JP7093620B2 - Photosensitive resin plate developer - Google Patents

Description

The present invention relates to a photosensitive resin plate developing apparatus.

Printing plates using photosensitive resins have become widespread due to the high print quality and the like. A part of the surface of the photosensitive resin plate is exposed and cured, and then a developing process is performed by a developing device. The developing apparatus supplies a developing solution to the photosensitive resin plate and removes the unexposed photosensitive resin from the surface.

Patent Document 1 describes a developing apparatus that collects a developing solution used for development and uses it again for developing. By repeatedly supplying the developer to the photosensitive resin plate in this way, the developer can be effectively used.

Japanese Unexamined Patent Publication No. 2005-266416

In the developing apparatus described in Patent Document 1, the recovered developer contains a resin composition (hereinafter referred to as "resin residue") removed from the photosensitive resin plate. The resin residue is dispersed or dissolved in the developer.

When the developer is repeatedly subjected to development and the concentration of the resin residue increases, agglomerates of the resin residue called "debris" or the like may be generated. The formation of such debris is remarkable when an aqueous developer in which the resin residue is difficult to dissolve is used. Further, when the developer stays, the resin residue tends to aggregate and the generation of debris tends to be promoted. If debris is clogged in the developer supply path, the stable supply of the developer may be hindered.

As a method for preventing debris clogging, a method of removing resin residue and debris from the developer with a filter or the like can be considered. However, if an attempt is made to completely remove them, there is a risk that the configuration of the device will be complicated or the size will be increased.

The present invention has been made in view of such a problem, and an object of the present invention is to provide a photosensitive resin plate developing apparatus capable of suppressing debris clogging and stably supplying a developing solution while having a simple structure. To provide.

In order to solve the above problems, the photosensitive resin plate developing apparatus according to the present invention is arranged above the resin plate mounting portion on which the photosensitive resin plate is placed and the developing solution. It is a discharge pipe that discharges, and a flow path through which the developer flows is formed inside, and the discharge pipe having a plurality of discharge holes penetrating the tube wall and the developer used for developing the photosensitive resin plate are collected. , A collection and supply unit for supplying to the discharge pipe. The discharge pipe has an outlet for discharging the developer from the flow path on the downstream side of the discharge hole, and a part of the developer flowing through the flow path toward the outlet is discharged from the discharge hole.

According to the above configuration, during the developing process, the developer flows through the flow path of the discharge pipe and flows out from the outlet. Then, a part of the developer flowing through the flow path is discharged from the discharge hole and supplied to the photosensitive resin plate.

That is, according to the above configuration, the retention of the developer in the flow path of the discharge pipe is suppressed during the development process. Most of the debris contained in the developer is washed away by the developer reaching the outlet and discharged from the outlet. As a result, it is possible to suppress the clogging of debris in the discharge hole of the discharge pipe and to stably supply the developing solution.

The cross-sectional area of each of the plurality of discharge holes may be smaller than the cross-sectional area of the outlet.

According to the above configuration, it is possible to promote the outflow of the developer from the outlet having a relatively large cross section. That is, the flow rate of the developer reaching the outlet can be made larger than the flow rate of the developer discharged from the discharge hole. As a result, it is possible to promote the discharge of debris from the outlet, suppress the clogging of debris in the discharge hole of the discharge pipe, and stably supply the developer.

The discharge pipe has a straight pipe portion extending along a predetermined axis, and when the straight pipe portion is viewed from a direction orthogonal to the axis line, the discharge hole is a pipe wall of the straight pipe portion in a direction substantially orthogonal to the axis line. May penetrate.

According to the above configuration, it is possible to prevent debris flowing through the straight tube portion together with the developer from being guided to the discharge hole. As a result, it is possible to suppress the clogging of debris in the discharge hole of the discharge pipe and to stably supply the developing solution.

The discharge hole may be formed in a portion of the pipe wall of the discharge pipe that is closer to the lower side.

