JPH01168866A - Production of article coated with copper film - Google Patents

Production of article coated with copper film

Info

Publication number
JPH01168866A
JPH01168866A JP62325568A JP32556887A JPH01168866A JP H01168866 A JPH01168866 A JP H01168866A JP 62325568 A JP62325568 A JP 62325568A JP 32556887 A JP32556887 A JP 32556887A JP H01168866 A JPH01168866 A JP H01168866A
Authority
JP
Japan
Prior art keywords
copper
acid
article
temp
thermoplastic resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62325568A
Other languages
Japanese (ja)
Inventor
Shigemasa Kawakami
川上 殷正
Kazuhiro Ando
和弘 安藤
Takatsugu Fujiura
隆次 藤浦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Gas Chemical Co Inc
Original Assignee
Mitsubishi Gas Chemical Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Gas Chemical Co Inc filed Critical Mitsubishi Gas Chemical Co Inc
Priority to JP62325568A priority Critical patent/JPH01168866A/en
Priority to EP88121504A priority patent/EP0322764B1/en
Priority to DE8888121504T priority patent/DE3879441T2/en
Priority to KR1019880017274A priority patent/KR960010822B1/en
Priority to US07/288,928 priority patent/US4913938A/en
Publication of JPH01168866A publication Critical patent/JPH01168866A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/08Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/105Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by conversion of non-conductive material on or in the support into conductive material, e.g. by using an energy beam

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)

Abstract

PURPOSE:To form a copper film having an excellent adhesive property with a simple means by applying a liq. mixture of copper hydroxide or the copper salt of an org. acid and a polyhydric alcohol on an article of a thermoplastic resin having a heat-deflection temp. higher than a specified value, and heating the article in a specified temp. range in a nonoxidizing atmosphere. CONSTITUTION:A liq. mixture contg. copper hydroxide or a copper compd. selected from the copper compds. of an org. acid and a polyhydric alcohol as the essential components is applied on the desired part of an article of the thermoplastic resin having >=165 deg.C heat-deflection temp. under a low load. The article is then heated in a nonoxidizing atmosphere to a temp. higher than 165 deg.C and lower than the deflection temp. of the article, and kept at that temp. For example, a liq. mixture consisting of 100 parts of copper hydroxide and 200 parts of glycerin is applied in 60mu thickness on one side of a molded article consisting of glass fiber-reinforced meta-xylenediamine and nylon MXD from adipic acid. The molded article is then heated to 180 deg.C in 30min in a gaseous N2 atmosphere, and kept at that temp. for 60min.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、低荷重下の熱変形温度が165℃以上である
熱可塑性樹脂物品に銅被膜を形成する新規な方法に関す
るものであり、本製造法による銅膜形成物品は、特別の
前処理をすることなく銅が強固に付着したものであり、
しかもハロゲンなどの腐食性を有する元素を全く含まな
いものであるので、そのままで或いは更に銅その他の金
属をメツキして、フィルム、シート、成形品、繊維、布
、粉、その他の各種形態の各種用途用物品に好適に使用
されるものである。
Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a novel method for forming a copper coating on a thermoplastic resin article having a heat distortion temperature of 165° C. or higher under low load. Copper film-formed articles manufactured using this manufacturing method have copper firmly attached to them without any special pretreatment.
Moreover, since it does not contain any corrosive elements such as halogens, it can be used as is or by plating with copper or other metals to produce films, sheets, molded products, fibers, cloth, powders, and various other forms. It is suitable for use in articles for use.

〔従来の技術およびその問題点〕[Conventional technology and its problems]

熱可塑性樹脂物品、例えば成形品に、銅被膜を形成する
方法としては、無電解メツキ法、蒸着法、圧接法、接着
剤による接着などがある。
Methods for forming a copper coating on a thermoplastic resin article, such as a molded article, include electroless plating, vapor deposition, pressure welding, bonding with an adhesive, and the like.

