JP6981933B2 - A curable composition, a cured product of the composition, and a semiconductor device using the cured product. - Google Patents

A curable composition, a cured product of the composition, and a semiconductor device using the cured product. Download PDF

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JP6981933B2
JP6981933B2 JP2018152932A JP2018152932A JP6981933B2 JP 6981933 B2 JP6981933 B2 JP 6981933B2 JP 2018152932 A JP2018152932 A JP 2018152932A JP 2018152932 A JP2018152932 A JP 2018152932A JP 6981933 B2 JP6981933 B2 JP 6981933B2
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大輔 平野
中 小林
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Shin Etsu Chemical Co Ltd
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Description

本発明は、硬化性組成物、その硬化物、及び前記硬化物を用いた半導体装置に関する。 The present invention relates to a curable composition, a cured product thereof, and a semiconductor device using the cured product.

従来、光学デバイスまたは光学部品用材料、特に発光ダイオード(LED)素子の封止材料としては、一般的にエポキシ樹脂が用いられている。また、シリコーン樹脂に関しても、LED素子のモールド部材等として用いること(特許文献1、2)、またカラーフィルター材料として用いること(特許文献3)が試みられているが、実際上の使用例は少ない。 Conventionally, an epoxy resin is generally used as a material for an optical device or an optical component, particularly as a sealing material for a light emitting diode (LED) element. Further, it has been attempted to use a silicone resin as a mold member or the like for an LED element (Patent Documents 1 and 2) and as a color filter material (Patent Document 3), but there are few practical examples of use. ..

近年、白色LEDが注目される中で、これまで問題とされなかったエポキシ封止材の紫外線等による黄変や、小型化に伴う発熱量の増加によるクラックの発生等が問題となっており対応が急務となっている。これらの対応策としては、分子中に多量のフェニル基を持つシリコーンレジン硬化物を用いることが検討されている。しかしながら、現状のLEDに使用されている基板は銀基板が使用されている事が多く、銀は空気中に存在する硫黄化合物により腐食され、これによりLEDの発光効率が落ちる場合がある。この現象はフェニル基を持つシリコーンレジン硬化物でもある程度は抑えられるが、エポキシ封止材には劣る。この対策として多環式炭化水素基を有する硬化組成物を用いることで、銀の腐食と耐熱性を両立した材料が提案されている(特許文献4)。しかしながら、この組成物は樹脂としての変化点が室温付近にあるため、高温・低温の温度変化により、クラックが発生しやすい。 In recent years, while white LEDs have been attracting attention, yellowing of epoxy encapsulants due to ultraviolet rays, etc., which has not been a problem until now, and cracks due to an increase in calorific value due to miniaturization have become problems. Is an urgent need. As a countermeasure against these, it is considered to use a cured silicone resin having a large amount of phenyl groups in the molecule. However, the substrate used for the current LED is often a silver substrate, and silver is corroded by sulfur compounds existing in the air, which may reduce the luminous efficiency of the LED. This phenomenon can be suppressed to some extent even with a cured silicone resin having a phenyl group, but it is inferior to the epoxy encapsulant. As a countermeasure against this, a material having both silver corrosion and heat resistance has been proposed by using a cured composition having a polycyclic hydrocarbon group (Patent Document 4). However, since the change point of this composition as a resin is near room temperature, cracks are likely to occur due to temperature changes at high and low temperatures.

特開平10−228249号公報Japanese Unexamined Patent Publication No. 10-228249 特開平10−242513号公報Japanese Unexamined Patent Publication No. 10-242513 特開2000−123981号公報Japanese Unexamined Patent Publication No. 2000-123981 特開2005−133073号公報Japanese Unexamined Patent Publication No. 2005-133073

本発明は、上記問題を解決するためになされたものであり、硬度、機械的強度、および耐クラック性が高く、短波長領域の光透過性、ガスバリア性に優れた硬化物を与える硬化性組成物を提供することを目的とする。 The present invention has been made to solve the above problems, and has a curable composition that provides a cured product having high hardness, mechanical strength, crack resistance, light transmission in a short wavelength region, and gas barrier properties. The purpose is to provide things.

上記課題を達成するために、本発明では、下記(A)、(B)及び(C)を含む硬化性組成物を提供する。
(A)下記式(1)で表される有機ケイ素化合物と、下記式(2)で表される有機ケイ素化合物との付加反応物であって、1分子中にSiH基を3個以上有する付加反応物、

Figure 0006981933
(式中、Rは独立に置換または非置換の炭素数1〜12の2価炭化水素基である。)
Figure 0006981933
(式中、Rは独立に置換または非置換の炭素数1〜12の1価炭化水素基であり、Rは単結合または非置換の炭素数1〜4の2価炭化水素基である。)
(B)アルケニル基を1分子中に2個以上有するオルガノシロキサン化合物、
(C)ヒドロシリル化反応触媒:組成物全体の質量に対して白金族金属原子として1〜500ppm In order to achieve the above problems, the present invention provides a curable composition containing the following (A), (B) and (C).
(A) An addition reaction product of an organosilicon compound represented by the following formula (1) and an organosilicon compound represented by the following formula (2), which has three or more SiH groups in one molecule. Reactant,
Figure 0006981933
(In the formula, R 1 is an independently substituted or unsubstituted divalent hydrocarbon group having 1 to 12 carbon atoms.)
Figure 0006981933
(In the formula, R 2 is an independently substituted or unsubstituted monovalent hydrocarbon group having 1 to 12 carbon atoms, and R 3 is a single bond or unsubstituted divalent hydrocarbon group having 1 to 4 carbon atoms. .)
(B) An organosiloxane compound having two or more alkenyl groups in one molecule,
(C) Hydrosilylation reaction catalyst: 1 to 500 ppm as a platinum group metal atom with respect to the total mass of the composition.

本発明の硬化性組成物であれば、硬度、機械的強度、および耐クラック性が高く、短波長領域の光透過性、ガスバリア性に優れた硬化物を与える硬化性組成物を提供できる。 The curable composition of the present invention can provide a curable composition having high hardness, mechanical strength, and crack resistance, and providing a cured product having excellent light transmission and gas barrier properties in a short wavelength region.

本発明の硬化性組成物は、上記Rがフェニレン基、上記Rがメチル基又はフェニル基であることができる。 In the curable composition of the present invention, the above R 1 can be a phenylene group and the above R 2 can be a methyl group or a phenyl group.

本発明の硬化性組成物は、さらに前記(B)が下記式(3)で表される化合物であることが好ましい。

Figure 0006981933
(式中、Rは独立に非置換または置換の1価炭化水素基であり、Rは独立にメチル基又はフェニル基であり、aは0〜50の整数であり、bは0〜100の整数である。ただし、aが0のときR5はフェニル基であり、かつ、bは1〜100である。括弧が付されたシロキサン単位の配列順は任意である。) The curable composition of the present invention is preferably a compound in which the above (B) is represented by the following formula (3).
Figure 0006981933
(In the formula, R 4 is an independently unsubstituted or substituted monovalent hydrocarbon group, R 5 is an independently methyl group or phenyl group, a is an integer of 0 to 50, and b is 0 to 100. However, when a is 0, R5 is a phenyl group and b is 1 to 100. The order of arrangement of the siloxane units in parentheses is arbitrary.)

また本発明は、前記硬化性組成物を硬化してなる硬化物を提供する。 The present invention also provides a cured product obtained by curing the curable composition.

本発明の硬化物であれば、硬度、機械的強度、および耐クラック性が高く、短波長領域の光透過性、ガスバリア性に優れる。 The cured product of the present invention has high hardness, mechanical strength, and crack resistance, and is excellent in light transmission in the short wavelength region and gas barrier property.

本発明の硬化物は、厚さ2mmにおける波長400nmの光透過率(25℃)が80%以上であることが好ましい。 The cured product of the present invention preferably has a light transmittance (25 ° C.) of 80% or more at a wavelength of 400 nm at a thickness of 2 mm.

