JP7388921B2 - Evaporated filter for UV LED - Google Patents

Description

The present invention relates to an ultraviolet irradiation device that irradiates ultraviolet rays, and an ultraviolet flaw detection device that irradiates the surface of an object to be inspected with ultraviolet rays to analyze the surface condition of the object. The present invention relates to a vapor-deposited filter for ultraviolet LEDs used for excitation of phosphors in penetrant testing and the like.

BACKGROUND ART Magnetic particle testing and penetrant testing, which are types of nondestructive testing methods, are known as flaw detection tests on the surface of objects to be inspected, such as steel materials. In a magnetic particle flaw detection test, magnetic particles or a magnetic powder solution containing magnetic particles are applied to the surface of an object to be inspected, and the object to be inspected is magnetized by, for example, applying a magnetic field to the object. Since magnetic flux concentrates on defects such as cracks on the surface of the object to be inspected, magnetic particles are attracted to this magnetic flux and an indication pattern is formed by the magnetic particles. Defects are then inspected by observing this magnetic particle indicating pattern. Magnetic particle flaw detection tests include fluorescent magnetic particle flaw detection tests that use fluorescent magnetic particles containing fluorescent material in the magnetic particles in order to improve defect detection accuracy.

On the other hand, in penetrant testing, a penetrating liquid is first applied to the surface of the object to be inspected, and the penetrating liquid is allowed to penetrate into defects such as cracks on the surface. Next, excess penetrating liquid adhering to the surface is removed, developer powder is applied to the surface, and the penetrating liquid that has penetrated into the defects is sucked out to the surface by capillary action. Defects are then inspected by observing the penetrating pattern caused by the sucked up penetrating liquid. Penetrant testing includes fluorescent penetrant testing that uses a fluorescent penetrant liquid containing a phosphor to improve defect detection accuracy.

When using fluorescent magnetic particles or a fluorescent penetrant liquid in a magnetic particle flaw detection test or a penetrant test, it is necessary to irradiate the object to be inspected with ultraviolet rays to excite the fluorescent substance contained in the fluorescent magnetic powder or the fluorescent penetrant liquid. An ultraviolet irradiation device that irradiates ultraviolet light is known for use in this ultraviolet flaw detection test. .

Since LEDs are basically point light sources, it is difficult to obtain a uniform light distribution, which leads to variations in the detection of defects such as cracks on the surface of the object to be inspected, resulting in a problem in that inspection accuracy is reduced. For this reason, it is possible to obtain high UV irradiance and uniform UV irradiance distribution by arranging many LEDs in a line as a light source, but it is difficult to obtain uniform light distribution because it is a collection of circular light distributions. Since a large number of LEDs are required, a problem arises in that the cost increases.
When performing magnetic particle testing or penetrant testing using ultraviolet rays, it is necessary to attach a visible light cut filter and an ultraviolet transmission filter to the ultraviolet irradiation equipment to prevent the visual field of the person conducting the inspection from being blocked by visible light. Common. Visible light generally has a wavelength of 400 to 700 nanometers, and by blocking only this portion and allowing the ultraviolet rays to pass, the above-mentioned high ultraviolet radiation intensity and uniform light distribution can be obtained. However, when a visible light cut filter and an ultraviolet transmission filter were used, it was only possible to gradually lower the transmittance over a wavelength range of 375 to 400 nanometers. In order to lower the transmittance, the energy of ultraviolet light in the wavelength range of 25 nanometers is consumed in order to gradually lower the transmittance. Therefore, energy is lost in the ultraviolet light in the 375 to 400 nanometer range, and the challenge has been whether the transmittance can be drastically lowered just before 400 nanometers and in a shorter wavelength range.

