JPH01159682A - Production of hologram - Google Patents

Production of hologram

Info

Publication number
JPH01159682A
JPH01159682A JP31968087A JP31968087A JPH01159682A JP H01159682 A JPH01159682 A JP H01159682A JP 31968087 A JP31968087 A JP 31968087A JP 31968087 A JP31968087 A JP 31968087A JP H01159682 A JPH01159682 A JP H01159682A
Authority
JP
Japan
Prior art keywords
hologram
moisture
atmosphere
moisture content
dry plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP31968087A
Other languages
Japanese (ja)
Other versions
JP2734512B2 (en
Inventor
Masusuke Toda
戸田 益資
Shinji Nanba
晋治 難波
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denso Corp
Original Assignee
NipponDenso Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NipponDenso Co Ltd filed Critical NipponDenso Co Ltd
Priority to JP31968087A priority Critical patent/JP2734512B2/en
Publication of JPH01159682A publication Critical patent/JPH01159682A/en
Application granted granted Critical
Publication of JP2734512B2 publication Critical patent/JP2734512B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE:To maintain the moisture in a photosensitive film a specified rate or below so that a sharp image is easily obtd. at the time of reproduction by adjusting the moisture content as well prior to exposing and executing sealing in a vacuum atmosphere. CONSTITUTION:A dry plate is placed in the atmosphere of the prescribed humidity prior to exposing and is subjected to a 1st moisture content adjusting treatment to adjust the moisture in the photosensitive film to the prescribed rate. The dry plate is placed in the vacuum atmosphere after the development process and is subjected to the 2nd moisture content adjusting treatment to adjust the moisture in the photosensitive film to the prescribed rate or below. The dry plate is thereafter sealed in the atmosphere of a dry gas. Dichromate or silver salt is applicable as a photosensitive material, of which the dichromate is exemplified by preferably ammonium dichromate and is also exemplified by potassium dichromate, sodium dichromate, etc., in addition thereto. The silver salt is exemplified by silver chloride, silver iodide, etc., used as the ordinary photosensitive material for photography. A hologram which has high heat resistance even in high humidity and can be reproduced at a desired wavelength is thereby obtd.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、ゼラチンに重り[tム酸塩等を含有した感光
膜を用いたホログラムの製造方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method for producing a hologram using a photosensitive film containing gelatin as a weight [t-mutate, etc.].

[従来の技術およびその問題点コ 従来、ホログラムの感光材料の1つに、ゼラチンに重ク
ロム酸塩を含有させたものが知られている。すなわち、
例えば、ゼラチンに重クロム酸アンモニウムを含有させ
た感光膜をガラス板上に塗布し、重クロム酸系高分子の
乾板を作成する。そして、この乾板を露光した後に、現
像処理をするものである。
[Prior Art and its Problems] Conventionally, one of the light-sensitive materials for holograms is one in which gelatin contains dichromate. That is,
For example, a photosensitive film made of gelatin containing ammonium dichromate is coated on a glass plate to create a dry plate of dichromate-based polymer. After exposing this dry plate to light, it is subjected to development processing.

ところが、ゼラチンを感光材料として用いると、その含
有水分量の変化により、ゼラチン層の厚さが変わり、こ
のため、記録した干渉ピッチがシール後の干渉ピッチと
大きく異なってしまい、像が消滅してしまうという問題
がある。
However, when gelatin is used as a photosensitive material, the thickness of the gelatin layer changes due to changes in its water content, and as a result, the recorded interference pitch differs greatly from the interference pitch after sealing, causing the image to disappear. There is a problem with putting it away.

