JP7066076B1 - Current transformers, instrument transformers, and gas-insulated switchgear - Google Patents

Abstract

PROBLEM TO BE SOLVED: To facilitate formation of a wiring pattern while reducing noise and improving detection accuracy. A current transformer 60 includes a coil portion 62 formed on a laminated substrate 61, and the coil portion 62 includes a rewinding coil 70 and a rewinding coil 80. The first conductive pattern 73 of the winding lead coil 70 includes a first inclined portion 732 that inclines in the first direction Dc1 from the outside to the inside of the radial Dr of the laminated substrate 61, and the second conductive pattern 74 has a radial direction. A second inclined portion 742 that inclines in the second direction Dc2 from the outside to the inside of Dr is provided. The rewind coil 80 includes a third conductive pattern 82 extending in the circumferential direction Dc, and the third conductive pattern 82 overlaps the first inclined portion 732 and the second inclined portion 742 when viewed from the stacking direction Ds.

Description

The present invention relates to current transformers, instrument transformers, and gas-insulated switchgear.

The gas-insulated switchgear (GIS) has a configuration in which equipment such as a circuit breaker unit, a disconnector unit, and an instrument transformer is housed in a container filled with an insulating gas (see, for example, Patent Document 1). ). The instrument transformer of such a gas-insulated switchgear includes an instrument transformer for the purpose of measuring high voltage. A capacitance voltage divider may be used as such an instrument transformer.

The instrument transformer is equipped with a current transformer for the purpose of measuring a large current. As such a current transformer, a Rogowski coil may be used. The Rogowski coil is known to have a plurality of layers of printed circuit boards having an opening through which a conductor penetrates in the center, and two windings having a mirror image relationship (see, for example, Patent Document 2). According to the description of Patent Document 2, the two windings are configured by electrically connecting the outer substrate surface of the printed circuit board and the radially extending metal foil formed on the inner layer through the substrate. To. The two windings that are mirror images of each other are connected in series to form a Rogowski coil.

Japanese Unexamined Patent Publication No. 2017-112661 Japanese Unexamined Patent Publication No. 2003-130894

In the Rogowski coil as described in Patent Document 2, noise reduction and improvement of detection accuracy are always desired. Further, as described in Patent Document 2, when the substrates are laminated and formed, it is required that the wiring pattern is appropriately formed on the substrate.

An object of the present invention is to provide a current transformer, an instrument transformer, and a gas-insulated switchgear capable of facilitating the formation of a wiring pattern while reducing noise and improving detection accuracy.

The current transformer presented is a current transformer used in a gas-insulated switchgear. The current transformer includes an annular laminated substrate in which a plurality of conductive layers are laminated via an insulating layer. The current transformer includes a coil portion formed on the laminated substrate . The laminated substrate is provided on the outer peripheral portion at intervals in the circumferential direction, and includes a plurality of through silicon vias that electrically connect the plurality of conductive layers . The laminated substrate is provided at intervals in the circumferential direction at the inner peripheral portion, and includes a plurality of inner through electrodes that electrically connect the plurality of conductive layers . The coil portion includes a winding coil that winds toward the first direction in the circumferential direction . The coil portion includes a rewind coil that rewinds in a second direction opposite to the first direction in the circumferential direction . The winding lead coil is provided at intervals in the circumferential direction in the first conductive layer, and includes a plurality of first conductive patterns connected to the outer through electrode and the inner through electrode . The winding lead coil is provided at intervals in the circumferential direction in the second conductive layer, and includes a plurality of second conductive patterns connected to the outer through electrode and the inner through electrode. The first conductive pattern includes a first inclined portion that is inclined in the first direction from the outside in the radial direction of the laminated substrate to the inside. The first conductive pattern is connected to the through silicon via and the first inclined portion, and includes a first outer extending portion extending in the radial direction . The second conductive pattern includes a second inclined portion that is inclined in the second direction from the outside in the radial direction to the inside. The second conductive pattern is connected to the outer through electrode and the second inclined portion, and includes a second outer extending portion extending in the radial direction . The rewind coil is provided in the third conductive layer between the first conductive layer and the second conductive layer, and includes a third conductive pattern extending in the circumferential direction . All through silicon vias are provided on the circumference of the first radius. All through silicon vias are provided on the circumference of the second radius. The outer through electrodes and the inner through electrodes are provided at positions offset from each other in the circumferential direction so as not to overlap each other on the same line extending in the radial direction. The first outer extending portion and the second outer extending portion overlap each other when viewed from the laminating direction of the laminated substrate. The third conductive pattern overlaps the first inclined portion and the second inclined portion when viewed from the stacking direction, and the angle formed by the pattern overlapping the first inclined portion and the pattern overlapping the second inclined portion is 90 degrees or more. be.

