JP7228085B2 - Active ester compound and curable composition - Google Patents

Active ester compound and curable composition Download PDF

Info

Publication number
JP7228085B2
JP7228085B2 JP2019526746A JP2019526746A JP7228085B2 JP 7228085 B2 JP7228085 B2 JP 7228085B2 JP 2019526746 A JP2019526746 A JP 2019526746A JP 2019526746 A JP2019526746 A JP 2019526746A JP 7228085 B2 JP7228085 B2 JP 7228085B2
Authority
JP
Japan
Prior art keywords
active ester
curable composition
group
compound
manufactured
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2019526746A
Other languages
Japanese (ja)
Other versions
JPWO2019003822A1 (en
Inventor
泰 佐藤
顕人 河崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DIC Corp
Original Assignee
DIC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by DIC Corp filed Critical DIC Corp
Publication of JPWO2019003822A1 publication Critical patent/JPWO2019003822A1/en
Application granted granted Critical
Publication of JP7228085B2 publication Critical patent/JP7228085B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/76Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring
    • C07C69/78Benzoic acid esters
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/62Alcohols or phenols
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Description

本発明は硬化物における高温条件下での弾性率が低く、銅箔等に対する密着性にも優れる活性エステル化合物、これを含有する硬化性組成物、その硬化物、半導体封止材料及びプリント配線基板に関する。 The present invention provides an active ester compound having a low elastic modulus under high temperature conditions in a cured product and excellent adhesion to copper foil, etc., a curable composition containing the same, a cured product thereof, a semiconductor sealing material and a printed wiring board. Regarding.

半導体や多層プリント基板等に用いられる絶縁材料の技術分野では、各種電子部材の薄型化や小型化に伴い、これらの市場動向に合わせた新たな樹脂材料の開発が求められている。半導体封止材料に求められる性能としては、リフロー性向上の為に高温条件下での弾性率が低いことが求められる。この他、硬化物における耐熱性や耐吸湿性、銅箔等に対する密着性は勿論のこと、信号の高速化及び高周波数化対策として、硬化物における誘電率及び誘電正接値が低いこと、高温条件下での信頼性としてガラス転移温度(Tg)等の物性変化がないこと、薄型化に伴う反りや歪み対策として硬化収縮率や線膨張係数が低いこと等も重要である。 In the technical field of insulating materials used in semiconductors, multilayer printed circuit boards, etc., the development of new resin materials that meet these market trends is required as various electronic components become thinner and smaller. As a performance required for a semiconductor encapsulating material, a low elastic modulus under high temperature conditions is required in order to improve reflowability. In addition to this, in addition to the heat resistance and moisture absorption resistance of the cured product and the adhesion to copper foil, etc., as a countermeasure for increasing the speed and frequency of signals, the dielectric constant and dielectric loss tangent value of the cured product must be low. It is also important that there is no change in physical properties such as glass transition temperature (Tg) as reliability under the environment, and that cure shrinkage and coefficient of linear expansion are low as countermeasures against warpage and distortion accompanying thinning.

硬化物における耐熱性や誘電特性等に優れる樹脂材料として、ジ(1-ナフチル)イソフタレートをエポキシ樹脂の硬化剤として用いる技術が知られている(下記特許文献1参照)。特許文献1に記載されたエポキシ樹脂組成物は、ジ(α-ナフチル)イソフタレートをエポキシ樹脂硬化剤として用いることにより、フェノールノボラック樹脂のような従来型のエポキシ樹脂硬化剤を用いた場合と比較して硬化物における誘電率や誘電正接の値は確かに低いものの、硬化物における高温条件下での弾性率が近年要求されるレベルを満足するものでは無く、銅箔等に対する密着性も低かった。また、溶融粘度が高いことから、半導体封止材料等溶融粘度が低いことが求められる用途においては使用に制限があった。 A technique of using di(1-naphthyl)isophthalate as a curing agent for epoxy resin is known as a resin material having excellent heat resistance, dielectric properties, etc. in a cured product (see Patent Document 1 below). The epoxy resin composition described in Patent Document 1 uses di(α-naphthyl)isophthalate as an epoxy resin curing agent, so that it can be compared with the case of using a conventional epoxy resin curing agent such as a phenol novolac resin. Although the values of the dielectric constant and dielectric loss tangent of the cured product are certainly low, the elastic modulus of the cured product under high temperature conditions does not satisfy the level required in recent years, and the adhesion to copper foil etc. was also low. . In addition, due to its high melt viscosity, its use is limited in applications requiring low melt viscosity, such as semiconductor encapsulation materials.

特開2003-82063号公報JP-A-2003-82063

従って、本発明が解決しようとする課題は、硬化物における高温条件下での弾性率が低く、銅箔等に対する密着性にも優れる活性エステル化合物、これを含有する硬化性組成物、その硬化物、半導体封止材料及びプリント配線基板を提供することにある。 Therefore, the problem to be solved by the present invention is an active ester compound having a low elastic modulus under high temperature conditions in a cured product and excellent adhesion to copper foil or the like, a curable composition containing the same, and a cured product thereof , to provide a semiconductor encapsulating material and a printed wiring board.

本発明者らは前記課題を解決すべく鋭意検討した結果、ジシクロペンタジエン付加型フェノール化合物と芳香族モノカルボン酸又はその酸ハロゲン化物とのジエステル化物である活性エステル化合物は、硬化物における高温条件下での弾性率が低い上、銅箔等に対する密着性も高く、溶融粘度も低いことを見出し、本発明を完成するに至った。 As a result of intensive studies by the present inventors to solve the above problems, the active ester compound, which is a diester compound of a dicyclopentadiene addition type phenol compound and an aromatic monocarboxylic acid or an acid halide thereof, can be used in a cured product under high temperature conditions. The inventors have found that the elastic modulus is low under low pressure, the adhesiveness to copper foil and the like is high, and the melt viscosity is also low, leading to the completion of the present invention.

即ち、本発明は、下記構造式(1) That is, the present invention has the following structural formula (1)

Figure 0007228085000001
(式中Rはそれぞれ独立して脂肪族炭化水素基、アルコキシ基、ハロゲン原子、アリール基、アラルキル基の何れかである。mは0又は1~4の整数であり、nは0又は1である。)
で表されるジヒドロキシ化合物(a1)と芳香族モノカルボン酸又はその酸ハロゲン化物(a2)とのジエステル化物である活性エステル化合物に関する。
Figure 0007228085000001
(In the formula, each R 1 is independently an aliphatic hydrocarbon group, an alkoxy group, a halogen atom, an aryl group, or an aralkyl group; m is an integer of 0 or 1 to 4; n is 0 or 1; is.)
It relates to an active ester compound that is a diester of a dihydroxy compound (a1) represented by and an aromatic monocarboxylic acid or an acid halide thereof (a2).

本発明は更に、前記活性エステル化合物と、硬化剤とを含有する硬化性組成物に関する。 The present invention further relates to a curable composition containing the active ester compound and a curing agent.

本発明は更に、前記硬化性組成物の硬化物に関する。 The present invention further relates to a cured product of said curable composition.

本発明は更に、前記硬化性組成物を用いてなる半導体封止材料に関する。 The present invention further relates to a semiconductor encapsulant using the curable composition.

本発明は更に、前記硬化性組成物を用いてなるプリント配線基板に関する。 The present invention further relates to a printed wiring board using the curable composition.

本発明によれば、硬化物において高温条件下での弾性率が低い活性エステル化合物、これを含有する硬化性組成物、その硬化物、半導体封止材料及びプリント配線基板を提供することができる。 According to the present invention, it is possible to provide an active ester compound whose cured product has a low elastic modulus under high temperature conditions, a curable composition containing the same, a cured product thereof, a semiconductor encapsulating material, and a printed wiring board.

図1は、実施例1で得られた活性エステル化合物(1)のGPCチャート図である。1 is a GPC chart of active ester compound (1) obtained in Example 1. FIG.

