JP7124770B2 - resin composition - Google Patents

Description

The present invention provides a resin composition containing an epoxy resin and a curing agent; a cured product of the resin composition; a sheet-like laminate material containing the resin composition; a resin sheet containing the resin composition; Board; relates to a semiconductor device including the above printed wiring board.

2. Description of the Related Art As a technique for manufacturing printed wiring boards, a manufacturing method using a build-up method in which insulating layers and conductor layers are alternately stacked is known. In the build-up manufacturing method, the insulating layer is generally formed by curing a resin composition.

Since printed wiring boards are exposed to various environments such as high and low temperatures, if the linear thermal expansion coefficient of the cured material used for the insulating layer is high, the insulating layer will repeatedly expand and contract, and cracks will occur due to the distortion. . As a technique for keeping the coefficient of linear thermal expansion low, a method of adding a relatively large amount of inorganic filler to a cured material is known (Patent Document 1). However, when a relatively large amount of inorganic filler is blended into the cured material, the elastic modulus increases, making it difficult to suppress warpage.

It has also been found that the adhesion between a conductor layer such as a copper foil and an insulating layer decreases when a relatively large amount of inorganic filler is contained in the cured material. Due to the recent demand for smaller semiconductor chip packages, excellent adhesion is required.

For this reason, even when a relatively large amount of inorganic filler is used, there is a demand for a cured material that can achieve both suppression of warpage due to a low elastic modulus and excellent adhesion.

JP 2016-27097 A

An object of the present invention is to provide a resin composition capable of achieving both suppression of warpage of the resulting cured product and excellent adhesion.

In order to achieve the object of the present invention, the present inventors conducted intensive studies and found that the resin composition contains (C) a benzoxazine compound having one or more alicyclic structures in the molecule, thereby obtaining a cured product. The present inventors have found that the elastic modulus can be reduced, thereby achieving both suppression of warpage and excellent adhesion, and have completed the present invention.

That is, the present invention includes the following contents.
[1] A resin composition containing (A) an epoxy resin, (B) an inorganic filler, and (C) a benzoxazine compound having an alicyclic structure in its molecule.
[2] The resin composition according to [1] above, wherein the alicyclic structure of component (C) is a cyclohexane ring structure.
[3] Component (C) has the formula (2):

[wherein R ¹ and R ² each independently represent a substituent, Y is a bond, an alkylene group having 1 to 6 carbon atoms, -O-, -S-, -SO ₂ -, -NH-, -CO-, -CONH-, -NHCO-, -COO-, or -OCO-, s and t are each independently an integer of 0 to 4, u is 0 or 1 is shown. ]
The resin composition according to the above [1] or [2], which is a compound represented by
[4] The content of component (B) is 50% by mass or more when all non-volatile components in the resin composition are 100% by mass. Resin composition.
[5] The resin composition according to any one of [1] to [4] above, wherein the component (B) has an average particle size of 10 μm or less.
[6] The resin composition according to any one of [1] to [5] above, further comprising (D) an elastomer.
[7] The resin composition according to any one of [1] to [6] above, further comprising (E) a curing agent.
[8] The resin composition according to any one of [1] to [7] above, for forming an insulating layer.
[9] A cured product of the resin composition according to any one of [1] to [8] above.
[10] A sheet-like laminated material containing the resin composition according to any one of [1] to [8] above.
[11] A resin sheet comprising a support and a resin composition layer formed from the resin composition according to any one of [1] to [8] provided on the support.
[12] A printed wiring board comprising an insulating layer comprising a cured product of the resin composition according to any one of [1] to [8] above.
[13] A semiconductor device including the printed wiring board according to [12] above.

ADVANTAGE OF THE INVENTION According to this invention, the resin composition which can implement|achieve both suppression of the curvature of hardened|cured material and the excellent adhesiveness by reducing the elastic modulus of hardened|cured material can be provided.

BEST MODE FOR CARRYING OUT THE INVENTION The present invention will now be described in detail with reference to its preferred embodiments. However, the present invention is not limited to the following embodiments and examples, and can be arbitrarily modified without departing from the scope of the claims of the present invention and their equivalents.

<Resin composition>
The resin composition of the present invention contains (A) an epoxy resin, (B) an inorganic filler, and (C) a benzoxazine compound having an alicyclic structure in its molecule.

By using such a resin composition, it is possible to reduce the elastic modulus of the cured product, thereby achieving both suppression of warpage and excellent adhesion.

The resin composition of the present invention may further contain optional components in addition to (A) an epoxy resin, (B) an inorganic filler, and (C) a benzoxazine compound having an alicyclic structure in the molecule. good. Optional components include, for example, (D) elastomer, (E) curing agent, (F) curing accelerator, (G) organic solvent, and (H) other additives. Each component contained in the resin composition will be described in detail below.

<(A) Epoxy resin>
The resin composition of the present invention contains (A) an epoxy resin.

(A) Epoxy resins include, for example, bixylenol type epoxy resins, bisphenol A type epoxy resins, bisphenol F type epoxy resins, bisphenol S type epoxy resins, bisphenol AF type epoxy resins, dicyclopentadiene type epoxy resins, and trisphenol type epoxy resins. Epoxy resin, naphthol novolac type epoxy resin, phenol novolac type epoxy resin, tert-butyl-catechol type epoxy resin, naphthalene type epoxy resin, naphthol type epoxy resin, anthracene type epoxy resin, glycidylamine type epoxy resin, glycidyl ester type epoxy resin , cresol novolac type epoxy resin, biphenyl type epoxy resin, linear aliphatic epoxy resin, epoxy resin having a butadiene structure, alicyclic epoxy resin, heterocyclic epoxy resin, spiro ring-containing epoxy resin, cyclohexane type epoxy resin, cyclohexane Examples include dimethanol type epoxy resin, naphthylene ether type epoxy resin, trimethylol type epoxy resin, tetraphenylethane type epoxy resin and the like. Epoxy resins may be used singly or in combination of two or more.

The resin composition preferably contains an epoxy resin having two or more epoxy groups in one molecule as (A) the epoxy resin. From the viewpoint of obtaining the desired effects of the present invention remarkably, the ratio of the epoxy resin having two or more epoxy groups in one molecule to 100% by mass of the non-volatile components of the epoxy resin (A) is preferably 50% by mass. % or more, more preferably 60 mass % or more, and particularly preferably 70 mass % or more.

Epoxy resins include liquid epoxy resins at a temperature of 20° C. (hereinafter sometimes referred to as “liquid epoxy resins”) and solid epoxy resins at a temperature of 20° C. (hereinafter sometimes referred to as “solid epoxy resins”). ). In one embodiment, the resin composition of the present invention contains a liquid epoxy resin as the epoxy resin. In one embodiment, the resin composition of the present invention contains a solid epoxy resin as the epoxy resin. The resin composition of the present invention may contain only a liquid epoxy resin as an epoxy resin, or may contain only a solid epoxy resin, and may contain a combination of a liquid epoxy resin and a solid epoxy resin. is preferred.

A liquid epoxy resin having two or more epoxy groups in one molecule is preferable as the liquid epoxy resin.

Examples of liquid epoxy resins include bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol AF type epoxy resin, naphthalene type epoxy resin, glycidyl ester type epoxy resin, glycidyl amine type epoxy resin, phenol novolak type epoxy resin, ester skeleton. An alicyclic epoxy resin, a cyclohexane type epoxy resin, a cyclohexanedimethanol type epoxy resin, a glycidylamine type epoxy resin, and an epoxy resin having a butadiene structure are preferred.

Specific examples of liquid epoxy resins include "HP4032", "HP4032D", and "HP4032SS" (naphthalene type epoxy resins) manufactured by DIC; "828US", "828EL", "jER828EL", and "825" manufactured by Mitsubishi Chemical Corporation; ", "Epikote 828EL" (bisphenol A type epoxy resin); "jER807" and "1750" (bisphenol F type epoxy resin) manufactured by Mitsubishi Chemical Corporation; "jER152" (phenol novolac type epoxy resin) manufactured by Mitsubishi Chemical Corporation; "630" and "630LSD" (glycidylamine type epoxy resin) manufactured by Mitsubishi Chemical Corporation; "ZX1059" manufactured by Nippon Steel & Sumikin Chemical Co., Ltd. (mixture of bisphenol A type epoxy resin and bisphenol F type epoxy resin); Nagase ChemteX Corporation "EX-721" (glycidyl ester type epoxy resin) manufactured by Daicel; "Celoxide 2021P" manufactured by Daicel (alicyclic epoxy resin having an ester skeleton); "PB-3600" manufactured by Daicel; "JP-100", "JP-200" (epoxy resin having a butadiene structure); "ZX1658" and "ZX1658GS" (liquid 1,4-glycidylcyclohexane type epoxy resin) manufactured by Nippon Steel & Sumikin Chemical Co., Ltd., and the like. These may be used individually by 1 type, and may be used in combination of 2 or more types.

The solid epoxy resin is preferably a solid epoxy resin having 3 or more epoxy groups per molecule, more preferably an aromatic solid epoxy resin having 3 or more epoxy groups per molecule.

Solid epoxy resins include bixylenol type epoxy resin, naphthalene type epoxy resin, naphthalene type tetrafunctional epoxy resin, cresol novolak type epoxy resin, dicyclopentadiene type epoxy resin, trisphenol type epoxy resin, naphthol type epoxy resin, biphenyl type epoxy resin, naphthylene ether type epoxy resin, anthracene type epoxy resin, bisphenol A type epoxy resin, bisphenol AF type epoxy resin, and tetraphenylethane type epoxy resin.

Specific examples of solid epoxy resins include "HP4032H" (naphthalene-type epoxy resin) manufactured by DIC; "HP-4700" and "HP-4710" (naphthalene-type tetrafunctional epoxy resin) manufactured by DIC; "N-690" (cresol novolac type epoxy resin) manufactured by DIC Corporation; "N-695" (cresol novolac type epoxy resin) manufactured by DIC Corporation; "HP-7200" (dicyclopentadiene type epoxy resin) manufactured by DIC Corporation; DIC's "HP-7200HH", "HP-7200H", "EXA-7311", "EXA-7311-G3", "EXA-7311-G4", "EXA-7311-G4S", "HP6000" ( Naphthylene ether type epoxy resin); Nippon Kayaku Co., Ltd. "EPPN-502H" (trisphenol type epoxy resin); Nippon Kayaku Co., Ltd. "NC7000L" (naphthol novolac type epoxy resin); "NC3000H", "NC3000", "NC3000L", "NC3100" (biphenyl type epoxy resin); "ESN475V" (naphthol type epoxy resin) manufactured by Nippon Steel & Sumikin Chemical Co., Ltd.; type epoxy resin); "YX4000H", "YX4000", "YL6121" (biphenyl type epoxy resin) manufactured by Mitsubishi Chemical Corporation; "YX4000HK" (bixylenol type epoxy resin) manufactured by Mitsubishi Chemical Corporation; YX8800" (anthracene type epoxy resin); "YX7700" (xylene structure-containing novolac type epoxy resin) manufactured by Mitsubishi Chemical; "PG-100" and "CG-500" manufactured by Osaka Gas Chemicals; "YL7760" (bisphenol AF type epoxy resin); "YL7800" (fluorene type epoxy resin) manufactured by Mitsubishi Chemical Corporation; "jER1010" (solid bisphenol A type epoxy resin) manufactured by Mitsubishi Chemical Corporation; jER1031S" (tetraphenylethane type epoxy resin) and the like. These may be used individually by 1 type, and may be used in combination of 2 or more types.

(A) When a liquid epoxy resin and a solid epoxy resin are used in combination as the epoxy resin, the ratio by mass (liquid epoxy resin: solid epoxy resin) is preferably 1:1 to 1:30. , more preferably 1:1 to 1:20, particularly preferably 1:1 to 1:10. The desired effect of the present invention can be remarkably obtained by setting the amount ratio of the liquid epoxy resin to the solid epoxy resin within such a range.

(A) The epoxy equivalent of the epoxy resin is preferably 50 g/eq. ~5000g/eq. , more preferably 50 g/eq. ~3000g/eq. , more preferably 80 g/eq. ~2000 g/eq. , even more preferably 110 g/eq. ~1000g/eq. is. Within this range, the crosslink density of the cured product of the resin sheet is sufficient, and an insulating layer with a small surface roughness can be obtained. Epoxy equivalent weight is the mass of resin containing one equivalent of epoxy groups. This epoxy equivalent can be measured according to JIS K7236.

(A) The weight average molecular weight (Mw) of the epoxy resin is preferably 100 to 5000, more preferably 250 to 3000, still more preferably 400 to 1500, from the viewpoint of significantly obtaining the desired effects of the present invention. The weight average molecular weight of the resin can be measured as a polystyrene-equivalent value by a gel permeation chromatography (GPC) method.

The content of (A) the epoxy resin is not particularly limited, but when the non-volatile components other than the component (B) in the resin composition are 100% by mass, the desired effects of the present invention are remarkably obtained. From the viewpoint, it is preferably 5% by mass or more, more preferably 10% by mass or more, still more preferably 15% by mass or more, and particularly preferably 20% by mass or more. The upper limit is preferably 60% by mass or less, more preferably 50% by mass or less, even more preferably 40% by mass or less, and particularly preferably 30% by mass or less, from the viewpoint of significantly obtaining the desired effects of the present invention.

<(B) Inorganic filler>
The resin composition of the present invention contains (B) an inorganic filler.

(B) The material of the inorganic filler is not particularly limited, but examples include silica, alumina, glass, cordierite, silicon oxide, barium sulfate, barium carbonate, talc, clay, mica powder, zinc oxide, hydrotalcite, Boehmite, aluminum hydroxide, magnesium hydroxide, calcium carbonate, magnesium carbonate, magnesium oxide, boron nitride, aluminum nitride, manganese nitride, aluminum borate, strontium carbonate, strontium titanate, calcium titanate, magnesium titanate, bismuth titanate , titanium oxide, zirconium oxide, barium titanate, barium zirconate titanate, barium zirconate, calcium zirconate, zirconium phosphate, and zirconium tungstate phosphate, with silica and alumina being particularly preferred. Examples of silica include amorphous silica, fused silica, crystalline silica, synthetic silica, and hollow silica. As silica, spherical silica is preferable. (B) The inorganic filler may be used singly or in combination of two or more.

