JP7481150B2 - Vacuum film forming apparatus and vacuum film forming method - Google Patents
Vacuum film forming apparatus and vacuum film forming method Download PDFInfo
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- JP7481150B2 JP7481150B2 JP2020069170A JP2020069170A JP7481150B2 JP 7481150 B2 JP7481150 B2 JP 7481150B2 JP 2020069170 A JP2020069170 A JP 2020069170A JP 2020069170 A JP2020069170 A JP 2020069170A JP 7481150 B2 JP7481150 B2 JP 7481150B2
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- 238000000034 method Methods 0.000 title claims description 12
- 239000000758 substrate Substances 0.000 claims description 178
- 239000000463 material Substances 0.000 claims description 125
- 239000010408 film Substances 0.000 claims description 81
- 230000015572 biosynthetic process Effects 0.000 claims description 19
- 238000012545 processing Methods 0.000 claims description 14
- 239000010409 thin film Substances 0.000 claims description 7
- 230000000873 masking effect Effects 0.000 claims 2
- 238000000151 deposition Methods 0.000 description 29
- 230000008021 deposition Effects 0.000 description 29
- 238000004804 winding Methods 0.000 description 15
- 229910052751 metal Inorganic materials 0.000 description 13
- 239000002184 metal Substances 0.000 description 13
- 238000001771 vacuum deposition Methods 0.000 description 10
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 229910052744 lithium Inorganic materials 0.000 description 5
- 238000012546 transfer Methods 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 238000011144 upstream manufacturing Methods 0.000 description 3
- 239000011888 foil Substances 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- 239000000057 synthetic resin Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
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Description
本発明は、真空処理室内でシート状の基材とシート状のマスク材とを走行させ、シート状の基材にシート状のマスク材を密着させた後、キャンローラに巻き掛けて周回させ、このキャンローラに対峙して設けられた成膜ユニットにより、キャンローラに巻き掛けられたシート状の基材の部分に対してマスク材越しに成膜するための真空成膜装置及び真空成膜方法に関する。 The present invention relates to a vacuum film-forming apparatus and a vacuum film-forming method in which a sheet-shaped substrate and a sheet-shaped mask material are run in a vacuum processing chamber, the sheet-shaped mask material is brought into close contact with the sheet-shaped substrate, and then the substrate is wrapped around a can roller and rotated, and a film-forming unit provided opposite the can roller forms a film over the mask material on the portion of the sheet-shaped substrate wrapped around the can roller.
例えば、金属箔製または樹脂製のシート状の基材は可撓性を有し、加工性も良いことから、その一方の面や両面に、真空雰囲気で所定の金属膜や酸化物膜等の所定の薄膜を単体または多層で成膜したりして電子部品や光学部品とすることが知られている。このような真空成膜装置は例えば特許文献１で知られている。このものは、真空雰囲気の形成が可能な真空チャンバ（真空処理室）を備える。真空チャンバ内には、シート状の基材を繰り出す繰出ローラと、成膜済みの基材を巻き取る巻取ローラと、繰り出されたシート状の基材の部分が巻き掛けられるキャンローラと、キャンローラに巻き掛けられたシート状の基材の部分に対して成膜する成膜ユニットとが設けられている。 For example, since sheet-like substrates made of metal foil or resin are flexible and easy to process, it is known that a predetermined thin film such as a predetermined metal film or oxide film is formed alone or in multiple layers on one or both sides of the substrate in a vacuum atmosphere to form electronic or optical components. Such a vacuum deposition device is known, for example, from Patent Document 1. This device is equipped with a vacuum chamber (vacuum processing chamber) capable of forming a vacuum atmosphere. Inside the vacuum chamber, there are provided a pay-out roller that pays out the sheet-like substrate, a wind-up roller that winds up the substrate after the film has been formed, a can roller around which the portion of the sheet-like substrate that has been paid out is wound, and a deposition unit that forms a film on the portion of the sheet-like substrate wound around the can roller.
ここで、シート状の基材への成膜時には、基材の成膜面にその成膜範囲を制限するマスク材を密着させ、マスク材越しに成膜する場合がある。このような場合、上記真空成膜装置に、例えば特許文献２記載のものを適用することが考えられる。即ち、真空処理室内に、シート状のマスク材を繰り出すマスク材用の繰出ローラと、シート状のマスク材を巻き取るマスク材用の巻取ローラと、シート状の基材とシート状のマスク材とを密着させるプラテンローラ（密着手段）と、シート状の基材からこれに密着するシート状のマスク材を剥離する剥離ローラとを更に設ける。そして、夫々繰り出されたシート状の基材とマスク材とが重ね合わされた後、プラテンローラでマスク材を基材に向けて押し付け密着させ、これをキャンローラに案内してキャンローラを周回する間にマスク材越しに成膜する。成膜後には、剥離ローラを起点にシート状のマスク材とシート状の基材とを互いに異なる方向に引っ張ることで（即ち、剥離ローラにおけるシート状の基材とマスク材との抱角を変えることで）、シート状の基材からシート状のマスク材が剥離される。 Here, when forming a film on a sheet-like substrate, a mask material that limits the film formation range may be attached to the film formation surface of the substrate, and the film may be formed through the mask material. In such a case, it is possible to apply, for example, the one described in Patent Document 2 to the above vacuum film formation device. That is, in the vacuum processing chamber, a mask material feed roller that feeds out the sheet-like mask material, a mask material take-up roller that winds up the sheet-like mask material, a platen roller (adhering means) that brings the sheet-like substrate and the sheet-like mask material into close contact, and a peeling roller that peels off the sheet-like mask material that is in close contact with it from the sheet-like substrate are further provided. Then, after the sheet-like substrate and the mask material that have been respectively fed out are superimposed, the platen roller presses the mask material against the substrate to bring them into close contact, and the mask material is guided to the can roller, and a film is formed through the mask material while it rotates around the can roller. After the film is formed, the sheet-like mask material and the sheet-like substrate are pulled in different directions from each other starting from the peeling roller (i.e., by changing the included angle between the sheet-like substrate and the mask material on the peeling roller), the sheet-like mask material is peeled off from the sheet-like substrate.
ところで、上記真空成膜装置を用い、シート状の基材をその厚さが数十μｍの金属箔（例えば、銅製）、シート状のマスク材をその厚さが数十μｍのもの（例えば、銅製や合成樹脂製）とし、真空蒸着法によりアルミニウムやリチウムといった金属膜を所定の膜厚（数μｍ～十数μｍの範囲）で成膜すると、剥離ローラによりシート状の基材からシート状のマスク材を剥離するときに、シート状の基材が破断する場合があることが判明した。そこで、本発明者は、鋭意研究を重ね、次のことを知見するのに至った。即ち、蒸着源から蒸着材料を飛散させて、キャンローラに巻き掛けられたシート状の基材の部分にマスク材越しに成膜すると、蒸着材料は、基材の成膜面だけでなく、マスク材の表面や板厚方向に沿うその側面にも付着、堆積する。成膜後、剥離ローラによりシート状の基材からシート状のマスク材を剥離する際、シート状の基材にはせん断力が作用するが、このときのせん断力は、アルミニウムやリチウムといった金属膜を所定の膜厚で成膜するための成膜時間が長くなるのに従い次第に大きくなり、これに起因して、蒸着材料が付着したマスク材の側面直下の位置にてシート状の基材が破断することを知見するのに至った。 By the way, when using the above-mentioned vacuum film-forming device to form a metal film of aluminum or lithium with a predetermined thickness (in the range of several μm to 10 μm) by vacuum deposition using a sheet-like substrate made of metal foil (e.g., copper) and a sheet-like mask material made of several μm (e.g., copper or synthetic resin), it was found that the sheet-like substrate may break when the sheet-like mask material is peeled off from the substrate by a peeling roller. Therefore, the inventors conducted extensive research and came to the following discovery. That is, when the deposition material is scattered from the deposition source and a film is formed on the portion of the substrate wrapped around the can roller through the mask material, the deposition material adheres and accumulates not only on the deposition surface of the substrate, but also on the surface of the mask material and its side along the plate thickness direction. After the film is formed, when the sheet-like mask material is peeled off from the sheet-like substrate by a peeling roller, a shear force acts on the sheet-like substrate. This shear force gradually increases as the film-forming time for forming a metal film of aluminum or lithium with a specified thickness increases, and it was discovered that this causes the sheet-like substrate to break at a position directly below the side of the mask material to which the deposition material is attached.
