JPH01135872A - Cold-setting composition - Google Patents
Cold-setting compositionInfo
- Publication number
- JPH01135872A JPH01135872A JP29362087A JP29362087A JPH01135872A JP H01135872 A JPH01135872 A JP H01135872A JP 29362087 A JP29362087 A JP 29362087A JP 29362087 A JP29362087 A JP 29362087A JP H01135872 A JPH01135872 A JP H01135872A
- Authority
- JP
- Japan
- Prior art keywords
- group
- silane compound
- silyl group
- formula
- vinyl polymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 12
- -1 silane compound Chemical class 0.000 claims abstract description 39
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims abstract description 23
- 229920002554 vinyl polymer Polymers 0.000 claims abstract description 20
- 229910000077 silane Inorganic materials 0.000 claims abstract description 16
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 9
- 239000003054 catalyst Substances 0.000 claims abstract description 9
- 125000003710 aryl alkyl group Chemical group 0.000 claims abstract description 4
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 3
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 claims abstract description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 8
- 239000000126 substance Substances 0.000 claims description 5
- 125000003118 aryl group Chemical group 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract description 8
- 239000011248 coating agent Substances 0.000 abstract description 6
- 238000000576 coating method Methods 0.000 abstract description 6
- 229920006163 vinyl copolymer Polymers 0.000 abstract description 4
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 abstract description 3
- 239000012975 dibutyltin dilaurate Substances 0.000 abstract description 3
- 229910052736 halogen Inorganic materials 0.000 abstract description 3
- 125000005843 halogen group Chemical group 0.000 abstract description 2
- 239000000463 material Substances 0.000 abstract description 2
- 125000004429 atom Chemical group 0.000 abstract 1
- 238000013329 compounding Methods 0.000 abstract 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 17
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 13
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 230000015572 biosynthetic process Effects 0.000 description 12
- 238000003786 synthesis reaction Methods 0.000 description 12
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 10
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 239000003973 paint Substances 0.000 description 9
- 229920005989 resin Polymers 0.000 description 9
- 239000011347 resin Substances 0.000 description 9
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 8
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 8
- 239000000178 monomer Substances 0.000 description 8
- PYOKUURKVVELLB-UHFFFAOYSA-N trimethyl orthoformate Chemical compound COC(OC)OC PYOKUURKVVELLB-UHFFFAOYSA-N 0.000 description 8
- 239000002253 acid Substances 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 7
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 238000006116 polymerization reaction Methods 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 5
- 150000002430 hydrocarbons Chemical group 0.000 description 5
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 5
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 5
- 239000005052 trichlorosilane Substances 0.000 description 5
- 239000008096 xylene Substances 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- 238000000862 absorption spectrum Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- CCCMONHAUSKTEQ-UHFFFAOYSA-N octadec-1-ene Chemical compound CCCCCCCCCCCCCCCCC=C CCCMONHAUSKTEQ-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- DCTOHCCUXLBQMS-UHFFFAOYSA-N cis-undecene Natural products CCCCCCCCCC=C DCTOHCCUXLBQMS-UHFFFAOYSA-N 0.000 description 3
- 239000012024 dehydrating agents Substances 0.000 description 3
- KTQYJQFGNYHXMB-UHFFFAOYSA-N dichloro(methyl)silicon Chemical compound C[Si](Cl)Cl KTQYJQFGNYHXMB-UHFFFAOYSA-N 0.000 description 3
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 3
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 3
- BUZRAOJSFRKWPD-UHFFFAOYSA-N isocyanatosilane Chemical compound [SiH3]N=C=O BUZRAOJSFRKWPD-UHFFFAOYSA-N 0.000 description 3
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 3
- 239000011976 maleic acid Substances 0.000 description 3
- 239000005048 methyldichlorosilane Substances 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 3
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 3
- 239000011342 resin composition Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 238000005809 transesterification reaction Methods 0.000 description 3
- AFFLGGQVNFXPEV-UHFFFAOYSA-N 1-decene Chemical compound CCCCCCCCC=C AFFLGGQVNFXPEV-UHFFFAOYSA-N 0.000 description 2
- GQEZCXVZFLOKMC-UHFFFAOYSA-N 1-hexadecene Chemical compound CCCCCCCCCCCCCCC=C GQEZCXVZFLOKMC-UHFFFAOYSA-N 0.000 description 2
- KWKAKUADMBZCLK-UHFFFAOYSA-N 1-octene Chemical compound CCCCCCC=C KWKAKUADMBZCLK-UHFFFAOYSA-N 0.000 description 2
- HFDVRLIODXPAHB-UHFFFAOYSA-N 1-tetradecene Chemical compound CCCCCCCCCCCCC=C HFDVRLIODXPAHB-UHFFFAOYSA-N 0.000 description 2
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 2
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 125000004423 acyloxy group Chemical group 0.000 description 2
- 238000007259 addition reaction Methods 0.000 description 2
- 125000003302 alkenyloxy group Chemical group 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- WQAQPCDUOCURKW-UHFFFAOYSA-N butanethiol Chemical compound CCCCS WQAQPCDUOCURKW-UHFFFAOYSA-N 0.000 description 2
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- MWKFXSUHUHTGQN-UHFFFAOYSA-N decan-1-ol Chemical compound CCCCCCCCCCO MWKFXSUHUHTGQN-UHFFFAOYSA-N 0.000 description 2
- 210000003298 dental enamel Anatomy 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- HGQSXVKHVMGQRG-UHFFFAOYSA-N dioctyltin Chemical compound CCCCCCCC[Sn]CCCCCCCC HGQSXVKHVMGQRG-UHFFFAOYSA-N 0.000 description 2
- 239000002320 enamel (paints) Substances 0.000 description 2
- 239000001530 fumaric acid Substances 0.000 description 2
- BXWNKGSJHAJOGX-UHFFFAOYSA-N hexadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCO BXWNKGSJHAJOGX-UHFFFAOYSA-N 0.000 description 2
- 238000006459 hydrosilylation reaction Methods 0.000 description 2
