JP7141864B2 - Electronic component mounting substrate and manufacturing method thereof - Google Patents

Electronic component mounting substrate and manufacturing method thereof Download PDF

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JP7141864B2
JP7141864B2 JP2018118419A JP2018118419A JP7141864B2 JP 7141864 B2 JP7141864 B2 JP 7141864B2 JP 2018118419 A JP2018118419 A JP 2018118419A JP 2018118419 A JP2018118419 A JP 2018118419A JP 7141864 B2 JP7141864 B2 JP 7141864B2
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electronic component
silver
film
metal plate
component mounting
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JP2019220627A (en
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整哉 結城
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Dowa Metaltech Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation

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Description

本発明は、電子部品搭載基板およびその製造方法に関し、特に、アルミニウムまたはアルミニウム合金からなる金属板がセラミックス基板に接合した金属-セラミックス接合基板の金属板の一方の面に半導体チップなどの電子部品が取り付けられた電子部品搭載基板およびその製造方法に関する。 TECHNICAL FIELD The present invention relates to an electronic component mounting board and a manufacturing method thereof, and in particular, an electronic component such as a semiconductor chip is mounted on one surface of a metal plate of a metal-ceramic bonding board in which a metal plate made of aluminum or an aluminum alloy is bonded to a ceramic substrate. The present invention relates to an attached electronic component mounting board and a manufacturing method thereof.

従来、電気自動車、電車、工作機械などの大電流を制御するために、パワーモジュールが使用されている。従来のパワーモジュールでは、ベース板と呼ばれている金属板または複合材の一方の面に金属-セラミックス絶縁基板が固定され、この金属-セラミックス絶縁基板の金属板上に半導体チップが半田付けにより固定されている。 Conventionally, power modules have been used to control large currents in electric vehicles, trains, machine tools, and the like. In a conventional power module, a metal-ceramic insulating substrate is fixed to one side of a metal plate or composite material called a base plate, and a semiconductor chip is fixed on the metal plate of this metal-ceramic insulating substrate by soldering. It is

近年、銀微粒子を含む銀ペーストを接合材として使用し、被接合物間に接合材を介在させ、被接合物間に圧力を加えながら所定時間加熱して、接合材中の銀を焼結させて、(銀めっきされた銅材などの)被接合物同士を接合することが提案されており(例えば、特許文献1参照)、このような接合材を半田の代わりに使用して、金属-セラミックス絶縁基板の金属板上に半導体チップなどの電子部品を固定する試みがなされている。 In recent years, a silver paste containing fine silver particles is used as a bonding material, the bonding material is interposed between the objects to be bonded, and the objects to be bonded are heated for a predetermined time while applying pressure to sinter the silver in the bonding material. It has been proposed to join objects (such as silver-plated copper materials) to each other by using such a joining material instead of solder. Attempts have been made to fix electronic components such as semiconductor chips on metal plates of ceramic insulating substrates.

また、アルミニウムまたはアルミニウム合金からなる金属板の一方の面にニッケルまたはニッケル合金のめっき皮膜を形成し、その上に銀接合層により電子部品を接合することが提案されている(例えば、特許文献2参照)。 It has also been proposed to form a nickel or nickel alloy plating film on one surface of a metal plate made of aluminum or an aluminum alloy, and to bond an electronic component thereon with a silver bonding layer (for example, Patent Document 2). reference).

特開2011-80147号公報(段落番号0014-0020、0085)JP 2011-80147 (paragraph numbers 0014-0020, 0085) 特開2014-130989号公報(段落番号0007-0011)JP 2014-130989 (paragraph number 0007-0011)

しかし、特許文献1のように、銀めっきされた銅材に接合材により電子部品を接合したり、特許文献2のように、ニッケルまたはニッケル合金でめっきされた金属板に銀接合層により電子部品を接合する場合、電子部品としてパワー半導体を使用して、そのパワー半導体のオンとオフを数万回以上繰り返すパワーサイクル試験を行うと、パワー半導体が金属板から剥離するおそれがある。 However, as in Patent Document 1, an electronic component is bonded to a silver-plated copper material with a bonding material, and as in Patent Document 2, an electronic component is bonded to a metal plate plated with nickel or a nickel alloy with a silver bonding layer. When a power semiconductor is used as an electronic component and a power cycle test is performed in which the power semiconductor is turned on and off several tens of thousands of times, the power semiconductor may separate from the metal plate.

したがって、本発明は、このような従来の問題点に鑑み、アルミニウムまたはアルミニウム合金からなる金属板上に電子部品を搭載した電子部品搭載基板において、パワーサイクル試験を行っても電子部品が金属板から剥離するのを防止することができる、電子部品搭載基板およびその製造方法を提供することを目的とする。 Therefore, in view of such conventional problems, the present invention provides an electronic component mounting substrate in which electronic components are mounted on a metal plate made of aluminum or an aluminum alloy, even if a power cycle test is performed, the electronic components are removed from the metal plate. An object of the present invention is to provide an electronic component mounting substrate and a method for manufacturing the same, which can prevent peeling.

