JPH01106342A - Photo-detecting head chip - Google Patents

Photo-detecting head chip

Info

Publication number
JPH01106342A
JPH01106342A JP62263229A JP26322987A JPH01106342A JP H01106342 A JPH01106342 A JP H01106342A JP 62263229 A JP62263229 A JP 62263229A JP 26322987 A JP26322987 A JP 26322987A JP H01106342 A JPH01106342 A JP H01106342A
Authority
JP
Japan
Prior art keywords
light
photo
head chip
shielding film
photodetection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62263229A
Other languages
Japanese (ja)
Inventor
Kosei Wada
和田 好世
Toshihiko Nishihata
俊彦 西端
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Victor Company of Japan Ltd
Original Assignee
Victor Company of Japan Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Victor Company of Japan Ltd filed Critical Victor Company of Japan Ltd
Priority to JP62263229A priority Critical patent/JPH01106342A/en
Priority to US07/259,706 priority patent/US4987505A/en
Publication of JPH01106342A publication Critical patent/JPH01106342A/en
Pending legal-status Critical Current

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  • Optical Head (AREA)
  • Light Receiving Elements (AREA)

Abstract

PURPOSE:To reduce the error of a photo-detecting output due to light scattering by covering a part of the photo-nonsensitive band part formed on a substrate surface and the photo-sensitive band part adjoining to the photo-sensitive band part with a shielding film with a small reflection factor. CONSTITUTION:Instead of the shielding film with a high reflection factor composed of gold, aluminum, etc., for example, the shielding film composed of the material with the low reflection factor of light is formed. As the suitable material, molybdenum, carbon, etc., are effective, the film may be formed by a sputtering means, etc., so that the film thickness can be 0.1-2mum. For example, rectangular light receiving elements 30-1-30-4 are provided two by two horizontally and longitudinally and in parallel, a shielding film 30, excluding light receiving element parts 30-1-30-4, is formed continuously to a photo- nonsensitive band part 32.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は光検出セルの構造に係り、特に、セル上に投光
された光を高い分解能で区分検出するのに適したサーボ
系測光系等に利用される光検出セルに関する。
Detailed Description of the Invention (Industrial Application Field) The present invention relates to the structure of a photodetection cell, and in particular to a servo-based photometry system suitable for detecting light projected onto the cell in sections with high resolution. The present invention relates to photodetection cells used in applications such as photodetection cells.

(従来技術とその問題点) 従来、例えばコンパクトディスク(CD>、光デイスク
プレーヤ等においては、信号ビット列を同心状に形成し
た光ディスクから正しく信号を取り出すために各種のサ
ーボシステムが採用されている。このようなサーボシス
テムには例えば、光ディスクに入射する光スポットのぼ
やけに対して対物レンズの焦点を自動的に合せるための
フォーカスサーボシステムとか、この光スポットを信号
ビット列に正しく位置せしめるためのトラッキングサー
ボシステム等があるが、原理的には光ディスクに入射し
た光スポットの反射光の位置あるいは状態を知るための
光検出部を、入射光量に応じて光検出信号を与える独立
した複数の受光素子を状況に応じてパターン的に配設す
ることにより光検出ヘッドチップを構成し、そこに発生
した電圧分布を知りサーボを行・うちのである。
(Prior Art and its Problems) Conventionally, for example, in compact discs (CDs), optical disc players, etc., various servo systems have been employed in order to correctly extract signals from optical discs in which signal bit strings are formed concentrically. Examples of such servo systems include a focus servo system that automatically focuses an objective lens on a blurred light spot incident on an optical disk, and a tracking servo system that correctly positions this light spot on a signal bit string. There are systems, etc., but in principle, a photodetector is used to determine the position or state of the reflected light of the light spot incident on the optical disc, and a plurality of independent light receiving elements that provide a photodetection signal depending on the amount of incident light are used. A photodetection head chip is constructed by arranging it in a pattern according to the voltage, and the servo is performed by knowing the voltage distribution generated there.

