JP6880438B2 - Solder paste - Google Patents
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- Publication number
- JP6880438B2 JP6880438B2 JP2018141536A JP2018141536A JP6880438B2 JP 6880438 B2 JP6880438 B2 JP 6880438B2 JP 2018141536 A JP2018141536 A JP 2018141536A JP 2018141536 A JP2018141536 A JP 2018141536A JP 6880438 B2 JP6880438 B2 JP 6880438B2
- Authority
- JP
- Japan
- Prior art keywords
- mass
- acid
- solder
- flux
- solder paste
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 229910000679 solder Inorganic materials 0.000 title claims description 115
- 239000000463 material Substances 0.000 claims description 49
- 230000004907 flux Effects 0.000 claims description 44
- 229910045601 alloy Inorganic materials 0.000 claims description 26
- 239000000956 alloy Substances 0.000 claims description 26
- 150000002989 phenols Chemical class 0.000 claims description 12
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 239000000843 powder Substances 0.000 description 33
- 239000011347 resin Substances 0.000 description 33
- 229920005989 resin Polymers 0.000 description 33
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 18
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 18
- -1 n-octylthio Chemical group 0.000 description 18
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 18
- 230000000694 effects Effects 0.000 description 17
- 230000008719 thickening Effects 0.000 description 16
- 239000003153 chemical reaction reagent Substances 0.000 description 15
- 229910052718 tin Inorganic materials 0.000 description 15
- 239000002245 particle Substances 0.000 description 14
- 229910052751 metal Inorganic materials 0.000 description 13
- 239000002184 metal Substances 0.000 description 13
- 238000000034 method Methods 0.000 description 10
- 150000001412 amines Chemical class 0.000 description 9
- 239000003795 chemical substances by application Substances 0.000 description 9
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 8
- 239000004925 Acrylic resin Substances 0.000 description 8
- 229920000178 Acrylic resin Polymers 0.000 description 8
- 239000002253 acid Substances 0.000 description 8
- 230000000415 inactivating effect Effects 0.000 description 8
- 229910052757 nitrogen Inorganic materials 0.000 description 8
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 8
- 150000003505 terpenes Chemical class 0.000 description 8
- 235000007586 terpenes Nutrition 0.000 description 8
- 229910001928 zirconium oxide Inorganic materials 0.000 description 8
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 7
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 6
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 6
- 239000012190 activator Substances 0.000 description 6
- 239000000047 product Substances 0.000 description 6
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- 239000002904 solvent Substances 0.000 description 5
- 238000005507 spraying Methods 0.000 description 5
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- ZUHZGEOKBKGPSW-UHFFFAOYSA-N tetraglyme Chemical compound COCCOCCOCCOCCOC ZUHZGEOKBKGPSW-UHFFFAOYSA-N 0.000 description 5
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- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- 150000001408 amides Chemical class 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 229910052736 halogen Inorganic materials 0.000 description 4
- 150000002367 halogens Chemical class 0.000 description 4
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
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- KGRVJHAUYBGFFP-UHFFFAOYSA-N 2,2'-Methylenebis(4-methyl-6-tert-butylphenol) Chemical compound CC(C)(C)C1=CC(C)=CC(CC=2C(=C(C=C(C)C=2)C(C)(C)C)O)=C1O KGRVJHAUYBGFFP-UHFFFAOYSA-N 0.000 description 3
- PHXLONCQBNATSL-UHFFFAOYSA-N 2-[[2-hydroxy-5-methyl-3-(1-methylcyclohexyl)phenyl]methyl]-4-methyl-6-(1-methylcyclohexyl)phenol Chemical compound OC=1C(C2(C)CCCCC2)=CC(C)=CC=1CC(C=1O)=CC(C)=CC=1C1(C)CCCCC1 PHXLONCQBNATSL-UHFFFAOYSA-N 0.000 description 3
- GPNYZBKIGXGYNU-UHFFFAOYSA-N 2-tert-butyl-6-[(3-tert-butyl-5-ethyl-2-hydroxyphenyl)methyl]-4-ethylphenol Chemical compound CC(C)(C)C1=CC(CC)=CC(CC=2C(=C(C=C(CC)C=2)C(C)(C)C)O)=C1O GPNYZBKIGXGYNU-UHFFFAOYSA-N 0.000 description 3
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 3
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 3
- ZVVFVKJZNVSANF-UHFFFAOYSA-N 6-[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxy]hexyl 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CC(C)(C)C1=C(O)C(C(C)(C)C)=CC(CCC(=O)OCCCCCCOC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)=C1 ZVVFVKJZNVSANF-UHFFFAOYSA-N 0.000 description 3
- 229910017944 Ag—Cu Inorganic materials 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 229910020888 Sn-Cu Inorganic materials 0.000 description 3
- 229910019204 Sn—Cu Inorganic materials 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000007983 Tris buffer Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- FTQWRYSLUYAIRQ-UHFFFAOYSA-N n-[(octadecanoylamino)methyl]octadecanamide Chemical compound CCCCCCCCCCCCCCCCCC(=O)NCNC(=O)CCCCCCCCCCCCCCCCC FTQWRYSLUYAIRQ-UHFFFAOYSA-N 0.000 description 3
- 239000005011 phenolic resin Substances 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 150000004671 saturated fatty acids Chemical class 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 3
- 150000004670 unsaturated fatty acids Chemical class 0.000 description 3
- 235000021122 unsaturated fatty acids Nutrition 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- HHMAHORWXWSISL-UHFFFAOYSA-N 1,2-bis(ethenoxy)ethane;3-(3-tert-butyl-4-hydroxy-5-methylphenyl)propanoic acid Chemical compound C=COCCOC=C.CC1=CC(CCC(O)=O)=CC(C(C)(C)C)=C1O.CC1=CC(CCC(O)=O)=CC(C(C)(C)C)=C1O HHMAHORWXWSISL-UHFFFAOYSA-N 0.000 description 2
- KOMNUTZXSVSERR-UHFFFAOYSA-N 1,3,5-tris(prop-2-enyl)-1,3,5-triazinane-2,4,6-trione Chemical class C=CCN1C(=O)N(CC=C)C(=O)N(CC=C)C1=O KOMNUTZXSVSERR-UHFFFAOYSA-N 0.000 description 2
- OWRCNXZUPFZXOS-UHFFFAOYSA-N 1,3-diphenylguanidine Chemical compound C=1C=CC=CC=1NC(=N)NC1=CC=CC=C1 OWRCNXZUPFZXOS-UHFFFAOYSA-N 0.000 description 2
- ULQISTXYYBZJSJ-UHFFFAOYSA-N 12-hydroxyoctadecanoic acid Chemical compound CCCCCCC(O)CCCCCCCCCCC(O)=O ULQISTXYYBZJSJ-UHFFFAOYSA-N 0.000 description 2
- GLDQAMYCGOIJDV-UHFFFAOYSA-N 2,3-dihydroxybenzoic acid Chemical compound OC(=O)C1=CC=CC(O)=C1O GLDQAMYCGOIJDV-UHFFFAOYSA-N 0.000 description 2
- GZMAAYIALGURDQ-UHFFFAOYSA-N 2-(2-hexoxyethoxy)ethanol Chemical compound CCCCCCOCCOCCO GZMAAYIALGURDQ-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- QSRJVOOOWGXUDY-UHFFFAOYSA-N 2-[2-[2-[3-(3-tert-butyl-4-hydroxy-5-methylphenyl)propanoyloxy]ethoxy]ethoxy]ethyl 3-(3-tert-butyl-4-hydroxy-5-methylphenyl)propanoate Chemical compound CC(C)(C)C1=C(O)C(C)=CC(CCC(=O)OCCOCCOCCOC(=O)CCC=2C=C(C(O)=C(C)C=2)C(C)(C)C)=C1 QSRJVOOOWGXUDY-UHFFFAOYSA-N 0.000 description 2
- MZZYGYNZAOVRTG-UHFFFAOYSA-N 2-hydroxy-n-(1h-1,2,4-triazol-5-yl)benzamide Chemical compound OC1=CC=CC=C1C(=O)NC1=NC=NN1 MZZYGYNZAOVRTG-UHFFFAOYSA-N 0.000 description 2
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 description 2
- KDSNLYIMUZNERS-UHFFFAOYSA-N 2-methylpropanamine Chemical compound CC(C)CN KDSNLYIMUZNERS-UHFFFAOYSA-N 0.000 description 2
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 2
- IJFXRHURBJZNAO-UHFFFAOYSA-N 3-hydroxybenzoic acid Chemical compound OC(=O)C1=CC=CC(O)=C1 IJFXRHURBJZNAO-UHFFFAOYSA-N 0.000 description 2
- XQXPVVBIMDBYFF-UHFFFAOYSA-N 4-hydroxyphenylacetic acid Chemical compound OC(=O)CC1=CC=C(O)C=C1 XQXPVVBIMDBYFF-UHFFFAOYSA-N 0.000 description 2
- JJMDCOVWQOJGCB-UHFFFAOYSA-N 5-aminopentanoic acid Chemical compound [NH3+]CCCCC([O-])=O JJMDCOVWQOJGCB-UHFFFAOYSA-N 0.000 description 2
- VVJKKWFAADXIJK-UHFFFAOYSA-N Allylamine Chemical compound NCC=C VVJKKWFAADXIJK-UHFFFAOYSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 2
- QEVGZEDELICMKH-UHFFFAOYSA-N Diglycolic acid Chemical compound OC(=O)COCC(O)=O QEVGZEDELICMKH-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- 239000004471 Glycine Substances 0.000 description 2
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- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
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- OKOBUGCCXMIKDM-UHFFFAOYSA-N Irganox 1098 Chemical compound CC(C)(C)C1=C(O)C(C(C)(C)C)=CC(CCC(=O)NCCCCCCNC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)=C1 OKOBUGCCXMIKDM-UHFFFAOYSA-N 0.000 description 2
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- 125000003118 aryl group Chemical group 0.000 description 2
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- 239000012298 atmosphere Substances 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
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- UCMIRNVEIXFBKS-UHFFFAOYSA-N beta-alanine Chemical compound NCCC(O)=O UCMIRNVEIXFBKS-UHFFFAOYSA-N 0.000 description 2
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- 150000001875 compounds Chemical class 0.000 description 2
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- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 2
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- 239000000539 dimer Substances 0.000 description 2
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Description
本発明は、ソルダペーストに関する。 The present invention relates to solder paste.
電子機器の基板への電子部品の接合及び組立ては、コスト面及び信頼性の観点から、ソルダペーストを用いたはんだ付けにより行われることが多い。 Joining and assembling electronic components to the substrate of an electronic device is often performed by soldering with solder paste from the viewpoint of cost and reliability.
