JPH01163648A - Humidity sensing element and its manufacture - Google Patents

Humidity sensing element and its manufacture

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Publication number
JPH01163648A
JPH01163648A JP32204487A JP32204487A JPH01163648A JP H01163648 A JPH01163648 A JP H01163648A JP 32204487 A JP32204487 A JP 32204487A JP 32204487 A JP32204487 A JP 32204487A JP H01163648 A JPH01163648 A JP H01163648A
Authority
JP
Japan
Prior art keywords
moisture
gold electrode
film
electrode
sensitive material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP32204487A
Other languages
Japanese (ja)
Inventor
Satoshi Nishiwaki
智 西脇
Koji Murakami
浩二 村上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP32204487A priority Critical patent/JPH01163648A/en
Publication of JPH01163648A publication Critical patent/JPH01163648A/en
Pending legal-status Critical Current

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  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)

Abstract

PURPOSE:To make a humidity-sensitive material thin and to eliminate thermal deterioration by outputting variation in electric characteristics of a humidity sensing material film corresponding to external humidity variation through a bonding pad provided to each electrode. CONSTITUTION:An upper gold electrode 24 is filmed on the humidity sensing film 23 of 1-2mum in film thickness every thinly to hundreds of Angstrom so as to increase permeability to moisture, etc. This electrode 24 is formed by vapor deposition, etc., so a lead-down electrode united with the side taper part of the film 23 is formed simultaneously with the formation of the electrode 24. If moisture which is an external factor permeates the upper gold electrode 24 and is absorbed by the humidity sensing film 23, the dielectric constant varies, but this variation is outputted in the form of variation of an electric signal through bonding pads 22a and 24a as variation in the electrostatic capacity between the upper gold electrode 24 and a lower gold electrode 22, so that an external detecting circuit detects the humidity.

Description

【発明の詳細な説明】 〔発明の目的] (産業上の利用分野) この発明は、誘電率または誘電率等の電気的特性が湿度
によって変化する材料を用いて外部雰囲気中における湿
度変化を検出するようにした、感湿素子とその製造方法
に関する。
[Detailed Description of the Invention] [Objective of the Invention] (Industrial Application Field) This invention detects changes in humidity in an external atmosphere using a material whose dielectric constant or electrical properties such as permittivity change depending on humidity. The present invention relates to a moisture sensitive element and a method for manufacturing the same.

(従来の技術) 例えば、空調機器などの湿度感知に用いられる従来の感
湿素子として第4図、第5図に示すものがある。
(Prior Art) For example, there are conventional humidity sensing elements shown in FIGS. 4 and 5 used for sensing humidity in air conditioners and the like.

第4図に示す素子は、感湿素子基板1上に下部金電極2
、湿度変化によって誘電率変化を生じる有機材料からな
る感湿膜3、上部金電極4及びこの上部金電極4を外部
回路へ接続するためのボンディングパラ1〜6,6まで
゛引きおろず、引きおろし金電極5から構成されている
The device shown in FIG. 4 has a lower gold electrode 2 on a moisture-sensitive device substrate 1.
, a moisture-sensitive film 3 made of an organic material whose dielectric constant changes with changes in humidity, an upper gold electrode 4, and bonding parameters 1 to 6 and 6 for connecting the upper gold electrode 4 to an external circuit. It consists of a grater electrode 5.

