JP7352061B2 - Sintered ore cooling equipment - Google Patents

Description

The present invention relates to a sintered ore cooling device for cooling sintered ore.

Conventionally, sintered ore cooling devices for cooling high-temperature sintered ore supplied from a sintering machine are known. For example, Patent Document 1 describes a ring-shaped deposition tank in which sintered ore from a sintering machine is deposited from above and discharged from the lower outer periphery; A sintered ore cooling device is disclosed that includes a plurality of ventilation ducts arranged in a row, and a plurality of central louver sections arranged in an annular shape connecting adjacent ventilation ducts. This sintered ore cooling device takes in outside air from the ventilation duct, supplies the taken air from between the louvers in the central louver section to the lower center of the sedimentation tank, and then flows the sintered ore deposited in the sedimentation tank from below to above. The air is passed through the sintered ore to cool the entire sintered ore.

Japanese Patent Application Publication No. 2008-232519

The present inventors newly discovered the following problem. In other words, when a sintered ore discharge port is provided at the bottom of either the outer peripheral wall or the inner peripheral wall of the sedimentation tank, the speed at which the sintered ore flows downward is relatively low on the side of the peripheral wall where the discharge port is provided. Therefore, the time it takes to reach the discharge port, in other words, the residence time in the sedimentation tank tends to be short. On the other hand, on the side of the peripheral wall where the discharge port is not provided, the speed at which the sintered ore flows downward is relatively slow, and the residence time tends to be long. If the distribution of flow velocity in the deposition tank becomes uneven in this way, there is a possibility that the cooling performance will deteriorate. That is, on the side where the flow rate is fast, the sintered ore becomes insufficiently cooled, while on the side where the flow rate is slow, the sintered ore becomes supercooled. As a result, the temperature of the discharged sintered ore may vary.

Therefore, the present invention has been made in view of the above problems, and an object of the present invention is to provide a new and improved sintered ore cooling device that can suppress deterioration of cooling performance. It's about doing.

In order to solve the above problems, according to one aspect of the present invention, there is provided a sintered ore cooling device for cooling sintered ore, in which sintered ore from a sintering machine is supplied from an upper part and deposited. , the cooling gas is supplied from the lower part and passes between the deposited sintered ore to the upper part, and the sintered ore cooled by the cooling gas is passed through the lower part of either the outer peripheral wall or the inner peripheral wall. an annular deposition tank that discharges from an outlet provided in the deposition tank, and a gas introduction member that is arranged inside the deposition tank to extend in the circumferential direction of the deposition tank and introduces cooling gas into the inside of the deposition tank, Of the outer peripheral wall and the inner peripheral wall, the peripheral wall without a discharge port is defined as the first peripheral wall, and the peripheral wall provided with the discharge port is defined as the second peripheral wall. Among the concretion passages, the passage that includes the space between the first peripheral wall and the gas introduction member and communicates with the discharge port is defined as the first flow passage, and the passage that includes the space between the second peripheral wall and the gas introduction member is defined as the first flow passage. When the passage communicating with the discharge port is the second flow passage, the difference between the flow velocity of the sintered ore in the first flow passage and the flow velocity of the sintered ore in the second flow passage is within a predetermined range, A sintered ore cooling device is provided, which is provided with a gas introduction member.

The gas introduction member may be provided such that the shortest distance between the first peripheral wall and the gas introduction member is greater than the shortest distance between the second peripheral wall and the gas introduction member.

The side surface of the gas introduction member facing the first peripheral wall may be provided so as to be inclined with respect to the vertical direction so as to move away from the first peripheral wall from the top to the bottom.

The side surface of the gas introducing member that faces the second peripheral wall may be inclined with respect to the vertical direction toward the second peripheral wall from the top to the bottom.

The lower surface of the gas introduction member may be provided to be inclined with respect to the horizontal direction so as to be directed downward as it goes from the first peripheral wall side to the second peripheral wall side.

The upper surface of the gas introducing member may be provided so as to be inclined with respect to the horizontal direction so as to be directed downward as it goes from the first peripheral wall side to the second peripheral wall side.

The gas introduction member is arranged such that the sinter is deposited on the upper surface of the gas introduction member in an inclined manner with respect to the horizontal direction in a downward direction from the first peripheral wall side to the second peripheral wall side. may be provided.

The ratio of the radial width of the bottom surface of the deposition tank to the vertical dimension of the discharge port may be 2.0 or less.

The ratio of the radial width of the bottom surface of the deposition tank to the shortest distance between the bottom surface of the deposition tank and the lower end of the gas introducing member may be 2.0 or less.

The lower end of the gas introduction member may be provided higher than the upper end of the discharge port.

The gas introduction member further includes a ventilation duct disposed inside the deposition tank, connected to at least one of the first peripheral wall and the second peripheral wall, and connected to the gas introduction member, to which cooling gas is supplied from outside the deposition tank, the gas introduction member being connected to the gas introduction member. , the cooling gas supplied from the ventilation duct may be provided so as to be able to be supplied toward the sintered ore.

As explained above, according to the sintered ore cooling device according to the present invention, deterioration of cooling performance can be suppressed.

FIG. 1 is an axial cross-sectional view of a sintered ore cooling device according to a first embodiment of the present invention. FIG. 3 is a top view of the sintered ore cooling device according to the same embodiment. It is a perspective view of the ventilation duct concerning the same embodiment. It is a perspective view of the louver unit concerning the same embodiment. It is an axial sectional view of the lower part of the deposition tank concerning the same embodiment. FIG. 3 is a schematic diagram of the lower part of the deposition tank according to the same embodiment viewed from above. It is an axial cross-sectional view of the lower part of the deposition tank concerning the same embodiment, and shows the flow of air and sintered ore. It is an axial cross-sectional view of the lower part of the deposition tank concerning a 2nd embodiment of the present invention. It is an axial sectional view of the lower part of the deposition tank concerning a 3rd embodiment of the present invention. It is an axial sectional view of the lower part of the deposition tank concerning a 4th embodiment of the present invention. It is an axial sectional view of the lower part of the deposition tank concerning the modification of the same embodiment. It is an axial sectional view of the lower part of the deposition tank concerning a 5th embodiment of the present invention. It is an axial sectional view of the lower part of the deposition tank concerning a 6th embodiment of the present invention.

DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments of the present invention will be described in detail below with reference to the accompanying drawings. Note that, in this specification and the drawings, components having substantially the same functional configurations are designated by the same reference numerals and redundant explanation will be omitted.

[First embodiment]
First, a schematic configuration of a sintered ore cooling device according to a first embodiment of the present invention will be described with reference to FIGS. 1 to 7. FIGS. 1 and 2 are schematic diagrams showing a schematic configuration of a sintered ore cooling device 1 according to the present embodiment. FIG. 1 shows a cross section through the sinter cooling device 1 along a plane passing through the axis 200 of the deposition tank 2. As shown in FIG. FIG. 2 is a top view of a part of the sintered ore cooling device 1 viewed from above.