このような光透過率を有する硬化物であれば、発光ダイオード素子の保護、封止もしくは接着、波長変更もしくは調整またはレンズ等の用途に好適に使用できる。 A cured product having such a light transmittance can be suitably used for applications such as protection, sealing or adhesion of a light emitting diode element, wavelength change or adjustment, or a lens.

さらに本発明は、前記硬化物により半導体素子が被覆されたものである半導体装置を提供する。 Further, the present invention provides a semiconductor device in which a semiconductor element is coated with the cured product.

本発明の半導体装置であれば、使用する硬化物の硬度、機械的強度、および耐クラック性が高く、そのガスバリア性が優れているため、高い耐久性を有する半導体装置となる。さらに、短波長領域の光透過性にも優れるため、発光ダイオード素子などの光透過性を要する半導体装置としても有用である。 The semiconductor device of the present invention has high hardness, mechanical strength, and crack resistance of the cured product used, and has excellent gas barrier properties, so that the semiconductor device has high durability. Further, since it is excellent in light transmission in a short wavelength region, it is also useful as a semiconductor device such as a light emitting diode element that requires light transmission.

本発明の硬化性組成物であれば、硬度、機械的強度、および耐クラック性が高く、短波長領域の光透過性、ガスバリア性に優れた硬化物を与えることができる。このため、発光ダイオード素子の保護、封止もしくは接着、波長変更もしくは調整またはレンズ等の用途に好適に使用できる。また、レンズ材料、光学デバイスもしくは光学部品用封止材、ディスプレイ材料等の各種の光学部品用材料、電子デバイスもしくは電子部品用絶縁材料、更にはコーティング材料としても有用である。 The curable composition of the present invention can provide a cured product having high hardness, mechanical strength, and crack resistance, and excellent light transmission and gas barrier properties in a short wavelength region. Therefore, it can be suitably used for applications such as protection, sealing or adhesion, wavelength change or adjustment, or a lens of a light emitting diode element. It is also useful as a lens material, a sealing material for an optical device or an optical component, a material for various optical components such as a display material, an insulating material for an electronic device or an electronic component, and a coating material.

本発明の硬化性組成物の硬化物を用いた光半導体装置の一例を示す概略断面図である。It is a schematic sectional drawing which shows an example of the optical semiconductor device which used the cured product of the curable composition of this invention. 合成例1で得られた付加反応物(A−1)のH−NMRスペクトルである。 6 is a 1 H-NMR spectrum of the addition reaction product (A-1) obtained in Synthesis Example 1. 合成例1で得られた付加反応物(A−1)のGPCチャートである。6 is a GPC chart of the addition reaction product (A-1) obtained in Synthesis Example 1. 合成例2で得られた付加反応物(A−2)のH−NMRスペクトルである。 6 is a 1 H-NMR spectrum of the addition reaction product (A-2) obtained in Synthesis Example 2. 合成例2で得られた付加反応物(A−2)のGPCチャートである。6 is a GPC chart of the addition reaction product (A-2) obtained in Synthesis Example 2. 合成例3で得られた付加反応物(A−3)のH−NMRスペクトルである。 6 is a 1 H-NMR spectrum of the addition reaction product (A-3) obtained in Synthesis Example 3. 合成例3で得られた付加反応物(A−3)のGPCチャートである。3 is a GPC chart of the addition reaction product (A-3) obtained in Synthesis Example 3.

上述のように、硬度、機械的強度、および耐クラック性が高く、短波長領域の光透過性、ガスバリア性に優れた硬化物を与える硬化性組成物の開発が求められていた。 As described above, there has been a demand for the development of a curable composition which has high hardness, mechanical strength, and crack resistance, and which provides a cured product having excellent light transmission and gas barrier properties in a short wavelength region.

本発明者らは、上記課題について鋭意検討を重ねた結果、特定の成分を含む硬化性組成物であれば、上記課題を解決できることを見出し、本発明を完成させた。 As a result of diligent studies on the above problems, the present inventors have found that a curable composition containing a specific component can solve the above problems, and have completed the present invention.

即ち、本発明は、下記(A)、(B)及び(C)を含む硬化性組成物である。
(A)下記式(1)で表される有機ケイ素化合物と、下記式(2)で表される有機ケイ素化合物との付加反応物であって、1分子中にSiH基を3個以上有する付加反応物、

Figure 0006981933
(式中、Rは独立に置換または非置換の炭素数1〜12の2価炭化水素基である。)
Figure 0006981933
(式中、Rは独立に置換または非置換の炭素数1〜12の1価炭化水素基であり、Rは単結合または非置換の炭素数1〜4の2価炭化水素基である。)
(B)アルケニル基を1分子中に2個以上有するオルガノシロキサン化合物、
(C)ヒドロシリル化反応触媒:組成物全体の質量に対して白金族金属原子として1〜500ppm That is, the present invention is a curable composition containing the following (A), (B) and (C).
(A) An addition reaction product of an organosilicon compound represented by the following formula (1) and an organosilicon compound represented by the following formula (2), which has three or more SiH groups in one molecule. Reactant,
Figure 0006981933
(In the formula, R 1 is an independently substituted or unsubstituted divalent hydrocarbon group having 1 to 12 carbon atoms.)
Figure 0006981933
(In the formula, R 2 is an independently substituted or unsubstituted monovalent hydrocarbon group having 1 to 12 carbon atoms, and R 3 is a single bond or unsubstituted divalent hydrocarbon group having 1 to 4 carbon atoms. .)
(B) An organosiloxane compound having two or more alkenyl groups in one molecule,
(C) Hydrosilylation reaction catalyst: 1 to 500 ppm as a platinum group metal atom with respect to the total mass of the composition.

以下、本発明について詳細に説明するが、本発明はこれらに限定されるものではない。 Hereinafter, the present invention will be described in detail, but the present invention is not limited thereto.

[硬化性組成物]
本発明の硬化性組成物は下記(A)〜(C)成分を含有してなる。本発明の硬化性組成物(付加硬化型シリコーン組成物)は、下記(A)〜(C)成分及び、必要に応じてその他の成分を、従来公知の方法で混合して調製することができる。
以下、各成分について詳細に説明する。
[Curable composition]
The curable composition of the present invention contains the following components (A) to (C). The curable composition (additional curable silicone composition) of the present invention can be prepared by mixing the following components (A) to (C) and, if necessary, other components by a conventionally known method. ..
Hereinafter, each component will be described in detail.

[(A)成分]
本発明の硬化性組成物における(A)成分は、後述の(B)成分とヒドロシリル化反応を起こすことにより、架橋剤として機能する。
[(A) component]
The component (A) in the curable composition of the present invention functions as a cross-linking agent by causing a hydrosilylation reaction with the component (B) described later.

(A)成分は、下記式(1)で表される有機ケイ素化合物と、下記式(2)で表される有機ケイ素化合物との付加反応物であって、1分子中にSiH基を3個以上有する付加反応物である。 The component (A) is an addition reaction product of an organosilicon compound represented by the following formula (1) and an organosilicon compound represented by the following formula (2), and has three SiH groups in one molecule. It is an addition reaction product having the above.

Figure 0006981933
(式中、Rは独立に置換または非置換の炭素数1〜12の2価炭化水素基である。)
Figure 0006981933
(式中、Rは独立に置換または非置換の炭素数1〜12の1価炭化水素基であり、Rは単結合または非置換の炭素数1〜4の2価炭化水素基である。)、
Figure 0006981933
(In the formula, R 1 is an independently substituted or unsubstituted divalent hydrocarbon group having 1 to 12 carbon atoms.)
Figure 0006981933
(In the formula, R 2 is an independently substituted or unsubstituted monovalent hydrocarbon group having 1 to 12 carbon atoms, and R 3 is a single bond or unsubstituted divalent hydrocarbon group having 1 to 4 carbon atoms. .),

で表される炭素数1〜12の2価炭化水素基としては、メチレン基、エチレン基、n−プロピレン基、n−ブチレン基、n−ペンチレン基、n−ヘキシレン基、シクロヘキシレン基、n−オクチレン基等のアルキレン基、フェニレン基、ナフチレン基等のアリーレン基等や、これらの基の水素原子の一部又は全部がフッ素、臭素、塩素等のハロゲン原子等で置換されたものが挙げられ、Rとしては、フェニレン基が特に好ましい。 Examples of the divalent hydrocarbon group having 1 to 12 carbon atoms represented by R 1 include a methylene group, an ethylene group, an n-propylene group, an n-butylene group, an n-pentylene group, an n-hexylene group and a cyclohexylene group. Examples include alkylene groups such as n-octylene groups, arylene groups such as phenylene groups and naphthylene groups, and those in which some or all of the hydrogen atoms of these groups are replaced with halogen atoms such as fluorine, bromine and chlorine. is, as the R 1, a phenylene group is particularly preferred.

