JP7232615B2 - SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - Google Patents

Description

The disclosed embodiments relate to a substrate processing apparatus and a substrate processing method.

2. Description of the Related Art Conventionally, there has been known a substrate processing apparatus that physically cleans a substrate using a brush, a sponge, or the like. For example, Patent Literature 1 discloses a substrate processing apparatus provided with brushes for cleaning the upper surface of a substrate.

JP 2010-109225 A

However, in the prior art, it is difficult to apply a strong force to the substrate because the substrate bends in the direction away from the brush when the brush is pressed against the substrate. For this reason, it is difficult to wash the substrate strongly with the conventional technique.

An object of one aspect of the embodiments is to provide a substrate processing apparatus and a substrate processing method capable of powerfully cleaning a substrate.

A substrate processing apparatus according to an aspect of an embodiment includes a holding section, a first cleaning body, a first moving mechanism, a second cleaning body, a second moving mechanism, and a control section. The holding part holds the substrate. The first cleaning body cleans one of the top surface and the bottom surface of the substrate held by the holding part by ejecting a fluid onto one of the surfaces or coming into contact with the one surface. The first moving mechanism horizontally moves the first cleaning body. The second cleaning body is in contact with the other of the top surface and the bottom surface of the substrate held by the holding part and cleans the other surface. The second moving mechanism horizontally moves the second cleaning body. The control unit controls the first moving mechanism and the second moving mechanism to eject the fluid to one surface, or to bring the first cleaning body in contact with one surface into contact with the other surface. A double-sided cleaning process is performed in which the second cleaning body is moved horizontally in synchronization with the second cleaning body.

According to one aspect of the embodiment, the substrate can be aggressively cleaned.

FIG. 1 is a plan view showing the configuration of the substrate processing apparatus according to the first embodiment. FIG. 2 is a longitudinal sectional view showing the configuration of the substrate processing apparatus according to the first embodiment. FIG. 3 is a flow chart showing the procedure of a series of cleaning processes by the substrate processing apparatus. FIG. 4 is a diagram illustrating an operation example of import processing. FIG. 5 is a diagram illustrating an operation example of import processing. FIG. 6 is a diagram showing an operation example of the lower surface cleaning process. FIG. 7 is a diagram showing an operation example of the lower surface cleaning process. FIG. 8 is a diagram showing an operation example of the lower surface cleaning process. FIG. 9 is a diagram showing an operation example of the double-sided cleaning process. FIG. 10 is a diagram showing an operation example of the double-sided cleaning process. FIG. 11 is a diagram showing an operation example of the double-sided cleaning process. FIG. 12 is a diagram showing an operation example of the double-sided cleaning process. FIG. 13 is a diagram showing an operation example of the double-sided cleaning process. FIG. 14 is a diagram showing an example of cleaning only the bottom surface of the wafer. FIG. 15 is a diagram showing an example of cleaning both surfaces of a wafer at the same time. FIG. 16 is a diagram showing another example of timing for starting synchronization between the first cleaning body and the second cleaning body. FIG. 17 is a diagram showing another example of timing for starting synchronization between the first cleaning body and the second cleaning body. FIG. 18 is a diagram showing another example of positions where the second cleaning body overlaps the first cleaning body. FIG. 19 is a diagram showing another operation example of the double-sided cleaning process. FIG. 20 is a diagram showing another operation example of the double-sided cleaning process. FIG. 21 is a diagram showing another operation example of the double-sided cleaning process. FIG. 22 is a diagram showing the height position of the upper cup in the lower surface cleaning process. FIG. 23 is a diagram showing the height position of the upper cup in the double-sided cleaning process. FIG. 24 is a diagram showing an example of another cleaning tool. FIG. 25 is a diagram showing an operation example of double-sided cleaning processing according to the fourth embodiment. FIG. 26 is a diagram showing an operation example of the tool cleaning process. FIG. 27 is a plan view showing the configuration of a substrate processing apparatus according to the sixth embodiment. FIG. 28 is a longitudinal sectional view showing the configuration of a substrate processing apparatus according to the sixth embodiment. FIG. 29 is a diagram showing an operation example of double-sided cleaning processing according to the sixth embodiment. FIG. 30 is a diagram showing an operation example of double-sided cleaning processing according to the sixth embodiment. FIG. 31 is a perspective view showing the configuration of the second cleaning body according to the seventh embodiment. FIG. 32 is a longitudinal sectional view showing the configuration of the second cleaning body according to the seventh embodiment. FIG. 33 is a diagram showing a state in which the second cleaning body according to the seventh embodiment is pressed against the wafer. FIG. 34 is a side view showing the configuration of the substrate processing apparatus according to the eighth embodiment. FIG. 35 is a plan view showing the wafer, cleaning body, polishing body and rotating plate. FIG. 36 is a plan view showing the wafer, cleaning body, polishing body and rotating plate. FIG. 37 is a plan view showing the configuration of a substrate processing apparatus according to the ninth embodiment. FIG. 38 is a diagram showing an operation example of the lower surface cleaning process in the ninth embodiment. FIG. 39 is a diagram showing an operation example of double-sided cleaning processing in the ninth embodiment.

DETAILED DESCRIPTION OF THE INVENTION Embodiments (hereinafter referred to as "embodiments") for carrying out a substrate processing apparatus and a substrate processing method according to the present application will be described in detail below with reference to the drawings. The substrate processing apparatus and substrate processing method according to the present application are not limited to this embodiment. Further, each embodiment can be appropriately combined within a range that does not contradict the processing contents. Also, in each of the following embodiments, the same parts are denoted by the same reference numerals, and overlapping descriptions are omitted.

(First embodiment)
First, the configuration of the substrate processing apparatus according to the first embodiment will be described with reference to FIGS. 1 and 2. FIG. FIG. 1 is a plan view showing the configuration of the substrate processing apparatus according to the first embodiment. Moreover, FIG. 2 is a longitudinal sectional view showing the configuration of the substrate processing apparatus according to the first embodiment. Hereinafter, in order to clarify the positional relationship, the X-axis, Y-axis and Z-axis are defined to be orthogonal to each other, and the positive direction of the Z-axis is defined as the vertically upward direction.

The substrate processing apparatus 1 includes two suction pads 10 for horizontally sucking and holding the lower surface of a substrate such as a semiconductor wafer or a glass substrate (hereinafter referred to as a wafer W), and the lower surface of the wafer W received from the suction pads 10. A spin chuck 11 horizontally sucked and held, a housing 13 with an open upper surface, a first cleaning unit 17 for cleaning the upper surface of the wafer W, and a second cleaning unit 18 for cleaning the lower surface of the wafer W. Prepare.

A circuit is formed on at least one of the upper surface and the lower surface of the wafer W. As shown in FIG. Here, it is assumed that a circuit is formed on the upper surface of the wafer W. As shown in FIG.

As shown in FIG. 1, the two suction pads 10 are formed in an elongated, substantially rectangular shape, and are provided substantially parallel to each other with the spin chuck 11 sandwiched therebetween in a plan view so as to hold the peripheral portion of the lower surface of the wafer W. It is Each suction pad 10 is supported by a substantially rectangular support plate 14 longer than the suction pad 10 . The support plate 14 is supported at both ends by a frame 15 which is movable in the horizontal direction (the X-axis direction in FIG. 1) and the vertical direction (the Z-axis direction in FIG. 1) by a driving mechanism (not shown). .

An upper cup 16 is provided on the upper surface of the frame 15 . An opening having a diameter larger than the diameter of the wafer W is formed in the upper surface of the upper cup 16 . Transfer of the wafer W is performed.

As shown in FIG. 2, spin chuck 11 is connected to drive mechanism 21 via shaft 20 . The spin chuck 11 is rotatable and vertically movable by a drive mechanism 21 .

For example, three elevating pins 22 are provided around the spin chuck 11 so as to be elevable by an elevating mechanism (not shown). Thereby, the wafer W can be transferred between the lifting pins 22 and a transfer mechanism (not shown) provided outside the substrate processing apparatus 1 .

A drain pipe 40 for discharging the cleaning liquid and an exhaust pipe 41 for forming a downward airflow in the substrate processing apparatus 1 and exhausting the airflow are provided at the bottom of the housing 13 .

Next, configurations of the first cleaning unit 17 and the second cleaning unit 18 will be described. As shown in FIG. 2 , the first cleaning section 17 includes a first cleaning body 171 , a first strut member 172 and a first driving section 173 .

The first cleaning body 171 is a member that is pressed against the upper surface of the wafer W. As shown in FIG. The first cleaning body 171 is, for example, a brush made up of a large number of tufts. The lower surface of the first cleaning body 171, that is, the contact surface with the wafer W, has a circular shape smaller than the upper surface of the wafer W, for example. Note that the first cleaning body 171 may be a sponge.