The sintered ore cooling device 1 is a cooler for cooling the sintered ore 11, and includes a main body part, a scraping part, a driving part, a suction part, and a sintered ore supply part. The main body includes a deposition tank 2, a plurality of ventilation ducts 3, a plurality of louver units 4, and a bridge 5. The scraping section has a scraper 6. The drive section includes a plurality of support rollers 70 and a drive motor 71. The suction section includes a hood 80, an exhaust duct 81, a suction fan 82, and a boiler 83. The sinter supply section has a supply chute 9 . For convenience of explanation, illustration of the ventilation duct 3 and the louver unit 4 is omitted in FIG.

FIG. 3 is a schematic perspective view of the ventilation duct 3. FIG. 4 is a schematic perspective view of the louver unit 4. FIG. 5 schematically shows a partial cross section of the lower part of the main body section taken along a plane passing through the axis 200. FIG. 6 is a schematic top view of the lower part of the main body. FIG. 7 schematically shows a partial cross section of the lower part of the main body, specifically, the vicinity of the scraper 6, taken along a plane passing through the axis 200.

As shown in FIGS. 1 and 5, the deposition tank 2 has a table 20, an inner circumferential wall 21, and an outer circumferential wall 22. The table 20 is an annular bottom plate that extends around the axis 200 and extends in the horizontal direction. Hereinafter, the direction around the shaft 200 will be referred to as the circumferential direction. The radial direction centered on the shaft 200, in other words, the linear direction extending horizontally through the shaft 200 is referred to as the radial direction. On the lower surface side of the table 20, two rows of annular rails 23 are provided that extend in the circumferential direction.

The deposition tank 2 has an annular shape extending in the circumferential direction. A cross section of the deposition tank 2 taken along a plane passing through the axis 200 has an inverted trapezoidal shape surrounded by the table 20, the inner circumferential wall 21, and the outer circumferential wall 22. The inner circumferential wall 21 is an inner circumferential wall, has a lower end connected to the inner circumferential edge of the table 20, and is inclined with respect to the vertical direction so as to move upward in the radial direction (that is, toward the shaft 200 side). The outer circumferential wall 22 is an outer circumferential wall, has a lower end facing the upper surface of the table 20, and is inclined with respect to the vertical direction so as to go radially outward as it goes upward. A discharge port 24 for the sintered ore 11 is provided at the bottom of the deposition tank 2 . The discharge port 24 is not provided on the inner circumferential wall 21 but on the outer circumferential wall 22 side. The discharge port 24 is a gap between the lower end of the outer peripheral wall 22 and the upper surface of the table 20, and is provided over the entire circumference of the deposition tank 2.

As shown in FIG. 6, a plurality of openings 210 and a plurality of louvers 211 are provided at the lower part of the inner peripheral wall 21. As shown in FIG. The opening portions 210 and the louver portions 211 are provided adjacent to each other alternately in the circumferential direction of the inner peripheral wall 21 over the entire circumference of the inner peripheral wall 21 . As shown in FIG. 5, in each louver portion 211, a plurality of louvers (namely, blades) 212 extending in the circumferential direction are arranged side by side in the vertical direction. Each louver 212 is arranged so as to be inclined downward from the inside to the outside in the radial direction of the deposition tank 2. In other words, the gap between the upper and lower adjacent louvers 212 is inclined with respect to the horizontal direction so as to move downward toward the inside of the deposition tank 2.

As shown in FIG. 6, a plurality of openings 220 and a plurality of louvers 221 are provided in the lower part of the outer peripheral wall 22 above the discharge port 24. The opening portions 220 and the louver portions 221 are provided alternately adjacent to each other in the circumferential direction of the outer circumferential wall 22 over the entire circumference of the outer circumferential wall 22 . The opening 220 is located radially opposite to the opening 210 of the inner peripheral wall 21 . As shown in FIG. 5, in each louver portion 221, a plurality of louvers 222 extending in the circumferential direction are arranged in a line in the vertical direction. Each louver 222 is arranged so as to be inclined downward from the outside toward the inside in the radial direction of the deposition tank 2 . In other words, the gap between the upper and lower adjacent louvers 222 is inclined with respect to the horizontal direction so as to move downward toward the inside of the deposition tank 2.

As shown in FIGS. 5 and 6, the ventilation duct 3 is arranged inside the deposition tank 2 so as to extend in the radial direction, and is connected to the inner circumferential wall 21 and the outer circumferential wall 22. The plurality of ventilation ducts 3 are arranged side by side in the circumferential direction of the deposition tank 2. As shown in FIGS. 3 and 5, the ventilation duct 3 has an inverted trapezoidal box shape when viewed from the circumferential direction of the deposition tank 2. As shown in FIGS. As shown in FIG. 3, intake ports 30 are provided at both ends of the ventilation duct 3 in the radial direction of the deposition tank 2. The upper and lower surfaces of the ventilation duct 3 are closed, and a connection opening 31 is provided in the wide side surface of the ventilation duct 3. The ventilation duct 3 is provided with a first partition plate 331 and a second partition plate 332. Both partition plates 331 and 332 extend in the vertical direction and partition the inside of the ventilation duct 3 into four parts. The first partition plate 331 extends in the direction along the wide side surface. The second partition plate 332 is orthogonal to the first partition plate 331, partitions the inside of the ventilation duct 3, and partitions the connection opening 31 into two.

As shown in FIG. 6, one end of the ventilation duct 3 having the intake port 30 fits into an opening 210 at the bottom of the inner peripheral wall 21. As shown in FIG. The other end of the ventilation duct 3 having the intake port 30 fits into the opening 220 at the bottom of the outer peripheral wall 22 .

As shown in FIG. 4, the louver unit 4 has a box shape with closed top and bottom surfaces. A cylindrical end portion having a ventilation hole 40 is provided on two narrow side surfaces of the louver unit 4 . Louver portions 41 are provided on two wide side surfaces. The louver section 41 has a plurality of louvers 411. The louver unit 4 is provided with a first partition plate 421 and a second partition plate 422. The first partition plate 421 extends in the direction along the wide side surface, partitions the louver portions 41 provided on both wide side surfaces from each other, and partitions the ventilation opening 40 into two. The second partition plate 422 partitions the wide louver portion 41 on each side into two. The plurality of louvers 411 are arranged side by side in the vertical direction. The louver 411 is arranged so as to be inclined downward as it moves away from the first partition plate 421. In other words, the gap between the upper and lower adjacent louvers 411 is inclined with respect to the horizontal direction so as to move downward as the distance from the first partition plate 421 increases.