(B) Commercially available inorganic fillers include, for example, “UFP-30” manufactured by Denka Kagaku Kogyo; “SP60-05” and “SP507-05” manufactured by Nippon Steel & Sumikin Materials; "YC100C", "YA050C", "YA050C-MJE", "YA010C"; "UFP-30" manufactured by Denka; 5N”; Admatechs “SC2500SQ”, “SO-C4”, “SO-C2”, “SO-C1”, “A23-SX-C1”; Denka “DAW-03”, “FB -105FD” and the like.

The average particle size of the inorganic filler (B) is not particularly limited, but is preferably 40 µm or less, more preferably 30 µm or less, still more preferably 20 µm or less, even more preferably 10 µm or less, and particularly preferably 5 µm or less. is. The lower limit of the average particle size of the inorganic filler is not particularly limited, but is preferably 0.01 µm or more, more preferably 0.05 µm or more, still more preferably 0.1 µm or more, and still more preferably 0.2 µm or more. , more preferably 0.3 μm or more, and particularly preferably 0.4 μm or more. The average particle size of the inorganic filler can be measured by a laser diffraction/scattering method based on Mie scattering theory. Specifically, the particle size distribution of the inorganic filler is prepared on a volume basis using a laser diffraction/scattering type particle size distribution measuring device, and the median diameter can be used as the average particle size for measurement. A measurement sample can be obtained by weighing 100 mg of an inorganic filler and 10 g of methyl ethyl ketone in a vial and dispersing them with ultrasonic waves for 10 minutes. A measurement sample is measured using a laser diffraction particle size distribution measuring device, the wavelengths of the light source used are blue and red, the volume-based particle size distribution of the inorganic filler is measured by the flow cell method, and from the obtained particle size distribution The average particle diameter was calculated as the median diameter. Examples of the laser diffraction particle size distribution analyzer include "LA-960" manufactured by Horiba, Ltd., and the like.

(B) Inorganic fillers include aminosilane-based coupling agents, epoxysilane-based coupling agents, mercaptosilane-based coupling agents, alkoxysilane compounds, organosilazane compounds, titanate-based coupling agents, from the viewpoint of improving moisture resistance and dispersibility. It is preferably treated with one or more surface treatment agents such as agents. Examples of commercially available surface treatment agents include "KBM403" (3-glycidoxypropyltrimethoxysilane) manufactured by Shin-Etsu Chemical Co., Ltd., "KBM803" (3-mercaptopropyltrimethoxysilane) manufactured by Shin-Etsu Chemical Co., Ltd., Shin-Etsu Chemical Industry Co., Ltd. "KBE903" (3-aminopropyltriethoxysilane), Shin-Etsu Chemical Co., Ltd. "KBM573" (N-phenyl-3-aminopropyltrimethoxysilane), Shin-Etsu Chemical Co., Ltd. "SZ-31" ( Hexamethyldisilazane), Shin-Etsu Chemical Co., Ltd. "KBM103" (phenyltrimethoxysilane), Shin-Etsu Chemical Co., Ltd. "KBM-4803" (long-chain epoxy type silane coupling agent), Shin-Etsu Chemical Co., Ltd. "KBM- 7103” (3,3,3-trifluoropropyltrimethoxysilane), “KBM503” (3-methacryloxypropyltrimethoxysilane) manufactured by Shin-Etsu Chemical Co., Ltd., “KBM5783” manufactured by Shin-Etsu Chemical Co., Ltd., and the like.

From the viewpoint of improving the dispersibility of the inorganic filler, the degree of surface treatment with the surface treatment agent is preferably within a predetermined range. Specifically, 100% by mass of the inorganic filler is preferably surface-treated with a surface treatment agent of 0.2% to 5% by mass, and is surface-treated with 0.2% to 3% by mass. preferably 0.3 mass % to 2 mass % of the surface treatment.

The degree of surface treatment by the surface treatment agent can be evaluated by the amount of carbon per unit surface area of the inorganic filler. The amount of carbon per unit surface area of the inorganic filler is preferably 0.02 mg/m ² or more, more preferably 0.1 mg/m ² or more, and more preferably 0.2 mg/m ² from the viewpoint of improving the dispersibility of the inorganic filler. The above is more preferable. On the other hand, from the viewpoint of preventing an increase in the melt viscosity of the resin composition and the melt viscosity in the form of a sheet, it is preferably 1 mg/m ² or less, more preferably 0.8 mg/m ² or less, and 0.5 mg/m ² or less. More preferred.

(B) The amount of carbon per unit surface area of the inorganic filler can be measured after the surface-treated inorganic filler is washed with a solvent (eg, methyl ethyl ketone (MEK)). Specifically, a sufficient amount of MEK as a solvent is added to the inorganic filler surface-treated with the surface treatment agent, and ultrasonic cleaning is performed at 25° C. for 5 minutes. After removing the supernatant liquid and drying the solid content, a carbon analyzer can be used to measure the amount of carbon per unit surface area of the inorganic filler. As a carbon analyzer, "EMIA-320V" manufactured by Horiba Ltd. can be used.

(B) The specific surface area of the inorganic filler is preferably 0.01 m ² /g or more, more preferably 0.1 m ² /g or more, and particularly preferably 0.2 m ² from the viewpoint of further improving the effects of the present invention. / g or more. Although there is no particular upper limit, it is preferably 50 m ² /g or less, more preferably 20 m ² /g or less, 10 m ² /g or less, or 5 m ² /g or less. The specific surface area of the inorganic filler is determined by adsorbing nitrogen gas on the sample surface using a specific surface area measuring device (Macsorb HM-1210 manufactured by Mountech) according to the BET method, and calculating the specific surface area using the BET multipoint method. obtained by

(B) The content of the inorganic filler is not particularly limited, but when all non-volatile components in the resin composition are 100% by mass, from the viewpoint of using it for a specific application, it is preferably 300% by mass. % or more, more preferably 50 mass % or more, still more preferably 60 mass % or more, and particularly preferably 70 mass % or more. In general, a resin composition containing a large amount of inorganic filler tends to warp greatly, but the resin composition of the present invention containing a combination of components (A) to (C) has a large amount of (B). , warpage can be effectively suppressed. On the other hand, the upper limit of the content of the inorganic filler (B) is not particularly limited, but may be, for example, 98% by mass or less, 95% by mass or less, 90% by mass or less, 85% by mass or less.

<(C) Benzoxazine compound having an alicyclic structure in the molecule>
The resin composition of the present invention contains (C) a benzoxazine compound having an alicyclic structure in the molecule. By using the component (C), the flexibility of the cured product of the resin composition can be increased and the elastic modulus can be lowered. Also, excellent adhesion can be achieved.

The "benzoxazine compound" in component (C) means a compound having a 3,4-dihydro-2H-1,3-benzoxazine ring (hereinafter sometimes abbreviated as "dihydrobenzoxazine ring"). The compound preferably has two or more dihydrobenzoxazine rings in the molecule. When the component (C) has two or more dihydrobenzoxazine rings, the two or more dihydrobenzoxazine rings are preferably bonded to the nitrogen atom of the ring via a linking group. Component (C) preferably has an alicyclic structure in the linking group. Furthermore, each dihydrobenzoxazine ring may have a substituent.

Therefore, (C) the benzoxazine compound having an alicyclic structure in the molecule preferably has the formula (1):

[Wherein, each R independently represents a substituent, X represents an m-valent linking group having an alicyclic structure, m represents an integer of 2 or more, n represents 0 to 4 indicates an integer of . ]
It is a compound represented by

In formula (1), the "substituent" for R is not particularly limited as long as it does not interfere with the function of component (C). substituted or unsubstituted alkyl group, substituted or unsubstituted alkenyl group, substituted or unsubstituted alkoxy group, substituted or unsubstituted alkylcarbonyl group, substituted or unsubstituted aryl group, substituted or unsubstituted heteroaryl group, A substituted or unsubstituted aryloxy group, a substituted or unsubstituted arylcarbonyl group, a substituted or unsubstituted aralkyl group, and the like.

"Halogen atom" includes, for example, a fluorine atom, a chlorine atom, a bromine atom, and the like.

"Alkyl group" refers to a linear, branched or cyclic monovalent aliphatic saturated hydrocarbon group. The "alkyl group" is preferably an alkyl group having 1 to 6 carbon atoms, more preferably an alkyl group having 1 to 3 carbon atoms. "Alkyl group" includes, for example, methyl group, ethyl group, propyl group, isopropyl group, butyl group, isobutyl group, sec-butyl group, tert-butyl group, pentyl group, isopentyl group, neopentyl group, cyclopentyl group, cyclohexyl and the like. The substituents of the alkyl group in the "substituted or unsubstituted alkyl group" are not particularly limited, but examples include halogen atoms, cyano groups, alkoxy groups, alkylcarbonyl groups, aryl groups, heteroaryl groups, aryl oxy group, arylcarbonyl group, amino group, nitro group, hydroxy group and the like. The number of substituents is preferably 1 to 3, more preferably 1.

"Alkoxy group" refers to a monovalent group (alkyl-O-) formed by bonding an alkyl group to an oxygen atom. The "alkoxy group" is preferably an alkoxy group having 1 to 6 carbon atoms, more preferably an alkoxy group having 1 to 3 carbon atoms. Examples of "alkoxy group" include methoxy group, ethoxy group, propoxy group, isopropoxy group, butoxy group, isobutoxy group, sec-butoxy group, tert-butoxy group, pentyloxy group and the like. Substituents for the alkoxy group in the "substituted or unsubstituted alkoxy group" are not particularly limited, but examples include a halogen atom, a cyano group, an alkoxy group, an alkylcarbonyl group, an aryl group, a heteroaryl group, and an aryl oxy group, arylcarbonyl group, amino group, nitro group, hydroxy group and the like. The number of substituents is preferably 1 to 3, more preferably 1.

An "alkenyl group" refers to a linear, branched or cyclic monovalent unsaturated hydrocarbon group having at least one carbon-carbon double bond. The "alkenyl group" is preferably an alkenyl group having 2 to 6 carbon atoms, more preferably an alkenyl group having 2 or 3 carbon atoms. Examples of "alkenyl group" include vinyl group, 1-propenyl group, 2-propenyl group, 2-methyl-1-propenyl group, 1-butenyl group, 2-butenyl group, 3-butenyl group, 3-methyl- 2-butenyl group, 1-pentenyl group, 2-pentenyl group, 3-pentenyl group, 4-pentenyl group, 4-methyl-3-pentenyl group, 1-hexenyl group, 3-hexenyl group, 5-hexenyl group, 2 -cyclohexenyl group and the like. The substituents of the alkenyl group in the "substituted or unsubstituted alkenyl group" are not particularly limited, but examples include halogen atoms, cyano groups, alkoxy groups, alkylcarbonyl groups, aryl groups, heteroaryl groups, aryl oxy group, arylcarbonyl group, amino group, nitro group, hydroxy group and the like. The number of substituents is preferably 1 to 3, more preferably 1.

"Alkylcarbonyl group" refers to a monovalent group (alkyl-CO-) formed by bonding an alkyl group to a carbonyl. The "alkylcarbonyl group" is preferably an alkylcarbonyl group having 2 to 7 carbon atoms, more preferably an alkylcarbonyl group having 2 to 4 carbon atoms. "Alkylcarbonyl group" includes, for example, acetyl group, propanoyl group, butanoyl group, 2-methylpropanoyl group, pentanoyl group, 3-methylbutanoyl group, 2-methylbutanoyl group, 2,2-dimethylpropanoyl group, hexanoyl group, heptanoyl group and the like. The substituents of the alkylcarbonyl group in the "substituted or unsubstituted alkylcarbonyl group" are not particularly limited, but examples include halogen atoms, cyano groups, alkoxy groups, alkylcarbonyl groups, aryl groups, heteroaryl groups. , an aryloxy group, an arylcarbonyl group, an amino group, a nitro group, a hydroxy group, and the like. The number of substituents is preferably 1 to 3, more preferably 1.

An "aryl group" refers to a monovalent aromatic hydrocarbon group. The "aryl group" is preferably an aryl group having 6 to 14 carbon atoms, more preferably an aryl group having 6 to 10 carbon atoms. The "aryl group" includes, for example, a phenyl group, a 1-naphthyl group, a 2-naphthyl group and the like, preferably a phenyl group. The substituents of the aryl group in the "substituted or unsubstituted aryl group" are not particularly limited, but examples include halogen atoms, cyano groups, alkyl groups, alkoxy groups, alkylcarbonyl groups, aryl groups, heteroaryl group, aryloxy group, arylcarbonyl group, aralkyl group, amino group, nitro group, hydroxy group and the like. The number of substituents is preferably 1 to 3, more preferably 1.

The term “heteroaryl group” refers to a monovalent aromatic heterocyclic group having 1 to 4 heteroatoms selected from oxygen, nitrogen and sulfur atoms in addition to carbon atoms as ring-constituting atoms. The “heteroaryl group” is preferably a 5- to 12-membered (preferably 5- or 6-membered) monocyclic, bicyclic or tricyclic (preferably monocyclic) aromatic heterocyclic group. Examples of the "heteroaryl group" include furyl, thienyl, pyrrolyl, oxazolyl, isoxazolyl, thiazolyl, isothiazolyl, imidazolyl, pyrazolyl, 1,2,3-oxadiazolyl, 1,2, 4-oxadiazolyl group, 1,3,4-oxadiazolyl group, furazanyl group, 1,2,3-thiadiazolyl group, 1,2,4-thiadiazolyl group, 1,3,4-thiadiazolyl group, 1,2,3- triazolyl group, 1,2,4-triazolyl group, tetrazolyl group, pyridyl group, pyridazinyl group, pyrimidinyl group, pyrazinyl group, triazinyl group and the like. The substituents of the heteroaryl group in the "substituted or unsubstituted heteroaryl group" are not particularly limited, but examples include halogen atoms, cyano groups, alkyl groups, alkoxy groups, alkylcarbonyl groups, aryl groups, heteroaryl groups, aryloxy groups, arylcarbonyl groups, aralkyl groups, amino groups, nitro groups, hydroxy groups and the like. The number of substituents is preferably 1 to 3, more preferably 1.