A first support member 172 is provided on the upper surface of the first cleaning body 171 . The first support member 172 extends in the vertical direction (Z-axis direction) and supports the first cleaning body 171 at one end.

A first driving portion 173 is provided at the other end of the first support member 172 . The first driving section 173 rotates the first strut member 172 around the vertical axis. Thereby, the first cleaning body 171 supported by the first support member 172 can be rotated around the vertical axis.

The first cleaning section 17 is horizontally supported by an arm 70 . The arm 70 is provided with a cleaning nozzle 70 a adjacent to the first cleaning section 17 for supplying a cleaning fluid to the upper surface of the wafer W held by the spin chuck 11 . Pure water, for example, is used as the cleaning fluid.

The arm 70 is provided with a load detector 75 that detects the pressing force of the first cleaning body 171 against the wafer W. As shown in FIG. Load detector 75 is, for example, a load cell.

Arm 70 is connected to moving portion 71 . The moving part 71 horizontally moves the arm 70 along a rail 72 extending in the horizontal direction (here, the X-axis direction). Further, the moving part 71 raises and lowers the arm 70 along the vertical direction (Z-axis direction).

The second cleaning section 18 includes a second cleaning body 181 , a second strut member 182 and a second driving section 183 .

The second cleaning body 181 is a member pressed against the lower surface of the wafer W. As shown in FIG. The second cleaning body 181 is, for example, a brush made up of a large number of tufts. The upper surface of the second cleaning body 181, that is, the contact surface with the wafer W, has a circular shape smaller than the upper surface of the wafer W, for example. Note that the second cleaning body 181 may be a sponge.

A second strut member 182 is provided on the lower surface of the second cleaning body 181 . The second strut member 182 extends along the vertical direction (Z-axis direction) and supports the second cleaning body 181 at one end.

A second drive section 183 is provided at the other end of the second support member 182 . The second driving section 183 rotates the second strut member 182 around the vertical axis. Thereby, the second cleaning body 181 supported by the second support member 182 can be rotated around the vertical axis.

The second cleaning section 18 is horizontally supported by an arm 80 . The arm 80 is provided with a cleaning nozzle 80 a adjacent to the second cleaning body 181 for supplying cleaning fluid to the lower surface of the wafer W held by the suction pad 10 or the spin chuck 11 . Pure water, for example, is used as the cleaning fluid.

Arm 80 is connected to moving portion 81 . The moving part 81 horizontally moves the arm 80 along a rail 82 extending in the horizontal direction (here, the Y-axis direction). Further, the moving part 81 raises and lowers the arm 80 along the vertical direction (Z-axis direction).

Arm 80 expands and contracts along the horizontal direction (X-axis direction), for example, by a drive unit (not shown). Thereby, the arm 80 can move the second cleaning section 18 and the cleaning nozzle 80 a along the X-axis direction, ie, the same direction as the moving direction of the first cleaning section 17 .

The arm 80 is provided with a load detector 85 that detects the pressing force of the second cleaning body 181 against the wafer W. As shown in FIG. The load detector 85 is, for example, a load cell.

The substrate processing apparatus 1 described above is provided with a control unit 200 as shown in FIG. Control unit 200 is, for example, a computer, and has a program storage unit (not shown). A program for controlling the processing of the wafer W in the substrate processing apparatus 1 is stored in the program storage unit. The program storage unit also stores programs for controlling the operation of drive systems such as the various drive devices and moving devices described above and various nozzles to realize the cleaning process in the substrate processing apparatus 1 . The program is recorded on a computer-readable storage medium H such as a computer-readable hard disk (HD), flexible disk (FD), compact disk (CD), magnet optical disk (MO), memory card, or the like. It may have been installed in the control unit 200 from the storage medium H.

Next, the cleaning process of the wafer W in the substrate processing apparatus 1 will be described. FIG. 3 is a flow chart showing the procedure of a series of cleaning processes by the substrate processing apparatus 1. As shown in FIG. 4 and 5 are diagrams showing an operation example of the loading process, FIGS. 6 to 8 are diagrams showing an operation example of the bottom surface cleaning process, and FIGS. 9 to 13 are diagrams of the double-sided cleaning process. It is a figure which shows the example of an operation.

As shown in FIG. 3, in the substrate processing apparatus 1, loading processing is first performed (step S101). In the loading process, as shown in FIG. 4, the wafer W is transported above the upper cup 16 by a transport mechanism 90 provided outside the substrate processing apparatus 1 . Subsequently, the elevating pins 22 are raised and the wafer W is transferred to the elevating pins 22 . At this time, the suction pad 10 is on standby at a position where its upper surface is higher than the upper surface of the second cleaning body 181 , and the spin chuck 11 is retracted to a position whose upper surface is lower than the upper surface of the second cleaning body 181 . After that, the lifting pins 22 are lowered, and the wafer W is transferred to the suction pad 10 and held by suction as shown in FIG.

Subsequently, a lower surface cleaning process is performed (step S102). In the lower surface cleaning process, first, as shown in FIG. 6, the suction pad 10 holding the wafer W is moved horizontally (here, in the X-axis direction) together with the support plate 14 and the upper cup 16 . As a result, the spin chuck 11 is placed near the outer periphery of the wafer W, and the second cleaning unit 18 is placed near the center of the wafer W. As shown in FIG.

Subsequently, as shown in FIG. 7, the second cleaning body 181 is pressed against the lower surface of the wafer W by elevating the second cleaning unit 18 using the moving unit 81 (see FIG. 2), for example. At this time, the moving part 81 raises the second cleaning part 18 so that the pressing force of the second cleaning body 181 against the wafer W becomes a desired value. The distance by which the second cleaning unit 18 is lifted can be determined based on the detection result of the load detection unit 85, for example. Although the second cleaning unit 18 is raised here, the lower surface of the wafer W may be pressed against the second cleaning body 181 by lowering the suction pad 10 . Alternatively, the suction pad 10 may be lowered while the second cleaning unit 18 is raised.

After that, the supply of pure water to the lower surface of the wafer W from the cleaning nozzle 80a (see FIG. 1) is started. Also, the rotation of the second cleaning body 181 is started.

The cleaning of the lower surface of the wafer W by the second cleaning unit 18 proceeds by combining the movement of the wafer W by the suction pad 10 and the movement of the second cleaning unit 18 by the moving unit 81 . For example, as shown in FIG. 8, the second cleaning body 181 is caused to reciprocate between the two suction pads 10 along the Y-axis direction, and when the moving direction of the second cleaning body 181 is switched, the second cleaning body The suction pad 10 is moved in the negative direction of the X-axis by a distance equal to or less than the diameter of 181 . As a result, the second cleaning body 181 cleans the central region A of the wafer W including the region held by the spin chuck 11 by suction. After that, the rotation of the second cleaning body 181 is stopped, and the supply of pure water from the cleaning nozzle 80a is stopped.

Subsequently, a double-sided cleaning process is performed (step S103). In the double-sided cleaning process, first, as shown in FIG. 9, after the suction pad 10 is moved to position the central portion of the wafer W above the spin chuck 11, the suction of the wafer W by the suction pad 10 is released. The wafer W is transferred from the suction pad 10 to the spin chuck 11 by lifting the spin chuck 11 .

Further, as shown in FIG. 10, after the first cleaning unit 17 is positioned above the center of the wafer W using the moving unit 71 (see FIG. 2), the first cleaning unit 17 is lowered to move the first cleaning body. 171 is pressed against the upper surface of the wafer W. At this time, the moving part 71 is configured so that the pressing force of the first cleaning body 171 against the wafer W becomes a desired value, specifically, the same as the pressing force of the second cleaning body 181 against the wafer W. The first cleaning unit 17 is lowered so that the value of . The distance by which first cleaning unit 17 is lowered can be determined, for example, based on the detection result of load detection unit 75 .

Here, for both the first cleaning unit 17 and the second cleaning unit 18, pressure control is performed based on the detection results of the load detection units 75 and 85 so that the pressing force against the wafer W becomes a desired value. However, one of the first cleaning unit 17 and the second cleaning unit 18 may not be subjected to pressure control, but may be subjected to position control to maintain a state of being arranged at a predetermined height position. . For example, while maintaining the state in which the first cleaning body 171 is arranged at a predetermined height position for the first cleaning unit 17, the pressing force of the second cleaning unit 18 against the wafer W may be a desired value. The height position of the second cleaning unit 18 may be adjusted based on the detection result of the load detection unit 85 so that As a result, it is possible to clean the upper surface and the lower surface of the wafer W with the same pressing force only by controlling the pressure of one of the first cleaning unit 17 and the second cleaning unit 18, so that the pressing force can be adjusted. can be facilitated.

