JPH01152777A - Laser device - Google Patents

Laser device

Info

Publication number
JPH01152777A
JPH01152777A JP62312523A JP31252387A JPH01152777A JP H01152777 A JPH01152777 A JP H01152777A JP 62312523 A JP62312523 A JP 62312523A JP 31252387 A JP31252387 A JP 31252387A JP H01152777 A JPH01152777 A JP H01152777A
Authority
JP
Japan
Prior art keywords
laser
laser beam
central section
reflecting mirror
partial
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62312523A
Other languages
Japanese (ja)
Other versions
JP2526946B2 (en
Inventor
Kimiharu Yasui
公治 安井
Masaaki Tanaka
正明 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP62312523A priority Critical patent/JP2526946B2/en
Priority to KR1019880006600A priority patent/KR910008990B1/en
Priority to DE8888108902T priority patent/DE3879547T2/en
Priority to EP88108902A priority patent/EP0293907B1/en
Priority to US07/201,999 priority patent/US4903271A/en
Publication of JPH01152777A publication Critical patent/JPH01152777A/en
Application granted granted Critical
Publication of JP2526946B2 publication Critical patent/JP2526946B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08059—Constructional details of the reflector, e.g. shape
    • H01S3/08063—Graded reflectivity, e.g. variable reflectivity mirror
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/034—Optical devices within, or forming part of, the tube, e.g. windows, mirrors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06—Construction or shape of active medium
    • H01S3/0602—Crystal lasers or glass lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08081—Unstable resonators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
    • H01S3/0915—Processes or apparatus for excitation, e.g. pumping using optical pumping by incoherent light
    • H01S3/092—Processes or apparatus for excitation, e.g. pumping using optical pumping by incoherent light of flash lamp
    • H01S3/093—Processes or apparatus for excitation, e.g. pumping using optical pumping by incoherent light of flash lamp focusing or directing the excitation energy into the active medium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S2301/00—Functional characteristics
    • H01S2301/20—Lasers with a special output beam profile or cross-section, e.g. non-Gaussian
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06—Construction or shape of active medium
    • H01S3/0602—Crystal lasers or glass lasers
    • H01S3/0615—Shape of end-face
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
    • H01S3/0915—Processes or apparatus for excitation, e.g. pumping using optical pumping by incoherent light
    • H01S3/092—Processes or apparatus for excitation, e.g. pumping using optical pumping by incoherent light of flash lamp

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Lasers (AREA)

Abstract

PURPOSE:To extract large-output laser beams in high quality by using a stabilized type resonator composed of a partial reflecting mirror having constant partial reflectivity at a central section and having constant partial reflectivity lower than that at the central section in the peripheral section of the central section and a total reflecting mirror. CONSTITUTION:Laser beams 7, 8 are extracted from a laser medium 5 by employing a stabilized type resonator consisting of a partial reflecting mirror 2 having constant partial reflectivity at a central section 3 and having constant partial reflectivity lower than that at the central section in the peripheral section of the central section and a total reflecting mirror 4. Consequently, convex beams, a central section of which is not very high, are acquired in the resonator and beams having the uniform intensity distribution of intermediate shrinking on the outside of the resonator. Accordingly, laser beams having high quality can be taken out stably up to a large output without deforming the partial reflecting mirror.

Description

【発明の詳細な説明】 ［産業上の利用分野コ この発明は、レーザ装置、とくにそのレーザビームの高
品質化に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a laser device, and particularly to improving the quality of its laser beam.

［従来の技術］ 第６図は例えは特開昭６２−１２４７８８号公報に記載
の従来のレーザ装置を示す断面構成図である。図におい
てり１）は部分反射鏡、（２）は誘電体等を主成分とす
る部分反射膜である。（３０）は全反鏡膜であり、この
場合は金属の薄膜で、部分反射鏡の中央部に形成されて
いる。（４）は全反射鏡、（５）はレーザ媒質であり、
ＣＯ２レーザ等のガスレーザを例にとれば、放電等によ
り励起されたガス、ＹＡＧレーザ等のガラスレーザを例
にとれば、フラッシュランプ等により励起されたガラス
である。（７）は反射鏡（以下ミラーと記す）（１）、
（４）で構成される安定型共振器内に発生したレーザビ
ーム、（６）はこのレーザビームの外形を制限するアパ
ーチャ、（８）は外部に取り出されたレーザビーム、（
９）は無反射膜である。[Prior Art] FIG. 6 is a cross-sectional configuration diagram showing a conventional laser device described in, for example, Japanese Unexamined Patent Publication No. 124788/1983. In the figure, 1) is a partially reflecting mirror, and 2) is a partially reflecting film whose main component is a dielectric material. (30) is a fully reflective mirror film, in this case a thin metal film formed in the center of the partially reflective mirror. (4) is a total reflection mirror, (5) is a laser medium,
For example, a gas laser such as a CO2 laser is a gas excited by an electric discharge or the like, and a glass laser such as a YAG laser is a glass excited by a flash lamp or the like. (7) is a reflecting mirror (hereinafter referred to as mirror) (1),
(4) is a laser beam generated within a stable resonator, (6) is an aperture that limits the outer shape of this laser beam, (8) is a laser beam taken out to the outside, (
9) is a non-reflective film.