As shown in FIG. 6, the louver unit 4 is connected to the ventilation duct 3. The end of the louver unit 4 with the ventilation opening 40 fits into the connection opening 31 of the ventilation duct 3. This connects the ventilation port 40 to the connection opening 31. Note that the shape or position of the connection opening 31 may be changed as appropriate to match the shape or position of the ventilation hole 40. The louver unit 4 is arranged so as to connect the ventilation ducts 3 adjacent to each other in the circumferential direction of the deposition tank 2 . The plurality of louver units 4 are arranged in a ring shape that extends in the circumferential direction over the entire circumference of the deposition tank 2 as a whole. As shown in FIG. 5, the first partition plate 421 of the louver unit 4 extends in the vertical direction and is arranged along the circumferential direction of the deposition tank 2. The louver portion 41 on one side of the louver unit 4 faces the inner circumferential wall 21 , and the louver portion 41 on the other side faces the outer circumferential wall 22 . When a line that is equidistant from the inner surface of the inner peripheral wall 21 and the inner surface of the outer peripheral wall 22 and extends in the vertical direction is defined as the intermediate line 202 of the deposition tank 2, the first partition plate 421 is located closer to the outer peripheral wall 22 than the intermediate line 202. Located in That is, the louver unit 4 is disposed biased toward the outer peripheral wall 22 side. Therefore, the shortest distance W1 between the inner peripheral wall 21 and the louver unit 4 is larger than the shortest distance W2 between the outer peripheral wall 22 and the louver unit 4.

As shown in FIG. 1, the bridge 5 is provided on the inner peripheral side of the deposition tank 2 and supports the deposition tank 2. The bridge 5 is rotatably provided with respect to the foundation 50 via a bearing 51 installed on the foundation 50. The center of rotation of the bridge 5, that is, the bearing 51 overlaps with the shaft 200.

The scraper 6 is a rod-shaped member, and is inserted into the deposition tank 2 from the discharge port 24. As shown in FIGS. 2 and 7, the scraper 6 is disposed below the ventilation duct 3 and the louver unit 4 so as to extend horizontally along the radial direction of the deposition tank 2. Both side surfaces (ie, front and rear surfaces) of the scraper 6 in the circumferential direction of the deposition tank 2 extend in the vertical direction.

The plurality of support rollers 70 are arranged on the foundation 50 in two rows in an annular shape extending in the circumferential direction, and are in contact with the rails 23 of the table 20. The drive motor 71 is connected to some of the plurality of support rollers 70 and generates a force to rotate these support rollers 70 . The table 20 is rotationally driven by the frictional force between the rotationally driven support roller 70 and the rail 23, and the deposition tank 2 is rotated around the axis 200.

As shown in FIG. 2, the hood 80 has an annular shape and is arranged to cover the upper opening of the deposition tank 2. The deposition tank 2 rotates relative to the hood 80 whose position is fixed with respect to the foundation 50. One end of the exhaust duct 81 is connected to the hood 80 and communicates with the inside of the hood 80. A suction fan 82 is connected to the other end of the exhaust duct 81, as shown in FIG. The suction fan 82 sucks the air 10 inside the hood 80 through the exhaust duct 81. A boiler 83 is connected in front of the suction fan 82. Boiler 83 recovers thermal energy from high-temperature air 10 from hood 80 by performing heat exchange. Note that a seal structure is provided to prevent air 10 from leaking from the gap between the hood 80 and the upper end of the deposition tank 2. Further, a dust remover 84 is connected between the boiler 83 and the hood 80.

The supply chute 9 is arranged to penetrate the hood 80. The supply chute 9 is supplied with high-temperature sintered ore 11 before being cooled from a sintering machine. The sintered ore 11 supplied to the supply chute 9 passes through the supply chute 9, is supplied from the upper part of the deposition tank 2 into the inside of the deposition tank 2, and is deposited. Note that the supply chute 9 may be provided so that a predetermined amount of sintered ore 11 is always filled inside the supply chute 9. In this case, since the sintered ore 11 is continuously supplied from the supply chute 9 to the deposition tank 2 according to the rotation of the deposition tank 2, fluctuations in the height of the sintered ore 11 deposited in the deposition tank 2 can be suppressed. .

By suctioning the air 10 inside the hood 80 by the suction fan 82, the outside air 10 is taken into the inside of the deposition tank 2. As shown in FIG. 7, air 10 is directly taken into the deposition tank 2 through the gaps between the louvers 212 in the louver portion 211 of the inner peripheral wall 21 of the deposition tank 2. As shown in FIG. The same applies to the louver portion 221 of the outer peripheral wall 22. On the other hand, the air 10 is also taken into the deposition tank 2 through the intake port 30 of the ventilation duct 3 connected to both the peripheral walls 21 and 22. The air 10 taken into the ventilation duct 3 from the intake port 30 has its flow path divided by the partition plates 331 and 332, and then is introduced into the louver part 41 of the louver unit 4 connected to the ventilation duct 3, and then It is supplied to the inside of the deposition tank 2 via the section 41. The louver unit 4 functions as a gas introduction member that introduces air 10 into the deposition tank 2 .

External air 10 taken into the deposition tank 2 passes between the deposited sintered ore 11 and moves from the lower part of the deposition tank 2 to the upper part. During this time, the air 10 absorbs the heat of the sintered ore 11, thereby cooling the sintered ore 11. The air 10 functions as a gas (hereinafter referred to as cooling gas) for cooling the sintered ore 11 inside the deposition tank 2. The deposition tank 2 functions as a cooling tank. The high temperature air 10 that has moved into the hood 80 is exhausted from the exhaust duct 81. The cooled sintered ore 11 is continuously discharged from the discharge port 24 at the lower part of the deposition tank 2 as the deposition tank 2 rotates. That is, due to the relative movement between the deposition tank 2 and the scraper 6 in the circumferential direction of the deposition tank 2, the sintered ore 11 in the lower part of the deposition tank 2 is pushed by the scraper 6 and is discharged from the discharge port 24 to the outside of the deposition tank 2. be done. The sintered ore 11 is continuously supplied from the upper part of the deposition tank 2, cooled by heat exchange with the air 10 sucked in from the outside, sequentially descends inside the deposition tank 2, and finally scraped by the scraper 6. It will be scraped out. At this time, the sintered ore 11 inside the deposition tank 2 gradually moves downward, and while it gradually moves downward, it is cooled by the sucked external air 10, so the sintered ore 11 is efficiently cooled. In this manner, the sintered ore cooling device enables counterflow type heat exchange in which cooling gas such as air flows from the bottom to the top. Note that the cooling gas is not limited to air.