The first angle formed by the first outer extending portion and the first inclined portion and the second angle formed by the second outer extending portion and the second inclined portion may be the same angle . The first conductive pattern may include a first inner extending portion that is connected to the inner through electrode and the first inclined portion and extends radially . The second conductive pattern may include a second inner extending portion that is connected to the inner through electrode and the second inclined portion and extends radially . The first inner extending portion and the second inner extending portion may overlap when viewed from the stacking direction . The first inclined portion and the second inclined portion may be provided so as to be continuous in the circumferential direction when viewed from the stacking direction.

Further, the instrument transformer according to the aspect of the present invention includes the current transformer of the above-mentioned aspect.

Further, the gas-insulated switchgear according to the aspect of the present invention includes an instrument transformer of the above-mentioned aspect.

In the current transformer according to the above aspect, the first outer extending portion of the first conductive pattern and the second outer extending portion of the second conductive pattern constituting the winding lead coil overlap each other when viewed from the stacking direction. , A first inclined portion inclined in the first direction in the circumferential direction from the first outer extending portion toward the inside in the radial direction, and a second direction in the circumferential direction toward the inner side in the radial direction from the second outer extending portion. The second inclined portion inclined to be arranged in a wavy or zigzag shape in the circumferential direction when viewed from the stacking direction. Since the third conductive pattern constituting the rewind coil overlaps the first inclined portion and the second inclined portion when viewed from the stacking direction, the third conductive pattern is also continuous in a wavy or zigzag shape in the circumferential direction. Become. This makes it possible to increase the number of turns of the rewind coil and the rewind coil in the circumferential direction within a limited space. Further, the cross section of the rewinding coil perpendicular to the coil winding direction (toroidal direction) is canceled by the cross section of the rewinding coil, and the influence of the external magnetic field is suppressed, so that noise can be reduced and the detection accuracy can be improved. .. Further, for example, by setting the inclination angle of the first inclined portion with respect to the first direction and the inclination angle of the second inclined portion with respect to the second direction to an acute angle of about 135 degrees, the third conductive pattern has a wavy bent portion. Since the temperature is about 90 degrees and no acute angle portion is formed in the third conductive pattern, the pattern can be easily formed.

Further, in the configuration in which the outer through electrode and the inner through electrode are provided so as to be offset in the circumferential direction when viewed from the radial direction, a first conductive pattern having a first inclined portion, an inner through electrode, and a second inclined portion are provided. By sequentially passing through the second conductive pattern and the outer through silicon via, the winding lead coil can be wound toward the first direction in the circumferential direction of the laminated substrate. Further, in a configuration in which the first angle formed by the first outer extending portion and the first inclined portion and the second angle formed by the second outer extending portion and the second inclined portion are the same angle, the first angle is obtained. The third conductive pattern that overlaps the inclined portion and the second inclined portion can have a shape that repeats a symmetrical pattern in the circumferential direction.

Further, in the configuration in which the first conductive pattern includes the first inner extending portion and the second conductive pattern includes the second inner extending portion, the first inclined portion and the second inclined portion have outer through electrodes in the radial direction. It will be located in the middle part between the through silicon via and the inner through electrode. Thereby, the third conductive pattern can be arranged in the intermediate portion between the outer through electrode and the inner through electrode in the radial direction. Further, in a configuration in which the first inner extending portion and the second inner extending portion overlap each other when viewed from the stacking direction, the radially inner end of the first inclined portion and the radially inner end of the second inclined portion are formed. And overlap when viewed from the stacking direction. As a result, it is possible to prevent the third conductive pattern from being formed so as to be displaced from the radially inner end of the first inclined portion and the radially inner end of the second inclined portion. In addition, the number of turns of the winding lead coil in the circumferential direction can be increased. Further, in the configuration in which the first inclined portion and the second inclined portion are provided so as to be continuous in the circumferential direction when viewed from the stacking direction, the third conductive pattern overlapping the first inclined portion and the second inclined portion is formed in the circumferential direction. It can be formed in a continuous wavy shape or a zigzag shape.

Further, since the instrument transformer according to the above aspect includes the above-mentioned current transformer, it is possible to reduce noise and improve the detection accuracy in detecting the current flowing through the primary conductor.

Further, since the gas-insulated switchgear according to the above aspect includes an instrument transformer with improved noise reduction and detection accuracy, it is possible to provide a highly functional gas-insulated switchgear.