この感湿素子では、感湿膜3は上部金電極4を通して外
部の湿度変化を感知するものであり、従って上部金電極
4はなるべく湿気を透過し易いように数百A程度まで薄
くされている。また感湿膜3は十分な誘電容量をえて安
定した湿度感知能力を得るために1〜2μm程度の厚さ
を有しており、そのため図示するように引きおろし電極
5はかなりの段差を越えてボンディングパッド6まで達
する必要がある。従って引きおろし金電極5が薄いと感
湿膜3の側部でクラックを生じ易く、そのため引きおろ
し電極5は感湿膜3と同等かそれ以上の厚さを有してい
な(プればならない。
In this humidity-sensitive element, the humidity-sensitive film 3 senses changes in external humidity through the upper gold electrode 4. Therefore, the upper gold electrode 4 is made as thin as several hundred amperes to allow moisture to pass through it as easily as possible. . In addition, the humidity sensitive film 3 has a thickness of about 1 to 2 μm in order to obtain sufficient dielectric capacity and stable humidity sensing ability, and therefore, as shown in the figure, the pull-down electrode 5 has to cross a considerable level difference. It is necessary to reach the bonding pad 6. Therefore, if the pull-down electrode 5 is thin, cracks are likely to occur on the sides of the moisture-sensitive membrane 3, and therefore the pull-down electrode 5 must have a thickness equal to or greater than that of the moisture-sensitive membrane 3.

第5図に示す素子は、感湿基板1上に2個の独立しIC
下部金金電極1.12と感湿膜13を形成し、感湿膜1
3上を第1図に示した素子と同様極薄い上部金電極14
で被覆した構成である。
The device shown in FIG. 5 consists of two independent ICs on a moisture-sensitive substrate 1.
A lower gold electrode 1.12 and a humidity sensitive film 13 are formed, and the humidity sensitive film 1
3. An extremely thin upper gold electrode 14 similar to the device shown in FIG.
The structure is coated with

この素子では、第4図に示した素子と異なり、上部金電
極1/′lは容量取り出し電極として作用ぼ一3= ず、上下の電極11−14.14−12間でそれぞれ静
電容量を形成し、下部金電極11−12間で合成容量の
取り出しを行っている。
In this device, unlike the device shown in FIG. 4, the upper gold electrode 1/'l does not function as a capacitance extraction electrode, but rather increases the capacitance between the upper and lower electrodes 11-14 and 14-12, respectively. The composite capacitance is taken out between the lower gold electrodes 11 and 12.

(発明が解決しようとする問題点) 上述したような従来の感湿素子では、それぞれ次のよう
な問題点を有している。
(Problems to be Solved by the Invention) The conventional moisture-sensitive elements as described above each have the following problems.

先ず第4図に示した素子では、引きおろし金電極5をか
なり厚く形成する必要があり、そのため蒸着或はスパッ
タなどによる電極形成時に感湿膜3を長時間高温にさら
すことになる。ところが感湿膜3は比較的熱に弱い有機
材料で形成されているため、高温に長時間さらされるこ
とにより変質を生じ易い。また引きおろし金電極5ど感
湿素子基板1との間の線膨張率の違いにより、高温加熱
中両者の間で応力を生じてクラック等を発生し易く、故
障の原因となる。ざらに、通常の感湿素子では特に湿気
の高い場所での使用を前提とするため、電極には腐食に
強い金が用いられるが、引きおろし金電極5がかなり厚
い為に高価な金を多量に使用し、コスト高の大ぎな要因
となる。
First, in the device shown in FIG. 4, it is necessary to form the downtrend electrode 5 quite thickly, so that the moisture sensitive film 3 is exposed to high temperature for a long time when the electrode is formed by vapor deposition or sputtering. However, since the moisture-sensitive film 3 is made of an organic material that is relatively heat-resistant, it is likely to deteriorate when exposed to high temperatures for a long period of time. Furthermore, due to the difference in linear expansion coefficient between the drawer electrode 5 and the moisture-sensitive element substrate 1, stress is generated between the two during high-temperature heating, which tends to cause cracks and the like, resulting in failure. Generally speaking, since ordinary humidity sensing elements are intended to be used in particularly humid places, gold, which is resistant to corrosion, is used for the electrodes, but since the drawer electrode 5 is quite thick, a large amount of expensive gold is used. This is a major cause of high costs.

