JP6820515B2 - Surface shape measuring device and surface shape measuring method - Google Patents

Surface shape measuring device and surface shape measuring method Download PDF

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JP6820515B2
JP6820515B2 JP2017041711A JP2017041711A JP6820515B2 JP 6820515 B2 JP6820515 B2 JP 6820515B2 JP 2017041711 A JP2017041711 A JP 2017041711A JP 2017041711 A JP2017041711 A JP 2017041711A JP 6820515 B2 JP6820515 B2 JP 6820515B2
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森井 秀樹
秀樹 森井
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Tokyo Seimitsu Co Ltd
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本発明は、表面形状測定装置及び表面形状測定方法に係り、特に光源、複数の倍率の異なる対物レンズ、及び測定画像を取得する撮影部を少なくとも有する光学部によって測定対象物の被測定面の表面形状を測定する表面形状測定装置及び表面形状測定方法に関する。 The present invention relates to a surface shape measuring device and a surface shape measuring method, and in particular, the surface of a surface to be measured by an optical unit having at least a light source, a plurality of objective lenses having different magnifications, and an imaging unit for acquiring a measurement image. The present invention relates to a surface shape measuring device for measuring a shape and a surface shape measuring method.

表面形状測定装置は、測定対象物の被測定面の3次元形状を測定する装置であり、被測定面の表面形状を測定する光を出力する光源、光源から出力された光を被測定面に照射する対物レンズ、及び被測定面の測定画像を取得する撮影部で少なくとも構成された表面形状測定装置としては、例えば白色干渉顕微鏡(特許文献1)あるいはレーザー共焦点顕微鏡が知られている。 The surface shape measuring device is a device that measures the three-dimensional shape of the surface to be measured of an object to be measured, and is a light source that outputs light for measuring the surface shape of the surface to be measured, and the light output from the light source is used as the surface to be measured. For example, a white interference microscope (Patent Document 1) or a laser cofocal microscope is known as a surface shape measuring device composed of at least an objective lens to be irradiated and a photographing unit for acquiring a measurement image of a surface to be measured.

そして、上記構成の光学部の表面形状測定装置は、測定準備アライメントとして、異なる倍率の複数の対物レンズの中から適正な倍率の対物レンズの選択及び光源の適正な光量調整を少なくとも行う必要がある。この測定準備アライメントを適正に行うか否かによって、被測定面の表面形状の測定精度が異なる。 Then, the surface shape measuring device of the optical unit having the above configuration needs to at least select an objective lens having an appropriate magnification from a plurality of objective lenses having different magnifications and adjust an appropriate amount of light of the light source as measurement preparation alignment. .. The measurement accuracy of the surface shape of the surface to be measured differs depending on whether or not this measurement preparation alignment is performed properly.

ところで、上記光学部のように対物レンズを備えた表面形状測定装置においては、対物レンズの測定視野等の制限により、1回の測定で測定可能な被測定面の測定範囲に制限がある場合が多い。このため、測定対象物を水平移動可能なステージ上に載置し、被測定面を複数回測定し、その後でソフトウェア処理等を用いて計算することで複数枚の測定データを接続するスティッチング測定を行うことが知られている。 By the way, in a surface shape measuring device provided with an objective lens such as the above optical unit, the measurement range of the surface to be measured that can be measured in one measurement may be limited due to the limitation of the measurement field of view of the objective lens. There are many. For this reason, stitching measurement is performed by placing the object to be measured on a horizontally movable stage, measuring the surface to be measured multiple times, and then calculating using software processing or the like to connect a plurality of measurement data. Is known to do.

したがって、スティッチング測定を高精度に行うには、複数回の測定ごとに対物レンズの倍率選択及び光量調整の測定準備アライメントを適正に行う必要がある。 Therefore, in order to perform the stitching measurement with high accuracy, it is necessary to properly perform the measurement preparation alignment of the magnification selection of the objective lens and the light intensity adjustment for each of a plurality of measurements.

特開2016−136091号公報Japanese Unexamined Patent Publication No. 2016-136091

しかしながら、従来、対物レンズの選択や光源の光量調整は、操作者の経験に基づいて行っていたので、操作者の習熟度によって表面形状の測定精度にバラツキが生じるという問題があった。特にスティッチング測定においては、複数回の測定ごとの測定精度にバラツキがあると、複数枚の測定データを接続して得られる表面形状の精度が悪くなり深刻な問題であった。 However, conventionally, since the selection of the objective lens and the adjustment of the light amount of the light source are performed based on the experience of the operator, there is a problem that the measurement accuracy of the surface shape varies depending on the proficiency of the operator. In particular, in stitching measurement, if there is a variation in the measurement accuracy for each of a plurality of measurements, the accuracy of the surface shape obtained by connecting a plurality of measurement data becomes poor, which is a serious problem.

本発明は、このような事情に鑑みてなされたもので、表面形状測定を高精度化できる表面形状測定装置及び表面形状測定方法を提供することを目的とする。 The present invention has been made in view of such circumstances, and an object of the present invention is to provide a surface shape measuring device and a surface shape measuring method capable of improving the accuracy of surface shape measurement.

本発明の一態様に係る表面形状測定装置は目的を達成するために、測定対象物を支持する支持部と、測定対象物の被測定面の表面形状を測定する光を出力する光源、光源から出力された光を被測定面に照射する複数の倍率の異なる対物レンズ、及び被測定面の測定画像を取得する撮影部を少なくとも有する光学部と、支持部を被測定面の面内方向に移動させる面内方向移動手段と、被測定面の概略形状情報を取得する概略形状取得手段と、概略形状情報に基づいて被測定面を傾斜状領域と平坦状領域とで構成される複数の測定面に分割する被測定面分割手段と、分割した傾斜状領域と平坦状領域とに光を照射したときの測定に寄与する測定寄与照射量に応じて複数の対物レンズのうち使用する倍率の対物レンズを選択する対物レンズ選択手段と、分割した傾斜状領域と平坦状領域とに光を照射したときの測定に寄与する測定寄与照射量に応じて光源の光量を調整する光量調整手段と、支持部を被測定面の面内方向に移動させることにより、分割した各測定面を選択した対物レンズ及び調整した光量に基づいて表面形状を個々に測定して複数の測定データを取得する測定面形状測定手段と、取得した複数の測定データを接続するデータ接続手段と、を備えた。光学部としては白色干渉計又はレーザー共焦点顕微鏡を適用することができる。 In order to achieve the object, the surface shape measuring device according to one aspect of the present invention uses a support portion that supports the object to be measured, a light source that outputs light for measuring the surface shape of the surface to be measured of the object to be measured, and a light source. A plurality of objective lenses having different magnifications for irradiating the surface to be measured with the output light, an optical unit having at least an imaging unit for acquiring a measurement image of the surface to be measured, and a support portion moved in the in-plane direction of the surface to be measured. A plurality of measuring surfaces composed of an in-plane moving means for making the measured surface, a rough shape acquiring means for acquiring the rough shape information of the surface to be measured, and an inclined region and a flat region for the measured surface based on the rough shape information. The object surface dividing means to be divided into two, and the objective lens having a magnification to be used among a plurality of objective lenses according to the measurement contribution irradiation amount that contributes to the measurement when the divided inclined region and flat region are irradiated with light. The objective lens selection means for selecting the above, the light amount adjusting means for adjusting the light amount of the light source according to the measurement contribution irradiation amount that contributes to the measurement when the divided inclined region and the flat region are irradiated with light, and the support portion. Measurement surface shape measurement to acquire a plurality of measurement data by individually measuring the surface shape based on the selected objective lens and the adjusted light amount by moving each of the divided measurement surfaces in the in-plane direction of the surface to be measured. A means and a data connecting means for connecting a plurality of acquired measurement data are provided. A white interferometer or a laser confocal microscope can be applied as the optical unit.

本発明の表面形状測定装置によれば、被測定面の表面形状測定を行う際の対物レンズの選択及び光源の光量調整の測定準備アライメントを適正に行うことができるので表面形状測定を高精度化でき、特にスティッチング測定において有効である。 According to the surface shape measuring apparatus of the present invention, it is possible to properly perform measurement preparation alignment for selection of an objective lens and adjustment of the amount of light of a light source when measuring the surface shape of a surface to be measured, so that surface shape measurement can be made highly accurate. It can be done and is especially effective in stitching measurement.

本発明の表面形状測定装置において、対物レンズの測定視野は測定対象物の被測定面よりも狭く、スティッチング測定により被測定面の表面形状を測定することが好ましい。スティッチング測定において本発明は特に有効だからである。 In the surface shape measuring apparatus of the present invention, the measurement field of view of the objective lens is narrower than the measured surface of the object to be measured, and it is preferable to measure the surface shape of the measured surface by stitching measurement. This is because the present invention is particularly effective in stitching measurement.

本発明の表面形状測定装置としては、光学部は白色干渉計を好適に使用することができる。 As the surface shape measuring device of the present invention, a white interferometer can be preferably used for the optical unit.

本発明の表面形状測定装置において、対物レンズを通して被測定面に照射した光のうち対物レンズに戻り測定に寄与する照射光の測定寄与照射量Gを検出する測定寄与照射光量検出手段を設けることが好ましい。 In the surface shape measuring apparatus of the present invention, it is possible to provide a measurement contributing irradiation light amount detecting means for detecting the measurement contributing irradiation amount G of the irradiation light that returns to the objective lens and contributes to the measurement among the light irradiated to the surface to be measured through the objective lens. preferable.

そして、対物レンズ選択手段は分割した傾斜状領域と平坦状領域とについて、照射した光の全照射光量Fに対する測定寄与照射量Gの割合G/Fに基づいて使用する倍率の対物レンズを選択する。これにより、傾斜状領域と平坦状領域とによって測定を高精度に行うための適正な倍率の対物レンズを選択することができる。 Then, the objective lens selection means selects an objective lens having a magnification to be used based on the ratio G / F of the measurement contribution irradiation amount G to the total irradiation light amount F of the irradiated light for the divided inclined region and flat region. .. As a result, it is possible to select an objective lens having an appropriate magnification for performing measurement with high accuracy in the inclined region and the flat region.

また、光量調整手段は分割した傾斜状領域及び平坦状領域について、平坦状領域を測定するときの測定寄与照射量Gを基準光量とし、傾斜状領域を測定するときの測定寄与照射量Gが基準光量になるように光源の光量を調整する。これにより、傾斜状領域と平坦状領域とによって測定を高精度に行うための適正な光源光量を調整することができる。 Further, the light amount adjusting means uses the measurement contribution irradiation amount G when measuring the flat region as the reference light amount for the divided inclined region and the flat region, and the measurement contribution irradiation amount G when measuring the inclined region is the reference. Adjust the amount of light from the light source so that the amount of light is the same. As a result, it is possible to adjust an appropriate amount of light source light for performing measurement with high accuracy depending on the inclined region and the flat region.

本発明の表面形状測定装置において、測定対象物の被測定面の表面形状はうねり形状であることが好ましい。測定対象物の被測定面の表面形状である場合において本発明は特に有効だからである。 In the surface shape measuring apparatus of the present invention, the surface shape of the surface to be measured of the object to be measured is preferably a wavy shape. This is because the present invention is particularly effective when the surface shape of the surface to be measured is the object to be measured.

本発明の表面形状測定装置において、概略形状取得手段は、三角測量方式のレーザー変位計、ステレオカメラ、パターン投影装置の何れかであることが好ましい。 In the surface shape measuring device of the present invention, the approximate shape acquiring means is preferably any of a triangulation type laser displacement meter, a stereo camera, and a pattern projection device.

本発明の表面形状測定装置において、概略形状取得手段は、測定対象物のCADデータを保持する保持手段であることが好ましい。 In the surface shape measuring apparatus of the present invention, the approximate shape acquiring means is preferably a holding means for holding CAD data of the object to be measured.

本発明の表面形状測定装置において、概略形状取得手段は、光学部の対物レンズよりも倍率の小さな低倍率レンズを用いた白色干渉計であることが好ましい。 In the surface shape measuring apparatus of the present invention, the approximate shape acquiring means is preferably a white interferometer using a low magnification lens having a smaller magnification than the objective lens of the optical unit.

本発明の表面形状測定装置において、被測定面分割手段で分割された複数の測定面について対物レンズ選択手段で選択した対物レンズマップを表示する表示部を有することが好ましい。 In the surface shape measuring apparatus of the present invention, it is preferable to have a display unit that displays an objective lens map selected by the objective lens selection means for a plurality of measurement surfaces divided by the surface shape measuring means to be measured.

本発明の一態様に係る表面形状測定方法は目的を達成するために、測定対象物を支持する支持部と、測定対象物の被測定面の表面形状を測定する光を出力する光源、光源からの出力された光を被測定面に照射する倍率の異なる複数の対物レンズ、及び被測定面の測定画像を取得する撮影部を少なくとも有する光学部と、を少なくとも有する表面形状測定装置を用いて被測定面の表面形状を測定する表面形状測定方法であって、被測定面の概略形状情報を取得する概略形状取得工程と、概略形状情報に基づいて被測定面を傾斜状領域と平坦状領域とで構成される複数の測定面に分割する被測定面分割工程と、分割した傾斜状領域と平坦状領域とに光を照射したときの測定に寄与する測定寄与照射量に応じて複数の対物レンズのうち使用する倍率の対物レンズを選択する対物レンズ選択工程と、分割した傾斜状領域と平坦状領域とに光を照射したときの測定に寄与する測定寄与照射量に応じて光源の光量を調整する光量調整工程と、支持部を被測定面の面内方向に移動させることにより、分割した各測定面を選択した対物レンズ及び設定した光量に基づいて表面形状を個々に測定して複数の測定データを取得する測定面形状測定工程と、取得した複数の測定データを接続するデータ接続工程と、を備えた。 In order to achieve the object, the surface shape measuring method according to one aspect of the present invention uses a support portion that supports the object to be measured, a light source that outputs light for measuring the surface shape of the surface to be measured of the object to be measured, and a light source. Using a surface shape measuring device having at least a plurality of objective lenses having different magnifications for irradiating the surface to be measured with the output light of the above, and an optical unit having at least an imaging unit for acquiring a measurement image of the surface to be measured. A surface shape measuring method for measuring the surface shape of a measurement surface, which includes a schematic shape acquisition process for acquiring the approximate shape information of the surface to be measured, and an inclined region and a flat region for the surface to be measured based on the schematic shape information. Multiple objective lenses according to the measurement contribution irradiation amount that contributes to the measurement when the divided inclined region and flat region are irradiated with light and the surface division step to be divided into a plurality of measurement surfaces composed of The amount of light from the light source is adjusted according to the objective lens selection step of selecting the objective lens of the magnification to be used and the measurement contribution irradiation amount that contributes to the measurement when the divided inclined region and flat region are irradiated with light. By moving the support portion in the in-plane direction of the surface to be measured, the surface shape of each divided measurement surface is individually measured based on the selected objective lens and the set amount of light, and a plurality of measurements are performed. It includes a measurement surface shape measurement step for acquiring data and a data connection step for connecting a plurality of acquired measurement data.

本発明の表面形状測定方法によれば、被測定面の表面形状測定を行う際の対物レンズの選択及び光源の光量調整の測定準備アライメントを適正に行うことができるので表面形状測定を高精度化でき、特にスティッチング測定において有効である。 According to the surface shape measuring method of the present invention, the objective lens can be selected when measuring the surface shape of the surface to be measured and the measurement preparation alignment for adjusting the light intensity of the light source can be appropriately performed, so that the surface shape measurement can be made highly accurate. It can be done and is especially effective in stitching measurement.

