JPH01103983A - Susceptor for molecular beam epitaxy device - Google Patents
Susceptor for molecular beam epitaxy deviceInfo
- Publication number
- JPH01103983A JPH01103983A JP63232458A JP23245888A JPH01103983A JP H01103983 A JPH01103983 A JP H01103983A JP 63232458 A JP63232458 A JP 63232458A JP 23245888 A JP23245888 A JP 23245888A JP H01103983 A JPH01103983 A JP H01103983A
- Authority
- JP
- Japan
- Prior art keywords
- susceptor
- groove
- rods
- molecular beam
- beam epitaxy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001451 molecular beam epitaxy Methods 0.000 title claims description 6
- 235000012431 wafers Nutrition 0.000 description 5
- 230000000694 effects Effects 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000004577 thatch Substances 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は分子線エピタキシ装置用のウェハを取付けるサ
セプタに関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a susceptor for mounting a wafer for a molecular beam epitaxy apparatus.
従来使われているサセプタの構造を第７図から第１０図
（例えばＵ Ｓ Ｐ４２０１１５２号）によって説明す
る。第７図に示す従来例は、つり下げて支持するもので
あり、サセプタ１の上部につり下げ治具２が付いており
、一方の面にウェハを貼り付けたものである。第８図、
第９図、第１０図に示す他の従来例は円形の板の側面に
三本の棒４を取り付けたものである。The structure of a conventionally used susceptor will be explained with reference to FIGS. 7 to 10 (for example, US Pat. No. 4,201,152). In the conventional example shown in FIG. 7, the susceptor 1 is suspended and supported, and a hanging jig 2 is attached to the upper part of the susceptor 1, and a wafer is attached to one surface. Figure 8,
Another conventional example shown in FIGS. 9 and 10 is one in which three rods 4 are attached to the side surface of a circular plate.
第７図の従来例はつり下げ構造であるため、蒸着膜の膜
厚均一度を上げるためにサセプタ１を回転させることは
できない、第８図の他の従来例は第９図、第１０図に示
すように、三本の棒４で受は渡しを行なうものであり、
固定部材５の三本の溝６にサセプタ１の三本の捧４が入
らなくてはならず、それらの位置調整はむずかしくなる
。その上、その三本の棒４はサセプタ１の受は渡しの際
、固定部材５にぶつかることになり、たびたび、棒４が
折れる事故が発生し、サセプタ１の受は渡しが不可能に
なるという問題が起る。Since the conventional example shown in FIG. 7 has a hanging structure, the susceptor 1 cannot be rotated to increase the uniformity of the thickness of the deposited film.Other conventional examples shown in FIG. 8 are shown in FIGS. 9 and 10. As shown, the three sticks 4 are used for uke,
The three ribs 4 of the susceptor 1 must fit into the three grooves 6 of the fixing member 5, making it difficult to adjust their positions. Moreover, the three rods 4 collide with the fixing member 5 when the holder of the susceptor 1 is transferred, and accidents often occur in which the rods 4 break, making it impossible to transfer the holder of the susceptor 1. A problem arises.
本発明の目的はサセプタの受は渡しを容易にすることに
より、受は渡しによる事故を減らし、合わせて、ウェハ
搬送の時間を短縮するのに好適な分子線エピタキシ装置
用サセプタを提供することにある。An object of the present invention is to provide a susceptor for molecular beam epitaxy equipment that is suitable for reducing accidents caused by passing the susceptor by facilitating the transfer of the susceptor, and shortening the time for transferring wafers. be.
上記目的は、サセプタの側面の周に溝を設けることによ
って、達成される。The above object is achieved by providing grooves around the side surfaces of the susceptor.
受取る側に設けた最低３本の支持棒の先端をサセプタの
側面の溝形状に合った形状にすることによって、サセプ
タを側面から容易にはさみ込んで固定することができる
。By shaping the tips of at least three support rods provided on the receiving side to match the shape of the groove on the side surface of the susceptor, the susceptor can be easily inserted and fixed from the side surface.