従って、より高密度記録を目指す装置においては、信号
ビット列、ビット間隔等を更に小とする必要から、それ
に伴った光スポットの径や独立受光素子の寸法形状及び
隣接間隔をより小さくする必要があるが、そのために、
独立した受光素子間の分離特性を悪化させず高い分解能
を持たせる゛ための工夫がなされている。
Therefore, in devices aiming for higher density recording, it is necessary to further reduce the signal bit string, bit interval, etc., and accordingly, it is necessary to further reduce the diameter of the light spot, the dimensions and shape of the independent light receiving element, and the adjacent spacing. However, for that purpose,
Efforts have been made to provide high resolution without degrading the separation characteristics between independent light-receiving elements.

第4図は、従来の光検出ヘッドチップ10の平面図であ
り、以下同図を用いて説明する。
FIG. 4 is a plan view of a conventional photodetection head chip 10, and the following description will be made with reference to the same figure.

この光検出ヘッドチップ10は、例えば−枚のウェハ1
1の上にp型又はn型領域を形成することにより光受感
帯である矩形状の受光素子12−1〜12−4を4枚並
べて形成し、受光素子12−1〜12−4以外は光を感
じない光不感帯13となる様に構成しであるが、実際に
は光不感帯13と受感帯12−1〜12−4が接する境
界部においては0〜5μの範囲でブロードな受光感度地
帯を形成しており、分解能を上げる際に問題となってい
た。
For example, this photodetecting head chip 10 has - wafers 1
By forming a p-type or n-type region on 1, four rectangular light-receiving elements 12-1 to 12-4, which are photosensitive zones, are formed side by side. is configured to be a light dead zone 13 that does not sense light, but in reality, at the boundary where the light dead zone 13 and the sensitive zones 12-1 to 12-4 touch, there is broad light reception in the range of 0 to 5μ. This creates a sensitive zone, which poses a problem when increasing resolution.

第5図は、第4図に示す従来の光検出ヘッドチップの光
不感帯と光受感帯との境界近傍の受光感度を示す説明図
であり、横軸に×方向の位置、縦軸にXに対応する受光
感度をとっである。
FIG. 5 is an explanatory diagram showing the light receiving sensitivity near the boundary between the light dead zone and the light sensitive zone of the conventional photodetection head chip shown in FIG. 4, where the horizontal axis represents the position in the x direction and the vertical axis represents the The light-receiving sensitivity corresponding to

同図から明らかな様に、入来光14による受光素子(例
えば12−27際の受光感度曲線15はブロードな減衰
特性を示し、理想的な角型特性、16とはならず、分解
能を向上させるには出来るだけ、受光感度曲線15を角
型特性16に近ずける必要があった。
As is clear from the figure, the light-receiving sensitivity curve 15 of the light-receiving element (for example, 12-27) due to the incoming light 14 shows a broad attenuation characteristic, and does not have the ideal square characteristic, 16, which improves the resolution. In order to achieve this, it was necessary to make the light receiving sensitivity curve 15 as close to the square characteristic 16 as possible.

第6図(a )は他の従来例の光検出ヘッドチップの2
0の平面図であり、同図(b)は同図(a)のI−I断
面図である。この例では、前記光検出ヘッドチップ10
の光受感帯12−1〜12−4と光不感帯13との境界
部に光スポットが入射しないように、例えば、アルミ、
金など光を透過させない材質からなる遮蔽膜1121を
光受感帯12−1〜12−4間に挾まれた光不感帯13
及び光受感帯12−1〜12−4の一部を覆う様にスパ
ッタリング等の薄膜形成手段によって形成したものであ
る。第7図は第6図に示す他の従来例の光検出ヘッドチ
ップの光不感帯と光受感帯との境界近傍の受光感度を説
明するための説明図である。
Figure 6(a) shows two of the other conventional photodetection head chips.
0, and the figure (b) is a sectional view taken along the line II in the figure (a). In this example, the photodetection head chip 10
For example, aluminum,
A light-insensitive zone 13 is sandwiched between the light-sensitive zones 12-1 to 12-4, and a shielding film 1121 made of a material such as gold that does not transmit light.
And it is formed by a thin film forming means such as sputtering so as to cover part of the photosensitive zones 12-1 to 12-4. FIG. 7 is an explanatory diagram for explaining the light receiving sensitivity near the boundary between the light dead zone and the light sensitive zone of the other conventional photodetection head chip shown in FIG.