第5図に示す素子の場合は引きおろし金電極が必要では
ないので、上述の問題点の多くは解消できる。ところが
上述したように、この素子は電極11−14および電極
1/l−12間で構成される2個のコンデンサーの直列
つなぎとして感湿質膜13の容量変化を取り出すもので
あり、従って、第4図のものと比べると感湿膜の同じ面
積にだいし出力効率は半分以下となる。
Since the device shown in FIG. 5 does not require a grater electrode, many of the problems described above are overcome. However, as mentioned above, this element extracts the capacitance change of the moisture sensitive membrane 13 by connecting two capacitors in series between the electrodes 11-14 and 1/1-12, and therefore Compared to the one shown in Figure 4, the output efficiency is less than half that for the same area of the moisture-sensitive membrane.

この発明は、従来の感湿素子にお(プる以上のような問
題点に関してざなれたものであり、製造コストが低く、
感湿能力に優れしかも特性が安定した高出力の感湿素子
およびその有効な製造方法を提供することを目的とする
ものである。
This invention overcomes the above-mentioned problems with conventional moisture-sensitive elements, has low manufacturing costs,
The object of the present invention is to provide a high-output moisture sensing element with excellent moisture sensing ability and stable characteristics, and an effective manufacturing method thereof.

[発明の構成] く問題点を解決するための手段) この発明の感湿素子は上記問題点を解決するために、絶
縁性の基板と、上記絶縁性基板上に形成された下部金電
極と、上記下部金電極上に比較的厚く形成され、側端部
がテーパ状をなす感湿材料膜と、上記感湿月利膜に外部
からの湿気が透過するに十分な薄ざであってかつ十分な
導電性を保持する厚さを有し、上記感湿材料膜の上面と
テーパ状をなす側面とを覆い更に絶縁性基板上にのびる
上部金電極と、上記下部金電極と上部金電極の絶縁性基
板上に伸びた部分とにそれぞれ形成され外部回路に接続
されるボンディングパッド、を構成要件として有するこ
とを要旨どする。
[Structure of the Invention] Means for Solving Problems) In order to solve the above problems, the moisture sensitive element of the present invention includes an insulating substrate, a lower gold electrode formed on the insulating substrate, and a lower gold electrode formed on the insulating substrate. , a moisture-sensitive material film formed relatively thickly on the lower gold electrode and having tapered side edges; and a moisture-sensitive film having a thin enough thickness to allow moisture to pass through from the outside. an upper gold electrode having a thickness that maintains sufficient conductivity and covering the upper surface of the moisture-sensitive material film and the tapered side surface and further extending onto the insulating substrate; The gist of the present invention is to have as constituent elements a bonding pad formed on a portion extending on an insulating substrate and connected to an external circuit.

この発明はさらに、外部の湿度変化に対応してその電気
的特性に変化を生じる感湿素子を形成するための製造方
法であって;絶縁性の基板上に下部金電極を形成する工
程と;上記下部金電極上に外部の湿度変化に対応してそ
の電気的特性に変化を生じる材料を塗布して感湿材料膜
を形成する工程と;上記感湿材料膜上に一側端部がテー
パ状をなす比較的薄い金属膜を形成する工程と;上記金
属膜をバターニングのためのマスクとして用い02アッ
シト一をかけることにより上記感湿材料膜をエツチング
してその側端部にテーパを形成する工程と:上記エッヂ
フグ工程後上記金属マスクを除去する工程と;上記金属
マスクの除去後上記感湿材料股上に釜を蒸着またはスパ
ッタリングして上記テーパ部分および絶縁性基板上に伸
びる薄い上部金電極を形成する工程と;上記下部金電極
の一部および絶縁性基板上に伸びた上部金電極の一部に
それぞれボンディングパッドを形成する工程と;からな
る製造方法をその要旨とする。
The present invention further provides a manufacturing method for forming a humidity sensitive element whose electrical characteristics change in response to changes in external humidity, comprising: forming a lower gold electrode on an insulating substrate; forming a moisture-sensitive material film by coating the lower gold electrode with a material that changes its electrical characteristics in response to changes in external humidity; one end of the moisture-sensitive material film is tapered; forming a relatively thin metal film having a shape; using the metal film as a mask for buttering, etching the moisture-sensitive material film by applying 02 ash to form a taper at the side edges thereof; removing the metal mask after the edge puffing process; and depositing or sputtering a pot on the moisture-sensitive material after removing the metal mask to form a thin upper gold electrode extending over the tapered portion and the insulating substrate. The gist of the manufacturing method is to form a bonding pad on a part of the lower gold electrode and a part of the upper gold electrode extending on the insulating substrate, respectively.

