JP7514728B2 - Sanitary cleaning device and toilet device - Google Patents

Description

This disclosure relates to a sanitary washing device and a toilet device equipped with the same.

Conventionally, a sanitary washing device has been disclosed that includes a retractable washing nozzle and a shutter section that opens and closes the front opening of the washing nozzle (see, for example, Patent Document 1). The sanitary washing device described in Patent Document 1 uses a movable washing nozzle to wash the user's private parts with washing water discharged from the washing nozzle's water outlet when the washing nozzle advances, and to wash the back surface of the shutter section with washing water discharged from the washing nozzle's water outlet when the washing nozzle is retracted.

JP 2013-28902 A

In the sanitary washing device described in Patent Document 1, the rear surface of the shutter is washed with washing water discharged from the washing nozzle, so it is not possible to wash any part of the rear surface of the shutter other than the part where the washing nozzle is located in the left-right direction. There is a demand for being able to wash parts of the rear surface of the shutter other than the part where the washing nozzle is located.

The present disclosure aims to provide a sanitary washing device that includes a shutter section that can open and close the front opening of the washing nozzle, and that can easily wash areas on the back surface of the shutter section other than where the washing nozzle is located.

The present disclosure relates to a sanitary washing device having a human body washing function provided in a functional section disposed at the rear of a toilet bowl, the sanitary washing device comprising a washing nozzle configured to be movable between a stored position and an advanced position, a shutter section that opens and closes an opening section formed in front of the functional section at a position outside the washing nozzle in the left-right direction, and a shutter back surface washing section that washes the back surface of the shutter section.

1 is a perspective view of a toilet apparatus according to one embodiment; FIG. FIG. 4 is a front view showing the shutter back surface cleaning unit. 1 is a perspective view of the shutter back surface cleaning unit as viewed from the front side. FIG. 1 is a perspective view of the shutter back surface cleaning unit as viewed from diagonally below. FIG. FIG. 13 is a perspective view showing a case where the cleaning nozzle is in an advanced position. 13 is a front view showing the cleaning nozzle in an advanced position. FIG. FIG. 2 is a diagram showing a cleaning water circuit of the sanitary cleaning device. 4 is a cross-sectional view taken along line AA in FIG. 3. 4 is a cross-sectional view taken along line BB in FIG. 3. 11 is a cross-sectional view showing the positional relationship between the cleaning nozzle and the central cleaning part on the rear surface of the shutter when the cleaning nozzle is in the advanced position. FIG. 4 is a cross-sectional view taken along line CC of FIG. 3.

One embodiment of the toilet device 1 will be described with reference to the drawings. In the following description, the front-to-back direction as seen by a user seated on the toilet seat (not shown) is referred to as the front-to-back direction Y. The left-to-right direction as seen by a user seated on the toilet seat is referred to as the left-to-right direction X. The up-to-down direction along the vertical direction relative to the floor surface on which the toilet 2 is installed is referred to as the up-to-down direction Z. The cross sections shown in Figures 9, 10, and 12 are cross sections taken along lines A-A to C-C in Figure 3, respectively, along the front-to-back direction Y and the up-to-down direction Z, as viewed in the left-to-right direction X.

As shown in FIG. 1, the toilet device 1 according to this embodiment includes a toilet bowl 2, a toilet seat (not shown), a toilet cover 3, and a functional unit 4. The toilet bowl 2 is formed with an opening facing upward. The toilet bowl 2 is made of, for example, ceramic or resin. The toilet seat (not shown) and the toilet cover 3 are attached above the toilet bowl 2 so as to be rotatable relative to the toilet bowl 2.

As shown in Figures 1 and 2, the toilet bowl 2 has a toilet bowl 21, an upper surface portion 22, a toilet bowl recess 23, and an outer peripheral wall portion 24. The toilet bowl 21 is disposed at the front side of the toilet bowl 2. The toilet bowl 21 has an opening 211 at the top. The outer peripheral wall portion 24 surrounds the outer surface of the toilet bowl 21 and the outside of the piping, etc.

The toilet recess 23 is disposed along the periphery of the rear side of the opening 211 of the toilet bowl 21, and is recessed from the upper surface of the top surface portion 22. As shown in FIG. 2, the toilet recess 23 has a bottom surface 231, a pair of side walls 232, and a rear wall 233 (see FIGS. 9, 10, and 12). In this embodiment, both the upper surface of the top surface portion 22 of the toilet 2 and the bottom surface 231 of the toilet recess 23 of the toilet 2 are the upper surface of the toilet 2.

The functional part 4 is disposed at the rear of the toilet bowl 2 as shown in FIG. 1. With the majority of the rear side of the functional part 4 disposed at the rear portion of the top surface part 22 of the toilet bowl 2, a portion of the front side is disposed above the toilet bowl recess 23 and above the rear side of the toilet bowl 21. The functional part 4 has a functional part protrusion 42. The functional part protrusion 42 is formed at the front side of the functional part 4, protruding downward from the functional part 4. The functional part protrusion 42 is disposed in the toilet bowl recess 23 of the toilet bowl 2 when the functional part 4 is installed on the top surface part 22 of the toilet bowl 2 other than the toilet bowl recess 23.

The functional unit 4 is configured to include at least a sanitary washing device 5 that washes the user's private parts. As shown in Figures 1 and 2, the functional unit 4 includes functional components that include the sanitary washing device 5, a base plate 41 (base member), and a cover member 411 that covers the outer shape of the functional unit. At least some of the functional components of the functional unit 4 are arranged on the base plate 41.