以下、本発明の実施例を第１図〜第６図を用いて説明す
る。第１図、第２図に実施例を示す、第１図は、サセプ
タ１の側面の溝７ａが半円形のものであり、第２図は、
その溝７ｂが三角形の他の実施例である。第３図、第４
図に本発明のサセプタの受は渡しの方法を述べている。Embodiments of the present invention will be described below with reference to FIGS. 1 to 6. Examples are shown in FIGS. 1 and 2. In FIG. 1, the groove 7a on the side surface of the susceptor 1 is semicircular, and in FIG.
This is another embodiment in which the groove 7b is triangular. Figures 3 and 4
The figure describes the method of transferring the susceptor of the present invention.
受は取る側に−設けた最低３本の支持棒８の先端が、そ
のサセプタ側面の溝形状に合った形状をしており、サセ
プタ側面からはさみ込んで固定する。従って、サセプタ
１とそれを受は取る側の支持棒８の軸心が何らかの原因
でずれが生じた場合でも、三本の支持棒８によって、正
規の位置に保持される。第５図に更に他の実施例を示す
。第５図に示したサセプタ１はウェハを取付けない側の
面・を削り込み、凹状に形成している。第５図の実施例
を採用することにより、サセプタ１の受は渡しがより容
易となる。第６図に本発明の更に他の実施例を示す。サ
セプタ１のウェハを取付けない側の面の中央に筒状の凹
部９を設けることにより、その凹部に熱電対を設置しサ
セプタ１の温度を測定するこ′とができる。The tips of at least three support rods 8 provided on the receiving side have a shape that matches the groove shape on the side surface of the susceptor, and are inserted and fixed from the side surface of the susceptor. Therefore, even if the axis of the support rod 8 on the receiving side is misaligned for some reason, the susceptor 1 and its receiver are held in the correct position by the three support rods 8. FIG. 5 shows yet another embodiment. The susceptor 1 shown in FIG. 5 is formed into a concave shape by cutting the surface on which the wafer is not attached. By adopting the embodiment shown in FIG. 5, the susceptor 1 can be more easily transferred. FIG. 6 shows still another embodiment of the present invention. By providing a cylindrical recess 9 in the center of the surface of the susceptor 1 on which the wafer is not attached, a thermocouple can be installed in the recess to measure the temperature of the susceptor 1.
以上説明したように本発明より、サセプタの受は渡しが
容易になるため、受は渡しの際の事故が少なくなり、そ
の上、それに関する時間も短縮することができる。As explained above, according to the present invention, the susceptor can be easily transferred, so accidents during the transfer can be reduced, and the time involved can also be shortened.
第１図は本発明の一実施例の断面図、第２図は他の実施
例の断面図、第３図および第４図はそれぞれ本発明の詳
細な説明する正面図と側面図、第５図は本発明の更に他
の実施例の断面図、第６図は本発明の更に他の実施例の
断面図、第７図、第８図、第９図および第１０図は従来
のサセプタの斜視図である。
８・・・支持棒、９・・・凹部。
代理人 弁理士 小川勝男、−１，１
−一−２
ｃ ′Ｉτ”・′
譬 １ 図
￥Ｚ図
１・・・・プｔ７’り
’７ｍ、７ｂ・−・弓御
葺、５ 圀
葺今図
８°°°゛走１奇半ト
芽 ダ図
イ６図
茅７図
’１−ｃｓａ ｔ１１FIG. 1 is a sectional view of one embodiment of the present invention, FIG. 2 is a sectional view of another embodiment, FIGS. The figure is a cross-sectional view of still another embodiment of the present invention, FIG. 6 is a cross-sectional view of still another embodiment of the present invention, and FIGS. 7, 8, 9, and 10 are of a conventional susceptor. FIG. 8... Support rod, 9... Recessed part. Agent Patent Attorney Katsuo Ogawa, -1,1 -1-2 c 'Iτ'・' Parable 1 Figure ¥Z Figure 1...Pt7'ri'7m, 7b--Yumiomibuki, 5 Kunibuki Now Figure 8°°°゛ Run 1 Odd Half Tobud Da Figure I 6 Figure Thatch 7 Figure '1-csa t11
Claims (1)
プタの側面に溝を設けたことを特徴とする分子線エピタ
キシ装置用サセプタ。 ２、特許請求の範囲第１項記載のサセプタに於て、ウェ
ハを取付けない側の面を削り込み凹状に形成したことを
特徴とする分子線エピタキシ装置用サセプタ。 ３、特許請求の範囲第１項又は、第２項記載のサセプタ
に於て、ウェハを取付けない側の面中央に凹部を設けた
