JP7463609B1 - Plating apparatus and plating method - Google Patents

Abstract

[Problem] To provide a plating apparatus and plating method that can appropriately plate an object to be plated while suppressing splashing of plating solution. [Solution] A plating apparatus 10 that performs electrolytic plating on an object to be plated P1, a rocking unit 7 of the plating apparatus 10 has a reciprocating mechanism 71 and a rocking mechanism 72, the reciprocating mechanism 71 reciprocates the rocking mechanism 72 so that the stirring panel 5 reciprocates at a predetermined reciprocating speed in a stirring range set in a horizontal direction that indicates a direction parallel to the plating surface of the object to be plated P1 and that is larger than the object to be plated P1, and the rocking mechanism 72 reciprocates within the stirring range in synchronization with the movement of the reciprocating mechanism 71 while rocking the stirring panel 5 at a rocking speed faster than the reciprocating speed in a rocking range set in a horizontal direction that is smaller than the size of the object to be plated P1 so as to uniformly supply plating solution to the object to be plated P1 held by a holder 2 in a plating tank 1, thereby stirring the plating solution. [Selected Figure] Figure 1

Description

This disclosure relates to a plating apparatus and a plating method.

Regarding electrolytic plating of semiconductor wafers and printed circuit boards, for example, the technology described in Patent Document 1 is known. That is, Patent Document 1 describes that "a substrate is immersed in the plating solution, and a current is passed between the substrate and an anode in the plating solution to plate the substrate."

JP 2017-183332 A

In the technology described in Patent Document 1, both ends of the paddle are set to be located outside the substrate when the paddle reciprocates. This allows the flow caused by the stirring of the plating solution to propagate throughout the entire area of the object to be plated. However, as the circuit pattern (plating pattern) on the surface of the object to be plated becomes more complex and finer, it may become difficult to uniformly plate the object to be plated.

In the technology described in Patent Document 1, increasing the speed at which the paddles are moved back and forth promotes the flow of the plating solution, making it possible to achieve uniform plating, but at the same time, this makes the plating solution more likely to splash. Since plating solutions often contain sulfate ions, etc., it is desirable to suppress splashing. In other words, it is desirable to properly plate the object to be plated while suppressing splashing of the plating solution, but such a technology is not described in Patent Document 1.

Therefore, the objective of the present disclosure is to provide a plating apparatus and plating method that can appropriately plate an object to be plated while suppressing splashing of the plating solution.

In order to solve the above-mentioned problems, the present disclosure provides a plating apparatus for electrolytic plating of an object to be plated, the plating apparatus being configured to include a rocking unit, a plating tank, and an agitation panel, the rocking unit having a reciprocating mechanism and a rocking mechanism, the rocking mechanism reciprocating the rocking mechanism so that the agitation panel reciprocates at a predetermined reciprocating speed in a stirring range set in a horizontal direction that indicates a direction parallel to the plating surface of the object to be plated, the rocking mechanism reciprocating the rocking mechanism so that the agitation panel reciprocates at a predetermined reciprocating speed in a stirring range set in a horizontal direction that indicates a direction parallel to the plating surface of the object to be plated, the rocking mechanism reciprocating the stirring panel in the stirring range in synchronization with the movement of the rocking mechanism while rocking the stirring panel at a rocking speed faster than the reciprocating speed in a rocking range set in a horizontal direction that is smaller than the size of the object to be plated, so as to uniformly supply plating solution to the object to be plated held by a holder in the plating tank, and agitating the plating solution.

The present disclosure provides a plating apparatus and plating method that can appropriately plate an object to be plated while suppressing splashing of the plating solution.

FIG. 1 is a configuration diagram of a plating apparatus according to an embodiment. 5 is an explanatory diagram of the stirring range and swing range of the stirring panel of the plating apparatus according to the embodiment. FIG. FIG. 2 is a perspective view of an agitation panel of the plating apparatus according to the embodiment. 3B is an explanatory diagram including a cross section taken along line III-III in FIG. 3A according to an embodiment of the plating apparatus; FIG. 13 is an explanatory diagram of a stirring rod of a plating apparatus according to a comparative example. FIG. 2 is an explanatory diagram of a stirring rod of the plating apparatus according to the embodiment. 2 is a schematic side view of a reciprocating mechanism of the plating apparatus according to the embodiment; FIG. 4 is a bottom view of a base portion of the reciprocating mechanism of the plating apparatus according to the embodiment, as viewed from below. FIG. FIG. 2 is an explanatory diagram of a mechanism including an air cylinder of the plating apparatus according to the embodiment. FIG. 2 is an explanatory diagram showing the configuration of a swing mechanism of the plating apparatus according to the embodiment. 5 is an explanatory diagram regarding the rocking of an agitation panel of the plating apparatus according to the embodiment; FIG. 5A and 5B are explanatory views regarding the rocking of an agitation panel of the plating apparatus according to the embodiment. 5 is an explanatory diagram regarding the rocking of an agitation panel of the plating apparatus according to the embodiment; FIG. FIG. 4 is an explanatory diagram regarding the length of a slide portion of the plating apparatus according to the embodiment. 13 is an explanatory diagram for changing the oscillation speed and oscillation range of the agitation panel of the plating apparatus according to the first modified example. FIG. FIG. 13 is an explanatory diagram including a cross section of a stirring rod of a plating apparatus according to a second modified example. FIG. 13 is an explanatory view including a cross section of a stirring rod of a plating apparatus according to a third modified example.

<Embodiment>
<Configuration of plating device>
FIG. 1 is a configuration diagram of a plating apparatus 10 according to an embodiment.
In addition, Fig. 1 shows the plating tank 1 and the container U1 with the side walls at the front side of the paper surface of Fig. 1 removed. In Fig. 1, the plating solution stored in the plating tank 1 is indicated by dots. As shown in Fig. 1, the y-axis is taken as a direction perpendicular to the plate surfaces of the holder 2, the anode electrode 3, the shielding plate 4, and the stirring panel 5 (depth direction). The x-axis is taken as a direction perpendicular to the y-axis on a horizontal plane (width direction). The z-axis is taken as a direction perpendicular to both the x-axis and the y-axis (height direction).

The plating apparatus 10 shown in FIG. 1 is an apparatus that performs electrolytic plating on an object to be plated P1. For example, a semiconductor wafer or a printed circuit board is used as the object to be plated P1. In the example of FIG. 1, the object to be plated P1 is shown to be rectangular plate-shaped, but it may be other shapes such as a disk-shaped object. As shown in FIG. 1, the plating apparatus 10 includes a plating tank 1, a holder 2, an anode electrode 3 (electrode plate), a shielding plate 4, an agitation panel 5, a plating solution supply device 6, a rocking unit 7, an agitation panel mounting part 8, and a control device 9.

