JPH01133938A - Method for reducing resistance of zink sulfide - Google Patents
Method for reducing resistance of zink sulfideInfo
- Publication number
- JPH01133938A JPH01133938A JP29382287A JP29382287A JPH01133938A JP H01133938 A JPH01133938 A JP H01133938A JP 29382287 A JP29382287 A JP 29382287A JP 29382287 A JP29382287 A JP 29382287A JP H01133938 A JPH01133938 A JP H01133938A
- Authority
- JP
- Japan
- Prior art keywords
- group
- zinc sulfide
- phosphate
- silicate
- zinc
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 18
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 title description 4
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 title 1
- 229910021480 group 4 element Inorganic materials 0.000 claims abstract description 13
- 229910021478 group 5 element Inorganic materials 0.000 claims abstract description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 10
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 8
- 230000004907 flux Effects 0.000 claims abstract description 7
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 5
- DLYUQMMRRRQYAE-UHFFFAOYSA-N tetraphosphorus decaoxide Chemical compound O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 claims abstract description 4
- 239000005083 Zinc sulfide Substances 0.000 claims description 38
- 229910052984 zinc sulfide Inorganic materials 0.000 claims description 38
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 claims description 38
- 150000001875 compounds Chemical class 0.000 claims description 31
- 238000010304 firing Methods 0.000 claims description 13
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 claims description 12
- FVAUCKIRQBBSSJ-UHFFFAOYSA-M sodium iodide Chemical group [Na+].[I-] FVAUCKIRQBBSSJ-UHFFFAOYSA-M 0.000 claims description 12
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 11
- 239000011593 sulfur Substances 0.000 claims description 9
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 6
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 claims description 6
- 235000009518 sodium iodide Nutrition 0.000 claims description 4
- ILRRQNADMUWWFW-UHFFFAOYSA-K aluminium phosphate Chemical compound O1[Al]2OP1(=O)O2 ILRRQNADMUWWFW-UHFFFAOYSA-K 0.000 claims description 3
- 239000003795 chemical substances by application Substances 0.000 claims description 3
- 235000011007 phosphoric acid Nutrition 0.000 claims description 3
- 229910000160 potassium phosphate Inorganic materials 0.000 claims description 3
- 235000011009 potassium phosphates Nutrition 0.000 claims description 3
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims description 3
- UEZVMMHDMIWARA-UHFFFAOYSA-N Metaphosphoric acid Chemical compound OP(=O)=O UEZVMMHDMIWARA-UHFFFAOYSA-N 0.000 claims description 2
- 239000004111 Potassium silicate Substances 0.000 claims description 2
- 239000004115 Sodium Silicate Substances 0.000 claims description 2
- 239000004110 Zinc silicate Substances 0.000 claims description 2
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 claims description 2
- 239000001506 calcium phosphate Substances 0.000 claims description 2
- 229910000389 calcium phosphate Inorganic materials 0.000 claims description 2
- 235000011010 calcium phosphates Nutrition 0.000 claims description 2
- 239000000378 calcium silicate Substances 0.000 claims description 2
- 229910052918 calcium silicate Inorganic materials 0.000 claims description 2
- 235000012241 calcium silicate Nutrition 0.000 claims description 2
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 claims description 2
- YWEUIGNSBFLMFL-UHFFFAOYSA-N diphosphonate Chemical group O=P(=O)OP(=O)=O YWEUIGNSBFLMFL-UHFFFAOYSA-N 0.000 claims description 2
- XPPKVPWEQAFLFU-UHFFFAOYSA-N diphosphoric acid Chemical compound OP(O)(=O)OP(O)(O)=O XPPKVPWEQAFLFU-UHFFFAOYSA-N 0.000 claims description 2
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 claims description 2
- GVALZJMUIHGIMD-UHFFFAOYSA-H magnesium phosphate Chemical compound [Mg+2].[Mg+2].[Mg+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O GVALZJMUIHGIMD-UHFFFAOYSA-H 0.000 claims description 2
- 239000004137 magnesium phosphate Substances 0.000 claims description 2
- 229910000157 magnesium phosphate Inorganic materials 0.000 claims description 2
- 229960002261 magnesium phosphate Drugs 0.000 claims description 2
- 235000010994 magnesium phosphates Nutrition 0.000 claims description 2