Subsequently, as shown in FIG. 11, the wafer W is rotated by rotating the spin chuck 11 using the drive mechanism 21 . Also, the supply of pure water from the cleaning nozzle 70a to the upper surface of the wafer W is started, and the rotation of the first cleaning body 171 is started. Then, the moving part 71 is used to move the first cleaning body 171 in the horizontal direction (positive direction of the X-axis). Thereby, the central region of the upper surface of the wafer W is cleaned by the first cleaning body 171 . Note that the first cleaning body 171 may be pressed against the wafer W after the wafer W and the first cleaning body 171 are rotated.

It is assumed that the second cleaning body 181 is stopped at a position displaced from the center of the wafer W in the direction along the rail 72 (see FIG. 1). That is, the second cleaning body 181 is arranged at a position overlapping the course of the first cleaning body 171 in plan view.

Subsequently, as shown in FIG. 12, when the first cleaning body 171 reaches a position where the first cleaning body 171 and the second cleaning body 181 overlap in plan view, the wafer W is removed from the cleaning nozzle 80a (see FIG. 1). Supply of pure water to the lower surface is started, and rotation of the second cleaning body 181 is started. Then, as shown in FIG. 13, the first cleaning body 171 and the second cleaning body 181 are separated from each other by the wafer W so that the first cleaning body 171 and the second cleaning body 181 overlap each other in plan view. , in the same direction (positive direction of the X-axis) at the same speed. That is, the first cleaning body 171 and the second cleaning body 181 are synchronously moved horizontally.

While the first cleaning body 171 and the second cleaning body 181 are synchronously moved horizontally, the pressing force of the first cleaning body 171 against the wafer W is the same as the pressing force of the second cleaning body 181 against the wafer W. adjusted to be the same. Therefore, it is possible to prevent the wafer W from bending downward due to being pushed by the first cleaning body 171 or bending upward due to being pushed by the second cleaning body 181 .

When the first cleaning body 171 and the second cleaning body 181 reach the outer peripheral portion of the wafer W, the rotation of the first cleaning body 171 and the second cleaning body 181 is stopped, and the supply of pure water from the cleaning nozzles 70a and 80a is stopped. Stop. Also, the first cleaning body 171 and the second cleaning body 181 are retracted from the wafer W. As shown in FIG.

The timing of stopping the supply of pure water from the cleaning nozzle 70a is preferably after stopping the supply of pure water from the cleaning nozzle 80a. As a result, pure water can be prevented from flowing from the bottom surface of the wafer W to the top surface of the wafer W, which is the circuit forming surface. However, the present invention is not limited to this, and the supply of pure water from the cleaning nozzles 70a and 80a may be stopped at the same time.

Subsequently, a drying process is performed (step S104). In the drying process, the wafer W is dried by rotating the spin chuck 11 at high speed to shake off the pure water adhering to the wafer W. As shown in FIG.

After that, carry-out processing is performed (step S105). In the unloading process, the wafer W is transferred to the transport mechanism 90 in the reverse order of the loading process (step S101). Thus, a series of cleaning processes for one wafer W is completed.

As described above, the substrate processing apparatus 1 according to the first embodiment can simultaneously clean both the upper surface and the lower surface of the wafer W by horizontally moving the first cleaning unit 17 and the second cleaning unit 18 synchronously. I decided to do a cleaning process.

As a result, the wafer W can be cleaned with a stronger pressing force than when the upper surface of the wafer W and the lower surface of the wafer W are cleaned separately. This point will be described with reference to FIGS. 14 and 15. FIG. FIG. 14 is a diagram showing an example of cleaning only the lower surface of the wafer W, and FIG. 15 is a diagram showing an example of cleaning both surfaces of the wafer W at the same time.

As shown in FIG. 14, for example, when only the lower surface of the wafer W is cleaned using the second cleaning unit 18, the wafer W is removed from the second cleaning body 181 by pressing the second cleaning body 181 against the wafer W. It is difficult to apply a strong force to the wafer W because it bends in the escape direction. This is the same when only the upper surface of the wafer W is cleaned using the first cleaning body 171 .

When only the lower surface of the wafer W is cleaned using the second cleaning unit 18 , pressing the second cleaning body 181 against the wafer W applies an upward force to the wafer W. There is a risk that it will come off. Therefore, the pressing force of the second cleaning body 181 is restricted by the adsorption force of the spin chuck 11 . That is, the pressing force is limited to such an extent that the wafer W does not come off the spin chuck 11 . For this reason, it is particularly difficult to wash the bottom surface of the wafer W strongly.

In contrast, in the substrate processing apparatus 1 according to the first embodiment, the wafer W is sandwiched between the first cleaning unit 17 and the second cleaning unit 18, so that the wafer W is pressed from both above and below. . As a result, the force of the first cleaning unit 17 pushing down the wafer W and the force of the second cleaning unit 18 pushing up the wafer W can be canceled out. Therefore, the pressing force of the first cleaning unit 17 and the second cleaning unit 18 can be set high without bending the wafer W and without being restricted by the adsorption force of the spin chuck 11 . . For example, the pressure of the first cleaning body 171 determined according to the force that can be applied to the upper surface of the wafer W (for example, a pressure that does not excessively scrape the film) or the force that can effectively clean the upper surface of the wafer W. By combining the pressing force of the lower surface of the wafer W with the pressing force, the lower surface of the wafer W is strongly cleaned with a pressing force stronger than the pressing force determined in consideration of the restriction due to the adsorption force of the spin chuck 11. - 特許庁can be done.

Thus, according to the substrate processing apparatus 1 of the first embodiment, the wafer W can be cleaned more powerfully than when only one surface of the wafer W is cleaned using a single cleaning body. be able to.

Further, according to the substrate processing apparatus 1 according to the first embodiment, by cleaning the upper surface and the lower surface of the wafer W at the same time, for example, after cleaning one surface of the wafer W, the wafer W is rotated using the reversing mechanism. The time required for cleaning both surfaces of the wafer W can be shortened as compared with the case where the cleaning of the other surface is performed after the front and back of the wafer W is reversed.

In the substrate processing apparatus 1 according to the first embodiment, for example, when the first cleaning body 171 and the second cleaning body 181 completely overlap in plan view, specifically, the rotation center of the first cleaning body 171 and the center of rotation of the second cleaning body 181 match in plan view, the second cleaning body 181 is horizontally moved in synchronization with the first cleaning body 171 . As a result, the deflection of the wafer W is greater than when the first cleaning body 171 and the second cleaning body 181 are horizontally moved while the rotation center of the first cleaning body 171 and the rotation center of the second cleaning body 181 are deviated from each other. can be suppressed more reliably.

When the first cleaning body 171 is displaced toward the center of the wafer W, the force received by the first cleaning body 171 is lower than when the first cleaning body 171 is not displaced, and is displaced toward the outer periphery. In this case, the height is higher than when the first cleaning body 171 is not displaced. Therefore, the controller 200 may detect the displacement of the first cleaning body 171 based on the detection result of the load detector 75 (see FIG. 2). The same is true for the second cleaning body 181 , and the control section 200 can detect the displacement of the second cleaning body 181 based on the detection result of the load detection section 85 .

The size of the contact surface of the first cleaning body 171 with the wafer W and the size of the contact surface of the second cleaning body 181 with the wafer W may be the same or different. For example, it may be desired that the circuit-formed surface of the wafer W be cleaned softer than the circuit-unformed surface. In such a case, the size of the contact surface of the first cleaning body 171 that cleans the upper surface, which is the circuit forming surface, of the wafer W may be made larger than the size of the contact surface of the second cleaning body 181 . By increasing the size of the contact surface, even when the first cleaning body 171 and the second cleaning body 181 are pressed against the wafer W with the same force, the force per unit area applied to the upper surface of the wafer W can be reduced. It can be less than the force per unit area applied to the lower surface. Therefore, the upper surface of the wafer W can be cleaned softer than the lower surface. Also, the size of the contact surface of the second cleaning body 181 that cleans the lower surface of the wafer W may be made larger than the size of the contact surface of the first cleaning body 171 . By increasing the size of the contact surface, the target surface can be cleaned in a shorter period of time. Further, by increasing the size of the contact surface, the cleaning target portion of the wafer W can be cleaned with a smaller amount of movement, so that the size of the driving portion (for example, the rails 72, 82, etc.) can be reduced. Therefore, the substrate processing apparatus 1 can be miniaturized.

Further, when it is desired to softly clean the circuit forming surface of the wafer W, the first cleaning body 171 for cleaning the upper surface, which is the circuit forming surface, of the wafer W may be made of a softer material than the second cleaning body 181. . By forming the first cleaning body 171 with a soft material, it is possible to make the circuit formation surface less likely to be damaged, so that the upper surface of the wafer W can be cleaned softer than the lower surface.

Further, here, when the first cleaning body 171 and the second cleaning body 181 completely overlap in plan view, in other words, the rotation center of the first cleaning body 171 and the rotation center of the second cleaning body 181 are in a plane. The second cleaning body 181 is moved synchronously with the first cleaning body 171 when they visually match. However, the timing for starting synchronization between the first cleaning body 171 and the second cleaning body 181 is not limited to the above example. This point will be described with reference to FIGS. 16 and 17. FIG. 16 and 17 are diagrams showing other examples of timing for starting synchronization between the first cleaning body 171 and the second cleaning body 181. FIG.