More specifically, in the circumferential direction of the deposition tank 2, the direction in which the scraper 6 advances with respect to the deposition tank 2 is defined as the front, and the direction in which the deposition tank 2 advances with respect to the scraper 6 is defined as the rear. In FIG. 2, an arrow 201 indicates the advancing direction (ie, backward) of the deposition tank 2 with respect to the scraper 6. As the deposition tank 2 rotates, the sintered ore 11 in front of the scraper 6 is pushed, and a cavity is generated behind the scraper 6. As the sintered ore 11 enters this cavity from above, a drop occurs in the interior of the deposition tank 2 in which the sintered ore 11 flows from above to below.

Next, with reference to FIG. 7, the advantages of the sintered ore cooling device 1 of this embodiment will be explained. Hereinafter, among the peripheral walls of the deposition tank 2, the inner peripheral wall 21, which is the peripheral wall where the discharge port 24 is not provided, will be referred to as the first peripheral wall 21, and the outer peripheral wall 22, which is the peripheral wall where the discharge port 24 is provided, will be referred to as the second peripheral wall 22. do. In FIG. 7, the flow of sintered ore 11 is shown by solid arrows, and the flow of air 10 is shown by dashed-dotted arrows. Inside the deposition tank 2, the passage of the sintered ore 11 flowing from the upper part toward the discharge port 24 due to the unloading, that is, the flow passage, is the first flow passage 111 and the second flow passage in the radial direction of the deposition tank 2. It is roughly divided into 112. The first flow passage 111 is a passage on the side of the first peripheral wall 21 and communicates with the discharge port 24 by changing the flow direction toward the outside in the radial direction of the deposition tank 2 at the lower part of the deposition tank 2 . The second flow passage 112 is a passage on the second peripheral wall 22 side, and communicates with the discharge port 24 at the lower part of the deposition tank 2 .

The sintered ore cooling device 1 of this embodiment includes a louver unit 4 as a gas introduction member. The louver unit 4 is arranged inside the deposition tank 2 so as to extend in the circumferential direction of the deposition tank 2. In this case, the first flow passage 111 includes a passage 111A between the first peripheral wall 21 and the louver unit 4, and a passage 111B between the table 20 and the louver unit 4, and communicates with the discharge port 24. The second flow passage 112 includes a passage between the second peripheral wall 22 and the louver unit 4 and communicates with the discharge port 24 .

A discharge port 24 is provided in the second peripheral wall 22 constituting the second flow passage 112, and the second flow passage 112 directly continues to the discharge port 24 at a lower portion. On the other hand, the first peripheral wall 21 constituting the first flow passage 111 is not provided with the discharge port 24 . The passage 111A bends downward and connects to the discharge port 24 via a passage 111B that runs along the top surface of the table 20, which is the bottom surface of the deposition tank 2. Therefore, in the lower part of the deposition tank 2, the length and direction of the flow of the sintered ore 11 toward the outside in the radial direction of the deposition tank 2, that is, toward the discharge port 24 side, are as follows: It is larger than 112. Therefore, the sintered ore 11 in the second flow path 112 has a faster flow rate than the sintered ore 11 in the first flow path 111, and the time taken to reach the discharge port 24, in other words, the time it takes to stay in the deposition tank 2. The time tends to be short, and it tends to be discharged from the discharge port 24 more quickly. On the other hand, the sintered ore 11 in the first flow path 111 has a slower flow rate and is stagnant than the sintered ore 11 in the second flow path 112, and the time it takes to reach the discharge port 24 (residence time) tends to be long, and is likely to be discharged from the discharge port 24 later.

As described above, if the distribution of the flow velocity becomes uneven in the radial direction of the deposition tank 2, there is a possibility that the cooling performance will deteriorate. That is, in the second flow path 112 where the flow speed is high, the sintered ore 11 may be insufficiently cooled, while in the first flow path 111A where the flow speed is slow, the sintered ore 11 may be in a supercooled state. As a result, the temperature of the discharged sintered ore 11 may vary. In particular, when the radial dimension of the deposition tank 2, in other words, the distance between the peripheral walls 21 and 22, is increased in order to enable cooling of a large amount of sintered ore 11, the distribution of the flow velocity in the radial direction is There is a risk that the degree of non-uniformity will increase.

On the other hand, in the sintered ore cooling device 1 of this embodiment, the difference between the flow speed of the sintered ore 11 in the first flow path 111A and the flow speed of the sintered ore 11 in the second flow path 112 is kept within a predetermined range. A louver unit 4 is provided so as to. Thereby, the flow velocity of the sintered ore 11 in the first flow passage 111A approaches the flow velocity of the sintered ore 11 in the second flow passage 112. Therefore, the distribution of the flow velocity in the radial direction of the deposition tank 2 can be made uniform, and deterioration of the cooling performance can be suppressed. The above-mentioned predetermined range of the difference in flow velocity depends on the specifications of the given deposition tank 2 (for example, the inclination of the peripheral walls 21, 22 or the distance between the peripheral walls 21, 22, etc.) and the operating conditions (for example, the sintered ore 11 and the air 10). supply route or supply amount, or rotational speed of the deposition tank 2, etc.), the speed difference may be within a range in which uniformity of the flow speed distribution is achieved to the extent that a predetermined cooling performance can be ensured.

As shown in FIG. 5, the louver unit 4 is arranged such that the shortest distance W1 between the first peripheral wall 21 and the louver unit 4 is larger than the shortest distance W2 between the second peripheral wall 22 and the louver unit 4. is provided. In this case, it becomes easy to make the minimum value of the flow path cross-sectional area of the first flow path 111A larger than the minimum value of the flow path cross-sectional area of the second flow path 112. Therefore, the resistance in the first flow path 111A can be reduced and the flow speed can be increased to approach the flow speed in the second flow path 112. In other words, the resistance in the second flow path 112 can be increased and the flow speed can be decreased to approach the flow speed in the first flow path 111A. Thereby, it becomes easy to make the difference between the flow speed of the sintered ore 11 in the first flow path 111A and the flow speed of the sintered ore 11 in the second flow path 112 within a predetermined range.

The louver unit 4 functions as a member that forms a passage for supplying air 10 as a cooling gas into the deposition tank 2 . Therefore, not only can the external air 10 be directly supplied into the deposition tank 2 from the surrounding walls 21 and 22, but also the air 10 can be supplied from the inside of the deposition tank 2 via the louver unit 4. The entire sintered ore 11 inside can be cooled more effectively. For example, even when the radial dimension of the deposition tank 2 is set large, the sintered ore 11 inside the deposition tank 2 can be effectively cooled by supplying cooling gas to the inside of the deposition tank 2 via the louver unit 4. It can be cooled to From this point of view, the gas introduction member is not limited to the louver unit 4, but may be any member that forms a passage through which cooling gas can flow. Further, the cooling gas flowing through the passage formed by the gas introduction member is not limited to air 10, and may be other gas.