The plating tank 1 is a tank (container) that stores plating solution. As shown in FIG. 1, the plating tank 1 has a box-shaped main body 1a that is open at the top, and a plate-shaped overflow wall 1b that separates the internal space of the main body 1a. The plate surface of the overflow wall 1b is perpendicular to the y-axis. The height position of the upper end of the overflow wall 1b is lower than the height position of the upper end of the main body 1a.

As shown in FIG. 1, plating solution is stored in the area on the positive side of the overflow wall 1b in the y-axis direction. The height of the plating solution is set near the upper end of the overflow wall 1b. The plating solution that overflows from the overflow wall 1b into the area on the negative side of the y-axis direction as the stirring panel 5 moves is returned to the area on the positive side of the overflow wall 1b in the y-axis direction by the plating solution supply device 6.

The plating solution stored in the plating tank 1 is an electrolyte used for electrolytic plating. For example, an electrolyte containing copper ions (Cu ²⁺ ) and sulfate ions (SO ₄ ^2- ) is used as such a plating solution. Note that the metal ions contained in the plating solution are not limited to copper ions (Cu ²⁺ ), and zinc ions (Zn ²⁺ ), chromium ions (Cr ³⁺ ), nickel ions (Ni ²⁺ ), gold ions (Au ²⁺ ), and silver ions (Ag ⁺ ) can also be used.

As shown in FIG. 1, the holder 2, stirring panel 5, shielding plate 4, and anode electrode 3 are arranged inside the plating tank 1 (the area on the positive side of the y-axis direction from the overflow wall 1b). More specifically, the holder 2, stirring panel 5, shielding plate 4, and anode electrode 3 are arranged in this order toward the negative side of the y-axis direction. In addition, the plate surfaces of the holder 2, stirring panel 5, shielding plate 4, and anode electrode 3 are approximately parallel.

The spacing between the multiple components (distance in the y direction) may be, for example, 25 mm between the anode electrode 3 and the shielding plate 4, 15 mm between the shielding plate 4 and the stirring panel 5, and 5 mm between the stirring panel 5 and the holder 2. Note that the above numerical values are merely examples and are not limited to these. The spacing between each component can be changed as appropriate based on the electrolytic plating conditions.

The holder 2 is a rectangular plate-shaped member for holding the object to be plated P1 while it is immersed in the plating solution. The lower part of the holder 2 is provided with an opening (not shown) shaped to correspond to the object to be plated P1. The object to be plated P1 is fitted into this opening.

A rectangular opening H3 is provided at the top of the holder 2 for inserting and removing the holder 2 in the vertical direction. When the holder 2 is immersed in the plating solution before the start of electrolytic plating, or when the holder 2 is removed from the plating solution after electrolytic plating is completed, the gripping portion 2a on the upper side of the opening H3 is gripped in a predetermined manner. The height position of the opening H3 of the holder 2 is higher than the liquid level of the plating solution. The position of the holder 2 is fixed during the electrolytic plating process.

The anode electrode 3 is a rectangular electrode plate electrically connected to the object to be plated P1 via a DC power source E1 and is immersed in the plating solution. The anode electrode 3 may be held by a specified electrode holder (not shown). Materials such as copper and phosphorus-containing copper are used as constituent materials of such an anode electrode 3. When a current is passed through the DC power source E1, a reduction reaction occurs at the object to be plated P1 (cathode electrode), and metal ions in the plating solution are precipitated on the surface of the object to be plated P1. Meanwhile, an oxidation reaction occurs at the anode electrode 3, and the metal contained in the anode electrode 3 dissolves into the plating solution.

The shielding plate 4 is a rectangular plate-shaped member for adjusting the thickness of the plating film on the object to be plated P1, and is immersed in the plating solution. In the example of FIG. 1, a rectangular opening H4 is provided in the shielding plate 4. The opening area of this opening H4 is appropriately adjusted to adjust the thickness of the plating film on the object to be plated P1. Note that in the example of FIG. 1, the position of the shielding plate 4 is fixed during the electrolytic plating process.

The stirring panel 5 is a member for stirring the plating solution in a predetermined manner. The stirring panel 5 is a rectangular plate-shaped member, and three stirring rods 5a are formed by providing a plurality of perforation sections H51, H52 having a rectangular shape and a congruent shape with a predetermined area on the stirring panel 5. In other words, the stirring panel 5 is formed by perforating two perforation sections H51, H52 (see FIG. 2) that are elongated in the height direction side by side from a rectangular plate-shaped member. On one side (positive side in the x-axis direction) of the elongated perforation section H51, a columnar stirring rod 5a that is elongated in the height direction is provided. Similarly, a columnar stirring rod 5a is provided between the perforation sections H51, H52, and a columnar stirring rod 5a is also provided on the other side (negative side in the x-axis direction) of the perforation section H52. These three stirring rods 5a are provided at equal intervals in the x-axis direction. In this way, the stirring panel 5 has three stirring rods 5a extending in the height direction, and the three stirring rods 5a are arranged at a predetermined interval in the x-axis direction (width direction). Note that the number of stirring rods 5a is not limited to three, and may be two or four or more. In other words, the number of stirring rods 5a needs to be at least two or more.

As shown in FIG. 1, the three stirring rods 5a are immersed in the plating solution. The height of the three stirring rods 5a is longer than the height of the object P1 to be plated. The stirring rods 5a and the object P1 to be plated are arranged so that the height range of the three stirring rods 5a includes the height range of the object P1 to be plated.

The plating solution supply device 6 shown in FIG. 1 is a device that returns plating solution that has overflowed from the overflow wall 1b into the negative region in the y-axis direction to the opposite region (the positive region in the y-axis direction), and is equipped with a pump (not shown). In addition, a plating solution outlet H1 is provided at a predetermined location on the bottom plate of the main body 1a of the plating tank 1, on the negative side of the overflow wall 1b in the y-axis direction. In addition, a plating solution inlet H2 is provided at a predetermined location on the bottom plate of the main body 1a of the plating tank 1, on the positive side of the holder 2 in the y-axis direction.

The plating solution introduced into the plating solution supply device 6 through the outlet H1 and the pipe K1 is returned from the plating solution supply device 6 to the inside of the plating tank 1 (the area on the positive side of the overflow wall 1b in the y-axis direction) through the pipe K2 and the inlet H2. In addition to the pump (not shown), the plating solution supply device 6 may be provided with a filter (not shown) for removing foreign matter, a heater (not shown) for adjusting temperature, and a cooler (not shown).

The rocking unit 7 shown in FIG. 1 is a device that moves the stirring panel 5 in the x-axis direction (width direction) while multiple stirring rods 5a are immersed in the plating solution. Details will be described later, but the rocking unit 7 rocks (reciprocates) the stirring panel 5 finely and quickly in the x-axis direction, while slowly reciprocating the stirring panel 5 in the x-axis direction.