で表される炭素数1〜12の1価炭化水素基としては、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、tert−ブチル基、ペンチル基、ネオペンチル基、ヘキシル基、オクチル基等のアルキル基、シクロヘキシル基等のシクロアルキル基、ビニル基、アリル基、プロペニル基等のアルケニル基、フェニル基、トリル基、キシリル基、ナフチル基等のアリール基、ベンジル基、フェニルエチル基、フェニルプロピル基等のアラルキル基等や、これらの基の水素原子の一部又は全部がフッ素、臭素、塩素等のハロゲン原子等で置換されたものが挙げられ、Rとしてはメチル又はフェニル基が好ましく、フェニル基が特に好ましい。 The monovalent hydrocarbon group having 1 to 12 carbon atoms represented by R 2, a methyl group, an ethyl group, a propyl group, an isopropyl group, butyl group, isobutyl group, tert- butyl group, a pentyl group, a neopentyl group, a hexyl Alkyl group such as group, octyl group, cycloalkyl group such as cyclohexyl group, alkenyl group such as vinyl group, allyl group and propenyl group, aryl group such as phenyl group, trill group, xylyl group and naphthyl group, benzyl group and phenyl. Examples thereof include an aralkyl group such as an ethyl group and a phenylpropyl group, and a group in which a part or all of the hydrogen atom of these groups is substituted with a halogen atom such as fluorine, bromine or chlorine, and R 2 is methyl or A phenyl group is preferable, and a phenyl group is particularly preferable.

で表される非置換の炭素数1〜4の2価炭化水素基としては、メチレン基、エチレン基、n−プロピレン基、n−ブチレン基等のアルキレン基が挙げられる。Rが単結合である場合は、ケイ素原子にビニル基が直接結合している有機ケイ素化合物を表す。Rとしては単結合又はエチレン基が特に好ましい。 Examples of the unsubstituted divalent hydrocarbon group having 1 to 4 carbon atoms represented by R 3 include an alkylene group such as a methylene group, an ethylene group, an n-propylene group and an n-butylene group. When R 3 is a single bond, it represents an organosilicon compound in which a vinyl group is directly bonded to a silicon atom. As R 3 is a single bond or an ethylene group it is particularly preferred.

上記式(1)で表される有機ケイ素化合物の好適な具体例を下記に示すが、これらに限定されるものではない。また、上記式(1)で表される有機ケイ素化合物は1種単独でも2種以上を組み合わせても使用することができる。

Figure 0006981933
Suitable specific examples of the organosilicon compound represented by the above formula (1) are shown below, but the present invention is not limited thereto. Further, the organosilicon compound represented by the above formula (1) can be used alone or in combination of two or more.
Figure 0006981933

上記式(2)で表される化合物の好適な具体例を下記に示すが、これらに限定されるものではない。また、上記式(2)で表される化合物は1種単独でも2種以上を組み合わせても使用することができる。

Figure 0006981933
Suitable specific examples of the compound represented by the above formula (2) are shown below, but the present invention is not limited thereto. Further, the compound represented by the above formula (2) can be used alone or in combination of two or more.
Figure 0006981933

上記式(1)で表される有機ケイ素化合物と、上記式(2)で表される有機ケイ素化合物との付加反応物である(A)成分の好ましい例としては下記単位式で表される化合物が挙げられる。

Figure 0006981933
(式中、nは1〜10の整数である。) A preferable example of the component (A) which is an addition reaction product of the organosilicon compound represented by the above formula (1) and the organosilicon compound represented by the above formula (2) is a compound represented by the following unit formula. Can be mentioned.
Figure 0006981933
(In the formula, n is an integer of 1 to 10.)

前記単位式で表される化合物の具体例としては、下記式で表される化合物等が挙げられるが、これらに限定されるものではない。

Figure 0006981933
Figure 0006981933
Figure 0006981933
Figure 0006981933
Figure 0006981933
Specific examples of the compound represented by the unit formula include, but are not limited to, compounds represented by the following formula.
Figure 0006981933
Figure 0006981933
Figure 0006981933
Figure 0006981933
Figure 0006981933

また、(A)成分は上記単位式で表される化合物の1種単独でも2種以上の組み合わせでも使用することができる。 Further, the component (A) can be used alone or in combination of two or more of the compounds represented by the above unit formulas.

[(A)成分の調製]
本発明の硬化性組成物における(A)成分は、上記式(2)で表される化合物1モルに対して、上記式(1)で表される化合物を、過剰量、好ましくは3モルを越え30モル以下、より好ましくは4.5モルを越え15モル以下混合して両者の存在下でヒドロシリル化反応を行う事により得ることができる。
[Preparation of (A) component]
The component (A) in the curable composition of the present invention contains an excess amount, preferably 3 mol, of the compound represented by the above formula (1) with respect to 1 mol of the compound represented by the above formula (2). It can be obtained by mixing 30 mol or less, more preferably 4.5 mol or more and 15 mol or less, and carrying out a hydrosilylation reaction in the presence of both.

前記ヒドロシリル化反応に用いる触媒としては、公知のものを使用することができる。例えば、白金金属を担持したカーボン粉末、白金黒、塩化第2白金、塩化白金酸、塩化白金酸と一価アルコールとの反応生成物、塩化白金酸とオレフィン類との錯体、白金ビスアセトアセテート等の白金系触媒;パラジウム系触媒、ロジウム系触媒等の白金族金属系触媒が挙げられる。また、付加反応条件、精製条件、溶媒の使用等については特に限定されず、公知の方法を用いればよい。 A known catalyst can be used as the catalyst used for the hydrosilylation reaction. For example, carbon powder carrying platinum metal, platinum black, second platinum chloride, platinum chloride acid, reaction product of platinum chloride acid and monovalent alcohol, complex of platinum chloride acid and olefins, platinum bisacetoacetate, etc. Platinum-based catalysts; examples thereof include platinum-based metal-based catalysts such as palladium-based catalysts and rhodium-based catalysts. Further, the addition reaction conditions, purification conditions, use of solvent and the like are not particularly limited, and known methods may be used.

本発明の硬化性組成物における(A)成分は、1種の化合物からなるものでも、2種以上の化合物の組み合わせ(混合物)からなるものでもよい。 The component (A) in the curable composition of the present invention may be composed of one kind of compound or a combination (mixture) of two or more kinds of compounds.

(A)成分を構成する化合物1分子中にSiH基を3個以上有することは適切な測定手段を選択することにより確認できる。(A)成分を構成する化合物が2種以上である場合には、適切な測定手段の組み合わせ(例えば、H−NMRとGPCなど)を選択することにより化合物ごとに1分子中にSiH基を3個以上有することを確認できる。 (A) It can be confirmed by selecting an appropriate measuring means that one molecule of the compound constituting the component has three or more SiH groups. (A) When there are two or more compounds constituting the component, a SiH group can be added to one molecule for each compound by selecting an appropriate combination of measuring means (for example, 1 H-NMR and GPC). It can be confirmed that there are three or more.

[(B)成分]
本発明の硬化性組成物における(B)成分は、アルケニル基を1分子中に2個以上有するオルガノシロキサン化合物である。
[(B) component]
The component (B) in the curable composition of the present invention is an organosiloxane compound having two or more alkenyl groups in one molecule.