The sintered ore cooling device 1 includes a ventilation duct 3. For example, the ventilation duct 3 is arranged inside the deposition tank 2 and is connected to the first peripheral wall 21 and the second peripheral wall 22, as well as to the louver unit 4. Thereby, the louver unit 4 is supported inside the deposition tank 2. Air 10 as a cooling gas is supplied to the ventilation duct 3 from outside the deposition tank 2 , and the louver unit 4 can supply the air 10 supplied from the ventilation duct 3 toward the sintered ore 11 . In this case, not only the louver parts 211 and 221 of the peripheral walls 21 and 22 but also the louver part 41 of the louver unit 4 can be used as a path for taking the air 10 into the inside of the deposition tank 2, so that the air 10 can be used as a cooling gas. Can be used effectively. By supplying air 10 from inside the deposition tank 2, the entire sintered ore 11 inside the deposition tank 2 can be cooled more effectively. Note that the ventilation duct 3 may be connected only to either the first peripheral wall 21 or the second peripheral wall 22. The ventilation duct 3 not only functions as an air supply passage to the louver unit 4 but also may have an opening and function to supply air 10 into the deposition tank 2 .

[Second embodiment]
First, the configuration of a sintered ore cooling device 1 according to a second embodiment will be described. The same components as in the first embodiment are given the same reference numerals as in the first embodiment, and the description thereof will be omitted. FIG. 8 shows the lower part of the main body in this embodiment. 6 is a partial cross-sectional view similar to FIG. 5. FIG.

As shown in FIG. 8, the louver unit 4 is inclined with respect to the vertical direction so that the upper part of the louver unit 4 approaches the inner peripheral wall 21 and the lower part of the louver unit 4 approaches the outer peripheral wall 22. Specifically, the first partition plate 421 of the louver unit 4 is inclined with respect to the intermediate line 202, moving away from the inner circumferential wall 21, in other words, approaching the outer circumferential wall 22 from above to below. Accordingly, the side surface 431 of the louver unit 4 facing the inner circumferential wall 21 is inclined with respect to the vertical direction in a direction that moves away from the inner circumferential wall 21 from above to below. A side surface 432 of the louver unit 4 facing the outer circumferential wall 22 is inclined with respect to the vertical direction toward the outer circumferential wall 22 from above to below. Here, the side surface 431 may be an envelope surface passing through the tips of the plurality of louvers 411 in the louver portion 41 facing the inner peripheral wall 21. The side surface 432 may be an envelope surface passing through the tips of the plurality of louvers 411 in the louver portion 41 facing the outer peripheral wall 22 . The angle at which the side surfaces 431 and 432 are inclined with respect to the vertical direction may be, for example, 10 degrees or more.

Next, the advantages of the sintered ore cooling device 1 of this embodiment will be explained. As in the first embodiment, the inner circumferential wall 21 is the first circumferential wall 21 and the outer circumferential wall 22 is the second circumferential wall 22.

In the louver unit 4, a side surface 431 facing the first peripheral wall 21 is provided so as to be inclined with respect to the vertical direction on a side that moves away from the first peripheral wall 21 from the top to the bottom. In this case, the cross-sectional area of the first flow passage 111A between the first peripheral wall 21 and the side surface 431 of the louver unit 4 is increased from the top to the bottom, and the resistance in the first flow passage 111A is decreased. I can do it. Alternatively, even if the first peripheral wall 21 is inclined as in the present embodiment, the side surface 431 is inclined as described above, so that the flow passage cross-sectional area of the first flow passage 111A increases from above to below. It is possible to reduce the degree of decrease in resistance in the first flow path 111A and to reduce the degree of increase in resistance in the first flow path 111A. Further, as shown in FIG. 8, the angle at which the first flow passage 111 bends from the passage 111A between the first peripheral wall 21 and the louver unit 4 to the passage 111B between the table 20 and the louver unit 4 Since θ becomes larger, the resistance in the first flow path 111 can be reduced. Therefore, the flow speed of the sintered ore 11 in the first flow path 111A can be increased to approach the flow speed of the sintered ore 11 in the second flow path 112.

On the other hand, a side surface 432 of the louver unit 4 that faces the second peripheral wall 22 is provided so as to be inclined with respect to the vertical direction toward the second peripheral wall 22 from above toward the bottom. In this case, the degree of decrease in the cross-sectional area of the second flow path 112 can be increased from the top to the bottom, and the degree of increase in the resistance in the second flow path 112 can be increased. Alternatively, when the second peripheral wall 22 is tilted as in this embodiment, the side surface 432 of the louver unit 4 is tilted as described above, so that the second peripheral wall 22 and the side surface 432 are It is possible to further increase the degree of decrease in the cross-sectional area of the second flow path 112 between the two positions, thereby further increasing the degree of increase in the resistance in the second flow path 112. Therefore, the flow speed of the sintered ore 11 in the second flow path 112 can be reduced to approach the flow speed of the sintered ore 11 in the first flow path 111A.

Further, as in the first embodiment, the louver unit 4 is arranged such that the shortest distance between the first peripheral wall 21 and the louver unit 4 is greater than the shortest distance between the second peripheral wall 22 and the louver unit 4. may be provided.

[Third embodiment]
First, the configuration of a sintered ore cooling device 1 according to a third embodiment will be described. The same components as in the first embodiment are given the same reference numerals as in the first embodiment, and the description thereof will be omitted. FIG. 9 shows the lower part of the main body in this embodiment. 6 is a partial cross-sectional view similar to FIG. 5. FIG.

As shown in FIG. 9, the lower surface 44 of the louver unit 4 is horizontally moved downward as it goes from the inner peripheral wall 21 side to the outer peripheral wall 22 side, that is, as it goes radially outward of the deposited layer 2. leaning against. In other words, the lower surface 44 of the louver unit 4, which faces the table 20 and forms the first flow passage 111B together with the table 20, is inclined so as to move away from the inner peripheral wall 21 from above to below. The angle that the lower surface 44 makes with respect to the horizontal direction may be, for example, 45° or more.

Next, the advantages of the sintered ore cooling device 1 of this embodiment will be explained. As in the first embodiment, the inner circumferential wall 21 is the first circumferential wall 21 and the outer circumferential wall 22 is the second circumferential wall 22.

The lower surface 44 of the louver unit 4 is provided so as to be inclined with respect to the horizontal direction so as to be directed downward as it goes from the first peripheral wall 21 side to the second peripheral wall 22 side. In this case, the angle θ at which the first flow passage 111 bends from the passage 111A between the first peripheral wall 21 and the louver unit 4 to the passage 111B between the louver unit 4 and the table 20 becomes large. Furthermore, the cross-sectional area of the passage 111B on the side of the connection portion with the passage 111A becomes larger. If the space between the lower surface 44 and the first peripheral wall 21 is considered as a part of the passage 111A, the flow passage cross-sectional area in the above-mentioned part of the passage 111A increases from the top to the bottom. Therefore, the sintered ore descending through the passage 111A can easily flow into the passage 111B, and the resistance in the first flow passage 111 can be reduced. Therefore, the flow speed of the sintered ore 11 in the first flow path 111 can be increased to approach the flow speed of the sintered ore 11 in the second flow path 112.

