JPH01165031A - Manufacture of magnetic recording medium - Google Patents

Manufacture of magnetic recording medium

Info

Publication number
JPH01165031A
JPH01165031A JP32157387A JP32157387A JPH01165031A JP H01165031 A JPH01165031 A JP H01165031A JP 32157387 A JP32157387 A JP 32157387A JP 32157387 A JP32157387 A JP 32157387A JP H01165031 A JPH01165031 A JP H01165031A
Authority
JP
Japan
Prior art keywords
substrate
rotating drum
wrinkles
polymer substrate
drum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP32157387A
Other languages
Japanese (ja)
Inventor
Yuji Kasanuki
有二 笠貫
Takayuki Yagi
隆行 八木
Kenji Suzuki
謙二 鈴木
Hirotsugu Takagi
高木 博嗣
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP32157387A priority Critical patent/JPH01165031A/en
Publication of JPH01165031A publication Critical patent/JPH01165031A/en
Pending legal-status Critical Current

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  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

PURPOSE:To obtain a magnetic film medium having no wrinkles by sequentially contacting a high polymer substrate with a rotary drum from a central part to a peripheral part with respect to the direction of the width of the substrate at the time of contacting the high polymer substrate to the rotary drum. CONSTITUTION:The high polymer substrate 1 is brought into contacts with the rotary drum 2 through a roller 12 having a central part with a diameter of 63mm and end part with a diameter of 65mm and a concave bobbin form made of aluminum. At this time, the substrate 1 is sequentially contacted to the rotary drum 2 from the central part to the peripheral part with respect to the direction of the width of the substrate 1. The wrinkles of the substrate 1 are generated according to the friction of the drum 2 and the substrate 1. According to this method, at the time of starting to form the wrinkles, both the sides of the wrinkles are not simultaneously fixed but one side thereof sequentially contacts the drum 2, so that the substrate 1 contacts along the drum 2 to prevent the wrinkles.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は真空蒸着法あるいはスパッタリング法により高
分子基体上にGoとCrを主成分とする磁性薄膜を形成
する磁気記録媒体の製造方法に関し、詳しくは高分子基
体が回転ドラムに接する際に発生するしわを防止するよ
うにした磁気記録媒体の製造方法に関する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for manufacturing a magnetic recording medium in which a magnetic thin film mainly composed of Go and Cr is formed on a polymer substrate by a vacuum evaporation method or a sputtering method. More specifically, the present invention relates to a method for manufacturing a magnetic recording medium that prevents wrinkles that occur when a polymer substrate comes into contact with a rotating drum.

〔従来の技術〕[Conventional technology]

垂直磁気記録方式は高い記録密度が得られる記録方式と
して知られている。この記録方式に用いられる媒体には
Go−Cr ′ai性薄膜薄膜o−Ni−Pメツキ膜あ
るいはBa−フェライト磁性粉を塗布したものなどがあ
り、なかでもCo−Cr 81性薄膜はすぐれた記録再
生特性を有している。
The perpendicular magnetic recording method is known as a recording method that provides high recording density. Media used in this recording method include Go-Cr'ai thin films, o-Ni-P plating films, and those coated with Ba-ferrite magnetic powder. Among them, Co-Cr 81 thin films have excellent recording properties. It has regenerative properties.

Go−Cr磁性薄膜の作製方法には真空蒸着法とスパッ
タリング法があり、それぞれ特徴を有している。真空蒸
着法は膜の形成速度が非常に高いが。
There are vacuum evaporation methods and sputtering methods for producing Go--Cr magnetic thin films, each of which has its own characteristics. Although the vacuum deposition method has a very high film formation rate.

基体に垂直な方向の保磁力Hclを大きくするためには
高い基体温度が必要である。スパッタリング法は真空蒸
着法より低い基体温度で十分な保磁力Hclが得られる
が、膜形成速度は低い、量産性からみれば真空蒸着法は
Go −Or磁性薄膜の作製に適した方法といえる。
A high substrate temperature is required to increase the coercive force Hcl in the direction perpendicular to the substrate. Although the sputtering method can obtain a sufficient coercive force Hcl at a lower substrate temperature than the vacuum evaporation method, the film formation rate is lower.From the viewpoint of mass production, the vacuum evaporation method can be said to be a method suitable for producing a Go-Or magnetic thin film.