Patent Document 1 discloses a visible light cut filter that blocks incident light in the visible light region and has a transmission band in the near-infrared region, and includes a transparent substrate and a surface of the transparent substrate. A front light-shielding film formed on the back surface of the light-transmitting substrate, and a back light-shielding film formed on the back surface of the transparent substrate, each of which divides the visible light region into a plurality of regions. Sometimes, a light-shielding film is laminated to block light from each region. Light-shielding films that divide the visible light region into multiple regions and block light from each region are laminated on both the front and back sides of the translucent substrate, so ripples generated in the visible light region are The light shielding film can further attenuate the light and suppress the occurrence of ripples. The front light shielding film and the back light shielding film are short wavelength light shielding multilayers in which the visible light region is divided into three regions, and films that shield light from the short wavelength end to the long wavelength side of the visible light region are laminated. a long-wavelength light-shielding multilayer film in which a film is laminated with a film that blocks light in a region from the long-wavelength end to the short-wavelength side of the visible light region; and a long-wavelength light-shielding multilayer film in the region where the short-wavelength light-shielding multilayer film blocks light. , the short wavelength end of the region where the long-wavelength light-shielding multilayer film blocks light, and an intermediate wavelength light-shielding multilayer film that blocks light in the region including can be reduced. In the visible light cut filter, the front light shielding film and the back light shielding film are each made of a plurality of alternately laminated high refractive index materials and low refractive index materials, and the high refractive index materials include ZrO2, TiO2 , Nb2O5, and Ta2O5, and the low refractive index material includes at least one of SiO2 and MgF2.

Although Patent Document 1 is useful for cutting visible light, it does not give much consideration to ultraviolet transmittance. In addition, regarding the control of ultraviolet transmittance, it is only said that it is controlled to eliminate the pulsation of the filter characteristics, and the undulating part that cannot be cut by filters in this wavelength band is effectively utilized, It has not been possible to sharply lower the transmittance at this wavelength and utilize this portion of ultraviolet light.

JP2016-186531

Therefore, we developed a filter that can utilize the energy of ultraviolet light with a wavelength of 400 nanometers or less without wasting it by rapidly lowering the transmittance while maintaining the transmittance as high as possible for the beam with a wavelength of less than 400 nanometers. development was desired.

An object of the present invention is to provide an ultraviolet LED vapor deposition device that can more efficiently achieve high ultraviolet irradiance in the irradiation area of the irradiated surface and improve the accuracy of ultraviolet flaw detection in an ultraviolet irradiation device that irradiates ultraviolet rays for ultraviolet flaw detection. Provide filters.

In order to solve the above problems, in the vapor-deposited filter for ultraviolet LEDs of the present invention, in which the vapor-deposited filter for ultraviolet LEDs removes visible light from the beam emitted from the ultraviolet irradiation device, the vapor-deposited filter for ultraviolet LEDs includes a first light-transmitting filter. a transparent substrate and a second transparent substrate, and when the incident angle of the beam is 0 degrees to 20 degrees, the beam is applied to the upper and lower surfaces of the first transparent substrate, and the beam has a diameter of 355 nanometers to 375 nanometers. A vapor deposited film having a transmittance of 95% at a wavelength of 100 nm, a transmittance of 10% or less at a wavelength of 400 nm, and a transmittance of 1% or less at a wavelength of 410 nm to 500 nm is deposited, When the incident angle of the beam is between 0 degrees and 20 degrees, the beam has a transmittance of 95% at a wavelength of 355 nm to 375 nm, and a wavelength of 500 nm to 600 nm. A vapor-deposited film having a transmittance of 1% or less in One of the vapor-deposited films having a transmittance of 1% or less at a wavelength of nanometers to 700 nanometers is vapor-deposited, and the other one is vapor-deposited on the lower surface of the second transparent substrate. It is characterized by

Further, in the vapor-deposited filter for ultraviolet LEDs according to the present invention, the vapor-deposited filter for ultraviolet LEDs further includes a spacer containing a sealant between the first light-transmitting substrate and the second light-transmitting substrate, It is characterized by being provided all around the circumference.

Further, a separation distance between the first light-transmitting substrate and the second light-transmitting substrate is 0.1 mm to 20 mm.