- 239000000391 magnesium silicate Substances 0.000 claims description 2
- 235000019792 magnesium silicate Nutrition 0.000 claims description 2
- 229910052919 magnesium silicate Inorganic materials 0.000 claims description 2
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 claims description 2
- 235000019353 potassium silicate Nutrition 0.000 claims description 2
- 229910052913 potassium silicate Inorganic materials 0.000 claims description 2
- 229940005657 pyrophosphoric acid Drugs 0.000 claims description 2
- 239000001488 sodium phosphate Substances 0.000 claims description 2
- 229910000162 sodium phosphate Inorganic materials 0.000 claims description 2
- 235000011008 sodium phosphates Nutrition 0.000 claims description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical group [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 claims description 2
- 229910052911 sodium silicate Inorganic materials 0.000 claims description 2
- 235000019794 sodium silicate Nutrition 0.000 claims description 2
- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 claims description 2
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 claims description 2
- LRXTYHSAJDENHV-UHFFFAOYSA-H zinc phosphate Chemical group [Zn+2].[Zn+2].[Zn+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LRXTYHSAJDENHV-UHFFFAOYSA-H 0.000 claims description 2
- 229910000165 zinc phosphate Inorganic materials 0.000 claims description 2
- XSMMCTCMFDWXIX-UHFFFAOYSA-N zinc silicate Chemical compound [Zn+2].[O-][Si]([O-])=O XSMMCTCMFDWXIX-UHFFFAOYSA-N 0.000 claims description 2
- 235000019352 zinc silicate Nutrition 0.000 claims description 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims 1
- 229910019142 PO4 Inorganic materials 0.000 claims 1
- 229960001714 calcium phosphate Drugs 0.000 claims 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims 1
- 239000010452 phosphate Substances 0.000 claims 1
- 229940093916 potassium phosphate Drugs 0.000 claims 1
- 229960003339 sodium phosphate Drugs 0.000 claims 1
- 239000012298 atmosphere Substances 0.000 abstract description 6
- 239000007789 gas Substances 0.000 abstract description 6
- 229910052797 bismuth Inorganic materials 0.000 abstract description 3
- 239000011261 inert gas Substances 0.000 abstract description 3
- 230000001590 oxidative effect Effects 0.000 abstract description 3
- 229910052787 antimony Inorganic materials 0.000 abstract description 2
- 229910052785 arsenic Inorganic materials 0.000 abstract description 2
- 238000001354 calcination Methods 0.000 abstract description 2
- 229910052732 germanium Inorganic materials 0.000 abstract description 2
- 229910052698 phosphorus Inorganic materials 0.000 abstract description 2
- 229910052710 silicon Inorganic materials 0.000 abstract description 2
- 229910052718 tin Inorganic materials 0.000 abstract description 2
- -1 e.g. Inorganic materials 0.000 abstract 2
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 229910052745 lead Inorganic materials 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 230000000694 effects Effects 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- 239000000654 additive Substances 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- YADSGOSSYOOKMP-UHFFFAOYSA-N dioxolead Chemical compound O=[Pb]=O YADSGOSSYOOKMP-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 3
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium oxide Inorganic materials O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000004570 mortar (masonry) Substances 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- DJHGAFSJWGLOIV-UHFFFAOYSA-N Arsenic acid Chemical compound O[As](O)(O)=O DJHGAFSJWGLOIV-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- AQTIRDJOWSATJB-UHFFFAOYSA-K antimonic acid Chemical compound O[Sb](O)(O)=O AQTIRDJOWSATJB-UHFFFAOYSA-K 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- 229940000488 arsenic acid Drugs 0.000 description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
- 230000000875 corresponding effect Effects 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 239000012776 electronic material Substances 0.000 description 2
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 2
- 229910003437 indium oxide Inorganic materials 0.000 description 2
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 150000004694 iodide salts Chemical class 0.000 description 2