無電解メツキ法は、最も一般的であり優れた方法である
が、通常は用いる熱可塑性樹脂に応じた前処理を必須と
するものであり、その工程が煩雑であるという欠点を有
している。また、前処理工程を省くためにジエン系ゴム
等を予め配合してなる組成物からの成形品を使用する方
法があるが、熱可塑性樹脂本来の性能が劣化する場合が
多いものであった。更に、この方法の場合、ガラス繊維
等の充填材を配合した成形体の場合、充填材が成形品の
表面に露出した場合には、良好な密着性が得られないと
いう欠点があった。
The electroless plating method is the most common and excellent method, but it usually requires pretreatment depending on the thermoplastic resin used, and has the disadvantage that the process is complicated. . In addition, there is a method of using a molded article made from a composition that is pre-blended with a diene rubber or the like in order to omit a pretreatment step, but this often results in deterioration of the inherent performance of the thermoplastic resin. Furthermore, in the case of a molded article containing a filler such as glass fiber, this method has the disadvantage that good adhesion cannot be obtained if the filler is exposed on the surface of the molded article.

蒸着法は、蒸着のための特別の設備を必須とし、大型品
の製造が困難であり、また樹脂の種類によっては接着性
を向上させるための前処理が必要であった。更に、圧接
法、接着剤による接着など適宜使用されるものであるが
、成形品の形状が限定されたり、接着層が厚くなるなど
の欠点があるものであった。
The vapor deposition method requires special equipment for vapor deposition, making it difficult to manufacture large products, and depending on the type of resin, pretreatment is required to improve adhesiveness. Furthermore, although pressure bonding methods and bonding with adhesives are used as appropriate, they have drawbacks such as the shape of the molded product being limited and the adhesive layer becoming thick.

〔問題点を解決するための手段〕[Means for solving problems]

本発明は、上記の事情に鑑み、簡便な方法により、経済
的で高品質の銅膜め形成された材料を提供する方法につ
いて検討した結果、完成したものである。
In view of the above circumstances, the present invention was completed as a result of research into a method of providing an economical and high-quality copper film-coated material using a simple method.

すなわち、本発明は、低荷重下の熱変形温度が165℃
以上である熱可塑性樹脂物品の所望部に、水酸化銅又は
有機酸銅から選択された銅化合物と多価アルコールとを
必須成分とする混合液を塗布した後、非酸化性雰囲気中
で165℃以上で該熱可塑性樹脂物品の低荷重下の熱変
形温度以下の温度に加熱し保持することを特徴とする銅
膜形成物品の製造法である。
That is, in the present invention, the heat distortion temperature under low load is 165°C.
After applying a liquid mixture containing a copper compound selected from copper hydroxide or organic acid copper and a polyhydric alcohol as essential components to a desired part of the above thermoplastic resin article, the mixture is heated to 165°C in a non-oxidizing atmosphere. The above is a method for producing a copper film-formed article, which is characterized by heating and holding the thermoplastic resin article at a temperature below the thermal deformation temperature under a low load.

以下、本発明について説明する。The present invention will be explained below.

本発明の低荷重下の熱変形温度が165℃以上である熱
可塑性樹脂物品とは、フィルム、シート、射出成形、圧
縮成形その他手段で成形してなる成形品、繊維、布、粉
等の各梯形の成形体である。
The thermoplastic resin articles of the present invention having a heat deformation temperature of 165°C or higher under low load include films, sheets, molded articles formed by injection molding, compression molding, and other means, fibers, cloth, powder, etc. It is a trapezoidal molded body.