以下、本発明を詳細に説明する。
本発明の活性エステル化合物は、下記構造式(1)
The present invention will be described in detail below.
The active ester compound of the present invention has the following structural formula (1)

Figure 0007228085000002
(式中Rはそれぞれ独立して脂肪族炭化水素基、アルコキシ基、ハロゲン原子、アリール基、アラルキル基の何れかである。mは0又は1~4の整数であり、nは0又は1である。)
で表されるジヒドロキシ化合物(a1)と芳香族モノカルボン酸又はその酸ハロゲン化物(a2)とのジエステル化物である。
Figure 0007228085000002
(In the formula, each R 1 is independently an aliphatic hydrocarbon group, an alkoxy group, a halogen atom, an aryl group, or an aralkyl group; m is an integer of 0 or 1 to 4; n is 0 or 1; is.)
It is a diester of a dihydroxy compound (a1) represented by and an aromatic monocarboxylic acid or an acid halide thereof (a2).

前記ジヒドロキシ化合物(a1)について、Rはそれぞれ独立して脂肪族炭化水素基、アルコキシ基、ハロゲン原子、アリール基、アラルキル基の何れかである。前記脂肪族炭化水素基は直鎖型及び分岐型のいずれでもよく、構造中に不飽和結合を有していてもよい。具体的には、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、へキシル基等のアルキル基;シクロへキシル基等のシクロアルキル基;ビニル基、アリル基、プロパギル基等の不飽和結合含有基等が挙げられる。前記アルコキシ基は、メトキシ基、エトキシ基、プロピルオキシ基、ブトキシ基等が挙げられる。前記ハロゲン原子は、フッ素原子、塩素原子、臭素原子等が挙げられる。前記アリール基は、フェニル基、ナフチル基、アントリル基、及びこれらの芳香核上に前記脂肪族炭化水素基やアルコキシ基、ハロゲン原子等が置換した構造部位等が挙げられる。前記アラルキル基は、ベンジル基、フェニルエチル基、ナフチルメチル基、ナフチルエチル基、及びこれらの芳香核上に前記アルキル基やアルコキシ基、ハロゲン原子等が置換した構造部位等が挙げられる。前記ジヒドロキシ化合物(a1)は一種類を単独で用いても良いし、置換基の種類や置換位置の異なる化合物等を2種類以上併用しても良い。In the dihydroxy compound (a1), each R1 is independently an aliphatic hydrocarbon group, an alkoxy group, a halogen atom, an aryl group, or an aralkyl group. The aliphatic hydrocarbon group may be linear or branched, and may have an unsaturated bond in its structure. Specifically, alkyl groups such as methyl group, ethyl group, propyl group, butyl group, pentyl group and hexyl group; cycloalkyl groups such as cyclohexyl group; unsaturated groups such as vinyl group, allyl group and propargyl group. A bond-containing group and the like are included. Examples of the alkoxy group include a methoxy group, an ethoxy group, a propyloxy group, and a butoxy group. The halogen atom includes a fluorine atom, a chlorine atom, a bromine atom, and the like. Examples of the aryl group include a phenyl group, a naphthyl group, an anthryl group, and structural sites in which the aromatic nuclei of these groups are substituted with the aliphatic hydrocarbon group, alkoxy group, halogen atom, or the like. Examples of the aralkyl group include a benzyl group, a phenylethyl group, a naphthylmethyl group, a naphthylethyl group, and structural sites in which the aromatic nuclei of these groups are substituted with the alkyl group, alkoxy group, halogen atom, or the like. The dihydroxy compound (a1) may be used alone or in combination of two or more compounds having different types of substituents or different substitution positions.

前記芳香族モノカルボン酸又はその酸ハロゲン化物(a2)は、ベンゼンカルボン酸、ナフタレンカルボン酸、これらの芳香核上に脂肪族炭化水素基、アルコキシ基、ハロゲン原子、アリール基、アラルキル基等の置換基を一つ乃至複数有する化合物、及びこれらの酸ハロゲン化物等が挙げられる。これらは一種類を単独で用いても良いし、2種類以上を併用しても良い。中でも、硬化物における高温条件下での弾性率が低く、また、硬化性等にも優れる活性エステル化合物となることから、ベンゼンカルボン酸又はそのハロゲン化物が好ましい。したがって、本発明の活性エステル化合物のより好ましい構造としては、下記構造式(2)で表されるものが挙げられる The aromatic monocarboxylic acid or its acid halide (a2) is benzenecarboxylic acid, naphthalenecarboxylic acid, and an aliphatic hydrocarbon group, an alkoxy group, a halogen atom, an aryl group, an aralkyl group, or the like substituted on the aromatic nucleus of these acids. Examples include compounds having one or more groups, and acid halides thereof. One of these may be used alone, or two or more of them may be used in combination. Among them, benzenecarboxylic acid or a halide thereof is preferable because the elastic modulus of the cured product under high temperature conditions is low and it becomes an active ester compound having excellent curability. Therefore, a more preferable structure of the active ester compound of the present invention is represented by the following structural formula (2).

Figure 0007228085000003
(式中R、Rはそれぞれ独立して脂肪族炭化水素基、アルコキシ基、ハロゲン原子、アリール基、アラルキル基の何れかである。mは0又は1~4の整数であり、nは0又は1であり、kは0又は1~5の整数である。)
Figure 0007228085000003
(wherein R 1 and R 2 are each independently an aliphatic hydrocarbon group, an alkoxy group, a halogen atom, an aryl group, or an aralkyl group; m is an integer of 0 or 1 to 4; n is 0 or 1, and k is 0 or an integer from 1 to 5.)

前記ジヒドロキシ化合物(a1)と芳香族モノカルボン酸又はその酸ハロゲン化物(a2)との反応は、例えば、アルカリ触媒の存在下、40~65℃程度の温度条件下で加熱撹拌する方法により行うことができる。反応は必要に応じて有機溶媒中で行っても良い。また、反応終了後は所望に応じて、水洗や再沈殿等により反応生成物を精製しても良い。 The reaction between the dihydroxy compound (a1) and the aromatic monocarboxylic acid or its acid halide (a2) is carried out, for example, by a method of heating and stirring at a temperature of about 40 to 65° C. in the presence of an alkali catalyst. can be done. You may perform reaction in an organic solvent as needed. After completion of the reaction, if desired, the reaction product may be purified by washing with water, reprecipitation, or the like.

前記アルカリ触媒は、例えば、水酸化ナトリウム、水酸化カリウム、トリエチルアミン、ピリジン等が挙げられる。これらはそれぞれ単独で用いても良いし、2種類以上を併用しても良い。また、3.0~30%程度の水溶液として用いても良い。中でも、触媒能の高い水酸化ナトリウム又は水酸化カリウムが好ましい。 Examples of the alkali catalyst include sodium hydroxide, potassium hydroxide, triethylamine, pyridine and the like. Each of these may be used alone, or two or more of them may be used in combination. Also, it may be used as an aqueous solution of about 3.0 to 30%. Among them, sodium hydroxide or potassium hydroxide with high catalytic ability is preferable.

前記有機溶媒は、例えば、アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン等のケトン溶媒、酢酸エチル、酢酸ブチル、セロソルブアセテート、プロピレングリコールモノメチルエーテルアセテート、カルビトールアセテート等の酢酸エステル溶媒、セロソルブ、ブチルカルビトール等のカルビトール溶媒、トルエン、キシレン等の芳香族炭化水素溶媒、ジメチルホルムアミド、ジメチルアセトアミド、N-メチルピロリドン等が挙げられる。これらはそれぞれ単独で用いても良いし、2種類以上の混合溶媒としても良い。 Examples of the organic solvent include ketone solvents such as acetone, methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone; acetic ester solvents such as ethyl acetate, butyl acetate, cellosolve acetate, propylene glycol monomethyl ether acetate, and carbitol acetate; cellosolve, and butyl carbitol; carbitol solvents such as toluene, aromatic hydrocarbon solvents such as toluene and xylene, dimethylformamide, dimethylacetamide, N-methylpyrrolidone and the like. Each of these may be used alone, or two or more of them may be used as a mixed solvent.

前記ジヒドロキシ化合物(a1)と芳香族モノカルボン酸又はその酸ハロゲン化物(a2)との反応割合は、目的の活性エステル化合物を高収率で得られることから、前記ジヒドロキシ化合物(a1)が有する水酸基の合計1モルに対し、前記芳香族モノカルボン酸又はその酸ハロゲン化物(a2)が0.95~1.05モルとなる割合であることが好ましい。 The reaction ratio between the dihydroxy compound (a1) and the aromatic monocarboxylic acid or acid halide thereof (a2) is such that the desired active ester compound can be obtained in a high yield. It is preferable that the ratio of the aromatic monocarboxylic acid or its acid halide (a2) is 0.95 to 1.05 mol per 1 mol of the total of the above.