ソルダペーストを電子機器の基板へ塗布する方法としては、例えば、メタルマスクを用いたスクリーン印刷を用いる方法がある。この場合、ソルダペーストの印刷性を確保するために、ソルダペーストの粘度を適度に調整する必要がある。しかし、ソルダペーストは、保存安定性に劣り、その結果、ソルダペーストの粘度が経時的に上昇することがある。 As a method of applying the solder paste to the substrate of an electronic device, for example, there is a method of using screen printing using a metal mask. In this case, it is necessary to appropriately adjust the viscosity of the solder paste in order to ensure the printability of the solder paste. However, the solder paste is inferior in storage stability, and as a result, the viscosity of the solder paste may increase over time.
また、ソルダペーストを構成するはんだ材料において、液相線温度(TL)と固相線温度(TS)との差(ΔT=TL−TS)が大きくなると、例えば、電子機器の基板にソルダペーストを塗布し、凝固させる際にはんだ材料の組織が不均一となりやすく、その結果、将来的な信頼性が低下することがある。 Further, in the solder material forming the solder paste, the difference between the liquidus temperature (T L) and the solidus temperature (T S) (ΔT = T L -T S) increases, for example, the electronic device substrate When the solder paste is applied to the solder and solidified, the structure of the solder material tends to be non-uniform, and as a result, the reliability in the future may decrease.
特許文献1には、無鉛系はんだ粉末、ロジン系樹脂、活性剤、溶剤、及びヒンダードフェノール系化合物を含有するソルダペーストが開示されている。この文献には、無鉛系はんだ粉末にヒンダードフェノール系化合物を組み合わせると、無鉛系はんだ粉末とソルダペースト膜のリフロー時の劣化が防止できることが開示されている。この文献には、Sn:96.5質量%、Ag:3.0質量%、Cu:0.5質量%の組成を有する無鉛系はんだ粉末を用いた実施例のみが開示されている。 Patent Document 1 discloses a solder paste containing a lead-free solder powder, a rosin-based resin, an activator, a solvent, and a hindered phenol-based compound. This document discloses that when a hindered phenol-based compound is combined with a lead-free solder powder, deterioration of the lead-free solder powder and the solder paste film during reflow can be prevented. This document discloses only an example using a lead-free solder powder having a composition of Sn: 96.5% by mass, Ag: 3.0% by mass, and Cu: 0.5% by mass.
しかしながら、特許文献1には、経時的な粘度上昇を抑制したり、信頼性に優れたりすることを目的としてものではない。このため、増粘抑制効果及び信頼性をバランスよく両立させたソルダペーストが望まれている。 However, Patent Document 1 is not intended to suppress an increase in viscosity with time or to have excellent reliability. Therefore, a solder paste having both a thickening suppressing effect and reliability in a well-balanced manner is desired.
したがって、本発明は、増粘抑制効果及び信頼性をバランスよく両立可能なソルダペーストを提供することを目的とする。 Therefore, an object of the present invention is to provide a solder paste that can achieve both a thickening suppressing effect and reliability in a well-balanced manner.
本発明者らは、上記課題を解決するべく鋭意研究した結果、はんだ材料とフラックスとからなるソルダペーストであって、はんだ材料が、Sn又はSn系合金、及び特定の割合でBiを含有し、フラックスがヒンダードフェノール系化合物を含有することにより、上記課題を解決できることを見出し、本発明を完成するに至った。 As a result of diligent research to solve the above problems, the present inventors have found that the solder paste is a solder paste composed of a solder material and a flux, and the solder material contains Sn or Sn-based alloy and Bi in a specific ratio. We have found that the above problems can be solved by containing a hindered phenolic compound in the flux, and have completed the present invention.
すなわち、本発明のソルダペーストは、はんだ材料とフラックスとからなるソルダペーストであって、前記はんだ材料が、Sn又はSn系合金、20〜300質量ppmのAs、及び50質量ppm〜3.0質量%のBiを含有し、前記フラックスが、ヒンダードフェノール系化合物を含有する。 That is, the solder paste of the present invention is a solder paste composed of a solder material and a flux, and the solder material is a Sn or Sn-based alloy, As of 20 to 300 mass ppm, and 50 mass ppm to 3.0 mass. % Bi, and the flux contains a hindered phenolic compound.
本発明によれば、増粘抑制効果及び信頼性をバランスよく両立可能なソルダペーストを提供可能である。 According to the present invention, it is possible to provide a solder paste having both a thickening suppressing effect and reliability in a well-balanced manner.
以下、本発明を実施するための形態(以下、「本実施形態」という。)について説明する。ただし、本発明はこれに限定されるものではなく、その要旨を逸脱しない範囲で様々な変形が可能である。 Hereinafter, embodiments for carrying out the present invention (hereinafter, referred to as “the present embodiment”) will be described. However, the present invention is not limited to this, and various modifications can be made without departing from the gist thereof.
本明細書において、「増粘抑制効果」とは、ソルダペーストを調製した際に、調製したソルダペーストの経時的な粘度上昇を抑制できる効果をいう。 As used herein, the term "thickness suppressing effect" refers to an effect of suppressing an increase in viscosity of the prepared solder paste over time when the solder paste is prepared.
なお、本明細書において、各元素の含有量は、例えば、JIS Z 3910 に準拠にしてICP−AESで分析することにより測定することができる。 In this specification, the content of each element can be measured by, for example, analyzing by ICP-AES in accordance with JIS Z 3910.
[ソルダペースト]
本実施形態のソルダペーストは、はんだ材料とフラックスとからなるソルダペーストである。はんだ材料は、Sn又はSn系合金、20〜300質量ppmのAs、及び50質量ppm〜3.0質量%のBiを含有する。フラックスは、ヒンダードフェノール系化合物を含有する。本実施形態のソルダペーストは、上記の構成を備えることにより、増粘抑制効果を向上できる。また、本実施形態のソルダペーストを構成するはんだ材料は、上記の構成を備えることにより、液相線温度(TL)と固相線温度(TS)との差(ΔT=TL−TS)を小さくできる。このため、例えば、上記はんだ材料を含有するソルダペーストを電子機器の基板に塗布し、凝固させても、ソルダペーストは、はんだ材料の組織の均一性を保つことができる。その結果、ソルダペーストは、サイクル特性等の信頼性に優れる。このように、ソルダペーストは、上記構成を備えることにより、増粘抑制効果及び信頼性をバランスよく両立できる。
[Solder paste]
The solder paste of this embodiment is a solder paste composed of a solder material and a flux. The solder material contains Sn or Sn-based alloy, As of 20 to 300 mass ppm, and Bi of 50 mass ppm to 3.0 mass%. The flux contains a hindered phenolic compound. By providing the solder paste of the present embodiment with the above-mentioned structure, the thickening suppressing effect can be improved. Further, the solder material forming the solder paste of the present embodiment is provided with the configuration described above, the difference between the liquidus temperature (T L) and the solidus temperature (T S) (ΔT = T L -T S ) can be reduced. Therefore, for example, even if the solder paste containing the solder material is applied to the substrate of an electronic device and solidified, the solder paste can maintain the uniformity of the structure of the solder material. As a result, the solder paste is excellent in reliability such as cycle characteristics. As described above, by providing the solder paste with the above structure, it is possible to achieve both the thickening suppressing effect and the reliability in a well-balanced manner.
(はんだ材料)
はんだ材料は、Sn又はSn系合金を含有する。Sn又はSn系合金は、不可避不純物を含んでもよい。
(Solder material)
The solder material contains Sn or Sn-based alloys. Sn or Sn-based alloys may contain unavoidable impurities.
Snは、例えば、99.9%以上の純度を有するSn(3N材)であってもよく、99.99%以上の純度を有するSn(4N材)であってもよく、99.999%の純度を有するSn(5N材)であってもよい。 Sn may be, for example, Sn (3N material) having a purity of 99.9% or more, Sn (4N material) having a purity of 99.99% or more, and 99.999%. It may be Sn (5N material) having purity.
Snの含有量は、はんだ材料全体に対して、例えば、40質量%以上であってもよく、50質量%以上であってもよく、70質量%以上であってもよく、90質量%以上であってもよい。 The Sn content may be, for example, 40% by mass or more, 50% by mass or more, 70% by mass or more, or 90% by mass or more with respect to the entire solder material. There may be.
Sn系合金としては、例えば、Sn−Ag合金、Sn−Cu合金、Sn−Ag−Cu合金、Sn−Ag−Cu−Ni−Co合金、Sn−In合金、Sn−Sb合金等の組成を有する合金、上記組成を有する合金にAs、Ag、Cu、In、Ni、Co、Sb、Ge、P、Fe、Zn、Al、Ga等を添加した合金が挙げられる。Sn系合金中のSnの含有量は、特に限定されず、例えば、40質量%超とすることができる。 As the Sn-based alloy, for example, it has a composition of Sn-Ag alloy, Sn-Cu alloy, Sn-Ag-Cu alloy, Sn-Ag-Cu-Ni-Co alloy, Sn-In alloy, Sn-Sb alloy and the like. Examples thereof include alloys and alloys having the above composition to which As, Ag, Cu, In, Ni, Co, Sb, Ge, P, Fe, Zn, Al, Ga and the like are added. The Sn content in the Sn-based alloy is not particularly limited, and can be, for example, more than 40% by mass.
Sn及びSn系合金は、ΔTを小さくすることにより、信頼性に優れる観点から、Sn、Sn−Cu合金、又はSn−Ag−Cu合金であることが好ましい。Sn−Cu合金は、同様の観点から、0を超え、1.0質量%以下(好ましくは0.5〜1.0質量%)のCuを含有し、残部がSnであることが好ましい。Sn−Ag−Cu合金は、同様の観点から、0を超え、3.5質量%以下(好ましくは1.0〜3.5質量%)のAgを含有し、0を超え、1.0質量%以下(好ましくは0.1〜1.0質量%)のCuを含有し、残部がSnであることが好ましい。 The Sn and Sn-based alloys are preferably Sn, Sn—Cu alloys, or Sn—Ag—Cu alloys from the viewpoint of excellent reliability by reducing ΔT. From the same viewpoint, the Sn—Cu alloy preferably contains Cu in an amount of more than 0 and 1.0% by mass or less (preferably 0.5 to 1.0% by mass), and the balance is Sn. From the same point of view, the Sn-Ag-Cu alloy contains Ag of more than 0 and 3.5% by mass or less (preferably 1.0 to 3.5% by mass), more than 0 and 1.0% by mass. It is preferable that Cu is contained in an amount of% or less (preferably 0.1 to 1.0% by mass) and the balance is Sn.