本発明者らは、上記課題を解決するために鋭意研究した結果、アルミニウムまたはアルミニウム合金からなる金属板の一方の面に電子部品が搭載された電子部品搭載基板の製造方法において、金属板の一方の面に、ニッケル皮膜とパラジウム皮膜と銀皮膜をこの順で形成し、銀皮膜上に銀ペーストを塗布してその上に電子部品を配置した後、銀ペースト中の銀を焼結させて銀接合層を形成し、この銀接合層によって電子部品を金属板の一方の面に接合することにより、パワーサイクル試験を行っても電子部品が金属板から剥離するのを防止することができる、電子部品搭載基板およびその製造方法を提供することができることを見出し、本発明を完成するに至った。 As a result of intensive research to solve the above problems, the present inventors have found that, in a method for manufacturing an electronic component mounting substrate in which an electronic component is mounted on one surface of a metal plate made of aluminum or an aluminum alloy, one side of the metal plate A nickel film, a palladium film, and a silver film are formed in this order on the surface of the silver film, and after applying silver paste on the silver film and placing electronic components on it, the silver in the silver paste is sintered to form a silver film. By forming a bonding layer and bonding the electronic component to one surface of the metal plate with this silver bonding layer, it is possible to prevent the electronic component from peeling off from the metal plate even when a power cycle test is performed. The inventors have found that it is possible to provide a component mounting board and a manufacturing method thereof, and have completed the present invention.

すなわち、本発明による電子部品搭載基板の製造方法は、アルミニウムまたはアルミニウム合金からなる金属板の一方の面に電子部品が搭載された電子部品搭載基板の製造方法において、金属板の一方の面に、ニッケル皮膜とパラジウム皮膜と銀皮膜をこの順で形成し、銀皮膜上に銀ペーストを塗布してその上に電子部品を配置した後、銀ペースト中の銀を焼結させて銀接合層を形成し、この銀接合層によって電子部品を金属板の一方の面に接合することを特徴とする。 That is, a method for manufacturing an electronic component mounting substrate according to the present invention is a method for manufacturing an electronic component mounting substrate in which an electronic component is mounted on one surface of a metal plate made of aluminum or an aluminum alloy, in which, on one surface of the metal plate, A nickel film, a palladium film, and a silver film are formed in this order, and after applying silver paste on the silver film and placing electronic components on it, the silver in the silver paste is sintered to form a silver bonding layer. The silver bonding layer is used to bond the electronic component to one surface of the metal plate.

この電子部品搭載基板の製造方法において、ニッケル皮膜の厚さが0.5~10μmであるのが好ましく、パラジウム皮膜の厚さが0.05~3μmであるのが好ましく、銀皮膜の厚さが0.05~5μmであるのが好ましい。また、電子部品の金属板の一方の面に接合される面が、金、銀、銅およびパラジウムからなる群から選ばれる少なくとも一種の金属またはこれらの合金で被覆されているのが好ましい。また、金属板の他方の面にセラミックス基板の一方の面を接合するのが好ましい。 In this method of manufacturing an electronic component mounting board, the nickel film preferably has a thickness of 0.5 to 10 μm, the palladium film preferably has a thickness of 0.05 to 3 μm, and the silver film has a thickness of 0.05 to 3 μm. It is preferably between 0.05 and 5 μm. Moreover, it is preferable that the surface to be joined to one surface of the metal plate of the electronic component is coated with at least one metal selected from the group consisting of gold, silver, copper and palladium, or an alloy thereof. Also, it is preferable to bond one surface of the ceramic substrate to the other surface of the metal plate.

また、本発明による電子部品搭載基板は、アルミニウムまたはアルミニウム合金からなる金属板の一方の面に電子部品が搭載された電子部品搭載基板において、金属板の一方の面に、ニッケル皮膜とパラジウム皮膜と銀皮膜がこの順で形成され、銀皮膜上に銀接合層により電子部品が接合されていることを特徴とする。 Further, the electronic component mounting substrate according to the present invention is an electronic component mounting substrate in which an electronic component is mounted on one surface of a metal plate made of aluminum or an aluminum alloy, wherein one surface of the metal plate is coated with a nickel film and a palladium film. A silver film is formed in this order, and an electronic component is bonded to the silver film by a silver bonding layer.

この電子部品搭載基板において、ニッケル皮膜の厚さが0.5~10μmであるのが好ましく、パラジウム皮膜の厚さが0.05~3μmであるのが好ましく、銀皮膜の厚さが0.05~5μmであるのが好ましい。また、電子部品の金属板の一方の面に接合される面が、金、銀、銅およびパラジウムからなる群から選ばれる少なくとも一種の金属またはこれらの合金で被覆されているのが好ましい。また、金属板の他方の面にセラミックス基板の一方の面が接合されているのが好ましい。 In this electronic component mounting board, the nickel film preferably has a thickness of 0.5 to 10 μm, the palladium film preferably has a thickness of 0.05 to 3 μm, and the silver film has a thickness of 0.05. It is preferably ˜5 μm. Moreover, it is preferable that the surface to be joined to one surface of the metal plate of the electronic component is coated with at least one metal selected from the group consisting of gold, silver, copper and palladium, or an alloy thereof. Also, it is preferable that one surface of the ceramic substrate is bonded to the other surface of the metal plate.