"Aryloxy group" refers to a monovalent group (aryl-O-) formed by bonding an aryl group to an oxygen atom. The "aryloxy group" is preferably an aryloxy group having 6 to 14 carbon atoms, more preferably an aryloxy group having 6 to 10 carbon atoms. The "aryloxy group" includes, for example, a phenoxy group, a naphthoxy group and the like. The substituents of the aryloxy group in the "substituted or unsubstituted aryloxy group" are not particularly limited, but examples include halogen atoms, cyano groups, alkyl groups, alkoxy groups, alkylcarbonyl groups, aryl groups, heteroaryl groups, aryloxy groups, arylcarbonyl groups, aralkyl groups, amino groups, nitro groups, hydroxy groups and the like. The number of substituents is preferably 1 to 3, more preferably 1.

"Arylcarbonyl group" refers to a monovalent group (aryl-CO-) formed by bonding an aryl group to a carbonyl. The "arylcarbonyl group" is preferably an arylcarbonyl group having 7 to 15 carbon atoms, more preferably an arylcarbonyl group having 7 to 11 carbon atoms. Examples of "arylcarbonyl group" include benzoyl group, 1-naphthoyl group, 2-naphthoyl group and the like. The substituents of the arylcarbonyl group in the "substituted or unsubstituted arylcarbonyl group" are not particularly limited, but examples include halogen atoms, cyano groups, alkyl groups, alkoxy groups, alkylcarbonyl groups, aryl groups, heteroaryl groups, aryloxy groups, arylcarbonyl groups, aralkyl groups, amino groups, nitro groups, hydroxy groups and the like. The number of substituents is preferably 1 to 3, more preferably 1.

An "aralkyl group" refers to an alkyl group substituted with one or more aryl groups. The “aralkyl group” is preferably an aralkyl group having 7 to 15 carbon atoms, more preferably an aralkyl group having 7 to 11 carbon atoms. "Aralkyl group" includes, for example, benzyl group, phenethyl group, 2-naphthylmethyl group and the like. The substituents of the aralkyl group in the "substituted or unsubstituted aralkyl group" are not particularly limited, but examples include halogen atoms, cyano groups, alkyl groups, alkoxy groups, alkylcarbonyl groups, aryl groups, heteroaryl group, aryloxy group, arylcarbonyl group, aralkyl group, amino group, nitro group, hydroxy group and the like. The number of substituents is preferably 1 to 3, more preferably 1.

In formula (1), n represents an integer of 0 to 4, preferably 0 or 1, more preferably 0. That is, the dihydrobenzoxazine ring is more preferably unsubstituted.

In formula (1), the "m-valent linking group having an alicyclic structure" for X is not particularly limited as long as it has at least one alicyclic structure. The number of alicyclic structures in component (C) is not particularly limited, but is preferably 1 to 5, more preferably 1 to 3, even more preferably 1 or 2. As the ring structure of the alicyclic structure in the component (C), a cycloalkane ring, a cycloalkene ring, and at least one skeletal carbon atom thereof may be -O-, -S-, -SO ₂ -, -NH- , --CO--, --CONH--, --NHCO--, --COO--, and --OCO-- and aliphatic heterocycles substituted with a heteroatom-containing group selected from among these, cycloalkane rings are preferred.

"Cycloalkane ring" refers to a monocyclic or polycyclic saturated aliphatic hydrocarbon ring. The "cycloalkane ring" is preferably a cycloalkane ring having 3 to 10 carbon atoms. Examples of the "cycloalkane ring" include monocycloalkane rings such as cyclobutane ring, cyclopentane ring, cyclohexane ring, cycloheptane ring and cyclooctane ring; bicycloalkane rings such as decalin ring and norbornane ring; spiro ring such as spirononane ring; An alkane ring and the like can be mentioned.

"Cycloalkene ring" refers to a monocyclic or polycyclic saturated aliphatic hydrocarbon ring having at least one carbon-carbon double bond. The "cycloalkene ring" is preferably a cycloalkene ring having 3 to 10 carbon atoms. The "cycloalkane ring" includes, for example, monocycloalkene rings such as cyclobutene ring, cyclopropene ring, cyclohexene ring, cyclohexadiene ring, cycloheptene ring and cyclooctene ring; bicycloalkene rings such as norbornene ring and norbornadiene ring; spirononene ring and the like spiroalkene rings.

The number of skeleton atoms in the “m-valent linking group having an alicyclic structure” is preferably 3-200, more preferably 3-100, still more preferably 3-50, and particularly preferably 3-20. The skeleton atoms may be selected from carbon atoms, oxygen atoms, nitrogen atoms, and sulfur atoms.

The "m-valent linking group having an alicyclic structure" for X in formula (1) is preferably a substituted or unsubstituted m-valent ring-containing saturated aliphatic group. Here, the substituents of the ring-containing saturated aliphatic group in the "substituted or unsubstituted m-valent ring-containing saturated aliphatic group" include those similar to the substituents of R, but are unsubstituted. is preferred. "Ring-containing saturated aliphatic group" means a saturated hydrocarbon group containing at least one cycloalkane ring (hereinafter referred to as "ring-containing saturated hydrocarbon group"); -S-, -SO ₂ -, -NH-, -CO-, -CONH-, -NHCO-, -COO-, and -OCO- substituted with a heteroatom-containing group (hereinafter referred to as "ring-containing saturated (referred to as "hydrocarbon heteroatom substituents").

In formula (1), m represents an integer of 2 or more, preferably 2 or 3, more preferably 2. Thus, in more preferred embodiments where m is 2, X is preferably a substituted or unsubstituted divalent ring-containing saturated aliphatic group. Both end atoms of the "divalent ring-containing saturated aliphatic group" are preferably arbitrary carbon atoms, more preferably carbon atoms constituting a ring.

Specific examples of the "divalent ring-containing saturated aliphatic group" for X in formula (1) include -cHex-, -cPent-, -DECAL-, -NORBOR-, -cHex-cHex-, - cPent-cPent-, -cHex-CH ₂ -cHex-, -cPent-CH ₂ -cPent-, -cHex-CH ₂ -CH ₂ -cHex-, -cPent-CH ₂ -CH ₂ -cPent-, -cHex- _CH2 - _CH2 - _CH2 -cHex-, -cPent- _CH2 - _CH2 - _CH2 -cPent-, -cHex-CH( _CH3 )-cHex-, -cPent-CH( _CH3 )-cPent- , -cHex-CH(CH ₂ CH ₃ )-cHex-, -cPent-CH(CH ₂ CH ₃ )-cPent-, -cHex-C(CH ₃ ) ₂ -cHex-, -cPent-C(CH ₃ ) ₂ -cPent-, -cHex-C(CH ₂ CH ₃ ) ₂ -cHex-, -cPent-C(CH ₂ CH ₃ ) ₂ -cPent- and other bivalent ring-containing saturated hydrocarbon groups; -cHex-O -cHex-, -cPent-O-cPent-, -cHex-O-CH ₂ -CH ₂ -O-cHex-, -cPent-O-CH ₂ -CH ₂ -O-cPent-, -cHex-S-cHex -, -cPent-S-cPent-, -cHex-S-CH ₂ -CH ₂ -S-cHex-, -cPent-S-CH ₂ -CH ₂ -S-cPent-, -cHex-CO-cHex-, -cPent-CO-cPent-, -cHex-SO ₂ -cHex-, -cPent-SO ₂ -cPent-, -cHex-CONH-cHex-, -cPent-CONH-cPent-, -cHex-NHCO-cHex-, -cPent-NHCO-cPent-, -cHex-COO-cHex-, -cPent-COO-cPent-, -cHex-OCO-cHex-, -cPent-OCO-cPent- and other bivalent ring-containing saturated hydrocarbon hetero Atom substituents are included. Here, "cHex" represents a 1,4-cyclohexylene group, a 1,3-cyclohexylene group, or a 1,2-cyclohexylene group. "cPent" represents a 1,3-cyclopentylene group or a 1,2-cyclopentylene group. "DECAL" represents a divalent decalin group, including a 2,6-bicyclo[4.4.0]decanylene group, a 2,7-bicyclo[4.4.0]decanylene group and the like. "NORBOR" represents a divalent norbornane group, including a 2,5-bicyclo[2.2.1]heptylene group, a 2,6-bicyclo[2.2.1]heptylene group and the like.

The alicyclic structure of component (C) is preferably a cyclohexane ring structure. That is, the component (C) preferably has one or more cyclohexane ring structures in its molecule. A cyclohexane ring structure may be part of a bicycloalkane ring structure. In this case, preferred examples of the "divalent ring-containing saturated aliphatic group" for X in formula (1) include -cHex-, -DECAL-, -NORBOR-, -cHex-cHex-, -cHex-CH ₂ -cHex-, -cHex-CH ₂ -CH ₂ -cHex-, -cHex-CH ₂ -CH ₂ -CH ₂ -cHex-, -cHex-CH(CH ₃ )-cHex-, -cHex-CH(CH ₂ CH ₃ )-cHex-, -cHex-C(CH ₃ ) ₂ -cHex-, -cHex-C(CH ₂ CH ₃ ) ₂ -cHex- and other bivalent ring-containing saturated hydrocarbon groups; -cHex- O-cHex-, -cHex-O-CH ₂ -CH ₂ -O-cHex-, -cHex-S-cHex-, -cHex-S-CH ₂ -CH ₂ -S-cHex-, -cHex-CO- Divalent ring-containing such as cHex-, -cHex-SO ₂ -cHex-, -cHex-CONH-cHex-, -cHex-NHCO-cHex-, -cHex-COO-cHex-, -cHex-OCO-cHex- Saturated hydrocarbon heteroatom substituents are included.

(C) A benzoxazine compound having an alicyclic structure in the molecule is particularly preferably represented by formula (2):

[wherein R ¹ and R ² each independently represent a substituent, Y is a bond, an alkylene group having 1 to 6 carbon atoms, -O-, -S-, -SO ₂ -, -NH-, -CO-, -CONH-, -NHCO-, -COO-, or -OCO-, s and t are each independently an integer of 0 to 4, u is 0 or 1 is shown. ]
It is a compound represented by The “substituent” for R ¹ and R ² is the same as the substituent for R in formula (1). s and t are each independently preferably 0 or 1, particularly preferably 0.

"Alkylene group" refers to a linear, branched or cyclic divalent aliphatic saturated hydrocarbon group. The number of carbon atoms in the "alkylene group having 1 to 6 carbon atoms" is preferably 1 to 3. Examples of the "alkylene group having 1 to 6 carbon atoms" include -CH ₂ -, -CH ₂ -CH ₂ -, -CH(CH ₃ )-, -CH ₂ -CH ₂ -CH ₂ -, -CH ₂ -CH(CH ₃ )-, -CH(CH ₃ )-CH ₂ -, -C(CH ₃ ) ₂ -, -CH ₂ -CH ₂ -CH ₂ -CH ₂ -, -CH ₂ -CH ₂ - CH(CH ₃ )-, -CH ₂ -CH(CH ₃ )-CH ₂ -, -CH(CH ₃ )-CH ₂ -CH ₂ -, -CH ₂ -C(CH ₃ ) ₂ -, -C( CH ₃ ) ₂ -CH ₂ -, -cHex- and the like.

(C) Specific examples of benzoxazine compounds having an alicyclic structure in the molecule include 1,4-di(3,4-dihydro-2H-1,3-benzoxazin-3-yl)cyclohexane, bis[ 4-(3,4-dihydro-2H-1,3-benzoxazin-3-yl)cyclohexyl]methane, 1,2-bis[4-(3,4-dihydro-2H-1,3-benzoxazine- 3-yl)cyclohexyl]ethane, 2,2-bis[4-(3,4-dihydro-2H-1,3-benzoxazin-3-yl)cyclohexyl]propane, bis[4-(3,4-dihydro -2H-1,3-benzoxazin-3-yl)cyclohexyl]ether, bis[4-(3,4-dihydro-2H-1,3-benzoxazin-3-yl)cyclohexyl]sulfone and the like.

Although the molecular weight of component (C) is not particularly limited, it is preferably 5,000 or less, more preferably 3,000 or less, from the viewpoint of significantly obtaining the desired effects of the present invention. , is more preferably 2,000 or less, and particularly preferably 1,000 or less.

(C) The content of the benzoxazine compound having an alicyclic structure in the molecule is not particularly limited, but when the non-volatile components other than the component (B) in the resin composition are 100% by mass, From the viewpoint of significantly obtaining the desired effects of the present invention, the content is preferably 0.1% by mass or more, more preferably 1% by mass or more, still more preferably 3% by mass or more, and particularly preferably 5% by mass or more. The upper limit is preferably 30% by mass or less, more preferably 20% by mass or less, even more preferably 10% by mass or less, and particularly preferably 8% by mass or less, from the viewpoint of significantly obtaining the desired effects of the present invention.

<(D) Elastomer>
The resin composition of the present invention may contain (D) an elastomer as an optional component. By using (D) an elastomer, the flexibility of the cured product of the resin composition can be increased and the elastic modulus can be decreased.

In the present invention, the elastomer (D) means a flexible resin, which is an amorphous resin component that dissolves in an organic solvent, and is preferably a resin having rubber elasticity or a resin that exhibits rubber elasticity by polymerization with other components. . Examples of rubber elasticity include resins exhibiting an elastic modulus of 1 GPa or less when subjected to a tensile test at a temperature of 25° C. and a humidity of 40% RH according to Japanese Industrial Standards (JIS K7161).