According to the above configuration, after the development process is completed and the developer is no longer supplied to the discharge pipe, the developer in the flow path is discharged from the discharge hole by gravity, and the developer remaining in the flow path is discharged. The amount can be reduced. As a result, it is possible to suppress the generation and clogging of new debris in the flow path of the discharge pipe, and to stably supply the developing solution.

The outlet may be open to the atmosphere.

According to the above configuration, it is possible to smoothly flow the developer in the flow path during the development process and further suppress the retention of the developer. As a result, it is possible to reliably suppress the clogging of debris in the discharge hole of the discharge pipe.

The outlet may be directed downwards.

According to the above configuration, after the development process is completed and the developer is no longer supplied to the discharge pipe, the developer in the flow path flows out from the outlet due to gravity. As a result, it is possible to suppress the generation and clogging of new debris in the flow path of the discharge pipe, and to stably supply the developing solution.

By the way, by flowing the developer through the flow path as described above, it is possible to suppress the occurrence of debris clogging in the discharge hole of the discharge pipe. However, if the flow rate of the developer reaching the outlet increases, the pressure of the developer in the flow path decreases, and there is a possibility that the developer having a sufficient flow rate cannot be discharged from the discharge hole.

Therefore, the discharge pipe may have a bent portion that bends downward.

According to the above configuration, the bent portion provides resistance to the flow of the developer. Therefore, by providing the bent portion, the pressure of the developer in the flow path can be appropriately increased, and the developer can be discharged at an appropriate flow rate from the discharge hole.

The discharge pipe may be arranged above the collection and supply unit.

According to the above configuration, the developer is supplied from the collection and supply unit to the upper discharge pipe during the development process. Therefore, after the development process is completed and the developer is no longer supplied to the discharge pipe, the developer remaining in the flow path flows out due to gravity. As a result, it is possible to suppress the generation and clogging of new debris in the flow path of the discharge pipe, and to stably supply the developing solution.

According to the present invention, it is possible to provide a photosensitive resin plate developing apparatus capable of suppressing clogging of debris and stably supplying a developing solution, although it has a simple structure.

It is a schematic diagram which shows the developing apparatus which concerns on embodiment. It is a perspective view which shows the developer development part of the developer of FIG. It is sectional drawing which shows the section III-III of FIG. It is sectional drawing which shows the IV-IV cross section of FIG.

Hereinafter, embodiments will be described with reference to the accompanying drawings. In order to facilitate understanding of the description, the same components are designated by the same reference numerals as possible in the drawings, and duplicate description is omitted.

First, the outline of the developing apparatus 1 according to the embodiment will be described with reference to FIG. FIG. 1 is a schematic view showing a developing device 1.

The developing device 1 is a device called a "in-line type" or the like, and is a device for developing a photosensitive resin plate 9 (hereinafter referred to as "resin plate 9"). The developing apparatus 1 uses water containing a surfactant as a developing solution to develop the resin plate 9. The development process is referred to as "water development" or the like.

The resin plate 9 is formed by laminating an adhesive or a photosensitive resin on the upper surface of a base film (not shown), and has a sheet shape as a whole. As the photosensitive resin, for example, acrylic resin, polyester, nylon, polyvinyl alcohol and the like can be used.

A part of the surface of the resin plate 9 is irradiated with ultraviolet rays prior to the development process by the developing apparatus 1. In the part where the ultraviolet rays are examined, that is, the exposed part, a chemical change in which the photosensitive resin is cured occurs. On the other hand, in the unexposed portion, the photosensitive resin is not cured. In the developing process of the developing apparatus 1, the unexposed photosensitive resin is removed, and unevenness of a predetermined pattern is formed on the surface of the resin plate 9.

Next, the main configuration of the developing apparatus 1 will be described. As shown in FIG. 1, the developing apparatus 1 includes a transport unit 2, a discharge unit 3, and roll brushes 41, 42, and 43.