次に動作について説明する。Next, the operation will be explained.

光共振器内を往復するレーザビーム（７）は、レーザ媒
質（５）により増幅され、−室以上の大きさになるとそ
の一部がレーザビーム（８）として外部に取り出される
。The laser beam (7) reciprocating within the optical resonator is amplified by the laser medium (5), and when it reaches a size larger than the -chamber, a part of it is taken out as a laser beam (8).

光共振器内に発生するレーザビームの伝帳方向と垂直方
向の強度分布を考えると、光共振器中央近傍は全反射膜
（３０）のためこの中心近傍のレーザビームは、全反射
膜（３０）の回りに回折として失われるのみて、損失が
少ない。このことから中央近傍に著し・く高い強度分布
を持つレーザビーム（７）が先兵Ｉ辰器内に発生するこ
とになる。Considering the intensity distribution of the laser beam generated in the optical resonator in the direction perpendicular to the propagation direction, since the area near the center of the optical resonator is a total reflection film (30), the laser beam near the center is affected by the total reflection film (30). ) is only lost as diffraction around the rays, so the loss is small. As a result, a laser beam (7) having a significantly high intensity distribution near the center is generated within the vanguard I radiator.

第７図（ａ）（ｂ）（ｃ）は各々従来のレーザ装置にお
けるレーザビームの強度分布を示す分布図であり、横軸
は動径方向距離である。第７図（ａ）に示すように光共
振器内には中央部に高い強度をもつレーザビームが発生
する。一方、部分反射ミラー（１）の中央部は全反射膜
であり、従ってレーザビームをほとんど透過させない。FIGS. 7(a), 7(b), and 7(c) are distribution diagrams each showing the intensity distribution of a laser beam in a conventional laser device, and the horizontal axis represents the distance in the radial direction. As shown in FIG. 7(a), a laser beam with high intensity is generated in the center of the optical resonator. On the other hand, the central part of the partial reflection mirror (1) is a total reflection film, and therefore hardly transmits the laser beam.

このことから、外に取り出されるレーザビーム（８）は
第７図（ｂ）に示すように、その強度分布は中央部のな
いレーザビームとなる。From this, the laser beam (8) taken out to the outside has an intensity distribution without a central portion, as shown in FIG. 7(b).

しかしながら、このレーザビームはレンズ等で集光する
と再び第７図（ｃ）に示すように中高となり、このレー
ザビームを用いて効率のよいレーザ加工を行なうことが
できる。However, when this laser beam is focused by a lens or the like, it becomes medium-height again as shown in FIG. 7(c), and efficient laser processing can be performed using this laser beam.

［発明が解決しようとする問題点コ 従来のレーザ装置は以上のように構成されていたので大
出力レーザビームを取り出そうとすると共振器中央部で
著し・く高いビーム強度となり、中央部の全反射膜を破
損したり、またレーザビーム（８）は部分反射ミラーよ
りドーナツ状に出射するため、部分反射ミラー内部に不
均一な温度分布、従って不均一な応力分布を発生させ、
ビーム品質が著しく悪化するなとの問題点があった。[Problems to be solved by the invention] Conventional laser devices were constructed as described above, so when trying to extract a high-output laser beam, the beam intensity was extremely high at the center of the resonator, and the entire center area was In addition, since the laser beam (8) is emitted from the partial reflection mirror in a donut shape, it may cause uneven temperature distribution and therefore uneven stress distribution inside the partial reflection mirror.
The problem was that the beam quality deteriorated significantly.

この発明は上記のような問題点を解決するためになされ
たものであり、大出力レーザビーｌ、を高品質で取り出
すことのできるレーザ装置を得ろことを目的とする。The present invention was made to solve the above-mentioned problems, and an object of the present invention is to provide a laser device that can extract a high-power laser beam with high quality.