本発明によれば、アルミニウムまたはアルミニウム合金からなる金属板上に電子部品を搭載した電子部品搭載基板において、パワーサイクル試験を行っても電子部品が金属板から剥離するのを防止することができる、電子部品搭載基板およびその製造方法を提供することができる。 According to the present invention, in an electronic component mounting board in which electronic components are mounted on a metal plate made of aluminum or an aluminum alloy, it is possible to prevent the electronic components from peeling off from the metal plate even when a power cycle test is performed. An electronic component mounting board and a manufacturing method thereof can be provided.

本発明による電子部品搭載基板の実施の形態の断面図である。1 is a sectional view of an embodiment of an electronic component mounting substrate according to the present invention; FIG. 図1の電子部品搭載基板の斜視図である。FIG. 2 is a perspective view of the electronic component mounting substrate of FIG. 1;

以下、添付図面を参照して、本発明による電子部品搭載基板およびその製造方法の実施の形態について詳細に説明する。 BEST MODE FOR CARRYING OUT THE INVENTION An embodiment of an electronic component mounting board and a method for manufacturing the same according to the present invention will be described in detail below with reference to the accompanying drawings.

図1および図2に示すように、本発明による電子部品搭載基板の実施の形態では、平面形状が略矩形の金属板(電子部品搭載用金属板)10の一方の主面に、ニッケル膜12とパラジウム皮膜14と銀皮膜16がこの順に形成され、この銀皮膜16の表面に(銀の焼結体を含む)銀接合層18により電子部品20が接合されている。また、金属板10の他方の主面に、平面形状が略矩形のセラミックス基板22の一方の主面を接合し、このセラミックス基板22の他方の主面に、平面形状が略矩形の放熱用金属板(金属ベース板)24を接合してもよい。 As shown in FIGS. 1 and 2, in the embodiment of the electronic component mounting board according to the present invention, a nickel film 12 is formed on one main surface of a metal plate (electronic component mounting metal plate) 10 having a substantially rectangular planar shape. A palladium film 14 and a silver film 16 are formed in this order, and an electronic component 20 is bonded to the surface of the silver film 16 by a silver bonding layer 18 (including a sintered body of silver). Further, one main surface of a ceramic substrate 22 having a substantially rectangular planar shape is bonded to the other main surface of the metal plate 10, and a heat radiation metal having a substantially rectangular planar shape is attached to the other main surface of the ceramic substrate 22. A plate (metal base plate) 24 may be joined.

電子部品搭載用金属板10および放熱用金属板24は、アルミニウムまたはアルミニウム合金からなり、導電性や放熱性の観点から、好ましくは99.5質量%以上、さらに好ましくは99.9質量%のアルミニウムを含むのが好ましい。 The electronic component mounting metal plate 10 and the heat radiation metal plate 24 are made of aluminum or an aluminum alloy, and from the viewpoint of conductivity and heat dissipation, preferably 99.5% by mass or more, more preferably 99.9% by mass of aluminum It preferably contains

セラミックス基板22は、電子部品としてパワー半導体を搭載して大電流・高電圧が負荷された場合にも優れた絶縁性を発揮するセラミックス基板であるのが好ましく、窒化アルミニウム(AlN)、アルミナ(Al)、窒化珪素(SiN)を主成分とするセラミックス基板であるのが好ましい。 The ceramic substrate 22 is preferably a ceramic substrate that exhibits excellent insulation even when a power semiconductor is mounted as an electronic component and a large current and high voltage are applied. Aluminum nitride (AlN), alumina (Al 2 O 3 ) and silicon nitride (SiN) as main components.

電子部品搭載用金属板10の一方の主面(の少なくとも銀接合層18により電子部品20が接合される部分)には、ニッケルまたはニッケル合金からなるニッケル皮膜12が形成されている。このニッケル皮膜12の厚さは、0.5~10μmであるのが好ましい。このニッケル膜12が薄過ぎると、パラジウム皮膜14との密着性が低下し、厚過ぎると導電性が低下し、製造コストが増加する。また、ニッケル皮膜12は、ニッケルめっき皮膜または(ニッケルを85質量%以上含有する)ニッケル合金めっき皮膜であるのが好ましく、電気めっきまたは無電解めっきにより形成することができる。ニッケル合金めっき皮膜の場合、Ni-P合金めっき皮膜でもよく、Ni-B合金めっき皮膜でもよい。Ni-P合金めっき皮膜の場合、パラジウム皮膜14との良好な密着性を得るために、P濃度を6~11質量%にするのが好ましく、6~8質量%にするのがさらに好ましい。このP濃度は、めっき液により調整することができる。 A nickel film 12 made of nickel or a nickel alloy is formed on one main surface of the electronic component mounting metal plate 10 (at least the portion thereof where the electronic component 20 is bonded by the silver bonding layer 18). The thickness of this nickel coating 12 is preferably 0.5 to 10 μm. If the nickel film 12 is too thin, the adhesion with the palladium film 14 will be reduced, and if it is too thick, the conductivity will be reduced and the manufacturing cost will increase. The nickel film 12 is preferably a nickel plating film or a nickel alloy plating film (containing 85% by mass or more of nickel), and can be formed by electroplating or electroless plating. In the case of a nickel alloy plating film, it may be a Ni—P alloy plating film or a Ni—B alloy plating film. In the case of a Ni—P alloy plating film, the P concentration is preferably 6 to 11 mass %, more preferably 6 to 8 mass %, in order to obtain good adhesion with the palladium film 14 . This P concentration can be adjusted with a plating solution.

