JP7148182B2 - diaphragm member - Google Patents

Description

TECHNICAL FIELD The present invention relates to a diaphragm member suitable for use in a diaphragm valve that allows liquids such as high-purity chemicals and ultrapure water to flow in semiconductor manufacturing equipment.

Conventionally, a diaphragm valve to which this type of diaphragm member is applied includes a housing, a diaphragm supported in the housing so as to be displaceable in an axially curved shape, and a diaphragm assembled in the housing to be axially curved. and a driving mechanism that drives the actuator so as to displace it in a shape.

When a diaphragm valve having such a configuration is used in semiconductor manufacturing equipment, highly corrosive chemicals such as strong acids and strong alkalis are used as high-purity chemicals in the cleaning and peeling processes of the semiconductor manufacturing equipment. As the material for forming the diaphragm in the diaphragm valve, it is desirable to employ fluororesin, which is excellent in chemical resistance such as acid resistance and alkali resistance.

In addition, in semiconductor manufacturing equipment, elution of metal components and organic components from diaphragm valves is not permitted, so it is desirable to employ a fluororesin having low elution properties as the material for forming the diaphragm.

Moreover, it is desirable to employ a fluororesin that has excellent flexibility and can maintain a long life in view of the construction of the diaphragm valve as described above.

For the reasons described above, it is required to employ a fluororesin, which has chemical resistance, low elution, excellent flexibility, and can maintain a long life, as a material for forming the diaphragm.

Japanese Patent No. 5286330

By the way, in the diaphragm valve having the above-described configuration, since contamination of the liquid by particles from the diaphragm valve is not allowed in the semiconductor manufacturing equipment, the liquid flowing through the flow path system in the diaphragm valve is It is necessary to isolate it from the driving mechanism, and for that purpose, it is required that the diaphragm is integrally constructed with an outer peripheral portion, a curved displacement portion and a central portion.

Here, when PTFE is adopted as the material for forming the diaphragm, since PTFE has a low melt flow rate, it is impossible to form a diaphragm of good quality by injection molding or extrusion molding. Therefore, the diaphragm is formed by cutting a compression-molded round bar of PTFE.

Although the PTFE diaphragm formed by cutting has a long service life, in a diaphragm valve using such a diaphragm, the curved displacement portion formed by cutting extends or extends on the surface as the diaphragm valve is operated. Due to the compression, a small amount of dust is generated from the curved displacement portion. However, such dust generation is within an allowable range, for example, when the wiring pitch of a silicon wafer manufactured by a semiconductor manufacturing apparatus is larger than 10 (nm).

When PFA is used instead of PTFE as the material for forming the diaphragm, the diaphragm is formed by cutting an injection-molded round bar, a compression-molded round bar, or an extrusion-molded round bar.

The life of the PFA diaphragm formed by cutting in this way is short. In addition, in the diaphragm valve using the PFA diaphragm formed by cutting in this way, the PTFE diaphragm formed by cutting is displaced on the surface of the curved displacement portion formed by cutting along with the operation. As with the curved displacement portion, since the curved displacement portion is stretched or compressed, a small amount of dust is generated from the curved displacement portion.

Here, when PFA is adopted as the material for forming the diaphragm, and the PFA is used to form a thick curved portion by injection molding and by cutting, the thickness of the diaphragm is formed by injection molding or compression molding. When molded into a meat shape, crystallization does not occur uniformly at the curved displacement portion, and the interface becomes a starting point of fracture and life is shortened. .

On the other hand, in recent years, there has been a demand for further miniaturization in the production of semiconductor elements, such as silicon wafers, by semiconductor production apparatuses. For example, there is a demand to reduce the wiring pitch on a silicon wafer to 10 (nm) or less. Therefore, even particles with a size of several nanometers are not allowed to be generated from the diaphragm valve.

However, as described above, in a diaphragm valve using a diaphragm formed by cutting, the surface of the curved displacement portion formed by cutting is stretched or compressed during its operation. Dust is produced, albeit minutely.

In such a case, it is not possible to cope with the situation where even particles with a size of several nanometers are not permitted to be generated from the diaphragm valve. requested.

On the other hand, since the PFA film is thin, the crystallization can be made uniform. If adopted, it was recognized that it would lead to the improvement of the above-mentioned diaphragm.

By the way, in the above-described diaphragm valve, due to its configuration, the diaphragm is connected at its central portion to the drive shaft of the drive mechanism when the diaphragm is curvedly displaced by the drive mechanism.

However, since the diaphragm is in the form of a film and is very thin as described above, it is impossible to form the connecting portion necessary for connecting with the drive shaft of the drive mechanism in the central portion of the diaphragm. Therefore, it is extremely difficult to connect the central portion of the diaphragm to the drive shaft of the drive mechanism without the connecting portion.

In order to solve this problem, it is conceivable to use a configuration of a diaphragm valve that applies laser welding according to the resin diaphragm sealing method described in Patent Document 1 above.

In the diaphragm valve disclosed in Patent Document 1, the flange portion of the diaphragm is laser-welded to the flange portion of the lower housing so as to seal the valve body chamber for the purpose of sealing. Focusing on such a fact, the inventors came up with the idea that it would be possible to use laser welding to connect the central portion of the PFA diaphragm to other members.

Therefore, in order to cope with the above problems, the present invention forms a film-like PFA that can ensure flexibility and long life, and a diaphragm that can suppress dust generation of about several nanometers to a minimum. In addition to selecting the material, an appropriate fluororesin auxiliary shaft is used in consideration of ease of assembly with other members, and even if the diaphragm is thin like a film, the auxiliary shaft and the central part of the diaphragm are connected. It is an object of the present invention to provide a diaphragm member configured as a diaphragm structure to which laser welding is applied to.

In order to solve the above problems, the diaphragm member according to the present invention, according to the description of claim 1,
A film-like diaphragm (200a) made of PFA that is applied to a diaphragm valve that allows high-purity chemical liquids and ultrapure water to flow,
a fluororesin auxiliary shaft (200c) coaxially laser-welded to the central portion of the film-like diaphragm;
Fluororesin which is laser-welded to the outer periphery of the diaphragm along one side of both surfaces of the diaphragm and formed to have an annular shape suitable for reinforcing the diaphragm and making it easy to handle. and a reinforcing annular body (200b) made of
The reinforcing ring, in its annular shape, is formed with a radial width and thickness suitable for reinforcing the diaphragm and making it easier to handle.

According to such a configuration , the auxiliary shaft is connected to the central portion of the diaphragm by laser welding, so the auxiliary shaft can be well connected to the central portion of the diaphragm. In addition , since the reinforcing annular body is connected to the outer peripheral portion of the diaphragm along one side of both surfaces of the diaphragm by laser welding, the reinforcing annular body and the diaphragm are connected at one side. The connection with the outer peripheral portion of the diaphragm along the side surface can be well secured . As a result, the diaphragm, auxiliary shaft and reinforcing ring can be laser welded to form a diaphragm member of good integral construction. The reinforcing annular body may be formed to have an outer diameter equal to the outer diameter of the diaphragm.

Here, the diaphragm is formed as a film-like diaphragm with PFA . By forming the diaphragm with PFA in this way, the diaphragm is excellent in chemical resistance, low elution, flexibility and long life even in the form of a film, and is dust-generating. It can be formed as a minimal (minimum) controllable diaphragm.

In addition, before the diaphragm is laser-welded to the auxiliary shaft and the reinforcing annular body at its central portion and outer peripheral portion as described above, the diaphragm is an independent body separate from the auxiliary shaft and the reinforcing annular body. Positioned as a part. Therefore, before laser welding the auxiliary shaft of the diaphragm and the reinforcing annular body, the diaphragm can be used as an independent and free part as a convenient diaphragm without limitation of use .

As described above, the fluororesin reinforcing annular body is laser-welded to the outer peripheral portion of the diaphragm along one of both surfaces of the diaphragm. Therefore, even if the diaphragm is thin like a film and is difficult to handle, the connecting structure by laser welding between the reinforcing annular body and the outer peripheral portion of the diaphragm along one side surface of the diaphragm as described above can be used. As a result, the reinforcing ring-shaped body can effectively exert a reinforcing function on the diaphragm.
Here, as described above, the reinforcing annular body is formed in an annular shape having a radial width and thickness suitable for reinforcing the diaphragm and making it easy to handle. The reinforcing function of the diaphragm can be secured even better.
Therefore , the diaphragm , although thin , can be handled more easily without bending .

In short, according to the first aspect of the present invention, the diaphragm, the auxiliary shaft and the reinforcing annular member, which are separately prepared in advance as independent parts, are provided with the diaphragm , the auxiliary shaft and the reinforcing ring. Before being laser-welded with the ring-shaped body, it is an independent and free part, and it has the advantage of having convenience without being limited to its use, and the diaphragm is reinforced to make it easy to handle. A reinforcing ring formed in an annular shape having a suitable radial width and thickness is film -like after laser welding along one side of the diaphragm with the outer periphery of the diaphragm. It is possible to achieve both the function and effect that the diaphragm, which is extremely thin and difficult to handle, is well reinforced and made easy to handle.

According to the description of claim 2 , the present invention is characterized in that, in the diaphragm member according to claim 1 , the diaphragm is formed into a film by extrusion molding or compression molding of PFA. do.

According to such a configuration, the diaphragm is formed into a film shape by extrusion molding or compression molding PFA. As a result, the diaphragm generates less dust than a diaphragm formed by cutting , and in particular, has a high smoothness that can suppress even dust generation such as particles of several nm size to the minimum (minimum). It is a diaphragm having a surface and can be secured as a diaphragm excellent in chemical resistance, low elution, flexibility and long life.

