JP6901273B2 - Pre-plating method and plating method for rare earth magnets - Google Patents

Pre-plating method and plating method for rare earth magnets Download PDF

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JP6901273B2
JP6901273B2 JP2017023812A JP2017023812A JP6901273B2 JP 6901273 B2 JP6901273 B2 JP 6901273B2 JP 2017023812 A JP2017023812 A JP 2017023812A JP 2017023812 A JP2017023812 A JP 2017023812A JP 6901273 B2 JP6901273 B2 JP 6901273B2
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直人 橋本
直人 橋本
和弘 縄田
和弘 縄田
将之 野口
将之 野口
直哉 須藤
直哉 須藤
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Towa Co Ltd
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本件発明は希土類磁石のめっき前処理方法及びめっき処理方法に関し、詳しくは希土類磁石の表面に良好な密着性及び外観を有した耐食性金属皮膜を形成するための希土類磁石のめっき前処理方法及びめっき処理方法に関する。 The present invention relates to a rare earth magnet plating pretreatment method and a plating treatment method. Specifically, the present invention relates to a rare earth magnet plating pretreatment method and a plating treatment for forming a corrosion-resistant metal film having good adhesion and appearance on the surface of the rare earth magnet. Regarding the method.

Nd−Fe−B系永久磁石等に代表されるR−TM−B系(R:希土類元素、TM:遷移金属、B:ホウ素)永久磁石は、高い磁気特性を有するため各種用途に使用され、主に電気、電子機器の分野で汎用されている。特に、高性能永久磁石として開発されたR−TM−B系永久磁石は、磁気特性に優れるため、電気、電子機器の高性能・小型化にも対応して好適に使用されている。 R-TM-B (R: rare earth element, TM: transition metal, B: boron) permanent magnets represented by Nd-Fe-B permanent magnets are used for various purposes because they have high magnetic properties. It is widely used mainly in the fields of electrical and electronic equipment. In particular, the R-TM-B permanent magnet developed as a high-performance permanent magnet has excellent magnetic characteristics, and is therefore suitably used in response to high performance and miniaturization of electric and electronic devices.

しかしながら、希土類磁石は、水分を有する大気中では、短時間に容易に酸化するという問題がある。この酸化は表面に酸化物を形成するのみならず、内部の結晶粒界に沿った粒界腐食も招くことになる。 However, rare earth magnets have a problem that they are easily oxidized in a short time in the atmosphere containing moisture. This oxidation not only forms an oxide on the surface, but also causes intergranular corrosion along the internal grain boundaries.

この希土類磁石の酸化を防ぐ手段として、当該希土類磁石の表面処理を行うことが提案されている。例えば、表面処理としては、樹脂皮膜の形成、めっき皮膜の形成が挙げられる。樹脂皮膜は、スプレーや電着塗装により形成され、簡便で、低コストであるが、樹脂そのものが水分を含有するため、高温高湿の環境下では充分な耐食性は得られない。めっき皮膜の形成は、耐食性に優れていることから賞用されている。しかし、真空蒸着法やイオンプレーティング法等の気相めっきは、高コストであり、溝部等にめっき層を形成することが困難となる難点がある。 As a means for preventing the oxidation of the rare earth magnet, it has been proposed to perform surface treatment on the rare earth magnet. For example, the surface treatment includes the formation of a resin film and the formation of a plating film. The resin film is formed by spraying or electrodeposition coating, and is simple and low cost. However, since the resin itself contains water, sufficient corrosion resistance cannot be obtained in a high temperature and high humidity environment. The formation of a plating film has been praised for its excellent corrosion resistance. However, vapor phase plating such as the vacuum vapor deposition method and the ion plating method is expensive and has a problem that it is difficult to form a plating layer in a groove or the like.

このため、希土類磁石の表面処理としては、NiやCu等の無電解めっき又は電解めっきによる皮膜形成が採用されている。この無電解めっき又は電解めっきによって皮膜を形成するためには、予め希土類磁石に前処理を行う必要がある。 Therefore, as the surface treatment of the rare earth magnet, film formation by electroless plating such as Ni or Cu or electrolytic plating is adopted. In order to form a film by this electroless plating or electroplating, it is necessary to pretreat the rare earth magnet in advance.

例えば、特許文献1には、焼結磁性体表面を、めっき前処理工程と、活性化処理工程と、スマット除去工程と、Cuめっき工程と、Ni−Pめっき工程とを順次行う耐食性希土類磁石の製造方法が記載されている。 For example, Patent Document 1 describes a corrosion-resistant rare earth magnet in which the surface of a sintered magnetic material is sequentially subjected to a plating pretreatment step, an activation treatment step, a smut removal step, a Cu plating step, and a Ni-P plating step. The manufacturing method is described.

ここで、特許文献1において、前処理工程とは、錆落し、溶剤脱脂、アルカリ脱脂、酸洗いにより希土類磁石表面の錆や油脂類の汚れ等を除去するものとされている。また、活性化処理工程とは、めっき膜と磁石との間の密着力を向上させるために行われるものとされ、活性化液として塩酸、硫酸等が例示されている。そして、スマット除去工程とは、磁石の表面に物理的な吸着あるいは磁気的に吸引されて残存する微量の不純物を磁石表面から脱離させる工程であり、具体的な方法としてブラシ掛けによる除去、水やエアスプレーによる除去、超音波による除去が例示されている。 Here, in Patent Document 1, the pretreatment step is defined as removing rust, solvent degreasing, alkaline degreasing, and pickling to remove rust on the surface of rare earth magnets and stains on oils and fats. Further, the activation treatment step is performed to improve the adhesion between the plating film and the magnet, and hydrochloric acid, sulfuric acid and the like are exemplified as the activation liquid. The smut removal step is a step of removing a small amount of impurities remaining by being physically attracted or magnetically attracted to the surface of the magnet from the surface of the magnet. Specific methods include removal by brushing and water. , Air spray removal, and ultrasonic removal are exemplified.

また、特許文献2には、磁性合金の表面を有機錯化合物及び/又は無機錯化合物並びに緩衝剤からなるpH8以上のアルカリ性溶液で表面調整した後、有機カルボン酸塩(オキシカルボン酸塩を含む)及び無機錫化合物並びに過酸化物からなるpH8以上のアルカリ性溶液で脱スマットし、その後に耐酸化性皮膜を形成する磁性合金の表面処理方法が記載されている。 Further, in Patent Document 2, the surface of the magnetic alloy is surface-adjusted with an alkaline solution having a pH of 8 or more composed of an organic complex compound and / or an inorganic complex compound and a buffer, and then an organic carboxylate (including an oxycarboxylate). A method for surface treatment of a magnetic alloy which is de-smuted with an alkaline solution having a pH of 8 or more composed of an inorganic tin compound and a peroxide and then forming an oxidation-resistant film is described.

一方、磁性合金に形成されるめっき皮膜は、種々提案されている。例えば特許文献2では、無電解銅めっき、電気銅めっき及び電気ニッケルめっき、アルカリ性無電解ニッケルめっき及び電気ニッケルめっきによって、金属めっき皮膜を形成している。 On the other hand, various plating films formed on magnetic alloys have been proposed. For example, in Patent Document 2, a metal plating film is formed by electroless copper plating, electrolytic copper plating and electrolytic nickel plating, alkaline electroless nickel plating and electrolytic nickel plating.

また、特許文献3では、永久磁石体とその表面に形成された置換Cuめっき層とそれより厚い無電解Ni−Pめっき層からなる二層無電解めっき層を有する希土類永久磁石が記載されている。この特許文献3に記載の希土類永久磁石によれば、磁気特性の低下が少なく、密着性が向上すると共に、高い耐食性を有するとされている。 Further, Patent Document 3 describes a rare earth permanent magnet having a two-layer electroless plating layer composed of a permanent magnet body, a substituted Cu plating layer formed on the surface thereof, and a thicker electroless Ni-P plating layer. .. According to the rare earth permanent magnet described in Patent Document 3, it is said that the magnetic characteristics are less deteriorated, the adhesion is improved, and the magnetism resistance is high.

しかしながら、特許文献1及び特許文献2に記載されているようなスマット除去等の前処理を行った後、Ni等の金属皮膜を形成しても、密着性や外観が良好で、耐食性に優れた皮膜は得られているとはいえない。また、特許文献2及び特許文献3に示されるような無電解めっき処理及び電解めっき処理を希土類磁石の表面に施しても、上述した前処理を行った場合と同様に、密着性や外観が良好で、耐食性に優れた金属めっき皮膜は得られていない。 However, even if a metal film such as Ni is formed after pretreatment such as removing smut as described in Patent Document 1 and Patent Document 2, the adhesion and appearance are good, and the corrosion resistance is excellent. It cannot be said that the film has been obtained. Further, even if the surface of the rare earth magnet is subjected to the electroless plating treatment and the electroplating treatment as shown in Patent Documents 2 and 3, the adhesion and appearance are good as in the case of the above-mentioned pretreatment. Therefore, a metal plating film having excellent corrosion resistance has not been obtained.

特開平3−283607号公報Japanese Unexamined Patent Publication No. 3-283607 特開平8−3783号公報Japanese Unexamined Patent Publication No. 8-3783 特開2003−249405号公報Japanese Unexamined Patent Publication No. 2003-249405

従って、本件発明の課題は、密着性や外観が良好で、耐食性に優れた金属めっき皮膜を表面に有する希土類磁石のめっき前処理方法及びめっき処理方法を提供することにある。 Therefore, an object of the present invention is to provide a plating pretreatment method and a plating treatment method for a rare earth magnet having a metal plating film having good adhesion and appearance and excellent corrosion resistance on the surface.

そこで、本件発明者らは、鋭意研究を行った結果、以下に述べる希土類磁石のめっき前処理方法及びめっき処理方法を採用することで、上記課題を解決することに想到した。 Therefore, as a result of diligent research, the present inventors have come up with the idea of solving the above-mentioned problems by adopting the plating pretreatment method and the plating treatment method for rare earth magnets described below.

本件発明に係る希土類磁石のめっき前処理方法: 本件発明に係る希土類磁石のめっき前処理方法は、無電解めっき又は電解めっきにより希土類磁石の表面に金属皮膜を形成する際の希土類磁石のめっき前処理方法であって、アルカリ脱脂処理工程を行った後に、少なくとも第1酸処理工程と第2酸処理工程との2段階で酸活性処理を行い、これら各工程の後に、20〜150kHzの超音波振動を加えた20〜50℃の水に当該希土類磁石の被めっき面を1〜5分間接触させる超音波水洗によるスマット除去を施すことを特徴とする。 Rare earth magnet plating pretreatment method according to the present invention: The rare earth magnet plating pretreatment method according to the present invention is a rare earth magnet plating pretreatment when a metal film is formed on the surface of the rare earth magnet by electroless plating or electrolytic plating. In this method, after performing the alkaline degreasing treatment step, the acid activity treatment is performed at least in two steps of the first acid treatment step and the second acid treatment step, and after each of these steps, ultrasonic vibration of 20 to 150 kHz is performed. It is characterized in that the smut is removed by ultrasonic water washing in which the surface to be plated of the rare earth magnet is brought into contact with water at 20 to 50 ° C. to which the above-mentioned material is added for 1 to 5 minutes.

本件発明に係る希土類磁石のめっき前処理方法において、前記第1酸処理工程は、前記希土類磁石の被めっき面を、硝酸、硫酸、塩酸、及びリン酸若しくはこれらの塩のうち1種又は2種を含み且つ酸濃度が15〜150mL/Lの酸液中に50〜600秒間浸漬させることが好ましい。 In the method for pre-treating a rare earth magnet according to the present invention, in the first acid treatment step, the surface to be plated of the rare earth magnet is subjected to one or two of nitric acid, sulfuric acid, hydrochloric acid, and phosphoric acid or salts thereof. It is preferable to immerse the substance in an acid solution containing 15 to 150 mL / L for 50 to 600 seconds.

本件発明に係る希土類磁石のめっき前処理方法において、前記第2酸処理工程は、前記希土類磁石の被めっき面を、硝酸、硫酸、塩酸、及びリン酸若しくはこれらの塩のうち1種又は2種を含み且つ酸濃度が20〜100mL/Lの酸液中に30〜600秒間浸漬させることが好ましい。 In the method for pre-treating a rare earth magnet according to the present invention, in the second acid treatment step, the surface to be plated of the rare earth magnet is subjected to one or two of nitric acid, sulfuric acid, hydrochloric acid, and phosphoric acid or salts thereof. It is preferable to immerse in an acid solution containing 20 to 100 mL / L and having an acid concentration of 20 to 100 mL / L for 30 to 600 seconds.

本件発明に係る希土類磁石のめっき処理方法: 本件発明に係る希土類磁石のめっき処理方法は、上述しためっき前処理方法で処理された希土類磁石の表面に無電解めっき処理により金属皮膜を形成する際の希土類磁石のめっき処理方法であって、2種のめっき処理工程を備え、当該2種のめっき処理工程は、アルカリ無電解ニッケルめっき処理工程と無電解ニッケルめっき処理工程であり、当該アルカリ無電解ニッケルめっき処理工程で用いるめっき浴が、ニッケル塩と、有機カルボン酸及び/又はその塩とを含有することを特徴とする。 Plating treatment method for rare earth magnets according to the present invention: The plating treatment method for rare earth magnets according to the present invention is for forming a metal film on the surface of a rare earth magnet treated by the above-mentioned pre-plating method by electroless plating. It is a plating treatment method for rare earth magnets and includes two types of plating treatment steps. The two types of plating treatment steps are an alkali electroless nickel plating treatment step and an electroless nickel plating treatment step, and the alkali electroless nickel The plating bath used in the plating treatment step is characterized by containing a nickel salt and an organic carboxylic acid and / or a salt thereof.