本発明は、以上の知見を基になされたものであり、シート状の基材にマスク材越しに所定の膜厚で成膜する場合に、シート状の基材からこれに密着させたシート状のマスク材を剥離する時、シート状の基材の破損を防止できるようにした真空成膜装置及び真空成膜方法を提供することをその課題とするものである。 The present invention was made based on the above findings, and has as its object to provide a vacuum film-forming apparatus and method that can prevent damage to a sheet-like substrate when a film is formed at a predetermined thickness through a mask material on the sheet-like substrate and the sheet-like mask material that has been adhered to the substrate is peeled off from the substrate.
上記課題を解決するために、本発明の真空成膜装置は、シート状の基材を走行させる基材走行手段と、シート状のマスク材を走行させるマスク材走行手段と、シート状の基材にシート状のマスク材を連続して密着させる密着手段と、真空処理室内でマスク材を密着させた基材の部分が順次巻き掛けられる複数個のキャンローラと、真空処理室内でキャンローラに対峙して設けられ、各キャンローラに夫々巻き掛けられた基材の部分に対してマスク材越しに成膜する成膜ユニットとを有し、各キャンローラにて、キャンローラに巻き掛けられた基材の部分に対して成膜ユニットによる成膜が開始される位置を成膜開始位置、成膜が終了する位置を成膜終了位置として、一のキャンローラの成膜終了位置から、成膜が終了した基板の部分が次に案内される他のキャンローラの成膜開始位置までシート状の基材が案内される間に、シート状の基材からシート状のマスク材を一旦剥離する剥離手段を更に備え、一旦剥離されたシート状の基材とシート状のマスク材とが他のキャンローラの成膜開始位置に達する前に再度密着されるように構成したことを特徴とする。
In order to solve the above problems, the vacuum film-forming apparatus of the present invention has a substrate running means for running a sheet-like substrate, a mask material running means for running a sheet-like mask material, an adhesion means for continuously adhering the sheet-like mask material to the substrate, a plurality of can rollers around which the portions of the substrate to which the mask material has been adhered are sequentially wrapped in a vacuum processing chamber, and a film-forming unit that is provided opposite the can rollers in the vacuum processing chamber and forms a film over the mask material on the portions of the substrate wrapped around each can roller, and on each can roller, the position at which film formation by the film-forming unit starts on the portion of the substrate wrapped around the can roller is defined as the film-forming start position, and the position at which film formation ends is defined as the film-forming end position, and the vacuum film- forming apparatus further includes a peeling means that temporarily peels the sheet-like mask material from the substrate while the substrate is being guided from the film-forming end position of one can roller to the film-forming start position of another can roller to which the portion of the substrate on which film formation has been completed is guided next , and the sheet-like substrate and the sheet-like mask material that have been once peeled off are again adhered to each other before they reach the film-forming start position of the other can roller .
本発明においては、真空処理室内に、夫々の回転軸をＸＹ平面上に平行に位置させて複数個のキャンローラが並設されているような場合、ＸＹ平面に直交する方向をＺ軸方向とし、剥離手段が、互いに隣接するキャンローラの間でＺ軸方向上下に間隔を置いて設けられる一対のガイドローラを有し、上方に位置するガイドローラにシート状基材が、下方に位置するガイドローラにシート状のマスク材が夫々巻き掛けられる構成を採用することができる。 In the present invention, when multiple can rollers are arranged in a vacuum processing chamber with their respective rotation axes positioned parallel to the XY plane, the direction perpendicular to the XY plane is the Z-axis direction, and the peeling means has a pair of guide rollers spaced apart above and below in the Z-axis direction between adjacent can rollers, and a configuration can be adopted in which the sheet-like substrate is wrapped around the upper guide roller and the sheet-like mask material is wrapped around the lower guide roller.
また、上記課題を解決するために、真空処理室内でシート状の基材とシート状のマスク材とを走行させ、シート状の基材にシート状のマスク材を密着させた後、キャンローラに巻き掛けて周回させ、このキャンローラに対峙して設けられた成膜ユニットによりキャンローラに巻き掛けられたシート状の基材の部分に対してマスク材越しに本発明の成膜する真空成膜方法は、シート状の基材に成膜しようとする薄膜の膜厚を目標膜厚とし、同一のキャンローラを複数回または異なるキャンローラを順次周回したときに目標膜厚に達するように成膜する工程と、キャンローラにて、キャンローラに巻き掛けられた基材の部分に対して成膜ユニットによる成膜が開始される位置を成膜開始位置、成膜が終了する位置を成膜終了位置として、一のキャンローラの成膜終了位置から、成膜が終了した基板の部分が次に案内されるキャンローラの成膜開始位置までシート状の基材が案内される間に、シート状の基材からシート状のマスク材を一旦剥離し、一旦剥離されたシート状の基材とシート状のマスク材とが次に案内されるキャンローラの成膜開始位置に達する前に再度密着させる工程を含むことを特徴とする。 In addition, in order to solve the above problems, a vacuum film-forming method of the present invention includes a step of running a sheet-like substrate and a sheet-like mask material in a vacuum processing chamber, adhering the sheet-like mask material to the substrate, wrapping the sheet-like mask material around a can roller and rotating the can roller, and forming a film on the portion of the substrate wrapped around the can roller through the mask material by a film-forming unit provided opposite the can roller, the step including the steps of: setting the thickness of a thin film to be formed on the substrate as a target film thickness, and forming a film so that the target film thickness is reached when the same can roller is rotated multiple times or when different can rollers are rotated sequentially ; and setting the position where film formation by the film-forming unit on the portion of the substrate wrapped around the can roller as a film-forming start position and the position where film formation ends on the can roller as a film-forming end position , peeling the sheet-like mask material from the substrate while the substrate is being guided from the film-forming end position of one can roller to the film-forming start position of the next can roller where the portion of the substrate where film formation has been completed is guided , and then re-adhering the sheet-like substrate and the sheet-like mask material that have been peeled off to each other before they reach the film-forming start position of the next can roller .
以上によれば、シート状の基材に成膜しようとする薄膜の膜厚を目標膜厚とし、例えば、真空処理室内に複数個のキャンローラを設けると共に、各キャンローラに対峙させて成膜ユニットを夫々設け、全てのキャンローラを経たときに目標膜厚に達するように各成膜ユニットによりマスク材越しに所定の薄膜を成膜する。そして、一の成膜ユニットによるシート状の基材に対する成膜終了位置から次の成膜ユニットによるシート状の基材の部分に対する成膜開始位置までシート状の基材が案内される間（例えば、一のキャンローラから他のキャンローラにシート状の基材が案内される間）に、シート状の基材からシート状のマスク材を一旦剥離し、言い換えると、剥離手段によりシート状の基材からシート状のマスク材を剥離するときにシート状の基材に作用するせん断力が大きくなる前に一旦剥離する。これにより、シート状の基材に例えばアルミニウムやリチウムといった金属膜を所定の膜厚（目標膜厚）で成膜する場合でも、シート状のマスク材の剥離に伴うシート状の基材の破損を可及的に防止することができる。 According to the above, the thickness of the thin film to be formed on the sheet-like substrate is set as the target thickness, and for example, a plurality of can rollers are provided in the vacuum processing chamber, and a film forming unit is provided facing each can roller, and a predetermined thin film is formed through the mask material by each film forming unit so that the target thickness is reached when passing through all the can rollers. Then, while the sheet-like substrate is guided from the end position of film formation on the sheet-like substrate by one film forming unit to the start position of film formation on a portion of the sheet-like substrate by the next film forming unit (for example, while the sheet-like substrate is guided from one can roller to another can roller), the sheet-like mask material is once peeled off from the sheet-like substrate, in other words, it is once peeled off before the shear force acting on the sheet-like substrate becomes large when the sheet-like mask material is peeled off from the sheet-like substrate by the peeling means. This makes it possible to prevent damage to the sheet-like substrate due to peeling of the sheet-like mask material as much as possible, even when a metal film such as aluminum or lithium is formed on the sheet-like substrate with a predetermined thickness (target thickness).