本発明では、前記ジヒドロキシ化合物(a1)原料として、下記構造式(3)で表され、tが1以上の整数であるオリゴマー成分(a3)を一部含有するものを用いてもよい。 In the present invention, as the raw material for the dihydroxy compound (a1), a compound partially containing an oligomer component (a3) represented by the following structural formula (3), in which t is an integer of 1 or more, may be used.

Figure 0007228085000004
(式中Rはそれぞれ独立して脂肪族炭化水素基、アルコキシ基、ハロゲン原子、アリール基、アラルキル基の何れかである。mは0又は1~4の整数であり、nは0又は1であり、tは0又は1以上の整数である。)
Figure 0007228085000004
(In the formula, each R 1 is independently an aliphatic hydrocarbon group, an alkoxy group, a halogen atom, an aryl group, or an aralkyl group; m is an integer of 0 or 1 to 4; n is 0 or 1; and t is an integer of 0 or 1 or more.)

この場合、前記ジヒドロキシ化合物(a1)原料中の前記ジヒドロキシ化合物(a1)の含有量は、本発明が奏する効果が十分に発揮されることから、50%以上であることが好ましく、65~90%の範囲であることが好ましい。また、前記ジヒドロキシ化合物(a1)原料中、前記構造式(3)においてtが1である成分の含有量は5~30%の範囲であることが好ましい。更に、前記ジヒドロキシ化合物(a1)原料中の前記ジヒドロキシ化合物(a1)と前記構造式(3)においてtが1である成分との合計、即ち、前記構造式(3)においてtが0又は1である成分の合計は70%以上であることが好ましく、85%以上であることがより好ましい。前記ジヒドロキシ化合物(a1)原料において構造式(3)中のtの平均値は0.05~0.8の範囲であることが好ましい。なお、tの平均値は前記ジヒドロキシ化合物(a1)原料の数平均分子量(Mn)から算出される計算値である。 In this case, the content of the dihydroxy compound (a1) in the raw material of the dihydroxy compound (a1) is preferably 50% or more, more preferably 65 to 90%, because the effects of the present invention are sufficiently exhibited. is preferably in the range of Further, the content of the component in which t is 1 in the structural formula (3) in the raw material of the dihydroxy compound (a1) is preferably in the range of 5 to 30%. Furthermore, the sum of the dihydroxy compound (a1) in the raw material of the dihydroxy compound (a1) and the component where t is 1 in the structural formula (3), that is, when t is 0 or 1 in the structural formula (3) The sum of one component is preferably 70% or more, more preferably 85% or more. The average value of t in structural formula (3) in the dihydroxy compound (a1) raw material is preferably in the range of 0.05 to 0.8. The average value of t is a calculated value calculated from the number average molecular weight (Mn) of the raw material of the dihydroxy compound (a1).

本発明において、前記ジヒドロキシ化合物(a1)原料中の各成分の含有量や分子量、後述する活性エステル組成物中の各成分の含有量や分子量は下記条件で測定されるGPCチャート図の面積比から算出される値である。 In the present invention, the content and molecular weight of each component in the raw material of the dihydroxy compound (a1) and the content and molecular weight of each component in the active ester composition described later are determined from the area ratio of the GPC chart measured under the following conditions. It is a calculated value.

測定装置 :東ソー株式会社製「HLC-8320 GPC」、
カラム:東ソー株式会社製ガードカラム「HXL-L」
+東ソー株式会社製「TSK-GEL G4000HXL」
+東ソー株式会社製「TSK-GEL G3000HXL」
+東ソー株式会社製「TSK-GEL G2000HXL」
+東ソー株式会社製「TSK-GEL G2000HXL」
検出器: RI(示差屈折計)
データ処理:東ソー株式会社製「GPCワークステーション EcoSEC-WorkStation」
測定条件: カラム温度 40℃
展開溶媒 テトラヒドロフラン
流速 1.0ml/分
標準 : 前記「GPC-8320」の測定マニュアルに準拠して、分子量が既知の下記の単分散ポリスチレンを用いた。
(使用ポリスチレン)
東ソー株式会社製「A-500」
東ソー株式会社製「A-1000」
東ソー株式会社製「A-2500」
東ソー株式会社製「A-5000」
東ソー株式会社製「F-1」
東ソー株式会社製「F-2」
東ソー株式会社製「F-4」
東ソー株式会社製「F-10」
東ソー株式会社製「F-20」
東ソー株式会社製「F-40」
東ソー株式会社製「F-80」
東ソー株式会社製「F-128」
試料 : 樹脂固形分換算で1.0質量%のテトラヒドロフラン溶液をマイクロフィルターでろ過したもの(50μl)
Measuring device: "HLC-8320 GPC" manufactured by Tosoh Corporation,
Column: Guard column "HXL-L" manufactured by Tosoh Corporation
+ "TSK-GEL G4000HXL" manufactured by Tosoh Corporation
+ "TSK-GEL G3000HXL" manufactured by Tosoh Corporation
+ "TSK-GEL G2000HXL" manufactured by Tosoh Corporation
+ "TSK-GEL G2000HXL" manufactured by Tosoh Corporation
Detector: RI (differential refractometer)
Data processing: "GPC Workstation EcoSEC-WorkStation" manufactured by Tosoh Corporation
Measurement conditions: Column temperature 40°C
Developing solvent Tetrahydrofuran
Flow rate 1.0 ml/min Standard: The following monodisperse polystyrene having a known molecular weight was used according to the measurement manual of "GPC-8320".
(Polystyrene used)
"A-500" manufactured by Tosoh Corporation
"A-1000" manufactured by Tosoh Corporation
"A-2500" manufactured by Tosoh Corporation
"A-5000" manufactured by Tosoh Corporation
"F-1" manufactured by Tosoh Corporation
"F-2" manufactured by Tosoh Corporation
"F-4" manufactured by Tosoh Corporation
"F-10" manufactured by Tosoh Corporation
"F-20" manufactured by Tosoh Corporation
"F-40" manufactured by Tosoh Corporation
"F-80" manufactured by Tosoh Corporation
"F-128" manufactured by Tosoh Corporation
Sample: 1.0% by mass of tetrahydrofuran solution in terms of resin solid content filtered through a microfilter (50 μl)

前記ジヒドロキシ化合物(a1)原料が前記オリゴマー成分(a3)を一部含有する場合、前記ジヒドロキシ化合物(a1)原料と芳香族モノカルボン酸又はその酸ハロゲン化物(a2)との反応割合は、目的の活性エステル化合物を高収率で得られることから、前記ジヒドロキシ化合物(a1)原料が有する水酸基の合計1モルに対し、前記芳香族モノカルボン酸又はその酸ハロゲン化物(a2)が0.95~1.05モルとなる割合であることが好ましい。 When the dihydroxy compound (a1) raw material partially contains the oligomer component (a3), the reaction ratio between the dihydroxy compound (a1) raw material and the aromatic monocarboxylic acid or its acid halide (a2) is the desired Since the active ester compound can be obtained in a high yield, the amount of the aromatic monocarboxylic acid or its acid halide (a2) is 0.95 to 1 mol per 1 mol of the hydroxyl groups in the raw material of the dihydroxy compound (a1). A ratio of 0.05 mol is preferred.

前記ジヒドロキシ化合物(a1)原料が前記オリゴマー成分(a3)を一部含有する場合、本発明の活性エステル化合物は、下記構造式(4)で表される化合物のうちtが1以上の整数であるポリエステル化合物を含む活性エステル組成物として得られる。 When the dihydroxy compound (a1) raw material partially contains the oligomer component (a3), the active ester compound of the present invention is a compound represented by the following structural formula (4), wherein t is an integer of 1 or more. It is obtained as an active ester composition containing a polyester compound.