(B)成分の具体例としては、特に限定されないが、分子鎖両末端トリメチルシロキシ基封鎖ジメチルシロキサン・メチルビニルシロキサン共重合体、分子鎖両末端トリメチルシロキシ基封鎖ジメチルシロキサン・ジフェニルシロキサン・メチルビニルシロキサン共重合体、分子鎖両末端ジメチルビニルシロキシ基封鎖ジメチルシロキサン・ジフェニルシロキサン共重合体等が挙げられ、(B)成分は、1種単独でも2種以上を組み合わせても使用することができる。 Specific examples of the component (B) are not particularly limited, but are trimethylsiloxy group-blocked dimethylsiloxane / methylvinylsiloxane copolymer at both ends of the molecular chain, and trimethylsiloxy group-blocked dimethylsiloxane / diphenylsiloxane / methylvinylsiloxane at both ends of the molecular chain. Examples thereof include a copolymer, a dimethylvinylsiloxy group-sealed dimethylsiloxane / diphenylsiloxane copolymer at both ends of the molecular chain, and the component (B) can be used alone or in combination of two or more.

(B)成分としては、下記式(3)で表される直鎖状のオルガノポリシロキサンであることが好ましい。

Figure 0006981933
(式中、Rは独立に非置換または置換の1価炭化水素基であり、Rは独立にメチル基又はフェニル基であり、aは0〜50の整数であり、bは0~100の整数である。ただし、aが0のときRはフェニル基であり、かつ、bは1〜100である。括弧が付されたシロキサン単位の配列順は任意である。) The component (B) is preferably a linear organopolysiloxane represented by the following formula (3).
Figure 0006981933
(In the formula, R 4 is an independently unsubstituted or substituted monovalent hydrocarbon group, R 5 is an independently methyl group or phenyl group, a is an integer of 0 to 50, and b is 0 to 100. However, when a is 0, R 5 is a phenyl group and b is 1 to 100. The order of arrangement of the siloxane units in parentheses is arbitrary.)

で表される非置換または置換の1価炭化水素基としては、前記脂肪族不飽和基、及び前記脂肪族不飽和基以外の1価炭化水素基、例えば、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、sec−ブチル基、t−ブチル基等の炭素原子数1〜6のアルキル基;クロロメチル基、3,3,3−トリフルオロプロピル基等の炭素原子数1〜4のハロアルキル基;フェニル基、トリル基等の炭素原子数6〜10のアリール基が挙げられる。中でも、炭素原子数1〜6のアルキル基、フェニル基、ビニル基が好ましく、特にメチル基が好ましい。 The monovalent hydrocarbon radical unsubstituted or substituted, represented by R 4, the aliphatic unsaturated group, and a monovalent hydrocarbon group other than the aliphatic unsaturated group, e.g., methyl group, ethyl group, propyl Alkyl groups having 1 to 6 carbon atoms such as groups, isopropyl groups, butyl groups, isobutyl groups, sec-butyl groups and t-butyl groups; carbon atoms such as chloromethyl groups and 3,3,3-trifluoropropyl groups. Examples thereof include a haloalkyl group having a number of 1 to 4; an aryl group having 6 to 10 carbon atoms such as a phenyl group and a trill group. Of these, an alkyl group having 1 to 6 carbon atoms, a phenyl group and a vinyl group are preferable, and a methyl group is particularly preferable.

上記式(3)において、aは0〜50の整数であり、1〜10であることが好ましく、1〜7であることがより好ましく、2〜4であることが更に好ましい。bは0〜100の整数であり、0〜50であることが好ましく、1〜10であることがより好ましく、2〜4であることが更に好ましい。 In the above formula (3), a is an integer of 0 to 50, preferably 1 to 10, more preferably 1 to 7, and even more preferably 2 to 4. b is an integer of 0 to 100, preferably 0 to 50, more preferably 1 to 10, and even more preferably 2 to 4.

式(3)で表されるオルガノポリシロキサンは、例えば、ジクロロジフェニルシランやジアルコキシジフェニルシラン等の二官能性シランを加水分解・縮合させた後、または加水分解・縮合と同時に、脂肪族不飽和基を含有するシロキサン単位で末端を封鎖することにより得られる。 The organopolysiloxane represented by the formula (3) is, for example, after hydrolyzing / condensing a bifunctional silane such as dichlorodiphenylsilane or dialkoxydiphenylsilane, or at the same time as hydrolysis / condensation, aliphatic unsaturated. It is obtained by blocking the end with a siloxane unit containing a group.

(B)成分の配合量は、組成物中の脂肪族不飽和基に対するSiH基のモル比(SiH基/脂肪族不飽和基)が0.5以上5以下であるようにすることができ、好ましくは0.8以上2以下となる量である。前記モル比(SiH基/脂肪族不飽和基)が0.5以上5以下であれば、本発明の組成物を十分に硬化させることができる。 The blending amount of the component (B) can be such that the molar ratio of SiH groups (SiH group / aliphatic unsaturated group) to the aliphatic unsaturated group in the composition is 0.5 or more and 5 or less. The amount is preferably 0.8 or more and 2 or less. When the molar ratio (SiH group / aliphatic unsaturated group) is 0.5 or more and 5 or less, the composition of the present invention can be sufficiently cured.

[(C)成分]
本発明の(C)成分であるヒドロシリル化反応触媒は、上記(A)成分の調製に用いられるものと同様のものが使用できる。
[(C) component]
As the hydrosilylation reaction catalyst which is the component (C) of the present invention, the same catalyst as that used for the preparation of the component (A) can be used.

本発明の硬化性組成物への(C)成分の配合量は、組成物全体の質量に対して、白金族金属原子として1〜500ppm、好ましくは1〜100ppm程度、さらに好ましくは2〜12ppmとなる量である。(C)成分の配合量を、組成物全体の質量に対して白金族金属原子として1ppm未満としたり、500ppmを超えるものとすると、硬化反応に要する時間が長くなりすぎたり、短すぎたりするうえ、硬化物が着色する等の問題を生じることがある。 The blending amount of the component (C) in the curable composition of the present invention is 1 to 500 ppm, preferably about 1 to 100 ppm, more preferably 2 to 12 ppm as a platinum group metal atom with respect to the total mass of the composition. Is the amount. If the blending amount of the component (C) is less than 1 ppm as a platinum group metal atom or more than 500 ppm with respect to the total mass of the composition, the time required for the curing reaction becomes too long or too short. , The cured product may be colored.

[その他の成分]
本発明の硬化性組成物には、上記(A)〜(C)成分に加え、必要に応じて酸化防止剤、無機充填剤等の成分を配合してもよい。
[Other ingredients]
In addition to the above-mentioned components (A) to (C), components such as an antioxidant and an inorganic filler may be added to the curable composition of the present invention, if necessary.

[酸化防止剤]
本発明の硬化性組成物の硬化物中には、上記(B)成分中の付加反応性炭素−炭素二重結合が未反応のまま残存している場合があり、それが大気中の酸素により酸化されることで硬化物が着色する原因となり得る。そこで、必要に応じ、本発明の硬化性組成物に酸化防止剤を配合することにより、このような着色を未然に防止することができる。
[Antioxidant]
In the cured product of the curable composition of the present invention, the addition-reactive carbon-carbon double bond in the component (B) may remain unreacted due to oxygen in the atmosphere. Oxidation can cause the cured product to become colored. Therefore, such coloring can be prevented in advance by adding an antioxidant to the curable composition of the present invention, if necessary.

酸化防止剤としては、公知のものを使用することができ、例えば、2,6−ジ−t−ブチル−4−メチルフェノール、2,5−ジ−t−アミルヒドロキノン、2,5−ジ−t−ブチルヒドロキノン、4,4‘−ブチリデンビス(3−メチル−6−t−ブチルフェノール)、2,2’−メチレンビス(4−メチル−6−t−ブチルフェノール)、2,2‘−メチレンビス(4−エチル−6−t−ブチルフェノール)等が挙げられる。これらは、1種単独でも2種以上を組み合わせても使用することができる。 As the antioxidant, known ones can be used, for example, 2,6-di-t-butyl-4-methylphenol, 2,5-di-t-amylhydroquinone, 2,5-di-. t-Butylhydroquinone, 4,4'-butylidenebis (3-methyl-6-t-butylphenol), 2,2'-methylenebis (4-methyl-6-t-butylphenol), 2,2'-methylenebis (4- Ethyl-6-t-butylphenol) and the like. These can be used alone or in combination of two or more.

