JP6785615B2 - Cleaning equipment - Google Patents

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JP6785615B2
JP6785615B2 JP2016203950A JP2016203950A JP6785615B2 JP 6785615 B2 JP6785615 B2 JP 6785615B2 JP 2016203950 A JP2016203950 A JP 2016203950A JP 2016203950 A JP2016203950 A JP 2016203950A JP 6785615 B2 JP6785615 B2 JP 6785615B2
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cleaning
sink
hypochlorous acid
ozone
acid water
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JP2018064676A (en
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昌洋 寺尾
昌洋 寺尾
載泰 廣川
載泰 廣川
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▲高▼橋金属株式会社
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Description

本発明は、手指等(洗浄対象)の洗浄(除菌、殺菌等を含む)を行える洗浄装置に関する。 The present invention relates to a cleaning device capable of cleaning (including sterilization, sterilization, etc.) of fingers and the like (objects to be cleaned).

衛生意識の高揚や種々の細菌やウイルスに起因した感染症を防止するために、洗浄または除菌を行う装置が種々提案されている。特に、洗浄後の水分等が装置を設置した周辺に飛散しないように、洗浄と洗浄後の水切(乾燥を含む)とを同じ収容室(洗浄槽)内で行う装置も提案されている。これに関連する記載が下記の特許文献にある。 Various devices for cleaning or sterilizing have been proposed in order to raise hygiene awareness and prevent infectious diseases caused by various bacteria and viruses. In particular, a device has been proposed in which washing and draining (including drying) after washing are performed in the same storage chamber (washing tank) so that moisture or the like after washing does not scatter around the place where the device is installed. A related description is found in the following patent documents.

特開2000−60763号公報Japanese Unexamined Patent Publication No. 2000-60763 特開2012−120717号公報Japanese Unexamined Patent Publication No. 2012-12017

特許文献1は、挿入部内に入れられた手へ洗浄用ミストを噴出させた後、そのまま送風により洗浄後の手を乾燥させる手洗浄乾燥装置を提案している。 Patent Document 1 proposes a hand-washing / drying device that dries the washed hands by blowing air as it is after ejecting the washing mist into the hands placed in the insertion portion.

特許文献2は、pH6〜7の次亜塩素酸水を一回あたり0.5〜10cc噴霧して洗浄した後に、オゾンを含む空気で乾燥させる手指洗浄乾燥装置を提案している。 Patent Document 2 proposes a hand washing / drying device in which 0.5 to 10 cc of hypochlorous acid water having a pH of 6 to 7 is sprayed at a time for washing, and then dried with air containing ozone.

いずれもの場合も、一回あたりに供給される洗浄液量が非常に少なく、洗浄性または除菌性等が十分とは言い難い。また、特許文献1には洗浄液に関する具体的な記載がない。特許文献2で用いているpH6〜7の微酸性の次亜塩素酸水は、殺菌に有効な次亜塩素酸(HClOまたはHOCl)の存在比率が低く、上記のような極少量では効率的な洗浄や除菌を行えない。 In either case, the amount of cleaning liquid supplied at one time is very small, and it cannot be said that the cleaning property or sterilizing property is sufficient. Further, Patent Document 1 does not have a specific description regarding the cleaning liquid. The slightly acidic hypochlorous acid water having a pH of 6 to 7 used in Patent Document 2 has a low abundance ratio of hypochlorous acid (HClO or HOCl) effective for sterilization, and is efficient in a very small amount as described above. Cannot be washed or sterilized.

本発明はこのような事情に鑑みて為されたものであり、従来の装置とは異なる洗浄装置を提供することを目的とする。 The present invention has been made in view of such circumstances, and an object of the present invention is to provide a cleaning device different from the conventional device.

本発明者はこの課題を解決すべく鋭意研究した結果、共通のシンク内で手等の洗浄と水切(乾燥)を行うことを前提に、殺菌活性に優れる次亜塩素酸の存在比率が高い洗浄液を洗浄対象へ比較的多く供給して、確実な除菌等を効率的に行う装置を着想した。この着想を具現化することにより、以降に述べる本発明を完成するに至った。 As a result of diligent research to solve this problem, the present inventor has a cleaning solution having a high abundance ratio of hypochlorous acid having excellent bactericidal activity on the premise that hands and the like are washed and drained (dried) in a common sink. We conceived a device that efficiently performs reliable sterilization, etc. by supplying a relatively large amount of water to the object to be cleaned. By embodying this idea, the present invention described below has been completed.