- 229910000464 lead oxide Inorganic materials 0.000 description 2
- XMFOQHDPRMAJNU-UHFFFAOYSA-N lead(ii,iv) oxide Chemical compound O1[Pb]O[Pb]11O[Pb]O1 XMFOQHDPRMAJNU-UHFFFAOYSA-N 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 2
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 2
- QHGNHLZPVBIIPX-UHFFFAOYSA-N tin(ii) oxide Chemical compound [Sn]=O QHGNHLZPVBIIPX-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- OOSZCNKVJAVHJI-UHFFFAOYSA-N 1-[(4-fluorophenyl)methyl]piperazine Chemical compound C1=CC(F)=CC=C1CN1CCNCC1 OOSZCNKVJAVHJI-UHFFFAOYSA-N 0.000 description 1
- 101100268548 Caenorhabditis elegans apl-1 gene Proteins 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- VCUFZILGIRCDQQ-KRWDZBQOSA-N N-[[(5S)-2-oxo-3-(2-oxo-3H-1,3-benzoxazol-6-yl)-1,3-oxazolidin-5-yl]methyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C1O[C@H](CN1C1=CC2=C(NC(O2)=O)C=C1)CNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F VCUFZILGIRCDQQ-KRWDZBQOSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 229910000410 antimony oxide Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 229910000413 arsenic oxide Inorganic materials 0.000 description 1
- COHDHYZHOPQOFD-UHFFFAOYSA-N arsenic pentoxide Chemical compound O=[As](=O)O[As](=O)=O COHDHYZHOPQOFD-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910000416 bismuth oxide Inorganic materials 0.000 description 1
- WMWLMWRWZQELOS-UHFFFAOYSA-N bismuth(III) oxide Inorganic materials O=[Bi]O[Bi]=O WMWLMWRWZQELOS-UHFFFAOYSA-N 0.000 description 1
- 150000003842 bromide salts Chemical class 0.000 description 1
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- 150000003841 chloride salts Chemical class 0.000 description 1
- 229910000428 cobalt oxide Inorganic materials 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- IOUCSUBTZWXKTA-UHFFFAOYSA-N dipotassium;dioxido(oxo)tin Chemical compound [K+].[K+].[O-][Sn]([O-])=O IOUCSUBTZWXKTA-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 description 1
- TVQLLNFANZSCGY-UHFFFAOYSA-N disodium;dioxido(oxo)tin Chemical compound [Na+].[Na+].[O-][Sn]([O-])=O TVQLLNFANZSCGY-UHFFFAOYSA-N 0.000 description 1
- 238000007580 dry-mixing Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 229940119177 germanium dioxide Drugs 0.000 description 1
- 229910021472 group 8 element Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 229940035105 lead tetroxide Drugs 0.000 description 1
- 229910001629 magnesium chloride Inorganic materials 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
- PVADDRMAFCOOPC-UHFFFAOYSA-N oxogermanium Chemical compound [Ge]=O PVADDRMAFCOOPC-UHFFFAOYSA-N 0.000 description 1
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 229940047047 sodium arsenate Drugs 0.000 description 1
- PTLRDCMBXHILCL-UHFFFAOYSA-M sodium arsenite Chemical compound [Na+].[O-][As]=O PTLRDCMBXHILCL-UHFFFAOYSA-M 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 229940074545 sodium dihydrogen phosphate dihydrate Drugs 0.000 description 1
- 229940079864 sodium stannate Drugs 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- QUBMWJKTLKIJNN-UHFFFAOYSA-B tin(4+);tetraphosphate Chemical compound [Sn+4].[Sn+4].[Sn+4].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QUBMWJKTLKIJNN-UHFFFAOYSA-B 0.000 description 1
- NSBGJRFJIJFMGW-UHFFFAOYSA-N trisodium;stiborate Chemical compound [Na+].[Na+].[Na+].[O-][Sb]([O-])([O-])=O NSBGJRFJIJFMGW-UHFFFAOYSA-N 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- OMSYGYSPFZQFFP-UHFFFAOYSA-J zinc pyrophosphate Chemical compound [Zn+2].[Zn+2].[O-]P([O-])(=O)OP([O-])([O-])=O OMSYGYSPFZQFFP-UHFFFAOYSA-J 0.000 description 1
Landscapes
- Compositions Of Oxide Ceramics (AREA)
- Thermistors And Varistors (AREA)
Abstract
Description
【発明の詳細な説明】 (産業上の利用分野) 本発明は、硫化亜鉛の低抵抗化方法に関する。[Detailed description of the invention] (Industrial application field) The present invention relates to a method for reducing the resistance of zinc sulfide.
低抵抗化された硫化亜鉛は、種々の分野で応用が期待さ
れる有用な物質である。Zinc sulfide with reduced resistance is a useful substance that is expected to be applied in various fields.
(従来の技術)
本来硫化亜鉛は絶縁体であり、従来このものを低抵抗化
することが、種々試みられている。例えば、Apl 1
.Phys、Lett、、2ユ。(Prior Art) Zinc sulfide is originally an insulator, and various attempts have been made to lower the resistance of this material. For example, Apl 1
.. Phys, Lett, 2 units.