このような問題を解決するための技術として、例えば、
特開昭57−173873号公報のものが知られている
。すなわち、ゼラチンからなる感光膜の表面をガラス板
でカバーし、さらに周辺部をエポキシ樹脂によりモール
ドすることにより、ゼラチン中の含有水分量の変動を防
止したり、あるいはガラス板の代わりにポリ◆モノクロ
・パラ・キシレンを真空蒸着することにより、より一層
ゼラチンの含有水分量の変動を防止するものである。
For example, as a technology to solve such problems,
The one disclosed in Japanese Unexamined Patent Publication No. 57-173873 is known. In other words, by covering the surface of a photosensitive film made of gelatin with a glass plate and further molding the peripheral part with epoxy resin, fluctuations in the water content in gelatin can be prevented, or by using poly◆monochrome instead of a glass plate.・Vacuum deposition of para-xylene further prevents fluctuations in the water content of gelatin.

しかし、単なるガラス板によるカバーでは、30℃以上
、湿度60%RH以上の環境下で長時間置かれると、記
録されたホログラムが消失し、また、ポリ・モノクロ・
バラ・キシレンによりシールしたものでも、90℃、湿
度90%RH以上の環境下に長時間置くと再生像が消滅
することがある。また、像の消滅を生じないまでも、ボ
ログラム再生波長が、露光時に使用した記録波長に対し
て短波長側にずれてしまい、再生時の波長を適切に設定
することが困難になるという問題がある。
However, if a cover made of a simple glass plate is left in an environment of 30°C or higher and humidity of 60% RH or higher for a long time, the recorded hologram will disappear, and poly, monochrome,
Even when sealed with rose xylene, the reproduced image may disappear if left in an environment of 90° C. and humidity of 90% RH or higher for a long time. In addition, even if the image does not disappear, the bologram reproduction wavelength shifts to the shorter wavelength side with respect to the recording wavelength used during exposure, making it difficult to appropriately set the reproduction wavelength. be.

また、他の技術として、特開昭61−261766号公
報に記載されているように、ホログラムを作成した後に
、真空乾燥して保護カバーで覆うものも知られているが
、やはり、露光時の乾板に含まれる水分の影響で記録波
長と再生波長との間にずれを生じて再生時に画像が不鮮
明になってしまうという問題があった。
In addition, as another technique, as described in Japanese Patent Application Laid-Open No. 61-261766, there is a method in which a hologram is created, then vacuum-dried and covered with a protective cover, but this also applies during exposure. There has been a problem in that a discrepancy occurs between the recording wavelength and the reproduction wavelength due to the influence of moisture contained in the dry plate, resulting in an image becoming unclear during reproduction.

このように従来のホログラムは、湿度や熱に弱いが、自
動車等のメータ類に使用するには、90℃の耐熱性が必
要であることから、これらに適用可能な技術が望まれて
いた。
As described above, conventional holograms are sensitive to humidity and heat, but in order to be used in meters such as automobiles, they must be heat resistant to 90° C., so there has been a desire for technology that can be applied to these.

本発明は、上記従来の技術の問題点を解決するためにな
されたもので、高湿度中であっても耐熱性の高いホログ
ラムを製造するとともに、さらにこれを発展させて所望
の波長で再生可能なホログラムの製造方法を提供する。
The present invention was made in order to solve the problems of the above-mentioned conventional technology, and it is possible to manufacture a hologram that is highly heat resistant even in high humidity, and further develops the hologram so that it can be reproduced at a desired wavelength. To provide a method for manufacturing a hologram.

[問題点を解決するための手段] 上記問題点を解決するためになされた本発明によるホロ
グラムの製造方法は、 ゼラチンに感光物質を含有させた感光膜を支持体上に有
する乾板を用いて、この乾板の感光膜に露光、現像、シ
ールを施すことによりホログラムを製造するホログラム
の製造方法において、露光前に乾板を所定湿度雰囲気中
に置いて感光膜中の水分を所定量に調整する第1の水分
量調整処理を施し、現像処理後に乾板を真空雰囲気中に
置いて感光膜中の水分を所定量以下に調製する第2の水
分量調整処理を施し、その後に、乾燥ガスの雰囲気中で
シールすることを特徴とするものである。
[Means for Solving the Problems] A method for manufacturing a hologram according to the present invention, which has been made to solve the above problems, uses a dry plate having a photosensitive film on a support, in which gelatin contains a photosensitive substance, In this hologram manufacturing method in which a hologram is manufactured by exposing, developing, and sealing a photoresist film on a dry plate, the first step is to place the dry plate in a predetermined humidity atmosphere and adjust the water content in the photoresist film to a predetermined amount before exposure. After the development process, the dry plate is placed in a vacuum atmosphere to adjust the moisture content in the photosensitive film to a predetermined amount or less. It is characterized by being sealed.