なお、この酸化防止剤を使用する場合、その配合量は特に制限されないが、上記(A)成分と(B)成分との合計質量に対して、通常、1〜10,000ppm、特に 10〜1,000ppm 程度配合することが好ましい。前記範囲内の配合量とすることによって、酸化防止能力が十分発揮され、着色、白濁、酸化劣化等の発生がなく光学的特性に優れた硬化物が得られる。 When this antioxidant is used, the blending amount thereof is not particularly limited, but it is usually 1 to 10,000 ppm, particularly 10 to 1 with respect to the total mass of the component (A) and the component (B). It is preferable to add about 000 ppm. By setting the blending amount within the above range, the antioxidant ability is sufficiently exhibited, and a cured product having excellent optical properties can be obtained without the occurrence of coloring, cloudiness, oxidative deterioration and the like.

[無機充填剤]
本発明の硬化性組成物の粘度や、本発明の硬化性組成物から得られる硬化物の硬度等を調整したり、強度を向上させたり、蛍光体の分散を良くするために、ナノシリカや、溶融シリカ、結晶性シリカ、酸化チタン、ナノアルミナ、アルミナ等の無機充填剤を添加しても良い。
[Inorganic filler]
In order to adjust the viscosity of the curable composition of the present invention, the hardness of the cured product obtained from the curable composition of the present invention, the strength, and the dispersion of the phosphor, nanosilica, Inorganic fillers such as fused silica, crystalline silica, titanium oxide, nanoalumina, and alumina may be added.

[接着性向上剤]
本発明の硬化性組成物には、接着性向上剤を配合してもよい。接着性向上剤としては、シランカップリング剤やそのオリゴマー、シランカップリング剤と同様の反応性基を有するポリシロキサン等が例示される。
[Adhesive improver]
An adhesiveness improver may be added to the curable composition of the present invention. Examples of the adhesiveness improving agent include a silane coupling agent, an oligomer thereof, and a polysiloxane having a reactive group similar to that of the silane coupling agent.

接着性向上剤は、下記式(4)で表される化合物が好ましい。

Figure 0006981933
(式中、sは1〜3の整数であり、tは0〜3の整数であり、uは0〜3の整数であり、但しs+t+uは4〜5の整数である。括弧が付されたシロキサン単位の配列順は任意である。) The adhesiveness improving agent is preferably a compound represented by the following formula (4).
Figure 0006981933
(In the formula, s is an integer of 1 to 3, t is an integer of 0 to 3, u is an integer of 0 to 3, but s + t + u is an integer of 4 to 5. Parentheses are added. The order of arrangement of siloxane units is arbitrary.)

接着性向上剤は、本発明の硬化性組成物及びその硬化物の基材に対する接着性を向上させるために組成物に配合される任意成分である。ここで、基材とは、金、銀、銅、ニッケルなどの金属材料、酸化アルミニウム、窒化アルミニウム、酸化チタンなどのセラミック材料、シリコーン樹脂、エポキシ樹脂などの高分子材料を指す。接着性向上剤は、1種単独でも2種以上を組み合わせても使用することができる。 The adhesiveness improver is an optional component added to the curable composition of the present invention and the cured product to improve the adhesiveness to the substrate. Here, the base material refers to a metal material such as gold, silver, copper, and nickel, a ceramic material such as aluminum oxide, aluminum nitride, and titanium oxide, and a polymer material such as a silicone resin and an epoxy resin. The adhesiveness improver can be used alone or in combination of two or more.

接着性向上剤を使用する場合の配合量は、上記(A)成分と(B)の合計100質量部に対し、好ましくは1〜30質量部であり、より好ましくは、1〜10質量部である。このような配合量であると、本発明の熱硬化性シリコーン組成物及びその硬化物は、基材に対する接着性が効果的に向上し、また、着色が起こりにくい。 When the adhesiveness improving agent is used, the blending amount is preferably 1 to 30 parts by mass, more preferably 1 to 10 parts by mass, based on 100 parts by mass of the total of the component (A) and (B). be. With such a blending amount, the thermosetting silicone composition of the present invention and the cured product thereof effectively improve the adhesiveness to the substrate and are less likely to cause coloring.

接着性向上剤の好適な具体例としては、下記式で表されるものが挙げられるが、これらに限定されるものではない。

Figure 0006981933
Preferable specific examples of the adhesiveness improver include, but are not limited to, those represented by the following formulas.
Figure 0006981933

[その他]
また、ポットライフを確保するために、1−エチニルシクロヘキサノール、3,5−ジメチル−1−ヘキシン−3−オール等の付加反応制御剤を配合することができる。
[others]
Further, in order to secure the pot life, an addition reaction control agent such as 1-ethynylcyclohexanol and 3,5-dimethyl-1-hexyne-3-ol can be blended.

更に、太陽光線、蛍光灯等の光エネルギーによる光劣化に抵抗性を付与するため光安定剤を用いることも可能である。この光安定剤としては、光酸化劣化で生成するラジカルを補足するヒンダードアミン系安定剤が適しており、酸化防止剤と併用することで、酸化防止効果はより向上する。光安定剤の具体例としては、ビス(2,2,6,6−テトラメチル−4−ピペリジル)セバケート、4−ベンゾイル−2,2,6,6−テトラメチルピペリジン等が挙げられる。 Further, it is also possible to use a light stabilizer in order to impart resistance to photodegradation due to light energy of sunlight, fluorescent lamps and the like. As this photostabilizer, a hindered amine-based stabilizer that captures radicals generated by photooxidation deterioration is suitable, and when used in combination with an antioxidant, the antioxidant effect is further improved. Specific examples of the light stabilizer include bis (2,2,6,6-tetramethyl-4-piperidyl) sebacate, 4-benzoyl-2,2,6,6-tetramethylpiperidine and the like.

[硬化物]
本発明の硬化性組成物を硬化して本発明の硬化物とする。前記硬化物は、硬度、機械的強度、および耐クラック性が高く、短波長領域の光透過性、ガスバリア性に優れる。なお、本発明の硬化性組成物の硬化条件については、特に制限されないが、60〜180℃、5〜180分の条件とすることが好ましい。
[Cursed product]
The curable composition of the present invention is cured to obtain a cured product of the present invention. The cured product has high hardness, mechanical strength, and crack resistance, and is excellent in light transmission in a short wavelength region and gas barrier property. The curing conditions of the curable composition of the present invention are not particularly limited, but are preferably 60 to 180 ° C. and 5 to 180 minutes.

本発明の硬化性組成物から得られる硬化物において、波長589nmの光の屈折率(25℃)が1.5以上である事が好ましい。 In the cured product obtained from the curable composition of the present invention, it is preferable that the refractive index (25 ° C.) of light having a wavelength of 589 nm is 1.5 or more.

また、本発明の硬化性組成物から得られる硬化物は、厚さ2mmにおける波長400nmの光透過率(25℃)が80%以上である事が好ましい。 Further, the cured product obtained from the curable composition of the present invention preferably has a light transmittance (25 ° C.) of 80% or more at a wavelength of 400 nm at a thickness of 2 mm.

このような光学特性を有する本発明の硬化物であれば、発光ダイオード素子の保護、封止もしくは接着、波長変更もしくは調整またはレンズ等の用途に好適に使用できるほか、レンズ材料、光学デバイスもしくは光学部品用封止材、ディスプレイ材料等の各種の光学部品用材料、電子デバイスもしくは電子部品用絶縁材料、更にはコーティング材料としても有用な材料となる。 The cured product of the present invention having such optical characteristics can be suitably used for applications such as protection, sealing or adhesion, wavelength change or adjustment, or lens of a light emitting diode element, as well as a lens material, an optical device, or optics. It is a useful material as a sealing material for parts, a material for various optical parts such as a display material, an insulating material for an electronic device or an electronic part, and a coating material.