Figure 0007228085000005
(式中R、Rはそれぞれ独立して脂肪族炭化水素基、アルコキシ基、ハロゲン原子、アリール基、アラルキル基の何れかである。mは0又は1~4の整数であり、nは0又は1であり、kは0又は1~5の整数であり、tは0又は1以上の整数である。)
Figure 0007228085000005
(wherein R 1 and R 2 are each independently an aliphatic hydrocarbon group, an alkoxy group, a halogen atom, an aryl group, or an aralkyl group; m is an integer of 0 or 1 to 4; n is 0 or 1, k is 0 or an integer of 1 to 5, and t is 0 or an integer of 1 or more.)

この場合、活性エステル組成物中のジエステル化合物、即ち本発明の活性エステル化合物の含有量は、本発明が奏する効果が十分に発揮されることから、50%以上であることが好ましく、65~95%の範囲であることが好ましい。また、活性エステル組成物中、前記構造式(4)においてtが1である成分の含有量が5~30%の範囲であることが好ましい。更に、活性エステル組成物中の前記活性エステル化合物と前記構造式(4)においてtが1である成分との合計、即ち、前記構造式(4)においてtが0又は1である成分の合計は70%以上であることが好ましく、85%以上であることがより好ましい。なお、活性エステル組成物中の各成分の含有量は、前記条件で測定されるGPCチャート図の面積比から算出される値である。活性エステル組成物においてtの平均値は0.05~0.8の範囲であることが好ましい。なお、tの平均値は活性エステル組成物の数平均分子量(Mn)から算出される計算値である。 In this case, the content of the diester compound in the active ester composition, that is, the content of the active ester compound of the present invention is preferably 50% or more, 65 to 95%, since the effect of the present invention is fully exhibited. % range is preferred. Further, it is preferable that the content of the component in which t is 1 in the structural formula (4) is in the range of 5 to 30% in the active ester composition. Furthermore, the sum of the active ester compound in the active ester composition and the components in which t is 1 in the structural formula (4), that is, the sum of the components in which t is 0 or 1 in the structural formula (4) is It is preferably 70% or more, more preferably 85% or more. The content of each component in the active ester composition is a value calculated from the area ratio of the GPC chart measured under the above conditions. The average value of t in the active ester composition is preferably in the range of 0.05 to 0.8. The average value of t is a calculated value calculated from the number average molecular weight (Mn) of the active ester composition.

本発明の活性エステル化合物或いは前記活性エステル組成物の溶融粘度は、ASTM D4287に準拠し、ICI粘度計にて測定した150℃における値が0.01~50dPa・sの範囲であることが好ましく、0.01~5dPa・sの範囲であることが特に好ましい。 The melt viscosity of the active ester compound or the active ester composition of the present invention is preferably in the range of 0.01 to 50 dPa s at 150° C. measured with an ICI viscometer in accordance with ASTM D4287. A range of 0.01 to 5 dPa·s is particularly preferred.

本発明の硬化性組成物は、前記本発明の活性エステル化合物或いは前記活性エステル組成物と併せて、その他の活性エステル化合物を含有しても良い。前記その他の活性エステル化合物としては、分子構造中にフェノール性水酸基を一つ有する化合物と芳香族ポリカルボン酸又はその酸ハロゲン化物とのエステル化物、前記ジヒドロキシ化合物(a1)や前記オリゴマー成分(a3)以外のフェノール性水酸基を2つ以上有する化合物と芳香族モノカルボン酸又はその酸ハロゲン化物とのエステル化物、分子構造中にフェノール性水酸基を一つ有する化合物、芳香族ポリカルボン酸又はその酸ハロゲン化物及び分子構造中にフェノール性水酸基を2つ以上有する化合物のエステル化物、芳香族ポリカルボン酸又はその酸ハロゲン化物、分子構造中にフェノール性水酸基を2つ以上有する化合物及び芳香族モノカルボン酸又はその酸ハロゲン化物のエステル化物等が挙げられる。 The curable composition of the present invention may contain other active ester compounds in combination with the active ester compound or the active ester composition of the present invention. Examples of the other active ester compounds include an esterified product of a compound having one phenolic hydroxyl group in the molecular structure and an aromatic polycarboxylic acid or an acid halide thereof, the dihydroxy compound (a1), and the oligomer component (a3). Esterified products of compounds having two or more phenolic hydroxyl groups other than aromatic monocarboxylic acids or acid halides thereof, compounds having one phenolic hydroxyl group in the molecular structure, aromatic polycarboxylic acids or acid halides thereof And esters of compounds having two or more phenolic hydroxyl groups in the molecular structure, aromatic polycarboxylic acids or acid halides thereof, compounds having two or more phenolic hydroxyl groups in the molecular structure and aromatic monocarboxylic acids or their Examples include esterified products of acid halides.

前記その他の活性エステル化合物を用いる場合、本発明が奏する効果が十分に発揮されることから、全活性エステル化合物の合計に対する本発明の活性エステル化合物又は前記活性エステル組成物の割合が70質量%以上であることが好ましく、80質量%以上であることがより好ましい。また、活性エステル化合物全体での溶融粘度が0.01~50dPa・sの範囲であることが好ましく、0.01~5dPa・sの範囲であることが特に好ましい。配合物の溶融粘度はASTM D4287に準拠し、ICI粘度計にて測定した150℃における値である。 When the other active ester compound is used, the effect of the present invention is sufficiently exhibited, so the ratio of the active ester compound of the present invention or the active ester composition to the total of all active ester compounds is 70% by mass or more. and more preferably 80% by mass or more. The melt viscosity of the active ester compound as a whole is preferably in the range of 0.01 to 50 dPa·s, particularly preferably in the range of 0.01 to 5 dPa·s. The melt viscosity of the compound is a value at 150° C. measured with an ICI viscometer according to ASTM D4287.

本発明の硬化性組成物は、前述の活性エステル化合物と硬化剤とを含有する。前記硬化剤は前記活性エステル化合物と反応し得る化合物であれば良く、特に限定なく様々な化合物が利用できる。硬化剤の一例としては、例えば、エポキシ樹脂が挙げられる。 The curable composition of the present invention contains the above active ester compound and a curing agent. The curing agent may be any compound that can react with the active ester compound, and various compounds can be used without particular limitation. An example of a curing agent includes, for example, an epoxy resin.

前記エポキシ樹脂は、例えば、フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂、ナフトールノボラック型エポキシ樹脂、ビスフェノールノボラック型エポキシ樹脂、ビフェノールノボラック型エポキシ樹脂、ビスフェノール型エポキシ樹脂、ビフェニル型エポキシ樹脂、トリフェノールメタン型エポキシ樹脂、テトラフェノールエタン型エポキシ樹脂、ジシクロペンタジエン-フェノール付加反応型エポキシ樹脂、フェノールアラルキル型エポキシ樹脂、ナフトールアラルキル型エポキシ樹脂等が挙げられる。 Examples of the epoxy resin include phenol novolak type epoxy resin, cresol novolak type epoxy resin, naphthol novolak type epoxy resin, bisphenol novolak type epoxy resin, biphenol novolak type epoxy resin, bisphenol type epoxy resin, biphenyl type epoxy resin, and triphenolmethane. type epoxy resin, tetraphenolethane type epoxy resin, dicyclopentadiene-phenol addition reaction type epoxy resin, phenol aralkyl type epoxy resin, naphthol aralkyl type epoxy resin, and the like.