本発明の表面形状測定装置及び表面形状測定方法によれば、被測定面の表面形状測定を行う際の対物レンズの選択及び光源の光量調整の測定準備アライメントを適正に行うことができるので表面形状測定を高精度化できる。 According to the surface shape measuring device and the surface shape measuring method of the present invention, it is possible to appropriately select an objective lens and perform measurement preparation alignment for adjusting the amount of light of a light source when measuring the surface shape of the surface to be measured. The measurement can be made highly accurate.

本発明の実施の形態の表面形状測定装置の全体構成図Overall configuration diagram of the surface shape measuring device according to the embodiment of the present invention 光学部の干渉部に設けられた倍率の異なる複数の種類の対物レンズの一例を示す概念図Conceptual diagram showing an example of a plurality of types of objective lenses having different magnifications provided in the interference portion of the optical portion. 撮像素子の撮像面のxy座標上における干渉縞の画素配列を示した図The figure which showed the pixel array of the interference fringes on the xy coordinate of the image pickup surface of an image sensor 干渉部のz位置と輝度値との関係及び干渉縞曲線を例示した図The figure which illustrated the relationship between the z position of an interference part and a luminance value, and an interference fringe curve. 被測定面の異なる点の異なるz座標値と干渉縞曲線との関係を例示した図A diagram illustrating the relationship between different z-coordinate values at different points on the surface to be measured and the interference fringe curve. スティッチング測定による表面形状測定の説明図Explanatory drawing of surface shape measurement by stitching measurement うねり形状の被測定面を有する測定対象物の一例を示す斜視図Perspective view showing an example of a measurement object having a swell-shaped surface to be measured. 概略形状取得手段の一態様のレーザー変位計を説明する説明図Explanatory drawing explaining one aspect of laser displacement meter of schematic shape acquisition means 概略形状取得手段の一態様のステレオカメラを説明する説明図Explanatory drawing explaining one aspect of stereo camera of schematic shape acquisition means 概略形状取得手段の一態様の白色干渉計を説明する説明図Explanatory drawing explaining one aspect of white interference meter of schematic shape acquisition means 表面形状測定装置の処理部に搭載した被測定面分割手段、対物レンズ選択手段、光量調整手段、測定面形状測定手段、データ接続手段の説明図Explanatory drawing of a surface dividing means to be measured, an objective lens selecting means, a light amount adjusting means, a measuring surface shape measuring means, and a data connecting means mounted on a processing unit of a surface shape measuring device. 段差閾値の説明図Explanatory drawing of step threshold うねり形状の被測定面を傾斜角度調整と平坦状領域との複数の測定面に分割した一例を説明する説明図Explanatory drawing explaining an example in which a swell-shaped measurement surface is divided into a plurality of measurement surfaces of an inclination angle adjustment and a flat region. 対物レンズ選択手段によって傾斜状領域と平坦状領域とに倍率の異なる対物レンズを選択する一例を説明する説明図Explanatory drawing explaining an example of selecting an objective lens having a different magnification in an inclined region and a flat region by an objective lens selection means. 見込角θ1の対物レンズで傾斜角度θ2の被測定面に光を照射したときの光の挙動を説明する説明図Explanatory drawing explaining the behavior of light when light is irradiated to the surface under measurement of tilt angle θ2 with the objective lens of prospect angle θ1. 被測定面の傾斜角度と、全照射光量に対する測定に寄与する測定寄与照射光量の割合との関係を表したグラフA graph showing the relationship between the tilt angle of the surface to be measured and the ratio of the measurement contribution irradiation light amount that contributes to the measurement to the total irradiation light amount. 本発明の実施の形態の表面形状測定方法のフローチャートFlow chart of the surface shape measuring method according to the embodiment of the present invention 対物レンズマップの説明図Explanatory drawing of the objective lens map

以下、添付図面にしたがって本発明の表面形状測定装置及び表面形状測定方法の好ましい実施の形態について説明する。 Hereinafter, preferred embodiments of the surface shape measuring apparatus and the surface shape measuring method of the present invention will be described with reference to the accompanying drawings.

本発明は以下の好ましい実施の形態により説明される。本発明の範囲を逸脱することなく、多くの手法により変更を行うことができ、本実施の形態以外の他の実施の形態を利用することができる。したがって、本発明の範囲内における全ての変更が特許請求の範囲に含まれる。 The present invention will be described in the following preferred embodiments. Changes can be made by many methods without departing from the scope of the present invention, and other embodiments other than the present embodiment can be used. Therefore, all modifications within the scope of the present invention are included in the claims.

ここで、図中、同一の記号で示される部分は、同様の機能を有する同様の要素である。また、本明細書中で、数値範囲を“ 〜 ”を用いて表す場合は、“ 〜 ”で示される上限、下限の数値も数値範囲に含むものとする。 Here, in the figure, the parts indicated by the same symbols are similar elements having the same functions. Further, in the present specification, when the numerical range is expressed by using "~", the numerical values of the upper limit and the lower limit indicated by "~" are also included in the numerical range.

[表面形状測定装置]
本実施の形態の表面形状測定装置では、測定対象物の被測定面の表面形状を測定する光を出力する光源、光源から出力された光を被測定面に照射する対物レンズ、及び被測定面の測定画像を取得する撮影部を少なくとも有する光学部として、垂直走査型の白色干渉計の例で以下に説明する。
[Surface shape measuring device]
In the surface shape measuring device of the present embodiment, a light source that outputs light for measuring the surface shape of the surface to be measured of the object to be measured, an objective lens that irradiates the surface to be measured with light output from the light source, and a surface to be measured. As an optical unit having at least an imaging unit for acquiring the measured image of the above, an example of a vertical scanning type white interferometer will be described below.

また、対物レンズの測定視野が測定対象物の被測定面よりも小さくスティッチング測定を行う場合で説明する。 Further, a case where the measurement field of view of the objective lens is smaller than the surface to be measured of the object to be measured and stitching measurement is performed will be described.

図1は、本発明の実施の形態の表面形状測定装置の全体構成を示した構成図である。 FIG. 1 is a configuration diagram showing the overall configuration of the surface shape measuring device according to the embodiment of the present invention.

図1における表面形状測定装置1は、マイケルソン型の干渉計を用いて測定対象物Pの被測定面Sの表面形状等を非接触により3次元測定する所謂、マイケルソン型の走査型白色干渉計(顕微鏡)であり、測定対象物Pの干渉縞(干渉画像)を取得する光学部2と、測定対象物Pが載置される支持部としてのステージ10と、表面形状測定装置1の各種制御や光学部2により取得された干渉縞像に基づいて各種演算処理を行うパーソナルコンピュータ等の演算処理装置からなる処理部18等を備える。 The surface shape measuring device 1 in FIG. 1 uses a Michaelson type interferometer to measure the surface shape of the surface S to be measured of the object P to be measured three-dimensionally by non-contact, so-called Michaelson type scanning white interference. An optical unit 2 that is a meter (microscope) and acquires interference fringes (interference images) of the object P to be measured, a stage 10 as a support portion on which the object P to be measured is placed, and various types of surface shape measuring devices 1. The processing unit 18 and the like including an arithmetic processing device such as a personal computer that performs various arithmetic processes based on the interference fringe image acquired by the control and the optical unit 2 are provided.

なお、本実施の形態では、マイケルソン型の走査型白色干渉計の例で説明するが、周知のミロー型の走査型白色干渉計であってもよい。また、測定対象物Pが配置される測定空間において、互いに直交する水平方向の2つの座標軸をx軸(紙面に平行する軸)とy軸(紙面に直交する軸)とし、x軸及びy軸に直交する鉛直方向の座標軸をz軸とする。z軸は後記する測定光軸Z−0に平行である。そして、処理部18は、被測定面S上の点をx軸のx座標、y軸のy座標、z軸のz座標で示すxyz座標をもっており、被測定面Sの3次元位置を得ることができる。 In the present embodiment, the example of the Michelson type scanning white interferometer will be described, but a well-known Millow type scanning white interferometer may be used. Further, in the measurement space where the measurement object P is arranged, the two horizontal coordinate axes orthogonal to each other are set as the x-axis (axis parallel to the paper surface) and the y-axis (axis orthogonal to the paper surface), and the x-axis and y-axis The coordinate axis in the vertical direction orthogonal to is defined as the z-axis. The z-axis is parallel to the measurement optical axis Z-0 described later. Then, the processing unit 18 has xyz coordinates indicating a point on the measured surface S by the x coordinate of the x axis, the y coordinate of the y axis, and the z coordinate of the z axis, and obtains the three-dimensional position of the measured surface S. Can be done.

ステージ10は、x軸及びy軸に略平行する平坦面であって測定対象物Pを載置するステージ面10Sを有する。また、ステージ10は、ステージ10を光学部2に対して相対的に被測定面Sの面内方向に水平移動させる面内方向移動手段35と、を備えている。 The stage 10 is a flat surface substantially parallel to the x-axis and the y-axis, and has a stage surface 10S on which the measurement object P is placed. Further, the stage 10 includes an in-plane moving means 35 for horizontally moving the stage 10 in the in-plane direction of the surface S to be measured relative to the optical unit 2.

面内方向移動手段35は、xアクチュエータ34とyアクチュエータ36とで構成される。そして、ステージ10は、xアクチュエータ34の駆動によりx軸方向に水平移動し、yアクチュエータ36の駆動によりy軸方向に水平移動する。このステージ10のx軸方向及びy軸方向への移動により、ステージ10に載置された測定対象物Pの被測定面Sを光学部2に対して移動させる。 The in-plane direction moving means 35 is composed of an x actuator 34 and a y actuator 36. Then, the stage 10 horizontally moves in the x-axis direction by driving the x-actuator 34, and horizontally moves in the y-axis direction by driving the y-actuator 36. By moving the stage 10 in the x-axis direction and the y-axis direction, the surface S to be measured of the measurement object P placed on the stage 10 is moved with respect to the optical unit 2.

なお、xアクチュエータ34及びyアクチュエータ36のように本明細書においてアクチュエータという場合には、ピエゾアクチュエータやモータなどの任意の駆動装置を示す。 The term actuator in the present specification, such as the x-actuator 34 and the y-actuator 36, refers to an arbitrary driving device such as a piezo actuator or a motor.

また、ステージ面10Sに対向する位置、即ち、ステージ10の上側には、筐体2A(図2参照)により一体的に保持された光学部2が配置される。 Further, an optical unit 2 integrally held by the housing 2A (see FIG. 2) is arranged at a position facing the stage surface 10S, that is, on the upper side of the stage 10.

光学部2は、x軸に平行な光軸Z−1を有する光源部12と、z軸に平行な光軸(測定光軸Z−0)を有する干渉部14と、撮影部16とを有する。光源部12の光軸Z−1は、干渉部14及び撮影部16の測定光軸Z−0に対して直交し、干渉部14と撮影部16との間において測定光軸Z−0と交差する。なお、光軸Z−1は、必ずしもx軸と平行でなくてもよい。 The optical unit 2 includes a light source unit 12 having an optical axis Z-1 parallel to the x-axis, an interference unit 14 having an optical axis parallel to the z-axis (measurement optical axis Z-0), and a photographing unit 16. .. The optical axis Z-1 of the light source unit 12 is orthogonal to the measurement optical axis Z-0 of the interference unit 14 and the photographing unit 16, and intersects the measurement optical axis Z-0 between the interference unit 14 and the photographing unit 16. To do. The optical axis Z-1 does not necessarily have to be parallel to the x-axis.

光源部12は、測定対象物Pを照明する照明光として波長幅が広い白色光(可干渉性の少ない低コヒーレンス光)を出射する光源40と、光源40から拡散して出射された照明光を略平行な光束に変換するコレクタレンズ42とを有する。光源40及びコレクタレンズ42の各々の中心とする軸は光源部12の光軸Z−1として同軸上に配置される。 The light source unit 12 emits a light source 40 that emits white light having a wide wavelength width (low coherence light with little coherence) as illumination light that illuminates the object P to be measured, and an illumination light that is diffused and emitted from the light source 40. It has a collector lens 42 that converts light into a substantially parallel light source. The central axes of the light source 40 and the collector lens 42 are coaxially arranged as the optical axis Z-1 of the light source unit 12.

また、光源40としては、発光ダイオード、半導体レーザー、ハロゲンランプ、高輝度放電ランプなど、任意の種類の発光体を用いることができる。 Further, as the light source 40, any kind of light emitting body such as a light emitting diode, a semiconductor laser, a halogen lamp, and a high-intensity discharge lamp can be used.

この光源部12から出射された照明光は、干渉部14と撮影部16との間に配置され、光軸Z−1と測定光軸Z−0とが交差する位置に配置されたハーフミラー等のビームスプリッタ44に入射する。そして、ビームスプリッタ44(ビームスプリッタ44の平坦な光分割面(反射面))で反射した照明光が光軸Z−0に沿って進行して干渉部14に入射する。 The illumination light emitted from the light source unit 12 is arranged between the interference unit 14 and the photographing unit 16, and is a half mirror or the like arranged at a position where the optical axis Z-1 and the measurement optical axis Z-0 intersect. It is incident on the beam splitter 44 of the above. Then, the illumination light reflected by the beam splitter 44 (the flat light dividing surface (reflecting surface) of the beam splitter 44) travels along the optical axis Z-0 and is incident on the interference portion 14.

干渉部14は、マイケルソン型干渉計により構成され、光源部12から入射した照明光を測定光と参照光とに分割する。そして、測定光を測定対象物Pに照射するとともに参照光を参照ミラー52に照射し、測定対象物Pから戻る測定光と参照ミラー52から戻る参照光とを干渉させた干渉光を生成する。 The interference unit 14 is composed of a Michelson type interferometer, and divides the illumination light incident from the light source unit 12 into measurement light and reference light. Then, the measurement object P is irradiated with the measurement light and the reference light is irradiated to the reference mirror 52 to generate interference light in which the measurement light returning from the measurement object P and the reference light returning from the reference mirror 52 interfere with each other.

干渉部14は、集光作用を有し、倍率の異なる複数の対物レンズ50と、光を反射する参照面であって平坦な反射面を有する参照ミラー52と、光を分割する平坦な光分割面を有するビームスプリッタ54を有する。対物レンズ50、参照ミラー52、及びビームスプリッタ54の各々の中心とする軸は干渉部14の測定光軸Z−0として同軸上に配置される。参照ミラー52の反射面はビームスプリッタ54の側方位置に、測定光軸Z−0と平行に配置される。 The interference unit 14 has a light-collecting action, a plurality of objective lenses 50 having different magnifications, a reference mirror 52 which is a reference surface for reflecting light and has a flat reflecting surface, and a flat light splitting which divides light. It has a beam splitter 54 having a surface. The axes at the centers of the objective lens 50, the reference mirror 52, and the beam splitter 54 are coaxially arranged as the measurement optical axis Z-0 of the interference unit 14. The reflecting surface of the reference mirror 52 is arranged at a lateral position of the beam splitter 54 in parallel with the measurement optical axis Z-0.

図2は、光学部2の干渉部14に設けられた対物レンズ50を示す概念図である。 FIG. 2 is a conceptual diagram showing an objective lens 50 provided in the interference unit 14 of the optical unit 2.