しかしながらいずれの作製方法を用いてもCo−Cr磁
性薄膜の製造には高分子基体が回転ドラムに接した際、
しわが発生するという問題があった、これについて以下
に説明する。
However, no matter which production method is used, when the polymer substrate comes into contact with the rotating drum, in the production of the Co-Cr magnetic thin film,
There was a problem of wrinkles, which will be explained below.

真空蒸着法あるいはスパッタリング法によりGo−IO
r磁性薄膜を作製する方法としては高分子基体を回転ド
ラムに沿って走行させつつ膜形成を行う方法が最も一般
的である。第7図はこのような磁性層形成装置の模式図
を示している。磁性層形成装置としては真空蒸着装置ま
たはスパッタリング装置が用いられるが、スパッタリン
グ装置は真空蒸着装置の蒸発源8をスパッタリングター
ゲットにかえるだけで同様の構成である。高分子基体1
は回転ドラム2の周面に沿って走行する0回転ドラム2
は周面温度が300℃まで任意の値に設定できる。蒸発
源8から蒸発したGo、 Cr原子あるいはスパッタリ
ングターゲット8からスパッタされたCo、 Cr原子
はマスク7により入射角を制限されて高分子基体lに付
着し、磁性薄膜を形成する。
Go-IO by vacuum evaporation method or sputtering method
The most common method for producing a magnetic thin film is to form the film while moving a polymer substrate along a rotating drum. FIG. 7 shows a schematic diagram of such a magnetic layer forming apparatus. A vacuum evaporation device or a sputtering device is used as the magnetic layer forming device, and the sputtering device has the same structure as the vacuum evaporation device except that the evaporation source 8 is replaced with a sputtering target. Polymer substrate 1
is a 0-rotation drum 2 that runs along the circumferential surface of the rotating drum 2.
The surrounding surface temperature can be set to any value up to 300°C. The Go and Cr atoms evaporated from the evaporation source 8 or the Co and Cr atoms sputtered from the sputtering target 8 have their incident angles restricted by the mask 7 and adhere to the polymer substrate 1 to form a magnetic thin film.

このようにして得られたGo −Or磁性薄膜の基体に
垂直な方向の保磁力Hclは膜形成時の基体温度が高い
程高くなる。ここで基体温度とは回転ドラムの周面温度
である。実用上掛くとも4006 eのHclが必要で
あるが、そのためには蒸着では80℃以上、スパッタリ
ングでは50℃以上の基体温度にしなければならない、
基体としては量産性ならびに寸法安定性などからポリエ
チレンテレフタレート、ポリイミドまたはアラミドなど
のフィルムが適している。
The coercive force Hcl of the thus obtained Go-Or magnetic thin film in the direction perpendicular to the substrate increases as the substrate temperature during film formation increases. Here, the substrate temperature is the temperature of the circumferential surface of the rotating drum. For practical purposes, at most 4006 e of HCl is required, but for this purpose the substrate temperature must be 80°C or higher for vapor deposition and 50°C or higher for sputtering.
As the substrate, a film made of polyethylene terephthalate, polyimide, or aramid is suitable from the viewpoint of mass production and dimensional stability.

しかしながら、このようなフィルムを用いて回転ドラム
の周面温度を80℃以上にして膜形成を行うと、高分子
基体1が回転ドラム2に接する際に回転ドラム2が高温
のため基体lが急激に加熱され、基体からのガス放出お
よび基体の熱変形が生じる0回転ドラム上に接した面で
基体1からガスが放出されると基体lはドラム2との間
に空隙をつくり、これがしわとなる、また基体の熱変形
はそのまま搬送されて回転ドラム上のしわとなる。
However, when such a film is used to form a film at a circumferential temperature of the rotating drum of 80° C. or higher, when the polymer substrate 1 comes into contact with the rotating drum 2, the temperature of the rotating drum 2 is so high that the substrate l suddenly When gas is released from the substrate 1 at the surface in contact with the 0-rotation drum, which causes gas release from the substrate and thermal deformation of the substrate, a gap is created between the substrate 1 and the drum 2, which causes wrinkles and Moreover, the thermal deformation of the substrate is transported as it is and becomes wrinkles on the rotating drum.

