。この状態で流体を供給流路30に
供給すると、液体は供給流路30の吐出口30aに案内
されて、容器2の内壁面に向かって流出し、壁面に沿っ
て流下する。
Therefore, as shown in FIG. 1, when pressure fluid is supplied to the hydraulic chamber 25 of the cylinder portion 6 of the valve box 3 through the communication passage 27, the valve body 4 moves inward of the container 2, and the valve body 4 moves toward the inside of the container 2. Head 4b of body 4
protrudes into the container 2. At this time, the supply channel 30 of the valve body 4
The discharge port 30a is in contact with the inner wall surface of the side wall 2a of the container 2, while the annular sealing member 32 of the valve body 4 is in contact with the chamber attachment body 7 to seal, thereby sealing the inside of the container 2 and the chamber 1.
0 is blocked. When fluid is supplied to the supply channel 30 in this state, the liquid is guided to the discharge port 30a of the supply channel 30, flows out toward the inner wall surface of the container 2, and flows down along the wall surface.

このため、液体を供給するとき、液体に気体が混入した
り、巻込むことが防止され、さらに発泡や液体が飛散す
ることが軽減される。
For this reason, when supplying the liquid, gas is prevented from being mixed into or drawn into the liquid, and furthermore, foaming and liquid scattering are reduced.

そして、液体の供給が終了すると、弁箱3のシリンダ部
6の連通路26から圧液を液圧室24に供給すると、第
3図に示すように弁体4が容器2の外側に移動して、弁
体4のキャップ29に設けられた環状シール部材28が
容器2の側壁2aの内壁面に当接してシールし、容器2
内と弁体4の供給流路30との間を遮断する。このとき
、弁体4の吐出口30aはチャンバ部5のチャンバ10
と連通している。従って、弁体4の供給流路30の上流
側から洗浄液を供給すると、洗浄液が吐出口30aから
チャンバ10に流れて接続管14から排出され、弁体4
の供給流路30及び吐出口30aを洗浄することができ
、供給系を完全に洗浄することができる。
When the supply of liquid is finished, pressure liquid is supplied to the hydraulic pressure chamber 24 from the communication passage 26 of the cylinder part 6 of the valve box 3, and the valve body 4 moves to the outside of the container 2 as shown in FIG. Then, the annular sealing member 28 provided on the cap 29 of the valve body 4 contacts and seals the inner wall surface of the side wall 2a of the container 2, and the container 2
The supply flow path 30 of the valve body 4 is cut off from the inside. At this time, the discharge port 30a of the valve body 4 is connected to the chamber 10 of the chamber portion 5.
It communicates with Therefore, when the cleaning liquid is supplied from the upstream side of the supply flow path 30 of the valve body 4, the cleaning liquid flows from the discharge port 30a to the chamber 10 and is discharged from the connecting pipe 14, and the cleaning liquid flows into the valve body 4.
The supply flow path 30 and the discharge port 30a can be cleaned, and the supply system can be completely cleaned.

この洗浄は洗浄液を接続管14側からチャンバ10内に
供給し、弁体4の吐出口30aから供給流路30へ供給
して洗浄するようにしてもよい。
This cleaning may be performed by supplying the cleaning liquid into the chamber 10 from the connecting pipe 14 side and supplying it to the supply channel 30 from the discharge port 30a of the valve body 4.

第4図はこの発明の液体供給弁装置1を写真感光材料の
塗布液の製造工程に適用したもので、容器である調整釜
40に備え、添加液釜41の洗浄液にて供給系42を通
水洗浄する実施例を示している。この実施例では調整釜
40に液体供給弁装置1の弁箱3が固定され、弁体4は
供給系42を介して添加液釜41に接続されている。添
加液釜41のバルブ43を開放すると、添加液が供給系
42を介して弁体4に供給され、弁体4の供給流路30
を流れて吐出口30aから調整釜40の内壁面を流下し
て供給される。
FIG. 4 shows a liquid supply valve device 1 according to the present invention applied to a manufacturing process of a coating liquid for photographic light-sensitive materials, in which an adjustment pot 40, which is a container, is provided, and cleaning liquid from an additive liquid pot 41 is passed through a supply system 42. An example of washing with water is shown. In this embodiment, the valve box 3 of the liquid supply valve device 1 is fixed to the adjustment pot 40, and the valve body 4 is connected to the additive liquid pot 41 via the supply system 42. When the valve 43 of the additive liquid pot 41 is opened, the additive liquid is supplied to the valve body 4 via the supply system 42, and the supply channel 30 of the valve body 4 is supplied with the additive liquid through the supply system 42.
The liquid flows down the inner wall surface of the adjustment pot 40 from the discharge port 30a and is supplied.