Also, as described above, the diaphragm is formed into a film by extrusion molding or compression molding of PFA . Therefore, in the diaphragm , crystallization around the curved displacement portion can be uniformly ensured, so that the life of the diaphragm can be maintained even longer . According to the above, the effects of the invention described in claim 1 can be further improved.

Further, according to the description of claim 3 , the present invention provides the diaphragm member according to claim 2 ,
The auxiliary shaft has an outer diameter within the range of 1 (mm) or more and 4 (mm) or less,
The diaphragm is characterized by having a thickness within the range of 0.1 (mm) or more and 0.5 (mm) or less.

Thus, the outer diameter of the auxiliary shaft is set to a value within the range of 1 (mm) or more and 4 (mm) or less, and the thickness of the diaphragm is set to a value of 0.1 (mm) or more to 0.5 (mm). ) By setting the following values, the same effects as those described in claim 2 can be achieved more reliably. Here, if the auxiliary shaft having an outer diameter of 4 (mm) or less is thermally bonded to the central portion of the diaphragm, there is a risk of thermal deformation occurring at the auxiliary shaft or the central portion of the diaphragm. Since the joint with the central portion of the diaphragm is performed by laser welding, even if the outer diameter of the auxiliary shaft is 4 (mm) or less, the joint between the auxiliary shaft and the central portion of the diaphragm can be performed without deformation. can. The reason why the outer diameter of the auxiliary shaft is set to 1 (mm) is that it is difficult to form an auxiliary shaft having an outer diameter of less than 1 (mm).

Further, as described above, the reason why the thickness of the diaphragm is set to 0.1 (mm) or more is that if the thickness is less than 0.1 (mm), the diaphragm is too thin and easily broken. Also , as mentioned above, 0 . The reason why the thickness is 5 (mm) or less is that if the diaphragm is thicker than 0.5 (mm), it is too thick to bend.

It should be noted that the symbols in parentheses of the above means indicate correspondence with specific means described in the embodiments described later.

BRIEF DESCRIPTION OF THE DRAWINGS It is a longitudinal cross-sectional view which shows 1st Embodiment of the diaphragm valve to which this invention is applied. FIG. 4 is a process diagram showing a process of laser welding the central portion of the diaphragm of the diaphragm member in the first embodiment with the auxiliary shaft. FIG. 4 is a cross-sectional view for explaining laser welding to an auxiliary shaft at the central portion of the diaphragm in the first embodiment; It is process drawing which shows the process of laser-welding the outer peripheral part of the diaphragm of the diaphragm member in the said 1st Embodiment, and the annular body for a reinforcement. FIG. 4 is a cross-sectional view for explaining laser welding of the reinforcing annular body to the outer peripheral portion of the diaphragm in the first embodiment; FIG. 4 is a partial vertical cross-sectional view showing the essential parts of a second embodiment of a diaphragm valve to which the present invention is applied; FIG. 12 is a cross-sectional view for explaining laser welding of the reinforcing annular body to the outer peripheral portion of the diaphragm in the second embodiment; FIG. 3 is a longitudinal sectional view showing a third embodiment of a diaphragm valve to which the present invention is applied; FIG. 10 is a vertical cross-sectional view showing a fourth embodiment of a diaphragm valve to which the present invention is applied;

Hereinafter, each embodiment of the present invention will be described with reference to the drawings.
(First embodiment)
FIG. 1 shows a first embodiment of a diaphragm valve to which the present invention is applied. As the diaphragm valve, an air-operated diaphragm valve applied to semiconductor manufacturing equipment for manufacturing semiconductor elements is employed.

The diaphragm valve is installed in the piping system of the semiconductor manufacturing apparatus, and configured to cause the liquid flowing through the piping system to flow from the upstream side to the downstream side. In the first embodiment, the liquid refers to a liquid such as a high-purity chemical liquid or ultrapure water, and is supplied to the piping system from the liquid supply source of the semiconductor manufacturing apparatus. In addition, the liquid is required to be clean in view of the characteristics of the semiconductor manufacturing apparatus.

As shown in FIG. 1, the diaphragm valve comprises a cylindrical housing 100, a diaphragm member 200 assembled in the cylindrical housing 100, and an air-operated drive mechanism 300, and is constructed as a normally closed diaphragm valve. ing. In addition, in the first embodiment, the air-operated drive mechanism 300 is also referred to as the drive mechanism 300 hereinafter.

The tubular housing 100 is composed of a lower housing member 100a and an upper housing member 100b.

As shown in FIG. 1, the lower housing member 100a includes a bottom wall 110 and a partition wall 120. The bottom wall 110 is composed of a bottom wall main body 110a, an inflow pipe 110b and an outflow pipe 110c. .

The bottom wall body 110a has a rectangular cross section, and has an upper wall portion 111 as shown in FIG.

Here, the upper wall portion 111 is composed of an inner annular wall portion 111a and an outer annular wall portion 111b. The outer annular wall portion 111b is formed to annularly protrude upward from the inner annular wall portion 111a on the outer peripheral side of the inner annular wall portion 111a.

The bottom wall main body 110a has an annular valve seat portion 111c, and the annular valve seat portion 111c protrudes coaxially and annularly from the central portion of the inner annular wall portion 111a to the partition wall 120 side. is formed in Here, the annular valve seat portion 111c is formed so as to communicate with the inner end opening portion of the inflow passage portion 112 (to be described later).

The bottom wall main body 110a has an inflow passage portion 112 and an outflow passage portion 113, and the inflow passage portion 112 extends from the annular valve seat portion 111c toward the inflow pipe 110b within the bottom wall main body 110a. is formed as The inflow passage portion 112 communicates with the annular valve seat portion 111c at its inner end opening.

On the other hand, the outflow passage portion 113 is formed inside the bottom wall main body 110a so as to extend from a portion of the inner annular wall portion 111a toward the outflow tube 110c. Here, the outflow passage portion 113 is formed in the bottom wall main body 110a so as to open from a part of the inner annular wall portion 111a into the liquid chamber Ra (to be described later) at the inner end opening portion thereof. .

The inflow pipe 110b is formed in the bottom wall main body 110a so as to extend outward from the outer end opening of the inflow passage portion 112, and the inflow pipe 110b flows into the upstream side of the piping system. It plays a role of communicating the path portion 112 . On the other hand, the outflow tube 110c plays a role of communicating the outflow passage portion 113 with the downstream side of the piping system.

The partition 120, as shown in FIG. 1, has a partition body 120a and an annular flange 120b. 111b and sits on the inner annular wall portion 111a via a diaphragm 200a of the diaphragm member 200 and a reinforcing annular body 200b (described later).

Further, the annular flange 120b is formed so as to annularly protrude outward along the radial direction from the axially intermediate portion of the bottom wall main body 110a. is seated coaxially on the outer annular wall portion 111b of the . In this manner, the partition wall 120 is coaxially attached to the bottom wall main body 110a from above via the diaphragm 200a and the reinforcing annular body 200b.

Further, the partition 120 has a communication passage 121, and the communication passage 121 is formed in an L shape as shown in FIG. 1 in the partition main body 120a. Here, the communicating path 121 is open to the outside of the partition 120 at its outer end opening, and the inner end opening of the communicating path 121 is located between the diaphragm 200a and the partition main body 120a. It opens into an air chamber Rb (to be described later) that is formed.

The upper housing member 100b has a rectangular cross section, and is composed of a peripheral wall 130 and an upper wall 140. As shown in FIG. The peripheral wall 130 extends downward from the upper wall 140 in a tubular shape, and a hollow portion 131 of the peripheral wall 130 is formed to have a circular cross section on the inner peripheral surface thereof. In addition, the peripheral wall 130 is coaxially and airtightly fitted to the bulkhead main body 120a of the bulkhead 120 from above through an O-ring 123 at the extended end opening, and is seated on the annular flange 120b. there is

The diaphragm member 200, as shown in FIG. 1, comprises a diaphragm 200a, a reinforcing annular body 200b and an auxiliary shaft 200c. The diaphragm 200a is sandwiched at its outer peripheral portion 210 between the bottom wall body 110a of the bottom wall 110 and the partition wall body 120a of the partition wall 120 via the reinforcing annular body 200b. As a result, the diaphragm 200a forms a liquid chamber Ra and an air chamber between the inner annular wall portion 111a and the partition wall main body 120a on the inner peripheral side of the outer annular wall portion 111b of the upper wall portion 111 of the bottom wall main body 110a. and Rb.

Here, into the liquid chamber Ra, the liquid flowing through the inflow tube 110b and the inflow passage portion 112 of the bottom wall 110 from the upstream side of the piping system of the semiconductor manufacturing apparatus flows through the annular valve seat portion 111c. As a result, the liquid generates a liquid pressure acting on the lower surface 220 of the diaphragm 200a within the liquid chamber Ra. On the other hand, outside air flows into the air chamber Rb through the communication passage 121 of the partition wall 120 . As a result, the outside air generates air pressure (atmospheric pressure) acting on the upper surface 230 of the diaphragm 200a within the air chamber Rb.

The diaphragm 200a is formed as a disc-shaped and film-shaped diaphragm with a predetermined fluororesin.

In the first embodiment, the diaphragm 200a is in contact with high-purity chemicals such as highly corrosive chemicals such as strong acids and strong alkalis due to its structure as a diaphragm valve. It is desirable to have excellent chemical resistance.

In addition, since the elution of metal components and organic components from the diaphragm 200a of the diaphragm valve and other constituent members is not permitted, it is desirable to adopt a fluororesin having low elution at least as the material for forming the diaphragm.