ここで、上記感光物質には、重クロム酸塩または銀塩を
適用でき、そのうち重クロム酸塩としては、好ましくは
、重クロム酸アンモニウムが挙げられるが、他に重クロ
ム酸カリウム、重クロム酸ナトリウム等が挙げられ、ま
た、銀塩としては、通常の写真の感光物質として用いら
れる塩化銀、ヨウ化銀等が挙げられる。
Here, a dichromate or a silver salt can be applied to the above-mentioned photosensitive material.Ammonium dichromate is preferably used as the dichromate, but potassium dichromate, dichromate Examples of the silver salt include silver chloride and silver iodide, which are used as light-sensitive materials for ordinary photography.

上記支持体として、その用途に応じてガラス板、プラス
チック板、金属板などが用いられる。
As the support, a glass plate, a plastic plate, a metal plate, etc. are used depending on the purpose.

露光前の第1の水分量調整処理の好適な態様として、感
光膜中の水分を所定量以下にするために、0、 1〜5
Torrの雰囲気中に、水分量が平衡に達する程度の時
間(例えは、5分量度)だけ乾板をさらす処理がある。
A preferred embodiment of the first water content adjustment process before exposure is 0, 1 to 5 in order to reduce the water content in the photoresist film to a predetermined amount or less.
There is a process in which a dry plate is exposed to a Torr atmosphere for a period of time (for example, 5 minutes) to reach equilibrium in moisture content.

このような第1の水分量調整処理を施すことにより、現
像後の感光膜の厚さを露光の時と同じ厚さに調整するこ
とができ、後述するように記録波長と再生波長とを一致
させることができる。なお、第1の水分量調整処理には
、水分量を素¥く減少させるために、90℃前後の加熱
処理を加えてもよい。また、第1の水分量調整処理の他
の好適な態様として、真空より高い湿度の雰囲気に乾板
を置く処理を施す。この雰囲気の湿度を調整することに
より、記録波長と異なった所望の再生波長を選択できる
By performing this first water content adjustment process, the thickness of the photoresist film after development can be adjusted to the same thickness as during exposure, and as will be described later, the recording wavelength and reproduction wavelength can be matched. can be done. Note that in the first moisture content adjustment process, heat treatment at around 90° C. may be added in order to quickly reduce the moisture content. Further, as another preferred embodiment of the first water content adjustment process, a process of placing the dry plate in an atmosphere with higher humidity than vacuum is performed. By adjusting the humidity of this atmosphere, a desired reproduction wavelength different from the recording wavelength can be selected.

上記露光の条件としては、感光物質の露光に適する感光
域であり、例えば、重クロム酸系高分子の感光膜を用い
た場合には、550nmより短い波長領域である。
The exposure conditions are a photosensitive range suitable for exposing a photosensitive material, and for example, when a photosensitive film of a dichromic acid polymer is used, a wavelength range shorter than 550 nm.

現像後の第2の水分量調整処理の好適な態様の1つは、
0.005〜0.ITorrの雰囲気中に、感光膜中の
水分量が平衡に達する程度の時間(例えは、5分程度)
だけ乾板を置き、感光膜中の水分をほどんど除去する。
One of the preferred aspects of the second moisture content adjustment treatment after development is as follows:
0.005~0. In an ITorr atmosphere for a period of time long enough for the moisture content in the photoresist film to reach equilibrium (for example, about 5 minutes)
Place a drying plate to remove most of the moisture in the photoresist film.