［問題点を解決するための手段］ この発明に係わるレーザ装置は、中央部でこ一定の部分
反射率を持ち、その周囲部に上記中央部の反射率より低
い一定の部分反射率な持つ部分反射鏡と、全反射鏡とに
より構成された安定型共振器をもちいて、レーザ媒質よ
りレーザビームを敗り出すよう（こ構成したものである
。[Means for Solving the Problems] The laser device according to the present invention has a central part having a constant partial reflectance, and a peripheral part having a constant partial reflectance lower than the central part. A stable resonator composed of a reflecting mirror and a total reflecting mirror is used to emit a laser beam from a laser medium.

［作用］ この発明における部分反射ミラーは共振器内部に中高の
レーザビームを発生させるとともに、中央部のレーザビ
ームを一部透過することにより、中央部の強度分布を下
げ、同時に外部に中高のレーザビームを出力する。[Function] The partially reflecting mirror of the present invention generates a medium-high laser beam inside the resonator, and also transmits a portion of the laser beam in the center to reduce the intensity distribution in the center, and at the same time generates a medium-high laser beam outside. Output a beam.

［実施例］ 以下、この発明の一実施例を図について説明する。[Example] An embodiment of the present invention will be described below with reference to the drawings.

第１図において、（１）は部分反射ミラー、（２）は誘
電体等を主成分とする低反射部分反射膜であり、例えは
Ｔ　ｈ　Ｆ４、Ｚ　ｎ　Ｓ　ｅ二層よりなり、一定の部
分反射率を有する。（３）は高反射部分反射膜であり、
ミラー（１）の中央部に設けられ、その周囲部には上記
部分反射膜（２）が設けられている。また、この部分反
射膜（３）は例えばＴ　＋＋　Ｆ４、Ｚｎ５ｅｌ！！Ｉ
ｆ層よりなる多層膜で、部分反射膜（２）より高い一定
の部分反射率を有する。In Fig. 1, (1) is a partial reflection mirror, and (2) is a low-reflection partial reflection film whose main component is a dielectric. Has partial reflectance. (3) is a highly reflective partially reflective film,
It is provided at the center of the mirror (1), and the partially reflective film (2) is provided at its periphery. Further, this partially reflective film (3) is, for example, T++F4, Zn5el! ! I
It is a multilayer film consisting of an f-layer and has a constant partial reflectance higher than that of the partially reflective film (2).

（４）は全反射ミラー、（５）はレーザ媒質であり、Ｃ
Ｏ２レーザ等のガスレーザを例にとれは、放電等により
励起されたガス、Ｙ　Ａ　Ｇレーザ等のガラスレーザを
例にとれは、フラッシュランプ等により励起されたガラ
スである。（６）はシ≠レーザビームの外形を制限する
アパーチャ、（７）はミラー（１）、（４）で構成され
る安定型共振器内に発生したレーザビーム、（８）は外
部に取り出されたレーザビーム、（９）は無反射膜であ
る。(4) is a total reflection mirror, (5) is a laser medium, and C
For example, a gas laser such as an O2 laser is a gas excited by an electric discharge or the like, and a glass laser such as a YAG laser is a glass excited by a flash lamp or the like. (6) is an aperture that limits the outer shape of the laser beam, (7) is a laser beam generated within a stable resonator composed of mirrors (1) and (4), and (8) is a laser beam that is taken out to the outside. The laser beam (9) is a non-reflection film.

次に動作について説明する。Next, the operation will be explained.

光共振器内を往復するレーザビーム（７）は、レーザ媒
質（５）により増幅され、一定態上の大きさになるとそ
の一部がレーザビーム（８）として外部に取り出される
。The laser beam (7) reciprocating within the optical resonator is amplified by the laser medium (5), and when it reaches a constant size, a part of it is extracted to the outside as a laser beam (8).

光共振器内に発生するレーザビームの転軸方向と垂直方
向の強度分布を考えると、先兵振器中央近傍は高反射部
分反射膜（３）のためこの中心近傍のレーザビームは、
損失が少ない。このことから中央近傍に高い強度分布を
持つレーザビーム（７）が光共振器内に発生することに
なる。Considering the intensity distribution of the laser beam generated in the optical resonator in the direction perpendicular to the axis of rotation, the laser beam near the center of the vanguard is
Less loss. As a result, a laser beam (7) having a high intensity distribution near the center is generated within the optical resonator.

第２図（ａ）（ｂ）は各々この発明の一実施例によるＣ
Ｏ２レーザ装置におけるレーザビームの強度分布を示す
分布図であり、横軸は動径方向距離である。FIGS. 2(a) and 2(b) each show C according to an embodiment of the present invention.
It is a distribution diagram showing the intensity distribution of a laser beam in an O2 laser device, and the horizontal axis is the distance in the radial direction.

