JPH01118217A - Production of magnetic disk - Google Patents

Production of magnetic disk

Info

Publication number
JPH01118217A
JPH01118217A JP27609187A JP27609187A JPH01118217A JP H01118217 A JPH01118217 A JP H01118217A JP 27609187 A JP27609187 A JP 27609187A JP 27609187 A JP27609187 A JP 27609187A JP H01118217 A JPH01118217 A JP H01118217A
Authority
JP
Japan
Prior art keywords
substrate
magnetic disk
thickness
magnetic
fine particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP27609187A
Other languages
Japanese (ja)
Inventor
Tadashi Hyono
表野 匡
Hayaaki Fukumoto
福本 隼明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP27609187A priority Critical patent/JPH01118217A/en
Publication of JPH01118217A publication Critical patent/JPH01118217A/en
Pending legal-status Critical Current

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  • Magnetic Record Carriers (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

PURPOSE:To obtain a high-reliability magnetic disk which has excellent contact start stop durability and small head attraction force by injecting fine particles to a substrate to form ruggedness on the surface thereof and forming a magnetic layer on such substrate. CONSTITUTION:An NiP underlying plating layer 2 is formed at 20mum thickness on the substrate (1.9mm thickness) 1 consisting of an Al-Mg alloy finished by lathing and the surface thereof is finished by polishing so as to have 15mum thickness and <=0.007mum surface roughness Ra. The fine particles of SiO2 (10mum average particle size) are injected onto the surface of such substrate by which the substrate 20 formed with the ruggedness is obtd. A Co-Ni film is formed to 0.08mum thickness by a high-frequency sputtering method as the magnetic layer 3 on the surface of the substrate formed with the ruggedness and further, a protective film consisting of SiO2 is formed to 0.04mum thickness thereon, on which a lubricating agent is spin-coated. The high-performance magnetic disk having the excellent contact start stop durability and the small head attraction force is thus obtd.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は磁気ディスクに関するものであり、特に磁性
層が薄膜よりなる磁気ディスクにおいてヘッドの摺動に
対する耐久性が良く、コンタクトスタートストップ(C
5S)特性も優れた磁気ディスクの製造方法に関するも
のである。
Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a magnetic disk, and in particular, a magnetic disk whose magnetic layer is a thin film has good durability against head sliding and has a contact start/stop (C
5S) The present invention relates to a method of manufacturing a magnetic disk with excellent characteristics.

〔従来の技術〕[Conventional technology]

スパッタ法、蒸着法などの方法によって磁性薄膜を形成
する薄膜型磁気デイヌクの基板としては、アルミ合金基
板上にNi合金めつき層を形成したものや、陽極酸化皮
膜を形成したものが使われ、さらにこれら下地皮膜形成
後、通常ポリッシング、フッピング等の研摩方法によシ
表面粗さRa O,005μm以下に鏡面化して使用さ
れる。
Substrates for thin-film magnetic deigns, in which magnetic thin films are formed by methods such as sputtering and vapor deposition, are made by forming a Ni alloy plating layer on an aluminum alloy substrate, or forming an anodic oxide film on an aluminum alloy substrate. Furthermore, after forming these base films, the surface is mirror-finished to a surface roughness of RaO, 005 μm or less by polishing methods such as polishing and flapping, and then used.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

ところがこの基板上に磁性薄膜を形成し、さらに保護膜
及び潤滑剤層を設けた場合、磁気ディスク表面、磁気ヘ
ッドスライダ−面ともに鏡面であるため潤滑剤あるいは
空気中の水分によシ吸着を生じ、C8Sにおいてディス
ク起動時に損傷を起こしやすい問題点があった。また、
潤滑剤の滞留場所がないためにヘッドとの摺動によυ潤
滑剤が飛散し、耐久性が劣るという問題点があった。こ
のような問題を解消するためには、磁気ディスク表面を
鏡面にすることなく凹凸を付けると良い、その面粗さは
Rmax 150〜600Aが適当である。
However, when a magnetic thin film is formed on this substrate, and a protective film and a lubricant layer are also provided, since both the magnetic disk surface and the magnetic head slider surface are mirror-finished, the lubricant or moisture in the air may be adsorbed. , C8S had the problem that disks were easily damaged when starting up. Also,
Since there is no place for the lubricant to stay, there is a problem in that the lubricant scatters due to sliding with the head, resulting in poor durability. In order to solve this problem, it is better to make the surface of the magnetic disk uneven without making it a mirror surface, and the appropriate surface roughness is Rmax 150 to 600A.