In one embodiment, component (D) is selected from polybutadiene structure, polysiloxane structure, poly(meth)acrylate structure, polyalkylene structure, polyalkyleneoxy structure, polyisoprene structure, polyisobutylene structure, and polycarbonate structure in the molecule. It is preferable that the resin has one or more structures selected from polybutadiene structures and polycarbonate structures from the viewpoint of obtaining flexible materials. In addition, "(meth)acrylate" refers to methacrylate and acrylate.

In another embodiment, component (D) is preferably one or more selected from resins having a glass transition temperature (Tg) of 25°C or lower and resins that are liquid at 25°C or lower. The glass transition temperature of the resin having a glass transition temperature (Tg) of 25° C. or lower is preferably 20° C. or lower, more preferably 15° C. or lower. Although the lower limit of the glass transition temperature is not particularly limited, it is usually −15° C. or higher. The resin that is liquid at 25°C is preferably a resin that is liquid at 20°C or lower, more preferably a resin that is liquid at 15°C or lower.

In a more preferred embodiment, the component (D) is one or more selected from resins having a glass transition temperature of 25° C. or lower and being liquid at 25° C., and having a polybutadiene structure and a polysiloxane structure in the molecule. , a poly(meth)acrylate structure, a polyalkylene structure, a polyalkyleneoxy structure, a polyisoprene structure, a polyisobutylene structure, and a polycarbonate structure.

The polybutadiene structure includes not only a structure formed by polymerizing butadiene but also a structure formed by hydrogenating the structure. Also, the butadiene structure may be partially hydrogenated or entirely hydrogenated. Furthermore, the polybutadiene structure may be contained in the main chain or in the side chains of component (D).

Preferred examples of polybutadiene resins include hydrogenated polybutadiene skeleton-containing resins, hydroxyl group-containing polybutadiene resins, phenolic hydroxyl group-containing polybutadiene resins, carboxyl group-containing polybutadiene resins, acid anhydride group-containing polybutadiene resins, epoxy group-containing polybutadiene resins, and isocyanate group-containing polybutadiene resins. containing polybutadiene resin, urethane group-containing polybutadiene resin, and the like. Among them, a phenolic hydroxyl group-containing polybutadiene resin is more preferable. Here, the "hydrogenated polybutadiene skeleton-containing resin" refers to a resin in which at least a portion of the polybutadiene skeleton is hydrogenated, and does not necessarily have to be a resin in which the polybutadiene skeleton is completely hydrogenated. Examples of hydrogenated polybutadiene skeleton-containing resins include hydrogenated polybutadiene skeleton-containing epoxy resins. Examples of the phenolic hydroxyl group-containing polybutadiene resin include resins having a polybutadiene structure and having a phenolic hydroxyl group.

Specific examples of polybutadiene resins, which are resins having a polybutadiene structure in the molecule, include “Ricon 657” (epoxy group-containing polybutadiene), “Ricon 130MA8”, “Ricon 130MA13”, “Ricon 130MA20”, “Ricon 130MA20” manufactured by Clay Valley. Ricon 131MA5", "Ricon 131MA10", "Ricon 131MA17", "Ricon 131MA20", "Ricon 184MA6" (acid anhydride group-containing polybutadiene), "GQ-1000" (hydroxyl group- and carboxyl group-introduced polybutadiene), "G-1000 ”, “G-2000”, “G-3000” (both hydroxyl-terminated polybutadiene), “GI-1000”, “GI-2000”, “GI-3000” (both hydroxyl-terminated hydrogenated polybutadiene), manufactured by Daicel "PB3600", "PB4700" (polybutadiene skeleton epoxy compound), "Epofriend A1005", "Epofriend A1010", "Epofriend A1020" (epoxy compound of styrene, butadiene and styrene block copolymer), Nagase ChemteX Co., Ltd. "FCA-061L" (hydrogenated polybutadiene skeleton epoxy compound), "R-45EPT" (polybutadiene skeleton epoxy compound), and the like manufactured by the company.

Examples of preferred polybutadiene resins include linear polyimides made from hydroxyl group-terminated polybutadiene, diisocyanate compounds and polybasic acids or their anhydrides (Japanese Patent Application Laid-Open No. 2006-37083, International Publication No. 2008/153208). polyimide). The polybutadiene structure content of the polyimide resin is preferably 60% to 95% by mass, more preferably 75% to 85% by mass. Details of the polyimide resin can be referred to in JP-A-2006-37083 and WO 2008/153208, the contents of which are incorporated herein.

The number average molecular weight of the hydroxyl-terminated polybutadiene is preferably 500-5,000, more preferably 1,000-3,000. The hydroxyl group-terminated polybutadiene preferably has a hydroxyl group equivalent weight of 250 to 1,250.

Examples of diisocyanate compounds include aromatic diisocyanates such as toluene-2,4-diisocyanate, toluene-2,6-diisocyanate, xylylene diisocyanate and diphenylmethane diisocyanate; aliphatic diisocyanates such as hexamethylene diisocyanate; and alicyclic compounds such as isophorone diisocyanate. diisocyanates of the formula: Among these, aromatic diisocyanates are preferred, and toluene-2,4-diisocyanate is more preferred.

Examples of polybasic acids or anhydrides thereof include ethylene glycol bis-trimellitic acid, pyromellitic acid, benzophenonetetracarboxylic acid, biphenyltetracarboxylic acid, naphthalenetetracarboxylic acid, 5-(2,5-dioxotetrahydrofuryl)- Tetrabasic acids such as 3-methyl-cyclohexene-1,2-dicarboxylic acid and 3,3′-4,4′-diphenylsulfonetetracarboxylic acid and their anhydrides, and tribasic acids such as trimellitic acid and cyclohexanetricarboxylic acid Acids and their anhydrides, 1,3,3a,4,5,9b-hexahydro-5-(tetrahydro-2,5-dioxo-3-furanyl)-naphtho(1,2-C)furan-1,3 - dione and the like.

Also, the resin having a polybutadiene structure may include a polystyrene structure having a structure obtained by polymerizing styrene.

Specific examples of polystyrene resins, which are resins having a polystyrene structure in the molecule, include styrene-butadiene-styrene block copolymer (SBS), styrene-isoprene-styrene block copolymer (SIS), styrene-ethylene-butylene- Styrene block copolymer (SEBS), styrene-ethylene-propylene-styrene block copolymer (SEPS), styrene-ethylene-ethylene-propylene-styrene block copolymer (SEEPS), styrene-butadiene-butylene-styrene block copolymer polymer (SBBS), styrene-butadiene diblock copolymer, hydrogenated styrene-butadiene block copolymer, hydrogenated styrene-isoprene block copolymer, hydrogenated styrene-butadiene random copolymer and the like.

Commercially available polystyrene resins may be used, for example, hydrogenated styrene thermoplastic elastomer "H1041", "Tuftec H1043", "Tuftec P2000", "Tuftec MP10" (manufactured by Asahi Kasei Corporation); epoxidized styrene-butadiene Thermoplastic elastomers "Epofriend AT501" and "CT310" (manufactured by Daicel); Modified styrene elastomer having hydroxyl group "Septon HG252" (manufactured by Kuraray); Modified styrene elastomer having carboxyl group "Tuftec N503M", amino modified styrene elastomer "Tuftec N501" having an acid anhydride group; modified styrene elastomer "Tuftec M1913" (manufactured by Asahi Kasei Chemicals); unmodified styrene elastomer "Septon S8104" (manufactured by Kuraray Co., Ltd.); be able to. (C) component may be used individually by 1 type, and may be used in combination of 2 or more types.

A polysiloxane structure is a structure containing siloxane bonds, and is included in, for example, silicone rubber. The polysiloxane structure may be contained in the main chain or in the side chains of component (D).

Specific examples of the polysiloxane resin, which is a resin having a polysiloxane structure in the molecule, include "SMP-2006", "SMP-2003PGMEA", and "SMP-5005PGMEA" manufactured by Shin-Etsu Silicone Co., Ltd., amine group-terminated polysiloxane, Linear polyimides made from basic acid anhydrides (International Publication No. 2010/053185) and the like can be mentioned.

A poly(meth)acrylate structure is a structure formed by polymerizing acrylic acid or an acrylic acid ester, and includes a structure formed by polymerizing methacrylic acid or a methacrylic acid ester. The (meth)acrylate structure may be contained in the main chain or in the side chain of component (D).

Preferable examples of poly(meth)acrylate resins, which are resins having a poly(meth)acrylate structure in the molecule, include hydroxyl group-containing poly(meth)acrylate resins, phenolic hydroxyl group-containing poly(meth)acrylate resins, and carboxyl group-containing poly(meth)acrylate resins. Poly(meth)acrylate resins, acid anhydride group-containing poly(meth)acrylate resins, epoxy group-containing poly(meth)acrylate resins, isocyanate group-containing poly(meth)acrylate resins, urethane group-containing poly(meth)acrylate resins, etc.) mentioned.

Specific examples of poly(meth)acrylate resins include Teisan Resin "SG-70L", "SG-708-6", "WS-023", "SG-700AS" and "SG-280TEA" manufactured by Nagase ChemteX Corporation. ”(Carboxy group-containing acrylic acid ester copolymer resin, acid value 5-34 mgKOH / g, weight average molecular weight 400,000-900,000, Tg-30 ° C.-5 ° C.), “SG-80H”, “SG-80H- 3”, “SG-P3” (epoxy group-containing acrylic acid ester copolymer resin, epoxy equivalent 4761-14285 g/eq, weight average molecular weight 350,000-850,000, Tg 11° C.-12° C.), “SG-600TEA”, "SG-790"" (hydroxy group-containing acrylic acid ester copolymer resin, hydroxyl value 20-40 mgKOH/g, weight average molecular weight 500,000-1,200,000, Tg -37°C to -32°C), manufactured by Negami Kogyo Co., Ltd. "ME-2000", "W-116.3" (carboxy group-containing acrylic ester copolymer resin), "W-197C" (hydroxyl group-containing acrylic ester copolymer resin), "KG-25", " KG-3000" (epoxy group-containing acrylic acid ester copolymer resin) and the like.

The polyalkylene structure preferably has a given number of carbon atoms. Specifically, the number of carbon atoms in the polyalkylene structure is preferably 2 or more, more preferably 3 or more, particularly preferably 5 or more, and preferably 15 or less, more preferably 10 or less, and particularly preferably 6 or less. Moreover, the polyalkylene structure may be contained in the main chain or the side chain in the component (D).

The polyalkyleneoxy structure preferably has a given number of carbon atoms. Specifically, the number of carbon atoms in the polyalkyleneoxy structure is preferably 2 or more, preferably 3 or more, more preferably 5 or more, preferably 15 or less, more preferably 10 or less, and particularly preferably 6 or less. The polyalkyleneoxy structure may be contained in the main chain or in the side chain of component (D).

Specific examples of the polyalkylene resin that is a resin having a polyalkylene structure in the molecule and the polyalkyleneoxy resin that is a resin having a polyalkyleneoxy structure in the molecule include "PTXG-1000" and "PTXG" manufactured by Asahi Kasei Fibers Co., Ltd. -1800”, “YX-7180” manufactured by Mitsubishi Chemical Corporation (resin containing an alkylene structure having an ether bond), “EXA-4850-150”, “EXA-4816”, “EXA-4822” manufactured by DIC Corporation ”, “EP-4000”, “EP-4003”, “EP-4010”, “EP-4011” manufactured by ADEKA, “BEO-60E” manufactured by New Japan Chemical Co., Ltd., “BPO-20E”, Mitsubishi Chemical "YL7175" and "YL7410" manufactured by the company.

The polyisoprene structure may be contained in the main chain or the side chain in the component (D). Specific examples of the polyisoprene resin, which is a resin having a polyisoprene structure in its molecule, include "KL-610" and "KL-613" manufactured by Kuraray Co., Ltd., and the like.

The polyisobutylene structure may be contained in the main chain or in the side chains of component (D). Specific examples of polyisobutylene resins, which are resins having a polyisobutylene structure in the molecule, include Kaneka's "SIBSTAR-073T" (styrene-isobutylene-styrene triblock copolymer) and "SIBSTAR-042D" (styrene- isobutylene diblock copolymer) and the like.

The polycarbonate structure may be contained in the main chain or in the side chains of component (D).

Preferable examples of polycarbonate resins, which are resins having a polycarbonate structure in the molecule, include hydroxyl group-containing polycarbonate resins, phenolic hydroxyl group-containing polycarbonate resins, carboxy group-containing polycarbonate resins, acid anhydride group-containing polycarbonate resins, and epoxy group-containing polycarbonate resins. , isocyanate group-containing polycarbonate resins, urethane group-containing polycarbonate resins, and the like.

Specific examples of polycarbonate resins include "T6002" and "T6001" (polycarbonate diols) manufactured by Asahi Kasei Chemicals, and "C-1090", "C-2090" and "C-3090" (polycarbonate diols) manufactured by Kuraray Co., Ltd. etc.

Examples of preferred polycarbonate resins also include linear polyimides made from hydroxyl group-terminated polycarbonates, diisocyanate compounds and polybasic acids or their anhydrides. The linear polyimide has a urethane structure and a polycarbonate structure. The polycarbonate structure content of the polyimide resin is preferably 60% to 95% by mass, more preferably 75% to 85% by mass. Details of the polyimide resin can be referred to in International Publication No. 2016/129541, the content of which is incorporated herein.

The number average molecular weight of the hydroxyl group-terminated polycarbonate is preferably 500-5,000, more preferably 1,000-3,000. The hydroxyl group-terminated polycarbonate preferably has a hydroxyl group equivalent weight of 250 to 1,250.

Component (D) preferably further has an imide structure. By having an imide structure, the heat resistance of the component (D) can be enhanced and the crack resistance can be effectively enhanced.