図2に示すように、光学部2を保持する筐体2Aの被測定面S側の面にはレボルバー2Bが設けられ、レボルバー2Bには低倍率レンズ50A,中倍率レンズ50B、高倍率レンズ50Cが固定されている。そして、処理部18の指示でレボルバー2Bを回転させることにより干渉部14の測定走査に用いる対物レンズ50を選択することができる。 As shown in FIG. 2, a revolver 2B is provided on the surface of the housing 2A that holds the optical unit 2 on the side to be measured, and the revolver 2B has a low magnification lens 50A, a medium magnification lens 50B, and a high magnification lens 50C. Is fixed. Then, the objective lens 50 used for the measurement scanning of the interference unit 14 can be selected by rotating the revolver 2B according to the instruction of the processing unit 18.

なお、対物レンズ50は上記の3種類に限定するものではなく、低倍率レンズ50A,中倍率レンズ50B、高倍率レンズ50Cのうちの2つを組み合わせてもよく、あるいは4つ以上の対物レンズ50を設けて倍率を細かく分けてもよい。 The objective lens 50 is not limited to the above three types, and two of the low magnification lens 50A, the medium magnification lens 50B, and the high magnification lens 50C may be combined, or four or more objective lenses 50. May be provided to subdivide the magnification.

図1に戻って、光源部12から干渉部14に入射した照明光は、対物レンズ50により集光作用を受けた後、ビームスプリッタ54に入射する。 Returning to FIG. 1, the illumination light incident on the interference unit 14 from the light source unit 12 is focused by the objective lens 50 and then incident on the beam splitter 54.

ビームスプリッタ54は、例えばハーフミラーであり、ビームスプリッタ54に入射した照明光は、ビームスプリッタ54を透過する測定光と、ビームスプリッタ54の光分割面で反射する参照光とに分割される。 The beam splitter 54 is, for example, a half mirror, and the illumination light incident on the beam splitter 54 is split into a measurement light that passes through the beam splitter 54 and a reference light that is reflected by the light splitting surface of the beam splitter 54.

ビームスプリッタ54を透過した測定光は、測定対象物Pの被測定面Sに照射された後、被測定面Sから干渉部14へと戻り、再度、ビームスプリッタ54に入射する。そして、ビームスプリッタ54を透過した測定光が対物レンズ50に入射する。 The measurement light transmitted through the beam splitter 54 is applied to the surface S to be measured of the object P to be measured, then returns from the surface S to be measured to the interference portion 14, and is incident on the beam splitter 54 again. Then, the measurement light transmitted through the beam splitter 54 is incident on the objective lens 50.

一方、ビームスプリッタ54で反射した参照光は、参照ミラー52の光反射面で反射した後、再度、ビームスプリッタ54に入射する。そして、ビームスプリッタ54で反射した参照光が対物レンズ50に入射する。 On the other hand, the reference light reflected by the beam splitter 54 is reflected by the light reflecting surface of the reference mirror 52 and then incidents on the beam splitter 54 again. Then, the reference light reflected by the beam splitter 54 is incident on the objective lens 50.

これにより、干渉部14から測定対象物Pの被測定面Sに照射されて干渉部14に戻る測定光と、参照ミラー52で反射した参照光とが重ね合わされた干渉光が生成され、その干渉光が対物レンズ50により集光作用を受けた後、干渉部14から撮影部16に向けて出射される。 As a result, interference light is generated in which the measurement light irradiated from the interference unit 14 to the measured surface S of the measurement object P and returned to the interference unit 14 and the reference light reflected by the reference mirror 52 are superimposed, and the interference is generated. After the light is focused by the objective lens 50, it is emitted from the interference unit 14 toward the photographing unit 16.

また、照明光が測定光と参照光とに分割された後、測定光と参照光とが重ね合わされるまでの測定光と参照光の各々が通過した光路の光学的距離を、測定光の光路長及び参照光の光路長といい、それらの差を測定光と参照光の光路長差というものとする。 Further, after the illumination light is divided into the measurement light and the reference light, the optical path of the optical path through which each of the measurement light and the reference light passes until the measurement light and the reference light are superimposed is determined by the optical path of the measurement light. The length and the optical path length of the reference light are called, and the difference between them is called the optical path length difference between the measurement light and the reference light.

干渉部14を測定光の測定光軸Z−0(z軸)に沿って垂直方向に測定走査することで測定光の光路長を変化させる走査手段としての干渉部アクチュエータ56を有する。そして、干渉部アクチュエータ56の駆動により干渉部14がz軸方向(測定走査方向)に移動する。これにより、対物レンズ50の焦点面の位置(高さ)がz軸方向に移動すると共に、被測定面Sとビームスプリッタ54との距離が変化することで測定光の光路長が変化し、測定光と参照光との光路長差が変化する。 The interference unit actuator 56 is provided as a scanning means for changing the optical path length of the measurement light by measuring and scanning the interference unit 14 in the vertical direction along the measurement optical axis Z-0 (z axis) of the measurement light. Then, the interference unit 14 moves in the z-axis direction (measurement scanning direction) by driving the interference unit actuator 56. As a result, the position (height) of the focal plane of the objective lens 50 moves in the z-axis direction, and the distance between the surface S to be measured and the beam splitter 54 changes, so that the optical path length of the measurement light changes, and the measurement is performed. The optical path length difference between the light and the reference light changes.

撮影部16は、測定対象物Pの被測定面Sの各点に照射された測定光と、参照光とによる干渉光の輝度情報から干渉縞を取得する干渉縞取得部であり、例えばCCD(Charge Coupled Device)カメラに相当し、CCD型の撮像素子60と、結像レンズ62とを有する。撮像素子60と結像レンズ62の各々の中心とする軸は撮影部16の測定光軸Z−0として同軸上に配置される。なお、撮像素子60は、CMOS(Complementary Metal Oxide Semiconductor)型の固体撮像素子等、任意の撮像手段を用いることができる。 The photographing unit 16 is an interference fringe acquisition unit that acquires interference fringes from the brightness information of the interference light due to the measurement light irradiated to each point of the measurement surface S of the measurement object P and the reference light, for example, a CCD ( It corresponds to a Charge Coupled Device) camera and has a CCD type image pickup element 60 and an imaging lens 62. The central axes of the image sensor 60 and the image lens 62 are coaxially arranged as the measurement optical axis Z-0 of the photographing unit 16. As the image pickup device 60, any imaging means such as a CMOS (Complementary Metal Oxide Semiconductor) type solid-state image pickup device can be used.

干渉部14から出射された干渉光は、上述のビームスプリッタ44に入射し、ビームスプリッタ44を透過した干渉光が撮影部16に入射する。 The interference light emitted from the interference unit 14 is incident on the beam splitter 44 described above, and the interference light transmitted through the beam splitter 44 is incident on the imaging unit 16.

撮影部16に入射した干渉光は、結像レンズ62により撮像素子60の撮像面60Sに干渉縞像を結像する。ここで、結像レンズ62は、測定対象物Pの被測定面Sの測定光軸Z−0周辺の領域に対する干渉縞像を高倍率に拡大して撮像素子60の撮像面60Sに結像する。 The interference light incident on the photographing unit 16 forms an interference fringe image on the image pickup surface 60S of the image pickup element 60 by the image pickup lens 62. Here, the imaging lens 62 magnifies the interference fringe image with respect to the region around the measurement optical axis Z-0 of the measurement surface S of the measurement object P at a high magnification and forms an image on the image pickup surface 60S of the image pickup element 60. ..

また、結像レンズ62は、干渉部14の対物レンズ50の焦点面上における点を、撮像素子60の撮像面上の像点として結像する。即ち、撮影部16は、対物レンズ50の焦点面の位置にピントが合うように(合焦するように)設計されている。 Further, the imaging lens 62 forms an image of a point on the focal plane of the objective lens 50 of the interference unit 14 as an image point on the imaging surface of the image sensor 60. That is, the photographing unit 16 is designed so that the position of the focal plane of the objective lens 50 is in focus (focused).

撮像素子60の撮像面60Sに結像された干渉縞像は、撮像素子60により電気信号に変換されて干渉縞として取得される。そして、その干渉縞は、処理部18に与えられる。 The interference fringe image formed on the image pickup surface 60S of the image pickup element 60 is converted into an electric signal by the image pickup element 60 and acquired as interference fringes. Then, the interference fringes are given to the processing unit 18.

以上のように光源部12、干渉部14、及び撮影部16等により構成される光学部2は、全体が一体的としてz軸方向に直進移動可能に設けられる。例えば、光学部2は、z軸方向に沿って立設された不図示のz軸ガイド部に直進移動可能に支持される。そして、zアクチュエータ70の駆動により光学部2全体がZ軸方向に直進移動する。これにより、干渉部14をz軸方向に移動させる場合よりも、撮影部16のピント位置をz軸方向に大きく移動させることができ、例えば、測定対象物Pの厚さ等に応じて撮影部16のピント位置を適切な位置に調整することができる。 As described above, the optical unit 2 including the light source unit 12, the interference unit 14, the photographing unit 16, and the like is provided as an integral body so as to be movable in the z-axis direction. For example, the optical unit 2 is supported by a z-axis guide unit (not shown) erected along the z-axis direction so as to be movable in a straight line. Then, the entire optical unit 2 moves linearly in the Z-axis direction by driving the z-actuator 70. As a result, the focus position of the imaging unit 16 can be moved more in the z-axis direction than when the interference unit 14 is moved in the z-axis direction. For example, the imaging unit can be moved according to the thickness of the measurement object P or the like. The focus position of 16 can be adjusted to an appropriate position.

処理部18は、測定対象物Pの被測定面Sの表面形状を測定する際に、干渉部アクチュエータ56を制御して光学部2の干渉部14をz軸方向に移動させながら撮影部16の撮像素子60から干渉縞を順次取得する。そして、取得した干渉縞に基づいて被測定面Sの3次元形状データを被測定面Sの表面形状を示すデータとして取得する。 When measuring the surface shape of the surface S to be measured of the object P to be measured, the processing unit 18 controls the interference unit actuator 56 to move the interference unit 14 of the optical unit 2 in the z-axis direction, while the processing unit 18 of the imaging unit 16 Interference fringes are sequentially acquired from the image sensor 60. Then, based on the acquired interference fringes, the three-dimensional shape data of the surface S to be measured is acquired as data indicating the surface shape of the surface S to be measured.

ここで、処理部18が干渉縞に基づいて被測定面Sの3次元形状データを取得する処理について説明する。 Here, a process in which the processing unit 18 acquires the three-dimensional shape data of the surface S to be measured based on the interference fringes will be described.

撮影部16の撮像素子60は、x軸及びy軸からなるxy平面(水平面)に沿って2次元的に配列された多数の受光素子(画素)から構成されている。そして、各画素において受光される干渉縞の輝度値、即ち、撮像素子60により取得される干渉縞の各画素の輝度値は、各画素に対応する被測定面Sの各点で反射した測定光と参照光との光路長差に応じた干渉光の強度(輝度情報)を示す。 The image sensor 60 of the photographing unit 16 is composed of a large number of light receiving elements (pixels) two-dimensionally arranged along an xy plane (horizontal plane) composed of an x-axis and a y-axis. Then, the brightness value of the interference fringes received by each pixel, that is, the brightness value of each pixel of the interference fringes acquired by the image pickup element 60 is the measurement light reflected at each point of the surface S to be measured corresponding to each pixel. The intensity (luminance information) of the interference light according to the difference in the optical path length between the light and the reference light is shown.

ここで、図3に示すように、撮像素子60の撮像面60Sのxy座標上の干渉縞におけるm列目、n行目の画素を(m,n)を表すものとする。そして、画素(m,n)のx軸方向に関する位置(以下、x軸方向に関する位置を「x位置」という)を示すx座標値をx(m,n)と表するものとする。そして、y軸方向に関する位置(以下、y軸方向に関する位置「y位置」という)を示すy座標値をy(m,n)と表すものとする。 Here, as shown in FIG. 3, the pixels in the m-th column and the n-th row in the interference fringes on the xy coordinates of the image pickup surface 60S of the image pickup element 60 are assumed to represent (m, n). Then, the x-coordinate value indicating the position of the pixel (m, n) in the x-axis direction (hereinafter, the position in the x-axis direction is referred to as “x position”) is expressed as x (m, n). Then, the y coordinate value indicating the position related to the y-axis direction (hereinafter, referred to as the position “y position” related to the y-axis direction) is represented by y (m, n).

また、画素(m,n)に対応する測定対象物Pの被測定面S上の点のx位置を示すx座標値をX(m,n)と表し、y位置を示すy座標値をY(m,n)と表すものとし、その点をxy座標値により(X(m,n),Y(m,n))と表すものとする。
なお、画素(m,n)に対応する被測定面S上の点とは、ピントが合っている状態において画素(m,n)の位置に像点が結像される被測定面S上の点を意味する。
Further, the x-coordinate value indicating the x-position of the point on the measured surface S of the measurement object P corresponding to the pixel (m, n) is represented by X (m, n), and the y-coordinate value indicating the y-position is Y. It shall be expressed as (m, n), and the point shall be expressed as (X (m, n), Y (m, n)) by the xy coordinate value.
The point on the measured surface S corresponding to the pixel (m, n) is the point on the measured surface S on which the image point is formed at the position of the pixel (m, n) in the focused state. Means a point.

このとき、撮像素子60により取得される干渉縞の画素(m,n)の輝度値は、画素(m,n)に対応する被測定面S上の点(X(m,n),Y(m,n))に照射された測定光と参照光との光路長差に応じた大きさを示す。 At this time, the brightness values of the pixels (m, n) of the interference fringes acquired by the image sensor 60 are the points (X (m, n), Y (X (m, n), Y () on the surface to be measured S corresponding to the pixels (m, n). The magnitude corresponding to the optical path length difference between the measurement light and the reference light irradiated to m, n)) is shown.

即ち、図1の干渉部アクチュエータ56により干渉部14をz軸方向に測定走査させて光学部2(撮影部16)に対する干渉部14の相対的なz軸方向の位置(以下、「z位置」という)を変位させると、撮影部16のピント位置(対物レンズ50の焦点面)もz軸方向に移動し、ピント位置も干渉部14と同じ変位量で変位する。また、ピント位置が変位すると、被測定面Sの各点に照射される測定光の光路長も変化する。 That is, the interference unit 14 is measured and scanned in the z-axis direction by the interference unit actuator 56 in FIG. 1, and the position of the interference unit 14 relative to the optical unit 2 (photographing unit 16) in the z-axis direction (hereinafter, “z position””. When the) is displaced, the focus position of the photographing unit 16 (the focal plane of the objective lens 50) also moves in the z-axis direction, and the focus position is also displaced by the same amount of displacement as the interference unit 14. Further, when the focus position is displaced, the optical path length of the measurement light applied to each point of the surface S to be measured also changes.

そして、干渉部14をz軸方向に移動させてピント位置を変位させながら、即ち、測定光の光路長を変化させながら、撮像素子60から干渉縞を順次取得して干渉縞の任意の画素(m,n)の輝度値を検出する。 Then, while moving the interference unit 14 in the z-axis direction to displace the focus position, that is, while changing the optical path length of the measurement light, the interference fringes are sequentially acquired from the image sensor 60 and any pixel of the interference fringes ( The brightness value of m, n) is detected.

ここで、処理部18は、干渉部14の所定の基準位置からの変位量(干渉部14のz位置)を、ポテンショメータやエンコーダなどの不図示の位置検出手段からの検出信号により検出することができる。または、位置検出手段を使用することなく干渉部14のz位置を制御する場合、例えば、干渉部アクチュエータ56に与える駆動信号により一定変位量ずつ干渉部14を移動させる場合には、その総変位量により検出することができる。 Here, the processing unit 18 can detect the displacement amount of the interference unit 14 from a predetermined reference position (z position of the interference unit 14) by a detection signal from a position detection means (not shown) such as a potentiometer or an encoder. it can. Alternatively, when controlling the z position of the interference unit 14 without using the position detecting means, for example, when moving the interference unit 14 by a constant displacement amount by a drive signal given to the interference unit actuator 56, the total displacement amount. Can be detected by.