そこで、特開昭61−29418号明細Jに記載されて
いるような前記鏡面基板上にフッピングテープ等によシ
同心円状の細かいスジ(テクスチャー)をつけた基板を
用いる磁気ディスクや特開昭61−280618号明細
書に記載されているような表面に微粒子塗布層を配した
基板を用いる磁気ディスクが提案されている。しかじ前
者のように研摩粒子による加工法では粗大砥粒や異物に
よる大きな研摩キズがはいりやすく信号欠落の原因とな
っていた。また後者のように基板表面に塗布層を設ける
方法は塗布層の機械的強度や付着力が不足し、C8S時
に塗布層から剥離してしまうという問題点があった。
Therefore, a magnetic disk using a substrate on which fine concentric lines (texture) are formed using flipping tape or the like on the mirror substrate as described in Japanese Patent Application Laid-open No. 61-29418 J, A magnetic disk using a substrate having a fine particle coating layer on its surface as described in Japanese Patent No. 61-280618 has been proposed. However, in the former processing method using abrasive particles, large abrasive scratches caused by coarse abrasive particles or foreign matter tend to occur, causing signal loss. Furthermore, the latter method of providing a coating layer on the substrate surface has the problem that the coating layer lacks mechanical strength and adhesion, resulting in peeling from the coating layer during C8S.

この発明は上記問題点(こ鑑み、C8S特性を向上させ
信頼性の高い磁気ディスクを提保することを目的とする
ものである。
In view of the above-mentioned problems, the present invention aims to improve the C8S characteristics and provide a highly reliable magnetic disk.

〔問題点を解決するための手段〕[Means for solving problems]

この発明の磁気デイヌクの製造方法は、基板に微粒子を
噴射してその表面に凹凸を付け、その基板に磁性層を形
成するものである。
The method for manufacturing a magnetic decoupling according to the present invention involves spraying fine particles onto a substrate to form irregularities on its surface, thereby forming a magnetic layer on the substrate.

〔作用〕[Effect]

この発明による磁気ディスクにおいては基板表面に凹凸
を形成しているために磁性層表面にも凹凸が生じ、磁気
ヘッドが磁気ディスクと接触しても摩擦力が小さくでき
るので、C8S特性が向上し、また凹凸によシヘッドと
ディスクの間に空隙が存在するため吸着が生じないので
信頼性が改良できる。さらに微粒子噴射によシ基板表面
層は加工硬化しているため、耐久性を改善することがで
きる。
In the magnetic disk according to the present invention, since the surface of the substrate is uneven, the surface of the magnetic layer is also uneven, and even when the magnetic head contacts the magnetic disk, the frictional force can be reduced, so that the C8S characteristics are improved. Furthermore, since there is a gap between the head and the disk due to the unevenness, no adhesion occurs, so reliability can be improved. Furthermore, since the surface layer of the substrate is work-hardened by fine particle injection, durability can be improved.

さらにまた削るのでなく、たたいて凹凸を付けているの
で削りくずや研磨粒子が残らない・〔実施例〕 以下、この発明の磁気デイヌクの製造方法について実施
例をあげて説明する。
Furthermore, since the unevenness is created by pounding rather than cutting, no shavings or abrasive particles remain. [Example] The method for manufacturing the magnetic decoy of the present invention will be described below with reference to Examples.

実施例1 第1図はこの発明の一実捲例により得られた磁気ディス
クを示す断面図である。第1図において(1)は基板で
Al−Mg合金基板(1)とAl−Mg合金基板(1)
上に形成されたN1−P下地めっき層(2)よシな。
Example 1 FIG. 1 is a sectional view showing a magnetic disk obtained by an example of winding the present invention. In Fig. 1, (1) is a substrate, an Al-Mg alloy substrate (1) and an Al-Mg alloy substrate (1).
Like the N1-P base plating layer (2) formed thereon.

る。(3)はツバツタ法によ、9Ni−P下地めっき層
(2)上に形成した磁性層である。
Ru. (3) is a magnetic layer formed on the 9Ni-P underplating layer (2) by the tsubata method.

