JP7440573B2 - ヘテロジニアスGaNレーザおよび能動構成要素 - Google Patents
ヘテロジニアスGaNレーザおよび能動構成要素 Download PDFInfo
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- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/2004—Confining in the direction perpendicular to the layer structure
- H01S5/2018—Optical confinement, e.g. absorbing-, reflecting- or waveguide-layers
- H01S5/2031—Optical confinement, e.g. absorbing-, reflecting- or waveguide-layers characterized by special waveguide layers, e.g. asymmetric waveguide layers or defined bandgap discontinuities
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- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/1028—Coupling to elements in the cavity, e.g. coupling to waveguides adjacent the active region, e.g. forward coupled [DFC] structures
- H01S5/1032—Coupling to elements comprising an optical axis that is not aligned with the optical axis of the active region
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/12004—Combinations of two or more optical elements
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- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
- H01S5/0425—Electrodes, e.g. characterised by the structure
- H01S5/04252—Electrodes, e.g. characterised by the structure characterised by the material
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- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
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- H01S5/3224—Si
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- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/323—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
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- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34333—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer based on Ga(In)N or Ga(In)P, e.g. blue laser
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/1228—Tapered waveguides, e.g. integrated spot-size transformers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/323—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/32308—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength less than 900 nm
- H01S5/32341—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength less than 900 nm blue laser based on GaN or GaP
Description
102 材料、層、機能層、領域
103 層、中間層、機能層
104 第2の材料の層、層、機能層、
105 基板、層、機能層
106 層、機能層
107 層、機能層
108 層、機能層、平坦化層
109 層、機能層
150 線、モード形状、モード
151 モード形状、モード
152 モード形状、モード
153 モード形状、モード
200 統合フォトニックデバイス、デバイス
201 能動デバイス、層
202 層
203 層
209 層
211 端部
220 リソグラフィ用位置合わせマーク
230 統合フォトニックデバイス
231 能動デバイス、層
232 層
233 層
239 層
241 端部
250 リソグラフィ用位置合わせマーク
260 統合フォトニックデバイス、デバイス
261 能動デバイス、層、構造物
262 層
263 層、構造物、導波路
269 層
271 端部
280 リソグラフィ用位置合わせマーク
285 角度
290 角度
301 機能層、層、能動層、完全貫通エッチング層
301-1 機能的サブレイヤ、層
301-2 機能的サブレイヤ、層
301-3 機能的サブレイヤ、層
301-4 機能的サブレイヤ
301-5 機能的サブレイヤ
302 機能層、層
303 機能層、層
304 機能層、層
305 機能層、層
306 機能層、層
307 機能層
308 機能層、層、平坦化層
309 金属、金属接触
310a 金属、金属接触、電気的接触
310b 金属、金属接触、電気的接触
312 クラッド
350 光モード
400 統合フォトニックデバイス
401 機能層
402 機能層
403 機能層
404 機能層
405 機能層
406 機能層
407 機能層
408 機能層
409 機能層
450 モード
451 モード
452 モード
453 モード
Claims (20)
- デバイスであって、
共通の基板上に製造される第1の要素、第2の要素、第3の要素、および第4の要素を備え、
前記第1の要素が第1の光モードをサポートする能動導波路構造物を備え、前記第2の要素が第2の光モードをサポートする受動導波路構造物を備え、前記第1の要素に少なくとも部分的に突き合わせ結合される、前記第3の要素が、中間光モードをサポートする中間導波路構造物を備え、第4の要素が、前記第1の要素に取り付けられるTCO材料を備え、かつ、電気的接触、電流拡散、および、前記第1の要素の表面と比較して改善した接触用の表面を提供し、かつ、前記第4の要素が前記第1の要素と前記第2の要素との間に配置され、