In the vapor-deposited filter for ultraviolet LEDs according to the present invention, in the vapor-deposited filter for ultraviolet LEDs for removing visible light from the beam emitted from the ultraviolet irradiation device, the vapor-deposited filter for ultraviolet LEDs includes a first transparent substrate and a second transparent substrate. The first transparent substrate has a transmittance of 95 on the upper and lower surfaces of the first transparent substrate at a wavelength of 355 nm to 375 nm when the incident angle of the beam is 0 degrees to 20 degrees. %, a vapor deposition film having a transmittance of 10% or less at a wavelength of 400 nanometers and a transmittance of 1% or less at a wavelength of 410 nm to 500 nanometers is deposited on the upper surface of the second transparent substrate. When the incident angle of the beam is between 0 degrees and 20 degrees, the beam has a transmittance of 95% at a wavelength of 355 nanometers to 375 nanometers and a transmittance of less than 1% at a wavelength of 500 nanometers to 600 nanometers. When the incident angle of the beam is 0 degrees to 20 degrees, the transmittance is 95% at a wavelength of 355 nanometers to 375 nanometers, and when the beam wavelength is 600 nanometers to 700 nanometers. One of the vapor deposited films having a transmittance of 1% or less at the wavelength is vapor deposited, and the other one is vapor deposited on the lower surface of the second light-transmitting substrate. It is possible to sufficiently cut harmful light as before, and the transmittance can be rapidly lowered from around 385 nm to 400 nm, so the part from 375 nm to around 385 nm can be cut. This increases the UV irradiance and improves visibility. Furthermore, since the transmittance in the effective wavelength range increases over a wide range, the number of ultraviolet LEDs used in the ultraviolet flaw detection lamp can be reduced.
Also, the loss of ultraviolet light is reduced. The lifespan of an ultraviolet LED is assumed to be around 70% when the ultraviolet irradiance is 100% for a new LED. By reducing the loss of ultraviolet light, the ultraviolet transmittance of the vapor-deposited filter for ultraviolet LEDs is high even at an ultraviolet irradiance of 70% or less, for example around 67%, so the ultraviolet irradiation device as a whole can maintain an effective ultraviolet irradiance. Therefore, the frequency of maintenance of the ultraviolet irradiation device itself is reduced, and its lifespan is increased. Furthermore, since an incident angle in the range of 0 degrees to 20 degrees can be used, the degree of freedom in design is expanded.

Further, in the vapor-deposited filter for ultraviolet LEDs according to the present invention, the vapor-deposited filter for ultraviolet LEDs further includes a spacer containing a sealant between the first light-transmitting substrate and the second light-transmitting substrate, Since it is characterized by being provided around the entire circumference, if the filter surface becomes dirty, the effectiveness of the vapor deposited film will decrease, and it is possible to prevent dust, mist, moisture, etc. from entering between the vapor deposited filters, and to prevent the intrusion of dust, mist, moisture, etc. By providing a space between the light-transmitting substrate and the second light-transmitting substrate, interference of incident light can be suppressed, and the function of the vapor-deposited filter for ultraviolet LED can be made effective.

Furthermore, the vapor-deposited filter for ultraviolet LEDs according to the present invention is characterized in that the separation distance between the first light-transmitting substrate and the second light-transmitting substrate is 0.1 mm to 20 mm. It is possible to reduce manufacturing costs and prevent interference of incident light.

BRIEF DESCRIPTION OF THE DRAWINGS It is a perspective view which showed an example of embodiment of the vapor deposition filter for ultraviolet LED which concerns on this invention. It is a top view of the vapor deposition filter for ultraviolet LED of FIG. FIG. 2 is a sectional view taken along the line XX of the vapor-deposited filter for ultraviolet LEDs in FIG. 1. FIG. It is a figure showing the spectral characteristics of a conventional product. It is a figure showing the spectral characteristic of the vapor deposition filter for ultraviolet LED concerning the present invention.

FIG. 1 is a perspective view showing an example of the embodiment of the vapor-deposited filter for ultraviolet LEDs according to the present invention, and FIG. 2 is a top view of the vapor-deposited filter for ultraviolet LEDs according to the present invention shown in FIG. 3 is a sectional view taken along the line XX shown in FIG. 1 of the vapor-deposited filter for ultraviolet LED in FIG. FIG. 4 is a graph showing the spectral characteristics of a conventional ultraviolet transmission and visible light cut filter that does not have the features of the present invention, and FIG. 5 is a graph showing the spectral characteristics of a vapor-deposited filter for ultraviolet LEDs according to the present invention. This is a graph.

DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of a vapor-deposited filter for ultraviolet LEDs according to the present invention will be described in detail with reference to FIG. The vapor deposition filter 1 for ultraviolet LEDs includes a first transparent substrate 10 and a second transparent substrate 20. The first transparent substrate 10 and the second transparent substrate 20 have a gap therebetween, which is secured by a spacer 4 containing a sealant. The spacer 4 contains a sealant that prevents dust, mist, moisture, etc. from entering the space between the first transparent substrate 10 and the second transparent substrate 20. As the sealant, it is preferable to use silicone resin, and as the material of the spacer, it is preferable to use aluminum or stainless steel (SUS), but the material is not limited to these, and any known material can be used. I can do it. In addition, the spacer 4 has the function of suppressing interference of incident light by maintaining a distance between the first transparent substrate 10 and the second transparent substrate 20.