《洗浄装置》
(1)本発明の洗浄装置は、洗浄対象を出し入れする挿入口を有し該洗浄対象を収容できると共に使用した洗浄液を排出させる排出口を有するシンクと、該シンク内へ洗浄液を吐出する洗浄手段と、該シンク内へ送気する送気手段と、を備える洗浄装置であって、前記洗浄手段は高濃度次亜塩素酸水へ希釈水を混合し希釈次亜塩素酸水を前記洗浄液として吐出し、前記高濃度次亜塩素酸水は、取替自在なカートリッジタンク内に収容されて供給するとよい
本発明の洗浄装置は、洗浄対象を出し入れする挿入口を有し該洗浄対象を収容できると共に使用した洗浄液を排出させる排出口を有するシンクと、該シンク内へ洗浄液を吐出する洗浄手段と、該シンク内へ送気する送気手段と、少なくとも該洗浄手段の作動を制御する制御手段と、を備える洗浄装置であって、前記洗浄手段は、高濃度次亜塩素酸水へ希釈水を混合した希釈次亜塩素酸水を前記洗浄液として吐出し、前記制御手段は、前記シンク内に前記洗浄対象が挿入されていない所定時期に、前記洗浄手段を所定時間作動させて前記シンクへ前記洗浄液を吐出する自己浄化モードを行うとよい。
本発明の洗浄装置は、洗浄対象を出し入れする挿入口を有し該洗浄対象を収容できると共に使用した洗浄液を排出させる排出口を有するシンクと、該シンク内へ洗浄液を吐出する洗浄手段と、該シンク内へ送気する送気手段と、該シンクへオゾンを供給するオゾン供給手段と、を備える洗浄装置であって、前記洗浄手段は、高濃度次亜塩素酸水へ希釈水を混合した希釈次亜塩素酸水を前記洗浄液として吐出し、前記オゾン供給手段は、前記洗浄対象が前記シンク内にないときに、該シンクへオゾンを供給するとよい。
《Washing device》
(1) The cleaning apparatus of the present invention has a sink having an insertion port for taking in and out the cleaning target, accommodating the cleaning target, and having a discharge port for discharging the used cleaning liquid, and a cleaning means for discharging the cleaning liquid into the sink. When, a cleaning apparatus and a blowing means for supplying air to said sink in, the cleaning means, the cleaning solution diluted hypochlorite solution mixed with dilution water to the high concentration hypochlorous acid water discharged as the high-concentration hypochlorous acid water, it is preferable to supply housed in replacement freely cartridge tank.
The cleaning apparatus of the present invention includes a sink having an insertion port for taking in and out the cleaning object, capable of accommodating the cleaning object, and a discharge port for discharging the used cleaning liquid, and a cleaning means for discharging the cleaning liquid into the sink. A cleaning device including an air supply means for supplying air into the sink and at least a control means for controlling the operation of the cleaning means. The cleaning means is a mixture of high-concentration hypochlorous acid water and diluted water. Diluted hypochlorous acid water is discharged as the cleaning liquid, and the control means operates the cleaning means for a predetermined time at a predetermined time when the cleaning target is not inserted in the sink and discharges the cleaning liquid to the sink. It is advisable to perform a self-cleaning mode.
The cleaning apparatus of the present invention includes a sink having an insertion port for taking in and out the cleaning object, capable of accommodating the cleaning object, and a discharge port for discharging the used cleaning liquid, and a cleaning means for discharging the cleaning liquid into the sink. A cleaning device including an air supply means for supplying air into the sink and an ozone supply means for supplying ozone to the sink. The cleaning means is a dilution of high-concentration hypochlorous acid water mixed with diluted water. Hypochlorite water may be discharged as the cleaning liquid, and the ozone supply means may supply ozone to the sink when the cleaning target is not in the sink.

(2)本発明の洗浄装置は、先ず、上述した洗浄手段と送気手段を備えることにより、洗浄対象の洗浄と洗浄対象から洗浄液を除去する水切(乾燥)とを、同一のシンク(洗浄槽)内で行える。このため、洗浄装置を設置した周辺を水滴等で濡らしたりすることがなく、装置を設置する周辺空間の環境も衛生的な状態に維持できる。 (2) The cleaning apparatus of the present invention first provides the above-mentioned cleaning means and air supply means to perform cleaning of the cleaning target and drainage (drying) for removing the cleaning liquid from the cleaning target in the same sink (cleaning tank). ) Can be done. Therefore, the surrounding area where the cleaning device is installed is not wet with water droplets or the like, and the environment of the surrounding space where the device is installed can be maintained in a hygienic state.

次に本発明の洗浄装置では、高濃度次亜塩素酸水を上水等で希釈して用いる。このため、洗浄時に洗浄対象へ供給する洗浄液の濃度や供給量等の調整自由度を大きくできる。例えば、本発明の洗浄装置によれば、洗浄対象へ比較的多くの洗浄液を掛け流して、洗浄対象に付着している菌等を殺菌しつつ十分に洗い流すこともできる。また、そのように一回あたりに多くの洗浄液を使用しても、希釈水が随時補給される環境下であれば、高濃度次亜塩素酸水を補充または交換する頻度を低減できる。 Next, in the cleaning apparatus of the present invention, high-concentration hypochlorous acid water is diluted with clean water or the like before use. Therefore, the degree of freedom in adjusting the concentration and supply amount of the cleaning liquid supplied to the cleaning target at the time of cleaning can be increased. For example, according to the cleaning apparatus of the present invention, a relatively large amount of cleaning liquid can be poured over the cleaning target to sufficiently wash away the bacteria and the like adhering to the cleaning target while sterilizing them. Further, even if a large amount of cleaning liquid is used at one time, the frequency of replenishing or replacing high-concentration hypochlorous acid water can be reduced if the environment is such that diluted water is replenished at any time.

さらに本発明の洗浄装置では、高濃度次亜塩素酸水自体ではなく希釈次亜塩素酸水からなる洗浄液を用いている。高い殺菌効果を発揮する次亜塩素酸(HClO)は、pH4〜6さらにはpH4.5〜5.5の水溶液中で存在比率が極大化(または最大化)する。従って本発明の洗浄装置によれば、高濃度次亜塩素酸水の使用量を抑制しつつも、次亜塩素酸を有効に活用した洗浄・除菌が可能となる。 Further in the cleaning apparatus of the present invention is not a high-concentration hypochlorous acid water per se, is used a cleaning liquid consisting of dilute hypochlorous acid water. Hypochlorous acid (HClO), which exerts a high bactericidal effect, maximizes (or maximizes) the abundance ratio in an aqueous solution having a pH of 4 to 6 and even a pH of 4.5 to 5.5. Therefore, according to the cleaning apparatus of the present invention, it is possible to perform cleaning and sterilization by effectively utilizing hypochlorous acid while suppressing the amount of high-concentration hypochlorous acid water used.