The functional parts are installed on the base plate 41 or in other installation positions, taking into consideration various functions and their positional relationships with other components. Examples of functional parts include a heater for the toilet seat (not shown), a toilet flushing device equipped with a flushing tank, a sanitary flushing device 5 (see FIG. 3) that washes the user's private parts, a hose, a power supply unit, a control circuit board, an electric opening/closing unit that electrically opens and closes the toilet seat and toilet lid 3, a valve unit, various pipes, etc.

The sanitary washing device 5 has a human body washing function, and as shown in Figs. 3 to 5, has a pair of wash nozzles 51 that can move back and forth, a shutter section 52 that opens and closes the front opening of the wash nozzles 51, a nozzle washing section 53, a shutter washing mechanism 6, a hot air drying device 54, and a wash control section 55 (see Fig. 8). The shutter section 52 is not shown in Figs. 4 and 5.

The pair of cleaning nozzles 51 are arranged at a distance in the left-right direction X at the center of the left-right direction X on the front side of the functional part 4. Each of the pair of cleaning nozzles 51 is used for anal washing and bidet washing to wash private parts of the human body. The cleaning nozzle 51 sprays cleaning water toward the human body through a nozzle water outlet 51a (see Figure 6) provided at the top of the tip side.

The pair of cleaning nozzles 51 can each be advanced and retreated between a stored position shown in Figures 3 to 5 and an advanced position shown in Figures 6 and 7. The stored position of the cleaning nozzle 51 is a position where the cleaning nozzle 51 is stored inside the shutter section 52. The advanced position of the cleaning nozzle 51 is a position where it is advanced forward to clean the user's private parts. A rack 512 of the nozzle drive mechanism 511 is provided on the back side of the cleaning nozzle 51, as shown in Figures 6 and 7.

As shown in Figures 6 and 7, the nozzle drive mechanism 511 includes a long rack 512, a pinion (not shown), and a motor (not shown). The pinion meshes with the rack 512 and is rotated by the drive of the motor. The cleaning nozzle 51 advances diagonally downward by the nozzle drive mechanism 511, and is configured so that its tip presses the back surface (inner surface) of the shutter section 52.

The shutter section 52 is disposed in front of the functional section protrusion 42, in the center in the left-right direction X. The shutter section 52 is formed in a plate shape extending in the left-right direction X (horizontal direction) of the toilet 2. When in the closed position, the shutter section 52 is formed in a flat shape with a downward slope from the front side to the rear side (see FIG. 9, etc.).

As shown in FIG. 6, the shutter unit 52 is configured to be rotatable around a rotation axis extending in the left-right direction X provided on the upper frame 431 of the functional unit front frame 43 arranged in front of the functional unit 4. The functional unit front frame 43 is fixed to the base plate 41. The functional unit front frame 43 is formed with an opening 432 (front opening) that constitutes the front opening of the cleaning nozzle 51. The opening 432 is an open portion formed in front of the functional unit 4.

When the cleaning nozzle 51 advances or retreats, the back surface of the shutter unit 52 is pressed by the cleaning nozzle 51, thereby opening and closing the opening 432 of the functional unit front frame 43 formed in front of the cleaning nozzle 51. When the shutter unit 52 is in the closed position, it is positioned in the opening 432 of the functional unit front frame 43.

In this embodiment, the shutter section 52 is configured as a single member and is disposed in front of the cleaning nozzle 51 and the hot air drying device 54 (described later). However, this is not limited to this. The shutter section may be configured as two separate members (a shutter section for the cleaning nozzle 51 and a shutter section for the hot air drying device 54).

As shown in FIG. 3, the hot air dryer 54 is disposed on one side in the left-right direction X, behind the shutter section 52 in the closed position. The hot air dryer 54 has a hot air outlet 541. The hot air outlet 541 is formed to open upward, behind the opening 432 of the functional section front frame 43. The hot air dryer 54 can blow hot air toward the human body from the hot air outlet 541 when the shutter section 52 is open, or blow hot air toward the back surface of the shutter section 52 after cleaning when the shutter section 52 is closed, at a predetermined timing after the cleaning operation of the sanitary cleaning device 5, to blow off water droplets.

As shown in FIG. 8, the sanitary washing device 5 has a washing water circuit 56 through which washing water for washing the front and back sides of the shutter section 52 flows. The washing water circuit 56 supplies washing water to the nozzle washing section 53 and the shutter washing mechanism 6. In this embodiment, washing also includes washing with sterilized water (silver ion water, hypochlorous acid), high-temperature water, foam washing, etc.

8, the cleaning water circuit 56 has a cleaning water supply flow path L1 that supplies cleaning water to the sanitary cleaning device 5, a shutter upper side cleaning flow path L2, a shutter backside center side cleaning flow path L3, and a shutter backside outer side cleaning flow path L4. The cleaning water circuit 56 includes a nozzle cleaning unit 53, a shutter front side cleaning unit 61, a shutter backside cleaning unit 62 (shutter backside center side cleaning unit 63, shutter backside outer side cleaning unit 64), and opening and closing valves 561a, 561b, and 561c, and constitutes a cleaning unit that performs each cleaning operation of the sanitary cleaning device 5.

The upper shutter cleaning flow path L2, the central shutter back surface cleaning flow path L3, and the outer shutter back surface cleaning flow path L4 are flow paths that branch off downstream of the cleaning water supply flow path L1. The upper shutter cleaning flow path L2, the central shutter back surface cleaning flow path L3, and the outer shutter back surface cleaning flow path L4 are, for example, made of rubber hoses.

