JP7172024B2 - Chalcogenide glass material - Google Patents
Chalcogenide glass material Download PDFInfo
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- JP7172024B2 JP7172024B2 JP2017174793A JP2017174793A JP7172024B2 JP 7172024 B2 JP7172024 B2 JP 7172024B2 JP 2017174793 A JP2017174793 A JP 2017174793A JP 2017174793 A JP2017174793 A JP 2017174793A JP 7172024 B2 JP7172024 B2 JP 7172024B2
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- glass material
- chalcogenide glass
- antireflection film
- layer
- refractive index
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- 239000000463 material Substances 0.000 title claims description 47
- 239000005387 chalcogenide glass Substances 0.000 title claims description 32
- 239000011521 glass Substances 0.000 claims description 26
- 230000003287 optical effect Effects 0.000 claims description 10
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 6
- 229910044991 metal oxide Inorganic materials 0.000 claims description 6
- 150000004706 metal oxides Chemical class 0.000 claims description 6
- WMWLMWRWZQELOS-UHFFFAOYSA-N bismuth(iii) oxide Chemical compound O=[Bi]O[Bi]=O WMWLMWRWZQELOS-UHFFFAOYSA-N 0.000 claims description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 3
- 150000001721 carbon Chemical class 0.000 claims description 3
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 claims description 3
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 claims description 3
- 229910052593 corundum Inorganic materials 0.000 claims description 3
- 229910052733 gallium Inorganic materials 0.000 claims description 3
- 229910052732 germanium Inorganic materials 0.000 claims description 3
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(IV) oxide Inorganic materials O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 229910001845 yogo sapphire Inorganic materials 0.000 claims description 3
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 claims description 3
- 238000010030 laminating Methods 0.000 claims 2
- 238000002834 transmittance Methods 0.000 description 20
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 12
- 239000002994 raw material Substances 0.000 description 11
- 239000003708 ampul Substances 0.000 description 10
- 238000004017 vitrification Methods 0.000 description 6
- 230000007423 decrease Effects 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910005900 GeTe Inorganic materials 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 229910052798 chalcogen Inorganic materials 0.000 description 2
- 150000001787 chalcogens Chemical class 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 229910017000 As2Se3 Inorganic materials 0.000 description 1
- 229910009973 Ti2O3 Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- FPHIOHCCQGUGKU-UHFFFAOYSA-L difluorolead Chemical compound F[Pb]F FPHIOHCCQGUGKU-UHFFFAOYSA-L 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 229910001512 metal fluoride Inorganic materials 0.000 description 1
- 230000004297 night vision Effects 0.000 description 1
- 229910052958 orpiment Inorganic materials 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- XSOKHXFFCGXDJZ-UHFFFAOYSA-N telluride(2-) Chemical compound [Te-2] XSOKHXFFCGXDJZ-UHFFFAOYSA-N 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- GQUJEMVIKWQAEH-UHFFFAOYSA-N titanium(III) oxide Chemical compound O=[Ti]O[Ti]=O GQUJEMVIKWQAEH-UHFFFAOYSA-N 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3464—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a chalcogenide
- C03C17/347—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a chalcogenide comprising a sulfide or oxysulfide
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- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3447—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a halide
- C03C17/3452—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a halide comprising a fluoride
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- C—CHEMISTRY; METALLURGY
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3621—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a fluoride
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- C—CHEMISTRY; METALLURGY
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3628—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a sulfide
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3634—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing carbon, a carbide or oxycarbide
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3639—Multilayers containing at least two functional metal layers
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3642—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating containing a metal layer
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3649—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer made of metals other than silver
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
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- C—CHEMISTRY; METALLURGY
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- C03C3/00—Glass compositions
- C03C3/32—Non-oxide glass compositions, e.g. binary or ternary halides, sulfides or nitrides of germanium, selenium or tellurium
- C03C3/321—Chalcogenide glasses, e.g. containing S, Se, Te
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- C—CHEMISTRY; METALLURGY
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- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/10—Compositions for glass with special properties for infrared transmitting glass
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0232—Optical elements or arrangements associated with the device
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- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
- C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes
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- Optics & Photonics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
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- Glass Compositions (AREA)
- Surface Treatment Of Glass (AREA)
- Light Receiving Elements (AREA)
Description
本発明は、赤外線センサ、赤外線カメラ等に使用されるカルコゲナイドガラス材に関する。 The present invention relates to a chalcogenide glass material used for infrared sensors, infrared cameras and the like.