本発明の硬化性組成物において、前記活性エステル化合物と硬化剤との配合割合は特に限定なく、所望の硬化物性能等に応じて適宜調整することができる。硬化剤としてエポキシ樹脂を用いる場合の配合の一例としては、硬化性組成物中のエポキシ基の合計1モルに対して、前記活性エステル化合物中の官能基の合計が0.7~1.5モルとなる割合であることが好ましい。 In the curable composition of the present invention, the mixing ratio of the active ester compound and the curing agent is not particularly limited, and can be appropriately adjusted according to the desired performance of the cured product. As an example of formulation when an epoxy resin is used as a curing agent, the total amount of functional groups in the active ester compound is 0.7 to 1.5 mol with respect to the total 1 mol of epoxy groups in the curable composition. It is preferable that the ratio be

本発明の硬化性組成物は、更にその他の樹脂成分を含有しても良い。その他の樹脂成分は、例えば、ジアミノジフェニルメタン、ジエチレントリアミン、トリエチレンテトラミン、ジアミノジフェニルスルホン、イソホロンジアミン、イミダゾ-ル、BF-アミン錯体、グアニジン誘導体等のアミン化合物;ジシアンジアミド、リノレン酸の2量体とエチレンジアミンとより合成されるポリアミド樹脂等のアミド化合物;無水フタル酸、無水トリメリット酸、無水ピロメリット酸、無水マレイン酸、テトラヒドロ無水フタル酸、メチルテトラヒドロ無水フタル酸、無水メチルナジック酸、ヘキサヒドロ無水フタル酸、メチルヘキサヒドロ無水フタル酸等の酸無水物;シアン酸エステル樹脂;ビスマレイミド樹脂;ベンゾオキサジン樹脂;スチレン-無水マレイン酸樹脂;ジアリルビスフェノールやトリアリルイソシアヌレートに代表されるアリル基含有樹脂;ポリリン酸エステルやリン酸エステル-カーボネート共重合体等が挙げられる。これらはそれぞれ単独で用いても良いし、2種類以上を併用しても良い。これらその他の樹脂成分の配合割合は特に限定なく、所望の硬化物性能等に応じて適宜調整することができる。The curable composition of the invention may further contain other resin components. Other resin components include, for example, diaminodiphenylmethane, diethylenetriamine, triethylenetetramine, diaminodiphenylsulfone, isophoronediamine, imidazole, BF 3 -amine complexes, amine compounds such as guanidine derivatives; Amide compounds such as polyamide resin synthesized from ethylenediamine; phthalic anhydride, trimellitic anhydride, pyromellitic anhydride, maleic anhydride, tetrahydrophthalic anhydride, methyltetrahydrophthalic anhydride, methylnadic anhydride, hexahydrophthalic anhydride acids, acid anhydrides such as methylhexahydrophthalic anhydride; cyanate ester resins; bismaleimide resins; benzoxazine resins; styrene-maleic anhydride resins; Examples thereof include polyphosphate esters and phosphate-carbonate copolymers. Each of these may be used alone, or two or more of them may be used in combination. The blending ratio of these other resin components is not particularly limited, and can be appropriately adjusted according to the desired cured product performance and the like.

本発明の硬化性組成物は必要に応じて硬化促進剤、難燃剤、無機質充填材、シランカップリング剤、離型剤、顔料、乳化剤等の各種添加剤を含有しても良い。 The curable composition of the present invention may optionally contain various additives such as curing accelerators, flame retardants, inorganic fillers, silane coupling agents, mold release agents, pigments and emulsifiers.

前記硬化促進剤は、例えば、リン系化合物、第3級アミン、イミダゾール化合物、ピリジン化合物、有機酸金属塩、ルイス酸、アミン錯塩等が挙げられる。中でも、硬化性、耐熱性、電気特性、耐湿信頼性等に優れる点から、リン系化合物ではトリフェニルホスフィン、第3級アミンでは1,8-ジアザビシクロ-[5.4.0]-ウンデセン(DBU)、イミダゾール化合物では2-エチル-4-メチルイミダゾール、ピリジン化合物では4-ジメチルアミノピリジンが好ましい。 Examples of the curing accelerator include phosphorus compounds, tertiary amines, imidazole compounds, pyridine compounds, organic acid metal salts, Lewis acids, and amine complex salts. Among them, triphenylphosphine is a phosphorus compound and 1,8-diazabicyclo-[5.4.0]-undecene (DBU ), the imidazole compound is preferably 2-ethyl-4-methylimidazole, and the pyridine compound is preferably 4-dimethylaminopyridine.

前記難燃剤は、例えば、赤リン、リン酸一アンモニウム、リン酸二アンモニウム、リン酸三アンモニウム、ポリリン酸アンモニウム等のリン酸アンモニウム、リン酸アミド等の無機リン化合物;リン酸エステル化合物、ホスホン酸化合物、ホスフィン酸化合物、ホスフィンオキシド化合物、ホスホラン化合物、有機系含窒素リン化合物、9,10-ジヒドロ-9-オキサ-10-ホスファフェナントレン-10-オキシド、10-(2,5―ジヒドロオキシフェニル)―10H-9-オキサ-10-ホスファフェナントレン-10-オキシド、10―(2,7-ジヒドロオキシナフチル)-10H-9-オキサ-10-ホスファフェナントレン-10-オキシド等の環状有機リン化合物、及びそれをエポキシ樹脂やフェノール樹脂等の化合物と反応させた誘導体等の有機リン化合物;トリアジン化合物、シアヌル酸化合物、イソシアヌル酸化合物、フェノチアジン等の窒素系難燃剤;シリコーンオイル、シリコーンゴム、シリコーン樹脂等のシリコーン系難燃剤;金属水酸化物、金属酸化物、金属炭酸塩化合物、金属粉、ホウ素化合物、低融点ガラス等の無機難燃剤等が挙げられる。これら難燃剤を用いる場合は、硬化性組成物中0.1~20質量%の範囲であることが好ましい。 The flame retardant is, for example, red phosphorus, monoammonium phosphate, diammonium phosphate, triammonium phosphate, ammonium phosphate such as ammonium polyphosphate, inorganic phosphorus compounds such as phosphoric acid amide; compound, phosphinic acid compound, phosphine oxide compound, phosphorane compound, organic nitrogen-containing phosphorus compound, 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide, 10-(2,5-dihydroxyphenyl )-10H-9-oxa-10-phosphaphenanthrene-10-oxide, 10-(2,7-dihydroxynaphthyl)-10H-9-oxa-10-phosphaphenanthrene-10-oxide and other cyclic organic phosphorus organic phosphorus compounds such as compounds and derivatives obtained by reacting them with compounds such as epoxy resins and phenolic resins; triazine compounds, cyanuric acid compounds, isocyanuric acid compounds, nitrogen-based flame retardants such as phenothiazine; silicone oils, silicone rubbers, silicones silicone-based flame retardants such as resins; and inorganic flame retardants such as metal hydroxides, metal oxides, metal carbonate compounds, metal powders, boron compounds, and low-melting glass. When using these flame retardants, it is preferably in the range of 0.1 to 20% by mass in the curable composition.

前記無機質充填材は、例えば、本発明の硬化性組成物を半導体封止材料用途に用いる場合などに配合される。前記無機質充填材は、例えば、溶融シリカ、結晶シリカ、アルミナ、窒化珪素、水酸化アルミ等が挙げられる。中でも、無機質充填材をより多く配合することが可能となることから、前記溶融シリカが好ましい。前記溶融シリカは破砕状、球状のいずれでも使用可能であるが、溶融シリカの配合量を高め、且つ、硬化性組成物の溶融粘度の上昇を抑制するためには、球状のものを主に用いることが好ましい。更に、球状シリカの配合量を高めるためには、球状シリカの粒度分布を適当に調整することが好ましい。その充填率は硬化性組成物100質量部中、0.5~95質量部の範囲で配合することが好ましい。 The inorganic filler is blended, for example, when the curable composition of the present invention is used as a semiconductor sealing material. Examples of the inorganic filler include fused silica, crystalline silica, alumina, silicon nitride, and aluminum hydroxide. Among them, the fused silica is preferable because it allows a larger amount of inorganic filler to be blended. The fused silica may be crushed or spherical, but spherical fused silica is mainly used in order to increase the amount of fused silica and to suppress the increase in the melt viscosity of the curable composition. is preferred. Furthermore, in order to increase the compounding amount of spherical silica, it is preferable to appropriately adjust the particle size distribution of spherical silica. The filling rate is preferably in the range of 0.5 to 95 parts by mass per 100 parts by mass of the curable composition.

この他、本発明の硬化性組成物を導電ペーストなどの用途に使用する場合は、銀粉や銅粉等の導電性充填剤を用いることができる。 In addition, when the curable composition of the present invention is used as a conductive paste, a conductive filler such as silver powder or copper powder can be used.

