JP6893838B2 - Implant surface structure and method of manufacturing implant surface structure - Google Patents

Description

The present invention relates to the surface structure of an implant and a method for manufacturing the surface structure of an implant.

In recent years, metal implants have been widely used at joints with bone tissue. As an implant used for a joint site with bone tissue, for example, a groove or a hole is formed on the surface of a base material made of titanium metal or a titanium alloy at the joint site with the bone tissue, and the inner surface of the groove or hole is oxidized. Bone-affinity implants having a physical coating have been proposed (see, for example, Patent Document 1). In the bone-affinity implant, polishing is performed to smooth the surface of a portion other than the groove or hole. According to the above-mentioned bone affinity implant, hydroxyapatite is likely to be formed inside the groove or hole.

JP-A-2007-159685

By the way, bone repeats metabolism called remodeling. In remodeling, osteoclasts break bone and osteoblasts produce new bone. In the process of new bone formation, osteoblasts express and secrete bone matrix proteins such as collagen. Calcium carried through the blood adheres to the bone matrix protein as hydroxyapatite, and new bone is generated. Therefore, multiple blood circulation pathways through which blood circulates between the bone tissue and the implant are required so that calcium is transported towards the substrate protein.

In the above-mentioned bone-affinity implant, since the surface of the portion other than the groove or hole is smooth, a blood circulation passage is not always conveniently formed between the bone tissue and the implant.

In view of such circumstances, the present invention provides a surface structure of an implant in which a large number of blood circulation passages are formed with the bone tissue and can be firmly engaged with the bone tissue, and a method for manufacturing the surface structure of the implant. It is something to try.

The present invention has been made to solve the above problems, and the surface structure of the implant of the present invention includes a plurality of concave recesses formed on the surface of the implant and a plurality of recessed portions protruding from the surface of the implant. The at least one recess has a peripheral edge that constitutes its own peripheral edge and is adjacent to at least a portion of the surface of the implant along the first alignment direction. As described above, the recesses are adjacent to the first row having at least three consecutive recesses along the second arrangement direction, which is a direction having an angle θ larger than 0 ° and less than 180 ° with respect to the first arrangement direction. A plurality of second rows in which the recesses are continuous at least three are included so as to fit, and the recesses adjacent to each other in the first row and the second row overlap each other, and the recesses are overlapped in the first row and in the first row. Adjacent recesses between the peripheral edge of the boundary between adjacent recesses in the second row, between the plurality of first rows, and between the plurality of second rows. The peripheral edge portion of the boundary portion is composed of a common peripheral edge portion which is a common peripheral edge portion, and each of the plurality of common peripheral edge portions is the recessed portion on one side of the recessed space side of the recessed portion on one side. The dented portion side on the one side becomes perpendicular to the depth direction of the dented portion on the one side as it advances from the inside to the outside of the dented portion on the one side in the depth direction of the portion. On the expansion surface extending from the inside to the outside of the recess on one side in the surface direction of, and on the concave space side of the recess on the other side, the other in the depth direction of the recess on the other side. The other side in the surface direction of the other side, which is perpendicular to the depth direction of the other side, as it advances from the inside to the outside of the dent on the side. It has a recessed side burr surface that advances in a direction toward the center side of the recessed portion, and a space is formed between the recessed portion side burr surface and the peripheral surface of the recessed portion on the other side. It is a feature.

Further, in the surface structure of the implant of the present invention, at least one of the recessed portions is provided on at least a peripheral portion constituting its own peripheral edge and at least a part of the surface of the peripheral edge portion on the concave space side of the recessed portion. An extension extending from the inside to the outside of the recess in the depth direction of the recess and in a plane direction perpendicular to the depth of the recess from the inside to the outside. It is characterized by having a surface and.

Further, in the surface structure of the implant of the present invention, at least one of the recessed portions is provided on at least a part of the surface of the peripheral edge portion on the concave space side of the recessed portion, and the recessed portion is described in the depth direction. It is characterized by having a recessed portion side burr surface that advances in the direction toward the center of the recessed portion in the surface direction as it advances from the inside to the outside of the recessed portion.

Further, in the surface structure of the implant of the present invention, the expansion surface is formed in at least a part of the first circumferential direction range, which is a part of the circumferential direction of the peripheral portion, and the recessed side burr surface is formed. It is characterized in that it is formed in at least a part of a second circumferential range, which is a part of the peripheral portion in the circumferential direction other than the first circumferential range.

Further, in the surface structure of the implant of the present invention, the plurality of the recessed portions include a first recessed portion and a second recessed portion, and the first recessed portion and the second recessed portion are adjacent to each other and described above. The peripheral edge portion of the boundary portion between the first recessed portion and the second recessed portion is composed of the common peripheral edge portion (hereinafter, referred to as the first common peripheral edge portion), and the first of the first common peripheral edge portions. The surface on the recessed side has the expanded surface.

Further, in the surface structure of the implant of the present invention, the surface of the first common peripheral edge portion on the second recess side has a burr surface on the recess side.

Further, in the surface structure of the implant of the present invention, in the plurality of the recessed portions, the first recessed portion and the second recessed portion, as well as the first recessed portion and the second recessed portion are arranged in the first arrangement direction. The third recess is included, the second recess and the third recess are adjacent to each other, and the peripheral edge of the boundary between the second recess and the third recess is a peripheral portion. It is characterized in that it is composed of the common peripheral edge portion (hereinafter, referred to as a second common peripheral edge portion), and the surface of the second common peripheral edge portion on the side of the second recessed portion has the expansion surface.

Further, in the surface structure of the implant of the present invention, the surface of the second common peripheral edge portion on the third recess side has a burr surface on the recess side.

Further, in the surface structure of the implant of the present invention, at least a part of the plurality of recessed portions has an angle θ (0 ° <θ <180 °) with respect to the first arrangement direction, which is the second arrangement direction. It is characterized in that it is arranged along.

Further, in the surface structure of the implant of the present invention, the angle θ is characterized by being approximately 90 °.

Further, in the surface structure of the implant of the present invention, at least a part of the plurality of recesses arranged in the first arrangement direction and / or the second arrangement direction is arranged in a scaly shape. ..

Further, in the surface structure of the implant of the present invention, the peripheral portion has a portion formed in a wavy and / or pleated shape.

Further, in the surface structure of the implant of the present invention, the surface of the implant has a specific region provided with an osteoblast-accommodating recess, which is a recess having a size capable of accommodating osteoblasts. The specific region is characterized in that the number of the osteoblast-accommodating recesses provided per unit area of 1 mm ^{2 is approximately 200 (pieces / mm 2} ) or more.

Further, in the surface structure of the implant of the present invention, when the recessed portion is viewed in a plan view, the maximum width of the recessed portion in a direction perpendicular to the virtual line having the maximum length in the recessed portion is defined as a diagonal width. When the area of the recess is defined as the plane area of the recess when the recess is viewed in a plan view, the surface of the implant has a diagonal width of about 20 μm or more and a plane area of the recess of about 300 μm ^2. It has a specific area in which the first condition-matching recess, which is the above-mentioned recess, is provided, and in the specific area, the number of the first condition-matching recesses provided per ^{unit area of 1 mm 2 is approximately 200 (pieces).} It is characterized by being / mm ^{2) or more.}

Further, in the surface structure of the implant of the present invention, when the area of the recessed portion when the recessed portion is viewed in a plan view is defined as the planar area of the recessed portion, the surface of the implant has a size capable of accommodating osteoblasts. It has a specific area in which the osteoblast-accommodating recess is provided, and in the specific area, the occupancy rate of the flat area of the osteoblast-accommodating recess is approximately 20% or more. It is a feature.

Further, in the surface structure of the implant of the present invention, when the recessed portion is viewed in a plan view, the maximum width of the recessed portion in a direction perpendicular to the virtual line having the maximum length in the recessed portion is defined as a diagonal width. When the area of the recess is defined as the plane area of the recess when the recess is viewed in a plan view, the surface of the implant has a diagonal width of about 20 μm or more and a plane area of the recess of about 300 μm ^2. It has a specific area in which the first condition-matching recess is provided, and in the specific area, the occupancy rate of the flat area of the recess of the first condition-matching recess is approximately 20% or more. And.

Further, in the surface structure of the implant of the present invention, the surface of the implant has a specific region in which a recess having the same size as the osteoblast, which is a recess having substantially the same size as the osteoblast, is provided. The region is characterized in that the number of the osteoblast-same-sized depressions provided per ^{unit area of 1 mm 2 is approximately 35 (pieces / mm 2} ) or more.