ことを特徴とする分子線エピタキシ装置用サセプタ。[Claims] 1. A susceptor for a molecular beam epitaxy apparatus for mounting a wafer, characterized in that a groove is provided on the side surface of the susceptor. 2. A susceptor for a molecular beam epitaxy apparatus according to claim 1, characterized in that the surface on the side on which the wafer is not attached is carved into a concave shape. 3. A susceptor for a molecular beam epitaxy apparatus, characterized in that the susceptor according to claim 1 or 2 is provided with a recessed portion in the center of the surface on which the wafer is not attached.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63232458A JPH01103983A (en) | 1988-09-19 | 1988-09-19 | Susceptor for molecular beam epitaxy device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63232458A JPH01103983A (en) | 1988-09-19 | 1988-09-19 | Susceptor for molecular beam epitaxy device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01103983A true JPH01103983A (en) | 1989-04-21 |
Family
ID=16939604
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63232458A Pending JPH01103983A (en) | 1988-09-19 | 1988-09-19 | Susceptor for molecular beam epitaxy device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01103983A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005200214A (en) * | 2003-11-28 | 2005-07-28 | Singulus Technologies Ag | Substrate support body adapter system |
-
1988
- 1988-09-19 JP JP63232458A patent/JPH01103983A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005200214A (en) * | 2003-11-28 | 2005-07-28 | Singulus Technologies Ag | Substrate support body adapter system |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7582166B2 (en) | Holder for supporting wafers during semiconductor manufacture | |
| CA1318371C (en) | Hermetically sealed feedthroughs | |
| US4966549A (en) | Wafer hanger useful for thermally treating semiconductor wafers | |
| JP2000176744A (en) | Cutting tool and its shrinkage fitting method | |
| JPH02256302A (en) | Dielectric loaded type cauity resonator | |
| JPH088198A (en) | Susceptor for vapor growth apparatus | |
| JPH01103983A (en) | Susceptor for molecular beam epitaxy device | |
| JPS62220904A (en) | Coaxial collet | |
| US20210102874A1 (en) | Flat plate sample holder expansion structure used in vacuum | |
| JPS62145677A (en) | Centering device for inserting pins into multi-position housing and application of the same | |
| JP2002025989A (en) | Semiconductor manufacturing device and aligning jig | |
| JPH02287308A (en) | Method for centering lenses in optical unit mount | |
| JPH113865A (en) | Boat for wafer mounting and manufacture thereof | |
| US6367643B2 (en) | Cryostat, cryostat positioning method and cryostat alignment set | |
| JP3853453B2 (en) | Vertical susceptor for vapor phase growth | |
| JPS63164312A (en) | Silicon wafer treating jig | |
| JPH058139A (en) | Engine piston positioning and fixing device | |
| JPH0648825Y2 (en) | Wafer carrier for growth equipment | |
| JPS594441Y2 (en) | Sample heating device for electron microscope | |
| JPH057240Y2 (en) | ||
| JP2003297894A (en) | Method of manufacturing substrate holding mechanism | |
| JPS5940443Y2 (en) | Wafer support device | |
| JPS61150319A (en) | Support table for vapor growth | |
| KR20190079885A (en) | Combination structure of shaft coupling to easy maintain the Flatness by deposition film thickness measuring module | |
| JPH0243722A (en) | Susceptor |