そして、干渉部14が基準位置のときのピント位置のz位置を測定空間におけるz座標の基準位置(原点位置)として、かつ、干渉部14の基準位置からの変位量をピント位置のz座標値として取得することができる。なお、z座標値は、原点位置よりも高い位置(撮影部16に近づく位置)を正側、低い位置(ステージ面10Sに近づく位置)を負側とする。また、干渉部14の基準位置、即ち、z座標の原点位置は任意のz位置に設定、変更することができる。 Then, the z position of the focus position when the interference unit 14 is the reference position is set as the reference position (origin position) of the z coordinate in the measurement space, and the displacement amount of the interference unit 14 from the reference position is the z coordinate value of the focus position. Can be obtained as. The z coordinate value has a positive side at a position higher than the origin position (a position closer to the photographing unit 16) and a negative side at a lower position (a position closer to the stage surface 10S). Further, the reference position of the interference unit 14, that is, the origin position of the z coordinate can be set or changed to an arbitrary z position.

図4の(A)〜(C)は、干渉部14を測定対象物Pの被測定面Sに近接した位置からz軸方向に上昇させながら撮影部16の撮像素子60から画像を取得したときの干渉部14のz位置と輝度値との関係を示した図である。 (A) to (C) of FIG. 4 show when an image is acquired from the image sensor 60 of the photographing unit 16 while raising the interference unit 14 from a position close to the measured surface S of the measurement object P in the z-axis direction. It is a figure which showed the relationship between the z position of the interference part 14 and a luminance value.

図4の(A)のように、測定光の光路長L1が参照光の光路長L2よりも小さいと干渉は小さく、輝度値は略一定となる。そして、図4の(B)のように、測定光の光路長L1と参照光の光路長L2とが同じ、即ち光路長差が0となる場合に干渉が大きくなり、最も大きな輝度値を示す。さらに、図4の(C)のように、測定光の光路長L1が参照光の光路長L2よりも大きいと再び干渉は小さくなり、輝度値は略一定となる。これにより、図4の(D)に示す干渉縞曲線Qに沿った輝度値が得られる。 As shown in FIG. 4A, when the optical path length L1 of the measurement light is smaller than the optical path length L2 of the reference light, the interference is small and the brightness value is substantially constant. Then, as shown in FIG. 4B, when the optical path length L1 of the measurement light and the optical path length L2 of the reference light are the same, that is, when the optical path length difference becomes 0, the interference becomes large and the maximum luminance value is shown. .. Further, as shown in FIG. 4C, when the optical path length L1 of the measurement light is larger than the optical path length L2 of the reference light, the interference becomes small again and the luminance value becomes substantially constant. As a result, the luminance value along the interference fringe curve Q shown in FIG. 4D can be obtained.

即ち、任意の画素(m,n)における干渉縞曲線Qは、その画素(m,n)に対応する被測定面S上の点(X(m,n),Y(m,n))に照射された測定光と参照光との光路長差が所定値より大きい場合には略一定の輝度値を示し、光路長差がその所定値より小さいときには、光路長差が減少するにつれて輝度値が振動すると共にその振幅が大きくなる。 That is, the interference fringe curve Q at an arbitrary pixel (m, n) is located at a point (X (m, n), Y (m, n)) on the surface to be measured S corresponding to the pixel (m, n). When the optical path length difference between the irradiated measurement light and the reference light is larger than the predetermined value, a substantially constant brightness value is shown, and when the optical path length difference is smaller than the predetermined value, the brightness value increases as the optical path length difference decreases. As it vibrates, its amplitude increases.

したがって、図4(D)に示すように、干渉縞曲線Qは、測定光と参照光との光路長が一致したときに(光路長差が0のときに)、最大値を示すと共に、その干渉縞曲線Qの包絡線における最大値を示す。 Therefore, as shown in FIG. 4D, the interference fringe curve Q shows the maximum value when the optical path lengths of the measurement light and the reference light match (when the optical path length difference is 0), and the maximum value thereof is shown. The maximum value in the envelope of the interference fringe curve Q is shown.

また、被測定面S上の点(X(m,n),Y(m,n))に照射された測定光と参照光との光路長は、撮影部16のピント位置が被測定面S上の点(X(m,n),Y(m,n))のz位置に一致したときに一致する。 Further, the optical path length between the measurement light and the reference light applied to the points (X (m, n), Y (m, n)) on the measurement surface S is such that the focus position of the photographing unit 16 is the measurement surface S. It matches when it matches the z position of the upper point (X (m, n), Y (m, n)).

したがって、干渉縞曲線Qが最大値を示すとき(又は干渉縞曲線Qの包絡線が最大値を示すとき)のピント位置は、被測定面S上の点(X(m,n),Y(m,n))のz位置に一致しており、そのときのピント位置のz座標値は、被測定面S上の点(X(m,n),Y(m,n))のz座標値を示す。 Therefore, when the interference fringe curve Q shows the maximum value (or when the envelope of the interference fringe curve Q shows the maximum value), the focus position is the point (X (m, n), Y ( It matches the z-position of m, n)), and the z-coordinate value of the focus position at that time is the z-coordinate of the point (X (m, n), Y (m, n)) on the surface S to be measured. Indicates a value.

以上のことから、処理部18は、干渉部アクチュエータ56により干渉部14をz軸方向に移動させてピント位置をz軸方向に移動させながら(測定光の光路長を変化させながら)、撮像素子60から干渉縞を順次取得し、各画素(m,n)の輝度値をピント位置のz座標値に対応付けて取得する。即ち、ピント位置をz軸方向に走査しながら干渉縞の各画素(m,n)の輝度値を取得する。そして、各画素(m,n)について、図3(D)のような干渉縞曲線Qの輝度値が最大値を示すときのピント位置のz座標値(干渉縞位置)を、各画素(m,n)に対応する被測定面S上の点(X(m,n),Y(m,n))のz座標値Z(m,n)として検出する。 From the above, the processing unit 18 moves the interference unit 14 in the z-axis direction by the interference unit actuator 56 to move the focus position in the z-axis direction (while changing the optical path length of the measurement light), while the image sensor Interference fringes are sequentially acquired from 60, and the luminance value of each pixel (m, n) is acquired in association with the z-coordinate value of the focus position. That is, the brightness values of each pixel (m, n) of the interference fringes are acquired while scanning the focus position in the z-axis direction. Then, for each pixel (m, n), the z coordinate value (interference fringe position) of the focus position when the brightness value of the interference fringe curve Q as shown in FIG. 3D shows the maximum value is set to each pixel (m). , N) is detected as the z-coordinate value Z (m, n) of the point (X (m, n), Y (m, n)) on the surface S to be measured.

なお、Z(m,n)は、画素(m,n)に対応する被測定面S上の点(X(m,n),Y(m,n))のz座標値を示す。 Note that Z (m, n) indicates the z coordinate value of the point (X (m, n), Y (m, n)) on the measured surface S corresponding to the pixel (m, n).

また、干渉縞曲線Qの輝度値が最大値を示すときのピント位置のz座標値を検出する方法は周知であり、どのような方法を採用してもよい。例えば、ピント位置の微小間隔ごとのz座標値において干渉縞を取得することで、各画素(m,n)について、図3(D)のような干渉縞曲線Qを実際に描画することができる程度に輝度値を取得することができる。そして、取得した輝度値が最大値を示すときのピント位置のz座標値を検出することで、干渉縞曲線Qの輝度値が最大値を示すときのピント位置のz座標値を検出することができる。 Further, a method of detecting the z-coordinate value of the focus position when the luminance value of the interference fringe curve Q indicates the maximum value is well known, and any method may be adopted. For example, by acquiring the interference fringes at the z-coordinate values for each minute interval of the focus position, it is possible to actually draw the interference fringe curve Q as shown in FIG. 3D for each pixel (m, n). The brightness value can be obtained to the extent. Then, by detecting the z-coordinate value of the focus position when the acquired luminance value indicates the maximum value, the z-coordinate value of the focus position when the luminance value of the interference fringe curve Q indicates the maximum value can be detected. it can.

または、ピント位置の各z座標値において取得した輝度値に基づいて最小二乗法等により干渉縞曲線Qを推測し、又は、干渉縞曲線Qの包絡線を推測する。そして、その推測した干渉縞曲線Q又は包絡線に基づいて輝度値が最大値を示すときのピント位置のz座標値を検出することで、干渉縞曲線Qの輝度値が最大値を示すときのピント位置のz座標値を検出することができる。 Alternatively, the interference fringe curve Q is estimated by the least squares method or the like based on the luminance value acquired at each z coordinate value of the focus position, or the envelope of the interference fringe curve Q is estimated. Then, by detecting the z-coordinate value of the focus position when the luminance value shows the maximum value based on the estimated interference fringe curve Q or the envelope, when the luminance value of the interference fringe curve Q shows the maximum value. The z-coordinate value of the focus position can be detected.

以上のようにして、処理部18は、干渉縞(撮像素子60の撮像面60S)の各画素(m,n)に対応する被測定面S上の各点(X(m,n),Y(m,n))のz座標値Z(m,n)を検出することで、被測定面S上の各点(X(m,n),Y(m,n))の相対的な高さを検出することができる。 As described above, the processing unit 18 has each point (X (m, n), Y) on the measured surface S corresponding to each pixel (m, n) of the interference fringe (imaging surface 60S of the image sensor 60). By detecting the z-coordinate value Z (m, n) of (m, n)), the relative height of each point (X (m, n), Y (m, n)) on the surface to be measured S is Can be detected.

そして、被測定面S上の各点のx座標値X(m,n)、y座標値Y(m,n)、及びz座標値Z(m,n)を被測定面Sの3次元形状データ(表面形状を示すデータ)として取得することができる。 Then, the x-coordinate values X (m, n), y-coordinate values Y (m, n), and z-coordinate values Z (m, n) of each point on the measured surface S are the three-dimensional shapes of the measured surface S. It can be acquired as data (data indicating the surface shape).

例えば、図5に示すようにx軸方向に並ぶ3つの画素に対応する被測定面S上の3点におけるz座標値Z1、Z2、Z3が相違する場合に、ピント位置をz軸方向に走査しながら干渉縞のそれらの画素の輝度値を取得する。その結果、それらの画素の各々に関してピント位置がz座標値Z1、Z2、Z3のときに輝度値が最大値を示す干渉縞曲線Q1、Q2、Q3が取得される。したがって、それらの干渉縞曲線Q1、Q2、Q3の輝度値が最大値を示すときのピント位置のz座標値を検出することで、それらの画素に対応する被測定面S上の3点におけるz座標値Z1、Z2、Z3を検出することができる。このようにして、被測定面Sの3次元形状データを取得することにより、測定対象物Pの表面形状測定を行う。 For example, as shown in FIG. 5, when the z-coordinate values Z1, Z2, and Z3 at three points on the measured surface S corresponding to the three pixels arranged in the x-axis direction are different, the focus position is scanned in the z-axis direction. While acquiring the brightness values of those pixels of the interference fringes. As a result, interference fringe curves Q1, Q2, and Q3 indicating the maximum luminance value when the focus position is the z coordinate values Z1, Z2, and Z3 for each of those pixels are acquired. Therefore, by detecting the z-coordinate value of the focus position when the luminance values of the interference fringe curves Q1, Q2, and Q3 show the maximum values, z at three points on the measured surface S corresponding to those pixels The coordinate values Z1, Z2, and Z3 can be detected. In this way, the surface shape of the object P to be measured is measured by acquiring the three-dimensional shape data of the surface S to be measured.

上述のように光学部2として垂直走査型の白色干渉計を使用した場合、干渉部14に使用する対物レンズ50の最大撮影面積である測定視野W等の制限により、1回の測定で測定可能な被測定面Sの測定視野に制限がある場合が多い。 When a vertical scanning white interferometer is used as the optical unit 2 as described above, it is possible to measure with one measurement due to the limitation of the measurement field of view W which is the maximum imaging area of the objective lens 50 used for the interferometer 14. In many cases, the measurement field of view of the surface S to be measured is limited.

このため、図6に示すように、測定対象物Pをx軸方向及びy軸方向に水平移動可能なステージ10上に載置し、測定対象物Pの被測定面Sを一定の割合で測定範囲が重なるように移動させながら複数回測定する。そして、その後でソフトウェア処理等を用いて計算することで複数枚の測定データを接続することにより被測定面Sの表面形状を測定するスティッチング測定を行う。 Therefore, as shown in FIG. 6, the measurement object P is placed on the stage 10 that can move horizontally in the x-axis direction and the y-axis direction, and the measured surface S of the measurement object P is measured at a constant ratio. Measure multiple times while moving so that the ranges overlap. Then, after that, stitching measurement is performed to measure the surface shape of the surface S to be measured by connecting a plurality of measurement data by calculation using software processing or the like.

なお、本実施の形態では、被測定面Sを一定の割合で測定範囲が重なるように測定する例で説明するが、重ねない場合もありえる。図6のWは対物レンズ50の測定視野を示しているが、実際には幅がWの正方形の面積である。 In this embodiment, the surface S to be measured is measured at a constant ratio so that the measurement ranges overlap, but the measurement may not overlap. W in FIG. 6 shows the measurement field of view of the objective lens 50, but is actually the area of a square having a width of W.

ところで、従来技術でも述べたように、光源40、倍率の異なる複数の対物レンズ50、及び撮影部16を備えた光学部2を有する表面形状測定装置1においては、測定準備アライメントとして、干渉部14に設けられた複数の倍率の異なる対物レンズ50の選択及び光源40の光量調整を少なくとも行う必要がある。 By the way, as described in the prior art, in the surface shape measuring device 1 having the light source 40, the plurality of objective lenses 50 having different magnifications, and the optical unit 2 including the photographing unit 16, the interfering unit 14 is used as the measurement preparation alignment. It is necessary to at least select the plurality of objective lenses 50 having different magnifications provided in the above and adjust the amount of light of the light source 40.

この測定準備アライメントを適正に行うか否かによって、表面形状の測定精度が異なる。特に、図7に示すように、表面形状が傾斜状領域Dと平坦状領域Kを有するうねり形状の被測定面Sを複数回測定し、その後に複数枚の測定データを接続するスティッチング測定を行う場合、傾斜状領域Dと平坦状領域Kとの測定精度にバラツキが生じ易い。したがって、複数回の測定ごとに対物レンズ50の選択及び光源40の光量調整に関する測定準備アライメントを適正に行わないと、表面形状測定の精度が悪くなる。 The measurement accuracy of the surface shape differs depending on whether or not this measurement preparation alignment is performed properly. In particular, as shown in FIG. 7, stitching measurement is performed in which a swell-shaped surface to be measured S having a surface shape having an inclined region D and a flat region K is measured a plurality of times, and then a plurality of measurement data are connected. When this is performed, the measurement accuracy between the inclined region D and the flat region K tends to vary. Therefore, if the measurement preparation alignment regarding the selection of the objective lens 50 and the light amount adjustment of the light source 40 is not properly performed for each of a plurality of measurements, the accuracy of the surface shape measurement deteriorates.

そこで、本発明の実施の形態の表面形状測定装置1は、上記の基本構成に加えて、表面形状測定を高精度に行うための以下の構成を備えるようにした。 Therefore, the surface shape measuring device 1 according to the embodiment of the present invention is provided with the following configuration for performing surface shape measurement with high accuracy in addition to the above basic configuration.