The transport unit 2 is a functional unit that transports the resin plate 9. The transport unit 2 has a resin plate mounting unit 22 on its upper surface. The resin plate 9 is placed on the resin plate mounting portion 22 with the exposed surface facing upward. A guide plate 24 is fixed to one end of the resin plate 9. The guide plate 24 is a metal member and has a flat shape.

The transport unit 2 has a roller chain (not shown). The roller chain is arranged along the resin plate mounting portion 22. The end of the guide plate 24 is locked to the roller chain. When a motor (not shown) is driven, the roller chain rotates and the guide plate 24 is moved along the resin plate mounting portion 22. As a result, the resin plate 9 is conveyed in the direction indicated by the arrow A1.

The discharge unit 3 is a functional unit that discharges a developer or water. The discharge unit 3 has a plurality of discharge pipes 31, 32, 33. The discharge pipes 31, 32, and 33 are all arranged above the resin plate mounting portion 22 and have a pipe shape.

The roll brushes 41, 42, and 43 are formed so as to extend along an axis (for example, the axis Cr of the roll brush 41 shown in FIG. 2). Further, the roll brushes 41, 42, and 43 are arranged above the resin plate mounting portion 22 and below the discharge pipes 31, 32, 33 so that the axes extend substantially horizontally, respectively.

Elastic hair bundles are arranged on the outer peripheral portions of the roll brushes 41, 42, and 43. When the roll brushes 41, 42, and 43 rotate around their respective axes, the bristles of the bristles move on the resin plate mounting portion 22.

The developing device 1 can be divided into a developer developing unit, a developer rinsing unit, and a water rinsing unit. The developer developing unit, the developing solution rinsing unit, and the water rinsing unit are arranged so as to be arranged in this order in the direction in which the resin plate 9 is conveyed. A discharge tube 31 and a roll brush 41 are arranged in the developer developing section, and a discharge tube 32 and a roll brush 42 are arranged in the developer rinse section. Further, a discharge pipe 33 and a roll brush 43 are arranged in the water rinse portion.

In the developer developing unit, the developer is discharged from the discharge pipe 31 and supplied to the surface of the resin plate 9. Further, the roll brush 41 rotates in the directions of arrows R1 and R2 and reciprocates in the direction of arrow S (see FIG. 2). As a result, the surface of the resin plate 9 is rubbed by the tips of the bristles 46 of the roll brush 41. The unexposed photosensitive resin on the surface of the resin plate 9 is scraped out by the hair bundle 46 and discharged together with the developing solution. The resin plate 9 that has passed through the developer developing section then reaches the developer rinsing section.

In the developer rinsing unit, the developer is discharged from the discharge pipe 32 and supplied to the surface of the resin plate 9. As will be described later, the developer discharged here does not contain resin residue. Further, the roll brush 42 rotates, and the hair bundle rubs the surface of the resin plate 9. As a result, the resin residue adhering to the surface of the resin plate 9 is removed, and the resin residue is discharged together with the developer. The resin plate 9 that has passed through the developer rinse portion then reaches the water rinse portion.

In the water rinse portion, a large amount of water is discharged from the discharge pipe 33 and supplied to the surface of the resin plate 9. Further, the roll brush 43 rotates, and the hair bundle rubs the surface of the resin plate 9. As a result, the resin residue and the surfactant adhering to the surface of the resin plate 9 are removed and discharged together with water.

The resin plate 9 that has been subjected to the development treatment by the developing apparatus 1 is swollen with a developer and water. After the resin plate 9 is developed, it is dried by a drying device (not shown). In the drying process, the resin plate 9 is promoted to be dried by blowing high temperature air. The dried resin plate 9 is used as a printing plate.

The developing device 1 further includes a recovery and supply unit 5, a new liquid supply unit 6, and a water supply unit 7.

The recovery and supply unit 5 is a functional unit that supplies the developer to the developer developer. The recovery supply unit 5 is arranged below the discharge pipe 31, and has a drain pan 51, a recovery liquid storage tank 52, a filter device 54, and a filtrate storage tank 56.