Agの含有量は、ΔTを小さくすることにより、信頼性に優れる観点から、はんだ材料全体に対して0.05〜3.5質量%であることが好ましく、0.1〜3.0質量%であることがより好ましく、0.5〜3.0質量%であることが更に好ましい。また、Cuの含有量は、ΔTを小さくすることにより、信頼性に優れる観点から、はんだ材料全体に対して0.01〜0.9質量%であることが好ましく、0.05〜0.75質量%であることがより好ましく、0.1〜0.7質量%であることが更に好ましい。なお、上記のAg及びCuの含有量の好ましい数値範囲は各々独立したものであって、Ag及びCuの含有量は各々独立して決定することができる。 The Ag content is preferably 0.05 to 3.5% by mass, preferably 0.1 to 3.0% by mass, based on the entire solder material, from the viewpoint of excellent reliability by reducing ΔT. Is more preferable, and 0.5 to 3.0% by mass is further preferable. Further, the Cu content is preferably 0.01 to 0.9% by mass, and 0.05 to 0.75% by mass, based on the entire solder material, from the viewpoint of excellent reliability by reducing ΔT. It is more preferably 0.1% by mass, and even more preferably 0.1 to 0.7% by mass. The preferable numerical ranges of the Ag and Cu contents are independent of each other, and the Ag and Cu contents can be determined independently.
はんだ材料は、20〜300質量ppmのAsを含有する。Asの含有量が20質量ppm以上であることにより、粘度上昇が抑制され、増粘抑制効果に優れる。Asの含有量が300質量ppm以下であることにより、液相線温度(TL)と固相線温度(TS)との差(ΔT=TL−TS)を小さくでき、サイクル特性等の信頼性に優れる。このため、Asの含有量が20〜300質量ppmであることにより、本実施形態のソルダペーストは、増粘抑制効果及び信頼性をバランスよく両立できる。同様の観点から、Asの含有量は、はんだ材料全体に対して、30〜250質量ppmであることが好ましく、50〜200質量ppmであることがより好ましい。Asは、Sn又はSn系合金と共に(例えば、金属間化合物や固溶体等)を構成していてもよいし、Sn系合金とは別に、例えばAs単体や酸化物として、存在していてもよい。 The solder material contains 20 to 300 mass ppm of As. When the content of As is 20 mass ppm or more, the increase in viscosity is suppressed, and the effect of suppressing thickening is excellent. When the content of As is not more than 300 mass ppm, it can reduce the difference (ΔT = T L -T S) and the liquidus temperature (T L) and the solidus temperature (T S), the cycle characteristics, etc. Excellent in reliability. Therefore, when the As content is 20 to 300 mass ppm, the solder paste of the present embodiment can achieve both the thickening suppressing effect and the reliability in a well-balanced manner. From the same viewpoint, the content of As is preferably 30 to 250 mass ppm, more preferably 50 to 200 mass ppm, based on the entire solder material. As may be formed together with Sn or a Sn-based alloy (for example, an intermetallic compound or a solid solution), or may exist as a simple substance of As or an oxide separately from the Sn-based alloy.
はんだ材料は、50質量ppm(0.0050質量%)〜3.0質量%のBiを含有する。Biの含有量が50質量ppm以上であることにより、粘度上昇が抑制され、増粘抑制効果に優れる。Biの含有量が3.0質量%以下であることにより、液相線温度(TL)と固相線温度(TS)との差(ΔT=TL−TS)を小さくでき、サイクル特性等の信頼性に優れる。このため、Biの含有量が50質量ppm〜3.0質量%であることにより、本実施形態のソルダペーストは、増粘抑制効果及び信頼性をバランスよく両立できる。同様の観点から、Biの含有量は、はんだ材料全体に対して、50質量ppm(0.0050質量%)〜1.0質量%であることが好ましく、100質量ppm(0.010質量%)〜1.0質量%であることがより好ましい。 The solder material contains 50% by mass (0.0050% by mass) to 3.0% by mass of Bi. When the Bi content is 50 mass ppm or more, the increase in viscosity is suppressed, and the effect of suppressing thickening is excellent. When the content of Bi is less than 3.0 wt%, can reduce the difference (ΔT = T L -T S) and the liquidus temperature (T L) and the solidus temperature (T S), Cycle Excellent reliability such as characteristics. Therefore, when the Bi content is 50% by mass to 3.0% by mass, the solder paste of the present embodiment can achieve both the thickening suppressing effect and the reliability in a well-balanced manner. From the same viewpoint, the Bi content is preferably 50% by mass (0.0050% by mass) to 1.0% by mass, and 100% by mass (0.010% by mass) with respect to the entire solder material. More preferably, it is ~ 1.0% by mass.
Biは、Sn又はSn系合金と共に合金(例えば、金属間化合物、固溶体等)の形態で存在していてもよく、Sn及びSn系合金とは別に存在していてもよい。 Bi may exist in the form of an alloy (for example, an intermetallic compound, a solid solution, etc.) together with Sn or a Sn-based alloy, or may exist separately from Sn and a Sn-based alloy.
本実施形態のはんだ材料の製造方法としては、特に限定されず、例えば、原料金属を溶融混合することにより製造する方法が挙げられる。 The method for producing the solder material of the present embodiment is not particularly limited, and examples thereof include a method for producing the solder material by melting and mixing the raw material metal.
本実施形態において、はんだ材料の形態は、特に限定されず、例えば、粉末状の形態(はんだ粉末)等の粒子状の形態であってもよい。はんだ材料の形態は、流動性に優れる観点から、粒子状の形態であることが好ましく、粉末状の形態であることがより好ましい。 In the present embodiment, the form of the solder material is not particularly limited, and may be, for example, a particulate form such as a powder form (solder powder). From the viewpoint of excellent fluidity, the solder material is preferably in the form of particles, more preferably in the form of powder.
粒子状のはんだ材料の製造方法としては、例えば、溶融させたはんだ材料を滴下して粒子を得る滴下法や遠心噴霧する噴霧法、バルクのはんだ材料を粉砕する方法等が挙げられる。滴下法や噴霧法において、滴下や噴霧は、粒子状とするために不活性雰囲気や溶媒中で行うことが好ましい。 Examples of the method for producing the particulate solder material include a dropping method for obtaining particles by dropping a molten solder material, a spraying method for centrifugal spraying, and a method for crushing a bulk solder material. In the dropping method and the spraying method, the dropping and spraying are preferably carried out in an inert atmosphere or a solvent in order to form particles.
また、はんだ材料が粒子状である場合、はんだ材料は、JIS Z 3284−1:2014における粉末サイズの分類(表2)において記号1〜8に該当するサイズ(粒度分布)を有していることが好ましく、記号4〜8に該当するサイズ(粒度分布)を有していることがより好ましく、記号5〜8に該当するサイズ(粒度分布)を有していることが更に好ましい。これにより、微細な部品へのはんだ付けが可能となる。 When the solder material is in the form of particles, the solder material has a size (particle size distribution) corresponding to symbols 1 to 8 in the powder size classification (Table 2) in JIS Z 3284-1: 20 14. It is more preferable to have a size (particle size distribution) corresponding to symbols 4 to 8, and it is further preferable to have a size (particle size distribution) corresponding to symbols 5 to 8. This enables soldering to fine parts.
[フラックス]
本明細書において、「フラックス」とは、ソルダペーストにおけるはんだ材料以外の成分全体をいう。
[flux]
As used herein, the term "flux" refers to the entire components of the solder paste other than the solder material.
フラックスは、金属不活性化剤としてヒンダードフェノール系化合物を含有する。フラックスがヒンダードフェノール系化合物を含有することにより、はんだ材料は、増粘抑制効果を向上できる。 The flux contains a hindered phenolic compound as a metal inactivating agent. Since the flux contains a hindered phenolic compound, the solder material can improve the thickening suppressing effect.
ヒンダードフェノール系化合物とは、フェノールのオルト位の少なくとも一方に嵩高い置換基(例えばt−ブチル基等の分岐状又は環状アルキル基)を有するフェノール系化合物をいう。ヒンダードフェノール系化合物としては、特に限定されず、例えば、ビス[3−(3−tert−ブチル−4−ヒドロキシ−5−メチルフェニル)プロピオン酸][エチレンビス(オキシエチレン)]、N,N’−ヘキサメチレンビス[3−(3,5−ジ−tert−ブチル−4−ヒドロキシフェニル)プロパンアミド]、1,6−ヘキサンジオールビス[3−(3,5−ジ−tert−ブチル−4−ヒドロキシフェニル)プロピオナート]、2,2’−メチレンビス[6−(1−メチルシクロヘキシル)−p−クレゾール]、2,2’−メチレンビス(6−tert−ブチル−p−クレゾール)、2,2’−メチレンビス(6−tert−ブチル−4−エチルフェノール)、トリエチレングリコール−ビス〔3−(3−tert−ブチル−5−メチル−4−ヒドロキシフェニル)プロピオネート〕、1,6−ヘキサンジオール−ビス−〔3−(3,5−ジ−tert−ブチル−4−ヒドロキシフェニル)プロピオネート〕、2,4−ビス−(n−オクチルチオ)−6−(4−ヒドロキシ−3,5−ジ−t−ブチルアニリノ)−1,3,5−トリアジン、ペンタエリスリチル−テトラキス〔3−(3,5−ジ−tert−ブチル−4−ヒドロキシフェニル)プロピオネート〕、2,2−チオ−ジエチレンビス〔3−(3,5−ジ−tert−ブチル−4−ヒドロキシフェニル)プロピオネート〕、オクタデシル−3−(3,5−ジ−tert−ブチル−4−ヒドロキシフェニル)プロピオネート、N,N’−ヘキサメチレンビス(3,5−ジ−t−ブチル−4−ヒドロキシ−ヒドロシンナマミド)、3,5−ジ−tert−ブチル−4−ヒドロキシベンジルフォスフォネート−ジエチルエステル、1,3,5−トリメチル−2,4,6−トリス(3,5−ジ−tert−ブチル−4−ヒドロキシベンジル)ベンゼン等が挙げられる。これらのヒンダードフェノール系化合物は、1種を単独で、又は2種以上を組み合わせて用いられる。 The hindered phenolic compound refers to a phenolic compound having a bulky substituent (for example, a branched or cyclic alkyl group such as a t-butyl group) at at least one of the ortho positions of the phenol. The hindered phenolic compound is not particularly limited, and is, for example, bis [3- (3-tert-butyl-4-hydroxy-5-methylphenyl) propionic acid] [ethylenebis (oxyethylene)], N, N. '-Hexamethylenebis [3- (3,5-di-tert-butyl-4-hydroxyphenyl) propanamide], 1,6-hexanediolbis [3- (3,5-di-tert-butyl-4) -Hydroxyphenyl) propionate], 2,2'-methylenebis [6- (1-methylcyclohexyl) -p-cresol], 2,2'-methylenebis (6-tert-butyl-p-cresol), 2,2' -Methylenebis (6-tert-butyl-4-ethylphenol), triethylene glycol-bis [3- (3-tert-butyl-5-methyl-4-hydroxyphenyl) propionate], 1,6-hexanediol-bis -[3- (3,5-di-tert-butyl-4-hydroxyphenyl) propionate], 2,4-bis- (n-octylthio) -6- (4-hydroxy-3,5-di-t-) Butylanilino) -1,3,5-triazine, pentaerythrityl-tetrakis [3- (3,5-di-tert-butyl-4-hydroxyphenyl) propionate], 2,2-thio-diethylenebis [3-( 3,5-Di-tert-butyl-4-hydroxyphenyl) propionate], octadecyl-3- (3,5-di-tert-butyl-4-hydroxyphenyl) propionate, N, N'-hexamethylenebis (3) , 5-Di-t-butyl-4-hydroxy-hydrocinnamamide), 3,5-di-tert-butyl-4-hydroxybenzylphosphonate-diethyl ester, 1,3,5-trimethyl-2, Examples thereof include 4,6-tris (3,5-di-tert-butyl-4-hydroxybenzyl) benzene. These hindered phenolic compounds may be used alone or in combination of two or more.