Moreover, since the diaphragm 200a repeats bending displacement each time the diaphragm valve is opened and closed, it is desirable that at least flexibility and longevity are excellent.

Therefore, in the first embodiment, tetrafluoroethylene perfluoroalkyl, which is excellent in chemical resistance, low elution property, heat resistance and corrosion resistance and can ensure flexibility and long life, is used as the above-mentioned predetermined fluororesin. A vinyl ether copolymer (PFA) is employed. In addition, in the first embodiment, PFA is used as a material for forming the cylindrical housing 100 and the partition wall 120 as well.

Further, the diaphragm 200a is made of PFA so as to have a thickness within a predetermined thickness range, for example, 0.5 (mm), as a film-like diaphragm. In the first embodiment, the predetermined thickness range refers to a thickness range of 0.1 (mm) or more and 0.5 (mm) or less.

Here, the reason why the thickness is set to 0.1 (mm) or more is that if the thickness is less than 0.1 (mm), the diaphragm 200a is too thin and easily broken. The reason why the thickness is 0.5 (mm) or less is that if the diaphragm 200a is thicker than 0.5 (mm), it is too thick to bend.

The diaphragm 200a configured as described above functions as a valve body portion (hereinafter also referred to as valve body portion 240) at its central portion 240 facing the annular valve seat portion 111c. This means that the valve body portion 240 constitutes the valve portion of the diaphragm valve together with the annular valve seat portion 111c.

The reinforcing annular body 200b is for reinforcing the film-shaped diaphragm 200a, and the reinforcing annular body 200b is laser-welded from the lower surface 220 side of the diaphragm 200a along the outer peripheral portion 210 of the diaphragm 200a. Thereby, the reinforcing annular body 200b is formed integrally with the outer peripheral portion 210 of the diaphragm 200a.

In the first embodiment, the reinforcing annular body 200b is formed by injection-molding PFA into a columnar shape and then cutting it into an annular shape, as will be described later. Here, the reinforcing annular body 200b has an outer diameter equal to the outer diameter of the diaphragm 200a, and the radial width and thickness of the reinforcing annular body 200b are adjusted to reinforce the film-like diaphragm 200a. It is set to each value suitable for ease of use. This means that the reinforcing annular body 200b has an outer diameter equal to the outer diameter of the diaphragm 200a, and has a radial width and thickness suitable for reinforcing the film-like diaphragm 200a and making it easy to handle. , means that it is formed in an annular shape suitable for reinforcing the film-like diaphragm 200a and making it easy to handle.

The auxiliary shaft 200c is cylindrical, and the lower portion of the auxiliary shaft 200c is laser-welded to the central portion 240 of the diaphragm 200a. Thereby, the auxiliary shaft 200c is formed integrally with the central portion 240 of the diaphragm 200a. Further, the auxiliary shaft 200c has a female threaded hole 260, and the female threaded hole 260 is formed coaxially with the auxiliary shaft 200c from its upper side.

In the first embodiment, the auxiliary shaft 200c is formed by injection-molding PFA into a cylindrical shape, as will be described later. Further, the outer diameter of the auxiliary shaft 200c is set to a value within the range of 1 (mm) or more and 4 (mm) or less.

Here, the reason why the outer diameter of the auxiliary shaft is set to 4 (mm) or less is that if the auxiliary shaft having an outer diameter of 4 (mm) or less is bonded to the central portion of the diaphragm by heat, the central portion of the auxiliary shaft and the diaphragm This is because, although there is a risk of thermal deformation occurring at , if the auxiliary shaft and the central portion of the diaphragm are joined by laser welding, the joining portion between the auxiliary shaft and the central portion of the diaphragm is not deformed. The reason why the outer diameter of the auxiliary shaft is set to 1 (mm) or more is that it is difficult to form an auxiliary shaft having an outer diameter of less than 1 (mm).

In addition, the lower part of the auxiliary shaft 200c is formed so as to be orthogonal to the axis of the auxiliary shaft 200c at the center side lower surface part a, and the outer peripheral side lower surface part b of the lower part of the auxiliary shaft 200c is formed outwardly. It is formed in an arcuate cross-section that is convex toward (see FIG. 3).

The auxiliary shaft 200c configured in this manner is slidably fitted from its upper portion into a through hole portion 122 (see FIG. 1) coaxially formed in the bulkhead main body 120a, and driven as described later. It is connected to the piston shaft 320 of the mechanism 300 within the through hole portion 122 . In this embodiment, the axial length of the auxiliary shaft 200c is shorter than the axial thickness of the bulkhead body 120a.

The diaphragm member 200 configured as described above is formed integrally with the diaphragm 200a, the reinforcing annular body 200b, and the auxiliary shaft 200c. Thus, when the auxiliary shaft 200c is pushed toward the liquid chamber Ra by the piston shaft 320 under the urging force of the coil spring 330 as will be described later, the diaphragm 200 is deformed at its curved displacement portion. The valve body 240 is pushed to the liquid chamber Ra by the valve body 200c and is bent to be seated on the annular valve seat 111c, thereby closing the valve. This means that the diaphragm valve is closed. The curved displacement portion of the diaphragm 200a refers to a film-like portion between the outer peripheral portion and the central portion of the diaphragm 200a.

On the other hand, the auxiliary shaft 200c is interlocked with the piston shaft 320, which slides against the biasing force of the coil spring 330 according to the air pressure in the lower chamber 131a, as will be described later. When the diaphragm 200a slides toward the side chamber 131b, the valve body 240 moves away from the annular valve seat 111c, thereby opening the valve. This means that the diaphragm valve opens.

The drive mechanism 300 is assembled inside the housing 100 as shown in FIG. The drive mechanism 300 is composed of a piston 310 , a piston shaft 320 and a coil spring 330 .

The piston 310 is hermetically slidably fitted in the hollow portion 131 of the peripheral wall 130 of the housing member 100b via an O-ring 311. The hollow portion 131 is divided into an upper chamber 131a and a lower chamber 131b. In the first embodiment, the piston 310 and the piston shaft 320 are made of PFA.

Here, the upper chamber 131a is open to the outside of the housing member 100b through an annular groove portion 141, a communicating passage portion 142 and an opening portion 143 formed in the upper wall 140 of the housing member 100b.

The annular groove 141 is formed in the upper wall 140 coaxially from the inside of the upper chamber 131a in an annular shape. The opening portion 143 is formed inside the outer peripheral portion of the top wall 140 , and the communicating passage portion 142 is formed inside the top wall 140 so as to communicate the annular groove portion 141 with the opening portion 143 .

On the other hand, the lower chamber 131b is connected to a compressed air flow supply source (not shown) through a communicating passage portion 133 and an opening portion 134 formed in the peripheral wall 130. As shown in FIG. As a result, the compressed air flow from the compressed air flow supply source is supplied through the opening portion 134 and the communication passage portion 133 to the inside of the lower chamber 131b.

The opening portion 134 is formed in a part of the peripheral wall 130 below the opening portion 143 so as to communicate with the lower chamber 131b through the communication passage portion 133. As shown in FIG. The communicating passage portion 133 is formed in a part of the peripheral wall 130 so as to communicate the opening portion 134 with the inside of the lower chamber 131b.

Piston shaft 320 is formed to extend coaxially and integrally from piston 310 . As shown in FIG. 1, the piston shaft 320 includes a shaft main body portion 320a and a shaft-like male screw portion 320b. It is slidably fitted in the through hole portion 122 of the bulkhead main body 120a with an O-ring 321 interposed therebetween.

The shaft-like male threaded portion 320b extends coaxially and integrally from the extending end of the shaft body portion 320a, and is fastened in the female threaded hole portion 260 of the auxiliary shaft 200c. It is Thereby, the piston shaft 320a is coaxially connected to the auxiliary shaft 200c so as to be slidable within the through hole portion 122 of the bulkhead main body 120a.

The coil spring 330 is fitted in the annular groove 141 of the upper wall 140 as shown in FIG. 310 is biased toward the lower chamber 131b.

In the drive mechanism 300 configured as described above, when the air pressure due to the compressed air flow from the compressed air supply source is not generated in the lower chamber 131b, the piston 310 is moved by the urging force of the coil spring 330 to move the piston 310 to the lower chamber 131b. 131b side, the piston shaft 320 pushes the auxiliary shaft 200c toward the annular valve seat portion 111c side, thereby moving the diaphragm 200a to the annular valve seat portion at its central portion 240 (valve body portion 240). 111c to be seated.

On the other hand, when the compressed air flow from the compressed air supply source is supplied into the lower chamber 131b through the opening portion 134 and the communication passage portion 133, the piston 310 moves according to the air pressure generated by the compressed air in the lower chamber 131b. The piston shaft 320 slides toward the upper chamber 131a while discharging air from the upper chamber 131a through the annular groove 141, the communication passage 142 and the opening 143 against the biasing force of the coil spring 330. , in conjunction with the sliding direction of the piston 310, the diaphragm 200a is curvedly displaced in the direction away from the annular valve seat portion 111c at the valve body portion, which is the central portion 240, via the auxiliary shaft 200c. Let

Next, a method of laser welding the diaphragm 200a of the diaphragm member 200, the reinforcing annular body 200b, and the auxiliary shaft 200c in manufacturing the diaphragm valve configured as described above will be described.

In laser welding the diaphragm 200a, the reinforcing annular body 200b, and the auxiliary shaft 200c, the diaphragm 200a, the reinforcing annular body 200b, and the auxiliary shaft 200c are each formed as separate separate parts. Since the diaphragm 200a is formed as a single separate part in this manner, it can be formed as a convenient diaphragm that is not subject to limitations in application.