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- GLDOVTGHNKAZLK-UHFFFAOYSA-N octadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCCCO GLDOVTGHNKAZLK-UHFFFAOYSA-N 0.000 description 2
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 2
- WRKCIHRWQZQBOL-UHFFFAOYSA-N octyl dihydrogen phosphate Chemical compound CCCCCCCCOP(O)(O)=O WRKCIHRWQZQBOL-UHFFFAOYSA-N 0.000 description 2
- YWAKXRMUMFPDSH-UHFFFAOYSA-N pentene Chemical compound CCCC=C YWAKXRMUMFPDSH-UHFFFAOYSA-N 0.000 description 2
- 150000003014 phosphoric acid esters Chemical class 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 125000005309 thioalkoxy group Chemical group 0.000 description 2
- 150000003606 tin compounds Chemical class 0.000 description 2
- 239000003039 volatile agent Substances 0.000 description 2
- BSSNZUFKXJJCBG-UPHRSURJSA-N (z)-but-2-enediamide Chemical compound NC(=O)\C=C/C(N)=O BSSNZUFKXJJCBG-UPHRSURJSA-N 0.000 description 1
- NDQXKKFRNOPRDW-UHFFFAOYSA-N 1,1,1-triethoxyethane Chemical compound CCOC(C)(OCC)OCC NDQXKKFRNOPRDW-UHFFFAOYSA-N 0.000 description 1
- HDPNBNXLBDFELL-UHFFFAOYSA-N 1,1,1-trimethoxyethane Chemical compound COC(C)(OC)OC HDPNBNXLBDFELL-UHFFFAOYSA-N 0.000 description 1
- MJYFYGVCLHNRKB-UHFFFAOYSA-N 1,1,2-trifluoroethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(F)(F)CF MJYFYGVCLHNRKB-UHFFFAOYSA-N 0.000 description 1
- 239000005968 1-Decanol Substances 0.000 description 1
- OSSNTDFYBPYIEC-UHFFFAOYSA-N 1-ethenylimidazole Chemical compound C=CN1C=CN=C1 OSSNTDFYBPYIEC-UHFFFAOYSA-N 0.000 description 1
- BMVXCPBXGZKUPN-UHFFFAOYSA-N 1-hexanamine Chemical compound CCCCCCN BMVXCPBXGZKUPN-UHFFFAOYSA-N 0.000 description 1
- XLPJNCYCZORXHG-UHFFFAOYSA-N 1-morpholin-4-ylprop-2-en-1-one Chemical compound C=CC(=O)N1CCOCC1 XLPJNCYCZORXHG-UHFFFAOYSA-N 0.000 description 1
- YAJYJWXEWKRTPO-UHFFFAOYSA-N 2,3,3,4,4,5-hexamethylhexane-2-thiol Chemical compound CC(C)C(C)(C)C(C)(C)C(C)(C)S YAJYJWXEWKRTPO-UHFFFAOYSA-N 0.000 description 1
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- SBYMUDUGTIKLCR-UHFFFAOYSA-N 2-chloroethenylbenzene Chemical compound ClC=CC1=CC=CC=C1 SBYMUDUGTIKLCR-UHFFFAOYSA-N 0.000 description 1
- CEYHHQSTMVVZQP-UHFFFAOYSA-N 2-ethenoxyethanamine Chemical compound NCCOC=C CEYHHQSTMVVZQP-UHFFFAOYSA-N 0.000 description 1
- VUIWJRYTWUGOOF-UHFFFAOYSA-N 2-ethenoxyethanol Chemical compound OCCOC=C VUIWJRYTWUGOOF-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- JGBOVFKUKBGAJQ-UHFFFAOYSA-N 2-methylidenebutanediamide Chemical compound NC(=O)CC(=C)C(N)=O JGBOVFKUKBGAJQ-UHFFFAOYSA-N 0.000 description 1
- AGBXYHCHUYARJY-UHFFFAOYSA-N 2-phenylethenesulfonic acid Chemical compound OS(=O)(=O)C=CC1=CC=CC=C1 AGBXYHCHUYARJY-UHFFFAOYSA-N 0.000 description 1
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 1
- IKYAJDOSWUATPI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propane-1-thiol Chemical compound CO[Si](C)(OC)CCCS IKYAJDOSWUATPI-UHFFFAOYSA-N 0.000 description 1
- NNTRMVRTACZZIO-UHFFFAOYSA-N 3-isocyanatopropyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)CCCN=C=O NNTRMVRTACZZIO-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- SAIKULLUBZKPDA-UHFFFAOYSA-N Bis(2-ethylhexyl) amine Chemical compound CCCCC(CC)CNCC(CC)CCCC SAIKULLUBZKPDA-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
- JYFHYPJRHGVZDY-UHFFFAOYSA-N Dibutyl phosphate Chemical compound CCCCOP(O)(=O)OCCCC JYFHYPJRHGVZDY-UHFFFAOYSA-N 0.000 description 1
- KKUKTXOBAWVSHC-UHFFFAOYSA-N Dimethylphosphate Chemical compound COP(O)(=O)OC KKUKTXOBAWVSHC-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- CTKINSOISVBQLD-UHFFFAOYSA-N Glycidol Chemical compound OCC1CO1 CTKINSOISVBQLD-UHFFFAOYSA-N 0.000 description 1
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 1
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- QQDSFKPWDURPAQ-UHFFFAOYSA-N O-[aminooxy(methyl)silyl]hydroxylamine Chemical compound C[SiH](ON)ON QQDSFKPWDURPAQ-UHFFFAOYSA-N 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- MZVQCMJNVPIDEA-UHFFFAOYSA-N [CH2]CN(CC)CC Chemical group [CH2]CN(CC)CC MZVQCMJNVPIDEA-UHFFFAOYSA-N 0.000 description 1
- XQBCVRSTVUHIGH-UHFFFAOYSA-L [dodecanoyloxy(dioctyl)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCCCCCC)(CCCCCCCC)OC(=O)CCCCCCCCCCC XQBCVRSTVUHIGH-UHFFFAOYSA-L 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- BNMJSBUIDQYHIN-UHFFFAOYSA-N butyl dihydrogen phosphate Chemical compound CCCCOP(O)(O)=O BNMJSBUIDQYHIN-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- QHIWVLPBUQWDMQ-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C=C QHIWVLPBUQWDMQ-UHFFFAOYSA-N 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920006217 cellulose acetate butyrate Polymers 0.000 description 1
- 229960000541 cetyl alcohol Drugs 0.000 description 1
- 239000012986 chain transfer agent Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- QABCGOSYZHCPGN-UHFFFAOYSA-N chloro(dimethyl)silicon Chemical compound C[Si](C)Cl QABCGOSYZHCPGN-UHFFFAOYSA-N 0.000 description 1
- YACLQRRMGMJLJV-UHFFFAOYSA-N chloroprene Chemical compound ClC(=C)C=C YACLQRRMGMJLJV-UHFFFAOYSA-N 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000000805 composite resin Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- ZWAJLVLEBYIOTI-UHFFFAOYSA-N cyclohexene oxide Chemical compound C1CCCC2OC21 ZWAJLVLEBYIOTI-UHFFFAOYSA-N 0.000 description 1
- FWFSEYBSWVRWGL-UHFFFAOYSA-N cyclohexene oxide Natural products O=C1CCCC=C1 FWFSEYBSWVRWGL-UHFFFAOYSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- SCIGVHCNNXTQDB-UHFFFAOYSA-N decyl dihydrogen phosphate Chemical compound CCCCCCCCCCOP(O)(O)=O SCIGVHCNNXTQDB-UHFFFAOYSA-N 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- AONDIGWFVXEZGD-UHFFFAOYSA-N diacetyloxy(methyl)silicon Chemical compound CC(=O)O[Si](C)OC(C)=O AONDIGWFVXEZGD-UHFFFAOYSA-N 0.000 description 1
- SUZUHCJTJZZKSB-UHFFFAOYSA-N diaminosilylmethane Chemical compound C[SiH](N)N SUZUHCJTJZZKSB-UHFFFAOYSA-N 0.000 description 1
- AYOHIQLKSOJJQH-UHFFFAOYSA-N dibutyltin Chemical compound CCCC[Sn]CCCC AYOHIQLKSOJJQH-UHFFFAOYSA-N 0.000 description 1
- XNAFLNBULDHNJS-UHFFFAOYSA-N dichloro(phenyl)silicon Chemical compound Cl[Si](Cl)C1=CC=CC=C1 XNAFLNBULDHNJS-UHFFFAOYSA-N 0.000 description 1
- QHAUASBJFFBWMY-UHFFFAOYSA-N didecyl hydrogen phosphate Chemical compound CCCCCCCCCCOP(O)(=O)OCCCCCCCCCC QHAUASBJFFBWMY-UHFFFAOYSA-N 0.000 description 1