Component (D) may have any of a linear, branched, or cyclic structure, but preferably has a linear structure.

Component (D) preferably further has a functional group capable of reacting with component (A). The functional groups also include reactive groups that appear upon heating. Component (D) having a functional group can improve the mechanical strength of the cured product of the resin composition.

Functional groups include carboxy groups, hydroxy groups, acid anhydride groups, phenolic hydroxyl groups, epoxy groups, isocyanate groups, urethane groups, and the like. Among them, from the viewpoint of significantly obtaining the effects of the present invention, the functional group has one or more functional groups selected from a hydroxyl group, an acid anhydride group, a phenolic hydroxyl group, an epoxy group, an isocyanate group and a urethane group. is preferred, and a phenolic hydroxyl group is particularly preferred.

Component (D) may be used singly or in combination of two or more.

The component (D) preferably has a high molecular weight from the viewpoint of exhibiting flexibility. Specific number average molecular weight Mn of component (D) is preferably 4000 or more, more preferably 4500 or more, still more preferably 5000 or more, particularly preferably 5500 or more, preferably 100000 or less, more preferably 95000 or less, Particularly preferably, it is 90,000 or less. The number average molecular weight Mn of component (D) is a polystyrene-equivalent number average molecular weight measured using GPC (gel permeation chromatography).

Further, the specific weight average molecular weight of component (D) is preferably 5,500 to 100,000, more preferably 10,000 to 90,000, still more preferably 15,000 to 80,000, from the viewpoint of obtaining flexibility. The weight average molecular weight of the component (D) is the polystyrene-equivalent weight average molecular weight measured by gel permeation chromatography (GPC).

When component (D) has a functional group, the functional group equivalent of component (D) is preferably 100 g/eq. above, more preferably 200 g/eq. above, more preferably 1000 g/eq. above, particularly preferably 2500 g/eq. or more, preferably 50000 g/eq. Below, more preferably 30000 g/eq. Below, more preferably 10000 g/eq. Below, particularly preferably 5000 g/eq. It is below. Functional group equivalent weight is the number of grams of resin containing one gram equivalent of functional group. For example, the epoxy group equivalent can be measured according to JIS K7236. Further, for example, the hydroxyl equivalent can be calculated by dividing the molecular weight of KOH by the hydroxyl value measured according to JIS K1557-1.

The glass transition temperature (Tg) of component (D) is 20° C. or lower, preferably 0° C. or lower.

(D) When containing an elastomer, the content of (D) elastomer is not particularly limited, but when the non-volatile components other than component (B) in the resin composition are 100% by mass, it is more flexible From the viewpoint of obtaining properties, the content is preferably 10% by mass or more, more preferably 30% by mass or more, still more preferably 40% by mass or more, and particularly preferably 50% by mass or more. (D) The upper limit of the elastomer content is preferably 75% by mass or less, more preferably 70% by mass or less, even more preferably 65% by mass or less, and particularly preferably It is 60% by mass or less.

<(E) Curing agent>
The resin composition of the present invention may contain (E) a curing agent as an optional component. By containing (E) a curing agent, (A) the epoxy resin can be easily cured.

(E) The curing agent is not particularly limited as long as it has a function of curing the epoxy resin. Curing agents, cyanate ester curing agents, and carbodiimide curing agents are included. The curing agent may be used singly or in combination of two or more. The (E) curing agent of the resin composition of the present invention is selected from the group consisting of phenol-based curing agents, naphthol-based curing agents, and active ester-based curing agents from the viewpoint of significantly obtaining the desired effects of the present invention. things are preferred. In one embodiment, (E) the curing agent preferably contains an active ester curing agent.

As the phenolic curing agent and the naphtholic curing agent, a phenolic curing agent having a novolac structure or a naphtholic curing agent having a novolac structure is preferable from the viewpoint of heat resistance and water resistance. From the viewpoint of adhesion to adherends, a nitrogen-containing phenolic curing agent or a nitrogen-containing naphthol curing agent is preferable, and a triazine skeleton-containing phenolic curing agent or a triazine skeleton-containing naphthol curing agent is more preferable. Among them, a triazine skeleton-containing phenol novolak resin is preferable from the viewpoint of highly satisfying heat resistance, water resistance, and adhesion. Specific examples of phenol-based curing agents and naphthol-based curing agents include, for example, “MEH-7700”, “MEH-7810”, “MEH-7851” and “MEH-8000H” manufactured by Meiwa Kasei; Nippon Kayaku Co., Ltd. "NHN", "CBN", "GPH" manufactured by Nippon Steel & Sumikin Chemical Co., Ltd. "SN-170", "SN-180", "SN-190", "SN-475", "SN-485", "SN-495", "SN-495V", "SN-375", "SN-395"; DIC's "TD-2090", "TD-2090-60M", "LA-7052", "LA -7054", "LA-1356", "LA-3018", "LA-3018-50P", "EXB-9500", "HPC-9500", "KA-1160", "KA-1163", "KA -1165”; “GDP-6115L”, “GDP-6115H”, “ELPC75” manufactured by Gunei Chemical Co., Ltd., and the like.

Acid anhydride curing agents include curing agents having one or more acid anhydride groups in one molecule. Specific examples of acid anhydride curing agents include phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methyltetrahydrophthalic anhydride, methylhexahydrophthalic anhydride, methylnadic anhydride, and hydrogenated methylnadic acid. anhydride, trialkyltetrahydrophthalic anhydride, dodecenylsuccinic anhydride, 5-(2,5-dioxotetrahydro-3-furanyl)-3-methyl-3-cyclohexene-1,2-dicarboxylic anhydride, trianhydride mellitic acid, pyromellitic anhydride, benzophenonetetracarboxylic dianhydride, biphenyltetracarboxylic dianhydride, naphthalenetetracarboxylic dianhydride, oxydiphthalic dianhydride, 3,3'-4,4'- Diphenylsulfonetetracarboxylic dianhydride, 1,3,3a,4,5,9b-hexahydro-5-(tetrahydro-2,5-dioxo-3-furanyl)-naphtho[1,2-C]furan-1 , 3-dione, ethylene glycol bis(anhydrotrimellitate), polymer-type acid anhydrides such as styrene/maleic acid resin obtained by copolymerizing styrene and maleic acid. Commercially available acid anhydride curing agents include "HNA-100" and "MH-700" manufactured by Shin Nippon Rika.

The active ester-based curing agent is not particularly limited, but generally contains an ester group with high reaction activity such as phenol esters, thiophenol esters, N-hydroxyamine esters, esters of heterocyclic hydroxy compounds in one molecule. A compound having two or more is preferably used. The active ester curing agent is preferably obtained by a condensation reaction between a carboxylic acid compound and/or a thiocarboxylic acid compound and a hydroxy compound and/or a thiol compound. In particular, from the viewpoint of improving heat resistance, an active ester curing agent obtained from a carboxylic acid compound and a hydroxy compound is preferred, and an active ester curing agent obtained from a carboxylic acid compound and a phenol compound and/or a naphthol compound is more preferred. Examples of carboxylic acid compounds include benzoic acid, acetic acid, succinic acid, maleic acid, itaconic acid, phthalic acid, isophthalic acid, terephthalic acid, and pyromellitic acid. Examples of phenol compounds or naphthol compounds include hydroquinone, resorcinol, bisphenol A, bisphenol F, bisphenol S, phenolphthalin, methylated bisphenol A, methylated bisphenol F, methylated bisphenol S, phenol, o-cresol, m- cresol, p-cresol, catechol, α-naphthol, β-naphthol, 1,5-dihydroxynaphthalene, 1,6-dihydroxynaphthalene, 2,6-dihydroxynaphthalene, dihydroxybenzophenone, trihydroxybenzophenone, tetrahydroxybenzophenone, phloroglucine, Benzenetriol, dicyclopentadiene-type diphenol compound, phenol novolak, and the like. Here, the term "dicyclopentadiene-type diphenol compound" refers to a diphenol compound obtained by condensing one molecule of dicyclopentadiene with two molecules of phenol.

Specifically, an active ester compound containing a dicyclopentadiene type diphenol structure, an active ester compound containing a naphthalene structure, an active ester compound containing an acetylated product of phenol novolac, and an active ester compound containing a benzoylated product of phenol novolak are preferred. Among them, an active ester compound containing a naphthalene structure and an active ester compound containing a dicyclopentadiene-type diphenol structure are more preferable. "Dicyclopentadiene-type diphenol structure" represents a divalent structural unit consisting of phenylene-dicyclopentalene-phenylene.

Commercially available active ester curing agents include, as active ester compounds containing a dicyclopentadiene type diphenol structure, "EXB9451", "EXB9460", "EXB9460S", "HPC-8000", "HPC-8000H", " HPC-8000-65T", "HPC-8000H-65TM", "EXB-8000L", "EXB-8000L-65TM" (manufactured by DIC); active ester compounds containing naphthalene structures: "EXB9416-70BK" and "EXB -8150-65T" (manufactured by DIC Corporation); "DC808" (manufactured by Mitsubishi Chemical Corporation) as an active ester compound containing an acetylated phenol novolak; "YLH1026" (manufactured by Mitsubishi Chemical Corporation) as an active ester compound containing a benzoylated phenol novolac "DC808" (manufactured by Mitsubishi Chemical Corporation) as an active ester curing agent that is an acetylated product of phenol novolac; "YLH1026" (manufactured by Mitsubishi Chemical Corporation) as an active ester curing agent that is a benzoylated product of phenol novolak; YLH1030" (manufactured by Mitsubishi Chemical Corporation), "YLH1048" (manufactured by Mitsubishi Chemical Corporation); and the like.

Specific examples of benzoxazine-based curing agents include "JBZ-OP100D" and "ODA-BOZ" manufactured by JFE Chemical; "HFB2006M" manufactured by Showa Polymer Co., Ltd.; Examples include "Fa".

Examples of cyanate ester curing agents include bisphenol A dicyanate, polyphenolcyanate (oligo(3-methylene-1,5-phenylenecyanate)), 4,4'-methylenebis(2,6-dimethylphenylcyanate), 4, 4′-ethylidene diphenyl dicyanate, hexafluorobisphenol A dicyanate, 2,2-bis(4-cyanate)phenylpropane, 1,1-bis(4-cyanatophenylmethane), bis(4-cyanate-3,5- Difunctional cyanate resins such as dimethylphenyl)methane, 1,3-bis(4-cyanatophenyl-1-(methylethylidene))benzene, bis(4-cyanatophenyl)thioether, and bis(4-cyanatophenyl)ether, Polyfunctional cyanate resins derived from phenol novolak, cresol novolak, etc., and prepolymers obtained by partially triazine-forming these cyanate resins. Specific examples of cyanate ester curing agents include "PT30" and "PT60" (both phenol novolac type polyfunctional cyanate ester resins), "BA230" and "BA230S75" (part of bisphenol A dicyanate) manufactured by Lonza Japan Co., Ltd. or a prepolymer that is entirely triazined to form a trimer), and the like.

Specific examples of carbodiimide curing agents include "V-03" and "V-07" manufactured by Nisshinbo Chemical Co., Ltd., and the like.

When a curing agent is included, the ratio of the epoxy resin to the curing agent is [total number of epoxy groups in the epoxy resin]:[total number of reactive groups in the curing agent], which is 1:0.2 to 1:1:0.2. A range of 2 is preferred, 1:0.3 to 1:1.5 is more preferred, and 1:0.4 to 1:1.2 is even more preferred. Here, the reactive group of the curing agent is an active hydroxyl group, an active ester group, or the like, and varies depending on the type of curing agent. The total number of epoxy groups in the epoxy resin is the sum of the values obtained by dividing the mass of the non-volatile components of each epoxy resin by the epoxy equivalent, and the total number of reactive groups in the curing agent is It is a value obtained by dividing the non-volatile component mass of each curing agent by the reactive group equivalent and totaling all the curing agents. By setting the ratio of the epoxy resin to the curing agent within this range, the heat resistance of the resulting cured product is further improved.

(E) When a curing agent is contained, the content of the (E) curing agent is not particularly limited, but when the non-volatile components other than the component (B) in the resin composition are 100% by mass, It is preferably 1% by mass or more, more preferably 5% by mass or more, still more preferably 8% by mass or more, and particularly preferably 10% by mass or more. (E) The upper limit of the content of the curing agent is preferably 40% by mass or less, more preferably 30% by mass or less, still more preferably 20% by mass or less, and particularly preferably 15% by mass or less.

<(F) Curing accelerator>
The resin composition of the present invention may contain (F) a curing accelerator as an optional component. (F) The curing accelerator has a function of promoting the effect of (A) the epoxy resin.

(F) Curing accelerators include, for example, phosphorus-based curing accelerators, amine-based curing accelerators, imidazole-based curing accelerators, guanidine-based curing accelerators, metal-based curing accelerators, and the like. Among them, phosphorus curing accelerators, amine curing accelerators, imidazole curing accelerators, and metallic curing accelerators are preferred, and amine curing accelerators, imidazole curing accelerators, and metallic curing accelerators are more preferred. The curing accelerator may be used singly or in combination of two or more.

Phosphorus curing accelerators include, for example, triphenylphosphine, phosphonium borate compounds, tetraphenylphosphonium tetraphenylborate, n-butylphosphonium tetraphenylborate, tetrabutylphosphonium decanoate, (4-methylphenyl)triphenylphosphonium thiocyanate. , tetraphenylphosphonium thiocyanate, butyltriphenylphosphonium thiocyanate, and the like.

Examples of amine curing accelerators include trialkylamines such as triethylamine and tributylamine, 4-dimethylaminopyridine (DMAP), benzyldimethylamine, 2,4,6-tris(dimethylaminomethyl)phenol, 1, 8-diazabicyclo(5,4,0)-undecene, etc., and 4-dimethylaminopyridine is preferred.