なお、本発明は、単一のキャンローラの周囲に複数個の成膜ユニットが周方向に所定間隔で配置されている真空成膜装置にも適用できる。このような場合には、一の成膜ユニットによるシート状の基材に対する成膜終了位置から次の成膜ユニットによるシート状の基材に対する成膜開始位置までの間でシート状の基材からシート状のマスク材を一旦剥離できれば、その構成は問わない。また、本発明は、単一のキャンローラに対峙させて単一の成膜ユニットが配置され、所謂逆転成膜によりシート状の基材の一方の面に所定の薄膜を成膜する真空成膜装置にも適用できる。即ち、繰出ローラからシート状の基材を繰り出し、単一の成膜ユニットによりキャンローラに巻き掛けられたシート状の基材の部分に対して成膜し、巻取ローラで成膜済みのシート状の基材を一旦巻き取り、その後に、巻取ローラからシート状の基材を再度繰り出し、単一の成膜ユニットによりキャンローラに巻き掛けられたシート状の基材の部分に対して更に成膜し、繰出ローラで成膜済みのシート状の基材を巻き取るようにして成膜するものにも適用できる。この場合、単一の成膜ユニットが、上記にいう「一の成膜ユニット」と「次の成膜ユニット」を兼用し、例えば、一旦巻き取ったシート状の基材を巻取ローラから繰り出した後、キャンローラに巻き掛けられるまでの間にシート状の基材からシート状のマスク材を一旦剥離すればよい。 The present invention can also be applied to a vacuum film-forming apparatus in which a plurality of film-forming units are arranged at a predetermined interval around a single can roller. In such a case, as long as the sheet-shaped mask material can be peeled off from the sheet-shaped substrate between the end position of film-forming on the substrate by one film-forming unit and the start position of film-forming on the substrate by the next film-forming unit, the configuration does not matter. The present invention can also be applied to a vacuum film-forming apparatus in which a single film-forming unit is arranged facing a single can roller and a predetermined thin film is formed on one side of the substrate by so-called reverse film-forming. That is, the sheet-shaped substrate is fed from a feed roller, a film is formed on a portion of the substrate wrapped around the can roller by a single film-forming unit, the film-formed substrate is temporarily wound up by a winding roller, and then the substrate is fed again from the winding roller, a further film is formed on a portion of the substrate wrapped around the can roller by a single film-forming unit, and the film-formed substrate is wound up by a feed roller. In this case, a single film-forming unit serves as both the "first film-forming unit" and the "next film-forming unit" mentioned above, and for example, after the sheet-like substrate that has been once wound is unwound from the winding roller, the sheet-like mask material can be peeled off from the sheet-like substrate before it is wound around the can roller.
以下、図面を参照して、シート状の基材Ｓｗを厚さが１０μｍで銅製のもの、シート状のマスク材Ｓｍを厚さが１０μｍで合成樹脂（例えば、ＰＥＴ）製のもの、蒸着材料をアルミニウムやリチウムといった金属とし、シート状の基材Ｓｗの幅方向両側にシート状のマスク材Ｓｍを密着させて真空蒸着法によりシート状の基材Ｓｗの一方の面に金属膜を成膜する場合を例に本発明の真空成膜装置及び真空成膜方法の実施形態を説明する。以下において、キャンローラの軸線方向が水平方向に一致する姿勢でキャンローラが成膜チャンバ（真空処理室）Ｖｃ１内に収容されているものとし、キャンローラの軸線が位置する平面をＸＹ平面、ＸＹ平面に直交する鉛直方向をＺ軸方向とし、上、下といった方向は、真空蒸着装置の設置姿勢で示す図１を基準とする。 Below, with reference to the drawings, an embodiment of the vacuum film-forming apparatus and vacuum film-forming method of the present invention will be described using an example in which the sheet-shaped substrate Sw is 10 μm thick and made of copper, the sheet-shaped mask material Sm is 10 μm thick and made of synthetic resin (e.g., PET), the deposition material is a metal such as aluminum or lithium, the sheet-shaped mask material Sm is attached to both sides of the width direction of the sheet-shaped substrate Sw, and a metal film is formed on one side of the sheet-shaped substrate Sw by a vacuum deposition method. In the following, it is assumed that the can roller is accommodated in the deposition chamber (vacuum processing chamber) Vc1 in a position where the axis direction of the can roller coincides with the horizontal direction, the plane on which the axis of the can roller is located is the XY plane, the vertical direction perpendicular to the XY plane is the Z-axis direction, and the directions such as up and down are based on FIG. 1, which shows the installation position of the vacuum deposition apparatus.
図１を参照して、真空成膜（蒸着）装置ＤＭ１は、中央の成膜チャンバＶｃ１と、成膜チャンバＶｃ１のＹ軸方向（図１中、左右方向）両側に夫々連設される第１及び第２の各搬送チャンバＶｃ２，Ｖｃ３とを備える。特に図示して説明しないが、成膜チャンバＶｃ１と各搬送チャンバＶｃ２，Ｖｃ３とには、ターボ分子ポンプ、ロータリーポンプ等で構成される真空ポンプユニットからの排気管が夫々接続され、真空雰囲気を形成できるようになっている。成膜チャンバＶｃ１と、各搬送チャンバＶｃ２，Ｖｃ３との互いに向かい合う側壁には、シート状のマスク材Ｓｍが密着されたシート状の基材Ｓｗの通過を許容する透孔ｈ１～ｈ４が夫々開設されている。また、成膜チャンバＶｃ１と、各搬送チャンバＶｃ２，Ｖｃ３との両側壁間の隙間には、この隙間を通過するシート状のマスク材Ｓｍが密着されたシート状の基材Ｓｗの部分を覆うようにしてロードロックバルブＬｖが設けられている。これにより、真空雰囲気中にて一貫してシート状の基材Ｓｗ及びシート状のマスク材Ｓｍが搬送できると共に成膜チャンバＶｃ１と各搬送チャンバＶｃ２，Ｖｃ３とを互いに隔絶できる。なお、この種の真空成膜（蒸着）装置ＤＭ１に利用されるロードロックバルブＬｖとしては公知のものが利用できるため、ここでは詳細な説明を省略する。 Referring to FIG. 1, the vacuum film-forming (evaporation) apparatus DM 1 includes a central film-forming chamber Vc1, and first and second transfer chambers Vc2 and Vc3, which are connected to both sides of the film-forming chamber Vc1 in the Y-axis direction (left and right direction in FIG. 1). Although not specifically shown and described, exhaust pipes from a vacuum pump unit consisting of a turbo molecular pump, a rotary pump, or the like are connected to the film-forming chamber Vc1 and each transfer chamber Vc2 and Vc3, respectively, so that a vacuum atmosphere can be formed. Through holes h1 to h4 are opened on the side walls of the film-forming chamber Vc1 and each transfer chamber Vc2 and Vc3 facing each other, respectively, to allow the passage of a sheet-like substrate Sw to which a sheet-like mask material Sm is adhered. In addition, a load lock valve Lv is provided in the gap between the both side walls of the film-forming chamber Vc1 and each transfer chamber Vc2 and Vc3 so as to cover the portion of the sheet-like substrate Sw to which the sheet-like mask material Sm is adhered, which passes through the gap. This allows the sheet-shaped substrate Sw and the sheet-shaped mask material Sm to be transported consistently in a vacuum atmosphere, and the deposition chamber Vc1 and the transport chambers Vc2, Vc3 to be isolated from each other. Note that a known load lock valve Lv can be used in this type of vacuum deposition (evaporation) apparatus DM1 , so a detailed description thereof will be omitted here.