- 150000005690 diesters Chemical class 0.000 description 1
- UCQFCFPECQILOL-UHFFFAOYSA-N diethyl hydrogen phosphate Chemical compound CCOP(O)(=O)OCC UCQFCFPECQILOL-UHFFFAOYSA-N 0.000 description 1
- PKTOVQRKCNPVKY-UHFFFAOYSA-N dimethoxy(methyl)silicon Chemical compound CO[Si](C)OC PKTOVQRKCNPVKY-UHFFFAOYSA-N 0.000 description 1
- CIQDYIQMZXESRD-UHFFFAOYSA-N dimethoxy(phenyl)silane Chemical compound CO[SiH](OC)C1=CC=CC=C1 CIQDYIQMZXESRD-UHFFFAOYSA-N 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- HTDKEJXHILZNPP-UHFFFAOYSA-N dioctyl hydrogen phosphate Chemical compound CCCCCCCCOP(O)(=O)OCCCCCCCC HTDKEJXHILZNPP-UHFFFAOYSA-N 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- WNAHIZMDSQCWRP-UHFFFAOYSA-N dodecane-1-thiol Chemical compound CCCCCCCCCCCCS WNAHIZMDSQCWRP-UHFFFAOYSA-N 0.000 description 1
- JRBPAEWTRLWTQC-UHFFFAOYSA-N dodecylamine Chemical compound CCCCCCCCCCCCN JRBPAEWTRLWTQC-UHFFFAOYSA-N 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002168 ethanoic acid esters Chemical class 0.000 description 1
- UIWXSTHGICQLQT-UHFFFAOYSA-N ethenyl propanoate Chemical compound CCC(=O)OC=C UIWXSTHGICQLQT-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- ZJXZSIYSNXKHEA-UHFFFAOYSA-L ethyl phosphate(2-) Chemical compound CCOP([O-])([O-])=O ZJXZSIYSNXKHEA-UHFFFAOYSA-L 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 210000003608 fece Anatomy 0.000 description 1
- WBJINCZRORDGAQ-UHFFFAOYSA-N formic acid ethyl ester Natural products CCOC=O WBJINCZRORDGAQ-UHFFFAOYSA-N 0.000 description 1
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229940049920 malate Drugs 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N malic acid Chemical compound OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- CAAULPUQFIIOTL-UHFFFAOYSA-N methyl dihydrogen phosphate Chemical compound COP(O)(O)=O CAAULPUQFIIOTL-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- SNVLJLYUUXKWOJ-UHFFFAOYSA-N methylidenecarbene Chemical compound C=[C] SNVLJLYUUXKWOJ-UHFFFAOYSA-N 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229940088644 n,n-dimethylacrylamide Drugs 0.000 description 1
- YWFWDNVOPHGWMX-UHFFFAOYSA-N n,n-dimethyldodecan-1-amine Chemical compound CCCCCCCCCCCCN(C)C YWFWDNVOPHGWMX-UHFFFAOYSA-N 0.000 description 1
- YLGYACDQVQQZSW-UHFFFAOYSA-N n,n-dimethylprop-2-enamide Chemical compound CN(C)C(=O)C=C YLGYACDQVQQZSW-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N n-Octanol Natural products CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- YPHQUSNPXDGUHL-UHFFFAOYSA-N n-methylprop-2-enamide Chemical compound CNC(=O)C=C YPHQUSNPXDGUHL-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 125000002560 nitrile group Chemical group 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
- GKASDNZWUGIAMG-UHFFFAOYSA-N triethyl orthoformate Chemical compound CCOC(OCC)OCC GKASDNZWUGIAMG-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- NLVXSWCKKBEXTG-UHFFFAOYSA-N vinylsulfonic acid Chemical compound OS(=O)(=O)C=C NLVXSWCKKBEXTG-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、耐汚染性の改良された常温硬化性樹脂組成物
に関するものである。更に詳しくは、加水分解性シリル
基を有するビニル系共重合体を用いた耐汚染性の改良さ
れた伸長型上塗材用樹脂組酸物に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Industrial Field of Application) The present invention relates to a room temperature curable resin composition with improved stain resistance. More specifically, the present invention relates to a resin composite acid product for an elongated top coat material that uses a vinyl copolymer having a hydrolyzable silyl group and has improved stain resistance.
(従来技術の問題点)
加水分解性シリル基含有ビニル樹脂が常温で空気中の湿
分により緻密な網状構造を形成し、高光沢、耐候性、耐
変色性、無機系基材に対する密着性等の優れた樹脂とな
ることが知られている。(Problems with conventional technology) Hydrolyzable silyl group-containing vinyl resin forms a dense network structure due to moisture in the air at room temperature, resulting in high gloss, weather resistance, discoloration resistance, and adhesion to inorganic substrates. It is known to be an excellent resin.
一方、塗料分野では、コンクリート等下地のひび割れに
追従し、防水性、美観を付与する伸長型上塗塗料の開発
が盛んに行なわれている。しかしながら、塗膜の伸びを
確保するためには柔軟な樹脂組成にする必要があり、そ
のために排気ガスやふんしん等に対する耐汚染性という
点では、必らずしも満足のいくものではなかった。On the other hand, in the field of paints, there is active development of elongated top coat paints that follow cracks in concrete and other substrates and provide waterproofness and aesthetic appeal. However, in order to ensure the elongation of the paint film, it was necessary to use a flexible resin composition, and as a result, it was not always satisfactory in terms of stain resistance against exhaust gas, dung, etc. .
(問題点を解決するための手段)
本発明者らは、市場の強い要求に答えるべく鋭意検討を
行った結果、加水分解性シリル基含有ビニル系共重合体
に下記のシラン化合物を添加することにより、塗膜の伸
び及び耐候性を低下させずに耐汚染性を著しく改巷でき
ることを見出し、本発明に至った。(Means for Solving the Problems) As a result of intensive studies in response to the strong demands of the market, the present inventors have found that the following silane compound is added to a hydrolyzable silyl group-containing vinyl copolymer. It was discovered that the stain resistance could be significantly improved without reducing the elongation and weather resistance of the coating film, leading to the present invention.
すなわち本発明は、
(4)主鎖が実質的にビニル系重合体鎖からなり、末端
あるいは側鎖に加水分解性基と結合した珪素原子を1分
子中に少なくとも1個有するシリル基含有ビニル系重合
体 100重量部(B)式
%式%()
(式中、R1は炭素数1〜10の1価のアルキル基、ア
ラルキル基、アリール基より選ばれる炭化水素基、Xは
ハロゲン、ヒドロキシ、アルコキシ、アシロキシ、アミ
ノキシ、フェノキシ、チオアルコキシ、アミノ、ケトキ
シメート、アルケニルオキシ基より選ばれる基、R2は
炭素数3〜200の1価のアルキル基を示し、nは0〜
2の整数を示す。)
で示されるシラン化合物 0.1〜100重量部及び(
C)硬化触媒0〜20重量部を含有する常温硬化性樹脂
組成物を要旨とする。That is, the present invention provides: (4) a silyl group-containing vinyl polymer whose main chain is substantially composed of a vinyl polymer chain and which has at least one silicon atom in each molecule bonded to a hydrolyzable group at the terminal or side chain; Polymer 100 parts by weight (B) Formula % Formula % () (In the formula, R1 is a hydrocarbon group selected from a monovalent alkyl group having 1 to 10 carbon atoms, an aralkyl group, and an aryl group, and X is a halogen, hydroxy, A group selected from alkoxy, acyloxy, aminoxy, phenoxy, thioalkoxy, amino, ketoximate, and alkenyloxy groups, R2 represents a monovalent alkyl group having 3 to 200 carbon atoms, and n is 0 to
Indicates an integer of 2. ) 0.1 to 100 parts by weight of a silane compound represented by
C) A room temperature curable resin composition containing 0 to 20 parts by weight of a curing catalyst.