FIG. 2 shows a top view of the embodiment of the vapor deposition filter for ultraviolet LEDs according to the present invention shown in FIG. Although the inner side of the spacer 4 is shown by a dotted line, it is preferable that the spacer 4 is provided over the entire circumference. This is more effective in preventing the intrusion of dust, mist, moisture, etc.
FIG. 3 is a cross-sectional view taken along the line XX shown in FIG. 1 of the embodiment of the vapor deposition filter for ultraviolet LEDs according to the present invention shown in FIG. The first transparent substrate 10 has a vapor deposited film 11 deposited on its upper surface. The vapor deposition referred to in the present invention includes physical vapor deposition (PVD), chemical vapor deposition (CVD), and vacuum vapor deposition among physical vapor deposition, and any method thereof may be used. Further, the first transparent substrate 10 has a vapor deposited film 12 deposited on its lower surface. The first light-transmitting substrate 10 may be made of a material that allows light to pass through, such as glass. The deposited films 11 and 12 both have a transmittance of 95% at a beam wavelength of 355 nm to 375 nm and a transmittance at a wavelength of 400 nm when the incident angle of the beam is between 0 degrees and 20 degrees. It is formed by depositing a light-shielding film having a transmittance of 1% or less at wavelengths of 410 to 500 nanometers. By forming two identical light-shielding films as vapor-deposited films 11 and 12 on both sides of the first light-transmitting substrate 10, as shown in FIG. When the transmittance was lowered from around 385 nanometers to 400 nanometers, the transmittance was suddenly lowered from around 385 nanometers to 400 nanometers, and 10 nanometers worth of ultraviolet light could be utilized without being blocked. , is suitable.

Moreover, the spacer 4 is suitable in that it can provide a separation distance X between the vapor deposited film 12 and the vapor deposited film 21. The separation distance X is preferably 0.1 mm to 20.0 mm. It is sufficient that the distance is at least 1.2 micrometers or more, but this is not the case if the flatness of the first transparent substrate 10, the second transparent substrate 20, and the vapor deposited films 12 and 21 thereof is not high. However, in order to ensure that the distance between the surfaces is 1.2 micrometers apart in all parts, it is preferable that the distance between the surfaces is 0.1 millimeter or more. Further, from the viewpoint of manufacturing cost, if the thickness is 20.0 mm or more, the manufacturing cost will double or more, so it is more preferable that the thickness is 20.0 mm or less. Moreover, if the separation distance X is less than 1.2 micrometers, interference of incident light will occur, which is not preferable.
Further, since the vapor deposited films 11 and 12 can utilize ultraviolet light having a beam incidence angle of 0 degrees to 20 degrees, a degree of freedom in design can be ensured, which is preferable.

Next, the vapor deposited films 21 and 22 of the second transparent substrate 20 will be described in detail. The second light-transmitting substrate 20 may be made of a material that allows light to pass through, such as glass. The vapor deposited films 21 and 22 are formed by vapor deposition on the upper surface and the lower surface of the second transparent substrate 20, respectively. Either of the vapor deposited films 21 and 22 may be on the upper surface or the lower surface of the second light-transmitting substrate 20. Although the vapor deposited film 21 is shown on the top surface and the vapor deposited film 22 on the bottom surface, for example, the vapor deposition film 21 may be on the bottom surface and the vapor deposition film 22 may be on the top surface.
The vapor-deposited film 21 has a transmittance of 95% at a beam wavelength of 355 nm to 375 nm and a transmittance of 1 at a wavelength of 500 nm to 600 nm when the incident angle of the beam is 0 degrees to 20 degrees. It is formed by vapor deposition of less than 1% of the properties. The vapor deposited film 22 has a transmittance of 95% at a wavelength of 355 nm to 375 nm when the incident angle of the beam is 0 degrees to 20 degrees, and when the beam wavelength is 600 nm to 700 nm. It is formed by vapor-depositing a material having a transmittance of 1% or less. All of these are based on known techniques.