即ち、図1に示すように、主として、概略形状取得手段72と、被測定面分割手段74と、対物レンズ選択手段75と、光量調整手段76と、測定面形状測定手段77と、データ接続手段78と、を備えた。 That is, as shown in FIG. 1, mainly, the approximate shape acquisition means 72, the surface to be measured dividing means 74, the objective lens selecting means 75, the light amount adjusting means 76, the measuring surface shape measuring means 77, and the data connecting means. It was equipped with 78.

(概略形状取得手段)
概略形状取得手段72は、被測定面Sの概略形状情報を取得するものであり、被測定面Sにおける傾斜状領域D(図7参照)と平坦状領域K(図7参照)とを識別できる程度の比較的低精度のものでよく、高速かつ広範囲で測定が可能であることが優先される。概略形状取得手段72としては、次の3通りのものを採用することが好ましい。
(Rough shape acquisition means)
The approximate shape acquisition means 72 acquires the approximate shape information of the surface S to be measured, and can distinguish between the inclined region D (see FIG. 7) and the flat region K (see FIG. 7) on the surface S to be measured. It may be of a relatively low accuracy, and priority is given to being able to measure at high speed and in a wide range. As the approximate shape acquisition means 72, it is preferable to adopt the following three types.

1つ目の概略形状取得手段72は、三角測量方式のレーザー変位計、ステレオカメラ、パターン投影装置、等を別途設ける場合である。図8は三角測量方式のレーザー変位計72Aを被測定面Sの面内方向に沿って移動させることにより被測定面Sの傾斜状領域Dや平坦状領域Kの概略形状を取得している概念図である。 The first rough shape acquisition means 72 is a case where a triangulation type laser displacement meter, a stereo camera, a pattern projection device, and the like are separately provided. FIG. 8 shows a concept in which the approximate shape of the inclined region D and the flat region K of the measured surface S is acquired by moving the triangulation type laser displacement meter 72A along the in-plane direction of the measured surface S. It is a figure.

三角測量方式のレーザー変位計72Aは、測定対象物Pの被測定面Sに照射されたレーザーの拡散反射の一部が受光レンズを通過して受光素子上にスポットを形成し、測定対象物Pまでの距離が変位すると、スポットも移動する。そのスポット位置を検出することにより被測定面Sの概略形状を測定する方法である。反射光のなかの拡散反射光を受光することにより、測定範囲を広くとることができる。 In the triangulation type laser displacement meter 72A, a part of the diffuse reflection of the laser irradiated on the surface S to be measured of the object P to be measured passes through the light receiving lens to form a spot on the light receiving element, and the object P to be measured is measured. When the distance to is displaced, the spot also moves. This is a method of measuring the approximate shape of the surface S to be measured by detecting the spot position. By receiving the diffuse reflected light in the reflected light, the measurement range can be widened.

ステレオカメラ72Bは、測定対象物Pの被測定面Sを複数の異なる方向から同時に撮影することにより、その奥行き方向の情報も記録でき、1台で両眼視差を再現し、立体的な空間把握のできる立体写真の撮影が可能である。 The stereo camera 72B can record information in the depth direction by simultaneously photographing the surface S to be measured of the object P to be measured from a plurality of different directions, reproduce the binocular parallax with one unit, and grasp the three-dimensional space. It is possible to take a stereoscopic photograph that can be done.

図9は2つのカメラ73で測定対象物Pの被測定面Sを撮像している図であり、これにより被測定面Sの概略形状を取得することができる。 FIG. 9 is a diagram in which the measured surface S of the measurement object P is imaged by two cameras 73, whereby the approximate shape of the measured surface S can be acquired.

図示しないが、パターン投影法は、パターン光を測定対象物Pの被測定面Sに投影し、画像に写ったパターン上の点の三次元座標を求める方法である。そして、パターン上の各点から三角測量の原理で、それらの点に対応する三次元座標で三次元形状データを取得することにより被測定面Sの概略形状を取得することができる。 Although not shown, the pattern projection method is a method of projecting pattern light onto a surface S to be measured of a measurement object P and obtaining three-dimensional coordinates of points on the pattern reflected in the image. Then, the approximate shape of the surface S to be measured can be obtained by acquiring the three-dimensional shape data from each point on the pattern with the three-dimensional coordinates corresponding to those points by the principle of triangulation.

これらの三角測量方式のレーザー変位計72A、ステレオカメラ72B、パターン投影装置等の概略形状取得手段72は公知のものを使用することができる。 As the approximate shape acquisition means 72 such as the triangulation type laser displacement meter 72A, the stereo camera 72B, and the pattern projection device, known ones can be used.

レーザー変位計72A、ステレオカメラ72B、パターン投影装置等の新たに設置が必要な概略形状取得手段72は、図1に示すように例えば光学部2の側方位置に配置される。また、ステージ10を光学部2の下方位置と概略形状取得手段72の下方位置とに往復移動させるステージ移動手段80が設けられる。これにより、概略形状取得手段72によりステージ10上に載置された測定対象物Pの被測定面Sの概略形状が取得されると、ステージ移動手段80によってステージ10が光学部2の下方まで移動する。なお、本実施の形態では、1つのステージ10を光学部2の下方位置と概略形状取得手段72の下方位置とで移動させるようにしたが、概略形状取得手段72のためのステージを別途設け、概略形状取得手段72による概略形状取得が終了したら、ユーザが測定対象物Pをステージ10に載せ変えるようにしてもよい。 As shown in FIG. 1, the approximate shape acquisition means 72 that needs to be newly installed, such as the laser displacement meter 72A, the stereo camera 72B, and the pattern projection device, is arranged at a lateral position of, for example, the optical unit 2. Further, a stage moving means 80 for reciprocating the stage 10 between the lower position of the optical unit 2 and the lower position of the approximate shape acquisition means 72 is provided. As a result, when the approximate shape of the surface S to be measured of the measurement object P placed on the stage 10 is acquired by the approximate shape acquisition means 72, the stage 10 is moved to the lower side of the optical unit 2 by the stage moving means 80. To do. In the present embodiment, one stage 10 is moved between the lower position of the optical unit 2 and the lower position of the approximate shape acquisition means 72, but a stage for the approximate shape acquisition means 72 is separately provided. When the approximate shape acquisition by the approximate shape acquisition means 72 is completed, the user may mount the measurement object P on the stage 10.

2つ目の概略形状取得手段72は、測定対象物PのCAD(computer-aided-design)データを保持する保持手段(図示せず)であり、処理部18の記憶手段を使用することができる。このように、測定対象物PのCADデータを保持する保持手段を概略形状取得手段72として利用すれば、1つ目の概略形状取得手段72のように、概略形状取得手段72を別途設ける必要がない。また、保持手段に保持されたCADデータは既に測定対象物Pの3次元形状データを有している。これにより、測定対象物Pの被測定面Sの概略形状を測定する必要もないので、測定の時間短縮に寄与する。 The second approximate shape acquisition means 72 is a holding means (not shown) for holding CAD (computer-aided-design) data of the measurement object P, and the storage means of the processing unit 18 can be used. .. As described above, if the holding means for holding the CAD data of the measurement object P is used as the rough shape acquisition means 72, it is necessary to separately provide the rough shape acquisition means 72 like the first rough shape acquisition means 72. Absent. Further, the CAD data held by the holding means already has the three-dimensional shape data of the measurement object P. As a result, it is not necessary to measure the approximate shape of the surface S to be measured of the object P to be measured, which contributes to shortening the measurement time.

3つ目の概略形状取得手段72は、干渉部14の対物レンズ50として広い範囲を高速で測定できる低倍率レンズを用いた白色干渉計で概略形状を事前測定する場合である。この場合は、本実施の形態の表面形状測定装置1の干渉部14に既設の対物レンズ50における低倍率レンズ50Aを使用することで構成できる。したがって、3つ目の概略形状取得手段72の場合にも、概略形状取得手段72を別途設ける必要がない。 The third approximate shape acquisition means 72 is a case where the approximate shape is pre-measured by a white interferometer using a low-magnification lens capable of measuring a wide range at high speed as the objective lens 50 of the interference unit 14. In this case, it can be configured by using the low magnification lens 50A of the existing objective lens 50 in the interference portion 14 of the surface shape measuring device 1 of the present embodiment. Therefore, even in the case of the third rough shape acquisition means 72, it is not necessary to separately provide the rough shape acquisition means 72.

そして、図10に示すように、低倍率レンズ50Aに切り替えた干渉部14により、被測定面Sの複数の特徴点近傍をサンプリング測定することで、被測定面Sの概略形状を取得することができる。特徴点は例えば被測定面Sの段差エッジ部分等である。 Then, as shown in FIG. 10, the approximate shape of the surface S to be measured can be obtained by sampling and measuring the vicinity of a plurality of feature points of the surface S to be measured by the interference unit 14 switched to the low magnification lens 50A. it can. The feature point is, for example, a stepped edge portion of the surface S to be measured.

これらの概略形状取得手段72で取得された被測定面Sの概略形状情報は被測定面分割手段74に送られる。 The approximate shape information of the measured surface S acquired by these approximate shape acquiring means 72 is sent to the measured surface dividing means 74.

(被測定面分割手段)
被測定面分割手段74は、概略形状取得手段72によって取得した概略形状情報に基づいて被測定面Sを傾斜状領域Dと平坦状領域Kとで構成され1つの面積が対物レンズ50の測定視野W以下の複数の測定面Nに分割するものである。
(Measurement surface dividing means)
The surface to be measured dividing means 74 comprises an inclined region D and a flat region K on the surface to be measured S based on the approximate shape information acquired by the approximate shape acquiring means 72, and one area is the measurement field of view of the objective lens 50. It is divided into a plurality of measurement surfaces N of W or less.

ここで、傾斜状領域D及び平坦状領域Kとは、概略形状情報を表示部20(図1参照)に表示したときに、被測定面S全体の概観として傾斜状に見える領域と平坦状に見える領域を言い、被測定面Sの細かな凹凸を拡大したときの傾斜や平坦は含まない。 Here, the inclined region D and the flat region K are flat regions and regions that appear to be inclined as an overview of the entire surface S to be measured when the approximate shape information is displayed on the display unit 20 (see FIG. 1). It refers to a visible area and does not include inclination or flatness when the fine irregularities of the surface S to be measured are enlarged.

また、傾斜状領域Dとは傾斜面及びその近傍領域を言い、傾斜面が1つであることに限らず、傾斜角度の異なる傾斜面が繋がっている場合も含む。平坦状領域Kとは平坦面及びその近傍領域を言い、平坦とは略平坦であればよい。 Further, the inclined region D refers to an inclined surface and a region in the vicinity thereof, and is not limited to one inclined surface, and includes a case where inclined surfaces having different inclination angles are connected. The flat region K refers to a flat surface and a region in the vicinity thereof, and the flat region may be substantially flat.

図11は、被測定面分割手段74、及び詳細を後記する対物レンズ選択手段75、光量調整手段76、測定面形状測定手段77、データ接続手段78をパーソナルコンピュータ等の演算処理装置からなる処理部18に搭載した場合である。 FIG. 11 shows a processing unit in which the surface to be measured dividing means 74, the objective lens selecting means 75, the light amount adjusting means 76, the measuring surface shape measuring means 77, and the data connecting means 78, which will be described in detail later, are composed of an arithmetic processing unit such as a personal computer. This is the case when it is mounted on 18.

なお、被測定面分割手段74、対物レンズ選択手段75、光量調整手段76、測定面形状測定手段77、及びデータ接続手段78は、処理部18に搭載せずに専用のハードウェアとして構成することもできるが、本実施の形態では、処理部18において実行されるプログラムを用いて構築される。即ち、処理部18のCPU(Central-Processing-Unit)が演算処理装置を構成し、被測定面分割手段74、対物レンズ選択手段75、光量調整手段76、測定面形状測定手段77、データ接続手段78として機能する。 The surface dividing means 74 to be measured, the objective lens selecting means 75, the light amount adjusting means 76, the measuring surface shape measuring means 77, and the data connecting means 78 shall be configured as dedicated hardware without being mounted on the processing unit 18. However, in the present embodiment, it is constructed by using the program executed in the processing unit 18. That is, the CPU (Central-Processing-Unit) of the processing unit 18 constitutes the arithmetic processing unit, and the surface to be measured dividing means 74, the objective lens selecting means 75, the light amount adjusting means 76, the measuring surface shape measuring means 77, and the data connecting means. Functions as 78.

図11に示すように、処理部18は被測定面分割手段74、対物レンズ選択手段75、光量調整手段76、測定面形状測定手段77と、データ接続手段78を搭載し、概略形状取得手段72からの概略形状情報が被測定面分割手段74に入力される。また、概略形状取得手段72における概略形状情報の3次元座標(xyz座標)も処理部18に入力される。 As shown in FIG. 11, the processing unit 18 is equipped with the surface dividing means 74 to be measured, the objective lens selecting means 75, the light amount adjusting means 76, the measuring surface shape measuring means 77, and the data connecting means 78, and the approximate shape acquiring means 72. The approximate shape information from is input to the surface dividing means 74 to be measured. Further, the three-dimensional coordinates (xyz coordinates) of the approximate shape information in the approximate shape acquisition means 72 are also input to the processing unit 18.

そして、被測定面分割手段74は、概略形状取得手段72により取得した概略形状情報の3次元座標と、ステージ10に載置された測定対象物Pの3次元座標とを整合する。これにより、測定対象物Pと概略形状情報との位置合わせが行われる。そして、概略形状情報に基づいて被測定面Sを傾斜状領域Dと平坦状領域Kとで構成され1つの面積が測定視野W以下の複数の測定面Nに分割する。この場合、被測定面Sを一定の割合で測定面Nが重なるように分割する。 Then, the surface dividing means 74 to be measured matches the three-dimensional coordinates of the rough shape information acquired by the rough shape acquisition means 72 with the three-dimensional coordinates of the measurement object P placed on the stage 10. As a result, the measurement target P and the approximate shape information are aligned. Then, based on the approximate shape information, the surface to be measured S is divided into a plurality of measurement surfaces N composed of an inclined region D and a flat region K and having one area equal to or less than the measurement field of view W. In this case, the surface to be measured S is divided at a constant ratio so that the measurement surfaces N overlap.

被測定面分割手段74は、傾斜状領域Dと平坦状領域Kとの高低差で形成される段差の閾値(以下、段差閾値という)によって識別することが好ましい。 The surface dividing means 74 to be measured is preferably identified by a threshold value of a step formed by a height difference between the inclined region D and the flat region K (hereinafter, referred to as a step threshold).

図12に示すように、例えば、うねり形状のうねり最大高さh(測定対象物Pの最大厚みh1-最小厚みh2)が100μmある場合に、段差閾値Rを例えば10μmに設定する。これにより、被測定面分割手段74は、被測定面Sにおいて10μm以上の高低差を有する領域を傾斜状領域Dとして判定し、10μm未満の高低差を有する領域を平坦状領域Kとして判断する。段差閾値Rをどの程度に設定するかは被測定面Sのうねり形状のうねり最大高さh、うねり幅の大きさ、うねり周期等に基づいて決定することができる。 As shown in FIG. 12, for example, when the maximum swell height h of the swell shape (maximum thickness h1-minimum thickness h2 of the object to be measured P) is 100 μm, the step threshold value R is set to, for example, 10 μm. As a result, the surface dividing means 74 to be measured determines the region having a height difference of 10 μm or more as the inclined region D on the surface S to be measured, and determines the region having a height difference of less than 10 μm as the flat region K. How much the step threshold value R is set can be determined based on the maximum swell height h of the swell shape of the surface S to be measured, the size of the swell width, the swell cycle, and the like.

