JP6869519B2 - Method of joining a base material made of synthetic resin - Google Patents

Method of joining a base material made of synthetic resin Download PDF

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JP6869519B2
JP6869519B2 JP2016085660A JP2016085660A JP6869519B2 JP 6869519 B2 JP6869519 B2 JP 6869519B2 JP 2016085660 A JP2016085660 A JP 2016085660A JP 2016085660 A JP2016085660 A JP 2016085660A JP 6869519 B2 JP6869519 B2 JP 6869519B2
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貴富喜 山本
貴富喜 山本
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Tokyo Institute of Technology NUC
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本発明は、合成樹脂からなる基材を接合する方法に関し、より詳細には、真空紫外光を用いて合成樹脂からなる基材を接合する方法に関する。 The present invention relates to a method of joining a base material made of a synthetic resin, and more particularly to a method of joining a base material made of a synthetic resin using vacuum ultraviolet light.

従来、炭化水素系の合成樹脂(プラスチック)からなる基材と他の基材を接合する方法としては、熱融着や接着剤を用いる方法が一般的であった。しかしながら、これまでの接合方法には、熱や接着剤の影響によって合成樹脂が化学的・物理的ダメージを受けるという問題があった。 Conventionally, as a method for joining a base material made of a hydrocarbon-based synthetic resin (plastic) to another base material, a method using heat fusion or an adhesive has been generally used. However, the conventional joining methods have a problem that the synthetic resin is chemically and physically damaged by the influence of heat and an adhesive.

一方、シリコーンゴムの表面に酸素プラズマや真空紫外光を照射すると、その表面が改質して接着力を発揮することが知られており、この点に着目した熱フリー・接着剤フリーの接着方法が提案されている。この点につき、特開2007−130836号公報(特許文献1)は、ポリジメチルシロキサン基材(PDMS)の表面に真空紫外光を照射した後、ガラス基材を重ね合わせることよって両基材を接合する方法を開示する。 On the other hand, it is known that when the surface of silicone rubber is irradiated with oxygen plasma or vacuum ultraviolet light, the surface is modified to exert adhesive strength, and a heat-free / adhesive-free bonding method focusing on this point. Has been proposed. In this regard, Japanese Patent Application Laid-Open No. 2007-1330836 (Patent Document 1) irradiates the surface of a polydimethylsiloxane base material (PDMS) with vacuum ultraviolet light, and then superimposes the glass base materials to join the two base materials. Disclose how to do this.

しかしながら、炭化水素系の合成樹脂からなる基材を、熱フリー・接着剤フリーで、且つ、実用的な強度を持って接合することに成功した例は、未だ報告されていない。 However, there have been no reports of successful bonding of a base material made of a hydrocarbon-based synthetic resin with heat-free, adhesive-free, and practical strength.

特開2007−130836号公報Japanese Unexamined Patent Publication No. 2007-1330836

本発明は、上記従来技術における課題に鑑みてなされたものであり、合成樹脂からなる基材を、実用的な強度を持って、熱フリー・接着剤フリーで接合することを可能にする新規な接合方法を提供することを目的とする。 The present invention, all SANYO been made in view of the problems in the prior art, a substrate made of a synthetic resin, has a practical strength, new that enables bonding by thermal free-adhesive free It is an object of the present invention to provide a flexible joining method.

本発明者は、炭化水素系の合成樹脂からなる基材を、実用的な強度を持って、熱フリー・接着剤フリーで接合することを可能にする新規な接合方法につき鋭意検討する過程で、炭化水素系の合成樹脂からなる基材の表面に対して、波長160nm以下の真空紫外光を照射することによって、その表面に実用的な強度を持った接着力が発現することを発見し、本発明に至ったのである。 In the process of diligently studying a novel joining method that enables a base material made of a hydrocarbon-based synthetic resin to be joined with practical strength and heat-free and adhesive-free. By irradiating the surface of a base material made of a hydrocarbon-based synthetic resin with vacuum ultraviolet light having a wavelength of 160 nm or less, it was discovered that an adhesive force having practical strength is exhibited on the surface. It led to the invention.