It is an external view which shows an example of the gas insulation switchgear which concerns on embodiment. It is an external view which shows an example of an instrument transformer. It is sectional drawing which shows an example of the internal structure of an instrument transformer. It is sectional drawing which shows an example of the structure of a current transformer. It is a figure which shows an example of the structure of the 1st conduction pattern of a current transformer. It is a figure which shows an example of the structure of the 3rd conductive pattern of a current transformer. It is a figure which shows an example of the structure of the 2nd conductive pattern of a current transformer. It is a perspective view which shows the structure of a part of the rewind coil and the rewind coil of a current transformer. It is a figure which shows an example of the 1st conductive pattern. It is a figure which shows an example of the 2nd conductive pattern. It is a figure which shows an example of the 3rd conductive pattern. It is a figure which shows the relationship between the 1st conductive pattern and the 2nd conductive pattern of a rewinding coil, and the 3rd conductive pattern of a rewinding coil. It is an enlarged view of a part of a winding lead coil.

Hereinafter, embodiments of the present invention will be described with reference to the drawings. However, the present invention is not limited to the contents described below. Further, in order to explain the embodiment, the drawings are expressed by changing the scale as appropriate, such as by making a part larger or emphasized, and the dimensions and shape may be different from the actual product. FIG. 1 is a diagram showing an example of a gas-insulated switchgear 1 according to an embodiment. The gas-insulated switchgear 1 according to the present embodiment is installed in a substation or the like. The gas-insulated switchgear 1 according to the present embodiment is provided in a high-voltage three-phase AC power system such as 24 kV to 1100 kV.

As shown in FIG. 1, the gas-insulated switchgear 1 includes a circuit breaker unit 2, a first disconnector unit 3A, a second disconnector unit 3B, and a power receiving side unit 5. The circuit breaker unit 2 includes a circuit breaker tank 21 and a circuit breaker (not shown) housed in the circuit breaker tank 21. The first disconnector unit 3A and the second disconnector unit 3B are arranged on one side of the circuit breaker unit 2. The first disconnector unit 3A and the second disconnector unit 3B have a disconnector tank 31 connected to the disconnector tank 21, and a bus disconnector (not shown) provided in the disconnector tank 31, respectively. To prepare for. The first disconnector unit 3A and the second disconnector unit 3B are connected to the first bus and the second bus (not shown), respectively.

The power receiving side unit 5 is arranged on the other side of the circuit breaker unit 2. As shown in FIGS. 1 to 3, the power receiving side unit 5 includes a tank 51 and an instrument transformer 50. The tank 51 is formed in a cylindrical shape extending in the axial direction Da along the central axis 51c. As shown in FIG. 1, one end 51a of the tank 51 is connected to the circuit breaker tank 21. The other end 51b of the tank 51 is connected to the power receiving side. As shown in FIG. 3, a total of three instrument transformers 50 are provided in the tank 51 for each of the three phases. The three sets of instrument transformers 50 are arranged at intervals in the circumferential direction Dc around the central axis 51c of the tank 51.

Each instrument transformer 50 is provided on the outer peripheral side of the primary conductor 52 extending in the tank 51 along the axial direction Da, and is electrically connected to the tank 51 via the mounting plate 100. Each instrument transformer 50 includes a capacitance voltage divider 55 and a current transformer 60. In the present embodiment, the capacitance voltage divider 55 and the current transformer 60 are arranged symmetrically in the axial direction Da of each instrument transformer 50. That is, each instrument transformer 50 includes two sets of capacitance voltage dividers 55 and a current transformer 60 along the axial direction Da. Each instrument transformer 50 is provided with two capacitive voltage dividers 55 at the center of the axial Da. Each instrument transformer 50 is provided with current transformers 60 on both sides of the axial Da for the two capacitive voltage dividers 55. In the present embodiment, each instrument transformer 50 is provided with two sets of capacitance voltage dividers 55 and a current transformer 60, but the present invention is not limited to this. Each instrument transformer 50 may include only one set of capacitive voltage dividers 55 and a current transformer 60.

Each capacitive voltage divider 55 divides a high voltage flowing through the primary conductor 52. The capacitance voltage divider 55 divides the voltage according to the ratio of the capacitance between the primary conductor 52 and the space electrode (not shown) and the capacitance between the space electrode and the ground electrode. The current transformer 60 is arranged outside the radial Dr of the primary conductor 52 before and after the capacitance voltage divider 55. The current transformer 60 is used as a detection coil for detecting a high voltage current value flowing through the primary conductor 52. The current transformer 60 is connected to a signal processing device (not shown). The signal processing device detects the current value flowing through the primary conductor based on the signal waveform output from the current transformer 60. In the present embodiment, the current transformer 60 is arranged outside the radial direction Dr of the primary conductor 52, but the installation position thereof can be changed as appropriate. For example, the current transformer 60 may be arranged outside the radial Dr of the capacitance voltage divider 55.