As shown in FIG. 1, the rocking unit 7 includes a reciprocating mechanism 71 and a rocking mechanism 72. The reciprocating mechanism 71 is a mechanism that moves the stirring panel 5 back and forth in the x-axis direction (width direction) within a predetermined stirring range. The rocking mechanism 72 is a mechanism that rocks the stirring panel 5 in the x-axis direction (width direction) within a predetermined rocking range. The stirring range and rocking range of the stirring panel 5 will be described later.

The agitation panel mounting part 8 shown in FIG. 1 is a member that connects the above-mentioned rocking mechanism 72 and the agitation panel 5. The agitation panel mounting part 8 is configured such that a first agitation panel mounting part 81, a second agitation panel mounting part 82, and a third agitation panel mounting part 83 are connected in sequence. The container U1 shown in FIG. 1 houses the rocking unit 7.

The control device 9 is a device that controls the plating solution supply device 6, the reciprocating mechanism 71, and the oscillating mechanism 72 in a predetermined manner. Although not shown, the control device 9 is configured to include electronic circuits such as a CPU (Central Processing Unit), a ROM (Read Only Memory), a RAM (Random Access Memory), and various interfaces. The control device 9 reads out programs stored in the ROM and expands them into the RAM, and the CPU executes various processes. The processes executed by the control device 9 will be described later.

FIG. 2 is an explanatory diagram regarding the stirring range and the swinging range of the stirring panel 5. As shown in FIG.
Note that the object to be plated P1 is shown in a schematic plan view (viewed from the z-axis direction), and the stirring panel 5 is shown in a front view viewed from the y-axis direction. The "stirring range" in FIG. 2 indicates the range in which the stirring panel 5 reciprocates in the x-axis direction as the reciprocating mechanism 71 (see FIG. 1) is driven. As shown in FIG. 2, the length of the stirring range in the x-axis direction (width direction) is longer than the dimension of the object to be plated P1 in the x-axis direction (width direction). In addition, in the x-axis direction, the range of the object to be plated P1 is included in the stirring range. The reciprocating mechanism 71 (see FIG. 1) reciprocates the stirring panel 5 in the x-axis direction at a predetermined reciprocating speed within this stirring range.

The positive end of the stirring range in the x-axis direction indicates the limit position of the positive end of the stirring panel 5 in the x-axis direction when the stirring panel 5 reciprocates in the x-axis direction. Similarly, the negative end of the stirring range in the x-axis direction indicates the limit position of the negative end of the stirring panel 5 in the x-axis direction when the stirring panel 5 reciprocates in the x-axis direction.

The "swing range" in FIG. 2 indicates the range of movement of the agitation panel 5 in each swing when it swings in the x-axis direction (alternately moving to the positive and negative sides in the x-direction) as the swing mechanism 72 (see FIG. 1) is driven. As shown in FIG. 2, the length of the swing range of the agitation panel 5 in each swing in the x-axis direction (width direction) is shorter than the dimension of the object to be plated P1 in the x-axis direction (width direction). The swing mechanism 72 (see FIG. 1) swings the agitation panel 5 in the x-axis direction at a predetermined swing speed within this swing range.

That is, the rocking unit 7 (see FIG. 1) rocks the stirring panel 5 in the x-axis direction (width direction) within a predetermined rocking range, while reciprocating the stirring panel 5 in the x-axis direction (width direction) within a predetermined rocking range. Therefore, the position of the rocking range shown in FIG. 2 is not particularly fixed, and the position of the rocking range in the x-axis direction changes from moment to moment as the stirring panel 5 reciprocates within the rocking range.

As described above, by reciprocating the agitation panel 5 in an agitation range longer than the dimension of the object to be plated P1 in the x-axis direction, plating (copper deposition, etc.) can be performed over the entire surface of the object to be plated P1. In addition, by rocking the agitation panel 5 in an oscillation range shorter than the dimension of the object to be plated P1 in the x-axis direction, the plating solution can be caused to flow toward the object to be plated P1 while suppressing splashing of the plating solution. This makes it possible to achieve a uniform thickness for the plating film even when a fine circuit pattern (plating pattern) is present on the object to be plated P1.

It is preferable that the number of oscillations per unit time when the oscillation unit 7 oscillates the stirring panel 5 in the predetermined oscillation range is greater than the number of reciprocations per unit time when the stirring panel 5 is reciprocated in the predetermined oscillation range. In other words, it is preferable that the oscillation speed when the oscillation unit 7 oscillates the stirring panel 5 in the predetermined oscillation range is faster than the reciprocation speed when the stirring panel 5 is reciprocated in the predetermined oscillation range.

In short, the rocking unit 7 (see FIG. 1) may rock the stirring panel 5 finely and quickly in the x-axis direction within a predetermined rocking range, while slowly and widely reciprocating the stirring panel 5 in the x-axis direction within a predetermined rocking range. This makes it possible to promote the flow of the plating solution by the rocking of the stirring panel 5 while suppressing splashing of the plating solution. This makes it easier for the flow of the plating solution to propagate to the fine circuit pattern (plating pattern) of the plated object P1, promoting the uniformity of the thickness of the plating film.
In this way, the reciprocating mechanism 71 of the rocking unit 7 (see FIG. 1 ) reciprocates the rocking mechanism 72 so that the stirring panel 5 reciprocates at a predetermined reciprocating speed in a stirring range set in a range larger than the object P1 to be plated in the horizontal direction (x-axis direction) indicating a direction parallel to the plating surface of the object P1 to be plated. Also, the rocking mechanism 72 of the rocking unit 7 reciprocates in the stirring range in synchronization with the movement of the reciprocating mechanism 71 while rocking the stirring panel 5 at a rocking speed faster than the reciprocating speed in a rocking range set in a range smaller than the size of the object P1 to be plated in the horizontal direction (x-axis direction) so as to uniformly supply the plating solution to the object P1 to be plated held by the holder 2 in the plating tank 1, thereby stirring the plating solution. This makes it possible to suppress the splashing of the plating solution while achieving a uniform thickness of the plating film.

As shown in FIG. 2, the dimension of the stirring panel 5 in the x-axis direction is shorter than the oscillation range. As an example of each dimension, if the dimension of the object to be plated P1 in the x-axis direction is 300 mm, the length of the stirring panel 5 in the x-axis direction may be 150 mm, the length of the stirring range in the x-axis direction may be 310 mm, and the length of the oscillation range in the x-axis direction may be 210 mm. These numerical values are appropriately set within a range that provides the effect of appropriately plating the object to be plated while suppressing splashing of the plating solution.

FIG. 3A is a perspective view of the agitation panel 5. FIG.
As described above, the agitation panel 5 has a shape in which the rectangular perforated portions H51 and H52, each elongated in the height direction, are perforated side by side from a rectangular plate-like member. Each of the three agitation rods 5a provided on the agitation panel 5 has a columnar shape extending in the height direction.