Ｙ軸方向一方（図１中、左側）に位置する第１の搬送チャンバＶｃ２には、成膜前のシート状の基材Ｓｗとシート状のマスク材Ｓｍとが夫々巻回される第１及び第２の各繰出ローラＷｒ１，Ｗｒ２が設けられ、第１の搬送チャンバＶｃ２外に設けられるモータＭ１１，Ｍ１２により夫々回転駆動されるようになっている。なお、シート状の基材Ｓｗの幅方向両側に、これより幅狭のシート状のマスク材Ｓｍを夫々密着させるために、第２の繰出ローラＷｒ２は、本来、第１の搬送チャンバＶｃ２内に別々に設けられるが、これらは同一の構成を持つことから、以下においては、本実施形態の説明を簡素化する目的でシート状の基材Ｓｗの幅方向一側にシート状のマスク材Ｓｍを密着させるものを例に説明する。第１の搬送チャンバＶｃ２内にはまた、シート状の基材Ｓｗとシート状のマスク材ＳｍとをＺ軸方向上下に重ねて密着させる密着手段としての上下一対のプラテンローラＰｒ１，Ｐｒ２と、プラテンローラＰｒ１，Ｐｒ２に第１及び第２の各繰出ローラＷｒ１，Ｗｒ２から繰り出されたシート状の基材Ｓｗとシート状のマスク材Ｓｍとを案内するガイドローラＧｒ１，Ｇｒ２とが設けられている。 The first transport chamber Vc2 located on one side of the Y-axis (left side in FIG. 1) is provided with first and second pay-out rollers Wr1 and Wr2 on which the sheet-shaped substrate Sw before film formation and the sheet-shaped mask material Sm are wound, respectively, and are rotated and driven by motors M11 and M12 provided outside the first transport chamber Vc2. In order to bring the sheet-shaped substrate Sw into close contact with the sheet-shaped mask material Sm on both sides of the width of the substrate Sw, the second pay-out roller Wr2 is originally provided separately in the first transport chamber Vc2, but since these have the same configuration, in the following, in order to simplify the explanation of this embodiment, an example in which the sheet-shaped mask material Sm is brought into close contact with one side of the width of the substrate Sw will be described. Also provided within the first transport chamber Vc2 are a pair of upper and lower platen rollers Pr1, Pr2 that act as a contacting means for stacking the sheet-shaped substrate Sw and the sheet-shaped mask material Sm vertically in the Z-axis direction and contacting them closely, and guide rollers Gr1, Gr2 that guide the sheet-shaped substrate Sw and the sheet-shaped mask material Sm that are fed from the first and second feed rollers Wr1, Wr2 to the platen rollers Pr1, Pr2.
Ｙ軸方向他方（図１中、右側）に位置する第２の搬送チャンバＶｃ３には、成膜済みのシート状の基材Ｓｗとシート状の基材Ｓｗから剥離されたシート状のマスク材Ｓｍを巻き取る第１及び第２の巻取ローラＵｒ１，Ｕｒ２が設けられ、第２の搬送チャンバＶｃ３外に設けられるモータＭ２１，Ｍ２２により回転駆動されるようになっている。第２の搬送チャンバＶｃ３内にはまた、Ｚ軸方向で近接配置した上下一対の分離用のガイドローラＳｅ１，Ｓｅ２が設けられ、シート状の基材Ｓｗとシート状のマスク材Ｓｍとが互いに逆方向に巻き掛けられて、シート状の基材Ｓｗからシート状のマスク材Ｓｍを分離するようになっている。そして、分離用のガイドローラＳｅ１，Ｓｅ２で分離されたシート状の基材Ｓｗとシート状のマスク材ＳｍとがガイドローラＧｒ３，Ｇｒ４を介して第１及び第２の巻取ローラＵｒ１，Ｕｒ２に夫々案内されて巻き取られるようになっている。 The second transport chamber Vc3, located on the other side in the Y-axis direction (the right side in FIG. 1), is provided with first and second winding rollers Ur1 and Ur2 for winding up the sheet-shaped substrate Sw on which the film has been formed and the sheet-shaped mask material Sm peeled off from the sheet-shaped substrate Sw, and is rotated and driven by motors M21 and M22 provided outside the second transport chamber Vc3. A pair of upper and lower separation guide rollers Se1 and Se2 are also provided in the second transport chamber Vc3, arranged close to each other in the Z-axis direction, and the sheet-shaped substrate Sw and the sheet-shaped mask material Sm are wound around them in opposite directions to separate the sheet-shaped substrate Sw from the sheet-shaped substrate Sw. The sheet-shaped substrate Sw and the sheet-shaped mask material Sm separated by the separation guide rollers Se1 and Se2 are guided to the first and second winding rollers Ur1 and Ur2 via guide rollers Gr3 and Gr4, respectively, and are wound up.
成膜チャンバＶｃ１には、夫々の回転軸ＡｒをＸＹ平面上に平行に位置させて複数個（本実施形態では、４個）のキャンローラＣｒ１～Ｃｒ４がＹ軸方向に等間隔で並設され、各キャンローラＣｒ１～Ｃｒ４が成膜チャンバＶｃ１外に設けられるモータＭ３により夫々回転駆動されるようになっている。本実施形態では、回転駆動される第１の繰出ローラＷｒ１、各キャンローラＣｒ１～Ｃｒ４及び第１の巻取ローラＵｒ１が基材走行手段を、第２の繰出ローラＷｒ２、各キャンローラＣｒ１～Ｃｒ４及び第２の巻取ローラＵｒ２がマスク材走行手段を構成する。成膜チャンバＶｃ１にはまた、各キャンローラＣｒ１～Ｃｒ４のＺ軸方向下方に夫々対峙させて、真空蒸着法によりシート状の基材Ｓｗの一方の面にマスク材Ｓｍ越しに成膜する成膜ユニットＦｕ１～Ｆｕ４が設けられている。成膜ユニットＦｕ１～Ｆｕ４としては、特に図示して説明しないが、例えば蒸着材料を収容する直方体状の収容箱を備え、収容箱のシート状の基材Ｓｗの部分との対向面（即ち、鉛直方向の上面）にスリット状の放出開口が設けられているもの（所謂ラインソース）等、公知のものが利用でき、また、各キャンローラＣｒ１～Ｃｒ４としては、これに巻き掛けられて周回する間にシート状の基材Ｓｗを冷却できるものであり、これ自体も公知のものであるため、これ以上の説明は省略する。 In the deposition chamber Vc1, a plurality of (four in this embodiment) can rollers Cr1 to Cr4 are arranged at equal intervals in the Y-axis direction with their respective rotation axes Ar positioned parallel to the XY plane, and each can roller Cr1 to Cr4 is rotated and driven by a motor M3 provided outside the deposition chamber Vc1. In this embodiment, the first feed roller Wr1, the can rollers Cr1 to Cr4, and the first winding roller Ur1, which are rotated, constitute the substrate running means, and the second feed roller Wr2, the can rollers Cr1 to Cr4, and the second winding roller Ur2 constitute the mask material running means. The deposition chamber Vc1 also has deposition units Fu1 to Fu4 that face each of the can rollers Cr1 to Cr4 downward in the Z-axis direction and form a film on one side of the sheet-like substrate Sw through the mask material Sm by a vacuum deposition method. Although not specifically illustrated or described, the deposition units Fu1 to Fu4 can be well-known, such as a rectangular parallelepiped storage box that contains the deposition material and has a slit-shaped discharge opening on the surface of the storage box facing the sheet-like substrate Sw (i.e., the vertical upper surface) (a so-called line source). Also, each of the can rollers Cr1 to Cr4 can cool the sheet-like substrate Sw while it is wrapped around it and rotates, and as this is itself well-known, further description will be omitted.