段差閾値Rを幾つに設定するかは、被測定面分割手段74に予め設定しておいてもよいが、ユーザが入力部22等を利用して被測定面分割手段74に任意に設定することが好ましい。これにより、被測定面Sの表面形状に応じて被測定面Sの分割数を適正に選択することができる。 The number of the step threshold value R to be set may be set in advance in the measured surface dividing means 74, but the user can arbitrarily set it in the measured surface dividing means 74 by using the input unit 22 or the like. Is preferable. As a result, the number of divisions of the surface S to be measured can be appropriately selected according to the surface shape of the surface S to be measured.

図13は、図7に示したうねり形状の被測定面Sを被測定面分割手段74により、x軸方向とy軸方向とに四角形状の16個の測定面N〜N16に分割し、分割した各測定面Nについて測定面に存在する最大高さを測定走査するのに最小限必要な干渉部14の最小走査範囲Z〜Zを設定した説明図である。 In FIG. 13, the wavy surface S to be measured shown in FIG. 7 is divided into 16 measurement surfaces N 1 to N 16 having a quadrangular shape in the x-axis direction and the y-axis direction by the measurement surface dividing means 74. It is explanatory drawing which set the minimum scanning range Z 1 to Z 8 of the interference part 14 which is the minimum necessary for measuring and scanning the maximum height existing in the measurement surface for each divided measurement surface N.

図13の(A)は分割した16個の測定面Nの最小走査範囲Z〜Zを示し、(B)は分割した16個の測定面N〜N16を示す。図13の(B)において、網状部分は測定面N同士の重なり部分を示す。また、図13の(C)は干渉部14の対物レンズ50の測定視野Wを示す。 FIG. 13A shows the minimum scanning ranges Z 1 to Z 8 of the 16 divided measurement surfaces N, and FIG. 13B shows the 16 measurement surfaces N 1 to N 16 divided. In FIG. 13B, the mesh-like portion indicates an overlapping portion between the measurement surfaces N. Further, FIG. 13C shows the measurement field of view W of the objective lens 50 of the interference unit 14.

図13の(B)に示すように、16個の測定面NをNからN16と名前を付けたとすると、例えば測定面N及び測定面Nの最小走査範囲はZとなる。また、測定面N及び測定面N16の最小走査範囲はZとなる。測定面N〜N及び測定面N10〜N15についても同様に最小測定走査設定Z〜Zを設定することができる。 As shown in FIG. 13B, assuming that the 16 measurement surfaces N are named N 1 to N 16 , for example, the minimum scanning range of the measurement surface N 1 and the measurement surface N 9 is Z 1 . Further, the minimum scanning range of the measurement surface N 8 and the measurement surface N 16 is Z 8 . Similarly, the minimum measurement scanning settings Z 2 to Z 7 can be set for the measurement surfaces N 2 to N 7 and the measurement surfaces N 10 to N 15 .

なお、被測定面分割手段74が被測定面Sを傾斜状領域Dと平坦状領域Kとに分割する別の方法としては、表示部20と入力部22とを用いてユーザが被測定面分割手段74に対して分割領域を指定することもできる。即ち、表示部20に表示した概略形状情報をユーザが目視して傾斜状領域Dと平坦状領域Kとに識別し、識別した分割領域の位置座標(xy座標)を入力する。そして、被測定面分割手段74は、ユーザからの指定に基づいて被測定面Sを傾斜状領域Dと平坦状領域Kとに分割する。また、被測定面Sを傾斜状領域Dと平坦状領域Kとに分割できれば、上記の分割方法に限定するものではない。 As another method in which the measured surface dividing means 74 divides the measured surface S into the inclined region D and the flat region K, the user divides the measured surface using the display unit 20 and the input unit 22. A division area can also be specified for the means 74. That is, the user visually identifies the approximate shape information displayed on the display unit 20 into the inclined region D and the flat region K, and inputs the position coordinates (xy coordinates) of the identified divided regions. Then, the surface to be measured dividing means 74 divides the surface to be measured S into an inclined region D and a flat region K based on a designation from the user. Further, if the surface S to be measured can be divided into an inclined region D and a flat region K, the method is not limited to the above division method.

(対物レンズ選択手段)
以下説明するように、対物レンズ選択手段75は、分割した各測定面Nについて傾斜状領域Dと平坦状領域Kとに光源40から光を照射したときの測定に寄与する測定寄与照射量に応じて複数の対物レンズ50の中から使用する倍率の対物レンズ50を選択する。
(Objective lens selection means)
As will be described below, the objective lens selecting means 75 responds to the measurement contribution irradiation amount that contributes to the measurement when the inclined region D and the flat region K are irradiated with light from the light source 40 for each of the divided measurement surfaces N. The objective lens 50 having the magnification to be used is selected from the plurality of objective lenses 50.

図14は、被測定面分割手段74によって分割された傾斜状領域Dと平坦状領域Kとに、対物レンズ選択手段75によって倍率の異なる対物レンズ50を選択する一例を示した説明図である。 FIG. 14 is an explanatory diagram showing an example in which an objective lens 50 having a different magnification is selected by the objective lens selection means 75 in the inclined region D and the flat region K divided by the surface dividing means 74 to be measured.

測定対象物Pの被測定面Sの表面形状が図14のようにうねり形状の場合、対物レンズ50を通して被測定面Sに照射された光は散乱し易い。これにより、対物レンズ50に戻る光が弱くなり、撮影部16においてノイズの多い画像になるため測定精度が悪くなる。 When the surface shape of the surface S to be measured of the object P to be measured has a wavy shape as shown in FIG. 14, the light irradiated to the surface S to be measured through the objective lens 50 is likely to be scattered. As a result, the light returning to the objective lens 50 becomes weak, and the image becomes noisy at the photographing unit 16, so that the measurement accuracy deteriorates.

一方、対物レンズ50の特質として、開口数(NA)の高い高倍率レンズ50Cは開口数の低い低倍率レンズ50Aに比べて微弱な光でも明るく高解像にとらえることができ、低倍率レンズ50Aは高倍率レンズ50Cに比べて測定視野が広い。 On the other hand, as a characteristic of the objective lens 50, the high-magnification lens 50C having a high numerical aperture (NA) can capture brighter and higher-resolution even in weak light than the low-magnification lens 50A having a low numerical aperture, and the low-magnification lens 50A. Has a wider measurement field than the high-magnification lens 50C.

したがって、図14に示すように、対物レンズ選択手段75は、測定視野Wが広いが傾斜面に対する測定精度が悪い低倍率レンズ50Aを平坦状領域Kの測定に選択し、傾斜面に対する測定精度は良いが測定視野Wが狭い高倍率レンズ50Cを傾斜状領域Dの測定に選択する。これにより、傾斜状領域Dと平坦状領域Kの両方を高精度に測定でき、しかも平坦状領域Kに測定視野が広い低倍率レンズ50Aを使用することによって短時間で広範囲を測定でき、測定準備アライメントの時間短縮を図ることができる。 Therefore, as shown in FIG. 14, the objective lens selection means 75 selects the low-magnification lens 50A having a wide measurement field of view W but poor measurement accuracy on the inclined surface for the measurement of the flat region K, and the measurement accuracy on the inclined surface is high. A high-magnification lens 50C, which is good but has a narrow measurement field of view W, is selected for the measurement of the inclined region D. As a result, both the inclined region D and the flat region K can be measured with high accuracy, and by using the low-magnification lens 50A having a wide measurement field of view in the flat region K, a wide range can be measured in a short time, and measurement preparation is possible. The alignment time can be shortened.

なお、図14における符号Wxは被測定面Sの面内方向(x軸)の測定面Nの幅を示し、Wzは干渉部14のz軸方向の走査範囲を示す。 The reference numeral Wx in FIG. 14 indicates the width of the measurement surface N in the in-plane direction (x-axis) of the surface to be measured S, and Wz indicates the scanning range of the interference unit 14 in the z-axis direction.

次に、傾斜状領域Dと平坦状領域Kとによって複数の対物レンズ50の中から適正な倍率の対物レンズ50をどのように選択するかの対物レンズ選択方法を説明する。 Next, an objective lens selection method of how to select an objective lens 50 having an appropriate magnification from a plurality of objective lenses 50 by the inclined region D and the flat region K will be described.

図15は、見込角θ1の対物レンズ50で傾斜角度θ2の被測定面Sに光を照射したときの光の挙動を説明する説明図である。図15において、傾斜角度θ2は水平面17に対する被測定面Sの傾斜角度である。 FIG. 15 is an explanatory diagram illustrating the behavior of light when the objective lens 50 having a viewing angle θ1 irradiates the surface S to be measured with an inclination angle θ2 with light. In FIG. 15, the inclination angle θ2 is the inclination angle of the surface S to be measured with respect to the horizontal plane 17.

即ち、空気中において、見込角θ1の対物レンズ50から傾斜角度θ2の測定対象物Pの被測定面Sへ光を照射した場合、対物レンズ50に戻る、いわゆる測定に寄与する照射光Aと対物レンズ50に戻らない、いわゆる測定に寄与しない照射光Bとがある。符号Cは、対物レンズ50に戻らない照射光Bの反射領域を示し、符号15は被測定面Sに対して垂直な法線である。 That is, when light is irradiated from the objective lens 50 having a prospect angle θ1 to the surface S to be measured of the measurement object P having an inclination angle θ2 in the air, the light A returns to the objective lens 50, that is, the irradiation light A and the objective that contribute to the measurement. There is an irradiation light B that does not return to the lens 50, that is, does not contribute to the so-called measurement. Reference numeral C indicates a reflection region of the irradiation light B that does not return to the objective lens 50, and reference numeral 15 is a normal line perpendicular to the surface to be measured S.

図15において、空気中では、開口数(NA)=sinθ1の関係がなりたつので、被測定面Sの傾斜角度θ2の理論的な測定限界傾斜角度θ2maxは、asin(NA)で表すことができる。例えばNAが0.3の対物レンズ50の場合、測定限界傾斜角度θ2maxは約17°となる。即ち、被測定面Sの傾斜角度θ2<asin(NA)の式を満足すれば測定可能と言える。換言すると、NAが0.3の対物レンズ50の場合には被測定面Sの傾斜角度が17°を超えると測定不可であり、17°以下であれば測定可能と判断できる。 In FIG. 15, since the numerical aperture (NA) = sin θ1 is established in the air, the theoretical measurement limit inclination angle θ2 max of the inclination angle θ2 of the surface S to be measured can be expressed by asin (NA). .. For example, in the case of the objective lens 50 having an NA of 0.3, the measurement limit tilt angle θ2 max is about 17 °. That is, it can be said that measurement is possible if the equation of inclination angle θ2 <asin (NA) of the surface to be measured S is satisfied. In other words, in the case of the objective lens 50 having an NA of 0.3, it can be determined that measurement is not possible if the inclination angle of the surface S to be measured exceeds 17 °, and measurement is possible if it is 17 ° or less.

しかしながら実際にはθ2<asin(NA)の式は理論的な測定限界傾斜角度θ2maxであり、対物レンズ50を選択する判断基準としてそのまま適用することは現実的でない。現実的な判断基準は対物レンズ50を通して被測定面Sに照射する光の全照射光量(F)に対して、対物レンズ50に戻る測定に寄与する測定寄与照射光量(G)の割合(G/F)によって決定することが好ましい。 However, in reality, the equation of θ2 <asin (NA) is the theoretical measurement limit tilt angle θ2 max , and it is not realistic to apply it as it is as a criterion for selecting the objective lens 50. A realistic criterion is the ratio (G / G) of the measurement contribution irradiation light amount (G) that contributes to the measurement returning to the objective lens 50 with respect to the total irradiation light amount (F) of the light emitted to the surface S to be measured through the objective lens 50. It is preferable to determine by F).

図16は、例えばNAが0.3の対物レンズ50において一様な照射光を想定した場合、被測定面Sの傾斜角度θ2と、全照射光量(F)に対する測定寄与照射光量(G)の割合(G/F)との関係を表したグラフである。 FIG. 16 shows, for example, assuming a uniform irradiation light in the objective lens 50 having an NA of 0.3, the inclination angle θ2 of the surface S to be measured and the measurement contribution irradiation light amount (G) with respect to the total irradiation light amount (F). It is a graph which showed the relationship with the ratio (G / F).

図16の横軸は被測定面Sの傾斜角度θ2(°)を示し、縦軸はG/Fを示す。そして、G/Fが0.2未満(20%未満)になるとNAが0.3の対物レンズ50では測定不可となり、0.3よりも大きなNA(大きな倍率)の対物レンズ50を選択する必要がある。図15のグラフから、G/Fが0.2は傾斜角度θ2が約12°であり、現実的には、傾斜角度12°が測定限界傾斜角度θ2maxになる。 The horizontal axis of FIG. 16 indicates the inclination angle θ2 (°) of the surface S to be measured, and the vertical axis indicates G / F. When the G / F is less than 0.2 (less than 20%), it becomes impossible to measure with the objective lens 50 having an NA of 0.3, and it is necessary to select the objective lens 50 having an NA (large magnification) larger than 0.3. There is. From the graph of FIG. 15, when the G / F is 0.2, the inclination angle θ2 is about 12 °, and in reality, the inclination angle 12 ° is the measurement limit inclination angle θ2 max .

このことから、干渉部14に備える複数の対物レンズ50のそれぞれについて測定限界傾斜角度θ2maxにおけるG/Fを予め予備試験等により求めておく。そして、傾斜状領域D及び平坦状領域Kの測定寄与照射光量(G)を知ることによって、傾斜状領域D及び平坦状領域Kを高精度に測定するための適正な倍率の対物レンズ50を選択することができる。なお、全照射光量(F)は測定しなくても光源40の出力から知ることができる。 From this, the G / F at the measurement limit tilt angle θ2 max is obtained in advance by a preliminary test or the like for each of the plurality of objective lenses 50 provided in the interference unit 14. Then, by knowing the measurement contribution irradiation light amount (G) of the inclined region D and the flat region K, an objective lens 50 having an appropriate magnification for measuring the inclined region D and the flat region K with high accuracy is selected. can do. The total irradiation light amount (F) can be known from the output of the light source 40 without measuring.

したがって、本発明の実施の形態の表面形状測定装置1は、測定寄与照射光量(G)を検出する測定寄与照射光量検出手段82(図2及び図11参照)を更に設けることが好ましい。そして、対物レンズ選択手段75は、分割した傾斜状領域Dと平坦状領域KとによってG/Fに基づいて使用する倍率の対物レンズ50を選択する。これにより、傾斜状領域Dと平坦状領域Kとによって複数の対物レンズ50の中から適正な倍率の対物レンズ50を選択することができる。 Therefore, it is preferable that the surface shape measuring device 1 according to the embodiment of the present invention is further provided with the measurement contribution irradiation light amount detecting means 82 (see FIGS. 2 and 11) for detecting the measurement contribution irradiation light amount (G). Then, the objective lens selection means 75 selects the objective lens 50 having a magnification to be used based on the G / F by the divided inclined region D and the flat region K. As a result, the objective lens 50 having an appropriate magnification can be selected from the plurality of objective lenses 50 by the inclined region D and the flat region K.