FIG. 3B is an explanatory diagram including a cross section taken along line III-III in FIG. 3A.
In addition, FIG. 3B illustrates the stirring rod 5a and also illustrates the plated object P1 in a plan view. In the example of FIG. 3B, the stirring rod 5a is formed as a columnar structure whose horizontal cross section has a triangular shape. This columnar structure (i.e., the stirring rod 5a) has two inclined surfaces 52a, 53a that are configured with predetermined inclination angles θ2, θ3. More specifically, in the example of FIG. 3B, the cross section of the stirring rod 5a has an isosceles triangle shape. In the stirring rod 5a, the side surface 51a that forms the base of the isosceles triangle is perpendicular to the y axis. In the stirring rod 5a, the inclined surfaces 52a, 53a that form a pair of equal sides of the isosceles triangle are inclined at a predetermined angle with respect to the xy plane. The stirring rod 5a is disposed so that the two inclined surfaces 52a, 53a face the plated object P1 when the stirring panel 5 (see FIG. 3A) swings.

In this way, the multiple faces forming the side of the columnar stirring rod 5a include inclined faces 52a, 53a that are inclined at a predetermined angle with respect to a plane (a plane parallel to the xy plane: not shown) that includes the plate surface of the plate-shaped object to be plated P1. These inclined faces 52a, 53a face the object to be plated P1 (oppose the object to be plated P1).

The inclination angle θ2 of the inclined surface 52a of the stirring rod 5a and the inclination angle θ3 of the inclined surface 53a of the stirring rod 5a are appropriately adjusted at the design stage so that the flow of the plating solution is appropriately propagated toward the plated object P1 when the stirring panel 5 is reciprocated in the x-axis direction while being finely oscillated in the x-axis direction. When the stirring rod 5a oscillates in the x-axis direction, as shown by the arrows in FIG. 3B, the plating solution receives a drag force F1 from the stirring rod 5a toward the positive side in the x-axis direction, and receives a lift force F2 from the stirring rod 5a toward the positive side in the y-axis direction. As a result, a resultant force F12 acts obliquely on the plated object P1 from the inclined surface 53a of the stirring rod 5a. In addition, a predetermined resultant force acts on the plated object P1 from the other inclined surface 52a. This allows the flow of the plating solution to be propagated to the plated object P1 more efficiently than when the cross-sectional shape of the stirring rod 5a is rectangular.

The cross-sectional shape of the stirring rod 5a is not limited to an isosceles triangle, and may be any other triangle. As described later, the cross-sectional shape of the stirring rod 5a may be a trapezoid (see FIG. 10A) or a rhombus (see FIG. 10B).
FIG. 3C is an explanatory diagram of a stirring rod 5Da of a plating apparatus according to a comparative example.
In addition, in FIG. 3C, particles M1 (predetermined ions) of the plating solution are illustrated for ease of understanding. In addition, the multiple white arrows in FIG. 3C indicate the force acting from the stirring rod 5Da to the particles M1 of the plating solution. As shown in FIG. 3C, when the cross section of the stirring rod 5Da is rectangular, a force in the x-axis direction acts on the particles M1 of the plating solution as the stirring rod 5Da moves, so that the flow of the plating solution is less likely to propagate toward the object to be plated P1. In addition, in FIG. 3C, the force acting from the stirring rod 5Da to the particles M1 of the plating solution is simplified, but in reality, even when the cross section of the stirring rod 5Da is rectangular, the flow of the plating solution propagates to some extent toward the object to be plated P1.
FIG. 3D is an explanatory diagram of the stirring rod 5a of the plating apparatus according to the embodiment.
In this embodiment, as described above, the cross section of the stirring rod 5a has a triangular shape. In other words, since the stirring rod 5a has inclined surfaces 52 and 53, an oblique force acts on the particles M1 of the plating solution as shown by the multiple white arrows in Fig. 3D (corresponding to the resultant force F12 in Fig. 3B). As a result, the flow of the plating solution can be efficiently propagated to the object P1 to be plated.

FIG. 4A is a schematic side view of the reciprocating mechanism 71. FIG.
As shown in FIG. 4A, the reciprocating mechanism 71 includes a pedestal 71a, a pair of guide rails 71b (guides), a base portion 71c, a member mounting portion 71d, an air cylinder 71e, and a connecting portion 71f (see FIG. 4B). The pedestal 71a is a platform on which a pair of guide rails 71b is installed on its upper surface. The pair of guide rails 71b are rails for guiding the movement of the base portion 71c in the x-axis direction, and extend in an elongated manner in the x-axis direction. The pair of (i.e., two) guide rails 71b are disposed on the pedestal 71a at a predetermined interval in the horizontal direction (y-axis direction). The positions of the pair of guide rails 71b in the y-axis direction correspond to the positions of the connecting mechanism 711c in the y-axis direction, which will be described next (see also FIG. 4B).

The base portion 71c is a plate-like member that moves in the x-axis direction as the air cylinder 71e is driven, and has four connection mechanisms 711c (see also FIG. 4B). Each connection mechanism 711c moves in the x-axis direction along a pair of guide rails 71b as the air cylinder 71e is driven, is installed on the underside of the base portion 71c, and is movable along the guide rails 71b (guides).

The member mounting portion 71d is a member for fixing the relative positions of the base portion 71c and the swinging mechanism 72, and is fixedly connected to the base portion 71c in an upright state at the end of the base portion 71c on the plating tank 1 side. Specifically, the member mounting portion 71d has its lower end fixed to the base portion 71c and extends elongatedly in the z direction in side view. The swinging mechanism 72 is installed on the negative side of the member mounting portion 71d in the y direction. The air cylinder 71e is equipped with a rod 713e (see FIG. 4B) that reciprocates in the x direction (width direction) using air pressure.

FIG. 4B is a bottom view of the base portion 71c of the reciprocating mechanism 71 as viewed from below.
4B, the base portion 71c has a rectangular shape when viewed from below. A connection mechanism 711c is provided at each of the four corners of the bottom surface of the base portion 71c. A pair of connection mechanisms 711c that are at the same position in the y-axis direction move in the x-axis direction along one guide rail 71b, and the remaining pair of connection mechanisms 711c move in the x-axis direction along the other guide rail 71b.

A connecting portion 71f is installed at the center in the y-axis direction on the underside of the base portion 71c. The connecting portion 71f is a member that connects the base portion 71c and the rod 713e of the air cylinder 71e, and is installed on the underside of the base portion 71c and fixed to the tip of the rod 713e. In addition, two pairs of connecting mechanisms 711c having a predetermined distance are arranged on the underside of the base portion 71c so that the base portion 71c can stably move along the two guide rails 71b (guides), and each pair of connecting mechanisms 711c is connected so that it can move along each guide rail 71b (guide). When the rod 713e moves, a driving force is transmitted to the base portion 71c via the connecting portion 71f, and the two pairs of connecting mechanisms 711c slide on the two guide rails 71b (guides), so that the swinging mechanism 72 reciprocates in synchronization with the reciprocating motion of the rod 713e. In other words, the entire rocking mechanism 72 (see FIG. 4A) moves back and forth in the x-axis direction, and the agitation panel 5 (see FIG. 1), which is connected to the rocking mechanism 72 via the agitation panel mounting part 8 (see FIG. 1), also moves back and forth in the x-axis direction. Note that the range of movement in the x-axis direction when the agitation panel 5 (see FIG. 1) moves back and forth as the rod 713e expands and contracts corresponds to the above-mentioned agitation range (see FIG. 2).

