JP7082615B2 - Electrochromic coated glass articles and how to laser machine them - Google Patents

Description

Cross-reference of related applications

This application claims priority to U.S. Patent Application No. 15 / 288,071 filed October 7, 2016, which is hereby incorporated by reference in its entirety. Be incorporated.

The present disclosure relates generally to electrochromic coated glass articles, and more particularly to methods of laser machining such articles. The present disclosure further relates to an insulating glass unit containing a glass substrate coated with an electrochromic layer.

Glass substrates coated with electrochromic films can be useful in a variety of applications, including architectural and automotive applications. For example, electrochromic films can be used to alter light intensity and / or light absorption in a room or vehicle. An insulating glass unit (IGU) may include two glass sheets with a peripheral seal forming a cavity between the glass sheets, the cavity being an insulating gas, eg, argon, to improve the energy rating of the IGU. And so on. In certain applications, one of the glass sheets in the IGU may be coated with an electrochromic layer. Such coated IGUs additionally include one or more components for applying a voltage to the electrochromic layer, such as a bus bar, and as a result, the IGUs have different wavelengths. And / or may provide a coloring effect that can reduce the heat transmission.

During the manufacture of IGUs or any other glass article containing an electrochromic layer, the electrochromic layer is due to the susceptibility of these films to the moisture and particles generated during the cutting and polishing steps. , Can be applied to glass after these steps. For example, exposure of electrochromic films to aqueous coolants used during the polishing process can result in film swelling and / or destruction, thereby impairing their function and / or aesthetic quality. Therefore, in conventional IGU manufacturing, the glass sheet is coated with a large glass substrate with an electrochromic film and then cut to size (“coat-and-cut”). Instead, they can often be first cut to the desired IGU shape and size and then coated with an electrochromic film (“cut-and-coat”).

However, the cutting-and-coating process can result in a glass substrate with a significant area that is not coated with the electrochromic layer or evenly coated due to the tightening fixation. For example, components for positioning and holding the glass substrate in an appropriate position in the coating apparatus may interfere with the ability to coat the glass substrate end-to-edge. In addition, the coating-because the tightening fixation must be specific to the shape and / or size of each glass substrate and must be adjusted to accommodate different glass shapes and / or sizes. And-The cutting process can have low manufacturing flexibility. In contrast, the coating-and-cutting process can practice a single standard tightening fixation to a large glass substrate, which can subsequently be cut to size (s). Coating-and-cutting).

Thus, a method of making a glass substrate coated with an electrochromic film that does not substantially damage the electrochromic film and / or results in uncoated or non-uniformly coated areas. It would be advantageous to provide a method, which does not result in a glass substrate containing. Further, a method of manufacturing such an electrochromic coated glass article, which can exhibit high manufacturing flexibility and / or low manufacturing cost, such as coating a glass substrate having a general shape and / or size. It would then be advantageous to provide a method, which can subsequently cut the glass into a specified shape and / or size for the desired application.

The present disclosure is a glass article comprising, in various embodiments, a first surface, a second surface facing the first surface, and an electrochromic coating disposed on at least a portion of the second surface. When applying a voltage to a glass article, the first region of the coated portion of the glass substrate has a first visible light transmittance that is lower than the second visible light transmittance of the second region of the coated portion. Regarding glass articles that have. According to some embodiments, the first region may be colored and the second region may not be colored when the voltage is applied. In various embodiments, the first and second regions can be separated by contours containing multiple defect spots or defect lines. In some embodiments, the defect line can be straight or curved when viewed at right angles to the first or second surface. According to additional embodiments, the first and / or second regions may include patterns on glass articles when viewed at right angles to the first or second surface.

Further, in the present specification, a glass article having a first surface, a second surface facing the first surface, and an electrochromic coating arranged on substantially all of the second surface, the electrochromic. The coating comprises a laser-damaged peripheral area close to at least one end of the glass article, the laser-damaged peripheral area having a width of less than about 10 mm, less than about 1 mm, or less than about 0.1 mm. The glass article having the above is disclosed. In addition, insulating glass units, including such glass articles, are also disclosed herein.

In aspect (1), the present disclosure is an electrochromic glass article comprising a glass substrate having a first surface, a second surface facing it, and one or more ends, said one or more. At least one or more of the ends of the glass comprises a laser-altered end; an electrochromic coating placed on at least a portion of the second surface, and at least two electricity each having a contour. Provided is an electrochromic glass article comprising a partially discontinuous region, wherein the two electrically discontinuous regions are separated by a laser-altered discontinuity having a width of about 0.1 μm to about 25 μm. do. In aspect (2), the present disclosure provides the electrochromic glass article of aspect (1), wherein the electrochromic coating comprises tungsten oxide. In aspect (3), the present disclosure provides the electrochromic glass article of aspect (1) or (2), wherein the electrically discontinuous regions are not substantially laser damaged. In aspect (4), the present disclosure relates to aspects (1)-(3), wherein the second surface of the glass substrate, which is close to the laser-altered discontinuity, is substantially not laser-damaged. The electrochromic glass article according to any one is provided. In aspect (5), the present disclosure provides the electrochromic glass article of aspect (4), wherein the contour of at least one of the at least two electrically discontinuous regions is non-linear. In aspect (6), the present disclosure is that the laser-cut discontinuity is a continuous line formed by a laser with a pulse width of ^10-10 seconds to ^10-15 seconds in FWHM, embodiments (1)-(. The electrochromic glass article according to any one of 5) is provided. In aspect (7), the present disclosure discloses embodiments (1)-(6), wherein the second region comprises a pattern in the first region, or the first region comprises a pattern in the second region. The electrochromic glass article according to any one of the above is provided. In aspect (8), the present disclosure comprises the electrochromic glass article according to any one of aspects (1) to (7), comprising a glass sheet having a thickness in the range of about 0.1 mm to about 10 mm. offer. In aspect (9), the present disclosure comprises a region of the second surface where one of the at least two electrically discontinuous regions is close to the one or more ends of the glass substrate. The electrochromic glass article according to any one of aspects (1) to (8), which comprises. In aspect (10), the present disclosure relates to aspect (9), wherein the electrically discontinuous region in close proximity to one or more ends of the glass substrate has a width of less than about 0.1 mm. Provides electrochromic glassware. In aspect (11), the disclosure discloses that the electrically discontinuous region in close proximity to the one or more ends of the glass substrate is about 5% or less of the coated portion of the glass article. Provided is the electrochromic glass article according to aspect (9).

In aspect (12), the present disclosure is a glass article having a first surface, a second surface facing the first surface, and an electrochromic coating disposed on substantially all of the second surface. A glass article in which the electrochromic coating comprises a laser-damaged peripheral area close to at least one end of the glass article, the laser-damaged peripheral area having a width of less than about 0.1 mm. offer. In aspect (13), the present disclosure provides the glass article of aspect (12), wherein the laser-damaged peripheral area occupies about 5% or less of the second surface of the glass article. In aspect (14), the present disclosure provides the glass article of aspect (12) or (13), wherein the at least one end has a linear or curved contour. In aspect (15), the present disclosure provides the glass article according to any one of aspects (12)-(14), comprising a glass sheet having a thickness in the range of about 0.1 mm to about 10 mm. .. In aspect (16), in the present disclosure, the coated portion of the second surface includes a first region and a second region, which is the first region when a voltage is applied to the glass article. The glass article according to any one of aspects (12) to (15), which has a first visible light transmittance lower than the second visible light transmittance of the second region. In aspect (17), the present disclosure provides the glass article of aspect (16), wherein the first and second regions are separated by a discontinuous line containing one or more laser beams. In aspect (18), the present disclosure provides the glass article of aspect (17), wherein the contour is linear or curved.