In the first embodiment, the diaphragm 200a is prepared by extrusion molding of PFA. Extrusion molding by the extrusion molding method is performed, for example, as follows.

Pellets of PFA prepared in advance are heated and melted by an extruder. Thereafter, the heat-melted PFA is press-fitted into a film-shaped cavity in a mold and gradually cooled to form a film. A disk shape corresponding to the diaphragm 200a is punched out from the molding thus molded. Thereby, the diaphragm 200a is formed as a film-like diaphragm.

The reason why the extrusion molding method using PFA is adopted in forming the diaphragm 200a as described above is based on the following grounds.

For example, when a diaphragm is formed by cutting a material made of PFA, cutting marks are formed on the surface of the diaphragm. Therefore, when the diaphragm made by such cutting comes into contact with the liquid flowing in the liquid chamber Ra of the diaphragm valve, particles, for example, minute particles of several nanometers in size, are generated due to the cutting traces of the diaphragm. If the dust comes off the diaphragm and gets into the liquid, the liquid cannot be kept clean.

This leads to poor quality of products manufactured by the semiconductor manufacturing apparatus, for example, silicon wafers having a wiring pitch of 10 (nm) or less. For this reason, it is necessary to reliably prevent particles from entering the liquid in the diaphragm valve, for example, even particles with a size of several nanometers from entering the liquid.

In addition, it is difficult to form a diaphragm into a film form by injection molding of PFA, and even if it is possible to form a film form, it is difficult to form a diaphragm with excellent flexibility and a long life. be.

Therefore, in the first embodiment, the diaphragm 200a is formed into a film by extrusion molding. As a result, the film-like diaphragm extruded by the extruder has a very good smooth surface on each surface, that is, a particle of several nanometers in size formed so as to have a smooth surface. It is a diaphragm that can minimize dust generation, and can be formed as a diaphragm that has excellent chemical resistance, low elution, flexibility, and a long life.

The laser welding between the auxiliary shaft 200c and the central portion 240 of the diaphragm 200a is performed as follows. First, in the auxiliary shaft holding step S1 shown in FIG. 2, the auxiliary shaft 200c is held so that the female screw hole 260 opens downward as shown in FIG. At this time, the holding is performed so that the female screw hole portion 260 is positioned vertically with respect to its axis.

After that, in the diaphragm mounting step S2, the diaphragm 200a is mounted on the auxiliary shaft 200c so that the central portion 240 of the diaphragm 200a is positioned on the lower surface of the lower portion of the auxiliary shaft 200c (see FIG. 3). .

Next, in the pressing plate placing step S3, the pressing plate Q is placed on the central portion 240 of the diaphragm 200a so as to coaxially face the auxiliary shaft 200c through the central portion 240 of the diaphragm 200a.

Here, the pressing plate Q is made of glass that easily transmits laser light, and is formed in a disc shape having a predetermined thickness and a predetermined outer diameter. Glass that easily transmits the laser light has high thermal conductivity. In general, the presser plate Q may be any presser member having optical transparency and thermal conductivity. may be

As described above, since the pressing plate Q is made of glass that easily transmits the laser beam, the pressing plate Q hardly absorbs the laser beam. Further, since the above-described glass forming the pressing plate Q has high thermal conductivity, it easily absorbs the heat of the central portion 240 of the diaphragm 200a when placed on the central portion 240 of the diaphragm 200a. In addition, in the first embodiment, the predetermined outer diameter of the pressing plate Q is set larger than the outer diameter of the auxiliary shaft 200c.

Further, the predetermined thickness of the pressing plate Q is selected as follows. With the holding plate Q placed on the central portion 240 of the diaphragm 200a as described above, a laser beam passes through the holding plate Q to the boundary between the central portion 240 of the diaphragm 200a and the auxiliary shaft 200c as described later. When the laser beam is converged near the plane, the laser beam passes through the pressing plate Q, and the pressing plate Q absorbs the heat generated in the central portion 240 of the diaphragm 200a due to the laser beam. It is selected so as to satisfactorily suppress the temperature rise of the central portion 240 of the diaphragm 220 .

After the presser plate Q is placed on the central portion 240 of the diaphragm 200a as described above, in the next presser plate pressing step S4, the presser plate Q is pressed from above by a suitable press (not shown). 3, is pressed toward the central portion 240 of the diaphragm 200a. At this time, the lower surface of the pressing plate Q is pressed with a uniform pressing force over the entire upper surface of the central portion 240 of the diaphragm 200a.

In the next laser beam irradiation step S5, the pressing plate Q is irradiated with a laser beam from the laser device L (see FIG. 3) in the following manner while the pressing plate Q is kept in this pressing state.

Regarding the irradiation, the configuration of the laser device L will be described. The laser device L is configured to emit a laser beam from its emitting portion. Here, the laser device is configured to converge the laser light from its emitting portion onto a focal point separated from the lens system by a predetermined focal length by a lens system (not shown). Further, the laser device L is configured to be able to adjust the emission intensity of the laser light from the emission portion.

Therefore, when irradiating the pressing plate Q with laser light from the laser device L, the laser device L is arranged to face the outer peripheral portion of the central portion 240 of the diaphragm 200a. is maintained just above the perimeter of the central portion 240 of the . In the first embodiment, the convergence point of the laser beam of the laser device L, that is, the focal point of the lens system is the boundary portion ( It corresponds to the vicinity of the site F (hereinafter also referred to as the irradiation site F) on the boundary between the central part and the auxiliary axis (see FIG. 3).

Here, the laser device L rotates around the axis of the presser plate Q while converging the laser beam along the circumference including the vicinity of the irradiation site F at the boundary between the central portion and the auxiliary shaft. It's like

At this time, the height of the central portion 240 of the diaphragm 200a of the laser device L with respect to the outer peripheral portion is such that the focal point of the lens system of the laser device L coincides with the vicinity of the irradiated portion F of the boundary between the central portion and the auxiliary axis. is aligned.

Furthermore, the portion including the central side lower surface portion a of the central portion 240 of the diaphragm 200a and the lower portion of the auxiliary shaft 200c is a circumferential area ( The intensity of the laser beam emitted from the laser device L is adjusted so that the laser beam can be melted in the melting region).

Here, since the melting point of PFA is about 320 (° C.), the laser device L, with its emission intensity, sets the heating temperature for the vicinity of the irradiated portion F of the boundary between the central portion and the auxiliary shaft to the melting point of PFA. It is set to be slightly higher than

However, considering that the presser plate Q absorbs heat from the outer peripheral edge of the central portion of the diaphragm 200a due to its high thermal conductivity, Even if the heating temperature exceeds the melting point of PFA, the vicinity of the irradiation site F is kept within a predetermined area so that the molten region centered on the vicinity of the irradiation site F at the boundary between the central part and the auxiliary shaft is within a predetermined area. is set as a predetermined emission intensity.

In other words, in the laser device L, the irradiation intensity of the laser beam irradiated along the melted region including the vicinity of the irradiated portion F of the boundary between the central portion and the auxiliary shaft uniformly becomes the predetermined irradiation intensity. is set to For example, when the central portion 240 of the diaphragm 200a is placed on the auxiliary shaft 200c, the above-described predetermined region does not include at least the upper surface portion of the central portion 240 of the diaphragm 200a and the lower portion of the auxiliary shaft 200c. A region that does not include a portion other than the portion including the central lower surface portion a.

When the laser device L emits a laser beam as shown in FIG. 3, the laser beam is emitted from the outer peripheral edge of the presser plate Q and the diaphragm 200a as shown in FIG. The light is transmitted through the outer peripheral edge of the central portion 240 in each thickness direction and converges in the vicinity of the irradiated portion F at the boundary portion between the central portion and the auxiliary shaft, which is sequentially displaced in the circumferential direction.

Therefore, while maintaining such laser light irradiation, under the setting of the laser light emission intensity of the laser device L as described above, the central lower surface of the central portion 240 of the diaphragm 200a and the lower surface of the auxiliary shaft 200c The portion including the portion a is sequentially heated by the laser light locally around the vicinity of the irradiation portion F along the circumferential direction of the boundary portion between the central portion and the auxiliary shaft according to the moving position of the laser device L. . Along with this, the outer peripheral edge of the central portion 240 of the diaphragm 200a and the corresponding portion of the auxiliary shaft 200c are shifted along the circumferential direction, centering on the vicinity of the irradiated portion F at the boundary between the central portion and the auxiliary shaft. They are melted locally and sequentially.

In the first embodiment, in the local heating as described above, the heating temperature of the central portion 240 of the diaphragm 200a is increased by the lower surface (auxiliary shaft 200c side surface) toward the opposite side surface, and in the auxiliary shaft 200c, the diaphragm 200a sequentially descends from the central portion 240 side toward the opposite direction to the upper surface of the central portion 240. Therefore, the auxiliary shaft 200c and the central portion 240 of the diaphragm 200a are melted together within the predetermined region described above.

While maintaining such laser light irradiation, the laser device L rotates so as to sequentially converge the laser light along the circumference including the vicinity of the irradiation site F at the boundary between the central portion and the auxiliary shaft. continue.

As a result, the portion of the lower portion of the auxiliary shaft 200c that includes the central lower surface portion a and the central portion 240 of the diaphragm 200a are centered on the melted region including the vicinity of the irradiated portion F at the boundary between the central portion and the auxiliary shaft. The predetermined area is heated by the laser beam and uniformly melted and welded together. After that, by stopping the emission of the laser beam from the laser device L, the part including the central lower surface part a of the lower part of the auxiliary shaft 200c and the central part 240 of the diaphragm 200a are hardened through natural cooling.

