JPH01115235U - - Google Patents

Info

Publication number
JPH01115235U
JPH01115235U JP956088U JP956088U JPH01115235U JP H01115235 U JPH01115235 U JP H01115235U JP 956088 U JP956088 U JP 956088U JP 956088 U JP956088 U JP 956088U JP H01115235 U JPH01115235 U JP H01115235U
Authority
JP
Japan
Prior art keywords
reaction tube
electrode
reaction
heating
semiconductor manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP956088U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP956088U priority Critical patent/JPH01115235U/ja
Publication of JPH01115235U publication Critical patent/JPH01115235U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP956088U 1988-01-29 1988-01-29 Pending JPH01115235U (US08063081-20111122-C00044.png)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP956088U JPH01115235U (US08063081-20111122-C00044.png) 1988-01-29 1988-01-29

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP956088U JPH01115235U (US08063081-20111122-C00044.png) 1988-01-29 1988-01-29

Publications (1)

Publication Number Publication Date
JPH01115235U true JPH01115235U (US08063081-20111122-C00044.png) 1989-08-03

Family

ID=31216407

Family Applications (1)

Application Number Title Priority Date Filing Date
JP956088U Pending JPH01115235U (US08063081-20111122-C00044.png) 1988-01-29 1988-01-29

Country Status (1)

Country Link
JP (1) JPH01115235U (US08063081-20111122-C00044.png)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5372460A (en) * 1976-12-10 1978-06-27 Hitachi Ltd Plasma cvd unit
JPS57134925A (en) * 1981-02-16 1982-08-20 Kokusai Electric Co Ltd Plasma cvd film producer
JPS61154036A (ja) * 1984-12-26 1986-07-12 Mitsubishi Chem Ind Ltd グロ−放電装置
JPS62203330A (ja) * 1986-03-04 1987-09-08 Denkoo:Kk 反応管洗浄手段を備えた半導体熱処理装置
JPS62245626A (ja) * 1986-04-18 1987-10-26 Furendo Tec Kenkyusho:Kk 半導体製造装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5372460A (en) * 1976-12-10 1978-06-27 Hitachi Ltd Plasma cvd unit
JPS57134925A (en) * 1981-02-16 1982-08-20 Kokusai Electric Co Ltd Plasma cvd film producer
JPS61154036A (ja) * 1984-12-26 1986-07-12 Mitsubishi Chem Ind Ltd グロ−放電装置
JPS62203330A (ja) * 1986-03-04 1987-09-08 Denkoo:Kk 反応管洗浄手段を備えた半導体熱処理装置
JPS62245626A (ja) * 1986-04-18 1987-10-26 Furendo Tec Kenkyusho:Kk 半導体製造装置

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