As shown in FIGS. 4 to 7, the current transformer 60 includes a laminated substrate 61 and a coil portion 62. The laminated substrate 61 is annular and has an opening 61h in the center. The laminated substrate 61 has a plate shape having a predetermined thickness in the axial direction Da. As shown in FIG. 4, the laminated substrate 61 includes a plurality of conductive layers 64 laminated on both sides of the substrate 63. In this embodiment, for example, four conductive layers 64A to 64D are laminated in the axial direction Da (hereinafter, the direction in which the plurality of conductive layers 64 are laminated is referred to as a stacking direction Ds). The plurality of conductive layers 64A to 64D are laminated with the base material 63, which is an insulating layer, interposed therebetween, via the insulating layer 65. The conductive layers 64A to 64D are formed of a conductive material, and a conductive pattern, an electrode, or the like as described later is formed by a photolithography method or the like.

As shown in FIGS. 4 to 11, the laminated substrate 61 includes a plurality of outer through electrodes 71 and a plurality of inner through electrodes 72. The outer through electrode 71 and the inner through electrode 72 electrically connect a plurality of conductive layers 64A to 64D, respectively. The outer through electrode 71 and the inner through electrode 72 extend in the stacking direction Ds and penetrate the plurality of conductive layers 64A to 64D, the base material 63, and the insulating layer 65, respectively, and are formed in a columnar shape, for example.

The plurality of outer through electrodes 71 are provided on the outer peripheral portion 61a of the laminated substrate 61 at intervals in the circumferential direction Dc. The plurality of outer silicon vias 71 are provided on concentric circles centered on the central axis 61c of the laminated substrate 61 at equal intervals in the circumferential direction Dc. The outer through electrodes 71 adjacent to each other in the circumferential direction Dc are arranged so that the sandwiching angle about the central axis 61c is an angle θ.

The plurality of inner through electrodes 72 are provided at the inner peripheral portion 61b of the laminated substrate 61 at intervals in the circumferential direction Dc. The plurality of inner through electrodes 72 are provided at equal intervals in the circumferential direction Dc. As shown in FIG. 12, the inner through electrodes 72 adjacent to each other in the circumferential direction Dc are arranged so that the sandwiching angle in the circumferential direction Dc is an angle θ. The outer through silicon via 71 and the inner through silicon via 72 are provided so as to be offset from each other in the circumferential direction Dc when viewed from the radial direction Dr. The plurality of inner through electrodes 72 are arranged so as to be offset by an angle θ / 2 in the circumferential direction Dc with respect to the plurality of outer through electrodes 71. That is, when viewed from the stacking direction Ds, the imaginary line of the radial Dr passing through the inner through electrode 72 does not match the imaginary line of the radial Dr passing through the outer through electrode 71, and is between the two outer through electrodes 71. It is in a state of passing (near the center).

As shown in FIGS. 4 to 12, the coil portion 62 includes a rewinding coil 70 and a rewinding coil 80. The winding lead coil 70 winds toward the first direction Dc1 in the circumferential direction Dc of the laminated substrate 61. The rewind coil 80 rewinds toward the second direction Dc2 in the circumferential direction Dc.

The winding lead coil 70 includes a plurality of first conductive patterns 73, a plurality of second conductive patterns 74, a plurality of outer through electrodes 71 provided on the laminated substrate 61, and a plurality of inner penetrations provided on the laminated substrate 61. The electrode 72 is provided. The plurality of first conductive patterns 73 are provided on the conductive layer 64 located at one end of the stacking direction Ds (axial direction Da) of the plurality of conductive layers 64. In the present embodiment, the plurality of first conductive patterns 73 are provided on the first conductive layer 64A located at one end of the stacking direction Ds of the plurality of conductive layers 64. The plurality of first conductive patterns 73 are provided in the first conductive layer 64A at intervals in the circumferential direction Dc. Both ends of each first conductive pattern 73 are connected to the outer through silicon via 71 and the inner through silicon via 72.

As shown in FIGS. 8, 9, and 12, the first conductive pattern 73 includes a first outer extending portion 731, a first inclined portion 732, and a first inner extending portion 733. One end of the first outer extending portion 731 is connected to the outer through silicon via 71. The first outer extending portion 731 extends inward in the radial direction from the outer through silicon via 71. The other end of the first outer extending portion 731 is connected to the first inclined portion 732. The first outer extending portion 731 is connected to the outer through silicon via 71 and the first inclined portion 732. The first inclined portion 732 is provided inside the radial Dr with respect to the first outer extending portion 731. The first inclined portion 732 is inclined and extends in the first direction Dc1 in the circumferential direction Dc from the outside of the radial direction Dr to the inside. The other end of the first inclined portion 732 is connected to one end of the first inner extending portion 733. The first inner extending portion 733 extends inward in the radial direction from the other end of the first inclined portion 732. The other end of the first inner extending portion 733 is connected to the inner through electrode 72. The first inner extending portion 733 is connected to the first inclined portion 732 and the inner through electrode 72.