Here, as described above, the predetermined region is at least the upper surface portion of the central portion 240 of the diaphragm 200a when placed on a portion including the central lower surface portion a of the lower portion of the auxiliary shaft 200c of the central portion 240 of the diaphragm 200a. and the lower portion of the auxiliary shaft 200c that does not include a portion other than the portion including the center-side lower surface portion a. In the state where the diaphragm 200a is placed on the plate Q, the central portion 240 of the diaphragm 200a does not melt up to the joint surface with the pressing plate Q, and the portion including the central side lower surface portion a of the lower portion of the auxiliary shaft 200c does not melt. The auxiliary shaft 200c is not melted to parts other than the above. Therefore, the auxiliary shaft 200c and the diaphragm 200a can be welded together while maintaining their original shape.

Thereafter, in the pressing plate removing step S6 of FIG. 2, the pressing plate Q is removed from the central portion 240 of the diaphragm 200a. As a result, the auxiliary shaft 200c and the central portion 240 of the diaphragm 200a are mutually welded and hardened, and the auxiliary shaft 200c and the central portion of the diaphragm 200a are integrally joined by laser welding to form a connection structure.

According to the above, the auxiliary shaft 200c and the central portion of the diaphragm 200a can be satisfactorily connected while ensuring the convenience before the laser welding of the diaphragm 200a as an independent component. Accordingly, the inside of the liquid chamber Ra is well sealed under the integral structure of the outer peripheral portion 210, the central portion 240, and the curved displacement portion between the outer peripheral portion 210 and the central portion 240 of the diaphragm 200a. can be secured.

Laser welding of the outer peripheral portion 210 of the diaphragm 200a and the reinforcing annular body 200b is performed as follows.

After the integral connection structure is formed by laser welding the auxiliary shaft 200c and the central portion of the diaphragm 200a as described above, in the reinforcing annular body holding step S1a shown in FIG. It is held horizontally on its upper surface (see FIG. 5).

Thereafter, in the diaphragm mounting step S2a, the diaphragm 200a is mounted on the reinforcing annular body 200b so that the outer peripheral portion 210 of the diaphragm 200a is positioned on the reinforcing annular body 200b (see FIG. 5). .

Next, in the step S3a of placing the annular pressing plate, the annular pressing plate Q1 is placed on the outer peripheral portion 210 of the diaphragm 200a so as to coaxially face the reinforcing annular body 200b through the outer peripheral portion 210 of the diaphragm 200a. (See FIG. 5).

Here, the annular presser plate Q1 is made of the same material as that of the presser plate Q and is formed in an annular shape having a predetermined thickness and a predetermined outer and inner diameter. Therefore, the annular presser plate Q1 has the same properties as the presser plate Q, that is, it has light transmittance and high thermal conductivity.

Therefore, the annular presser plate Q1 hardly absorbs the laser beam due to its light transmissivity. Also, due to its high thermal conductivity, the annular pressing plate Q1 easily absorbs heat from the outer peripheral portion 210 of the diaphragm 200a when placed on the outer peripheral portion 210 of the diaphragm 200a.

The predetermined thickness of the annular presser plate Q1 is obtained by applying a laser beam to the annular presser plate Q1 in a state where the annular presser plate Q1 is placed on the outer peripheral portion 210 of the diaphragm 200a as described above. When the laser beam converges near the boundary surface between the outer peripheral portion 210 of the diaphragm 200a and the reinforcing annular body 200b through the laser beam, the laser beam passes through the annular pressing plate Q1 satisfactorily, and the annular pressing plate Q1 is caused by the laser beam. The heat generated in the outer peripheral portion 210 of the diaphragm 200a is thereby absorbed, and the temperature rise of the outer peripheral portion 210 of the diaphragm 220 is suppressed satisfactorily. Further, the predetermined outer diameter of the annular pressing plate Q1 is selected to be larger than the outer diameter of the reinforcing annular body 200b, and the predetermined inner diameter of the annular pressing plate Q1 is selected to be smaller than the inner diameter of the reinforcing annular body 200b.

After the annular presser plate Q1 is placed on the outer peripheral portion 210 of the diaphragm 200a as described above, in the next pressing step S4a for the annular presser plate, the annular presser plate Q1 is pressed from above by an appropriate press ( (not shown) is pressed toward the outer peripheral portion 210 of the diaphragm 200a as indicated by the arrow P1 in FIG. At this time, the lower surface of the annular pressing plate Q1 presses the entire upper surface of the outer peripheral portion 210 of the diaphragm 200a with a uniform pressing force.

In the following laser light irradiation step S5a, while the pressing state is maintained, laser light is emitted from the laser device L (see FIG. 6) to the annular pressing plate Q1 in the following manner. .

When the laser device L irradiates the annular holding plate Q1 with a laser beam, the laser device L is positioned at the outer peripheral portion 20 of the diaphragm 200a so that the emission portion thereof faces the outer peripheral portion 210 of the diaphragm 200a. maintained upright. In the first embodiment, the convergence point of the laser beam of the laser device L, that is, the focal point of the lens system is the boundary portion between the outer peripheral portion 210 of the diaphragm 200a and the reinforcing annular body 200b (hereinafter referred to as the outer peripheral portion). - corresponds to the vicinity of the site F1 (hereinafter also referred to as the irradiation site F1) on the boundary between the reinforcing annular bodies (see FIG. 5).

Here, the laser device L converges the laser light along the circumference including the vicinity of the irradiation site F1 at the boundary between the outer peripheral portion and the reinforcing annular body, and rotates around the axis of the annular pressing plate Q1. It is designed to rotate to

At this time, the height of the diaphragm 200a of the laser device L with respect to the outer peripheral portion 210 is adjusted so that the focal point of the lens system of the laser device L coincides with the vicinity of the irradiated portion F1 of the boundary portion between the outer peripheral portion and the reinforcing annular body. Aligned.

Furthermore, the laser device L is arranged so that the upper surface side portion of the outer peripheral portion 210 of the diaphragm 200a and the reinforcing annular body 200b can be melted around the vicinity of the irradiation portion F1 at the boundary between the outer peripheral portion and the reinforcing annular body. The output intensity of laser light from is adjusted.

Specifically, the laser device L uses its emission intensity so that the heating temperature of the vicinity of the irradiated portion F1 of the boundary between the outer peripheral portion and the reinforcing annular body is slightly higher than the melting point of PFA. is set.

However, considering that the annular holding plate Q1 absorbs the heat of the outer peripheral portion 210 of the diaphragm 200a due to its high thermal conductivity, the vicinity of the irradiation site F1 at the boundary between the outer peripheral portion and the reinforcing annular body Even if the heating temperature rises above the melting point of PFA, the molten region centered around the irradiation site F1 at the boundary between the outer peripheral portion and the reinforcing annular body is the same as the pressing plate Q. The emission intensity of the laser light to the vicinity of the irradiation site F1 is set as a predetermined emission intensity so as to fall within the region.

When the laser device L emits laser light as it rotates, the laser light travels through the annular pressing plate Q1 and the outer peripheral portion 210 of the diaphragm 200a in the respective thickness directions, as shown in FIG. It is transmitted and converges in the vicinity of the irradiation site F1 at the boundary between the outer peripheral portion and the reinforcing annular body, which is sequentially displaced.

Therefore, while maintaining such laser light irradiation, under the setting of the laser light emission intensity of the laser device L as described above, the outer peripheral portion 210 of the diaphragm 200a and the upper surface side portion of the reinforcing annular body 200b are , along the circumferential direction of the boundary between the outer peripheral portion and the reinforcing ring-like body, the laser light sequentially heats the vicinity of the irradiated portion F1 locally according to the moving position of the laser device L. As shown in FIG. Along with this, the outer peripheral part 210 of the diaphragm 200a and the upper surface side part of the reinforcing annular body 200b are localized along the circumferential direction around the vicinity of the irradiation site F1 at the boundary between the outer peripheral part and the reinforcing annular body. sequentially melted.

In the first embodiment, in the local heating as described above, the heating temperature of the outer peripheral portion 210 of the diaphragm 200a is increased at the lower surface (reinforcement) of the outer peripheral portion 210 of the diaphragm 200a under the heat absorption effect of the annular pressing plate Q1. In the reinforcing annular body 200b, from the side of the outer peripheral portion 210 of the diaphragm 200a to the opposite direction to the upper surface of the outer peripheral portion 210. gradually decrease. Therefore, the reinforcing annular body 200b and the outer peripheral portion 210 of the diaphragm 200a are melted together within the predetermined region described above.

While maintaining such laser light irradiation, the laser device L directs the laser light along the circumferential region (melting region) including the vicinity of the irradiation site F1 at the boundary between the outer peripheral portion and the reinforcing annular body. It rotates so that it converges sequentially.

As a result, the upper surface side portion of the reinforcing ring-shaped body 200b and the outer peripheral portion 210 of the diaphragm 200a are formed in the above-described predetermined circumferential region centered on the vicinity of the irradiation site F1 at the boundary between the outer peripheral portion and the reinforcing ring-shaped body. The area is heated by the laser light and uniformly melted and welded together. After that, by stopping the emission of the laser light from the laser device L, the upper surface side portion of the reinforcing annular body 200b and the outer peripheral portion 210 of the diaphragm 200a are naturally cooled and hardened. Therefore, the reinforcing annular body 200b and the diaphragm 200a can be welded together while maintaining their original shape.