Further, as in the first embodiment, the louver unit 4 is arranged such that the shortest distance between the first peripheral wall 21 and the louver unit 4 is greater than the shortest distance between the second peripheral wall 22 and the louver unit 4. may be provided. For example, as in the first embodiment, the first partition plate 421 may be located closer to the outer peripheral wall 22 than the intermediate line 202.

[Fourth embodiment]
First, the configuration of a sintered ore cooling device 1 according to a fourth embodiment will be described. The same components as in the first embodiment are given the same reference numerals as in the first embodiment, and the description thereof will be omitted. FIG. 10 shows the lower part of the main body in this embodiment. 6 is a partial cross-sectional view similar to FIG. 5. FIG. As shown in FIG. 10, the upper surface 45 of the louver unit 4 is inclined with respect to the horizontal direction so as to move downward from the inner circumferential wall 21 side toward the outer circumferential wall 22 side. In other words, the upper surface 45 is inclined so as to approach the outer peripheral wall 22 from above to below. The angle that the upper surface 45 makes with respect to the horizontal direction may be, for example, 45° or more.

Next, the advantages of the sintered ore cooling device 1 of this embodiment will be explained. As in the first embodiment, the inner circumferential wall 21 is the first circumferential wall 21 and the outer circumferential wall 22 is the second circumferential wall 22.

The upper surface 45 of the louver unit 4 is provided so as to be inclined with respect to the horizontal direction so as to be directed downward as it goes from the first peripheral wall 21 side to the second peripheral wall 22 side. In this case, the upper surface 45 of the louver unit 4 generates a reaction force that pushes the sintered ore 11 flowing down upward and toward the outer peripheral wall 22 . As a result, the resistance in the second flow path 112 increases, so that the flow speed of the sintered ore 11 in the second flow path 112 can be reduced to approach the flow speed of the sintered ore 11 in the first flow path 111A.

Further, as in the first embodiment, the louver unit 4 is arranged such that the shortest distance between the first peripheral wall 21 and the louver unit 4 is greater than the shortest distance between the second peripheral wall 22 and the louver unit 4. may be provided.

(Modified example)
As shown in FIG. 11, a plate member 46 may be provided at the upper end of the louver unit 4. The plate member 46 may be installed on the edge of the upper surface of the louver unit 4 on the inner peripheral wall 21 side so as to spread in the vertical direction. Note that the plate-like member 46 may be integrated with the plate-like member that constitutes the upper surface of the louver unit 4, or may be separate. Thereby, the cross section of the upper part of the louver unit 4 becomes L-shaped with an opening toward the outer peripheral wall 22 side. In this case, in the flow of the sintered ore 11 flowing from the top to the bottom, the sintered ore 11 accumulates and accumulates in the L-shaped recess between the top surface of the louver unit 4 and the plate member 46. sell. The sintered ore 11 accumulated in this way is deposited at an angle with respect to the horizontal direction so as to move downward from the inner circumferential wall 21 side to the outer circumferential wall 22 side, and this state is maintained in the flow. Retained.

In this case as well, the inclined surface 113 of the sintered ore 11 deposited on the upper part of the louver unit 4 generates a reaction force that pushes the sintered ore 11 flowing from above upward and toward the second peripheral wall 22. Since the resistance in the second flow path 112 increases, the flow speed of the sintered ore 11 in the second flow path 112 can be reduced to approach the flow speed of the sintered ore 11 in the first flow path 111A.

[Fifth embodiment]
First, the configuration of a sintered ore cooling device 1 according to a fifth embodiment will be described. The same components as in the first embodiment are given the same reference numerals as in the first embodiment, and the description thereof will be omitted. FIG. 12 shows the lower part of the main body in this embodiment. 6 is a partial cross-sectional view similar to FIG. 5. FIG. As shown in FIG. 12, the lower surface 44 of the louver unit 4 is provided at a position higher than the upper end of the discharge port 24 and higher than the lower surface 35 of the ventilation duct 3.

Next, the advantages of the sintered ore cooling device 1 of this embodiment will be explained. As in the first embodiment, the inner circumferential wall 21 is the first circumferential wall 21 and the outer circumferential wall 22 is the second circumferential wall 22.

The lower end of the louver unit 4, specifically the lower surface 44, is provided higher than the upper end of the discharge port 24. In this case, in the first flow passage 111, the vertical width H1 of the passage 111B between the louver unit 4 and the table 20 is set to the height of the discharge port 24 with the table 20 as the lower end (that is, the vertical direction of the discharge port 24). By making the dimension larger than H0, the resistance in the passage 111B can be reduced. Furthermore, the angle θ at which the first flow passage 111 bends from the passage 111A between the first peripheral wall 21 and the louver unit 4 to the passage 111B between the louver unit 4 and the table 20 becomes larger. Furthermore, the cross-sectional area of the flow path at the connection portion between the passage 111A and the passage 111B becomes large. Therefore, the sintered ore 11 descending through the passage 111A can easily flow into the passage 111B, and the resistance in the first flow passage 111 can be reduced. Therefore, the flow speed of the sintered ore 11 in the first flow path 111 can be increased to approach the flow speed of the sintered ore 11 in the second flow path 112.

Further, as in the first embodiment, the louver unit 4 is arranged such that the shortest distance between the first peripheral wall 21 and the louver unit 4 is greater than the shortest distance between the second peripheral wall 22 and the louver unit 4. may be provided.

[Sixth embodiment]
First, the configuration of a sintered ore cooling device 1 according to a sixth embodiment will be described. The same components as in the first embodiment are given the same reference numerals as in the first embodiment, and the description thereof will be omitted. FIG. 13 shows the lower part of the main body in this embodiment. 6 is a partial cross-sectional view similar to FIG. 5. FIG.

As shown in FIG. 13, the ratio of the radial width L of the bottom surface of the deposition tank 2 to the vertical dimension H0 of the discharge port 24 is 2.0 or less (L/H0≦2.0). Here, the bottom surface of the deposition tank 2 refers to the portion of the upper surface of the table 20 where a perpendicular line is drawn from the lower end of the inner surface of the outer peripheral wall 22 and intersects with the upper surface of the table 20, and the lower end of the inner surface of the inner peripheral wall 21 Refers to the area between the top surface and the area where it intersects. The radial width L refers to the dimension of the region in the radial direction of the deposition tank 2. Further, the ratio of the radial width L of the bottom surface of the deposition tank 2 to the shortest distance H1 between the bottom surface of the deposition tank 2 and the lower end of the louver unit 4 is 2.0 or less (L/H1≦2 .0). The shortest distance H1 may be the distance between the lower surface 44 of the louver unit 4 and the upper surface of the table 20.