本件発明に係る希土類磁石のめっき処理方法において、前記めっき浴は、更に還元剤及び安定剤を含有し、pHが9〜10であることが好ましい。 In the method for plating a rare earth magnet according to the present invention, it is preferable that the plating bath further contains a reducing agent and a stabilizer and has a pH of 9 to 10.

本件発明に係る希土類磁石のめっき処理方法において、前記還元剤がリン酸及び/又はその塩であり、前記安定剤が硝酸鉛であることが好ましい。 In the method for plating a rare earth magnet according to the present invention, it is preferable that the reducing agent is phosphoric acid and / or a salt thereof, and the stabilizer is lead nitrate.

本件発明に係る希土類磁石のめっき処理方法において、前記有機カルボン酸がクエン酸であることが好ましい。 In the method for plating a rare earth magnet according to the present invention, it is preferable that the organic carboxylic acid is citric acid.

本件発明に係る希土類磁石のめっき前処理方法及びめっき処理方法によれば、密着性や外観が良好で、耐食性に優れた金属めっき皮膜を表面に有する希土類磁石を得ることが可能となる。 According to the rare earth magnet plating pretreatment method and the plating treatment method according to the present invention, it is possible to obtain a rare earth magnet having a metal plating film having good adhesion and appearance and excellent corrosion resistance on the surface.

以下に、本件発明を実施するための形態について説明する。 Hereinafter, modes for carrying out the present invention will be described.

[本件発明に係る希土類磁石のめっき前処理方法について]
本件発明に係る希土類磁石のめっき前処理方法は、無電解めっき又は電解めっきにより希土類磁石の表面に金属皮膜を形成する際の希土類磁石のめっき前処理方法である。本件発明に係る希土類磁石のめっき前処理方法では、アルカリ脱脂処理工程を行った後に、少なくとも第1酸処理工程と第2酸処理工程との2段階で酸活性処理を行い、これら各工程の後に超音波水洗によるスマット除去を施す。以下に、本件発明に係る希土類磁石のめっき前処理方法について具体的に説明する。
[About the plating pretreatment method for rare earth magnets according to the present invention]
The rare earth magnet plating pretreatment method according to the present invention is a rare earth magnet plating pretreatment method for forming a metal film on the surface of a rare earth magnet by electroless plating or electrolytic plating. In the method for pre-plating a rare earth magnet according to the present invention, after performing an alkaline degreasing treatment step, an acid activity treatment is carried out in at least two steps of a first acid treatment step and a second acid treatment step, and after each of these steps. Remove the smut by washing with ultrasonic water. The method for pre-plating the rare earth magnet according to the present invention will be specifically described below.

<希土類磁石について>
希土類磁石は、R−TM−B系(R:Yを含む希土類元素、TM:遷移金属、B:ホウ素)で示され、希土類元素としては、サマリウム、ネオジム、プラセオジム、ホルミウム等の少なくとも1種及びイットリウムが挙げられる。遷移金属としては鉄、コバルト等が挙げられる。
<About rare earth magnets>
Rare earth magnets are represented by R-TM-B system (rare earth elements including R: Y, TM: transition metals, B: boron), and the rare earth elements include at least one kind such as samarium, neodymium, praseodymium, and formium. Yttrium can be mentioned. Examples of the transition metal include iron and cobalt.

<アルカリ脱脂処理について>
アルカリ脱脂処理は、希土類磁石表面の油脂類の汚れを除去するもので、希土類磁石をアルカリ脱脂処理液に浸漬することにより行う。アルカリ脱脂処理液の成分は、特に限定はされず、例えば水酸化ナトリウム、炭酸ナトリウム、シアン化ナトリウム、メタケイ酸ナトリウム等を含むものを用いることができ、市販品としてはアルカリ脱脂剤(商品名K−340、日本カニゼン株式会社)が例示される。ここで、希土類磁石の浸漬条件としては、アルカリ脱脂処理液のアルカリ濃度を5〜200g/L、温度を20〜90℃とし、浸漬時間を2〜30分とすることが好ましい。また、このアルカリ脱脂処理の前に、トリクロルエチレン等を用いた溶剤脱脂処理を行ってもよい。
<Alkaline degreasing treatment>
The alkaline degreasing treatment removes dirt from oils and fats on the surface of the rare earth magnet, and is performed by immersing the rare earth magnet in an alkaline degreasing treatment liquid. The components of the alkaline degreasing solution are not particularly limited, and for example, those containing sodium hydroxide, sodium carbonate, sodium cyanide, sodium metasilicate and the like can be used, and as a commercial product, an alkaline degreasing agent (trade name K). -340, Japan Kanigen Co., Ltd.) is exemplified. Here, as the immersion conditions for the rare earth magnet, it is preferable that the alkali concentration of the alkaline degreasing solution is 5 to 200 g / L, the temperature is 20 to 90 ° C., and the immersion time is 2 to 30 minutes. Further, before this alkaline degreasing treatment, a solvent degreasing treatment using trichloroethylene or the like may be performed.

<酸活性処理について>
本件発明では、希土類磁石の被めっき面に対して、アルカリ脱脂処理を行った後に酸活性処理を施す。酸活性処理は、希土類磁石表面の酸化皮膜及びアルカリ皮膜の除去や、希土類磁石と金属めっき皮膜との間の密着性を向上させ、また不純物質の侵入を防止し、金属めっき皮膜の耐食性を向上させることを目的として行われる。ここで、この酸活性処理は、少なくとも第1酸処理工程と第2酸処理工程との2段階で行う。
<About acid activity treatment>
In the present invention, the surface to be plated of a rare earth magnet is subjected to an alkali degreasing treatment and then an acid activity treatment. The acid activity treatment removes the oxide film and alkali film on the surface of the rare earth magnet, improves the adhesion between the rare earth magnet and the metal plating film, prevents the invasion of impurities, and improves the corrosion resistance of the metal plating film. It is done for the purpose of making it. Here, this acid activity treatment is carried out in at least two steps of a first acid treatment step and a second acid treatment step.

1.第1酸処理工程について
第1酸処理工程は、希土類磁石表面の酸化皮膜及びアルカリ皮膜の除去を目的とするものである。ここで、第1酸処理工程で用いる第1酸処理液としては、硝酸、硫酸、塩酸、及びリン酸若しくはこれらの塩のうち1種又は2種を含むことが、磁石表面を十分に活性化させる上で好ましい。当該リン酸としては、例えば、次亜リン酸、亜リン酸、正リン酸等のリン化合物が挙げられる。
1. 1. About the first acid treatment step The first acid treatment step aims at removing the oxide film and the alkali film on the surface of the rare earth magnet. Here, the first acid treatment liquid used in the first acid treatment step sufficiently activates the magnet surface by containing one or two of nitric acid, sulfuric acid, hydrochloric acid, and phosphoric acid or salts thereof. It is preferable to make it. Examples of the phosphoric acid include phosphorus compounds such as hypophosphorous acid, phosphorous acid, and orthophosphorus acid.

そして、第1酸処理工程では、希土類磁石の被めっき面を、酸濃度が15〜150mL/Lの酸液中に50〜600秒間浸漬させることが好ましい。ここで、酸液中における酸濃度が15mL/L未満、又は浸漬時間が50秒間未満となると、磁石表面が十分に活性化されず、めっき皮膜の密着不良を招くため好ましくない。また、酸液中における酸濃度が150mL/Lを超える、又は浸漬時間が600秒間を超えると、磁石表面にスマットや砂状析出物(焼結合金である磁石が粒界腐食して残った成分により生成される析出物)が付着し、めっき皮膜の密着不良を招く原因となるため好ましくない。 Then, in the first acid treatment step, it is preferable to immerse the surface to be plated of the rare earth magnet in an acid solution having an acid concentration of 15 to 150 mL / L for 50 to 600 seconds. Here, if the acid concentration in the acid solution is less than 15 mL / L or the immersion time is less than 50 seconds, the magnet surface is not sufficiently activated, resulting in poor adhesion of the plating film, which is not preferable. Further, when the acid concentration in the acid solution exceeds 150 mL / L or the immersion time exceeds 600 seconds, smut or sandy precipitates (components in which the magnet, which is a sintered alloy, remains intergranular corrosion) on the magnet surface. This is not preferable because it causes adhesion of the plating film due to adhesion).

更に、第1酸処理工程では、希土類磁石の被めっき面を浸漬する酸液の温度を10〜50℃とすることがより好ましい。第1酸処理工程で用いる酸液の温度を10〜50℃とすることで、被めっき表面の活性化を促進し、異常なエッチングが起こり難くなる。 Further, in the first acid treatment step, it is more preferable that the temperature of the acid solution for immersing the surface to be plated of the rare earth magnet is 10 to 50 ° C. By setting the temperature of the acid solution used in the first acid treatment step to 10 to 50 ° C., activation of the surface to be plated is promoted, and abnormal etching is less likely to occur.

2.第2酸処理工程について
第2酸処理工程は、希土類磁石と金属めっき皮膜との間の密着性を向上させ、また不純物質の進入を防止し、金属めっき皮膜の耐食性を向上させることを目的とするものである。ここで、第2酸処理工程で用いる第2酸処理液としては、第1酸処理液と同様に、硝酸、硫酸、塩酸、及びリン酸若しくはこれらの塩のうち1種又は2種を含むことが、磁石表面を十分に活性化させる上で好ましい。当該リン酸としては、例えば、次亜リン酸、亜リン酸、正リン酸等のリン化合物が挙げられる。
2. About the second acid treatment step The purpose of the second acid treatment step is to improve the adhesion between the rare earth magnet and the metal plating film, prevent the ingress of impurities, and improve the corrosion resistance of the metal plating film. It is something to do. Here, the second acid treatment liquid used in the second acid treatment step contains one or two of nitric acid, sulfuric acid, hydrochloric acid, and phosphoric acid or salts thereof, similarly to the first acid treatment liquid. However, it is preferable for sufficiently activating the magnet surface. Examples of the phosphoric acid include phosphorus compounds such as hypophosphorous acid, phosphorous acid, and orthophosphorus acid.

そして、第2酸処理工程では、希土類磁石の被めっき面を、酸濃度が20〜100mL/Lの酸液中に30〜600秒間浸漬させることが好ましい。ここで、酸液中における酸濃度が20mL/L未満となると、めっき皮膜の密着性を必要十分に向上させるだけの表面活性化が起こらず好ましくない。酸液中における酸濃度が100mL/Lを超えると、磁石表面に異常なエッチングが起こり好ましくない。また、浸漬時間が30秒間未満となると、表面活性化が均一且つ十分に起こらず好ましくない。浸漬時間が600秒間を超えると、作業工数の増加及び過剰な表面活性化による異常なエッチングが起こり好ましくない。 Then, in the second acid treatment step, it is preferable to immerse the surface to be plated of the rare earth magnet in an acid solution having an acid concentration of 20 to 100 mL / L for 30 to 600 seconds. Here, if the acid concentration in the acid solution is less than 20 mL / L, surface activation that sufficiently improves the adhesion of the plating film does not occur, which is not preferable. If the acid concentration in the acid solution exceeds 100 mL / L, abnormal etching occurs on the magnet surface, which is not preferable. Further, if the immersion time is less than 30 seconds, surface activation does not occur uniformly and sufficiently, which is not preferable. If the immersion time exceeds 600 seconds, abnormal etching occurs due to an increase in work man-hours and excessive surface activation, which is not preferable.

更に、第2酸処理工程では、希土類磁石の被めっき面を浸漬する酸液の温度を10〜50℃とすることがより好ましい。第2酸処理工程で用いる酸液の温度を10〜50℃とすることで、被めっき表面における活性化不足の低減及び異常なエッチングの防止を図ることが出来る。 Further, in the second acid treatment step, it is more preferable that the temperature of the acid solution in which the surface to be plated of the rare earth magnet is immersed is 10 to 50 ° C. By setting the temperature of the acid solution used in the second acid treatment step to 10 to 50 ° C., it is possible to reduce insufficient activation on the surface to be plated and prevent abnormal etching.

以上に、本件発明における第1酸処理工程及び第2酸処理工程について説明したが、本件発明に係る希土類磁石のめっき前処理方法では、これら第1酸処理工程及び第2酸処理工程の後に更に酸処理工程を設けることも出来る。本件発明に係る希土類磁石のめっき前処理方法において、3段階以上の酸処理工程を設けたとしても、2段階の酸処理工程を設けたときと同様の効果を得ることが出来るが、この場合工数の増加を招くこととなる。ここで、3段階目以降の酸処理工程は、2段階目の酸処理工程(第2酸処理工程)よりも酸濃度を徐々に低くし且つ処理時間を徐々に短くすることが出来る。 The first acid treatment step and the second acid treatment step in the present invention have been described above, but in the rare earth magnet plating pretreatment method according to the present invention, the first acid treatment step and the second acid treatment step are further followed. An acid treatment step can also be provided. In the rare earth magnet plating pretreatment method according to the present invention, even if three or more stages of acid treatment steps are provided, the same effect as when two steps of acid treatment steps are provided can be obtained, but in this case, man-hours are required. Will lead to an increase in. Here, in the acid treatment steps of the third and subsequent steps, the acid concentration can be gradually lowered and the treatment time can be gradually shortened as compared with the acid treatment step of the second step (second acid treatment step).