ニッケル皮膜12の表面には、パラジウムまたはパラジウム合金からなるパラジウム皮膜14が形成されている。このパラジウム皮膜14をニッケル皮膜12と銀皮膜16の間に設けることにより、ニッケル皮膜12と銀皮膜16の密着性を向上させることができる。パラジウム皮膜14の厚さは、0.05~3μmであるのが好ましい。パラジウム皮膜14が薄過ぎると、ニッケル皮膜12や銀皮膜16との密着性が低下し、厚過ぎると高価なパラジウムの使用量が増えるので製造コストが増加する。また、パラジウム皮膜14は、パラジウムめっき皮膜または(パラジウムを95質量%以上含有する)パラジウム合金めっき皮膜であるのが好ましく、電気めっきまたは無電解めっきにより形成することができる。 A palladium film 14 made of palladium or a palladium alloy is formed on the surface of the nickel film 12 . By providing the palladium film 14 between the nickel film 12 and the silver film 16, the adhesion between the nickel film 12 and the silver film 16 can be improved. The thickness of the palladium film 14 is preferably 0.05-3 μm. If the palladium film 14 is too thin, the adhesion to the nickel film 12 and the silver film 16 will be lowered, and if it is too thick, the amount of expensive palladium used will increase, increasing the manufacturing cost. The palladium film 14 is preferably a palladium plating film or a palladium alloy plating film (containing 95% by mass or more of palladium), and can be formed by electroplating or electroless plating.

パラジウム皮膜14の表面には、銀または銀合金からなる銀皮膜16が形成されている。この銀皮膜16は、銀接合層18との密着性を向上させることができる。銀皮膜16の厚さは、0.05~5μmであるのが好ましい。銀皮膜16が薄過ぎると、銀接合層18との密着性が低下し、厚過ぎると製造コストが増大する。また、銀皮膜16は、銀めっき皮膜または(銀を95質量%以上含有する)銀合金めっき皮膜であるのが好ましく、電気めっきまたは無電解めっきにより形成することができる。 A silver film 16 made of silver or a silver alloy is formed on the surface of the palladium film 14 . This silver film 16 can improve adhesion with the silver bonding layer 18 . The thickness of the silver film 16 is preferably 0.05-5 μm. If the silver film 16 is too thin, the adhesion with the silver bonding layer 18 will be reduced, and if it is too thick, the manufacturing cost will increase. The silver film 16 is preferably a silver plating film or a silver alloy plating film (containing 95% by mass or more of silver), and can be formed by electroplating or electroless plating.

また、電子部品20の金属板10の一方の主面に接合される面が、金、銀、銅およびパラジウムからなる群から選ばれる少なくとも一種の金属またはこれらの合金のように、銀接合層18と接合可能な金属で被覆されているのが好ましく、金、銀およびパラジウムからなる群から選ばれる少なくとも一種の金属またはこれらの合金で(電気めっきまたは無電解めっきにより)めっきされているのが好ましい。 In addition, the surface to be bonded to one main surface of the metal plate 10 of the electronic component 20 is made of at least one metal selected from the group consisting of gold, silver, copper and palladium, or an alloy thereof, and the silver bonding layer 18 It is preferably coated with a metal that can be bonded to and is preferably plated (by electroplating or electroless plating) with at least one metal selected from the group consisting of gold, silver and palladium or an alloy thereof .

本発明による電子部品搭載基板の製造方法の実施の形態では、アルミニウムまたはアルミニウム合金からなる金属板10の一方の主面に電子部品20が搭載された電子部品搭載基板の製造方法において、金属板10の一方の主面(の少なくとも銀ペーストを塗布する部分)に、ニッケル皮膜12とパラジウム皮膜14と銀皮膜16をこの順で形成し、銀皮膜16上に銀ペーストを塗布してその上に電子部品20を配置した後、銀ペースト中の銀を焼結させて銀接合層18を形成し、この銀接合層18によって電子部品20を金属板10の一方の面に接合する。 In the embodiment of the method for manufacturing an electronic component mounting board according to the present invention, in the method for manufacturing an electronic component mounting board in which an electronic component 20 is mounted on one main surface of a metal plate 10 made of aluminum or an aluminum alloy, the metal plate 10 A nickel film 12, a palladium film 14, and a silver film 16 are formed in this order on one main surface of (at least a portion of which silver paste is applied), a silver paste is applied on the silver film 16, and an electron is applied thereon. After placing the component 20 , the silver in the silver paste is sintered to form the silver bonding layer 18 , and the electronic component 20 is bonded to one surface of the metal plate 10 by this silver bonding layer 18 .