The drain pan 51 is located below the transport unit 2 and at a portion corresponding to the developer developing unit and the developer rinsing unit. The drain pan 51 is configured to collect the developer discharged downward from the developer developing unit and the developer rinsing unit.

The recovery liquid storage tank 52 is a container capable of storing liquid. The developer recovered by the drain pan 51 flows into and is stored inside the recovery liquid storage tank 52. The developer contains resin residue scraped from the surface of the resin plate 9 in the developer developing section and resin residue removed from the surface of the resin plate 9 in the developer rinsing section. The resin residue is dispersed in the developing solution.

A part of the developer stored in the recovery liquid storage tank 52 is sucked by the pump 53b via the suction pipe 53a and fed to the filter device 54 via the feed pipe 53c. The filter device 54 has a filter (not shown) inside thereof. The developer fed by the feed pipe 53c is supplied into the filter device 54 and passes through the filter. When the developer passes through the filter, the surfactant is removed from the surface of the resin residue dispersed in the developer due to friction with the filter. As a result, in the developing solution that has passed through the filter, the resin residue is aggregated without adding the aggregating agent, and an agglomerate called "debris" or the like is generated.

The developer in the filter device 54 containing the debris is fed to the filter liquid storage tank 56 via the feed pipe 55. The filtrate storage tank 56 is a container capable of storing liquid. A filter 56a is arranged inside the filtrate storage tank 56. The developer supplied by the supply pipe 55 is supplied into the filtrate storage tank 56 and passes through the filter 56a. When the developer passes through the filter 56a, the debris contained in the developer is removed. The filtrate storage tank 56 stores the developer from which debris has been removed in this way.

The developer stored in the filtrate storage tank 56 is sucked by the pump 57b via the suction pipe 57a and returned to the recovery liquid storage tank 52 via the feed pipe 57c. By supplying the developer from which the resin residue has been removed from the filtrate storage tank 56, the concentration of the resin residue decreases in the recovery liquid storage tank 52.

The developer stored in the developer storage tank 56 is sucked by the pump 58b via the suction pipe 58a and supplied to the discharge pipe 31 of the developer developing unit via the feed pipe 58c. The discharge pipe 31 discharges the developer and supplies it to the resin plate 9 arranged in the developer developing unit. Specifically, the developer is discharged from one discharge tube 31 toward the two roll brushes 41, and is supplied to the surface of the resin plate 9 via the bristles of the roll brush 41.

The developer supplied to the surface of the resin plate 9 in the developer developing unit contains the resin residue scraped off by the roll brush 41. The developer falls from the transport unit 2, is collected by the drain pan 51 as described above, and is subjected to a process of removing resin residue. That is, the developer discharged from the developer developer is repeatedly subjected to the development of the resin plate 9.

The new liquid supply unit 6 is a functional unit that supplies the developer to the developer rinse unit. The new liquid supply unit 6 has a new liquid supply source 61. The new liquid supply source 61 is, for example, a tank for storing a developer that has not yet been used for developing the resin plate 9.

The developer of the new liquid supply source 61 is sucked by the pump 63b via the suction pipe 63a and supplied to the discharge pipe 32 of the developer rinse unit via the feed pipe 63c. The discharge pipe 32 discharges the developer and supplies it to the resin plate 9 arranged in the developer rinse unit. Specifically, the developer is discharged from one discharge tube 32 toward the two roll brushes 42, and is supplied to the surface of the resin plate 9 via the bristles of the roll brush 42.

The developer supplied to the surface of the resin plate 9 in the developer rinse portion contains the resin residue adhering to the surface of the resin plate 9. The developer falls from the transport unit 2 and is collected by the drain pan 51. That is, the developer discharged from the new liquid supply unit is supplied to the developer development unit after being subjected to a treatment for removing resin residue together with the developer discharged from the developer development unit.

The water supply unit 7 is a functional unit that supplies water to the water rinse unit. The water supply unit 7 has a water supply source 71. The water supply source 71 is, for example, a tank for storing water supplied from tap water.