Next, the advantages of the sintered ore cooling device 1 of this embodiment will be explained. As in the first embodiment, the inner circumferential wall 21 is the first circumferential wall 21 and the outer circumferential wall 22 is the second circumferential wall 22.

When the ratio of the radial width L of the bottom surface of the deposition tank 2 to the vertical dimension H0 of the discharge port 24 is 2.0 or less, the first flow passage 111 includes the passage 111B. Since the length L of the passage along the upper surface of the table 20 and reaching the discharge port 24 is relatively short, the resistance in the first flow passage 111 can be reduced. In other words, by making the length L of the passage relatively short, the distance from the passage 111A of the first flow passage 111 to the discharge port 24 can be shortened. Therefore, the flow velocity in the first flow passage 111 can be increased to approach the flow velocity in the second flow passage 112.

Further, when the ratio of the radial width L of the bottom surface of the deposition tank 2 to the shortest distance H1 between the bottom surface of the deposition tank 2 and the lower end of the louver unit 4 is 2.0 or less, The length L of the first flow passage 111, including the passage 111B between the louver unit 4 and the table 20, along the upper surface of the table 20 and reaching the discharge port 24 is relatively short. Further, the distance H1 that can be the minimum width of the passage becomes relatively large. Therefore, the resistance in the first flow path 111 can be reduced. Moreover, since the distance H1 becomes relatively large, the resistance in the passage 111B becomes small, and the angle θ at the time of bending from the passage 111A to the passage 111B becomes large. Furthermore, the cross-sectional area of the flow path at the connection portion between the passage 111A and the passage 111B becomes large. Therefore, the sintered ore 11 descending through the passage 111A can easily flow into the passage 111B, and the resistance in the first flow passage 111 can be reduced. Therefore, the flow speed of the sintered ore 11 in the first flow path 111 can be increased to approach the flow speed of the sintered ore 11 in the second flow path 112. Note that, similarly to the fifth embodiment, the lower end of the louver unit 4, specifically the lower surface 44, may be provided higher than the upper end of the discharge port 24. In this case, the above effects can be improved.

Further, as in the first embodiment, the louver unit 4 is arranged such that the shortest distance between the first peripheral wall 21 and the louver unit 4 is greater than the shortest distance between the second peripheral wall 22 and the louver unit 4. may be provided.

Although preferred embodiments of the present invention have been described above in detail with reference to the accompanying drawings, the present invention is not limited to such examples. It is clear that a person with ordinary knowledge in the technical field to which the present invention pertains can come up with various changes or modifications within the scope of the technical idea stated in the claims. It is understood that these also naturally fall within the technical scope of the present invention.

For example, the configurations of the louver units 4 of each embodiment may be combined as appropriate.

The discharge port 24 may be provided in the inner circumferential wall 21 and the discharge port 24 may not be provided in the outer circumferential wall 22. That is, the outer circumferential wall 22 may be the first circumferential wall, and the inner circumferential wall 21 may be the second circumferential wall. Further, the cross-sectional shape of the deposition tank 2 is arbitrary, and is not limited to an inverted trapezoidal shape, but may be a rectangular shape, a trapezoidal shape, or the like. In other words, the inclination of the peripheral walls 21 and 22 of the deposition tank 2 with respect to the vertical direction can be set arbitrarily.

Note that if it is difficult to detect the difference between the flow speed of the sintered ore 11 in the first flow path 111 and the flow speed of the sintered ore 11 in the second flow path 112 with actual equipment, for example, the deposition tank 2 Detection may also be performed using a model. Specifically, the model has a cross-sectional shape imitating each embodiment (FIGS. 5 and 7 to 13), and allows sinter to be individually supplied to each flow path, and Prepare one with a discharge port provided at the bottom of one peripheral wall. In this model, if a certain amount of sinter is supplied to at least one of the flow paths and deposited, and then the sinter is discharged from the discharge port, the amount of sinter in the flow path decreases. From this rate of decrease, the flow rate of the sintered ore in the flow path can be calculated. This makes it possible to calculate the difference in flow velocity in each flow path. Note that the difference in the flow velocity of each flow passage may be calculated directly from the difference in the reduction rate of sintered ore in each flow passage.

1 Sintered ore cooling device 11 Sintered ore 111 First flow passage 112 Second flow passage 2 Deposition tank 21 Inner peripheral wall (first peripheral wall)
22 Outer peripheral wall (second peripheral wall)
24 Discharge port 4 Louver unit (gas introduction member)

Claims (10)