697 (1975)には、金属亜鉛とアルミニウムと
の900℃の溶融混合物中に、硫化亜鉛単結晶を10〜
24時間浸漬し、硫化亜鉛を低抵抗化する方法が記され
ている。しかし、この方法では耐蝕性の高温高圧に耐え
る高価な装置を要すること、処理に長時間を要すること
、又浸漬後it化亜鉛表面に付着した金属亜鉛とアルミ
ニウムを除去するため非常に繁雑な後処理を要すること
など工業的方法として適しているとはいえない。又、こ
の方法は硫化亜鉛粉末に適しているとはいえない。697 (1975), 10~10% of zinc sulfide single crystals were added to a molten mixture of metallic zinc and aluminum at 900°C.
A method for lowering the resistance of zinc sulfide by soaking it for 24 hours is described. However, this method requires expensive corrosion-resistant equipment that can withstand high temperatures and high pressures, requires a long processing time, and requires a very complicated post-processing process to remove metallic zinc and aluminum that adhere to the surface of the IT-based zinc after dipping. It cannot be said to be suitable as an industrial method as it requires treatment. Further, this method cannot be said to be suitable for zinc sulfide powder.
(発明が解決しようとする問題点)
絶縁体として知られている硫化亜鉛を低抵抗化すること
は、例えば電子材料及び発光材料管種々の分野で期待さ
れ、産業上非常に意義のあることである。(Problems to be solved by the invention) Reducing the resistance of zinc sulfide, which is known as an insulator, is expected to be used in various fields such as electronic materials and luminescent material tubes, and is of great industrial significance. be.
本発明者らは、種々の方法で硫化亜鉛を低抵抗化するこ
とを鋭意研究し、本発明に到達した。The present inventors have conducted extensive research into reducing the resistance of zinc sulfide using various methods, and have arrived at the present invention.
即ち、本発明者らは、硫化亜鉛に第4族元素の化合物及
び第5族元素の化合物のうち1種又は2種以上を硫化亜
鉛に対して、0.01〜10重量パーセント添加して焼
成することによ′つて硫化亜鉛を低抵抗化する方法を見
出した。That is, the present inventors added 0.01 to 10% by weight of one or more of a group 4 element compound and a group 5 element compound to zinc sulfide, and fired the mixture. We have discovered a method of lowering the resistance of zinc sulfide by doing this.
本発明による方法は、特に高価な装置や繁雑な操作を必
要とすることなく、容易に且つ安価に硫化亜鉛の低抵抗
化を達成することができる。The method according to the present invention can easily and inexpensively reduce the resistance of zinc sulfide without requiring particularly expensive equipment or complicated operations.
(問題点を解決するための手段)
本発明の要旨は、硫化亜鉛に第4族元素の化合物及び第
5族元素の化合物のうち、1種又は2種以上を硫化亜鉛
に対して0.01〜10重予パーセント添加して焼成す
ることを特徴とする硫化亜鉛の低抵抗化方法である。(Means for Solving the Problems) The gist of the present invention is to add one or more of a group 4 element compound and a group 5 element compound to zinc sulfide at a concentration of 0.01 to zinc sulfide. This is a method for reducing the resistance of zinc sulfide, which is characterized by adding ~10% by weight and firing.
ここで、焼成に際しては、所謂融剤として知られている
種々の塩化物、臭化物、沃化物などと硫黄とを加えた方
が好結果を与えることが多い。融剤の例としては、塩化
ナトリウム、臭化ナトリウム、沃化ナトリウム、塩化カ
リウム、臭化カリウム、沃化カリウム、塩化アンモン、
塩化亜鉛、塩化マグネシウム等が挙げられるが、特に好
ましいものとしては、沃化ナトリウム、沃化カリウム等
の沃化物である。Here, during firing, better results are often obtained by adding sulfur and various chlorides, bromides, iodides, etc. known as so-called fluxing agents. Examples of fluxing agents include sodium chloride, sodium bromide, sodium iodide, potassium chloride, potassium bromide, potassium iodide, ammonium chloride,
Examples include zinc chloride and magnesium chloride, but particularly preferred are iodides such as sodium iodide and potassium iodide.
融剤を添加すると、焼成の際に第4族元素の化合物及び
第5族元素の化合物が硫化亜鉛中によく浸透し、これら
が速やかに拡散するため好結果を与えるものと考えられ
る。It is believed that the addition of a flux allows the compounds of group 4 elements and compounds of group 5 elements to penetrate well into zinc sulfide during firing and quickly diffuse, giving good results.
又、硫黄を添加することは、元来硫化亜鉛中の硫黄は特
に高温では揮発性でおり、これを抑制するのに有効であ
ると考えられる。特に、硫黄を全く添加せずに焼成する
と硫化亜鉛が変質し、硫化亜鉛そのものの特性が失われ
ることがある。Furthermore, the addition of sulfur is considered to be effective in suppressing the sulfur in zinc sulfide, which is volatile especially at high temperatures. In particular, when fired without adding any sulfur, the quality of zinc sulfide changes and the properties of zinc sulfide itself may be lost.