《その他》
(1)本明細書でいう高濃度次亜塩素酸水は、それを水で希釈した希釈次亜塩素酸水を調製するために用いる原料となる次亜塩素酸水という意味である。高濃度次亜塩素酸水と希釈次亜塩素酸水は、pHの相違からも明確に区別し得る。従って、高濃度次亜塩素酸水の具体的な濃度は問わない。
《Others》
(1) The high-concentration hypochlorite water referred to in the present specification means hypochlorous acid water which is a raw material used for preparing diluted hypochlorous acid water obtained by diluting it with water. High-concentration hypochlorous acid water and diluted hypochlorous acid water can be clearly distinguished from each other by the difference in pH. Therefore, the specific concentration of high-concentration hypochlorous acid water does not matter.

敢えて濃度をいうなら、高濃度次亜塩素酸水は、有効塩素濃度が500mg/L以上、1000mg/L以上さらには1500mg/L以上であると好ましい。また生産性や管理性等の観点から敢えていうと、有効塩素濃度は2500mg/L以下さらには2000mg/L以下であると好ましい。また希釈次亜塩素酸水は、例えば、高濃度次亜塩素酸水を10〜100倍、20〜60倍さらには30〜50倍に希釈し、有効塩素濃度が5〜100mg/L、10〜80mg/Lさらには20〜60mg/Lであると好ましい。 Speaking of the concentration, it is preferable that the high-concentration hypochlorous acid water has an effective chlorine concentration of 500 mg / L or more, 1000 mg / L or more, and further 1500 mg / L or more. From the viewpoint of productivity and controllability, the effective chlorine concentration is preferably 2500 mg / L or less, more preferably 2000 mg / L or less. The diluted hypochlorous acid water is, for example, diluted 10 to 100 times, 20 to 60 times, and 30 to 50 times the high concentration hypochlorite water, and the effective chlorine concentration is 5 to 100 mg / L, 10 to 10. It is preferably 80 mg / L, more preferably 20 to 60 mg / L.

高濃度次亜塩素酸水はpH6(超)〜7さらには6.2〜6.8が好ましい。そのpHが高くなると、次亜塩素酸(HClO)は殺菌力の弱い次亜塩素酸イオン(ClO-)または次亜塩素酸ナトリウム等へ変化し得る。逆にpHが低下すると、塩素ガス(Cl)を発生し得る。いずれの場合も、殺菌力の強い次亜塩素酸の減少や有効塩素濃度の低下を招くため好ましくない。 The high-concentration hypochlorous acid water preferably has a pH of 6 (super) to 7, and more preferably 6.2 to 6.8. When the pH is increased, hypochlorous acid (HClO) can be changed to hypochlorite ion (ClO ) or sodium hypochlorite having weak bactericidal activity. On the contrary, when the pH is lowered, chlorine gas (Cl 2 ) can be generated. In either case, hypochlorous acid, which has strong bactericidal activity, is reduced and the effective chlorine concentration is lowered, which is not preferable.

なお、高濃度次亜塩素酸水と希釈水の混合により、高濃度次亜塩素酸水中の次亜塩素酸は不均化反応(2HClO→2HCl+O)を生じる。これにより希釈次亜塩素酸水は高濃度次亜塩素酸水よりも酸性側へシフトし、次亜塩素酸の存在比率が高いpH4〜6となる。ちなみに次亜塩素酸水は、食塩水や塩酸水を電気分解して生成され、食品添加物(殺菌料)としても認められた安全な洗浄液(除菌液)である。但し、本発明に係る洗浄液は、次亜塩素酸を主成分(濃度が最大な成分)としつつ、他の安全な洗浄成分または除菌成分をさらに含んでもよい。 By mixing high-concentration hypochlorous acid water and diluted water, hypochlorous acid in high-concentration hypochlorous acid water causes a disproportionation reaction (2HClO → 2HCl + O 2 ). As a result, the diluted hypochlorous acid water shifts to the more acidic side than the high-concentration hypochlorous acid water, and the pH becomes pH 4 to 6 in which the abundance ratio of hypochlorous acid is high. By the way, hypochlorous acid water is a safe cleaning liquid (sterilizing liquid) that is produced by electrolyzing salt water or hydrochloric acid water and is also recognized as a food additive (sterilizing agent). However, the cleaning liquid according to the present invention may further contain other safe cleaning components or sterilizing components while containing hypochlorous acid as the main component (the component having the maximum concentration).

(2)特に断らない限り本明細書でいう「x〜y」は下限値xおよび上限値yを含む。本明細書に記載した種々の数値または数値範囲に含まれる任意の数値を新たな下限値または上限値として「a〜b」のような範囲を新設し得る。 (2) Unless otherwise specified, "x to y" in the present specification includes a lower limit value x and an upper limit value y. A range such as "ab" may be newly established with any numerical value included in the various numerical values or numerical ranges described in the present specification as a new lower limit value or upper limit value.

本発明の一実施例である手指洗浄乾燥除菌装置の外観斜視図である。It is external perspective view of the hand washing dry sterilizing apparatus which is one Example of this invention. その内部構造を模式的に示したブロック図である。It is a block diagram which shows the internal structure schematically. その作動(制御)を示すフローチャートである。It is a flowchart which shows the operation (control).

上述した本発明の構成要素に、本明細書中から任意に選択した一つまたは二つ以上の構成要素を付加し得る。方法的な構成要素でも物に関する構成要素ともなり得る。いずれの実施形態が最良であるか否かは、対象、要求性能等によって異なる。 One or more components arbitrarily selected from the present specification may be added to the components of the present invention described above. It can be a methodical component or a component of an object. Whether or not which embodiment is the best depends on the target, required performance, and the like.