具体的な熱可塑性樹脂としては、ナイロン−6、ナイロ
ン−66、ナイロン−6/66 、ナイロン−11、ナ
イロン−3、メタキシリレンジアミンと脂肪族ジカルボ
ン酸類から誘導されるMXD6、MXD6/10などの
ポリアミド樹脂、ポリブチレンテレフタレート、ポリエ
チレンテレフタレートなどの結晶性ポリエステル樹脂な
どの汎用エンジニアリングプラスチック類;P−ヒドロ
キシ安息香酸、フタル酸、ビスフェノールなどを主要モ
ノマーとする全芳香族ポリエステルやこれらにポリエチ
レンテレフタレート等をグラフトしてなる芳香族ポリエ
ステル液晶ポリマー、ポリエーテルイミド、ポリスルホ
ン、ポリサルホン、ポリエーテルサルホン、ポリエーテ
ルエーテルケトン、ポリフェニレンエーテル等のエンジ
ニアリングプラスチック並びにこれらのポリマーの繊維
、ミネラル、その他充填材強化物等が挙げられ、これら
の中でも、上記した熱変形温度が190℃以上のものが
好ましく、特に210℃以上のものが、銅膜形成のため
の処理条件がより広くとれること等から好ましい。
Specific thermoplastic resins include nylon-6, nylon-66, nylon-6/66, nylon-11, nylon-3, MXD6 and MXD6/10 derived from meta-xylylene diamine and aliphatic dicarboxylic acids. General-purpose engineering plastics such as crystalline polyester resins such as polyamide resins, polybutylene terephthalate, and polyethylene terephthalate; wholly aromatic polyesters whose main monomers are P-hydroxybenzoic acid, phthalic acid, and bisphenol, and polyethylene terephthalate, etc. Engineering plastics such as grafted aromatic polyester liquid crystal polymers, polyetherimide, polysulfone, polysulfone, polyethersulfone, polyetheretherketone, and polyphenylene ether, as well as fibers, minerals, and other filler reinforcements of these polymers, etc. Among these, those having the above-described heat distortion temperature of 190° C. or higher are preferable, and those having a heat distortion temperature of 210° C. or higher are particularly preferable because they allow a wider range of processing conditions for forming a copper film.

上記の樹脂或いは充填材強化樹脂に銅膜を形成するため
に使用する本発明の水酸化銅又は有機酸銅から選択され
た銅化合物と多価アルコールとを必須成分とする混合液
(以下、処理液と記す)に使用する銅化合物とは、水酸
化銅又は有機酸の銅塩であり、これらは特に限定されな
いものであるが、銅膜形成に使用する温度において表面
から離脱し易い化合物が好ましく、価格や入手のし易さ
を考慮して適宜選択する。具体的には、蟻酸、酢酸、プ
ロピオン酸、酪酸、ピバリン酸、カプロン酸、カプリン
酸、ラウリン酸、ステアリン酸、ナフテン酸、安息香酸
、オレイン酸、アクリル酸、メタクリル酸、クロトン酸
、ペンテン酸などのモノカルボン酸の銅塩;蓚酸、マロ
ン酸、コハク酸、グルタル酸、アジピン酸、ピメリン酸
、コハク酸、アゼライン酸、ブラシリン酸、マレイン酸
、フマル酸、フタル酸、トリメリット酸、マレイン酸な
どのポリカルボン酸のの銅塩:更に、モノ−或いはポリ
カルボン酸のエステル、アミドなど、グリコール酸など
の水酸基、グルタミン酸などのアミノ酸などの銅塩も、
挙げられる。
A mixed solution (hereinafter referred to as treatment The copper compound used in the liquid (referred to as "liquid") is copper hydroxide or a copper salt of an organic acid, and is not particularly limited, but preferably a compound that is easily released from the surface at the temperature used for forming the copper film. , to be selected appropriately taking into consideration price and availability. Specifically, formic acid, acetic acid, propionic acid, butyric acid, pivalic acid, caproic acid, capric acid, lauric acid, stearic acid, naphthenic acid, benzoic acid, oleic acid, acrylic acid, methacrylic acid, crotonic acid, pentenoic acid, etc. Copper salts of monocarboxylic acids; oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, succinic acid, azelaic acid, brassylic acid, maleic acid, fumaric acid, phthalic acid, trimellitic acid, maleic acid, etc. Copper salts of polycarboxylic acids: In addition, copper salts of mono- or polycarboxylic acid esters, amides, etc., hydroxyl groups such as glycolic acid, amino acids such as glutamic acid, etc.
Can be mentioned.