[半導体装置]
本発明では更に、上記の硬化性組成物から得られる硬化物により半導体素子が被覆された半導体装置を提供する。
[Semiconductor device]
The present invention further provides a semiconductor device in which a semiconductor element is coated with a cured product obtained from the above curable composition.

以下、図1を参照して、本発明の硬化性組成物の硬化物を用いた半導体装置(以下、「本発明の半導体装置」ともいう)について説明するが、本発明はこれらに限定されるものではない。 Hereinafter, a semiconductor device using a cured product of the curable composition of the present invention (hereinafter, also referred to as “semiconductor device of the present invention”) will be described with reference to FIG. 1, but the present invention is limited thereto. It's not a thing.

図1は、本発明の半導体装置の一例を示す概略断面図である。本発明の半導体装置1は、銀メッキ基板2が形成されたパッケージ3上に、半導体チップ4がダイボンドされており、この半導体チップ4は、ボンディングワイヤ5によりワイヤボンディングされている。そして、上述した本発明の硬化性組成物の硬化物6により、半導体チップ4が被覆されている。半導体チップ4の被覆は、上述した本発明の硬化性組成物(付加硬化型シリコーン組成物)を塗布し、加熱により硬化性組成物を硬化させることにより行われる。なお、その他公知の硬化条件下で公知の硬化方法により硬化させても良い。 FIG. 1 is a schematic cross-sectional view showing an example of the semiconductor device of the present invention. In the semiconductor device 1 of the present invention, a semiconductor chip 4 is die-bonded on a package 3 on which a silver-plated substrate 2 is formed, and the semiconductor chip 4 is wire-bonded by a bonding wire 5. The semiconductor chip 4 is coated with the cured product 6 of the curable composition of the present invention described above. The coating of the semiconductor chip 4 is performed by applying the above-mentioned curable composition of the present invention (additional curable silicone composition) and curing the curable composition by heating. In addition, you may cure by a known curing method under other known curing conditions.

この場合、外部応力の影響を受け難くし、又ゴミ等の付着を極力抑えるという観点から、上記硬化性組成物は、硬化により、JISに規定の硬さがShoreDで30以上の硬化物を形成するものであることが好ましい。 In this case, from the viewpoint of making it less susceptible to the influence of external stress and suppressing the adhesion of dust and the like as much as possible, the curable composition forms a cured product having a hardness of 30 or more in ShoreD specified in JIS by curing. It is preferable that the product is used.

本発明の硬化性組成物は、硬度および耐クラック性が高く、短波長領域の光透過性、ガスバリア性に優れた硬化物を形成するため、この硬化性組成物を用いた本発明の半導体装置は、信頼性に優れたものとなる。 Since the curable composition of the present invention forms a cured product having high hardness and crack resistance and excellent light transmission and gas barrier properties in a short wavelength region, the semiconductor device of the present invention using this curable composition is used. Is highly reliable.

以下、実施例及び比較例を用いて本発明を具体的に説明するが、本発明はこれらに限定されるものではない。 Hereinafter, the present invention will be specifically described with reference to Examples and Comparative Examples, but the present invention is not limited thereto.

また、実施例において、H−NMR測定はブルカー・バイオスピン社製AVANCE IIIを使用した。GPC(ゲルパーミエーションクロマトグラフィー)測定は、東ソー(株)製HLC−8320GPCを用い、移動相としてテトラヒドロフラン(THF)を使用し、ポリスチレン換算で行った。 Further, in the example, 1 H-NMR measurement used AVANCE III manufactured by Bruker Biospin. GPC (gel permeation chromatography) measurement was carried out using HLC-8320GPC manufactured by Tosoh Corporation, using tetrahydrofuran (THF) as a mobile phase, in terms of polystyrene.

[合成例1](A−1)成分の調製
攪拌装置、冷却管、滴下ロートおよび温度計を備えた1Lの4つ口フラスコに、1,4−ビス(ジメチルシリル)ベンゼン(信越化学工業株式会社製)350.0g(1.8モル)、5%Ptカーボン粉末(エヌ・イーケムキャット株式会社製)0.18gを加え、オイルバスを用いて85℃に加熱した。これにトリビニルフェニルシラン(信越化学工業株式会社製)を74.5g(0.4モル)滴下した。滴下終了後、90〜100℃の間で5時間撹拌した。撹拌後終了後25℃に戻し、活性炭を4.2g加え1時間撹拌した。撹拌後ろ過、減圧濃縮し、(A−1)成分250.7g(無色透明、収率81%、25℃における粘度:400Pa・s)を得た。
[Synthesis Example 1] Preparation of (A-1) Components In a 1 L 4-necked flask equipped with a stirrer, a cooling tube, a dropping funnel and a thermometer, 1,4-bis (dimethylsilyl) benzene (Shinetsu Chemical Industry Co., Ltd.) 350.0 g (1.8 mol) of 5% Pt carbon powder (manufactured by N.E.Chemcat Co., Ltd.) 0.18 g was added, and the mixture was heated to 85 ° C. using an oil bath. To this, 74.5 g (0.4 mol) of trivinylphenylsilane (manufactured by Shin-Etsu Chemical Co., Ltd.) was added dropwise. After completion of the dropping, the mixture was stirred at 90 to 100 ° C. for 5 hours. After stirring, the temperature was returned to 25 ° C., 4.2 g of activated carbon was added, and the mixture was stirred for 1 hour. After stirring, the mixture was filtered and concentrated under reduced pressure to obtain 250.7 g (colorless and transparent, yield 81%, viscosity at 25 ° C.: 400 Pa · s) of the component (A-1).

反応生成物をH−NMR(図2)、GPC(図3)等により分析した結果、得られた反応生成物は、下記式(a)〜(e)で表される構造を有する化合物の混合物であり、各化合物の割合は(a):(b):(c):(d):(e)=30:20:15:10:25(mol%)であった。また、前記化合物はそれぞれ1分子中にSiH基を3個以上有する化合物であり、混合物全体のSiH基の含有割合は、0.0030mol/gであった。 As a result of analyzing the reaction product by 1 H-NMR (FIG. 2), GPC (FIG. 3), etc., the obtained reaction product is a compound having a structure represented by the following formulas (a) to (e). It was a mixture, and the ratio of each compound was (a) :( b) :( c) :( d) :( e) = 30: 20: 15: 10: 25 (mol%). Further, each of the above compounds was a compound having 3 or more SiH groups in one molecule, and the content ratio of SiH groups in the whole mixture was 0.0030 mol / g.

Figure 0006981933
Figure 0006981933

Figure 0006981933
Figure 0006981933

Figure 0006981933
Figure 0006981933

Figure 0006981933
Figure 0006981933

Figure 0006981933
Figure 0006981933

[合成例2](A−2)成分の調製
攪拌装置、冷却管、滴下ロートおよび温度計を備えた1Lの4つ口フラスコに、1,4−ビス(ジメチルシリル)ベンゼン(信越化学工業株式会社製)194.4g(1.0モル)、5%Ptカーボン粉末(エヌ・イーケムキャット株式会社製)0.097gを加え、オイルバスを用いて85℃に加熱した。これにトリビニルフェニルシラン(信越化学工業株式会社製)を37.3g(0.2モル)滴下した。滴下終了後、90〜100℃の間で5時間撹拌した。撹拌後終了後25℃に戻し、活性炭を4.2g加え1時間撹拌した。撹拌後ろ過、減圧濃縮し、(A−2)成分131.0g(無色透明、収率85%、25℃における粘度:150Pa・s)を得た。
[Synthesis Example 2] Preparation of (A-2) Components In a 1 L 4-necked flask equipped with a stirrer, a cooling tube, a dropping funnel and a thermometer, 1,4-bis (dimethylsilyl) benzene (Shinetsu Chemical Industry Co., Ltd.) 194.4 g (1.0 mol) of 5% Pt carbon powder (manufactured by N.E.Chemcat Co., Ltd.) 0.097 g was added, and the mixture was heated to 85 ° C. using an oil bath. 37.3 g (0.2 mol) of trivinylphenylsilane (manufactured by Shin-Etsu Chemical Co., Ltd.) was added dropwise thereto. After completion of the dropping, the mixture was stirred at 90 to 100 ° C. for 5 hours. After stirring, the temperature was returned to 25 ° C., 4.2 g of activated carbon was added, and the mixture was stirred for 1 hour. After stirring, the mixture was filtered and concentrated under reduced pressure to obtain 131.0 g of the component (A-2) (colorless and transparent, yield 85%, viscosity at 25 ° C.: 150 Pa · s).