融剤及び硫黄の添加量は特に限定されるものではないが
、余り少くては、効果はなく、一方多過ぎてもそれに見
合った効果が1qられないので不経済″Cおる。適当な
融剤の量は硫化亜鉛に対して、0、1〜10重量パーセ
ント、一方硫黄の量は0.5〜20小fflパーセント
の範囲である。この融剤と硫黄とは、どちらか一方でも
それなりの効果はめるが、添加する場合には両者併用す
ることが望ましい。The amount of flux and sulfur added is not particularly limited, but if it is too small, there will be no effect, and if it is too large, the corresponding effect will not be achieved by 1q, making it uneconomical. The amount of sulfur is in the range of 0.1 to 10 weight percent relative to zinc sulfide, while the amount of sulfur is in the range of 0.5 to 20 ffl percent. However, if they are added, it is desirable to use both together.
本発明において第4族元素の化合物とは、ケイ素、ゲル
マニウム、錫、鉛の化合物が対象となるが、就中ケイ素
酸化物、ケイ酸及びその塩、ゲルマニウム酸化物、錫酸
化物、錫酸及びその塩、鉛酸化物が好ましい。更に具体
的に、これらの化合物を例示すると、二酸化ケイ素、ケ
イ酸、ケイ酸ナトリウム、ケイ酸カリウム、ケイ酸マグ
ネシウム、ケイ酸カルシウム、ケイ酸亜鉛、ケイ酸アル
ミニウム、二酸化ゲルマニウム、酸化第一錫、酸化第二
錫、錫酸、錫酸ナトリウム、錫酸カリウム。In the present invention, compounds of Group 4 elements include compounds of silicon, germanium, tin, and lead, among which silicon oxide, silicic acid and its salts, germanium oxide, tin oxide, stannic acid, and Its salt, lead oxide, is preferred. More specifically, examples of these compounds include silicon dioxide, silicic acid, sodium silicate, potassium silicate, magnesium silicate, calcium silicate, zinc silicate, aluminum silicate, germanium dioxide, stannous oxide, Stannic oxide, stannic acid, sodium stannate, potassium stannate.
−酸化鉛、二酸化鉛、二酸化鉛、四酸化鉛等が挙げられ
る。- Lead oxide, lead dioxide, lead dioxide, lead tetroxide, and the like.
一方、第5族元素の化合物とは、リン、ヒ素。On the other hand, compounds of Group 5 elements include phosphorus and arsenic.
アンチモン、ビスマスの化合物が対象となるが、就中リ
ン酸化物、リン酸及びその塩、ヒ素酸化物。Target compounds include antimony and bismuth, but especially phosphoric oxides, phosphoric acid and its salts, and arsenic oxides.
ヒ酸及びその塩、アンチモン酸化物、アンチモン酸及び
その塩、ビスマス酸化物が好ましい。Arsenic acid and its salts, antimony oxide, antimonic acid and its salts, and bismuth oxide are preferred.
更に具体的にこれらの化合物を例示すると、五酸化リン
、メタリン酸、オルトリン酸、ピロリン酸。More specific examples of these compounds include phosphorus pentoxide, metaphosphoric acid, orthophosphoric acid, and pyrophosphoric acid.
リン酸ナトリウム、リン酸カリウム、リン酸マグネシウ
ム、リン酸カルシウム、リン酸亜鉛、リン酸アルミニウ
ム、リン酸錫、五酸化二ヒ素、ヒ酸。Sodium phosphate, potassium phosphate, magnesium phosphate, calcium phosphate, zinc phosphate, aluminum phosphate, tin phosphate, diarsenic pentoxide, arsenic acid.
亜ヒ酸、ヒ酸ナトリウム、三酸化アンチモン、アンチモ
ン酸、アンチモン酸ナトリウム、三酸化ビスマス等が挙
げられる。Examples include arsenite, sodium arsenate, antimony trioxide, antimonic acid, sodium antimonate, bismuth trioxide, and the like.
これらは、単独に使用してもよいし、又2種以上を併用
してもよい。これは低抵抗化の目的と添加物の種類によ
って選択すぺぎである。These may be used alone or in combination of two or more. This is selected depending on the purpose of reducing resistance and the type of additive.