前記第1の光モードが、所定の量を超えて前記第2の光モードと異なる場合、前記第2の要素および前記第3の要素のうちの少なくとも1つの先細導波路構造物が、前記第2の光モードと前記中間光モードのうちの1つとの間の効率的な断熱変換を容易にし、
前記中間光モードのいずれかと前記第1の光モードとの間で断熱変換が生じず、
前記第1の要素、前記第2の要素、および前記第3の要素の相互の位置合わせが、前記第1の要素、前記第2の要素、前記第3の要素、および前記第4の要素を製造する処理ステップの期間中に形成される層間の正確な位置合わせを容易にするリソグラフィ用位置合わせマークを使用して規定される、デバイス。 - 前記第3の要素の下面が、平坦である、請求項1に記載のデバイス。
- 前記第1の要素と前記第3の要素との間の界面が、反射を最小化するように最適化された角度に傾けられている、請求項1に記載のデバイス。
- 少なくとも1つの傾けられた前記界面上に堆積される反射防止コーティング層をさらに備える、請求項3に記載のデバイス。
- 前記第1の要素が、GaNベースの半導体層を備える、請求項1に記載のデバイス。
- 前記第2の要素の屈折率が、1.6と2.45の間である、請求項1に記載のデバイス。
- 前記第2の要素が、SiNベースの材料を備える、請求項1に記載のデバイス。
- 前記第3の要素の屈折率が、1.55と2.15の間であり、前記第2の要素の前記屈折率より低い、請求項6に記載のデバイス。
- 前記能動導波路構造物を備える前記第1の要素が、少なくとも3つのサブレイヤを有し、
前記能動導波路構造物中の前記サブレイヤのうちの少なくとも1つがn型接触層を備え、前記能動導波路構造物中の前記サブレイヤのうちの少なくとも1つが能動領域を備え、前記能動導波路構造物中の前記サブレイヤのうちの少なくとも1つがp型接触層を備える、請求項1に記載のデバイス。 - 前記サブレイヤのうちの少なくとも1つが、エッチング停止層を備える、請求項9に記載のデバイス。
- 前記第1の要素が、光モード閉込め、及び、前記第4の要素上の金属接触を形成するようにエッチングされている、請求項9に記載のデバイス。
- 共通の基板上に製造される第1の要素、第2の要素、第3の要素、および第4の要素を備え、
前記第1の要素が第1の光モードをサポートする能動導波路構造物を備え、前記第2の要素が第2の光モードをサポートする受動導波路構造物を備え、前記第1の要素に少なくとも部分的に突き合わせ結合される、前記第3の要素が、中間光モードをサポートする中間導波路構造物を備え、第4の要素が前記第1の要素に取り付けられるTCO材料を備え、かつ、電気的接触、電流拡散、および、前記第1の要素の表面と比較して改善した接触用の表面を提供し、かつ、前記第4の要素が前記第1の要素と前記第2の要素との間に配置され、
前記第3の要素が前記第2の要素についてのクラッドを実現し、
前記第1の光モードが、所定の量を超えて前記第2の光モードと異なる場合、前記第2の要素中の先細導波路構造物が、前記第2の光モードと前記中間光モードのうちの1つとの間の効率的な断熱変換を容易にし、
前記中間光モードのいずれかと前記第1の光モードとの間で断熱変換が生じず、
前記第1の要素、前記第2の要素、および前記第3の要素の相互の位置合わせが、前記第1の要素、前記第2の要素、前記第3の要素、および前記第4の要素を製造する処理ステップの期間中に形成される層間の正確な位置合わせを容易にするリソグラフィ用位置合わせマークを使用して規定される、デバイス。 - 前記第3の要素の下面が、平坦である、請求項12に記載のデバイス。
- 前記第1の要素と前記第3の要素との間の界面が、反射を最小化するように最適化された角度に傾けられている、請求項12に記載のデバイス。
- 少なくとも1つの傾けられた前記界面上に堆積される反射防止コーティング層をさらに備える、請求項14に記載のデバイス。
- 前記第1の要素が、GaNベースの半導体層を備える、請求項12に記載のデバイス。
- 前記第2の要素の屈折率が、1.6~2.45である、請求項12に記載のデバイス。
- 前記第2の要素が、SiNベースの材料を備える、請求項12に記載のデバイス。
- 前記第3の要素の屈折率が、1.55~2.15であり、前記第2の要素の前記屈折率より低い、請求項17に記載のデバイス。
- 前記第2の要素が、AlNベースの材料を備える、請求項1に記載のデバイス。
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US17/738,608 US20230361534A1 (en) | 2022-05-06 | 2022-05-06 | Heterogeneous gan lasers and active components |
US17/738,608 | 2022-05-06 |
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JP2011096981A (ja) | 2009-11-02 | 2011-05-12 | Panasonic Corp | 窒化物半導体光機能素子 |
US20190115496A1 (en) | 2017-10-17 | 2019-04-18 | Lumileds Llc | Nano-photonics reflector for led emitters |
JP2019204904A (ja) | 2018-05-24 | 2019-11-28 | 日本電信電話株式会社 | 半導体光モジュール |
US20200284979A1 (en) | 2019-01-23 | 2020-09-10 | Hyundai Park | Integrated active devices with improved optical coupling between active and passive waveguides |
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US11480734B2 (en) * | 2019-09-25 | 2022-10-25 | Nexus Photonics, Inc | Active-passive photonic integrated circuit platform |
US11209592B2 (en) * | 2020-06-02 | 2021-12-28 | Nexus Photonics Llc | Integrated active devices with enhanced optical coupling to dielectric waveguides |
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JP2011096981A (ja) | 2009-11-02 | 2011-05-12 | Panasonic Corp | 窒化物半導体光機能素子 |
US20190115496A1 (en) | 2017-10-17 | 2019-04-18 | Lumileds Llc | Nano-photonics reflector for led emitters |
JP2019204904A (ja) | 2018-05-24 | 2019-11-28 | 日本電信電話株式会社 | 半導体光モジュール |
US20200284979A1 (en) | 2019-01-23 | 2020-09-10 | Hyundai Park | Integrated active devices with improved optical coupling between active and passive waveguides |
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