〈作用) この発明の感湿素子では、上下金電極間に設けられる感
湿材料膜の側端部がテーパ状をなすように構成されてい
るため、このテーパ部分に伸びた金電極は、基板と上部
金電極との段差による電極の段切れを生じない。従って
、このテーパ部分をも含めた上部金電極を極り薄くする
ことができ、従来例素子のように厚い引きおろし金電極
は不用となるので、引きおろし電極形成時の熱工程によ
る感湿月利膜の変質は発生しない。従って製造時の素子
間の特性のばらつきが防止され、製造歩溜まりおよび信
頼性の向上が図られる。
<Function> In the moisture-sensitive element of the present invention, the side end portion of the moisture-sensitive material film provided between the upper and lower gold electrodes is configured to be tapered, so that the gold electrode extending into this tapered portion is The electrode does not break due to the difference in level between the upper gold electrode and the upper gold electrode. Therefore, the upper gold electrode, including this tapered part, can be made extremely thin, and the thick draw-down metal electrodes used in conventional elements are not required. No deterioration of the membrane occurs. Therefore, variations in characteristics between elements during manufacturing are prevented, and manufacturing yield and reliability are improved.

またその製造方法にあっては、感湿材料膜上に側端部が
テーパ状の金属マスクを設(プ、金属マスクの厚さによ
る酸素の透過率の違いを利用して02アッシャ−による
感湿材料膜のエツチングを行うと、金属マスクの厚さに
よってエツチング速度がことなるので、結果として感湿
材料膜は一側端部がテーパ状にエツチングされる。これ
にJ:って容易にテーパ状の側端部を有する感湿材料膜
が形成される。
In addition, in the manufacturing method, a metal mask with tapered side edges is placed on the moisture-sensitive material film, and the difference in oxygen permeability depending on the thickness of the metal mask is used to create the sensitivity using the 02 asher. When etching a wet material film, the etching speed varies depending on the thickness of the metal mask, so as a result, one end of the moisture sensitive material film is etched into a tapered shape. A film of moisture sensitive material is formed having side edges of the shape.

(実施例) 以下、この発明の実施例を図面に基づいて説明する。(Example) Embodiments of the present invention will be described below based on the drawings.

第1図はこの発明の1実施例にかかる感湿素子の断面図
である。図において21はシリコン基板表面に酸化層2
1aを形成した感湿素子基板、22はボンディングパッ
ド22aを有する下部金電極、23は1側面がテーパ上
に形成された感湿膜であり、有機物質である感湿材料を
スピンコードによって基板21、電極22上に塗布して
形成したものである。24ば上部金電極であるが、図示
するJ:うに感湿膜23の側部テーパ部分と基板21−
にとにわたって形成され、いわゆる引きおろし電極を一
体に形成している。なお24aは外部回路との接続用の
ボンディングパッドである。
FIG. 1 is a sectional view of a moisture sensitive element according to an embodiment of the present invention. In the figure, 21 is an oxide layer 2 on the silicon substrate surface.
22 is a lower gold electrode having a bonding pad 22a, 23 is a moisture sensitive film formed with one side tapered, and an organic moisture sensitive material is attached to the substrate 21 by a spin cord. , is formed by coating on the electrode 22. 24 is the upper gold electrode, J shown in the figure is the side tapered part of the sea urchin moisture sensitive film 23 and the substrate 21-
It is formed over the entire length of the electrode, and is integrally formed with a so-called pull-down electrode. Note that 24a is a bonding pad for connection with an external circuit.