(5)成分のシリル基含有ビニル系重合体は、ビニルモ
ノマーと加水分解性シリル基含有モノマーとの共重合に
より得られ、主鎖また側鎖にウレタン結合、ウレア結合
あるいはシロキサン結合を一部含んでもよい。この際、
使用されるビニルモノマーとしては特に限定はなく、メ
チル(メタ)クリレート、エチル(メタ)クリレート、
ブチル(メタ)クリレート、2−エチルヘキシル(メタ
)クリレート、ステアリル(メタ)クリレート、ベンジ
ル(メタ)クリレート、シクロヘキシル(メタ)クリレ
ート、トリフロロエチル(メタ)クリレート、ペンタフ
ロロプロピル(メタ)クリレート、ポリカルボン酸(マ
レイン酸、フマル酸、イタコン酸等)の炭素数1〜20
の直鎖または分岐のアルコールとのジエステルまたはハ
ーフエステル等の不飽和カルボン酸のエステル;スチレ
ン、α−メチルスチレン、クロロスチレン、スチレンス
ルホン酸、4−ヒドロキシスチレン、ビニルトルエン等
の芳香族炭化水素系ビニル化合物;酢酸ビニル、プロピ
オン酸ビニル、ジアリルフタレート等のビニルエステル
やアリル化合物;(メタ)クリロニトリル等のニトリル
基含有ビニル化合物;グリシジル(メタ)クリレート等
のエポキシ基含有ビニル化合物;ジメチルアミノエチル
(メタ)クリレート、ジエチルアミノエチル(メタ)ク
リレート、ビニルピリジン、アミノエチルビニルエーテ
ル等のアミノ基含有ビニル化合物;(メタ)クリルアミ
ド、イタコン酸ジアミド、α−エチル(メタ)クリルア
ミド、クロトンアミド、マレイン酸ジアミド、フマル酸
ジアミド、N−ビニルピロリドン、N−ブトキシメチル
(メタ)クリルアミド、N、N−ジメチルアクリルアミ
ド、N−メチルアクリルアミド、アクリロイルモルホリ
ン等のアミド基含有ビニル化合物;2−ヒドロキシエチ
ル(メタ)クリレート、2−ヒドロキシプ口ピル(メタ
)クリレート、2−ヒドロキシエチルビニルエーテル、
N−メチロール(メタ)クリルアミド、アロニクス57
00(東亜合成■袈)、Placcel FA−1、P
laccel FA−4、PlaccelFM−1、
Placcel FM−4(ダイセル化学■製)等の水
酸基含有ビニル化合物;(メタ)クリル酸、マレイン酸
、フマル酸、イタコン酸およびそれらの塩(アルカリ金
属塩、アンモニウム塩、アミン塩等)、無水マレイン酸
等の不飽和カルボン酸、酸無水物、またはその塩;ビニ
ルメチルエーテル、塩化ビニノペ塩化ビニリデン、クロ
ロプレン、プロピレン、ブタジェン、イソプレン、マレ
イミド、N−ビニルイミダゾール、ビニルスルホン酸等
のその他のビニル化合物等が挙げられる。(5) The silyl group-containing vinyl polymer is obtained by copolymerizing a vinyl monomer and a hydrolyzable silyl group-containing monomer, and contains some urethane bonds, urea bonds, or siloxane bonds in the main chain or side chain. But that's fine. On this occasion,
The vinyl monomer used is not particularly limited, and includes methyl (meth)acrylate, ethyl (meth)acrylate,
Butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, stearyl (meth)acrylate, benzyl (meth)acrylate, cyclohexyl (meth)acrylate, trifluoroethyl (meth)acrylate, pentafluoropropyl (meth)acrylate, polycarbonate Acid (maleic acid, fumaric acid, itaconic acid, etc.) with 1 to 20 carbon atoms
esters of unsaturated carboxylic acids such as diesters or half esters with linear or branched alcohols; aromatic hydrocarbons such as styrene, α-methylstyrene, chlorostyrene, styrene sulfonic acid, 4-hydroxystyrene, vinyltoluene, etc. Vinyl compounds; vinyl esters and allyl compounds such as vinyl acetate, vinyl propionate, and diallyl phthalate; vinyl compounds containing nitrile groups such as (meth)crylonitrile; vinyl compounds containing epoxy groups such as glycidyl (meth)acrylate; dimethylaminoethyl ( Vinyl compounds containing amino groups such as meth)acrylate, diethylaminoethyl (meth)acrylate, vinylpyridine, and aminoethyl vinyl ether; (meth)acrylamide, itaconic acid diamide, α-ethyl (meth)acrylamide, crotonamide, maleic acid diamide, fumar Vinyl compounds containing amide groups such as acid diamide, N-vinylpyrrolidone, N-butoxymethyl (meth)acrylamide, N,N-dimethylacrylamide, N-methylacrylamide, acryloylmorpholine; 2-hydroxyethyl (meth)acrylate, 2- Hydroxypyl (meth)acrylate, 2-hydroxyethyl vinyl ether,
N-methylol(meth)crylamide, Aronix 57
00 (Toagosei ■), Placel FA-1, P
laccel FA-4, laccel FM-1,
Hydroxyl group-containing vinyl compounds such as Placcel FM-4 (manufactured by Daicel Chemical ■); (meth)acrylic acid, maleic acid, fumaric acid, itaconic acid and their salts (alkali metal salts, ammonium salts, amine salts, etc.), maleic anhydride Unsaturated carboxylic acids such as acids, acid anhydrides, or salts thereof; other vinyl compounds such as vinyl methyl ether, vinylidene chloride, chloroprene, propylene, butadiene, isoprene, maleimide, N-vinylimidazole, vinyl sulfonic acid, etc. can be mentioned.
加水分解性シリル基含有モノマーとしては、具体的には
CH2=CHBi(OOHa)B、CCH2=CH81
cI、(J−I3
CH2=CHOOO(CFIs+)3Si(OCHa)
2、CH2=OHOOO(CH2)351(OCHa)
a、EI3
CH2=CHCOO(OR2)a 8 iC12,0)
+2=cHOOo(CH2)3Si01B 、(EH
8
0H2=O(OHa)000(CH2)3Si(OCH
a)2.0H2=C(CHa)000(CI(2)3S
i(OCHa)3、H3
0H2=0(CHa)Coo(CH2)38i 012
、CH2=C(CJ(a)C00(Of(2)381
C1a 、0 0 ?Ha
II ll
0H2=C(CH3)000(CH2)38i(002
H5)3、fI3
CHz=C(CHa)COO(CH2)B8i (OC
21−I5)2、等があげられる。Specifically, hydrolyzable silyl group-containing monomers include CH2=CHBi(OOHa)B, CCH2=CH81
cI, (J-I3 CH2=CHOOO(CFIs+)3Si(OCHa)
2, CH2=OHOOO(CH2)351(OCHa)
a, EI3 CH2=CHCOO(OR2)a 8 iC12,0)
+2=cHOOo(CH2)3Si01B, (EH
8 0H2=O(OHa)000(CH2)3Si(OCH
a) 2.0H2=C(CHa)000(CI(2)3S
i(OCHa)3, H3 0H2=0(CHa)Coo(CH2)38i 012
, CH2=C(CJ(a)C00(Of(2)381
C1a, 0 0? Ha II ll 0H2=C(CH3)000(CH2)38i(002
H5)3, fI3 CHz=C(CHa)COO(CH2)B8i (OC
21-I5)2, etc.