FIG. 5 is an explanatory diagram of a mechanism including the air cylinder 71e.
As shown in Fig. 5, the air cylinder 71e is driven by air pressure and includes a cylinder body 711e, a piston 712e, a rod 713e, a first intake and exhaust port H6, and a second intake and exhaust port H7. The cylinder body 711e is a hollow cylindrical member configured so that the piston 712e slides inside it. The piston 712e is a disk-shaped member that reciprocates in the x-axis direction inside the cylinder body 711e by air pressure. The rod 713e is a rod-shaped member that moves integrally with the piston 712e. The base end of the rod 713e is fixed to the piston 712e, and the tip end is fixed to the connecting portion 71f (see Fig. 4B).

The reciprocating mechanism 71 (see Figures 4A and 4B) includes an air supply device 71g and an intake/exhaust switching mechanism 71h in addition to the air cylinder 71e described above. The air supply device 71g supplies compressed air to the intake/exhaust switching mechanism 71h through the ventilation pipe G1 based on a command from the control device 9. The intake/exhaust switching mechanism 71h is connected to the air supply device 71g through the ventilation pipe G1, and is connected to the air cylinder 71e through two ventilation pipes G2 and G3.

The downstream end of one of the ventilation pipes G2 is connected to the first intake and exhaust port H6 of the cylinder body 711e. The downstream end of the other ventilation pipe G3 is connected to the second intake and exhaust port H7 of the cylinder body 711e. The first intake and exhaust port H6 is connected to the space on the x-axis direction positive side of the piston 712e in the cylinder body 711e. The other second intake and exhaust port H7 is connected to the space on the x-axis direction negative side of the piston 712e in the cylinder body 711e. In this way, the first intake and exhaust port H6 and the second intake and exhaust port H7 of the air cylinder 71e are connected to the intake and exhaust switching mechanism 71h via the ventilation pipes G2 and G3, respectively. Then, based on a command from the control device 9, the supply destination of the compressed air from the air supply device 71g is alternately switched between the first intake and exhaust port H6 and the second intake and exhaust port H7 by the intake and exhaust switching mechanism 71h. In other words, the operation of the intake/exhaust switching mechanism 71h alternates between sucking in compressed air from the air supply device 71g through one of the first intake/exhaust port H6 and the second intake/exhaust port H7 and exhausting it through the other, causing the rod 713e in the air cylinder 71e to reciprocate.

For example, while compressed air is being supplied to the first intake and exhaust port H6, the piston 712e and the rod 713e move to the negative side in the x-axis direction. As a result, the base portion 71c (see FIG. 4A), the member mounting portion 71d (see FIG. 4A), and the rocking mechanism 72 (see FIG. 4A) also move to the negative side in the x-axis direction. Also, while compressed air is being supplied to the second intake and exhaust port H7, the piston 712e and the rod 713e move to the positive side in the x-axis direction. As a result, the base portion 71c (see FIG. 4A), the member mounting portion 71d (see FIG. 4A), and the rocking mechanism 72 (see FIG. 4A) also move to the positive side in the x-axis direction. In this way, the entire rocking mechanism 72 (see FIG. 4A) moves back and forth in the x-axis direction, and the agitation panel 5 (see FIG. 1) also moves back and forth in the x-axis direction.

FIG. 6 is an explanatory diagram showing the configuration of the swing mechanism 72.
The swing mechanism 72 is a mechanism that converts the rotational motion of the motor 72a into a swinging motion (reciprocating motion) in the x-axis direction. As shown in Fig. 6, the swing mechanism 72 includes a motor 72a, a motor gripper 72b, a rotating plate 72c (rotating body), a cam follower 72d, a flat plate portion 72e, an upright plate portion 72f, a slide portion 72g, and a linear guide 72h.

The motor 72a is an electric motor that generates a rotational driving force, and is installed via the motor grip 72b at a predetermined position on the member mounting part 71d. The rotating shaft 721a is an axis that receives the rotational driving force of the motor 72a, is directly connected to the drive shaft of the motor 72a, and extends in the z-axis direction. The motor grip 72b is a member that fixes the relative position between the motor 72a and the member mounting part 71d, and is L-shaped in side view.

The rotating plate 72c, the cam follower 72d, and the flat plate portion 72e are mechanisms that convert the rotational driving force of the motor 72a into a swinging motion in the x-axis direction. The rotating plate 72c (rotating body) is a disk-shaped member that rotates in the circumferential direction integrally with the rotating shaft 721a connected to the drive shaft of the motor 72a, and is arranged so that its plate surface is perpendicular to the z-axis. Such a rotating plate 72c functions as a "rotating body" fixedly connected to the rotating shaft 721a. In addition, the rotating shaft 721a connected to the drive shaft of the motor 72a is fixed to the center of the lower surface of the rotating plate 72c. The cam follower 72d is a member that performs a circular motion integrally with the rotating plate 72c, and extends from the upper surface of the rotating plate 72c to the positive side in the z-axis direction. In addition, the cam follower 72d is installed at a position a predetermined distance away from the center of the rotating plate 72c.

The cam follower 72d is a cylindrical member whose axis is parallel to the z-axis, and is inserted into a hole in the rotating plate 72c at a position offset from the center of the rotating plate 72c by a predetermined amount. The cam follower 72d is also fitted into the long hole H8 in the flat plate portion 72e. When the motor 72a is driven, the cam follower 72d reciprocates in the y-axis direction within the range of the long hole H8.

The flat plate portion 72e is a rectangular plate having an elongated hole H8 (see also FIG. 7A) in the y-axis direction, and extends on a horizontal plane. The flat plate portion 72e is arranged so that its plate surface is perpendicular to the z-axis. The upright plate portion 72f is a plate-like member for fixing the relative positions of the flat plate portion 72e, the slide portion 72g, and the stirring panel mounting part 8. The upright plate portion 72f is arranged so that its plate surface is perpendicular to the y-axis, and is fixedly connected vertically to the end of the flat plate portion 72e on the plating tank 1 side. The "link plate" to which the linear motion (oscillating motion) converted from the circular motion of the rotating plate 72c is transmitted is composed of the flat plate portion 72e and the upright plate portion 72f.

As shown in FIG. 6, the upright plate portion 72f is installed on the flat plate portion 72e and is connected to the agitation panel 5 via the agitation panel mounting part 8. That is, the flat plate portion 72e is fixed to the plate surface on one side (negative side in the y-axis direction) of the upright plate portion 72f, and the slide portion 72g is fixed to the plate surface on the other side (positive side in the y-axis direction). In addition, the upper surface of the upright plate portion 72f is fixed to the end of the agitation panel mounting part 8.