車載ナイトビジョンやセキュリティシステム等は、夜間の生体検知に用いられる赤外線センサを備えている。赤外線センサは、生体から発せられる波長約8~14μmの赤外線を感知するため、センサ部の前には当該波長範囲の赤外線を透過するフィルターやレンズ等の光学素子が設けられる。 In-vehicle night vision systems, security systems, and the like are equipped with infrared sensors used for biometric detection at night. Since the infrared sensor senses infrared rays with a wavelength of about 8 to 14 μm emitted from a living body, an optical element such as a filter or lens that transmits infrared rays in this wavelength range is provided in front of the sensor section.
上記のような光学素子用の材料として、GeやZnSeが挙げられる。これらは結晶体であるため加工性に劣り、非球面レンズ等の複雑な形状に加工することが困難である。そのため量産しにくく、また赤外線センサの小型化も困難であるという問題がある。 Ge and ZnSe are mentioned as a material for the above optical elements. Since these materials are crystalline, they are inferior in workability and difficult to process into complicated shapes such as aspherical lenses. Therefore, there is a problem that mass production is difficult and it is also difficult to miniaturize the infrared sensor.
そこで、波長約8~14μmの赤外線を透過し、加工が比較的容易なガラス質の材料として、カルコゲナイドガラスが提案されている。(例えば特許文献1参照) Therefore, chalcogenide glass has been proposed as a vitreous material that transmits infrared rays with a wavelength of about 8 to 14 μm and is relatively easy to process. (See Patent Document 1, for example)
しかしながら、特許文献1に記載のガラスは、波長10μm以上で赤外線透過率が顕著に低下しているため、特に生体から発せられる赤外線に対する感度に劣り、赤外線センサが十分に機能しないおそれがある。さらに、前記ガラスは、耐候性が低いため変質し、赤外線透過率が低下するという問題がある。 However, the glass described in Patent Literature 1 has a significantly reduced infrared transmittance at a wavelength of 10 μm or longer, and is particularly poor in sensitivity to infrared rays emitted from a living body, and the infrared sensor may not function satisfactorily. Furthermore, the glass has a problem that it deteriorates due to its low weather resistance, and the infrared transmittance decreases.
本発明は、このような状況に鑑みてなされたものであり、耐候性に優れ、赤外線センサの光学素子として好適なカルコゲナイドガラス材を提供することを目的とする。 SUMMARY OF THE INVENTION It is an object of the present invention to provide a chalcogenide glass material that has excellent weather resistance and is suitable as an optical element for an infrared sensor.
本発明のカルコゲナイドガラス材は、モル%で、Te 20~99%を含有し、表面に反射防止膜が形成されていることを特徴とする。 The chalcogenide glass material of the present invention is characterized by containing 20 to 99% by mol of Te and having an antireflection film formed on the surface thereof.
本発明のカルコゲナイドガラス材は、必須成分としてTeを含有させているため、赤外線透過率に優れている。また、表面に反射防止膜が形成されているため、赤外光の反射を抑制することができ、赤外線透過率をより高めることができる。さらに、表面に反射防止膜が形成されていると、ガラスが空気中の水分や酸素と反応し変質することを抑制できるため、耐候性に優れている。 Since the chalcogenide glass material of the present invention contains Te as an essential component, it is excellent in infrared transmittance. In addition, since an antireflection film is formed on the surface, reflection of infrared light can be suppressed, and infrared transmittance can be further increased. Furthermore, when an antireflection film is formed on the surface, the glass can be prevented from reacting with moisture and oxygen in the air and deteriorating, so that the glass has excellent weather resistance.
本発明のカルコゲナイドガラス材は、モル%で、Te 40~95%を含有することが好ましい。 The chalcogenide glass material of the present invention preferably contains 40 to 95% by mole of Te.
本発明のカルコゲナイドガラス材は、さらに、モル%で、Ge 0~40%を含有することが好ましい。 The chalcogenide glass material of the present invention preferably further contains 0 to 40% by mole of Ge.
本発明のカルコゲナイドガラス材は、さらに、モル%で、Ga 0~30%を含有することが好ましい。 The chalcogenide glass material of the present invention preferably further contains 0 to 30% Ga in terms of mol %.