すなわち、本発明によれば、合成樹脂からなる第1の基材の第1の表面と第2の基材の第2の表面に波長160nm以下の真空紫外光を照射した後、該第1の表面と該第2の表面を重ね合わせて密着させることによって、該第1の基材と該第2の基材を接合する方法であって、
前記第1の基材は、ポリカーボネート、環状オレフィンポリマー、ポリメチルメタクリレート、ポリ塩化ビニル、ポリエチレンテレフタレートおよびポリアミドからなる群から選択される少なくとも一種の合成樹脂からなり、前記第2の基材は、ガラス、シリコン、ケイ素化合物およびシリコーンからなる群から選択される少なくとも一種の材料からなる方法が提供される。
That is, according to the present invention, after irradiating the first surface of the first base material made of synthetic resin and the second surface of the second base material with vacuum ultraviolet light having a wavelength of 160 nm or less, the first surface is said. It is a method of joining the first base material and the second base material by superimposing the surface and the second surface and bringing them into close contact with each other.
The first base material is made of at least one synthetic resin selected from the group consisting of polycarbonate, cyclic olefin polymer, polymethyl methacrylate, polyvinyl chloride, polyethylene terephthalate and polyamide, and the second base material is glass. , A method comprising at least one material selected from the group consisting of silicon, silicon compounds and silicones.

上述したように、本発明によれば、炭化水素系の合成樹脂からなる基材を、実用的な強度を持って、熱フリー・接着剤フリーで接合することを可能にする新規な接合方法が提供される。 As described above, according to the present invention, there is a novel joining method that enables a base material made of a hydrocarbon-based synthetic resin to be joined with practical strength and heat-free and adhesive-free. Provided.

本発明の合成樹脂からなる基材の接合方法を説明するための概念図。The conceptual diagram for demonstrating the joining method of the base material made of the synthetic resin of this invention. 実施例で使用した真空紫外光照射装置の放射スペクトルを示す図。The figure which shows the emission spectrum of the vacuum ultraviolet light irradiation apparatus used in an Example. サンプル1に係る照射時間と引張せん断強さの関係を示す図。The figure which shows the relationship between the irradiation time and the tensile shear strength which concerns on a sample 1. サンプル2に係る照射時間と引張せん断強さの関係を示す図。The figure which shows the relationship between the irradiation time and the tensile shear strength which concerns on a sample 2. サンプル3に係る照射時間と90°剥離強さの関係を示す図。The figure which shows the relationship between the irradiation time and the 90 ° peeling strength which concerns on a sample 3.

以下、本発明を図面に示した実施の形態をもって説明するが、本発明は、図面に示した実施の形態に限定されるものではない。 Hereinafter, the present invention will be described with reference to the embodiments shown in the drawings, but the present invention is not limited to the embodiments shown in the drawings.

図1は、本発明の実施形態である合成樹脂からなる基材の接合方法を概念的に示す図である。以下、図1に基づいて、本実施形態の接合方法を説明する。 FIG. 1 is a diagram conceptually showing a method of joining a base material made of a synthetic resin according to an embodiment of the present invention. Hereinafter, the joining method of the present embodiment will be described with reference to FIG.

本実施形態では、まず最初に、図1(a)に示すように、第1の基材(以下、基材Aという)と第2の基材(以下、基材Bという)を用意する。 In the present embodiment, first, as shown in FIG. 1A, a first base material (hereinafter referred to as base material A) and a second base material (hereinafter referred to as base material B) are prepared.

本実施形態において、基材Aは、炭化水素系の合成樹脂からなる基材である。本実施形態では、ここでいう合成樹脂として、ポリカーボネート(PC)、環状オレフィンポリマー(COP)、ポリプロピレン(PP)、ポリメチルメタクリレート(PMMA)、ポリ塩化ビニル(PVC)、ポリエチレンテレフタレート(PET)、ポリアミド(PA)などを挙げることができる。 In the present embodiment, the base material A is a base material made of a hydrocarbon-based synthetic resin. In the present embodiment, the synthetic resin referred to here is polycarbonate (PC), cyclic olefin polymer (COP), polypropylene (PP), polymethylmethacrylate (PMMA), polyvinyl chloride (PVC), polyethylene terephthalate (PET), and polyamide. (PA) and the like can be mentioned.

一方、本実施形態において、基材Bは、ガラス、シリコン、ケイ素化合物(窒化シリコン(SiN)、酸化シリコン(SiO)、シリコンカーバイト(SiC)など)、シリコーン(ポリジメチルシロキサン(PDMS)、シリコーンレジン、シリコーンゴムなど)からなる基材であってもよく、また、先に挙げた合成樹脂(PC、COP、PP、PMMA、PVC、PET、PAなど)からなる基材であってもよい。なお、基材Bが合成樹脂からなる基材である場合、基材Bは、基材Aと同じ種類の合成樹脂からなる基材であってもよいし、基材Aとは異なる種類の合成樹脂からなる基材であってもよい。 On the other hand, in the present embodiment, the base material B is glass, silicon, a silicon compound (silicon nitride (SiN), silicon oxide (SiO 2 ), silicon carbide (SiC), etc.), silicone (polydimethylsiloxane (PDMS), etc.). It may be a base material made of silicone resin, silicone rubber, etc., or may be a base material made of the synthetic resin mentioned above (PC, COP, PP, PMMA, PVC, PET, PA, etc.). .. When the base material B is a base material made of a synthetic resin, the base material B may be a base material made of the same type of synthetic resin as the base material A, or a different type of synthesis from the base material A. It may be a base material made of resin.