なお、銀ペースト中の銀の焼結は、200~500℃に加熱することによって行うのが好ましく、220~400℃に加熱することによって行うのがさらに好ましい。この焼結の際の加熱時間は、1~10分間であるのが好ましい。また、この焼結は、加圧しないで加熱することによって行うことができるが、金属板10に対して電子部品20を加圧しながら加熱することによって行ってもよい。この焼結の際に加圧する圧力は、10MPa以下でよく、2~10MPaであるのが好ましく、3~8MPaであるのがさらに好ましい。 The sintering of silver in the silver paste is preferably carried out by heating to 200 to 500.degree. C., more preferably by heating to 220 to 400.degree. The heating time during this sintering is preferably 1 to 10 minutes. Moreover, this sintering can be performed by heating without pressure, but may be performed by heating while pressing the electronic component 20 against the metal plate 10 . The pressure applied during this sintering may be 10 MPa or less, preferably 2 to 10 MPa, more preferably 3 to 8 MPa.

また、金属板10の他方の主面に、平面形状が略矩形のセラミックス基板22の一方の主面を接合し、このセラミックス基板22の他方の主面に、平面形状が略矩形の放熱用金属板(金属ベース板)24を接合してもよい。この場合、これらの金属板10とセラミックス基板22の間およびセラミックス基板22と金属ベース板24の間の接合の後、金属板10の一方の主面(電子部品20が接合される面)に、ニッケル皮膜12とパラジウム皮膜14と銀皮膜16をこの順で形成し、銀皮膜16上に銀ペーストを塗布して電子部品20を配置した後、銀ペースト中の銀を焼結させて銀接合層18を形成し、この銀接合層18によって電子部品20を金属板10の一方の主面に接合すればよい。なお、金属板10とセラミックス基板22の間およびセラミックス基板22と金属ベース板24の間の接合では、(図示しない)鋳型内にセラミックス基板22を配置した後、セラミックス基板22の両主面に接触するようにアルミニウムまたはアルミニウム合金の溶湯を注湯した後に溶湯を冷却して固化させることにより、セラミックス基板22の各々の主面に金属板10および金属ベース板24を形成して直接接合させるのが好ましい。 Further, one main surface of a ceramic substrate 22 having a substantially rectangular planar shape is bonded to the other main surface of the metal plate 10, and a heat radiation metal having a substantially rectangular planar shape is attached to the other main surface of the ceramic substrate 22. A plate (metal base plate) 24 may be joined. In this case, after bonding between the metal plate 10 and the ceramic substrate 22 and between the ceramic substrate 22 and the metal base plate 24, on one main surface of the metal plate 10 (the surface to which the electronic component 20 is bonded), A nickel film 12, a palladium film 14, and a silver film 16 are formed in this order, a silver paste is applied on the silver film 16, an electronic component 20 is arranged, and then the silver in the silver paste is sintered to form a silver bonding layer. 18 is formed, and the electronic component 20 is bonded to one main surface of the metal plate 10 by this silver bonding layer 18 . In addition, in the bonding between the metal plate 10 and the ceramic substrate 22 and between the ceramic substrate 22 and the metal base plate 24, after placing the ceramic substrate 22 in a mold (not shown), both main surfaces of the ceramic substrate 22 are brought into contact with each other. The metal plate 10 and the metal base plate 24 are formed on the respective main surfaces of the ceramic substrate 22 by pouring molten aluminum or aluminum alloy in such a manner as to cool and solidify the molten aluminum or aluminum alloy so as to be directly bonded. preferable.

また、銀ペーストとして、500℃以下の温度で焼結可能な銀微粒子を含むペーストを使用することができ、炭素数8以下(好ましくは6~8)の有機化合物で被覆された平均一次粒子径1~200nmの銀微粒子が分散媒(好ましくは極性溶媒)に分散した接合材(例えば、DOWAエレクトロニクス株式会社製のPA-HT-1503M-C)を使用するのが好ましい。このような銀微粒子が分散した分散媒に平均一次粒径(D50径)が0.5~3.0μmの銀粒子がさらに分散した接合材(例えば、DOWAエレクトロニクス株式会社製のPA-HT-1001L)を使用してもよい。 In addition, as the silver paste, a paste containing fine silver particles that can be sintered at a temperature of 500 ° C. or less can be used, and the average primary particle diameter coated with an organic compound having 8 or less carbon atoms (preferably 6 to 8) It is preferable to use a bonding material (for example, PA-HT-1503M-C manufactured by DOWA Electronics Co., Ltd.) in which fine silver particles of 1 to 200 nm are dispersed in a dispersion medium (preferably a polar solvent). A bonding material (for example, PA- HT- 1001L) may be used.

以下、本発明による電子部品搭載基板およびその製造方法の実施例について詳細に説明する。 Examples of an electronic component mounting board and a method of manufacturing the same according to the present invention will be described below in detail.