Further, in the surface structure of the implant of the present invention, when the recessed portion is viewed in a plan view, the maximum width of the recessed portion in a direction perpendicular to the virtual line having the maximum length in the recessed portion is defined as a diagonal width. When the area of the recessed portion when the recessed portion is viewed in a plan view is defined as the planar area of the recessed portion, the surface of the implant has a diagonal width of approximately 20 to 30 μm and the planar area of the recessed portion. has a specific area in which the second condition matching recess is provided which is the recess which is in the range of between about 300～750Myuemu ^2, wherein in the specific area, the second condition matches provided a unit area 1 mm ² per It is characterized in that the number of recessed portions is approximately 35 (pieces / mm ^{2) or more.}

Further, in the surface structure of the implant of the present invention, when the area of the recessed portion when the recessed portion is viewed in a plan view is defined as the plane area of the recessed portion, the surface of the implant has substantially the same size as osteoblasts. It has a specific area in which the osteoblast same size recess is provided, and in the specific area, the occupancy rate of the flat area of the osteoblast same size recess is approximately 1.5% or more. It is characterized by.

Further, in the surface structure of the implant of the present invention, when the recessed portion is viewed in a plan view, the maximum width of the recessed portion in a direction perpendicular to the virtual line having the maximum length in the recessed portion is defined as a diagonal width. When the area of the recessed portion is defined as the planar area of the recessed portion when the recessed portion is viewed in a plan view, the surface of the implant has a diagonal width of approximately 20 to 30 μm and the planar area of the recessed portion. It has a specific area in which the second condition-matching recess is provided within a range of approximately 300 to 750 μm ² , and in the specific area, the occupancy rate of the flat area of the recess of the second condition-matching recess is It is characterized by being about 1.5% or more.

Further, in the surface structure of the implant of the present invention, the protruding portion includes a base portion protruding from the surface of the implant and a head provided on the distal end side of the base portion, and the head portion has the base portion. In the vicinity of the boundary, it is characterized by having a protruding portion burr surface that goes outward in a direction perpendicular to the protruding direction as it advances in the protruding direction that is the direction from the base toward the head.

Further, in the surface structure of the implant of the present invention, at least a part of the surface of the head is formed by a curved surface.

Further, in the surface structure of the implant of the present invention, the head is formed to be substantially spherical.

Further, the surface structure of the implant of the present invention includes a plurality of concave recesses formed on the surface of the implant, and at least one of the recesses is a peripheral edge constituting its own peripheral edge and the recessed portion. Provided on at least a part of the surface of the peripheral edge portion on the concave space side, the direction from the inside to the outside of the recessed portion in the depth direction of the recessed portion, and perpendicular to the depth direction of the recessed portion. An expansion surface extending from the inside to the outside of the recess in the direction of the surface and at least one of the recesses are provided on at least a part of the surface of the peripheral edge of the recess on the concave space side. It is characterized by having a recessed portion side burr surface that advances in the direction from the inside to the outside of the recessed portion in the depth direction of the recessed portion in the direction toward the center side of the recessed portion in the surface direction. ..

Further, in the surface structure of the implant of the present invention, the implant is a dental implant.

Further, the method for manufacturing the surface structure of the implant of the present invention is the method for manufacturing the surface structure of the implant according to any one of the above, in which electrical energy is applied to a minute region on the surface of the implant to dissolve the minute region. It is characterized in that the surface structure of the implant is formed by performing a surface processing treatment for the implant.

Further, in the method for manufacturing the surface structure of an implant of the present invention, the surface processing is characterized by wire electric discharge machining.

According to the surface structure of the implant of the present invention, a large number of blood circulation passages are formed between the implant and the bone tissue, and the implant can have an excellent effect of being able to be firmly engaged with the bone tissue.

It is a photograph of the secondary electron image (SEI) (photographing magnification: 250 times) of the surface of the dental implant in the first embodiment of the present invention. (A) is a plan schematic view of the recessed portion 2A on the surface of the dental implant according to the first embodiment of the present invention. (B) is a schematic cross-sectional view taken along the line AA of the recessed portion 2A on the surface of the dental implant according to the first embodiment of the present invention. (C) and (D) are views showing the vicinity of the peripheral edge of the recessed portion 2A on the surface of the dental implant according to the first embodiment of the present invention. It is a photograph of the secondary electron image (SEI) (photographing magnification: 1500 times) of the portion near the peripheral edge of the recessed portion 2A on the surface of the dental implant in the first embodiment of the present invention. (A) and (B) are schematic cross-sectional views of a modified example of the recessed portion 2A on the surface of the dental implant according to the first embodiment of the present invention. It is a figure which shows the appearance that the osteoblast of the bone tissue in the mouth was accommodated in the recess part of the dental implant in the 1st Embodiment of this invention. (A) is a plan view of three recesses arranged side by side on the surface of the dental implant according to the first embodiment of the present invention. (B) is a schematic cross-sectional view taken along the line BB of three recesses arranged on the surface of the dental implant according to the embodiment of the present invention. (C) is a figure which shows the vicinity of the peripheral edge of the recess 2B on the surface of the dental implant in the 1st Embodiment of this invention. It is a photograph of a secondary electron image (photographing magnification: 500 times) of a region including three side-by-side recesses on the surface of a dental implant according to the first embodiment of the present invention. (A) is a plan schematic view which shows the first circumferential direction range and the second circumferential direction range of the recessed part of the surface of the dental implant in the 1st Embodiment of this invention. (B) is a schematic plan view showing a modification of the first circumferential range and the second circumferential range of the recessed portion on the surface of the dental implant according to the first embodiment of the present invention. It is a figure which shows the appearance that the osteoblast of the bone tissue in the mouth of a patient was accommodated in the three side-by-side recesses of the dental implant in the 1st Embodiment of this invention. (A) is a schematic plan view of three recesses arranged in each of the first arrangement direction and the second arrangement direction perpendicular to the first arrangement direction on the surface of the dental implant according to the first embodiment of the present invention. Is. (B) is a plane of three recesses arranged in each of the first arrangement direction and the second arrangement direction forming an angle θ with the first arrangement direction on the surface of the dental implant according to the first embodiment of the present invention. It is a schematic diagram. (A) is a schematic plan view of a plurality of recesses arranged according to the arrangement of the first recesses in the first embodiment of the present invention. (B) is a schematic plan view of a plurality of recesses arranged according to the arrangement of the second recesses in the first embodiment of the present invention. (A) is a schematic plan view of a plurality of recesses arranged according to the arrangement of the third recesses in the first embodiment of the present invention. (B) is a schematic plan view of a plurality of recesses arranged according to the arrangement of the fourth recesses in the first embodiment of the present invention. It is a photograph of the secondary electron image (photographing magnification: 1500 times) of the portion including the protrusion on the surface of the dental implant in the first embodiment of the present invention. It is a side schematic of the protrusion of the surface of the dental implant in the 1st Embodiment of the invention. (A) is a cross-sectional view showing an example of a state in which new bone tissue is formed on the surface of a dental implant according to the first embodiment of the invention. (B) is a cross-sectional view showing how an external force is applied to a new bone tissue formed around the protrusion. (A) is a photograph of a secondary electron image (photographing magnification: 200 times) on the surface of the dental implant according to the second embodiment of the present invention. (B) is a second surface structure analysis photograph on the surface of the dental implant according to the second embodiment of the present invention. It is a figure for demonstrating the diagonal width used as a boundary condition in the preparation of the 2nd surface structure analysis photograph. (A) is a table showing the analysis result of the first condition-matching recessed portion on the surface of the dental implant in the second to fifth embodiments of the present invention. (B) is a table showing the analysis results of the second condition-matching recessed portion on the surface of the dental implant in the second to fifth embodiments of the present invention. (A) is a photograph of a secondary electron image (photographing magnification: 100 times) on the surface of the dental implant according to the third embodiment of the present invention. (B) is a third surface structure analysis photograph on the surface of the dental implant according to the third embodiment of the present invention. (A) is a photograph of a secondary electron image (photographing magnification: 150 times) on the surface of the dental implant according to the fourth embodiment of the present invention. (B) is a fourth surface structure analysis photograph on the surface of the dental implant according to the fourth embodiment of the present invention. (A) is a photograph of a secondary electron image (photographing magnification: 150 times) on the surface of the dental implant according to the fifth embodiment of the present invention. (B) is a fifth surface structure analysis photograph on the surface of the dental implant according to the fifth embodiment of the present invention.

Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. The implant of the present invention is mainly intended to be in contact with bone tissue, and can be applied to all parts of the human body. That is, the implant of the present invention can be applied to any of, for example, dental implants used in dental treatment, implants for osteopathy, and all other implants that come into contact with bone tissue. In the following, a case where the implant of the present invention is a dental implant will be described as an example. The following description of dental implants is also applicable to other implants.

<First Embodiment>
<First surface structure of dental implant>
The first surface structure 100 of the dental implant 1 according to the first embodiment of the present invention will be described with reference to FIG. As shown in FIG. 1, the first surface structure 100 of the dental implant 1 includes a plurality of recesses 2 formed on the surface 1A of the dental implant 1 and a plurality of protrusions 3 protruding from the surface 1A of the dental implant 1. To be equipped.