In aspect (19), the present disclosure provides an insulating glass unit comprising the electrochromic glass article according to any one of aspects (1)-(11).

In aspect (20), the present disclosure provides an insulating glass unit comprising the glass article according to any one of aspects (12) to (18).

Further features and advantages of the present disclosure are described in the detailed description below, which to some extent will be readily apparent to those skilled in the art, or the detailed description below, the scope of claims, and the accompanying drawings. Including, it will be recognized by practicing such methods as described herein.

Both the general description above and the detailed description below are intended to present various embodiments of the present disclosure and provide an overview or framework for understanding the nature and characteristics of the claims. That should be understood. The accompanying drawings are included to provide a further understanding of the present disclosure and are incorporated herein by them and form part of this specification. The drawings exemplify various embodiments of the present disclosure and serve to explain the principles and actions of the present disclosure as well as the description.

The detailed description below can be further understood when read in conjunction with the drawings below, where possible, the same numbers indicate the same components, and the accompanying figures are not necessarily to a certain scale. Please understand that it is not drawn in.
A glass substrate having a contour including a plurality of defect lines is shown. A glass substrate having a contour including a plurality of defect lines is shown. The positioning of the laser beam focused line for inducing absorption on the glass substrate along the focused line is shown. The positioning of the laser beam focused line for inducing absorption on the glass substrate along the focused line is shown. An optical assembly for condensing a laser beam onto a laser beam focused line according to various embodiments of the present disclosure is shown. Shown is a glass substrate comprising an electrochromic coated region and an uncoated region according to a particular embodiment of the present disclosure. Shown is a glass substrate comprising an electrochromic coated region and an uncoated region according to a particular embodiment of the present disclosure. Shown is a glass substrate comprising an electrochromic coated region and an uncoated region according to a particular embodiment of the present disclosure.

Methods The glass articles disclosed herein drill into a material in an optional combination with one or more methods of inducing defects or discontinuities in an electrochromic layer coated on glass. One or one to make a small "hole" in the glass (eg, 100 micrometers or less, 10 micrometers or less, or 1 micrometer or less) for cutting, separating, drilling, or otherwise processing. It can be manufactured using multiple methods. In certain embodiments, ultra-short (ie, ^{10-10 to 10-15 second} pulse widths, eg nanoseconds to femtoseconds) pulsed laser beams (eg, 1064 nm, 532 nm, 355 nm, or 266 nm, etc. in FWHM). (Operating at a wavelength of) can be focused to an energy density above a threshold that can create defects in the area of focus on or within the glass. By repeating the process, a series of laser-induced defects arranged along a predetermined path or contour can be created. In some embodiments, the laser-induced defect lines can be separated from each other sufficiently close together, thereby creating a mechanically weakly controlled region within the glass. , Optionally, used to crush or separate (mechanically or thermally) the material along the formed contour. For example, after contact with an ultrashort pulse laser, the material may use a second laser beam, eg, an infrared laser such as a carbon dioxide (CO ₂ ) laser, or others to separate the glass into one or more portions. Can be contacted with a source of thermal stress.

Various embodiments allow spots, series of spots, or lines of one or more vertical faults or defects to be made on the glass substrate, which can outline or path the least resistance. The substrate can be separated along them to form the desired shape, in which case the contour may be a plurality of defect lines extending from the first surface of the glass substrate to the second surface facing it. Includes area. The substrate to be processed is irradiated with an ultrashort pulse laser beam (eg, pulse width <100 picoseconds; wavelength ≤ 1064 nm) that can be focused on high aspect ratio focused lines that penetrate all or part of the substrate thickness. Can be done.

Within this amount of high energy density, the substrate can be altered by a non-linear effect, which can be triggered by the high light intensity. Below this intensity threshold, the substrate can be transparent to the laser irradiation and cannot be altered to produce defect lines. As used herein, if substrate absorption is less than about 10% per mm of substrate depth at the wavelength of the laser, eg, less than about 5%, or less than about 1%, the substrate is at the laser wavelength. On the other hand, it is "substantially transparent". By scanning the laser over the desired contour or path, one or more narrow defect lines can be created on the substrate, and the contour can form a perimeter or shape along it. , The glass substrate can be separated, and / or the contour can form a colored or uncolored area of the coated substrate.

The ultrashort pulse laser can cause multiphoton absorption (“MPA”) in a substantially transparent material such as glass. MPA is the simultaneous absorption of two or more photons of the same or different frequencies to excite a molecule from a state, usually the ground state, to a higher energy electronic state. The energy difference between the lower and higher energy states involved in the molecule is equal to the sum of the energies of the two photons. MPA, also called induced absorption, can be a secondary or tertiary process, eg, several orders of magnitude weaker than linear absorption. It differs from linear absorption in that, for example, the intensity of induced absorption can be proportional to the square of light intensity, thus it is a nonlinear optical process.

The pulsed laser beam may have a wavelength selected from those for which the substrate is substantially transparent, such as wavelengths of about 1064 nm or less, such as 532 nanometers, 355 nanometers, or 266 nanometers. , In this case all ranges and subranges between those values are included. Exemplary output levels for the pulsed laser can be in the range of about 10 W to about 150 W, such as about 25 W to about 125 W, or about 50 W to about 100 W, in some embodiments, in this case of them. All ranges and subranges between the values are included. In various embodiments, the pulsed laser beam can have a pulse duration of less than 10 nanoseconds, eg, less than about 100 picoseconds. In some embodiments, the pulsed laser beam is from more than about 1 picosecond to less than about 100 picoseconds, eg, about 5 picoseconds to about 50 picoseconds, about 10 picoseconds to about 30 picoseconds, or about 15 picoseconds. It has pulse durations ranging from picoseconds to about 20 picoseconds, in which case all and subranges between those values are included. In additional embodiments, the pulse repetition rate of the pulsed laser beam is from about 1 kHz to about 4 MHz, such as from about 10 kHz to about 650 kHz, from about 50 kHz to about 500 kHz, from about 100 kHz to about 400 kHz, or from about 200 kHz to about 300 kHz. It can be a range, in which case all ranges and subranges between those values are included.

The pulsed laser beam may operate in a single pulse mode in some embodiments or in a burst mode in other embodiments. In the latter embodiment, the pulse burst can include more than one pulse per burst, eg, 3, 4, 5, 10, 15, 20, 25, or more, in this case those. All ranges and subranges between the values are included. The duration between individual pulses in a pulse burst is, for example, from about 1 nanosecond to about 50 nanoseconds, such as from about 10 nanoseconds to about 30 nanoseconds, or from about 20 nanoseconds to about 40 nanoseconds. It may be a range, in which case all ranges and subranges between those values are included. The duration between pulse bursts can, in certain embodiments, range from about 1 microsecond to about 20 microseconds, eg, about 5 microseconds to about 10 microseconds, in which case they. All ranges and subranges between the values are included. Thus, the burst repeat frequency of the bals laser beam can range from about 1 kHz to about 200 kHz, eg, about 20 kHz to about 150 kHz, or about 50 kHz to about 100 kHz, and in this case all between those values. Ranges and subranges are included.