この供給が完了すると、弁体4を後進させて弁体4の供
給流路30と調整釜40の内部とを遮断して、洗浄系の
バルブ44を開放して洗浄ノズル浄液を添加液釜41内
に噴射して洗浄し、この洗浄によるドレインはバルブ4
7を開放して排出される。供給系42の洗浄は洗浄系に
接続された分岐3方ボール弁48をライン49と連通す
るように作動し、バルブ50を操作して洗浄液を弁箱3
のチャンバに供給し、弁体4の供給流路30を洗浄する
。そして、供給系42及び多方弁46を洗浄してドレイ
ンとして排出する逆洗浄が行なわれる。
When this supply is completed, the valve body 4 is moved backward to shut off the supply flow path 30 of the valve body 4 and the inside of the adjustment pot 40, and the cleaning system valve 44 is opened to transfer the cleaning nozzle purified liquid to the addition liquid pot. The drain from this cleaning is discharged from the valve 4.
7 is opened and discharged. To clean the supply system 42, a branch three-way ball valve 48 connected to the cleaning system is operated to communicate with the line 49, and a valve 50 is operated to supply cleaning liquid to the valve box 3.
and cleans the supply channel 30 of the valve body 4. Then, back cleaning is performed in which the supply system 42 and the multi-way valve 46 are cleaned and discharged as a drain.

この洗浄が終了して、分岐3方ボール弁48をライン5
1と連通ずるように切換えて、供給系42に洗浄液の残
留しないように排出する。
After this cleaning is completed, the branch 3-way ball valve 48 is connected to the line 5.
1, and discharge the cleaning liquid so that it does not remain in the supply system 42.

第6図はこの発明の液体供給弁装置1の他の実施例を示
し、このものは弁体4の供給流路30の吐出口30aが
、その先端部を絞った形状に形成されている。このもの
では、吐出口30aから流出する液体の流速が向上し、
容器2の側壁2aに円滑に沿わせて流下させることがで
きる。
FIG. 6 shows another embodiment of the liquid supply valve device 1 of the present invention, in which the discharge port 30a of the supply channel 30 of the valve body 4 is formed in a constricted shape at its tip. In this case, the flow velocity of the liquid flowing out from the discharge port 30a is improved,
It can be made to flow down smoothly along the side wall 2a of the container 2.

第7図乃至第9図はさらに他の実施例を示し、この実施
例では弁体4の突出口30aを垂直方向45から洗浄液
を添加液釜41内に噴射して洗浄する。この洗浄液は添
加液釜41から、供給系42を洗浄し、さらに弁体4の
供給流路30及び吐出口30aを洗浄して、ドレインと
して排出される。
FIGS. 7 to 9 show still another embodiment, in which the protrusion 30a of the valve body 4 is cleaned by injecting cleaning liquid into the additive liquid pot 41 from the vertical direction 45. This cleaning liquid cleans the supply system 42 from the additive tank 41, further cleans the supply channel 30 and discharge port 30a of the valve body 4, and is discharged as a drain.

第5図はこの発明の液体供給弁装置1を調整釜40に備
え、洗浄液にて供給系42を逆洗浄する実施例を示して
いる。この実施例でも前記実施例と同様に調整釜40に
液体供給弁装置1の弁箱3が固定され、弁体4は供給系
42を介して添加液釜41に接続されている。添加液釜
41の多方弁46を開放すると、添加液が供給系42を
介して弁体4に供給され、弁体4の供給流路30を流れ
、吐出口30aから調整釜40の内壁面を流下して供給
される。なお、この多方弁46は例えば特開昭61−2
978号に開示されたものを使用する。
FIG. 5 shows an embodiment in which the liquid supply valve device 1 of the present invention is provided in a regulating pot 40 and a supply system 42 is backwashed with a cleaning liquid. In this embodiment as well, the valve box 3 of the liquid supply valve device 1 is fixed to the adjustment pot 40 as in the previous embodiment, and the valve body 4 is connected to the additive liquid pot 41 via the supply system 42. When the multi-way valve 46 of the additive liquid pot 41 is opened, the additive liquid is supplied to the valve body 4 via the supply system 42, flows through the supply flow path 30 of the valve body 4, and flows through the inner wall surface of the adjustment pot 40 from the discharge port 30a. Supplied downstream. Note that this multi-way valve 46 is, for example, disclosed in Japanese Patent Application Laid-Open No. 61-2
The one disclosed in No. 978 is used.

