JPH01145440U - - Google Patents

Info

Publication number
JPH01145440U
JPH01145440U JP4189888U JP4189888U JPH01145440U JP H01145440 U JPH01145440 U JP H01145440U JP 4189888 U JP4189888 U JP 4189888U JP 4189888 U JP4189888 U JP 4189888U JP H01145440 U JPH01145440 U JP H01145440U
Authority
JP
Japan
Prior art keywords
ion
electrode substrate
control electrode
base member
recording head
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4189888U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP4189888U priority Critical patent/JPH01145440U/ja
Publication of JPH01145440U publication Critical patent/JPH01145440U/ja
Pending legal-status Critical Current

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  • Dot-Matrix Printers And Others (AREA)
  • Printers Or Recording Devices Using Electromagnetic And Radiation Means (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの考案に係るイオン流記録ヘツドの
実施例1を示す断面説明図、第2図はその分解斜
視図、第3図は第1図中部拡大図、第4図は実
施例1に係るイオン流記録ヘツドの長手方向のス
リツト幅変化を示すグラフ図、第5図はこの考案
に係るイオン流記録ヘツドの実施例2を示す断面
説明図、第6図はその分解斜視図、第7図は第5
図中部拡大図、第8図は従来におけるイオン流
記録ヘツドの一例を示す断面説明図である。 [符号の説明]、1……ベースプレート(ベー
ス部材)、2……イオン生成ユニツト、3……放
電ワイヤ(イオン生成部)、4……シールド(イ
オン生成部)、6……イオン排出路、7……制御
電極基板、7a……制御電極、9……イオン流制
御スリツト、10……変位量調整手段、41……
調整ねじ(調整部材)、51……板ばね、53…
…付勢力調整ねじ(付勢力調整部材)。
FIG. 1 is a cross-sectional explanatory view showing Example 1 of the ion flow recording head according to this invention, FIG. 2 is an exploded perspective view thereof, FIG. 3 is an enlarged view of the middle part of FIG. 5 is a cross-sectional explanatory view showing Example 2 of the ion current recording head according to this invention; FIG. 6 is an exploded perspective view thereof; FIG. The figure is number 5
FIG. 8, an enlarged view of the middle part of the figure, is an explanatory cross-sectional view showing an example of a conventional ion flow recording head. [Explanation of symbols] 1...Base plate (base member), 2...Ion generation unit, 3...Discharge wire (ion generation section), 4...Shield (ion generation section), 6...Ion discharge path, 7... Control electrode substrate, 7a... Control electrode, 9... Ion flow control slit, 10... Displacement adjustment means, 41...
Adjustment screw (adjustment member), 51... Leaf spring, 53...
...Biasing force adjustment screw (biasing force adjustment member).

Claims (1)

【実用新案登録請求の範囲】 (1) ベース部材1と、 このベース部材1に固定され、内部にイオン生
成部3,4が設けられると共にこのイオン生成部
3,4に連通するイオン排出路6が形成されるイ
オン生成ユニツト2と、 上記ベース部材1に一端が固定されてイオン生
成ユニツト2との間でイオン排出路6に連通する
イオン流制御スリツト9が形成されると共にこの
イオン流制御スリツト9に面した箇所に画素密度
に応じて配列される制御電極7aを有する制御電
極基板7と、 この制御電極基板7の自由端側の変位量を調整
する変位量調整手段10とを備えていることを特
徴とするイオン流記録ヘツド。 (2) 変位量調整手段10は、上記制御電極基板
7の自由端縁に対向するベース部材1部分に対し
て適宜間隔毎に調整自在に取付けられ且つその先
端が制御電極基板7の自由端縁に当接する調整部
材41で構成されていることを特徴とする請求項
1記載のイオン流記録ヘツド。 (3) 変位量調整手段10は、一端がベース部材
1に取付けられて他端が上記制御電極基板7の自
由端に当接する板ばね51と、この板ばね51の
制御電極基板7への付勢力を適宜調整する付勢力
調整部材53とで構成されていることを特徴とす
る請求項1記載のイオン流記録ヘツド。
[Claims for Utility Model Registration] (1) A base member 1; and an ion discharge channel 6 fixed to the base member 1, having ion generating units 3 and 4 provided therein and communicating with the ion generating units 3 and 4; An ion flow control slit 9 communicating with the ion discharge path 6 is formed between the ion generation unit 2 having one end fixed to the base member 1 and communicating with the ion discharge passage 6. A control electrode substrate 7 having control electrodes 7a arranged according to pixel density at a location facing 9, and a displacement adjustment means 10 for adjusting the displacement amount of the free end side of the control electrode substrate 7. An ion flow recording head characterized by: (2) The displacement adjusting means 10 is attached to a portion of the base member 1 facing the free edge of the control electrode substrate 7 so as to be freely adjustable at appropriate intervals, and its tip is attached to the free edge of the control electrode substrate 7. 2. The ion flow recording head according to claim 1, further comprising an adjusting member (41) that comes into contact with the ion current recording head. (3) The displacement adjustment means 10 includes a leaf spring 51 whose one end is attached to the base member 1 and whose other end abuts the free end of the control electrode substrate 7, and the attachment of the leaf spring 51 to the control electrode substrate 7. 2. The ion flow recording head according to claim 1, further comprising a biasing force adjusting member 53 for appropriately adjusting the force.
JP4189888U 1988-03-31 1988-03-31 Pending JPH01145440U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4189888U JPH01145440U (en) 1988-03-31 1988-03-31

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4189888U JPH01145440U (en) 1988-03-31 1988-03-31

Publications (1)

Publication Number Publication Date
JPH01145440U true JPH01145440U (en) 1989-10-05

Family

ID=31268324

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4189888U Pending JPH01145440U (en) 1988-03-31 1988-03-31

Country Status (1)

Country Link
JP (1) JPH01145440U (en)

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