The upstream end of the shutter upper side cleaning flow path L2 is connected to the downstream end of the cleaning water supply flow path L1, and the downstream end is connected to the shutter upper storage section 441. The shutter upper storage section 441 temporarily stores cleaning water to be supplied to the shutter front cleaning section 61. The shutter upper storage section 441 extends in the left-right direction X inside the upper frame 431 of the functional section front frame 43.

The shutter upper reservoir 441 is connected to the slit water outlet 611 of the shutter front cleaning section 61 (described later) at the front side below the upper frame 431 of the functional section front frame 43, and also to the three nozzle cleaning water outlets 531 of the nozzle cleaning section 53 (described later). The cleaning water stored in the shutter upper reservoir 441 is discharged from the slit water outlet 611 of the shutter front cleaning section 61, and also from the three nozzle cleaning water outlets 531 of the nozzle cleaning section 53.

The upstream end of the shutter rear surface center cleaning flow path L3 is connected to the downstream end of the cleaning water supply flow path L1, and the downstream end is connected to the shutter lower center storage section 442. The shutter lower center storage section 442 temporarily stores cleaning water to be supplied to the shutter rear surface center cleaning section 63. The shutter lower center storage section 442 is formed in the rear protruding section 434 that protrudes rearward from the lower frame 433 (see Figure 4) of the functional section front frame 43 located below the cleaning nozzle 51, at the center of the functional section 4 in the left-right direction X. The shutter lower center storage section 442 is located at the rear of the shutter section 52 located in the closed position.

The shutter lower center storage section 442 is connected at the front side to multiple lower center water outlets 631 of the shutter back side center cleaning section 63 (described later). The cleaning water stored in the shutter lower center storage section 442 is discharged from the multiple lower center water outlets 631 of the shutter back side center cleaning section 63.

The shutter back surface outer cleaning flow path L4 has an upstream cleaning flow path L41 on the upstream side, and two downstream cleaning flow paths L42 branching off from the downstream end of the upstream cleaning flow path. The downstream ends of the two downstream cleaning flow paths L42 are connected to two shutter lower outer storage sections 443 arranged separately in the left-right direction X. The two shutter lower outer storage sections 443 are respectively arranged on one side and the other side of the shutter lower central storage section 442 on the outside in the left-right direction X.

The two shutter lower outer storage sections 443 are each connected to a plurality of lower outer water outlets 641 of the shutter back surface outer cleaning section 64 (described below). The cleaning water stored in the shutter lower outer storage sections 443 is discharged from the plurality of lower outer water outlets 641 of the shutter back surface outer cleaning section 64.

Opening and closing valves 561a, 561b, and 561c are arranged in the middle of the upper shutter cleaning flow path L2, the central shutter back surface cleaning flow path L3, and the outer shutter back surface cleaning flow path L4 to open and close each flow path. The circuit configuration of the cleaning water circuit 56 is not limited to this embodiment. The cleaning water circuit 56 may be configured as a single circuit, or may be configured by providing multiple circuits with switching valves, etc.

The opening and closing operations of the opening and closing valves 561a, 561b, and 561c are controlled by the cleaning control unit 55, which will be described later. By the cleaning control unit 55 controlling the opening and closing operations of the opening and closing valves 561a, 561b, and 561c, the nozzle cleaning unit 53, the shutter front cleaning unit 61, and the shutter back surface cleaning unit 62 (the shutter back surface central side cleaning unit 63, and the shutter back surface outer side cleaning unit 64) can discharge cleaning water.

In this embodiment, the cleaning water supplied to the nozzle cleaning unit 53 and the shutter front cleaning unit 61 is the cleaning water temporarily stored in the shutter upper storage unit 441. The cleaning water stored in the shutter upper storage unit 441 is discharged from the nozzle cleaning unit 53 and the shutter front cleaning unit 61 at the same timing. The timing of the nozzle cleaning unit 53 and the shutter front cleaning unit 61 to discharge water, the timing of the shutter back central side cleaning unit 63 to discharge water, and the timing of the shutter back outer side cleaning unit 64 to discharge water can be independent of each other. In this embodiment, the timing of the nozzle cleaning unit 53 and the shutter front cleaning unit 61 to discharge water is the same. However, this is not limited to this. In order to enable the nozzle cleaning unit 53 and the shutter front cleaning unit 61 to discharge water at different timings, the flow paths that supply cleaning water to the nozzle cleaning unit 53 and the shutter front cleaning unit 61 may be configured as separate flow paths and controlled to discharge water at different timings.

As shown in Figures 3 and 5, the nozzle cleaning unit 53 is provided on the underside of the upper frame 431 of the functional unit front frame 43, at the center in the left-right direction X on the upper side of the shutter unit 52. The nozzle cleaning unit 53 has three nozzle cleaning water outlets 531. The nozzle cleaning unit 53 sprays cleaning water from the three nozzle cleaning water outlets 531 to clean the cleaning nozzle 51.

The three nozzle cleaning water outlets 531 each open downward above the two cleaning nozzles 51. The three nozzle cleaning water outlets 531 are arranged side by side in the left-right direction X on the underside of the upper frame 431 of the functional section front frame 43. The number of nozzle cleaning water outlets 531 is not limited.

Each of the three nozzle cleaning water outlets 531 discharges cleaning water downward. As shown in Figures 5 and 9, the nozzle cleaning water outlet 531 has an introduction section 531a, a constriction section 531b, and a diffusion section 531c. As shown in Figures 8 and 9, inside the upper frame 431 of the functional section front frame 43, a shutter upper storage section 441 is formed extending in the left-right direction X. Cleansing water is supplied to the shutter upper storage section 441 via the shutter upper side cleaning flow path L2.

