JP7254462B2 - 半導体装置の作製方法 - Google Patents
半導体装置の作製方法 Download PDFInfo
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- JP7254462B2 JP7254462B2 JP2018150541A JP2018150541A JP7254462B2 JP 7254462 B2 JP7254462 B2 JP 7254462B2 JP 2018150541 A JP2018150541 A JP 2018150541A JP 2018150541 A JP2018150541 A JP 2018150541A JP 7254462 B2 JP7254462 B2 JP 7254462B2
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| Application Number | Priority Date | Filing Date | Title |
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| JP2018150541A JP7254462B2 (ja) | 2018-08-09 | 2018-08-09 | 半導体装置の作製方法 |
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| JP2018150541A JP7254462B2 (ja) | 2018-08-09 | 2018-08-09 | 半導体装置の作製方法 |
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| Publication Number | Publication Date |
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| JP2020027825A JP2020027825A (ja) | 2020-02-20 |
| JP2020027825A5 JP2020027825A5 (https=) | 2021-09-16 |
| JP7254462B2 true JP7254462B2 (ja) | 2023-04-10 |
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| JP2018150541A Active JP7254462B2 (ja) | 2018-08-09 | 2018-08-09 | 半導体装置の作製方法 |
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Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12604536B2 (en) | 2020-03-26 | 2026-04-14 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing semiconductor device |
| JP7777531B2 (ja) * | 2020-08-19 | 2025-11-28 | 株式会社半導体エネルギー研究所 | ハフニウムジルコニウム酸化物の製造方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017072627A1 (ja) | 2015-10-28 | 2017-05-04 | 株式会社半導体エネルギー研究所 | 半導体装置、モジュール、電子機器および半導体装置の作製方法 |
| US20170229486A1 (en) | 2016-02-05 | 2017-08-10 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and electronic device |
| JP2018022879A (ja) | 2016-07-20 | 2018-02-08 | 株式会社リコー | 電界効果型トランジスタ、及びその製造方法、並びに表示素子、画像表示装置、及びシステム |
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Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017072627A1 (ja) | 2015-10-28 | 2017-05-04 | 株式会社半導体エネルギー研究所 | 半導体装置、モジュール、電子機器および半導体装置の作製方法 |
| US20170229486A1 (en) | 2016-02-05 | 2017-08-10 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and electronic device |
| JP2017143255A (ja) | 2016-02-05 | 2017-08-17 | 株式会社半導体エネルギー研究所 | 半導体装置、電子機器 |
| JP2018022879A (ja) | 2016-07-20 | 2018-02-08 | 株式会社リコー | 電界効果型トランジスタ、及びその製造方法、並びに表示素子、画像表示装置、及びシステム |
| US20190245090A1 (en) | 2016-07-20 | 2019-08-08 | Minehide Kusayanagi | Field-effect transistor, method for producing the same, display element, image display device, and system |
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| JP2020027825A (ja) | 2020-02-20 |
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