The water of the water supply source 71 is sucked by the pump 73b via the suction pipe 73a, and is supplied to the discharge pipe 33 of the water rinse portion via the supply pipe 73c. The discharge pipe 33 discharges water and supplies it to the resin plate 9 arranged in the water rinse portion. Specifically, water is discharged from one discharge pipe 33 toward two roll brushes 43, and is supplied to the surface of the resin plate 9 via the bristles of the roll brush 43.

The water supplied in the water rinse portion contains the resin residue and the surfactant adhering to the surface of the resin plate 9. The water falls from the transport unit 2 and is collected by the drain pan 8. The water recovered by the drain pan 8 is filtered by a filtration device (not shown) to remove impurities, and then returned to the water supply source 71.

Next, the supply of the developer in the developer developing unit will be described with reference to FIGS. 2 to 4. FIG. 2 is a perspective view showing a developer developing unit of the developer 1, and shows a part of a plurality of discharge tubes 31 and a roll brush 41 arranged in the developer developing unit. FIG. 3 is a cross-sectional view showing a section III-III of FIG. The cross section III-III is a plane including the axis Cp described later. That is, FIG. 3 shows the discharge pipe 31 from the direction orthogonal to the axis Cp. FIG. 4 is a cross-sectional view showing the IV-IV cross section of FIG. The IV-IV cross section is a plane orthogonal to the axis Cp.

As shown in FIGS. 2 and 3, the discharge pipe 31 has a straight pipe portion 35 and a bent portion 36.

The straight pipe portion 35 has a cylindrical shape extending around the axis Cp (see FIGS. 3 and 4). The axis Cp is a virtual straight line extending in the substantially horizontal direction. As shown in FIG. 2, the resin plate 9 is conveyed on the resin plate mounting portion 22 in the direction indicated by the arrow A2, whereas the axis Cp extends in a direction substantially orthogonal to the arrow A2. ..

As shown in FIG. 3, a flow path 35a is formed inside the straight pipe portion 35. One end of the straight pipe portion 35 is connected to the feed pipe 58c so that the flow path 35a communicates with the flow path 58d in the feed pipe 58c of the collection and supply section 5 (see FIG. 1).

A plurality of discharge holes 39 are formed in the pipe wall of the straight pipe portion 35. The discharge hole 39 penetrates the pipe wall of the straight pipe portion 35 along the straight line P and communicates the flow path 35a with the outside. As shown in FIG. 3, when the straight pipe portion 31 is viewed from the direction orthogonal to the axis Cp, the straight line P is substantially orthogonal to the axis Cp. The cross-sectional area of each of the plurality of discharge holes 39 is smaller than the cross-sectional area of the outlet 38 described later.

As shown in FIG. 4, the discharge hole 39 is formed in a lower portion (that is, a portion below the axis Cp) in the pipe wall of the straight pipe portion 35. As shown in FIG. 3, the discharge holes 39 are arranged so as to be spaced apart from each other in the axis Cp direction. Further, as shown in FIG. 4, the discharge holes 39 are arranged so as to be spaced apart from each other in the circumferential direction about the axis Cp.

The bent portion 36 has a cylindrical shape bent by approximately 90 °. As shown in FIG. 3, a flow path 36a is formed inside the bent portion 36. One end of the bent portion 36 is connected to the other end of the straight pipe portion 35 so that the flow path 36a communicates with the flow path 35a of the straight pipe portion 35. The outlet 38, which is the other end of the bent portion 36, is open to the atmosphere and is directed downward.

As shown by the arrow F1 in FIG. 3, the flow path 58d of the feed pipe 58c allows the developer to flow upward. The developer contains resin residue D1 and debris D2. The developer that has passed through the flow path 58d changes its direction and flows into the flow path 35a of the straight pipe portion 35 from the inflow port 37.

Next, the developer flows through the flow path 35a toward the outlet 38, as shown by the arrow F2 in FIG. That is, the developer flows so as to straddle the resin plate mounting portion 22. At this time, as shown by the arrow F3, a part of the developer flowing through the flow path 35a is discharged to the outside from the discharge hole 39. As shown in FIG. 2, the developer is discharged toward the two roll brushes 41 arranged below the discharge pipe 31, and is discharged onto the surface of the resin plate 9 via the bristles of the roll brush 41. Will be supplied.