In the conventional product (D-10B) that uses a metal halide lamp, a UV transmission filter blocks most of the visible light of 400 to 700 nanometers, and a visible light cut filter blocks the remaining visible light that passes through. . It also transmits ultraviolet light (300 to 400 nanometers), but there is a problem in that the ultraviolet transmittance at 365 nanometers is as low as about 75% (reference value).
By using the present invention, the spectral characteristics become perpendicular from light blocking to transmission in the range of 25 nanometers from 375 to 400 nanometers, and the spectral characteristics become vertical from light blocking to transmission in the range of 25 nanometers from 375 to 400 nanometers, and from 355 nanometers to 375 nanometers in the range of incident angles from 0 degrees to 20 degrees. It can easily transmit 90 percent of ultraviolet light in the nanometer range. Therefore, the ultraviolet transmittance at 365 nanometers is approximately 90%, and the ultraviolet irradiance of the ultraviolet flaw detection lamp can be increased compared to conventional products. In addition, by layering two areas of vapor deposited films that block incident light in the visible light range (400 to 450 nanometers) on both sides of the first transparent substrate 10 in the form of vapor deposited films 11 and 12, The visible light transmittance of 450 nanometers can be reduced to 1% or less, and by layering one area each of the vapor-deposited films 21 and 22 on the second light-transmitting substrate 20, the transmittance of 450 to 700 nanometers can be reduced to 1% or less. It can be less than 1%. By combining two multifaceted evaporated filters, the visible light transmittance of 400 to 700 nanometers, which is harmful to inspection, can be reduced to less than 1%, making it comparable to conventional products. Incidentally, the vapor deposited films 11, 12, 21, and 22 in the present invention are all formed by alternately laminating a plurality of layers of Ta2O5 (tantalum pentoxide) and SiO2 (silicon dioxide).

The ultraviolet LED vapor deposition filter 1 according to this embodiment is used by applying a beam from above in FIG. 3, that is, from the vapor deposition film 11 side, and by passing the beam downward, that is, from the vapor deposition film 22 side. Further, in the ultraviolet irradiation device, it is desirable to use the ultraviolet light irradiation device by fixing it to the emission port by any method. It is preferable to use an ultraviolet LED as the light source of the ultraviolet irradiation device.

The transmittance specifications (incident angle: 0 degrees to 20 degrees) of the multifaceted evaporated filter are as follows.
- Light shielding film (A side) used for vapor deposited films 11 and 12: 355-375 nanometers (transmittance = 95%), 400 nanometers (transmittance = 10% or less), 410-500 nanometers (transmittance = 1% or less)
- Light-shielding film (B side) used in the vapor deposited film 21: 355-375 nanometers (transmittance = 95%), 500-600 nanometers (transmittance = 1% or less)
- Light-shielding film (C side) used in the vapor deposited film 22: 355-375 nanometers (transmittance = 95%), 600-700 nanometers (transmittance = 1% or less)
・Specifications for light shielding and ultraviolet transmission only in the first transparent substrate 10
A side + A side: 355-375 nm (transmittance = 95%), 400 nm (transmittance = 1% or less), 410-500 nm (transmittance = 0.01% or less)
・Specifications for light shielding and ultraviolet transmission only in the first transparent substrate 10 B side + C side: 355-375 nanometers (transmittance = 95%), 500-700 nanometers (transmittance = 1% or less)
・Light shielding and transmittance prediction for the first light-transmitting substrate 10 and the second light-transmitting substrate 20 (each having vapor deposited films 11, 12, 21, and 22) ・(Side A+Side A)+(Side B) +C plane): 355-375 nanometers (transmittance = 90%), 400 nanometers (transmittance = 1% or less),
410-500 nanometers (transmittance = 0.01% or less), 500-700 nanometers (transmittance = 1% or less)
*Wavelength: 90% transmittance at 365 nanometers

EXAMPLES The present disclosure will be explained in more detail and specifically by showing examples below. However, the present disclosure is not limited to the following examples.

[Example 1]
An ultraviolet irradiation device equipped with a vapor-deposited filter 1 for ultraviolet LEDs according to the present embodiment shown in FIG. 1 etc. was used. The vapor-deposited filter 1 for ultraviolet LEDs includes a first transparent substrate 10 and a second transparent substrate 20 made of glass. On the A side, films of 355-375 nm (transmittance = 95%), 400 nm (transmittance = 10% or less), and 410-500 nm (transmittance = 1% or less) are formed, A vapor deposited film 21 is formed on the upper surface of the second light-transmitting substrate 20, and the vapor deposited film 21 has B-sides of 355-375 nanometers (transmittance = 95%) and 500-600 nanometers (transmittance = 95%). A vapor deposited film 22 is formed on the lower surface of the second transparent substrate 20, and the vapor deposited film 22 has a C-plane of 355 to 375 nanometers (transmittance = 95%) and 600-700 nanometers (transmittance = 1% or less) were used. A spacer 4 was provided in a strip shape over the previous week between the first transparent substrate 10 and the second transparent substrate 20. The distance X, which is the thickness of the spacer and is the distance between the vapor deposited film 12 deposited on the first transparent substrate 10 and the vapor deposited film 21 deposited on the second transparent substrate 20, is 0.1. It was millimeters. All of the deposited films are formed by alternately laminating multiple layers of Ta2O5 (tantalum pentoxide) and SiO2 (silicon dioxide), and the features of the present invention such as being used in an ultraviolet flaw detection lamp equipped with an LED light source and the above conditions are met. It was also equipped with