成膜チャンバＶｃ１には、互いに隣接する各キャンローラＣｒ１～Ｃｒ４の間でＺ軸方向上下に間隔を置いて一対の剥離用のガイドローラＰｇ１，Ｐｇ２が設けられ、Ｚ軸方向上方に位置するガイドローラＰｇ１にシート状の基材Ｓｗが、下方に位置するガイドローラＰｇ２にシート状のマスク材Ｓｍが夫々巻き掛けられるようにしている。これにより、例えば、シート状のマスク材Ｓｍが密着したシート状の基材Ｓｗが、成膜チャンバＶｃ１に設けたガイドローラＧｒ５，Ｇｒ６を介して、最上流側のキャンローラＣｒ１に案内されてこれを周回すると、剥離用の各ガイドローラＰｇ１，Ｐｇ２によりシート状の基材Ｓｗとシート状のマスク材Ｓｍとが互いに異なる方向に引っ張られることで（即ち、キャンローラＣｒ１～Ｃｒ４におけるシート状の基材Ｓｗとシート状のマスク材Ｓｍとの抱角を変えることで）、両者が一旦剥離される。そして、ガイドローラＰｇ１を周回したシート状の基材Ｓｗと、ガイドローラＰｇ２を周回したシート状のマスク材Ｓｍとがこれに隣接するキャンローラＣｒ２に夫々案内されて、互いに再度重ね合わされて密着し、この状態でキャンローラＣｒ２を周回するようになる。本実施形態では、一対の剥離用のガイドローラＰｇ１，Ｐｇ２が剥離手段を構成する。最後に、最下流側のキャンローラＣｒ４を経た、シート状のマスク材Ｓｍが密着したシート状の基材Ｓｗは、成膜チャンバＶｃ１に設けたガイドローラＧｒ７を介して第２の搬送チャンバＶｃ３へと案内される。以下に、シート状の基材Ｓｗに対するマスク材Ｓｍ越しの成膜方法を説明する。 In the deposition chamber Vc1, a pair of guide rollers Pg1 and Pg2 for peeling are provided at an interval in the vertical direction of the Z axis between the adjacent can rollers Cr1 to Cr4, and the sheet-shaped substrate Sw is wound around the guide roller Pg1 located at the top of the Z axis, and the sheet-shaped mask material Sm is wound around the guide roller Pg2 located at the bottom. As a result, for example, when the sheet-shaped substrate Sw to which the sheet-shaped mask material Sm is adhered is guided to the most upstream can roller Cr1 via the guide rollers Gr5 and Gr6 provided in the deposition chamber Vc1 and rotates around it, the sheet-shaped substrate Sw and the sheet-shaped mask material Sm are pulled in different directions by the guide rollers Pg1 and Pg2 for peeling (i.e., by changing the embrace angle between the sheet-shaped substrate Sw and the sheet-shaped mask material Sm in the can rollers Cr1 to Cr4), and the two are temporarily peeled off. Then, the sheet-like substrate Sw that has gone around the guide roller Pg1 and the sheet-like mask material Sm that has gone around the guide roller Pg2 are guided by the adjacent can roller Cr2, where they are again superimposed and adhered to each other, and go around the can roller Cr2 in this state. In this embodiment, a pair of guide rollers Pg1 and Pg2 for peeling constitute a peeling means. Finally, the sheet-like substrate Sw that has passed through the most downstream can roller Cr4 and adhered to the sheet-like mask material Sm is guided to the second transport chamber Vc3 via the guide roller Gr7 provided in the film-forming chamber Vc1. The method of forming a film on the sheet-like substrate Sw through the mask material Sm is described below.
上記真空蒸着装置ＤＭ１にて、シート状の基材Ｓｗとシート状のマスク材Ｓｍとを走行させながら、シート状の基材Ｓｗの一方の面にマスク材Ｓｍ越しに成膜する場合、成膜ユニットＦｕ１～Ｆｕ４に顆粒状やインゴット状の蒸着材料を充填する。また、第１の搬送チャンバＶｃ２にて、第１の繰出ローラＷｒ１にシート状の基材Ｓｗが、第２の繰出ローラＷｒ２にシート状のマスク材Ｓｍが夫々巻回され、その両先端部が各ガイドローラＧｒ１，Ｇｒ２を介してプラテンローラＰｒ１，Ｐｒ２に案内される。そして、シート状の基材Ｓｗとシート状のマスク材Ｓｍとの先端部をガイドローラＧｒ５，Ｇｒ６を経て、各キャンローラＣｒ１～Ｃｒ４及び剥離用のガイドローラＰｇ１，Ｐｇ２に順次巻き掛けた後、ガイドローラＧｒ７を介して第２の搬送チャンバＶｃ３に案内する。そして、第２の搬送チャンバＶｃ３にて、シート状の基材Ｓｗとシート状のマスク材Ｓｍとの先端部が分離用のガイドローラＳｅ１，Ｓｅ２で夫々逆方向に巻き掛けられ、ガイドローラＧｒ３，Ｇｒ４を介して第１及び第２の巻取ローラＵｒ１，Ｕｒ２に夫々固定される。その後、成膜チャンバＶｃ１、第１及び第２の各搬送チャンバＶｃ２，Ｖｃ３が夫々所定圧力まで真空排気される。 In the vacuum deposition device DM 1 , when a film is formed on one side of the sheet-shaped substrate Sw through the mask material Sm while the sheet-shaped substrate Sw and the sheet-shaped mask material Sm are running, the deposition units Fu1 to Fu4 are filled with granular or ingot-shaped deposition material. In the first transport chamber Vc2, the sheet-shaped substrate Sw is wound around the first feed roller Wr1, and the sheet-shaped mask material Sm is wound around the second feed roller Wr2, and both leading ends are guided to the platen rollers Pr1 and Pr2 via the guide rollers Gr1 and Gr2. Then, the leading ends of the sheet-shaped substrate Sw and the sheet-shaped mask material Sm are wound around the can rollers Cr1 to Cr4 and the peeling guide rollers Pg1 and Pg2 via the guide rollers Gr5 and Gr6, and then guided to the second transport chamber Vc3 via the guide roller Gr7. Then, in the second transport chamber Vc3, the leading ends of the sheet-like substrate Sw and the sheet-like mask material Sm are wound around separation guide rollers Se1 and Se2 in opposite directions, and are fixed to the first and second take-up rollers Ur1 and Ur2 via guide rollers Gr3 and Gr4, respectively. After that, the deposition chamber Vc1 and the first and second transport chambers Vc2 and Vc3 are each evacuated to a predetermined pressure.