本発明のカルコゲナイドガラス材は、反射防止膜が、低屈折率層と高屈折率層が交互に合計2層以上積層されていることが好ましい。 In the chalcogenide glass material of the present invention, the antireflection film preferably has a total of two or more layers of alternating low refractive index layers and high refractive index layers.
本発明の光学素子は、上記のカルコゲナイドガラス材を用いることを特徴とする。 An optical element of the present invention is characterized by using the chalcogenide glass material described above.
本発明の赤外線センサは、上記の光学素子を用いることを特徴とする。 An infrared sensor of the present invention is characterized by using the optical element described above.
本発明によれば、耐候性に優れ、赤外線センサの光学素子として好適なカルコゲナイドガラス材を提供することができる。 According to the present invention, it is possible to provide a chalcogenide glass material that is excellent in weather resistance and suitable as an optical element for an infrared sensor.
本発明のカルコゲナイドガラス材は、表面に反射防止膜が形成されている。上述した通り、表面に反射防止膜が形成されていると、赤外線透過率、耐候性を向上させることができる。 The chalcogenide glass material of the present invention has an antireflection film formed on its surface. As described above, when an antireflection film is formed on the surface, infrared transmittance and weather resistance can be improved.
まず、反射防止膜について説明する。 First, the antireflection film will be explained.
反射防止膜は、低屈折率層と高屈折率層が交互に合計2層以上、2~34層、特に4~12層積層されていることが好ましい。積層数が少なすぎると赤外光を透過しにくくなる。一方、積層数が多すぎると成膜に要する工程が多くなり高コスト化の要因となる傾向がある。なお、低屈折率層及び高屈折率層の組合わせに制限は無く、高屈折率層の屈折率が低屈折率層の屈折率より相対的に大きければよい。 It is preferable that the antireflection film has a total of 2 or more layers, 2 to 34 layers, particularly 4 to 12 layers, in which low refractive index layers and high refractive index layers are alternately laminated. If the number of laminations is too small, it becomes difficult to transmit infrared light. On the other hand, if the number of laminations is too large, the number of steps required for film formation increases, which tends to cause an increase in cost. The combination of the low refractive index layer and the high refractive index layer is not limited as long as the refractive index of the high refractive index layer is relatively higher than that of the low refractive index layer.
屈折率層の1層当りの厚みは、0.01~10μm、0.02~5μm、特に0.03~2μmが好ましい。1層当たりの厚みが小さすぎると赤外光を透過しにくくなる。一方、厚みが大きすぎると、反射防止膜とカルコゲナイドガラス材の界面にかかる応力が大きくなり、膜の密着性、ガラス材の機械的強度が低下しやすくなる。 The thickness of each refractive index layer is preferably 0.01 to 10 μm, 0.02 to 5 μm, particularly 0.03 to 2 μm. If the thickness per layer is too small, it becomes difficult to transmit infrared light. On the other hand, if the thickness is too large, the stress applied to the interface between the antireflection film and the chalcogenide glass material increases, and the adhesion of the film and the mechanical strength of the glass material tend to decrease.
屈折率層の材質は、金属酸化物(Y2O3、Al2O3、SiO、SiO2、MgO、TiO、TiO2、Ti2O3、CeO2、Bi2O3、HfO2)、水素化炭素、ダイヤモンドライクカーボン(DLC)、Ge、Si、ZnS、ZnSe、As2S3、As2Se3、PbF2、テルル化金属、フッ化金属が好ましい。なお、耐候性、機械的強度をより向上させるためには、金属酸化物、水素化炭素、ダイヤモンドライクカーボン(DLC)を最外層にすることが好ましい。また、密着性をより向上するためには、金属酸化物を中間層にすることが好ましい。なお、屈折率層の材質は、樹脂でもよく、例えばオレフィン系樹脂等を用いることができる。 The material of the refractive index layer is metal oxide ( Y2O3 , Al2O3 , SiO, SiO2 , MgO, TiO, TiO2 , Ti2O3 , CeO2 , Bi2O3 , HfO2 ), Hydrogenated carbon, diamond-like carbon (DLC), Ge, Si, ZnS, ZnSe, As2S3 , As2Se3 , PbF2 , metal telluride, and metal fluoride are preferred. In order to further improve weather resistance and mechanical strength, it is preferable to use metal oxide, hydrogenated carbon, or diamond-like carbon (DLC) as the outermost layer. Moreover, in order to further improve adhesion, it is preferable to use a metal oxide as the intermediate layer. The material of the refractive index layer may be a resin, for example, an olefin resin or the like.