これらの添加母は種類によって一義的に限定はできない
が、通常0.01〜10重量パーセントの範囲、好まし
くは0.05〜5重量パーセントの範囲が適当でおる。Although these additives cannot be uniquely limited depending on the type, they are usually in the range of 0.01 to 10% by weight, preferably in the range of 0.05 to 5% by weight.
0.01重最パーセント未満では効果がなく、一方10
重量パーセントを超えると、それに見合う効果が得られ
ないばかりか、特性が失われることがあるので避けるべ
きでおる。Less than 0.01 weight percent has no effect, while 10
If the weight percentage is exceeded, not only the corresponding effect cannot be obtained, but also the properties may be lost, so it should be avoided.
硫化亜鉛とこれらの添加物又、場合によっては融剤と硫
黄とは、できるだけ均一に混合することが好ましい。混
合方法としては乳鉢又はボールミル等の乾式混合、或は
水等の適当な媒体を用いる湿式混合を有利に利用するこ
とができる。It is preferred that zinc sulfide and these additives, and in some cases flux and sulfur, be mixed as uniformly as possible. As a mixing method, dry mixing using a mortar or ball mill, or wet mixing using a suitable medium such as water can be advantageously used.
混合の順序は特に限定されることなく、全部−緒に混合
すればよい。これらの混合物は次の焼成工程に供される
。The order of mixing is not particularly limited, and all may be mixed together. These mixtures are subjected to the next firing step.
焼成工程は、酸化性ガス雰囲気、還元性ガス雰囲気或は
不活性ガス雰囲気中で実施される。酸化性ガスとしては
空気、酸素、還元性ガスとしては水素、硫化水素、不活
性ガスとしては窒素、アルゴン等があり、全て利用でき
る。どの雰囲気中で焼成するかは、目的と添加物の種類
により選択すべき問題である。The firing process is performed in an oxidizing gas atmosphere, a reducing gas atmosphere, or an inert gas atmosphere. Oxidizing gases include air and oxygen, reducing gases include hydrogen and hydrogen sulfide, and inert gases include nitrogen and argon, all of which can be used. The atmosphere to be used for firing should be selected depending on the purpose and the type of additives.
焼成温度は400〜1500’Cの範囲、好ましくは5
00〜1200℃の範囲が適当である。The firing temperature ranges from 400 to 1500'C, preferably 5
A range of 00 to 1200°C is suitable.
400’C未満では充分な焼成や添加物の充分な拡散が
行なわれず、一方1500’Cを超えると、高温のため
不経済であり、又逆に効果が低下する場合がある。If it is less than 400'C, sufficient calcination or sufficient diffusion of additives will not be carried out, while if it exceeds 1500'C, it will be uneconomical due to the high temperature, and on the contrary, the effect may be reduced.
本発明によって硫化亜鉛が低抵抗となる理由は、現在の
所、充分詳らかではないが第4族元素の化合物及び第5
族元素の化合物の一部がそのまま、或はこれらが化学的
に変化したものの一部が硫化亜鉛結晶中に固溶したため
と考えられる。又、本発明者らの実験によれば、酸化マ
グネシウム、酸化カルシウムの如き第2族元素の化合物
、酸化アルミニウム、酸化インジウムの如き第3族元素
の化合物、酸化鉄、酸化コバルトの如き第8族元素の化
合物を添加して焼成しても全く効果はない。The reason why zinc sulfide has low resistance according to the present invention is not fully understood at present, but
It is thought that this is because some of the group element compounds as they were or some of these chemically changed compounds were dissolved in the zinc sulfide crystal. Furthermore, according to the experiments of the present inventors, compounds of Group 2 elements such as magnesium oxide and calcium oxide, compounds of Group 3 elements such as aluminum oxide and indium oxide, and compounds of Group 8 elements such as iron oxide and cobalt oxide. Adding a compound of the element and firing it has no effect at all.
尚、上記の第4族元素及び第5族元素以外の族の元素が
、本発明の第4族元素の化合物及び第5族元素の化合物
の組成の溝底成分となっていることは全く差し支えない
。要するに、第4族元素及び第5族元素以外の化合物は
低抵抗化に際し、プラスの効果も、マイナスの効果も与
えないので、添加の必要はない。Furthermore, it is completely acceptable for elements of groups other than the above-mentioned Group 4 elements and Group 5 elements to be the bottom component of the composition of the Group 4 element compound and the Group 5 element compound of the present invention. do not have. In short, compounds other than Group 4 elements and Group 5 elements do not have a positive or negative effect when lowering the resistance, so there is no need to add them.