鋳型内に45mm×25mm×0.6mmの大きさのAlN(窒化アルミニウム)からなるセラミックス基板を配置し、このセラミックス基板の両主面に接触するように99.9質量%のアルミニウムの溶湯を注湯した後に溶湯を冷却して固化させることにより、セラミックス基板の各々の主面に45mm×23mm×0.4mmの大きさの(電子部品搭載用)金属板と45mm×23mm×0.4mmの大きさの(放熱用)金属ベース板を形成して、それぞれセラミックス基板の主面に直接接合させ、金属-セラミックス接合基板を作製した。 A ceramic substrate made of AlN (aluminum nitride) having a size of 45 mm × 25 mm × 0.6 mm is placed in the mold, and molten aluminum of 99.9% by mass is poured so as to contact both main surfaces of the ceramic substrate. After heating, the molten metal is cooled and solidified to form a metal plate (for mounting electronic parts) of 45 mm x 23 mm x 0.4 mm and a metal plate of 45 mm x 23 mm x 0.4 mm on each main surface of the ceramic substrate. A metal base plate (for heat radiation) was formed and directly bonded to the main surface of each ceramic substrate to produce a metal-ceramic bonded substrate.

次に、めっきの前処理として、脱脂、化学研磨および酸洗を行い、ダブルジンケート処理(2回亜鉛置換)を行った後、金属-セラミックス接合基板を無電解Ni-Pめっき液(上村工業株式会社製のニムデンNPR-4)に浸漬することによって、(電子部品搭載用)金属板の表面に厚さ4μmの無電解Ni-P合金めっき皮膜(P濃度が7質量%で残部がNiの無電解Ni-Pめっき皮膜)を形成した。 Next, as pretreatment for plating, degreasing, chemical polishing and pickling are performed, and after double zincate treatment (twice zinc substitution), the metal-ceramic bonded substrate is coated with an electroless Ni-P plating solution (Uemura Kogyo Co., Ltd.). Nimden NPR-4 (manufactured by the company) was used to form an electroless Ni-P alloy plating film (with a P concentration of 7% by mass and the balance being Ni-free) on the surface of a metal plate (for mounting electronic components) with a thickness of 4 μm. Electrolytic Ni—P plating film) was formed.

次に、このNi-Pめっき皮膜が形成された金属-セラミックス接合基板を、無電解Ni-P合金めっきに対して自己触媒性を有する金属のめっき液として、自己触媒還元型無電解パラジウムめっき液(上村工業株式会社製のアルタレアTDP-30-MW)に浸漬することによって、Ni-P合金めっき皮膜上に厚さ0.1μmのパラジウムめっき皮膜を形成した。 Next, the metal-ceramic bonding substrate on which the Ni—P plating film was formed was treated with an autocatalytic reduction type electroless palladium plating solution as a metal plating solution having autocatalytic properties for electroless Ni—P alloy plating. A 0.1 μm-thick palladium plating film was formed on the Ni—P alloy plating film by immersion in (Altalea TDP-30-MW manufactured by Uyemura & Co., Ltd.).

次に、このパラジウムめっき皮膜が形成された金属-セラミックス接合基板を、無電解銀めっき液(上村工業株式会社製のアルジェントRSD-4)に浸漬することによって、パラジウムめっき皮膜上に厚さ0.1μmの銀めっき皮膜を形成した。 Next, the metal-ceramic bonding substrate on which the palladium plating film is formed is immersed in an electroless silver plating solution (Argento RSD-4, manufactured by Uyemura & Co., Ltd.), thereby forming a 0.05 mm thick layer on the palladium plating film. A silver plating film of 1 μm was formed.

次に、(電子部品搭載用)金属板上の銀めっき皮膜の表面の電子部品搭載部分に、銀ペースト(NBE Tech,LLC社製のNano Tach)をスクリーン印刷により塗布し、その上に電子部品として底面(裏面)が銀めっきされた(縦7.19mm×横6.74mm×厚さ0.07mmの大きさの)パワー半導体シリコンチップ(Fairchild社製のSi-IGBTチップ、型番PCFG75N60SMW)を配置し、大気中において、加圧しないで、250℃で10分間加熱することにより、銀ペースト中の銀を焼結させて銀接合層を形成し、この銀接合層により(電子部品搭載用)金属板にシリコンチップを接合した。なお、この接合後の銀接合層の厚さは約30μmであった。 Next, a silver paste (NBE Tech, Nano Tach manufactured by LLC) is applied by screen printing to the electronic component mounting portion of the surface of the silver plating film on the metal plate (for mounting electronic components), and the electronic component is applied thereon. As a power semiconductor silicon chip (Si-IGBT chip manufactured by Fairchild, model number PCFG75N60SMW) whose bottom surface (back surface) is silver-plated (length 7.19 mm × width 6.74 mm × thickness 0.07 mm) is arranged. Then, the silver in the silver paste is sintered by heating at 250° C. for 10 minutes in the air without pressurization to form a silver bonding layer. A silicon chip was bonded to the plate. The thickness of the silver bonding layer after this bonding was about 30 μm.