ヒンダードフェノール系化合物の含有量は、フラックス全体に対して、0.5〜10質量%であることが好ましい。含有量が0.5質量%以上であることにより、ソルダペーストは、増粘抑制効果を一層向上できる。含有量が10質量%以下であることにより、ソルダペーストは、はんだ濡れ性を一層向上できる。同様の観点から、含有量は、1.0〜5.0質量%であることがより好ましく、2.0〜4.0質量%であることが更に好ましい。 The content of the hindered phenolic compound is preferably 0.5 to 10% by mass with respect to the total flux. When the content is 0.5% by mass or more, the solder paste can further improve the thickening suppressing effect. When the content is 10% by mass or less, the solder paste can further improve the solder wettability. From the same viewpoint, the content is more preferably 1.0 to 5.0% by mass, and further preferably 2.0 to 4.0% by mass.
フラックスは、樹脂を含有することが好ましい。樹脂の含有量は、フラックス全体に対して、例えば、30〜60質量%であってもよい。 The flux preferably contains a resin. The content of the resin may be, for example, 30 to 60% by mass with respect to the entire flux.
樹脂としては、特に限定されず、例えば、ロジン系樹脂、(メタ)アクリル系樹脂、ウレタン系樹脂、ポリエステル系樹脂、フェノキシ樹脂、ビニルエーテル系樹脂、テルペン樹脂、変性テルペン樹脂(例えば、芳香族変性テルペン樹脂、水添テルペン樹脂、水添芳香族変性テルペン樹脂等)、テルペンフェノール樹脂、変性テルペンフェノール樹脂(例えば、水添テルペンフェノール樹脂等)、スチレン樹脂、変性スチレン樹脂(例えば、スチレンアクリル樹脂、スチレンマレイン樹脂等)、キシレン樹脂、変性キシレン樹脂(例えば、フェノール変性キシレン樹脂、アルキルフェノール変性キシレン樹脂、フェノール変性レゾール型キシレン樹脂、ポリオール変性キシレン樹脂、ポリオキシエチレン付加キシレン樹脂等)等が挙げられる。これらの樹脂は、1種を単独で、又は2種以上を組み合わせて用いられる。これらの中でも、樹脂は、ロジン系樹脂及び(メタ)アクリル系樹脂からなる群より選択される1種以上であることが好ましい。なお、ここでいう「(メタ)アクリル系樹脂」とは、メタクリル系樹脂及びアクリル系樹脂を包含する概念をいう。 The resin is not particularly limited, and is, for example, a rosin-based resin, a (meth) acrylic-based resin, a urethane-based resin, a polyester-based resin, a phenoxy resin, a vinyl ether-based resin, a terpene resin, or a modified terpene resin (for example, an aromatic-modified terpene). Resin, hydrogenated terpene resin, hydrogenated aromatic modified terpene resin, etc.), terpene phenol resin, modified terpene phenol resin (for example, hydrogenated terpene phenol resin, etc.), styrene resin, modified styrene resin (for example, styrene acrylic resin, styrene). Maleine resin, etc.), xylene resin, modified xylene resin (for example, phenol-modified xylene resin, alkylphenol-modified xylene resin, phenol-modified resole-type xylene resin, polyol-modified xylene resin, polyoxyethylene-added xylene resin, etc.) and the like. These resins may be used alone or in combination of two or more. Among these, the resin is preferably one or more selected from the group consisting of rosin-based resins and (meth) acrylic-based resins. The term "(meth) acrylic resin" as used herein refers to a concept that includes a methacrylic resin and an acrylic resin.
ロジン系樹脂としては、例えば、ガムロジン、ウッドロジン、トール油ロジン等の原料ロジン、原料ロジンから得られる誘導体が挙げられる。誘導体としては、例えば、精製ロジン、水添ロジン、不均化ロジン、重合ロジン及びα,β不飽和カルボン酸変性物(アクリル化ロジン)、マレイン化ロジン、フマル化ロジン等)、並びに重合ロジンの精製物、水素化物及び不均化物、並びにα,β不飽和カルボン酸変性物の精製物、水素化物、不均化物等が挙げられる。これらのロジン系樹脂は、1種を単独で、又は2種以上を組み合わせて用いられる。 Examples of the rosin-based resin include raw material rosins such as gum rosin, wood rosin, and tall oil rosin, and derivatives obtained from raw material rosins. Derivatives include, for example, purified rosin, hydrogenated rosin, disproportionated rosin, polymerized rosin and α, β unsaturated carboxylic acid modified products (acrylic acid rosin), maleated rosin, fumarized rosin, etc.), and polymerized rosin Examples thereof include purified products, hydrogenated products and disproportionated products, and purified products, hydrogenated products and disproportionated products of α and β unsaturated carboxylic acid modified products. These rosin-based resins may be used alone or in combination of two or more.
ロジン系樹脂の含有量は、フラックス全体に対して、例えば、30〜60質量%であってもよい。 The content of the rosin-based resin may be, for example, 30 to 60% by mass with respect to the entire flux.
(メタ)アクリル系樹脂としては、例えば、(メタ)アクリル系モノマーの単独重合体、2種類以上の(メタ)アクリル系モノマーの共重合体が挙げられる。(メタ)アクリル系モノマーとしては、(メタ)アクリル酸、イタコン酸、マレイン酸、クロトン酸、(メタ)アクリル酸メチル、(メタ)アクリル酸エチル、(メタ)アクリル酸ブチル、(メタ)アクリル酸ヘキシル、(メタ)アクリル酸プロピル、(メタ)アクリル酸オクチル、(メタ)アクリル酸ノニル、(メタ)アクリル酸デシル、(メタ)アクリル酸ウンデシル、(メタ)アクリル酸ドデシル、(メタ)アクリル酸トリデシル、(メタ)アクリル酸テトラデシル、(メタ)アクリル酸ラウリル、(メタ)アクリル酸ステアリル等が挙げられる。これらの(メタ)アクリル系樹脂は、1種を単独で、又は2種以上を組み合わせて用いられる。 Examples of the (meth) acrylic resin include homopolymers of (meth) acrylic monomers and copolymers of two or more types of (meth) acrylic monomers. Examples of the (meth) acrylic monomer include (meth) acrylic acid, itaconic acid, maleic acid, crotonic acid, methyl (meth) acrylic acid, ethyl (meth) acrylic acid, butyl (meth) acrylic acid, and (meth) acrylic acid. Hexil, propyl (meth) acrylate, octyl (meth) acrylate, nonyl (meth) acrylate, decyl (meth) acrylate, undecyl (meth) acrylate, dodecyl (meth) acrylate, tridecyl (meth) acrylate , (Meta) tetradecyl acrylate, (meth) lauryl acrylate, stearyl (meth) acrylate and the like. These (meth) acrylic resins may be used alone or in combination of two or more.
樹脂は、(メタ)アクリル系樹脂を含有することにより、温度サイクル信頼性を向上できる。高温と低温の繰り返しのサーマルストレスを実装部又は接合部に与えた際に、ロジンのような結晶性の高い材料は割れて、その亀裂から吸湿する虞がある。これに対し、樹脂に軟らかい(メタ)アクリル系樹脂を含めることにより、上記亀裂を抑制し、その結果、温度サイクル信頼性を向上できる。(メタ)アクリル系樹脂の含有量は、フラックス全体に対して、例えば、0〜40質量%であり、温度サイクル信頼性に優れる観点から、20〜30質量%であることが好ましい。(メタ)アクリル系樹脂の含有量は、樹脂全体に対して、例えば、0〜80質量%であり、温度サイクル信頼性に優れる観点から、30〜80質量%であることが好ましい。 By containing the (meth) acrylic resin in the resin, the temperature cycle reliability can be improved. When a repeated thermal stress of high temperature and low temperature is applied to the mounting portion or the joint portion, a highly crystalline material such as rosin may crack and absorb moisture from the crack. On the other hand, by including a soft (meth) acrylic resin in the resin, the above-mentioned cracks can be suppressed, and as a result, the temperature cycle reliability can be improved. The content of the (meth) acrylic resin is, for example, 0 to 40% by mass with respect to the entire flux, and is preferably 20 to 30% by mass from the viewpoint of excellent temperature cycle reliability. The content of the (meth) acrylic resin is, for example, 0 to 80% by mass with respect to the entire resin, and is preferably 30 to 80% by mass from the viewpoint of excellent temperature cycle reliability.
フラックスは、はんだ付け性を向上させるために有機酸系活性剤(有機酸)を含有してもよい。有機酸としては、アジピン酸、アゼライン酸、エイコサン二酸、クエン酸、グリコール酸、コハク酸、サリチル酸、ジグリコール酸、ジピコリン酸、ジブチルアニリンジグリコール酸、スベリン酸、セバシン酸、チオグリコール酸、テレフタル酸、ドデカン二酸、パラヒドロキシフェニル酢酸、ピコリン酸、フェニルコハク酸、フタル酸、フマル酸、マレイン酸、マロン酸、ラウリン酸、安息香酸、酒石酸、イソシアヌル酸トリス(2−カルボキシエチル)、グリシン、1,3−シクロヘキサンジカルボン酸、2,2−ビス(ヒドロキシメチル)プロピオン酸、2,2−ビス(ヒドロキシメチル)ブタン酸、2,3−ジヒドロキシ安息香酸、2,4−ジエチルグルタル酸、2−キノリンカルボン酸、3−ヒドロキシ安息香酸、リンゴ酸、p−アニス酸、ステアリン酸、12−ヒドロキシステアリン酸、オレイン酸、リノール酸、リノレン酸、ダイマー酸、水添ダイマー酸、トリマー酸、水添トリマー酸等が挙げられる。 The flux may contain an organic acid-based activator (organic acid) in order to improve solderability. Organic acids include adipic acid, azelaic acid, eicosanic acid, citric acid, glycolic acid, succinic acid, salicylic acid, diglycolic acid, dipicolinic acid, dibutylaniline diglycolic acid, suberic acid, sebacic acid, thioglycolic acid, terephthal Acid, dodecanedioic acid, parahydroxyphenylacetic acid, picolinic acid, phenylsuccinic acid, phthalic acid, fumaric acid, maleic acid, malonic acid, lauric acid, benzoic acid, tartaric acid, tris isocyanurate (2-carboxyethyl), glycine, 1,3-Cyclohexanedicarboxylic acid, 2,2-bis (hydroxymethyl) propionic acid, 2,2-bis (hydroxymethyl) butanoic acid, 2,3-dihydroxybenzoic acid, 2,4-diethylglutaric acid, 2- Kinolincarboxylic acid, 3-hydroxybenzoic acid, malic acid, p-anisic acid, stearic acid, 12-hydroxystearic acid, oleic acid, linoleic acid, linolenic acid, dimer acid, hydrogenated dimer acid, trimeric acid, hydrogenated trimmer Acids and the like can be mentioned.