As described above, the cross-sectional area of each of the plurality of discharge holes 39 is smaller than the cross-sectional area of the outlet 38. Therefore, most of the developer flowing through the flow path 35a passes through the straight pipe portion 35 without being discharged from the discharge hole 39.

The developer that has passed through the straight pipe portion 35 then flows into the flow path 36a of the bent portion 36. The developer turns downward along the flow path 36a as indicated by arrow F4 and flows out of the outlet 38 as indicated by arrow F5. The developer flowing out from the outlet 38 is collected by the drain pan 51 (see FIG. 1).

Next, the action and effect of the developing device 1 will be described.

According to the configuration of the developing apparatus 1, the developing solution flows through the flow paths 35a and 36a of the discharge pipe 31 and flows out from the outlet 38 during the developing process. Then, a part of the developer flowing through the flow path 35a in this way is discharged from the discharge hole 39 and supplied to the resin plate 9.

That is, according to the above configuration, the retention of the developer in the flow paths 35a and 36a of the discharge pipe 31 is suppressed during the development process. Most of the debris D2 contained in the developer is flushed by the developer leading to the outlet 38 and discharged from the outlet 38. As a result, clogging of the debris D2 in the discharge hole 39 of the discharge pipe 31 is suppressed, and the developer can be stably supplied.

Further, the cross-sectional area of each of the plurality of discharge holes 39 is smaller than the cross-sectional area of the outlet 38.

According to the above configuration, it is possible to promote the outflow of the developer from the outlet 38 having a relatively large cross section. That is, the flow rate of the developer reaching the outlet 38 can be made larger than the flow rate of the developer discharged from the discharge hole 39. As a result, the discharge of the debris D2 from the outlet 38 is promoted, the clogging of the debris D2 is suppressed in the discharge hole 39 of the discharge pipe 31, and the developer can be stably supplied.

Further, the discharge pipe 31 has a straight pipe portion 35 extending along the axis Cp. When the straight pipe portion 35 is viewed from a direction orthogonal to the axis Cp, the discharge hole 39 penetrates the pipe wall of the straight pipe portion 35 in a direction substantially orthogonal to the axis Cp.

According to the above configuration, it is possible to prevent the debris D2 flowing through the straight tube portion 35 together with the developing solution from being guided to the discharge hole 39. As a result, clogging of the debris D2 in the discharge hole 39 of the discharge pipe 31 is suppressed, and the developer can be stably supplied.

Further, the discharge hole 39 is formed in a portion of the pipe wall of the discharge pipe 31 that is closer to the lower side.

According to the above configuration, after the development process is completed and the developer is no longer supplied to the discharge pipe 31, the developer in the flow paths 35a and 36a is discharged from the discharge hole 39 by gravity, and the flow path 35a is used. , 36a can reduce the amount of developer remaining. As a result, the generation and clogging of new debris D2 in the discharge pipe 31 can be suppressed, and the developer can be stably supplied.

Further, the outlet 38 is open to the atmosphere.

According to the above configuration, it is possible to smoothly flow the developer in the flow paths 35a and 36a during the development process and further suppress the retention of the developer. As a result, it is possible to reliably suppress the clogging of the debris D2 in the discharge hole 39 of the discharge pipe 31.

Further, the outlet 38 is directed downward.

According to the above configuration, after the development process is completed and the developer is no longer supplied to the discharge pipe 31, the developer in the flow paths 35a and 36a flows out from the outlet 38 due to gravity. As a result, the generation and clogging of new debris D2 in the flow paths 35a and 36 of the discharge pipe 31 can be suppressed, and the developer can be stably supplied.

Further, the discharge pipe 31 has a bent portion 36 that bends downward.