次に、成膜ユニットＦｕ１～Ｆｕ４に夫々設けたヒータ（図示せず）を作動して蒸着（金属）材料が加熱され、これにより、各成膜ユニットＦｕ１～Ｆｕ４にて蒸着材料が気化し始める。次に、モータＭ１１，Ｍ１２，Ｍ２１，Ｍ２２，Ｍ３を夫々回転駆動して、シート状の基材Ｓｗを一定の速度で走行させる。これにより、各キャンローラＣｒ１～Ｃｒ４を周回する間にシート状の基材Ｓｗの一方の面にマスク材Ｓｍ越しに成膜される。このとき、シート状の基材Ｓｗに成膜しようとする金属膜の膜厚を目標膜厚とし、４個のキャンローラＣｒ１～Ｃｒ４を経たときに目標膜厚に達するように各成膜ユニットＦｕ１～Ｆｕ４での蒸着レートや各キャンローラＣｒ１～Ｃｒ４の回転数が制御される（言い換えると、シート状の基材Ｓｗへの成膜を４回に分けて行う）。このとき、各キャンローラＣｒ１～Ｃｒ４にて、これに巻き掛けられて周回するシート状の基材Ｓｗに成膜ユニットＦｕ１～Ｆｕ４から飛散する蒸着材料が到達し始める位置が成膜開始位置Ｓｐ、蒸着材料がもはや到達しなくなる位置が成膜終了位置Ｅｐとなる。そして、剥離手段Ｐｇ１，Ｐｇ２を設けたことで、例えば最上流側のキャンローラＣｒ１からこれに隣接するキャンローラＣｒ２にシート状の基材Ｓｗが案内される間（言い換えると、一の成膜ユニットＦｕ１～Ｆｕ３によるシート状の基材Ｓｗに対する成膜終了位置Ｅｐから次の成膜ユニットＦｕ２～Ｆｕ４によるシート状の基材Ｓｗに対する成膜開始位置Ｓｐまでの間）にシート状の基材Ｓｗからシート状のマスク材Ｓｍが一旦剥離され、これが、下流側の各キャンローラＣｒ２～Ｃｒ４を経る毎に繰り返される。成膜されたシート状の基材Ｓｗは、第２の搬送チャンバＶｃ３内にて分離用のガイドローラＳｅ１，Ｓｅ２でシート状のマスク材Ｓｍが分離された後、第１の巻取ローラＵｒ１に巻き取られ、分離されたシート状のマスク材Ｓｍは、第２の巻取ローラＵｒ２に巻き取られる。そして、第２の搬送チャンバＶｃ３を大気開放した後、成膜処理済みのシート状の基材Ｓｗが回収される。 Next, the heaters (not shown) provided in each of the deposition units Fu1 to Fu4 are operated to heat the deposition (metal) material, which causes the deposition material to begin to vaporize in each of the deposition units Fu1 to Fu4. Next, the motors M11, M12, M21, M22, and M3 are rotated to run the sheet-shaped substrate Sw at a constant speed. As a result, a film is formed on one side of the sheet-shaped substrate Sw through the mask material Sm while rotating around each of the can rollers Cr1 to Cr4. At this time, the thickness of the metal film to be formed on the sheet-shaped substrate Sw is set as the target thickness, and the deposition rate in each deposition unit Fu1 to Fu4 and the rotation speed of each can roller Cr1 to Cr4 are controlled so that the target thickness is reached after passing through the four can rollers Cr1 to Cr4 (in other words, the deposition on the sheet-shaped substrate Sw is performed in four separate steps). At this time, the position where the deposition material scattered from the film-forming units Fu1 to Fu4 starts to reach the sheet-like substrate Sw that is wound around each of the can rollers Cr1 to Cr4 is the film-forming start position Sp, and the position where the deposition material no longer reaches is the film-forming end position Ep. By providing the peeling means Pg1 and Pg2, for example, while the sheet-like substrate Sw is guided from the most upstream can roller Cr1 to the adjacent can roller Cr2 (in other words, between the film-forming end position Ep on the sheet-like substrate Sw by one of the film-forming units Fu1 to Fu3 and the film-forming start position Sp on the sheet-like substrate Sw by the next film-forming unit Fu2 to Fu4), the sheet-like mask material Sm is peeled off from the sheet-like substrate Sw, and this is repeated every time the substrate Sw passes through each of the downstream can rollers Cr2 to Cr4. After the sheet-like substrate Sw on which the film has been formed is separated into the sheet-like mask material Sm by the separating guide rollers Se1 and Se2 in the second transport chamber Vc3, it is wound up on the first winding roller Ur1, and the separated sheet-like mask material Sm is wound up on the second winding roller Ur2. Then, after the second transport chamber Vc3 is opened to the atmosphere, the sheet-like substrate Sw on which the film has been formed is collected.
以上の実施形態によれば、シート状の基材Ｓｗからシート状のマスク材Ｓｍを一旦剥離する。言い換えると、剥離手段Ｐｇ１，Ｐｇ２によりシート状の基材Ｓｗからシート状のマスク材Ｓｍを剥離するときにシート状に基材Ｓｗに作用するせん断力が大きくなる前に一旦剥離される。これにより、シート状の基材Ｓｗに例えばアルミニウムやリチウムといった金属膜を所定の膜厚（目標膜厚）で成膜する場合でも、シート状のマスク材Ｓｍの剥離に伴うシート状の基材Ｓｗの破損を可及的に防止することができる。 According to the above embodiment, the sheet-like mask material Sm is once peeled off from the sheet-like substrate Sw. In other words, when the sheet-like mask material Sm is peeled off from the sheet-like substrate Sw by the peeling means Pg1, Pg2, it is once peeled off before the shear force acting on the substrate Sw in a sheet-like form becomes large. This makes it possible to prevent damage to the sheet-like substrate Sw due to the peeling off of the sheet-like mask material Sm as much as possible, even when a metal film such as aluminum or lithium is formed on the sheet-like substrate Sw with a predetermined film thickness (target film thickness).
以上、本発明の実施形態について説明したが、本発明は上記実施形態のものに限定されるものではなく、本発明の趣旨を逸脱しない限り、種々の変形が可能である。上記実施形態では、キャンローラＣｒ１～Ｃｒ４を４個設け、各キャンローラＣｒ１～Ｃｒ４に対峙させて成膜ユニットＦｕ１～Ｆｕ４を設けたものを例に説明したが、これに限定されるものではなく、キャンローラＣｒ１～Ｃｒ４の数やその配置は上記のものに限定されるものではない。また、成膜ユニットについても、互いに隣接する２個キャンローラに対して１個の成膜ユニットで成膜するようにしてもよい。 Although the embodiment of the present invention has been described above, the present invention is not limited to the above embodiment, and various modifications are possible without departing from the spirit of the present invention. In the above embodiment, four can rollers Cr1 to Cr4 are provided, and film-forming units Fu1 to Fu4 are provided facing each of the can rollers Cr1 to Cr4, but this is not limited to the above, and the number and arrangement of the can rollers Cr1 to Cr4 are not limited to the above. In addition, the film-forming units may be configured to form a film on two adjacent can rollers.