<Materials for dental implants>
The material of the dental implant 1 in the first embodiment of the present invention may be any material having biocompatibility. Examples of the biocompatible material include titanium, titanium alloy, cobalt-chromium alloy, cobalt-chromium-molybdenum alloy, stainless steel and the like. Titanium is preferable as the material of the dental implant 1, and titanium alloy is more preferable from the viewpoint of strength and biocompatibility. As the titanium alloy, for example, a titanium alloy containing at least one of tantalum, aluminum, vanadium, zirconium, niobium, palladium, and molybdenum is preferable.

<Dent>
Those having various forms are mixed in the plurality of recessed portions 2. As shown in FIG. 1, the plurality of recessed portions 2 are referred to as, for example, a recessed portion 2A having a shape that extends radially or in an umbrella shape as a whole, or a concave portion 2A that has a shape that extends radially or in an umbrella shape (hereinafter, referred to as an extended portion). ) And the recessed portions 2B and 2C in which the portion extending to the central side of the self (hereinafter, referred to as the extending portion on the central side) coexists. Hereinafter, the recessed portion 2A and the recessed portions 2B and 2C will be described.

<Dent 2A>
First, the recessed portion 2A will be described with reference to FIGS. 2 to 4.

<Concave space of recess 2A>
As shown in FIG. 2B, the recessed portion 2A forms a concave concave space 12 on the surface 1A of the dental implant 1. The concave space 12 of the recessed portion 2A is formed by being surrounded by the peripheral surface 13 of the recessed portion 2A. The peripheral surface 13 has a shape that extends radially or in an umbrella shape from the substantially center 20A of the recessed portion 2A.

A plurality of recesses 2A are formed on the surface 1A of the dental implant 1. The concave space 12 of the recessed portion 2A is a mixture of those having various sizes. It is preferable that the concave space 12 contains osteoblasts. The size of the diameter of osteoblasts is about 20 to 30 μm. Therefore, the diameter of the concave space 12 may be larger than the diameter of the osteoblast (about 20 to 30 μm). However, it is difficult to obtain the adhesiveness of osteoblasts in the concave space 12 whose diameter is too large compared to the diameter of the osteoblasts, such as the concave space 12 having a diameter of about 200 μm or more. Therefore, the diameter of the concave space 12 is preferably, for example, about 200 μm or less, more preferably about 20 to 50 μm capable of accommodating osteoblasts, and about about 20 to about the same as the size of the diameter of osteoblasts. Most preferably about 30 μm.

<Peripheral part of recess 2A>
The recessed portion 2A has a peripheral edge portion 14 and a first expansion surface 15. The peripheral edge portion 14 is a portion constituting the peripheral edge of the recessed portion 2A. The peripheral edge portion 14 has various aspects. The peripheral edge portion 14 is, for example, as shown in the left side portion of FIG. 2B, in the depth direction from the surface (hereinafter referred to as the adjacent surface) 1B of the dental implant 1 adjacent to the recessed portion 2A to the recessed portion 2A. It may be an embodiment extending from the tip of the protruding base end portion 16 projecting from the inside to the outside of the recessed portion 2A. The left side portion of FIG. 2 (B) and the peripheral portion 14 shown in FIG. 2 (C) are formed, for example, as shown in the photograph of the secondary electron image (SEI) (photographing magnification: 1500 times) of FIG. ..

Further, as shown in the right side portion of FIG. 2B, for example, the peripheral edge portion 14 projects from the adjacent surface 1B of the dental implant 1 in the depth direction of the recessed portion 2A from the inside to the outside of the recessed portion 2A. It may be in the mode of The difference between the left and right peripheral edges 14 in FIG. 2B is the difference in the degree of height protruding from the surface 1A of the dental implant 1.

Further, the peripheral edge portion 14 may be in a form slightly raised from the adjacent surface 1B of the dental implant 1, for example, as shown in the left side portion of FIG. 4 (A). In this case, the peripheral edge portion 14 extends in the depth direction of the recessed portion 2A so as to straddle the adjacent surface 1B of the dental implant 1. Further, as shown in the right side portion of FIG. 4A, for example, the peripheral edge portion 14 is in the direction from the outside to the inside of the recessed portion 2A in the depth direction of the recessed portion 2A with respect to the adjacent surface 1B of the dental implant 1. It may be a mode to be formed.

Then, as shown in FIG. 2A, at least a part of the peripheral edge portion 14 is formed in a wavy shape and / or a fold shape along its own circumferential direction. When the vicinity of the peripheral edge portion 14 is formed in a wavy and / or pleated shape, a bag-like space is formed in that portion. Even if the dental implant 1 and the bone tissue are brought into contact with each other, the bone tissue does not enter the bag-shaped space, so that the bag-shaped space can function as a blood circulation passage.

The first expansion surface 15 is a surface of the peripheral edge portion 14 on the concave space 12 side (hereinafter, referred to as a concave space side peripheral surface). Then, as shown in FIG. 2B, the first expansion surface 15 is directed from the inside to the outside of the recessed portion 2A in the depth direction of the recessed portion 2A and with respect to the depth direction of the recessed portion 2A. It extends from the inside to the outside of the recess 2A in the plane direction at a right angle.

For example, as shown in FIGS. 2B and 2C, when the depth direction of the recess 2A is the Y axis and the predetermined surface direction is the X axis, the first expansion surface 15 is along the X axis. The direction of the composite vector 15C, which is the sum of the first vector 15A in the direction from the inside to the outside of the recess 2A and the second vector 15B in the direction from the inside to the outside of the recess 2A along the Y axis (hereinafter). , Called the first tilt direction.) The first inclination direction is various directions depending on the size of the first vector 15A and the second vector 15B, and includes all possible directions within the range.

As shown in the right side portion of FIG. 4B, the peripheral surface on the concave space side is not the first expansion surface 15, but the direction from the inside to the outside of the recess 2A in the depth direction of the recess 2A. There may be a portion where the extending depth direction vertical surface 19 is provided.

Further, as shown in FIG. 2B, even if the second expansion surface 17 is formed on the surface of the peripheral edge portion 14 on the opposite side of the concave space 12 (hereinafter, referred to as the peripheral surface on the anti-concave space side). Good. Similar to the first expansion surface 15, the second expansion surface 17 is in the direction from the inside to the outside of the recess 2A in the depth direction of the recess 2A, and the recess 2A, as shown in FIG. 2 (B). Extends from the inside to the outside of the recess 2A in the plane direction perpendicular to the depth direction of.

For example, as shown in FIG. 2D, when the depth direction of the recessed portion 2A is the Y axis and the predetermined surface direction is the X axis, the second expansion surface 17 is the recessed portion 2A along the X axis. The direction of the composite vector 17C, which is the sum of the first vector 17A in the direction from the inside to the outside and the second vector 17B in the direction from the inside to the outside of the recess 2A along the Y axis (hereinafter, the second inclination). It extends in the direction.) The second inclination direction is various directions depending on the sizes of the first vector 17A and the second vector 17B, and includes all possible directions within the range.

Then, the second expansion surface 17 and the adjacent surface 1B of the dental implant 1 overlap each other in a plan view from the depth direction of the recessed portion 2A. A space E is formed between the second expansion surface 17 and the adjacent surface 1B of the dental implant 1 at the overlapping portion.

The protruding base end expansion surface 18 may be formed on the surface of the protruding base end portion 16 on the side opposite to the concave space 12. The protruding base end expansion surface 18 extends in the second inclined direction, similarly to the second expansion surface 17. However, the second inclination direction of the protruding base end expansion surface 18 and the second expansion surface 17 may be the same or different as long as the second inclination direction is within the range of possible directions.

Then, the protruding base end expansion surface 18 and the adjacent surface 1B of the dental implant 1 overlap each other in a plan view from the depth direction of the recessed portion 2A. A space F is formed between the protruding base end expansion surface 18 and the adjacent surface 1B of the dental implant 1 at the overlapping portion.

<Role of recess 2A and spaces E and F>
The roles of the recessed portion 2A and the spaces E and F will be described with reference to FIG. As shown in FIG. 5, when the dental implant 1 is attached to the bone tissue 4 in the patient's mouth so as to abut, the osteoblasts 5 of the bone tissue 4 are housed in the recess 2A. The gap between the osteoblast 5 and the recess 2A and the spaces E and F function as blood circulation passages. Calcium is carried by the blood flowing through the blood circulation passages. Calcium forms hydroxyapatite and attaches to the bone matrix protein expressed and secreted from osteoblast 5, and new bone is generated.