また、多価アルコールとは、水酸基を2個以上含有する
化合物であり、これらは特に限定されないものであるが
、用いる成形体の表面との濡れ特性が良好で、銅膜形成
に使用する温度において表面から離脱し易い化合物が好
ましい。具体的には、エチレングリコール、プロピレン
グリコール、ブタンジオール、ベンタンジオール、ヘキ
サンジオール、1.5−ヘキサジエン−3,4−ジオー
ル、2.6−オクタジエン−4,5−ジオール、グリセ
リン、1,2゜3−ブタントリオール、1,2.3−ペ
ンタントリオール、ペンタメチルグリセリン、エリトリ
ット、ペンタエリトリット、アトニット、アラビット、
ジエチレングリコール、トリエチレングリコール、ジプ
ロピレングリコール、その他のポリアルキレングリコー
ル類、さらはジェタノールアミン、トリエタノールアミ
ンなどが挙げられる。
In addition, polyhydric alcohol is a compound containing two or more hydroxyl groups, and although it is not particularly limited, it has good wettability with the surface of the molded product and is suitable for use at the temperature used for forming the copper film. Compounds that are easily released from the surface are preferred. Specifically, ethylene glycol, propylene glycol, butanediol, bentanediol, hexanediol, 1,5-hexadiene-3,4-diol, 2,6-octadiene-4,5-diol, glycerin, 1,2° 3-butanetriol, 1,2,3-pentanetriol, pentamethylglycerin, erythritol, pentaerythritol, attonite, aravit,
Examples include diethylene glycol, triethylene glycol, dipropylene glycol, other polyalkylene glycols, jetanolamine, triethanolamine, and the like.

本発明の処理液は、上記した水酸化銅又は有機酸銅と多
価アルコールとを混合して調整する。処理液中の水酸化
銅又は有機酸銅と多価アルコールとの組成比は、塗布し
たときに均一な塗膜となる程度に均一な液が調整出来る
範囲であれば特に限定されないが、水酸化銅又は有機酸
銅をより多く使用することが好ましく、通常、水酸化銅
又は有機酸銅を10〜70重量%の範囲、好ましくは2
0〜60重量%の範囲で用い、常温乃至加熱下に混練し
て均一とする。
The treatment liquid of the present invention is prepared by mixing the above-described copper hydroxide or organic acid copper with a polyhydric alcohol. The composition ratio of copper hydroxide or organic acid copper and polyhydric alcohol in the treatment solution is not particularly limited as long as it can be adjusted to a uniform solution to form a uniform coating when applied. It is preferable to use a larger amount of copper or organic acid copper, and usually copper hydroxide or organic acid copper is used in a range of 10 to 70% by weight, preferably 2% by weight.
It is used in a range of 0 to 60% by weight, and is homogenized by kneading at room temperature or under heating.

なお、本発明の処理液の調整にあたっては、適宜、上記
以外の添加剤類を併用してもよいものであり、有機酸、
アミン、有機溶剤、界面活性剤、銅その他金属の塩類、
ポリビニルアルコールなどが例示される。
In addition, in preparing the treatment liquid of the present invention, additives other than those mentioned above may be used in combination, as appropriate, such as organic acids,
Amines, organic solvents, surfactants, salts of copper and other metals,
Examples include polyvinyl alcohol.