有機酸の含有量は、フラックス全体に対して、例えば、0〜10質量%であってもよい。 The content of the organic acid may be, for example, 0 to 10% by mass with respect to the entire flux.
フラックスは、はんだ付け性を向上させるためにアミン系活性剤(アミン)を含有してもよい。アミンとしては、例えば、アミン脂肪族アミン、芳香族アミン、アミノアルコール、イミダゾール、ベンゾトリアゾール、アミノ酸、グアニジン、ヒドラジド等が挙げられる。脂肪族アミンとしては、例えば、ジメチルアミン、エチルアミン、1−アミノプロパン、イソプロピルアミン、トリメチルアミン、アリルアミン、n−ブチルアミン、ジエチルアミン、sec−ブチルアミン、tert−ブチルアミン、N,N−ジメチルエチルアミン、イソブチルアミン、シクロヘキシルアミン等が挙げられる。芳香族アミンとしては、例えば、アニリン、N−メチルアニリン、ジフェニルアミン、N−イソプロピルアニリン、p−イソプロピルアニリン等が挙げられる。アミノアルコールとしては、例えば、2−アミノエタノール、2−(エチルアミノ)エタノール、ジエタノールアミン、ジイソプロパノールアミン、トリエタノールアミン、N−ブチルジエタノールアミン、トリイソプロパノールアミン、N,N−ビス(2−ヒドロキシエチル)−N−シクロヘキシルアミン、N,N,N',N'−テトラキス(2−ヒドロキシプロピル)エチレンジアミン、N,N,N',N'',N''−ペンタキス(2−ヒドロキシプロピル)ジエチレントリアミン等が挙げられる。イミダゾールとしては、例えば、2−メチルイミダゾール、2−ウンデシルイミダゾール、2−ヘプタデシルイミダゾール、1,2−ジメチルイミダゾール、2−エチル−4−メチルイミダゾール、2−フェニルイミダゾール、2−フェニル−4−メチルイミダゾール、1−ベンジル−2−メチルイミダゾール、1−ベンジル−2−フェニルイミダゾール、1−シアノエチル−2−メチルイミダゾール、1−シアノエチル−2−ウンデシルイミダゾール、1−シアノエチル−2−エチル−4−メチルイミダゾール、1−シアノエチル−2−フェニルイミダゾール、1−シアノエチル−2−ウンデシルイミダゾリウムトリメリテイト、1−シアノエチル−2−フェニルイミダゾリウムトリメリテイト、2,4−ジアミノ−6−[2'―メチルイミダゾリル−(1')]―エチル−s−トリアジン、2,4−ジアミノ−6−[2'―ウンデシルイミダゾリル−(1')]―エチル−s−トリアジン、2,4−ジアミノ−6−[2'―エチル−4'―メチルイミダゾリル−(1')]―エチル−s−トリアジン、2,4−ジアミノ−6−[2'―メチルイミダゾリル−(1')]―エチル−s−トリアジンイソシアヌル酸付加物、2−フェニルイミダゾールイソシアヌル酸付加物、2−フェニル−4,5−ジヒドロキシメチルイミダゾール、2−フェニル−4−メチル−5−ヒドロキシメチルイミダゾール、2,3−ジヒドロ−1H−ピロロ[1,2−a]ベンズイミダゾール、1−ドデシル−2−メチル−3−ベンジルイミダゾリウムクロライド、2−メチルイミダゾリン、2−フェニルイミダゾリン、2,4−ジアミノ−6−ビニル−s−トリアジン、2,4−ジアミノ−6−ビニル−s−トリアジンイソシアヌル酸付加物、2,4−ジアミノ−6−メタクリロイルオキシエチル−s−トリアジン、エポキシ―イミダゾールアダクト、2−メチルベンゾイミダゾール、2−オクチルベンゾイミダゾール、2−ペンチルベンゾイミダゾール、2−(1−エチルペンチル)ベンゾイミダゾール、2−ノニルベンゾイミダゾール、2−(4−チアゾリル)ベンゾイミダゾール、ベンゾイミダゾール等が挙げられる。ベンゾトリアゾールとしては、例えば、2−(2'―ヒドロキシ−5'―メチルフェニル)ベンゾトリアゾール、2−(2'―ヒドロキシ−3'―tert−ブチル−5'―メチルフェニル)−5−クロロベンゾトリアゾール、2−(2'―ヒドロキシ−3',5'―ジ−tert−アミルフェニル)ベンゾトリアゾール、2−(2'―ヒドロキシ−5'−tert−オクチルフェニル)ベンゾトリアゾール、2,2’―メチレンビス[6−(2H−ベンゾトリアゾール−2−イル)−4−tert−オクチルフェノール]、6−(2−ベンゾトリアゾリル)−4−tert−オクチル−6'−tert−ブチル−4'−メチル−2,2'−メチレンビスフェノール、1,2,3−ベンゾトリアゾール、1−[N,N−ビス(2−エチルヘキシル)アミノメチル]ベンゾトリアゾール、カルボキシベンゾトリアゾール、1−[N,N−ビス(2−エチルヘキシル)アミノメチル]メチルベンゾトリアゾール、2,2’―[[(メチル−1H−ベンゾトリアゾール−1−イル)メチル]イミノ]ビスエタノール、1,2,3−ベンゾトリアゾールナトリウム塩水溶液、1−(1',2'―ジカルボキシエチル)ベンゾトリアゾール、1−(2,3−ジカルボキシプロピル)ベンゾトリアゾール、1−[(2−エチルヘキシルアミノ)メチル]ベンゾトリアゾール、2,6−ビス[(1H−ベンゾトリアゾール−1−イル)メチル]−4−メチルフェノール、5−メチルベンゾトリアゾール等が挙げられる。アミノ酸としては、アラニン、アルギニン、アスパラギン、アスパラギン酸、システイン塩酸塩、グルタミン、グルタミン酸、グリシン、ヒスチジン、イソロイシン、ロイシン、リジン一塩酸塩、メチオニン、フェニルアラニン、プロリン、セリン、トレオニン、トリプトファン、チロシン、バリン、β-アラニン、γ-アミノ酪酸、δ-アミノ吉草酸、ε-アミノヘキサン酸、ε-カプロラクタム、7−アミノヘプタン酸等が挙げられる。グアニジンとしては、例えば、カルボジヒドラジド、マロン酸ジヒドラジド、コハク酸ジヒドラジド、アジピン酸ジヒドラジド、1,3−ビス(ヒドラジノカルボノエチル)−5−イソプロピルヒダントイン、セバシン酸ジヒドラジド、ドデカン二酸ジヒドラジド、7,11−オクタデカジエン−1,18−ジカルボヒドラジド、イソフタル酸ジヒドラジド等が挙げられる。ヒドラジドとしては、例えば、ジシアンジアミド、1,3−ジフェニルグアニジン、1,3−ジ−o−トリルグアニジン等が挙げられる。 The flux may contain an amine-based activator (amine) in order to improve solderability. Examples of amines include amine aliphatic amines, aromatic amines, amino alcohols, imidazoles, benzotriazoles, amino acids, guanidines, hydrazides and the like. Examples of the aliphatic amine include dimethylamine, ethylamine, 1-aminopropane, isopropylamine, trimethylamine, allylamine, n-butylamine, diethylamine, sec-butylamine, tert-butylamine, N, N-dimethylethylamine, isobutylamine and cyclohexyl. Amine and the like can be mentioned. Examples of the aromatic amine include aniline, N-methylaniline, diphenylamine, N-isopropylaniline, p-isopropylaniline and the like. Examples of amino alcohols include 2-aminoethanol, 2- (ethylamino) ethanol, diethanolamine, diisopropanolamine, triethanolamine, N-butyldiethanolamine, triisopropanolamine, N, N-bis (2-hydroxyethyl). -N-cyclohexylamine, N, N, N', N'-tetrax (2-hydroxypropyl) ethylenediamine, N, N, N', N'', N''-pentakis (2-hydroxypropyl) diethylenetriamine, etc. Can be mentioned. Examples of the imidazole include 2-methylimidazole, 2-undecyl imidazole, 2-heptadecyl imidazole, 1,2-dimethyl imidazole, 2-ethyl-4-methyl imidazole, 2-phenyl imidazole and 2-phenyl-4- Methylimidazole, 1-benzyl-2-methylimidazole, 1-benzyl-2-phenylimidazole, 1-cyanoethyl-2-methylimidazole, 1-cyanoethyl-2-undecylimidazole, 1-cyanoethyl-2-ethyl-4- Methylimidazole, 1-cyanoethyl-2-phenylimidazole, 1-cyanoethyl-2-undecyl imidazolium trimerite, 1-cyanoethyl-2-phenylimidazolium trimerite, 2,4-diamino-6- [2' -Methylimidazolyl- (1')]-ethyl-s-triazine, 2,4-diamino-6- [2'-undecylimidazolyl- (1')]-ethyl-s-triazine, 2,4-diamino- 6- [2'-ethyl-4'-methylimidazolyl- (1')]-ethyl-s-triazine, 2,4-diamino-6- [2'-methylimidazolyl- (1')]-ethyl-s -Triazine isocyanuric acid adduct, 2-phenylimidazole isocyanuric acid adduct, 2-phenyl-4,5-dihydroxymethylimidazole, 2-phenyl-4-methyl-5-hydroxymethylimidazole, 2,3-dihydro-1H- Pyrrolo [1,2-a] benzimidazole, 1-dodecyl-2-methyl-3-benzylimidazolium chloride, 2-methylimidazoline, 2-phenylimidazoline, 2,4-diamino-6-vinyl-s-triazine, 2,4-Diamino-6-vinyl-s-triazine isocyanuric acid adduct, 2,4-diamino-6-methacryloyloxyethyl-s-triazine, epoxy-imidazole adduct, 2-methylbenzoimidazole, 2-octylbenzoimidazole , 2-Pentylbenzoimidazole, 2- (1-ethylpentyl) benzoimidazole, 2-nonylbenzoimidazole, 2- (4-thiazolyl) benzoimidazole, benzoimidazole and the like. Examples of the benzotriazole include 2- (2'-hydroxy-5'-methylphenyl) benzotriazole and 2- (2'-hydroxy-3'-tert-butyl-5'-methylphenyl) -5-chlorobenzo. Triazole, 2- (2'-hydroxy-3', 5'-di-tert-amylphenyl) benzotriazole, 2- (2'-hydroxy-5'-tert-octylphenyl) benzotriazole, 2,2'- Methylenebis [6- (2H-benzotriazole-2-yl) -4-tert-octylphenol], 6- (2-benzotriazolyl) -4-tert-octyl-6'-tert-butyl-4'-methyl -2,2'-Methylenebisphenol, 1,2,3-benzotriazole, 1- [N, N-bis (2-ethylhexyl) aminomethyl] benzotriazole, carboxybenzotriazole, 1- [N, N-bis ( 2-Ethylhexyl) aminomethyl] methylbenzotriazole, 2,2'-[[(methyl-1H-benzotriazole-1-yl) methyl] imino] bisethanol, 1,2,3-benzotriazole sodium salt aqueous solution, 1 -(1', 2'-dicarboxyethyl) benzotriazole, 1- (2,3-dicarboxypropyl) benzotriazole, 1-[(2-ethylhexylamino) methyl] benzotriazole, 2,6-bis [( 1H-benzotriazole-1-yl) methyl] -4-methylphenol, 5-methylbenzotriazole and the like can be mentioned. Amino acids include alanine, arginine, aspartic acid, aspartic acid, cysteine hydrochloride, glutamine, glutamic acid, glycine, histidine, isoleucine, leucine, lysine monohydrochloride, methionine, phenylalanine, proline, serine, threonine, tryptophan, tyrosine, valine, Examples thereof include β-alanine, γ-aminobutyric acid, δ-aminovaleric acid, ε-aminohexanoic acid, ε-caprolactam and 7-aminoheptanoic acid. Examples of guanidine include carbodihydrazide, malonic acid dihydrazide, succinic acid dihydrazide, adipic acid dihydrazide, 1,3-bis (hydrazinocarbonoethyl) -5-isopropylhydrandine, sebacic acid dihydrazide, dodecanedioic acid dihydrazide, 7, Examples thereof include 11-octadecaziene-1,18-dicarbohydrazide and isophthalic acid dihydrazide. Examples of the hydrazide include dicyandiamide, 1,3-diphenylguanidine, 1,3-di-o-tolylguanidine and the like.