このようなしわの発生は回転ドラムの局面温度が80℃
以上になると起こり易く、また高分子基体の厚みが小さ
いほど、とりわけ10鱗以下で著しくなる。従来しわの
発生を防止するためにニップローラーや予備加熱ローラ
ーまたは予備加熱ローラー上でのハロゲンランプによる
加熱といった方法が用いられていた。しかしこれらの方
法も不十分であることが本発明者らの検討により明らか
になった。第8図、第9図は上記方法の構成を示してい
る。すなわち、第8図のニップローラー9は回転ドラム
2に接する際に基体1を押さえつけてしわの発生を防ご
うとするものであるが、回転ドラムの温度が高い場合は
基体lを押さえつけてもしわの発生を防ぐことはできず
、しわがニップローラー9で押さえつけられて折しわと
なってしまう、第9図に示される予備加熱ローラー10
の場合、回転ドラムの温度が高くなれば、予備加熱ロー
ラー10の温度も高くしなければならず、結局、予備加
熱ローラー上でしわが発生する。また予備加熱ローラー
上でハロゲンランプ11により加熱しても一度発生した
しわはほとんど改善されなかった。
The occurrence of such wrinkles occurs when the surface temperature of the rotating drum is 80°C.
This phenomenon is more likely to occur when the thickness of the polymer substrate is more than 10 scales, and it becomes more noticeable as the thickness of the polymer substrate becomes smaller, especially when the thickness of the polymer substrate is less than 10 scales. Conventionally, methods such as a nip roller, a preheating roller, or heating with a halogen lamp on the preheating roller have been used to prevent wrinkles. However, studies by the present inventors have revealed that these methods are also insufficient. FIGS. 8 and 9 show the configuration of the above method. In other words, the nip roller 9 in FIG. 8 tries to prevent wrinkles by pressing the substrate 1 when it comes into contact with the rotating drum 2, but if the temperature of the rotating drum is high, even if it presses the substrate 1, wrinkles will not occur. The preheating roller 10 shown in FIG.
In this case, if the temperature of the rotating drum increases, the temperature of the preheating roller 10 must also increase, resulting in wrinkles on the preheating roller. Further, even if the film was heated with a halogen lamp 11 on a preheating roller, wrinkles that had once occurred were hardly improved.

以上のように従来の構成ではGo−Orr磁性薄膜蒸着
する際、あるいはスパッタリングにより膜形成する際、
回転ドラム上で高分子基体にしわが発生し、磁気記録媒
体として使用できないという問題があった。
As described above, in the conventional configuration, when depositing a Go-Orr magnetic thin film or forming a film by sputtering,
There was a problem in that the polymer substrate wrinkled on the rotating drum, making it unusable as a magnetic recording medium.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

本発明は上記のような問題点を解決するものであり、し
わのない良好なCo −Cr磁気記録媒体を製造するた
めの方法を提供することを目的としている。
The present invention solves the above-mentioned problems and aims to provide a method for manufacturing a good wrinkle-free Co--Cr magnetic recording medium.

〔問題点を解決するための手段〕[Means for solving problems]

本発明は高分子基体を80℃以上に加熱した回転ドラム
に沿って搬送し、この回転ドラム上の高分子基体に真空
蒸着法あるいはスパッタリング法によりCoとCrを主
成分とする磁性層を形成して得られる磁気記録媒体の製
造方法において、該高分子基体が回転ドラムに接する際
、基体の幅方向に関して中央部から周辺部へと順次回転
ドラムに接するようにすることを特徴とした磁気記録媒
体の製造方法であり、本発明の方法を用いることにより
しわのない磁気記録媒体が得られる。高分子基体が回転
ドラムに接する際、基体の幅方向に関して中央部から周
辺部へと順次回転ドラムに接するようにするためには、
中央部が凹状のガイドを基体の搬送路上基体面が回転ド
ラムに接する側のドラム直前の位置に設置される。この
ガイドは回転するローラー状のものであっても固定され
た棒状のものであってもよい。
In the present invention, a polymer substrate is conveyed along a rotating drum heated to 80° C. or higher, and a magnetic layer mainly composed of Co and Cr is formed on the polymer substrate on the rotating drum by vacuum evaporation or sputtering. A method for producing a magnetic recording medium obtained by manufacturing a magnetic recording medium, characterized in that when the polymer substrate comes into contact with the rotating drum, the polymer substrate comes into contact with the rotating drum sequentially from the center to the periphery in the width direction of the substrate. By using the method of the present invention, a wrinkle-free magnetic recording medium can be obtained. When the polymer substrate contacts the rotating drum, in order to contact the rotating drum sequentially from the center to the periphery in the width direction of the substrate,
A guide having a concave center portion is installed on the transport path of the substrate at a position immediately in front of the drum on the side where the substrate surface contacts the rotating drum. This guide may be a rotating roller or a fixed rod.