本発明の方法によって、例えば体積抵抗1010〜10
Ω・cmを有する硫化亜鉛が、105〜106Ω・c
mを有する低抵抗硫化亜鉛となる。体積抵抗の測定は試
料0.2gを内径10mのアルミナ円筒に入れ、900
Kl/ criの加圧下で抵抗計を用いて測定する。By the method of the invention, for example, a volume resistivity of 1010 to 10
Zinc sulfide with Ω・cm is 105 to 106 Ω・c
It becomes low resistance zinc sulfide with m. To measure the volume resistance, place 0.2 g of the sample into an alumina cylinder with an inner diameter of 10 m, and
Measure using a resistance meter under pressure of Kl/cri.
(発明の効果)
本発明によって、工業的に右利に低抵抗化硫化亜鉛が得
られ、このものは電子材料及び発光材料管種々の分野へ
の応用が期待されている。(Effects of the Invention) According to the present invention, low-resistivity zinc sulfide can be obtained industrially, and this product is expected to be applied to various fields of electronic materials and luminescent material tubes.
(実施例)
以下、実施例により本発明を更に詳細に説明するが、本
発明がこれに限定されるものではない。(Examples) Hereinafter, the present invention will be explained in more detail with reference to Examples, but the present invention is not limited thereto.
実施例1
硫化亜鉛粉末10gに二酸化ケイ素(無水ケイ酸・沈降
製)0.2y、融剤として沃化カリウム0.2g、5A
黄粉17を加え、乳鉢中で充分混合し、窒素雰囲気中毎
時200 ’Cの速度で胃温し、900’Cにて1時間
保持して焼成した。放冷後、水洗し、減圧下120’C
で乾燥して低抵抗化硫化亜鉛を得た。このものの体積抵
抗は、8X10”Ω・cmであった。尚、二酸化ケイ素
を加えないで同様に硫化亜鉛を処理した場合の体積抵抗
は、3X1010Ω・cmであった。Example 1 10 g of zinc sulfide powder, 0.2 y of silicon dioxide (manufactured by Silicic Anhydride/Precipitation), 0.2 g of potassium iodide as a flux, 5A
Yellow powder 17 was added, thoroughly mixed in a mortar, heated at a rate of 200'C/hour in a nitrogen atmosphere, and held at 900'C for 1 hour for firing. After cooling, wash with water and heat at 120'C under reduced pressure.
and dried to obtain low resistance zinc sulfide. The volume resistivity of this product was 8×10” Ω·cm. When zinc sulfide was treated in the same manner without adding silicon dioxide, the volume resistivity was 3×10 10 Ω·cm.
実施例2
硫化亜鉛粉末109にリン酸二水素ナトリウム二水塩0
.19を加え、乳鉢中で混合し、空気中毎時200’C
の速度で昇温し、600°Cにて1時間保持して焼成し
た。実施例1と同様に処理して低抵抗硫化亜鉛を得た。Example 2 Sodium dihydrogen phosphate dihydrate 0 in zinc sulfide powder 109
.. 19, mixed in a mortar and heated to 200'C/hr in air.
The temperature was raised at a rate of 200°C, and the temperature was maintained at 600°C for 1 hour for firing. A low resistance zinc sulfide was obtained by processing in the same manner as in Example 1.
このものの体積抵抗は、9×106Ω・cmであった。The volume resistivity of this material was 9×10 6 Ω·cm.
実施例3
硫化亜鉛粉末10gにリン酸水素二ナトリウム0.53
を加えて充分混合し、窒素雰囲気中200°Cで30分
間保持した後、硫化水素雰囲気中毎時200 ’Cの速
度で界温し、1200’Cで30分間保持して焼成した
。同様に処理して得た低抵抗化硫化亜鉛の体積抵抗は、
5X10”Ω・cmであった。Example 3 0.53 disodium hydrogen phosphate in 10 g of zinc sulfide powder
was added, thoroughly mixed, and held at 200° C. for 30 minutes in a nitrogen atmosphere, then brought to ambient temperature at a rate of 200° C./hour in a hydrogen sulfide atmosphere, and held at 1200° C. for 30 minutes for firing. The volume resistivity of low-resistivity zinc sulfide obtained by the same treatment is
It was 5×10”Ω·cm.