In the above example, the first cleaning body 171 moves along the positive direction of the X-axis, and when the rotation center R1 of the first cleaning body 171 coincides with the rotation center R2 of the second cleaning body 181 in plan view, , the second cleaning body 181 is moved synchronously with the first cleaning body 171 . However, the synchronization between the first cleaning body 171 and the second cleaning body 181 is such that the contact surface of the first cleaning body 171 with the wafer W and the contact surface of the second cleaning body 181 with the wafer W overlap in plan view. It should be started within the period specified.

Therefore, as shown in FIG. 16, for example, the movement of the first cleaning body 171 in the X-axis direction caused the contact surface of the first cleaning body 171 and the contact surface of the second cleaning body 181 to partially overlap each other. After that, even if the second cleaning body 181 is moved synchronously with the first cleaning body 171 before the rotation center R1 of the first cleaning body 171 and the rotation center R2 of the second cleaning body 181 match in plan view. good. Further, as shown in FIG. 17, while the contact surface of the first cleaning body 171 and the contact surface of the second cleaning body 181 overlap each other, the center of rotation R1 of the first cleaning body 171 and the second cleaning body The second cleaning body 181 may be moved synchronously with the first cleaning body 171 after the center of rotation R2 of the cleaning body 181 coincides with the center of rotation R2 in plan view.

Also, the contact surface of the second cleaning body 181 does not necessarily overlap the contact surface of the first cleaning body 171 in plan view. This point will be described with reference to FIG. FIG. 18 is a diagram showing another example of the position where the second cleaning body 181 overlaps the first cleaning body 171. As shown in FIG.

As shown in FIG. 18, a region where the first cleaning body 171 contacts the upper surface of the wafer W while the wafer W rotates about the central axis C (hereinafter referred to as a contact region B) and a second cleaning region. The second cleaning body 181 may be horizontally moved in synchronism with the first cleaning body 171 so that the contact surface of the body 181 with the wafer W is kept overlapping in plan view. Even in this case, the force by which the second cleaning unit 18 pushes up the wafer W can be weakened by the force by which the first cleaning unit 17 pushes the wafer W down. Therefore, the pressing force of the second cleaning unit 18 can be set high without bending the wafer W and without being restricted by the adsorption force of the spin chuck 11 .

An example of the double-sided cleaning process in this case will be described with reference to FIGS. 19 to 21. FIG. 19 to 21 are diagrams showing another operation example of the double-sided cleaning process.

For example, as shown in FIG. 19, the first cleaning body 171 is brought into contact with the upper surface of the end of the wafer W on the positive X-axis side, and the second cleaning body 181 is placed on the end of the wafer W on the positive X-axis direction. Make contact with the bottom surface. Subsequently, the first cleaning body 171 and the second cleaning body 181 are rotated to move the first cleaning body 171 and the second cleaning body 181 toward the end of the wafer W on the X-axis negative direction side in the X-axis negative direction. move at the same speed along the As a result, the second cleaning body 181 moves while maintaining a state of overlapping with the contact area B in plan view.

Subsequently, as shown in FIG. 20 , the movement and rotation of the second cleaning body 181 are stopped at a position before it interferes with the spin chuck 11 . On the other hand, the first cleaning body 171 continues to move. As a result, synchronization between the first cleaning body 171 and the second cleaning body 181 is released.

Subsequently, as shown in FIG. 21, when the first cleaning body 171 moves further in the X-axis negative direction and the second cleaning body 181 overlaps the contact area B again in plan view, the second cleaning body 181 to move the second cleaning body 181 at the same speed as the first cleaning body 171 and in the opposite direction to the first cleaning body 171 . As a result, the second cleaning body 181 moves again while maintaining a state of overlapping with the contact area B in plan view. Thereafter, when the first cleaning body 171 reaches the end of the wafer W on the X-axis negative direction side and the second cleaning body 181 reaches the end of the wafer W on the X-axis positive direction side, the first cleaning is performed. The rotation of the body 171 and the second cleaning body 181 is stopped to finish the double-sided cleaning process.

As described above, the substrate processing apparatus 1 according to the first embodiment includes the spin chuck 11 (an example of the holding portion), the first cleaning body 171, the arm 70, the moving portion 71 and the rails 72 (first moving portion). an example of a mechanism), a second cleaning body 181, an arm 80, a moving portion 81 and a rail 82 (an example of a second moving mechanism), and a control portion 200. A spin chuck 11 holds a wafer W (an example of a substrate). The first cleaning body 171 cleans the upper surface of the wafer W by coming into contact with the upper surface of the wafer W held by the spin chuck 11 . Arm 70 , moving part 71 and rail 72 horizontally move first cleaning body 171 . The second cleaning body 181 cleans the lower surface of the wafer W by coming into contact with the lower surface of the wafer W held by the spin chuck 11 . Arm 80 , moving portion 81 and rail 82 horizontally move second cleaning body 181 . The controller 200 controls the moving part 71 and the arm 80 to horizontally move the first cleaning body 171 in contact with the upper surface of the wafer W and the second cleaning body 181 in contact with the lower surface of the wafer W in synchronization. Execute the double-sided cleaning process.

For example, in a plan view of the wafer W held by the spin chuck 11 in the thickness direction, the control unit 200 controls the contact surface of the first cleaning body 171 with the upper surface of the wafer W and the contact surface of the wafer W of the second cleaning body 181. A process of horizontally moving the first cleaning body 171 and the second cleaning body 181 while maintaining a state in which the contact surface with the lower surface overlaps is performed as a double-sided cleaning process.

As a result, for example, the force of the first cleaning unit 17 pushing down the wafer W and the force of the second cleaning unit 18 pushing up the wafer W can cancel each other out. It is possible to set the pressing force of the first cleaning body 171 and the second cleaning part 18 to be high without being restricted by the adsorption force of 11 . Therefore, according to the substrate processing apparatus 1 according to the first embodiment, the wafer W can be strongly cleaned using the first cleaning body 171 and the second cleaning body 181 .

Further, the substrate processing apparatus 1 further includes a first driving section 173 that rotates the first cleaning body 171 around the vertical axis, and a second driving section 183 that rotates the second cleaning body 181 around the vertical axis. The unit 200 rotates the first cleaning body 171 and the second cleaning body 171 in a state where the rotation center of the first cleaning body 171 by the first driving section 173 and the rotation center of the second cleaning body 181 by the second driving section 183 are aligned. The process of horizontally moving the body 181 is executed as double-sided cleaning process. As a result, bending of the wafer W can be suppressed more reliably than when the center of rotation of the first cleaning body 171 and the center of rotation of the second cleaning body 181 are deviated from each other.

Further, in the double-side cleaning process, the control unit 200 makes the pressing force of the first cleaning body 171 against the upper surface of the wafer W and the pressing force of the second cleaning body 181 against the lower surface of the wafer W to be the same. , at least one of the moving part 71 and the moving part 81 is controlled to adjust the height position of at least one of the first cleaning body 171 and the second cleaning body 181 . In this manner, by setting the pressing force of the first cleaning body 171 against the upper surface of the wafer W and the pressing force of the second cleaning body 181 against the lower surface of the wafer W to be the same magnitude, for example, the first cleaning When the pressing force of the body 171 exceeds the pressing force of the second cleaning body 181 , the wafer W may bend downward or the pressing force of the second cleaning body 181 may exceed the pressing force of the first cleaning body 171 . By exceeding, it can suppress that the wafer W bends upwards.

Further, the substrate processing apparatus 1 further includes load detection units 75 and 85 for detecting the pressing force of the first cleaning body 171 against the upper surface of the wafer W or the pressing force of the second cleaning body 181 against the lower surface of the wafer W. Prepare. Then, the control unit 200 arranges one of the first cleaning body 171 and the second cleaning body 181 at a predetermined height position, and arranges the other one of the first cleaning body 171 and the second cleaning body 181 at a predetermined height. The position is adjusted based on the detection results of the load detection units 75 and 85 . This makes it easier to adjust the pressing force.

(Second embodiment)
In the above-described first embodiment, the lower surface cleaning process (step S102) and the double-side cleaning process (step S103) are performed while the height of the upper cup 16 is kept constant. The height of the upper cup 16 may be changed depending on the cleaning process. Such a case will be described with reference to FIGS. 22 and 23. FIG. FIG. 22 is a diagram showing the height position of the upper cup 16 in the lower surface cleaning process, and FIG. 23 is a diagram showing the height position of the upper cup 16 in the double side cleaning process.

For example, as shown in FIG. 22, the substrate processing apparatus 1A according to the second embodiment includes an elevating mechanism 45 that elevates the support plate 14 independently of the upper cup 16. As shown in FIG. The elevating mechanism 45 includes, for example, a support member 46 that supports the support plate 14 and a drive unit 47 that raises and lowers the support member 46 .