まず旋削により仕上げたAl−Mg合金基板(厚さ1.
g mm ) (1)上にNiP下地めっき層(2)を
zμm  の厚さで形成し、その表面をポリッシュする
ことによシ厚みが巧μmで、かつ表面粗さがRaで0.
007μm以下になるように仕上げた。この基板面上に
シリカ(SiOz)微粒子(平均粒7子径10μm)を
噴射することにより凹凸を付けた基板(1)を得た。こ
の凹凸を付けた基板表面に磁性層としてCo−Ni膜を
高周波スパッタ法にて0.08μm厚に形成し、さらに
その上に5iOz保護膜を0.04μm厚に形成し、潤
滑剤としてクライトクスAC(デュポン社商品名)をス
ピンコードして、第1図に示す磁気ディスクを得た。
First, an Al-Mg alloy substrate (thickness 1.
By forming a NiP base plating layer (2) with a thickness of zμm on (1) and polishing its surface, the thickness is finely μm and the surface roughness is Ra: 0.
It was finished to have a thickness of 0.007 μm or less. A substrate (1) with irregularities was obtained by spraying silica (SiOz) fine particles (average particle diameter of 7 particles: 10 μm) onto the surface of this substrate. A Co-Ni film with a thickness of 0.08 μm was formed as a magnetic layer on the uneven substrate surface by high-frequency sputtering, and a 5iOz protective film was further formed on the surface with a thickness of 0.04 μm, and Kryx AC was used as a lubricant. (Dupont Co., Ltd. product name) was spin-coded to obtain the magnetic disk shown in FIG.

微粒子の噴射の方法を第2図の微粒子噴射装置を示す概
略図によフ説明する。(6)は微粒子00をためておく
ホッパ一部、(7)は噴射のための噴射ノズルである。
The method of ejecting particles will be explained with reference to a schematic diagram of a particle injection device shown in FIG. (6) is a part of a hopper for storing fine particles 00, and (7) is a spray nozzle for spraying.

矢印(8)から噴射用圧縮空気を送り込むことにより微
粒子移送管(9)を通ってホッパ一部(6)より微粒子
が供給され、噴射ノズル(7)から磁気デイヌク基板(
1)表面へ微粒子00が噴射される。基板表面の凹凸の
大きさ及び深さを微粒子粒径及び噴射用圧縮空気の圧力
や、微粒子の硬さなどによシ制御することができる。な
お、この実施例1の磁気ディスク基板は平均粒子径10
μmのシリカ微粒子ヲ3.8kg/dの圧縮空気(ζて
噴射すること辺よって得られたものである。
By sending compressed air for injection from the arrow (8), particles are supplied from the hopper part (6) through the particle transfer pipe (9), and from the injection nozzle (7) the magnetic deinuk substrate (
1) Fine particles 00 are sprayed onto the surface. The size and depth of the unevenness on the substrate surface can be controlled by the particle size, the pressure of the compressed air for injection, the hardness of the particles, etc. Note that the magnetic disk substrate of Example 1 had an average particle diameter of 10
This was obtained by injecting 3.8 kg/d of compressed air (ζ) with micron silica particles.

このようにして鴎られた実施例1の磁気デイヌクの表面
の微分干渉顕微鏡写真(倍率200倍)を第8図に示す
が、均一な凹凸が形成されており表面粗さを測定すると
Rma xで0.028μmであった。
Fig. 8 shows a differential interference micrograph (magnification: 200x) of the surface of the magnetic decoy of Example 1 that has been molded in this way, and it shows that uniform irregularities are formed, and when the surface roughness is measured, it is Rmax. It was 0.028 μm.

実施例2 厚さ17μmのNi −Mo −P下地めっき付き基板
に微小水(H,O)粒子(平均粒径5μm)を噴射圧力
3.2kg/cutで噴射することにより基板表面に凹
凸をつけ、その上に磁性層として0.15μm厚のγ−
Fete、膜を形成し、さらに保護膜をSin、 0.
085μm1潤滑剤クライトクス148AD(デュポン
社商品名)を0.007μmヌピンコートして磁気ディ
スクを得た。この磁気ディスクの表面粗さはRma x
で0.02.2μmであった。
Example 2 The surface of the substrate was made uneven by spraying micro water (H, O) particles (average particle size 5 μm) at a spray pressure of 3.2 kg/cut onto a 17 μm thick Ni-Mo-P underplated substrate. , on which a 0.15 μm thick γ-
Fete, a film is formed, and a protective film is formed with Sin, 0.
A magnetic disk was obtained by coating the magnetic disk with 0.085 μm lubricant Kryx 148AD (trade name of DuPont) with a thickness of 0.007 μm. The surface roughness of this magnetic disk is Rmax
It was 0.02.2 μm.