The slide portion 72g is a member that swings the agitation panel mounting part 8 and the agitation panel 5 in the x-axis direction by linear motion (swinging motion) transmitted via the "link plate" described above. The slide portion 72g is disposed on the upper part of the member mounting part 71d and is connected to the upright plate part 72f. The linear guide 72h is a rail that guides the slide portion 72g to move in the x-axis direction, and is elongated and extends in the x-axis direction. The motor 72a then causes the rotating plate 72c to move in a circular motion at a predetermined rotational speed so that the agitation panel 5 swings at a predetermined swing speed.

The agitation panel mounting part 8 is a member that connects the upright plate portion 72f of the rocking mechanism 72 and the agitation panel 5. That is, the rocking mechanism 72 is connected to the agitation panel 5 via the agitation panel mounting part 8. In the example of FIG. 6, the agitation panel mounting part 8 is configured such that the first agitation panel mounting part 81, the second agitation panel mounting part 82, and the third agitation panel mounting part 83 are connected in sequence toward the positive side in the y-axis direction. The first agitation panel mounting part 81 is a plate-shaped member extending in the y-axis direction, and its end is fixed to the upper surface of the upright plate portion 72f. The first agitation panel mounting part 81 is also connected to the third agitation panel mounting part 83 via the second agitation panel mounting part 82. The third agitation panel mounting part 83 is fixed to the top of the agitation panel 5.

In addition to the connection between the agitation panel 5 and the third agitation panel mounting part 83, the connection between the motor grip part 72b and the member mounting part 71d, and the connection between the linear guide 72h and the member mounting part 71d may each be screwed. This allows, for example, when using an agitation bar 5a (FIGS. 3A and 3B) with a different inclination angle of the inclined surfaces 52a and 53a from the current situation, the worker can remove the agitation panel 5 screwed to the third agitation panel mounting part 83 and screw in another agitation panel with a different inclination angle, making it easy to replace the agitation panel 5. In this way, when the inclination angle of the agitation bar 5a is changed according to the pattern of the plated object P1, the agitation panel 5 screwed to the specified agitation panel mounting part 8 is removed, and a newly prepared another agitation panel (not shown) is screwed to the agitation panel mounting part 8.

7A, 7B, and 7C are explanatory diagrams regarding the swinging of the agitation panel 5. FIG.
When the rotating plate 72c rotates with the driving of the motor 72a (see FIG. 6), the cam follower 72d mounted on the rotating plate 72c performs a circular motion. For example, the cam follower 72d performs a circular motion clockwise in a plan view in the order of FIG. 7A, FIG. 7B, and FIG. 7C. The radius of the circle in the circular motion of the cam follower 72d is equal to the distance in a plan view between the rotating shaft 721a of the motor 72a (see FIG. 6) and the axis of the cam follower 72d.

As described above, the cam follower 72d is inserted into the long hole H8 of the flat plate portion 72e. Therefore, in the process of the circular motion of the cam follower 72d, the cam follower 72d moves in the long hole H8 in the y-axis direction while pressing the wall surface of the long hole H8 in the x-axis direction. Meanwhile, the flat plate portion 72e is movable in the x-axis direction via the slide portion 72g (see FIG. 6) relative to the linear guide 72h. Therefore, when the cam follower 72d presses the wall surface of the long hole H8 in the x-axis direction, the flat plate portion 72e, the agitation panel mounting part 8, and the agitation panel 5 also move in the x-axis direction.
In this way, the rotating plate 72c is given a rotational driving force from the motor 72a via the rotating shaft 721a and moves circularly at a predetermined rotation speed. The cam follower 72d moves circularly in synchronization with the rotating plate 72c while maintaining a distance from the central axis of the rotating plate 72c, thereby forming a moving trajectory of the eccentric wheel. Furthermore, the long hole H8 into which the cam follower 72d is inserted moves in accordance with the movement of the cam follower 72d, thereby converting the circular motion of the rotating plate 82c into a swinging motion, which is a linear motion, and transmitting it to the link plate (flat plate portion 72e and upright plate portion 72f). As a result, the link plate swings the agitation panel 5 at a predetermined swinging speed via the slide portion 72g.

In the state of FIG. 7A, the cam follower 72d is located on the negative side of the x-axis direction with respect to the rotation shaft 721a of the motor 72a (see FIG. 6). In the state of FIG. 7B, the cam follower 72d is located in the center in the x-axis direction. In the state of FIG. 7C, the cam follower 72d is located on the positive side in the x-axis direction. With this movement (circular motion) of the cam follower 72d, the stirring panel 5 swings in the x-axis direction (width direction) within a predetermined swing range.

The relationship between the rotation speed of the motor 72a and the rocking speed of the agitation panel 5 is expressed by the following formula (1). Here, R included in formula (1) is the distance in a plan view from the rotation shaft 721a of the motor 72a (see FIG. 6) to the axis of the cam follower 72d. Also, π included in formula (1) is the ratio of the circumference of a circle to its circumference.

(Oscillation speed) = 2πR x (Rotation speed) ... (1)

For example, if R=15 mm and (rotation speed)=360 min ⁻¹ (rpm may also be used as a unit), the number of oscillations of the agitation panel 5 per minute is also 360. In addition, (oscillation speed)=2π×15×360=10,800π (mm/min).

As described above, while the stirring panel 5 is swinging in the x-axis direction within a predetermined swing range, the entire swing mechanism 72 reciprocates in the x-axis direction within a predetermined stirring range by the air cylinder 71e (see FIGS. 4A and 4B). For example, the reciprocating speed may be set so that the stirring panel 5 reciprocates once every six seconds. In this case, the number of reciprocating movements of the stirring panel 5 per minute is 10. As described above, the swing speed of the stirring panel 5 in the x-axis direction is set to a value faster than the reciprocating speed (stirring speed) in the x-axis direction.
The rocking speed and reciprocating speed of the stirring panel 5 are set in advance based on simulations and experiments so that the plating solution is uniformly supplied to the object to be plated P1, and are stored in the control device 9 (see FIG. 1). More specifically, in a test operation prior to the actual operation of the plating apparatus 10, the value of the reciprocating speed, the value of the rocking speed, and the value of the inclination angle of the stirring rod 5a are set in accordance with the plating pattern of the object to be plated P1 so that the plating solution is uniformly supplied to the object to be plated P1.

FIG. 8 is an explanatory diagram regarding the length of the linear guide 72h.
As shown in FIG. 8, when the center of the swing range in the x-axis direction and the center of the stirring panel 5 are aligned, the difference in length between the swing range and the stirring panel 5 on the positive and negative sides of the x-axis direction is L. In the swing of the stirring panel 5, the stirring panel 5 is moved from the center position to the positive side of the x-axis direction by the length L, then returned to the center position, and further moved from the center position to the negative side of the x-axis direction by the length L. This process is repeated. In order to perform such a process, the length in the horizontal direction (x-axis direction) of the linear guide 72h that guides the movement of the slide part 72g is set to at least the difference between the length of the swing range and the length of the stirring panel 5. In the example of FIG. 8, the length of the linear guide 72h in the x-axis direction is 2L, but the length of the linear guide 72h may be longer than 2L.