同図に示す様に、前記遮蔽膜21の形成により、受光感
度曲線の減衰特性は理想的な角型特性16を与えるはず
であるが、実際にはブロードな曲線22となり充分なも
のとは言えず分解能を高める上で必ずしも充分な対策と
はなり得なかった。
As shown in the figure, the formation of the shielding film 21 should give the attenuation characteristic of the light sensitivity curve an ideal square characteristic 16, but in reality it becomes a broad curve 22, which is not satisfactory. However, this was not necessarily a sufficient measure to improve resolution.

(問題点を解決するための手段) 本発明は上記問題点を解決するためになされたものであ
り、基板面に光不感帯部と光受感帯部とを同一平面上に
形成し、入射光量に応じてそれぞれ独立した光検出信号
を与える複数の受光素子部を形成してなる光検出ヘッド
チップにおいて、前記光不感帯部及びこの光不感帯部に
隣接した前記光受感帯部の一部を反射率の小なる蔽遮腹
で覆ったことを特徴とする光検出ヘッドチップを提供し
ようとするものである。
(Means for Solving the Problems) The present invention has been made to solve the above problems, and includes forming a light dead zone portion and a light sensitive zone portion on the same plane on the substrate surface, and reducing the amount of incident light. In a photodetection head chip formed with a plurality of photodetection elements that each give an independent photodetection signal in response to the It is an object of the present invention to provide a photodetecting head chip characterized in that it is covered with a shielding layer having a small shielding ratio.

もかかわらず受光感度曲線の減衰特性がブロードになる
原因を追及した結果、その原因の一つとして、光不感帯
と光受感帯の近傍においては、遮蔽1121として形成
したアルミ及び金等の反射率の高い薄膜が入射光を反射
散乱させる結果、これらの散乱光の一部が受光素子に入
射し、受光感度曲線の減衰特性をブロードにしているこ
とをつきとめた。
However, as a result of investigating the cause of the broad attenuation characteristic of the light receiving sensitivity curve, we found that one of the causes was the reflectance of aluminum, gold, etc. formed as the shield 1121 in the vicinity of the light dead zone and the light sensitive zone. It was found that as a result of a thin film with a high polarity reflecting and scattering incident light, a portion of this scattered light enters the light-receiving element, making the attenuation characteristic of the light-receiving sensitivity curve broader.

その結果、第5図に示す従来の光検出ヘッドチップ20
の構成において、金、アルミ等からなる反射率の高い遮
蔽膜21のかわりに、たとえば光の反射率の低い材質か
らなる遮蔽膜を形成することに思い至ったのである。実
験の結果によると、適当な材質としてはモリブデン、カ
ーボン等が有効であり、膜厚が0.1〜2μmとなるよ
うにスパッタリング手段等によって成膜すればよい。
As a result, the conventional photodetection head chip 20 shown in FIG.
In this structure, instead of the shielding film 21 having a high reflectance made of gold, aluminum, etc., we came up with the idea of forming a shielding film made of a material with a low light reflectance, for example. According to the results of experiments, molybdenum, carbon, etc. are effective as suitable materials, and the film may be formed by sputtering or the like so that the film thickness is 0.1 to 2 μm.