Thereafter, in the annular presser plate removing step S6a of FIG. 4, the annular presser plate Q1 is removed from the outer peripheral portion 210 of the diaphragm 200a. As a result, the reinforcing annular body 200b and the outer peripheral portion 210 of the diaphragm 200a are welded and hardened to each other, and an integral joint structure is formed by laser welding the reinforcing annular body 200b and the outer peripheral portion of the diaphragm 200a. be. Along with this, a good seal can be ensured between the reinforcing annular body 200b and the outer peripheral portion 210 of the diaphragm 200a.

As described above, the diaphragm member 200 is integrally formed with the diaphragm 200a, the reinforcing annular body 200b, and the holding shaft 200c. The auxiliary shaft 200c of the diaphragm member 200a configured in this manner is formed as a separate component from the piston shaft 320 of the drive mechanism 300. As shown in FIG. Therefore, according to the diaphragm member 200, it is possible to easily assemble components such as the partition wall 120 between the driving mechanism 300 and the diaphragm 200a in the housing 100. The member 200 can ensure the convenience that it can be used in diaphragm valves having various specifications.

After the diaphragm member 200 is formed as described above, the diaphragm member 200 holds the auxiliary shaft 200c upward, and the upper wall portion 111 of the bottom wall 110 prepared in advance is held by the diaphragm 200a. It is fitted inside the outer annular wall portion 111b and is seated on the inner annular wall portion 111a via the reinforcing annular body 200b.

At this time, since the reinforcing annular body 200b is laser-welded to the outer peripheral portion of the diaphragm 200a, the reinforcing annular body 200b is attached to the inner annular wall portion 111b of the upper wall portion 111 of the bottom wall 110 inside the outer annular wall portion 111b. By seating on the portion 111a, the diaphragm 200a can be seated on the inner annular wall portion 111a via the reinforcing annular body 200b.

In other words, even if the diaphragm 200a is thin and difficult to handle, the outer peripheral portion 210 of the diaphragm 200a and the reinforcing annular body 200b are laser-welded along the lower surface of the diaphragm 200a as described above. The body 200b exerts a reinforcing function on the diaphragm 200a, so that the diaphragm 200a can be easily fitted inside the outer annular wall portion 111b of the upper wall portion 111 and mounted on the inner annular wall portion 111a together with the reinforcing annular body 200b. Good seating.

Next, as shown in FIG. 1, the partition wall 120 faces the inner annular wall portion 111a via the diaphragm 200a at the partition body 120a so that the inner end opening of the communication passage 121 faces the diaphragm 200a. It is fitted inside the outer annular wall portion 111b as shown in FIG. As a result, when the outer peripheral portion 210 of the diaphragm 200 is laser-welded to the reinforcing ring-shaped member 200b, the outer peripheral portion 210 of the diaphragm 200a is welded to the outer circumference of the inner ring-shaped wall portion 111a and the bulkhead main body 120a via the reinforcing ring-shaped member 200b. As described above, the inside of the liquid chamber Ra can be satisfactorily sealed. As described above, when the partition wall 120 is assembled to the upper wall 110, the partition wall 120 is coaxially fitted to the auxiliary shaft 200c at the through hole portion 122 thereof.

Next, the piston shaft 320 is coaxially fastened in the female threaded hole 260 of the auxiliary shaft 200c while being fitted in the through hole 122 of the partition wall 120 via the O-ring 321 at the male threaded portion 320b of the piston shaft 320. be. At this time, as described above, the center portion 240 of the diaphragm 200a and the extended end portion of the auxiliary shaft 200c are laser welded. Therefore, although the film-like diaphragm 200a described above is very thin, because the diaphragm 200a is laser-welded to the auxiliary shaft 200c at its central portion 240, the diaphragm 200a is connected to the piston shaft 320 at its central portion. By screwing the shaft-shaped male threaded portion 320b of the piston shaft 320 into the female threaded hole portion 260 of the auxiliary shaft 200c, the piston shaft 320, the diaphragm 200a and the auxiliary shaft 200c can be connected without a connecting portion required for can be easily done.

After that, the upper housing member 100b accommodates the piston 310 in the hollow portion 131 of the peripheral wall 130 via the O-ring 131 with the coil spring 330 prepared in advance fitted in the annular groove portion 141. At the opening, it is fitted into the bulkhead body 120a and sits on the annular flange portion 120b. This completes the manufacture and assembly of the diaphragm valve.

In the first embodiment configured as described above, it is assumed that the air-operated diaphragm valve is closed when the semiconductor device is manufactured by the semiconductor manufacturing apparatus.

At this time, in the air-operated diaphragm valve, the piston 310 slides downward within the upper housing member 110b due to the biasing force of the coil spring 330. As shown in FIG.

Accordingly, the piston shaft 320 causes the diaphragm 200a to be seated on the annular valve seat portion 111c at the valve body portion 240, which is the central portion 240 thereof, via the auxiliary shaft 200c. In such a closed state of the diaphragm valve, when a compressed air flow is supplied from the compressed air flow supply source through the opening 134 and the communication passage 133 of the upper housing member 100b into the lower chamber 131b, the piston 310 slides upward in the hollow portion 131 of the upper housing member 100b together with the piston shaft 320 against the biasing force of the coil spring 330 based on the pressure of the compressed air flow in the lower chamber 131b.

Along with this, the auxiliary shaft 200c interlocks with the piston shaft 320, and the diaphragm 200a is pulled by the auxiliary shaft 200c at its central portion 240, and is curved toward the air chamber Rb. Accordingly, the diaphragm 200a moves away from the annular valve seat portion 111c at its central portion 240. As shown in FIG. This opens the diaphragm valve.

In this state, when the liquid is supplied from the liquid supply source to the upstream portion of the piping system, the liquid flows into the liquid chamber Ra through the inflow tube 110b, the communication passage portion 112, and the annular valve seat portion 111c. influx. The liquid flowing into the liquid chamber Ra in this manner passes through the communication passage portion 113 and the outflow tube 110c and flows out into the downstream portion of the piping system.

In such a liquid flow process, the liquid flowing into the liquid chamber Ra as described above bends and displaces the diaphragm 200a toward the air chamber Rb side or the liquid chamber Ra according to the fluctuation of the liquid pressure. The liquid flows from the liquid chamber Ra into the outflow pipe 110c through the communicating passage portion 113. As shown in FIG.

Here, the diaphragm 200a is a film-like diaphragm formed by extrusion molding of PFA, as described above. Therefore, both surfaces of the diaphragm 200a are excellent smooth surfaces.

Therefore, even if the diaphragm valve is in an operating state, particles such as those caused by cutting marks will not, of course, be separated from the diaphragm 200a and mixed into the liquid due to the contact of the diaphragm 200a with the liquid. In other words, it is possible to minimize (minimize) even the contamination of minute particles of several nanometers in size into the liquid. Also, this holds true even if the central portion 240 of the diaphragm 200a is seated on the annular valve seat portion 111c or separated from the annular valve seat 111c in the operating state of the diaphragm valve.

As described above, the liquid flowing into the liquid chamber Ra is kept substantially clean by minimizing the contamination of even minute particles of several nanometers in size. It flows out into the downstream portion of the piping system through the outflow tube 110c.

Therefore, even if the liquid that has flowed out into the downstream portion of the piping system flows along the surface of a semiconductor wafer having a wiring pitch of 10 (nm) or less, for example, particles of several nanometers are generated in the manufacture of semiconductor devices. It does not adhere to the surface of the semiconductor wafer and cause short circuits between wirings or other abnormalities. As a result, the quality of the manufactured semiconductor device can be favorably maintained.

In addition, since the film-shaped diaphragm 200a is formed by extrusion molding using PFA, as described above, it is possible to suppress the generation of particles of several nanometers in size to a minimum, and at the same time, it has excellent flexibility and maintains a long service life. It can be formed as a flexible diaphragm. Therefore, even if a diaphragm valve having such a diaphragm 200a is applied to a semiconductor manufacturing apparatus, the diaphragm 200a maintains a favorable bending operation for a long period of time. As a valve, it can maintain good function over a long period of time.
(Second embodiment)
FIG. 6 shows the main part of the second embodiment of the invention. In the second embodiment, the air-operated diaphragm valve includes a diaphragm member obtained by laser-welding a reinforcing annular body 200b to the outer peripheral portion 210 of the diaphragm 200a from the upper surface side, as the diaphragm described in the first embodiment. It is adopted instead of the member 200 . Note that the diaphragm member referred to in the second embodiment is also denoted by reference numeral 200 as in the first embodiment.

The diaphragm member 200 is composed of a diaphragm 200a, a reinforcing annular body 200b and an auxiliary shaft 200c, as in the first embodiment. Also in the second embodiment, the auxiliary shaft 200c is laser-welded to the central portion 240 of the diaphragm 200a as in the first embodiment. Further, unlike the first embodiment, the reinforcing annular body 200b is laser-welded to the outer peripheral portion 210 of the diaphragm 200a from the upper surface 230 side.

Here, as in the first embodiment, laser welding of the auxiliary shaft 200c and the outer peripheral portion 210 of the diaphragm 200a formed by laser welding to the reinforcing annular body 200b is performed as follows.

In the holding step S1a of the reinforcing annular body in FIG. 4, the reinforcing annular body 200b is held horizontally on its upper surface (see FIG. 7). Then, in the next diaphragm mounting step S2a, the diaphragm 200a is mounted on the upper surface 230 of the diaphragm 200a on the reinforcing annular body 200b from above, unlike the first embodiment. At this time, the placement is such that the outer peripheral portion 210 of the diaphragm 200a coaxially corresponds to the reinforcing annular body 200b.