比較例1 実施例1のNiP下地めっき付き基板(ポリッシュによ
り表面粗さRmax Q、007μmに仕上げたもの)
の上に実施例1と同じ磁性層、保穫膜、潤滑層を形成し
た。
Comparative Example 1 NiP underplating substrate of Example 1 (finished to surface roughness Rmax Q, 007 μm by polishing)
The same magnetic layer, protection film, and lubricant layer as in Example 1 were formed thereon.

比較例2 実施例2と同じNi −Mo  P下地めっき付き基板
を#4000のホワイトアルミナヲツピングテープでテ
クスチャー加工し、その上に実施例2と同じ磁性層、保
護膜、潤滑層を形成した。この磁気ディスクの表面粗さ
はRmaxで0.025μmであった。
Comparative Example 2 The same Ni-MoP underplating substrate as in Example 2 was textured with #4000 white alumina wopping tape, and the same magnetic layer, protective film, and lubricant layer as in Example 2 were formed thereon. The surface roughness of this magnetic disk was 0.025 μm in Rmax.

こうして碍られた実施例1,2I比較例1.2の磁気デ
ィスクについてMn−Znフェライトヘッドを使ってC
8S耐久性及びヘッド吸着の試験を行なった。第1表に
示すようにC8S耐久性は実施例1.2の磁気ディスク
ではどちらも25000回C8Sを繰り返してもヘッド
、ディスクとも損傷がみられなかった。また比較例1の
磁気ディスクでは16000回で、比較例2の磁気ディ
スクでは7500回でそれぞれディスクにスクフツチキ
ズが認められた。ヘッド吸着試験はヘッドを荷重9.5
gでデイヌ第1表 りに押し付け20”0651 R,Hで70時間放置後
の吸着力を測定することによシ行なった。実施例1,2
の磁気ディスクではそれぞれ2.8 g、 2.8 g
であったが比較例1ではr、99m比較例2では3.7
gであった。
With respect to the magnetic disks of Examples 1 and 2I and Comparative Example 1.2 thus prepared, a C
8S durability and head adsorption tests were conducted. As shown in Table 1, in terms of C8S durability, both the head and the disk showed no damage even after repeating C8S 25,000 times for both of the magnetic disks of Example 1.2. In addition, scratches were observed on the magnetic disk of Comparative Example 1 after 16,000 times, and scratches on the magnetic disk of Comparative Example 2 after 7,500 times. In the head adsorption test, the head was loaded with a load of 9.5
This was done by pressing the sample onto the first surface of Deinu with a pressure of 20" 0651 R, H and measuring the adsorption force after leaving it for 70 hours. Examples 1 and 2
2.8 g and 2.8 g for magnetic disks, respectively.
However, it was r in Comparative Example 1, and 3.7 in 99m Comparative Example 2.
It was g.

なお上記実施例においては下地めっきとしてN1−P及
びNi −Mo −Pの例を示したが、その他のめつき
下地あるいはアルマイト皮膜でもかまわない。
In the above embodiments, N1-P and Ni-Mo-P were used as the base plating, but other plating bases or alumite films may be used.

また磁性層としてCo−Ni及びγ−Fe! Os ス
パッタ膜の例を示したが、Co −Cr * Co−W
+ Co−Ni −0。
Moreover, Co-Ni and γ-Fe! Although an example of an Os sputtered film is shown, Co-Cr*Co-W
+Co-Ni-0.

Co−Fe 、 Fe−N等の薄膜としてもよい。It may also be a thin film of Co-Fe, Fe-N, or the like.

また、上記実施例では、シリカ及び氷(N20)の微粒
子を噴射する場合について示したが、微粒子としては他
にAl2O8,Ti O,、ZrO,、SiC、Si3
N、 。
In addition, in the above example, a case was shown in which fine particles of silica and ice (N20) were injected, but other fine particles include Al2O8, TiO,, ZrO,, SiC, and Si3.
N.