The cleaning water temporarily stored in the shutter upper reservoir 441 is introduced into the inlet 531a of the nozzle cleaning water outlet 531. In the nozzle cleaning water outlet 531, the cleaning water introduced into the inlet 531a is throttled by the throttle section 531b, and the cleaning water throttled by the throttle section 531b is diffused in the diffusion section 531c and forcefully discharged downward.

The nozzle cleaning unit 53 described above can clean the cleaning nozzle 51 when the cleaning nozzle 51 is in the advanced state. The advanced state of the cleaning nozzle 51 includes not only when the cleaning nozzle 51 is in the advanced position where it performs a local cleaning operation, but also when the cleaning nozzle 51 is in the middle of moving from the stored position to the advanced position, and when the cleaning nozzle 51 is in the middle of returning from the advanced position to the stored position.

As shown in FIG. 3, the lower central water outlet 631 of the shutter backside central cleaning section 63 (described later) is disposed below the nozzle cleaning section 53. As a result, for example, the nozzle cleaning section 53 can discharge cleaning water toward the lower central water outlet 631 of the shutter backside central cleaning section 63 disposed below at a predetermined timing, so that the cleaning water discharged from the nozzle cleaning section 53 hits the two lower central water outlets 631 of the shutter backside central cleaning section 63 directly, thereby cleaning the two lower central water outlets 631 of the shutter backside central cleaning section 63. The nozzle cleaning section 53 can, for example, discharge cleaning water downward at a predetermined timing to collect cleaning water on the base plate 41, and clean the two lower central water outlets 631 of the shutter backside central cleaning section 63 with the cleaning water accumulated on the base plate 41.

As shown in Figures 4 and 5, the shutter cleaning mechanism 6 includes a shutter front surface cleaning section 61 and a shutter back surface cleaning section 62.

As shown in Figs. 5 and 9, the shutter front cleaning unit 61 cleans the front side of the shutter unit 52. When the shutter unit 52 is closed, the shutter front cleaning unit 61 discharges cleaning water from above the front side of the shutter unit 52 along the front surface of the shutter unit 52. The shutter front cleaning unit 61 has a slit-shaped water outlet 611 that extends in the left-right direction X.

The slit water outlet 611 is provided at the bottom of the upper frame 431 of the functional section front frame 43, in the center of the left-right direction X on the upper side of the shutter section 52. The slit water outlet 611 opens downward in a slit shape. The slit water outlet 611 extends in the left-right direction X of the shutter section 52 at the top of the shutter section 52, forward of the three nozzle cleaning water outlets 531 of the nozzle cleaning section 53.

The length of the slit water outlet 611 in the left-right direction X is formed to a length that can clean the left-right direction X area of the front surface of the shutter section 52. In this embodiment, for example, the length of the slit water outlet 611 in the left-right direction X is formed slightly shorter than the length of the shutter section 52 in the left-right direction X. The length of the slit water outlet 611 in the left-right direction X is not limited to this. The length of the slit water outlet 611 in the left-right direction X may be formed to be approximately the same as the length of the shutter section 52 in the left-right direction X, or may be formed to be longer than the length of the shutter section 52 in the left-right direction X.

In this embodiment, the shutter front cleaning section 61 is configured to discharge cleaning water from a slit-shaped slit water outlet 611 extending in the left-right direction X. However, this is not limited to this. The shutter front cleaning section 61 may be configured with multiple water outlets arranged side by side in the left-right direction X.

As shown in FIG. 3, the shutter back surface cleaning section 62 includes a shutter back surface central cleaning section 63 (shutter back surface cleaning section) and a pair of shutter back surface outer cleaning sections 64.

The shutter backside central cleaning section 63 is located in the center in the left-right direction X at the bottom front of the functional section 4. The shutter backside central cleaning section 63 cleans the central side in the left-right direction X of the back surface of the shutter section 52. The shutter backside central cleaning section 63 is provided on the functional section front frame 43 (fixed section) which does not move in the functional section 4. The functional section front frame 43 is a fixed section which is fixed to the functional section 4 and does not move relative to the base plate 41.

As shown in Figures 3 and 4, the shutter backside central cleaning section 63 is located below the cleaning nozzle 51 in the center of the functional section 4 in the left-right direction X. The shutter backside central cleaning section 63 has two lower central water outlets 631. The two lower central water outlets 631 are located apart in the left-right direction X in the center of the functional section 4 in the left-right direction X.

As shown in Figures 4 and 10, the two lower central water outlets 631 each open forward below one of the two cleaning nozzles 51 corresponding thereto. The lower central water outlet 631 discharges cleaning water diagonally downward in the forward direction relative to the horizontal direction. This prevents cleaning water discharged from the lower central water outlet 631 from splashing out of the toilet bowl 2. If the shutter section 52 becomes detached, for example, cleaning water can be prevented from splashing out of the toilet bowl 2. The opening direction of the lower central water outlet 631 is not limited. For example, the lower outer water outlet 641 may open horizontally in the forward direction and discharge cleaning water horizontally.

When the shutter section 52 is closed, the two lower central water outlets 631 are positioned at the rear of the shutter section 52, at the center of the shutter section 52 in the left-right direction X. When the shutter section 52 is open, the two lower central water outlets 631 are positioned at the center of the shutter section 52 in the left-right direction X, exposed to the outside on the front side, and easy to see for the user. This allows the user to easily clean the two lower central water outlets 631 by opening the shutter section 52.