As shown in FIG. 4, the plurality of second conductive patterns 74 are provided on the conductive layer 64 located at the other end of the stacking direction Ds (axial direction Da) of the plurality of conductive layers 64. In the present embodiment, the plurality of second conductive patterns 74 are provided on the second conductive layer 64D located at the other end of the stacking direction Ds of the plurality of conductive layers 64. The plurality of second conductive patterns 74 are provided in the second conductive layer 64D at intervals in the circumferential direction Dc. As shown in FIGS. 8, 10, and 12, both ends of each second conductive pattern 74 are connected to the outer through silicon via 71 and the inner through silicon via 72.

The second conductive pattern 74 includes a second outer extending portion 741, a second inclined portion 742, and a second inner extending portion 743. One end of the second outer extending portion 741 is connected to the outer through silicon via 71. The second outer extending portion 741 extends inward in the radial direction from the outer through silicon via 71. The other end of the second outer extending portion 741 is connected to the second inclined portion 742. The second outer extending portion 741 is connected to the outer through silicon via 71 and the second inclined portion 742. The second inclined portion 742 is provided inside the radial Dr with respect to the second outer extending portion 741. The second inclined portion 742 is inclined and extends in the second direction Dc2 in the circumferential direction Dc from the outside of the radial direction Dr to the inside. The other end of the second inclined portion 742 is connected to one end of the second inner extending portion 743. The second inner extending portion 743 extends inward in the radial direction from the other end of the second inclined portion 742. The other end of the second inner extending portion 743 is connected to the inner through electrode 72. The second inner extending portion 743 is connected to the second inclined portion 742 and the inner through electrode 72.

As shown in FIGS. 8 and 12, the first outer extending portion 731 of the first conductive pattern 73 connected to each through silicon via 71 and the second outer extending portion 741 of the second conductive pattern 74 are Each extends radially Dr. That is, the first outer extending portion 731 of the first conductive pattern 73 connected to each outer through silicon via 71 and the second outer extending portion 741 of the second conductive pattern 74 overlap each other when viewed from the stacking direction Ds. Further, the first inner extending portion 733 of the first conductive pattern 73 connected to each inner through silicon via 72 and the second inner extending portion 743 of the second conductive pattern 74 extend in the radial direction, respectively. That is, the first inner extending portion 733 of the first conductive pattern 73 connected to each inner through silicon via 72 and the second inner extending portion 743 of the second conductive pattern 74 overlap each other when viewed from the stacking direction Ds.

The first inclined portion 732 of the first conductive pattern 73 and the second inclined portion 742 of the second conductive pattern 74 have the same positions in the radial direction Dr. Since the first outer extending portion 731 and the second outer extending portion 741 overlap each other when viewed from the stacking direction Ds, the outer end portion of the first inclined portion 732 in the radial direction Dr and the first outer extending portion 731 The connecting portion J11 and the connecting portion J12 between the outer end portion of the second inclined portion 742 in the radial direction Dr and the second outer extending portion 741 overlap each other when viewed from the stacking direction Ds. The first inclined portion 732 and the second inclined portion 742 are connected to the first outer extending portion 731 and the second outer extending portion 741 at the outer end portion in the radial direction Dr when viewed from the stacking direction Ds. It extends in a V shape from J11 and J12 toward the inside of the radial Dr. Here, in the present embodiment, the first angle θ1 formed by the first outer extending portion 731 and the first inclined portion 732, and the second angle θ2 formed by the second outer extending portion 741 and the second inclined portion 742. Is the same angle.

Since the first inner extending portion 733 and the second inner extending portion 743 overlap each other when viewed from the stacking direction Ds, the inner end portion of the first inclined portion 732 in the radial direction Dr and the first inner extending portion 733 The connecting portion J13, the connecting portion J14 between the inner end portion of the second inclined portion 742 in the radial direction and the second inner extending portion 743, and the connecting portion J14 overlap each other when viewed from the stacking direction Ds. The first inclined portion 732 and the second inclined portion 742 are connected to the first inner extending portion 733 and the second inner extending portion 743 at the inner end portion in the radial direction Dr when viewed from the stacking direction Ds. It extends in a V shape from J13 and J14 toward the outside of the radial Dr. Here, in the present embodiment, the third angle θ3 formed by the first inner extending portion 733 and the first inclined portion 732, and the fourth angle θ4 formed by the second inner extending portion 743 and the second inclined portion 742. Is the same angle. In this way, the first inclined portion 732 and the second inclined portion 742 are provided so as to be continuous in a wavy or zigzag shape in the circumferential direction Dc when viewed from the stacking direction Ds.