アミンの含有量は、フラックス全体に対して、例えば、0〜20質量%であってもよい。 The amine content may be, for example, 0 to 20% by mass with respect to the total flux.
フラックスは、はんだ付け性を向上させるために、共有結合性ハロゲン活性剤(共有結合性ハロゲン)を含有してもよい。共有結合性ハロゲンとしては、例えば、トランス−2,3−ジブロモ−2−ブテン−1,4−ジオール、2,3−ジブロモ−1,4−ブタンジオール、2,3−ジブロモ−1−プロパノール、2,3−ジクロロ−1−プロパノール、1,1,2,2−テトラブロモエタン、2,2,2−トリブロモエタノール、ペンタブロモエタン、四臭化炭素、2,2−ビス(ブロモメチル)−1,3−プロパンジオール、meso−2,3−ジブロモこはく酸、クロロアルカン、塩素化脂肪酸エステル、臭化n−ヘキサデシルトリメチルアンモニウム、トリアリルイソシアヌレート6臭化物、2,2−ビス[3,5−ジブロモ−4−(2,3−ジブロモプロポキシ)フェニル]プロパン、ビス[3,5−ジブロモ−4−(2,3−ジブロモプロポキシ)フェニル]スルホン、エチレンビスペンタブロモベンゼン、2−クロロメチルオキシラン、ヘット酸、ヘット酸無水物、臭化ビスフェノールA型エポキシ樹脂等が挙げられる。 The flux may contain a covalent halogen activator (covalent halogen) in order to improve solderability. Examples of the covalent halogen include trans-2,3-dibromo-2-butene-1,4-diol, 2,3-dibromo-1,4-butanediol, 2,3-dibromo-1-propanol, and the like. 2,3-Dichloro-1-propanol, 1,1,2,2-tetrabromoethane, 2,2,2-tribromoethanol, pentabromoethane, carbon tetrabromide, 2,2-bis (bromomethyl)- 1,3-Propanediol, meso-2,3-dibromoethane, chloroalkane, chlorinated fatty acid ester, n-hexadecyltrimethylammonium bromide, triallyl isocyanurate 6 bromide, 2,2-bis [3,5 −Dibromo-4- (2,3-dibromopropoxy) phenyl] propane, bis [3,5-dibromo-4- (2,3-dibromopropoxy) phenyl] sulfone, ethylenebispentabromobenzene, 2-chloromethyloxylane , Hetic acid, hetic acid anhydride, bromide bisphenol A type epoxy resin and the like.
共有結合性ハロゲンの含有量は、フラックス全体に対して、例えば、0〜5質量%であってもよい。 The content of the covalent halogen may be, for example, 0 to 5% by mass with respect to the entire flux.
フラックスは、はんだ付け性を向上させるためにアミンハロゲン化水素酸塩活性剤(アミンハロゲン化水素酸塩)を含有してもよい。アミンハロゲン化水素酸塩としては、アミンとして例示したアミンのハロゲン化水素酸塩が挙げられる。アミンハロゲン化水素酸塩としては、例えば、ステアリルアミン塩酸塩、ジエチルアニリン塩酸塩、ジエタノールアミン塩酸塩、2−エチルヘキシルアミン臭化水素酸塩、ピリジン臭化水素酸塩、イソプロピルアミン臭化水素酸塩、シクロヘキシルアミン臭化水素酸塩、ジエチルアミン臭化水素酸塩、モノエチルアミン臭化水素酸塩、1,3−ジフェニルグアニジン臭化水素酸塩、ジメチルアミン臭化水素酸塩、ジメチルアミン塩酸塩、ロジンアミン臭化水素酸塩、2−エチルヘキシルアミン塩酸塩、イソプロピルアミン塩酸塩、シクロヘキシルアミン塩酸塩、2−ピペコリン臭化水素酸塩、1,3−ジフェニルグアニジン塩酸塩、ジメチルベンジルアミン塩酸塩、ヒドラジンヒドラート臭化水素酸塩、ジメチルシクロヘキシルアミン塩酸塩、トリノニルアミン臭化水素酸塩、ジエチルアニリン臭化水素酸塩、2−ジエチルアミノエタノール臭化水素酸塩、2−ジエチルアミノエタノール塩酸塩、塩化アンモニウム、ジアリルアミン塩酸塩、ジアリルアミン臭化水素酸塩、モノエチルアミン塩酸塩、モノエチルアミン臭化水素酸塩、ジエチルアミン塩酸塩、トリエチルアミン臭化水素酸塩、トリエチルアミン塩酸塩、ヒドラジン一塩酸塩、ヒドラジン二塩酸塩、ヒドラジン一臭化水素酸塩、ヒドラジン二臭化水素酸塩、ピリジン塩酸塩、アニリン臭化水素酸塩、ブチルアミン塩酸塩、へキシルアミン塩酸塩、n−オクチルアミン塩酸塩、ドデシルアミン塩酸塩、ジメチルシクロヘキシルアミン臭化水素酸塩、エチレンジアミン二臭化水素酸塩、ロジンアミン臭化水素酸塩、2−フェニルイミダゾール臭化水素酸塩、4−ベンジルピリジン臭化水素酸塩、L−グルタミン酸塩酸塩、N−メチルモルホリン塩酸塩、ベタイン塩酸塩、2−ピペコリンヨウ化水素酸塩、シクロヘキシルアミンヨウ化水素酸塩、1,3−ジフェニルグアニジンフッ化水素酸塩、ジエチルアミンフッ化水素酸塩、2−エチルヘキシルアミンフッ化水素酸塩、シクロヘキシルアミンフッ化水素酸塩、エチルアミンフッ化水素酸塩、ロジンアミンフッ化水素酸塩、シクロヘキシルアミンテトラフルオロホウ酸塩、ジシクロヘキシルアミンテトラフルオロホウ酸塩等が挙げられる。 The flux may contain an amine hydrohalide activator (aminehal hydrohalide) in order to improve solderability. Examples of the amine hydrohalide include amine halide hydrolates exemplified as amines. Examples of the amine halogenated hydroxide include stearylamine hydrochloride, diethylaniline hydrochloride, diethanolamine hydrochloride, 2-ethylhexylamine hydrobromide, pyridine hydrobromide, and isopropylamine hydrofluorate. Cyclohexylamine hydrofluoric acid salt, diethylamine hydrofluoric acid salt, monoethylamine hydrofluoric acid salt, 1,3-diphenylguanidine hydrofluoric acid salt, dimethylamine hydrofluoric acid salt, dimethylamine hydrochloride, rosinamine odor Hydrofluoric acid salt, 2-ethylhexylamine hydrochloride, isopropylamine hydrochloride, cyclohexylamine hydrochloride, 2-pipecholine hydrobromide, 1,3-diphenylguanidine hydrochloride, dimethylbenzylamine hydrochloride, hydrazinehydrate odor Hydrofluoric acid salt, dimethylcyclohexylamine hydrochloride, trinonylamine hydrobromide, diethylaniline hydrofluorate, 2-diethylaminoethanol hydrobromide, 2-diethylaminoethanol hydrochloride, ammonium chloride, diallylamine hydrochloride Salt, diallylamine hydrofluoric acid salt, monoethylamine hydrochloride, monoethylamine hydrofluorate, diethylamine hydrochloride, triethylamine hydrofluorate, triethylamine hydrochloride, hydrazine monohydrochloride, hydrazine dihydrochloride, hydrazine monoodor Hydrofluoric acid, hydrazine dibromide, pyridine hydrochloride, aniline hydrobromide, butylamine hydrochloride, hexylamine hydrochloride, n-octylamine hydrochloride, dodecylamine hydrochloride, dimethylcyclohexylamine bromide Hydrofluorate, ethylenediamine hydrofluorate, rosinamine hydrofluorate, 2-phenylimidazole hydrofluorate, 4-benzylpyridine hydrofluorate, L-glutamate, N-methylmorpholine hydrochloride Salt, betaine hydrochloride, 2-pipecholine hydroiodide, cyclohexylamine hydroiodide, 1,3-diphenylguanidine hydrofluorate, diethylamine hydrofluorate, 2-ethylhexylamine hydrofluorate , Cyclohexylamine hydrofluorate, ethylamine hydrofluorate, rosinamine hydrofluorate, cyclohexylaminetetrafluoroborate, dicyclohexylaminetetrafluoroborate and the like.
アミンハロゲン化水素酸塩の含有量は、フラックス全体に対して、例えば、0〜2質量%であってもよい。 The content of the amine hydrohalide may be, for example, 0 to 2% by mass with respect to the entire flux.