このようにして作製した電子部品搭載基板について、シリコンチップの電極に試験電源を接続し、付加電流を3A、付加電圧を11Vに設定して、50秒間電流を流した後に40秒間電流を流さないようにオン/オフを繰り返すサイクル(電流をオンにすることによりシリコンチップが加熱されて50秒後にシリコンチップの温度が約175℃まで上昇し、電流をオフにすることによち40秒後にシリコンチップの温度が約45℃まで降下するサイクル(ΔT=130℃))を20,000サイクル行うパワーサイクル試験を行った。なお、パワー半導体シリコンチップのゲート-エミッタ間の電圧Vgeとそのシリコンチップの温度との間に線形の関係があることから、予めその線形の関係を求めておき、ゲート-エミッタ間の電圧Vgeからシリコンチップの温度を換算した。このパワーサイクル試験後のシリコンチップの温度の上昇(過渡熱抵抗の上昇)は、初期設定値(175℃)と比べて105%未満であり、シリコンチップに電気的な異常は生じなかった。 A test power supply is connected to the electrodes of the silicon chip on the electronic component mounting substrate thus produced, and the additional current is set to 3 A and the additional voltage is set to 11 V, and the current is applied for 50 seconds and then not applied for 40 seconds. (Since the silicon chip is heated by turning on the current, the temperature of the silicon chip rises to about 175° C. after 50 seconds, and after 40 seconds by turning off the current, the silicon chip A power cycle test was conducted in which 20,000 cycles (.DELTA.T=130.degree. C.) in which the temperature of the chip drops to about 45.degree. Since there is a linear relationship between the gate-emitter voltage Vge of the power semiconductor silicon chip and the temperature of the silicon chip, the linear relationship is obtained in advance, and the gate-emitter voltage V The temperature of the silicon chip was converted from ge . The temperature rise (increase in transient thermal resistance) of the silicon chip after this power cycle test was less than 105% of the initial set value (175° C.), and no electrical abnormality occurred in the silicon chip.

また、作製した電子部品搭載基板について、(電子部品搭載用)金属板とシリコンチップとの接合部を超音波探傷装置(SAT)(日立建機ファインテック株式会社製のFS100II)により観察したところ、銀接合層にボイドなどの欠陥は確認されず、シリコンチップの剥離も認められなかった。 In addition, when observing the joint between the metal plate (for mounting electronic components) and the silicon chip on the manufactured electronic component mounting substrate with an ultrasonic flaw detector (SAT) (FS100II manufactured by Hitachi Kenki Finetech Co., Ltd.), No defects such as voids were observed in the silver bonding layer, and no peeling of the silicon chip was observed.

また、比較例として、実施例1の無電解Ni-Pめっき液に代えて、無電解Ni-Pめっき液(上村工業株式会社製のニムデンSX)を使用して無電解Ni-P合金めっき皮膜(リン濃度が10質量%で残部がニッケルの無電解Ni-Pめっき皮膜)を形成し、実施例1の自己触媒還元型無電解パラジウムめっき液に浸漬することによってパラジウムめっき皮膜を形成する代わりに、パラジウム活性処理液(上村工業株式会社製のアクセマルタMPD-22)に浸漬することによって活性化処理を行った以外は、実施例1と同様の方法により、電子部品搭載基板を作製した。この電子部品搭載基板について、実施例1と同様のパワーサイクル試験を行ったところ、9,000サイクル経過後に、ゲート-エミッタ間の電圧Vgeにノイズが生じ、シリコンチップの温度の上昇(過渡熱抵抗の上昇)が初期設定値(175℃)と比べて105%を超えたため、シリコンチップに電気的な異常が生じたと判断した。また、作製した電子部品搭載基板について、(電子部品搭載用)金属板とシリコンチップとの接合部を実施例と同様の超音波探傷装置(SAT)により観察したところ、銀めっき皮膜の一部がニッケルめっき皮膜から剥離していることが確認され、シリコンチップに触れるとシリコンチップが簡単に脱落した。 Further, as a comparative example, instead of the electroless Ni-P plating solution of Example 1, an electroless Ni-P plating solution (Nimden SX manufactured by Uyemura & Co., Ltd.) was used to form an electroless Ni-P alloy plating film. Instead of forming a palladium plating film (electroless Ni-P plating film with a phosphorus concentration of 10% by mass and the balance being nickel) and immersing it in the autocatalytic reduction type electroless palladium plating solution of Example 1 , and a palladium activation treatment solution (Axemalta MPD-22 manufactured by Uyemura & Co., Ltd.), except that the activation treatment was performed in the same manner as in Example 1, to produce an electronic component mounting substrate. A power cycle test similar to that of Example 1 was performed on this electronic component mounting board. After 9,000 cycles, noise was generated in the voltage Vge between the gate and the emitter, and the temperature of the silicon chip increased (transient heat). increase in resistance) exceeded 105% of the initially set value (175° C.), it was determined that an electrical abnormality had occurred in the silicon chip. In addition, when observing the joint between the metal plate (for mounting electronic components) and the silicon chip on the manufactured electronic component mounting board with the same ultrasonic flaw detector (SAT) as in the example, part of the silver plating film was observed. Detachment from the nickel plating film was confirmed, and when the silicon chip was touched, the silicon chip fell off easily.