以上詳述した通り、本発明の活性エステル化合物及びこれを含有する硬化性組成物は、硬化物における高温条件下での弾性率が低く、銅箔等に対する密着性にも優れる特徴を有する。この他、汎用有機溶剤への溶解性や、耐熱性、耐吸水性、低硬化収縮性、誘電特性にも優れ、また、溶融粘度が低い等、樹脂材料に求められる他の一般的な要求性能も十分に高いものである。このため、プリント配線基板や半導体封止材料、レジスト材料等の電子材料用途の他、塗料や接着剤、成型品等の用途にも広く利用することができる。 As described in detail above, the active ester compound of the present invention and the curable composition containing the same are characterized by having a low elastic modulus in the cured product under high-temperature conditions and excellent adhesion to copper foil and the like. In addition, it has excellent solubility in general-purpose organic solvents, heat resistance, water absorption resistance, low curing shrinkage, excellent dielectric properties, and low melt viscosity. is also sufficiently high. Therefore, it can be widely used for electronic materials such as printed wiring boards, semiconductor sealing materials, and resist materials, as well as for paints, adhesives, moldings, and the like.

本発明の硬化性組成物をプリント配線基板用途やビルドアップ接着フィルム用途に用いる場合、一般には有機溶剤を配合して希釈して用いることが好ましい。前記有機溶剤は、メチルエチルケトン、アセトン、ジメチルホルムアミド、メチルイソブチルケトン、メトキシプロパノール、シクロヘキサノン、メチルセロソルブ、エチルジグリコールアセテート、プロピレングリコールモノメチルエーテルアセテート等が挙げられる。有機溶剤の種類や配合量は硬化性組成物の使用環境に応じて適宜調整できるが、例えば、プリント配線板用途では、メチルエチルケトン、アセトン、ジメチルホルムアミド等の沸点が160℃以下の極性溶剤であることが好ましく、不揮発分が40~80質量%となる割合で使用することが好ましい。ビルドアップ接着フィルム用途では、アセトン、メチルエチルケトン、シクロヘキサノン等のケトン溶剤、酢酸エチル、酢酸ブチル、セロソルブアセテート、プロピレングリコールモノメチルエーテルアセテート、カルビトールアセテート等の酢酸エステル溶剤、セロソルブ、ブチルカルビトール等のカルビトール溶剤、トルエン、キシレン等の芳香族炭化水素溶剤、ジメチルホルムアミド、ジメチルアセトアミド、N-メチルピロリドン等を用いることが好ましく、不揮発分が30~60質量%となる割合で使用することが好ましい。 When the curable composition of the present invention is used for printed wiring boards or build-up adhesive films, it is generally preferred to mix and dilute an organic solvent. Examples of the organic solvent include methyl ethyl ketone, acetone, dimethylformamide, methyl isobutyl ketone, methoxypropanol, cyclohexanone, methyl cellosolve, ethyl diglycol acetate, and propylene glycol monomethyl ether acetate. The type and blending amount of the organic solvent can be appropriately adjusted according to the environment in which the curable composition is used. is preferable, and it is preferable to use it at a ratio of 40 to 80% by mass of non-volatile matter. For build-up adhesive film applications, ketone solvents such as acetone, methyl ethyl ketone, and cyclohexanone; acetic ester solvents such as ethyl acetate, butyl acetate, cellosolve acetate, propylene glycol monomethyl ether acetate, and carbitol acetate; and carbitols such as cellosolve and butyl carbitol. It is preferable to use solvents such as aromatic hydrocarbon solvents such as toluene and xylene, dimethylformamide, dimethylacetamide, N-methylpyrrolidone, etc., and it is preferable to use such a proportion that the non-volatile content is 30 to 60% by mass.

また、本発明の硬化性組成物を用いてプリント配線基板を製造する方法は、例えば、硬化性組成物を補強基材に含浸し硬化させてプリプレグを得、これと銅箔とを重ねて加熱圧着させる方法が挙げられる。前記補強基材は、紙、ガラス布、ガラス不織布、アラミド紙、アラミド布、ガラスマット、ガラスロービング布などが挙げられる。硬化性組成物の含浸量は特に限定されないが、通常、プリプレグ中の樹脂分が20~60質量%となるように調製することが好ましい。 In addition, a method for producing a printed wiring board using the curable composition of the present invention includes, for example, impregnating a reinforcing base material with the curable composition and curing to obtain a prepreg, which is overlapped with a copper foil and heated. A method of crimping can be mentioned. Examples of the reinforcing base material include paper, glass cloth, glass nonwoven fabric, aramid paper, aramid cloth, glass mat, and glass roving cloth. Although the amount of the curable composition to be impregnated is not particularly limited, it is usually preferable to adjust the resin content in the prepreg to 20 to 60% by mass.

本発明の硬化性組成物を半導体封止材料用途に用いる場合、一般には無機質充填材を配合することが好ましい。半導体封止材料は、例えば、押出機、ニーダー、ロール等を用いて配合物を混合して調製することができる。得られた半導体封止材料を用いて半導体パッケージを成型する方法は、例えば、該半導体封止材料を注型或いはトランスファー成形機、射出成型機などを用いて成形し、更に50~200℃の温度条件下で2~10時間加熱する方法が挙げられ、このような方法により、成形物である半導体装置を得ることが出来る。 When the curable composition of the present invention is used as a semiconductor encapsulant, it is generally preferred to incorporate an inorganic filler. The semiconductor encapsulating material can be prepared by mixing formulations using, for example, an extruder, a kneader, rolls, or the like. A method of molding a semiconductor package using the obtained semiconductor encapsulating material includes, for example, molding the semiconductor encapsulating material using a cast molding machine, a transfer molding machine, an injection molding machine, etc. A method of heating for 2 to 10 hours under certain conditions can be mentioned, and a semiconductor device, which is a molded product, can be obtained by such a method.

次に本発明を実施例、比較例により具体的に説明する。実施例中の「部」及び「%」の記載は、特に断わりのない限り質量基準である。 EXAMPLES Next, the present invention will be specifically described with reference to examples and comparative examples. Descriptions of "parts" and "%" in the examples are based on mass unless otherwise specified.

GPCの測定条件
測定装置 :東ソー株式会社製「HLC-8320 GPC」、
カラム:東ソー株式会社製ガードカラム「HXL-L」
+東ソー株式会社製「TSK-GEL G4000HXL」
+東ソー株式会社製「TSK-GEL G3000HXL」
+東ソー株式会社製「TSK-GEL G2000HXL」
+東ソー株式会社製「TSK-GEL G2000HXL」
検出器: RI(示差屈折計)
データ処理:東ソー株式会社製「GPCワークステーション EcoSEC-WorkStation」
測定条件: カラム温度 40℃
展開溶媒 テトラヒドロフラン
流速 1.0ml/分
標準 : 前記「GPC-8320」の測定マニュアルに準拠して、分子量が既知の下記の単分散ポリスチレンを用いた。
(使用ポリスチレン)
東ソー株式会社製「A-500」
東ソー株式会社製「A-1000」
東ソー株式会社製「A-2500」
東ソー株式会社製「A-5000」
東ソー株式会社製「F-1」
東ソー株式会社製「F-2」
東ソー株式会社製「F-4」
東ソー株式会社製「F-10」
東ソー株式会社製「F-20」
東ソー株式会社製「F-40」
東ソー株式会社製「F-80」
東ソー株式会社製「F-128」
試料 : 樹脂固形分換算で1.0質量%のテトラヒドロフラン溶液をマイクロフィルターでろ過したもの(50μl)
Measurement conditions of GPC Measurement equipment: "HLC-8320 GPC" manufactured by Tosoh Corporation,
Column: Guard column "HXL-L" manufactured by Tosoh Corporation
+ "TSK-GEL G4000HXL" manufactured by Tosoh Corporation
+ "TSK-GEL G3000HXL" manufactured by Tosoh Corporation
+ "TSK-GEL G2000HXL" manufactured by Tosoh Corporation
+ "TSK-GEL G2000HXL" manufactured by Tosoh Corporation
Detector: RI (differential refractometer)
Data processing: "GPC Workstation EcoSEC-WorkStation" manufactured by Tosoh Corporation
Measurement conditions: Column temperature 40°C
Developing solvent Tetrahydrofuran
Flow rate 1.0 ml/min Standard: The following monodisperse polystyrene having a known molecular weight was used according to the measurement manual of "GPC-8320".
(Polystyrene used)
"A-500" manufactured by Tosoh Corporation
"A-1000" manufactured by Tosoh Corporation
"A-2500" manufactured by Tosoh Corporation
"A-5000" manufactured by Tosoh Corporation
"F-1" manufactured by Tosoh Corporation
"F-2" manufactured by Tosoh Corporation
"F-4" manufactured by Tosoh Corporation
"F-10" manufactured by Tosoh Corporation
"F-20" manufactured by Tosoh Corporation
"F-40" manufactured by Tosoh Corporation
"F-80" manufactured by Tosoh Corporation
"F-128" manufactured by Tosoh Corporation
Sample: 1.0% by mass of tetrahydrofuran solution in terms of resin solid content filtered through a microfilter (50 μl)

溶融粘度測定法
本願実施例において活性エステル化合物或いは組成物の溶融粘度は、ASTM D4287に準拠し、150℃における溶融粘度をICI粘度計にて測定した。
Melt Viscosity Measurement Method In the examples of the present application, the melt viscosity of the active ester compound or composition was measured by an ICI viscometer at 150° C. according to ASTM D4287.

