JP7132156B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP7132156B2 JP7132156B2 JP2019041385A JP2019041385A JP7132156B2 JP 7132156 B2 JP7132156 B2 JP 7132156B2 JP 2019041385 A JP2019041385 A JP 2019041385A JP 2019041385 A JP2019041385 A JP 2019041385A JP 7132156 B2 JP7132156 B2 JP 7132156B2
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- 239000004065 semiconductor Substances 0.000 title claims description 244
- 150000004767 nitrides Chemical class 0.000 claims description 179
- 239000000758 substrate Substances 0.000 claims description 78
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 44
- 229910052757 nitrogen Inorganic materials 0.000 claims description 23
- 229910052782 aluminium Inorganic materials 0.000 claims description 14
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 12
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 5
- 229910052710 silicon Inorganic materials 0.000 claims 3
- 239000010703 silicon Substances 0.000 claims 3
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 41
- 239000013078 crystal Substances 0.000 description 14
- 229910052984 zinc sulfide Inorganic materials 0.000 description 11
- 229910002704 AlGaN Inorganic materials 0.000 description 10
- 230000002950 deficient Effects 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 238000004458 analytical method Methods 0.000 description 5
- 125000004433 nitrogen atom Chemical group N* 0.000 description 5
- 230000008569 process Effects 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 238000005430 electron energy loss spectroscopy Methods 0.000 description 3
- 230000005669 field effect Effects 0.000 description 3
- WGPCGCOKHWGKJJ-UHFFFAOYSA-N sulfanylidenezinc Chemical compound [Zn]=S WGPCGCOKHWGKJJ-UHFFFAOYSA-N 0.000 description 3
- 229910004205 SiNX Inorganic materials 0.000 description 2
- 238000003917 TEM image Methods 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000002003 electron diffraction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 238000000731 high angular annular dark-field scanning transmission electron microscopy Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000002040 relaxant effect Effects 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 230000005533 two-dimensional electron gas Effects 0.000 description 1
- 238000000927 vapour-phase epitaxy Methods 0.000 description 1
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Description
実施形態の半導体装置は、基板と、基板の上に設けられ、基板面に平行な第1方向に第1格子周期を有し、且つ、窒素及びアルミニウムを含む第1窒化物半導体層と、基板と第1窒化物半導体層の間に設けられ、基板面に平行な第1方向に第1格子周期の3倍の第2格子周期を少なくとも一部に有し、且つ、窒素及びアルミニウムを含む第2窒化物半導体層と、第1窒化物半導体層の上に設けられた第3窒化物半導体層と、第3窒化物半導体層の上に設けられ、第3窒化物半導体層よりバンドギャップの大きな第4窒化物半導体層と、第4窒化物半導体層の上に設けられた電流供給のための少なくとも1個の主電極と、第3窒化物半導体層の上に設けられた電流を制御するための制御電極と、を備える。
4 第2窒化物半導体層
4a 窒素欠乏領域(第1領域)
4b 窒素欠乏領域(第2領域)
6 第1窒化物半導体層
8 AlGaN層(第7窒化物半導体層)
10 AlN/GaN超格子半導体層(第6窒化物半導体層)
12 GaN高抵抗層(第5窒化物半導体層)
14 第3窒化物半導体層
16 第4窒化物半導体層
18 絶縁膜
20 ソース電極
22 ゲート電極
24 ドレイン電極
26 p型窒化物半導体層
100 半導体装置
110 半導体装置
120 半導体装置
Claims (7)
- 基板と、
前記基板の上に設けられ、基板面に平行な第1方向に第1格子周期を有し、窒素及びアルミニウムを含む第1窒化物半導体層と、
前記基板と前記第1窒化物半導体層の間に設けられ、前記基板面に平行な第1方向に前記第1格子周期の3倍の第2格子周期を少なくとも一部に有し、窒素及びアルミニウムを含む第2窒化物半導体層と、
前記第1窒化物半導体層の上に設けられた第3窒化物半導体層と、
前記第3窒化物半導体層の上に設けられ、前記第3窒化物半導体層よりバンドギャップの大きな第4窒化物半導体層と、
前記第4窒化物半導体層の上に設けられた少なくとも1個の主電極と、
前記第3窒化物半導体層の上に設けられた電流を制御するための制御電極と、
を備える半導体装置。 - 前記基板はシリコン基板であり、前記基板面の面方位は(111)である請求項1記載の半導体装置。
- 前記第2窒化物半導体層の膜厚は10nm以下である請求項1または請求項2記載の半導体装置。
- 前記基板面は凹凸を有し、前記基板と前記第2窒化物半導体層の界面を含む前記第1方向に前記第2格子周期及びシリコン(111)面の格子周期に対応する第3格子周期を有する請求項1ないし請求項3いずれか一項記載の半導体装置。
- 前記基板と前記第2窒化物半導体層の界面近傍において、シリコン(111)面が有する格子周期に対応する回折スポットを有する請求項1ないし請求項4いずれか一項記載の半導体装置。
- 前記第2窒化物半導体層内の窒素濃度は、前記基板側の第1領域よりも、前記第1窒化物半導体側の第2領域において高い請求項1ないし請求項5いずれか一項記載の半導体装置。
- 前記第2窒化物半導体層は、前記第1方向に直交する第2方向に、前記第1格子周期の3倍の第2格子周期をさらに有する請求項1ないし請求項6いずれか一項記載の半導体装置。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019041385A JP7132156B2 (ja) | 2019-03-07 | 2019-03-07 | 半導体装置 |
US16/458,670 US10910489B2 (en) | 2019-03-07 | 2019-07-01 | Semiconductor device |
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WO2002029873A1 (en) | 2000-10-03 | 2002-04-11 | Texas Tech University | Method of epitaxial growth of high quality nitride layers on silicon substrates |
JP2011166067A (ja) | 2010-02-15 | 2011-08-25 | Panasonic Corp | 窒化物半導体装置 |
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WO2002029873A1 (en) | 2000-10-03 | 2002-04-11 | Texas Tech University | Method of epitaxial growth of high quality nitride layers on silicon substrates |
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