In the substrate processing apparatus 1A, the height position of the upper cup 16 is set to H1 by lifting the support plate 14 using the lifting mechanism 45 in the lower surface cleaning process. The height position of the upper cup 16 refers to the height position of the upper cup 16 when the upper surface of the wafer W sucked and held by the suction pad 10 or the spin chuck 11 is used as a reference. The height position H1 is a position where pure water or the like can be prevented from flowing from the bottom surface of the wafer W to the top surface.

Subsequently, in the substrate processing apparatus 1A, after setting the height position of the upper cup 16 to H2, which is higher than H1, double-sided cleaning processing is performed. That is, after the height position of the upper cup 16 is changed to H2, the supply of pure water to the upper surface of the wafer W from the cleaning nozzle 70a is started. The height position H<b>2 is a height position where it is possible to suppress the pure water or the like splashing from the rotating first cleaning body 171 from splashing to the outside of the upper cup 16 . The height position of the upper cup 16 can be changed by adjusting the height position of the spin chuck 11, for example.

In this manner, the substrate processing apparatus 1A may change the height position of the upper cup 16 with respect to the wafer W during the lower surface cleaning process and during the double side cleaning process. As a result, pure water or the like can be prevented from flowing into the upper surface of the wafer W during the lower surface cleaning process, or from splashing out of the upper cup 16 during the double-side cleaning process.

(Third embodiment)
In each of the above-described embodiments, an example in which the substrate processing apparatus 1, 1A includes the first cleaning unit 17 and the second cleaning unit 18 as cleaning tools has been described, but other cleaning tools may be included. . This point will be described with reference to FIG. FIG. 24 is a diagram showing an example of another cleaning tool.

As shown in FIG. 24, the substrate processing apparatus 1B according to the third embodiment cleans the edge of the wafer W using, for example, a cleaning body such as a brush or a sponge in addition to the first cleaning section 17 and the second cleaning section 18 . a third cleaning unit 30 for cleaning the wafer W, a fourth cleaning unit 31 for supplying the cleaning fluid toward the bottom surface of the wafer W, a fifth cleaning unit 32 for supplying the cleaning fluid toward the top surface of the wafer W, and the like. may be The substrate processing apparatus 1B can select and use an optimum tool from among these cleaning tools according to the type of wafer W to be processed.

For example, in the bottom surface cleaning process, the bottom surface of the wafer W may be cleaned using the fourth cleaning unit 31 in addition to the second cleaning unit 18 . Further, in the double-sided cleaning process, the upper surface of the wafer W may be cleaned using the fifth cleaning section 32 in addition to the first cleaning section 17 . In this way, cleaning time can be shortened by simultaneously cleaning with a plurality of types of cleaning tools. Further, for example, dust and the like lifted up by the first cleaning body 171 or the second cleaning body 181 can be efficiently removed using the fourth cleaning section 31 or the fifth cleaning section 32 . Further, after finishing the double-sided cleaning process, the fourth cleaning section 31 and the fifth cleaning section 32 may be used to perform the rinsing process, and then the drying process may be performed.

The fourth cleaning section 31 and the fifth cleaning section 32 are, for example, two-fluid nozzles. The fourth cleaning unit 31 and the fifth cleaning unit 32, which are two-fluid nozzles, mist the cleaning liquid and spray it onto the wafer W. As shown in FIG. The fourth cleaning unit 31 and the fifth cleaning unit 32 are not limited to two-fluid nozzles, and may be normal nozzles that eject cleaning liquid.

Further, the substrate processing apparatus 1B may include a plurality of first cleaning units 17 each having different removal performance. For example, when high removal performance is required, the first cleaning unit 17 having the first cleaning body 171 with high removal performance is used, or when it is desired to clean the upper surface without damaging it as much as possible, a soft first cleaning unit is used. A first cleaning part 17 having a body 171 can be used. Similarly, the substrate processing apparatus 1B may include a plurality of second cleaning units 18 each having different removal performance.

Thus, the substrate processing apparatus 1B may include cleaning tools other than the first cleaning unit 17 and the second cleaning unit 18. FIG.

(Fourth embodiment)
In the above-described embodiment, in the double-sided cleaning process, the first cleaning body 171 and the second cleaning body 181 are synchronized to clean both surfaces of the wafer W at the same time. is not limited to the first cleaning body 171 . This point will be described with reference to FIG. FIG. 25 is a diagram showing an operation example of double-sided cleaning processing according to the fourth embodiment.

As shown in FIG. 25, a substrate processing apparatus 1C according to the fourth embodiment includes, for example, a second cleaning section 18 and a fifth cleaning section 32 as cleaning tools. The fifth cleaning section 32 is a two-fluid nozzle.

In the substrate processing apparatus 1C according to the fourth embodiment, the second cleaning section 18 and the fifth cleaning section 32 are synchronized to perform the double-sided cleaning process. Specifically, it is similar to the case of synchronizing the first cleaning body 171 and the second cleaning body 181. As shown in FIG. When the fifth cleaning unit 32 reaches a position where the two overlap in plan view, the second cleaning unit 181 is rotated and moved in the same direction (X-axis positive direction) at the same speed as the fifth cleaning unit 32. move horizontally.

According to the substrate processing apparatus 1C according to the fourth embodiment, the force of the second cleaning unit 18 pushing up the wafer W is weakened by the force of the mist-like cleaning liquid supplied from the fifth cleaning unit 32 pushing down the wafer W. can be done. Therefore, the pressing force of the second cleaning unit 18 can be set high without bending the wafer W and without being restricted by the adsorption force of the spin chuck 11 . Also in the double-sided cleaning process using the second cleaning section 18 and the fifth cleaning section 32, it is desirable to set the height position of the upper cup 16 to a position higher than the height position H1 in the lower surface cleaning process. As a result, it is possible to prevent the misted cleaning liquid supplied from the fifth cleaning section 32 from scattering outside the upper cup 16 .

(Fifth embodiment)
In the fifth embodiment, a cleaning tool for cleaning the upper surface of the wafer W and a cleaning tool for cleaning the lower surface of the wafer W will be described with reference to FIG. FIG. 26 is a diagram showing an operation example of the tool cleaning process.

For example, as shown in FIG. 26, a substrate processing apparatus 1D according to the fifth embodiment includes a first cleaning section 17 and a second cleaning section 18. As shown in FIG. In the substrate processing apparatus 1D, when the wafer W is not suction-held by the suction pad 10 and the spin chuck 11, for example, after the carry-out process (step S105) and before the carry-in process (step S101) of the next wafer W is performed. Then, perform the tool cleaning process.

Specifically, the substrate processing apparatus 1D moves the first cleaning body 171 while the contact surface of the first cleaning body 171 with the wafer W and the contact surface of the second cleaning body 181 with the wafer W are in contact with each other. and rotate the second cleaning body 181 . Further, the substrate processing apparatus 1D supplies pure water toward the second cleaning body 181 from the cleaning nozzle 70a. Thereby, the contact surface of the first cleaning body 171 and the contact surface of the second cleaning body 181 can be cleaned simultaneously. At this time, the first cleaning body 171 is rotated in a direction opposite to the rotating direction of the second cleaning body 181, so that the contact surface of the first cleaning body 171 and the contact surface of the second cleaning body 181 are more strongly cleaned. be able to.

The tool cleaning process is not limited to the above examples. For example, the substrate processing apparatus 1B according to the third embodiment cleans the contact surface of the second cleaning body 181 by supplying cleaning fluid from the fifth cleaning unit 32 toward the contact surface of the second cleaning body 181. A tool cleaning process may also be performed. Further, the substrate processing apparatus 1B performs a tool cleaning process of cleaning the contact surface of the first cleaning body 171 by supplying cleaning fluid from the fourth cleaning section 31 toward the contact surface of the first cleaning body 171. good too.

(Sixth embodiment)
In each of the above-described embodiments, an example of partially synchronizing the first cleaning unit 17 and the second cleaning unit 18 in the double-sided cleaning process has been described. Full synchronization is also possible. This point will be described with reference to FIGS. 27 to 30. FIG. FIG. 27 is a plan view showing the configuration of a substrate processing apparatus according to the sixth embodiment. FIG. 28 is a longitudinal sectional view showing the configuration of a substrate processing apparatus according to the sixth embodiment. 29 and 30 are diagrams showing an operation example of the double-sided cleaning process according to the sixth embodiment.

As shown in FIGS. 27 and 28, the substrate processing apparatus 1E according to the sixth embodiment includes an annular holding portion 24 having a plurality of holding portions 23 for holding the peripheral portion of the wafer W, and An annular fixed portion 25 arranged concentrically with the holding portion 24 on the outer peripheral side, and an annular bearing 26 arranged between the holding portion 24 and the fixed portion 25 .