次に、本発明のカルコゲナイドガラス材の組成について説明する。なお、以下の各成分の含有量に関する説明において、特に断りのない限り、「%」は「モル%」を意味する。 Next, the composition of the chalcogenide glass material of the present invention will be described. In the following description of the content of each component, "%" means "mol %" unless otherwise specified.
本発明のカルコゲナイドガラス材は、Teを必須成分として含有する。カルコゲン元素であるTeはガラス骨格を形成し、赤外線透過率を高める成分である。Teの含有量は、20~99%であり、40~95%、50~85%、60~85%、特に70~80%であることが好ましい。Teの含有量が少なすぎると、ガラス化しにくくなり、赤外線透過率が低下しやすくなる。一方、Teの含有量が多すぎるとガラスの熱安定性が低下しやすく、Te系の結晶が析出しやすくなる。ちなみに、他のカルコゲン元素Se、Sは、Teより赤外線透過率を向上させにくく、赤外透過限界波長が短くなりやすい。 The chalcogenide glass material of the present invention contains Te as an essential component. Te, which is a chalcogen element, is a component that forms a glass skeleton and increases infrared transmittance. The Te content is 20 to 99%, preferably 40 to 95%, 50 to 85%, 60 to 85%, particularly 70 to 80%. If the Te content is too low, vitrification becomes difficult and the infrared transmittance tends to decrease. On the other hand, if the Te content is too high, the thermal stability of the glass tends to decrease, and Te-based crystals tend to precipitate. Incidentally, the other chalcogen elements Se and S are more difficult to improve the infrared transmittance than Te, and tend to have a shorter infrared transmission limit wavelength.
上記成分以外にも、以下に示す種々の成分を含有させることができる。 In addition to the above components, various components shown below can be contained.
Geは赤外線透過率を低下させることなく、ガラス化範囲を広げ、ガラスの熱安定性を高める成分である。Geの含有量は、0~40%、1~35%、5~30%、7~25%、特に10~20%であることが好ましい。Geの含有量が多すぎると、Ge系の結晶が析出しやすくなるとともに、原料コストが高くなる傾向がある。 Ge is a component that widens the vitrification range and increases the thermal stability of the glass without lowering the infrared transmittance. The Ge content is preferably 0-40%, 1-35%, 5-30%, 7-25%, particularly 10-20%. If the Ge content is too high, Ge-based crystals tend to precipitate more easily and raw material costs tend to increase.
Gaは赤外線透過率を低下させることなく、ガラス化範囲を広げ、ガラスの熱安定性を高める成分である。Gaの含有量は、0~30%、1~30%、3~25%、4~20%、特に5~15%であることが好ましい。Gaの含有量が多すぎると、Ga系の結晶が析出しやすくなるとともに、原料コストが高くなる傾向がある。 Ga is a component that widens the vitrification range and increases the thermal stability of the glass without lowering the infrared transmittance. The Ga content is preferably 0 to 30%, 1 to 30%, 3 to 25%, 4 to 20%, particularly 5 to 15%. If the Ga content is too high, Ga-based crystals tend to precipitate more easily and raw material costs tend to increase.
Agはガラス化範囲を広げ、ガラスの熱安定性を高める成分である。Agの含有量は0~20%、特に1~10%であることが好ましい。Agの含有量が多すぎると、ガラス化しにくくなる。 Ag is a component that widens the vitrification range and enhances the thermal stability of the glass. The Ag content is preferably 0 to 20%, particularly 1 to 10%. If the Ag content is too high, it becomes difficult to vitrify.
Alはガラス化範囲を広げ、ガラスの熱安定性を高める成分である。Alの含有量は0~20%、特に0~10%であることが好ましい。Alの含有量が多すぎると、ガラス化しにくくなる。 Al is a component that widens the vitrification range and enhances the thermal stability of the glass. The Al content is preferably 0 to 20%, particularly 0 to 10%. If the Al content is too high, it becomes difficult to vitrify.