After that, the steps S3a for placing the annular presser plate, the step S5a for irradiating the laser beam, and the step S6a for removing the annular presser plate are performed in the same manner as in the first embodiment. As a result, the reinforcing annular body 200b and the outer peripheral portion 210 of the diaphragm 200a are welded and hardened to each other, and an integral joint structure is formed by laser welding the reinforcing annular body 200b and the outer peripheral portion of the diaphragm 200a. be.

As a result, with respect to laser welding between the reinforcing annular body 200b and the outer peripheral portion of the diaphragm 200a, the same effects as described in the first embodiment can be obtained while ensuring the convenience of the diaphragm 200a. can also be achieved in the diaphragm member 200 of

After forming the diaphragm member 200 according to the second embodiment as described above, the diaphragm member 200 is assembled to the lower housing member 100a in the following manner.

Here, in the bottom wall main body 110a of the lower housing member 100a described in the first embodiment, the upper wall portion 111 includes both the inner annular wall portion 111a and the outer annular wall portion 111b, as well as the inner annular wall portion 111a and the outer annular wall portion 111b. It is formed to have an intermediate wall portion 111d between the portion 111a and the outer annular wall portion 111b.

The middle wall portion 111d is formed on the outer peripheral portion of the inner annular wall portion 111a, and the middle wall portion 111d protrudes higher than the inner annular wall portion 111a. As a result, the bottom wall body 111 is formed so that the upper wall portion 111 of the bottom wall body 111 protrudes upward in a stepwise manner over the inner annular wall portion 111a, the intermediate wall portion 111d, and the outer annular wall portion 111b.

Thus, in the second embodiment, in the diaphragm member 200 configured as described above, the diaphragm 200a is fitted in the outer wall portion 211a with the reinforcing annular body 200b positioned on the upper side. Then, the outer peripheral portion 210 is seated on the middle wall portion 111d. Along with this, the reinforcing annular body 200b is fitted into the outer annular wall portion 111b from the upper side of the diaphragm 200a.

Next, as shown in FIG. 6, the partition wall 120 faces the diaphragm 200a at the inner end opening of the communicating passage 121 via the reinforcing annular member 200b, and the outer annular wall portion is formed at the partition main body 120a. 111b and is seated on the reinforcing annular body 200b, and is assembled to the bottom wall 110 so as to be seated on the outer annular wall portion 111b at the annular flange portion 120b. At this time, the auxiliary shaft 200c is coaxially and slidably fitted in the through hole portion 122 of the partition wall 120 .

As described above, unlike the first embodiment, the diaphragm member 200 has a structure in which the reinforcing annular body 200b is laser-welded to the outer peripheral portion 210 of the diaphragm 200a from the upper surface side. , is formed as a separate part from the piston shaft 320 of the drive mechanism 300 . Therefore, according to the diaphragm member 200 in the second embodiment as well, it is of course possible to easily assemble components such as the partition wall 120 between the driving mechanism 300 and the diaphragm 200a in the housing 100. , the convenience that the diaphragm member 200 can be used in diaphragm valves having various specifications can be ensured.

Next, the piston shaft 320 is coaxially fastened in the female threaded hole 260 of the auxiliary shaft 200c while being fitted in the through hole 122 of the partition wall 120 via the O-ring 321 at the male threaded portion 320b of the piston shaft 320. be. In this way, as described in the first embodiment, even if the diaphragm 200a does not have a connecting portion required for connecting with the piston shaft 320 at its central portion, the inner threaded hole portion 260 of the auxiliary shaft 200c can be The diaphragm 200a and the piston shaft 320 can be easily connected by fastening the shaft-like male threaded portion 320b of the piston shaft 320 to the shaft. Other configurations and effects are the same as those of the first embodiment.
(Third Embodiment)
FIG. 8 shows a third embodiment of a diaphragm valve to which the present invention is applied. In the third embodiment, an electromagnetically operated diaphragm valve is employed as the diaphragm valve, unlike the air operated diaphragm valve described in the first embodiment.

As shown in FIG. 8, the electromagnetically actuated diaphragm valve includes a cylindrical housing, the diaphragm member 200 described in the first embodiment, and an electromagnetically actuated drive mechanism 400, and is a normally closed electromagnetic valve. It is configured as an actuated solenoid valve. In addition, in the third embodiment, the cylindrical housing is denoted by reference numeral 100 as in the first embodiment. Further, the electromagnetically actuated drive mechanism 400 is hereinafter also referred to as the drive mechanism 400 .

The tubular housing 100 according to the third embodiment is composed of a lower housing member 100c and an upper housing member 100d. As shown in FIG. 8, the lower housing member 100c is composed of the bottom wall 110 and the partition wall 150 described in the first embodiment.

As shown in FIG. 8, the partition 150 has a partition main body 150a and an annular flange portion 150b. It is fitted within the portion 111b and rests on the inner annular wall portion 111a via the diaphragm 200a of the diaphragm member 200 and the reinforcing annular body 200b.

Further, the annular flange 150b is formed so as to annularly protrude outward along the radial direction from a portion of the outer peripheral portion of the partition wall body 150a excluding the lower portion. It sits coaxially on the outer annular wall portion 111b of the upper wall portion 111 of the. In this manner, the partition wall 150 is coaxially attached to the bottom wall main body 110a from above via the diaphragm 200a and the reinforcing annular body 200b.

The upper housing member 100d, like the upper housing member 100b described in the first embodiment, has a rectangular cross section. It is integrally formed of a magnetic material (for example, iron).

The peripheral wall 170 extends downward from the upper wall 180 in a cylindrical shape. is coaxially mounted on the

The guide member 160 serves to guide the plunger 400b (described later) in its axial direction, and the guide member 160 is integrally formed with a cylindrical portion 160a and an annular flange portion 160b. . The annular flange portion 160b extends radially from the lower end of the cylindrical portion 160a parallel to the upper wall 180 so as to position the circular head portion 160a coaxially within the peripheral wall 170. The annular flange portion 160b is fixed at its outer peripheral portion in the extension end opening of the peripheral wall 170 by caulking. The cylindrical portion 160a coaxially extends into the peripheral wall 170 from the inner peripheral portion of the annular flange portion 160b.

The diaphragm member 200 has a configuration similar to that of the diaphragm member described in the first embodiment. 111 is fitted on the inner peripheral side of the outer annular wall portion 111b.

Along with this, the diaphragm 200a is seated on the inner annular wall portion 111a of the upper wall portion 111 via the reinforcing annular body 200b, and the diaphragm 200a is positioned on the inner peripheral side of the outer annular wall portion 111b. The space between the wall portion 111a and the partition main body 150a is divided into the liquid chamber Ra and the air chamber Rb described in the first embodiment.

The auxiliary shaft 200c is slidably fitted in a through-hole 151 coaxially formed in the central portion of the bulkhead main body 150a. The interior of the air chamber Rb may be open to the outside through the partition wall 150, and the air chamber Rb may be opened to the outside through the partition wall main body 150a through the through hole 151 and the auxiliary shaft 200c. may be communicated with.

The driving mechanism 400 includes a coil member 400a, a plunger 400b, a coil spring 400c and a cylindrical stopper member 400d. The coil member 400a is coaxially fitted within the peripheral wall 170 of the upper housing member 100d. The coil member 400 a has a tubular bobbin 410 and a solenoid 420 . The tubular bobbin 410 is composed of a tubular portion 411 and upper and lower annular wall portions 412 and 413 radially extending outward from both axial end portions of the tubular portion 411 . The solenoid 420 is wound around the tubular portion 411 between the upper and lower annular wall portions 412 and 413 .

The coil member 400a configured in this way is accommodated in the peripheral wall 170 so that the cylindrical portion 411 of the cylindrical bobbin 410 is fitted to the cylindrical portion 160a of the guide member 160 and the cylindrical stopper member 400d. ing. The upper terminal of the solenoid 420 is connected to the feeder line H of the power source (not shown) through the upper annular wall portion 412 of the cylindrical bobbin 410 .

Thus, in the coil member 400a configured as described above, when the solenoid 420 receives power from the power supply through the power supply line H and is excited, the solenoid 420 generates a magnetic attraction force. Also, the solenoid 420 is de-energized and stops generating the magnetic attraction force when the power source is cut off.

The plunger 400b is made of a magnetic material, and is composed of a cylindrical plunger main body 430 and a male screw shaft 440. The plunger main body 430 is a cylindrical portion of the guide member 160. It is coaxially slidably fitted in 160a. The male threaded shaft portion 440 coaxially extends downward from the lower end portion of the plunger main body portion 430, and is fastened in the female threaded hole portion 260 of the auxiliary shaft 200c.

The coil spring 400c is inserted into an insertion hole 431 formed coaxially from the upper end of the plunger body 430 of the plunger 400b. The stopper member 400d is coaxially fixed to the central portion of the upper wall 180 of the upper housing member 100d, and includes the cylindrical portion 160a of the guide member 160, the plunger body portion 430 of the plunger 400b, and the coil spring 400c. extending towards.

As a result, the coil spring 400c is sandwiched between the center of the extension end of the stopper member 400d and the bottom of the insertion hole 431 of the plunger main body 430, and the plunger 400b is attached toward the auxiliary shaft 200c. force.

Thus, in the drive mechanism 400, when the solenoid 420 generates a magnetic attraction force, the plunger 400b moves toward the stopper member 400d based on the magnetic attraction force against the urging force of the coil spring 400c. It is attracted and slides along the cylindrical portion 160a of the guide member 160 toward the extended end portion of the stopper member 400d, and the externally threaded shaft portion 440 moves the diaphragm 200a away from the annular valve seat portion 111c via the auxiliary shaft 200c. Displace in a curved shape.