In burst mode, the average laser output per burst is from about 50 μJ / burst to about 1000 μJ / burst, for example from about 100 μJ / burst to about 750 μJ / burst, from about 200 μJ / burst to about 500 μJ / burst, or from about 250 μJ / burst. It can be in the range of about 400 μJ / burst, etc., in which case all and subranges between those values are included. According to additional embodiments, the average laser power applied to a given material can be measured as μJ / burst per 1 mm of material, eg, a unit thickness (mm) of a given material (eg, glass). More than about 40 μJ / burst, for example, about 40 μJ / burst / mm to about 2500 μJ / burst / mm, about 100 μJ / burst / mm to about 2000 μJ / burst / mm, about 250 μJ / burst / mm to about 1500 μJ / burst / mm. , Or range from about 500 μJ / burst / mm to about 1000 μJ / burst / mm, in which case all and subranges between those values are included. For example, a 0.1-0.2 mm thick Corning Eagle XG® glass substrate is machined using a 200 μJ / burst pulsed laser to provide an exemplary laser output of 1000-2000 μJ / burst / mm. be able to. In another non-limiting example, a 0.5-0.7 mm thick Corning "Eagle XG" glass substrate of 400-700 μJ / burst to provide an exemplary laser output of 570-1400 μJ / burst / mm. It can be processed using a pulsed laser.

In a non-limiting embodiment, the glass substrate and the pulsed laser beam can be moved parallel to each other, for example, the glass substrate can be moved parallel to the pulsed laser beam to create a contour, and. / Or the pulsed laser beam can be moved in parallel to the glass substrate. In one particular embodiment, the glass substrate is translated and the pulsed laser beam is applied to it, while the pulsed laser itself is also translated. For example, in roll-to-roll machining, the glass substrate can be very long, eg, tens of meters or more in length, and is substantially continuously translated during laser machining. The laser is translated at the appropriate speed and along the appropriate vector to create one or more contours on the glass substrate. Either the substrate or the laser may vary their speed during this process.

The contour can include multiple defect lines that can be traced or demarcated around the shape created by either subsequent separation or subsequent application of voltage (eg, coloring). The translation or scan speed may depend on various laser machining parameters including, for example, laser power and / or repeat rate. Exemplary speeds of parallel movement or scanning are, for example, from about 1 mm / sec to about 5000 mm / sec, eg, from about 100 mm / sec to about 4000 mm / sec, from about 200 mm / sec to about 3000 mm / sec, from about 300 mm / sec to about. It can range from 2500 mm / sec, about 400 mm / sec to about 2000 mm / sec, or about 500 mm / sec to about 1000 m / sec, in which case all ranges and subranges between those values are included. ..

The repetition rate and / or scan rate of the pulsed laser beam can be varied to create the desired periodicity (or pitch) between the defect lines. In some embodiments, the defect line is from about 0.5 μm to about 25 μm, eg, from about 1 μm to about 20 μm, from about 2 μm to about 15 μm, from about 3 μm to about 12 μm, from about 4 μm to about 10 μm, or from about 5 μm. They can be separated at, for example, about 8 μm, in which case all ranges and subranges between those values are included. For example, for a linear cutting (or scanning) rate of 300 mm / sec, the periodicity of 3 μm between defect lines corresponds to a pulsed laser with a burst repeat rate of at least 100 kHz. Similarly, for a scan rate of 600 mm / sec, the periodicity of 3 μm between defect lines corresponds to a pulsed laser with a burst repeat rate of at least 200 kHz.

In addition, the dimensions of the defect line can be influenced by, for example, laser focusing parameters such as the length of the laser beam focus and / or the average spot diameter of the laser beam focus. The pulsed laser can be used, for example, to create one or more defect lines with a relatively high aspect ratio (length: diameter), thereby, in some embodiments, the substrate. Very thin and long defect lines can be made that extend from the first surface of the to the second surface facing it. Such defect lines can, in principle, be created by a single laser pulse, or additional pulses can be used to increase the affected area (eg, defect line length and /). Or increase in width).

Generally, as shown in FIGS. 1A-B, a method of cutting a glass substrate 130 having an electrochromic layer 150 uses a pulsed laser 140 to provide contours or tomographic lines containing a plurality of defect lines 120 in the substrate to be machined. It may include a step of making 110. The defect line 120 may extend through the thickness of the glass substrate, for example, substantially orthogonal to the main (flat) surfaces a, b of the glass sheet. A linear contour, such as the contour 110 shown in FIG. 1A, can be made by translating the glass substrate 130 and / or the pulsed laser 140 in one dimension, while the curved contour or Non-linear contours can also be created by translating the glass substrate and / or pulsed laser in two dimensions. As shown in FIG. 1B, the glass substrate 130 can then be separated along the contour 110 to create two separate parts 130a and 130b, in which case the separated ends or surfaces are , Formed by contour 110, each portion having an electrochromic layer 150.

Referring to FIGS. 2A-B, the method of laser machining a substrate may include focusing the pulsed laser beam 2 onto a laser beam focused line 2b oriented along the beam propagation direction. A laser (not shown) may emit a pulsed laser beam 2, which may have a portion 2a incident on the optical assembly 6. The optical assembly 6 may convert the incident portion 2a of the laser beam into a laser beam focused line 2b along the beam direction, which may have a length L and a diameter D. The substrate 1 can be positioned in the beam path so that it at least partially overlaps the laser beam focused line 2b, and thus the laser beam focused line 2b can be directed into the substrate 1. The first surface 1a can be positioned to face the optical assembly 6, while the opposing second surface 1b can be positioned to face the opposite side of the optical assembly 6 and vice versa. It can be similar. The thickness d of the substrate may extend vertically between the surfaces 1a and 1b.

As shown in FIG. 2A, the substrate 1 may be placed perpendicular to the vertical axis of the laser beam and focus 2b generated by the optical assembly 6. In various embodiments (as shown in the figure), the focused line 2b may start before the surface 1a of the substrate 1 and may not extend beyond the surface 1b. Of course, other focus orientations can also be used, whereby the focus 2b can start after the surface 1a and / or extend beyond the surface 1b (not shown). .. If sufficient laser intensity is assumed along the laser beam focus 2b, the area where the laser beam focus and the substrate overlap can be altered by nonlinear polyphotons or induced absorption of laser energy, in which case the intensity is length. It can be generated by condensing the laser beam 2 onto a portion of l, i.e., a linear focal point of length l.