これら加水分解性シリル基含有モノマーとビニルモノマ
ーの共重合体の製造法については、例えば特開昭54−
86395、同57−36109、同58−15781
0等に示される方法を用いればよい。特に好ましいのは
、アゾビスイソブチロニトリル等のアゾ系ラジカル開始
剤を用いた溶液重合である。また必要に応じて、n−ド
デシルメルカプタン、t−ドデシルメルカプタン、n−
ブチルメルカプタン、γ−メルカプトプロピルトリメト
キシシラン、r−メルカプトプロピルトリエトキシシラ
ン、γ−メルカプトプロピルメチルジメトキシシラン、
γ−メルカプトプロピルメチルジェトキシシラン、(C
Ha O) 8Si−8−8−8i −(OCHa )
3、(CH30)3S 1−8B S 1(OCHa
)3 等の連鎖移動剤を用い分子量調節をする事がで
きる。特に加水分解性シリル基を分子中に有する連鎖移
動剤、例えばr−メルカプトプロピルトリメトキシシラ
ンを用いればシリル基含有ビニル系重合体の末端Jこ加
水分解性シリル基を導入することができる。Regarding the production method of copolymers of these hydrolyzable silyl group-containing monomers and vinyl monomers, for example,
86395, 57-36109, 58-15781
0 etc. may be used. Particularly preferred is solution polymerization using an azo radical initiator such as azobisisobutyronitrile. In addition, n-dodecyl mercaptan, t-dodecyl mercaptan, n-
Butyl mercaptan, γ-mercaptopropyltrimethoxysilane, r-mercaptopropyltriethoxysilane, γ-mercaptopropylmethyldimethoxysilane,
γ-Mercaptopropylmethyljethoxysilane, (C
HaO)8Si-8-8-8i-(OCHa)
3, (CH30)3S 1-8B S 1(OCHa
) 3 etc. can be used to adjust the molecular weight. In particular, if a chain transfer agent having a hydrolyzable silyl group in the molecule, such as r-mercaptopropyltrimethoxysilane, is used, the hydrolyzable silyl group can be introduced at the end of the silyl group-containing vinyl polymer.
重合溶剤は、炭化水素類(トルエン、キシレン、n−ヘ
キサン、シクロヘキサン等)、酢酸エステル類(酢酸エ
チル、酢酸ブチル等)、アルコール類(メタノール、エ
タノール、イソプロパツール、n−ブタノール等)、エ
ーテル類(エチルセロソルブ、ブチルセロソルブ、セロ
ソルブアセテート等)、ケトン類(メチルエチルケトン
、アセト酢酸エチル、アセチルアセトン、ジアセトンア
ルコール、メチルイソブチルケトン、アセトン等)の如
き非反応性の溶剤であれば特に限定はない。Polymerization solvents include hydrocarbons (toluene, xylene, n-hexane, cyclohexane, etc.), acetic acid esters (ethyl acetate, butyl acetate, etc.), alcohols (methanol, ethanol, isopropanol, n-butanol, etc.), and ether. The solvent is not particularly limited as long as it is a non-reactive solvent such as ethyl cellosolve, butyl cellosolve, cellosolve acetate, etc., ketones (methyl ethyl ketone, ethyl acetoacetate, acetylacetone, diacetone alcohol, methyl isobutyl ketone, acetone, etc.).
ω)成分のシラン化合物は、式(1)、(If)又は面
で示されるが、式中R2で表わされるアルキル基は炭素
数3〜200、好ましくは6〜200、より好 。The silane compound as the component ω) is represented by the formula (1), (If) or a surface, and the alkyl group represented by R2 in the formula has 3 to 200 carbon atoms, preferably 6 to 200 carbon atoms, and more preferably.
ましくは10〜20であって、以下の方法で合成できる
。Preferably, it is 10 to 20, and can be synthesized by the following method.
■ 片末端にアリル基を有する分子量42〜3000の
炭化水素系化合物を、次式
(式中、R1は炭素数1〜10の1価のアルキル基、ア
ラルキル基、アリール基より選ばれる炭化水素基、Xは
ハロゲン、ヒドロキシ、アルコキシ、アシロキシ、アミ
ノキシ、フェノキシ、チオアルコキシ、アミノ、ケトキ
シメート、アルケニルオキシ基より選ばれる基、nは0
〜2の整数を示す)
で示されるヒドロシラン化合物でヒドロシリル化し、シ
ラン化合物(1)を得る方法。■ A hydrocarbon compound having a molecular weight of 42 to 3,000 and having an allyl group at one end is prepared by the following formula (wherein R1 is a hydrocarbon group selected from a monovalent alkyl group having 1 to 10 carbon atoms, an aralkyl group, and an aryl group). , X is a group selected from halogen, hydroxy, alkoxy, acyloxy, aminoxy, phenoxy, thioalkoxy, amino, ketoximate, alkenyloxy group, n is 0
A method for obtaining a silane compound (1) by hydrosilylation with a hydrosilane compound represented by (representing an integer of ~2).
■ 片末端に水酸基を有する分子量42〜3000のア
ルコール類をウィリアムソンのエーテル合成法で片末端
にアリル基を導入した後、上記ヒドロシランでヒドロシ
リル化し、シラン化合物(1)を得る方法。(2) A method in which an allyl group is introduced at one end of an alcohol having a hydroxyl group at one end and a molecular weight of 42 to 3,000 by Williamson's ether synthesis method, and then hydrosilylated with the above hydrosilane to obtain the silane compound (1).
■ 片末端に水酸基を有する分子量42〜3000のア
ルコール類をイソシアナートシランで封鎖し、シラン化
合物(2)を得る方法。(2) A method of obtaining a silane compound (2) by capping an alcohol having a molecular weight of 42 to 3,000 with an isocyanatosilane having a hydroxyl group at one end.
等が挙げられる。etc.
アリル基とヒドロシラン化合物のヒドロシリル化反応は
、白金、ロジウム、コバルト、パラジウムおよびニッケ
ルから選ばれた■族の遷移金属錯体化合物を触媒として
用い、50〜150℃の温度で進行し、反応時間は1〜
4時間で定量的に進行する。The hydrosilylation reaction between an allyl group and a hydrosilane compound is carried out at a temperature of 50 to 150°C using a group II transition metal complex compound selected from platinum, rhodium, cobalt, palladium, and nickel as a catalyst, and the reaction time is 1. ~
It progresses quantitatively in 4 hours.
水酸基とイソシアナートシランの反応は、触媒は用いて
も用いなくてもよいが、速かに付加反応を進行させたい
ときはジブチルスズジラウレート、オクチル酸スズのよ
うな有機スズ化合物、ジメチルベンジルアミン、トリエ
チルアミン等の3級アミン化合物を用いる事ができる。The reaction between hydroxyl groups and isocyanatosilanes can be carried out with or without a catalyst, but if you want the addition reaction to proceed quickly, use organic tin compounds such as dibutyltin dilaurate or tin octylate, dimethylbenzylamine, or triethylamine. Tertiary amine compounds such as the following can be used.
反応温度は50〜150℃で、2270cm1の赤外吸
収スペクトルのNCOの吸収にて反応を追跡する。The reaction temperature is 50 to 150°C, and the reaction is monitored by the absorption of NCO in the infrared absorption spectrum at 2270 cm1.
片末端にアリル基を有する炭化水素系化合物として、具
体的には、1−プロペン、1−ペンテン、1−オクテン
、1−デセン、1−テトラデセン、1−へキサデセン、
1−オクタデセン等が挙げられる。Examples of hydrocarbon compounds having an allyl group at one end include 1-propene, 1-pentene, 1-octene, 1-decene, 1-tetradecene, 1-hexadecene,
Examples include 1-octadecene.
片末端に水酸基を有するアルコール類としては、1−プ
ロパツール、1−ペンタノール、1−オクタツール、1
−デカノール、1−テトラデカノニル、1−ヘキサデカ
ノール、1−オクタデカノール等が挙げられる。Alcohols having a hydroxyl group at one end include 1-propanol, 1-pentanol, 1-octatool, 1
-decanol, 1-tetradecanonyl, 1-hexadecanol, 1-octadecanol and the like.