<超音波水洗について>
本件発明では、上述したアルカリ脱脂処理及び酸活性処理の後に、それぞれ超音波水洗を行いスマット除去する。超音波水洗は、希土類磁石の表面に物理的又は磁気的に付着した不純物を除去するもので、これにより希土類磁石と金属めっき皮膜の密着性を向上することができる。超音波水洗に用いる水としては、水道水やイオン交換水等を用いることができ、特に限定されるものではない。また、超音波水洗の方法に関しても特に限定されず、希土類磁石を浸漬することが出来る。
<About ultrasonic water washing>
In the present invention, after the above-mentioned alkaline degreasing treatment and acid activity treatment, ultrasonic water washing is performed to remove the smut. Ultrasonic washing removes impurities physically or magnetically attached to the surface of the rare earth magnet, whereby the adhesion between the rare earth magnet and the metal plating film can be improved. The water used for ultrasonic washing can be tap water, ion-exchanged water, or the like, and is not particularly limited. Further, the method of ultrasonic water washing is not particularly limited, and a rare earth magnet can be immersed.

そして、超音波水洗では、20〜150kHzの超音波振動を加えた水に、希土類磁石の被めっき面を1〜5分間接触させることが好ましい。ここで、超音波振動の周波数が20kHz未満又は150kHzを超える場合には、特殊な装置が必要となり、大きなメリットもないため、超音波水洗の条件として適さない。また、超音波振動を加えた水に希土類磁石の被めっき面を接触させる時間が1分間未満となると、水洗が十分行われずスマットを十分に除去することが出来ない。超音波振動を加えた水に希土類磁石の被めっき面を接触させる時間が5分間を超えると、作業工数の増加を招き好ましくない。 Then, in ultrasonic water washing, it is preferable that the surface to be plated of the rare earth magnet is brought into contact with water subjected to ultrasonic vibration of 20 to 150 kHz for 1 to 5 minutes. Here, when the frequency of ultrasonic vibration is less than 20 kHz or exceeds 150 kHz, a special device is required and there is no great merit, so that it is not suitable as a condition for ultrasonic water washing. Further, if the time for contacting the surface to be plated of the rare earth magnet with the water subjected to ultrasonic vibration is less than 1 minute, the water washing is not sufficiently performed and the smut cannot be sufficiently removed. If the time for contacting the surface to be plated of the rare earth magnet with the water subjected to ultrasonic vibration exceeds 5 minutes, the work man-hours will increase, which is not preferable.

更に、超音波水洗では、用いる水の温度を20〜50℃とすることがより好ましい。超音波水洗で用いる水の温度を20〜50℃とすることで、水洗不足を招き難くすると共に、磁石表面に対する異常なエッチングを効果的に防止することが出来る。 Further, in ultrasonic water washing, it is more preferable that the temperature of the water used is 20 to 50 ° C. By setting the temperature of the water used in the ultrasonic water washing to 20 to 50 ° C., it is possible to prevent insufficient washing with water and effectively prevent abnormal etching on the magnet surface.

[本件発明に係る希土類磁石のめっき処理方法について]
本件発明に係る希土類磁石のめっき処理方法は、上述しためっき前処理方法で処理された希土類磁石の表面に無電解めっき処理により金属皮膜を形成する際の希土類磁石のめっき処理方法である。本件発明に係る希土類磁石のめっき処理方法では、アルカリ無電解ニッケルめっき処理工程と無電解ニッケルめっき処理工程とを備え、当該アルカリ無電解ニッケルめっき処理工程で用いるめっき浴が、ニッケル塩と、有機カルボン酸及び/又はその塩とを含有する。以下に、本件発明に係る希土類磁石のめっき処理方法について具体的に説明する。
[About the plating treatment method for rare earth magnets according to the present invention]
The method for plating a rare earth magnet according to the present invention is a method for plating a rare earth magnet when forming a metal film on the surface of the rare earth magnet treated by the above-mentioned pre-plating method by electroless plating. The rare earth magnet plating treatment method according to the present invention includes an alkali electroless nickel plating treatment step and an electroless nickel plating treatment step, and the plating bath used in the alkali electroless nickel plating treatment step includes a nickel salt and an organic carboxyl. Contains acid and / or a salt thereof. Hereinafter, the plating treatment method for the rare earth magnet according to the present invention will be specifically described.

<無電解めっき処理について>
本件発明では、上述しためっき前処理を施した後、希土類磁石の酸化を防ぐ手段として、希土類磁石表面に2種類の無電解めっき処理を施してニッケルめっき皮膜を形成する。本件発明における無電解めっき処理では、2種類の無電解めっき処理として、アルカリ無電解ニッケルめっき処理工程と無電解ニッケルめっき処理工程とを実施する。これら2種のめっき処理工程を実施することで、触媒を付与することなしにめっき析出させることができ、膜厚を効率良く析出させるという効果を得ることが出来る。ここで、アルカリ無電解ニッケルめっき処理と、無電解ニッケルめっき処理とは、この順番で行うことで、ニッケルの析出が促進されると共にめっき浴の自己分解が起きないため、触媒付与が不要となる。
<About electroplating>
In the present invention, after the above-mentioned plating pretreatment, two types of electroless plating treatments are applied to the surface of the rare earth magnets to form a nickel plating film as a means for preventing the oxidation of the rare earth magnets. In the electroless plating treatment in the present invention, an alkaline electroless nickel plating treatment step and an electroless nickel plating treatment step are carried out as two types of electroless plating treatments. By carrying out these two types of plating treatment steps, it is possible to perform plating precipitation without applying a catalyst, and it is possible to obtain the effect of efficiently precipitating the film thickness. Here, by performing the alkaline electroless nickel plating treatment and the electroless nickel plating treatment in this order, the precipitation of nickel is promoted and the self-decomposition of the plating bath does not occur, so that it is not necessary to add a catalyst. ..

1.アルカリ無電解ニッケルめっき処理工程について
本件発明に係る希土類磁石のめっき処理方法において、アルカリ無電解ニッケルめっき処理工程で用いられるめっき浴は、ニッケル塩と、有機カルボン酸及び/又はその塩とを含有する。ここで、当該めっき浴にニッケル塩が含まれることで、ニッケルめっき皮膜の密着性を向上させることが出来る。当該ニッケル塩は、硫酸及び塩素のいずれも含まないものが好ましく、酢酸ニッケル、炭酸ニッケル、硝酸ニッケル、水酸化ニッケル等を好適に用いることが出来る。特に、当該ニッケル塩としては、炭酸ニッケルを用いることが工業的に望ましく、また炭酸ニッケルを用いることでニッケルめっき皮膜の密着性の向上をより図ることが出来る。また、当該めっき浴に当該有機カルボン酸及び/又はその塩が含まれることで、ニッケル析出の安定化を図ることが出来る。当該有機カルボン酸としては、クエン酸、乳酸、リンゴ酸、コハク酸、マロン酸、酢酸等を挙げることが出来る。特に、有機カルボン酸としてクエン酸を用いることで、ニッケル析出の安定化をより図ることが出来る。
1. 1. Alkaline electroless nickel plating treatment step In the rare earth magnet plating treatment method according to the present invention, the plating bath used in the alkaline electroless nickel plating treatment step contains a nickel salt, an organic carboxylic acid and / or a salt thereof. .. Here, by containing the nickel salt in the plating bath, the adhesion of the nickel plating film can be improved. The nickel salt preferably contains neither sulfuric acid nor chlorine, and nickel acetate, nickel carbonate, nickel nitrate, nickel hydroxide and the like can be preferably used. In particular, it is industrially desirable to use nickel carbonate as the nickel salt, and by using nickel carbonate, the adhesion of the nickel plating film can be further improved. Further, by containing the organic carboxylic acid and / or a salt thereof in the plating bath, it is possible to stabilize nickel precipitation. Examples of the organic carboxylic acid include citric acid, lactic acid, malic acid, succinic acid, malonic acid, acetic acid and the like. In particular, by using citric acid as the organic carboxylic acid, it is possible to further stabilize nickel precipitation.

また、アルカリ無電解ニッケルめっき処理工程で用いられるめっき浴は、更に還元剤及び安定剤を含有し、pHが9〜10であることが好ましい。ここで、当該めっき浴に更に還元剤が含まれることで、ニッケルを十分に析出させることが出来る。当該還元剤としては、リン酸及び/又はその塩を用いることで、ニッケル析出の促進を図ることができ好ましい。当該リン酸としては、例えば、次亜リン酸、亜リン酸等のリン化合物が挙げられ、特に次亜リン酸が好ましい。また、当該めっき浴に更に安定剤が含まれることで、異常分解を抑制することが出来る。当該安定剤としては、無電解ニッケルめっきにおいて既知である、鉛、ビスマス、カドミウム、チタン、及びアンチモン等の重金属安定剤、チオ硫酸塩、チオ尿素、及びチオジグリコール酸等の硫黄系安定剤、ヨウ素酸塩、モリブデン酸塩、バナジン酸塩、及びスズ酸塩等の多価金属酸化物安定剤を用いることが出来る。これら安定剤は、1種単独で用いても良く、また2種以上組み合わせて用いても良い。特に、当該安定剤として鉛を用いることで、めっき浴の自己分解を抑制することが出来る。 Further, the plating bath used in the alkaline electroless nickel plating treatment step further contains a reducing agent and a stabilizer, and the pH is preferably 9 to 10. Here, by further containing a reducing agent in the plating bath, nickel can be sufficiently precipitated. By using phosphoric acid and / or a salt thereof as the reducing agent, nickel precipitation can be promoted, which is preferable. Examples of the phosphoric acid include phosphorus compounds such as hypophosphorous acid and phosphorous acid, and hypophosphorous acid is particularly preferable. Further, by further containing a stabilizer in the plating bath, abnormal decomposition can be suppressed. Examples of the stabilizer include heavy metal stabilizers such as lead, bismuth, cadmium, titanium, and antimony, and sulfur-based stabilizers such as thiosulfate, thiourea, and thiodiglycolic acid, which are known in electroless nickel plating. Polyvalent metal oxide stabilizers such as iodate, molybdate, vanadinate, and stannate can be used. These stabilizers may be used alone or in combination of two or more. In particular, by using lead as the stabilizer, self-decomposition of the plating bath can be suppressed.

そして、アルカリ無電解ニッケルめっき処理工程で用いられるめっき浴は、pHが9以上であることで、磁石と接した面において還元剤との異常反応が生じ磁石が溶解するという問題が起こらず、安定的にニッケルを析出させることが可能となる。また、pHが10以下であることでニッケル塩の沈殿やニッケル析出が停止して皮膜が形成出来なくなるという問題が生じない。更に、当該めっき浴は、20〜70℃に設定されることで、ニッケル析出の均一化及び安定化という効果を得ることが出来る。ちなみに、アルカリ無電解ニッケルめっき処理工程では、当該めっき浴のpHを9〜10に調整する方法に関して特に限定はされず、例えばアンモニア等のpH調整剤やその他の添加剤を当該めっき浴に含めて用いることが出来る。 The plating bath used in the alkaline electroless nickel plating treatment step is stable because the pH is 9 or more, so that an abnormal reaction with the reducing agent occurs on the surface in contact with the magnet and the magnet does not dissolve. It becomes possible to deposit nickel. Further, when the pH is 10 or less, the problem that nickel salt precipitation or nickel precipitation is stopped and a film cannot be formed does not occur. Further, by setting the plating bath at 20 to 70 ° C., the effect of uniformizing and stabilizing nickel precipitation can be obtained. Incidentally, in the alkaline electroless nickel plating treatment step, the method of adjusting the pH of the plating bath to 9 to 10 is not particularly limited, and for example, a pH adjuster such as ammonia and other additives are included in the plating bath. Can be used.

以上に、アルカリ無電解ニッケルめっき処理工程で用いられるめっき浴について説明したが、具体的には、当該めっき浴におけるニッケル塩の濃度は金属ニッケルとして4〜5g/Lとするのが好ましい。また、当該めっき浴におけるニッケル塩を除いた浴組成としては、クエン酸5〜30g/L、次亜リン酸ナトリウム20〜40g/L、チオ硫酸ナトリウム0.0001〜0.05g/L、鉛0.0005〜0.005g/Lとすることが好ましい。 The plating bath used in the alkaline electroless nickel plating treatment step has been described above. Specifically, the concentration of the nickel salt in the plating bath is preferably 4 to 5 g / L as metallic nickel. The bath composition of the plating bath excluding the nickel salt was 5 to 30 g / L of citric acid, 20 to 40 g / L of sodium hypophosphate, 0.0001 to 0.05 g / L of sodium thiosulfate, and 0 lead. It is preferably 0005 to 0.005 g / L.

2.無電解ニッケルめっき処理工程について
本件発明に係る希土類磁石のめっき処理方法では、無電解ニッケルめっき処理工程を行うことで、無電解ニッケル皮膜の膜厚をより厚くすることが出来る。無電解ニッケルめっき処理工程で用いられるめっき浴は、通常の硫酸ニッケル、次亜リン酸ニッケル等のニッケル塩や、リン、ホウ素等の還元剤を含有する浴が用いられる。
2. Electroless nickel plating treatment step In the rare earth magnet plating treatment method according to the present invention, the film thickness of the electroless nickel film can be further increased by performing the electroless nickel plating treatment step. As the plating bath used in the electroless nickel plating treatment step, a bath containing a normal nickel salt such as nickel sulfate or nickel hypophosphate or a reducing agent such as phosphorus or boron is used.