The induced absorption can result in the formation of defect lines in the substrate material along the portion 2c. In some embodiments, the defect line can be a microscopic series of "holes" (also referred to as perforations or defect lines) (eg, 100 nm <diameter <10 μm). According to various embodiments, individual perforations can be made at speeds of hundreds of kHz (hundreds of thousands of perforations per second). These perforations can be made adjacent to each other in the desired spatial separation (also referred to as periodicity or pitch) by translating the substrate and the pulsed laser to each other. The periodicity of the defect lines can be selected, if desired, to facilitate separation of the substrate and / or to produce the desired coloring effect. The exemplary periodicity between the defect lines is, for example, about 0.5 μm to about 25 μm, such as about 1 μm to about 20 μm, about 2 μm to about 15 μm, about 3 μm to about 12 μm, about 4 μm to about 10 μm, or about. It can range from 5 μm to about 8 μm, and in this case all ranges and subranges between those values are included.

In certain non-limiting embodiments, the defect line extends from the first surface 1a to the second surface 1b facing it, eg, extends over the entire thickness d of the substrate 1, "penetrating". It can be a "hole" or an open channel. The formation of defect lines can extend over a portion of the thickness of the substrate, as indicated by the portion 2c having length L in FIG. 2A. Therefore, the length L of the portion 2c corresponds to the length of the overlap between the laser beam focused line 2b and the substrate 1 and the length of the resulting defect line. The average diameter D of the portion 2c may correspond approximately to the average diameter of the laser beam focused line 2b. Referring to FIG. 2B, the substrate 1 exposed to the laser beam 2 in FIG. 2A will eventually expand due to the induced absorption of laser energy, whereby the corresponding induced tension in the material will be microcracked. Can cause formation. The induced tension can be greatest on the surface 1a, depending on the various embodiments.

As defined herein, the width of the defect line corresponds to the inner width of the open channel or the diameter of the vents made in the glass substrate. For example, in some embodiments, the width of the defect line is from about 0.1 μm to about 5 μm, eg, from about 0.25 μm to about 4 μm, from about 0.5 μm to about 3.5 μm, from about 1 μm to about 3 μm. Or it can range from about 1.5 μm to about 2 μm, etc., in which case all ranges and subranges between those values are included. The width of the defect line can, in some embodiments, be as large as the average spot diameter of the laser beam focus, eg, the average spot diameter of the laser beam focus is also from about 0.1 μm. It can range from about 5 μm, eg, about 0.25 μm to about 4 μm, about 0.5 μm to about 3.5 μm, about 1 μm to about 3 μm, or about 1.5 μm to about 2 μm, in which case they. All ranges and subranges between the values are included. In an embodiment in which the glass substrate is separated along a contour containing a plurality of defect lines, the defect lines can potentially be seen along the cuts of the separated portions, and these areas are of the defect lines. It can have a width comparable to the width, eg, about 0.1 μm to about 5 μm.

The pulsed laser beam can be focused on a laser beam focused line having any desired length l, which length l can be varied, for example, depending on the configuration of the selected optical assembly. .. In some embodiments, the length of the laser beam focus is, for example, from about 0.01 mm to about 100 mm, such as from about 0.1 mm to about 50 mm, from about 0.5 mm to about 20 mm, from about 1 mm to about 10 mm. , About 2 mm to about 8 mm, or about 3 mm to about 5 mm, and the like, in which case all ranges and subranges between those values are included. In various embodiments, the length l of the laser beam focus can correspond to the thickness d of the substrate, or can be less than or less than the thickness d, or can exceed the thickness d of the substrate. Thus, in some embodiments, the method disclosed herein can be used to process or cut two or more substrates, such as a stack of two or more substrates. By a non-limiting embodiment, the pulsed laser beam has a total thickness of about 100 mm or more with a single laser pass, even when one or more air gaps are present between the substrates at various locations. Now, for example, a stack of glass substrates can be drilled from 20 μm to a total thickness of about 200 mm. For example, each substrate in a stack of 200 substrates, each substrate being 0.5 mm thick, can be perforated by a single pass of the laser. For example, if each substrate has an electrochromic film with a thickness of approximately 1 micrometer (0.001 mm), a stack of 200 such substrates will have a thickness of 100.2 mm (100 mm glass and 0.2 mm electrochromic). Will have a film). Additionally, some embodiments may further include an additional coating and / or protective material that is optically transparent and capable of perforating multiple layers between the glass substrates. Such coatings include, but are not limited to, SiO ₂ , Al ₂ O ₃ , and organic and inorganic polymers such as, for example, siloxane.

The defect line or a plurality of defect lines can be produced by using various methods. For example, various devices can be used to focus the laser beam to produce a laser beam focus. The laser beam focus may be generated, for example, by transmitting a Gauss laser beam through an axicon lens to create a Gauss-Vessel laser beam profile. Gaussian-Bessel beams can diffract more slowly than Gaussian beams (eg, maintain a single micrometer spot size over a range of hundreds of micrometers or hundreds of millimeters, as opposed to tens of micrometers or less. Can be). As a result, the depth or length of the focal intensity of the Gauss-Bessel beam can be much greater than that of the Gaussian beam. Other slowly diffracting or non-diffraction beams, such as airy and Bessel beams, may be used or may be generated using optics. Exemplary optical assemblies for generating laser beam focused lines are provided in U.S. Patent Application Nos. 14 / 529,520 and 14 / 530,457, which is hereby referred to by reference. The whole is incorporated herein. Condensing uses, for example, any variety of donut-shaped laser beams, spherical lenses, axicon lenses, diffractometers, or any other suitable method or device for forming high intensity linear regions. And can be carried out. The type of pulsed laser (eg, picoseconds, femtoseconds, etc.) and / or its wavelength (eg, IR, UV, green, etc.) may also be, as long as the non-linear optical effect provides sufficient intensity to create fracture of the substrate material. Can be changed.

FIG. 3 is one that can be used to focus the pulsed laser beam 2 onto the laser beam focused 2b directed into the glass substrate 1 having length l and having the electrochromic layer 7. An exemplary optical assembly 6 is shown. The optical assembly 6 may include, for example, an axicon lens 3, a collimating lens 4, and a condenser lens 5. The focal length of each lens in the optical assembly can be varied to produce a laser beam focus with the desired diameter and / or length. For example, the condenser lens 5 can have focal lengths in the range of about 10 mm to about 50 mm, such as about 20 mm to about 40 mm, or about 25 mm to about 30 mm, in this case between those values. All ranges and subranges are included. The collimating lens 4 may also have focal lengths in the range of about 50 mm to about 200 mm, such as about 75 mm to about 150 mm, or about 100 mm to about 125 mm, in this case of those values. All ranges and subranges between are included.

To create high intensity regions with high aspect ratios, such as non-tapered laser microchannels, using ultrashort Bessel beams (of picosecond or femtosecond duration) in various non-limiting embodiments. In addition, the axicon lens 3 may be incorporated into the optical lens assembly 6. An axicon is a lens cut into a cone that can form a spot source on a line along the optical axis (or can change the laser beam into an annular shape). Axicons and their configurations are known to those of skill in the art and may have cone angles ranging from, for example, about 5 ° to about 20 °, for example, about 10 ° to about 15 °, in which case they. All ranges and subranges between values are included.