The fixed portion 25 is fixed, for example, to the inner wall of the upper cup 16E. The holding portion 24 is rotatably supported by the fixed portion 25 via bearings 26 . Bearing 26 is, for example, a ball bearing.

The substrate processing apparatus 1</b>E also includes a belt 27 stretched over the peripheral surface of the holding section 24 and a driving section 28 that rotates the holding section 24 via the belt 27 . The belt 27 is pulled out of the upper cup 16E through an opening 161 formed in the side surface of the upper cup 16E and connected to the driving portion 28, for example.

Further, as shown in FIG. 27, the second cleaning section 18 according to the sixth embodiment is horizontally supported by an arm 80E. Arm 80E is connected to moving part 81E. The moving part 81E horizontally moves the arm 80E along a rail 82E extending in the horizontal direction (here, the X-axis direction). Further, the moving part 81E raises and lowers the arm 80E along the vertical direction (Z-axis direction).

The substrate processing apparatus 1E according to the sixth embodiment starts the double-sided cleaning process (step S103) without performing the lower surface cleaning process (step S102) after the carrying-in process (step S101). As shown in FIG. 29, in the double-sided cleaning process according to the sixth embodiment, the first cleaning body 171 is pressed against the central portion of the upper surface of the wafer W, and the second cleaning body 181 is pressed against the central portion of the lower surface of the wafer W. press against. Thereafter, the wafer W is rotated by rotating the holding portion 24 using the driving portion 28 . Also, the first cleaning body 171 and the second cleaning body 181 are rotated. The first cleaning body 171 and the second cleaning body 181 may be pressed against the wafer W after the wafer W, the first cleaning body 171 and the second cleaning body 181 are rotated.

Subsequently, as shown in FIG. 30, the first cleaning body 171 and the second cleaning body 181 are horizontally moved toward the outer periphery of the wafer W at the same speed in the same direction (X-axis positive direction). As a result, the entire upper surface of the wafer W is cleaned by the first cleaning body 171 , and the entire lower surface of the wafer W is cleaned by the second cleaning body 181 .

As described above, in the substrate processing apparatus 1E according to the sixth embodiment, since the spin chuck 11 does not exist in the central portion of the lower surface of the wafer W, the movement of the second cleaning body 181 starts from the central portion of the lower surface of the wafer W. can be made Therefore, according to the substrate processing apparatus 1E according to the sixth embodiment, the first cleaning body 171 and the second cleaning body 181 can be completely synchronized in the double-sided cleaning process.

Although the double-sided cleaning process is started from the central portion of the wafer W here, the double-sided cleaning process may be started from one edge of the wafer W (for example, the negative side of the X-axis). That is, the first cleaning body 171 and the second cleaning body 181 may be moved from one end of the wafer W to the other end at the same speed.

Also, here, an example in which the holding portion 24 is rotated using the belt 27 is shown, but the method for rotating the holding portion 24 is not limited to the above example. For example, a gearbox may be used to rotate holding portion 24 . In addition, a holding plate that holds the outer periphery of the wafer W, a shaft connected to the lower portion of the holding plate, and a driving portion that rotates the shaft are provided. A configuration in which an arm supporting the second cleaning body 181 is inserted through the hole and the second cleaning body 181 is arranged between the wafer W and the holding plate may be employed. According to this configuration, the second cleaning body 181 can be moved from the central portion to the outer peripheral portion of the wafer W without interfering with the shaft.

(Seventh embodiment)
In the seventh embodiment, another configuration example of the first cleaning body 171 and the second cleaning body 181 will be described. As an example, other structural examples of the second cleaning body 181 are shown in FIGS. 31 to 33. FIG. FIG. 31 is a perspective view showing the configuration of the second cleaning body according to the seventh embodiment. Also, FIG. 32 is a longitudinal sectional view showing the configuration of the second cleaning body according to the seventh embodiment. Also, FIG. 33 is a diagram showing a state in which the second cleaning body according to the seventh embodiment is pressed against the wafer W. As shown in FIG.

A second cleaning body 181F according to the seventh embodiment shown in FIG. 31 has a function as a polishing body for polishing the lower surface of the wafer W in addition to a function as a cleaning body.

Specifically, as shown in FIG. 31, the second cleaning body 181F includes a polishing member 50 having a polishing surface 50a made of, for example, urethane foam or nonwoven fabric, and a flexible material such as polyvinyl alcohol, polypropylene, or nylon. and a support member 52 that supports the polishing member 50 and the cleaning member 51 . The polishing surface 50a of the polishing member 50 is formed so as to be smaller than the diameter of the wafer W, for example. It is constructed by pasting a sheet formed of or non-woven fabric. As an example of the shape of the polishing member 50, FIG. 31 illustrates a state in which eight arc-shaped polishing surfaces 50a having a predetermined width are concentrically provided at predetermined intervals.

The cleaning members 51 are formed, for example, in a sector shape, and are arranged inside the ring-shaped polishing member 50 so as to form a concentric circle with the polishing member 50 . Note that FIG. 31 shows an example in which four fan-shaped cleaning members 51 are arranged inside the polishing member 50 .

The surfaces of the polishing member 50 and the cleaning member 51 opposite to the supporting member 52 are a polishing surface 50a and a cleaning surface provided to face the wafer W. For example, as shown in FIG. The surface 51 a is formed to protrude upward from the polishing surface 50 a of the polishing member 50 . Therefore, when the second cleaning body 181F approaches the lower surface of the wafer W, the cleaning member 51 first contacts the lower surface of the wafer W. As shown in FIG. Since the cleaning member 51 is made of a stretchable material, even after the cleaning member 51 contacts the wafer W, the second cleaning body 181F can be pressed against the wafer W, for example, as shown in FIG. , the cleaning member 51 is compressed and the polishing member 50 is also brought into contact with the lower surface of the wafer W, so that the wafer W can be polished.

Thus, the second cleaning body 181F may function as a polishing body. In this case, for example, the lower surface of the wafer W can be polished by rotating the second cleaning body 181F while the polishing member 50 is in contact with the lower surface of the wafer W, as shown in FIG. After that, the second cleaning body 181F is lowered slightly to bring only the cleaning member 51 into contact with the bottom surface of the wafer W, and then the second cleaning body 181F is rotated to clean the bottom surface of the wafer W. can be washed.

(Eighth embodiment)
In the eighth embodiment, the configuration of a substrate processing apparatus separately provided with a cleaning body and a polishing section will be described with reference to FIGS. 34 to 36. FIG. FIG. 34 is a side view showing the configuration of the substrate processing apparatus according to the eighth embodiment. 35 and 36 are plan views showing the wafer W, the cleaning body, the polishing body, and the rotary plate.

As shown in FIG. 34, a substrate processing apparatus 1G according to the eighth embodiment is made of, for example, a circular plate, and is provided so as to face a wafer W held by a suction pad 10 or a spin chuck 11. and a cleaning body 6A and a polishing body 6B provided on the rotating plate 101. As shown in FIG. The rotary plate 101 is configured to be rotatable about a vertical axis by a drive mechanism 103 via a pivot 102 provided on the bottom side thereof. A pivot 102 is provided at the center of the rotating plate 101 . Therefore, in plan view, the center of the rotating plate 101 and the center of the turning shaft 102 are aligned, and this center becomes the turning center O1. In this example, the rotating plate 101, the rotating shaft 102, and the drive mechanism 103 form a rotating mechanism.

As shown in FIG. 35, the rotary plate 101 is set such that its radius r1 is smaller than the radius r2 of the wafer W. As shown in FIG. When cleaning the area including the central portion of the lower surface of the wafer W, the wafer W is held by the suction pad 10 and moved horizontally. That is, when cleaning the area including the central portion of the lower surface of the wafer W, the swivel shaft 102 is positioned so as to overlap the wafer W. As shown in FIG. Furthermore, in a plan view, the rotating shaft 102 of the rotating plate 101 and the shaft 20 of the spin chuck 11 are provided so as to line up along the horizontal direction (X-axis direction).

The cleaning body 6A and the polishing body 6B are composed of cylindrical brushes, for example, and are connected to drive mechanisms 112A and 112B via drive shafts 111A and 111B. The driving mechanisms 112A and 112B are provided on the rotating plate 101, and move the cleaning body 6A and the polishing body 6B up and down and rotate them around vertical axes.

The cleaning body 6A and the polishing body 6B are arranged laterally apart from each other on the rotating plate 101 . Further, the cleaning body 6A and the polishing body 6B rotate in one direction while the wafer W is held by the spin chuck 11 and rotating, so that both the cleaning body 6A and the polishing body 6B clean the lower surface of the wafer W. It is arranged so that it can be cleaned and polished in all areas except the central part. Turning in one direction means that one of the left and right sides of the shaft 20 of the spin chuck 11 viewed from the turning shaft 102 of the rotating plate 101, the cleaning body 6A positioned on the left side in this example is on the other side on the right side in this example. It means to turn around and move.