<金属めっき皮膜について>
上述した本件発明に係る希土類磁石のめっき前処理方法で処理された希土類磁石の表面に、従来公知の方法により電解めっき処理又は無電解めっき処理を施したとしても、当該希土類磁石に密着性や外観が良好で、且つ耐食性に優れた金属めっき皮膜を形成することは可能である。しかし、希土類磁石の表面に対し、上述しためっき処理条件でニッケルめっき皮膜を形成することで、より密着性や外観が良好で且つ耐食性に優れたニッケルめっき皮膜を形成することが出来る。なお、めっき皮膜は、単層でも複数層でもよく、その目的によって任意に選択することが出来る。
<About metal plating film>
Even if the surface of the rare earth magnet treated by the above-mentioned pretreatment method for plating the rare earth magnet according to the present invention is subjected to electrolytic plating treatment or electroless plating treatment by a conventionally known method, the adhesion and appearance of the rare earth magnet are obtained. It is possible to form a metal plating film having good corrosion resistance and excellent corrosion resistance. However, by forming a nickel plating film on the surface of the rare earth magnet under the above-mentioned plating treatment conditions, it is possible to form a nickel plating film having better adhesion and appearance and excellent corrosion resistance. The plating film may be a single layer or a plurality of layers, and can be arbitrarily selected depending on the purpose.

以上に、本件発明に係る希土類磁石のめっき前処理方法及びめっき処理に関して説明したが、以下に本件発明の実施例を示し、本件発明をより詳細に説明する。なお、本件発明はこれらの例により何ら限定されるものではない。 The plating pretreatment method and the plating treatment of the rare earth magnet according to the present invention have been described above, but examples of the present invention will be shown below, and the present invention will be described in more detail. The present invention is not limited to these examples.

実施例1では、希土類磁石のめっき前処理として、アルカリ脱脂処理工程を行った後に、第1酸処理工程と第2酸処理工程との2段階で酸活性処理を行い、これら各工程の後に超音波水洗によるスマット除去を施したときのめっき皮膜の密着性の確認を行った。 In Example 1, as a pretreatment for plating a rare earth magnet, after performing an alkali degreasing treatment step, an acid activity treatment is carried out in two steps of a first acid treatment step and a second acid treatment step, and after each of these steps, super The adhesion of the plating film when the smut was removed by sonic washing was confirmed.

この実施例1では、試験体として希土類磁石(信越化学社製ネオジム磁石「品番:N50M」)を用い、当該試験体に対してアルカリ濃度50g/Lで温度50℃のアルカリ脱脂処理液に10分間浸漬させるアルカリ脱脂処理工程を行った後、38kHzの超音波振動を2分間加える超音波水洗を行った。次いで、当該試験体を60%硝酸50mL/Lの酸液(室温)中に160秒間浸漬させる第1酸処理工程を行った後、上述と同じ条件で超音波水洗を行った。更に、当該試験体を36%塩酸50mL/Lの酸液(25℃)中に160秒間浸漬させる第2酸処理工程を行った後、上述と同じ条件で超音波水洗を行った。ここで、上述したアルカリ脱脂剤としては、日本カニゼン株式会社製「品番:K−340」を用いた。また、超音波水洗には、装置として株式会社カイジョー製「品番:64200」を用いた。 In this Example 1, a rare earth magnet (neodymium magnet "Product No .: N50M" manufactured by Shin-Etsu Chemical Co., Ltd.) is used as a test body, and the test body is immersed in an alkaline degreasing solution having an alkali concentration of 50 g / L and a temperature of 50 ° C. for 10 minutes. After performing the alkaline degreasing treatment step of immersing, ultrasonic water washing was performed by applying ultrasonic vibration of 38 kHz for 2 minutes. Next, the test piece was subjected to a first acid treatment step of immersing the test piece in an acid solution (room temperature) of 60% nitric acid of 50 mL / L for 160 seconds, and then ultrasonically washed with water under the same conditions as described above. Further, after performing a second acid treatment step of immersing the test piece in an acid solution (25 ° C.) of 36% hydrochloric acid of 50 mL / L for 160 seconds, ultrasonic water washing was performed under the same conditions as described above. Here, as the above-mentioned alkaline degreasing agent, "Product No .: K-340" manufactured by Japan Kanigen Co., Ltd. was used. Further, for ultrasonic water washing, "Product No .: 64200" manufactured by Kaijo Co., Ltd. was used as an apparatus.

そして、試験体に対して上述した前処理を行った後に、アルカリ性無電解ニッケルめっき液(温度:50℃、pH:10)を用いて15分間のめっき処理を施し、その後更に日本カニゼン株式会社製「商品名:SEK−797」の無電解ニッケルめっき液(温度:88℃)を用いて25分間めっき処理を施した。ここで、アルカリ性無電解ニッケルめっき液には、ニッケル塩と有機カルボン酸とを含有したものを用いた。具体的には、当該ニッケル塩は、金属ニッケルとして4.5g/Lの濃度となる炭酸ニッケルを用いた。また、当該有機カルボン酸として20g/Lのクエン酸を用いた。そして、当該アルカリ性無電解ニッケルめっき液において、ニッケル塩及び有機カルボン酸を除いた浴組成としては、次亜リン酸ナトリウム30g/L、チオ硫酸ナトリウム0.001g/L、鉛0.001g/Lの組成のものを用いた。 Then, after performing the above-mentioned pretreatment on the test piece, it is plated with an alkaline electroless nickel plating solution (temperature: 50 ° C., pH: 10) for 15 minutes, and then further manufactured by Japan Kanigen Co., Ltd. The plating treatment was performed for 25 minutes using an electroless nickel plating solution (temperature: 88 ° C.) of "trade name: SEK-797". Here, as the alkaline electroless nickel plating solution, one containing a nickel salt and an organic carboxylic acid was used. Specifically, as the nickel salt, nickel carbonate having a concentration of 4.5 g / L was used as metallic nickel. Moreover, 20 g / L citric acid was used as the organic carboxylic acid. In the alkaline electroless nickel plating solution, the bath composition excluding the nickel salt and the organic carboxylic acid is 30 g / L of sodium hypophosphate, 0.001 g / L of sodium thiosulfate, and 0.001 g / L of lead. The composition was used.

実施例1では、このようにして試験体表面に形成しためっき皮膜の密着性を、JIS Z 1522に準じて評価した。実施例1で行うめっき皮膜の密着性の確認は、希土類磁石表面に2mm間隔で100マス目形成し、粘着テープ(ニチバン株式会社製「品番:CT−18」)による剥離試験を行い、マス目の残存率より評価した。 In Example 1, the adhesion of the plating film thus formed on the surface of the test piece was evaluated according to JIS Z 1522. To confirm the adhesion of the plating film in Example 1, 100 squares are formed on the surface of the rare earth magnet at 2 mm intervals, and a peeling test is performed with an adhesive tape (“Product No .: CT-18” manufactured by Nichiban Co., Ltd.). It was evaluated from the residual rate of.

表1には、以上の条件でめっき皮膜の密着性について確認を行った結果を示す。表1には、実施例1以外にも、実施例2,3、比較例1〜9の結果を併せて示す。ここで、めっき皮膜の密着性の確認は、剥離試験を行った後のマス目の残存率により評価した。めっき皮膜の密着性の評価は、マス目の欠損がないものを「○」、マス目が一部でも欠損したものを「×」とした。 Table 1 shows the results of confirming the adhesion of the plating film under the above conditions. Table 1 shows the results of Examples 2 and 3 and Comparative Examples 1 to 9 in addition to Example 1. Here, the confirmation of the adhesion of the plating film was evaluated by the residual ratio of the squares after the peeling test. The adhesion of the plating film was evaluated as "○" for those having no missing squares and "x" for those with even a part of the squares missing.

Figure 0006901273
Figure 0006901273

実施例2では、実施例1と同様に、希土類磁石のめっき前処理として、アルカリ脱脂処理工程を行った後に、第1酸処理工程と第2酸処理工程との2段階で酸活性処理を行い、これら各工程の後に超音波水洗によるスマット除去を施したときのめっき皮膜の密着性の確認を行った。この確認を行った結果を表1に示す。 In Example 2, as in Example 1, as a pretreatment for plating a rare earth magnet, an alkali degreasing treatment step is performed, and then an acid activity treatment is performed in two steps, a first acid treatment step and a second acid treatment step. After each of these steps, the adhesion of the plating film when the smut was removed by ultrasonic water washing was confirmed. The results of this confirmation are shown in Table 1.

実施例2では、試験体として信越化学社製ネオジム磁石(品番:N48M)を用いた以外は、実施例1と同じめっき前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。 In Example 2, the same plating pretreatment and plating treatment as in Example 1 were performed except that a neodymium magnet (product number: N48M) manufactured by Shin-Etsu Chemical Co., Ltd. was used as a test body. Therefore, the description of these processes will be omitted.

実施例3では、実施例1と同様に、希土類磁石のめっき前処理として、アルカリ脱脂処理工程を行った後に、第1酸処理工程と第2酸処理工程との2段階で酸活性処理を行い、これら各工程の後に超音波水洗によるスマット除去を施したときのめっき皮膜の密着性の確認を行った。この確認を行った結果を表1に示す。 In Example 3, similarly to Example 1, as a pretreatment for plating a rare earth magnet, an alkali degreasing treatment step is performed, and then an acid activity treatment is performed in two steps of a first acid treatment step and a second acid treatment step. After each of these steps, the adhesion of the plating film when the smut was removed by ultrasonic water washing was confirmed. The results of this confirmation are shown in Table 1.

実施例3では、試験体として信越化学製サマリウムコバルト磁石(品番:R26H)を用いた以外は、実施例1と同じめっき前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。 In Example 3, the same pre-plating and plating treatments as in Example 1 were performed except that a samarium-cobalt magnet (product number: R26H) manufactured by Shin-Etsu Chemical Co., Ltd. was used as a test body. Therefore, the description of these processes will be omitted.

実施例4では、実施例1〜3で得られた結果をふまえ、超音波水洗において試験体の表面に加える超音波振動の周波数を変更させた場合に、めっき皮膜の状態や密着性に及ぼされる影響について確認を行った。 In Example 4, based on the results obtained in Examples 1 to 3, when the frequency of ultrasonic vibration applied to the surface of the test piece in ultrasonic washing is changed, the state and adhesion of the plating film are affected. We confirmed the impact.

実施例4では、試験体に対して行う超音波水洗の際の周波数を25kHzと変化させた以外は、実施例1と同じ試験体を用い、実施例1と同じ前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。 In Example 4, the same test body as in Example 1 was used, except that the frequency of ultrasonic water washing performed on the test body was changed to 25 kHz, and the same pretreatment and plating treatment as in Example 1 were performed. .. Therefore, the description of these processes will be omitted.

表2には、以上の条件でめっき皮膜の状態及び密着性について確認を行った結果を示す。表2には、実施例4以外にも、実施例5,6の結果を併せて示す。ここで、めっき皮膜の状態の確認は、目視によって評価した。めっき皮膜の状態の評価は、均一光沢を「◎」、不均一光沢を「○」、一部無光沢を「△」、無光沢を「×」とした。また、めっき皮膜の密着性の評価は、実施例1と同じ条件で評価した。 Table 2 shows the results of confirming the state and adhesion of the plating film under the above conditions. Table 2 shows the results of Examples 5 and 6 in addition to Example 4. Here, the confirmation of the state of the plating film was visually evaluated. The state of the plating film was evaluated as "⊚" for uniform gloss, "○" for non-uniform gloss, "Δ" for partially matte gloss, and "x" for matte gloss. Further, the adhesion of the plating film was evaluated under the same conditions as in Example 1.

Figure 0006901273
Figure 0006901273

実施例5では、実施例4と同様に、超音波水洗において試験体の表面に加える超音波振動の周波数を変更させた場合に、めっき皮膜の状態や密着性に及ぼされる影響について確認を行った。この確認を行った結果を表2に示す。 In Example 5, as in Example 4, when the frequency of ultrasonic vibration applied to the surface of the test piece was changed in ultrasonic water washing, the effect on the state and adhesion of the plating film was confirmed. .. The results of this confirmation are shown in Table 2.

実施例5では、試験体に対して行う超音波水洗の際の周波数を45kHzと変化させた以外は、実施例1と同じ試験体を用い、実施例1と同じ前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。 In Example 5, the same test body as in Example 1 was used, except that the frequency of ultrasonic water washing performed on the test body was changed to 45 kHz, and the same pretreatment and plating treatment as in Example 1 were performed. .. Therefore, the description of these processes will be omitted.

実施例6では、実施例4と同様に、超音波水洗において試験体の表面に加える超音波振動の周波数を変更させた場合に、めっき皮膜の状態や密着性に及ぼされる影響について確認を行った。この確認を行った結果を表2に示す。 In Example 6, as in Example 4, when the frequency of ultrasonic vibration applied to the surface of the test piece was changed in ultrasonic water washing, the effect on the state and adhesion of the plating film was confirmed. .. The results of this confirmation are shown in Table 2.

実施例6では、試験体に対して行う超音波水洗の際の周波数を100kHzと変化させた以外は、実施例1と同じ試験体を用い、実施例1と同じ前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。 In Example 6, the same test body as in Example 1 was used, except that the frequency of ultrasonic water washing performed on the test body was changed to 100 kHz, and the same pretreatment and plating treatment as in Example 1 were performed. .. Therefore, the description of these processes will be omitted.

実施例7では、実施例1〜3で得られた結果をふまえ、第1酸処理工程の条件(酸液の酸濃度、浸漬時間)を変更させた場合に、めっき皮膜の密着性及び外観に及ぼされる影響について確認を行った。 In Example 7, based on the results obtained in Examples 1 to 3, when the conditions of the first acid treatment step (acid concentration of the acid solution, immersion time) were changed, the adhesion and appearance of the plating film were improved. We confirmed the impact.