以上の構成において、通常1〜2μmの膜厚を有する感
湿膜23に対して、上部金電極24は湿度等の透過率を
上げるため数百人の後く薄い膜で形成されている。この
電極23は一般に蒸着あるいはスパッタリングによって
形成され、したがって膜23の側部テーパ部分に一体形
成される引ぎおろし電極も電極24の形成と同時に容易
に形成される。
In the above configuration, the upper gold electrode 24 is formed of a thin film of several hundred layers in order to increase the transmittance of humidity and the like, whereas the moisture sensitive film 23 normally has a film thickness of 1 to 2 μm. This electrode 23 is generally formed by vapor deposition or sputtering, and therefore, the pull-down electrode integrally formed on the side tapered portion of the membrane 23 can be easily formed at the same time as the electrode 24 is formed.

この素子では、外部要因である湿気が上部金電極24を
透過して感湿膜23に吸収され、その誘電率に変化を生
じる。この変化は、上部金電極24および下部金型4@
22間にお【プる静電容(イ)の変化としてボンディン
グパッド22a、24aを介し電気信号の変化として出
力され、外部の検知回路により湿度が検出される。
In this element, moisture, which is an external factor, passes through the upper gold electrode 24 and is absorbed by the moisture sensitive film 23, causing a change in its dielectric constant. This change is caused by the upper gold electrode 24 and the lower mold 4@
The change in the capacitance (a) that is applied between the two is outputted as a change in an electrical signal via the bonding pads 22a and 24a, and the humidity is detected by an external detection circuit.

第2図、第3図は、この発明の上記1実施例素子の製造
工程を示す図である。次に図面にそって製造工程を説明
しながら、この発明の素子の構成をさらに明らかにする
FIGS. 2 and 3 are diagrams showing the manufacturing process of the above-mentioned first embodiment element of the present invention. Next, the structure of the device of the present invention will be further clarified while explaining the manufacturing process with reference to the drawings.

第2図に示す製造過程では、まず図<a >に示すJ:
うにシリコン基板21の表面に酸化膜21aを形成し、
更にその上に下部金電極22を設(プる。
In the manufacturing process shown in FIG. 2, first J:
An oxide film 21a is formed on the surface of the silicon substrate 21,
Furthermore, a lower gold electrode 22 is provided thereon.

この後図(b)に示すように下部金電極22上に有機物
質からなる感湿材料をスピンコートにより塗布する。感
湿材P31−膜25の厚さは1〜2μmである。次に感
湿材料膜25上の一部に、A1等の金属を図(C)に示
すように側端部がテーパをなすように段階状に多層蒸着
する。この金属膜26の厚さは最大500人程度であり
、またテーパを形成する位置は感湿膜にテーパを形成す
る位置に相当する。このようにして側端部が階段状の金
属膜26が形成されると、この金属膜26をマスクとし
て02アッシャ−ににる感湿材料膜25のエツチングを
行なう。このとき金属マスクの酸素(02)に対する透
過率は膜厚さによって異なり、金属マスクの薄いところ
程エツチング速度が速く、その結果感湿膜25はパター
ニングされ、図(d )に示ずように側端部がデーパ状
の感湿膜23が形成される。この後図((1)に示でよ
うに金属マスク26を除去し、感湿膜上部金電極24を
金の蒸着或はスパッタリングによって形成する(図e)
Thereafter, as shown in Figure (b), a moisture sensitive material made of an organic substance is applied onto the lower gold electrode 22 by spin coating. The thickness of the moisture sensitive material P31-film 25 is 1 to 2 μm. Next, on a part of the moisture-sensitive material film 25, metal such as A1 is vapor-deposited in multiple layers in stages so that the side edges are tapered as shown in Figure (C). The thickness of this metal film 26 is about 500 at most, and the position where the taper is formed corresponds to the position where the taper is formed on the moisture sensitive film. After the metal film 26 with stepped side edges is formed in this way, the moisture-sensitive material film 25 is etched using the metal film 26 as a mask. At this time, the transmittance of the metal mask to oxygen (02) differs depending on the film thickness, and the thinner the metal mask, the faster the etching rate.As a result, the moisture-sensitive film 25 is patterned, and as shown in FIG. A moisture sensitive film 23 having tapered ends is formed. After that, as shown in Figure (1), the metal mask 26 is removed, and a gold electrode 24 on the moisture sensitive film is formed by vapor deposition or sputtering of gold (Figure e).
.