なお、適正な倍率の対物レンズ50の選択方法として、測定寄与照射光量検出手段82に限定するものではない。傾斜状領域Dや平坦状領域Kの傾斜角度を測定して測定限界傾斜角度θ2maxを求めることができれば、直接的な指数である測定限界傾斜角度θ2maxに基づいて適正な倍率の対物レンズ50を選択してもよい。あるいは概略形状取得手段72で取得した測定対象物Pの概略形状情報を表示部20に表示し、操作者が目視で傾斜状領域Dや平坦状領域Kの傾斜角度の程度を判定して対物レンズ50を選択してもよい。 The method of selecting the objective lens 50 having an appropriate magnification is not limited to the measurement contribution irradiation light amount detecting means 82. If the measurement limit tilt angle θ2 max can be obtained by measuring the tilt angle of the tilted region D or the flat region K, the objective lens 50 having an appropriate magnification is based on the measurement limit tilt angle θ2 max , which is a direct index. May be selected. Alternatively, the approximate shape information of the measurement object P acquired by the approximate shape acquisition means 72 is displayed on the display unit 20, and the operator visually determines the degree of the inclination angle of the inclined region D and the flat region K to determine the degree of the inclination angle of the objective lens. 50 may be selected.

(光量調整手段)
以下説明するように、光量調整手段76は、分割した各測定面Nについて傾斜状領域Dと平坦状領域Kとに光源40から光を照射したときの測定に寄与する測定寄与照射量に応じて光源40の光量調整を行う。
(Light intensity adjusting means)
As will be described below, the light amount adjusting means 76 responds to the measurement contribution irradiation amount that contributes to the measurement when the inclined region D and the flat region K are irradiated with light from the light source 40 for each of the divided measurement surfaces N. The amount of light of the light source 40 is adjusted.

光源40の光量調整についても、図15で説明した考えを用いることができる。例えばNAが0.3の対物レンズ50において一様な照射光を想定した場合、被測定面Sの傾斜角度θ2と、全照射光量(F)に対する測定に寄与する測定寄与照射光量(G)の割合(G/F)との関係は図16のグラフになる。 The idea described with reference to FIG. 15 can also be used for adjusting the amount of light of the light source 40. For example, assuming a uniform irradiation light in the objective lens 50 having an NA of 0.3, the inclination angle θ2 of the surface S to be measured and the measurement contribution irradiation light amount (G) that contributes to the measurement with respect to the total irradiation light amount (F). The relationship with the ratio (G / F) is shown in the graph of FIG.

ここで、被測定面Sの傾斜角度θ2が例えば6°のときのG/F(約0.56)は傾斜角度θ2が0°のときのG/F(1.0)の約半分になり、光量不足により測定精度が低下する。 Here, the G / F (about 0.56) when the inclination angle θ2 of the surface S to be measured is, for example, 6 ° is about half of the G / F (1.0) when the inclination angle θ2 is 0 °. , The measurement accuracy is lowered due to insufficient light intensity.

したがって、光量調整手段76は、被測定面Sの傾斜角度θ2が例えば6°のときには、傾斜角度θ2が0°のときの光量の約2倍に調整する。このように、傾斜角度θ2が0°のときの光量を基準光量として、被測定面Sの傾斜角度が大きくなることで生じる光量不足による測定精度低下を避けることができる。これにより、被測定面Sがうねり形状のように小さな傾斜角度から大きな傾斜角度まで複数の測定面Nが存在する場合であっても、各測定面Nの表面形状を高精度に測定することができる。 Therefore, when the inclination angle θ2 of the surface S to be measured is, for example, 6 °, the light amount adjusting means 76 adjusts the amount of light to about twice the amount of light when the inclination angle θ2 is 0 °. As described above, it is possible to avoid a decrease in measurement accuracy due to insufficient light amount caused by an increase in the inclination angle of the surface S to be measured, using the amount of light when the inclination angle θ2 is 0 ° as a reference light amount. As a result, even when a plurality of measurement surfaces N exist from a small inclination angle to a large inclination angle such as a swell shape of the surface S to be measured, the surface shape of each measurement surface N can be measured with high accuracy. it can.

したがって、光量調整手段76は、測定寄与照射光量検出手段82で検出した測定寄与照射光量(G)を光源40の光量調整方法に利用することができる。即ち、光量調整手段は平坦状領域Kを測定するときの測定寄与照射量Gを基準光量とし、傾斜状領域Dを測定するときの測定寄与照射量Gが基準光量になるように光源40の光量を調整する。 Therefore, the light amount adjusting means 76 can use the measurement contribution irradiation light amount (G) detected by the measurement contribution irradiation light amount detecting means 82 in the light amount adjusting method of the light source 40. That is, the light amount adjusting means uses the measurement contribution irradiation amount G when measuring the flat region K as the reference light amount, and the light amount of the light source 40 so that the measurement contribution irradiation amount G when measuring the inclined region D becomes the reference light amount. To adjust.

これによって、傾斜状領域Dと平坦状領域Kとの光量が同じになるので、両方の領域D,Kを高精度に測定することができ且つ測定精度を均一化することができる。 As a result, the amount of light in the inclined region D and the flat region K becomes the same, so that both regions D and K can be measured with high accuracy and the measurement accuracy can be made uniform.

(測定面形状測定手段)
測定面形状測定手段77は、ステージ10を面内方向移動手段35により被測定面Sの面内方向に移動させることにより、分割した各測定面Nを選択した対物レンズ50及び調整した光源40の光量に基づいて表面形状を個々に測定して複数の測定データを取得するものである。
(Measuring surface shape measuring means)
The measuring surface shape measuring means 77 moves the stage 10 in the in-plane direction of the surface S to be measured by the in-plane moving means 35, so that each of the divided measuring surfaces N is selected as the objective lens 50 and the adjusted light source 40. A plurality of measurement data are acquired by individually measuring the surface shape based on the amount of light.

即ち、測定面形状測定手段77は、面内方向移動手段35により被測定面Sの面内方向に移動させることにより、分割した各測定面Nを選択した対物レンズ50及び調整した光源40の光量に基づいて表面形状を個々に測定して複数の測定データを取得する。 That is, the measuring surface shape measuring means 77 moves the measured surface S in the in-plane direction by the in-plane moving means 35, so that the divided measurement surfaces N are selected as the objective lens 50 and the adjusted light source 40. The surface shape is individually measured based on the above, and a plurality of measurement data are acquired.

即ち、図13で示した16個の測定面N〜N16ごとに設定した最小走査範囲Z〜Zの範囲で干渉部14を垂直方向に測定走査し、各測定面N〜N16の表面形状を測定する。処理部18は、例えば最初に測定面Nについて最小走査範囲Zだけ測定走査して測定面Nの表面形状を取得する。次に、測定面Nについて最小走査範囲Zだけ測定走査して測定面Nの表面形状を取得する。これを測定面N16まで繰り返す。 That is, the interference portion 14 is measured and scanned in the vertical direction within the range of the minimum scanning range Z 1 to Z 8 set for each of the 16 measurement surfaces N 1 to N 16 shown in FIG. 13, and each measurement surface N 1 to N is measured. The surface shape of 16 is measured. Processing unit 18, for example, first to obtain a minimum scanning range Z 1 only measure the scanned surface shape of the measurement surface N 1 and the measurement surface N 1. Next, to obtain the surface shape of the measurement surface N 2 scans measured measurement surface N 2 by a minimum scan range Z 2. This is repeated until the measuring surface N 16.

(データ接続手段)
データ接続手段78は、測定面形状測定手段77で取得した各測定面Nの測定データを接続するものである。これにより、被測定面S全体の表面形状を測定することができる。データ接続手段78による各測定面Nの接続方法はソフトウェア処理等の公知の方法を採用することができる。
(Data connection means)
The data connecting means 78 connects the measurement data of each measuring surface N acquired by the measuring surface shape measuring means 77. As a result, the surface shape of the entire surface S to be measured can be measured. As a method of connecting each measurement surface N by the data connection means 78, a known method such as software processing can be adopted.

[表面形状測定方法]
次に、上記の如く構成した本発明の表面形状測定装置1を用いて、うねり形状の被測定面Sを有する測定対象物Pの表面形状を測定する表面形状測定方法について説明する。
[Surface shape measurement method]
Next, a surface shape measuring method for measuring the surface shape of the object to be measured P having the wavy surface S to be measured will be described using the surface shape measuring device 1 of the present invention configured as described above.

図17は、測定対象物Pの被測定面Sの表面形状をスティッチング測定方法で測定するステップフローである。説明し易いように本実施の表面形状測定方法では、図7に示すように、x軸方向のみにうねり形状を有し、x軸方向の長さが干渉部14の対物レンズ50の測定視野Wよりも長く、y軸方向の長さが測定視野Wよりも僅かに短い測定対象物Pの例で説明する。 FIG. 17 is a step flow for measuring the surface shape of the surface S to be measured of the object P to be measured by the stitching measurement method. For easy explanation, as shown in FIG. 7, the surface shape measuring method of the present embodiment has a wavy shape only in the x-axis direction, and the length in the x-axis direction is the measurement field of view W of the objective lens 50 of the interference portion 14. An example of the measurement object P, which is longer than the measurement object P and has a length in the y-axis direction slightly shorter than the measurement visual field W, will be described.

先ず概略形状取得手段72は、測定対象物Pの被測定面Sの概略形状情報を取得する概略形状取得工程を行う(ステップ10)。概略形状取得手段72は、上記した三角測量方式のレーザー変位計、ステレオカメラ、パターン投影装置、CAD(computer-aided-design)データを保持する保持手段、干渉部14の対物レンズとして広視野な低倍率レンズを用いた白色干渉計の何れでもよい。 First, the rough shape acquisition means 72 performs a rough shape acquisition step of acquiring the rough shape information of the surface S to be measured of the measurement object P (step 10). The approximate shape acquisition means 72 is a low field of view as an objective lens of the above-mentioned triangular survey type laser displacement meter, stereo camera, pattern projection device, holding means for holding CAD (computer-aided-design) data, and interference unit 14. Any white interferometer using a magnification lens may be used.

次に被測定面分割手段74は、概略形状取得手段72による概略形状情報の3次元座標とステージ10に載置された測定対象物Pの3次元座標とを整合し、概略形状情報に基づいて被測定面Sを傾斜状領域Dと平坦状領域Kとで構成され1つの面積が測定視野W以下の複数の測定面に分割する被測定面分割工程を行う(ステップ20)。 Next, the surface dividing means 74 to be measured matches the three-dimensional coordinates of the rough shape information by the rough shape acquisition means 72 with the three-dimensional coordinates of the measurement object P placed on the stage 10, and is based on the rough shape information. A surface to be measured division step is performed in which the surface to be measured S is composed of an inclined region D and a flat region K, and one area is divided into a plurality of measurement surfaces having a measurement field of view W or less (step 20).

次に対物レンズ選択手段75は、分割した各測定面Nについて傾斜状領域Dと平坦状領域Kとに光源40から光を照射したときの測定に寄与する測定寄与照射量に応じて複数の対物レンズ50のうち使用する倍率の対物レンズ50を選択する対物レンズ選択工程を行う(ステップ30)。 Next, the objective lens selecting means 75 has a plurality of objectives depending on the measurement contribution irradiation amount that contributes to the measurement when the inclined region D and the flat region K are irradiated with light from the light source 40 for each of the divided measurement surfaces N. The objective lens selection step of selecting the objective lens 50 having the magnification to be used among the lenses 50 is performed (step 30).

この対物レンズ選択工程において、図18に示すように、分割した複数の傾斜状領域Dと平坦状領域Kとの各測定面Nについて上記した対物レンズ選択方法で選択した対物レンズ50の対物レンズマップFを表示部20に表示することが好ましい。 In this objective lens selection step, as shown in FIG. 18, the objective lens map of the objective lens 50 selected by the objective lens selection method described above for each measurement surface N of the divided plurality of inclined regions D and the flat region K. It is preferable to display F on the display unit 20.

図18の(A)は、被測定面Sのうねり形状をx軸方向とz軸方向とで示したものである。実際にはy軸方向にもうねりがあるが、図では省略している。図18の(B)は、図18の(A)のうねり形状を分割した複数の傾斜状領域Dと平坦状領域Kとについて選択した対物レンズ50の対物レンズマップFの一例を表示部20に表示したものである。10の(C)は、低倍率レンズ50A、中倍率レンズ50B、及び高倍率レンズ50Cの測定視野W,W,Wの大きさを示したものである。 FIG. 18A shows the swell shape of the surface S to be measured in the x-axis direction and the z-axis direction. Actually, there is a swell in the y-axis direction, but it is omitted in the figure. In FIG. 18B, an example of the objective lens map F of the objective lens 50 selected for the plurality of inclined regions D and the flat region K in which the swell shape of FIG. 18A is divided is displayed on the display unit 20. It is the one displayed. Reference numeral 10 (C) indicates the sizes of the measurement fields W 1 , W 2 , and W 3 of the low-magnification lens 50A, the medium-magnification lens 50B, and the high-magnification lens 50C.

図18の(B)のように、対物レンズマップFには、各測定面Nの測定範囲を四角形で表示するとともに、異なる倍率の対物レンズ50を異なる色で表示することが好ましい。例えば対物レンズマップFには、低倍率レンズ50Aで測定する測定面Nを赤色で示し、中倍率レンズ50Bで測定する測定面Nを緑色で示し、高倍率レンズ50Cで測定する測定面Nを青色で示すことができる。なお、斜線部分は測定面の重なり合う部分である。 As shown in FIG. 18B, it is preferable that the measurement range of each measurement surface N is displayed in a quadrangle and the objective lenses 50 having different magnifications are displayed in different colors on the objective lens map F. For example, the objective lens map F, show the measurement surface N R to be measured at low magnification lens 50A in red shows the measurement surface N G measuring at medium magnification lens 50B in green, the measurement surface N of measuring at a high magnification lens 50C B can be shown in blue. The shaded area is the area where the measurement surfaces overlap.

これにより、操作者に対して、測定面Nごとに使用する対物レンズ50の倍率を目視で確認させることができ、倍率に応じて対物レンズ50が面積の異なる測定範囲をもつことを明示することができる。 As a result, the operator can visually confirm the magnification of the objective lens 50 used for each measurement surface N, and clearly indicate that the objective lens 50 has a measurement range having a different area depending on the magnification. Can be done.

また、対物レンズマップFを表示部20に表示することで、表示しない場合に比べて、より最適な対物レンズ50の選択プランの様子をユーザは実感することができる。 Further, by displaying the objective lens map F on the display unit 20, the user can actually feel the state of the more optimal selection plan of the objective lens 50 as compared with the case where the objective lens map F is not displayed.

次に、光量調整手段76は、分割した各測定面Nについて傾斜状領域Dと平坦状領域Kとに光源40から光を照射したときの測定に寄与する測定寄与照射量に応じて光源40の光量調整を行う光量調整工程を行う(ステップ40)。 Next, the light amount adjusting means 76 uses the light source 40 according to the measurement contribution irradiation amount that contributes to the measurement when the inclined region D and the flat region K are irradiated with light from the light source 40 for each of the divided measurement surfaces N. A light amount adjusting step for adjusting the light amount is performed (step 40).

次に処理部18の測定面形状測定手段77は、ステージ10を被測定面Sの面内方向に移動させることにより、分割した各測定面Nを選択した対物レンズ50及び調整した光源光量に基づいて表面形状を個々に測定して複数の測定データを取得する測定面形状測定工程を行う(ステップ50)。 Next, the measuring surface shape measuring means 77 of the processing unit 18 moves the stage 10 in the in-plane direction of the surface S to be measured, so that each divided measurement surface N is based on the selected objective lens 50 and the adjusted light source light amount. The surface shape is individually measured and a measurement surface shape measurement step of acquiring a plurality of measurement data is performed (step 50).