上記の処理液を低荷重下の熱変形温度が165℃以上で
ある熱可塑性樹脂成形体の所望部に、印刷、刷毛像、デ
イピング、スプレーコート、バーコード、ロールコート
などし、バッチ式或いは連続的に不活性雰囲気中で熱処
理することにより本発明の銅膜形成物品を製造する。
The above treatment liquid is printed, brushed, dipping, spray coated, bar coded, roll coated, etc. on a desired part of a thermoplastic resin molded body whose heat deformation temperature under low load is 165°C or higher, and is applied in a batch or continuous manner. The copper film-formed article of the present invention is produced by heat treatment in an inert atmosphere.

非酸化性雰囲気としては、N2. Ar、 CO2,C
D、 Haなどのガス雰囲気下とする方法や、単に、塗
布面を耐熱性のフィルム類で被い、加熱して塗布層より
の分解発生ガス雰囲気に維持することによる。
The non-oxidizing atmosphere is N2. Ar, CO2, C
D, Ha or the like gas atmosphere, or simply covering the coated surface with a heat-resistant film and heating it to maintain an atmosphere of decomposed gas from the coated layer.

又、加熱は、赤外線、電子線、マイクロ波などの放射線
加熱、電気炉、オーブン、オイル加熱、加圧蒸気その他
の手段を適宜使用する温度等により選択し、バッチ或い
は連続的に行う。通常、昇温速度 50〜b t/Hrで加熱し、所定の温度、すなわち165℃から
熱可塑性樹脂物品の低荷重下の熱変形温度の範囲、好ま
しくは170℃から熱可塑性樹脂物品の低荷重下の熱変
形温度の範囲に0〜3時間、好ましくは数分〜2時間程
度保持することによる。
The heating may be carried out batchwise or continuously by selecting appropriate temperatures such as radiation heating such as infrared rays, electron beams, or microwaves, electric furnaces, ovens, oil heating, pressurized steam, or other means. Usually, heating is carried out at a heating rate of 50 to 100 bt/Hr, and from a predetermined temperature, i.e., 165°C, to the thermal deformation temperature under low load of the thermoplastic resin article, preferably from 170°C to the low load of the thermoplastic resin article. By maintaining the heat distortion temperature in the following range for 0 to 3 hours, preferably several minutes to 2 hours.

〔実施例〕〔Example〕

以下、実施例、比較例によって本発明をさらに具体的に
説明する。尚、実施例、比較例中の部は特に断らない限
り重量基準である。
Hereinafter, the present invention will be explained in more detail with reference to Examples and Comparative Examples. In addition, parts in Examples and Comparative Examples are based on weight unless otherwise specified.

実施例1 水酸化銅100部とグリセリン200部とを撹拌混合し
て粘性のある青色の処理液(以下、処理液1と記す)を
得た。
Example 1 A viscous blue treatment liquid (hereinafter referred to as treatment liquid 1) was obtained by stirring and mixing 100 parts of copper hydroxide and 200 parts of glycerin.

この処理液1をガラス繊維強化メタキシリレンジアミン
とアジピン酸とからのナイロンMXD6の厚み3mmの
成形品の片面に厚み60.uで塗布した後、ボンベより
の窒素ガス雰囲気下において、30分間で180℃まで
昇温し、この温度で60分間保持した後、取り出した。
This treatment solution 1 was applied to one side of a 3 mm thick molded product of nylon MXD6 made from glass fiber reinforced metaxylylene diamine and adipic acid to a thickness of 60 mm. After coating with U, the temperature was raised to 180° C. in 30 minutes under a nitrogen gas atmosphere from a cylinder, and after being held at this temperature for 60 minutes, it was taken out.

得られたナイロンMXD6の成形品表面には、銅膜が均
一密着していた。
The copper film was uniformly adhered to the surface of the obtained nylon MXD6 molded product.

この銅膜の厚みは3−1体積抵抗3X10−’Ω・印、
セロテープ基盤目(クロスカット)テストによる剥離試
験結果は100/IOQであった。
The thickness of this copper film is 3-1 volume resistance 3X10-'Ω・mark,
The peel test result by cellotape base cross cut test was 100/IOQ.