The lower central water outlet 631 has an introduction section 631a, a constriction section 631b, and a diffusion section 631c, as shown in Figures 4 and 10. At the center of the functional section 4 in the left-right direction X, below the cleaning nozzle 51, a shutter lower central storage section 442 is formed, as shown in Figures 8 and 10. Cleaning water is supplied to the shutter lower central storage section 442 via the shutter back surface central cleaning flow path L3.

The introduction section 631a of the lower central water outlet 631 introduces the cleaning water that has been temporarily stored in the shutter lower central storage section 442. In the lower central water outlet 631, the cleaning water introduced into the introduction section 631a is throttled by the throttle section 631b, and the cleaning water throttled by the throttle section 631b is diffused in the diffusion section 631c and is forcefully discharged diagonally downward in the forward direction.

The above-mentioned shutter backside center cleaning section 63 discharges cleaning water toward the backside of the shutter section 52 when the cleaning nozzle 51 is in the storage position and the shutter section 52 is closed. In addition, as shown in FIG. 11, the shutter backside center cleaning section 63 can clean the backside of the cleaning nozzle 51 when the cleaning nozzle 51 is in the advanced state. The backside of the cleaning nozzle 51 means the backside of the cleaning nozzle 51 when viewed from the front of the toilet device 1, and means the rear side of the cleaning nozzle 51. Cleaning the backside of the cleaning nozzle 51 includes cleaning the backside surface of the cleaning nozzle 51 and cleaning various parts provided on the backside of the cleaning nozzle 51. In this embodiment, the shutter backside center cleaning section 63 can clean, for example, the rack 512 provided on the backside of the cleaning nozzle 51.

In this embodiment, the advanced state of the cleaning nozzle 51 includes not only the state in which the cleaning nozzle 51 is located at the advanced position where the local cleaning operation is performed, but also the state in which the cleaning nozzle 51 is in the middle of moving from the stored position to the advanced position, and the state in which the cleaning nozzle 51 is in the middle of returning from the advanced position to the stored position.

As shown in Figs. 3 and 4, the pair of shutter back surface outer cleaning parts 64 are arranged on both sides of the shutter back surface center cleaning part 63 in the left-right direction X at the lower front side of the functional part 4, sandwiching the shutter back surface center cleaning part 63. The pair of shutter back surface outer cleaning parts 64 are arranged in the left-right direction X on the back surface of the shutter part 52 other than the part where the cleaning nozzle 51 is arranged. In this embodiment, the part of the back surface of the shutter part 52 other than the part where the cleaning nozzle 51 is arranged in the left-right direction X is the outer part of the back surface of the shutter part 52 in the left-right direction X. The pair of shutter back surface outer cleaning parts 64 clean the back surface of a part of the shutter part 52 that opens and closes the opening 432 of the functional part front frame 43 at a position outer than the cleaning nozzle 51 in the left-right direction X. The pair of shutter back surface outer cleaning parts 64 are each fixed to an immovable part of the functional part 4.

As shown in Figures 4 and 5, each of the pair of shutter back surface outer cleaning sections 64 has two lower outer water outlets 641. The two lower outer water outlets 641 are arranged apart in the left-right direction X on the outer sides of the functional section 4, sandwiching the center in the left-right direction X.

The two lower outer water outlets 641 each open horizontally toward the front outside the left-right direction X behind the shutter section 52. The lower outer water outlets 641 discharge flushing water forward. The opening direction of the lower outer water outlets 641 is not limited. The lower outer water outlets 641 may discharge flushing water diagonally downward toward the front from the horizontal direction. This can prevent flushing water from splashing out outside the toilet bowl 2 if, for example, the shutter section 52 comes off.

When the shutter section 52 is closed, the two lower outer water outlets 641 are positioned outside the shutter section 52 in the left-right direction X, behind the shutter section 52. When the shutter section 52 is open, the two lower outer water outlets 641 are positioned outside the shutter section 52 in the left-right direction X, exposed to the outside on the forward side, and in a position that is easily visible to the user. This allows the user to easily clean the two lower outer water outlets 641 by opening the shutter section 52.

The lower outer water outlet 641 has an introduction section 641a, a throttle section 641b, and a diffusion section 641c, as shown in Figs. 4 and 12. Outside the functional section 4 in the left-right direction X, a shutter lower outer storage section 443 is formed, as shown in Figs. 8 and 12. Cleaning water is supplied to the shutter lower outer storage section 443 via the shutter rear surface outer cleaning flow path L4.

The wash water temporarily stored in the shutter lower outer reservoir 443 is introduced into the inlet 641a of the lower outer water outlet 641. In the lower outer water outlet 641, the wash water introduced into the inlet 641a is throttled by the throttle section 641b, and the wash water throttled by the throttle section 641b is diffused in the diffusion section 641c and forcefully discharged forward.

When the cleaning nozzle 51 is in the storage position and the shutter section 52 is closed, the pair of shutter back surface outer cleaning sections 64 discharge cleaning water to the outside in the left-right direction X of the back surface of the shutter section 52. This allows the pair of shutter back surface outer cleaning sections 64 to clean the outer part of the back surface of the shutter section 52 in the left-right direction X.

In this embodiment, the cleaning water discharged from the nozzle cleaning unit 53 can be stored on the base plate 41 to clean the two lower central water outlets 631 of the shutter backside central cleaning unit 63. However, this is not limited to this. In addition to the cleaning water discharged from the nozzle cleaning unit 53, any cleaning water such as cleaning water discharged from the shutter cleaning mechanism 6 (the shutter front cleaning unit 61 and the shutter backside cleaning unit 62) can be stored on the base plate 41, etc., and the two lower central water outlets 631 of the shutter backside central cleaning unit 63 can be cleaned with the cleaning water stored on the base plate 41, etc. Similarly, for example, any cleaning water such as cleaning water discharged from the nozzle cleaning unit 53 or cleaning water discharged from the shutter cleaning mechanism 6 (the shutter front cleaning unit 61 and the shutter backside cleaning unit 62) can be stored on the base plate 41, etc., and the lower outer water outlet 641 of the shutter backside outer cleaning unit 64 can be cleaned with the cleaning water stored on the base plate 41, etc.