ヒドロシラン化合物として、具体的には、トリクロルシ
ラン、メチルジクロルシラン、ジメチルクロルシラン、
フエニルジクロルシラン等のハロゲン化シラン類;トリ
メトキシシラン、トリエトキシシラン、メチルジメトキ
シシラン、メチルジェトキシシラン、フエニルジメトキ
シシラン等のアルコキシシラン類;トリアセトキシシラ
ン、メチルジアセトキシシラン、フエニルジアセトキシ
シラン等のアシロキシシラン類ニジメチルエチルメチル
オキシムシラン;トリアミノキシシラン、メチルジアミ
ノキシシラン、メチルジアミノシラン等が挙げられる。Specific examples of hydrosilane compounds include trichlorosilane, methyldichlorosilane, dimethylchlorosilane,
Halogenated silanes such as phenyldichlorosilane; alkoxysilanes such as trimethoxysilane, triethoxysilane, methyldimethoxysilane, methyljethoxysilane, phenyldimethoxysilane; triacetoxysilane, methyldiacetoxysilane, phenyl Acyloxysilanes such as diacetoxysilane include dimethylethylmethyloxime silane; triaminoxysilane, methyldiaminoxysilane, methyldiaminosilane, and the like.
イソシアナートシランとして、具体的には、γ−イソシ
アナート、プロピルトリメトキシシラン、γ−イソシア
ナートプロピルトリエトキシシラン、γ−イソシアナー
トプロピルメチルジメトキシシラン等が挙げられる。Specific examples of the isocyanatosilane include γ-isocyanate, propyltrimethoxysilane, γ-isocyanatopropyltriethoxysilane, γ-isocyanatopropylmethyldimethoxysilane, and the like.
(0成分の硬化触媒として、具体的には、ジブチルスズ
ジラウレート、ジブチルスズシマレート、ジオクチルス
ズジラウレート、ジオクチルスズシマレート、オクチル
酸スズ等の有機スズ化合物;リン酸、モノメチルホスフ
ェート、モノエチルホスフェート、モノブチルホスフェ
ート、モノオクチルホスフェート、モノデシルホスフェ
ート、ジメチルホスフェート、ジエチルホスフェート、
ジブチルホスフェート、ジオクチルホスフェート、ジデ
シルホスフェート等のリン酸またはリン酸エステル;プ
ロピレンオキサイド、ブチレンオキサイド、シクロヘキ
センオキサイド、グリシジルメタクリレート、グリシド
ール、アリルグリシジルエーテル、γ−グリシドキシプ
ロピルトリメトキシシラン、r−グリシドキシプロビル
トリエトキシシラン、γ−グリシドキシプロピルメチル
ジメカーデュラE(油化シェル側製)、 エピコート8
28(油化シェル側製)、エピコー)1001(油化シ
ェル側製)等のエポキシ化合物とリン酸およびまたはモ
ノ酸性リン酸エステルとの付加反応物;アルキルチタン
酸塩;有機アルミニウム;マレイン酸パラトルエンスル
ホン酸等の酸性化合物;ヘキシルアミン、ジー2−エチ
ルヘキシルアミン、N、N−ジメチルドデシルアミン、
ドデシルアミン等のアミン類;水酸化ナトリウム、水酸
化カワウ・ ム等のアルカリ性化合物等が挙げられる。(Specifically, as the curing catalyst of component 0, organic tin compounds such as dibutyltin dilaurate, dibutyltin simalate, dioctyltin dilaurate, dioctyltin simalate, tin octylate; phosphoric acid, monomethyl phosphate, monoethyl phosphate, monobutyl Phosphate, monooctyl phosphate, monodecyl phosphate, dimethyl phosphate, diethyl phosphate,
Phosphoric acid or phosphoric acid ester such as dibutyl phosphate, dioctyl phosphate, didecyl phosphate; propylene oxide, butylene oxide, cyclohexene oxide, glycidyl methacrylate, glycidol, allyl glycidyl ether, γ-glycidoxypropyltrimethoxysilane, r-glyside Xyprobyltriethoxysilane, γ-glycidoxypropylmethyldimecardura E (manufactured by Yuka Shell), Epicote 8
28 (manufactured by Yuka Shell), Epicor) 1001 (manufactured by Yuka Shell), addition reaction products of epoxy compounds and phosphoric acid and/or monoacidic phosphoric acid esters; alkyl titanates; organoaluminum; maleic acid para Acidic compounds such as toluenesulfonic acid; hexylamine, di-2-ethylhexylamine, N,N-dimethyldodecylamine,
Examples include amines such as dodecylamine; alkaline compounds such as sodium hydroxide and potassium hydroxide.
これらの硬化触媒(C)は、添加しなくとも硬化を進め
る事はできるが、硬化を速かに進めたいときは、単独あ
るいは複数の組み合せで使用できる。Although curing can proceed without addition of these curing catalysts (C), when it is desired to proceed with curing quickly, they can be used alone or in combination.
以上掲げた加水分解性シリル基含有ビニル系樹脂囚、シ
ラン化合物(B)および硬化触媒(Oの混合比は、重量
比で(A) :(B) :(C)= 100 : 0.
1〜100:0〜20、好ましくは(A:■):(C)
= 1o o :0.5〜20:0.01〜10である
。B成分が0.1重量部未満では、耐汚染性の改良効果
が認められず、100重量部をこえると相溶性が低下し
、塗膜かにごろごとがあったりして好ましくない。The mixing ratio of the above-mentioned hydrolyzable silyl group-containing vinyl resin, the silane compound (B), and the curing catalyst (O) is (A):(B):(C)=100:0.
1-100:0-20, preferably (A:■):(C)
= 1 o o: 0.5-20: 0.01-10. If component B is less than 0.1 part by weight, no improvement in stain resistance is observed, and if it exceeds 100 parts by weight, the compatibility decreases and the coating film may be rough, which is not preferable.
本発明の組成物には脱水剤は用いても用いなくても良い
が1、長期にわたる安定性を確保する場合、あるいは、
容器に入れたこの組成物を何回にも分けてくり返し使用
するような条件での安定性を確保するためには脱水剤を
用いることが好ましい。脱水剤として、具体的には、オ
ルトギ酸メチル、オルトギ酸エチル、オルト酢酸メチル
、オルト酢酸エチル、メチルトリメトキシシラン、γ−
メタクリロキシプロピルトリメトキシシラン、ビニルト
リメトキシシラン、メチルシリケート、エチルシリケー
ト等の加水分解性エステル化合物がある。これらの加水
分篩性エステル化合物は、シリル基含有ビニル系共重合
体(A)の重合反応前の反応系に予め加えても、重合中
の反応系に加えても、また重合の後に加えてもよい。A dehydrating agent may or may not be used in the composition of the present invention, but if long-term stability is to be ensured, or
It is preferable to use a dehydrating agent in order to ensure stability under conditions where the composition is divided into containers and used repeatedly. As a dehydrating agent, specifically, methyl orthoformate, ethyl orthoformate, methyl orthoacetate, ethyl orthoacetate, methyltrimethoxysilane, γ-
There are hydrolyzable ester compounds such as methacryloxypropyltrimethoxysilane, vinyltrimethoxysilane, methyl silicate, and ethyl silicate. These hydrosieving ester compounds may be added in advance to the reaction system before the polymerization reaction of the silyl group-containing vinyl copolymer (A), added to the reaction system during polymerization, or added after the polymerization. Good too.
本発明の組成物には、用途に応じて各種顔料、紫外線吸
収剤、沈降防止剤、レベリング剤等の添加剤;ニトロセ
ルロース、セルロースアセテートブチレート等の繊維素
;アルキド樹脂、アクリル樹脂、塩化ビニル系樹脂、塩
素化ポリプロピレン、塩化ゴム、ポリビニルブチラール
等の樹脂を添加する事ができる。The composition of the present invention may contain additives such as various pigments, ultraviolet absorbers, anti-settling agents, leveling agents, etc. depending on the purpose; cellulose such as nitrocellulose, cellulose acetate butyrate; alkyd resins, acrylic resins, vinyl chloride, etc. Resins such as chlorinated polypropylene, chlorinated rubber, and polyvinyl butyral can be added.
(実施例) 次に本発明の実施例を記載する。(Example) Next, examples of the present invention will be described.