第２図（ａ）は共振器内部のレーザビームを、第２（ｇ
（Ｃ）は共振器外部のレーザビームの強度を示す。ここ
てミラー（１）１．（４）の曲率は２０ｍ、２０ｍ、共
振器長は２．５ｍ、アパーチャ（６）の内径は２０ｍｍ
、反射膜（３）の外径は１２ｍｍ、反射膜（２）、（３
）の反射率はそれぞれ１７％、５０％である。第２図か
ら共振器内外に中づまり状のレーザビームが得られてい
ることがわかる。なお、第２図（ａ）の点線は同一レー
ザ出力での従来例によるものだが、比較するとこの発明
のものでは中央部のビーム強度が著しく小さくなってい
ることがわかる。また、第３図はさらにこのレーザビー
ムをレンズで集光したパターンを示すが、中高によく集
光されているのがわかる。Figure 2 (a) shows the laser beam inside the resonator in the second (g)
(C) shows the intensity of the laser beam outside the resonator. Kokote mirror (1) 1. The curvature of (4) is 20 m, the resonator length is 2.5 m, and the inner diameter of aperture (6) is 20 mm.
, the outer diameter of the reflective film (3) is 12 mm, the reflective film (2), (3
) are 17% and 50%, respectively. From FIG. 2, it can be seen that a jammed laser beam is obtained inside and outside the resonator. Note that the dotted line in FIG. 2(a) is for the conventional example with the same laser output, but when compared, it can be seen that the beam intensity at the center of the invention is significantly smaller. Furthermore, FIG. 3 shows a pattern in which this laser beam is focused by a lens, and it can be seen that the laser beam is well focused in the middle and high areas.

なお上記実施例では部分反射膜（２）により部分反射率
を得る構成を示したが、第４図に示すように反射膜を施
さない無コートとすることにより部分反射率を得てもよ
い。In the above embodiment, a configuration was shown in which partial reflectance was obtained by the partial reflective film (2), but as shown in FIG. 4, partial reflectance may be obtained by leaving the reflective film uncoated.

また、この実施例では部分反射膜（２）、（３）を通過
するレーザビーム間の位相差が小さく、問題にならなっ
かったが、これが大きくなるとレーザビームの集光性が
悪化する。この場合には、第５図に示すように、例えは
部分反射ミラーの外側に段差（１００）をもうけて、部
分反射膜（２）、（３）を通過するレーザビームにそれ
ぞれ異なる光路長を与え、この位相差を打ち消すように
すれば良い。Further, in this example, the phase difference between the laser beams passing through the partially reflective films (2) and (3) was small and did not pose a problem, but if this becomes large, the focusing ability of the laser beam will deteriorate. In this case, as shown in FIG. 5, for example, a step (100) may be provided on the outside of the partially reflecting mirror to provide different optical path lengths to the laser beams passing through the partially reflecting films (2) and (3). This phase difference can be canceled out.

［発明の効果］ 以−ヒのように、この発明によれば中央部に一定の部分
反射率を持ち、その周囲部に上記中央部の反射率より低
い一定の部分反射率を持つ部分反射鏡と、全反射鏡とに
より構成された安定型共振器をもちいて、レーザ媒質よ
りレーザビームを取り出すようにしたので、共振器内部
には中央部があまり高くない中高のビームを、外部には
中づまりの均一強度分布のビームが得られ、部分反射鏡
の変形を招くことなく大出力まで安定して高品質のレー
ザビー１１を取り出すことができる効果がある。[Effects of the Invention] As described below, according to the present invention, there is provided a partially reflecting mirror having a constant partial reflectance at the center and a constant partial reflectance lower than the reflectance at the center at the periphery. The laser beam is extracted from the laser medium by using a stable resonator composed of a total reflection mirror and a total reflection mirror, so a medium-high beam with a not very high center is placed inside the resonator, and a medium-high beam is placed outside. A beam with a uniform intensity distribution can be obtained, and a high-quality laser beam 11 can be stably extracted up to a large output without causing deformation of the partial reflecting mirror.