このとき同時に感湿膜23の側部を覆いボンディングパ
ッド24 aが形成される位置まで達する金電極24b
が形成される。またこの上部金電極24の厚さは、湿気
等の感湿膜23への十分な透過度を保持する薄さであっ
て、しかも十分な電導性を保持する厚さ、即ち、数百人
でよい。
At this time, a gold electrode 24b simultaneously covers the side of the moisture sensitive film 23 and reaches the position where the bonding pad 24a is formed.
is formed. The thickness of the upper gold electrode 24 is thin enough to maintain sufficient permeability to the moisture-sensitive membrane 23 for moisture, etc., and also thick enough to maintain sufficient conductivity. good.

第3図に示す製造方法にあっては、図(a )、(b)
に示す、下部金電極22上に感湿材料膜25を形成する
までの経過、および図(d )、(e )に示すエツチ
ングされた感湿膜23上に上部金電極を形成する過程は
、第2図に示した製造方法と同じである。一方この製造
方法では、図(C)に示す金属マスク26の形成過程で
金属マスク蒸着用マスク27の一端を図示するようにく
さび型にして、蒸着金属の回り込みを意図的に生じざぜ
、感湿膜パターニング用金属マスク2Cの側端部にテー
パを形成した点が第2図に示す製造方法と異なった点で
ある。
In the manufacturing method shown in Figure 3, Figures (a) and (b)
The process of forming the moisture-sensitive material film 25 on the lower gold electrode 22 shown in FIG. 2 and the process of forming the upper gold electrode on the etched moisture-sensitive film 23 shown in FIGS. This is the same manufacturing method as shown in FIG. On the other hand, in this manufacturing method, in the process of forming the metal mask 26 shown in FIG. This method differs from the manufacturing method shown in FIG. 2 in that a taper is formed at the side end portion of the metal mask 2C for film patterning.

なお上述の例では、感湿素子の基板としてシリコン基板
上に酸化膜を形成したものを用いているが、あるいはガ
ラス等の絶縁性の基板であっても良いこと勿論である。
In the above example, a silicon substrate on which an oxide film is formed is used as the substrate of the moisture-sensitive element, but it is of course possible to use an insulating substrate such as glass.

また上記感湿材料膜は、外部の湿気に反応してその誘電
率に変化を生じるものであったが、或は導電率に変化を
生じるものであっても良い。
Further, although the above-mentioned moisture-sensitive material film changes its dielectric constant in response to external moisture, it may also change its conductivity.

[発明の効果1 以上実施例を挙げて説明したように、この発明の感湿素
子では、上下の金電極に挾まれた感湿膜に83いてその
側部端面がテーパ状であるため、側面において電極の段
切れの恐れがなくな、す、製造歩留まりおよび信頼性の
向上を図ることが出来る。
[Effect of the Invention 1] As explained above with reference to the embodiments, in the moisture-sensitive element of the present invention, the moisture-sensitive film 83 sandwiched between the upper and lower gold electrodes has a tapered side end surface. In this case, there is no fear of electrode breakage, and manufacturing yield and reliability can be improved.