上記の構成により、光不感帯13に入射する光は反射率
の小さな遮蔽膜に吸収されるから光の散乱は制御され、
光感度曲線は理想的な角型特性16に近くなり分解能の
高い光ヘツドチップを可能とする。
With the above configuration, the light incident on the light dead zone 13 is absorbed by the shielding film with low reflectance, so the scattering of light is controlled.
The photosensitivity curve is close to the ideal square characteristic 16, allowing an optical head chip with high resolution.

第1図(a )は本発明の第2実施例になる光検出ヘッ
ドチップ30の平面図、同図(b)は同図(a )のI
F−IF断面図であるが、基本的に構成は、第5図の光
検出チップヘッド20と路間−の構成のため、同一構成
要素には同一符号を付し、説明を省略する。
FIG. 1(a) is a plan view of a photodetection head chip 30 according to a second embodiment of the present invention, and FIG.
Although this is an F-IF cross-sectional view, the configuration is basically between the photodetection chip head 20 and the path in FIG.

この例においては、矩形状の受光素子30−1〜30−
4を縦横に2個ずつ平行に配設したものであり、遮蔽1
1132は受光素子30−1〜3〇−4を除き、光不感
帯部32に連続して形成されている。
In this example, rectangular light receiving elements 30-1 to 30-
4 are arranged in parallel, two each in the vertical and horizontal directions, and the shielding 1
1132 is formed continuously in the light dead zone 32 except for the light receiving elements 30-1 to 30-4.

第2図は本発明の第3実施例になる光検出ヘッドチップ
AOの平面図であり、更に細い正方形の受光素子41を
縦横にn個ずつ平行に並べたものであり、遮蔽膜13は
前記同様受光素子部を除き連続している。
FIG. 2 is a plan view of a photodetection head chip AO according to a third embodiment of the present invention, in which n thin square light receiving elements 41 are arranged in parallel in each direction, and the shielding film 13 is Similarly, it is continuous except for the light receiving element section.

第3因は本発明の第4実施例になる光検出ヘッドチップ
50の平面図であり、受光素子51は円を90°の角度
で4分割した形状となっており、遮蔽膜13は受光素子
部を除き連続して形成されている。
The third factor is a plan view of a photodetection head chip 50 according to a fourth embodiment of the present invention, in which the light receiving element 51 has a shape obtained by dividing a circle into four parts at an angle of 90°, and the shielding film 13 is the light receiving element. It is formed continuously except for the part.