実施例2 蟻酸銅100部とエチレングリコール100部とを撹拌
混合して粘性のある青色の処理液(以下、処理液2と記
す)を得た。
Example 2 100 parts of copper formate and 100 parts of ethylene glycol were stirred and mixed to obtain a viscous blue treatment liquid (hereinafter referred to as treatment liquid 2).

この処理液2を使用する他は実施例1と同様にして光沢
ある銅膜が均一密着したナイロンMXD6の成形品を得
た。
A molded article of nylon MXD6 to which a shiny copper film was evenly adhered was obtained in the same manner as in Example 1, except that this treatment liquid 2 was used.

実施例3 実施例1において、グリセリン200部に代えてトリエ
タノールアミン200部を使用する他は同様にして処理
液(以下、処理液3と記す)を得、この処理液3を用い
る他は同様にして同様にして銅膜が均一密着したナイロ
ンMXD6の成形品を得た。
Example 3 A treatment liquid (hereinafter referred to as treatment liquid 3) was obtained in the same manner as in Example 1 except that 200 parts of triethanolamine was used instead of 200 parts of glycerin; In the same manner, a molded product of nylon MXD6 to which the copper film was uniformly adhered was obtained.

実施例4〜11 実施例1〜3において、ナイロンMXD6の成形品に代
えて、ボリアリレート(商品名;Uポリマー、ユニチカ
■製、以下、Uポリマーと記す)、ポリサルホン(商品
名;ユーデルボリサルフオン、アモコケミカルズ■製、
以下、tlPsPと記す)、20重量%ガラス繊維強化
ポリエーテルサルホン(三井東圧■製、以下、pEsp
と記す)、ポリエーテルイミド(商品名;ウルテム、ジ
ェネラル・エレクトリック■製、以下、ウルテムと記す
)、ポリエーテルエーテルケトン(商品名;ピクトレッ
クス、英国ICI社製、以下、PEEKと記す)の成形
品を使用し、第1表に記載の条件にて処理して銅膜が均
一に形成された成形品を得た。
Examples 4 to 11 In Examples 1 to 3, polyarylate (trade name: U Polymer, manufactured by Unitika ■, hereinafter referred to as U Polymer), polysulfone (trade name: Udelboly) was used instead of the molded product of nylon MXD6. Sulfon, manufactured by Amoco Chemicals,
(hereinafter referred to as tlPsP), 20% by weight glass fiber reinforced polyether sulfone (manufactured by Mitsui Toatsu ■, hereinafter referred to as pEsp)
Molding of polyetherimide (trade name: Ultem, manufactured by General Electric ■, hereinafter referred to as Ultem), polyetheretherketone (trade name: Pictrex, manufactured by ICI, UK, hereinafter referred to as PEEK) The product was treated under the conditions listed in Table 1 to obtain a molded product in which a copper film was uniformly formed.

結果を第1表に示した。The results are shown in Table 1.

なお、第1表中の処理液4は、蟻酸銅100部とグリセ
リン200部とを撹拌混合して得たものであり、処理液
5は、酢酸銅100部とグリセリン200部とを撹拌混
合して得たものである。
In addition, treatment liquid 4 in Table 1 was obtained by stirring and mixing 100 parts of copper formate and 200 parts of glycerin, and treatment liquid 5 was obtained by stirring and mixing 100 parts of copper acetate and 200 parts of glycerin. This is what I got.

また、銅膜外観は目視観察によるものであり、○は均一
密着銅膜の生成を示す。
Further, the appearance of the copper film is based on visual observation, and ◯ indicates the formation of a uniformly adhered copper film.