シールは、現像後に外界の湿度の影響を受けて感光膜中
の水分量が変動しないようにするためであり、シールの
手法としては、カバーガラスを用いて光学接着剤でシー
ル処理する。このときの接着剤としては、カバーガラス
とほぼ等しい屈折率で無色透明ものを用いる必要がある
。なお、上記シールを行う際の雰囲気は、感光膜中の水
分量が変動しないような雰囲気に設定することが必要で
あり、つまり、第2の水分量調整処理を真空雰囲気中で
行っているから、乾燥ガス中か、あるいは水分が蒸発す
る高温(例えば105℃)中で水分調整およびシールを
行なってもよい。
The purpose of the seal is to prevent the amount of water in the photosensitive film from changing after development due to the influence of external humidity, and the sealing method is to use a cover glass and seal with an optical adhesive. As the adhesive at this time, it is necessary to use a colorless and transparent adhesive having a refractive index approximately equal to that of the cover glass. It should be noted that the atmosphere when performing the above sealing must be set in such a way that the moisture content in the photoresist film does not fluctuate; in other words, the second moisture content adjustment process is performed in a vacuum atmosphere. Moisture conditioning and sealing may be performed in dry gas, or at high temperatures (eg, 105° C.) where moisture evaporates.

[作用コ 本発明のホログラムの製造方法によれば、現像後に真空
雰囲気中に置く第2の水分量調整処理を行うだけでなく
、露光前にも真空処理等の湿度雰囲気を調整する第1の
水分量調整処理を行っているが、これは、以下に説明す
るように、露光時における湿度雰囲気の違いが再生波長
に大きな変動をもたらすことが本発明者によって見いだ
されたことにより加えられたものである。
[Function] According to the hologram manufacturing method of the present invention, not only is the second moisture content adjustment process performed in a vacuum atmosphere after development, but also the first moisture content adjustment process such as vacuum treatment is performed before exposure. The moisture content adjustment process was added after the inventor discovered that differences in the humidity atmosphere during exposure caused large fluctuations in the reproduced wavelength, as explained below. It is.

すなわち、例えば、ゼラチンに重クロム酸塩を含有させ
た感光膜に露光を行うにあたって、湿度雰囲気を種々に
変えて、514.5nmの記録波長にて露光を行い、現
像後の第2の水分量調整処理の条件を、90℃、O,l
’rorrの真空加熱処理として1時間行うことにより
ホログラムを作成した。そして、再生に最適な波長を探
し、第2図および第3図に示すように、その再生波長と
記録波長の差を縦軸に、露光時の湿度(真空度)を横軸
にとって、その関係を表した。
That is, for example, when exposing a photosensitive film made of gelatin containing dichromate, exposure is performed at a recording wavelength of 514.5 nm in various humidity atmospheres, and the second moisture content after development is The conditions for the adjustment treatment were 90°C, O, l.
A hologram was created by carrying out 1 hour of 'rorr' vacuum heating treatment. Then, we search for the optimal wavelength for reproduction, and as shown in Figures 2 and 3, we plot the difference between the reproduction wavelength and recording wavelength on the vertical axis and the humidity (degree of vacuum) at the time of exposure on the horizontal axis. expressed.

その結果、第2図に示すように露光時の湿度が低くなる
ほど再生波長と記録波長との差は急激に小さくなり、さ
らに第3図に示すように露光時の雰囲気を、真空に近い
0.  ITorr以下にすると、再生波長が記録波長
に一致する。すなわち、現像後の真空乾燥処理(第2の
水分量調整処理)に加えて、露光前にも真空乾燥処理(
第1の水分量調整処理)を行うことにより、露光時のゼ
ラチン中の水分量を一定量以下に低減することができ、
再生波長を記録波長に一致させるには、露光前に真空引
きがよいことに着目したものである。
As a result, as shown in FIG. 2, the lower the humidity at the time of exposure, the sharper the difference between the reproduction wavelength and the recording wavelength becomes.As shown in FIG. When the value is less than ITorr, the reproduction wavelength matches the recording wavelength. That is, in addition to the vacuum drying process (second moisture content adjustment process) after development, the vacuum drying process (second moisture content adjustment process) is also performed before exposure.
By performing the first water content adjustment process), the water content in gelatin at the time of exposure can be reduced to a certain amount or less,
The idea was to draw attention to the fact that vacuuming before exposure is a good way to match the reproduction wavelength with the recording wavelength.