本実施形態では、続いて、図1(b)に示すように、基材Aの表面aと基材の表面bのそれぞれに対して、波長160nm以下の真空紫外光(VUV)を照射して、表面aおよび表面bの表面状態を改質する。 In the present embodiment, as shown in FIG. 1B, each of the surface a of the base material A and the surface b of the base material is subsequently irradiated with vacuum ultraviolet light (VUV) having a wavelength of 160 nm or less. , The surface condition of the surface a and the surface b is modified.

本実施形態では、続いて、図1(c)に示すように、基材Aの表面aと基材Bの表面bを重ね合わせた後、図1(d)に示すように、表面aと表面bを密着させた状態で、所定時間(例えば、1日程度)放置する。なお、放置の際、表面aと表面bを密着させた状態で0.5MPa程度の荷重を加えるようにしてもよい。 In the present embodiment, subsequently, as shown in FIG. 1 (c), the surface a of the base material A and the surface b of the base material B are overlapped with each other, and then the surface a and the surface a as shown in FIG. 1 (d). With the surface b in close contact, leave it for a predetermined time (for example, about one day). When left to stand, a load of about 0.5 MPa may be applied with the surface a and the surface b in close contact with each other.

以上、本実施形態の接合方法を説明してきたが、本実施形態の接合方法によれば、炭化水素系の合成樹脂からなる基材を熱フリー・接着剤フリーで接合することが可能となり、これにより、基材の化学的・物理的ダメージを回避することが可能となる。 The joining method of the present embodiment has been described above, but according to the joining method of the present embodiment, it is possible to join a base material made of a hydrocarbon-based synthetic resin in a heat-free and adhesive-free manner. This makes it possible to avoid chemical and physical damage to the base material.

なお、本発明は上述した実施形態に限定されるものではなく、当業者が推考しうる実施態様の範囲内において、本発明の作用・効果を奏する限り、本発明の範囲に含まれるものである。 It should be noted that the present invention is not limited to the above-described embodiments, but is included in the scope of the present invention as long as the actions and effects of the present invention are exhibited within the range of embodiments that can be inferred by those skilled in the art. ..

以下、本発明の接合方法について、実施例を用いてより具体的に説明を行なうが、本発明は、後述する実施例に限定されるものではない。 Hereinafter, the joining method of the present invention will be described in more detail with reference to Examples, but the present invention is not limited to the Examples described later.

(合成樹脂の接合)
下記(1)〜(3)の手順で下記表1に示す基材Aと基材Bを接合してサンプル1〜3を得た。
(Joining synthetic resin)
Samples 1 to 3 were obtained by joining the base materials A and the base material B shown in Table 1 below according to the procedures (1) to (3) below.

Figure 0006869519
Figure 0006869519

(1)基材Aと基材Bのそれぞれの表面のゴミを圧縮空気で除去。
(2)基材Aと基材Bのそれぞれの表面に波長160nm以下の真空紫外光を所定時間照射して表面状態を改質。
(3)両基材の表面を重ね合わせて0.5MPaの荷重を加えた状態で1日放置。
(1) Remove dust on the surfaces of base material A and base material B with compressed air.
(2) The surface state of each of the surfaces of the base material A and the base material B is modified by irradiating the surfaces of the base material A and the base material B with vacuum ultraviolet light having a wavelength of 160 nm or less for a predetermined time.
(3) The surfaces of both base materials were overlapped and left for one day with a load of 0.5 MPa applied.

なお、上記(2)は、0〜3500[s]の範囲で真空紫外光の照射時間について複数の条件を設けた。また、真空紫外光照射装置として、VUVイオナイザ(L12542,浜松ホトニクス)を使用した。図2は、VUVイオナイザの放射スペクトルを示す。 In the above (2), a plurality of conditions were set for the irradiation time of vacuum ultraviolet light in the range of 0 to 3500 [s]. In addition, a VUV ionizer (L12542, Hamamatsu Photonics) was used as a vacuum ultraviolet light irradiation device. FIG. 2 shows the emission spectrum of the VUV ionizer.

(接着力評価)
サンプル1および2の接着力を評価するために、引張せん断試験(JIS K 6850)を行い、サンプル3の接着力を評価するために、90°剥離試験(JIS Z 0237)を行った。
(Adhesive strength evaluation)
A tensile shear test (JIS K 6850) was performed to evaluate the adhesive strength of Samples 1 and 2, and a 90 ° peel test (JIS Z 0237) was performed to evaluate the adhesive strength of Sample 3.