Snはガラス化範囲を広げ、ガラスの熱安定性を高める成分である。Snの含有量は0~20%、特に0~10%であることが好ましい。Snの含有量が多すぎると、ガラス化しにくくなる。 Sn is a component that widens the vitrification range and enhances the thermal stability of the glass. The Sn content is preferably 0 to 20%, particularly 0 to 10%. If the Sn content is too high, it becomes difficult to vitrify.
次に、本発明のカルコゲナイドガラス材の製造方法について説明する。 Next, the method for producing the chalcogenide glass material of the present invention will be described.
上記のガラス組成となるように、原料を混合し、原料バッチを得る。次に、石英ガラスアンプルを加熱しながら真空排気した後、原料バッチを入れ、真空排気を行いながら酸素バーナーで石英ガラスアンプルを封管する。 Raw materials are mixed to obtain the above glass composition to obtain a raw material batch. Next, after the quartz glass ampoule is evacuated while being heated, a raw material batch is put therein, and the quartz glass ampoule is sealed with an oxygen burner while being evacuated.
原料としては、元素原料(Te、Ge、Ga等)を用いてもよく、化合物原料(GeTe、GeTe2、Ga2Te3等)を用いても良い。また、これらを併用することも可能である。 As raw materials, element raw materials (Te, Ge, Ga, etc.) may be used, and compound raw materials (GeTe, GeTe 2 , Ga 2 Te 3 , etc.) may be used. Moreover, it is also possible to use these together.
次に、封管された石英ガラスアンプルを溶融炉内で10~80℃/時間の速度で650~1000℃まで昇温後、6~12時間保持する。保持時間中、必要に応じて、石英ガラスアンプルの上下を反転し、溶融物を攪拌する。 Next, the sealed quartz glass ampoule is heated to 650 to 1000° C. at a rate of 10 to 80° C./hour in a melting furnace and held for 6 to 12 hours. During the holding time, the quartz glass ampoule is turned upside down to stir the melt, if necessary.
その後、石英ガラスアンプルを溶融炉から取り出し、室温まで急冷することによりガラス母材を得る。 Thereafter, the quartz glass ampoule is taken out from the melting furnace and rapidly cooled to room temperature to obtain a glass preform.
続いて、得られたガラス母材を所定形状(円盤状、レンズ状等)に加工する。 Subsequently, the obtained glass base material is processed into a predetermined shape (disk-like, lens-like, etc.).
所定形状に加工したガラス母材の片面又は両面に、反射防止膜を形成させカルコゲナイドガラス材を得る。反射防止膜の形成方法としては、真空蒸着法、イオンプレーティング法、スパッタリング法等が挙げられる。 A chalcogenide glass material is obtained by forming an antireflection film on one or both sides of a glass base material processed into a predetermined shape. Methods for forming the antireflection film include a vacuum deposition method, an ion plating method, a sputtering method, and the like.
なお、ガラス母材に反射防止膜を形成した後、ガラス母材を所定形状に加工しても構わない。ただし、加工工程において反射防止膜の剥離が生じやすくなるため、特段の事情がない限り、ガラス母材を所定形状に加工した後に、反射防止膜を形成することが好ましい。 After forming the antireflection film on the glass base material, the glass base material may be processed into a predetermined shape. However, since the antireflection film tends to peel off during the processing step, it is preferable to form the antireflection film after processing the glass base material into a predetermined shape unless there are special circumstances.
本発明のカルコゲナイドガラス材は、厚み2mmでの波長8~14μmにおける平均赤外線透過率が80%以上、85%以上、特に90%以上であることが好ましい。平均赤外線透過率が低すぎると、赤外線センサ用として使用した場合に十分に機能しないおそれがある。 The chalcogenide glass material of the present invention preferably has an average infrared transmittance of 80% or more, 85% or more, particularly 90% or more at a wavelength of 8 to 14 μm with a thickness of 2 mm. If the average infrared transmittance is too low, it may not function sufficiently when used as an infrared sensor.
本発明のカルコゲナイドガラス材は、赤外線透過率、耐候性に優れるため、赤外線センサのセンサ部を保護するためのカバー部材や、赤外線センサ部に赤外光を集光させるためのレンズ等の光学素子として好適である。 Since the chalcogenide glass material of the present invention is excellent in infrared transmittance and weather resistance, it can be used as an optical element such as a cover member for protecting the sensor part of an infrared sensor or a lens for concentrating infrared light on the infrared sensor part. It is suitable as
以下、本発明を実施例に基づいて説明するが、本発明はこれらの実施例に限定されるものではない。 EXAMPLES The present invention will be described below based on examples, but the present invention is not limited to these examples.