Examples of imidazole curing accelerators include 2-methylimidazole, 2-undecylimidazole, 2-heptadecylimidazole, 1,2-dimethylimidazole, 2-ethyl-4-methylimidazole, 1,2-dimethylimidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 1-benzyl-2-methylimidazole, 1-benzyl-2-phenylimidazole, 1-cyanoethyl-2-methylimidazole, 1-cyanoethyl-2-undecylimidazole, 1-cyanoethyl-2-ethyl-4-methylimidazole, 1-cyanoethyl-2-phenylimidazole, 1-cyanoethyl-2-undecylimidazolium trimellitate, 1-cyanoethyl- 2-phenylimidazolium trimellitate, 2,4-diamino-6-[2'-methylimidazolyl-(1')]-ethyl-s-triazine, 2,4-diamino-6-[2'-undecyl imidazolyl-(1′)]-ethyl-s-triazine, 2,4-diamino-6-[2′-ethyl-4′-methylimidazolyl-(1′)]-ethyl-s-triazine, 2,4- Diamino-6-[2'-methylimidazolyl-(1')]-ethyl-s-triazine isocyanurate, 2-phenylimidazole isocyanurate, 2-phenyl-4,5-dihydroxymethylimidazole, 2- Phenyl-4-methyl-5-hydroxymethylimidazole, 2,3-dihydro-1H-pyrrolo[1,2-a]benzimidazole, 1-dodecyl-2-methyl-3-benzylimidazolium chloride, 2-methylimidazoline , 2-phenylimidazoline and other imidazole compounds, and adducts of imidazole compounds and epoxy resins.

As the imidazole-based curing accelerator, a commercially available product may be used, such as "P200-H50" manufactured by Mitsubishi Chemical Corporation.

Guanidine curing accelerators include, for example, dicyandiamide, 1-methylguanidine, 1-ethylguanidine, 1-cyclohexylguanidine, 1-phenylguanidine, 1-(o-tolyl)guanidine, dimethylguanidine, diphenylguanidine, trimethylguanidine, Tetramethylguanidine, Pentamethylguanidine, 1,5,7-triazabicyclo[4.4.0]dec-5-ene, 7-methyl-1,5,7-triazabicyclo[4.4.0] Dec-5-ene, 1-methylbiguanide, 1-ethylbiguanide, 1-n-butylbiguanide, 1-n-octadecylbiguanide, 1,1-dimethylbiguanide, 1,1-diethylbiguanide, 1-cyclohexylbiguanide, 1 -allylbiguanide, 1-phenylbiguanide, 1-(o-tolyl)biguanide and the like.

Metal-based curing accelerators include, for example, organometallic complexes or organometallic salts of metals such as cobalt, copper, zinc, iron, nickel, manganese, and tin. Specific examples of organometallic complexes include organocobalt complexes such as cobalt (II) acetylacetonate and cobalt (III) acetylacetonate, organocopper complexes such as copper (II) acetylacetonate, and zinc (II) acetylacetonate. organic zinc complexes such as iron (III) acetylacetonate; organic nickel complexes such as nickel (II) acetylacetonate; organic manganese complexes such as manganese (II) acetylacetonate; Examples of organic metal salts include zinc octoate, tin octoate, zinc naphthenate, cobalt naphthenate, tin stearate, and zinc stearate.

(F) When a curing accelerator is contained, the content of (F) curing accelerator is not particularly limited, but non-volatile components other than the component (B) in the resin composition are set to 100% by mass. is preferably 0.001% by mass or more, more preferably 0.01% by mass or more, still more preferably 0.05% by mass or more, and particularly preferably 0.1% by mass or more. (F) The upper limit of the content of the curing accelerator is preferably 5% by mass or less, more preferably 2% by mass or less, still more preferably 1% by mass or less, and particularly preferably 0.5% by mass or less.

<(G) Organic solvent>
The resin composition of the present invention may further contain (G) an organic solvent as an optional volatile component.

Examples of organic solvents include ketone solvents such as acetone, methyl ethyl ketone and cyclohexanone; ester solvents such as ethyl acetate, butyl acetate, cellosolve acetate, propylene glycol monomethyl ether acetate, carbitol acetate, ethyl diglycol acetate and γ-butyrolactone. carbitol solvents such as cellosolve and butyl carbitol; aromatic hydrocarbon solvents such as benzene, toluene, xylene, ethylbenzene and trimethylbenzene; amide solvents such as dimethylformamide, dimethylacetamide (DMAc) and N-methylpyrrolidone; alcohol solvents such as methanol, ethanol, and 2-methoxypropanol; and hydrocarbon solvents such as cyclohexane and methylcyclohexane. The organic solvent may be used singly or in combination of two or more at any ratio.

<(H) Other Additives>
The resin composition may further contain other additives as optional components in addition to the components described above. Examples of such additives include organic fillers, thickeners, antifoaming agents, leveling agents, adhesion imparting agents, polymerization initiators, flame retardants and the like. These additives may be used singly or in combination of two or more. Each content can be appropriately set by those skilled in the art.

<Method for producing resin composition>
In one embodiment, the resin composition of the present invention contains, for example, (A) an epoxy resin, (B) an inorganic filler, (C) a benzoxazine compound having one or more alicyclic structures in the molecule, and Optionally (D) elastomer, optionally (E) curing agent, optionally (F) curing accelerator, optionally (G) organic solvent, and optionally (H) other Additives may be added in any order and/or partially or wholly at the same time and mixed to obtain a resin composition.

In the above steps, the temperature during the process of adding each component can be set appropriately, and heating and/or cooling may be performed temporarily or throughout the process of adding each component. Stirring or shaking may be used during the process of adding each component. Moreover, it is preferable to further include a step of uniformly dispersing the resin composition after the above step by stirring it with a stirring device such as a mixer.

<Characteristics of resin composition>
Since the resin composition of the present invention contains (A) an epoxy resin, (B) an inorganic filler, and (C) a benzoxazine compound having one or more alicyclic structures in the molecule, the elastic modulus of the cured product is It is possible to achieve both suppression of warpage and excellent adhesion.

In one embodiment, the tensile elastic modulus (GPa) at 23° C. measured in accordance with JIS K7127 of the cured product of the resin composition of the present invention is the viewpoint of relaxing the stress generated during thermosetting for low warpage. Therefore, it is preferably 15 Gpa or less, more preferably 12 Gpa or less, even more preferably 11 Gpa or less, and particularly preferably 10.5 Gpa or less.

In one embodiment, the peel strength (peel strength) of the cured product of the resin composition of the present invention against a copper foil is, for example, at room temperature when 35 mm is peeled off vertically at a speed of 50 mm / min. When the load is measured according to JIS C6481, it is preferably 0.25 kgf/cm or more, more preferably 0.3 kgf/cm or more, still more preferably 0.35 kgf/cm or more, and particularly preferably 0.35 kgf/cm or more. It can be 38 kgf/cm or more.

In one embodiment, the amount of warpage when the substrate comprising the resin composition layer (thickness of 100 μm) of the present invention and a 12-inch silicon wafer is heat-treated at 180° C. for 90 minutes is preferably 4 mm or less, more preferably 3 mm or less, and further It can be preferably 2.5 mm or less, particularly preferably 2.3 mm or less, 2.2 mm or less, 2.1 mm or less or 2 mm or less.

<Application of resin composition>
The resin composition of the present invention can be suitably used as a resin composition for insulation, particularly as a resin composition for forming an insulation layer. Specifically, a resin composition for forming an insulating layer for forming a conductor layer (including a rewiring layer) formed on an insulating layer (resin for forming an insulating layer for forming a conductor layer composition). Moreover, in the printed wiring board described later, it can be suitably used as a resin composition for forming an insulating layer of a printed wiring board (resin composition for forming an insulating layer of a printed wiring board). The resin composition of the present invention also includes resin sheets, sheet laminate materials such as prepreg, solder resists, underfill materials, die bonding materials, semiconductor encapsulants, hole-filling resins, component-embedding resins, and the like. Can be used for a wide range of applications.

Further, for example, when a semiconductor chip package is manufactured through the following steps (1) to (6), the resin composition of the present invention is used as an insulating layer for forming a rewiring layer. (a resin composition for forming a rewiring layer) and a resin composition for sealing a semiconductor chip (a resin composition for semiconductor chip sealing). A rewiring layer may be further formed on the encapsulation layer when the semiconductor chip package is manufactured.
(1) a step of laminating a temporary fixing film on a substrate;
(2) temporarily fixing the semiconductor chip on the temporary fixing film;
(3) forming a sealing layer on the semiconductor chip;
(4) a step of peeling the base material and the temporary fixing film from the semiconductor chip;
(5) forming a rewiring layer as an insulating layer on the surface of the semiconductor chip from which the substrate and the temporary fixing film have been removed; and (6) forming a rewiring layer as a conductor layer on the rewiring layer. forming process

Moreover, since the resin composition of the present invention provides an insulating layer having good part-embedding properties, it can be suitably used when the printed wiring board is a component-embedded circuit board.

<Sheet-like laminated material>
Although the resin composition of the present invention can be applied in the form of a varnish, it is industrially preferably used in the form of a sheet-like laminated material containing the resin composition.

As the sheet-like laminate material, resin sheets and prepregs shown below are preferable.

In one embodiment, the resin sheet comprises a support and a resin composition layer provided on the support, and the resin composition layer is formed from the resin composition of the present invention.

The thickness of the resin composition layer is preferably 50 μm or less, more It is preferably 40 μm or less. Although the lower limit of the thickness of the resin composition layer is not particularly limited, it can be usually 5 μm or more, 10 μm or more, or the like.

Examples of the support include a film made of a plastic material, a metal foil, and a release paper, and a film made of a plastic material and a metal foil are preferable.

When a film made of a plastic material is used as the support, examples of the plastic material include polyethylene terephthalate (hereinafter sometimes abbreviated as "PET") and polyethylene naphthalate (hereinafter sometimes abbreviated as "PEN"). ), polycarbonate (hereinafter sometimes abbreviated as "PC"), acrylic such as polymethyl methacrylate (PMMA), cyclic polyolefin, triacetyl cellulose (TAC), polyether sulfide (PES), polyether ketones, polyimides, and the like. Among them, polyethylene terephthalate and polyethylene naphthalate are preferable, and inexpensive polyethylene terephthalate is particularly preferable.

When a metal foil is used as the support, examples of the metal foil include copper foil and aluminum foil, with copper foil being preferred. As the copper foil, a foil made of a single metal of copper may be used, and a foil made of an alloy of copper and other metals (for example, tin, chromium, silver, magnesium, nickel, zirconium, silicon, titanium, etc.) may be used. may be used.

The support may be subjected to matte treatment, corona treatment, or antistatic treatment on the surface to be bonded to the resin composition layer.

Further, as the support, a support with a release layer having a release layer on the surface to be bonded to the resin composition layer may be used. The release agent used in the release layer of the release layer-attached support includes, for example, one or more release agents selected from the group consisting of alkyd resins, polyolefin resins, urethane resins, and silicone resins. . As the support with a release layer, a commercially available product may be used, for example, "SK-1" manufactured by Lintec Co., Ltd., "SK-1", " AL-5", "AL-7", Toray's "Lumirror T60", Teijin's "Purex", and Unitika's "Unipeel".

The thickness of the support is not particularly limited, but is preferably in the range of 5 μm to 75 μm, more preferably in the range of 10 μm to 60 μm. When a release layer-attached support is used, the thickness of the release layer-attached support as a whole is preferably within the above range.

In one embodiment, the resin sheet may further contain any layer as necessary. Examples of such an optional layer include a protective film conforming to the support provided on the surface of the resin composition layer not bonded to the support (that is, the surface opposite to the support). be done. Although the thickness of the protective film is not particularly limited, it is, for example, 1 μm to 40 μm. By laminating the protective film, the surface of the resin composition layer can be prevented from being dusted or scratched.

For the resin sheet, for example, a liquid resin composition is used as it is, or a resin varnish is prepared by dissolving the resin composition in an organic solvent. It can be produced by allowing the resin composition layer to form.

Examples of organic solvents include ketones such as acetone, methyl ethyl ketone (MEK) and cyclohexanone; acetic acid esters such as ethyl acetate, butyl acetate, cellosolve acetate, propylene glycol monomethyl ether acetate and carbitol acetate; cellosolve and butyl carbitol; carbitols; aromatic hydrocarbons such as toluene and xylene; amide solvents such as dimethylformamide, dimethylacetamide (DMAc) and N-methylpyrrolidone. An organic solvent may be used individually by 1 type, and may be used in combination of 2 or more type.

Drying may be carried out by a known method such as heating or blowing hot air. The drying conditions are not particularly limited, but the resin composition layer is dried so that the content of the organic solvent is 10% by mass or less, preferably 5% by mass or less. Although it varies depending on the boiling point of the organic solvent in the resin varnish, for example, when using a resin varnish containing 30% by mass to 60% by mass of the organic solvent, drying at 50 ° C. to 150 ° C. for 3 minutes to 10 minutes The resin composition layer can be formed.

The resin sheet can be wound into a roll and stored. When the resin sheet has a protective film, it can be used by peeling off the protective film.

In one embodiment, a prepreg is formed by impregnating a sheet-like fiber base material with the resin composition of the present invention.

The sheet-like fiber base material used for the prepreg is not particularly limited, and those commonly used as prepreg base materials such as glass cloth, aramid nonwoven fabric, and liquid crystal polymer nonwoven fabric can be used. From the viewpoint of thinning the printed wiring board, the thickness of the sheet-like fiber base material is preferably 50 μm or less, more preferably 40 μm or less, still more preferably 30 μm or less, and particularly preferably 20 μm or less. The lower limit of the thickness of the sheet-like fiber base material is not particularly limited. Usually, it is 10 μm or more.

A prepreg can be manufactured by a known method such as a hot melt method or a solvent method.

The thickness of the prepreg can be in the same range as the resin composition layer in the resin sheet described above.

