JPH01162265U - - Google Patents

Info

Publication number
JPH01162265U
JPH01162265U JP5499188U JP5499188U JPH01162265U JP H01162265 U JPH01162265 U JP H01162265U JP 5499188 U JP5499188 U JP 5499188U JP 5499188 U JP5499188 U JP 5499188U JP H01162265 U JPH01162265 U JP H01162265U
Authority
JP
Japan
Prior art keywords
semiconductor laser
active layer
layer
laser device
alxga
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5499188U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP5499188U priority Critical patent/JPH01162265U/ja
Publication of JPH01162265U publication Critical patent/JPH01162265U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの考案の一実施例による半導体レー
ザ装置を示す断面図、第2図a〜dは第1図の製
造工程を示す断面図、第3図は従来の半導体レー
ザ装置を示す断面図である。図において、1はP
―GaAs基板、2はP―AlxGa―XAs
下クラツド層、3はP―AlxGa―XAs
下クラツド層、4はAlyGaAs活性
層、5はAlxGa―XAs上クラツド層の
拡散領域(電流阻止層)、6はN―AlxGa
―XAs上クラツド層、7はN―AlxGa
―XAs上クラツド層、8はN―GaAsコン
タクト層、9,10は電極を示す。なお、図中、
同一符号は同一、又は相当部分を示す。
FIG. 1 is a sectional view showing a semiconductor laser device according to an embodiment of the invention, FIGS. 2 a to d are sectional views showing the manufacturing process of FIG. 1, and FIG. 3 is a sectional view showing a conventional semiconductor laser device. It is. In the figure, 1 is P
-GaAs substrate, 2 is P-AlxGa 1 -XAs
Lower cladding layer, 3 is P-AlxGa 1 -XAs
Lower cladding layer, 4 is AlyGa 1 - y As active layer, 5 is AlxGa 1 -XAs diffusion region (current blocking layer) of upper cladding layer, 6 is N-AlxGa 1
-XAs upper cladding layer, 7 is N-AlxGa 1
- XAs upper cladding layer; 8 is an N--GaAs contact layer; 9 and 10 are electrodes. In addition, in the figure,
The same reference numerals indicate the same or equivalent parts.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 半導体レーザの発光端面付近において活性層を
含む各層が一様に折れ曲り、さらには、極性が異
なり、かつ、ドーピング量を各々適当に調整した
薄い2つの層で活性層をはさみ込んだことを特徴
とする半導体レーザ装置。
Each layer, including the active layer, is bent uniformly near the light-emitting end face of the semiconductor laser, and the active layer is sandwiched between two thin layers with different polarities and appropriately adjusted doping amounts. Semiconductor laser device.
JP5499188U 1988-04-21 1988-04-21 Pending JPH01162265U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5499188U JPH01162265U (en) 1988-04-21 1988-04-21

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5499188U JPH01162265U (en) 1988-04-21 1988-04-21

Publications (1)

Publication Number Publication Date
JPH01162265U true JPH01162265U (en) 1989-11-10

Family

ID=31280899

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5499188U Pending JPH01162265U (en) 1988-04-21 1988-04-21

Country Status (1)

Country Link
JP (1) JPH01162265U (en)

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