In this example, in plan view, with respect to the wafer W held by the spin chuck 11, when the cleaning body 6A is in the center, the polishing body 6B is positioned at the periphery, and when the polishing body 6B is in the center, the cleaning body 6A are provided so as to be positioned on the periphery. Positioning at the periphery means that the cleaning body 6A and the polishing body 6B are positioned so that the outer edge of the wafer W held by the spin chuck 11 can be cleaned (polished). It means that the cleaning body 6A and the polishing body 6B are positioned so that cleaning (polishing) can be performed on a straight line L connecting the center of rotation O1. FIG. 35 shows a state in which the cleaning body 6A is on the periphery and the polishing body 6B is in the center, and FIG. 36 shows a state in which the cleaning body 6A is in the center and the polishing body 6B is in the periphery.

Thus, when the cleaning body 6A located on the left side starts turning toward the right side, the polishing body 6B is positioned on the straight line L connecting the turning shaft 102 of the rotating plate 101 and the shaft 20 of the spin chuck 11, and when the turning ends. , the cleaning body 6A is positioned on the straight line L. Further, since the radius r1 of the rotary plate 101 is shorter than the radius r2 of the wafer W, the turning radii of the cleaning body 6A and the polishing body 6B are shorter than the wafer W radius r2. The turning radius is the length of the line connecting the centers of the cleaning body 6A and the polishing body 6B and the turning center O1 of the rotary plate 101. As shown in FIG.

As described above, the cleaning body 6A and the polishing body 6B are not limited to being provided integrally like the second cleaning body 181F according to the seventh embodiment, and may be provided separately.

(Ninth embodiment)
Next, a ninth embodiment will be described with reference to FIGS. 37 to 39. FIG. First, a configuration example of a substrate processing apparatus according to the ninth embodiment will be described with reference to FIG. FIG. 37 is a plan view showing the configuration of a substrate processing apparatus according to the ninth embodiment.

As shown in FIG. 37, the substrate processing apparatus 1H according to the ninth embodiment includes a first cleaning section 17H.

The first cleaning part 17H includes a first cleaning body 171H. The first cleaning body 171H is, for example, a two-fluid nozzle. The first cleaning body 171H mixes a gas supplied from a gas supply source (not shown) and a liquid supplied from a liquid supply source (not shown) to apply a mixed fluid of gas and liquid onto the wafer W. Discharge to the top. In addition, the gas supplied from the gas supply source is, for example, an inert gas such as nitrogen. Also, the liquid supplied from the liquid supply source is pure water, for example.

The first cleaning section 17H is horizontally supported by an arm 70H, and the arm 70H is connected to a moving section 71H. The moving part 71H horizontally moves the arm 70H along a rail 72H extending in the horizontal direction (here, the Y-axis direction).

Further, in the substrate processing apparatus 1H according to the ninth embodiment, the arm 80 supporting the second cleaning section 18 is connected to the turning section 81H, and the turning section 81H turns the arm 80 around the vertical axis. The substrate processing apparatus 1H may be configured to include a moving section 81 for horizontally moving the arm 80, like the substrate processing apparatus 1 according to the first embodiment.

Next, the bottom cleaning process in the ninth embodiment will be described with reference to FIG. FIG. 38 is a diagram showing an operation example of the lower surface cleaning process in the ninth embodiment.

As shown in FIG. 38, in the ninth embodiment, the cleaning of the lower surface of the wafer W by the second cleaning unit 18 consists of the movement of the wafer W by the suction pad 10 (see FIG. 37) and the movement of the wafer W by the turning unit 81H. It advances by combination with turning movement of. Specifically, the control unit 200H rotates the second cleaning body 181, and performs a predetermined turning movement in one direction (for example, the Y-axis positive direction) and the other turning movement (for example, in the Y-axis negative direction). repeat a number of times. Further, the controller 200H causes the suction pad 10 to move the wafer W in the negative direction of the X-axis. Thereby, the central area A is cleaned by the second cleaning body 181 .

Next, double-sided cleaning processing according to the ninth embodiment will be described with reference to FIG. FIG. 39 is a diagram showing an operation example of double-sided cleaning processing in the ninth embodiment.

As shown in FIG. 39, the controller 200H horizontally moves the first cleaning body 171H and the second cleaning body 181 in the direction in which the first cleaning body 171H and the second cleaning body 181 separate from each other in the double-sided cleaning process.

When the ejection position of the first cleaning body 171H and the rotation center of the second cleaning body 181 do not overlap in plan view, if the distance between the first cleaning body 171H and the second cleaning body 181 is short, the second cleaning body 181 There is a possibility that the cleaning of the lower surface of the wafer W may not be properly performed. This is because the wafer W bends due to the pressure of the mixed fluid discharged from the first cleaning body 171</b>H, and the wafer W partially floats from the second cleaning body 181 . Therefore, when the ejection position of the first cleaning body 171H and the center of rotation of the second cleaning body 181 do not overlap in plan view, it is better to separate the first cleaning body 171H and the second cleaning body 181 as much as possible.

Therefore, in the ninth embodiment, in the double-sided cleaning process, the first cleaning body 171H and the second cleaning body 181 are horizontally moved in the direction in which the first cleaning body 171H and the second cleaning body 181 separate. Accordingly, since the first cleaning body 171H and the second cleaning body 181 do not approach each other, the wafer W is prevented from being partially lifted from the second cleaning body 181 due to bending of the wafer W due to the pressure of the mixed fluid. . Therefore, since the lower surface of the wafer W can be appropriately cleaned by the second cleaning body 181 , the wafer W can be cleaned strongly using the second cleaning body 181 .

Specifically, the controller 200H first rotates the wafer W by rotating the spin chuck 11 . Further, the control unit 200H is positioned radially inward of the outer peripheral portion of the wafer W and shifted toward the moving direction of the first cleaning body 171H (here, negative Y-axis direction) relative to the center of the wafer W. , the second cleaning body 181 is arranged. Note that this position may be the position of the second cleaning body 181 at the end of the lower surface cleaning process described above. After that, the controller 200H starts supplying pure water from the cleaning nozzle 80a to the bottom surface of the wafer W while the second cleaning unit 181 is in contact with the bottom surface of the wafer W, and rotates the second cleaning unit 181. .

Subsequently, the control unit 200H controls the swivel unit 81H to move the wafer at a position shifted from the center of the wafer W to the opposite side of the moving direction of the first cleaning body 171H (here, the Y-axis positive direction side). The second cleaning body 181 is pivotally moved to the outer peripheral portion of W. Then, when the second cleaning body 181 reaches the outer peripheral portion of the wafer W, the control section 200H stops the turning movement of the second cleaning body 181 by the turning section 81H, and keeps the second cleaning body 181 there for a certain period of time. rotate.

Further, the control unit 200H controls the moving unit 71H to dispose the first cleaning body 171H above the center of the wafer W, and to discharge the mixed fluid from the first cleaning body 171H to the center of the upper surface of the wafer W. Then, the controller 200H moves the second cleaning body 181 at a timing after the second cleaning body 181 has moved at least to the opposite side of the moving direction of the first cleaning body 171H from the center of the wafer W (here, the Y-axis positive direction side). By controlling the portion 71H, the first cleaning body 171H is moved from the center of the wafer W to the outer peripheral portion in the Y-axis negative direction. As a result, the double-sided cleaning process can be performed without the first cleaning body 171H and the second cleaning body 181 approaching each other.

As described above, the substrate processing apparatus 1H according to the ninth embodiment includes a holding section (eg, the spin chuck 11), a first cleaning body 171H, a first moving mechanism (eg, an arm 70H, a moving section 71H and rails 72H), a second cleaning body 181, a second moving mechanism (for example, the arm 80 and the swivel portion 81H), and a control portion 200H. The holding unit holds a substrate (wafer W as an example). The first cleaning body 171H cleans one of the upper and lower surfaces of the substrate held by the holder by ejecting a fluid (eg, a mixed fluid) onto one of the surfaces (upper surface, as an example). The first moving mechanism horizontally moves the first cleaning body 171H. The second cleaning body 181 comes into contact with the other surface (for example, the lower surface) of the upper surface and the lower surface of the substrate held by the holding unit and cleans the other surface. The second moving mechanism horizontally moves the second cleaning body 181 . The control unit 200H controls the first moving mechanism and the second moving mechanism to synchronize the first cleaning body 171H discharging fluid to one surface and the second cleaning body in contact with the lower surface. and move it horizontally to perform the double-sided cleaning process.

Specifically, in the double-sided cleaning process, the control unit 200H controls the first moving mechanism and the second moving mechanism to move the first cleaning body 171H in the direction in which the first cleaning body 171H and the second cleaning body 181 move away from each other. and the second cleaning body 181 are horizontally moved.