According to the above configuration, the bent portion 36 provides resistance to the flow of the developer. Therefore, by providing the bent portion 36, the pressure of the developing solution in the flow path 35a can be appropriately increased, and the developing solution having an appropriate flow rate can be discharged from the discharge hole 39.

Further, the discharge pipe 31 is arranged above the collection and supply unit 5.

According to the above configuration, the developer is supplied from the collection and supply unit 5 to the discharge pipe 31 above during the development process. Therefore, after the development process is completed and the developer is no longer supplied to the discharge pipe 31, the developer remaining in the flow paths 35a and 36a flows out due to gravity. As a result, the generation and clogging of new debris D2 in the flow paths 35a and 36 of the discharge pipe 31 can be suppressed, and the developer can be stably supplied.

The embodiments of the present invention have been described above with reference to specific examples. However, the present invention is not limited to these specific examples. That is, those skilled in the art with appropriate design changes to these specific examples are also included in the scope of the present invention as long as they have the features of the present invention. Each element provided in each of the above-mentioned specific examples, its arrangement, material, condition, shape, size, and the like are not limited to those exemplified, and can be appropriately changed.

The above-mentioned developing apparatus 1 is an in-line type that performs a developing process while transporting a resin plate 9, but the present invention is not limited to this aspect. The present invention can also be applied to, for example, a developing device of a type called "batch type" in which a stationary resin plate 9 is subjected to a developing process.

Further, the discharge pipe 31 described above is arranged so that the straight pipe portion 35 extends in a substantially horizontal direction, but the present invention is not limited to this aspect. That is, the straight pipe portion 35 may be arranged so as to be inclined with respect to the horizontal direction. According to this configuration, after the developer is no longer supplied to the discharge pipe 31, the developer remaining in the flow paths 35a and 36a can be discharged by gravity. As a result, after the development process is completed, it becomes possible to suppress the generation and clogging of new debris D2 in the flow paths 35a and 36 of the discharge pipe 31.

1: Developing device 22: Resin plate mounting part 31: Discharge tube 36: Bending part 38: Outlet 39: Discharge hole 5: Recovery and supply part 9: Photosensitive resin plate

Claims (8)

It is a developing device for photosensitive resin plates,
The resin plate mounting part on which the photosensitive resin plate is placed, and
A discharge pipe that is arranged above the resin plate mounting portion and discharges the developer, and has a flow path for flowing the developer inside and has a plurality of discharge holes penetrating the tube wall.
It is provided with a collection and supply unit that collects the developer used for developing the photosensitive resin plate and supplies it to the discharge tube.
The discharge pipe has an outlet for discharging the developer from the flow path on the downstream side of the discharge hole, and a part of the developer flowing through the flow path toward the outlet is discharged from the discharge hole. death,
The cross-sectional area of each of the plurality of discharge holes is smaller than the cross-sectional area of the outlet.
The flow rate of the developer to the outlet is larger than the flow rate of the developer discharged from the discharge hole.
Photosensitive resin plate developer. The discharge pipe has a straight pipe portion extending along a predetermined axis.
The photosensitive member according to claim 1, wherein when the straight tube portion is viewed from a direction orthogonal to the axis line, the discharge hole penetrates the tube wall of the straight tube portion in a direction substantially orthogonal to the axis line. A developing device for a sex resin plate. The developer for a photosensitive resin plate according to claim 1 or 2, wherein the discharge hole is formed in a portion of the tube wall of the discharge tube closer to the lower side. The photosensitive resin plate developing apparatus according to any one of claims 1 to 3, wherein the outlet is open to the atmosphere. The developing apparatus for a photosensitive resin plate according to claim 4, wherein the outlet is directed downward. The developing device for a photosensitive resin plate according to claim 5, wherein the discharge pipe has a bent portion that bends downward. The photosensitive resin plate developing apparatus according to any one of claims 1 to 6, wherein the discharge pipe is arranged above the collection and supply unit. The method for developing a photosensitive resin plate using the photosensitive resin plate developing apparatus according to any one of claims 1 to 7.

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