〔発明の作用および効果〕[Operation and effects of the invention]

以上の如くである本発明の製造法によれば、極めて簡単
な手段により容易に密着性に優れた銅膜が形成された成
形体が得られるので、この銅膜を電気メツキ、無電解メ
ツキ、真空蒸着、銅箔接着の代替、溶接用下地などの下
地処理として、銅張フィルム、銅張積層板その他の用途
に、或いは、そのまま或いは耐酸化塗膜を形成して、導
電性、熱伝導性膜として好適に使用されるものである。
According to the manufacturing method of the present invention as described above, a molded article on which a copper film with excellent adhesion is formed can be easily obtained by extremely simple means. It can be used as a base treatment for vacuum evaporation, as a substitute for copper foil adhesion, as a base for welding, for copper-clad films, copper-clad laminates, and other uses, or as it is or by forming an oxidation-resistant coating to improve electrical conductivity and thermal conductivity. It is suitably used as a membrane.

Claims (1)

【特許請求の範囲】[Claims] 低荷重下の熱変形温度が165℃以上である熱可塑性樹
脂物品の所望部に、水酸化銅又は有機酸銅から選択され
た銅化合物と多価アルコールとを必須成分とする混合液
を塗布した後、非酸化性雰囲気中で165℃以上で該熱
可塑性樹脂物品の低荷重下の熱変形温度以下の温度に加
熱し保持することを特徴とする銅膜形成物品の製造法。
A mixed solution containing a copper compound selected from copper hydroxide or organic acid copper and a polyhydric alcohol as essential components was applied to a desired part of a thermoplastic resin article whose heat distortion temperature under low load was 165°C or higher. A method for producing a copper film-formed article, comprising heating and holding the thermoplastic resin article at a temperature of 165° C. or higher and lower than the thermal deformation temperature under a low load in a non-oxidizing atmosphere.
JP62325568A 1987-12-24 1987-12-24 Production of article coated with copper film Pending JPH01168866A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP62325568A JPH01168866A (en) 1987-12-24 1987-12-24 Production of article coated with copper film
EP88121504A EP0322764B1 (en) 1987-12-24 1988-12-22 Method for producing copper film-formed articles
DE8888121504T DE3879441T2 (en) 1987-12-24 1988-12-22 METHOD FOR PRODUCING BODIES WITH A COPPER COVER.
KR1019880017274A KR960010822B1 (en) 1987-12-24 1988-12-22 Method for porducing copper film-formed articles
US07/288,928 US4913938A (en) 1987-12-24 1988-12-23 Method for producing copper film-formed articles

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62325568A JPH01168866A (en) 1987-12-24 1987-12-24 Production of article coated with copper film

Publications (1)

Publication Number Publication Date
JPH01168866A true JPH01168866A (en) 1989-07-04

Family

ID=18178340

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62325568A Pending JPH01168866A (en) 1987-12-24 1987-12-24 Production of article coated with copper film

Country Status (1)

Country Link
JP (1) JPH01168866A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013136937A1 (en) 2012-03-16 2013-09-19 株式会社Adeka Copper film-forming composition, and method for producing copper film by using the composition
KR20160027174A (en) 2013-07-25 2016-03-09 가부시키가이샤 아데카 Composition for copper film formation and copper film production method using same
KR20160114175A (en) 2014-03-12 2016-10-04 가부시키가이샤 아데카 Copper film forming composition and process for manufacturing copper film using same
JPWO2015045932A1 (en) * 2013-09-30 2017-03-09 新日鉄住金化学株式会社 Copper thin film forming composition

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013136937A1 (en) 2012-03-16 2013-09-19 株式会社Adeka Copper film-forming composition, and method for producing copper film by using the composition
US9028599B2 (en) 2012-03-16 2015-05-12 Adeka Corporation Copper film-forming composition, and method for producing copper film by using the composition
KR20160027174A (en) 2013-07-25 2016-03-09 가부시키가이샤 아데카 Composition for copper film formation and copper film production method using same
JPWO2015045932A1 (en) * 2013-09-30 2017-03-09 新日鉄住金化学株式会社 Copper thin film forming composition
KR20160114175A (en) 2014-03-12 2016-10-04 가부시키가이샤 아데카 Copper film forming composition and process for manufacturing copper film using same

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