また、第2図から明らかなように、露光前の感光膜中の
水分量を多めに調整することにより、記録波長と違った
所望の波長に再生波長を設定することも可能になる。し
かも、現像後には第2の水分量調整処理により真空雰囲
気中に置かれるから感光膜中には、水分がほとんどなく
、シールによって水分量の変動もない。
Further, as is clear from FIG. 2, by adjusting the amount of water in the photoresist film before exposure to a larger amount, it is also possible to set the reproduction wavelength to a desired wavelength different from the recording wavelength. Moreover, since the photoresist film is placed in a vacuum atmosphere after development through a second moisture content adjustment process, there is almost no moisture in the photoresist film, and the moisture content does not change due to sealing.

[効果] 以上説明したように、本発明によれば、露光前にも水分
量の調整を行っており、これを真空雰囲気中に置いた後
、乾燥雰囲気中でシールすれば、感光膜中の水分を一定
量以下に保つことができるので、長時間、高温状態に置
いても、像が消滅したり、再生波長が記録波長からずれ
たりすることがないので、再生時に容易に鮮明な画像を
得ることができる。
[Effect] As explained above, according to the present invention, the moisture content is adjusted before exposure, and if the film is placed in a vacuum atmosphere and then sealed in a dry atmosphere, the amount of moisture in the photoresist film is reduced. Since the moisture content can be kept below a certain level, the image will not disappear or the reproduced wavelength will not deviate from the recorded wavelength even if left in high temperature conditions for a long time, making it easy to obtain clear images during reproduction. Obtainable.

また、露光前に感光膜中の湿度を高めに設定することに
より記録波長とは異なった所望の再生波長により像を得
ることができる。
Further, by setting the humidity in the photoresist film to a high level before exposure, an image can be obtained at a desired reproduction wavelength different from the recording wavelength.

[実施例] 以下本発明の一実施例を図面にしたがって説明する。[Example] An embodiment of the present invention will be described below with reference to the drawings.

第4図は本実施例の製造方法により製造されたホログラ
ムの断面を示す。このホログラムは、ガラス基板1上に
、重クロム酸アンモニウムをゼラチンに含有させた感光
膜3を形成し、さらに接着剤5によりガラスカバー7で
シールすることにより構成されている。
FIG. 4 shows a cross section of a hologram manufactured by the manufacturing method of this example. This hologram is constructed by forming a photosensitive film 3 containing ammonium dichromate in gelatin on a glass substrate 1, and sealing the film with a glass cover 7 using an adhesive 5.

このようなホログラムを製造するには、第1図に示すよ
うに、まず、水100重量部にゼラチン5重量部と重ク
ロム酸アンモニウム1ffi量を混合して感光材料を調
製し、これをガラス基板上に25nmの厚さで塗布して
感光膜を形成する。次に、このようにして製造した乾板
の感光膜を室温で乾燥する。
To manufacture such a hologram, first, as shown in Figure 1, a photosensitive material is prepared by mixing 100 parts by weight of water with 5 parts by weight of gelatin and 1 ffi amount of ammonium dichromate, and this is placed on a glass substrate. A photoresist film is formed by coating the film to a thickness of 25 nm. Next, the photosensitive film on the dry plate thus produced is dried at room temperature.

次に、露光前の乾板に対して真空乾燥処理(第1の水分
量調製処理)を行って感光膜中の水分を除去する。この
ときの真空度は、0.ITorrで、15分間の処理を
行う。なお、真空乾燥処理は、その真空度において感光
膜中の水分が平衡状態になる程度の時間だけ処理すれは
よいが、真空度をより高くすることにより処理時間を短
縮することができる。したがって、この真空度および時
間は、ゼラチン乾板に塗布されたゼラチンの厚さ等に応
じて適宜変更することが好適である。
Next, the dry plate before exposure is subjected to a vacuum drying process (first moisture content adjustment process) to remove moisture in the photosensitive film. The degree of vacuum at this time is 0. Process at ITorr for 15 minutes. The vacuum drying process may be carried out for a time sufficient to bring the moisture in the photoresist film into an equilibrium state at the degree of vacuum, but the processing time can be shortened by increasing the degree of vacuum. Therefore, it is preferable to change the degree of vacuum and time as appropriate depending on the thickness of gelatin applied to the gelatin dry plate.