合成例1(シリル基含有ビニル系重合体の合成A−1)
撹拌装置、温度計、窒素導入管、滴下ロート、冷却管を
備えた反応器に、キシレン87077を仕込み、110
℃に加熱する。ブチルアクリレート511F1メチルメ
タクリレート4881. γ−メタクリロキシプロピ
ルトリメトキシシラン3511N−メチロールアクリル
アミド10g及びアゾビスイソブチロニトリル5yを溶
かした溶液を反応器に3時間連続追加した。モノマー追
加終了後、別に用意したアゾビスイソブチロニトリルI
11トルエン200J7の溶液を更に1時間追加し、更
に1時間後重合を行い、シリル基含有ビニル系樹脂(A
−1)を得た。Synthesis Example 1 (Synthesis A-1 of silyl group-containing vinyl polymer) Xylene 87077 was charged into a reactor equipped with a stirring device, a thermometer, a nitrogen introduction tube, a dropping funnel, and a cooling tube, and 110
Heat to ℃. Butyl acrylate 511F1 Methyl methacrylate 4881. A solution containing 10 g of γ-methacryloxypropyltrimethoxysilane 3511N-methylolacrylamide and 5 y of azobisisobutyronitrile was continuously added to the reactor for 3 hours. After completing the monomer addition, separately prepared azobisisobutyronitrile I
A solution of 11 toluene 200J7 was added for another 1 hour, and after another 1 hour, polymerization was carried out to obtain a silyl group-containing vinyl resin (A
-1) was obtained.
得られたシリル基含有ビニル系樹脂゛溶液の不揮発分濃
度は61%であった。またGPC法による数平均分子量
は28,000であった。The nonvolatile content concentration of the obtained silyl group-containing vinyl resin solution was 61%. The number average molecular weight determined by GPC method was 28,000.
合成例2(シリル基含有ビニル系重合体の合成A−2)
撹拌装置、温度計、窒素導入管、滴下ロート、冷却管を
備えた反応器に、キシレン37(lを仕込み、110℃
に加熱する。ブチルアクリレート485、F、メチルメ
タクリレート389Ii1γ−メタクリロキシプロピル
トリメトキシシラン11711 N−メチロールアクリ
ルアミド9I及びアゾビスイソブチロニトリル3Iを溶
かした溶液を反応器に3時間連続追加した。モノマー追
加終了後、別に用意したアゾビスイソブチロニトリル0
.5,91)ルエン200,9の溶液を更に1時間追加
し、更に1時間後重合を行い、シリル基含有ビニル系樹
脂(A−2)を得た。Synthesis Example 2 (Synthesis A-2 of silyl group-containing vinyl polymer) 37 (l) of xylene was charged into a reactor equipped with a stirring device, a thermometer, a nitrogen introduction pipe, a dropping funnel, and a cooling pipe, and the temperature was heated to 110°C.
Heat to. Butyl acrylate 485, F, methyl methacrylate 389Ii1 γ-methacryloxypropyltrimethoxysilane 11711 A solution containing N-methylolacrylamide 9I and azobisisobutyronitrile 3I was continuously added to the reactor for 3 hours. After adding the monomer, add azobisisobutyronitrile 0, which was prepared separately.
.. 5,91) A solution of toluene 200.9 was added for another 1 hour, and polymerization was carried out for another 1 hour to obtain a silyl group-containing vinyl resin (A-2).
得られたシリル基含有ビニル系樹脂溶液の不揮発分濃度
ii60 %であった。またGPO法による数平均分子
量は26,000であった。The nonvolatile content concentration of the obtained silyl group-containing vinyl resin solution was 60%. The number average molecular weight determined by the GPO method was 26,000.
合成例3(シラン化合物の合成 B−1)耐圧容器に、
1−オクタデセンを2521仕込み、更に142Iのト
リクロルシラン、0.5,9の塩化白金酸の10%イソ
プロパツール溶液を窒素雰囲気下で加え、90℃で4時
間反応させた。反応後、赤外吸収スペクトルを測定した
ところ1640cm=のアリル基の赤外吸収は消失して
いた。その後100℃にて未反応のトリクロルシランを
減圧下(5Torr)で留去した。更に、192Iのメ
タノールを加え、生成する塩化水素ガスを減圧で除き、
更にオルトギ酸メチル100Iを加え、60℃で2時間
エステル交換を進めた後、減圧下(5Torr) で
揮発物を留去した。Synthesis Example 3 (Synthesis of silane compound B-1) In a pressure container,
2,521 l of 1-octadecene was charged, and a 10% isopropanol solution of 142 I of trichlorosilane and 0.5,9 of chloroplatinic acid were added under a nitrogen atmosphere, and the mixture was reacted at 90°C for 4 hours. After the reaction, an infrared absorption spectrum was measured, and it was found that the infrared absorption of the allyl group at 1640 cm had disappeared. Thereafter, unreacted trichlorosilane was distilled off at 100° C. under reduced pressure (5 Torr). Furthermore, 192I methanol was added, and the generated hydrogen chloride gas was removed under reduced pressure.
Furthermore, 100 I of methyl orthoformate was added and the transesterification proceeded at 60°C for 2 hours, after which the volatiles were distilled off under reduced pressure (5 Torr).
合成例4(シラン化合物の合成 B−2)耐圧容器に1
−ウンデセンを1541仕込み、更に142Iのトリク
ロルシラン、0.5,9の塩化白金酸の10πイソプロ
パツール溶液を窒素雰囲気下で加え、90℃で4時間反
応させた。反応後、赤外吸収スペクトルを測定したとこ
ろ、1640cm=のアリル基の赤外吸収は消失してい
た。その後100℃にて未反応のトリクロルシランを減
圧下(5Torr)で留去した。更に、192Iiのメ
タノールを加え、生成する塩化水素ガスを減圧で除き、
更にオルトギ酸メチル100Iを加え、60゜で2時間
エステル交換を進めた後、減圧下(5Torr)で揮発
物を留去した。Synthesis Example 4 (Synthesis of silane compound B-2) 1 in a pressure container
- Undecene was charged at 1541, and a 10π isopropanol solution of 142 I trichlorosilane and 0.5,9 chloroplatinic acid was added under a nitrogen atmosphere, and the mixture was reacted at 90° C. for 4 hours. After the reaction, an infrared absorption spectrum was measured, and it was found that the infrared absorption of the allyl group at 1640 cm had disappeared. Thereafter, unreacted trichlorosilane was distilled off at 100° C. under reduced pressure (5 Torr). Furthermore, 192Ii methanol was added, and the generated hydrogen chloride gas was removed under reduced pressure.
Furthermore, 100 I of methyl orthoformate was added, and the transesterification was carried out at 60° for 2 hours, after which volatile substances were distilled off under reduced pressure (5 Torr).
合成例5(シラン化合物の合成 B−3)耐圧容器に、
1−ウンデセンを154I仕込み、更に1211のメチ
ルジクロルシラン、0.5.9の塩化白金酸の10%イ
ソプロパツール溶液を窒素雰囲気下で加え、90℃で4
時間反応させた。反応後、赤外吸収スペクトルを測定し
たところ、1640cm−1のアリル基の赤外吸収は消
失していた。その後100℃にて未反応のメチルジクロ
ルシランを減圧下(5Torr)で留去した。更に12
8gのメタノールを加え、生成する塩化水素ガスを減圧
で除き、更にオルトギ酸メチル100Iを加え、600
で2時間エステル交換を進めた後、減圧下(5Torr
) で揮発物を留去した。Synthesis Example 5 (Synthesis of silane compound B-3) In a pressure container,
1-Undecene was charged with 154I, and 1211 of methyldichlorosilane and 0.5.9 of a 10% isopropanol solution of chloroplatinic acid were added under a nitrogen atmosphere, and the mixture was heated at 90°C for 4 hours.