実施例1 活性エステル組成物(1)の製造
温度計、滴下ロート、冷却管、分留管、攪拌器を取り付けたフラスコにジシクロペンタジエン付加型フェノール化合物(前記構造式(3)においてmが0であり、数平均分子量(Mn)から算出されるtの平均値が0.2であるもの、水酸基当量166.6g/当量)333gとトルエン1600gを仕込み、系内を減圧窒素置換しながら溶解させた。次いで、塩化ベンゾイル218gを仕込み、系内を減圧窒素置換しながら溶解させた。テトラブチルアンモニウムブロマイド0.8gを加え、窒素ガスパージを施しながら、系内を60℃以下に制御して、20%水酸化ナトリウム水溶液420gを3時間かけて滴下した。滴下終了後、そのまま1時間撹拌を続けて反応させた。反応終了後、反応混合物を静置して分液し、水層を取り除いた。残った有機層に水を加えて約15分間攪拌混合した後、混合物を静置して分液し、水層を取り除いた。水層のpHが7になるまでこの操作を繰り返した後、デカンタ脱水で水分とトルエンを除去し、活性エステル組成物(1)を得た。活性エステル組成物(1)のGPCチャート図を図1に示す。GPCチャート図の面積比から算出される活性エステル組成物(1)中のジエステル化合物の含有量は77%、前記構造式(4)においてtが1である化合物に相当する成分の含有量は15%であった。また、活性エステル組成物(1)の溶融粘度は1.48dPa・sであった。
Example 1 Production of Active Ester Composition (1) A flask equipped with a thermometer, a dropping funnel, a condenser, a fractionating tube, and a stirrer was charged with a dicyclopentadiene-added phenol compound (m is 0 in the structural formula (3) above). , and the average value of t calculated from the number average molecular weight (Mn) is 0.2. rice field. Next, 218 g of benzoyl chloride was charged and dissolved while the inside of the system was replaced with nitrogen under reduced pressure. 0.8 g of tetrabutylammonium bromide was added, and while purging with nitrogen gas, the inside of the system was controlled at 60° C. or lower, and 420 g of a 20% aqueous sodium hydroxide solution was added dropwise over 3 hours. After the dropwise addition was completed, the mixture was allowed to react while stirring for 1 hour. After completion of the reaction, the reaction mixture was allowed to stand still for liquid separation, and the aqueous layer was removed. After adding water to the remaining organic layer and stirring and mixing for about 15 minutes, the mixture was allowed to stand for liquid separation, and the aqueous layer was removed. After repeating this operation until the pH of the aqueous layer reached 7, water and toluene were removed by decanter dehydration to obtain an active ester composition (1). A GPC chart of the active ester composition (1) is shown in FIG. The content of the diester compound in the active ester composition (1) calculated from the area ratio of the GPC chart is 77%, and the content of the component corresponding to the compound in which t is 1 in the structural formula (4) is 15. %Met. Moreover, the melt viscosity of the active ester composition (1) was 1.48 dPa·s.

比較製造例1 活性エステル化合物(1’)の製造
温度計、滴下ロート、冷却管、分留管、攪拌器を取り付けたフラスコにイソフタル酸クロリド202gとトルエン1250gを仕込み、系内を減圧窒素置換しながら溶解させた。次いで、1-ナフトール288gを仕込み、系内を減圧窒素置換しながら溶解させた。テトラブチルアンモニウムブロマイド0.6gを加え、窒素ガスパージを施しながら、系内を60℃以下に制御して、20%水酸化ナトリウム水溶液420gを3時間かけて滴下した。滴下終了後、そのまま1時間撹拌を続けて反応させた。反応終了後、反応混合物を静置して分液し、水層を取り除いた。残った有機層に水を加えて約15分間攪拌混合した後、混合物を静置して分液し、水層を取り除いた。水層のpHが7になるまでこの操作を繰り返した後、デカンタ脱水で水分とトルエンを除去し、活性エステル化合物(1’)を得た。活性エステル化合物(1’)の溶融粘度は0.65dPa・sであった。
Comparative Production Example 1 Production of active ester compound (1′) A flask equipped with a thermometer, a dropping funnel, a condenser, a fractionating tube and a stirrer was charged with 202 g of isophthaloyl chloride and 1250 g of toluene, and the system was decompressed and replaced with nitrogen. while it was dissolved. Then, 288 g of 1-naphthol was charged and dissolved while replacing the pressure in the system with nitrogen. 0.6 g of tetrabutylammonium bromide was added, and while purging with nitrogen gas, the inside of the system was controlled at 60° C. or less, and 420 g of a 20% aqueous sodium hydroxide solution was added dropwise over 3 hours. After the dropwise addition was completed, the mixture was allowed to react while stirring for 1 hour. After completion of the reaction, the reaction mixture was allowed to stand still for liquid separation, and the aqueous layer was removed. After adding water to the remaining organic layer and stirring and mixing for about 15 minutes, the mixture was allowed to stand for liquid separation, and the aqueous layer was removed. After repeating this operation until the pH of the aqueous layer reached 7, water and toluene were removed by decanter dehydration to obtain an active ester compound (1′). The melt viscosity of the active ester compound (1') was 0.65 dPa·s.

実施例2及び比較例1
下記表1に示す割合で各成分を配合して硬化性組成物を製造し、下記要領で評価試験を行った。結果を表1に示す。
Example 2 and Comparative Example 1
A curable composition was produced by blending each component in the ratio shown in Table 1 below, and an evaluation test was performed in the following manner. Table 1 shows the results.

高温条件下での貯蔵弾性率の測定
硬化性組成物を型枠へ流し込み、プレス機を用いて175℃の温度で10分間成型した。型枠から成型物を取り出し、175℃の温度で5時間硬化させて硬化物を得た。
前記硬化物から5mm×54mm×2.4mmサイズの試験片を切り出した。試験片について、粘弾性測定装置(レオメトリック社製「固体粘弾性測定装置RSAII」)を用い、レクタンギュラーテンション法、周波数1Hz、昇温温度3℃/分の条件で、260℃における貯蔵弾性率を測定した。
Measurement of Storage Modulus under High Temperature Conditions The curable composition was poured into a mold and molded at a temperature of 175° C. for 10 minutes using a press. The molded product was removed from the mold and cured at a temperature of 175° C. for 5 hours to obtain a cured product.
A test piece having a size of 5 mm×54 mm×2.4 mm was cut out from the cured product. Using a viscoelasticity measuring device (“Solid viscoelasticity measuring device RSAII” manufactured by Rheometric Co., Ltd.), the storage modulus at 260° C. was measured using a rectangular tension method, a frequency of 1 Hz, and a heating temperature of 3° C./min. It was measured.

銅箔密着性の評価
真空成型機(株式会社名機製作所製「MHPC-VF」)を用いて、金型温度175℃、成形圧力0.4MPa、硬化時間90分の条件で、銅箔と硬化物の積層体を製造した。
先で得た積層体から幅7mm、長さ200mmサイズの試験片を切り出し、JIS K 6854に準拠して、剥離速度50mm/分条件にて銅箔のピール強度を測定した。
Evaluation of copper foil adhesion Using a vacuum forming machine (“MHPC-VF” manufactured by Meiki Seisakusho Co., Ltd.), the copper foil and the copper foil are cured under the conditions of a mold temperature of 175 ° C., a molding pressure of 0.4 MPa, and a curing time of 90 minutes. A laminate of objects was produced.
A test piece having a width of 7 mm and a length of 200 mm was cut out from the laminate obtained above, and the peel strength of the copper foil was measured according to JIS K 6854 at a peel rate of 50 mm/min.