【図面の簡単な説明】[Brief explanation of the drawing]

第１図はこの発明の一実施例によるレーザ装置を示す断
面構成図、第２図（ａ　”）　（１１）、および第３図
は各々この発明の一実施例によるＣ　Ｏ２レーザ装置に
おけるレーザビームの強度分布を示す分布図、第４図、
および第５図は各々この発明の他の実施例によるレーザ
装置を示す断面構成図、第６図は従来のレーザ装置を示
す断面構成図、並びに第７図（ａ　）　（ｂ　）　（ｃ
　）は各々従来のレーザ装置におけるレーザビームの強
度分布を示す分布図である。 図において、（＋）は部分反射鏡、（２）、（３）は部
分反射膜、（４）は全反射鏡、（５）はレーザ媒質、（
７）、（８）はレーザビーム、（１００）は段差である
。 なお、図中、同一符号は同一または相当部分を示す。FIG. 1 is a cross-sectional configuration diagram showing a laser device according to an embodiment of the present invention, FIG. 2 (a ”) (11), and FIG. Fig. 4 is a distribution diagram showing the intensity distribution of
and FIG. 5 are cross-sectional configuration diagrams showing laser devices according to other embodiments of the present invention, FIG. 6 is a cross-sectional configuration diagram showing a conventional laser device, and FIGS. 7(a), (b), and (c).
) are distribution diagrams showing the intensity distribution of the laser beam in each conventional laser device. In the figure, (+) is a partial reflection mirror, (2), (3) are partial reflection films, (4) is a total reflection mirror, (5) is a laser medium, (
7) and (8) are laser beams, and (100) is a step. In addition, in the figures, the same reference numerals indicate the same or corresponding parts.

Claims (2)

【特許請求の範囲】[Claims] （１）　中央部に一定の部分反射率を持ち、その周囲部
に上記中央部の反射率より低い一定の部分反射率を持つ
部分反射鏡と、全反射鏡とにより構成された安定型共振
器をもちいて、レーザ媒質よりレーザビームを取り出す
ように構成したレーザ装置。(1) A stable resonator composed of a partial reflector that has a constant partial reflectance at the center and a constant partial reflectance that is lower than the reflectance at the center around the center, and a total reflector. A laser device configured to extract a laser beam from a laser medium using （２）　中央部と周囲部とを通過するレーザビーム間の
位相差を調整する手段をもうけた特許請求の範囲第１項
記載のレーザ装置。(2) The laser device according to claim 1, further comprising means for adjusting the phase difference between the laser beams passing through the central portion and the peripheral portion.
JP62312523A 1987-06-03 1987-12-10 Laser device Expired - Lifetime JP2526946B2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP62312523A JP2526946B2 (en) 1987-12-10 1987-12-10 Laser device
KR1019880006600A KR910008990B1 (en) 1987-06-03 1988-06-02 Laser apparatus
DE8888108902T DE3879547T2 (en) 1987-06-03 1988-06-03 LASER APPARATUS.
EP88108902A EP0293907B1 (en) 1987-06-03 1988-06-03 Laser apparatus
US07/201,999 US4903271A (en) 1987-06-03 1988-06-03 Laser apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62312523A JP2526946B2 (en) 1987-12-10 1987-12-10 Laser device

Publications (2)

Publication Number Publication Date
JPH01152777A true JPH01152777A (en) 1989-06-15
JP2526946B2 JP2526946B2 (en) 1996-08-21

Family

ID=18030251

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62312523A Expired - Lifetime JP2526946B2 (en) 1987-06-03 1987-12-10 Laser device

Country Status (1)

Country Link
JP (1) JP2526946B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5506858A (en) * 1992-10-21 1996-04-09 Mitsubishi Denki Kabushiki Kaisha Laser system with transverse mode selecting output coupler
JP2013502716A (en) * 2009-08-20 2013-01-24 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ Vertical cavity surface emitting laser device with angle selective feedback
JP2016082208A (en) * 2014-10-22 2016-05-16 ファナック株式会社 Laser oscillator improving beam quality

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5039488A (en) * 1973-08-10 1975-04-11
JPS61199686A (en) * 1985-03-01 1986-09-04 Mitsubishi Electric Corp Unstable laser resonator

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5039488A (en) * 1973-08-10 1975-04-11
JPS61199686A (en) * 1985-03-01 1986-09-04 Mitsubishi Electric Corp Unstable laser resonator

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5506858A (en) * 1992-10-21 1996-04-09 Mitsubishi Denki Kabushiki Kaisha Laser system with transverse mode selecting output coupler
JP2013502716A (en) * 2009-08-20 2013-01-24 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ Vertical cavity surface emitting laser device with angle selective feedback
JP2016082208A (en) * 2014-10-22 2016-05-16 ファナック株式会社 Laser oscillator improving beam quality

Also Published As

Publication number Publication date
JP2526946B2 (en) 1996-08-21

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