例えば、他の実施形態に係る真空成膜（蒸着）装置ＤＭ２は、図２に示すように、中央の成膜チャンバＶｃ１内に単一のキャンローラＣｒ１０が設けられ、キャンローラＣｒ１０の周囲には、例えば２個の成膜ユニットＦｕ１０，Ｆｕ２０が周方向に所定間隔で配置されている。キャンローラＣｒ１０の周囲にはまた、周方向で各成膜ユニットＦｕ１０，Ｆｕ２０の間に位置させて、シート状のマスク材Ｓｍのみが巻き掛けられるガイドローラＰｇ１０が設けられている。これにより、例えば、一の成膜ユニットＦｕ１０によるシート状の基材Ｓｗに対する成膜終了位置Ｅｐから、次の成膜ユニットＦｕ２０によるシート状の基材Ｓｗに対する成膜開始位置Ｓｐまでの間でシート状の基材Ｓｗからシート状のマスク材Ｓｍが一旦剥離される。また、特に図示して説明しないが、単一のキャンローラに対峙させて単一の成膜ユニットが配置され、所謂逆転成膜によりシート状の基材の一方の面に所定の薄膜を成膜する真空成膜装置にも本発明は適用できる。即ち、繰出ローラからシート状の基材を繰り出し、単一の成膜ユニットによりキャンローラに巻き掛けられたシート状の基材の部分に対して成膜し、巻取ローラで成膜済みのシート状の基材を一旦巻き取り、その後に、巻取ローラからシート状の基材を再度繰り出し、単一の成膜ユニットによりキャンローラに巻き掛けられたシート状の基材の部分に対して更に成膜し、繰出ローラで成膜済みのシート状の基材を巻き取るようにして成膜するものにも適用できる。この場合、単一の成膜ユニットが、上記にいう「一の成膜ユニット」と「次の成膜ユニット」を兼用し、例えば、一旦巻き取ったシート状の基材を巻取ローラから繰り出した後、キャンローラに巻き掛けられるまでの間にシート状の基材からシート状のマスク材を一旦剥離すればよい。 For example, in a vacuum film-forming (evaporation) apparatus DM 2 according to another embodiment, as shown in FIG. 2, a single can roller Cr10 is provided in a central film-forming chamber Vc1, and for example, two film-forming units Fu10 and Fu20 are arranged around the can roller Cr10 at a predetermined interval in the circumferential direction. A guide roller Pg10 is also provided around the can roller Cr10, positioned between the film-forming units Fu10 and Fu20 in the circumferential direction, and around which only the sheet-shaped mask material Sm is wound. As a result, for example, the sheet-shaped mask material Sm is once peeled off from the sheet-shaped substrate Sw between the end position Ep of film-forming on the sheet-shaped substrate Sw by one film-forming unit Fu10 and the start position Sp of film-forming on the sheet-shaped substrate Sw by the next film-forming unit Fu20. In addition, although not particularly shown and described, the present invention can also be applied to a vacuum film-forming apparatus in which a single film-forming unit is arranged opposite a single can roller, and a predetermined thin film is formed on one side of a sheet-shaped substrate by so-called reverse film formation. That is, the sheet-like substrate is unwound from the unwinding roller, a film is formed on the portion of the sheet-like substrate wound around the can roller by a single film-forming unit, the film-formed sheet-like substrate is temporarily wound up by the winding roller, and then the sheet-like substrate is unwound again from the winding roller, a film is further formed on the portion of the sheet-like substrate wound around the can roller by a single film-forming unit, and the film-formed sheet-like substrate is temporarily wound up by the unwinding roller. In this case, the single film-forming unit serves as both the "first film-forming unit" and the "next film-forming unit" described above, and for example, after the once-wound sheet-like substrate is unwound from the winding roller, the sheet-like mask material may be temporarily peeled off from the sheet-like substrate before it is wound around the can roller.
更に、上記実施形態では、剥離手段として、剥離用のガイドローラＰｇ１，Ｐｇ２を設けるものを例に説明したが、これに限定されるものではなく、互いに密着したシート状の基材Ｓｗとマスク材Ｓｍとを一旦剥離できるものであれば、その形態を問わず、例えばピールプレートを用い、シート状のマスク材Ｓｍが密着したシート状の基材Ｓｗを折り返して両者を剥離することもできる。 In addition, in the above embodiment, the peeling means is described as being provided with guide rollers Pg1 and Pg2 for peeling, but the present invention is not limited to this, and any form can be used as long as the sheet-like substrate Sw and the mask material Sm that are in close contact with each other can be peeled off once. For example, a peel plate can be used to fold back the sheet-like substrate Sw to which the sheet-like mask material Sm is in close contact, and peel the two off.
また、上記実施形態では、シート状の基材Ｓｗの幅方向両側にシート状のマスク材Ｓｍを密着させて真空蒸着法によりシート状の基材Ｓｗの一方の面に金属膜を成膜する場合を例に説明したが、これに限定されるものではなく、シート状の基材Ｓｗの両面にシート状のマスク材Ｓｍを夫々密着させ、シート状の基材Ｓｗの両面に交互に金属膜を夫々成膜するものにも本発明は適用することができる。このような場合、図１に示す実施形態のものを参照して説明すると、更に他の実施形態に係る真空成膜装置（図示せず）では、第１の搬送チャンバＶｃ２に、成膜前のシート状の基材Ｓｗと、その一方の面に密着されるシート状のマスク材Ｓｍに加えて、その他方の面に密着される他のシート状のマスク材（図示せず）が巻回される他の繰出ローラ（図示せず）が更に設けられると共に、第２の搬送チャンバＶｃ３に、他のシート状のマスク材を巻き取る他の巻取ローラ（図示せず）が更に設けられる。また、更に他の実施形態に係る真空成膜装置（図示せず）では、図１に示す実施形態でいうところの剥離用のガイドローラＰｇ２が、Ｙ軸方向に等間隔で並設される各キャンローラ（図示せず）で構成されると共に、各キャンローラのＺ軸方向上方に夫々対峙させて、真空蒸着法によるシート状の基材Ｓｗの一方の面にマスク材Ｓｍ越しに成膜する成膜ユニット（図示せず）が設けられる。そして、上記実施形態と同様に、互いに隣接する各キャンローラの間でＺ軸方向上下に間隔を置いて剥離用の他のガイドローラ（図示せず）が更に設けられ、他のガイドローラにシート状のマスク材Ｓｍが巻き掛けられるようにしている。 In the above embodiment, the case where a sheet-like mask material Sm is attached to both sides of the sheet-like substrate Sw in the width direction and a metal film is formed on one side of the sheet-like substrate Sw by a vacuum deposition method has been described as an example, but the present invention is not limited to this, and the present invention can also be applied to a case where a sheet-like mask material Sm is attached to both sides of the sheet-like substrate Sw and a metal film is formed alternately on both sides of the sheet-like substrate Sw. In such a case, referring to the embodiment shown in FIG. 1, in a vacuum film forming apparatus (not shown) according to yet another embodiment, in addition to the sheet-like substrate Sw before film formation and the sheet-like mask material Sm attached to one side of the substrate Sw, another pay-out roller (not shown) is further provided in the first transport chamber Vc2 around which another sheet-like mask material (not shown) attached to the other side is wound, and another winding roller (not shown) is further provided in the second transport chamber Vc3 for winding up the other sheet-like mask material. In a vacuum film-forming apparatus according to yet another embodiment (not shown), the peeling guide roller Pg2 in the embodiment shown in FIG. 1 is composed of can rollers (not shown) arranged side by side at equal intervals in the Y-axis direction, and film-forming units (not shown) that form a film on one side of the sheet-like substrate Sw by vacuum deposition over the mask material Sm are provided facing each other above the can rollers in the Z-axis direction. As in the above embodiment, other peeling guide rollers (not shown) are further provided at intervals above and below in the Z-axis direction between the adjacent can rollers, and the sheet-like mask material Sm is wrapped around the other guide rollers.