さらにこのテーパ部分にかかる電極は上部金電極と同時
に形成され、極めて薄く(上部金電極と同じ厚さ)する
ことが出来る。従って従来素子の場合のように極めて厚
い引きおろし電極を形成することによる感湿材料の熱的
変質がなく、各素子間で電気的特性のばらつき等は発生
せず、製造の歩留まりが向上する。また、厚い金引きお
ろし電極を形成することによるコストの増加もなく、更
に感湿膜の面積−杯に誘電容量が取れるため、高い出力
の素子を得ることが出来る。
Furthermore, the electrode over this tapered portion is formed at the same time as the upper gold electrode, and can be made extremely thin (same thickness as the upper gold electrode). Therefore, there is no thermal deterioration of the moisture-sensitive material due to the formation of extremely thick pull-down electrodes as in the case of conventional elements, and variations in electrical characteristics among the elements do not occur, improving manufacturing yield. In addition, there is no increase in cost due to the formation of thick gold-plated electrodes, and since the dielectric capacity can be increased by the area of the moisture-sensitive film, a high-output device can be obtained.

またこの発明の素子の製造方法にあっては、金属膜の厚
さによって酸素の透過率が違うことを利用して、側端部
がテーパ状の金属マスクを用いて02アッシャ−による
エツチングを行っているので、−側端部がテーパ状をな
ん感湿材料膜を容易に形成することができる。
In addition, in the method of manufacturing the device of the present invention, etching is performed using a 02 asher using a metal mask with tapered side edges, taking advantage of the fact that the oxygen permeability varies depending on the thickness of the metal film. Therefore, it is possible to easily form a moisture-sensitive material film having a tapered shape at the negative end.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの発明に係る感湿素子の1実施例を示す断面
図、第2図は第1図に示す素子の製造工程の1例を示す
工程図、第3図は第1図に示す素子の製造工程の他の例
を示す工程図、第4図、第5図は感湿素子の従来例を示
す断面図である。 21・・・シリコン基板 21a・・・酸素膜22・・
・下部金電極  23・・・@湿材料膜24・・・上部
金型4#A  25・・・感湿材料層26・・・金属マ
スク
FIG. 1 is a cross-sectional view showing one embodiment of the moisture-sensitive element according to the present invention, FIG. 2 is a process diagram showing an example of the manufacturing process of the element shown in FIG. 1, and FIG. 3 is the same as shown in FIG. 1. FIGS. 4 and 5 are process diagrams showing other examples of the manufacturing process of the device, and are cross-sectional views showing conventional examples of the moisture-sensitive device. 21...Silicon substrate 21a...Oxygen film 22...
・Lower gold electrode 23...@Wet material film 24...Upper mold 4#A 25...Moisture sensitive material layer 26...Metal mask

Claims (2)

