JPH01137528U - - Google Patents
Info
- Publication number
- JPH01137528U JPH01137528U JP3265088U JP3265088U JPH01137528U JP H01137528 U JPH01137528 U JP H01137528U JP 3265088 U JP3265088 U JP 3265088U JP 3265088 U JP3265088 U JP 3265088U JP H01137528 U JPH01137528 U JP H01137528U
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- outer electrode
- inner electrode
- processing apparatus
- plasma processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- Drying Of Semiconductors (AREA)
Description
第１図は本考案のプラズマ処理装置の電極構造
の斜視図、第２図は従来のプラズマ処理装置の電
極構造の斜視図である。
図中、１……外側電極、２ａ……外側電極の上
端、２ｂ……外側電極の下端、３……内側電極、
４ａ……内側電極の上端、４ｂ……内側電極の下
端、５……筒長、６……高周波電源。
FIG. 1 is a perspective view of an electrode structure of a plasma processing apparatus according to the present invention, and FIG. 2 is a perspective view of an electrode structure of a conventional plasma processing apparatus. In the figure, 1... outer electrode, 2a... upper end of outer electrode, 2b... lower end of outer electrode, 3... inner electrode,
4a...Top end of inner electrode, 4b...Lower end of inner electrode, 5...Cylinder length, 6...High frequency power source.
Claims (1)
理装置において、内側電極を外側電極よりも筒長
を長くし、該内側電極を、該外側電極の両端部か
ら突出させたことを特徴とするプラズマ処理装置
。 A plasma processing apparatus in which two electrodes are arranged in a concentric cylindrical shape, characterized in that the inner electrode has a longer cylindrical length than the outer electrode, and the inner electrode protrudes from both ends of the outer electrode. Processing equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3265088U JPH0713216Y2 (en) | 1988-03-14 | 1988-03-14 | Plasma processing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3265088U JPH0713216Y2 (en) | 1988-03-14 | 1988-03-14 | Plasma processing device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01137528U true JPH01137528U (en) | 1989-09-20 |
| JPH0713216Y2 JPH0713216Y2 (en) | 1995-03-29 |
Family
ID=31259203
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3265088U Expired - Lifetime JPH0713216Y2 (en) | 1988-03-14 | 1988-03-14 | Plasma processing device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0713216Y2 (en) |
-
1988
- 1988-03-14 JP JP3265088U patent/JPH0713216Y2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0713216Y2 (en) | 1995-03-29 |