《洗浄手段》
(1)本発明に係る洗浄手段は、高濃度次亜塩素酸水(以下、単に「原水」ともいう。)と希釈水を混合して得られた希釈次亜塩素酸水(洗浄液)をシンク内へ吐出する。この洗浄手段は、例えば、高濃度次亜塩素酸水を汲み上げて圧送する第1ポンプと、希釈水を汲み上げて圧送する第2ポンプと、両ポンプから圧送された高濃度次亜塩素酸水と希釈水を混合する混合器(継手)と、希釈次亜塩素酸水をシンクへ吐出(噴出)させる洗浄ノズルと、第1ポンプから混合器までを連通させる第1配管と、第2ポンプから混合器までを連通させる第2配管と、混合器から洗浄ノズルまでを連通させる第3配管とを備える。
<< Cleaning means >>
(1) The cleaning means according to the present invention sinks diluted hypochlorous acid water (cleaning solution) obtained by mixing high-concentration hypochlorous acid water (hereinafter, also simply referred to as "raw water") and diluted water. Discharge inward. The cleaning means includes, for example, a first pump that pumps and pumps high-concentration hypochlorous acid water, a second pump that pumps and pumps diluted water, and high-concentration hypochlorous acid water pumped from both pumps. Mixing from a mixer (joint) that mixes diluted water, a cleaning nozzle that discharges (spouts) diluted hypochlorous acid water to a sink, a first pipe that communicates from the first pump to the mixer, and a second pump. A second pipe for communicating with the pump and a third pipe for communicating from the mixer to the cleaning nozzle are provided.

洗浄液の吐出の開始や停止は、各ポンプの起動・停止と連動させても良いし、開閉弁等を別途設けて行ってもよい。洗浄ノズルからの吐出流量(ml/min)や希釈率(高濃度次亜塩素酸水と希釈水の混合割合)の調整も、各ポンプ自体の出力(流量)調整により行ってもよいし、配管中に流量調整弁等を配設して行ってもよい。なお、各ポンプの起動・停止(オン・オフ)や別途設けた電磁弁等の制御は、後述する制御手段によりなされる。また、第1ポンプと第2ポンプは独立した二つのポンプからなる場合に限らず、一つのポンプを兼用してもよい。 The start and stop of the discharge of the cleaning liquid may be linked with the start and stop of each pump, or an on-off valve or the like may be provided separately. The discharge flow rate (ml / min) and dilution rate (mixing ratio of high-concentration hypochlorous acid water and diluted water) from the cleaning nozzle may be adjusted by adjusting the output (flow rate) of each pump itself, or the piping. A flow rate adjusting valve or the like may be arranged inside. It should be noted that the start / stop (on / off) of each pump and the control of the separately provided solenoid valve and the like are performed by the control means described later. Further, the first pump and the second pump are not limited to the case where they are composed of two independent pumps, and one pump may be used in combination.

(2)高濃度次亜塩素酸水は、取替自在なカートリッジタンク内に収容されて供給されると好ましい。これにより、次亜塩素酸水の生成装置(電解装置)を設ける必要がなく、洗浄装置のコンパクト化を図れる。また、洗浄装置の維持や管理も容易となる。なお、高濃度次亜塩素酸水の残量がわかる表示手段(残量警告等を含む)または検知手段がカートリッジタンクや洗浄装置に設けられていると好ましい。洗浄装置に設ける検知手段は、例えば、カートリッジタンクの重量変化をロードセルやスプリングの変位で検出することにより行える。 (2) It is preferable that the high-concentration hypochlorous acid water is stored and supplied in a replaceable cartridge tank. As a result, it is not necessary to provide a hypochlorite water generator (electrolyzer), and the cleaning device can be made compact. It also facilitates maintenance and management of the cleaning equipment. It is preferable that the cartridge tank or the cleaning device is provided with a display means (including a remaining amount warning or the like) or a detection means for indicating the remaining amount of high-concentration hypochlorous acid water. The detection means provided in the cleaning device can be performed, for example, by detecting a change in the weight of the cartridge tank by the displacement of the load cell or the spring.

一方、希釈水は、上水道または上水タンクから供給されると好ましい。これにより洗浄装置を設置する場所で多量の希釈水を取得できるようになり、吐出する洗浄液の流量や希釈率の調整自由度が高まる。なお、ここでいう「上水」とは、通常、いわゆる水道水であるが、浄化された衛生的な水であれば水道水には限らない。上水タンクは、孤立した貯水タンク(リザーブタンク)でもよいが、上水道に連結されていてもよい。後者の場合、例えば、上水道と上水道タンクの連通が開閉弁等で制御されると、上水タンク内の水位が低下したときに上水道から上水が適宜補充されて好ましい。なお、そのような開閉弁は、電磁弁の他、ボールタップ式等の機械弁でもよい。 On the other hand, the diluted water is preferably supplied from the water supply or the water supply tank. As a result, a large amount of diluted water can be obtained at the place where the cleaning device is installed, and the degree of freedom in adjusting the flow rate and the dilution rate of the discharged cleaning liquid is increased. The term "tap water" as used herein is usually so-called tap water, but it is not limited to tap water as long as it is purified and sanitary water. The water supply tank may be an isolated water storage tank (reserve tank), or may be connected to the water supply. In the latter case, for example, if the communication between the water supply and the water supply tank is controlled by an on-off valve or the like, it is preferable that the water supply is appropriately replenished with clean water when the water level in the water supply tank drops. In addition to the solenoid valve, such an on-off valve may be a mechanical valve such as a ball tap type.

(3)洗浄手段は、一回の洗浄あたり洗浄液を150〜1000ml、250〜500mlさらには300〜400ml吐出するようにすると好ましい。吐出量が過少では、次亜塩素酸水による十分な洗い流しができず、洗浄性や除菌性が低下し得る。吐出量が過多では、高濃度次亜塩素酸水等の浪費になる。また一回の洗浄あたりの吐出時間(洗浄時間)は10〜30秒さらには15〜20秒であると好ましい。吐出時間が過小では洗浄性や除菌性が低下し、過大な吐出時間は非効率である。 (3) It is preferable that the cleaning means discharges 150 to 1000 ml, 250 to 500 ml, and further 300 to 400 ml of the cleaning liquid per cleaning. If the discharge amount is too small, it cannot be sufficiently washed away with hypochlorite water, and the detergency and sterilization property may deteriorate. If the discharge amount is excessive, high-concentration hypochlorous acid water and the like will be wasted. The discharge time (washing time) per washing is preferably 10 to 30 seconds, more preferably 15 to 20 seconds. If the discharge time is too short, the cleaning property and sterilization property are deteriorated, and if the discharge time is too long, it is inefficient.