反応生成物を、H−NMR(図4)、GPC(図5)等により分析した結果、得られた反応生成物は、上記式(a)〜(e)で表される構造を有する化合物の混合物であり、各化合物の割合は(a):(b):(c):(d):(e)=36:24:15:10:15(mol%)であった。また、前記化合物はそれぞれ1分子中にSiH基を3個以上有する化合物であり、混合物全体のSiH基の含有割合は、0.0032mol/gであった。 As a result of analyzing the reaction product by 1 H-NMR (FIG. 4), GPC (FIG. 5), etc., the obtained reaction product is a compound having a structure represented by the above formulas (a) to (e). The ratio of each compound was (a) :( b) :( c) :( d) :( e) = 36: 24: 15: 10: 15 (mol%). Further, each of the above compounds was a compound having 3 or more SiH groups in one molecule, and the content ratio of SiH groups in the whole mixture was 0.0032 mol / g.

[合成例3](A−3)成分の調製
攪拌装置、冷却管、滴下ロートおよび温度計を備えた1Lの4つ口フラスコに、1,4−ビス(ジメチルシリル)ベンゼン(信越化学工業株式会社製)262.8g(1.35モル)、5%Ptカーボン粉末(エヌ・イーケムキャット株式会社製)0.12gを加え、オイルバスを用いて85℃に加熱した。これにトリビニルフェニルシラン(信越化学工業株式会社製)を28.0g(0.15モル)滴下した。滴下終了後、90〜100℃の間で5時間撹拌した。撹拌後終了後25℃に戻し、活性炭を2.9g加え1時間撹拌した。撹拌後ろ過、減圧濃縮し、(A−3)成分99.7g(無色透明、収率87%、25℃における粘度:30Pa・s)を得た。
[Synthesis Example 3] Preparation of (A-3) Components In a 1 L 4-necked flask equipped with a stirrer, a cooling tube, a dropping funnel and a thermometer, 1,4-bis (dimethylsilyl) benzene (Shinetsu Chemical Industry Co., Ltd.) 262.8 g (1.35 mol) of 5% Pt carbon powder (manufactured by N.E.Chemcat Co., Ltd.) 0.12 g was added, and the mixture was heated to 85 ° C. using an oil bath. 28.0 g (0.15 mol) of trivinylphenylsilane (manufactured by Shin-Etsu Chemical Co., Ltd.) was added dropwise thereto. After completion of the dropping, the mixture was stirred at 90 to 100 ° C. for 5 hours. After stirring, the temperature was returned to 25 ° C., 2.9 g of activated carbon was added, and the mixture was stirred for 1 hour. After stirring, the mixture was filtered and concentrated under reduced pressure to obtain 99.7 g of the component (A-3) (colorless and transparent, yield 87%, viscosity at 25 ° C.: 30 Pa · s).

反応生成物を、H−NMR(図6)、GPC(図7)等により分析した結果、このものは、下記式(a)〜(c)、(f)で表される構造を有する化合物の混合物であり、各化合物の割合は(a):(b):(c):(f)=55:25:10:10(mol%)であった。また、前記化合物はそれぞれ1分子中にSiH基を3個以上有する化合物であり、前記混合物全体としてSiH基の含有割合は、0.0035モル/gであった。 As a result of analyzing the reaction product by 1 H-NMR (FIG. 6), GPC (FIG. 7), etc., this compound has a structure represented by the following formulas (a) to (c) and (f). The ratio of each compound was (a) :( b) :( c) :( f) = 55: 25: 10: 10 (mol%). Further, each of the above compounds was a compound having 3 or more SiH groups in one molecule, and the content ratio of SiH groups in the whole mixture was 0.0035 mol / g.

Figure 0006981933
Figure 0006981933

Figure 0006981933
Figure 0006981933

Figure 0006981933
Figure 0006981933

Figure 0006981933
Figure 0006981933

[実施例1〜4、比較例1〜3]
表1、2に示す組成比(数値は質量部を表す)で下記の各成分を混合し、シリコーン組成物を調製した。下記の例において、オルガノポリシロキサンの組成を表す記号は以下のとおりである。
Vi:(CH=CH)(CHSiO1/2
ΦVi:(CH=CH)(CH)(C)SiO1/2
:H(CHSiO1/2
2Φ:(CSiO2/2
Φ:(C)SiO3/2
Q:SiO4/2
[Examples 1 to 4, Comparative Examples 1 to 3]
The following components were mixed at the composition ratios shown in Tables 1 and 2 (numerical values represent parts by mass) to prepare a silicone composition. In the example below, the symbols representing the composition of the organopolysiloxane are as follows.
M Vi : (CH 2 = CH) (CH 3 ) 2 SiO 1/2
M ΦVi : (CH 2 = CH) (CH 3 ) (C 6 H 5 ) SiO 1/2
MH : H (CH 3 ) 2 SiO 1/2
D : (C 6 H 5 ) 2 SiO 2/2
T Φ : (C 6 H 5 ) SiO 3/2
Q: SiO 4/2

(A)成分
(A−1)上記合成例1で得られた化合物
(A−2)上記合成例2で得られた化合物
(A−3)上記合成例3で得られた化合物
比較成分
(A−4)M Φ で表される分岐型オルガノポリシロキサン
(A) Component (A-1) Compound obtained in Synthetic Example 1 (A-2) Compound obtained in Synthetic Example 2 (A-3) Compound comparative component obtained in Synthetic Example 3 (A) -4) Branched organopolysiloxane represented by MH 3 T Φ 1

(B)成分
(B−1)平均単位式MΦVi 2Φ で表される、100gあたりビニル基を0.23モル有する粘度2,000mPa・sのオルガノポリシロキサン
(B−2)平均単位式MVi 2Φで表される、100gあたりビニル基を0.50モル有する粘度10mPa・sのオルガノポリシロキサン
(B−3)平均単位式MΦVi 202Φ 37.542.5で表される、100gあたりビニル基を0.16モル有する25℃において固体のオルガノポリシロキサン
(B) Component (B-1) Average unit formula M ΦVi 2 D 3 Organopolysiloxane (B-2) Average unit with a viscosity of 2,000 mPa · s and 0.23 mol of vinyl group per 100 g Organopolysiloxane (B-3) with a viscosity of 10 mPa · s, represented by the formula M Vi 2 D , having 0.50 mol of vinyl group per 100 g. Average unit formula M Φ Vi 20 D 37.5 Q 42.5 . Represented, an organopolysiloxane solid at 25 ° C. with 0.16 mol of vinyl group per 100 g

(C)成分
白金1,3−ジビニル−1,1,3,3−テトラメチルジシロキサン錯体のポリシロキサン希釈品(白金含有量:1重量%)
(C) Component Polysiloxane diluted product of platinum 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 1% by weight)

(D)成分
下記構造式(5)で表される接着性向上剤

Figure 0006981933
(D) Component Adhesive improver represented by the following structural formula (5)
Figure 0006981933

Figure 0006981933
Figure 0006981933

Figure 0006981933
Figure 0006981933

<性能評価手法>
上記実施例および比較例で得られた硬化性組成物について、下記手法に従い、その硬化物の性能を評価した。
<Performance evaluation method>
With respect to the curable compositions obtained in the above Examples and Comparative Examples, the performance of the cured product was evaluated according to the following method.