(発明の効果) 上述の様に、本発明になる光検出ヘッドチップは基板面
に形成した光不感帯部及びこの光不感帯部に隣接した光
受感帯部の一部を反射率の小なる蔽遮膜で覆ったため、
光不感帯部に入射した光は遮蔽膜に吸収され、光散乱が
制御される結果、光散乱による光検出出力の誤差を減少
させることが出来、分解能の高い光検出ヘッドチップを
得ることが可能となる。
(Effects of the Invention) As described above, the photodetection head chip of the present invention uses a light-insensitive zone formed on the substrate surface and a part of the light-sensitive zone adjacent to the light-insensitive zone to be shielded with a low reflectance. Because it was covered with a shielding film,
The light incident on the light dead zone is absorbed by the shielding film, and light scattering is controlled. As a result, errors in the light detection output due to light scattering can be reduced, making it possible to obtain a high-resolution light detection head chip. Become.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図(a )は本発明の第2実施例になる光検出ヘッ
ドチップの平面図、同図(b ’)は同図(a )のI
f−I[断面図、第2図は本発明の第3実施例になる光
検出ヘッドチップの平面図、第3図は本発明の第4実施
例になる光検出ヘッドチップ50の平面図、第4図は従
来の光検出ヘッドチップの平面図、第5図は、第4図に
示す従来の光検出ヘッドチップの光不感帯と光受感帯と
の境界近傍の受光感度を示す説明図、第6図<a >は
他の従来例の光検出ヘッドチップの平面図、同図(b 
)は同図(a )のI−I断面図、第7図は第6図に示
す他の従来例の光検出ヘッドチップの光不感帯と光受感
帯との境界近傍の受光感度を説明するための説明図であ
る。 11・・・ウェハ、13・・・光不感帯、22・・・光
スポット、20,30.40.50・・・光検出ヘッド
チップ、12−1〜12−4.30−1〜30−4゜4
1.51・・・遮蔽膜。 璽に3図 (/:)) 窮6図
FIG. 1(a) is a plan view of a photodetection head chip according to a second embodiment of the present invention, and FIG. 1(b') is an I
f-I [cross-sectional view; FIG. 2 is a plan view of a photodetection head chip according to a third embodiment of the present invention; FIG. 3 is a plan view of a photodetection head chip 50 according to a fourth embodiment of the present invention; FIG. 4 is a plan view of a conventional photodetection head chip, FIG. 5 is an explanatory diagram showing the light receiving sensitivity near the boundary between the light dead zone and the photosensitive zone of the conventional photodetection head chip shown in FIG. Figure 6 <a> is a plan view of another conventional photodetection head chip;
) is a sectional view taken along line II in FIG. FIG. 11... Wafer, 13... Light dead zone, 22... Light spot, 20, 30.40.50... Photo detection head chip, 12-1 to 12-4. 30-1 to 30-4゜4
1.51...shielding film. 3 drawings on the seal (/:)) 6 drawings

Claims (1)

【特許請求の範囲】[Claims]  基板面に光不感帯部と光受感帯部とを同一平面上に形
成し、入射光量に応じてそれぞれ独立した光検出信号を
与える複数の受光素子部を形成してなる光検出ヘッドチ
ップにおいて、前記光不感帯部及びこの光不感帯部に隣
接した前記光受感帯部の一部を反射率の小なる蔽遮膜で
覆ったことを特徴とする光検出ヘッドチップ
In a photodetection head chip in which a light dead zone and a light sensitive zone are formed on the same plane on a substrate surface, and a plurality of light receiving element sections are formed to provide independent light detection signals depending on the amount of incident light, A photodetection head chip characterized in that the light dead zone and a part of the light sensitive zone adjacent to the light dead zone are covered with a shielding film having a low reflectance.
JP62263229A 1987-10-19 1987-10-19 Photo-detecting head chip Pending JPH01106342A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP62263229A JPH01106342A (en) 1987-10-19 1987-10-19 Photo-detecting head chip
US07/259,706 US4987505A (en) 1987-10-19 1988-10-19 Magnetic head device having photo detector cell

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62263229A JPH01106342A (en) 1987-10-19 1987-10-19 Photo-detecting head chip

Publications (1)

Publication Number Publication Date
JPH01106342A true JPH01106342A (en) 1989-04-24

Family

ID=17386570

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62263229A Pending JPH01106342A (en) 1987-10-19 1987-10-19 Photo-detecting head chip

Country Status (1)

Country Link
JP (1) JPH01106342A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01257377A (en) * 1988-04-07 1989-10-13 Nec Corp Photodiode
WO2002007226A1 (en) * 2000-07-18 2002-01-24 Nippon Sheet Glass Co., Ltd. Photodetector array
JP2007022393A (en) * 2005-07-19 2007-02-01 Komatsu Ltd Working vehicle

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01257377A (en) * 1988-04-07 1989-10-13 Nec Corp Photodiode
WO2002007226A1 (en) * 2000-07-18 2002-01-24 Nippon Sheet Glass Co., Ltd. Photodetector array
US6828541B2 (en) 2000-07-18 2004-12-07 Nippon Sheet Glass Co., Ltd. Light receiving element array having isolated pin photodiodes
JP2007022393A (en) * 2005-07-19 2007-02-01 Komatsu Ltd Working vehicle

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