Therefore, according to the substrate processing apparatus 1H according to the ninth embodiment, it is possible to make the wafer W less susceptible to warping due to the pressure of the mixed fluid. can be washed.

Here, an example of cleaning the upper surface of the wafer W using the first cleaning body 171H and cleaning the lower surface of the wafer W using the second cleaning body 181 is shown. may be used to clean the bottom surface of the wafer W, and the second cleaning body 181 may be used to clean the top surface of the wafer W. FIG.

Also, here, an example in which the first cleaning body 171H is moved in the Y-axis negative direction is shown, but the moving direction of the first cleaning body 171H is not limited to this. You can move it. In this case, the controller 200H moves the second cleaning body 181 from a position shifted from the center of the wafer W in the positive Y-axis direction to a position shifted from the center of the wafer W in the negative Y-axis direction. should be moved to the outer periphery of the .

Also, here, an example in which the first cleaning body 171H is a two-fluid nozzle that discharges a mixed fluid of gas and liquid is shown, but the first cleaning body 171H supplies fluid to the wafer W. Any nozzle may be used, and the nozzle does not necessarily have to be a two-fluid nozzle.

(Modification)
In the above-described embodiment, the first cleaning body 171 cleans the central portion of the wafer W until the first cleaning body 171 and the second cleaning body 181 are synchronized after the double-sided cleaning process is started. The second cleaning body 181 was stopped during this period. However, the present invention is not limited to this, and while the first cleaning body 171 is cleaning the central portion of the wafer W, the second cleaning body 181 may be used to clean the lower surface of the wafer W. FIG.

Further, in the above-described embodiment, the first cleaning body 171 and the second cleaning body 181 are rotated in the same direction as the wafer W. can be rotated to Further, in the above-described embodiment, the first cleaning body 171 and the second cleaning body 181 are rotated in the same direction. good too. The rotation speed of the first cleaning body 171 and the second cleaning body 181 may be the same as the rotation speed of the wafer W, may be slower than the rotation speed of the wafer W, or may be faster than the rotation speed of the wafer W. good too. Also, the first cleaning body 171 and the second cleaning body 181 do not necessarily have to be rotated.

In the above-described embodiment, the first cleaning body 171 and the second cleaning body 181 are linearly moved along the rails 72 and 82. By supporting the first cleaning body 171 and supporting the second cleaning body 181 on the second swivel arm that revolves around the vertical axis, the first cleaning body 171 and the second cleaning body 181 are moved in an arc shape. good too. In this case, the movements of the first cleaning body 171 and the second cleaning body 181 can be synchronized by matching the positions of the centers of rotation of the first and second turning arms.

Further, in the above-described embodiment, an example in which double-side cleaning processing is performed has been described, but depending on the type of wafer W, for example, only the bottom surface cleaning processing may be performed. When performing only the lower surface cleaning process without performing the double-side cleaning process, in order to suppress deionized water or the like from entering the upper surface side of the wafer W, even if the rotation speed of the wafer W is lower than in the case of performing the double-side cleaning process. good. Alternatively, only the upper surface of the wafer W may be cleaned without performing the double-sided cleaning process.

Here, the double-sided cleaning process of the wafer W is not limited to cleaning the circuit-formed surface and the circuit-unformed surface. For example, at least one of the wafers W may be a member bonded to the circuit forming surface. In that case, there is a protective member for protecting the circuit or a bonded wafer in which wafers are bonded together. Alternatively, the wafer W may be a wafer W before circuits are formed.

Further effects and modifications can be easily derived by those skilled in the art. Therefore, the broader aspects of the invention are not limited to the specific details and representative embodiments so shown and described. Accordingly, various changes may be made without departing from the spirit or scope of the general inventive concept defined by the appended claims and equivalents thereof.

W wafer 1 substrate processing apparatus 10 suction pad 11 spin chuck 13 housing 14 support plate 15 frame 16 upper cup 17 first cleaning unit 18 second cleaning unit 171 first cleaning unit 181 second cleaning unit 200 control unit

Claims (10)

a holding part that holds the substrate;
a first cleaning body that cleans one of an upper surface and a lower surface of the substrate held by the holding part by ejecting a fluid onto the one surface;
a first moving mechanism for horizontally moving the first cleaning body;
a second cleaning body that is in contact with and cleans the other of the upper and lower surfaces of the substrate held by the holding portion;
a second moving mechanism for horizontally moving the second cleaning body;
By controlling the first moving mechanism and the second moving mechanism, the first cleaning body ejecting the fluid onto the one surface and the second cleaning body brought into contact with the other surface and a control unit that executes a double- sided cleaning process that synchronously moves the
The control unit
In the double-sided cleaning process, the first cleaning body and the second cleaning body are moved in a direction in which the first cleaning body and the second cleaning body are separated by controlling the first moving mechanism and the second moving mechanism. A substrate processing device that horizontally moves the a holding part that holds the substrate;
a first cleaning body that cleans the upper surface of the substrate by ejecting a fluid onto the upper surface of the substrate held by the holding part or by coming into contact with the upper surface ;
a first moving mechanism for horizontally moving the first cleaning body;
a second cleaning body that comes into contact with and cleans the lower surface of the substrate held by the holding part;
a second moving mechanism for horizontally moving the second cleaning body;
By controlling the first moving mechanism and the second moving mechanism, the fluid is ejected to the upper surface , or the first cleaning body brought into contact with the upper surface is brought into contact with the lower surface . a control unit that executes a double-sided cleaning process that horizontally moves the second cleaning body in synchronization with the second cleaning body ,
The holding part is
a rotatable first holding portion that sucks and holds a first region including a central portion of the lower surface of the substrate;
a second holding part that sucks and holds a second region that is a region other than the first region on the lower surface of the substrate;
with
The control unit
A lower surface for horizontally moving the first area by controlling the second moving mechanism to bring the second cleaning body into contact with the first area while the substrate is held by suction by the second holding part. After performing the cleaning process, the substrate is held by suction by the first holding unit and rotated, and the second cleaning body is brought into contact with the second area to perform the double-sided cleaning process. A substrate processing apparatus. The first cleaning body is
contacting and cleaning the top surface of the substrate;
The second cleaning body is
3. The substrate processing apparatus according to claim 1 , wherein the lower surface of the substrate is cleaned by contacting the lower surface. The control unit
A state in which a contact surface with the upper surface of the first cleaning body and a contact surface with the lower surface of the second cleaning body overlap in a plan view of the substrate held by the holding part when viewed from the thickness direction. 4. The substrate processing apparatus according to claim 3 , wherein a process of horizontally moving the first cleaning body and the second cleaning body while maintaining the same is executed as the double-sided cleaning process. a first driving unit that rotates the first cleaning body around a vertical axis;
a second driving unit that rotates the second cleaning body around a vertical axis,
The control unit
The first cleaning body and the second cleaning body are moved in a state where the center of rotation of the first cleaning body driven by the first driving section and the center of rotation of the second cleaning body driven by the second driving section are aligned with each other. 4. The substrate processing apparatus according to claim 3 , wherein horizontal movement processing is executed as said double-sided cleaning processing. The first moving mechanism is
The first cleaning body can be raised and lowered,
The second moving mechanism is
the second cleaning body can be moved up and down,
The control unit
In the double-sided cleaning process, the first moving mechanism and the first moving mechanism and the 6. The substrate processing apparatus according to claim 3 , wherein at least one of the second moving mechanisms is controlled. a load detection unit that detects a pressing force of the first cleaning body against the upper surface or a pressing force of the second cleaning body against the lower surface;
The control unit
One of the first cleaning body and the second cleaning body is arranged at a predetermined height position, and the height position of the other of the first cleaning body and the second cleaning body is set to the load detection unit. 7. The substrate processing apparatus according to claim 6 , wherein adjustment is performed based on the detection result. one of the upper surface and the lower surface is a circuit forming surface;
Of the first cleaning body and the second cleaning body, one of the cleaning bodies contacting the circuit forming surface has a contact surface with the substrate that is larger than a contact surface with the substrate of the other cleaning body. Item 8. The substrate processing apparatus according to any one of items 3 to 7 . one of the upper surface and the lower surface is a circuit forming surface;
The substrate processing according to any one of claims 3 to 7 , wherein one of said first cleaning body and said second cleaning body that contacts said circuit forming surface is softer than the other cleaning body. Device. a holding step of holding the substrate;
A first cleaning body that cleans the one surface by ejecting the fluid onto one of the upper surface and the lower surface of the substrate discharges the fluid onto the one surface of the substrate . The first cleaning body and the second cleaning body are synchronously moved horizontally while the second cleaning body for cleaning the other side is in contact with the other side. a double-sided cleaning step of cleaning the top surface and the bottom surface by
The double-sided cleaning step includes:
The substrate processing method , wherein the first cleaning body and the second cleaning body are horizontally moved in a direction in which the first cleaning body and the second cleaning body are separated from each other.

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