On the other hand, when the magnetic attraction force of the solenoid 420 stops being generated, the plunger 400b slides toward the partition wall 150 under the biasing force of the coil spring 400c, and the male screw shaft portion 440 engages the auxiliary shaft 200c. The diaphragm 200a is curvedly displaced so as to be seated on the annular valve seat portion 111c. Other configurations are the same as those of the first embodiment.

In the third embodiment constructed as described above, an electromagnetically operated diaphragm valve is adopted as a diaphragm valve instead of the air operated diaphragm valve described in the first embodiment.

According to this, the electromagnetically actuated diaphragm valve referred to in the third embodiment has an upper housing different from the upper housing member 100b and the air actuated drive mechanism 300 of the air-actuated diaphragm valve described in the first embodiment. By having the member 100d and the electromagnetically actuated drive mechanism 400, the shaft-shaped male threaded portion 440 of the plunger 400b is fastened to the female threaded hole portion 260 of the auxiliary shaft 200c, but the diaphragm member 200 and the lower housing member 100a are , is substantially the same as the first embodiment except that the partition walls have a slightly different configuration.

Therefore, in the third embodiment as well, since the central portion 240 of the diaphragm 200a is already laser-welded to the auxiliary shaft 200c as described above, the shaft-like male screw portion 440 of the plunger 400b is connected to the female screw hole portion 260 of the auxiliary shaft 200c. The plunger 400b, the diaphragm 200a and the auxiliary shaft 200c can be easily connected by tightening them.

Further, in the third embodiment, when the electromagnetically actuated diaphragm valve is interposed in the piping system of the semiconductor manufacturing apparatus instead of the air-actuated diaphragm valve described in the first embodiment, the diaphragm member Although the operation of the diaphragm 200a and the auxiliary shaft 200c of 200 is performed by the operation of the plunger 400b by the magnetic attraction force in the third embodiment, not by the operation of the piston 310 by the compressed air in the first embodiment. , the opening and closing operation as a diaphragm valve and the configuration of the diaphragm member 200 are the same as those of the first embodiment, and effects similar to those of the first embodiment can be achieved.
(Fourth embodiment)
FIG. 9 shows a fourth embodiment of the invention. In the fourth embodiment, the electromagnetically actuated diaphragm valve employs the diaphragm member 200 (see FIGS. 6 and 7) and the lower housing member 100a described in the second embodiment, and the second embodiment. In place of the upper housing member 100b and the air-operated drive mechanism 300 described above, the upper housing member 100d and the electromagnetically-operated drive mechanism 400 described in the third embodiment are employed.

Here, the auxiliary shaft 200c is slidably fitted in the through hole portion 151 of the partition wall 150 through the reinforcing annular body 200b. is tightened. In addition, in the fourth embodiment, the auxiliary shaft 200c and the shaft-like male threaded portion 440 have axial lengths longer than those of the auxiliary shaft 200c and the shaft-like male threaded portion 440 in the third embodiment. 200b. Other configurations are the same as those of the second embodiment.

In the fourth embodiment constructed as described above, an electromagnetically operated diaphragm valve is employed as a diaphragm valve instead of the air operated diaphragm valve described in the second embodiment.

According to this, the electromagnetically actuated diaphragm valve according to the fourth embodiment has an upper housing different from the upper housing member 100b and the air actuated drive mechanism 300 of the air-actuated diaphragm valve described in the second embodiment. By having the member 100d and the electromagnetically actuated drive mechanism 400, the shaft-like male screw portion 440 of the plunger 400b is fastened to the central portion 240 of the diaphragm 200a via the reinforcing annular member 200b, but the diaphragm member 200 and the lower side The housing member 100a is substantially the same as the second embodiment except that the partition walls have a slightly different configuration.

Therefore, in the fourth embodiment as well, since the central portion 240 of the diaphragm 200a is already laser-welded to the auxiliary shaft 200c as described above, the shaft-like male screw portion 440 of the plunger 400b is connected to the female screw hole portion 260 of the auxiliary shaft 200c. The plunger 400b, the diaphragm 200a and the auxiliary shaft 200c can be easily connected by tightening them.

Further, in the fourth embodiment, when the electromagnetically actuated diaphragm valve is interposed in the piping system of the semiconductor manufacturing apparatus instead of the air-actuated diaphragm valve described in the second embodiment, the diaphragm member In the fourth embodiment, the operation of the diaphragm 200a and the auxiliary shaft 200c of 200 is not the operation of the piston 310 by compressed air in the second embodiment, but the plunger by the magnetic attraction force as in the third embodiment. Although it is performed by the operation of 400b, the opening/closing operation as a diaphragm valve and the configuration of the diaphragm member 200 are the same as those of the second embodiment, and the same effects as those of the second embodiment can be achieved.

In addition, in carrying out the present invention, the following various modifications can be given without being limited to the above embodiments.
(1) In carrying out the present invention, the diaphragm 200a described in the above embodiment is not limited to a diaphragm formed by extruding PFA into a film shape by extrusion molding, but PFA is formed into a film shape by a compression molding method. It may be a diaphragm formed by compression molding.

The compression molding method is a method of filling PFA into a mold and compressing it into a film. It can be formed as a film-like diaphragm with excellent longevity and high smoothness that can minimize the dust generation of particles with a size of several nanometers. Also by this, the same effect as the above embodiment can be achieved.
(2) In carrying out the present invention, the drive mechanism 300 described in the first or second embodiment described above is different from the above embodiment in that the coil spring 330 is arranged in the lower chamber 131b in FIG. 1 or FIG. , the piston 310 may be biased in the direction opposite to the partition wall 120 . This means that the diaphragm valve functions as a normally open diaphragm valve.

In this way, even if the diaphragm valve described in the first or second embodiment operates as a normally open diaphragm valve, the effect is substantially the same as that of the first or second embodiment. effect can be achieved.
(3) In carrying out the present invention, the drive mechanism 400 described in the third or fourth embodiment has the coil spring 400c shown in FIG. Alternatively, the plunger 400b may be provided so as to be biased toward the stopper member 400d. This means that the electromagnetically actuated diaphragm valve functions as a normally open diaphragm valve.

Thus, even if the electromagnetically actuated diaphragm valve described in the third or fourth embodiment operates as a normally open diaphragm valve, it is substantially the same as the third or fourth embodiment. A similar effect can be achieved.
(4) Further, in carrying out the present invention, the reinforcing ring-shaped body 200b may be eliminated as necessary. In this case, the outer peripheral portion 210 of the diaphragm 200a is sandwiched between the outer peripheral portion of the partition wall main body 120a of the partition wall 120 and the inner annular wall portion 111a of the bottom wall main body 110a so as to be able to seal well.
(5) In carrying out the present invention, the piston shaft 320 described in the first embodiment has a female threaded hole coaxially formed in the shaft body portion 320a from the extending end side instead of the shaft-like male threaded portion 320b. On the other hand, the female screw hole 260 may be eliminated by forming the auxiliary shaft 200c so that the shaft-like male screw extends coaxially from its extension end. In this case, the auxiliary shaft 200c is coaxially fastened to the female threaded hole of the shaft main body 320a of the piston shaft 320 at its axial male thread.
(6) Further, in carrying out the present invention, the plunger 400b described in the third or fourth embodiment has a plunger main body portion 430 instead of the shaft-like male screw portion 440. A female threaded hole is formed coaxially from the auxiliary shaft 200c, while a shaft-shaped male threaded portion coaxially extends from the extension end of the auxiliary shaft 200c, thereby eliminating the female threaded hole 260. good too. In this case, the auxiliary shaft 200c is coaxially fastened to the female threaded hole of the plunger 400b at its axial male thread.
(7) In carrying out the present invention, instead of the pressing plate Q, a ring-shaped pressing plate that plays the same role as the pressing plate Q may be employed. It may be a pressing member having a function.

100... housing, 100a, 100c... lower housing member,
100b, 100d... upper housing member, 110... bottom wall,
112, 113... communicating passage portion, 110b... inflow tube, 110c... outflow tube,
111c... Annular valve seat portion, 120, 150... Partition wall, 130... Cylindrical peripheral wall,
131a... Upper chamber, 131b... Lower chamber, 140... Upper wall,
200... Diaphragm member, 200a... Diaphragm,
200b... Reinforcement annular body, 200c... Auxiliary shaft, 300... Air-operated drive mechanism,
310...Piston, 320...Piston shaft, 330, 400c...Coil spring,
400... Electromagnetically operated diaphragm valve, 400b... Plunger, Ra... Liquid chamber,
Rb... Air chamber, Q... Holding plate, Q1... Annular holding plate.

Claims (3)

A film-like diaphragm made of PFA that is applied to a diaphragm valve that allows high-purity chemical liquids and ultrapure water to flow,
a fluororesin auxiliary shaft coaxially laser-welded to the central portion of the film-like diaphragm;
A diaphragm laser-welded along one side of both surfaces of the diaphragm to the outer periphery of the diaphragm to reinforce the diaphragm and form an annular shape suitable for easy handling. and a reinforcing annular body made of fluorine resin ,
A diaphragm member, wherein said reinforcing ring is formed in its annular shape to have a radial width and thickness suitable to reinforce said diaphragm and make it easier to handle . 2. The diaphragm member according to claim 1 , wherein the diaphragm is formed into a film by extrusion molding or compression molding PFA . The auxiliary shaft has an outer diameter within the range of 1 (mm) or more and 4 (mm) or less,
3. The diaphragm member according to claim 2, wherein the diaphragm has a thickness within the range of 0.1 (mm) or more and 0.5 (mm) or less .

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