【特許請求の範囲】[Claims] (1)絶縁性の基板と、 上記絶縁性基板上に形成された下部金電極と、外部の湿
度変化に対応してその電気的特性に変化を生じる物質を
材料とし、上記下部金電極上に比較的厚く形成され、側
端部がテーパ状をなす感湿材料膜と、 上記感湿材料膜に外部からの湿気が透過するに十分な薄
さであってかつ十分な導電性を保持する厚さを有し、上
記感湿材料膜の上面とテーパ状をなす側面とを覆い更に
絶縁性基板上にのびて形成された上部金電極と、 上記下部金電極上と上部金電極の絶縁性基板上に伸びた
部分上とにそれぞれ形成され外部回路に接続されるボン
ディングパッド、 からなり、外部の湿度変化に対応する上記感湿材料膜の
電気的特性の変化を上記各電極に設けたボンディングパ
ッドを介して出力することを特徴とする感湿素子。
(1) An insulating substrate, a lower gold electrode formed on the insulating substrate, and a material made of a substance whose electrical characteristics change in response to changes in external humidity; a moisture-sensitive material film formed relatively thickly with tapered side edges, and a thickness that is thin enough to allow moisture from the outside to pass through the moisture-sensitive material film and maintain sufficient conductivity. an upper gold electrode formed to cover the upper surface of the moisture-sensitive material film and the tapered side surface and further extend onto the insulating substrate; and an insulating substrate on the lower gold electrode and the upper gold electrode. a bonding pad formed on each of the upwardly extending portions and connected to an external circuit, and a bonding pad provided on each of the electrodes to change the electrical characteristics of the moisture-sensitive material film in response to changes in external humidity. A moisture sensing element characterized by outputting through.
(2)外部の湿度変化に対応してその電気的特性に変化
を生じる感湿素子を形成するための製造方法であって、 絶縁性の基板上に下部金電極を形成する工程と、上記下
部金電極上に外部の湿度変化に対応してその電気的特性
に変化を生じる材料を塗布して感湿材料膜を形成する工
程と、 上記感湿材料膜上に一側端部がテーパ状をなす比較的薄
い金属膜を形成する工程と、 上記金属膜をパターニングのためのマスクとして用いO
_2アッシャーをかけることにより上記感湿材料膜をエ
ッチングしてその側端部にテーパを形成する工程と、 上記エッチング工程後上記金属マスクを除去する工程と
、 上記金属マスクの除去後上記感湿材料膜上に金を蒸着ま
たはスパッタリングして上記テーパ部分および絶縁性基
板上に伸びる薄い上部金電極を形成する工程と、 上記下部金電極の一部および絶縁性基板上に伸びた上部
金電極の一部にそれぞれボンディングパッドを形成する
工程と、 からなることを特徴とする感湿素子の製造方法。
(2) A manufacturing method for forming a humidity-sensitive element whose electrical characteristics change in response to changes in external humidity, the method comprising: forming a lower gold electrode on an insulating substrate; A step of forming a moisture-sensitive material film by coating a gold electrode with a material whose electrical characteristics change in response to changes in external humidity; and forming a tapered end on one side of the moisture-sensitive material film. A process of forming a relatively thin metal film, and using the metal film as a mask for patterning.
_2 A step of etching the moisture-sensitive material film by applying an asher to form a taper at its side edge; a step of removing the metal mask after the etching step; and a step of removing the moisture-sensitive material after removing the metal mask. forming a thin upper gold electrode extending over the tapered portion and the insulating substrate by depositing or sputtering gold on the film; and a portion of the upper gold electrode extending over the tapered portion and the insulating substrate. 1. A method for manufacturing a moisture-sensitive element, comprising: forming a bonding pad on each portion.
JP32204487A 1987-12-19 1987-12-19 Humidity sensing element and its manufacture Pending JPH01163648A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32204487A JPH01163648A (en) 1987-12-19 1987-12-19 Humidity sensing element and its manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32204487A JPH01163648A (en) 1987-12-19 1987-12-19 Humidity sensing element and its manufacture

Publications (1)

Publication Number Publication Date
JPH01163648A true JPH01163648A (en) 1989-06-27

Family

ID=18139294

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32204487A Pending JPH01163648A (en) 1987-12-19 1987-12-19 Humidity sensing element and its manufacture

Country Status (1)

Country Link
JP (1) JPH01163648A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03167464A (en) * 1989-11-27 1991-07-19 Yamatake Honeywell Co Ltd Humidity-sensitive element and its manufacture
JPH06123725A (en) * 1992-10-09 1994-05-06 Yamatake Honeywell Co Ltd Humidity-sensing element
JPWO2022202290A1 (en) * 2021-03-25 2022-09-29

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03167464A (en) * 1989-11-27 1991-07-19 Yamatake Honeywell Co Ltd Humidity-sensitive element and its manufacture
JPH06123725A (en) * 1992-10-09 1994-05-06 Yamatake Honeywell Co Ltd Humidity-sensing element
JPWO2022202290A1 (en) * 2021-03-25 2022-09-29
WO2022202290A1 (en) * 2021-03-25 2022-09-29 三菱電機株式会社 Substance detecting device, substance detecting system, and semiconductor integrated circuit system

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