Further, as shown in FIGS. 12 and 13, the first angle θ1 (third angle θ3) and the second angle θ2 (fourth angle θ4) are set to obtuse angles, respectively. For example, the first angle θ1 and the second angle θ2 are set to, for example, 91 degrees to 135 degrees. By setting the first angle θ1 and the second angle θ2 to about 135 degrees, the angle formed by the first inclined portion 732 and the second inclined portion 742 when viewed from the stacking direction Ds becomes about 90 degrees, respectively, and is wavy. It is avoided that the bent portion has an acute angle. Further, by setting the first angle θ1 and the second angle θ2 to about 135 degrees, it is possible to prevent one first conductive pattern 73 or the second conductive pattern 74 from widening in the circumferential direction Dc. As a result, it is possible to form a large number of first conductive patterns 73 or second conductive patterns 74 in the circumferential direction Dc, and it is possible to increase the number of turns of the winding lead coil 70 within a limited space.

As shown in FIGS. 8 and 9, in the winding lead coil 70, a connection terminal 77 to which an external input terminal is connected is connected to an outer through electrode 71S arranged at a winding start position. The winding coil 70 is a toroidal coil that winds toward the first direction Dc1 in the circumferential direction Dc by sequentially passing through the first conductive pattern 73, the inner through electrode 72, the second conductive pattern 74, and the outer through electrode 71. .. The rewinding coil 70 is connected to the rewinding coil 80 via an inner through electrode 72E arranged at the winding end position.

As shown in FIGS. 4 and 8, the rewind coil 80 is provided in the conductive layer 64 between the first conductive layer 64A and the second conductive layer 64D. In the present embodiment, the rewind coil 80 is provided on the third conductive layer 64C between the first conductive layer 64A and the second conductive layer 64D. The rewind coil 80 may be provided on the conductive layer 64B between the first conductive layer 64A and the second conductive layer 64D. As shown in FIGS. 8 and 11, the rewind coil 80 includes a third inner extending portion 81, a third conductive pattern 82, and a third outer extending portion 83.

One end of the third inner extending portion 81 is connected to the inner through electrode 72E arranged at the winding end position of the winding lead coil 70 by the third conductive layer 64C. The third inner extending portion 81 extends outward from the inner through silicon via 72E in the radial direction. The other end of the third inner extending portion 81 is connected to the starting end 82s of the third conductive pattern 82.

The third conductive pattern 82 extends from the start end 82s toward the end 82e in the second direction Dc2 in the circumferential direction Dc. As shown in FIGS. 8 and 12, the third conductive pattern 82 overlaps the first inclined portion 732 and the second inclined portion 742 when viewed from the stacking direction Ds. The third conductive pattern 82 has a circumferential direction of a third inclined portion 813 that overlaps with the first inclined portion 732 when viewed from the stacking direction Ds and a fourth inclined portion 814 that overlaps with the second inclined portion 742 when viewed from the stacking direction Ds. Prepare for Dc alternately. The position of the third conductive pattern 82 in the radial direction coincides with the position of the first inclined portion 732 and the second inclined portion 742 in the radial direction Dr.

The connection portion J31 between the outer end of the radial Dr of the third inclined portion 813 and the outer end of the radial Dr of the fourth inclined portion 814 is the outer end of the radial Dr of the first inclined portion 732. And the connection portion J11 with the first outer extension portion 731, the outer end portion of the second inclined portion 742 in the radial direction Dr, and the connection portion J12 with the second outer extension portion 741 overlap with each other when viewed from the stacking direction Ds. The joint J32 between the inner end of the radial Dr of the third inclined portion 813 and the inner end of the radial Dr of the fourth inclined portion 814 is the inner end of the radial Dr of the first inclined portion 732. Seen from the stacking direction Ds, the connection portion J13 between the first inner extension portion 733 and the connection portion J14 between the inner end portion of the second inclined portion 742 in the radial direction Dr and the second inner extension portion 743. Overlap.

As shown in FIGS. 8 and 11, one end of the third outer extending portion 83 is connected to the end 82e of the third conductive pattern 82. The third outer extending portion 83 extends to the outside of the radial Dr. The other end of the third outer extending portion 83 is connected to the outer through electrode 71F arranged at the winding end position of the rewinding coil 80 in the third conductive layer 64C. The outer through electrode 71F is connected to the connection terminal 78 to which the external output terminal is connected in the first conductive layer 64A. The rewind coil 80 is a flat coil that rewinds from the inner through electrode 72E arranged at the winding end position of the rewinding coil 70 toward the second direction Dc2 in the circumferential direction Dc through the third conductive pattern 82.

Here, as shown in FIG. 8, the first conductive pattern 73F of the winding coil 70 in which the first outer extending portion 731 overlaps the third outer extending portion 83 when viewed from the stacking direction Ds is the outer through electrode 71F. It is connected to the outer through electrode 71S arranged so as to avoid interference with the outer through portion 79 via the bent portion 79. Further, the outer through silicon via 71H to which the other first conductive pattern 73H adjacent to the first conductive pattern 73F is connected is inside the radial Dr so as to avoid interference with the outer through silicon via 71S and the bent portion 79. Be placed.