以下図を用いて本発明を説明する。The present invention will be explained below using the figures.

第1図は本発明の実施の1例を示す磁性層形成装置内部
の正面図である。lは高分子基体、2は回転ドラム、3
は送出しローラー、4は捲取りローラー、5と6はフリ
ーローラーである。7は蒸発原子の入射角を制限するマ
スク、8は蒸発源、12はローラー中央部の径が端部径
より小さい、すなわち糸まき型のフリーローラーである
FIG. 1 is a front view of the inside of a magnetic layer forming apparatus showing one embodiment of the present invention. l is a polymer base, 2 is a rotating drum, 3
is a delivery roller, 4 is a take-up roller, and 5 and 6 are free rollers. 7 is a mask that limits the incident angle of evaporated atoms, 8 is an evaporation source, and 12 is a thread-type free roller in which the diameter of the center portion of the roller is smaller than the diameter of the end portions.

第2図は前記糸まき型の凹状フリーローラー12から回
転ドラム2にいたる部分を示している。
FIG. 2 shows the portion from the thread-type concave free roller 12 to the rotating drum 2. As shown in FIG.

上記のような構成にすると、高分子基体1は回転ドラム
2に接する際、基体lの幅方向に関して中央部から周辺
部に向かって順次回転ドラム2に接していく。これを詳
しく説明すると以下のようになる。従来の方法では高分
子基体1が回転ドラム2に接した際、しわが形成されは
じめると第3図に示すようにしわの両側は回転ドラム2
に高分子基体lが接しており、このため回転ドラム2と
基体1の摩擦によりしわは固定されて回転ドラム上を搬
送される。一方本発明のような構成にすると、しわが形
成されはじめる際、第4図に示すようにしわの両側が同
時に固定されるということがなく1片側から順次回転ド
ラム2に接するため基体lは回転ドラム2に沿って接す
るようになり、しわを防止することができる。
With the above configuration, when the polymer substrate 1 comes into contact with the rotating drum 2, it comes into contact with the rotating drum 2 sequentially from the center toward the peripheral portion in the width direction of the substrate 1. This will be explained in detail as follows. In the conventional method, when the polymer substrate 1 comes into contact with the rotating drum 2, when wrinkles begin to form, both sides of the wrinkles are exposed to the rotating drum 2, as shown in FIG.
The polymer substrate 1 is in contact with the substrate 1, so that the wrinkles are fixed by the friction between the rotating drum 2 and the substrate 1, and the substrate is conveyed on the rotating drum. On the other hand, with the structure of the present invention, when wrinkles begin to form, both sides of the wrinkles are not fixed at the same time, but one side of the wrinkles contacts the rotating drum 2 sequentially, so that the substrate l rotates. It comes into contact with the drum 2 and can prevent wrinkles.

〔実施例〕〔Example〕

次に実施例によりさらに詳しく説明する。 Next, the present invention will be explained in more detail using examples.

実施例1 凹状フリーローラーとして長さ200mm 、端部にお
ける直径85m5、中央部における直径631諺のアル
ミローラーを設置した。
Example 1 An aluminum roller with a length of 200 mm, a diameter of 85 m at the ends, and a diameter of 631 m at the center was installed as a concave free roller.

高分子基体1としてI[80mm、厚さ7.5μs、9
JL11,12.5μsのポリイミドフィルムを用い、
回転ドラムの周面温度を240℃としてポリイミドフィ
ルムLに0.4μs厚のCo−0r磁性薄膜を蒸着した
。ポリイミドフィルムは回転ドラム2に接する際にしわ
は発生せず、得られた磁性薄膜において、しわはなかっ
た、また膜面に垂直な方向の保磁力Hc工は8000e
であった。
I [80 mm, thickness 7.5 μs, 9
JL11, using a 12.5 μs polyimide film,
A Co-Or magnetic thin film having a thickness of 0.4 μs was deposited on the polyimide film L at a peripheral surface temperature of the rotating drum of 240° C. The polyimide film did not wrinkle when it came into contact with the rotating drum 2, and there were no wrinkles in the obtained magnetic thin film, and the coercive force Hc in the direction perpendicular to the film surface was 8000e.
Met.

