JPH01102929A - Electron-beam lithography apparatus - Google Patents

Abstract

PURPOSE:To correct a drift value accurately even when a minimum unit for a data on a deflection value is changed over by a method wherein a memory for data conversion use is arranged between a data on the drift value from a length measuring instrument and an addition-and-subtraction circuit of the data on the drift value inside a data processing part and is linked with a changeover of an LSB value of the data on the deflection value. CONSTITUTION:A data 2 on a present position of a shifting stage output from a length measuring instrument 1 becomes a data 5 on a drift value after a value of a register 3 storing a position immediately after a stop operation has been subtracted. A control computer 6 reads out an LSB value 7 of a data on a deflection value and an LSB value 8 from the length measuring instrument 1, calculates a data on a conversion value with reference to the data on the drift value of the values and registers it into a RAM 9 immediately before a lithographic operation. By this setup, the data 5 on the drift value is converted into a data 10 on the drift value and is operated by using a data 13 on the deflection value output from a data processing part used to process a data 11 on a graphic and by using an adder-subtractor 14; a data 15 on the deflection value to which the data on the drift value has been added is obtained.

Description

[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to an electron beam lithography system, and is particularly suitable for correcting positional deviation data (referred to as drift data) after the moving table on which a lithography sample is mounted has stopped. This invention relates to an electron beam lithography system.

[Conventional technology]

Conventional electron beam lithography apparatuses process drawing figure information provided by a computer using hardware, convert it into electron beam deflection data, and perform drawing.

Furthermore, during this data processing, the drift data of the movable table is digitally added and subtracted to correct the drawing deviation caused by the drift of the movable table.

In short, in conventional devices, the minimum unit of electron beam deflection data is fixed, and the data processing section that generates this deflection data performs addition and subtraction, and the ILSB (minimum unit) of drift data is also fixed. Ta.

[Problem that the invention seeks to solve]

The above conventional technology uses the minimum unit of electron beam deflection data (L S B
) can be switched at will, there is a problem in that the LSB values of the drift data added and subtracted by the data processing section will not match, making correct correction impossible.

SUMMARY OF THE INVENTION An object of the present invention is to solve the above-mentioned problems and provide an electron beam lithography apparatus that can perform correct drift correction even when the minimum unit of deflection data is changed.

[Means for solving problems]

The above purpose is to reduce the positional deviation of the moving table on which the drawing sample is mounted after it has stopped, in conjunction with switching the minimum control unit of the electron beam control unit that controls the lens barrel that generates the electron beam that draws the figure on the drawing sample. The minimum unit of data was achieved as a changeable configuration.

In short, a memory for data conversion is placed between the drift data generated by the length measuring device that measures the position of the moving table and the drift data addition/subtraction circuit in the data processing section, and the memory is linked to the LSB value switching of the deflection data. This can be achieved by automatically rewriting the contents of , or by selecting an in-memory table.

[Effect]

When the LSB value of the deflection data is changed, the value of (drift data) is calculated by the computer that controls it, and stored in the data conversion memory immediately before drawing, and during drawing, the memory is dressed 7 times with drift data to obtain drift data that matches the LSB value of the deflection data. If you change it again, (drift data)X (B/A)
The data table in the memory is rewritten in accordance with
Drift data having an SB value can be obtained, and correct drift correction can always be performed when switching deflection data. In addition, if there are only a few types of LSB values that can be switched for deflection data, calculate (drift data') x (B/A) for all LSB values in advance and write several types of tables in memory. A method was adopted in which one table was selected using a deflection data switching state signal and the data in this table was addressed using drift data.

〔Example〕

The present invention will be explained in detail below using the embodiments shown in FIGS. 1 and 2.

FIG. 1 is a conceptual diagram showing an embodiment of an electron beam lithography apparatus of the present invention. In FIG. 1, moving table current position data 2 output from a length measuring device 1 that measures the position of the moving table is subtracted by an arithmetic unit 4 from the value of a register 3 that stores the stop position immediately after the moving table stops. The amount of deviation after the moving table stops, that is,
Drift data 5 is generated. In addition, the control computer 6 that controls the electron beam lithography device can read the LSB value 7 of the deflection data and the LSB value 8 from the length measuring device 1, and from these data (drift data) is used to calculate conversion data for each drift data, and register it as a table in a RAM (random access memory) 9 immediately before drawing. According to No. 29, the drift data 5 at the time of drawing is stored in the RAM 9 in the LSB of the deflection data.
The deflection data 10 is converted into drift data 10 that matches the value 7, and is calculated by the adder/subtractor 14 with the deflection data 13 output from the data processing section 12 that processes the graphic data 11, to obtain deflection data 15 that takes the drift data into account.

FIG. 2 is a conceptual diagram showing another embodiment of the present invention. This embodiment is effective when there are few types of LSB value switching of the deflection data, and the same parts as in FIG. 1 are indicated by the same reference numerals, and the explanation will be omitted here. The ROM (read-only memory) 16 stores (drift data') X corresponding to each LSB value of switchable deflection data.
A drift conversion data table calculated in advance using (B/A) is registered with only the switching types of LSB values. By selecting one of these several types of tables' with the deflection data state switching signal 17 and addressing the data in the table with the drift data 5, drift data having an LSB value suitable for the deflection data is obtained. It is.

According to this embodiment, it is possible to convert the LSB value of drift data in response to switching of the LSB value of deflection data, and normal drift correction is possible without depending on switching of the LSB value.

〔Effect of the invention〕

As explained above, according to the present invention, L of the deflection data
Since it becomes possible to switch the LSB value of the drift data in accordance with the SB value switch, there is an effect that normal drift correction becomes possible regardless of the LSB value switch.

[Brief explanation of the drawing]

FIG. 1 is a conceptual diagram showing one embodiment of the electron beam lithography apparatus of the present invention, and FIG. 2 is a conceptual diagram showing another embodiment of the present invention. 1... Length measuring device, 3... Register, 4... Arithmetic unit,
6... Control computer, 9... RAM, 12... Data processing section, 1st m 1... 14th turn... Md b = '#ItP 'f-t19''x Fig. 2 14・-ROr'1

Claims (1)

[Claims] 1. A moving table on which a drawn sample is mounted, a length measuring device for measuring the position of the moving table, a moving table control unit for positioning the moving table based on output data from the length measuring device, and a moving table control unit for positioning the moving table based on output data from the length measuring device. A lens barrel that generates an electron beam to draw a figure on the drawing sample on a table, an electron beam control unit that controls the lens barrel, and a computer that processes the drawing figure information given by the computer and and a data processing unit that provides control data to the moving table, the unit is configured such that the minimum unit of positional deviation data after the movable table has stopped can be changed in conjunction with switching of the minimum control unit of the electron beam control unit. An electron beam lithography device characterized by