Comparative Example 1 was tested using a conventional filter. The conditions were the same as in Examples, such as using an ultraviolet flaw detection lamp equipped with an ultraviolet LED light source. A conventional filter manufactured by Marktec (D-10B) was used. Transmission at 365 nanometers was specified as 75 percent.

<Evaluation method>
An ultraviolet transmittance test was conducted using Example 1 and Comparative Example 1. An ultraviolet-visible spectrometer UV-2450 manufactured by Shimadzu Corporation was used to measure the spectral characteristics. As a result, the results shown in FIG. 4 were obtained in Comparative Example 1, and the results shown in FIG. 5 were obtained in Example 1. In Comparative Example 1, the slope of the line where the transmittance decreases was relatively gentle from 375 nanometers to 400 nanometers. Calculated, the slope is 90/5 x 100 ≒ 6 in the example, whereas the slope in the comparative example is 85/25 x 100. 100≒29. Therefore, it was shown that the example was able to sharply lower the transmittance before 400 nanometers.

The present disclosure can be suitably used for an ultraviolet irradiation device that irradiates ultraviolet rays and an ultraviolet flaw detection device that includes an ultraviolet irradiation device. However, the present disclosure is not limited to the embodiments and examples described above. The vapor-deposited filter for ultraviolet LEDs of the present disclosure is useful for all tests and inspections that utilize ultraviolet light, such as contamination checks, leakage tests, and confirmation of degreasing and cleaning. Further, the ultraviolet flaw detection device of the present disclosure is not limited to a fluorescent magnetic particle flaw detection device, but may be a penetrant flaw detection device that uses a fluorescent penetrating liquid to detect defects on the surface of an object to be inspected, and may also be a penetrant flaw detection device that uses ultraviolet light. It can be applied to any type of ultraviolet flaw detection equipment that detects defects.

1 Deposited filter for ultraviolet LED 4 Spacer 10 First transparent substrate 11, 12, 21, 22 Deposited film 20 Second transparent substrate

Claims (3)

In a vapor-deposited filter for ultraviolet LEDs for removing visible light from a beam emitted from an ultraviolet irradiation device, the vapor-deposited filter for ultraviolet LEDs includes a first light-transmitting substrate and a second light-transmitting substrate; The upper and lower surfaces of the transparent substrate have a beam transmittance of 95% at a wavelength of 355 nm to 375 nm and a transmittance of 400 nm at a wavelength of 400 nm when the incident angle of the beam is between 0 degrees and 20 degrees. Depositing a vapor-deposited film having a property of 10% or less and a transmittance of 1% or less at a wavelength of 410 nanometers to 500 nanometers,
The upper surface of the second transparent substrate has a beam transmittance of 95% at a wavelength of 355 nm to 375 nm and a wavelength of 500 nm to 600 nm when the incident angle of the beam is 0 degrees to 20 degrees. A vapor deposited film with a transmittance of 1% or less at a wavelength of 1000 nm, or a film with a transmittance of 95% at a wavelength of 355 nm to 375 nm when the incident angle of the beam is 0 degrees to 20 degrees, and the beam One of the vapor-deposited films having a transmittance of 1% or less at a wavelength of 600 nm to 700 nm is vapor-deposited, and the other one is vapor-deposited on the lower surface of the second transparent substrate. A vapor-deposited filter for ultraviolet LEDs characterized by being formed by vapor-deposition. The vapor-deposited filter for ultraviolet LEDs further comprises a spacer containing a sealant provided between the first light-transmitting substrate and the second light-transmitting substrate over the entire circumference. 1. The vapor deposition filter for ultraviolet LEDs according to 1. The vapor-deposited filter for ultraviolet LEDs according to claim 1, wherein a distance between the first light-transmitting substrate and the second light-transmitting substrate is 0.1 mm to 20 mm. .

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