実施例2 第5図に示すようにわん曲したバー13を回転ドラム2
の直前に位置する搬送路上に設置した。
Embodiment 2 As shown in FIG. 5, a curved bar 13 is mounted on a rotating drum 2.
It was installed on the conveyance path located just in front of.

バー13はアルミ製で長さ200mm 、直径10m層
、端部に対して中央部は1■凹状にたわんでいる。バー
13の表面にはフッ素系樹脂がコーティングされており
、バー13の凹状の部分を高分子基体lが接する際の摩
擦力を小さくしている。
The bar 13 is made of aluminum, has a length of 200 mm, a layer of 10 m in diameter, and is bent in a concave shape at the center by 1 inch with respect to the ends. The surface of the bar 13 is coated with a fluororesin to reduce the frictional force when the polymer base l contacts the concave portion of the bar 13.

高分子基体lとして幅80腸■、厚さ6μsと12−の
アラミドフィルムを用い、回転ドラムの周面温度を 2
00℃としてアラミドフィルム上に0.4賜厚のCo−
Cr磁性薄膜を蒸着した。アラミドフィルムは回転ドラ
ム2に接する際にしわは発生せず、得られた磁性薄膜に
おいてしわはなかった。また膜面に垂直な方向の保磁力
Hciは?000eであった。
An aramid film with a width of 80 cm, a thickness of 6 μs, and 12 mm was used as the polymer substrate, and the peripheral surface temperature of the rotating drum was set to 2.
0.4 thickness of Co-
A Cr magnetic thin film was deposited. No wrinkles were generated in the aramid film when it came into contact with the rotating drum 2, and there were no wrinkles in the obtained magnetic thin film. Also, what is the coercive force Hci in the direction perpendicular to the film surface? It was 000e.

実施例3 第6図に示すように端部の径より中央部の径が小さいフ
リーローラー14を回転ドラム2の直前に位置する搬送
路上に設置した。フリーローラー14はアルミ製で全長
200mm 、直径85mm、中央の小さい径の部分は
長さ70II11、直径83mmである。
Example 3 As shown in FIG. 6, a free roller 14 having a smaller diameter at its center than at its ends was installed on a conveyance path located immediately in front of the rotating drum 2. The free roller 14 is made of aluminum and has a total length of 200 mm and a diameter of 85 mm, and the small diameter portion at the center has a length of 70 mm and a diameter of 83 mm.

高分子基体lとして幅80m■、厚さ7−とlOμsの
PETフィルムを用い、回転ドラムの周面温度を室温と
してPETフィルム上に0.4u厚のパーマロイ層を1
次に周面温度を90°にして、 0.2牌厚のCo−C
r層をスパッタリング法により形成した。
A PET film with a width of 80 m and a thickness of 7 and 10 μs was used as the polymer substrate l, and a permalloy layer with a thickness of 0.4 u was placed on the PET film with the circumferential temperature of the rotating drum set at room temperature.
Next, the surrounding surface temperature was set to 90°, and the Co-C with a thickness of 0.2 tiles was
The r layer was formed by sputtering.

PETフィルムは回転ドラム2に接する際にしわは発生
せず、得られた磁性薄膜においてしわはなかった。また
Go−Or tlIの膜面に垂直な方向の保磁力HCL
は8000e テあった。
No wrinkles were generated in the PET film when it came into contact with the rotating drum 2, and there were no wrinkles in the obtained magnetic thin film. In addition, the coercive force HCL in the direction perpendicular to the film surface of Go-Or tlI
It was 8000e.

〔発明の効果〕〔Effect of the invention〕

本発明の方法によれば高分子基体が回転ドラムに接する
際、基体の幅方向に関して中央部から周辺部へと順次回
転ドラムに接するようにガイドを設置することにより、
従来高分子基体上にCOとCrを主成分とする磁性薄膜
を蒸着する際あるいはスパッタリングにより膜形成する
際回転ドラムに高分子基体が接するときに発生していた
しわを除去することができ、しわのない磁性薄膜媒体を
得ることができる。
According to the method of the present invention, when the polymer substrate comes into contact with the rotating drum, by installing guides so as to contact the rotating drum sequentially from the center to the periphery in the width direction of the substrate,
Conventionally, wrinkles that occur when a polymer substrate comes into contact with a rotating drum when depositing a magnetic thin film containing CO and Cr as main components on a polymer substrate or when forming a film by sputtering can be removed. It is possible to obtain a magnetic thin film medium free of .