In the present invention using a resin composition containing a combination of components (A), (B), and (C) in a specific content, the glass transition temperature is high, the dielectric loss tangent is low, and the conductor layer and It is possible to realize a sheet-like laminated material that gives a cured product with good adhesion and is extremely useful in the production of printed wiring boards.

The sheet-like laminated material of the present invention can be suitably used for forming an insulating layer of a printed wiring board (for an insulating layer of a printed wiring board), and for forming an interlayer insulating layer of a printed wiring board (for a printed wiring board). for interlayer insulating layers of wiring boards).

<Printed wiring board>
The printed wiring board of the present invention includes an insulating layer made of a cured product obtained by curing the resin composition of the present invention.

A printed wiring board can be manufactured, for example, using the resin sheet described above by a method including the following steps (I) and (II).
(I) A step of laminating a resin sheet on the inner layer substrate so that the resin composition layer of the resin sheet is bonded to the inner layer substrate (II) Curing (for example, thermosetting) the resin composition layer to form an insulating layer process

The "inner layer substrate" used in step (I) is a member that serves as a printed wiring board substrate, and includes, for example, a glass epoxy substrate, a metal substrate, a polyester substrate, a polyimide substrate, a BT resin substrate, and a thermosetting polyphenylene ether substrate. etc. The substrate may also have a conductor layer on one or both sides thereof, and the conductor layer may be patterned. An inner layer substrate having conductor layers (circuits) formed on one side or both sides of the substrate is sometimes referred to as an "inner layer circuit board." Further, an intermediate product on which an insulating layer and/or a conductor layer are to be further formed when manufacturing a printed wiring board is also included in the "inner layer substrate" as used in the present invention. When the printed wiring board is a circuit board with built-in components, an inner layer board with built-in components may be used.

The lamination of the inner layer substrate and the resin sheet can be performed, for example, by thermocompression bonding the resin sheet to the inner layer substrate from the support side. Examples of the member for thermocompression bonding the resin sheet to the inner layer substrate (hereinafter also referred to as "thermocompression bonding member") include heated metal plates (such as SUS end plates) and metal rolls (SUS rolls). Instead of pressing the thermocompression member directly onto the resin sheet, it is preferable to press through an elastic material such as heat-resistant rubber so that the resin sheet can sufficiently follow the uneven surface of the inner layer substrate.

Lamination of the inner layer substrate and the resin sheet may be performed by a vacuum lamination method. In the vacuum lamination method, the thermocompression temperature is preferably in the range of 60° C. to 160° C., more preferably 80° C. to 140° C., and the thermocompression pressure is preferably 0.098 MPa to 1.77 MPa, more preferably 0. .29 MPa to 1.47 MPa, and the heat pressing time is preferably 20 seconds to 400 seconds, more preferably 30 seconds to 300 seconds. Lamination is preferably carried out under reduced pressure conditions of 26.7 hPa or less.

Lamination can be done with a commercially available vacuum laminator. Commercially available vacuum laminators include, for example, a vacuum pressurized laminator manufactured by Meiki Seisakusho, a vacuum applicator manufactured by Nikko Materials, a batch vacuum pressurized laminator, and the like.

After lamination, the laminated resin sheets may be smoothed under normal pressure (atmospheric pressure), for example, by pressing a thermocompression member from the support side. The pressing conditions for the smoothing treatment may be the same as the thermocompression bonding conditions for the lamination described above. Smoothing treatment can be performed with a commercially available laminator. Lamination and smoothing may be performed continuously using the above-mentioned commercially available vacuum laminator.

The support may be removed between steps (I) and (II) or after step (II).

In step (II), the resin composition layer is cured (for example, thermally cured) to form an insulating layer made of the cured resin composition. Curing conditions for the resin composition layer are not particularly limited, and conditions that are usually employed when forming an insulating layer of a printed wiring board may be used.

For example, although the thermosetting conditions for the resin composition layer vary depending on the type of resin composition, etc., the curing temperature is preferably 120°C to 240°C, more preferably 150°C to 220°C, and still more preferably 170°C to 210°C. °C. The curing time can be preferably 5 minutes to 120 minutes, more preferably 10 minutes to 100 minutes, even more preferably 15 minutes to 100 minutes.

Before thermosetting the resin composition layer, the resin composition layer may be preheated at a temperature lower than the curing temperature. For example, prior to thermosetting the resin composition layer, the resin composition layer is cured at a temperature of 50° C. or higher and lower than 120° C., preferably 60° C. or higher and lower than 115° C., more preferably 70° C. or higher and lower than 110° C. Minutes or more, preferably 5 minutes to 150 minutes, more preferably 15 minutes to 120 minutes, more preferably 15 minutes to 100 minutes, may be preheated.

When manufacturing a printed wiring board, (III) the step of drilling holes in the insulating layer, (IV) the step of roughening the insulating layer, and (V) the step of forming a conductor layer may be further carried out. These steps (III) to (V) may be carried out according to various methods known to those skilled in the art that are used in the manufacture of printed wiring boards. When the support is removed after step (II), the support may be removed between step (II) and step (III), between step (III) and step (IV), or step ( It may be carried out between IV) and step (V). If necessary, the steps (II) to (V) of forming the insulating layer and the conductor layer may be repeated to form a multilayer wiring board.

In another embodiment, the printed wiring board of the present invention can be manufactured using the prepreg described above. The manufacturing method is basically the same as in the case of using a resin sheet.

Step (III) is a step of making holes in the insulating layer, whereby holes such as via holes and through holes can be formed in the insulating layer. Step (III) may be performed using, for example, a drill, laser, plasma, or the like, depending on the composition of the resin composition used to form the insulating layer. The dimensions and shape of the holes may be appropriately determined according to the design of the printed wiring board.

Step (IV) is a step of roughening the insulating layer. Smear is usually also removed in this step (IV). The procedure and conditions of the roughening treatment are not particularly limited, and known procedures and conditions that are commonly used in forming insulating layers of printed wiring boards can be employed. For example, the insulating layer can be roughened by performing a swelling treatment with a swelling liquid, a roughening treatment with an oxidizing agent, and a neutralizing treatment with a neutralizing liquid in this order.

The swelling liquid used in the roughening treatment is not particularly limited, but examples thereof include alkaline solutions, surfactant solutions, etc., preferably alkaline solutions, more preferably sodium hydroxide solutions and potassium hydroxide solutions. preferable. Examples of commercially available swelling liquids include "Swelling Dip Securigans P" and "Swelling Dip Securigans SBU" manufactured by Atotech Japan. The swelling treatment with the swelling liquid is not particularly limited, but can be performed, for example, by immersing the insulating layer in the swelling liquid at 30.degree. C. to 90.degree. C. for 1 to 20 minutes. From the viewpoint of suppressing the swelling of the resin of the insulating layer to an appropriate level, it is preferable to immerse the insulating layer in a swelling liquid at 40° C. to 80° C. for 5 minutes to 15 minutes.

The oxidizing agent used in the roughening treatment is not particularly limited, but examples thereof include an alkaline permanganate solution in which potassium permanganate or sodium permanganate is dissolved in an aqueous solution of sodium hydroxide. The roughening treatment with an oxidizing agent such as an alkaline permanganate solution is preferably carried out by immersing the insulating layer in an oxidizing agent solution heated to 60° C. to 100° C. for 10 to 30 minutes. Further, the permanganate concentration in the alkaline permanganate solution is preferably 5% by mass to 10% by mass. Examples of commercially available oxidizing agents include alkaline permanganate solutions such as "Concentrate Compact CP" and "Dosing Solution Security P" manufactured by Atotech Japan.

Moreover, as a neutralization liquid used for the roughening treatment, an acidic aqueous solution is preferable, and as a commercial product, for example, "Reduction Solution Securigant P" manufactured by Atotech Japan Co., Ltd. can be mentioned.

The treatment with the neutralizing solution can be carried out by immersing the treated surface roughened with the oxidizing agent in the neutralizing solution at 30° C. to 80° C. for 5 to 30 minutes. From the viewpoint of workability, etc., a method of immersing an object roughened with an oxidizing agent in a neutralizing solution at 40° C. to 70° C. for 5 to 20 minutes is preferable.

In one embodiment, the arithmetic mean roughness (Ra) of the insulating layer surface after roughening treatment is not particularly limited, but is preferably 500 nm or less, more preferably 400 nm or less, and still more preferably 300 nm or less. . Although the lower limit is not particularly limited, it is preferably 0.5 nm or more, more preferably 1 nm or more. The root mean square roughness (Rq) of the surface of the insulating layer after roughening treatment is preferably 500 nm or less, more preferably 400 nm or less, and even more preferably 300 nm or less. Although the lower limit is not particularly limited, it is preferably 0.5 nm or more, more preferably 1 nm or more. The arithmetic mean roughness (Ra) and root mean square roughness (Rq) of the insulating layer surface can be measured using a non-contact surface roughness meter.

Step (V) is a step of forming a conductor layer, in which the conductor layer is formed on the insulating layer. The conductor material used for the conductor layer is not particularly limited. In a preferred embodiment, the conductor layer contains one or more selected from the group consisting of gold, platinum, palladium, silver, copper, aluminum, cobalt, chromium, zinc, nickel, titanium, tungsten, iron, tin and indium. Contains metal. The conductor layer may be a single metal layer or an alloy layer, and the alloy layer may be, for example, an alloy of two or more metals selected from the above group (for example, a nickel-chromium alloy, a copper- nickel alloys and copper-titanium alloys). Among them, from the viewpoint of versatility of conductor layer formation, cost, ease of patterning, etc., single metal layers of chromium, nickel, titanium, aluminum, zinc, gold, palladium, silver or copper, nickel-chromium alloys, copper- Nickel alloys and copper/titanium alloy alloy layers are preferred, and single metal layers of chromium, nickel, titanium, aluminum, zinc, gold, palladium, silver or copper, or nickel/chromium alloy alloy layers are more preferred, and copper single metal layers are preferred. A metal layer is more preferred.

The conductor layer may have a single layer structure or a multi-layer structure in which two or more single metal layers or alloy layers made of different kinds of metals or alloys are laminated. When the conductor layer has a multilayer structure, the layer in contact with the insulating layer is preferably a single metal layer of chromium, zinc or titanium, or an alloy layer of nickel-chromium alloy.

The thickness of the conductor layer is generally between 3 μm and 35 μm, preferably between 5 μm and 30 μm, depending on the desired printed wiring board design.

In one embodiment, the conductor layer may be formed by plating. For example, a conductive layer having a desired wiring pattern can be formed by plating the surface of an insulating layer by a conventionally known technique such as a semi-additive method or a full-additive method. It is preferably formed by a method. An example of forming a conductor layer by a semi-additive method is shown below.

First, a plating seed layer is formed on the surface of the insulating layer by electroless plating. Next, a mask pattern is formed on the formed plating seed layer to expose a portion of the plating seed layer corresponding to a desired wiring pattern. After forming a metal layer on the exposed plating seed layer by electroplating, the mask pattern is removed. After that, the unnecessary plating seed layer is removed by etching or the like, and a conductor layer having a desired wiring pattern can be formed.

In other embodiments, the conductor layer may be formed using a metal foil. When forming the conductor layer using a metal foil, step (V) is preferably performed between step (I) and step (II). For example, after step (I), the support is removed and a metal foil is laminated on the exposed surface of the resin composition layer. Lamination of the resin composition layer and the metal foil may be carried out by a vacuum lamination method. The lamination conditions may be the same as those described for step (I). Then, step (II) is performed to form an insulating layer. After that, using the metal foil on the insulating layer, a conductor layer having a desired wiring pattern can be formed by conventional known techniques such as the subtractive method and the modified semi-additive method.

A metal foil can be manufactured by a known method such as an electrolysis method or a rolling method. Commercially available metal foils include, for example, HLP foil and JXUT-III foil manufactured by JX Nippon Mining & Metals Co., Ltd., 3EC-III foil and TP-III foil manufactured by Mitsui Kinzoku Mining Co., Ltd., and the like.

When producing a printed wiring board using the resin composition of the present invention containing a combination of components (A), (B), and (C) in a specific content, the conductor layer is formed by plating, or Adhesion between the conductor layer and the insulating layer can be remarkably improved regardless of whether or not they are formed using metal foil.

<Semiconductor device>
A semiconductor device of the present invention includes the printed wiring board of the present invention. The semiconductor device of the present invention can be manufactured using the printed wiring board of the present invention.

Examples of semiconductor devices include various semiconductor devices used in electrical appliances (eg, computers, mobile phones, digital cameras, televisions, etc.) and vehicles (eg, motorcycles, automobiles, trains, ships, aircraft, etc.).

EXAMPLES Hereinafter, the present invention will be specifically described with reference to Examples. The invention is not limited to these examples. In the following, "parts" and "%" representing amounts mean "parts by mass" and "% by mass", respectively, unless otherwise specified.

<Synthesis Example 1: Synthesis of bis[4-(3,4-dihydro-2H-1,3-benzoxazin-3-yl)cyclohexyl]methane>

4,4'-methylenebis(cyclohexylamine), phenol and 92% paraformaldehyde were reacted in toluene at a molar ratio of 1:2:4.1, respectively, by heating to reflux. After toluene was distilled off, the target compound was obtained. Purity measurement by GPC revealed a purity of 65% as a monomer. Although the polymer was included as a by-product, it was used as such in the examples.

<Synthesis Example 2: Synthesis of 1,4-di(3,4-dihydro-2H-1,3-benzoxazin-3-yl)cyclohexane>

1,4-Cyclohexanediamine, phenol and 92% paraformaldehyde were reacted at a molar ratio of 1:2:4.1, respectively, in toluene by heating to reflux. After toluene was distilled off, the target compound was obtained. Purity measurement by GPC revealed a purity of 60% as a monomer. Although the polymer was included as a by-product, it was used as such in the examples.