実施例4〜16及び比較例1〜2
硫化亜鉛粉末10g、融剤として沃化ナトリウム0.5
g、硫黄粉1g及び表1に示す第4族元素の化合物或
は第5族元素化合物を充分混合し、窒素雰囲気中800
’Cで1時間焼成した。実施例1と同様に処理して低
抵抗化硫化亜鉛を得た。表1に体積抵抗を測定した結果
を示す。又、表1に第4族元素の化合物及び第5族元素
の化合物の代りに第3族元素化合物を加えた場合の比較
例を示す。Examples 4 to 16 and Comparative Examples 1 to 2 10 g of zinc sulfide powder, 0.5 sodium iodide as a flux
g, 1 g of sulfur powder and a compound of a group 4 element or a compound of a group 5 element shown in Table 1 were thoroughly mixed, and 800 g of sulfur powder was mixed in a nitrogen atmosphere.
It was baked at 'C for 1 hour. A low resistance zinc sulfide was obtained by processing in the same manner as in Example 1. Table 1 shows the results of measuring volume resistance. Table 1 also shows comparative examples in which a Group 3 element compound was added in place of the Group 4 element compound and the Group 5 element compound.
のトLr)CD寸へのの り 実圧倒Nα 化合物名 12) リン酸カリウム 13) ピロリン酸亜鉛 14) リン酸アルミニウム 15)三醒化ビスマス 比較例 1) 酸化アルミニウム 2) 酸化インジュウム 添カロ量 体積抵抗 0.29 1 X106Ω・Cm O,25x106 0.2 1 X106 0.2 5 Xl07 0−1 3 X106 0.05 0.2 4 X108 0.1 6 XIO10(Lr) CD size the law of nature Real overwhelming Nα Compound name 12) Potassium phosphate 13) Zinc pyrophosphate 14) Aluminum phosphate 15) Three Awakening Bismuth Comparative example 1) Aluminum oxide 2) Indium oxide Added calorie volume volume resistance 0.29 1×106Ω・Cm O, 25x106 0.2 X106 0.2 5 Xl07 0-1 3 X106 0.05 0.2 4×108 0.1 6 XIO10
Claims (5)
の化合物のうち1種又は2種以上を硫化亜鉛に対して0
.01〜10重量パーセント添加して焼成することを特
徴とする硫化亜鉛の低抵抗化方法。(1) To zinc sulfide, one or more of the compounds of group 4 elements and compounds of group 5 elements are added to zinc sulfide.
.. 1. A method for reducing the resistance of zinc sulfide, which comprises adding 1 to 10 percent by weight of zinc sulfide and firing.
範囲第1項記載の方法。(2) The method according to claim 1, wherein a flux and sulfur are added during firing.
特許請求の範囲第2項記載の方法。(3) The method according to claim 2, wherein the fluxing agent is sodium iodide or potassium iodide.
ケイ酸ナトリウム、ケイ酸カリウム、ケイ酸マグネシウ
ム、ケイ酸カルシウム、ケイ酸亜鉛、又はケイ酸アルミ
ニウムである特許請求の範囲第1項又は第2項記載の方
法。(4) The compound of Group 4 element is silicon dioxide, silicic acid,
3. The method according to claim 1 or 2, wherein the silicate is sodium silicate, potassium silicate, magnesium silicate, calcium silicate, zinc silicate, or aluminum silicate.
、オルトリン酸、ピロリン酸、リン酸ナトリウム、リン
酸カリウム、リン酸マグネシウム、リン酸カルシウム、
リン酸亜鉛又はリン酸アルミニウムである特許請求の範
囲第1項又は第2項記載の方法。(5) The compound of Group 5 element is phosphorus pentoxide, metaphosphoric acid, orthophosphoric acid, pyrophosphoric acid, sodium phosphate, potassium phosphate, magnesium phosphate, calcium phosphate,
3. The method according to claim 1 or 2, wherein the phosphate is zinc phosphate or aluminum phosphate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29382287A JPH01133938A (en) | 1987-11-19 | 1987-11-19 | Method for reducing resistance of zink sulfide |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29382287A JPH01133938A (en) | 1987-11-19 | 1987-11-19 | Method for reducing resistance of zink sulfide |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01133938A true JPH01133938A (en) | 1989-05-26 |
Family
ID=17799606
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP29382287A Pending JPH01133938A (en) | 1987-11-19 | 1987-11-19 | Method for reducing resistance of zink sulfide |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01133938A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110869320A (en) * | 2017-03-21 | 2020-03-06 | 哈里发科学技术大学 | Mechanical-thermal preparation of zinc sulfide nanoparticles |
-
1987
- 1987-11-19 JP JP29382287A patent/JPH01133938A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110869320A (en) * | 2017-03-21 | 2020-03-06 | 哈里发科学技术大学 | Mechanical-thermal preparation of zinc sulfide nanoparticles |
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