Since the surface of a conventional dental implant is smooth, there is a possibility that a sufficient gap cannot be formed between the osteoblast 5 and the recess 2A depending on the shape of the bone tissue 4, and a blood circulation passage may not be formed. There is. On the other hand, according to the dental implant 1 of the present embodiment, even if a sufficient gap cannot be obtained between the osteoblast 5 and the recess 2A, the space E, F or the space E as a blood circulation passage is always secured. Therefore, a blood circulation passage can be surely secured for each osteoblast 5. As a result, calcium is uniformly attached to the bone matrix protein expressed and secreted from each osteoblast 5 as hydroxyapatite, and a healthy bone tissue 4 is newly formed.

<Processing method for recess 2A>
In order to form the recessed portion 2A as described above, for example, electric energy may be applied to a minute region of the surface 1A of the dental implant 1, the minute region may be melted, and then cooled. By cooling, the material of the dental implant 1 in the minute region is scattered and a recess 2 is formed. The above can be realized by, for example, wire electric discharge machining, laser machining, or the like.

<Dents 2B, 2C>
Next, the recessed portion 2B will be described with reference to FIGS. 6 to 8, but the recessed portion 2C can also be described in the same manner. The recessed portions 2B and 2C shown in FIGS. 6 (A) and 6 (B) are formed as shown in the photograph of the secondary electron image (SEI) of FIG. 7, for example.

<Concave space of recesses 2B and 2C>
As shown in FIG. 6B, the recessed portion 2B forms a concave concave space 22 on the surface 1A of the dental implant 1. The concave space 22 of the recessed portion 2B is formed by being surrounded by the peripheral surface 23 of the recessed portion 2B. The peripheral surface 23 includes an extended portion of the recessed portion 2B that extends radially or in an umbrella shape from the substantially center 20B of the peripheral surface 23, and a central side extending portion of the recessed portion 2B that extends to the central side.

A plurality of recesses 2B are formed on the surface 1A of the dental implant 1. Then, the concave space 22 of the recessed portion 2B is a mixture of those having various sizes, similarly to the concave space 12 of the recessed portion 2A.

<Peripheral part of recess 2A>
The recessed portion 2B has a peripheral edge portion 24, a third expansion surface 25, and a burr surface 26. The peripheral edge portion 24 is a portion constituting the peripheral edge of the recessed portion 2B. The peripheral edge portion 24 has various aspects like the peripheral edge portion 14. Then, the description in the peripheral edge portion 14 can be applied to the peripheral edge portion 24 as it is.

The third expansion surface 25 is a surface (peripheral surface on the concave space side) of the peripheral edge portion 24 on the concave space 22 side. The third expansion surface 25 corresponds to the expansion portion. Further, the third expansion surface 25 is provided on at least a part of the peripheral surface on the concave space side, and is in the direction from the inside to the outside of the recessed portion 2B in the depth direction of the recessed portion 2B and in the depth direction of the recessed portion 2B. It extends from the inside to the outside of the recessed portion 2B in the plane direction perpendicular to the surface.

For example, as shown in FIGS. 6 (B) and 6 (C), when the depth direction of the recess 2B is the Y axis and the predetermined surface direction is the X axis, the third expansion surface 25 is along the X axis. The direction of the composite vector 25C, which is the sum of the third vector 25A in the direction from the inside to the outside of the recessed portion 2B and the fourth vector 25B in the direction from the inside to the outside of the recessed portion 2B along the Y axis (hereinafter). , Called the third tilt direction.) The third inclination direction is various directions depending on the size of the third vector 25A and the fourth vector 25B, and includes all possible directions within the range.

As with the recessed portion 2A, the peripheral surface on the concave space side may have a portion provided with an upright surface in the depth direction instead of the third expansion surface 25.

Further, the fourth expansion surface 27 may be formed on the surface of the peripheral edge portion 24 on the opposite side of the concave space 22 (the peripheral surface on the anti-concave space side). The fourth expansion surface 27 corresponds to the second expansion surface 17 in the recessed portion 2A, and the description of the second expansion surface 17 can be applied.

Then, the fourth expansion surface 27 and the adjacent surface 1B of the dental implant 1 overlap each other in a plan view from the depth direction of the recessed portion 2B. A space G is formed between the fourth expansion surface 27 and the adjacent surface 1B of the dental implant 1 at the overlapping portion. Further, a space H is formed between the portion corresponding to the protruding base end portion.

The burr surface 26 is a surface (peripheral surface on the concave space side) of the peripheral edge portion 24 on the concave space 22 side. The burr surface 26 corresponds to the extending portion on the central side. The burr surface 26 is provided on at least a part of the peripheral surface on the concave space side, and the burr surface 26 is provided in the direction from the inside to the outside of the recessed portion 2B in the depth direction of the recessed portion 2B with respect to the depth direction of the recessed portion 2B. It extends so as to proceed in the direction toward the center of the recessed portion 2B in the plane direction at right angles. That is, the burr surface 26 extends in the direction toward the center of the recessed portion 2B along the X axis as it advances from the inside to the outside of the recessed portion 2B along the Y axis (positive direction of the Y axis).

Then, the burr surface 26 and the peripheral surface 23 of the recessed portion 2B overlap each other in a plan view from the depth direction of the recessed portion 2B. A space I is formed between the burr surface 26 and the peripheral surface 23 of the recessed portion 2B at the overlapping portion. A space J is formed between the burr surface 26 in the recessed portion 2C and the peripheral surface 23 of the recessed portion 2C. Further, spaces K and L are formed between the portions corresponding to the protruding base ends of the recessed portions 2B and 2C and the peripheral surface 23.

As shown in FIG. 8A, the third expansion surface 25 is provided in the first circumferential direction range R1, which is a partial range in the circumferential direction of the peripheral edge portion 24. Further, the burr surface 26 is provided in the second circumferential direction range R2, which is a partial range in the circumferential direction of the peripheral edge portion 24 other than the first circumferential direction range R1. As shown in FIG. 8A, the first circumferential range R1 and the second circumferential range R2 may be integrally formed around the peripheral portion 24 in the circumferential direction. However, the present invention is not limited to this, and as shown in FIG. 8B, it may be set so as not to go around the circumferential direction of the peripheral edge portion 24 even if both are integrated.

In FIG. 8A, the circumferential direction of the peripheral edge portion 24 is composed of a thick line and a thin line. The thick line corresponds to the first circumferential range R1 and the thin line corresponds to the second circumferential range R2. Further, in FIG. 8B, the circumferential direction of the peripheral edge portion 24 is composed of a large thick line, a small thick line, and a thin line. Corresponds to.

<First arrangement direction arrangement of the recess>
Next, the arrangement of the recessed portions 2B to 2D will be described with reference to FIG. 6 again. The recessed portions 2B and 2C are adjacent to each other. The peripheral edge portion of the boundary portion between the recessed portions 2B and 2C is composed of a common peripheral edge portion (hereinafter, referred to as a first common peripheral edge portion) 24A. The surface of the first common peripheral edge portion 24A on the recessed portion 2C side has a third expansion surface 25. On the other hand, the surface of the first common peripheral edge portion 24A on the recessed portion 2B side has a burr surface 26.

Further, the recessed portions 2C and 2D are adjacent to each other. When the direction in which the recessed portions 2B and 2C are arranged is defined as the first arrangement direction, the recessed portions 2D are arranged along the first arrangement direction. The peripheral edge of the boundary between the recessed portions 2C and 2D is composed of a common peripheral edge (hereinafter referred to as a second common peripheral edge) 24B. The surface of the second common peripheral edge portion 24B on the recessed portion 2D side has a third expansion surface 25. On the other hand, the surface of the second common peripheral edge portion 24B on the recessed portion 2C side has a burr surface 26.

As described above, in the recesses arranged along the first arrangement direction, the peripheral edge of the boundary portion of the adjacent recesses is composed of a common peripheral edge. Then, an expansion surface is formed on the surface on one recess side of the common peripheral edge portion. In addition, a burr surface is formed on the surface of the common peripheral edge portion on the other recessed portion side. When the boundary between the adjacent recesses is formed as described above, the common peripheral edge is inclined to the side where the burr surface is formed. As a result, the peripheral edge portion common in the plan view from the depth direction of the recessed portion is formed so as to overlap a part of the recessed portion on the leading side in the first arrangement direction. Then, a space is formed between the overlapping common peripheral edge portion and the peripheral surface of the recessed portion. The space functions as a blood circulation passage.

Further, the recessed portions 2D arranged at the rear end of the recessed portions 2B to 2D have a shape in which the entire recessed portion 2D extends radially or in an umbrella shape from the substantially center 20A of the peripheral surface 13 like the recessed portion 2A. Further, even when a plurality of recesses are arranged along the first arrangement direction, the entire rearmost recess extends radially or in an umbrella shape from the substantially center of the peripheral surface like the recess 2A. Become a shape.

