JP7805906B2 - 感光性樹脂組成物、感光性樹脂皮膜、パターン形成方法及び発光素子 - Google Patents

感光性樹脂組成物、感光性樹脂皮膜、パターン形成方法及び発光素子

Info

Publication number
JP7805906B2
JP7805906B2 JP2022160787A JP2022160787A JP7805906B2 JP 7805906 B2 JP7805906 B2 JP 7805906B2 JP 2022160787 A JP2022160787 A JP 2022160787A JP 2022160787 A JP2022160787 A JP 2022160787A JP 7805906 B2 JP7805906 B2 JP 7805906B2
Authority
JP
Japan
Prior art keywords
photosensitive resin
resin composition
meth
composition according
quantum dots
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2022160787A
Other languages
English (en)
Japanese (ja)
Other versions
JP2024054521A (ja
JP2024054521A5 (https=
Inventor
仁 丸山
伸司 青木
義弘 野島
一也 鳶島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2022160787A priority Critical patent/JP7805906B2/ja
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to CN202380071044.0A priority patent/CN119998730A/zh
Priority to KR1020257010965A priority patent/KR20250085736A/ko
Priority to PCT/JP2023/034849 priority patent/WO2024075586A1/ja
Priority to EP23874714.1A priority patent/EP4600744A1/en
Priority to TW112138044A priority patent/TW202432790A/zh
Publication of JP2024054521A publication Critical patent/JP2024054521A/ja
Publication of JP2024054521A5 publication Critical patent/JP2024054521A5/ja
Application granted granted Critical
Publication of JP7805906B2 publication Critical patent/JP7805906B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent materials, e.g. electroluminescent or chemiluminescent
    • C09K11/02—Use of particular materials as binders, particle coatings or suspension media therefor
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent materials, e.g. electroluminescent or chemiluminescent
    • C09K11/02—Use of particular materials as binders, particle coatings or suspension media therefor
    • C09K11/025—Use of particular materials as binders, particle coatings or suspension media therefor non-luminescent particle coatings or suspension media
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent materials, e.g. electroluminescent or chemiluminescent
    • C09K11/08—Luminescent materials, e.g. electroluminescent or chemiluminescent containing inorganic luminescent materials
    • C09K11/56—Luminescent materials, e.g. electroluminescent or chemiluminescent containing inorganic luminescent materials containing sulfur
    • C09K11/562—Chalcogenides
    • C09K11/565—Chalcogenides with zinc cadmium
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent materials, e.g. electroluminescent or chemiluminescent
    • C09K11/08—Luminescent materials, e.g. electroluminescent or chemiluminescent containing inorganic luminescent materials
    • C09K11/70—Luminescent materials, e.g. electroluminescent or chemiluminescent containing inorganic luminescent materials containing phosphorus
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent materials, e.g. electroluminescent or chemiluminescent
    • C09K11/08—Luminescent materials, e.g. electroluminescent or chemiluminescent containing inorganic luminescent materials
    • C09K11/88—Luminescent materials, e.g. electroluminescent or chemiluminescent containing inorganic luminescent materials containing selenium, tellurium or unspecified chalcogen elements
    • C09K11/881—Chalcogenides
    • C09K11/883—Chalcogenides with zinc or cadmium
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/85—Packages
    • H10H20/851—Wavelength conversion means

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Luminescent Compositions (AREA)
  • Optical Filters (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2022160787A 2022-10-05 2022-10-05 感光性樹脂組成物、感光性樹脂皮膜、パターン形成方法及び発光素子 Active JP7805906B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2022160787A JP7805906B2 (ja) 2022-10-05 2022-10-05 感光性樹脂組成物、感光性樹脂皮膜、パターン形成方法及び発光素子
KR1020257010965A KR20250085736A (ko) 2022-10-05 2023-09-26 감광성 수지 조성물, 감광성 수지 피막, 패턴 형성방법 및 발광소자
PCT/JP2023/034849 WO2024075586A1 (ja) 2022-10-05 2023-09-26 感光性樹脂組成物、感光性樹脂皮膜、パターン形成方法及び発光素子
EP23874714.1A EP4600744A1 (en) 2022-10-05 2023-09-26 Photosensitive resin composition, photosensitive resin coating film, pattern formation method, and light-emitting element
CN202380071044.0A CN119998730A (zh) 2022-10-05 2023-09-26 光敏树脂组合物、光敏树脂覆膜、图案形成方法及发光元件
TW112138044A TW202432790A (zh) 2022-10-05 2023-10-04 感光性樹脂組成物、感光性樹脂皮膜、圖型形成方法及發光元件

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2022160787A JP7805906B2 (ja) 2022-10-05 2022-10-05 感光性樹脂組成物、感光性樹脂皮膜、パターン形成方法及び発光素子

Publications (3)

Publication Number Publication Date
JP2024054521A JP2024054521A (ja) 2024-04-17
JP2024054521A5 JP2024054521A5 (https=) 2025-04-11
JP7805906B2 true JP7805906B2 (ja) 2026-01-26

Family

ID=90608249

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022160787A Active JP7805906B2 (ja) 2022-10-05 2022-10-05 感光性樹脂組成物、感光性樹脂皮膜、パターン形成方法及び発光素子

Country Status (6)