以上によれば、シート状の基材Ｓｗの両面にシート状のマスク材Ｓｍが夫々密着された後、最上流側のキャンローラ（図１でいうところのキャンローラＣｒ１）に案内されてこれを周回する間に、シート状の基材Ｓｗの一方の面にマスク材越しに成膜され、次のキャンローラ（図１でいうところの剥離用のローラＰｇ１）に、他方の面にマスク材が密着した状態のシート状の基材Ｓｗが案内されてシート状の基材Ｓｗの他方の面にマスク材越しに成膜されると共に、剥離用の各ガイドローラＰｇ２によりシート状の基材Ｓｗの一方の面から一方のシート状のマスク材Ｓｍが一旦剥離される。そして、更に次のキャンローラ（図１でいうところの剥離用のローラＰｇ２）に、シート状の基材ＳｗとガイドローラＰｇ２を周回したシート状のマスク材Ｓｍとが夫々案内されて、互いに再度重ね合わされて密着し、この状態でキャンローラＣｒ２を周回し、その間に成膜される。このような構成を採用すると、シート状の基材Ｓｗの両面に比較的厚い膜厚で成膜するような場合に、膜応力を相殺できるため、シート状の基材Ｓｗの変形に纏わる問題の発生を防止できて生産物の品質向上に寄与し、有利である。 According to the above, after the sheet-like mask material Sm is adhered to both sides of the sheet-like substrate Sw, it is guided to the most upstream can roller (can roller Cr1 in FIG. 1) and rotates around it, a film is formed on one side of the sheet-like substrate Sw through the mask material, and the sheet-like substrate Sw with the mask material adhered to the other side is guided to the next can roller (peeling roller Pg1 in FIG. 1) and a film is formed on the other side of the sheet-like substrate Sw through the mask material, and one sheet-like mask material Sm is peeled off from one side of the sheet-like substrate Sw by each peeling guide roller Pg2. Then, the sheet-like substrate Sw and the sheet-like mask material Sm that has rotated around the guide roller Pg2 are guided to the next can roller (peeling roller Pg2 in FIG. 1), respectively, and are superimposed on each other again and adhered to each other, and in this state rotate around the can roller Cr2, during which a film is formed. By adopting such a configuration, when a relatively thick film is formed on both sides of the sheet-like substrate Sw, the film stress can be offset, preventing problems associated with deformation of the sheet-like substrate Sw and contributing to improved product quality, which is advantageous.
ＤＭ１，ＤＭ２…真空蒸着装置（真空成膜装置）、Ａｒ…回転軸、Ｃｒ１～Ｃｒ４…キャンローラ（基材走行手段，マスク材走行手段）、Ｆｕ１～Ｆｕ４，Ｆｕ１０～Ｆｕ３０…成膜ユニット、Ｐｇ１，Ｐｇ２，Ｐｇ１０，Ｐｇ２０…剥離用のガイドローラ（剥離手段）、Ｐｒ１，Ｐｒ２…プラテンローラ（密着手段）、Ｓｍ…シート状のマスク材、Ｓｗ…シート状の基材、Ｓｐ…成膜開始位置、Ｅｐ…成膜終了位置、Ｕｒ１…第１の巻取ローラ（基材走行手段）、Ｕｒ２…第２の巻取ローラ（マスク材走行手段）、Ｖｃ１…成膜チャンバ（真空処理室）、Ｗｒ１…第１の繰出ローラ（基材走行手段）、Ｗｒ２…第２の繰出ローラ（マスク材走行手段）。 DM1 , DM2 ...vacuum deposition apparatus (vacuum film-forming apparatus), Ar...rotation shaft, Cr1-Cr4...can rollers (substrate traveling means, mask material traveling means), Fu1-Fu4, Fu10-Fu30...film-forming units, Pg1, Pg2, Pg10, Pg20...guide rollers for peeling (peeling means), Pr1, Pr2...platen rollers (contact means), Sm...sheet-shaped mask material, Sw...sheet-shaped substrate, Sp...film-forming start position, Ep...film-forming end position, Ur1...first take-up roller (substrate traveling means), Ur2...second take-up roller (mask material traveling means), Vc1...film-forming chamber (vacuum processing chamber), Wr1...first pay-out roller (substrate traveling means), Wr2...second pay-out roller (mask material traveling means).
Claims (3)
各キャンローラにて、キャンローラに巻き掛けられた基材の部分に対して成膜ユニットによる成膜が開始される位置を成膜開始位置、成膜が終了する位置を成膜終了位置として、一のキャンローラの成膜終了位置から、成膜が終了した基板の部分が次に案内される他のキャンローラの成膜開始位置までシート状の基材が案内される間に、シート状の基材からシート状のマスク材を一旦剥離する剥離手段を更に備え、一旦剥離されたシート状の基材とシート状のマスク材とが他のキャンローラの成膜開始位置に達する前に再度密着されるように構成したことを特徴とする真空成膜装置。 A vacuum film forming apparatus having a substrate transport means for transporting a sheet-like substrate, a mask material transport means for transporting a sheet-like mask material, a contact means for continuously bringing the sheet-like mask material into close contact with the substrate, a plurality of can rollers around which portions of the substrate to which the mask material has been brought into close contact are sequentially wound in a vacuum processing chamber, and a film forming unit disposed opposite the can rollers in the vacuum processing chamber and for forming a film over the mask material on the portions of the substrate wound around each of the can rollers,
The vacuum film forming apparatus further comprises a peeling means for temporarily peeling off the sheet-like mask material from the sheet-like substrate while the sheet-like substrate is guided from the film-forming end position of one can roller to the film-forming start position of the other can roller to which the portion of the substrate on which film forming has been completed is next guided, the film-forming start position being the position at which film formation by the film-forming unit begins on the portion of the substrate wrapped around the can roller, and the film-forming end position being the position at which film formation ends, and the sheet-like substrate and the sheet-like mask material that have been once peeled off are re-adhered to each other before they reach the film-forming start position of the other can roller.
ＸＹ平面に直交する方向をＺ軸方向とし、剥離手段が、互いに隣接するキャンローラの間でＺ軸方向上下に間隔を置いて設けられる一対のガイドローラを有し、上方に位置するガイドローラにシート状基材が、下方に位置するガイドローラにシート状のマスク材が夫々巻き掛けられるように構成したことを特徴とする真空成膜装置。 2. The vacuum film forming apparatus according to claim 1, wherein a plurality of can rollers are arranged in a vacuum processing chamber with their respective rotation axes positioned parallel to an XY plane,
A vacuum film forming apparatus characterized in that the direction perpendicular to the XY plane is the Z-axis direction, the peeling means has a pair of guide rollers spaced apart above and below in the Z-axis direction between adjacent can rollers, and the sheet-like substrate is wrapped around the upper guide roller, and the sheet-like mask material is wrapped around the lower guide roller.
シート状の基材に成膜しようとする薄膜の膜厚を目標膜厚とし、同一のキャンローラを複数回または異なるキャンローラを順次周回したときに目標膜厚に達するように成膜する工程と、
キャンローラにて、キャンローラに巻き掛けられた基材の部分に対して成膜ユニットによる成膜が開始される位置を成膜開始位置、成膜が終了する位置を成膜終了位置として、一のキャンローラの成膜終了位置から、成膜が終了した基板の部分が次に案内されるキャンローラの成膜開始位置までシート状の基材が案内される間に、シート状の基材からシート状のマスク材を一旦剥離し、一旦剥離されたシート状の基材とシート状のマスク材とが次に案内されるキャンローラの成膜開始位置に達する前に再度密着させる工程を含むことを特徴とする真空成膜方法。 A vacuum film-forming method in which a sheet-like substrate and a sheet-like mask material are run in a vacuum processing chamber, the sheet-like substrate is brought into close contact with the sheet-like substrate, the sheet-like mask material is then wound around a can roller and rotated, and a film is formed over the mask material on the portion of the sheet-like substrate wound around the can roller by a film-forming unit provided opposite the can roller,
a step of forming a thin film on a sheet-like substrate so that the film reaches the target thickness when the film is rotated around the same can roller multiple times or around different can rollers sequentially;
a film-forming start position being the position where film formation by a film-forming unit on a portion of a substrate wrapped around a can roller, and a film-forming end position being the position where film formation ends; a sheet-like masking material being temporarily peeled off from the sheet-like substrate while the sheet-like substrate is being guided from the film-forming end position of one can roller to the film-forming start position of the next can roller to which the portion of the substrate on which film formation has been completed is being guided; and a vacuum film-forming method comprising the steps of: re-adhering the sheet-like substrate and the sheet-like masking material that have been temporarily peeled off to each other before they reach the film-forming start position of the next can roller to which they are guided .
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