次に、この乾板に対して、アルゴンイオンレーザ(51
4,5nm)により露光する。露光時にはゼラチン感光
膜中に水分が入り込まない状態、例えば真空容器内もし
くは水を含まない液中(インデックスマツチング液中)
で露光する。
Next, an argon ion laser (51
4.5 nm). During exposure, no moisture enters the gelatin photosensitive film, such as in a vacuum container or in a liquid that does not contain water (in an index matching liquid).
Expose to light.

次に、0.5重量%の重クロム酸アンモニウムの水溶液
に浸漬した後、20℃の硬膜定着液(コダック社製、ラ
ピッドフィクサー:Rapidfixer)に10分間
浸漬し硬膜化処理を行う。
Next, it is immersed in a 0.5% by weight aqueous solution of ammonium dichromate, and then immersed in a 20° C. hardening fixer (Rapidfixer, manufactured by Kodak) for 10 minutes to perform a hardening treatment.

その後に現像処理を行う。この処理の条件として、25
℃のインプロピルアルコール70%に2分間浸漬後、2
0℃のインプロピルアルコール100%に4分間浸漬し
、その後水洗、湯浴、脱水処理を行う。
After that, development processing is performed. As a condition for this process, 25
After immersion in 70% inpropyl alcohol at ℃ for 2 minutes,
It is immersed in 100% inpropyl alcohol at 0°C for 4 minutes, then washed with water, bathed in hot water, and dehydrated.

その後、90℃の温風下で10分以上乾燥する高温乾燥
を施した後に、真空中で、90℃の雰囲気下における真
空処理(真空加熱乾燥処理:第2の水分量調整処理)を
施し、ゼラチン中の水分を完全に取り除く。このときの
処理条件は、0.005〜0. 1Torrの真空度で
、感光膜中の水分量が平衡になる時間(例えば、5分程
度)行う。
Thereafter, after performing high-temperature drying by drying under hot air at 90°C for 10 minutes or more, vacuum treatment (vacuum heating drying process: second moisture content adjustment process) in a 90°C atmosphere is performed in a vacuum, and the gelatin is Remove the moisture inside completely. The processing conditions at this time were 0.005 to 0. The process is carried out at a vacuum level of 1 Torr for a period of time (for example, about 5 minutes) until the amount of water in the photoresist film reaches equilibrium.

次に、乾燥ガス中でカバーガラス7を用い、乾板を光学
接着剤でシールする。なお、乾燥ガスでシールするのは
、仮に、大気を導入すると、感光膜中の水分量が変動す
ることから、これを防止するためである。
Next, using a cover glass 7 in a dry gas, the dry plate is sealed with an optical adhesive. The purpose of sealing with dry gas is to prevent the moisture content in the photoresist film from changing if air is introduced.

上記のような製造によるホログラムによれば、露光前に
ゼラチン乾板を真空乾燥させてゼラチン中の水分を除去
した後、露光、現像、その後再び真空乾燥することによ
り、露光時とシール終了後における感光膜中の水分がほ
とんど除去され、その水分量の条件を同一にすることが
できる。これにより、ゼラチン感光膜中の水分の含有量
の相違によるゼラチンの膨張に伴って再生波長がずれる
ことを防止することができる。したがって、記録波長に
アルゴンイオンレーザを用いた場合には、再生波長も同
一の波長のレーザで再生することができ、その耐久性も
、90℃、90%RHの環境下に1000時間以上放置
しても回折効率、再生波長に何ら変化が生じない。
According to the hologram produced as described above, the gelatin drying plate is vacuum-dried before exposure to remove moisture in the gelatin, and then exposed, developed, and then vacuum-dried again, so that the exposure to light during exposure and after sealing is completed. Most of the water in the film is removed, and the water content conditions can be kept the same. This can prevent the playback wavelength from shifting due to expansion of gelatin due to differences in water content in the gelatin photosensitive film. Therefore, if an argon ion laser is used for the recording wavelength, the reproduction wavelength can also be reproduced by a laser of the same wavelength, and its durability can be maintained for more than 1000 hours in an environment of 90°C and 90% RH. However, there is no change in diffraction efficiency or reproduction wavelength.