10 電子部品搭載用金属板
12 ニッケル皮膜
14 パラジウム皮膜
16 銀皮膜
18 銀接合層
20 電子部品
22 セラミックス基板
24 放熱用金属板(金属ベース板)
REFERENCE SIGNS LIST 10 metal plate for mounting electronic component 12 nickel film 14 palladium film 16 silver film 18 silver bonding layer 20 electronic component 22 ceramic substrate 24 metal plate for heat dissipation (metal base plate)

Claims (10)

アルミニウムまたはアルミニウム合金からなる金属板の一方の面に電子部品が搭載されるとともに他方の面にセラミックス基板の一方の面が接合された電子部品搭載基板の製造方法において、他方の面にセラミックス基板の一方の面が接合された金属板の一方の面に、ニッケル皮膜とパラジウム皮膜と銀皮膜をこの順で形成し、銀皮膜上に銀ペーストを塗布してその上に電子部品を配置した後、銀ペースト中の銀を焼結させて銀接合層を形成し、この銀接合層によって電子部品を金属板の一方の面に接合することを特徴とする、電子部品搭載基板の製造方法。 A method for manufacturing an electronic component-mounted substrate in which electronic components are mounted on one surface of a metal plate made of aluminum or an aluminum alloy and one surface of a ceramic substrate is bonded to the other surface, wherein the ceramic substrate is bonded to the other surface. A nickel film, a palladium film, and a silver film are formed in this order on one surface of the metal plate to which one surface is bonded . What is claimed is: 1. A method of manufacturing an electronic component mounting substrate, comprising the steps of: sintering silver in a silver paste to form a silver bonding layer; and bonding an electronic component to one surface of a metal plate by means of the silver bonding layer. 前記ニッケル皮膜の厚さが0.5~10μmであることを特徴とする、請求項1に記載の電子部品搭載基板の製造方法。 2. The method for manufacturing an electronic component mounting board according to claim 1, wherein the nickel film has a thickness of 0.5 to 10 μm. 前記パラジウム皮膜の厚さが0.05~3μmであることを特徴とする、請求項1または2に記載の電子部品搭載基板の製造方法。 3. The method for manufacturing an electronic component mounting board according to claim 1, wherein the palladium film has a thickness of 0.05 to 3 μm. 前記銀皮膜の厚さが0.05~5μmであることを特徴とする、請求項1乃至3のいずれかに記載の電子部品搭載基板の製造方法。 4. The method for manufacturing an electronic component mounting board according to claim 1, wherein the silver film has a thickness of 0.05 to 5 μm. 前記電子部品の前記金属板の一方の面に接合される面が、金、銀、銅およびパラジウムからなる群から選ばれる少なくとも一種の金属またはこれらの合金で被覆されていることを特徴とする、請求項1乃至4のいずれかに記載の電子部品搭載基板の製造方法。 The surface of the electronic component to be bonded to one surface of the metal plate is coated with at least one metal selected from the group consisting of gold, silver, copper and palladium or an alloy thereof, 5. The method for manufacturing an electronic component mounting board according to claim 1. アルミニウムまたはアルミニウム合金からなる金属板の一方の面に電子部品が搭載されるとともに他方の面にセラミックス基板の一方の面が接合された電子部品搭載基板において、他方の面にセラミックス基板の一方の面が接合された金属板の一方の面に、ニッケル皮膜とパラジウム皮膜と銀皮膜がこの順で形成され、銀皮膜上に銀接合層により電子部品が接合されていることを特徴とする、電子部品搭載基板。 An electronic component mounting board in which electronic components are mounted on one surface of a metal plate made of aluminum or an aluminum alloy and one surface of a ceramic substrate is bonded to the other surface, and one surface of the ceramic substrate is attached to the other surface. A nickel film, a palladium film, and a silver film are formed in this order on one surface of a metal plate to which is bonded, and an electronic component is bonded to the silver film by a silver bonding layer. mounting board. 前記ニッケル皮膜の厚さが0.5~10μmであることを特徴とする、請求項に記載の電子部品搭載基板。 7. The electronic component mounting board according to claim 6 , wherein said nickel film has a thickness of 0.5 to 10 μm. 前記パラジウム皮膜の厚さが0.05~3μmであることを特徴とする、請求項またはに記載の電子部品搭載基板。 8. The electronic component mounting substrate according to claim 6 , wherein said palladium film has a thickness of 0.05 to 3 μm. 前記銀皮膜の厚さが0.05~5μmであることを特徴とする、請求項乃至のいずれかに記載の電子部品搭載基板。 9. The electronic component mounting board according to claim 6 , wherein said silver film has a thickness of 0.05 to 5 μm. 前記電子部品の前記金属板の一方の面に接合される面が、金、銀、銅およびパラジウムからなる群から選ばれる少なくとも一種の金属またはこれらの合金で被覆されていることを特徴とする、請求項乃至のいずれかに記載の電子部品搭載基板。 The surface of the electronic component to be bonded to one surface of the metal plate is coated with at least one metal selected from the group consisting of gold, silver, copper and palladium or an alloy thereof, The electronic component mounting board according to any one of claims 6 to 9 .
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