図3は、サンプル1に係る引張せん断試験の結果を示す。なお、図3(a)は、照射時間(0〜3500s)と引張せん断強さ[MPa]の関係を示し、図3(b)は、照射時間(0〜60s)と引張せん断強さ[MPa]の関係を示す。図3(a)、(b)に示すように、ポリカーボネート同士を接合してなるサンプル1は、最大で約2MPaの接着力(引張せん断強さ)を示した。 FIG. 3 shows the results of the tensile shear test according to Sample 1. Note that FIG. 3 (a) shows the relationship between the irradiation time (0 to 3500 s) and the tensile shear strength [MPa], and FIG. 3 (b) shows the irradiation time (0 to 60 s) and the tensile shear strength [MPa]. ] Relationship is shown. As shown in FIGS. 3 (a) and 3 (b), the sample 1 formed by bonding polycarbonates showed an adhesive force (tensile shear strength) of about 2 MPa at the maximum.

図4は、サンプル2に係る引張せん断試験の結果を示す。なお、図4(a)は、照射時間(0〜3500s)と引張せん断強さ[MPa]の関係を示し、図4(b)は、照射時間(0〜60s)と引張せん断強さ[MPa]の関係を示す。図4(a)、(b)に示すように、ポリカーボネートとガラスを接合してなるサンプル2は、最大で約11MPaの接着力(引張せん断強さ)を示した。 FIG. 4 shows the result of the tensile shear test according to the sample 2. Note that FIG. 4 (a) shows the relationship between the irradiation time (0 to 3500 s) and the tensile shear strength [MPa], and FIG. 4 (b) shows the irradiation time (0 to 60 s) and the tensile shear strength [MPa]. ] Relationship is shown. As shown in FIGS. 4 (a) and 4 (b), the sample 2 formed by joining polycarbonate and glass showed an adhesive force (tensile shear strength) of about 11 MPa at the maximum.

図5は、サンプル3に係る90°剥離試験の結果を示す。なお、図5(a)は、照射時間(0〜3500s)と90°剥離強さ[N/cm]の関係を示し、図5(b)は、照射時間(0〜60s)と90°剥離強さ[N/cm]の関係を示す。図5(a)、(b)に示すように、環状オレフィンポリマーとガラスを接合してなるサンプル3は、最大で約15N/cmの接着力(90°剥離強さ)を示した。 FIG. 5 shows the result of the 90 ° peeling test according to the sample 3. Note that FIG. 5 (a) shows the relationship between the irradiation time (0 to 3500 s) and the 90 ° peeling strength [N / cm], and FIG. 5 (b) shows the irradiation time (0 to 60 s) and 90 ° peeling. The relationship of strength [N / cm] is shown. As shown in FIGS. 5 (a) and 5 (b), the sample 3 formed by bonding the cyclic olefin polymer and the glass showed an adhesive force (90 ° peel strength) of about 15 N / cm at the maximum.

上述した評価試験の結果から、本発明の接合方法によって、炭化水素系の合成樹脂からなる基材が実用的な強度を持って接合されることが実証された。 From the results of the evaluation test described above, it was demonstrated that the base material made of a hydrocarbon-based synthetic resin is bonded with practical strength by the bonding method of the present invention.

Claims (1)

合成樹脂からなる第1の基材の第1の表面と第2の基材の第2の表面に波長160nm以下の真空紫外光を照射した後、該第1の表面と該第2の表面を重ね合わせて密着させることによって、該第1の基材と該第2の基材を接合する方法であって、
前記第1の基材は、ポリカーボネート、環状オレフィンポリマー、ポリメチルメタクリレート、ポリ塩化ビニル、ポリエチレンテレフタレートおよびポリアミドからなる群から選択される少なくとも一種の合成樹脂からなり、前記第2の基材は、ガラス、シリコン、ケイ素化合物およびシリコーンからなる群から選択される少なくとも一種の材料からなる方法。
After irradiating the first surface of the first base material made of synthetic resin and the second surface of the second base material with vacuum ultraviolet light having a wavelength of 160 nm or less, the first surface and the second surface are exposed to light. It is a method of joining the first base material and the second base material by superimposing and adhering them.
The first base material is made of at least one synthetic resin selected from the group consisting of polycarbonate, cyclic olefin polymer, polymethyl methacrylate, polyvinyl chloride, polyethylene terephthalate and polyamide, and the second base material is glass. A method consisting of at least one material selected from the group consisting of, silicon, silicon compounds and silicones.
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