<Role of recesses 2B to 2D and spaces I to L>
Next, with reference to FIG. 9, the roles of the recessed portions 2B to 2D and the spaces IL to be described. As shown in FIG. 9, when the dental implant 1 is attached so as to be in contact with the bone tissue 4 in the mouth, the osteoblasts 5 of the bone tissue 4 are housed in the recesses 2B to 2D. The gap between the osteoblast 5 and the recesses 2B to 2D functions as a blood circulation passage. Even if a gap is not formed between the osteoblast 5 and the recesses 2B to 2D, the spaces I to L are secured, so that a blood circulation passage is always secured for each osteoblast 5. be able to. As a result, calcium is uniformly attached to the bone matrix protein expressed and secreted from each osteoblast 5 as hydroxyapatite, and a healthy bone tissue 4 is newly formed.

<Second arrangement direction arrangement of the recess>
Next, the arrangement of the recessed portions 2E to 2G will be described with reference to FIG. As shown in FIG. 10A, the second arrangement direction D2 of the recessed portions 2E to 2G is a direction substantially perpendicular to the first arrangement direction D1 of the recessed portions 2B to 2D. The actual relationship between the first arrangement direction D1 and the second arrangement direction D2 is as shown in the photograph of the secondary electron image on the surface of the dental implant 1 shown in FIG.

Further, in the recessed portions 2E to 2G, similarly to the recessed portions 2B to 2D, the peripheral edge portion of the boundary portion of the adjacent recessed portions may be composed of a common peripheral edge portion. In this case, an expansion surface may be formed on one recessed surface of the common peripheral edge, and a burr surface may be formed on the other recessed surface of the common peripheral edge.

As shown in FIG. 10B, the recessed portions 2E to 2G form an angle θ (however, 0 ° <θ <90 °, 90 ° <θ <180 °) with respect to the first arrangement direction D1. The mode may be arranged along the third arrangement direction D3.

<Example of arrangement of recesses>
Next, with reference to FIGS. 11 and 12, the arrangement of the recesses 2 in the predetermined region of the dental implant 1 will be described. In the first region of the dental implant 1 in which the recesses 2 are arranged along the first arrangement direction D1 and the second arrangement direction D2, as shown in FIG. 11 (A), the first arrangement direction D1 and the second arrangement direction The recessed portions 2 adjacent to each other along D2 are arranged so that, for example, a part of them overlap each other. Such an arrangement of the recessed portions 2 is called a first recessed portion array. In this case, the peripheral edge portion of the boundary portion of the adjacent recessed portions is composed of a common peripheral edge portion. When the recessed portions 2 are arranged according to the first recessed portion arrangement, the plurality of recessed portions 2 are arranged in a scaly shape in the first region.

Further, in the second region of the dental implant 1 in which the recess 2 is arranged along the first arrangement direction D1 and the second arrangement direction D2, as shown in FIG. 11B, the first arrangement direction D1 (second arrangement direction D1). The recesses 2 adjacent to each other along the arrangement direction D2) are arranged so as to partially overlap each other, and the recesses 2 adjacent to each other along the second array direction D2 (first array direction D1) do not overlap each other. Are arranged as follows. Such an arrangement is called a second recess arrangement. At least the peripheral edge of the boundary between the overlapping recesses is composed of a common peripheral edge. When the recesses 2 are arranged according to the second recess arrangement, the plurality of recesses 2 are formed in a scaly shape in the second region.

As shown in FIG. 12A, in the third region of the dental implant 1 in which the depressions 2 are arranged along the first arrangement direction D1 and the second arrangement direction D2, the adjacent depressions 2 will eventually be adjacent to each other. Also included in the present invention are sequences that do not overlap (hereinafter referred to as a third recessed array). Further, as shown in FIG. 12B, in the fourth region of the dental implant 1 in which the recess 2 is arranged along the first arrangement direction D1 and the second arrangement direction D2, the first arrangement direction D1 (second arrangement direction D1). The recesses 2 adjacent to each other along the arrangement direction D2) are arranged so that some overlap and some do not overlap, and the recesses adjacent to each other along the second arrangement direction D2 (first arrangement direction D1) are arranged. The present invention also includes an arrangement in which the parts 2 do not overlap each other (hereinafter, referred to as a fourth recessed portion arrangement).

<Processing method for multiple dents>
Next, with reference to FIG. 11, a case where a plurality of recesses arranged in the first recessed portion array are formed by wire electric discharge machining will be described. First, a recess 2H is formed on the surface of the work (dental implant 1) by wire electric discharge machining. At this time, the recessed portion 2H is formed in a manner similar to that of the recessed portion 2A.

Next, the work surface is set to the first machining direction Q1 with respect to the wire so that the wire electric discharge machining is performed centering on the work surface position P1 deviated by a predetermined distance L1 from the center C1 of the recessed portion 2H along the first machining direction Q1. It is moved relative to each other. Wire electric discharge machining is performed around the work surface position P1 to form a recessed portion 2I having a center C2. The first processing direction Q1 is the same as the first arrangement direction D1. At this time, as shown in FIG. 11A, a part of the recessed portion 2I is formed so as to overlap a part of the recessed portion 2H when viewed in a plan view from the depth direction of the recessed portions 2H and 2I.

Further, the work surface is moved relative to the wire in the first machining direction Q1 so that the wire electric discharge machining is performed centering on the work surface position P2 deviated by a predetermined distance L1 from the work surface position P1 along the first machining direction Q1. To. Wire electric discharge machining is performed around the work surface position P2 to form a recessed portion 2J having a center C3. At this time, as shown in FIG. 11A, a part of the recessed portion 2J is formed so as to overlap a part of the recessed portion 2I when viewed in a plan view from the depth direction of the recessed portions 2I and 2J. The processing process in the first processing direction Q1 is referred to as the first processing process.

When the first processing is completed, the work surface is then moved relative to the wire in the second processing direction Q2. Specifically, the work surface is in the second machining direction with respect to the wire so that the wire electric discharge machining is performed centering on the work surface position P3 deviated by a predetermined distance L2 from the center C1 of the recessed portion 2H along the second machining direction Q2. It is moved relative to Q2. Wire electric discharge machining is performed around the work surface position P3 to form a recessed portion 2K having a center C4. The first processing direction Q2 is the same as the second arrangement direction D2.

As a result, the extended portion of the recessed portion 2H in the second circumferential direction range R2 (see the thick line) disappears, and the expanded portion of the recessed portion 2K is newly formed. That is, in the second circumferential range R2 of the recessed portion 2H, the extended portion (third expansion surface 25) of the recessed portion 2K is replaced with the central extending portion (burd surface 26) of the recessed portion 2H. The processing process in the second processing direction Q2 described above is referred to as a second processing process.

Next, the work surface is relatively moved with respect to the wire in the first processing direction Q1, and the first processing is performed to form the recessed portions 2L and 2M. After that, similarly, the first processing process and the second processing process are alternately performed to form a plurality of recessed portions 2 arranged in the first recessed portion array on the work surface.

Even when a plurality of recesses arranged in the second recessed portion array are formed by wire electric discharge machining, the first recessed portion can be adjusted by adjusting a predetermined distance L2 along the second machining direction Q2 in the second machining process. It can be explained in the same way as the explanation in the array. Further, with respect to the third recessed portion array and the fourth recessed portion array, if the predetermined distance L1 along the first machining direction Q1 and the predetermined distance L2 along the second machining direction Q2 are adjusted, the first recessed portion array can be obtained. It can be explained in the same way as the explanation.

<Protruding part>
Next, the protruding portion 3 will be described with reference to FIGS. 13 and 14. A plurality of protruding portions 3 exist in the vicinity of the recessed portion 2. A specific embodiment thereof is shown in FIG. As shown in FIG. 14, the projecting portion 3 includes a base portion 30 and a head portion 31. The base portion 30 is a portion that protrudes from the surface 1A of the dental implant 1 including the peripheral surface of the recessed portion 2.

The head 31 is a portion provided on the tip end side of the base portion 30. At least a part of the surface of the head 31 is formed by a curved surface. The shape of the head 31 may be, for example, substantially spherical. When the head 31 is formed in this way, a large number of gaps are formed with the bone tissue. This gap functions as a blood circulation passage.

Further, the head 31 has a burr surface 32 in the vicinity of the boundary with the base 30. The burr surface 32 is the surface of the head 31 that goes outward in the direction perpendicular to the protruding direction (hereinafter, referred to as the width direction) as it advances in the protruding direction, which is the direction from the base 30 toward the head 31. .. When the projecting direction is the Y-axis and the width direction is the X-axis, the burr surface 32 extends in the direction away from the center of the head 31 along the X-axis as it advances in the positive direction of the Y-axis. When the burr surface 32 is formed, a constricted shape constricted inward in the width direction is formed in the vicinity of the boundary between the base portion 30 and the head portion 31.

Further, spaces N1 and N2 are formed between the burr surface 32 and the surface 1A of the dental implant 1 or the surface of the base 30. Spaces N1 and N2 are difficult to be embedded by bone tissue and function as blood circulation passages.