Figure 0007228085000006
Figure 0007228085000006

エポキシ樹脂(*1):クレゾールノボラック型エポキシ樹脂(DIC株式会社製「N-655-EXP-S」、エポキシ当量202g/当量) Epoxy resin (*1): cresol novolac type epoxy resin (manufactured by DIC Corporation "N-655-EXP-S", epoxy equivalent 202 g/equivalent)

Claims (6)

下記構造式(3)
Figure 0007228085000007
(式中Rはそれぞれ独立して脂肪族炭化水素基、アルコキシ基、ハロゲン原子、アリール基、アラルキル基の何れかである。mは0又は1~4の整数であり、nは0又は1であり、tの平均値は0.05~0.8の範囲である。)
で表されるヒドロキシ化合物(a1)と芳香族モノカルボン酸又はその酸ハロゲン化物(a2)とのエステル化物である活性エステル組成物
Structural formula (3) below
Figure 0007228085000007
(In the formula, each R 1 is independently an aliphatic hydrocarbon group, an alkoxy group, a halogen atom, an aryl group, or an aralkyl group; m is an integer of 0 or 1 to 4; n is 0 or 1; , and the average value of t is in the range of 0.05 to 0.8.)
An active ester composition which is an ester of a hydroxy compound (a1) represented by and an aromatic monocarboxylic acid or an acid halide thereof (a2).
前記ヒドロキシ化合物(a1)におけるジヒドロキシ化合物の含有量が、65~90質量%である請求項1記載の活性エステル組成物2. The active ester composition according to claim 1, wherein the content of the dihydroxy compound in the hydroxy compound (a1) is 65 to 90% by mass. 請求項1又は2記載の活性エステル組成物と硬化剤とを含有する硬化性組成物。 A curable composition comprising the active ester composition according to claim 1 or 2 and a curing agent. 請求項3記載の硬化性組成物の硬化物。 A cured product of the curable composition according to claim 3 . 請求項3記載の硬化性組成物を用いてなる半導体封止材料。 A semiconductor sealing material using the curable composition according to claim 3 . 請求項3記載の硬化性組成物を用いてなるプリント配線基板。 A printed wiring board using the curable composition according to claim 3 .
JP2019526746A 2017-06-28 2018-06-05 Active ester compound and curable composition Active JP7228085B2 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2017126265 2017-06-28
JP2017126265 2017-06-28
PCT/JP2018/021500 WO2019003822A1 (en) 2017-06-28 2018-06-05 Active ester compound and curable composition

Publications (2)

Publication Number Publication Date
JPWO2019003822A1 JPWO2019003822A1 (en) 2020-04-23
JP7228085B2 true JP7228085B2 (en) 2023-02-24

Family

ID=64740536

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2019526746A Active JP7228085B2 (en) 2017-06-28 2018-06-05 Active ester compound and curable composition

Country Status (4)

Country Link
JP (1) JP7228085B2 (en)
CN (1) CN110799482A (en)
TW (1) TWI808973B (en)
WO (1) WO2019003822A1 (en)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004018718A (en) 2002-06-18 2004-01-22 Mitsui Chemicals Inc Adhesive composition for semiconductor device
JP2004018720A (en) 2002-06-18 2004-01-22 Mitsui Chemicals Inc Adhesive for semiconductor device
JP2007016113A (en) 2005-07-07 2007-01-25 Nippon Kayaku Co Ltd Epoxy resin, photosensitive resin and photosensitive resin composition
JP4527977B2 (en) 2001-09-28 2010-08-18 三井化学株式会社 Epoxy resin composition and use thereof
JP2011127063A (en) 2009-12-21 2011-06-30 Dic Corp Epoxy resin curing agent and epoxy resin composition including the same
WO2015141370A1 (en) 2014-03-18 2015-09-24 Dic株式会社 Active ester resin, epoxy resin composition, cured product of same, prepreg, circuit board and buildup film

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3723891A1 (en) * 1987-07-18 1989-01-26 Huels Chemische Werke Ag METHOD FOR PRODUCING DICYCLOPENTENE OLESTERS
US4895908A (en) * 1987-09-28 1990-01-23 Eastman Kodak Company Cyclopentadienylethanol and bis(2-hydroxyethyl)dicyclopentadiene esters and grafts thereof on carboxyl modified polyolefins
US5176977A (en) * 1991-07-01 1993-01-05 Eastman Kodak Company Nonpolymeric amorphous developer compositions and developing processes
JPH0853539A (en) * 1994-08-12 1996-02-27 Dainippon Ink & Chem Inc Production of phenol resin and epoxy resin
JP2000327751A (en) * 1999-05-20 2000-11-28 Mitsui Chemicals Inc Epoxy resin composition and its use
JP4643000B2 (en) * 2000-12-28 2011-03-02 三井化学株式会社 Ester group-containing compound and epoxy resin composition
WO2007013284A1 (en) * 2005-07-29 2007-02-01 Sumitomo Bakelite Co., Ltd. Epoxy resin composition and semiconductor device
WO2012165317A1 (en) * 2011-05-27 2012-12-06 Dic株式会社 Active ester resin, method for producing same, thermosetting resin composition, cured product thereof, semiconductor sealing material, prepreg, circuit board, and build-up film
JP6308344B2 (en) * 2013-04-08 2018-04-11 味の素株式会社 Curable resin composition
KR20160100943A (en) * 2013-12-18 2016-08-24 닛뽄 가야쿠 가부시키가이샤 Thermosetting resin composition, method for manufacturing reflective member for optical semiconductor device using same, and optical semiconductor device

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4527977B2 (en) 2001-09-28 2010-08-18 三井化学株式会社 Epoxy resin composition and use thereof
JP2004018718A (en) 2002-06-18 2004-01-22 Mitsui Chemicals Inc Adhesive composition for semiconductor device
JP2004018720A (en) 2002-06-18 2004-01-22 Mitsui Chemicals Inc Adhesive for semiconductor device
JP2007016113A (en) 2005-07-07 2007-01-25 Nippon Kayaku Co Ltd Epoxy resin, photosensitive resin and photosensitive resin composition
JP2011127063A (en) 2009-12-21 2011-06-30 Dic Corp Epoxy resin curing agent and epoxy resin composition including the same
WO2015141370A1 (en) 2014-03-18 2015-09-24 Dic株式会社 Active ester resin, epoxy resin composition, cured product of same, prepreg, circuit board and buildup film

Also Published As

Publication number Publication date
CN110799482A (en) 2020-02-14
TWI808973B (en) 2023-07-21
JPWO2019003822A1 (en) 2020-04-23
TW201904931A (en) 2019-02-01
WO2019003822A1 (en) 2019-01-03

Similar Documents

Publication Publication Date Title
JP7137152B2 (en) Active ester composition
JP6270092B1 (en) Active ester resin composition and cured product thereof
JP7068669B2 (en) Active ester compound
JP6304465B1 (en) Active ester composition and cured product thereof
JP6332720B1 (en) Active ester resin and its cured product
JPWO2018008414A1 (en) Epoxy resin and its cured product
JP6332719B1 (en) Active ester resin and its cured product
JP2022132514A (en) Polyester resin, curable resin composition, and cured product thereof, printed wiring board and semiconductor sealing material
JP7104899B2 (en) Active ester compound and curable composition
JP7228085B2 (en) Active ester compound and curable composition
JP7136095B2 (en) Active ester compound and curable composition
JP7276665B2 (en) Active ester composition and semiconductor encapsulation material
JP7496210B2 (en) Active ester compounds
JP6332721B1 (en) Active ester resin and its cured product
JP2019137622A (en) Polyester resin
JPWO2018173499A1 (en) Polyester resin and its cured product
JP2018193470A (en) δ- VALEROLACTONE SKELETON-CONTAINING RESIN

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20210528

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20220603

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20220728

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20220825

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20221017

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20230106

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20230119

R151 Written notification of patent or utility model registration

Ref document number: 7228085

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R151