表1及び2は、本発明の実施例(試料No.1~10)及び比較例(試料No.11、12)を示している。 Tables 1 and 2 show examples of the present invention (samples Nos. 1 to 10) and comparative examples (samples Nos. 11 and 12).
表1及び2に示すガラス組成になるように原料を調合し、原料バッチを得た。次に、純水で洗浄した石英ガラスアンプルを加熱しながら真空排気した後、原料バッチを入れ、真空排気を行いながら酸素バーナーで石英ガラスアンプルを封管した。封管された石英ガラスアンプルを溶融炉内で10~80℃/時間の速度で650~1000℃まで昇温後、6~12時間保持した。保持時間中、2時間ごとに石英ガラスアンプルの上下を反転し、溶融物を攪拌した。その後、石英ガラスアンプルを溶融炉から取り出し、室温まで急冷することによりガラス母材を得た。 Raw materials were blended so that the glass compositions shown in Tables 1 and 2 were obtained, and raw material batches were obtained. Next, after the quartz glass ampoule washed with pure water was heated and evacuated, a raw material batch was put therein, and the quartz glass ampoule was sealed with an oxygen burner while being evacuated. The sealed quartz glass ampoule was heated to 650 to 1000° C. at a rate of 10 to 80° C./hour in a melting furnace and held for 6 to 12 hours. During the holding time, the quartz glass ampoule was turned upside down every 2 hours to stir the melt. Thereafter, the quartz glass ampoule was taken out from the melting furnace and rapidly cooled to room temperature to obtain a glass preform.
得られたガラス母材を切削、研磨することにより、直径15mm、厚み2mmの円盤状に加工した後、両面を光学研磨した。光学研磨後のガラス母材に、真空蒸着法にて表1及び2に示す構成の反射防止膜を全面に形成し、カルコゲナイドガラス材を得た。なお、反射防止膜に関しては、表1及び2に記載の通り、ガラス材側から第1層、第2層、第3層、第4層、第5層、第6層、第7層、第8層、第9層、第10層、第11層、第12層、第13層の順に成膜を行った。 The obtained glass base material was cut and polished to be processed into a disk shape having a diameter of 15 mm and a thickness of 2 mm, and both surfaces were optically polished. An anti-reflection film having the structure shown in Tables 1 and 2 was formed on the entire surface of the optically polished glass base material by vacuum deposition to obtain a chalcogenide glass material. Regarding the antireflection film, as shown in Tables 1 and 2, from the glass material side, the first layer, the second layer, the third layer, the fourth layer, the fifth layer, the sixth layer, the seventh layer, and the third layer. The 8th layer, the 9th layer, the 10th layer, the 11th layer, the 12th layer, and the 13th layer were formed in this order.
得られた試料について、平均赤外線透過率、耐候性を測定または評価した。結果を表1、2に示す。 The obtained samples were measured or evaluated for average infrared transmittance and weather resistance. Tables 1 and 2 show the results.
波長8~14μmにおける平均赤外線透過率は、FT-IR(フーリエ変換赤外分光光度計)にて測定した。 The average infrared transmittance at a wavelength of 8 to 14 μm was measured by FT-IR (Fourier transform infrared spectrophotometer).
耐候性は次のようにして評価した。得られた試料を60℃-90Rh%の恒温恒湿層内に500時間保持した。保持後の試料の波長8~14μmにおける平均赤外線透過率をFT-IRにて測定した。保持前後で平均赤外線透過率が変化しなかったものを「○」、変化したものを「×」とした。 Weather resistance was evaluated as follows. The obtained sample was kept in a constant temperature and humidity layer of 60° C.-90 Rh % for 500 hours. After holding, the average infrared transmittance at a wavelength of 8 to 14 μm was measured by FT-IR. When the average infrared transmittance did not change before and after holding, it was evaluated as "○", and when it changed, it was evaluated as "X".