<Role of protrusion>
The role of the protrusion 3 will be described with reference to FIG. When the dental implant 1 is attached so as to be in contact with the bone tissue 4 in the mouth, the osteoblasts 5 of the bone tissue 4 are housed in the recess 2A. Then, as shown in FIG. 15 (A), calcium becomes hydroxyapatite and adheres to the bone matrix protein expressed and secreted from osteoblast 5, and new bone tissue 4A is generated. In addition, in FIG. 15A, as an example of the formation mode of the new bone tissue 4A, a mode in which the space between the dental implant 1 and the bone tissue 4 is filled with the new bone tissue 4A is shown. .. In such a case, new bone tissue 4A is also formed on the entire periphery of the protrusion 3 and the entire periphery of the peripheral edge 14.

Here, as shown in FIG. 15 (B), when an external force (see the arrow in FIG. 15 (B)) that separates the dental implant 1 and the bone tissue 4 is applied, the bone tissue 4 becomes a new bone tissue. Along with 4A, it tries to move away from dental implant 1. However, even if an external force trying to separate from the dental implant 1 is applied to the new bone tissue 4A, the new bone tissue 4A is caught on the burr surface 32 of the protrusion 3, so that the new bone tissue 4A is separated from the dental implant 1. Absent.

Further, even if an external force trying to separate from the dental implant 1 is applied to the new bone tissue 4A, the new bone tissue 4A is caught on the second expansion surface 17 and the protruding base end expansion surface 18 of the peripheral portion 14, so that the new bone tissue 4A is new. Bone tissue 4A does not separate from dental implant 1.

As described above, when a new bone tissue 4A is formed on the contact surface between the dental implant 1 and the bone tissue 4 in the first embodiment of the present invention, the two are firmly engaged with each other.

<Second embodiment>
The second surface structure 110 of the dental implant 1 in the second embodiment of the present invention will be described with reference to FIG. Like the first surface structure 100, the second surface structure 110 of the dental implant 1 also includes a plurality of recesses 2 and a plurality of protrusions 3. The secondary electron image photograph (hereinafter referred to as the second surface structure photograph) of the second surface structure 110 of the dental implant 1 in FIG. 16 is a first rectangular region (width 618 μm, length 420 μm) of the surface of the dental implant 1. ).

<Analysis method of the second surface structure>
As described in the first surface structure 100 of the dental implant 1 in the first embodiment of the present invention, osteoblasts can be accommodated in the recessed portion 2. The diameter of the osteoblasts is about 20 to 30 μm. The inventor of the present application analyzed how many depressions (hereinafter, referred to as osteoblast-accommodating depressions) having a size capable of accommodating osteoblasts in the first rectangular region. As a reference, in FIGS. 16A and 16B, one osteoblast-accommodating depression is designated by reference numeral 2N.

In order to clarify the osteoblast-accommodating depression in the second surface structure photograph shown in FIG. 16A in the analysis, the portion corresponding to the osteoblast-accommodating depression was colored gray in FIG. 16 (A). The second surface structure analysis photograph shown in B) was prepared. In the creation of the second surface structure analysis photograph, the bright white colored part of the second surface structure photograph (the part corresponding to the peripheral edge of the osteoblast-accommodating depression) is omitted from the inside of the osteoblast-accommodating depression. A position 2 μm away was used as the contour portion of the recessed portion that can accommodate osteoblasts.

Then, the inner part of the recessed portion that can accommodate osteoblasts is colored gray from the contour portion. However, if the diagonal width U is 20 μm or less and the plane area of the recess is 300 μm ² or less, it is considered that osteoblasts having a diameter of about 20 to 30 μm are not accommodated, and the cells are not colored gray.

As shown in FIG. 17, the diagonal width U is the maximum length of the recessed portion 2 when the recessed portion 2 is viewed in a plan view (outside the recessed portion 2 and from the depth direction of the recessed portion 2). It is defined as the shortest distance between the two tangents T1 and T2 when the entire recess 2 is sandwiched between the two tangents T1 and T2 parallel to the virtual line S. That is, the diagonal width U is the maximum width of the recessed portion 2 in the direction (width direction) perpendicular to the virtual line S. Further, the plane area of the recessed portion is defined as the plane area of the recessed portion 2 when the recessed portion 2 is viewed in a plan view (outside the recessed portion 2 and from the depth direction of the recessed portion 2).

The diagonal width U of 20 μm is due to the minimum value of the osteoblast diameter. ^{Further, 300 μm 2} in the plane area of the recess corresponds to the plane area when the osteoblasts having a diameter of 20 μm are viewed in a plane, assuming that the osteoblasts have a spherical shape.

The inventor of the present application analyzed the dented portion that can accommodate osteoblasts based on the above second surface structure analysis photograph. In the second surface structure analysis photograph, the inventor of the present application satisfies the condition that the diagonal width U is 20 μm or more and the plane area of the recess is 300 μm ² or more (hereinafter, the first condition is met). It was judged that the depression (called the depression) corresponds to the depression that can accommodate osteoblasts, and the analysis was performed.

The condition that the diagonal width U is about 20 μm or more is due to the fact that the minimum value of the osteoblast diameter is about 20 μm. The condition that the plane area of the recess is 300 μm ² or more is that the plane area of the osteoblasts having a diameter of 20 μm is approximately 300 μm ^{2 when the osteoblasts are assumed to be spherical.} to cause.

<Analysis result of the second surface structure>
Next, the analysis result based on the second surface structure analysis photograph will be described with reference to FIG. First, as shown in the analysis result of the first row of the table of FIG. 18 (A), 67 recesses matching the first condition were present in the second surface structure analysis photograph. The area of the first rectangular region is approximately 259560 (618 × 420) μm ² . Therefore, when the unit area is 1 mm ² , the number of osteoblast-accommodating depressions (first condition-matching depressions) per unit area in the first rectangular region is approximately 258.1 (67 / 0.25560). (Pieces / mm ² ).

The total plane area of the recessed portion satisfying the first condition was approximately 888885.4 μm ² . Therefore, the occupancy rate (%) of the dented portion plane area of the dented portion (the dented portion that meets the first condition) that can accommodate osteoblasts in the first rectangular region is approximately 34.2% (88885.4 / 259560).

Next, the inventor of the present application analyzes a depression having substantially the same size as the osteoblast (hereinafter, referred to as a depression of the same size as the osteoblast) based on the above second surface structure analysis photograph. It was. In the second surface structure analysis photograph, the inventor of the present application satisfies the condition that the diagonal width U is between about 20 to 30 μm and the plane area of the ^{recess is between about 300 to 750 μm 2.} (Hereinafter, referred to as a dent portion that meets the second condition) was determined to correspond to a dent portion of the same size as osteoblasts, and analysis was performed.

The condition that the diagonal width U is between about 20 and 30 μm is due to the fact that the diameter of osteoblasts is about 20 to 30 μm. Further, under the condition that the plane area of the recessed portion ^{is between about 300 and 750 μm 2} , the plane area when the osteoblasts having a diameter of 20 μm or 30 μm are viewed in a plan view is assumed to be spherical, respectively. approximately 300 [mu] m ^2, due to a substantially 750 [mu] m ² approximately.

As shown in the analysis result of the first row of the table of FIG. 18B, 16 dents matching the second condition were present in the second surface structure analysis photograph. Therefore, when the unit area is 1 mm ² , the number of osteoblast-sized depressions (second condition-matching depressions) per unit area in the first rectangular region is approximately 61.6 (16 / 0.25560). (Pieces / mm ² ).

The total plane area of the recessed portion satisfying the second condition was ^{6863.2 μm 2.} Therefore, the occupancy rate (%) of the dented portion plane area of the dented portion having the same size as the osteoblast cells (the dented portion satisfying the second condition) in the first rectangular region is approximately 2.6% (6863.2 / 259560).

<Third Embodiment>
The third surface structure 120 of the dental implant 1 according to the third embodiment of the present invention will be described with reference to FIG. Similar to the first surface structure 100, the third surface structure 120 of the dental implant 1 also includes a plurality of recesses 2 and a plurality of protrusions 3. The secondary electron image photograph (hereinafter referred to as the third surface structure photograph) of the third surface structure 120 of the dental implant 1 in FIG. 19 is a second rectangular region (width 1717 μm, length 824 μm) of the surface of the dental implant 1. ).