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の磁性層形成装置内部の正面図、第2図
は本発明で用いた磁性層形成装置内部の回転ドラム部の
斜視図、第3.4図は回転ドラム上でのしわの状況を示
すための高分子基体の断面図、第5.6図は本発明で使
用したガイドを示す磁性層形成装置内部の回転ドラム部
の斜視図、第7.8.9図はCo−0r磁性薄膜を作製
するための従来の磁性層形成装置内部の正面図である。 lは高分子基体、2は回転ドラム、3は送出しローラー
、4は捲取りローラー、5と6はフリーローラー、7は
マスク、8は蒸発源またはスパッタリングターゲット、
9はニップローラー、10は予備加熱ローラー、11は
ハロゲンランプ、12は糸まき型ローラー、13はバー
、14は他の変形ローラー。 特許出願人  キャノン株式会社 代 理 人   若   林      忠第3図  
       M4図
Figure 1 is a front view of the inside of the magnetic layer forming apparatus of the present invention, Figure 2 is a perspective view of the rotating drum section inside the magnetic layer forming apparatus used in the present invention, and Figures 3.4 are wrinkles on the rotating drum. 5.6 is a perspective view of the rotating drum inside the magnetic layer forming apparatus showing the guide used in the present invention, and FIG. 7.8.9 is a sectional view of the polymer substrate to show the situation of Co- FIG. 2 is a front view of the inside of a conventional magnetic layer forming apparatus for producing an 0r magnetic thin film. 1 is a polymer substrate, 2 is a rotating drum, 3 is a delivery roller, 4 is a take-up roller, 5 and 6 are free rollers, 7 is a mask, 8 is an evaporation source or sputtering target,
9 is a nip roller, 10 is a preheating roller, 11 is a halogen lamp, 12 is a thread-type roller, 13 is a bar, and 14 is another deformation roller. Patent applicant Canon Co., Ltd. Representative Tadashi Wakabayashi Figure 3
M4 figure

Claims (1)

【特許請求の範囲】[Claims] 1)高分子基体を80℃以上に加熱した回転ドラムに沿
って搬送し、この回転ドラム上の高分子基体に真空蒸着
法あるいはスパッタリング法によりCoとCrを主成分
とする磁性層を形成して得られる磁気記録媒体の製造方
法において、該高分子基体が回転ドラムに接する際、基
体の幅方向に関して中央部から周辺部へと順次回転ドラ
ムに接するようにすることを特徴とする磁気記録媒体の
製造方法。
1) A polymer substrate is conveyed along a rotating drum heated to 80° C. or higher, and a magnetic layer mainly composed of Co and Cr is formed on the polymer substrate on the rotating drum by vacuum evaporation or sputtering. In the method for manufacturing the obtained magnetic recording medium, the polymer substrate is brought into contact with the rotating drum sequentially from the center to the periphery in the width direction of the substrate. Production method.
JP32157387A 1987-12-21 1987-12-21 Manufacture of magnetic recording medium Pending JPH01165031A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32157387A JPH01165031A (en) 1987-12-21 1987-12-21 Manufacture of magnetic recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32157387A JPH01165031A (en) 1987-12-21 1987-12-21 Manufacture of magnetic recording medium

Publications (1)

Publication Number Publication Date
JPH01165031A true JPH01165031A (en) 1989-06-29

Family

ID=18134071

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32157387A Pending JPH01165031A (en) 1987-12-21 1987-12-21 Manufacture of magnetic recording medium

Country Status (1)

Country Link
JP (1) JPH01165031A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150021176A1 (en) * 2013-07-19 2015-01-22 Nitto Denko Corporation Sputtering device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150021176A1 (en) * 2013-07-19 2015-01-22 Nitto Denko Corporation Sputtering device
JP2015021161A (en) * 2013-07-19 2015-02-02 日東電工株式会社 Sputtering device

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