実施例7では、試験体に対して行う第1酸処理工程において、酸液の酸濃度を10mL/Lとし、試験体を浸漬させる時間を600secと変化させた以外は、実施例1と同じ試験体を用い、実施例1と同じ前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。 In Example 7, the same test as in Example 1 except that in the first acid treatment step performed on the test piece, the acid concentration of the acid solution was set to 10 mL / L and the immersion time of the test piece was changed to 600 sec. Using the body, the same pretreatment and plating treatment as in Example 1 were performed. Therefore, the description of these processes will be omitted.

表3には、以上の条件でめっき皮膜の密着性及び外観について確認を行った結果を示す。表3には、実施例7以外にも、実施例8〜13の結果を併せて示す。ここで、めっき皮膜の密着性の確認は、実施例1と同じ条件で評価した。また、めっき皮膜の外観は、実施例4と同じ条件で、目視によって評価した。以上をふまえ、めっき皮膜の密着性及び外観の評価は、外観上均一で密着性良好を「◎」、外観上曇りも見られるが密着性良好を「○」、外観上均一であるが密着性不良を「△」、外観上曇りがあり密着性不良を「×」とした。 Table 3 shows the results of confirming the adhesion and appearance of the plating film under the above conditions. Table 3 shows the results of Examples 8 to 13 in addition to Example 7. Here, the confirmation of the adhesion of the plating film was evaluated under the same conditions as in Example 1. The appearance of the plating film was visually evaluated under the same conditions as in Example 4. Based on the above, the evaluation of the adhesion and appearance of the plating film is uniform in appearance and good adhesion is "◎", cloudiness is also seen in appearance but good adhesion is "○", and the appearance is uniform but good adhesion. The defect was marked with "Δ", and the appearance was cloudy and the poor adhesion was marked with "x".

Figure 0006901273
Figure 0006901273

実施例8では、実施例7と同様に、第1酸処理工程の条件(酸液の酸濃度、浸漬時間)を変更させた場合に、めっき皮膜の密着性及び外観に及ぼされる影響について確認を行った。この確認を行った結果を表3に示す。 In Example 8, similarly to Example 7, when the conditions of the first acid treatment step (acid concentration of the acid solution, immersion time) were changed, the effect on the adhesion and appearance of the plating film was confirmed. went. The results of this confirmation are shown in Table 3.

実施例8では、試験体に対して行う第1酸処理工程において、酸液の酸濃度を20mL/Lとし、試験体を浸漬させる時間を300secと変化させた以外は、実施例1と同じ試験体を用い、実施例1と同じ前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。 In Example 8, the same test as in Example 1 except that in the first acid treatment step performed on the test piece, the acid concentration of the acid solution was set to 20 mL / L and the immersion time of the test piece was changed to 300 sec. Using the body, the same pretreatment and plating treatment as in Example 1 were performed. Therefore, the description of these processes will be omitted.

実施例9では、実施例7と同様に、第1酸処理工程の条件(酸液の酸濃度、浸漬時間)を変更させた場合に、めっき皮膜の密着性及び外観に及ぼされる影響について確認を行った。この確認を行った結果を表3に示す。 In Example 9, as in Example 7, when the conditions of the first acid treatment step (acid concentration of the acid solution, immersion time) were changed, the effect on the adhesion and appearance of the plating film was confirmed. went. The results of this confirmation are shown in Table 3.

実施例9では、試験体に対して行う第1酸処理工程において、酸液の酸濃度を20mL/Lとし、試験体を浸漬させる時間を60secと変化させた以外は、実施例1と同じ試験体を用い、実施例1と同じ前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。 In Example 9, the same test as in Example 1 except that in the first acid treatment step performed on the test piece, the acid concentration of the acid solution was set to 20 mL / L and the immersion time of the test piece was changed to 60 sec. Using the body, the same pretreatment and plating treatment as in Example 1 were performed. Therefore, the description of these processes will be omitted.

実施例10では、実施例7と同様に、第1酸処理工程の条件(酸液の酸濃度、浸漬時間)を変更させた場合に、めっき皮膜の密着性及び外観に及ぼされる影響について確認を行った。この確認を行った結果を表3に示す。 In Example 10, as in Example 7, it was confirmed that when the conditions of the first acid treatment step (acid concentration of the acid solution, immersion time) were changed, the effect on the adhesion and appearance of the plating film was confirmed. went. The results of this confirmation are shown in Table 3.

実施例10では、試験体に対して行う第1酸処理工程において、酸液の酸濃度を50mL/Lとし、試験体を浸漬させる時間を60secと変化させた以外は、実施例1と同じ試験体を用い、実施例1と同じ前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。 In Example 10, the same test as in Example 1 except that in the first acid treatment step performed on the test piece, the acid concentration of the acid solution was set to 50 mL / L and the immersion time of the test piece was changed to 60 sec. Using the body, the same pretreatment and plating treatment as in Example 1 were performed. Therefore, the description of these processes will be omitted.

実施例11では、実施例7と同様に、第1酸処理工程の条件(酸液の酸濃度、浸漬時間)を変更させた場合に、めっき皮膜の密着性及び外観に及ぼされる影響について確認を行った。この確認を行った結果を表3に示す。 In Example 11, as in Example 7, when the conditions of the first acid treatment step (acid concentration of the acid solution, immersion time) were changed, the effect on the adhesion and appearance of the plating film was confirmed. went. The results of this confirmation are shown in Table 3.

実施例11では、試験体に対して行う第1酸処理工程において、酸液の酸濃度を100mL/Lとし、試験体を浸漬させる時間を60secと変化させた以外は、実施例1と同じ試験体を用い、実施例1と同じ前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。 In Example 11, the same test as in Example 1 except that in the first acid treatment step performed on the test piece, the acid concentration of the acid solution was set to 100 mL / L and the immersion time of the test piece was changed to 60 sec. Using the body, the same pretreatment and plating treatment as in Example 1 were performed. Therefore, the description of these processes will be omitted.

実施例12では、実施例7と同様に、第1酸処理工程の条件(酸液の酸濃度、浸漬時間)を変更させた場合に、めっき皮膜の密着性及び外観に及ぼされる影響について確認を行った。この確認を行った結果を表3に示す。 In Example 12, as in Example 7, when the conditions of the first acid treatment step (acid concentration of the acid solution, immersion time) were changed, the effect on the adhesion and appearance of the plating film was confirmed. went. The results of this confirmation are shown in Table 3.

実施例12では、試験体に対して行う第1酸処理工程において、酸液の酸濃度を100mL/Lとし、試験体を浸漬させる時間を300secと変化させた以外は、実施例1と同じ試験体を用い、実施例1と同じ前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。 In Example 12, the same test as in Example 1 except that in the first acid treatment step performed on the test piece, the acid concentration of the acid solution was set to 100 mL / L and the immersion time of the test piece was changed to 300 sec. Using the body, the same pretreatment and plating treatment as in Example 1 were performed. Therefore, the description of these processes will be omitted.

実施例13では、実施例7と同様に、第1酸処理工程の条件(酸液の酸濃度、浸漬時間)を変更させた場合に、めっき皮膜の密着性及び外観に及ぼされる影響について確認を行った。この確認を行った結果を表3に示す。 In Example 13, similarly to Example 7, when the conditions of the first acid treatment step (acid concentration of the acid solution, immersion time) were changed, the effect on the adhesion and appearance of the plating film was confirmed. went. The results of this confirmation are shown in Table 3.

実施例13では、試験体に対して行う第1酸処理工程において、酸液の酸濃度を200mL/Lとし、試験体を浸漬させる時間を30secと変化させた以外は、実施例1と同じ試験体を用い、実施例1と同じ前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。 In Example 13, the same test as in Example 1 except that the acid concentration of the acid solution was set to 200 mL / L and the immersion time of the test body was changed to 30 sec in the first acid treatment step performed on the test body. Using the body, the same pretreatment and plating treatment as in Example 1 were performed. Therefore, the description of these processes will be omitted.

実施例14では、実施例1〜3で得られた結果をふまえ、第2酸処理工程の条件(酸液の酸濃度、浸漬時間)を変更させた場合に、めっき皮膜の密着性及び外観に及ぼされる影響について確認を行った。 In Example 14, based on the results obtained in Examples 1 to 3, when the conditions of the second acid treatment step (acid concentration of the acid solution, immersion time) were changed, the adhesion and appearance of the plating film were improved. We confirmed the impact.

実施例14では、試験体に対して行う第2酸処理工程において、酸液の酸濃度を10mL/Lとし、試験体を浸漬させる時間を600secと変化させた以外は、実施例1と同じ試験体を用い、実施例1と同じ前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。 In Example 14, the same test as in Example 1 except that in the second acid treatment step performed on the test piece, the acid concentration of the acid solution was set to 10 mL / L and the immersion time of the test piece was changed to 600 sec. Using the body, the same pretreatment and plating treatment as in Example 1 were performed. Therefore, the description of these processes will be omitted.

表4には、以上の条件でめっき皮膜の密着性及び外観について確認を行った結果を示す。表4には、実施例14以外にも、実施例15〜20の結果を併せて示す。 Table 4 shows the results of confirming the adhesion and appearance of the plating film under the above conditions. Table 4 shows the results of Examples 15 to 20 in addition to Example 14.

Figure 0006901273
Figure 0006901273

実施例15では、実施例14と同様に、第2酸処理工程の条件(酸液の酸濃度、浸漬時間)を変更させた場合に、めっき皮膜の密着性及び外観に及ぼされる影響について確認を行った。この確認を行った結果を表4に示す。 In Example 15, as in Example 14, it was confirmed that when the conditions of the second acid treatment step (acid concentration of the acid solution, immersion time) were changed, the effect on the adhesion and appearance of the plating film was confirmed. went. The results of this confirmation are shown in Table 4.

実施例15では、試験体に対して行う第2酸処理工程において、酸液の酸濃度を20mL/Lとし、試験体を浸漬させる時間を300secと変化させた以外は、実施例1と同じ試験体を用い、実施例1と同じ前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。 In Example 15, the same test as in Example 1 except that the acid concentration of the acid solution was set to 20 mL / L and the immersion time of the test body was changed to 300 sec in the second acid treatment step performed on the test body. Using the body, the same pretreatment and plating treatment as in Example 1 were performed. Therefore, the description of these processes will be omitted.

実施例16では、実施例14と同様に、第2酸処理工程の条件(酸液の酸濃度、浸漬時間)を変更させた場合に、めっき皮膜の密着性及び外観に及ぼされる影響について確認を行った。この確認を行った結果を表4に示す。 In Example 16, as in Example 14, it was confirmed that when the conditions of the second acid treatment step (acid concentration of the acid solution, immersion time) were changed, the effect on the adhesion and appearance of the plating film was confirmed. went. The results of this confirmation are shown in Table 4.

実施例16では、試験体に対して行う第2酸処理工程において、酸液の酸濃度を20mL/Lとし、試験体を浸漬させる時間を60secと変化させた以外は、実施例1と同じ試験体を用い、実施例1と同じ前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。 In Example 16, the same test as in Example 1 except that in the second acid treatment step performed on the test piece, the acid concentration of the acid solution was set to 20 mL / L and the immersion time of the test piece was changed to 60 sec. Using the body, the same pretreatment and plating treatment as in Example 1 were performed. Therefore, the description of these processes will be omitted.

実施例17では、実施例14と同様に、第2酸処理工程の条件(酸液の酸濃度、浸漬時間)を変更させた場合に、めっき皮膜の密着性及び外観に及ぼされる影響について確認を行った。この確認を行った結果を表4に示す。 In Example 17, as in Example 14, it was confirmed that when the conditions of the second acid treatment step (acid concentration of the acid solution, immersion time) were changed, the effect on the adhesion and appearance of the plating film was confirmed. went. The results of this confirmation are shown in Table 4.

実施例17では、試験体に対して行う第2酸処理工程において、酸液の酸濃度を50mL/Lとし、試験体を浸漬させる時間を60secと変化させた以外は、実施例1と同じ試験体を用い、実施例1と同じ前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。 In Example 17, the same test as in Example 1 except that in the second acid treatment step performed on the test piece, the acid concentration of the acid solution was set to 50 mL / L and the immersion time of the test piece was changed to 60 sec. Using the body, the same pretreatment and plating treatment as in Example 1 were performed. Therefore, the description of these processes will be omitted.

実施例18では、実施例14と同様に、第2酸処理工程の条件(酸液の酸濃度、浸漬時間)を変更させた場合に、めっき皮膜の密着性及び外観に及ぼされる影響について確認を行った。この確認を行った結果を表4に示す。 In Example 18, as in Example 14, it was confirmed that when the conditions of the second acid treatment step (acid concentration of the acid solution, immersion time) were changed, the effect on the adhesion and appearance of the plating film was confirmed. went. The results of this confirmation are shown in Table 4.

実施例18では、試験体に対して行う第2酸処理工程において、酸液の酸濃度を100mL/Lとし、試験体を浸漬させる時間を60secと変化させた以外は、実施例1と同じ試験体を用い、実施例1と同じ前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。 In Example 18, the same test as in Example 1 except that in the second acid treatment step performed on the test piece, the acid concentration of the acid solution was set to 100 mL / L and the immersion time of the test piece was changed to 60 sec. Using the body, the same pretreatment and plating treatment as in Example 1 were performed. Therefore, the description of these processes will be omitted.

実施例19では、実施例14と同様に、第2酸処理工程の条件(酸液の酸濃度、浸漬時間)を変更させた場合に、めっき皮膜の密着性及び外観に及ぼされる影響について確認を行った。この確認を行った結果を表4に示す。 In Example 19, as in Example 14, it was confirmed that when the conditions of the second acid treatment step (acid concentration of the acid solution, immersion time) were changed, the effect on the adhesion and appearance of the plating film was confirmed. went. The results of this confirmation are shown in Table 4.