<Analysis method of the third surface structure>
The inventor of the present application analyzed how many osteoblast-accommodating depressions are in the second rectangular region of the dental implant 1. The third surface structure analysis photograph shown in FIG. 19 (B) was prepared so that the osteoblast-accommodating depression portion of the third surface structure photograph shown in FIG. 19 (A) was clarified in the analysis. Since the creation of the third surface structure analysis photograph is the same as the case of creating the second surface structure analysis photograph described in the second embodiment, the description thereof will be omitted. Based on the above third surface structure analysis photograph, the inventor of the present application has an osteoblast-accommodating depression (first condition-matched depression) and an osteoblast-same-size depression (second condition-matched) in the second rectangular region. An analysis was performed on the dented part). As a reference, in FIGS. 19A and 19B, one osteoblast-accommodating depression is designated by reference numeral 2N.

<Analysis result of the third surface structure>
Next, the analysis result based on the third surface structure analysis photograph will be described with reference to FIG. First, as shown in the analysis result of the second row of the table of FIG. 18A, there were 203 recesses matching the first condition in the second rectangular region. The area of the second rectangular region is approximately 1002808 (1217 × 824) μm ² . Therefore, when the unit area is 1 mm ² , the number of osteoblast-accommodating depressions (dents that meet the first condition) per unit area in the second rectangular region is approximately 202.4 (203 / 1.002808). (Pieces / mm ² ).

Further, the total plane area of the recessed portion satisfying the first condition was approximately 31593.6 μm ² . Therefore, the occupancy rate (%) of the dented portion plane area of the dented portion (the dented portion that meets the first condition) that can accommodate osteoblasts in the second rectangular region is approximately 31.4% (315193.6 / 1002808).

Further, as shown in the analysis result of the second row of the table of FIG. 18B, there were 40 recesses matching the second condition in the second rectangular region. Therefore, when the unit area is 1 mm ² , the number of osteoblast-sized depressions (second condition-matching depressions) per unit area in the second rectangular region is approximately 39.9 (40 / 1.002808). (Pieces / mm ² ).

The total plane area of the recessed portion satisfying the second condition was ^{16880.7 μm 2.} Therefore, the occupancy rate (%) of the dented portion plane area of the dented portion having the same size as the osteoblast cells (the dented portion satisfying the second condition) in the second rectangular region is approximately 1.7% (16880.7 / 1002808).

<Fourth Embodiment>
The fourth surface structure 130 of the dental implant 1 according to the fourth embodiment of the present invention will be described with reference to FIG. Like the first surface structure 100, the fourth surface structure 130 of the dental implant 1 also includes a plurality of recesses 2 and a plurality of protrusions 3. The secondary electron image photograph of the fourth surface structure 130 of the dental implant 1 in FIG. 20 (hereinafter referred to as the fourth surface structure photograph) is a third rectangular region (width 800 μm, length 542 μm) on the surface of the dental implant 1. ).

<Analysis method of the fourth surface structure>
The inventor of the present application analyzed how many osteoblast-accommodating depressions were large enough to accommodate osteoblasts in the third rectangular region of the dental implant 1. The fourth surface structure analysis photograph shown in FIG. 20 (B) was prepared so that the osteoblast-accommodating depression portion of the fourth surface structure photograph shown in FIG. 20 (A) was clarified in the analysis. Since the creation of the fourth surface structure analysis photograph is the same as the case of creating the second surface structure analysis photograph described in the second embodiment, the description thereof will be omitted. Based on the above-mentioned fourth surface structure analysis photograph, the inventor of the present application has an osteoblast-accommodating depression (first condition-matched depression) and an osteoblast-same-size depression (second condition-matched) in the third rectangular region. An analysis was performed on the dented part). As a reference, in FIGS. 20A and 20B, one osteoblast-accommodating depression is designated by reference numeral 2N.

<Analysis result of the fourth surface structure>
Next, the analysis result based on the fourth surface structure analysis photograph will be described with reference to FIG. First, as shown in the analysis result of the third row of the table of FIG. 18A, there were 94 recesses matching the first condition in the third rectangular region. The area of the third rectangular region is approximately 433600 (800 × 542) μm ² . Therefore, when the unit area is 1 mm ² , the number of osteoblast-accommodating depressions (dents that meet the first condition) per unit area in the third rectangular region is approximately 216.8 (94 / 0.433600). (Pieces / mm ² ).

Further, the total plane area of the recessed portion satisfying the first condition was approximately 128475.3 μm ² . Therefore, the occupancy rate (%) of the dented portion plane area of the dented portion (the dented portion that meets the first condition) that can accommodate osteoblasts in the third rectangular region is approximately 29.6% (128475.3 / 433600).

Further, as shown in the analysis result of the third row of the table of FIG. 18B, 28 dents matching the second condition were present in the third rectangular region. Therefore, when the unit area is 1 mm ² , the number of osteoblast-sized depressions (second condition-matching depressions) per unit area in the third rectangular region is approximately 64.6 (28 / 0.433600). (Pieces / mm ² ).

The total plane area of the recessed portion satisfying the second condition was ^{12310.7 μm 2.} Therefore, the occupancy rate (%) of the dented portion plane area of the dented portion having the same size as the osteoblast cells (the dented portion satisfying the second condition) in the third rectangular region is approximately 2.8% (12310.7 / 433600).

<Fifth Embodiment>
The fifth surface structure 140 of the dental implant 1 according to the fifth embodiment of the present invention will be described with reference to FIG. 21. Like the first surface structure 100, the fifth surface structure 140 of the dental implant 1 also includes a plurality of recesses 2 and a plurality of protrusions 3. The secondary electron image photograph of the fifth surface structure 140 of the dental implant 1 in FIG. 21 (hereinafter referred to as the fifth surface structure photograph) is a fourth rectangular region (width 799 μm, length 545 μm) of the surface of the dental implant 1. ).

<Fifth surface structure analysis method>
The inventor of the present application analyzed how many osteoblast-accommodating depressions are present in the fifth surface structure 140 of the dental implant 1. The fifth surface structure analysis photograph shown in FIG. 21 (B) was prepared so that the osteoblast-accommodating depression portion of the fifth surface structure photograph shown in FIG. 21 (A) was clarified in the analysis. Since the creation of the fifth surface structure analysis photograph is the same as the case of creating the second surface structure analysis photograph described in the second embodiment, the description thereof will be omitted. Based on the above-mentioned fifth surface structure analysis photograph, the inventor of the present application has an osteoblast-accommodating depression (a depression that meets the first condition) and an osteoblast-same size depression (second condition) in the fourth rectangular region. An analysis was performed on the matching depression). As a reference, in FIGS. 21 (A) and 21 (B), one osteoblast-accommodating depression is designated by reference numeral 2N.

<Analysis result of the fifth surface structure>
Next, the analysis result based on the fifth surface structure analysis photograph will be described with reference to FIG. First, as shown in the analysis result of the fourth row of the table of FIG. 18 (A), 97 recesses matching the first condition were present in the fourth rectangular region. The area of the fourth rectangular region is approximately 435455 (799 × 545) μm ² . Therefore, when the unit area is 1 mm ² , the number of osteoblast-accommodating depressions (dents that meet the first condition) per unit area in the fourth rectangular region is approximately 222.8 (97 / 0.435455). (Pieces / mm ² ).

Further, the total plane area of the recessed portion satisfying the above first condition was approximately 99854.5 μm ² . Therefore, the occupancy rate (%) of the dented portion plane area of the dented portion (the dented portion that meets the first condition) that can accommodate osteoblasts in the fourth rectangular region is approximately 22.9% (99854.5 / 435455).

Further, as shown in the analysis result of the fourth row of the table of FIG. 18B, there were 33 recesses matching the second condition in the fourth rectangular region. Therefore, when the unit area is 1 mm ² , the number of osteoblast-sized depressions (second condition-matching depressions) per unit area in the fourth rectangular region is approximately 75.8 (33 / 0.435455). It becomes an individual.

Further, the total plane area of the recessed portion satisfying the second condition was ^{14313.1 μm 2.} Therefore, the occupancy rate (%) of the dented portion plane area of the dented portion of the same size as the osteoblast cells (the dented portion that meets the second condition) in the fourth rectangular region is approximately 3.3% (14313.1/435455).

<Consideration of the second to fifth surface structures>
Considering the second surface structure 100 to the fifth surface structure 140 of the dental implant 1 described above, the surface of the dental implant 1 has 200 or more dents that can accommodate osteoblasts per ^{unit area (1 mm 2).} It is preferable to have a specific region. Further, the surface of the dental implant 1 ^{preferably has a specific region in which the number of osteoblast-sized depressions per unit area (1 mm 2} ) is 35 or more, and preferably has a specific region of 40 or more. Is more preferable.

Adhesion of osteoblasts can be easily obtained in a depression having a diagonal width U or diameter of about 20 to 30 μm and having the same size as osteoblasts. Therefore, it is preferable that the ratio of the osteoblast-same size depression to the entire depression provided on the surface of the dental implant is large. In addition, the osteoblasts of the same size are placed on the surface of the dental implant in the same pattern as the arrangement pattern of the osteoblasts of the bone tissue so that most of the osteoblasts of the bone tissue are housed in the osteoblasts of the same size. It is preferably formed.

