JPH01110433U - - Google Patents
Info
- Publication number
- JPH01110433U JPH01110433U JP1988004154U JP415488U JPH01110433U JP H01110433 U JPH01110433 U JP H01110433U JP 1988004154 U JP1988004154 U JP 1988004154U JP 415488 U JP415488 U JP 415488U JP H01110433 U JPH01110433 U JP H01110433U
- Authority
- JP
- Japan
- Prior art keywords
- view
- rectangular hole
- semiconductor
- etching mask
- anisotropic etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005530 etching Methods 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 2
Description
第１図は本考案の一実施例の要部構成説明図で
、Ａは平面図、Ｂは側断面図、第２図、第３図は
第１図の動作説明図で、Ａは平面図、Ｂは側断面
図、第４図は従来より一般に使用されている従来
例の構成説明図で、Ａは平面図、Ｂは側断面図、
第５図は第４図の動作説明図で、Ａは平面図、Ｂ
は側断面図である。
２……半導体の１００面異方性エツチング加工
マスク、２１……四角穴、２１１……辺、２２…
…溝穴。
Fig. 1 is an explanatory view of the main part of an embodiment of the present invention, A is a plan view, B is a side sectional view, Figs. 2 and 3 are explanatory views of the operation of Fig. 1, and A is a plan view. , B is a side sectional view, FIG. 4 is an explanatory diagram of the configuration of a conventional example commonly used, A is a plan view, B is a side sectional view,
Figure 5 is an explanatory diagram of the operation of Figure 4, where A is a plan view and B
is a side sectional view. 2... 100-plane anisotropic etching mask for semiconductor, 21... Square hole, 211... Side, 22...
...Mizohole.
Claims (1)
穴の各角にそれぞれ一端が接続され１１０方向に
設けられた溝穴とを具備してなる半導体の１００
面異方性エツチング加工マスク。 A semiconductor 100 comprising a rectangular hole having sides in the 100 direction, and a slotted hole provided in the 110 direction with one end connected to each corner of the rectangular hole.
Planar anisotropic etching mask.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988004154U JPH079376Y2 (en) | 1988-01-19 | 1988-01-19 | (100) plane anisotropic etching mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988004154U JPH079376Y2 (en) | 1988-01-19 | 1988-01-19 | (100) plane anisotropic etching mask |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01110433U true JPH01110433U (en) | 1989-07-26 |
| JPH079376Y2 JPH079376Y2 (en) | 1995-03-06 |
Family
ID=31206413
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1988004154U Expired - Lifetime JPH079376Y2 (en) | 1988-01-19 | 1988-01-19 | (100) plane anisotropic etching mask |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH079376Y2 (en) |
-
1988
- 1988-01-19 JP JP1988004154U patent/JPH079376Y2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH079376Y2 (en) | 1995-03-06 |