A sintered ore cooling device for cooling sintered ore,
The sintered ore from the sintering machine is supplied from the upper part and deposited, and the cooling gas is supplied from the lower part and passes between the deposited sintered ore toward the upper part, and is cooled by the cooling gas. an annular deposition tank that discharges the sintered ore from an outlet provided at the bottom of either the outer peripheral wall or the inner peripheral wall;
a gas introduction member disposed inside the deposition tank so as to extend in a circumferential direction of the deposition tank, and introducing the cooling gas into the inside of the deposition tank;
Equipped with
Of the outer peripheral wall and the inner peripheral wall, the peripheral wall where the discharge port is not provided is a first peripheral wall, and the peripheral wall where the discharge port is provided is a second peripheral wall ,
The gas introduction member is provided such that the shortest distance between the first peripheral wall and the gas introduction member is greater than the shortest distance between the second peripheral wall and the gas introduction member. , sinter cooling equipment. A sintered ore cooling device for cooling sintered ore,
The sintered ore from the sintering machine is supplied from the upper part and deposited, and the cooling gas is supplied from the lower part and passes between the deposited sintered ore toward the upper part, and is cooled by the cooling gas. an annular deposition tank that discharges the sintered ore from an outlet provided at the bottom of either the outer peripheral wall or the inner peripheral wall;
a gas introduction member disposed inside the deposition tank so as to extend in a circumferential direction of the deposition tank, and introducing the cooling gas into the inside of the deposition tank;
Equipped with
Of the outer peripheral wall and the inner peripheral wall, the peripheral wall where the discharge port is not provided is a first peripheral wall, and the peripheral wall where the discharge port is provided is a second peripheral wall ,
A sintered ore cooling device, wherein a side surface of the gas introducing member that faces the first peripheral wall is inclined with respect to a vertical direction so as to move away from the first peripheral wall from above to below. A sintered ore cooling device for cooling sintered ore,
The sintered ore from the sintering machine is supplied from the upper part and deposited, and the cooling gas is supplied from the lower part and passes between the deposited sintered ore toward the upper part, and is cooled by the cooling gas. an annular deposition tank that discharges the sintered ore from an outlet provided at the bottom of either the outer peripheral wall or the inner peripheral wall;
a gas introduction member disposed inside the deposition tank so as to extend in a circumferential direction of the deposition tank, and introducing the cooling gas into the inside of the deposition tank;
Equipped with
Of the outer peripheral wall and the inner peripheral wall, the peripheral wall where the discharge port is not provided is a first peripheral wall, and the peripheral wall where the discharge port is provided is a second peripheral wall ,
A sintered ore cooling device, wherein a side surface of the gas introduction member that faces the second peripheral wall is inclined with respect to the vertical direction so that the side surface approaches the second peripheral wall from above to below. A sintered ore cooling device for cooling sintered ore,
The sintered ore from the sintering machine is supplied from the upper part and deposited, and the cooling gas is supplied from the lower part and passes between the deposited sintered ore toward the upper part, and is cooled by the cooling gas. an annular deposition tank that discharges the sintered ore from an outlet provided at the bottom of either the outer peripheral wall or the inner peripheral wall;
a gas introduction member disposed inside the deposition tank so as to extend in a circumferential direction of the deposition tank, and introducing the cooling gas into the inside of the deposition tank;
Equipped with
Of the outer peripheral wall and the inner peripheral wall, the peripheral wall where the discharge port is not provided is a first peripheral wall, and the peripheral wall where the discharge port is provided is a second peripheral wall ,
A sintered ore cooling device, wherein the lower surface of the gas introducing member is inclined with respect to the horizontal direction so as to be directed downward as it goes from the first peripheral wall side to the second peripheral wall side. A sintered ore cooling device for cooling sintered ore,
The sintered ore from the sintering machine is supplied from the upper part and deposited, and the cooling gas is supplied from the lower part and passes between the deposited sintered ore toward the upper part, and is cooled by the cooling gas. an annular deposition tank that discharges the sintered ore from an outlet provided at the bottom of either the outer peripheral wall or the inner peripheral wall;
a gas introduction member disposed inside the deposition tank so as to extend in a circumferential direction of the deposition tank, and introducing the cooling gas into the inside of the deposition tank;
Equipped with
Of the outer peripheral wall and the inner peripheral wall, the peripheral wall where the discharge port is not provided is a first peripheral wall, and the peripheral wall where the discharge port is provided is a second peripheral wall ,
A sintered ore cooling device, wherein the upper surface of the gas introducing member is inclined with respect to the horizontal direction so as to be directed downward as it goes from the first peripheral wall side to the second peripheral wall side. A sintered ore cooling device for cooling sintered ore,
The sintered ore from the sintering machine is supplied from the upper part and deposited, and the cooling gas is supplied from the lower part and passes between the deposited sintered ore toward the upper part, and is cooled by the cooling gas. an annular deposition tank that discharges the sintered ore from an outlet provided at the bottom of either the outer peripheral wall or the inner peripheral wall;
a gas introduction member disposed inside the deposition tank so as to extend in a circumferential direction of the deposition tank, and introducing the cooling gas into the inside of the deposition tank;
Equipped with
Of the outer peripheral wall and the inner peripheral wall, the peripheral wall where the discharge port is not provided is a first peripheral wall, and the peripheral wall where the discharge port is provided is a second peripheral wall ,
A plate - like member is provided on the upper surface of the gas introduction member, and the cross section of the upper part of the gas introduction member is L-shaped with an opening toward the outer circumferential wall. A sintered ore cooling device, wherein the gas introducing member is provided so that the sintered ore is maintained in a state in which the sintered ore is deposited tilting with respect to the horizontal direction so as to move downward toward the peripheral wall side. A sintered ore cooling device for cooling sintered ore,
The sintered ore from the sintering machine is supplied from the upper part and deposited, and the cooling gas is supplied from the lower part and passes between the deposited sintered ore toward the upper part, and is cooled by the cooling gas. an annular deposition tank that discharges the sintered ore from an outlet provided at the bottom of either the outer peripheral wall or the inner peripheral wall;
a gas introduction member disposed inside the deposition tank so as to extend in a circumferential direction of the deposition tank, and introducing the cooling gas into the inside of the deposition tank;
Equipped with
Of the outer peripheral wall and the inner peripheral wall, the peripheral wall where the discharge port is not provided is a first peripheral wall, and the peripheral wall where the discharge port is provided is a second peripheral wall ,
A sintered ore cooling device, wherein the ratio of the radial width of the bottom surface of the deposition tank to the vertical dimension of the discharge port is 2.0 or less. A sintered ore cooling device for cooling sintered ore,
The sintered ore from the sintering machine is supplied from the upper part and deposited, and the cooling gas is supplied from the lower part and passes between the deposited sintered ore toward the upper part, and is cooled by the cooling gas. an annular deposition tank that discharges the sintered ore from an outlet provided at the bottom of either the outer peripheral wall or the inner peripheral wall;
a gas introduction member disposed inside the deposition tank so as to extend in a circumferential direction of the deposition tank, and introducing the cooling gas into the inside of the deposition tank;
Equipped with
Of the outer peripheral wall and the inner peripheral wall, the peripheral wall where the discharge port is not provided is a first peripheral wall, and the peripheral wall where the discharge port is provided is a second peripheral wall ,
Sintered ore provided such that the ratio of the radial width of the bottom surface of the deposition tank to the shortest distance between the bottom surface of the deposition tank and the lower end of the gas introduction member is 2.0 or less. Cooling system. A sintered ore cooling device for cooling sintered ore,
The sintered ore from the sintering machine is supplied from the upper part and deposited, and the cooling gas is supplied from the lower part and passes between the deposited sintered ore toward the upper part, and is cooled by the cooling gas. an annular deposition tank that discharges the sintered ore from an outlet provided at the bottom of either the outer peripheral wall or the inner peripheral wall;
a gas introduction member disposed inside the deposition tank so as to extend in a circumferential direction of the deposition tank, and introducing the cooling gas into the inside of the deposition tank;
Equipped with
Of the outer peripheral wall and the inner peripheral wall, the peripheral wall where the discharge port is not provided is a first peripheral wall, and the peripheral wall where the discharge port is provided is a second peripheral wall ,
A sintered ore cooling device, wherein a lower end of the gas introducing member is provided higher than an upper end of the discharge port. Further, a ventilation duct is arranged inside the deposition tank, connected to at least one of the first peripheral wall and the second peripheral wall, and connected to the gas introduction member, and to which the cooling gas is supplied from the outside of the deposition tank. Prepare,
The sintered ore cooling device according to any one of claims 1 to 9, wherein the gas introducing member is provided so as to be able to supply the cooling gas supplied from the ventilation duct toward the sintered ore.

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