また、他の実施例として、第1の水分量調製処理に真空
乾燥を行う代わりに、真空より高い湿度雰囲気に乾板を
さらして感光膜中の水分量を所定量に調整することによ
り、再生波長を記録波長と違った波長にすることができ
る。このように再生波長を変えることにより、次に述べ
る使用法が可能になる。つまり、レーザ光では特定の波
長しか得られず、再生波長の領域に限定を受けるが、再
生波長として、例えばテレビ画面上で緑色で再生したい
場合に、555nmより長い波長で記録し、第1の水分
調整処理の湿度雰囲気を適宜選択することにより、緑色
の再生波長である555nmに設定可能になる。
As another example, instead of performing vacuum drying in the first moisture content adjustment process, the reproduction wavelength can be set to a wavelength different from the recording wavelength. By changing the reproduction wavelength in this way, the following usage becomes possible. In other words, laser light can only obtain a specific wavelength and is limited to the playback wavelength range, but if you want to play back green on a TV screen, for example, you can record at a wavelength longer than 555 nm and use the first By appropriately selecting the humidity atmosphere for the moisture adjustment process, it is possible to set the green reproduction wavelength to 555 nm.

なお、この場合の湿度雰囲気を調整する手法として、あ
る湿度雰囲気で得られる感光膜中の水分量を、赤外線領
域にある吸収スペクトルで測定することにより予め求め
ておき、このような水分量になる湿度雰囲気で水分量調
整処理を行うことにより実現できる。
In addition, as a method of adjusting the humidity atmosphere in this case, the moisture content in the photoresist film obtained in a certain humidity atmosphere is determined in advance by measuring the absorption spectrum in the infrared region, and the moisture content is determined in advance. This can be achieved by performing moisture content adjustment treatment in a humid atmosphere.

このようなボログラムによる再生画像は、他の画像と重
ねて表示することもでき、多様な表示を行うことができ
る。
Such a reproduced image using a bologram can be displayed in a superimposed manner with other images, allowing various displays to be performed.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例によるホログラムの製造工程
を示す工程図、第2図および第3図は再生波長と記録波
長との差と露光時の湿度(真空度)との関係を示すグラ
フ、第4図は本発明の製造方法により製造されたホログ
ラムを模式的に示す断面図である。 1・・・ガラス基板  3・・・感光膜5・・・接着剤
  7・・・カバーガラス代理人  弁理士  定立 
勉(ほか1名)第1図 第2図 露光的の51度t%RHノ 第3図 第4図
Fig. 1 is a process diagram showing the manufacturing process of a hologram according to an embodiment of the present invention, and Figs. 2 and 3 show the relationship between the difference between the reproduction wavelength and the recording wavelength and the humidity (degree of vacuum) during exposure. The graph and FIG. 4 are cross-sectional views schematically showing a hologram manufactured by the manufacturing method of the present invention. 1...Glass substrate 3...Photoresist film 5...Adhesive 7...Cover glass agent Patent attorney Establishment
Tsutomu (and 1 other person) Figure 1 Figure 2 Exposure of 51 degrees t% RH Figure 3 Figure 4

Claims (1)