The axicon lens 3 is a smaller laser beam having an original diameter D1 (eg, about 1-5 mm, eg, about 2-3 mm, etc.) corresponding to, for example, the focused line diameter D shown in FIG. 2A. It can be focused into a high-strength region with a diameter, which is substantially cylindrical and has a high aspect ratio (eg, long length and small diameter). The high intensity created within the focused laser beam can result in a non-linear interaction between the laser's electromagnetic field and the substrate, which transfers the laser energy to the substrate. Achieve the formation of defect lines. However, in areas of the substrate where the laser intensity is not high enough (eg, the area around the central convergence line), the substrate can be transparent to the laser and therefore from the laser to the substrate. There is no mechanism for transferring energy to the material. Therefore, no damage or change can be present in that region of the glass substrate exposed to laser intensities below the non-linear threshold.

After using a pulsed laser beam to create a contour containing multiple defect lines or perforations, the glass substrate can optionally be separated into two or more portions using a second laser beam. can. The second laser beam can be used as a heat source to create a thermal stress zone around the contour, which can place the defect line under tension, thereby inducing separation. The second laser beam can emit any wavelength that the glass substrate is not transparent to, such as an infrared wavelength, such as a wavelength greater than about 1064 nm. In some embodiments, the second laser beam can radiate at wavelengths greater than about 5 μm, such as wavelengths greater than about 10 μm. Suitable infrared lasers may include, for example, CO ₂ lasers, which may be modulated or unmodulated. Non-limiting examples of the second laser beam include, but are not limited to, wavelengths greater than about 10 μm, such as from about 10.2 μm to about 10.7 μm, or from about 10.4 μm to about 10. Examples include modulated CO ₂ lasers operating at wavelengths of 6 μm, etc., in which case the entire range and subrange between those values is included.

Referring to FIGS. 1A-B, the second laser beam (not shown) can come into contact with the first surface a of the glass substrate 130 and separate the glass substrate into two or more portions 130a, 130b. It is possible to translate along the contour 110 in order to do so. The second surface b may have an electrochromic layer 150 facing opposite to the surface a in contact with the second laser beam. The second laser beam can create a region of thermal stress on and around the contour 110, resulting in the separation of the glass substrate 130 along the contour 110, thereby the separate portions 130a. , 130b can be made.

Exemplary output levels for the second laser beam range from about 50 W to about 500 W, eg, about 100 W to about 400 W, about 150 W to about 300 W, or about 200 W to about 250 W, in some embodiments. Possible, in this case, all ranges and subranges between those values are included. When operated in continuous (eg, unmodulated) mode, the second laser beam may have a lower output than when operated in modulated mode. For example, a continuous second laser beam can have an output level in the range of about 50 W to about 300 W, while a modulated second laser beam can have an output level in the range of about 200 W to about 500 W. Although possible, each laser output can be varied and is not limited to the exemplary range presented. In additional embodiments, the average spot diameter of the second laser beam is from about 1 mm to about 10 mm, such as from about 2 mm to about 9 mm, from about 3 mm to about 8 mm, from about 4 mm to about 7 mm, or from about 5 mm to about 6 mm, and the like. , In this case all ranges and subranges between those values are included. The heat generated by the second laser beam can result in a thermal stress region on and / or around the contour, which is a diameter on the order of micrometers, eg, about 20 μm. They can have diameters less than, for example, in the range of about 1 μm to about 20 μm, about 2 μm to about 15 μm, about 3 μm to about 10 μm, about 4 μm to about 8 μm, or about 5 μm to about 6 μm, in which case they. All ranges and subranges between the values are included.

Depending on various embodiments, the second laser beam can be modulated, as well as less than about 200 microseconds, eg, from more than about 1 microsecond to less than about 200 microseconds, such as from about 5 microseconds to about 150 microseconds. It has a pulse duration ranging from about 10 microseconds to about 100 microseconds, about 20 microseconds to about 80 microseconds, about 30 microseconds to about 60 microseconds, or about 40 microseconds to about 50 microseconds, and the like. It can, in this case, include all ranges and subranges between those values. Depending on the various embodiments, the rise time of the modulated second laser beam is less than about 150 microseconds, eg, about 10 microseconds to about 150 microseconds, about 20 microseconds to about 100 microseconds, about 30 microseconds. It can range from about 80 microseconds, about 40 microseconds to about 70 microseconds, or about 50 microseconds to about 60 microseconds, in which case the entire range and subrange between those values is. included.

In additional embodiments, the pulse repetition rate (or modulation rate) of the modulated second laser beam is from about 1 kHz to about 100 kHz, for example, from about 5 kHz to about 80 kHz, from about 10 kHz to about 60 kHz, from about 20 kHz to about 50 kHz. , Or may range from about 30 kHz to about 40 kHz, etc., in which case all ranges and subranges between those values are included. According to non-limiting embodiments, the pitch or periodicity between the second laser beam pulses is from about 1 μm to about 100 μm, eg, about 5 μm to about 90 μm, about 10 μm to about 80 μm, about 20 μm to about 70 μm, about. It can range from 30 μm to about 60 μm, or from about 40 μm to about 50 μm, etc., in which case all and subranges between those values are included.

In one particular embodiment, the first surface of the glass substrate can come into contact with the second laser beam in one pass, and in other embodiments, it can make multiple passes. For example, the second laser beam can be passed anywhere from one pass to ten passes, for example, from two passes to nine passes, from three passes to eight passes, from four passes to seven passes, or from five passes. It can be translated relative to the glass substrate using, for example, 6 passes, and vice versa, in which case all ranges and subranges between those values are included. The parallel movement speed is from about 100 mm / sec to about 1000 mm / sec, for example, from about 150 mm / sec to about 900 mm / sec, from about 200 mm / sec to about 800 mm / sec, from about 250 mm / sec to about 700 mm / sec, about 300 mm. It can range from / sec to about 600 mm / sec, or from about 400 mm / sec to about 500 mm / sec, and in this case includes all ranges and subranges between those values.

Another aspect is the process described above to create holes, voids, gaps, or other discontinuities in the electrochromic layer on the substrate while not damaging the underlying substrate or limiting damage to the substrate. Including the use of any of. In such an embodiment, the electrochromic layer 150 can be used to change the laser absorption or penetration depth. In some embodiments, the electrochromic layer 150 is positioned in a colored or darkened state to increase its absorption of the laser light, and in such embodiments, the laser is the electrochromic. It can be adjusted to a wavelength close to the light absorption wavelength of the layer 150. In such embodiments, the absorption of the electrochromic layer can assist in altering the electrochromic layer, affect the laser penetration depth, or alter the glass or electrochromic layer. The overall laser pulse output required for this can be increased or decreased.

In creating discontinuities in electrochromic layers, it is a fact that, in general, the goal is to create two or more electrically separated regions. Therefore, a discontinuous line defined as a laser-formed line, which is clearly formed to electrically isolate two or more regions of the electrochromic layer on the substrate, is typically continuous. There is a need, which means that the two regions of the electrochromic layer are completely separated from each other, and may require ablation of at least one layer of the electrochromic film. The laser power or energy level required to create a discontinuity in the electrochromic layer is typically much less than required to create damage to the glass substrate. Either a pulsed laser or a continuous laser can be used. The use of a pulsed laser can ablate the electrochromic material without heating the electrochromic material or substrate and avoid damaging the properties of the adjacent retained electrochromic material or glass substrate. Can be advantageous in. In addition, the wavelength of the laser can advantageously target the absorption of the electrochromic film in either the bright or darkened state. In addition, the beam can be focused through the substrate or on the opposite side of the substrate, depending on the needs.