＜Effects＞
According to this embodiment, the rocking unit 7 reciprocates the stirring panel 5 in a stirring range longer than the length of the object P1 in the x-axis direction. This allows the flow of the plating solution to propagate throughout the entire area of the object P1, so that electrolytic plating can be performed over the entire area of the object P1. The rocking unit 7 also rocks the stirring panel 5 in a swinging range shorter than the length of the object P1. This makes it possible to suppress splashing of the plating solution and to make the thickness of the plating film uniform, compared to, for example, a case in which the stirring panel 5 is reciprocated at high speed by the reciprocating mechanism 71 without providing the rocking mechanism 72. In particular, by setting the rocking speed higher than the reciprocating speed (movement speed in the stirring range) of the stirring panel 5, the thickness of the plating film is made uniform.

In addition, according to this embodiment, each of the multiple stirring rods 5a of the stirring panel 5 has an inclined surface 52a, 53a (see FIG. 3B). This makes it easier for the plating solution to flow toward the object to be plated P1, allowing for efficient electrolytic plating.

<<Variations>>
While the plating apparatus 10 and plating method according to the present disclosure have been described above in terms of the embodiments, they are not limited to these descriptions and may be modified in various ways.
For example, in the embodiment, the number of screw holes in which the cam follower 72d is installed in the rotating plate 72c is one, but the present invention is not limited to this. That is, as illustrated in FIG. 9, the rotating plate 72c may be provided with a plurality of screw holes for the cam follower 72d.

FIG. 9 is an explanatory diagram relating to changes in the rocking speed and rocking range of the agitation panel of the plating apparatus according to the first modified example.
In the example of Fig. 9, three screw holes H11, H12, and H13 for screwing the cam follower 72d are provided in the rotating plate 72Ac. These screw holes H11, H12, and H13 are provided on a predetermined straight line passing through the center of the rotating plate 72c. The screw holes H11, H12, and H13 are different in distance from the center of the rotating plate 72c (the position of the rotating shaft 721a). That is, the screw hole H12 is longer from the center of the rotating plate 72c than the screw hole H11, and the screw hole H13 is even longer from the center of the rotating plate 72c than the screw hole H12.

The cam follower 72d is screwed into one of the screw holes H11, H12, or H13. In this way, the mounting position of the cam follower 72d can be appropriately changed to change the rocking speed and rocking range of the agitation panel 5 (see FIG. 1). Specifically, the longer the distance from the center of the rotating plate 72c to the cam follower 72d, the wider the rocking range becomes, and the faster the rocking speed becomes when the motor 72a is driven at a predetermined rotation speed.

It is also possible to prepare multiple rotating plates 72c, each with a single screw hole (not shown). In this case, each of the multiple rotating plates 72c has a different distance from its center to the screw hole.

FIG. 10A is an explanatory diagram including a cross section of a stirring bar 5Ba of a plating apparatus according to a second modified example.
In addition, in Fig. 10A, particles M1 (predetermined ions) of the plating solution are illustrated for ease of understanding. Also, a plurality of white arrows in Fig. 10A indicate forces acting on particles M1 of the plating solution from inclined surfaces 53Ba and 54Ba of stirring rod 5Ba. In the example of Fig. 10A, the cross section of stirring rod 5Ba is trapezoidal.

In addition, the side surfaces 51Ba, 52Ba corresponding to the upper and lower bases of the trapezoid in the cross section of the stirring bar 5Ba are perpendicular to the y-axis, and the side surface 51Ba corresponding to the upper base of the trapezoid faces the plated object P1. A pair of legs in the trapezoid in the cross section of the stirring bar 5Ba are inclined surfaces 53Ba, 54Ba inclined at a predetermined angle with respect to a plane including the plate surface of the plated object P1. These inclined surfaces 53Ba, 54Ba face the plated object P1. In other words, the stirring bar 5Ba is a columnar structure whose horizontal cross section is a trapezoid, and this columnar structure has two inclined surfaces 53Ba, 54Ba that are formed at predetermined inclination angles θ3, θ4, and is arranged so that the two inclined surfaces 53Ba, 54Ba face the plated object P1 when the stirring panel (not shown) swings. Even if the cross section of the stirring rod 5Ba is trapezoidal in this way, the plating solution can be efficiently supplied to the object to be plated P1 by moving the stirring rod 5Ba in the x-axis direction.

FIG. 10B is an explanatory diagram including a cross section of a stirring bar 5Ca of a plating apparatus according to a third modified example.
As shown in FIG. 10B, the cross section of the stirring rod 5Ca may be rhombic. One of the two diagonals (not shown) of this rhombic shape is parallel to the x-axis, and the other is parallel to the y-axis. In the cross section of the rhombic shape, the two sides facing the plated object P1 form inclined surfaces 51Ca and 52Ca. That is, the stirring rod 5Ca is a columnar structure whose horizontal cross section is rhombic, and this columnar structure has two inclined surfaces 51Ca and 52Ca that are configured at predetermined inclination angles θ1 and θ2. Even if the cross section is rhombic in this way, the stirring rod 5Ca can move in the x-axis direction to efficiently supply the plating solution to the plated object P1.

The cross-sectional shape of each of the multiple stirring rods is not limited to a triangle (see FIG. 3B), a trapezoid (see FIG. 10A), or a diamond (see FIG. 10B), and may be any other predetermined shape. As described above, by having the stirring rod have an inclined surface that is inclined at a predetermined angle with respect to a plane including the plate surface of the plated object P1, the flow of the plating solution can be efficiently propagated toward the plated object P1.

In the embodiment, the number of the stirring rods 5a (see FIG. 3A) provided on the stirring panel 5 (see FIG. 3A) is three, but this is not limited thereto. That is, the number of the stirring rods 5a may be two, or may be four or more.

In the embodiment, the air cylinder 71e (see FIG. 4A) is used as the drive source of the reciprocating mechanism 71 (see FIG. 4A), but the present invention is not limited to this. That is, a hydraulic cylinder or a motor may be used as the drive source of the reciprocating mechanism 71.
In the embodiment, the case where the rocking mechanism 72 moves the agitation panel 5 back and forth in the x-axis direction has been described, but this is not limiting. For example, a predetermined rocking axis (not shown) may be provided to rock the agitation panel 5 like a pendulum to "rock."

In addition, each embodiment has been described in detail to clearly explain the present disclosure, and is not necessarily limited to having all of the configurations described. In addition, it is possible to add, delete, or replace part of the configuration of each embodiment with other configurations.
Furthermore, the mechanisms and configurations described above are those considered necessary for the explanation, and do not necessarily show all mechanisms and configurations of the product.