表1、2から明らかなように、実施例1~10の試料は、平均赤外線透過率が94%以上と高く、耐候性にも優れていた。一方、比較例1は、反射防止膜が形成されていないため、平均赤外線透過率が52%と低く、耐候性にも劣っていた。比較例2は、Teを含有していないため平均赤外線透過率が68%と低かった。 As is clear from Tables 1 and 2, the samples of Examples 1 to 10 had a high average infrared transmittance of 94% or more and excellent weather resistance. On the other hand, in Comparative Example 1, since no antireflection film was formed, the average infrared transmittance was as low as 52%, and the weather resistance was also poor. Comparative Example 2 did not contain Te, so the average infrared transmittance was as low as 68%.
本発明のカルコゲナイドガラス材は、赤外線センサのセンサ部を保護するためのカバー部材や、赤外線センサ部に赤外光を集光させるためのレンズ等の光学素子として好適である。 INDUSTRIAL APPLICABILITY The chalcogenide glass material of the present invention is suitable as a cover member for protecting the sensor portion of an infrared sensor and as an optical element such as a lens for concentrating infrared light on the infrared sensor portion.
Claims (9)
前記反射防止膜は、低屈折率層及び高屈折率層が交互に合計2層以上積層されてなり、
前記反射防止膜の最外層が、Y 2 O 3 、Al 2 O 3 、MgO、CeO 2 、Bi 2 O 3 、HfO 2 のいずれかから選択される金属酸化物、水素化炭素又はZnSのいずれかであり、
前記反射防止膜の、ガラス材側の第1層が、Ge、Si、Y 2 O 3 、Al 2 O 3 、MgO、CeO 2 、HfO 2 のいずれかから選択される金属酸化物のいずれかであることを特徴とするカルコゲナイドガラス材。 A chalcogenide glass material containing 20 to 99% by mol of Te and having an antireflection film formed on its surface,
The antireflection film is formed by laminating a total of two or more layers of a low refractive index layer and a high refractive index layer alternately,
The outermost layer of the antireflection film is a metal oxide selected from Y2O3 , Al2O3 , MgO , CeO2 , Bi2O3 , HfO2 , hydrogenated carbon or ZnS . is either
The first layer of the antireflection film on the glass material side is any metal oxide selected from Ge, Si , Y2O3 , Al2O3 , MgO, CeO2 , and HfO2 . A chalcogenide glass material comprising:
前記反射防止膜は、低屈折率層及び高屈折率層が交互に合計2層以上積層されてなり、 The antireflection film is formed by laminating a total of two or more layers of a low refractive index layer and a high refractive index layer alternately,
前記反射防止膜の最外層がZnSであり、 The outermost layer of the antireflection film is ZnS,
前記反射防止膜の、ガラス材側の第1層が、Ge、Si、Y The first layer of the antireflection film on the glass material side contains Ge, Si, Y 22 OO. 33 、Al, Al 22 OO. 33 、MgO、CeO, MgO, CeO 22 、HfO, HfO 22 のいずれかから選択される金属酸化物のいずれかであることを特徴とするカルコゲナイドガラス材。A chalcogenide glass material characterized by being any metal oxide selected from any one of
An infrared sensor using the optical element according to claim 8 .
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EP (1) | EP3683196B1 (en) |
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JP2021056270A (en) * | 2019-09-27 | 2021-04-08 | 日本電気硝子株式会社 | Lens member, lens unit, and methods of manufacturing lens member and lens unit |
CN112047627B (en) * | 2020-08-14 | 2022-09-09 | 暨南大学 | Full-spectrum chalcogenide glass material and preparation method thereof |
JPWO2022130909A1 (en) * | 2020-12-16 | 2022-06-23 | ||
WO2023095900A1 (en) * | 2021-11-29 | 2023-06-01 | 日本電気硝子株式会社 | Infrared-transmitting glass |
WO2023243407A1 (en) * | 2022-06-17 | 2023-12-21 | 日本電気硝子株式会社 | Infrared ray transmitting glass |
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US11643357B2 (en) | 2023-05-09 |
EP3683196A1 (en) | 2020-07-22 |
EP3683196A4 (en) | 2021-06-02 |
CN115010379A (en) | 2022-09-06 |
JP2022186810A (en) | 2022-12-15 |
WO2019054145A1 (en) | 2019-03-21 |
US20200189964A1 (en) | 2020-06-18 |
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EP3683196B1 (en) | 2023-09-06 |
JP2019048752A (en) | 2019-03-28 |
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