Country Link
EP (1) EP4600744A1 (https=)
JP (1) JP7805906B2 (https=)
KR (1) KR20250085736A (https=)
CN (1) CN119998730A (https=)
TW (1) TW202432790A (https=)
WO (1) WO2024075586A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2025164117A (ja) * 2024-04-19 2025-10-30 信越化学工業株式会社 感光性樹脂組成物、感光性樹脂皮膜、感光性ドライフィルム、パターン形成方法、表示装置、及びマイクロｌｅｄディスプレイ
JP2025164126A (ja) * 2024-04-19 2025-10-30 信越化学工業株式会社 多層構造型の感光性ドライフィルム、パターン形成方法、表示装置、及びマイクロｌｅｄディスプレイ
JP2025164121A (ja) * 2024-04-19 2025-10-30 信越化学工業株式会社 感光性樹脂組成物、感光性樹脂皮膜、感光性ドライフィルム、パターン形成方法、表示装置、及びマイクロｌｅｄディスプレイ

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015121702A (ja) 2013-12-24 2015-07-02 Jsr株式会社 硬化性樹脂組成物、硬化膜、発光素子、波長変換フィルムおよび発光層の形成方法
JP2018091924A (ja) 2016-11-30 2018-06-14 東京応化工業株式会社 感光性組成物、硬化膜、発光表示素子用の発光層、発光表示素子、及び発光層の形成方法
JP2020193249A (ja) 2019-05-27 2020-12-03 信越化学工業株式会社 量子ドット、量子ドット組成物、波長変換材料、波長変換フィルム、バックライトユニット及び画像表示装置
JP2021043452A (ja) 2016-10-20 2021-03-18 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 量子ドット分散体、これを含む自発光感光性樹脂組成物、これを利用して製造されたカラーフィルターおよび画像表示装置
CN113088275A (zh) 2021-03-05 2021-07-09 苏州星烁纳米科技有限公司 量子点及量子点组合物、由其制备的量子点彩膜及显示装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7227890B2 (ja) 2019-12-03 2023-02-22 信越化学工業株式会社 感光性樹脂組成物、感光性樹脂皮膜、感光性ドライフィルム、パターン形成方法及び発光素子

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015121702A (ja) 2013-12-24 2015-07-02 Jsr株式会社 硬化性樹脂組成物、硬化膜、発光素子、波長変換フィルムおよび発光層の形成方法
JP2021043452A (ja) 2016-10-20 2021-03-18 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 量子ドット分散体、これを含む自発光感光性樹脂組成物、これを利用して製造されたカラーフィルターおよび画像表示装置
JP2018091924A (ja) 2016-11-30 2018-06-14 東京応化工業株式会社 感光性組成物、硬化膜、発光表示素子用の発光層、発光表示素子、及び発光層の形成方法
JP2020193249A (ja) 2019-05-27 2020-12-03 信越化学工業株式会社 量子ドット、量子ドット組成物、波長変換材料、波長変換フィルム、バックライトユニット及び画像表示装置
CN113088275A (zh) 2021-03-05 2021-07-09 苏州星烁纳米科技有限公司 量子点及量子点组合物、由其制备的量子点彩膜及显示装置

Also Published As

Publication number Publication date
WO2024075586A1 (ja) 2024-04-11
EP4600744A1 (en) 2025-08-13
TW202432790A (zh) 2024-08-16
KR20250085736A (ko) 2025-06-12
JP2024054521A (ja) 2024-04-17
CN119998730A (zh) 2025-05-13

Similar Documents

Publication Publication Date Title
JP7805906B2 (ja) 感光性樹脂組成物、感光性樹脂皮膜、パターン形成方法及び発光素子
JP7244585B2 (ja) 量子ドット含有組成物、量子ドット製造方法およびカラーフィルタ
JP6171923B2 (ja) 硬化性樹脂組成物、硬化膜、発光素子、波長変換フィルムおよび発光層の形成方法
JP6171927B2 (ja) 感放射線性樹脂組成物、硬化膜、発光素子および発光層の形成方法
CN114077161B (zh) 可固化组合物、使用其的固化层以及包含固化层的显示装置
JP2019526076A (ja) 感光性組成物、色変換媒体、光学デバイスおよびこれらを製造するための方法
JP2024070567A (ja) 感光性樹脂組成物、感光性樹脂皮膜、パターン形成方法及び発光素子
JP7724195B2 (ja) 感光性樹脂組成物、感光性樹脂皮膜、感光性ドライフィルム、パターン形成方法及び発光素子
CN119511633B (zh) 一种感光树脂组合物及其制备方法和应用
JP7821094B2 (ja) 感光性樹脂組成物、感光性樹脂皮膜、感光性ドライフィルム、パターン形成方法及び発光素子
JP7830283B2 (ja) 感光性樹脂組成物、感光性樹脂皮膜、感光性ドライフィルム、パターン形成方法、及び発光素子
TWI908138B (zh) 可固化組成物、使用所述組成物的固化層及包括所述固化層的顯示裝置
CN116855126B (zh) 可固化组合物、使用组合物的固化层、包含固化层的滤色器以及包含滤色器的显示装置
TW202535986A (zh) 可固化組成物、使用該組成物的固化層、包括固化層的彩色濾光片、及包括彩色濾光片的顯示裝置
TW202535972A (zh) 著色感光性樹脂組合物、彩色濾光片及影像顯示裝置
TW202542277A (zh) 量子點、包含其的可固化組成物以及使用該可固化組成物的固化層
CN120882836A (zh) 可固化组合物、使用所述组合物的固化层以及包含所述固化层的显示装置
CN119998695A (zh) 含量子点组合物及其制备方法
TW202449117A (zh) 可固化組合物、使用所述組合物的固化層以及包含所述固化層的顯示裝置

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20241025

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20250403

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20251014

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20251202

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20251223

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20260114

R150 Certificate of patent or registration of utility model

Ref document number: 7805906

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150