1 Plating tank 2 Holder 3 Anode electrode (electrode plate)
4 Shielding plate 5 Stirring panel 5a, 5Ba, 5Ca Stirring rod 6 Plating solution supply device 7 Swinging unit 8 Stirring panel mounting part 9 Control device 10 Plating device 52a, 53a, 53Ba, 54Ba, 51Ca, 52Ca Inclined surface 71 Reciprocating mechanism 71a Base 71b Guide rail (guide)
71c Base portion 711c Connection mechanism 71d Member mounting portion 71e Air cylinder 71f Connection portion 713e Rod 72 Swing mechanism 72a Motor 72b Motor grip portion 72c, 72Ac Rotating plate 72d Cam follower 72e Flat plate portion (link plate)
72f Upright plate section (link plate)
72g Slide portion 72h Linear guide 81 First agitation panel mounting part (agitation panel mounting part)
82 Second agitation panel mounting part (agitation panel mounting part)
83 Third agitation panel mounting part (agitation panel mounting part)
H6 First intake/exhaust port H7 Second intake/exhaust port H8 Slot H51, H52 Perforated portion P1 Plated object

Claims (10)

A plating apparatus for performing electrolytic plating on an object to be plated,
The plating apparatus includes a swing unit, a plating tank, and a stirring panel,
The rocking unit has a reciprocating mechanism and a rocking mechanism,
The reciprocating mechanism reciprocates the rocking mechanism so that the stirring panel reciprocates at a predetermined reciprocating speed within a stirring range set to be larger than the object to be plated in a horizontal direction indicating a direction parallel to the plating surface of the object to be plated,
the swing mechanism swings the stirring panel at a swing speed faster than the reciprocating speed in a swing range set in the horizontal direction that is smaller than the size of the object to be plated, so as to uniformly supply the plating solution to the object to be plated held by a holder in the plating tank, while reciprocating within the stirring range in synchronization with the movement of the reciprocating mechanism, thereby stirring the plating solution;
A plating apparatus characterized by the above. The stirring panel is a rectangular plate-like member, and has at least two stirring rods formed by providing a plurality of perforated parts having a rectangular shape and a congruent shape with a predetermined area in the stirring panel;
the stirring rod is a columnar structure having a horizontal cross section of a triangle or trapezoid, the columnar structure has two inclined surfaces that are formed at a predetermined inclination angle, and is disposed so that the two inclined surfaces face the object to be plated when the stirring panel swings;
2. The plating apparatus according to claim 1, In a test operation prior to actual operation of the plating apparatus, the reciprocating speed value, the rocking speed value, and the inclination angle value of the stirring rod are set in accordance with a plating pattern of the plated object so that the plating solution is uniformly supplied to the plated object;
3. The plating apparatus according to claim 2, The reciprocating mechanism includes two guides spaced apart from each other by a predetermined distance on a base, and an air cylinder driven by air pressure.
The air cylinder includes a first intake and exhaust port and a second intake and exhaust port,
the first intake/exhaust port and the second intake/exhaust port are each connected to an intake/exhaust switching mechanism via a ventilation pipe;
The intake/exhaust switching mechanism is connected to an air supply device,
a process in which compressed air from the air supply device is sucked in through one of the first intake/exhaust port and the second intake/exhaust port and exhausted through the other port is alternately repeated by the operation of the intake/exhaust switching mechanism, thereby causing a rod in the air cylinder to perform a reciprocating motion;
2. The plating apparatus according to claim 1, The reciprocating mechanism includes:
a base portion having a connection mechanism movable along the guide;
A connecting portion is installed on a lower surface of the base portion and connects the base portion and the rod;
a member mounting portion fixedly connected to the base portion in an upright state at an end portion of the base portion on the plating tank side,
two pairs of the connection mechanisms having a predetermined distance therebetween are disposed on the lower surface of the base portion so that the base portion can stably move along the two guides, and each pair of the connection mechanisms is connected so as to be movable along each of the guides;
When the rod moves, a driving force is transmitted to the base part via the connecting part, and two pairs of the connection mechanisms slide on the two guides, thereby causing the swinging mechanism to reciprocate in synchronization with the reciprocating motion of the rod.
5. The plating apparatus according to claim 4, The rocking mechanism includes:
a motor that is installed via a motor gripper at a predetermined position of the member mounting portion and generates a rotational driving force;
a rotating shaft directly connected to a drive shaft of the motor and receiving the rotational driving force of the motor;
A rotor including a rotating plate fixedly connected to the rotating shaft,
the motor causes the rotor to move in a circular motion at a predetermined rotation speed so as to rock the agitation panel at the predetermined rocking speed;
6. The plating apparatus according to claim 5, The rocking mechanism includes:
a cam follower inserted into a hole in the rotary plate at a position offset from the center of the rotary plate by a predetermined amount;
a link plate including a flat plate portion on a horizontal surface having a long hole and an upright plate portion vertically fixedly connected to an end portion of the flat plate portion on the plating tank side;
a slide portion disposed on an upper portion of the member mounting portion and connected to the upright plate portion;
and an agitation panel mounting part that connects the upright plate portion and the agitation panel,
the rotating plate is given the rotational driving force from the motor via the rotating shaft and moves circularly at a predetermined rotational speed, the cam follower moves circularly in synchronization with the rotating plate while maintaining a separation distance from the central axis of the rotating plate, thereby forming a movement locus of the eccentric wheel, the long hole into which the cam follower is inserted moves in accordance with the movement of the cam follower, thereby converting the circular motion of the rotating plate into a swinging motion which is a linear motion and transmitting it to the link plate, and the link plate swinging the agitation panel at the swinging speed via the slide portion;
7. The plating apparatus according to claim 6, When the inclination angle of the stirring rod is changed according to the pattern of the object to be plated, the stirring panel screwed to a predetermined stirring panel mounting part is removed, and a newly prepared another stirring panel is attached to the stirring panel mounting part by screwing it.
3. The plating apparatus according to claim 2, The length of the linear guide that guides the movement of the sliding portion in the horizontal direction is set to be at least equal to or greater than the difference between the length of the swing range and the length of the stirring panel;
8. The plating apparatus according to claim 7, A plating method for performing electrolytic plating on an object to be plated, comprising the steps of:
The reciprocating mechanism of the rocking unit reciprocates the rocking mechanism so that the stirring panel reciprocates at a predetermined reciprocating speed within a stirring range set to be larger than the object to be plated in a horizontal direction indicating a direction parallel to the plating surface of the object to be plated;
the swing mechanism of the swing unit swings the stirring panel at a swing speed faster than the reciprocating speed in a swing range set in the horizontal direction to be smaller than the size of the object to be plated, so as to uniformly supply the plating solution to the object to be plated held by a holder in the plating tank, while reciprocating the stirring range in synchronization with the movement of the reciprocating mechanism, thereby stirring the plating solution;
The plating method according to the present invention is characterized by the above.