Allowed time to react. After the reaction, an infrared absorption spectrum was measured, and it was found that the infrared absorption of the allyl group at 1640 cm −1 had disappeared. Thereafter, unreacted methyldichlorosilane was distilled off at 100° C. under reduced pressure (5 Torr). 12 more
8 g of methanol was added, the generated hydrogen chloride gas was removed under reduced pressure, and 100 I of methyl orthoformate was added.
After proceeding with transesterification for 2 hours at
) to remove volatiles.
(白エナメルの調製)
合成例1.2で得られた共重合体溶液100Iに酸化チ
タン(5原産業製、0R−90)26.F。(Preparation of white enamel) Titanium oxide (manufactured by Gohara Sangyo, OR-90) 26. F.
キシレン17.9を加え、ペイントシェーカーで1時間
分散を行ない白エナメルを得た。17.9 g of xylene was added and dispersion was performed for 1 hour using a paint shaker to obtain white enamel.
実施例1〜6、比較例1〜2
合成例1.2で得られたシリル基含有ビニル樹脂(A)
の白エナメル塗料、合成例3〜5で得られたシラン化合
物(J3)、市販の有機スズ化合物TN801(堺化学
■製、ジオクチルスズマレート)の硬化触媒(Oを第1
表に示した組成(重量部)で配合し、更にキシレンで塗
装粘度に希釈し、塗料化した。Examples 1-6, Comparative Examples 1-2 Silyl group-containing vinyl resin (A) obtained in Synthesis Example 1.2
white enamel paint, silane compound (J3) obtained in Synthesis Examples 3 to 5, curing catalyst of commercially available organotin compound TN801 (manufactured by Sakai Chemical Co., Ltd., dioctyltin malate) (with O as the first
The compositions shown in the table (parts by weight) were blended and further diluted with xylene to a coating viscosity to form a paint.
塗料化した実施例、比較例の白エナメル塗料を、脱脂し
たアルミ板上に常法によりスプレー塗装した後、室温に
1日放置し、耐汚染性試験を行なった。The white enamel paints of Examples and Comparative Examples were spray-painted onto a degreased aluminum plate by a conventional method, and then left at room temperature for one day to conduct a stain resistance test.
耐汚染性は、塗膜上に塗料用カーボンの2π水スラリー
溶液をおとし、1晩室温に放皿し、粘着テープで圧着し
て遊藤カーボンをとり除き、塗膜のカーボンによるシミ
の程度を汚染用グレースケール(JIS−LO805に
準拠)により評価した。To test stain resistance, pour a 2π water slurry solution of carbon for paint onto the paint film, leave it at room temperature overnight, press it with adhesive tape to remove Yuto carbon, and check the degree of carbon stains on the paint film. Evaluation was made using a gray scale for contamination (based on JIS-LO805).
伸びは、乾燥膜厚30μになるようにフィルムを作成し
、室温で7日間硬化乾燥させ、得られた塗膜を室温で引
張り速度200 mm/m i nで測定した。For elongation, a film was prepared to have a dry film thickness of 30 μm, cured and dried at room temperature for 7 days, and the resulting coating film was measured at room temperature at a tensile speed of 200 mm/min.
第1表から分かる通り、本発明の組成物からなる塗料の
場合、耐汚染性が大巾に改良されている。As can be seen from Table 1, the stain resistance of paints made from the compositions of the present invention is greatly improved.
Claims (2)
、末端あるいは側鎖に加水分解性基と結 合した珪素原子を1分子中に少なくとも1 個有するシリル基含有ビニル系重合体 100重量部 (B)式 ▲数式、化学式、表等があります▼( I ) ▲数式、化学式、表等があります▼(II) 又は ▲数式、化学式、表等があります▼(III) (式中、R^1は炭素数1〜10の1価のアルキル基、
アラルキル基、アリール基より 選ばれる炭化水素基、Xはハロゲン、ヒド ロキシ、アルコキシ、アシロキシ、アミノ キシ、フェノキシ、チオアルコキシ、アミ ノ、ケトキシメート、アルケニルオキシ基 より選ばれる基、R^2は炭素数3〜200の1価のア
ルキル基を示し、nは0〜2の 整数を示す。) で示されるシラン化合物0.1〜100重 量部 及び(C)硬化触媒0〜20重量部を含有する常温硬化
性組成物。(1) (A) A silyl group-containing vinyl polymer whose main chain consists essentially of a vinyl polymer chain and which has at least one silicon atom in each molecule bonded to a hydrolyzable group at the terminal or side chain. 100 parts by weight (B) Formula ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (I) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (II) or ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (III) (In the formula , R^1 is a monovalent alkyl group having 1 to 10 carbon atoms,
A hydrocarbon group selected from an aralkyl group and an aryl group; represents a monovalent alkyl group, and n represents an integer of 0 to 2. ) A room temperature curable composition containing 0.1 to 100 parts by weight of a silane compound represented by the following formula and 0 to 20 parts by weight of a curing catalyst (C).
のトリメトキシシランである特許請求の範囲第1項記載
の組成物。(2) R^2 of the silane compound (B) has 10 to 20 carbon atoms
The composition according to claim 1, which is trimethoxysilane.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62293620A JP2593896B2 (en) | 1987-11-20 | 1987-11-20 | Room temperature curable stretch type resin composition for topcoat material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62293620A JP2593896B2 (en) | 1987-11-20 | 1987-11-20 | Room temperature curable stretch type resin composition for topcoat material |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01135872A true JPH01135872A (en) | 1989-05-29 |
JP2593896B2 JP2593896B2 (en) | 1997-03-26 |
Family
ID=17797070
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62293620A Expired - Lifetime JP2593896B2 (en) | 1987-11-20 | 1987-11-20 | Room temperature curable stretch type resin composition for topcoat material |
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Country | Link |
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JP (1) | JP2593896B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1999009099A1 (en) * | 1997-08-14 | 1999-02-25 | Kaneka Corporation | Curable composition |
JP2012056976A (en) * | 2010-09-03 | 2012-03-22 | Yokohama Rubber Co Ltd:The | Moisture-curable resin composition |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55152745A (en) * | 1979-05-17 | 1980-11-28 | Kanegafuchi Chem Ind Co Ltd | Curable composition |
JPS58111855A (en) * | 1981-12-25 | 1983-07-04 | Kanegafuchi Chem Ind Co Ltd | One-pack curable composition and its preparation |
JPS6047076A (en) * | 1983-08-25 | 1985-03-14 | Dainippon Ink & Chem Inc | Room temperature curing paint resin composition |
JPS6475567A (en) * | 1987-09-18 | 1989-03-22 | Kanegafuchi Chemical Ind | Cold curing polymer composition |
-
1987
- 1987-11-20 JP JP62293620A patent/JP2593896B2/en not_active Expired - Lifetime
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55152745A (en) * | 1979-05-17 | 1980-11-28 | Kanegafuchi Chem Ind Co Ltd | Curable composition |
JPS58111855A (en) * | 1981-12-25 | 1983-07-04 | Kanegafuchi Chem Ind Co Ltd | One-pack curable composition and its preparation |
JPS6047076A (en) * | 1983-08-25 | 1985-03-14 | Dainippon Ink & Chem Inc | Room temperature curing paint resin composition |
JPS6475567A (en) * | 1987-09-18 | 1989-03-22 | Kanegafuchi Chemical Ind | Cold curing polymer composition |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1999009099A1 (en) * | 1997-08-14 | 1999-02-25 | Kaneka Corporation | Curable composition |
JP2012056976A (en) * | 2010-09-03 | 2012-03-22 | Yokohama Rubber Co Ltd:The | Moisture-curable resin composition |
Also Published As
Publication number | Publication date |
---|---|
JP2593896B2 (en) | 1997-03-26 |
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