JPH01122060U - - Google Patents
Info
- Publication number
- JPH01122060U JPH01122060U JP1510988U JP1510988U JPH01122060U JP H01122060 U JPH01122060 U JP H01122060U JP 1510988 U JP1510988 U JP 1510988U JP 1510988 U JP1510988 U JP 1510988U JP H01122060 U JPH01122060 U JP H01122060U
- Authority
- JP
- Japan
- Prior art keywords
- bottomed cylindrical
- magnetic
- cylindrical support
- plate
- cooling water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000498 cooling water Substances 0.000 claims description 4
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Description
第1図は本考案のマグネトロンスパツタリング
装置の陰極構造の1実施例を示する概略側断面図
、第2図はそれに用いる下部バツキングプレート
の斜視図、第3図は他の実施例の概略側断面図、
第4図はそれに用いる下部バツキングプレートの
斜視図、第5図は従来の陰極構造の概略側断面図
である。
1……有底円筒支持台、1a……冷却水導入口
、1b……冷却水導出口、1c……周壁、2,1
2,13′……Oリング、3……バツキングプレ
ート、4,14,23……ターゲツト板、5……
マグネツト手段、5a……N極、5b……S極、
5c……スペーサリング、6……非磁性カバー、
6a……鍔部、6b……補助カバー、11,21
……下部バツキングプレート、11a……段差部
、13,22……上部バツキングプレート、15
……スペーサ。
FIG. 1 is a schematic side sectional view showing one embodiment of the cathode structure of the magnetron sputtering apparatus of the present invention, FIG. 2 is a perspective view of the lower backing plate used therein, and FIG. Schematic side sectional view,
FIG. 4 is a perspective view of a lower backing plate used therein, and FIG. 5 is a schematic side sectional view of a conventional cathode structure. 1...Cylindrical support with bottom, 1a...Cooling water inlet, 1b...Cooling water outlet, 1c...Peripheral wall, 2,1
2, 13'... O-ring, 3... Bucking plate, 4, 14, 23... Target plate, 5...
Magnetic means, 5a...N pole, 5b...S pole,
5c...Spacer ring, 6...Nonmagnetic cover,
6a... Flange, 6b... Auxiliary cover, 11, 21
...Lower bucking plate, 11a...Step part, 13, 22...Upper bucking plate, 15
……Spacer.
Claims (1)
開口する非磁性の有底円筒支持台と、該有底円筒
支持台に載置された環状の下部バツキングプレー
トと、該下部バツキングプレートに重畳され上面
にはターゲツト板が一体的に固定されている上部
バツキングプレートと、前記有底円筒容器の中に
設置されて前記ターゲツト板を横切る磁界を形成
するマグネツト手段と、前記ターゲツト板の周縁
から前記有底円筒支持台の外側面までを被包して
周設される非磁性カバーとから成ることを特徴と
するマグネトロンスパツタリング装置の陰極構造
。 A non-magnetic bottomed cylindrical support base having a cooling water inlet and a cooling water outlet and open at the top, an annular lower bucking plate placed on the bottomed cylindrical support base, and the lower backing plate. an upper backing plate on which a target plate is integrally fixed on the top surface; a magnetic means installed in the bottomed cylindrical container to form a magnetic field across the target plate; A cathode structure for a magnetron sputtering device, comprising a non-magnetic cover surrounding the periphery and the outer surface of the bottomed cylindrical support.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1510988U JPH01122060U (en) | 1988-02-09 | 1988-02-09 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1510988U JPH01122060U (en) | 1988-02-09 | 1988-02-09 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01122060U true JPH01122060U (en) | 1989-08-18 |
Family
ID=31226877
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1510988U Pending JPH01122060U (en) | 1988-02-09 | 1988-02-09 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01122060U (en) |
-
1988
- 1988-02-09 JP JP1510988U patent/JPH01122060U/ja active Pending