この供給が完了すると、前記と同様に弁体4を外側へ8
勤させて、弁体4と調整釜40とを遮断してバルブ44
を開放して洗浄ノズル45から洗に対して角度βをもた
せたもので、容器2に取付けたもので、液体のよりなめ
らかな流下状態が得られる。
When this supply is completed, the valve body 4 is moved outward 8 in the same manner as above.
The valve body 4 and the adjusting pot 40 are shut off, and the valve 44 is closed.
The cleaning nozzle 45 is opened to form an angle β with respect to the washing from the washing nozzle 45, and is attached to the container 2, so that a smoother flowing state of the liquid can be obtained.

従って、液体の添加投入に際して、弁体4の軸方向を規
制することにより、容器2の側壁2aの内面に対して適
度な角度を有した添加没入が可能となり、第9図に示す
ように容器2の側壁の内面の曲率合わせた、より円滑な
投入を得ることができる(タイゼンシャルフロー)。
Therefore, by regulating the axial direction of the valve body 4 when adding liquid, it is possible to insert the liquid at an appropriate angle to the inner surface of the side wall 2a of the container 2, and as shown in FIG. By matching the curvature of the inner surface of the side wall of No. 2, smoother feeding can be obtained (Tizenshall flow).

(発明の効果) 以上説明したように、この発明は容器に洗浄系と連通す
るチャンバを有する弁箱を備え、この弁箱に容器内に液
体を供給する供給流路を有する弁体を往復動可能に設け
、この供給流路の吐出口は容器の内壁面に向って流出す
るように形成され、吐出口は弁体の容器内側への移動位
置で容器の内壁面に接し、弁体の容器外側への移動位置
で前記弁箱のチャンバと連通ずるように構成されるので
、液体を供給するときには弁体を容器内側へ移動させて
、液体を弁体の供給流路に供給すると、吐出口から容器
の内壁面に向って流出し、容器の内壁面に沿って流下し
て供給されるため、液体に気体が混入したり、投入動作
による液体の発泡や飛散を抑えることができる。さらに
、液体の供給が終了すると、弁体を容器外側へ移動させ
ると、弁体の供給流路の吐出口が弁箱のチャンバと連通
し洗浄系と接続され、容器内とは隔離されるから、供給
系の全体を洗浄することができる。
(Effects of the Invention) As explained above, the present invention includes a container provided with a valve box having a chamber communicating with a cleaning system, and a valve body having a supply channel for supplying liquid into the container in the valve box. The discharge port of this supply flow path is formed so as to flow out toward the inner wall surface of the container, and the discharge port contacts the inner wall surface of the container at a position where the valve body moves inside the container, and The valve body is configured to communicate with the chamber of the valve box at the outward movement position, so when supplying liquid, the valve body is moved inside the container and the liquid is supplied to the supply channel of the valve body, and the discharge port Since the liquid flows out toward the inner wall surface of the container and is supplied by flowing down along the inner wall surface of the container, it is possible to suppress the mixing of gas into the liquid and the foaming and scattering of the liquid due to the pouring operation. Furthermore, when the supply of liquid is finished, when the valve body is moved to the outside of the container, the discharge port of the supply channel of the valve body communicates with the chamber of the valve box and is connected to the cleaning system, and is isolated from the inside of the container. , the entire supply system can be cleaned.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図乃至343図はこの発明の一実施例を示す液体供
給弁装置で、第1図は供給時の断面図、第2図は第1図
のII −II断面図、第3図は洗浄時の断面図、第4
図及び第S図はこの発明の液体供給弁装置を写真感光材
料の塗布液の製造工程に適用した実施例を示し、第4図
は通水洗浄する実施例を示す概略図、第5図は洗浄液に
て供給系を逆洗浄する実施例を示す概略図、第6図は液
体供給弁装置の他の実施例を示す一部断面図、第7図乃
至第9図は液体供給弁装置のさらに他の実施例を示し、
第7図は液体供給弁装置の一部断面図、第8図は第7図
の■−■断面図、第9図は液体の状態を示す図、第10
図及び第11図は従来の液体の供給を示す概略図である
。 図中符号2は容器、3は弁箱、4は弁体、5はチャンバ
部、6はシリンダ部、10はチャンバ、30は供給流路
、30aは吐出口である。 特 許 出 願 人   コニカ株式会社第4図 第5図 第6図 21シ 8 F≧J 第 9 図 第10比 第11図 手続補正書 1 事件の表示 昭和62年特許願第335761号 2 発明の名称   液体供給弁装置 3 補正をする者 事件との関係  特許出願人 住所 東京都新宿区西新富1丁目26番2号氏名 (1
27)コニカ株式会社 (昭和62年12月11日付にて 一括名称変更届提出済) 4 代理人〒151 住所 東京都渋谷区代々木2丁目23番1号(1)明細
書第10頁第6行の「第2図」を「第3図」と訂正する
。 (2)同書第15頁第9行の「(タイゼンシャルフロー
)。jを「。すなわち、流体の流れは、タンゼンシャル
フローとなる。」と訂正する。 以上
Figures 1 to 343 show a liquid supply valve device showing an embodiment of the present invention, in which Figure 1 is a sectional view during supply, Figure 2 is a sectional view taken along line II-II in Figure 1, and Figure 3 is a cleaning valve device. Cross section of time, 4th
Figures 1 and 2 show an embodiment in which the liquid supply valve device of the present invention is applied to a manufacturing process of a coating liquid for photographic light-sensitive materials. A schematic diagram showing an embodiment in which the supply system is backwashed with cleaning liquid, FIG. 6 is a partial sectional view showing another embodiment of the liquid supply valve device, and FIGS. 7 to 9 are further diagrams of the liquid supply valve device. Showing other examples,
Fig. 7 is a partial sectional view of the liquid supply valve device, Fig. 8 is a sectional view taken along the line ■-■ in Fig. 7, Fig. 9 is a diagram showing the state of the liquid, and Fig. 10
1 and 11 are schematic diagrams showing conventional liquid supply. In the figure, reference numeral 2 is a container, 3 is a valve box, 4 is a valve body, 5 is a chamber portion, 6 is a cylinder portion, 10 is a chamber, 30 is a supply channel, and 30a is a discharge port. Patent Applicant Konica Co., Ltd. Figure 4 Figure 5 Figure 6 Figure 21 C 8 F≧J Name Liquid supply valve device 3 Relationship to the case of the person making the amendment Patent applicant address 1-26-2 Nishishintomi, Shinjuku-ku, Tokyo Name (1)
27) Konica Co., Ltd. (Bulk name change notification submitted as of December 11, 1986) 4 Agent 151 Address 2-23-1 Yoyogi, Shibuya-ku, Tokyo (1) Statement, page 10, line 6 ``Figure 2'' is corrected as ``Figure 3.'' (2) In the same book, page 15, line 9, ``(Tensential flow). that's all