As described above, according to the current transformer 60, the instrument transformer 50, and the gas-insulated switchgear 1 according to the present embodiment, the first outer extending portion 731 of the first conductive pattern 73 constituting the winding lead coil 70 Since the second outer extending portion 741 of the second conductive pattern 74 overlaps with the second outer extending portion 741 when viewed from the stacking direction Ds, the first direction in the circumferential direction Dc from the first outer extending portion 731 toward the inside of the radial direction Dr. The first inclined portion 732 inclined toward Dc1 and the second inclined portion 742 inclined toward the second direction Dc2 in the circumferential direction Dc from the second outer extending portion 741 toward the inside of the radial direction Dr are formed from the stacking direction Ds. As seen, they are arranged in a wavy or zigzag shape in the circumferential direction Dc.

Since the third conductive pattern 82 constituting the rewind coil 80 overlaps the first inclined portion 732 and the second inclined portion 742 when viewed from the stacking direction Ds, the third conductive pattern 82 is wavy in the circumferential direction Dc. Or it will be continuous in a zigzag pattern. Further, by setting the first angle θ1 and the second angle θ2 to obtuse angles of 91 degrees to 135 degrees, it is possible to avoid forming an acute-angled portion in the third conductive pattern 82. That is, when the pattern is formed, the acute-angled portion is likely to be damaged, and the possibility that the rewind coil 80 is defective increases. Therefore, it is necessary to pay close attention to the formation of the third conductive pattern 82, but since the third conductive pattern 82 has no acute angle portion by making the improvements as described above, the third conductive pattern 82 can be easily formed. Can be formed. Further, the cross section of the rewinding coil 70 perpendicular to the coil winding direction (toroidal direction) is offset by the cross section of the rewinding coil 80, and the influence thereof is suppressed. As a result, it is possible to reduce noise and improve detection accuracy.

Further, in a configuration in which the outer through electrode 71 and the inner through electrode 72 are provided so as to be offset in the circumferential direction Dc when viewed from the radial direction Dr, the first conductive pattern 73 provided with the first inclined portion 732, the inner through electrode 72, By sequentially passing through the second conductive pattern 74 provided with the second inclined portion 742 and the outer through silicon via 71, the winding lead coil 70 is configured toward the first direction Dc1 in the circumferential direction Dc of the laminated substrate 61 by a simple configuration. You can roll it up.

Further, the first angle θ1 formed by the first outer extending portion 731 and the first inclined portion 732 and the second angle θ2 formed by the second outer extending portion 741 and the second inclined portion 742 are at the same angle. In a certain configuration, the third conductive pattern 82 overlapping the first inclined portion 732 and the second inclined portion 742 can have a shape that repeats a symmetrical pattern in the circumferential direction Dc. As described above, by setting the first angle θ1 and the second angle θ2 to an obtuse angle in the range of 91 degrees to 135 degrees, the bent portion of the third conductive pattern 82 can have an obtuse angle of 90 degrees or more. .. As a result, the third conductive pattern 82 has no acute-angled portion, and the third conductive pattern 82 can be appropriately formed.

Further, in the configuration in which the first conductive pattern 73 includes the first inner extending portion 733 and the second conductive pattern 74 includes the second inner extending portion 743, the first inclined portion 732 and the second inclined portion 742 are It will be located at the intermediate portion between the outer through silicon via 71 and the inner through silicon via 72 in the radial direction Dr. Thereby, the third conductive pattern 82 can be arranged in the intermediate portion between the outer through silicon via 71 and the inner through silicon via 72 in the radial direction Dr.

Further, in a configuration in which the first inner extending portion 733 and the second inner extending portion 743 overlap each other when viewed from the stacking direction Ds, the inner end portion of the first inclined portion 732 in the radial direction Dr and the second inclined portion 742 The end portion inside the radial direction Dr overlaps with each other when viewed from the stacking direction Ds. As a result, the third conductive pattern 82 extends long in the circumferential direction Dc at the portion where the end portion inside the radial Dr of the first inclined portion 732 and the end portion inside the radial Dr of the second inclined portion 742 overlap. Can be suppressed. Therefore, the number of turns of the rewind coil 70 and the rewind coil 80 in the circumferential direction Dc can be increased.

Further, in a configuration in which the first inclined portion 732 and the second inclined portion 742 are provided so as to be continuous in the circumferential direction Dc when viewed from the stacking direction Ds, the first inclined portion 732 and the second inclined portion 742 overlap each other. 3 The conductive pattern 82 can be formed in a wavy shape or a zigzag shape continuous in the circumferential direction Dc.