For example, the pair of shutter back surface outer cleaning sections 64 can discharge cleaning water toward the back surface of the shutter section 52 that is positioned in the closed position, and the cleaning water that hits the back surface of the shutter section 52 can be stored in the base recess 412 (see FIG. 12) of the base plate 41. The base recess 412 is structured so that it can only temporarily store cleaning water and can be drained. By configuring the amount of water that enters the base recess 412 to be greater than the amount of water that is drained, the base recess 412 can temporarily store cleaning water.

As shown in FIG. 12, the base recess 412 of the base plate 41 is formed by being recessed downward on the front side of the base plate 41. As a result, when the cleaning water discharged by the shutter back surface external cleaning unit 64 is disinfectant water (silver ion water, hypochlorous acid), the disinfectant water (silver ion water, hypochlorous acid) that hits the back surface of the shutter unit 52 can be stored in the base recess 412, and the disinfectant water (silver ion water, hypochlorous acid) stored in the base recess 412 can disinfect the inside of the functional unit 4 and the lower external water discharge port 641 of the shutter back surface external cleaning unit 64.

The cleaning control unit 55 controls each cleaning operation of the sanitary cleaning device 5, as shown in FIG. 8. The cleaning control unit 55 controls the cleaning water circuit 56 to execute control related to cleaning of the sanitary cleaning device 5. The cleaning control unit 55 controls the hot air drying device 54 to emit hot air after each cleaning operation of the sanitary cleaning device 5.

The cleaning water circuit 56 controls the opening and closing valves 561a, 561b, and 561c (cleaning water circuit 56) to perform cleaning operations such as a nozzle upper side cleaning operation for cleaning the cleaning nozzle 51 by the nozzle cleaning unit 53, a shutter front side cleaning operation for cleaning the front side of the shutter unit 52 by the shutter front side cleaning unit 61, a shutter back side center side cleaning operation for cleaning the central part of the back side of the shutter unit 52 in the left-right direction X by the shutter back side center side cleaning unit 63, a nozzle back side cleaning operation for cleaning the back side of the cleaning nozzle 51 by the shutter back side center side cleaning unit 63, and a shutter back side outer side cleaning operation for cleaning the outer part of the back side of the shutter unit 52 in the left-right direction X by the shutter back side outer side cleaning unit 64. This allows the cleaning nozzle 51 and the shutter unit 52 to be cleaned.

The cleaning control unit 55 controls the opening and closing valves 561a, 561b, 561c (cleaning water circuit 56) so that after the nozzle cleaning unit 53 has performed (finished) a local cleaning operation of the cleaning nozzle 51, it performs a nozzle top side cleaning operation and a nozzle back side cleaning operation while the cleaning nozzle 51 is in the advanced state in the middle of moving from the advanced position to the stored position, and after performing the nozzle top side cleaning operation and the nozzle back side cleaning operation, it performs a shutter back side center side cleaning operation after storing the cleaning nozzle 51, and then performs a shutter back side outer cleaning operation. This allows the shutter unit 52 to be cleaned from the center to the outside in the left-right direction X, so that the cleaning operations can be performed in an order that is least likely to leave dirt behind.

After the nozzle cleaning unit 53 finishes the local cleaning operation of the cleaning nozzle 51, the nozzle backside cleaning operation by the shutter backside center cleaning unit 63 and the shutter backside center cleaning operation by the shutter backside center cleaning unit 63 are performed, so that after the local cleaning operation of the cleaning nozzle 51 by the nozzle cleaning unit 53, which is the most likely to get dirty, the nozzle backside cleaning operation and the shutter backside center cleaning operation can be performed. In this embodiment, after the local cleaning operation of the cleaning nozzle 51 by the nozzle cleaning unit 53 is completed, both the nozzle backside cleaning operation and the shutter backside center cleaning operation are performed. However, this is not limited to this. After the local cleaning operation of the cleaning nozzle 51 by the nozzle cleaning unit 53 is completed, either the nozzle backside cleaning operation or the shutter backside center cleaning operation may be performed.

The cleaning control unit 55 controls the opening and closing valves 561a, 561b, and 561c (cleaning water circuit 56) so that the nozzle top side cleaning operation and the nozzle back side cleaning operation are performed at the same time. This allows the top of the cleaning nozzle 51 to be cleaned by the nozzle top side cleaning operation, and dirt that has gotten behind the cleaning nozzle 51 can also be washed away by the nozzle back side cleaning operation, so that dirt does not remain on the upper surface inside the base plate 41.

As shown in FIG. 8, the flushing control unit 55 can control the flushing operation based on a detection signal from a water level detection sensor 45 that detects a rise in the wastewater level. An actual illustration of the water level detection sensor 45 is omitted. The water level detection sensor 45 can be installed, for example, on the underside of the functional part protrusion 42 of the functional part 4, and can detect a clog in the toilet bowl 2 when the water level rises. The location and height at which the water level detection sensor 45 is installed are not limited to this. The water level detection sensor 45 may be installed in another location.