次に、処理部18のデータ接続手段78は、取得した複数の測定データを接続するデータ接続工程を行う(ステップ60)。 Next, the data connection means 78 of the processing unit 18 performs a data connection step of connecting the acquired plurality of measurement data (step 60).

これにより、スティッチング測定において、被測定面Sの表面形状測定を行う際の適正な倍率の対物レンズ50の選択及び光源40の適正な光量の調整の測定準備アライメントを行うことができるので被測定面Sの表面形状測定を高精度化できる。 As a result, in the stitching measurement, it is possible to select the objective lens 50 having an appropriate magnification when measuring the surface shape of the surface S to be measured and to perform the measurement preparatory alignment for adjusting the appropriate amount of light of the light source 40. The surface shape measurement of the surface S can be made highly accurate.

上記の説明した本実施の形態では、対物レンズ50の測定視野Wが被測定面Sよりも小さく、スティッチング測定を行う例で説明したが、スティッチング測定に限定するものではない。対物レンズ50の測定視野Wが被測定面Sと同等以上の場合であっても、本発明のように、概略形状取得工程(ステップ10)〜データ接続工程(ステップ60)を行うことによって、特にうねり形状の被測定面Sの表面形状を高精度に測定することができる。 In the present embodiment described above, the measurement field W of the objective lens 50 is smaller than the surface S to be measured, and the stitching measurement has been described, but the present invention is not limited to the stitching measurement. Even when the measurement field of view W of the objective lens 50 is equal to or greater than the surface S to be measured, by performing the approximate shape acquisition step (step 10) to the data connection step (step 60) as in the present invention, in particular. The surface shape of the wavy surface S to be measured can be measured with high accuracy.

なお、ステージ10を光学部2に対して水平移動させることで説明したが、ステージ10に対して光学部2を水平移動させてもよい。また、本実施の形態では、被測定面Sがうねり形状である場合で説明したが、この形状に限定するものではなく、表面が凹凸の高低差を有する形状であればよい。 Although the description has been made by moving the stage 10 horizontally with respect to the optical unit 2, the optical unit 2 may be moved horizontally with respect to the stage 10. Further, in the present embodiment, the case where the surface S to be measured has a wavy shape has been described, but the shape is not limited to this shape, and any shape may be used as long as the surface has a height difference of unevenness.

なお、上記した本実施の形態の表面形状測定装置1では、測定対象物Pの被測定面Sの表面形状を測定する光を出力する光源40、光源40から出力された光を被測定面Sに照射する対物レンズ50、及び被測定面Sの測定画像を取得する撮影部16を少なくとも有する光学部2として、垂直走査型の白色干渉計の例で説明したが、本発明はレーザー共焦点顕微鏡にも適用することができる。 In the surface shape measuring device 1 of the present embodiment described above, the light source 40 that outputs the light for measuring the surface shape of the surface S to be measured of the object P to be measured, and the light output from the light source 40 are the surface S to be measured. As an optical unit 2 having at least an imaging unit 16 for acquiring a measurement image of the surface S to be measured and an objective lens 50 to irradiate the light source 50, the present invention has been described with an example of a vertical scanning white interferometer, but the present invention is a laser confocal microscope. It can also be applied to.

P…測定対象物、Q,Q1,Q2,Q3…干渉縞曲線、S…被測定面、Z−0,Z−1…光軸、N…測定面、D…傾斜状領域、K…平坦状領域、A…測定に使用可能な照射光、B…測定に使用不可な照射光、C…対物レンズ50に戻らない反射光、F…対物レンズ分割マップ、Z…走査範囲、1…表面形状測定装置、2…光学部、2A…筐体、2B…レボルバー、10…ステージ、10S…ステージ面、12…光源部、14…干渉部、16…撮影部、18…処理部、20…表示部、22…入力部、34…xアクチュエータ、35…面内方向移動手段、36…yアクチュエータ、40…光源、42…コレクタレンズ、44,54…ビームスプリッタ、50…対物レンズ、50A…低倍率レンズ、50B…中倍率レンズ、50C…高倍率レンズ、52…参照ミラー、56…干渉部アクチュエータ、60…撮像素子、60S…撮像面、62…結像レンズ、70…zアクチュエータ、72…概略形状取得手段、74…被測定面分割手段、75…対物レンズ選択手段、76…光量調整手段、77…測定面形状測定手段、78…データ接続手段、80…ステージ移動手段、82…測定寄与照射光量測定手段 P ... Measurement target, Q, Q1, Q2, Q3 ... Interference fringe curve, S ... Measured surface, Z-0, Z-1 ... Optical axis, N ... Measurement surface, D ... Inclined region, K ... Flat shape Region, A ... irradiation light that can be used for measurement, B ... irradiation light that cannot be used for measurement, C ... reflected light that does not return to the objective lens 50, F ... objective lens division map, Z ... scanning range, 1 ... surface shape measurement Device, 2 ... Optical unit, 2A ... Housing, 2B ... Revolver, 10 ... Stage, 10S ... Stage surface, 12 ... Light source unit, 14 ... Interference unit, 16 ... Imaging unit, 18 ... Processing unit, 20 ... Display unit, 22 ... Input unit, 34 ... x actuator, 35 ... In-plane moving means, 36 ... y actuator, 40 ... Light source, 42 ... Collector lens, 44, 54 ... Beam splitter, 50 ... Objective lens, 50A ... Low magnification lens, 50B ... Medium magnification lens, 50C ... High magnification lens, 52 ... Reference mirror, 56 ... Interference part actuator, 60 ... Imaging element, 60S ... Imaging surface, 62 ... Imaging lens, 70 ... z actuator, 72 ... Approximate shape acquisition means , 74 ... Measured surface dividing means, 75 ... Objective lens selecting means, 76 ... Light amount adjusting means, 77 ... Measuring surface shape measuring means, 78 ... Data connecting means, 80 ... Stage moving means, 82 ... Measurement contribution irradiation light amount measuring means

Claims (12)

測定対象物を支持する支持部と、
前記測定対象物の被測定面の表面形状を測定する光を出力する光源、前記光源から出力された光を前記被測定面に照射する複数の倍率の異なる対物レンズ、及び前記被測定面の測定画像を取得する撮影部を少なくとも有する光学部と、
前記支持部を前記被測定面の面内方向に移動させる面内方向移動手段と、
前記被測定面の概略形状情報を取得する概略形状取得手段と、
前記概略形状情報に基づいて前記被測定面を傾斜状領域と平坦状領域とで構成される複数の測定面に分割する被測定面分割手段と、
前記分割した前記傾斜状領域と前記平坦状領域とに前記光を照射したときの測定に寄与する測定寄与照射量に応じて前記複数の対物レンズのうち使用する倍率の対物レンズを選択する対物レンズ選択手段と、
前記分割した前記傾斜状領域と前記平坦状領域とに前記光を照射したときの測定に寄与する測定寄与照射量に応じて前記光源の光量を調整する光量調整手段と、
前記支持部を前記被測定面の面内方向に移動させることにより、前記分割した各測定面を前記選択した対物レンズ及び前記調整した光量に基づいて表面形状を個々に測定して複数の測定データを取得する測定面形状測定手段と、
前記取得した複数の測定データを接続するデータ接続手段と、を備えた表面形状測定装置。
A support part that supports the object to be measured and
A light source that outputs light for measuring the surface shape of the surface to be measured of the object to be measured, a plurality of objective lenses having different magnifications that irradiate the surface to be measured with light output from the light source, and measurement of the surface to be measured. An optical unit that has at least an imaging unit that acquires an image,
An in-plane moving means for moving the support portion in the in-plane direction of the surface to be measured, and
A rough shape acquisition means for acquiring the rough shape information of the surface to be measured, and
A surface dividing means for measuring, which divides the surface to be measured into a plurality of measurement surfaces composed of an inclined region and a flat region based on the schematic shape information.
An objective lens that selects an objective lens having a magnification to be used from the plurality of objective lenses according to a measurement contribution irradiation amount that contributes to measurement when the divided region and the flat region are irradiated with the light. Selection method and
A light amount adjusting means for adjusting the light amount of the light source according to the measurement contribution irradiation amount that contributes to the measurement when the divided inclined region and the flat region are irradiated with the light.
By moving the support portion in the in-plane direction of the surface to be measured, the surface shape of each of the divided measurement surfaces is individually measured based on the selected objective lens and the adjusted amount of light, and a plurality of measurement data are obtained. With the measuring surface shape measuring means to acquire
A surface shape measuring device including a data connecting means for connecting a plurality of acquired measurement data.
前記対物レンズの測定視野は前記測定対象物の被測定面よりも狭く、スティッチング測定により前記被測定面の表面形状を測定する請求項1に記載の表面形状測定装置。 The surface shape measuring apparatus according to claim 1, wherein the measurement field of view of the objective lens is narrower than the surface to be measured of the object to be measured, and the surface shape of the surface to be measured is measured by stitching measurement. 前記対物レンズを通して前記被測定面に照射した光のうち前記対物レンズに戻り測定に寄与する照射光の測定寄与照射量Gを検出する測定寄与照射光量検出手段を設けた請求項1又は2に記載の表面形状測定装置。 The invention according to claim 1 or 2, wherein the measurement contribution irradiation light amount detecting means for detecting the measurement contribution irradiation amount G of the irradiation light that returns to the objective lens and contributes to the measurement among the light irradiated to the surface to be measured through the objective lens is provided. Surface shape measuring device. 前記対物レンズ選択手段は前記分割した前記傾斜状領域及び前記平坦状領域について、照射した光の全照射光量Fに対する前記測定寄与照射量Gの割合G/Fに基づいて使用する倍率の対物レンズを選択する請求項1から3の何れか1項に記載の表面形状測定装置。 The objective lens selecting means obtains an objective lens having a magnification to be used based on the ratio G / F of the measurement contribution irradiation amount G to the total irradiation light amount F of the irradiated light for the divided inclined region and the flat region. The surface shape measuring device according to any one of claims 1 to 3 to be selected. 前記光量調整手段は前記分割した前記傾斜状領域及び前記平坦状領域について、前記平坦状領域を測定するときの前記測定寄与照射量Gを基準光量とし、前記傾斜状領域を測定するときの前記測定寄与照射量Gが前記基準光量になるように前記光源の光量を調整する請求項1から4の何れか1項に記載の表面形状測定装置。 The light amount adjusting means uses the measurement contribution irradiation amount G when measuring the flat region as a reference light amount for the divided inclined region and the flat region, and the measurement when measuring the inclined region. The surface shape measuring device according to any one of claims 1 to 4, wherein the light amount of the light source is adjusted so that the contribution irradiation amount G becomes the reference light amount. 前記測定対象物の前記被測定面の表面形状はうねり形状である請求項1から5の何れか1項に記載の表面形状測定装置。 The surface shape measuring apparatus according to any one of claims 1 to 5, wherein the surface shape of the surface to be measured of the measurement object is a wavy shape. 前記概略形状取得手段は、三角測量方式のレーザー変位計、ステレオカメラ、パターン投影装置の何れかである請求項1から6の何れか1項に記載の表面形状測定装置。 The surface shape measuring device according to any one of claims 1 to 6, wherein the approximate shape acquiring means is any one of a triangulation type laser displacement meter, a stereo camera, and a pattern projection device. 前記概略形状取得手段は、前記測定対象物のCADデータを保持する保持手段である請求項1から6の何れか1項に記載の表面形状測定装置。 The surface shape measuring device according to any one of claims 1 to 6, wherein the approximate shape acquiring means is a holding means for holding CAD data of the measurement object. 前記概略形状取得手段は、前記光学部の対物レンズよりも倍率の小さな低倍率レンズを用いた白色干渉計である請求項1から6の何れか1項に記載の表面形状測定装置。 The surface shape measuring device according to any one of claims 1 to 6, wherein the rough shape acquiring means is a white interference meter using a low magnification lens having a magnification smaller than that of the objective lens of the optical unit. 前記被測定面分割手段で分割された複数の測定面について前記対物レンズ選択手段で選択した対物レンズマップを表示する表示部を有する請求項1から9の何れか1項に記載の表面形状測定装置。 The surface shape measuring apparatus according to any one of claims 1 to 9, further comprising a display unit for displaying an objective lens map selected by the objective lens selecting means for a plurality of measurement surfaces divided by the surface dividing means to be measured. .. 前記光学部は白色干渉計又はレーザー共焦点顕微鏡である請求項1から10の何れか1項に記載の表面形状測定装置。 The surface shape measuring apparatus according to any one of claims 1 to 10, wherein the optical unit is a white interferometer or a laser confocal microscope. 測定対象物を支持する支持部と、
前記測定対象物の被測定面の表面形状を測定する光を出力する光源、前記光源からの出力された光を前記被測定面に照射する倍率の異なる複数の対物レンズ、及び前記被測定面の測定画像を取得する撮影部を少なくとも有する光学部と、を少なくとも有する表面形状測定装置を用いて前記被測定面の表面形状を測定する表面形状測定方法であって、
前記被測定面の概略形状情報を取得する概略形状取得工程と、
前記概略形状情報に基づいて前記被測定面を傾斜状領域と平坦状領域とで構成される複数の測定面に分割する被測定面分割工程と、
前記分割した前記傾斜状領域と前記平坦状領域とに前記光を照射したときの測定に寄与する測定寄与照射量に応じて前記複数の対物レンズのうち使用する倍率の対物レンズを選択する対物レンズ選択工程と、
前記分割した前記傾斜状領域と前記平坦状領域とに前記光を照射したときの測定に寄与する測定寄与照射量に応じて前記光源の光量を調整する光量調整工程と、
前記支持部を前記被測定面の面内方向に移動させることにより、前記分割した各測定面を前記選択した対物レンズ及び前記調整した光量に基づいて表面形状を個々に測定して複数の測定データを取得する測定面形状測定工程と、
前記取得した複数の測定データを接続するデータ接続工程と、を備えた表面形状測定方法。
A support part that supports the object to be measured and
A light source that outputs light for measuring the surface shape of the surface to be measured of the object to be measured, a plurality of objective lenses having different magnifications for irradiating the surface to be measured with the light output from the light source, and the surface to be measured. A surface shape measuring method for measuring the surface shape of the surface to be measured by using an optical unit having at least an imaging unit for acquiring a measurement image and a surface shape measuring device having at least a photographing unit.
The outline shape acquisition step for acquiring the outline shape information of the surface to be measured, and
A surface division step of dividing the surface to be measured into a plurality of measurement surfaces composed of an inclined region and a flat region based on the schematic shape information.
An objective lens that selects an objective lens having a magnification to be used among the plurality of objective lenses according to a measurement contribution irradiation amount that contributes to measurement when the divided region and the flat region are irradiated with the light. Selection process and
A light amount adjusting step of adjusting the light amount of the light source according to the measurement contribution irradiation amount that contributes to the measurement when the divided inclined region and the flat region are irradiated with the light.
By moving the support portion in the in-plane direction of the surface to be measured, the surface shape of each of the divided measurement surfaces is individually measured based on the selected objective lens and the adjusted amount of light, and a plurality of measurement data are obtained. To acquire the measurement surface shape measurement process and
A surface shape measuring method comprising a data connecting step of connecting a plurality of acquired measurement data.
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JP6037254B2 (en) * 2015-02-27 2016-12-07 株式会社東京精密 Surface shape measuring apparatus and surface shape measuring method
EP3133369B1 (en) * 2015-08-19 2017-12-20 Mitutoyo Corporation Methods for measuring a height map of multiple fields of view and combining them to a composite height map with minimized sensitivity to instrument drift

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