実施例19では、試験体に対して行う第2酸処理工程において、酸液の酸濃度を100mL/Lとし、試験体を浸漬させる時間を300secと変化させた以外は、実施例1と同じ試験体を用い、実施例1と同じ前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。 In Example 19, the same test as in Example 1 except that in the second acid treatment step performed on the test piece, the acid concentration of the acid solution was set to 100 mL / L and the immersion time of the test piece was changed to 300 sec. Using the body, the same pretreatment and plating treatment as in Example 1 were performed. Therefore, the description of these processes will be omitted.

実施例20では、実施例14と同様に、第2酸処理工程の条件(酸液の酸濃度、浸漬時間)を変更させた場合に、めっき皮膜の密着性及び外観に及ぼされる影響について確認を行った。この確認を行った結果を表4に示す。 In Example 20, as in Example 14, it was confirmed that when the conditions of the second acid treatment step (acid concentration of the acid solution, immersion time) were changed, the effect on the adhesion and appearance of the plating film was confirmed. went. The results of this confirmation are shown in Table 4.

実施例20では、試験体に対して行う第2酸処理工程において、酸液の酸濃度を200mL/Lとし、試験体を浸漬させる時間を30secと変化させた以外は、実施例1と同じ試験体を用い、実施例1と同じ前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。 In Example 20, the same test as in Example 1 except that in the second acid treatment step performed on the test piece, the acid concentration of the acid solution was set to 200 mL / L and the immersion time of the test piece was changed to 30 sec. Using the body, the same pretreatment and plating treatment as in Example 1 were performed. Therefore, the description of these processes will be omitted.

実施例21では、希土類磁石のめっき処理方法として、アルカリ無電解ニッケルめっき処理工程と無電解ニッケルめっき処理工程との2種類の無電解めっき処理を行い、当該アルカリ無電解ニッケルめっき処理工程で用いるめっき浴が、ニッケル塩と有機カルボン酸とを含有したときに得られるめっき皮膜の密着性の確認を行った。 In Example 21, two types of electroless plating treatments, an alkaline electroless nickel plating treatment step and an electroless nickel plating treatment step, are performed as a plating treatment method for the rare earth magnet, and the plating used in the alkali electroless nickel plating treatment step is performed. The adhesion of the plating film obtained when the bath contained the nickel salt and the organic carboxylic acid was confirmed.

この実施例21では、試験体のめっき前処理において、酸活性処理における第1酸処理工程と第2酸処理工程とを共に150秒間実施した以外は、実施例1と同じ試験体を用い、実施例1と同じめっき前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。 In Example 21, the same test body as in Example 1 was used in the pre-plating treatment of the test body, except that both the first acid treatment step and the second acid treatment step in the acid activity treatment were carried out for 150 seconds. The same pre-plating and plating treatments as in Example 1 were performed. Therefore, the description of these processes will be omitted.

表5には、以上の条件でめっき皮膜の密着性について確認を行った結果を示す。表5には、実施例21以外にも、実施例22,23、比較例10の結果を併せて示す。 Table 5 shows the results of confirming the adhesion of the plating film under the above conditions. Table 5 shows the results of Examples 22 and 23 and Comparative Example 10 in addition to Example 21.

Figure 0006901273
Figure 0006901273

実施例22では、実施例21と同様に、希土類磁石のめっき処理方法として、アルカリ無電解ニッケルめっき処理工程と無電解ニッケルめっき処理工程とを行い、当該アルカリ無電解ニッケルめっき処理工程で用いるめっき浴が、ニッケル塩と有機カルボン酸とを含有したときに得られるめっき皮膜の密着性の確認を行った。この確認を行った結果を表5に示す。 In Example 22, similarly to Example 21, an alkali electroless nickel plating treatment step and an electroless nickel plating treatment step are performed as a plating treatment method for the rare earth magnet, and a plating bath used in the alkali electroless nickel plating treatment step is performed. However, the adhesion of the plating film obtained when the nickel salt and the organic carboxylic acid were contained was confirmed. The results of this confirmation are shown in Table 5.

実施例22では、実施例2と同じ試験体を用い、当該試験体のめっき前処理において、酸活性処理における第1酸処理工程と第2酸処理工程とを共に150秒間実施した以外は、実施例1と同じめっき前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。 In Example 22, the same test piece as in Example 2 was used, except that in the plating pretreatment of the test piece, both the first acid treatment step and the second acid treatment step in the acid activity treatment were carried out for 150 seconds. The same pre-plating and plating treatments as in Example 1 were performed. Therefore, the description of these processes will be omitted.

実施例23では、実施例21と同様に、希土類磁石のめっき処理方法として、アルカリ無電解ニッケルめっき処理工程と無電解ニッケルめっき処理工程とを行い、当該アルカリ無電解ニッケルめっき処理工程で用いるめっき浴が、ニッケル塩と有機カルボン酸とを含有したときに得られるめっき皮膜の密着性の確認を行った。この確認を行った結果を表5に示す。 In Example 23, as in Example 21, an alkali electroless nickel plating treatment step and an electroless nickel plating treatment step are performed as a plating treatment method for the rare earth magnet, and a plating bath used in the alkali electroless nickel plating treatment step is performed. However, the adhesion of the plating film obtained when the nickel salt and the organic carboxylic acid were contained was confirmed. The results of this confirmation are shown in Table 5.

実施例23では、実施例3と同じ試験体を用い、当該試験体のめっき前処理において、酸活性処理における第1酸処理工程と第2酸処理工程とを共に150秒間実施した以外は、実施例1と同じめっき前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。 In Example 23, the same test piece as in Example 3 was used, except that in the plating pretreatment of the test piece, both the first acid treatment step and the second acid treatment step in the acid activity treatment were carried out for 150 seconds. The same pre-plating and plating treatments as in Example 1 were performed. Therefore, the description of these processes will be omitted.

実施例24では、実施例21〜23で得られた結果をふまえ、希土類磁石のめっき処理方法として、アルカリ無電解ニッケルめっき処理工程と無電解ニッケルめっき処理工程との2種類の無電解めっき処理を行った場合に、当該アルカリ無電解ニッケルめっき処理工程で用いるめっき浴のpH値がめっき皮膜の析出性及び密着性に及ぼす影響について確認を行った。 In Example 24, based on the results obtained in Examples 21 to 23, two types of electroless plating treatments, an alkali electroless nickel plating treatment step and an electroless nickel plating treatment step, are performed as a plating treatment method for rare earth magnets. When this was done, the effect of the pH value of the plating bath used in the alkaline electroless nickel plating treatment step on the precipitation and adhesion of the plating film was confirmed.

この実施例24では、試験体の無電解めっき処理において、アルカリ無電解ニッケルめっき処理工程で用いるめっき浴のpH値を「8.5」とした以外は、実施例1と同じ試験体を用い、実施例1と同じめっき前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。 In Example 24, in the electroless plating treatment of the test piece, the same test piece as in Example 1 was used except that the pH value of the plating bath used in the alkaline electroless nickel plating treatment step was set to "8.5". The same pre-plating and plating treatments as in Example 1 were performed. Therefore, the description of these processes will be omitted.

表6には、以上の条件で形成したニッケルめっき皮膜の析出性及び密着性について確認を行った結果を示す。表6には、実施例24以外にも、実施例25〜28の結果を併せて示す。ここで、めっき皮膜の析出性の評価は、目視によって行った。めっき皮膜の析出性の評価は、めっきの未析出部分が確認されないものを「○」、一部でもめっきの未析出部分が確認されたものを「△」、めっきの析出部分が殆ど確認されないものを「×」とした。また、めっき皮膜の密着性の評価は、実施例1と同じ条件で評価した。 Table 6 shows the results of confirming the precipitation and adhesion of the nickel plating film formed under the above conditions. Table 6 shows the results of Examples 25 to 28 in addition to Example 24. Here, the evaluation of the precipitation property of the plating film was performed visually. The evaluation of the precipitation property of the plating film is "○" when the unprecipitated part of the plating is not confirmed, "△" when the unprecipitated part of the plating is confirmed even in part, and the precipitated part of the plating is hardly confirmed. Was set to "x". Further, the adhesion of the plating film was evaluated under the same conditions as in Example 1.

Figure 0006901273
Figure 0006901273

実施例25では、実施例24と同様に、希土類磁石のめっき処理方法として、アルカリ無電解ニッケルめっき処理工程と無電解ニッケルめっき処理工程との2種類の無電解めっき処理を行った場合に、当該アルカリ無電解ニッケルめっき処理工程で用いるめっき浴のpH値がめっき皮膜の析出性及び密着性に及ぼす影響について確認を行った。この確認を行った結果を表6に示す。 In Example 25, as in Example 24, when two types of electroless plating treatments, an electroless nickel plating treatment step and an electroless nickel plating treatment step, are performed as the plating treatment method for the rare earth magnet. The effect of the pH value of the plating bath used in the alkaline electroless nickel plating treatment step on the precipitation and adhesion of the plating film was confirmed. The results of this confirmation are shown in Table 6.

この実施例25では、試験体の無電解めっき処理において、アルカリ無電解ニッケルめっき処理工程で用いるめっき浴のpH値を「9.0」とした以外は、実施例1と同じ試験体を用い、実施例1と同じめっき前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。 In Example 25, in the electroless plating treatment of the test piece, the same test piece as in Example 1 was used except that the pH value of the plating bath used in the alkaline electroless nickel plating treatment step was set to "9.0". The same pre-plating and plating treatments as in Example 1 were performed. Therefore, the description of these processes will be omitted.

実施例26では、実施例24と同様に、希土類磁石のめっき処理方法として、アルカリ無電解ニッケルめっき処理工程と無電解ニッケルめっき処理工程との2種類の無電解めっき処理を行った場合に、当該アルカリ無電解ニッケルめっき処理工程で用いるめっき浴のpH値がめっき皮膜の析出性及び密着性に及ぼす影響について確認を行った。この確認を行った結果を表6に示す。 In Example 26, as in Example 24, when two types of electroless plating treatments, an electroless nickel plating treatment step and an electroless nickel plating treatment step, are performed as the plating treatment method for the rare earth magnet. The effect of the pH value of the plating bath used in the alkaline electroless nickel plating treatment step on the precipitation and adhesion of the plating film was confirmed. The results of this confirmation are shown in Table 6.

この実施例26では、試験体の無電解めっき処理において、アルカリ無電解ニッケルめっき処理工程で用いるめっき浴のpH値を「9.5」とした以外は、実施例1と同じ試験体を用い、実施例1と同じめっき前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。 In Example 26, in the electroless plating treatment of the test piece, the same test piece as in Example 1 was used except that the pH value of the plating bath used in the alkaline electroless nickel plating treatment step was set to "9.5". The same pre-plating and plating treatments as in Example 1 were performed. Therefore, the description of these processes will be omitted.

実施例27では、実施例24と同様に、希土類磁石のめっき処理方法として、アルカリ無電解ニッケルめっき処理工程と無電解ニッケルめっき処理工程との2種類の無電解めっき処理を行った場合に、当該アルカリ無電解ニッケルめっき処理工程で用いるめっき浴のpH値がめっき皮膜の析出性及び密着性に及ぼす影響について確認を行った。この確認を行った結果を表6に示す。 In Example 27, as in Example 24, when two types of electroless plating treatments, an electroless nickel plating treatment step and an electroless nickel plating treatment step, are performed as the plating treatment method for the rare earth magnet. The effect of the pH value of the plating bath used in the alkaline electroless nickel plating treatment step on the precipitation and adhesion of the plating film was confirmed. The results of this confirmation are shown in Table 6.

この実施例27では、実施例1と同じ試験体を用い、実施例1と同じめっき前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。実施例27における、アルカリ無電解ニッケルめっき処理工程で用いるめっき浴のpH値は、実施例1と同じく「10.0」である。 In this Example 27, the same test body as in Example 1 was used, and the same pre-plating treatment and plating treatment as in Example 1 were performed. Therefore, the description of these processes will be omitted. The pH value of the plating bath used in the alkaline electroless nickel plating treatment step in Example 27 is "10.0" as in Example 1.

実施例28では、実施例24と同様に、希土類磁石のめっき処理方法として、アルカリ無電解ニッケルめっき処理工程と無電解ニッケルめっき処理工程との2種類の無電解めっき処理を行った場合に、当該アルカリ無電解ニッケルめっき処理工程で用いるめっき浴のpH値がめっき皮膜の析出性及び密着性に及ぼす影響について確認を行った。この確認を行った結果を表6に示す。 In Example 28, as in Example 24, when two types of electroless plating treatments, an electroless nickel plating treatment step and an electroless nickel plating treatment step, are performed as the plating treatment method for the rare earth magnet. The effect of the pH value of the plating bath used in the alkaline electroless nickel plating treatment step on the precipitation and adhesion of the plating film was confirmed. The results of this confirmation are shown in Table 6.

この実施例28では、試験体の無電解めっき処理において、アルカリ無電解ニッケルめっき処理工程で用いるめっき浴のpH値を「10.5」とした以外は、実施例1と同じ試験体を用い、実施例1と同じめっき前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。 In Example 28, in the electroless plating treatment of the test piece, the same test piece as in Example 1 was used except that the pH value of the plating bath used in the alkaline electroless nickel plating treatment step was set to "10.5". The same pre-plating and plating treatments as in Example 1 were performed. Therefore, the description of these processes will be omitted.