In the case of a pulsed laser, the exemplary laser output may range from about 0.25 W to about 150 W, for example about 0.25 W to about 50 W, or about 1 W to about 100 W, in some embodiments. In this case, all ranges and subranges between those values are included. Depending on various embodiments, the pulsed laser beam can have a pulse duration of 100 nanoseconds to 10 femtoseconds, eg, about 100 picoseconds. In some embodiments, the pulsed laser beam is from more than about 1 picosecond to less than about 100 picoseconds, eg, about 5 picoseconds to about 50 picoseconds, about 10 picoseconds to about 30 picoseconds, or about. It has a pulse duration ranging from 15 picoseconds to about 20 picoseconds, in which case all and subranges between those values are included. In additional embodiments, the pulse repetition rate of the pulsed laser beam is from about 1 kHz to about 4 MHz, such as from about 10 kHz to about 650 kHz, from about 50 kHz to about 500 kHz, from about 100 kHz to about 400 kHz, or from about 200 kHz to about 300 kHz, and the like. Can be a range of, in this case all ranges and subranges between those values are included.

Since the output level for making discontinuities in electrochromics is much lower, continuous laser light sources can also be used. The output level for a continuous laser is primarily from about 0.25 W to about 150 W, for example about 0.25 W to about 50 W, or depending on the wavelength, focus, and time the beam is aimed at a particular region. It ranges from about 1 W to about 100 W, in which case all ranges and subranges between those values are included.

The discontinuity can be approximately the same width as the laser used to make it. The width of the discontinuity is from about 0.1 μm to about 5 μm, for example from about 0.25 μm to about 4 μm, from about 0.5 μm to about 3.5 μm, from about 1 μm to about 3 μm, or from about 1.5 μm to about 2 μm. And so on, in which case all ranges and subranges between those values are included. The width of the discontinuity can, in some embodiments, be as large as the average spot diameter of the laser beam focus, eg, the average spot diameter of the laser beam focus is also about 0.1 μm. Can range from about 5 μm, eg, about 0.25 μm to about 4 μm, about 0.5 μm to about 3.5 μm, about 1 μm to about 3 μm, or about 1.5 μm to about 2 μm, and in this case they. All ranges and subranges between the values of are included.

Glass Articles In the present specification, a glass article having a first surface, a second surface facing the first surface, and an electrochromic coating arranged on at least a part of the second surface, to the glass article. When the voltage of the glass is applied, the first region of the coated portion of the glass substrate has a first visible light transmittance lower than the second visible light transmittance of the second region of the coated portion of the glass. The article is disclosed. Referring to FIG. 4A, a second surface of the glass article comprising an electrochromic layer on a portion E (hatched portion) of the substrate separated by line Z and an uncoated portion U (non-shaded portion). It is shown. By various embodiments, the methods disclosed herein are used to laser machine the glass articles of FIGS. 4B-C and to create any desired modifications thereof. can do.

In some embodiments, the electrochromic layer comprises one or more inorganic materials. In some embodiments, the electrochromic layer comprises one or more tungsten oxides.

For example, a first pulsed laser can be used to create contour A1 (dashed line), also referred to herein as laser "scribe" or laser "perforation". By tracing the first pulse laser and the second laser along contour B1 (double line) to make the glass article shown in FIG. 4B and the uncoated rest (not shown). , The glass can be separated into two parts. Upon applying a voltage to C1, the C1 of the coated portion E can be "colored" and / or have a reduced transmittance (eg, compared to the second region C2 of the coated portion E). It may have (for a visible wavelength of 400-700 nm), in which case the second region C2 may remain unactivated and unaltered (or uncolored). Alternatively, if the voltage is applied to C2 but not to C1, C2 can be performed in the same manner as C1 above. Since the scribe lines have layers that are not electrically connected to each other, both C1 and C2 can be colored independently of each other.

The laser scribe along the contour A1 serves to create an electrical barrier to the electrochromic effect between C1 and C2. Thus, the glass article can include an uncoated (eg, uncolored) portion U and a "new" uncolored (but coated) region C2, which is the region. C2 will not show an electrochromic effect when applying a voltage to C1 even if it is coated with an electrochromic layer (and vice versa). Therefore, the laser scribe process or laser perforation process is used to create any desired pattern on a glass substrate, including linear and curved contours, as well as patterns within the first or second region. can do. The contour or laser scribe can include multiple discontinuities as described above, as well as to produce any desired visual effect without significant damage to the electrochromic layer or glass substrate. Each region can be separated. The width of the discontinuity is from about 0.1 μm to about 25 μm, such as from about 0.25 μm to about 10 μm, from about 0.5 μm to about 5 μm, from about 1 μm to about 3 μm, or from about 1.5 μm to about 2 μm, and so on. Can be a range of, in this case all ranges and subranges between those values are included.

In some embodiments, C2 is laser-damaged or substantially non-laser-damaged. For example, the electrochromic coating and / or glass substrate in this region may be laser-damaged or may indicate a very small region of laser damage along the contour, as described in more detail below. Thus, in certain embodiments, the contour creates two or more active elements from a single mother substrate. The laser cutting is accurate and the output can be controlled to produce very fine lines with little damage to the electrochromic film, so that the electrochromic layers in C1 and C2 are undamaged. Also, very little electrochromic material is wasted.

In some embodiments, the formation of discontinuities in the electrochromic film can be used to eliminate the coloring effect in certain areas of the article. Current methods for eliminating the tinting effect in a given area of a coated substrate are steps to remove the coating, for example, by using laser ablation to "burn" the coating in the desired area. Accompanied by. However, such a process can be inaccurate and, as a result, can result in large areas of damage to both the electrochromic layer and the underlying glass substrate. For example, several passes may be made using a high power laser to ensure that the electrochromic layer is completely removed from the desired region, which results in the electro remaining along it. A large area (or band) can be created in which the chromic layer is damaged and / or the underlying glass substrate is damaged. Such laser damage areas can have widths on the order of tens of millimeters, eg, greater than about 20 mm, greater than about 25 mm, and even greater than about 30 mm.

Further, in the present specification, a glass article having a first surface, a second surface facing the first surface, and an electrochromic coating arranged on substantially all of the second surface, the electrochromic. The coating comprises a laser-damaged peripheral area close to at least one end of the glass article, the laser-damaged peripheral area having a width of less than about 10 mm, less than about 1 mm, or less than about 0.1 mm. The glass article having the above is disclosed. Referring again to FIG. 4A, the first pulsed laser can be used to create contour A2 (dashed line), and the first pulsed laser and the second laser separate the glass into two parts. It can be traced along contour B2 (double line) to make the glass article shown in FIG. 4C. Upon application of voltage, the first region C1 of the coated portion E may be colored and / or the second region C2 of the coated portion E which may remain unchanged (or remain uncolored). In comparison, it may have a reduced transmittance (eg, for a visible wavelength of 400-700 nm).