The flushing control unit 55 controls the opening and closing valves 561a, 561b, and 561c (flushing water circuit 56) to perform flushing operations (nozzle top flushing operation, shutter front flushing operation, shutter back center flushing operation, nozzle back flushing operation, shutter back outside flushing operation) when the sewage level rises and the toilet bowl 2 is detected as clogged by the water level detection sensor 45, and then a drop in the sewage level is detected. Even if the toilet bowl 2 becomes clogged and the sewage level rises due to the clog in the toilet bowl 2, causing the lower part of the functional unit 4 to become submerged in the sewage, when the toilet bowl 2 is cleared, the flushing operations (nozzle top flushing operation, shutter front flushing operation, shutter back center flushing operation, nozzle back flushing operation, shutter back outside flushing operation) can be performed to clean the areas that became dirty when the toilet bowl 2 was submerged.

The cleaning control unit 55 controls the opening and closing valves 561a, 561b, 561c (cleaning water circuit 56) to perform the shutter backside center cleaning operation and the shutter backside outer cleaning operation during the local cleaning operation of the sanitary cleaning device 5. This prevents splashes during cleaning by the local cleaning operation from entering the inside of the base plate 41 by the cleaning water discharged from the shutter backside center cleaning unit 63 and the shutter backside center cleaning unit 63.

The cleaning control unit 55 controls the opening and closing valves 561a, 561b, and 561c (cleaning water circuit 56) to perform an operation of cleaning the two lower central water outlets 631 of the shutter backside central cleaning unit 63 with cleaning water discharged from the nozzle cleaning unit 53 at a predetermined timing. Specifically, the nozzle cleaning unit 53 discharges cleaning water toward the lower central water outlet 631 of the shutter backside central cleaning unit 63 located below at a predetermined timing, thereby directly hitting the cleaning water discharged from the nozzle cleaning unit 53 against the two lower central water outlets 631 of the shutter backside central cleaning unit 63, thereby cleaning the two lower central water outlets 631 of the shutter backside central cleaning unit 63. The nozzle cleaning unit 53 can, for example, spray cleaning water downward at a predetermined timing to collect the cleaning water on the base plate 41, and then use the cleaning water collected on the base plate 41 to clean the two lower central water outlets 631 of the shutter back surface central cleaning unit 63.

When the human body sensor 46 detects that a person is standing in front of the toilet 2, as shown in FIG. 8, the flushing control unit 55 advances the flushing nozzle 51 a predetermined distance to push the shutter unit 52 open slightly, and controls the opening and closing valves 561a, 561b, 561c (flushing water circuit 56) to perform the shutter back flushing operation (shutter back center flushing operation, shutter back outside flushing operation). As a result, when a man uses the toilet device 1 while standing, the flushing water discharged from the shutter back center flushing unit 63 and the flushing water discharged from the shutter back outside flushing unit 64 can prevent urine splashes from penetrating inside the base plate 41.

The cleaning control unit 55 controls the opening and closing valves 561a, 561b, and 561c (cleaning water circuit 56) to perform a shutter back cleaning operation (a shutter back center side cleaning operation by the shutter back center side cleaning unit 63, and a shutter back outer side cleaning operation by the shutter back outer side cleaning unit 64) to clean the back side of the shutter unit 52 when the cleaning nozzle 51 is in the stored position. This makes it possible to prevent cleaning water from splashing out during cleaning by performing a shutter back cleaning operation (a shutter back center side cleaning operation by the shutter back center side cleaning unit 63, and a shutter back outer side cleaning operation by the shutter back outer side cleaning unit 64) to clean the back side of the shutter unit 52 when the cleaning nozzle 51 is in the stored position.

The flushing control unit 55 controls the opening and closing valves 561a, 561b, 561c (flushing water circuit 56) to perform a shutter backside flushing operation (a shutter backside center side flushing operation by the shutter backside center side flushing unit 63, and a shutter backside outer side flushing operation by the shutter backside outer side flushing unit 64) to flush the backside of the shutter unit 52 when the user is not seated on the toilet 2. This makes it possible to prevent flushing water from splashing on the user during flushing by performing a shutter backside flushing operation (a shutter backside center side flushing operation by the shutter backside center side flushing unit 63, and a shutter backside outer side flushing operation by the shutter backside outer side flushing unit 64) to flush the backside of the shutter unit 52 when the user is not seated on the toilet 2.

The cleaning control unit 55 controls the hot air drying device 54 to emit hot air after the back surface of the shutter is cleaned. This makes it possible to blow away and remove water droplets on the back surface of the shutter section 52 after the cleaning operations (nozzle top side cleaning operation, shutter front side cleaning operation, shutter back surface center side cleaning operation, nozzle back side cleaning operation, shutter back surface outer cleaning operation) are performed.

The sanitary washing device 5 of this embodiment described above provides the following advantages:

The sanitary washing device 5 of this embodiment is a sanitary washing device 5 with a human body washing function provided in a functional part 4 arranged at the rear of the toilet 2, and includes a washing nozzle 51 configured to be able to move between a stored position and an advanced position, a shutter part 52 that opens and closes an opening 432 at a position outside the washing nozzle 51 in the left-right direction X, and a shutter back surface outer washing part 64 that washes the back surface of the shutter part 52. As a result, the shutter back surface outer washing part 64 can easily wash the outer part of the back surface of the shutter part 52 in the left-right direction X in the left-right direction X of the shutter part 52.

In this embodiment, the shutter back surface outer cleaning section 64 has multiple lower outer water outlets 641. Therefore, by arranging the multiple lower outer water outlets 641 in a line in the left-right direction, a wide area in the left-right direction can be cleaned on the outside of the left-right direction of the back surface of the shutter section 52.