(1)硬度
ガラス板で組んだ型の中に硬化性組成物を6mm厚になるように流し込み、150℃で4時間ポストキュアーを行い、硬化物を得た。ASTM D 2240に準じて、各硬化物の硬度(Shore DまたはType A)を23℃で測定した結果を表3に示す。なお、Shore D硬度は値の前にDを、Type A硬度は値の前にAをそれぞれ付記した。
(1) Hardness A curable composition was poured into a mold assembled from a glass plate to a thickness of 6 mm, and post-cured at 150 ° C. for 4 hours to obtain a cured product. Table 3 shows the results of measuring the hardness (Shore D or Type A) of each cured product at 23 ° C. according to ASTM D 2240. For Shore D hardness, D is added before the value, and for Type A hardness, A is added before the value.

(2)光透過率
上記硬度測定と同様に調製した2mm厚の硬化物について、各硬化物の400nm光透過率を分光光度計を用いて測定した。測定結果を表3に示す。
(2) Light Transmittance With respect to the cured product having a thickness of 2 mm prepared in the same manner as in the above hardness measurement, the 400 nm light transmittance of each cured product was measured using a spectrophotometer. The measurement results are shown in Table 3.

(3)伸び、引張強度
上記硬度測定と同様に調製した2mm厚の硬化物について、各硬化物の伸び、及び引張強度をJIS−K−6249に準じて23℃で測定した。測定結果を表3に示す。
(3) Elongation and tensile strength With respect to the cured product having a thickness of 2 mm prepared in the same manner as in the above hardness measurement, the elongation and tensile strength of each cured product were measured at 23 ° C. according to JIS-K-6249. The measurement results are shown in Table 3.

(4)耐クラック性
図1に示した半導体装置(LEDデバイス)に硬化性組成物を流し込み、100℃で1時間保持した後、150℃で4時間の条件で硬化を行った。得られたLEDデバイスを260℃に3分間曝し、硬化物のクラックの有無を確認した。その後、各LEDデバイスを−40℃15分、125℃15分を1サイクルとする熱衝撃試験機に入れ、500サイクル後の各LEDデバイスにおける硬化性組成物の硬化物部分のクラックの有無を確認した。その結果を表3に示す。
(4) Crack resistance A curable composition was poured into the semiconductor device (LED device) shown in FIG. 1, held at 100 ° C. for 1 hour, and then cured at 150 ° C. for 4 hours. The obtained LED device was exposed to 260 ° C. for 3 minutes, and the presence or absence of cracks in the cured product was confirmed. After that, each LED device was placed in a thermal shock tester having a cycle of -40 ° C for 15 minutes and 125 ° C for 15 minutes, and it was confirmed whether or not there was a crack in the cured product portion of the curable composition in each LED device after 500 cycles. did. The results are shown in Table 3.

(5)酸素ガス透過性
ガラス板で組んだ型の中に硬化性組成物を1mm厚になるように流し込み、150℃で4時間ポストキュアーを行って得られた硬化物について、酸素ガス透過装置(イリノイインスツルメンツ社製モデル8000)を用いて測定を行った。その結果を表3に示す。
(5) Oxygen gas permeability Oxygen gas permeation device for the cured product obtained by pouring the curable composition into a mold made of a glass plate to a thickness of 1 mm and post-curing at 150 ° C. for 4 hours. The measurement was performed using (Model 8000 manufactured by Illinois Instruments). The results are shown in Table 3.

Figure 0006981933
Figure 0006981933

表3より、本発明の硬化性組成物の硬化物が、透明性、伸び、引っ張り強度、耐クラック性、ガスバリア性に優れることを示している。よって、本発明の透明熱硬化性シリコーン組成物の硬化物は、光学素子封止材料、特に白色LED用の封止材料として有用である。 Table 3 shows that the cured product of the curable composition of the present invention is excellent in transparency, elongation, tensile strength, crack resistance, and gas barrier property. Therefore, the cured product of the transparent thermosetting silicone composition of the present invention is useful as a sealing material for an optical element, particularly a white LED.

比較例1〜3に示したように、シロキサン結合を有する架橋剤である(A−4)を用いた場合は、本発明の硬化性組成物と比較して伸び及び酸素ガス透過率において劣る結果となった。 As shown in Comparative Examples 1 to 3, when (A-4), which is a cross-linking agent having a siloxane bond, is used, the result is inferior in elongation and oxygen gas permeability as compared with the curable composition of the present invention. It became.

なお、本発明は、上記実施形態に限定されるものではない。上記実施形態は例示であり、本発明の特許請求の範囲に記載された技術的思想と実質的に同一な構成を有し、同様な作用効果を奏するものは、いかなるものであっても本発明の技術的範囲に包含される。 The present invention is not limited to the above embodiment. The above-described embodiment is an example, and any of the above-described embodiments having substantially the same configuration as the technical idea described in the claims of the present invention and having the same effect and effect is the present invention. Is included in the technical scope of.

1…半導体装置、 2…銀メッキ基板、 3…パッケージ、 4…半導体チップ、
5…ボンディングワイヤ、 6…硬化性組成物の硬化物
1 ... semiconductor device, 2 ... silver-plated substrate, 3 ... package, 4 ... semiconductor chip,
5 ... Bonding wire, 6 ... Cured product of curable composition

Claims (5)

下記(A)、(B)及び(C)を含む硬化性組成物。
(A)下記式(1)で表される有機ケイ素化合物と、下記式(2)で表される有機ケイ素化合物との付加反応物であって、1分子中にSiH基を3個以上有する付加反応物、
Figure 0006981933
(式中、Rフェニレン基である。)
Figure 0006981933
(式中、Rフェニル基であり、Rは単結合である。)
(B)アルケニル基を1分子中に2個以上有するオルガノシロキサン化合物、
(C)ヒドロシリル化反応触媒:組成物全体の質量に対して白金族金属原子として1〜500ppm
A curable composition comprising the following (A), (B) and (C).
(A) An addition reaction product of an organosilicon compound represented by the following formula (1) and an organosilicon compound represented by the following formula (2), which has three or more SiH groups in one molecule. Reactant,
Figure 0006981933
(In the formula, R 1 is a phenylene group.)
Figure 0006981933
(Wherein, R 2 is phenyl group, R 3 is Tan'yui if.)
(B) An organosiloxane compound having two or more alkenyl groups in one molecule,
(C) Hydrosilylation reaction catalyst: 1 to 500 ppm as a platinum group metal atom with respect to the total mass of the composition.
前記(B)が下記式(3)で表される化合物であることを特徴とする請求項1に記載の硬化性組成物。
Figure 0006981933
(式中、Rは独立に非置換または置換の1価炭化水素基であり、Rは独立にメチル基又はフェニル基であり、aは0〜50の整数であり、bは0〜100の整数である。ただし、aが0のときRはフェニル基であり、かつ、bは1〜100である。括弧が付されたシロキサン単位の配列順は任意である。)
The curable composition according to claim 1, wherein the (B) is a compound represented by the following formula (3).
Figure 0006981933
(In the formula, R 4 is an independently unsubstituted or substituted monovalent hydrocarbon group, R 5 is an independently methyl group or phenyl group, a is an integer of 0 to 50, and b is 0 to 100. However, when a is 0, R 5 is a phenyl group and b is 1 to 100. The order of arrangement of the siloxane units in parentheses is arbitrary.)
請求項1又は請求項2に記載の硬化性組成物を硬化してなることを特徴とする硬化物。 A cured product obtained by curing the curable composition according to claim 1 or 2. 厚さ2mmにおける波長400nmの光透過率(25℃)が80%以上であることを特徴とする請求項に記載の硬化物。 The cured product according to claim 3 , wherein the light transmittance (25 ° C.) at a wavelength of 400 nm at a thickness of 2 mm is 80% or more. 請求項または請求項に記載の硬化物により半導体素子が被覆されたものであることを特徴とする半導体装置。
A semiconductor device characterized in that the semiconductor element is coated with the cured product according to claim 3 or 4.
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