Claims (1)

【特許請求の範囲】[Claims] 液体を容器の内壁面に沿って流下させて供給する液体供
給弁装置において、前記容器に洗浄系と連通するチャン
バを有する弁箱を備え、この弁箱に容器内に液体を供給
する供給流路を有する弁体を往復動可能に設け、この供
給流路の吐出口は容器の内壁面に向って流出するように
形成され、この吐出口は弁体の容器内側への移動位置で
容器の内壁面に接し、弁体の容器外側への移動位置で前
記弁箱のチャンバと連通するように構成されることを特
徴とする液体供給弁装置。
A liquid supply valve device for supplying liquid by flowing it down along an inner wall surface of a container, wherein the container is provided with a valve box having a chamber communicating with a cleaning system, and the valve box is provided with a supply channel for supplying liquid into the container. A valve body having a valve body is provided so as to be reciprocally movable, and a discharge port of this supply flow path is formed so as to flow out toward the inner wall surface of the container, and this discharge port is formed to flow into the container at a position where the valve body moves inside the container. A liquid supply valve device, characterized in that it is configured to contact a wall surface and communicate with a chamber of the valve box at a position where the valve body moves to the outside of the container.
JP33576187A 1987-12-29 1987-12-29 Liquid supply valve device Expired - Fee Related JP2628056B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP33576187A JP2628056B2 (en) 1987-12-29 1987-12-29 Liquid supply valve device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33576187A JP2628056B2 (en) 1987-12-29 1987-12-29 Liquid supply valve device

Publications (2)

Publication Number Publication Date
JPH01176863A true JPH01176863A (en) 1989-07-13
JP2628056B2 JP2628056B2 (en) 1997-07-09

Family

ID=18292163

Family Applications (1)

Application Number Title Priority Date Filing Date
JP33576187A Expired - Fee Related JP2628056B2 (en) 1987-12-29 1987-12-29 Liquid supply valve device

Country Status (1)

Country Link
JP (1) JP2628056B2 (en)

Also Published As

Publication number Publication date
JP2628056B2 (en) 1997-07-09

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