Unlike the contour B1 that traverses the uncoated portion U, the contour B2 traverses the coated region E. Although not bound by theory, the laser cutting methods disclosed herein are capable of separating the coated glass article with minimal damage to the electrochromic layer. Conceivable. The laser machining methods disclosed herein can result in relatively small areas (contour widths) where the electrochromic film is laser damaged, which areas are electrochromic when the voltage is applied. Will not show any effect. For example, the laser cutting process can result in a laser damage zone L along a relatively narrow (eg, less than about 0.1 mm) cut e. In some embodiments, the laser damage zone L is less than about 10 mm, less than 1 mm, or less than 0.1 mm, such as less than about 9 mm, less than 8 mm, less than 5 mm, less than 1 mm, less than 0.5 mm, 0.1 mm. Less than, less than 0.09 mm, less than 0.08 mm, less than 0.07 mm, less than 0.06 mm, less than 0.05 mm, less than 0.04 mm, less than 0.03 mm, less than 0.02 mm, less than 0.01 mm, or less , For example, can have a width ranging from about 0.01 mm to about 0.1 mm, in which case all ranges and subranges between those values are included.

The glass articles disclosed herein may have relatively small laser damaged areas compared to uncoated areas and / or damaged areas created by the comparative process. For example, the cutting-and-coating process can result in significant uncoated areas due to interference from tightening and fixing. Similarly, if the glass is coated and then cut using conventional water-based edge grinding methods, the damage to the electrochromic layer in close proximity to the cut (eg, swelling) is much greater. Will. Moreover, if it is desirable to eliminate the tinting effect on any part of such a substrate using prior art methods (either cutting-and-coating, or coating-and-cutting), of the ablation process. The resulting laser damage area will be much larger (eg, width of 20 mm or more).

The glass articles herein can have at least one surface that is substantially coated with a functional electrochromic layer, eg, colored end-to-end upon application of voltage. Previously, it was not possible using prior art methods. In certain embodiments, substantially all of the surface of the glass article may be coated with an electrochromic layer, in which case they may be one or more along one or more ends of the article. Laser damage area (<0.1 mm) can be included. For example, by coating the surface of a glass substrate with an electrochromic layer and then separating the coated substrate along a single contour, any uncoated portion of the glass substrate (eg, tightening). The portion that is not coated due to the attachment and fixing) may be removed. Thus, the resulting glass article may be substantially coated with an electrochromic layer and may include a peripheral laser damage area in the vicinity of the contour edge. In additional embodiments, the coated glass substrate can be separated along two or more contours and the resulting glass article can include two or more laser damaged areas. When applying a voltage, an edge-to-edge tinting effect can be observed, except for any laser-damaged areas at the edges. However, such laser damaged areas can be relatively small compared to uncoated areas and / or damaged areas created by prior art processes. In various embodiments, the laser damaged area is less than about 5% of the coated portion of the glass surface, eg, less than about 4%, less than about 3%, less than about 2%, less than about 1%, about 0. Can occupy less than .5%, less than about 0.1%, or less than about 0.01%, in which case all ranges and subranges between those values are included, but the size of the glass article. The relative proportion of the surface occupied by the laser-damaged area can increase with the decrease in.

The glass articles disclosed herein can include any glass known in the art that is suitable for automotive, architectural, and other similar applications. Exemplary glass substrates are, but are not limited to, aluminosilicate glass, alkali-aluminosilicate glass, borosilicate glass, alkali-borosilicate glass, aluminoborosilicate glass, alkali-aluminoborosilicate glass, soda lime. Glass, and other suitable glasses can be included. In certain embodiments, the substrate has a thickness ranging from about 0.1 mm to about 10 mm, such as about 0.3 mm to about 5 mm, about 0.5 mm to about 3 mm, or about 1 mm to about 2 mm. In this case, all ranges and subranges between those values are included. Non-limiting examples of commercially available glasses suitable for use as optical filters include, for example, Corning's "EAGLE XG" glass, Iris ™ glass, Rotus ™ glass, Willow ™ glass. , Gorilla® glass, HPFS® glass, and ULE® glass. Suitable glasses are disclosed, for example, in U.S. Pat. Nos. 4,483,700, 5,674,790, and 7,666,511, which are by reference. The whole is incorporated herein.

The substrate can include a glass sheet having a first surface and a second surface facing it. In certain embodiments, the surface can be flat or substantially flat, for example, substantially flat and / or flat. The substrate may further be curved in at least one radius of curvature in some embodiments and may be a three-dimensional substrate such as, for example, a convex or concave substrate. The first and second surfaces can be parallel or substantially parallel in various embodiments. The substrate may further have at least one end, eg, at least two ends, at least three ends, or at least four ends. As a non-limiting example, the substrate may include a rectangular or square sheet with four ends, but other shapes and configurations are also conceivable and are intended to be within the scope of the present disclosure. .. The laser cutting method disclosed herein can also be used to create a variety of curved contours, resulting in a glass article with curved edges, such as non-linear edges. Can be done.

The glass articles disclosed herein can be used to make various products such as insulating glass units (IGUs). For example, a glass article having at least a partial surface coated with an electrochromic layer can be sealed around a second glass sheet to produce an IGU. The glass article can be cut into size and / or shape after being coated with an electrochromic layer, making such an IGU may have improved flexibility and / or cost reduction. obtain.

It will be appreciated that the various disclosed embodiments may be accompanied by specific features, elements, or steps described with respect to that particular embodiment. A particular feature, element, or step is described in connection with a particular embodiment, but it is also understood that it may be interchanged or combined with an alternative embodiment in various non-exemplified combinations or sequences. Will.

As used herein, "the", "a", or "an" means "at least one" and should be limited to "only one" unless otherwise stated. It should also be understood that it is not. Thus, for example, the reference to "laser" includes examples of having two or more such lasers, unless the context clearly indicates otherwise. Similarly, "plurality" is intended to mean "two or more." Therefore, the "plurality of defect lines" includes two or more such defect lines, such as three or more such defect lines.

The range can be expressed herein as from one particular value "about" and / or to another particular value "about". When expressing such a range, some examples include from one particular value and / or to the other. Similarly, if a value is expressed as an approximation by using the antecedent "about", it will be understood that the particular value forms another aspect. It will be further understood that each end point of the range is important both in relation to the other end point and independently of the other end point.

The terms "substantial", "substantially", and variations thereof, as used herein, may state that the features described are equal to or approximately equal to a value or description. Intended. For example, a "substantially flat" surface is intended to mean a surface that is flat or approximately flat.

Unless otherwise stated, none of the methods described herein is intended to be construed as requiring the steps to be performed in a particular order. Therefore, if the claim of the method does not actually enumerate the order in which the steps should follow, or if the claims or description do not specifically state that the steps should be limited to a particular order. It is not intended that any particular order will be inferred either.

Where various features, elements, or steps of a particular embodiment can be disclosed using the transition phrase "comprising", at the same time, substantially from the transition phrase "consisting" or ". It should be understood that alternative embodiments are included, including embodiments that can be described using "consisting essentially of". Thus, for example, an implied alternative embodiment for an article comprising A + B + C includes an embodiment in which the article comprises A + B + C and an embodiment in which the article comprises substantially A + B + C.

It will be apparent to those skilled in the art that various modifications and variations may be made to this disclosure without departing from the spirit and scope of this disclosure. This disclosure is within the scope of the appended claims, as changes, combinations, partial combinations, and variations of the disclosed embodiments incorporating the gist and essence of the present disclosure may be noticed by those skilled in the art. It should be construed to include all and their equivalents.

