JPH01102153U - - Google Patents
Info
- Publication number
- JPH01102153U JPH01102153U JP19912587U JP19912587U JPH01102153U JP H01102153 U JPH01102153 U JP H01102153U JP 19912587 U JP19912587 U JP 19912587U JP 19912587 U JP19912587 U JP 19912587U JP H01102153 U JPH01102153 U JP H01102153U
- Authority
- JP
- Japan
- Prior art keywords
- substrate holder
- plasma cvd
- cvd apparatus
- area
- substrates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 6
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims description 3
- 239000011810 insulating material Substances 0.000 claims 1
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19912587U JPH01102153U (cs) | 1987-12-28 | 1987-12-28 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19912587U JPH01102153U (cs) | 1987-12-28 | 1987-12-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01102153U true JPH01102153U (cs) | 1989-07-10 |
Family
ID=31489594
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19912587U Pending JPH01102153U (cs) | 1987-12-28 | 1987-12-28 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01102153U (cs) |
-
1987
- 1987-12-28 JP JP19912587U patent/JPH01102153U/ja active Pending