In this embodiment, the hot air dryer 54 is disposed behind the shutter section 52. As a result, the hot air dryer 54 can blow hot air toward the human body from the hot air outlet 541 when the shutter section 52 is open at a predetermined timing after the cleaning operation of the sanitary cleaning device 5, for example, or blow hot air to the back surface of the shutter section 52 after cleaning the back surface of the shutter section 52 when the shutter section 52 is closed to blow off water droplets.

In this embodiment, the shutter back surface outer cleaning unit 64 cleans the back surface of the shutter section 52 when the cleaning nozzle 51 is in the stored position and the shutter section 52 is closed. This allows the shutter back surface outer cleaning unit 64 to clean the back surface of the shutter section 52 while the cleaning nozzle 51 and the shutter section 52 are stopped, making it easy to clean the back surface of the shutter section 52.

In this embodiment, the toilet includes a toilet bowl 2, a functional unit 4 having a base plate 41 disposed at the rear of the toilet bowl 2, and a sanitary washing device 5. The base plate 41 has a base recess 412 that can store washing water that hits the back surface of the shutter unit 52 when the shutter back surface outer washing unit 64 discharges washing water toward the back surface of the shutter unit 52 that is in the closed position. As a result, when the washing water discharged by the shutter back surface outer washing unit 64 is disinfecting water (silver ion water, hypochlorous acid), the disinfecting water (silver ion water, hypochlorous acid) that hits the back surface of the shutter unit 52 can be stored in the base recess 412, and the disinfecting water (silver ion water, hypochlorous acid) that has accumulated in the base recess 412 can disinfect the inside of the functional unit 4 and the lower outer water outlet 641 of the shutter back surface outer washing unit 64.

The above describes a preferred embodiment of the present disclosure. The present disclosure is not limited to the above-described embodiment, and can be modified as appropriate.

For example, in the above embodiment, at the position in the left-right direction X where the multiple lower central water outlets 631 of the shutter backside central cleaning section 63 and the multiple lower outer water outlets 641 of the pair of shutter backside outer cleaning sections 64 are arranged, as shown in Figures 10 and 12, in a cross section cut along the front-rear direction Y, the bottom surface 231 of the toilet recess 23 of the toilet 2 does not extend to the shutter section 52, and does not extend to the multiple lower central water outlets 631 of the shutter backside central cleaning section 63 and the multiple lower outer water outlets 641 of the pair of shutter backside outer cleaning sections 64. However, this is not limited to this.

For example, by extending the position of the bottom surface 231 of the toilet recess 23 of the toilet 2 forward or changing the position of the functional portion protrusion 42, the ceramic portion of the toilet 2 can be positioned below the shutter portion 52. As a result, at least a part of the upper surface of the toilet 2 (upper surface of the upper surface portion 22, bottom surface 231 of the toilet recess 23) is positioned below the lower central water outlet 631 of the shutter back surface central cleaning portion 63. In this state, when the front or back surface of the shutter portion 52 is cleaned, the cleaning water that falls from the lower portion of the shutter portion 52 can be received by the ceramic portion of the toilet 2. Therefore, by receiving the cleaning water on the ceramic portion of the toilet 2, the sound of the cleaning water falling can be reduced and splashing of the cleaning water can be reduced.

In the above embodiment, the shutter backside center cleaning section 63 is provided on the functional unit front frame 43 (fixed section). However, this is not limited to this. The shutter backside center cleaning section 63 does not have to be provided on the functional unit front frame 43, but may be provided on a fixed section that does not move in the functional unit 4. The fixed section that does not move in the functional unit 4 may be, for example, the base plate 41 (base member) in the above embodiment.

In the above embodiment, the shutter unit 52 is configured as a single member. However, this is not limited to this. A shutter that opens and closes the front open portion of the functional unit 4 at a position outside the cleaning nozzle 51 in the left-right direction X may be provided separately from the cleaning nozzle shutter that is arranged in front of the cleaning nozzle 51.

1 Toilet device, 2 Toilet, 4 Functional part, 5 Sanitary washing device, 41 Base plate (base member), 51 Washing nozzle, 52 Shutter part, 54 Warm air drying device, 64 Shutter backside outer washing part (shutter backside washing part), 412 Base recess, 432 Opening (front opening), 641 Lower outer water outlet (water outlet)

Claims (4)

A sanitary washing device having a function of washing a human body provided in a functional part arranged at the rear of a toilet bowl,
A cleaning nozzle configured to be movable between a storage position and an advanced position;
a shutter portion for opening and closing an opening portion formed in front of the functional portion at a position outside the cleaning nozzle in the left-right direction;
A shutter back surface cleaning unit that cleans the back surface of the shutter unit ,
The shutter back surface cleaning unit has a plurality of water outlets,
The multiple water outlets of the sanitary cleaning device include a central water outlet that cleans the back surface on the central side of the shutter section in the left-right direction, and an outer water outlet that cleans the back surface on both the left-right outsides of the shutter section . The sanitary washing device according to claim 1 , further comprising a hot air drying device disposed behind the shutter portion. The sanitary washing device according to claim 1 or 2 , wherein the shutter back surface washing unit washes the back surface of the shutter unit when the washing nozzle is located in a storage position and the shutter unit is closed. A toilet bowl and
A functional part disposed at a rear portion of the toilet bowl and having a base member;
The sanitary washing device according to any one of claims 1 to 3 ,
The toilet device has a base member having a base recess capable of collecting flushing water that hits the back surface of the shutter section when the shutter back surface cleaning section discharges flushing water toward the back surface of the shutter section positioned in the closed position.

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