比較例Comparative example

[比較例1]
比較例1では、実施例1〜3との対比を行うため、希土類磁石のめっき前処理として、アルカリ脱脂処理工程を行った後に、第1酸処理工程と第2酸処理工程とのいずれか一方の処理を施さないときのめっき皮膜の密着性の確認を行った。この確認を行った結果を表1に示す。
[Comparative Example 1]
In Comparative Example 1, in order to make a comparison with Examples 1 to 3, one of the first acid treatment step and the second acid treatment step is performed after performing the alkaline degreasing treatment step as the plating pretreatment for the rare earth magnet. The adhesion of the plating film was confirmed when the above treatment was not applied. The results of this confirmation are shown in Table 1.

比較例1では、試験体のめっき前処理において、第1酸処理工程を行わないこと以外は、実施例1と同じ試験体を用い、実施例1と同じめっき前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。
[比較例2]
比較例2では、比較例1と同様に、希土類磁石のめっき前処理として、アルカリ脱脂処理工程を行った後に、第1酸処理工程と第2酸処理工程とのいずれか一方の処理を施さないときのめっき皮膜の密着性の確認を行った。この確認を行った結果を表1に示す。
In Comparative Example 1, in the plating pretreatment of the test piece, the same test piece as in Example 1 was used except that the first acid treatment step was not performed, and the same plating pretreatment and plating treatment as in Example 1 were performed. Therefore, the description of these processes will be omitted.
[Comparative Example 2]
In Comparative Example 2, as in Comparative Example 1, after performing the alkaline degreasing treatment step as the plating pretreatment for the rare earth magnet, either the first acid treatment step or the second acid treatment step is not performed. The adhesion of the plating film was confirmed. The results of this confirmation are shown in Table 1.

比較例2では、試験体のめっき前処理において、第2酸処理工程を行わないこと以外は、実施例1と同じ試験体を用い、実施例1と同じめっき前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。 In Comparative Example 2, in the plating pretreatment of the test piece, the same test piece as in Example 1 was used except that the second acid treatment step was not performed, and the same plating pretreatment and plating treatment as in Example 1 were performed. Therefore, the description of these processes will be omitted.

[比較例3]
比較例3では、実施例1〜3との対比を行うため、希土類磁石のめっき前処理として、アルカリ脱脂処理工程を行った後に、第1酸処理工程と第2酸処理工程との2段階で酸活性処理を行った場合に、これら全ての工程の後に超音波水洗によるスマット除去を施さないときのめっき皮膜の密着性の確認を行った。この確認を行った結果を表1に示す。
[Comparative Example 3]
In Comparative Example 3, in order to make a comparison with Examples 1 to 3, after performing an alkaline degreasing treatment step as a plating pretreatment for the rare earth magnet, there are two steps of a first acid treatment step and a second acid treatment step. When the acid activity treatment was performed, the adhesion of the plating film was confirmed when the smut was not removed by ultrasonic water washing after all these steps. The results of this confirmation are shown in Table 1.

比較例3では、試験体のめっき前処理において、アルカリ脱脂処理工程、第1酸処理工程、及び第2酸処理工程の各工程の後に超音波水洗によるスマット除去を施さないこと以外は、実施例1と同じ試験体を用い、実施例1と同じめっき前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。 In Comparative Example 3, in the plating pretreatment of the test piece, the smut was not removed by ultrasonic water washing after each step of the alkaline degreasing treatment step, the first acid treatment step, and the second acid treatment step. Using the same test piece as in No. 1, the same pre-plating treatment and plating treatment as in Example 1 were performed. Therefore, the description of these processes will be omitted.

[比較例4]
比較例4では、比較例3と同様に、希土類磁石のめっき前処理として、アルカリ脱脂処理工程を行った後に、第1酸処理工程と第2酸処理工程との2段階で酸活性処理を行った場合に、これら全ての工程の後に超音波水洗によるスマット除去を施さないときのめっき皮膜の密着性の確認を行った。この確認を行った結果を表1に示す。
[Comparative Example 4]
In Comparative Example 4, similarly to Comparative Example 3, as a pretreatment for plating the rare earth magnet, an alkali degreasing treatment step is performed, and then an acid activity treatment is performed in two steps of a first acid treatment step and a second acid treatment step. In this case, the adhesion of the plating film was confirmed when the smut was not removed by ultrasonic water washing after all these steps. The results of this confirmation are shown in Table 1.

比較例4では、試験体のめっき前処理において、アルカリ脱脂処理工程、及び第1酸処理工程の後に超音波水洗によるスマット除去を施さないこと以外は、実施例1と同じ試験体を用い、実施例1と同じめっき前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。 In Comparative Example 4, in the plating pretreatment of the test piece, the same test piece as in Example 1 was used except that the smut was not removed by ultrasonic water washing after the alkaline degreasing treatment step and the first acid treatment step. The same pre-plating and plating treatments as in Example 1 were performed. Therefore, the description of these processes will be omitted.

[比較例5]
比較例5では、比較例3と同様に、希土類磁石のめっき前処理として、アルカリ脱脂処理工程を行った後に、第1酸処理工程と第2酸処理工程との2段階で酸活性処理を行った場合に、これら全ての工程の後に超音波水洗によるスマット除去を施さないときのめっき皮膜の密着性の確認を行った。この確認を行った結果を表1に示す。
[Comparative Example 5]
In Comparative Example 5, similarly to Comparative Example 3, as a pretreatment for plating a rare earth magnet, an alkali degreasing treatment step is performed, and then an acid activity treatment is performed in two steps of a first acid treatment step and a second acid treatment step. In this case, the adhesion of the plating film was confirmed when the smut was not removed by ultrasonic water washing after all these steps. The results of this confirmation are shown in Table 1.

比較例5では、試験体のめっき前処理において、アルカリ脱脂処理工程の後に超音波水洗によるスマット除去を施さないこと以外は、実施例1と同じ試験体を用い、実施例1と同じめっき前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。 In Comparative Example 5, in the plating pretreatment of the test piece, the same test piece as in Example 1 was used except that the smut was not removed by ultrasonic water washing after the alkaline degreasing treatment step, and the same pre-plating treatment as in Example 1. And plating treatment was performed. Therefore, the description of these processes will be omitted.

[比較例6]
比較例6では、比較例3と同様に、希土類磁石のめっき前処理として、アルカリ脱脂処理工程を行った後に、第1酸処理工程と第2酸処理工程との2段階で酸活性処理を行った場合に、これら全ての工程の後に超音波水洗によるスマット除去を施さないときのめっき皮膜の密着性の確認を行った。この確認を行った結果を表1に示す。
[Comparative Example 6]
In Comparative Example 6, similarly to Comparative Example 3, as a pretreatment for plating a rare earth magnet, an alkali degreasing treatment step is performed, and then an acid activity treatment is performed in two steps of a first acid treatment step and a second acid treatment step. In this case, the adhesion of the plating film was confirmed when the smut was not removed by ultrasonic water washing after all these steps. The results of this confirmation are shown in Table 1.

比較例6では、試験体のめっき前処理において、第1酸処理工程、及び第2酸処理工程の後に超音波水洗によるスマット除去を施さないこと以外は、実施例1と同じ試験体を用い、実施例1と同じめっき前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。 In Comparative Example 6, in the plating pretreatment of the test piece, the same test piece as in Example 1 was used except that the smut was not removed by ultrasonic water washing after the first acid treatment step and the second acid treatment step. The same pre-plating and plating treatments as in Example 1 were performed. Therefore, the description of these processes will be omitted.

[比較例7]
比較例7では、比較例3と同様に、希土類磁石のめっき前処理として、アルカリ脱脂処理工程を行った後に、第1酸処理工程と第2酸処理工程との2段階で酸活性処理を行った場合に、これら全ての工程の後に超音波水洗によるスマット除去を施さないときのめっき皮膜の密着性の確認を行った。この確認を行った結果を表1に示す。
[Comparative Example 7]
In Comparative Example 7, similarly to Comparative Example 3, as a pretreatment for plating a rare earth magnet, an alkali degreasing treatment step is performed, and then an acid activity treatment is performed in two steps of a first acid treatment step and a second acid treatment step. In this case, the adhesion of the plating film was confirmed when the smut was not removed by ultrasonic water washing after all these steps. The results of this confirmation are shown in Table 1.

比較例7では、試験体のめっき前処理において、第1酸処理工程の後に超音波水洗によるスマット除去を施さないこと以外は、実施例1と同じ試験体を用い、実施例1と同じめっき前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。 In Comparative Example 7, in the pre-plating treatment of the test body, the same test body as in Example 1 was used except that the smut was not removed by ultrasonic water washing after the first acid treatment step, and the same pre-plating as in Example 1. Treatment and plating treatment were performed. Therefore, the description of these processes will be omitted.

[比較例8]
比較例8では、比較例3と同様に、希土類磁石のめっき前処理として、アルカリ脱脂処理工程を行った後に、第1酸処理工程と第2酸処理工程との2段階で酸活性処理を行った場合に、これら全ての工程の後に超音波水洗によるスマット除去を施さないときのめっき皮膜の密着性の確認を行った。この確認を行った結果を表1に示す。
[Comparative Example 8]
In Comparative Example 8, similarly to Comparative Example 3, as a pretreatment for plating the rare earth magnet, an alkali degreasing treatment step is performed, and then an acid activity treatment is performed in two steps of a first acid treatment step and a second acid treatment step. In this case, the adhesion of the plating film was confirmed when the smut was not removed by ultrasonic water washing after all these steps. The results of this confirmation are shown in Table 1.

比較例8では、試験体のめっき前処理において、第2酸処理工程の後に超音波水洗によるスマット除去を施さないこと以外は、実施例1と同じ試験体を用い、実施例1と同じめっき前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。 In Comparative Example 8, in the pre-plating treatment of the test body, the same test body as in Example 1 was used except that the smut was not removed by ultrasonic water washing after the second acid treatment step, and the same pre-plating as in Example 1. Treatment and plating treatment were performed. Therefore, the description of these processes will be omitted.

[比較例9]
比較例9では、比較例3と同様に、希土類磁石のめっき前処理として、アルカリ脱脂処理工程を行った後に、第1酸処理工程と第2酸処理工程との2段階で酸活性処理を行った場合に、これら全ての工程の後に超音波水洗によるスマット除去を施さないときのめっき皮膜の密着性の確認を行った。
[Comparative Example 9]
In Comparative Example 9, similarly to Comparative Example 3, as a pretreatment for plating a rare earth magnet, an alkali degreasing treatment step is performed, and then an acid activity treatment is performed in two steps of a first acid treatment step and a second acid treatment step. In this case, the adhesion of the plating film was confirmed when the smut was not removed by ultrasonic water washing after all these steps.

比較例9では、試験体のめっき前処理において、アルカリ脱脂処理工程、及び第2酸処理工程の後に超音波水洗によるスマット除去を施さないこと以外は、実施例1と同じ試験体を用い、実施例1と同じめっき前処理及びめっき処理を行った。そのため、これら処理に関する説明は省略する。 In Comparative Example 9, in the plating pretreatment of the test piece, the same test piece as in Example 1 was used except that the smut was not removed by ultrasonic water washing after the alkaline degreasing treatment step and the second acid treatment step. The same pre-plating and plating treatments as in Example 1 were performed. Therefore, the description of these processes will be omitted.

[比較例10]
比較例10では、実施例21〜23との対比を行うため、希土類磁石のめっき処理方法として、アルカリ無電解ニッケルめっき処理工程を行なわずに無電解ニッケルめっき処理工程のみを行ったときに得られるめっき皮膜の密着性の確認を行った。
[Comparative Example 10]
In Comparative Example 10, in order to make a comparison with Examples 21 to 23, it is obtained when only the electroless nickel plating treatment step is performed without performing the alkali electroless nickel plating treatment step as the plating treatment method for the rare earth magnet. The adhesion of the plating film was confirmed.

比較例10では、試験体として実施例21と同じ希土類磁石を用い、当該試験体のめっき前処理において、実施例21と同じめっき前処理を行った。また、比較例10では、当該試験体のめっき処理において、アルカリ無電解ニッケルめっき工程を行わずに、実施例21と同様の無電解ニッケルめっき処理工程を行った。そのため、これら処理に関する説明は省略する。 In Comparative Example 10, the same rare earth magnet as in Example 21 was used as the test body, and the same pre-plating treatment as in Example 21 was performed in the plating pretreatment of the test body. Further, in Comparative Example 10, in the plating treatment of the test piece, the same electroless nickel plating treatment step as in Example 21 was performed without performing the alkaline electroless nickel plating step. Therefore, the description of these processes will be omitted.