【特許請求の範囲】 1 ゼラチンに感光物質を含有させた感光膜を支持体上
に有する乾板を用いて、この乾板の感光膜に露光、現像
、シールを施すことによりホログラムを製造するホログ
ラムの製造方法において、露光前に乾板を所定湿度雰囲
気中に置いて感光膜中の水分を所定量に調整する第1の
水分量調整処理を施し、現像処理後に乾板を真空雰囲気
中に置いて感光膜中の水分を所定量以下に調製する第2
の水分量調整処理を施し、その後に、乾燥ガスの雰囲気
中でシールすることを特徴とするホログラムの製造方法
。 2 上記感光物質は、重クロム酸塩であることを特徴と
する特許請求の範囲第1項記載のホログラムの製造方法
。 3 上記感光物質は銀塩であることを特徴とする特許請
求の範囲第1項記載のホログラムの製造方法。 4 上記第1の水分量調整処理は、乾板を真空雰囲気中
にて処理して感光膜中の水分量を所定量以下にすること
を特徴とする特許請求の範囲第1項ないし第3項いずれ
か記載のホログラムの製造方法。 5 上記第1の水分量調整処理は、記録波長に対して再
生波長が所定の波長差となるような湿度雰囲気で行うこ
とを特徴とする特許請求の範囲第1項ないし第3項いず
れか記載のホログラムの製造方法。
[Scope of Claims] 1. Production of a hologram, in which a hologram is produced by exposing, developing, and sealing the photosensitive film of the dry plate using a dry plate having a photosensitive film on a support in which gelatin contains a photosensitive substance. In this method, before exposure, a dry plate is placed in a predetermined humidity atmosphere to perform a first moisture content adjustment process to adjust the moisture in the photoresist film to a predetermined amount, and after development, the dry plate is placed in a vacuum atmosphere to adjust the moisture content in the photoresist film. The second step is to adjust the moisture content to a predetermined amount or less.
A method for producing a hologram, which comprises subjecting the hologram to water content adjustment treatment, followed by sealing in a dry gas atmosphere. 2. The method for producing a hologram according to claim 1, wherein the photosensitive material is dichromate. 3. The method for producing a hologram according to claim 1, wherein the photosensitive material is a silver salt. 4. Any one of claims 1 to 3, wherein the first water content adjustment process is characterized in that the dry plate is processed in a vacuum atmosphere to reduce the water content in the photosensitive film to a predetermined amount or less. A method for manufacturing a hologram as described in . 5. According to any one of claims 1 to 3, the first water content adjustment process is performed in a humid atmosphere such that the reproduction wavelength has a predetermined wavelength difference with respect to the recording wavelength. hologram manufacturing method.
JP31968087A 1987-12-16 1987-12-16 Hologram manufacturing method Expired - Fee Related JP2734512B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP31968087A JP2734512B2 (en) 1987-12-16 1987-12-16 Hologram manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP31968087A JP2734512B2 (en) 1987-12-16 1987-12-16 Hologram manufacturing method

Publications (2)

Publication Number Publication Date
JPH01159682A true JPH01159682A (en) 1989-06-22
JP2734512B2 JP2734512B2 (en) 1998-03-30

Family

ID=18112992

Family Applications (1)

Application Number Title Priority Date Filing Date
JP31968087A Expired - Fee Related JP2734512B2 (en) 1987-12-16 1987-12-16 Hologram manufacturing method

Country Status (1)

Country Link
JP (1) JP2734512B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0224658A (en) * 1988-07-13 1990-01-26 Nippon Denso Co Ltd Photosensitive film of basic dye sensitizing dichromate system
US5631107A (en) * 1994-02-18 1997-05-20 Nippondenso Co., Ltd. Method for producing optical member
US5672448A (en) * 1992-12-29 1997-09-30 Nippondenso Co., Ltd. Multi-exposure system for hologram

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0224658A (en) * 1988-07-13 1990-01-26 Nippon Denso Co Ltd Photosensitive film of basic dye sensitizing dichromate system
US5672448A (en) * 1992-12-29 1997-09-30 Nippondenso Co., Ltd. Multi-exposure system for hologram
US5631107A (en) * 1994-02-18 1997-05-20 Nippondenso Co., Ltd. Method for producing optical member

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