《送気手段》
送気手段は、シンク内へ送気して、少なくとも洗浄液で洗い流された洗浄対象の水切または乾燥を行う。送気手段は、例えば、洗浄装置の筐体外から空気(外気)を導入するブロワーと、ブロワーによる送風をシンクの通気口(送気口、送風口またはエアーノズル)へ誘導するダクトを備える。ブロワーは一つでも良いが、風量を確保するために複数設けられてもよい。なお、送気手段は、外気温等に応じて適宜、送風を加温する加温手段を備えると好ましい。加温手段は、種々のヒータでもよいが、例えば、ブロワーの吹き出し圧力により空気が圧縮されて、空気温度が自然と上昇する圧力加温式を採用すると、省エネルギー化も図れて好ましい。
<< Means of air supply >>
The air supply means blows air into the sink to drain or dry at least the object to be washed that has been washed away with the washing liquid. The air supply means includes, for example, a blower that introduces air (outside air) from outside the housing of the cleaning device, and a duct that guides the air blown by the blower to the ventilation port (air supply port, air supply port or air nozzle) of the sink. One blower may be provided, but a plurality of blowers may be provided to secure the air volume. In addition, it is preferable that the air supply means is provided with a heating means that appropriately heats the air according to the outside air temperature and the like. The heating means may be various heaters, but for example, it is preferable to adopt a pressure heating type in which the air is compressed by the blowout pressure of the blower and the air temperature naturally rises, in order to save energy.

さらにブロワーの上流側に浄化フィルターが配設されていると好ましい。これによりシンクへ清浄な空気が送気され、水切・乾燥時に洗浄対象が再汚染されることが防止される。浄化フィルターは、ブロワーが取り込む空気中からゴミ、塵埃、細菌等を取り除くフィルターであり、洗浄装置の用途や仕様に応じた適切な性能を有すると好ましい。例えば、JIS(Z8122)にも規定されているような、HEPAフィルター(High Efficiency Particulate Air Filter)やULPAフィルター (Ultra Low Penetration Air Filter) 等を用いるとよい。 Further, it is preferable that a purification filter is provided on the upstream side of the blower. As a result, clean air is sent to the sink, and the cleaning target is prevented from being recontaminated when draining and drying. The purification filter is a filter that removes dust, dirt, bacteria, etc. from the air taken in by the blower, and preferably has appropriate performance according to the application and specifications of the cleaning device. For example, a HEPA filter (High Efficiency Particulate Air Filter), a ULPA filter (Ultra Low Penetration Air Filter), or the like as specified in JIS (Z8122) may be used.

《オゾン供給手段》
本発明の洗浄装置は、シンク内へオゾンを供給するオゾン供給手段を備えると好適である。これにより、オゾンで除菌等された清浄な空気で洗浄後の水切・乾燥を行うことが可能となる。また、洗浄後の水切・乾燥を行うとき以外(例えば、洗浄対象がシンク内になく、送気手段が停止しているとき)にも、オゾン供給手段を作動させて、シンクの通気口(送気口)を通じてオゾンを放出させると、洗浄装置を設置している空間の空気清浄、除菌、脱臭等(以下、これらを「空間清浄」という。)を行うこともできる。さらに、シンクの内壁面等に付着した有機物等(タンパク質、油脂等)をオゾンで分解することもできる。なお、オゾンで有機物等が分解されることにより、後述する自己浄化がより有効に促進される。
《Ozone supply means》
It is preferable that the cleaning device of the present invention includes an ozone supply means for supplying ozone into the sink. This makes it possible to drain and dry after cleaning with clean air that has been sterilized with ozone. Also, except when draining and drying after cleaning (for example, when the object to be cleaned is not in the sink and the air supply means is stopped), the ozone supply means is activated to vent the sink (feed). By releasing ozone through the air vent), it is possible to perform air cleaning, sterilization, deodorization, etc. (hereinafter, these are referred to as "space cleaning") in the space where the cleaning device is installed. Further, organic substances (proteins, fats and oils, etc.) adhering to the inner wall surface of the sink can be decomposed by ozone. By decomposing organic substances and the like with ozone, self-purification, which will be described later, is more effectively promoted.

オゾン供給手段は、例えば、オゾン発生器と、オゾン発生器で発生したオゾンを送気するファンと、オゾンを送気手段のダクトまたはシンクまで誘導する導管からなる。オゾンを送気手段のダクトへ流入させる場合、導管は送気手段(特にブロワー)の下流側に接続されると好ましい。これにより、オゾンによるブロワーの劣化促進やブロワーへのオゾン対策を回避できる。 The ozone supply means includes, for example, an ozone generator, a fan that sends ozone generated by the ozone generator, and a conduit that guides ozone to the duct or sink of the air supply means. When ozone flows into the duct of the air supply means, it is preferable that the conduit is connected to the downstream side of the air supply means (particularly the blower). As a result, it is possible to avoid the promotion of deterioration of the blower due to ozone and the measures against ozone for the blower.

オゾンを供給する際に(水切・乾燥時に限らない)、導管がダクトに接続された状態で送気手段のブロワーを作動させるなら、上述したファンを省略することもできる。ダクト内を流れる送風により生じる負圧(ベンチュリー効果)で、オゾンは導管からダクトへ自ずと流入するからである。 The above-mentioned fan can be omitted if the blower of the air supply means is operated with the conduit connected to the duct when supplying ozone (not limited to when draining or drying). This is because ozone naturally flows from the duct into the duct due to the negative pressure (Venturi effect) generated by the air flowing through the duct.