Further, the surface of the dental implant 1 preferably has a specific region in which the occupancy rate (%) of the dented portion plane area of the dented portion capable of accommodating osteoblasts is approximately 20% or more, and is preferably approximately 22% or more. It is more preferable to have. Further, the surface of the dental implant 1 preferably has a specific region in which the occupancy rate (%) of the dented portion plane area of the dented portion of the same size as the osteoblast is about 1.5% or more, and is about 2.0% or more. It is more preferable to have a specific region to be.

The surface structure of the implant of the present invention and the method for producing the implant are not limited to the above-described embodiments, and it goes without saying that various modifications can be made without departing from the gist of the present invention.

1 Dental implant 1A Dental implant surface 1B Adjacent surface 2,2A, 2B, 2C, 2D, 2E, 2F, 2G Depression 2N Osteoblast accommodating depression 3 Protrusion 4 Bone tissue 4A New bone tissue 5 Osteoblast Cell 12, 22 Concave space 13, 23 Peripheral surface 14, 24 Peripheral part 15 First expansion surface 16 Protruding base end 17 Second expansion surface 18 Protruding base end expansion surface 20A, 20B Center 24A First common peripheral edge 24B Second Common peripheral edge 25 Third expansion surface 26, 32 Bone surface 27 Fourth expansion surface 30 Base 31 Head 100 First surface structure 110 Second surface structure 120 Third surface structure 130 Fourth surface structure 140 Fifth surface structure D1 First One arrangement direction D2 Second arrangement direction D3 Third arrangement direction Space E, F, G, H, I, J, K, L, M
P1, P2, P3 Work surface position Q1 First machining direction Q2 Second machining direction R1 First circumferential range R2 Second circumferential range U Diagonal width

Claims (16)

The surface structure of the implant
A plurality of concave recesses formed on the surface of the implant,
A plurality of protrusions protruding from the surface of the implant,
Equipped with a,
The at least one recess has a peripheral edge that constitutes its own peripheral edge.
In at least a part of the surface of the implant, there is a first row of at least three consecutive recesses so as to be adjacent along the first arrangement direction, and from 0 ° with respect to the first arrangement direction. A plurality of second rows having at least three consecutive recesses are included so as to be adjacent to each other along the second arrangement direction, which is a direction having an angle θ larger than 180 °.
The recesses adjacent to each other in the first row and the second row overlap each other,
Between the peripheral edge portion of the boundary portion between the recessed portions adjacent to each other in the first row and the second row, between the plurality of the first rows, and between the plurality of the second rows. The peripheral edge portion of the boundary portion between the recessed portions adjacent to each other is composed of a common peripheral edge portion which is a common peripheral edge portion.
Each of the plurality of common peripheral edges
On the concave space side of the recessed portion on one side, the recessed portion on the one side proceeds from the inside to the outside of the recessed portion on the one side in the depth direction of the recessed portion on the one side. An expansion surface extending from the inside to the outside of the recess on the one side in the surface direction of the recess on the one side, which is perpendicular to the depth direction of the
On the concave space side of the recess on the other side, the recess on the other side proceeds from the inside to the outside of the recess on the other side in the depth direction of the recess on the other side. In the surface direction of the recessed portion on the other side, which is perpendicular to the depth direction of the
Have,
A space is formed between the burr surface on the recessed portion side and the peripheral surface of the recessed portion on the other side .
The surface structure of the implant. The expansion surface is formed in at least a part of the first circumferential range, which is a part of the peripheral portion in the circumferential direction.
The recessed burr surface is formed in at least a part of a second circumferential range, which is a part of the peripheral edge in the circumferential direction other than the first circumferential range.
The surface structure of the implant according to claim 1. The angle θ is characterized by being approximately 90 °.
The surface structure of the implant according to claim 1 or 2. At least a part of the plurality of recesses arranged in the first arrangement direction and / or the second arrangement direction is arranged in a scaly shape.
The surface structure of the implant according to any one of claims 1 to 3. The peripheral edge portion has a portion formed in a wavy and / or pleated shape.
The surface structure of the implant according to any one of claims 1 to 4. The surface of the implant has a specific area provided with an osteoblast-accommodating depression, which is a recess having a size capable of accommodating osteoblasts.
The specific region is characterized in that the number of the osteoblast-accommodating recesses provided per unit area of 1 mm ^{2 is approximately 200 (pieces / mm 2} ) or more.
The surface structure of the implant according to any one of claims 1 to 5. When the recessed portion is viewed in a plan view, the maximum width of the recessed portion in a direction perpendicular to the virtual line having the maximum length in the recessed portion is defined as a diagonal width.
When the area of the recessed portion when the recessed portion is viewed in a plan view is defined as the plane area of the recessed portion,
Surface of the implant, the diagonal width substantially 20μm or more, and has a specific area condition matching recess the recess planar area of said recess is substantially 300 [mu] m ² or more is provided,
The specific region is characterized in that the number of the condition-matching recesses provided per unit area of 1 mm ^{2 is approximately 200 (pieces / mm 2} ) or more.
The surface structure of the implant according to any one of claims 1 to 5. When the area of the recessed portion when the recessed portion is viewed in a plan view is defined as the plane area of the recessed portion,
The surface of the implant has a specific area provided with an osteoblast-accommodating depression, which is a recess having a size capable of accommodating osteoblasts.
In the specific region, the occupancy rate of the plane area of the recessed portion of the recessed portion capable of accommodating osteoblasts is approximately 20% or more.
The surface structure of the implant according to any one of claims 1 to 5. When the recessed portion is viewed in a plan view, the maximum width of the recessed portion in a direction perpendicular to the virtual line having the maximum length in the recessed portion is defined as a diagonal width.
When the area of the recessed portion when the recessed portion is viewed in a plan view is defined as the plane area of the recessed portion,
Surface of the implant, the diagonal width substantially 20μm or more, and has a specific area condition matching recess the recess planar area of said recess is substantially 300 [mu] m ² or more is provided,
The specific region is characterized in that the occupancy rate of the flat area of the recessed portion of the recessed portion that meets the conditions is approximately 20% or more.
The surface structure of the implant according to any one of claims 1 to 5. The surface of the implant has a specific region in which a depression having the same size as the osteoblast, which is a depression having a size substantially the same as that of the osteoblast, is provided.
The specific region is characterized in that the number of the osteoblast-same-sized depressions provided per unit area of 1 mm ^{2 is approximately 35 (pieces / mm 2} ) or more.
The surface structure of the implant according to any one of claims 1 to 5. When the recessed portion is viewed in a plan view, the maximum width of the recessed portion in a direction perpendicular to the virtual line having the maximum length in the recessed portion is defined as a diagonal width.
When the area of the recessed portion when the recessed portion is viewed in a plan view is defined as the plane area of the recessed portion,
Surface of the implant, while the diagonal width of approximately 20 to 30 [mu] m, and condition matching recess the recess planar area of said recess portion in the range of between about 300～750Myuemu ² is provided Has a specific area
The specific region is characterized in that the number of the condition-matching recesses provided per unit area of 1 mm ^{2 is approximately 35 (pieces / mm 2} ) or more.
The surface structure of the implant according to any one of claims 1 to 5. When the area of the recessed portion when the recessed portion is viewed in a plan view is defined as the plane area of the recessed portion,
The surface of the implant has a specific region in which a depression having the same size as the osteoblast, which is a depression having a size substantially the same as that of the osteoblast, is provided.
The specific region is characterized in that the occupancy rate of the plane area of the depression portion of the depression portion of the same size as the osteoblast is approximately 1.5% or more.
The surface structure of the implant according to any one of claims 1 to 5. When the recessed portion is viewed in a plan view, the maximum width of the recessed portion in a direction perpendicular to the virtual line having the maximum length in the recessed portion is defined as a diagonal width.
When the area of the recessed portion when the recessed portion is viewed in a plan view is defined as the plane area of the recessed portion,
Surface of the implant, while the diagonal width of approximately 20 to 30 [mu] m, and condition matching recess the recess planar area of said recess portion in the range of between about 300～750Myuemu ² is provided Has a specific area
The specific region is characterized in that the occupancy rate of the flat area of the recessed portion of the recessed portion that meets the conditions is approximately 1.5% or more.
The surface structure of the implant according to any one of claims 1 to 5. The protrusion is
A base protruding from the surface of the implant and
The head provided on the tip side of the base and
With
The head has a protruding portion burr surface in a direction perpendicular to the protruding direction as it advances in the protruding direction, which is the direction from the base toward the head, in the vicinity of the boundary with the base. Features,
The surface structure of the implant according to any one of claims 1 to 13. At least a part of the surface of the head is formed by a curved surface.
The surface structure of the implant according to claim 14. The head is characterized in that it is formed substantially spherically.
The surface structure of the implant according to claim 14 or 15.

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