Hereinafter, preferred embodiments of the present invention will be described in terms of terms.

Embodiment 1
a. It ’s a glass substrate,
i. First surface,
ii. The second surface facing it, and iii. One or more ends, one or more of which include at least one or more of the one or more ends that have been laser altered.
With a glass substrate, including
b. It ’s an electrochromic coating,
i. Placed on at least part of the second surface,
ii. Each contains at least two electrically discontinuous regions with contours,
Including with electrochromic coating
An electrochromic glass article in which the two electrically discontinuous regions are separated by a laser-altered discontinuous line having a width of about 0.1 μm to about 25 μm.

Embodiment 2
The electrochromic glass article according to Embodiment 1, wherein the electrochromic coating comprises tungsten oxide.

Embodiment 3
The electrochromic glass article according to Embodiment 1 or Embodiment 2, wherein the electrically discontinuous region is not substantially laser-damaged.

Embodiment 4
The electrochromic glass article according to any one of embodiments 1 to 3, wherein the second surface of the glass substrate, which is close to the laser-altered discontinuous line, is substantially not laser-damaged.

Embodiment 5
The electrochromic glass article according to Embodiment 4, wherein the contour of at least one of the at least two electrically discontinuous regions is non-linear.

Embodiment 6
The electrochromic glass according to any one of embodiments 1 to 5, wherein the laser-cut discontinuity is a continuous line formed by a laser with a pulse width of ^10-10 seconds to ^10-15 seconds in FWHM. Goods.

Embodiment 7
The electrochromic glass article according to any one of embodiments 1 to 6, wherein the second region comprises a pattern in the first region, or the first region comprises a pattern in the second region.

8th embodiment
The electrochromic glass article according to any one of embodiments 1 to 7, wherein the glass article comprises a glass sheet having a thickness in the range of about 0.1 mm to about 10 mm.

Embodiment 9
Any of embodiments 1-8, wherein one of the at least two electrically discontinuous regions comprises a region of the second surface close to the one or more ends of the glass substrate. The electrochromic glass article according to one.

Embodiment 10
The electrochromic glass article according to embodiment 9, wherein the electrically discontinuous region in the vicinity of the one or more ends of the glass substrate has a width of less than about 0.1 mm.

Embodiment 11
The electrochromic glass according to embodiment 9, wherein the electrically discontinuous region in the vicinity of the one or more ends of the glass substrate occupies about 5% or less of the coated portion of the glass article. Goods.

Embodiment 12
A glass article having a first surface, a second surface facing the first surface, and an electrochromic coating disposed on substantially all of the second surface, wherein the electrochromic coating is the glass article. A glass article comprising a laser-damaged peripheral area in close proximity to at least one end, wherein the laser-damaged peripheral area has a width of less than about 0.1 mm.

Embodiment 13
12. The glass article according to embodiment 12, wherein the laser-damaged peripheral region occupies about 5% or less of the second surface of the glass article.

Embodiment 14
12. The glass article according to embodiment 12 or 13, wherein the at least one end has a linear contour or a curved contour.

Embodiment 15
The glass article according to any one of embodiments 12 to 14, wherein the glass article comprises a glass sheet having a thickness in the range of about 0.1 mm to about 10 mm.

Embodiment 16
The coated portion on the second surface includes the first region and the second region, and when the voltage is applied to the glass article, the first region is more than the second visible light transmittance of the second region. The glass article according to any one of embodiments 12 to 15, which has a low first visible light transmittance.

Embodiment 17
16. The glass article of embodiment 16, wherein the first and second regions are separated by a discontinuous line containing one or more laser beams.

Embodiment 18
The glass article according to embodiment 17, wherein the contour is linear or curved.

Embodiment 19
An insulating glass unit comprising the electrochromic glass article according to any one of embodiments 1 to 11.

20th embodiment
An insulating glass unit comprising the glass article according to any one of embodiments 12 to 17.

1 Substrate 1a First surface 1b Second surface 2 Pulsed laser beam 2a Incident part 2b Laser beam focused line 3 Axicon lens 4 Collimating lens 5 Condensing lens 6 Optical assembly 7 Electrochromic layer 110 Contour or tomographic line 120 Defect line 130 Glass substrate 130a, 130b Part 140 Pulsed laser 150 Electrochromic layer

Claims (13)

a. It ’s a glass substrate,
i. First surface,
ii. The second surface facing it, and iii. A glass substrate comprising one or more ends, wherein at least one or more of the one or more ends comprises one or more laser-altered ends. ,
b. It is an electrochromic coating i. Placed on at least a portion of the second surface
ii. Each contains contoured first and second regions,
With electrochromic coating,
Including
The first region and the second region are 0 . Separated by laser altered lines with a width of 1 μm to 25 μm
The coated portion of the second surface includes a first region and a second region, and when a voltage is applied to the glass article, the first region is more than the second visible light transmittance of the second region. An electrochromic glass article with low first visible light transmittance . The electrochromic glass article according to claim 1, wherein the electrochromic coating comprises tungsten oxide. The electrochromic glass article according to claim 1 or 2, wherein the first region and the second region are not laser- damaged. The second surface of the glass substrate, which is close to the laser-altered line , is not laser- damaged.
The electrochromic glass article according to any one of claims 1 to 3, wherein the contour of at least one of the first region and the second region is non-linear. (I) The laser- altered line is a continuous line formed by a laser with a pulse width of ^10-10 seconds to ^10-15 seconds in FWHM ;
(Ii ) The glass article is 0 . Includes glass sheets with thicknesses ranging from 1 mm to 10 mm,
The electrochromic glass article according to any one of claims 1 to 4. 10. The aspect of any one of claims 1-5, wherein one of the first and second regions comprises a region of the second surface that is close to the one or more ends of the glass substrate. Electrochromic glass articles. (I) The laser-altered line in the vicinity of the one or more ends of the glass substrate is 0 . It has a width of less than 1 mm; or (ii) the laser altered line in close proximity to the one or more ends of the glass substrate occupies less than 5% of the coated portion of the glass article. The electrochromic glass article according to claim 6. A glass article having a first surface, a second surface facing it, and an electrochromic coating placed on all of the second surface.
The electrochromic coating comprises a laser-damaged peripheral area close to at least one end of the glass article, and the laser-damaged peripheral area is 0 . Has a width of less than 1 mm
The coated portion of the second surface comprises a first region and a second region.
A glass article, wherein the first region has a first visible light transmittance lower than the second visible light transmittance of the second region when a voltage is applied to the glass article. The glass article according to claim 8, wherein the laser-damaged peripheral area occupies 5% or less of the second surface of the glass article. (I) The at least one end has a linear or curved contour ;
(Ii) The glass article is 0 . Includes glass sheets with thicknesses ranging from 1 mm to 10 mm,
The glass article according to claim 8 or 9. (I) The first and second regions are separated by a line containing one or more laser beams; (ii) the contour is linear or curved, claim 10. Glass article. An insulating glass unit comprising the electrochromic glass article according to any one of claims 1 to 7. An insulating glass unit comprising the glass article according to any one of claims 8 to 12.

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