オゾンの供給量は、洗浄装置の設置空間におけるオゾン濃度が0.02〜0.06mg/Lさらには0.03〜0.05mg/Lとなるように調整されると好ましい。オゾン濃度が過小では空間清浄や自己浄化の効果が乏しく、オゾン濃度が過大では不快感を人に与え得る。設置空間の大きさにも依るが、オゾンの供給量は、例えば、1〜10mg/hさらには2〜6mg/hとするとよい。なお、オゾン濃度が異常に上昇し得る環境下では、オゾン分解触媒を、送気手段やオゾン供給手段の外気取込口側に設けてもよい。 The amount of ozone supplied is preferably adjusted so that the ozone concentration in the installation space of the cleaning device is 0.02 to 0.06 mg / L, more preferably 0.03 to 0.05 mg / L. If the ozone concentration is too low, the effect of space cleaning and self-purification is poor, and if the ozone concentration is too high, it can cause discomfort to people. Although it depends on the size of the installation space, the amount of ozone supplied may be, for example, 1 to 10 mg / h or 2 to 6 mg / h. In an environment where the ozone concentration can rise abnormally, the ozone decomposition catalyst may be provided on the outside air intake side of the air supply means or the ozone supply means.

《制御手段》
制御手段は、各手段の作動(起動・停止等)を制御する。例えば、シンク内に洗浄対象が挿入されているときに、制御手段は洗浄手段を所定時間作動させて洗浄対象へ洗浄液を吐出する洗浄モードを行った後、さらに送気手段を所定時間作動させて洗浄対象に付着した洗浄液を気流により吹き払う乾燥モードを行う。
<< Control means >>
The control means controls the operation (start / stop, etc.) of each means. For example, when the cleaning target is inserted in the sink, the control means operates the cleaning means for a predetermined time to perform a cleaning mode in which the cleaning liquid is discharged to the cleaning target, and then further operates the air supply means for a predetermined time. A drying mode is performed in which the cleaning liquid adhering to the object to be cleaned is blown off by an air flow.

また制御手段は、例えば、シンク内に洗浄対象が挿入されていない所定時期に、洗浄手段を所定時間作動させてシンクへ洗浄液を吐出する自己浄化モードを行う。ここで、オゾン供給手段は、制御手段により起動・停止等が制御されても良いが、単に洗浄装置の電源のON・OFFと連動して起動・停止してもよい。後者の場合、オゾン供給手段は、電源がON状態にあるときは常時稼働しており、水切・乾燥時以外のときもオゾンがシンク内や洗浄装置の設置空間へ放出される。これにより空間清浄がなされ、また自己浄化を促進できる。 Further, the control means performs, for example, a self-purification mode in which the cleaning means is operated for a predetermined time to discharge the cleaning liquid to the sink at a predetermined time when the cleaning target is not inserted in the sink. Here, the ozone supply means may be started / stopped by the control means, but may be started / stopped simply in conjunction with turning on / off the power of the cleaning device. In the latter case, the ozone supply means is always in operation when the power is on, and ozone is discharged into the sink or the installation space of the cleaning device even when the water is not drained or dried. As a result, the space can be cleaned and self-purification can be promoted.

なお、オゾンによって自己浄化が促進される理由は次の通りである。先ず、オゾンによってシンクに付着していた有機物等が酸化分解される。この状態で洗浄液が供給されると、次亜塩素酸水が有機物等により撥水されずに細菌等へ直接作用し、自己浄化による除菌効果等が高まる。 The reasons why ozone promotes self-purification are as follows. First, ozone oxidatively decomposes organic substances and the like adhering to the sink. When the cleaning liquid is supplied in this state, the hypochlorous acid water does not repel water due to organic substances and acts directly on bacteria and the like, and the sterilization effect by self-purification is enhanced.

《その他》
本発明の洗浄装置は、食品加工工場、クリーンルーム、病院、トイレ等に設置して、指・手・腕等の洗浄・除菌(さらに空間清浄)に利用できる。洗浄対象は、手指等の人体に限らず、シンクの形状や大きさを調整すれば、医療器具や衛生器具など様々な物も洗浄対象となる。
《Others》
The cleaning device of the present invention can be installed in a food processing factory, a clean room, a hospital, a toilet, etc., and can be used for cleaning / sterilizing fingers / hands / arms (further space cleaning). The object to be cleaned is not limited to the human body such as fingers, but various objects such as medical instruments and sanitary instruments can be cleaned by adjusting the shape and size of the sink.

本発明の洗浄装置の一実施例である手指洗浄乾燥除菌装置M(単に「洗浄乾燥装置M」という。)を取り上げて、以下に本発明を具体的に詳しく説明する。 Taking up the hand washing and drying sterilizing device M (simply referred to as “washing and drying device M”) which is an embodiment of the washing device of the present invention, the present invention will be specifically described below.

《構成》
洗浄乾燥装置Mの外観は、図1に示すような略直方体状の筐体40からなる。筐体40の上方には挿入口410から差し入れた手指を収容可能な洗浄槽であるシンク41があり、その前方下方には開閉扉42がある。開閉扉42を通じて、後述する高濃度次亜塩素酸水のカートリッジタンク110の出し入れ(交換)が可能となっている。また筐体40の上端付近には制御盤50が設けられており、洗浄乾燥装置Mの作動状態を示すインジケータや電源スイッチ等が配置されている。
"Constitution"
The appearance of the washing / drying device M is composed of a substantially rectangular parallelepiped housing 40 as shown in FIG. Above the housing 40 is a sink 41 which is a washing tank capable of accommodating fingers inserted from the insertion port 410, and below the front is an opening / closing door 42. The cartridge tank 110 of high-concentration hypochlorous acid water, which will be described later, can be taken in and out (replaced) through the opening / closing door 42. A control panel 50 is provided near the upper end of the housing 40, and an indicator, a power switch, and the like indicating the operating state of the washing / drying device M are arranged.