<Synthesis Example 3: Synthesis of Elastomer>
In a reaction vessel, 69 g of bifunctional hydroxy group-terminated polybutadiene ("G-3000" manufactured by Nippon Soda Co., Ltd., number average molecular weight = 3000, hydroxy group equivalent = 1800 g / eq.), and an aromatic hydrocarbon-based mixed solvent (Idemitsu Oil 40 g of "Ipsol 150" manufactured by Kagaku Co., Ltd.) and 0.005 g of dibutyltin laurate were added and mixed to dissolve uniformly. When the mixture became uniform, the temperature was raised to 60° C., and 8 g of isophorone diisocyanate (“IPDI” manufactured by Evonik Degussa Japan, isocyanate group equivalent=113 g/eq.) was added while stirring, and the reaction was carried out for about 3 hours.

Next, 23 g of a cresol novolac resin ("KA-1160" manufactured by DIC, hydroxyl equivalent=117 g/eq.) and 60 g of ethyl diglycol acetate (manufactured by Daicel) were added to the reactant and heated to 150° C. while stirring. The temperature was raised and the reaction was carried out for about 10 hours. The disappearance of the NCO peak at 2250 cm ⁻¹ was confirmed by FT-IR. Confirmation of the disappearance of the NCO peak was regarded as the end of the reaction, and the reaction mixture was allowed to cool to room temperature. Then, the reaction product was filtered through a 100-mesh filter cloth to obtain an elastomer having a butadiene structure and phenolic hydroxyl groups (phenolic hydroxyl group-containing butadiene resin: 50% by mass of non-volatile components). The elastomer had a number average molecular weight of 5900 and a glass transition temperature of -7°C.

<Example 1>
Biphenyl type epoxy resin (“NC3000” manufactured by Nippon Kayaku Co., Ltd., epoxy equivalent 276 g / eq.) 5 parts, bisphenol type epoxy resin (“ZX1059” manufactured by Nippon Steel & Sumikin Chemical Co., Ltd., 1:1 mixture of bisphenol A type and bisphenol F type product, epoxy equivalent 169 g / eq.) 2 parts, spherical silica (“SO-C2” manufactured by Admatechs Co., Ltd., “SO-C2” manufactured by Admatex Co., Ltd., surface-treated with 0.5% by mass of an amine-based alkoxysilane compound (“KBM573” manufactured by Shin-Etsu Chemical Co., Ltd.) Average particle size 0.5 μm) 70 parts, 30 parts of the elastomer obtained in Synthesis Example 3, 2 parts of the benzoxazine compound obtained in Synthesis Example 1, cresol novolac resin (manufactured by DIC "KA-1160", phenolic hydroxyl group equivalent: 117 g / eq) 3 parts, a curing accelerator ("1B2PZ" manufactured by Shikoku Kasei Co., Ltd., 1-benzyl-2-phenylimidazole) 0.1 part, and 15 parts of methyl ethyl ketone are mixed and uniformly dispersed with a high-speed rotating mixer. Then, a resin composition was prepared.

<Example 2>
A resin composition was prepared in the same manner as in Example 1 except for using 2 parts of the benzoxazine compound obtained in Synthesis Example 2 instead of 2 parts of the benzoxazine compound obtained in Synthesis Example 1.

<Example 3>
Instead of 70 parts of spherical silica (“SO-C2” manufactured by Admatechs, average particle size 0.5 μm) surface-treated with 0.5% by mass of an amine-based alkoxysilane compound (“KBM573” manufactured by Shin-Etsu Chemical Co., Ltd.) , 115 parts of spherical alumina (“DAW-03” manufactured by Denka Co., Ltd., average particle size 3.7 μm) surface-treated with 0.5% by mass of an amine-based alkoxysilane compound (“KBM573” manufactured by Shin-Etsu Chemical Co., Ltd.). A resin composition was prepared in the same manner as in Example 1 except that

<Example 4>
Instead of 70 parts of spherical silica (“SO-C2” manufactured by Admatechs, average particle size 0.5 μm) surface-treated with 0.5% by mass of an amine-based alkoxysilane compound (“KBM573” manufactured by Shin-Etsu Chemical Co., Ltd.) , Spherical alumina (average particle size 1.5 μm, specific surface area 2.0 m ² /g, maximum particle size 5 μm) surface-treated with 0.5% by mass of an amine-based alkoxysilane compound (“KBM573” manufactured by Shin-Etsu Chemical Co., Ltd.) A resin composition was prepared in the same manner as in Example 1, except that 115 parts were used.

<Comparative Example 1>
2 parts of the benzoxazine compound obtained in Synthesis Example 1 was not used, and the amount of cresol novolac resin (manufactured by DIC "KA-1160", phenolic hydroxyl group equivalent: 117 g/eq) was changed from 3 parts to 5 parts. A resin composition was prepared in the same manner as in Example 1, except for the changes.

<Comparative Example 2>
Instead of 2 parts of the benzoxazine compound obtained in Synthesis Example 1, a commercially available benzoxazine compound (“Pd-type benzoxazine” manufactured by Shikoku Kasei Kogyo Co., Ltd., bis[4-(3,4-dihydro-2H-1, A resin composition was prepared in the same manner as in Example 1, except that 2 parts of 3-benzoxazin-3-yl)phenyl]methane) was used.

<Test Example 1: Measurement and evaluation of tensile modulus>
A release agent-treated PET film ("501010" manufactured by Lintec Co., Ltd., thickness 38 μm, 240 mm square) was coated with a glass cloth-based epoxy resin double-sided copper-clad laminate ("R5715ES" manufactured by Panasonic Corporation, 0.7 mm thick, 255 mm square) were stacked and fixed on four sides with polyimide adhesive tape (width 10 mm) (hereinafter sometimes referred to as "fixed PET film").

The resin compositions prepared in Examples and Comparative Examples were applied onto the release-treated surface of the "fixed PET film" using a die coater so that the thickness of the resin composition layer after drying was 50 µm, and the temperature was maintained at 80°C. A resin sheet was obtained by drying at ~120°C (average 100°C) for 6 minutes. Then, the resin composition layer was heat-cured under curing conditions for 90 minutes after being placed in an oven at 180°C. After thermal curing, the polyimide adhesive tape was peeled off, the cured product was removed from the glass cloth-based epoxy resin double-sided copper-clad laminate, and the PET film ("501010" manufactured by Lintec Co., Ltd.) was also peeled off to obtain a sheet-like cured product. rice field. The resulting cured product is referred to as "evaluation cured product".

The cured product for evaluation was cut into a dumbbell-shaped No. 1 specimen to obtain a test piece. The tensile strength of the test piece was measured using a tensile tester "RTC-1250A" manufactured by Orientec Co., Ltd., and the elastic modulus at 23°C was obtained. The measurement was carried out according to JIS K7127. This operation was performed three times and the average values are shown in the table below. Considering the relaxation of the stress generated during thermosetting in order to reduce warpage, a lower tensile modulus is preferable. Taking this into account, samples with a tensile modulus of elasticity of 10.5 GPa or less were evaluated as "◯", and samples with a tensile modulus of greater than 10.5 GPa were evaluated as "X".

<Test Example 2: Measurement and Evaluation of Peel Strength>
As an inner layer substrate, a glass cloth-based epoxy resin double-sided copper-clad laminate (copper foil thickness 18 μm, substrate thickness 0.8 mm, “R1515A” manufactured by Panasonic Corporation) having copper foil on the surface was prepared. All the copper foil on the surface of this inner layer substrate was removed by etching. After that, drying was performed at 190° C. for 30 minutes.

The resin compositions obtained in the above-described Examples and Comparative Examples were coated with a batch-type vacuum pressure laminator (2-stage build-up laminator "CVP700" manufactured by Nikko Materials Co., Ltd.), and the resin composition layer was the inner layer substrate. It was laminated on both sides of the inner layer substrate so as to join with. This lamination was carried out by pressure bonding for 30 seconds at a temperature of 100° C. and a pressure of 0.74 MPa after reducing the pressure to 13 hPa or less for 30 seconds. Then, the laminated resin sheet was hot-pressed for 60 seconds at 100° C. under atmospheric pressure and a pressure of 0.5 MPa for smoothing. After that, the support was peeled off to obtain an "intermediate multilayer body I" comprising a resin composition layer, an inner layer substrate and a resin composition layer in this order.

On the other hand, a copper foil with a glossy surface (thickness 35 μm, “3EC-III” manufactured by Mitsui Kinzoku Co., Ltd.) was prepared. The glossy surface of this copper foil was roughened by etching with a micro-etching agent (“CZ8101” manufactured by MEC Co., Ltd.) at a copper etching amount of 1 μm. The copper foil thus obtained is called "roughened copper foil".

This roughened copper foil was laminated on both surfaces of the intermediate multilayer body I so that the roughened surface of the roughened copper foil was bonded to the resin composition layer of the intermediate multilayer body I. This lamination was performed under the same conditions as the lamination of the resin sheet to the inner layer substrate described above. As a result, an "intermediate multi-layer body II" containing the surface-roughened copper foil, the resin composition layer, the inner layer substrate, the resin composition layer and the surface-roughened copper foil in this order was obtained.

This intermediate multilayer body II was placed in an oven at 180° C. and additionally heated for 90 minutes. As a result, the resin composition layer is thermally cured, and the roughened copper foil, the insulating layer as a cured product of the resin composition layer, the inner layer substrate, the insulating layer as a cured product of the resin composition layer, and the rough An "evaluation board" containing copper oxide foils in this order was obtained. In this evaluation board, the roughened copper foil corresponds to the conductor layer.

Using the evaluation board described above, the peel strength between the roughened copper foil and the insulating layer was measured. The peel strength was measured according to JIS C6481. Specifically, the peel strength was measured by the following operation. A cut was made in the roughened copper foil of the evaluation substrate to surround a rectangular portion with a width of 10 mm and a length of 100 mm. One end of this rectangular portion was peeled off and gripped with a gripper (Autocom type testing machine "AC-50C-SL" manufactured by TSE Co., Ltd.). A range of 35 mm in length of the rectangular portion was peeled off in the vertical direction, and the load (kgf/cm) at the time of this peeling was measured as the peel strength. The peeling was performed at room temperature at a speed of 50 mm/min. Those having a peel strength of 0.39 kgf/cm or more were evaluated as "good", and those having a peel strength of less than 0.39 kgf/cm were evaluated as "poor".

<Test Example 3: Evaluation of warpage>
As a support, a polyethylene terephthalate film (“AL5” manufactured by Lintec Corporation, thickness 38 μm) provided with a release layer was prepared. On the release layer of this support, the resin compositions obtained in the above Examples and Comparative Examples were uniformly applied so that the thickness of the resin composition layer after drying was 50 μm. Thereafter, the resin varnish was dried at 80° C. to 120° C. (average 100° C.) for 6 minutes to obtain a resin sheet including the support and the resin composition layer.

Next, the resin sheet 50 μm thick is laminated on the entire surface of a 12-inch silicon wafer (thickness 775 μm) using a batch-type vacuum pressure laminator (2-stage build-up laminator “CVP700” manufactured by Nikko Materials Co., Ltd.). Thus, two layers were laminated to form a resin composition layer having a thickness of 100 μm. The obtained silicon wafer with a resin composition layer was heat-treated in an oven at 180° C. for 90 minutes to form a silicon wafer with a cured resin composition layer (that is, an insulating layer). The edge of the obtained wafer with an insulating layer was pressed against a table, and the distance between the edge of the wafer on the opposite side of the pressed portion and the table was measured as the amount of warpage. Those with a warpage amount of 0 to 2 mm were evaluated as "good", and those with a warpage amount of more than 2 mm were evaluated as "poor".

Table 1 below shows the non-volatile components and amounts used in the resin compositions of Examples and Comparative Examples, and the evaluation results of Test Examples.

From the above results, it was found that when (C) the benzoxazine compound having one or more alicyclic structures in the molecule was used, it was possible to achieve both suppression of warpage and excellent adhesion.

Claims (10)

A resin composition comprising (A) an epoxy resin, (B) an inorganic filler, (C) a benzoxazine compound having an alicyclic structure in the molecule, and (D) an elastomer,
(C) component is the formula (2):

[In the formula, R ¹ and R ² each independently represent a halogen atom, a cyano group, an amino group, a nitro group, a hydroxy group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted substituted or unsubstituted alkoxy group, substituted or unsubstituted alkylcarbonyl group, substituted or unsubstituted aryl group, substituted or unsubstituted heteroaryl group, substituted or unsubstituted aryloxy group, substituted or unsubstituted arylcarbonyl group, or , represents a substituted or unsubstituted aralkyl group , Y is a bond, an alkylene group having 1 to 6 carbon atoms, -O-, -S-, -SO ₂ -, -NH-, -CO-, -CONH -, -NHCO-, -COO- or -OCO-, s and t each independently represent an integer of 0 to 4, u represents 0 or 1; ]
is a compound represented by
Component (D) is one or more selected from resins having a glass transition temperature of 25°C or less and resins that are liquid at 25 °C, and has a polybutadiene structure, a polysiloxane structure, and a poly(meth)acrylate in the molecule. structure, a polyalkylene structure, a polyalkyleneoxy structure, a polyisoprene structure, a polyisobutylene structure, and a resin having one or more structures selected from a polycarbonate structure, and having a functional group capable of reacting with component (A), Resin composition. 2. The resin composition according to claim 1, wherein the content of component (B) is 50% by mass or more when all non-volatile components in the resin composition are taken as 100% by mass. 3. The resin composition according to claim 1, wherein component (B) has an average particle size of 10 [mu]m or less. 4. The resin composition according to any one of claims 1 to 3 , further comprising (E) a curing agent. The resin composition according to any one of claims 1 to 4 , for forming an insulating layer. A cured product of the resin composition according to any one of claims 1 to 5 . A sheet-like laminate material containing the resin composition according to any one of claims 1 to 5 . A resin sheet comprising a support and a resin composition layer formed from the resin composition according to any one of claims 1 to 5 provided on the support. A printed wiring board comprising an insulating layer comprising a cured product of the resin composition according to any one of claims 1 to 5 . A semiconductor device comprising the printed wiring board according to claim 9 .