フラックスは、溶剤を含有してもよい。溶剤としては、水、アルコール系溶剤、グリコールエーテル系溶剤、テルピネオール類等が挙げられる。アルコール系溶剤としては、イソプロピルアルコール、1,2−ブタンジオール、イソボルニルシクロヘキサノール、2,4−ジエチル−1,5−ペンタンジオール、2,2−ジメチル−1,3−プロパンジオール、2,5−ジメチル−2,5−ヘキサンジオール、2,5−ジメチル−3−ヘキシン−2,5−ジオール、2,3−ジメチル−2,3−ブタンジオール、1,1,1−トリス(ヒドロキシメチル)エタン、2−エチル−2−ヒドロキシメチル−1,3−プロパンジオール、2,2′−オキシビス(メチレン)ビス(2−エチル−1,3−プロパンジオール)、2,2−ビス(ヒドロキシメチル)−1,3−プロパンジオール、1,2,6−トリヒドロキシヘキサン、ビス[2,2,2−トリス(ヒドロキシメチル)エチル]エーテル、1−エチニル−1−シクロヘキサノール、1,4−シクロヘキサンジオール、1,4−シクロヘキサンジメタノール、エリトリトール、トレイトール、グアヤコールグリセロールエーテル、3,6−ジメチル−4−オクチン−3,6−ジオール、2,4,7,9−テトラメチル−5−デシン−4,7−ジオール等が挙げられる。グリコールエーテル系溶剤としては、ジエチレングリコールモノ−2−エチルヘキシルエーテル、エチレングリコールモノフェニルエーテル、2−メチルペンタン−2,4−ジオール、ジエチレングリコールモノヘキシルエーテル、ジエチレングリコールジブチルエーテル、トリエチレングリコールモノブチルエーテル、ヘキシルジグリコール、テトラエチレングリコールジメチルエーテル等が挙げられる。 The flux may contain a solvent. Examples of the solvent include water, alcohol-based solvents, glycol ether-based solvents, terpineols and the like. Examples of the alcohol-based solvent include isopropyl alcohol, 1,2-butanediol, isobornylcyclohexanol, 2,4-diethyl-1,5-pentanediol, 2,2-dimethyl-1,3-propanediol, 2, 5-dimethyl-2,5-hexanediol, 2,5-dimethyl-3-hexine-2,5-diol, 2,3-dimethyl-2,3-butanediol, 1,1,1-tris (hydroxymethyl) ) Ethan, 2-ethyl-2-hydroxymethyl-1,3-propanediol, 2,2'-oxybis (methylene) bis (2-ethyl-1,3-propanediol), 2,2-bis (hydroxymethyl) ) -1,3-Propanediol, 1,2,6-trihydroxyhexane, bis [2,2,2-tris (hydroxymethyl) ethyl] ether, 1-ethynyl-1-cyclohexanol, 1,4-cyclohexane Diol, 1,4-cyclohexanedimethanol, erythritol, tretol, guayacol glycerol ether, 3,6-dimethyl-4-octin-3,6-diol, 2,4,7,9-tetramethyl-5-decine- Examples thereof include 4,7-diol. Examples of glycol ether-based solvents include diethylene glycol mono-2-ethylhexyl ether, ethylene glycol monophenyl ether, 2-methylpentane-2,4-diol, diethylene glycol monohexyl ether, diethylene glycol dibutyl ether, triethylene glycol monobutyl ether, and hexyl diglycol. , Tetraethylene glycol dimethyl ether and the like.
溶媒の含有量は、例えば、フラックス全体に対して、0〜80質量%であってもよい。 The content of the solvent may be, for example, 0 to 80% by mass with respect to the entire flux.
フラックスは、チキソ剤を含有してもよい。チキソ剤としては、例えば、ワックス系チキソ剤、アマイド系チキソ剤等が挙げられる。ワックス系チキソ剤としては、例えば、ヒマシ硬化油等が挙げられる。アマイド系チキソ剤としては、例えば、ラウリン酸アマイド、パルミチン酸アマイド、ステアリン酸アマイド、ベヘン酸アマイド、ヒドロキシステアリン酸アマイド、飽和脂肪酸アマイド、オレイン酸アマイド、エルカ酸アマイド、不飽和脂肪酸アマイド、p−トルエンメタンアマイド、芳香族アマイド、メチレンビスステアリン酸アマイド、エチレンビスラウリン酸アマイド、エチレンビスヒドロキシステアリン酸アマイド、飽和脂肪酸ビスアマイド、メチレンビスオレイン酸アマイド、不飽和脂肪酸ビスアマイド、m−キシリレンビスステアリン酸アマイド、芳香族ビスアマイド、飽和脂肪酸ポリアマイド、不飽和脂肪酸ポリアマイド、芳香族ポリアマイド、置換アマイド、メチロールステアリン酸アマイド、メチロールアマイド、脂肪酸エステルアマイド等が挙げられる。 The flux may contain a thixotropic agent. Examples of the thixotropy include wax-based thixotropy, amide-based thixotropy, and the like. Examples of the wax-based thixotropy include castor oil and the like. Examples of amido-based thixo agents include laurate amide, palmitate amide, stearic acid amide, bechenic acid amide, hydroxystearic acid amide, saturated fatty acid amide, oleic acid amide, erucate amide, unsaturated fatty acid amide, and p-toluene. Methane amide, aromatic amide, methylene bisstearic acid amide, ethylene bislauric acid amide, ethylene bishydroxystearic acid amide, saturated fatty acid bis amide, methylene bisoleic acid amide, unsaturated fatty acid bis amide, m-xylylene bisstearate amide, Examples thereof include aromatic bisamide, saturated fatty acid polyamide, unsaturated fatty acid polyamide, aromatic polyamide, substituted amide, methylol stearate amide, methylol amide, and fatty acid ester amide.
チキソ剤の含有量は、フラックス全体に対して、例えば、0〜15質量%であってもよい。 The content of the thixotropic agent may be, for example, 0 to 15% by mass with respect to the entire flux.
本実施形態において、はんだ材料の含有量と、フラックスの含有量との質量比(はんだ材料:フラックス)は、例えば、はんだ材料95質量%:フラックス5質量%〜はんだ材料5質量%:フラックス95質量%であってもよく、好ましくははんだ材料95質量%:フラックス5質量%〜はんだ材料85質量%:フラックス15質量%であってもよい。 In the present embodiment, the mass ratio of the content of the solder material to the content of the flux (solder material: flux) is, for example, 95% by mass of the solder material: 5% by mass of the flux to 5% by mass of the solder material: 95% by mass of the flux. It may be%, preferably 95% by mass of the solder material: 5% by mass of the flux to 85% by mass of the solder material: 15% by mass of the flux.
本実施形態において、ソルダペーストは、酸化ジルコニウム粉末をさらに含むことができる。ソルダペースト全体の質量に対する酸化ジルコニウム粉末の含有量は、0.05〜20.0質量%が好ましく、0.05〜10.0質量%がより好ましく、0.1〜3質量%が最も好ましい。酸化ジルコニウム粉末の含有量が上記範囲内であれば、フラックスに含まれる活性剤が酸化ジルコニウム粉末と優先的に反応し、はんだ粉末表面のSnやSn酸化物との反応が起こりにくくなることで経時変化による粘度上昇を更に抑制する効果が発揮される。 In this embodiment, the solder paste can further contain zirconium oxide powder. The content of the zirconium oxide powder with respect to the total mass of the solder paste is preferably 0.05 to 20.0% by mass, more preferably 0.05 to 10.0% by mass, and most preferably 0.1 to 3% by mass. When the content of the zirconium oxide powder is within the above range, the activator contained in the flux reacts preferentially with the zirconium oxide powder, and the reaction with Sn or Sn oxide on the surface of the solder powder is less likely to occur. The effect of further suppressing the increase in viscosity due to the change is exhibited.
ソルダペーストに添加する酸化ジルコニウム粉末の粒径の上限に限定はないが、5μm以下であることが好ましい。粒径が5μm以下であるとペーストの印刷性を維持することができる。また、下限も特に限定されることはないが、0.5μm以上であることが好ましい。上記粒径は、酸化ジルコニウム粉末のSEM写真を撮影し、視野内に存在する各粒子について画像解析により投影円相当径を求めたときの、投影円相当径が0.1μm以上であるものの投影円相当径の平均値とする。酸化ジルコニウム粒子の形状は特に限定されないが、異形状であればフラックスとの接触面積が大きく増粘抑制効果がある。球形であると良好な流動性が得られるためにペーストとしての優れた印刷性が得られる。所望の特性に応じて適宜形状を選択すればよい。 The upper limit of the particle size of the zirconium oxide powder added to the solder paste is not limited, but is preferably 5 μm or less. When the particle size is 5 μm or less, the printability of the paste can be maintained. The lower limit is not particularly limited, but is preferably 0.5 μm or more. The above particle size is the projected circle of the zirconium oxide powder, although the projected circle equivalent diameter is 0.1 μm or more when the SEM photograph of the zirconium oxide powder is taken and the projected circle equivalent diameter is obtained by image analysis for each particle existing in the visual field. The average value of the equivalent diameter. The shape of the zirconium oxide particles is not particularly limited, but if the particles have a different shape, the contact area with the flux is large and the thickening suppressing effect is obtained. When it is spherical, good fluidity can be obtained, so that excellent printability as a paste can be obtained. The shape may be appropriately selected according to the desired characteristics.
本実施形態において、ソルダペーストは、本実施形態のはんだ材料(はんだ粉末)とフラックスとを公知の方法により混練することにより製造することができる。 In the present embodiment, the solder paste can be produced by kneading the solder material (solder powder) of the present embodiment and the flux by a known method.
本実施形態のソルダペーストは、例えば、電子機器における微細構造の回路基板に用いられ、具体的には、メタルマスクを用いた印刷法、ディスペンサを用いた吐出法、又は転写ピンによる転写法等により、はんだ付け部に塗布し、リフローを行うことができる。 The solder paste of the present embodiment is used, for example, for a circuit board having a fine structure in an electronic device, and specifically, by a printing method using a metal mask, a discharge method using a dispenser, a transfer method using a transfer pin, or the like. , Can be applied to the soldered part and reflowed.
以下、本発明について実施例により具体的に説明するが、本発明は実施例に記載の内容に限定されるものではない。 Hereinafter, the present invention will be specifically described with reference to Examples, but the present invention is not limited to the contents described in the Examples.
(はんだ粉末の調整)
表1〜表10に示す各金属を表1〜表10に示す組成になるように、溶融混合し、Ar雰囲気中で遠心噴霧することにより粉末を調製した。各表中の数値は、はんだ粉末の合計が100質量%としたときの各金属の含有量(質量%)を表し、「Bal」は、残部を表す。また、各はんだ粉末の平均粒子径をJIS Z3284−1:2014に準じて測定し、測定値からJIS Z3284−1:2014の粉末サイズ分類の表2に従って分類した。各表中に示す数値は、JIS Z3284−1:2014の表2における粉末サイズの記号を示す。
(Adjustment of solder powder)
Each metal shown in Tables 1 to 10 was melt-mixed so as to have the composition shown in Tables 1 to 10, and powder was prepared by centrifugal spraying in an Ar atmosphere. The numerical values in each table represent the content (mass%) of each metal when the total of the solder powder is 100% by mass, and "Bal" represents the balance. Further, the average particle size of the solder powder JIS Z3284-1: 20 according to the 1 4 measured, JIS Z3284-1 from measurements: were classified according to Table 2 of 20 1 4 powder sizing. The numerical values shown in each table indicate the powder size symbols in Table 2 of JIS Z3284-1: 20 14.