洗浄乾燥装置Mの内部構造を図2に模式的に示した。洗浄乾燥装置Mは、洗浄手段と、送気手段およびオゾン供給手段を備える。洗浄手段は、カートリッジタンク110内の高濃度次亜塩素酸水を配管111を通じて汲み上げるポンプ11(第1ポンプ)と、リザーブタンク120内の上水(希釈水)を配管121を通じて汲み上げるポンプ12(第2ポンプ)と、ポンプ11から配管112を通じて圧送された高濃度次亜塩素酸水とポンプ12から配管122を通じて圧送された希釈水とを混合する連結部13(混合器)と、連結部13で生じた希釈次亜塩素酸水(洗浄液)を配管131を通じてシンク内へ噴出させる洗浄ノズル14とを備える。 The internal structure of the washing / drying device M is schematically shown in FIG. The washing / drying device M includes a washing means, an air supply means, and an ozone supply means. The cleaning means are a pump 11 (first pump) that pumps high-concentration hypochlorous acid water in the cartridge tank 110 through the pipe 111, and a pump 12 (first pump) that pumps the clean water (diluted water) in the reserve tank 120 through the pipe 121. 2 pumps), a connecting portion 13 (mixer) that mixes high-concentration hypochlorous acid water pumped from the pump 11 through the pipe 112 and diluted water pumped from the pump 12 through the pipe 122, and a connecting portion 13 A cleaning nozzle 14 for ejecting the generated diluted hypochlorous acid water (cleaning liquid) into the sink through the pipe 131 is provided.

なお、リザーブタンク12の側面には、ボールタップ式の自動開閉弁を介して上水道が配管されている。これによりリザーブタンク12内で希釈水の水位が低下すると、希釈水が所定の水位となるまで、上水道からリザーブタンク12内へ自動的に補水される。また、洗浄ノズル14は、シンク41の両側にある壁面上方に複数配置されている。そして洗浄ノズル14から吐出された希釈次亜塩素酸水は、シンク41の排出口から配管43を通じて下水道等へ排水される。なお、図示していないが、リザーブタンク12またはリザーブタンク12から洗浄ノズル14に至る配管の少なくとも一部にヒーターを設置して、洗浄液を加温してもよい。これにより冬季等も、快適な洗浄を行うことができる。 A water supply is piped to the side surface of the reserve tank 12 via a ball tap type automatic on-off valve. As a result, when the water level of the diluted water drops in the reserve tank 12, water is automatically replenished from the water supply into the reserve tank 12 until the diluted water reaches a predetermined water level. Further, a plurality of cleaning nozzles 14 are arranged above the wall surface on both sides of the sink 41. Then, the diluted hypochlorous acid water discharged from the cleaning nozzle 14 is drained from the discharge port of the sink 41 to the sewer or the like through the pipe 43. Although not shown, a heater may be installed in at least a part of the reserve tank 12 or the pipe from the reserve tank 12 to the cleaning nozzle 14 to heat the cleaning liquid. As a result, comfortable cleaning can be performed even in winter and the like.

本実施例では、高濃度次亜塩素酸水として、高橋金属株式会社製SAN−TIWS(サンティウス)を用いた。この高濃度次亜塩素酸水は、pH調整用の塩酸を適宜添加した塩化ナトリウム水溶液を二室型電解槽の一方の電解室(例えば陰極室)に通水した後、もう一方の電解室(例えば陽極室)へ通水して得られたものである。高濃度次亜塩素酸水は、二室型電解槽の代わりに無隔膜一室型電解槽で電気分解して得られたものでもよい。さらに高濃度次亜塩素酸水は、塩化ナトリウム水溶液を電気分解して得られた強酸性電解水に、同電気分解時に得られた強アルカリ性電解水の一部を混合したものでもよい。 In this example, SAN-TIWS manufactured by Takahashi Metal Co., Ltd. was used as the high-concentration hypochlorous acid water. In this high-concentration hypochlorous acid water, an aqueous sodium chloride solution to which hydrochloric acid for pH adjustment is appropriately added is passed through one electrolytic cell (for example, a cathode chamber) of a two-chamber electrolytic cell, and then the other electrolytic cell (for example, a cathode chamber) is passed. For example, it was obtained by passing water through an anode chamber). The high-concentration hypochlorous acid water may be obtained by electrolysis in a non-diabolic single-chamber electrolytic cell instead of the two-chamber electrolytic cell. Further, the high-concentration hypochlorous acid water may be a mixture of hypochlorous acid water obtained by electrolyzing an aqueous sodium chloride solution and a part of the hypochlorous acid water obtained during the electrolysis.

カートリッジタンク110は、例えば、そのサンティウス(pH6.5、有効塩素濃度:約1800mg/L)を10L収容したパウチ容器からなる。本実施例では、ポンプ11とポンプ12の各流量を調整して、その高濃度次亜塩素酸水を上水で40倍程度に希釈した。得られた希釈次亜塩素酸水は、pH5付近で有効塩素濃度が約50ml/Lとなった。 The cartridge tank 110 is composed of, for example, a pouch container containing 10 L of the Santius (pH 6.5, effective chlorine concentration: about 1800 mg / L). In this example, the flow rates of the pump 11 and the pump 12 were adjusted, and the high-concentration hypochlorite water was diluted with clean water about 40 times. The obtained diluted hypochlorous acid water had an effective chlorine concentration of about 50 ml / L at around pH 5.