[まとめ]
表1より、希土類磁石のめっき前処理において、アルカリ脱脂処理工程を行った後に、第1酸処理工程と第2酸処理工程との2段階で酸活性処理を行い、これら各工程の後に超音波水洗によるスマット除去を施した実施例1〜3は、クロスカット法に準じてめっき皮膜の密着性の確認を行った結果、試験体のめっき皮膜に全く剥がれは見受けられなかった。これに対して、アルカリ脱脂処理工程を行った後に、第1酸処理工程と第2酸処理工程との2段階で酸活性処理を行わない比較例1,2や、アルカリ脱脂処理工程を行った後に、第1酸処理工程と第2酸処理工程との2段階で酸活性処理を行った場合にこれら全ての工程の後に超音波水洗によるスマット除去を施さない比較例3〜9に関しては、クロスカット法に準じてめっき皮膜の密着性の確認を行った結果、マス目の一部に欠損が見受けられた。以上の結果より、希土類磁石のめっき前処理において、アルカリ脱脂処理工程を行った後に、第1酸処理工程と第2酸処理工程との2段階で酸活性処理を行い、これら各工程の後に超音波水洗によるスマット除去を施すことによって、効果的にめっき皮膜の密着性の向上が図られることが分かった。
[Summary]
From Table 1, in the plating pretreatment of rare earth magnets, after performing the alkaline degreasing treatment step, the acid activity treatment is performed in two steps of the first acid treatment step and the second acid treatment step, and after each of these steps, ultrasonic waves are used. In Examples 1 to 3 in which the smut was removed by washing with water, the adhesion of the plating film was confirmed according to the cross-cut method, and as a result, no peeling was observed in the plating film of the test piece. On the other hand, after performing the alkaline degreasing treatment step, Comparative Examples 1 and 2 in which the acid activity treatment was not performed in two steps of the first acid treatment step and the second acid treatment step, and the alkaline degreasing treatment step were performed. Later, with respect to Comparative Examples 3 to 9 in which the acid activity treatment was performed in two steps of the first acid treatment step and the second acid treatment step and the smut was not removed by ultrasonic water washing after all these steps, the cloth was used. As a result of confirming the adhesion of the plating film according to the cutting method, a defect was found in a part of the grid. Based on the above results, in the pre-plating treatment of rare earth magnets, after performing the alkaline degreasing treatment step, the acid activity treatment is carried out in two steps, the first acid treatment step and the second acid treatment step, and after each of these steps, super It was found that the adhesion of the plating film can be effectively improved by removing the smut by sonic washing.

表2より、上述した超音波水洗において試験体の表面に加える超音波振動の周波数を本件発明に規定する条件(20〜150kHz)とした実施例4〜6は、試験体のめっき皮膜に全く欠陥は見受けられず、クロスカット法に準じてめっき皮膜の密着性の確認を行った結果、試験体のめっき皮膜に全く剥がれは見受けられなかった。以上の結果より、希土類磁石のめっき前処理において、アルカリ脱脂処理、及び酸活性処理を行った後に行う超音波水洗の超音波振動の周波数条件を、本件発明に規定する条件範囲とすることが、めっき皮膜の密着性を向上させる上でより好ましいことが分かった。 From Table 2, Examples 4 to 6 in which the frequency of ultrasonic vibration applied to the surface of the test piece in the above-mentioned ultrasonic water washing was set to the condition (20 to 150 kHz) specified in the present invention were completely defective in the plating film of the test piece. As a result of confirming the adhesion of the plating film according to the cross-cut method, no peeling was observed in the plating film of the test piece. Based on the above results, it is possible to set the frequency condition of ultrasonic vibration of ultrasonic water washing performed after performing alkaline degreasing treatment and acid activity treatment in the pre-plating treatment of rare earth magnets within the condition range specified in the present invention. It was found to be more preferable in improving the adhesion of the plating film.

表3より、上述した第1酸処理工程において、本件発明に規定する酸液の酸濃度の条件(15〜150mL/L)及び酸液中に浸漬させる時間の条件(50〜600秒間)を満たす実施例8〜12は、これらの条件を全て満たさない実施例7,13に比べ、クロスカット法に準じてめっき皮膜の密着性の確認を行った結果、めっき皮膜の密着性及び外観に関し総じて良好な結果が得られた。以上の結果より、希土類磁石のめっき前処理において行う第1酸処理工程に関し、本件発明に規定する条件を満たすことが、希土類磁石の表面に良好な密着性及び外観を有する上でより好ましいことが分かった。 From Table 3, in the above-mentioned first acid treatment step, the condition of the acid concentration of the acid solution (15 to 150 mL / L) and the condition of the time of immersion in the acid solution (50 to 600 seconds) specified in the present invention are satisfied. Compared with Examples 7 and 13 which do not satisfy all of these conditions, Examples 8 to 12 are generally better in terms of adhesion and appearance of the plating film as a result of confirming the adhesion of the plating film according to the cross-cut method. The result was obtained. From the above results, it is more preferable that the conditions specified in the present invention are satisfied in the first acid treatment step performed in the plating pretreatment of the rare earth magnet in order to have good adhesion and appearance on the surface of the rare earth magnet. Do you get it.

表4より、上述した第2酸処理工程において、本件発明に規定する酸液の酸濃度の条件(20〜100mL/L)及び酸液中に浸漬させる時間の条件(30〜600秒間)を満たす実施例15〜19は、これらの条件を全て満たさない実施例14,20に比べ、クロスカット法に準じてめっき皮膜の密着性の確認を行った結果、めっき皮膜の密着性及び外観に関し総じて良好な結果が得られた。以上の結果より、希土類磁石のめっき前処理において行う第2酸処理工程に関し、本件発明に規定する条件を満たすことが、希土類磁石の表面に良好な密着性及び外観を有する上でより好ましいことが分かった。 From Table 4, in the above-mentioned second acid treatment step, the condition of the acid concentration of the acid solution (20 to 100 mL / L) and the condition of the time of immersion in the acid solution (30 to 600 seconds) specified in the present invention are satisfied. Compared with Examples 14 and 20 which do not satisfy all of these conditions, Examples 15 to 19 are generally better in terms of adhesion and appearance of the plating film as a result of confirming the adhesion of the plating film according to the cross-cut method. The result was obtained. From the above results, it is more preferable that the conditions specified in the present invention are satisfied in the second acid treatment step performed in the pre-plating treatment of the rare earth magnet in order to have good adhesion and appearance on the surface of the rare earth magnet. Do you get it.

表5より、希土類磁石のめっき処理において、アルカリ無電解ニッケルめっき処理工程と無電解ニッケルめっき処理工程との2種のめっき処理工程を行うと共に、アルカリ性無電解ニッケルめっき処理液に、ニッケル塩と有機カルボン酸とが含有された実施例21〜23は、クロスカット法に準じてめっき皮膜の密着性の確認を行った結果、試験体のめっき皮膜に全く剥がれは見受けられなかった。これに対し、当該アルカリ無電解ニッケルめっき処理工程を行わない比較例10は、クロスカット法に準じてめっき皮膜の密着性の確認を行った結果、マス目の一部に欠損が見受けられた。以上の結果より、希土類磁石のめっき処理においては、アルカリ無電解ニッケルめっき処理工程と無電解ニッケルめっき処理工程との2種のめっき処理工程を行うと共に、アルカリ性無電解ニッケルめっき処理液に、ニッケル塩と有機カルボン酸とが含有されたものを用いることで、めっき皮膜の安定的形成及び密着性の向上が図られることが分かった。 From Table 5, in the plating treatment of rare earth magnets, two types of plating treatment steps, an alkali electroless nickel plating treatment step and an electroless nickel plating treatment step, are performed, and a nickel salt and an organic substance are added to the alkaline electroless nickel plating treatment liquid. As a result of confirming the adhesion of the plating film in Examples 21 to 23 containing the carboxylic acid according to the cross-cut method, no peeling was observed in the plating film of the test piece. On the other hand, in Comparative Example 10 in which the alkali electroless nickel plating treatment step was not performed, as a result of confirming the adhesion of the plating film according to the cross-cut method, a defect was found in a part of the squares. Based on the above results, in the plating treatment of rare earth magnets, two types of plating treatment steps, an alkaline electroless nickel plating treatment step and a non-electroless nickel plating treatment step, are performed, and a nickel salt is added to the alkaline electroless nickel plating treatment liquid. It was found that the stable formation of the plating film and the improvement of the adhesion can be achieved by using the one containing the organic carboxylic acid and the organic carboxylic acid.

表6より、上述したアルカリ無電解ニッケルめっき処理工程において、用いるめっき浴のpH値の条件(pH9〜10)を満たす実施例25〜27は、この条件を満たさない実施例24,28に比べて試験体表面にニッケルをムラなく十分に析出させることができ、めっき皮膜の析出性に関して良好な結果が得られた。以上の結果より、希土類磁石のめっき処理において用いるアルカリ性無電解ニッケルめっき処理液に関し、本件発明に規定する条件を満たすことが、希土類磁石の表面にめっき皮膜をムラなく安定的に析出させる上でより好ましいことが分かった。 From Table 6, in Examples 25 to 27 that satisfy the pH value condition (pH 9 to 10) of the plating bath used in the above-mentioned alkaline electroless nickel plating treatment step, compared with Examples 24 and 28 that do not satisfy this condition. Nickel could be sufficiently deposited on the surface of the test piece evenly, and good results were obtained regarding the precipitation property of the plating film. Based on the above results, regarding the alkaline electroless nickel plating treatment liquid used in the plating treatment of rare earth magnets, satisfying the conditions specified in the present invention is more necessary for the plating film to be evenly and stably deposited on the surface of the rare earth magnets. It turned out to be preferable.

本件発明に係る希土類磁石のめっき前処理方法によって、密着性や外観が良好で、耐食性に優れた金属めっき皮膜を表面に有する希土類磁石が得られる。この希土類磁石は、このような利点を有することから、各種用途に使用され、特に電気、電子機器の分野で好適に使用される。 According to the method for pre-plating a rare earth magnet according to the present invention, a rare earth magnet having a metal plating film having good adhesion and appearance and excellent corrosion resistance can be obtained. Since this rare earth magnet has such an advantage, it is used for various purposes, and is particularly preferably used in the fields of electric and electronic devices.

Claims (7)

無電解めっき又は電解めっきにより希土類磁石の表面に金属皮膜を形成する際の希土類磁石のめっき前処理方法であって、
アルカリ脱脂処理工程を行った後に、少なくとも第1酸処理工程と第2酸処理工程との2段階で酸活性処理を行い、これら各工程の後に、20〜150kHzの超音波振動を加えた20〜50℃の水に当該希土類磁石の被めっき面を1〜5分間接触させる超音波水洗によるスマット除去を施すことを特徴とする希土類磁石のめっき前処理方法。
A pretreatment method for rare earth magnets when forming a metal film on the surface of rare earth magnets by electroless plating or electrolytic plating.
After performing the alkaline degreasing treatment step, the acid activity treatment was carried out in at least two steps of the first acid treatment step and the second acid treatment step, and after each of these steps, ultrasonic vibration of 20 to 150 kHz was applied 20 to 20 to A pretreatment method for plating a rare earth magnet, which comprises removing smut by ultrasonic water washing in which the surface to be plated of the rare earth magnet is brought into contact with water at 50 ° C. for 1 to 5 minutes.
前記第1酸処理工程は、前記希土類磁石の被めっき面を、硝酸、硫酸、塩酸、及びリン酸若しくはこれらの塩のうち1種又は2種を含み且つ酸濃度が15〜150mL/Lの酸液中に50〜600秒間浸漬させる請求項1に記載の希土類磁石のめっき前処理方法。 In the first acid treatment step, the surface to be plated of the rare earth magnet contains one or two of nitric acid, sulfuric acid, hydrochloric acid, and phosphoric acid or salts thereof, and the acid concentration is 15 to 150 mL / L. The pretreatment method for plating a rare earth magnet according to claim 1, wherein the rare earth magnet is immersed in a liquid for 50 to 600 seconds. 前記第2酸処理工程は、前記希土類磁石の被めっき面を、硝酸、硫酸、塩酸、及びリン酸若しくはこれらの塩のうち1種又は2種を含み且つ酸濃度が20〜100mL/Lの酸液中に30〜600秒間浸漬させる請求項1又は請求項2に記載の希土類磁石のめっき前処理方法。 In the second acid treatment step, the surface to be plated of the rare earth magnet contains one or two of nitric acid, sulfuric acid, hydrochloric acid, and phosphoric acid or salts thereof, and the acid concentration is 20 to 100 mL / L. The pretreatment method for plating a rare earth magnet according to claim 1 or 2 , wherein the rare earth magnet is immersed in a liquid for 30 to 600 seconds. 請求項1〜請求項のいずれかに記載のめっき前処理方法で処理された希土類磁石の表面に無電解めっき処理により金属皮膜を形成する際の希土類磁石のめっき処理方法であって、
2種のめっき処理工程を備え、
当該2種のめっき処理工程は、アルカリ無電解ニッケルめっき処理工程と無電解ニッケルめっき処理工程であり、
当該アルカリ無電解ニッケルめっき処理工程で用いるめっき浴が、ニッケル塩と、有機カルボン酸及び/又はその塩とを含有することを特徴とする希土類磁石のめっき処理方法。
A method for plating a rare earth magnet when forming a metal film on the surface of the rare earth magnet treated by the plating pretreatment method according to any one of claims 1 to 3 by electroless plating.
Equipped with two types of plating processes
The two types of plating treatment steps are an alkaline electroless nickel plating treatment step and an electroless nickel plating treatment step.
A method for plating a rare earth magnet, wherein the plating bath used in the alkali electroless nickel plating treatment step contains a nickel salt and an organic carboxylic acid and / or a salt thereof.
前記めっき浴は、更に還元剤及び安定剤を含有し、pHが9〜10である請求項に記載の希土類磁石のめっき処理方法。 The method for plating a rare earth magnet according to claim 4 , wherein the plating bath further contains a reducing agent and a stabilizer and has a pH of 9 to 10. 前記還元剤がリン酸及び/又はその塩であり、前記安定剤が硝酸鉛である請求項に記載の希土類磁石のめっき処理方法。 The method for plating a rare earth magnet according to claim 5 , wherein the reducing agent is phosphoric acid and / or a salt thereof, and the stabilizer is lead nitrate. 前記有機カルボン酸がクエン酸である請求項〜請求項のいずれかに記載の希土類磁石のめっき処理方法。 The method for plating a rare earth magnet according to any one of claims 4 to 6 , wherein the organic carboxylic acid is citric acid.
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