(フラックスの調製)
表1〜表10に示す各材料を、表1〜表10に示す組成となるように加熱撹拌した後、冷却することによりフラックスを調製した。各表中の数値は、フラックスの合計が100質量%としたときの各材料の含有量(質量%)を表す。以下に表中に示す各材料の試薬名及びCAS番号を示す。
(Preparation of flux)
Each material shown in Tables 1 to 10 was heated and stirred so as to have the composition shown in Tables 1 to 10, and then cooled to prepare a flux. The numerical values in each table represent the content (mass%) of each material when the total flux is 100% by mass. The reagent names and CAS numbers of each material shown in the table are shown below.
・「金属不活性化剤A」
試薬名:ビス[3−(3−tert−ブチル−4−ヒドロキシ−5−メチルフェニル)プロピオン酸][エチレンビス(オキシエチレン)]
CAS No.36443−68−2
・「金属不活性化剤B」
試薬名:N,N’−ヘキサメチレンビス[3−(3,5−ジ−tert−ブチル−4−ヒドロキシフェニル)プロパンアミド]
CAS No.23128−74−7
・「金属不活性化剤C」
試薬名:1,6−ヘキサンジオールビス[3−(3,5−ジ−tert−ブチル−4−ヒドロキシフェニル)プロピオナート]
CAS No.35074−77−2
・「金属不活性化剤D」
試薬名:2,2’−メチレンビス[6−(1−メチルシクロヘキシル)−p−クレゾール]
CAS No.77−62−3
・「金属不活性化剤E」
試薬名:2,2’−メチレンビス(6−tert−ブチル−p−クレゾール)
CAS No.119−47−1
・「金属不活性化剤F」
試薬名:2,2’−メチレンビス(6−tert−ブチル−4−エチルフェノール)
CAS No.88−24−4
・「金属不活性化剤G」
試薬名:N−(2H−1,2,4−トリアゾール−5−イル)サリチルアミド
CAS No.36411−52−6
・試薬名:2−エチル−4−メチルイミダゾール
CAS No.931−36−2
・試薬名:2−ウンデシルイミダゾール
CAS No.16731−68−3
・試薬名:トランス−2,3−ジブロモ−2−ブテン−1,4−ジオール
CAS No.3234−02−4
・試薬名:トリアリルイソシアヌレート6臭化物
CAS No.52434−90−9
・試薬名:ヘキシルジグリコール
CAS No.112−59−4
・試薬名:テトラエチレングリコールジメチルエーテル
CAS No.143−24−8
・試薬名:ヒマシ硬化油
CAS No.8001−78−3
-"Metal inactivating agent A"
Reagent name: Bis [3- (3-tert-butyl-4-hydroxy-5-methylphenyl) propionic acid] [Ethylene bis (oxyethylene)]
CAS No. 36443-68-2
・ "Metal inactivating agent B"
Reagent name: N, N'-hexamethylenebis [3- (3,5-di-tert-butyl-4-hydroxyphenyl) propanamide]
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-"Metal inactivating agent C"
Reagent name: 1,6-Hexanediol bis [3- (3,5-di-tert-butyl-4-hydroxyphenyl) propionate]
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-"Metal inactivating agent D"
Reagent name: 2,2'-methylenebis [6- (1-methylcyclohexyl) -p-cresol]
CAS No. 77-62-3
・ "Metal inactivating agent E"
Reagent name: 2,2'-methylenebis (6-tert-butyl-p-cresol)
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・ "Metal inactivating agent F"
Reagent name: 2,2'-methylenebis (6-tert-butyl-4-ethylphenol)
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-"Metal inactivating agent G"
Reagent name: N- (2H-1,2,4-triazole-5-yl) salicylamide CAS No. 36411-52-6
-Reagent name: 2-Ethyl-4-methylimidazole CAS No. 931-36-2
-Reagent name: 2-Undecylimidazole CAS No. 16731-68-3
-Reagent name: Trans-2,3-dibromo-2-butene-1,4-diol CAS No. 3234-02-4
-Reagent name: Triallyl isocyanurate 6 bromide CAS No. 52434-90-9
-Reagent name: Hexyldiglycol CAS No. 112-59-4
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(ソルダペーストの調製)
はんだ粉末と、フラックスとを質量比(はんだ粉末:フラックス)が89:11となるように混練し、ソルダペーストを調製した。
(Preparation of solder paste)
The solder powder and the flux were kneaded so that the mass ratio (solder powder: flux) was 89:11 to prepare a solder paste.
各実施例及び比較例のソルダペーストについて(1)増粘抑制評価を行い、各実施例及び比較例で用いたはんだ粉末について(2)信頼性評価を行った。各評価方法を以下に示し、評価結果を表1〜表10に示す。 The solder pastes of each Example and Comparative Example were evaluated for (1) thickening suppression, and the solder powder used in each Example and Comparative Example was evaluated for reliability (2). Each evaluation method is shown below, and the evaluation results are shown in Tables 1 to 10.
(1)増粘抑制評価
得られたソルダペーストについて、JIS Z 3284−3の「4.2 粘度特性試験」に記載された方法に従って、回転粘度計(PCU−205、株式会社マルコム製)を用い、回転数:10rpm、測定温度:25℃にて、粘度を12時間測定し続けた。そして、初期粘度(撹拌30分後の粘度)と12時間後の粘度とを比較し、以下の基準に基づいて増粘抑制効果の評価を行った。
13時間後の粘度 ≦ 初期粘度×1.2 :経時での粘度上昇が小さく良好(○)
13時間後の粘度 > 初期粘度×1.2 :経時での粘度上昇が大きく不良(×)
(1) Evaluation for suppression of thickening of the obtained solder paste, using a rotational viscometer (PCU-205, manufactured by Malcolm Co., Ltd.) according to the method described in "4.2 Viscosity Characteristic Test" of JIS Z 3284-3. The viscosity was continuously measured for 12 hours at a rotation speed of 10 rpm and a measurement temperature of 25 ° C. Then, the initial viscosity (viscosity after 30 minutes of stirring) and the viscosity after 12 hours were compared, and the thickening suppressing effect was evaluated based on the following criteria.
Viscosity after 13 hours ≤ Initial viscosity x 1.2: Viscosity increase over time is small and good (○)
Viscosity after 13 hours> Initial viscosity x 1.2: Viscosity increase over time is large and defective (x)
(2)信頼性の評価
得られたはんだ粉末について、示差走査熱量計(EXSTAR DSC7020、エスアイアイ・ナノテクノロジー株式会社製)を用いて、昇温速度:5℃/分(180℃〜250℃)、降温速度:−3℃/分(250℃〜150℃)、キャリアガス:N2の測定条件でDSC測定を行い、液相線温度(TL)及び固相線温度(TS)を測定した。そして、液相線温度(TL)と固相線温度(TS)との差(ΔT=TL−TS)を算出し、以下の基準に基づいて評価を行った。
ΔTが10℃以内:信頼性に優れる(○)
ΔTが10℃超 :信頼性に劣る(×)
はんだ粉末の液相線温度(TL)と固相線温度(TS)との差(ΔT=TL−TS)が大きい場合、当該はんだ粉末を含むソルダペーストを電子機器の基板に塗布し、凝固させる際に、はんだ粉末の表面に融点の高い組織が析出しやすい。はんだ粉末の表面に融点の高い組織が析出すると、その後、はんだ粉末の内側に向かって融点の低い組織が逐次析出し、はんだ粉末の組織が不均一となりやすく、サイクル性等の信頼性を低下させる原因になる。
(2) Evaluation of reliability The obtained solder powder was heated at a temperature of 5 ° C./min (180 ° C. to 250 ° C.) using a differential scanning calorimeter (EXSTAR DSC7020, manufactured by SII Nanotechnology Co., Ltd.). cooling rate: -3 ° C. / min (250 ℃ ~150 ℃), carrier gas: perform DSC measurement under the measurement conditions of the N 2, measured liquidus temperature (T L) and the solidus temperature (T S) did. Then, calculate the difference between the liquidus temperature (T L) and the solidus temperature (T S) and (ΔT = T L -T S) , were evaluated based on the following criteria.
ΔT within 10 ° C: Excellent reliability (○)
ΔT exceeds 10 ° C: Inferior in reliability (×)
If the difference between the solder powder liquidus temperature (T L) and the solidus temperature (T S) (ΔT = T L -T S) is large, applying a solder paste containing the solder powder to the substrate of the electronic device However, when solidifying, a structure having a high melting point tends to precipitate on the surface of the solder powder. When a structure having a high melting point is deposited on the surface of the solder powder, then a structure having a low melting point is sequentially deposited toward the inside of the solder powder, and the structure of the solder powder tends to be non-uniform, which lowers reliability such as cycleability. It causes.
本発明のはんだ材料は、増粘抑制効果やサイクル特性等の信頼性にも優れているため各種用途に利用できる。 The solder material of the present invention can be used for various purposes because it is excellent in reliability such as thickening suppressing effect and cycle characteristics.
Claims (3)
前記はんだ材料が、Sn、20〜300質量ppmのAs、50質量ppm〜3.0質量%のBi、0.0質量%以上3.5質量%以下のAg、及び0.0質量%以上1.0質量%以下のCu(但し、Sn、170〜220質量ppmのAs、0.55〜1.15質量%のBi、0質量%以上2.05質量%以下のAg、及び0.0質量%以上0.66質量%以下のCuからなる鉛フリーはんだ合金を除く)からなり、
前記フラックスが、ヒンダードフェノール系化合物を含有し、
前記ヒンダードフェノール系化合物の含有量が、前記フラックス全体に対して、0.5〜10質量%であるソルダペースト。 It is a solder paste consisting of solder material and flux.
The solder material is Sn, 20 to 300% by mass of As, 50% by mass to 3.0% by mass of Bi, 0.0% by mass or more and 3.5% by mass or less of Ag, and 0.0% by mass or more 1 .0% by mass or less of Cu (where Sn, 170 to 220% by mass of As, 0.55 to 1.15% by mass of Bi, 0% by mass or more and 2.05% by mass or less of Ag, and 0.0% by mass. (Excluding lead-free solder alloys consisting of Cu of% or more and 0.66% by mass or less)
The flux contains a hindered phenolic compound and
A solder paste in which the content of the hindered phenolic compound is 0.5 to 10% by mass with respect to the entire flux.
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