Although the embodiments have been described above, the technical scope of the present invention is not limited to the scope described in the above-described embodiments. One or more of the requirements described in the embodiments described above may be omitted. In addition, the requirements described in the above-described embodiments can be combined as appropriate. It will also be apparent to those skilled in the art that various changes or improvements can be made to the above embodiments. Such modifications or improvements are also included in the technical scope of the invention. For example, in the above-described embodiment, a plurality of current transformers 60 may be arranged side by side in the axial direction Da.

1 ... Gas insulation switchgear 50 ... Instrument transformer 55 ... Capacity voltage divider 60 ... Current transformer 61 ... Laminated substrate 61a ... Outer peripheral portion 61b ... Inner peripheral portion 63 ... Base material 62 ... Coil portion 64 ... Conductive layer 64A ... First conductive layer (conductive layer)
64C ... Third conductive layer (conductive layer)
64D ... Second conductive layer (conductive layer)
65 ... Insulation layer 70 ... Winding coil 71, 71F, 71H, 71S ... Outer through electrodes 72, 72E ... Inner through electrodes 73, 73F, 73H ... First conductive pattern 731 ... 1st outer extending portion 732 ... 1st inclined portion 733 ... 1st inner extending portion 74 ... 2nd conductive pattern 741 ... 2nd outer extending portion 742 ... 2nd inclination Part 743 ... Second inner extending part 80 ... Rewinding coil 82 ... Third conductive pattern Dc ... Circumferential direction Dc1 ... First direction Dc2 ... Second direction Dr ... Radial direction Ds ・ ・ ・ Stacking direction θ ・ ・ ・ Angle θ1 ・ ・ ・ First angle θ2 ・ ・ ・ Second angle

Claims (7)

A current transformer used for gas-insulated switchgear.
An annular laminated substrate in which a plurality of conductive layers are laminated via an insulating layer,
A coil portion formed on the laminated substrate is provided.
The laminated substrate is
A plurality of through silicon vias, which are provided at intervals in the circumferential direction on the outer peripheral portion and electrically connect the plurality of conductive layers,
A plurality of inner through electrodes, which are provided at intervals in the circumferential direction in the inner peripheral portion and electrically connect the plurality of conductive layers, are provided.
The coil portion is
A winding coil that winds toward the first direction in the circumferential direction,
A rewind coil for rewinding in a second direction opposite to the first direction in the circumferential direction is provided.
The winding lead coil is
A plurality of first conductive patterns provided in the first conductive layer at intervals in the circumferential direction and connected to the outer through electrode and the inner through electrode.
The second conductive layer includes a plurality of second conductive patterns provided at intervals in the circumferential direction and connected to the outer through electrode and the inner through electrode.
The first conductive pattern is
A first inclined portion that inclines in the first direction from the outside to the inside in the radial direction of the laminated substrate,
A first outer extending portion connected to the outer through electrode and the first inclined portion and extending in the radial direction is provided.
The second conductive pattern is
A second inclined portion that inclines in the second direction from the outside to the inside in the radial direction,
A second outer extending portion connected to the outer through electrode and the second inclined portion and extending in the radial direction is provided.
The rewind coil is provided in a third conductive layer between the first conductive layer and the second conductive layer, and has a third conductive pattern extending in the circumferential direction.
All the through silicon vias are provided on the circumference of the first radius.
All the through silicon vias are provided on the circumference of the second radius.
The outer through electrode and the inner through electrode are provided at positions displaced from each other in the circumferential direction so as not to overlap each other on the same line extending in the radial direction.
The first outer extending portion and the second outer extending portion overlap each other when viewed from the laminating direction of the laminated substrate.
The third conductive pattern overlaps the first inclined portion and the second inclined portion when viewed from the stacking direction, and is composed of a pattern overlapping the first inclined portion and a pattern overlapping the second inclined portion. A current transformer with an angle of 90 degrees or more . A claim that the first angle formed by the first outer extending portion and the first inclined portion and the second angle formed by the second outer extending portion and the second inclined portion are the same angle. The current transformer according to 1 . The first conductive pattern is connected to the inner through electrode and the first inclined portion, and includes a first inner extending portion extending in the radial direction.
The current transformer according to claim 1 or 2 , wherein the second conductive pattern is connected to the inner through electrode and the second inclined portion and includes a second inner extending portion extending in the radial direction. The current transformer according to claim 3 , wherein the first inner extending portion and the second inner extending portion overlap each other when viewed from the stacking direction. The current transformer according to any one of claims 1 to 4 , wherein the first inclined portion and the second inclined portion are provided so as to be continuous in the circumferential direction when viewed from the stacking direction. An instrument transformer comprising the current transformer according to any one of claims 1 to 5 . A gas-insulated switchgear comprising the instrument transformer according to claim 6 .

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