カーボン、四フッ化エチレン、塩ビ、NBRゴム。Carbon, tetrafluoroethylene, PVC, NBR rubber.

及びポリオレフィンのいずれか一種が用いられる。and polyolefin.

なお、氷(H,O)に限らず、他の液体を氷らしたもの
でも適用できる。また必要に応じて混合粒子を吹き付け
ても良い。さらに微粒子の粒径としては0.1〜200
μmの範囲が望ましい。
Note that not only ice (H, O) but also other liquids that have been frozen can be applied. Further, mixed particles may be sprayed as necessary. Furthermore, the particle size of fine particles is 0.1 to 200.
A range of μm is desirable.

〔発明の効果〕〔Effect of the invention〕

以上のように、この発明によれば、基板に微粒子を噴射
してその表面に凹凸を付け、その基板に磁性層を形成す
ることにより、C3S耐久性に優れ、ヘッド吸着力の小
さい信頼性の高いri1気ディスクが得られる効果があ
る。
As described above, according to the present invention, fine particles are sprayed onto a substrate to make the surface uneven, and a magnetic layer is formed on the substrate. This has the effect of producing a high ri1ki disc.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの発明の一実施例によシ得られた磁気ディス
クを示す断面図、第2図はこの発明の一実施例に係わる
微粒子噴射装置を示す概略図、第8図は実施例1によシ
得られた磁気デイヌクの表面状態の微分干渉顕微鏡写真
である。 図において、(3)は磁性層、(7)は噴射ノズル、a
oは微粒子、(1)は基板である。 なお、図中、同一符号は同−又は相当部分を示す。
FIG. 1 is a sectional view showing a magnetic disk obtained according to an embodiment of the present invention, FIG. 2 is a schematic diagram showing a particle injection device according to an embodiment of the present invention, and FIG. 8 is a sectional view showing a magnetic disk obtained according to an embodiment of the present invention. This is a differential interference microscopic photograph of the surface state of the magnetic delinquent obtained by this method. In the figure, (3) is the magnetic layer, (7) is the injection nozzle, and a
o is a fine particle, and (1) is a substrate. In addition, in the figures, the same reference numerals indicate the same or corresponding parts.

Claims (2)

【特許請求の範囲】[Claims] (1)基板に微粒子を噴射してその表面に凹凸を付け、
その基板に磁性層を形成する磁気ディスクの製造方法。
(1) Spray fine particles onto the substrate to make the surface uneven;
A method of manufacturing a magnetic disk in which a magnetic layer is formed on the substrate.
(2)微粒子がSiO_2、Al_2O_3、H_2O
(氷)、TiO_2、ZrO_2、SiC、Si_3N
_4、カーボン、四フッ化エチレン、塩ビ、NBRゴム
、及びポリオレフィンのいずれか一種である特許請求の
範囲第1項記載の磁気ディスクの製造方法。
(2) Fine particles are SiO_2, Al_2O_3, H_2O
(ice), TiO_2, ZrO_2, SiC, Si_3N
The method for manufacturing a magnetic disk according to claim 1, wherein the magnetic disk is any one of _4, carbon, tetrafluoroethylene, vinyl chloride, NBR rubber, and polyolefin.
JP27609187A 1987-10-30 1987-10-30 Production of magnetic disk Pending JPH01118217A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27609187A JPH01118217A (en) 1987-10-30 1987-10-30 Production of magnetic disk

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27609187A JPH01118217A (en) 1987-10-30 1987-10-30 Production of magnetic disk

Publications (1)

Publication Number Publication Date
JPH01118217A true JPH01118217A (en) 1989-05-10

Family

ID=17564677

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27609187A Pending JPH01118217A (en) 1987-10-30 1987-10-30 Production of magnetic disk

Country Status (1)

Country Link
JP (1) JPH01118217A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04232614A (en) * 1990-12-21 1992-08-20 Internatl Business Mach Corp <Ibm> Magnetic recording hard disk whose surface is roughened and surface roughening method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04232614A (en) * 1990-12-21 1992-08-20 Internatl Business Mach Corp <Ibm> Magnetic recording hard disk whose surface is roughened and surface roughening method

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