送気手段は、筐体40の側面に設けられた多数の開孔401を通じて吸引した外気をダクト211を通じて送気するブロワー21と、ブロワー21の上流側(開孔401側)に配設されたHEPAフィルターからなる浄化フィルター22と、連結部23およびダクト212を通じてシンク41に設けた送気口411(通気口)とを備える。 The air supply means are arranged on the blower 21 that blows the outside air sucked through a large number of openings 401 provided on the side surface of the housing 40 through the duct 211 and on the upstream side (opening 401 side) of the blower 21. A purification filter 22 made of a HEPA filter and an air supply port 411 (vent) provided in the sink 41 through a connecting portion 23 and a duct 212 are provided.

なお、送気口411も、シンク41の両側にある壁面上方にそれぞれ配置されている。また、ブロワー21も各送気口411に対応して複数設けられており、十分な風量で短時間の水切や乾燥が可能となっている。 The air supply port 411 is also arranged above the wall surface on both sides of the sink 41. Further, a plurality of blowers 21 are also provided corresponding to each air supply port 411, and it is possible to drain and dry the water in a short time with a sufficient air volume.

オゾン供給手段は、オゾン発生器31と、オゾン発生器31で生成されたオゾンを導管33および連結部23を通じてブロワー21の下流側にあるダクト212へ送気するファン32とを有する。なお、本実施例では、オゾン発生器31によるオゾン発生量を4mg/hとした。 The ozone supply means includes an ozone generator 31 and a fan 32 that sends the ozone generated by the ozone generator 31 to the duct 212 on the downstream side of the blower 21 through the conduit 33 and the connecting portion 23. In this example, the amount of ozone generated by the ozone generator 31 was set to 4 mg / h.

《作動》
制御盤50に内蔵されたマイコン(図略/制御手段)により、電源がONされた洗浄乾燥装置Mは、図3に示すように作動する。
《Operation》
The cleaning / drying device M, whose power is turned on by the microcomputer (not shown / control means) built in the control panel 50, operates as shown in FIG.

(1)洗浄乾燥装置Mの電源がONされると、オゾン発生器31とファン32が連続的に稼働してオゾンを送気口411へ常時供給する(ステップS1)。 (1) When the power of the washing / drying device M is turned on, the ozone generator 31 and the fan 32 continuously operate to constantly supply ozone to the air supply port 411 (step S1).

シンク41内に洗浄対象である手指等が挿入されたことが赤外線センサー等(図略)により検知されると(ステップS2)、ポンプ11、12を稼働させる(ステップS3)。これにより洗浄ノズル14からシンク41内に挿入された手指へ希釈次亜塩素酸水が噴出されて洗浄モードが開始される。そして、予め設定した洗浄時間が経過すると(ステップS4)、ポンプ11、12を停止させる(ステップS5)。ポンプ11、の停止により洗浄モードが終了する。なお、例えば、洗浄モードのときの洗浄時間(洗浄液の吐出時間)は16〜18秒程度、洗浄液の噴出量は320〜360ml程度とするとよい。 When it is detected by the infrared sensor or the like (not shown) that the finger or the like to be cleaned is inserted into the sink 41 (step S2), the pumps 11 and 12 are operated (step S3). As a result, diluted hypochlorous acid water is ejected from the cleaning nozzle 14 to the fingers inserted into the sink 41, and the cleaning mode is started. Then, when the preset cleaning time elapses (step S4), the pumps 11 and 12 are stopped (step S5). The cleaning mode ends when the pump 11 is stopped. For example, the cleaning time (discharging time of the cleaning liquid) in the cleaning mode may be about 16 to 18 seconds, and the amount of the cleaning liquid ejected may be about 320 to 360 ml.

シンク41内から手指が抜かれていないことを確認した後(ステップS6)、ブロワー21を稼働させる(ステップS7)。これにより送気口411からの送風によってシンク41内に挿入された手指に付着している希釈次亜塩素酸水を水切・乾燥させる乾燥モードが開始される。ブロワー21は、シンク41内に手指がある間は継続して稼働する(ステップS8)。但し、シンク41内から手指が抜かれるか(ステップS8)、予め設定した乾燥時間(例えば30秒)が経過すると(ステップS9)、ブロワー21は停止する(ステップS10)。ブロワー21の停止により乾燥モードが終了する。 After confirming that the fingers have not been pulled out from the sink 41 (step S6), the blower 21 is operated (step S7). As a result, a drying mode is started in which the diluted hypochlorous acid water adhering to the fingers inserted in the sink 41 is drained and dried by the air blown from the air supply port 411. The blower 21 continuously operates as long as the fingers are in the sink 41 (step S8). However, the blower 21 is stopped (step S10) when the finger is pulled out from the sink 41 (step S8) or when a preset drying time (for example, 30 seconds) elapses (step S9). The drying mode ends when the blower 21 is stopped.

(2)シンク41内で手指等が検知されない状態が予め設定した時間(例えば1時間)を経過すると(ステップS2、ステップS11)、ポンプ11、12を稼働させて洗浄液をシンク41内へ噴出させる(ステップS12)。予め設定した洗浄時間(例えば5秒)が経過すると(ステップS13)、ポンプ11、12を停止させて洗浄液の噴出を止める(ステップS14)。このように洗浄モードおよび乾燥モードがなされていないときでも、定期的に自己浄化モードがなされる。なお、自己浄化モードのときの洗浄液の噴出量は、例えば100ml程度にすればよい。 (2) When the state in which fingers or the like are not detected in the sink 41 elapses for a preset time (for example, 1 hour) (steps S2 and S11), the pumps 11 and 12 are operated to eject the cleaning liquid into the sink 41. (Step S12). When the preset cleaning time (for example, 5 seconds) has elapsed (step S13), the pumps 11 and 12 are stopped to stop the ejection of the cleaning liquid (step S14). Even when the cleaning mode and the drying mode are not performed in this way, the self-cleaning mode is periodically performed. The amount of the cleaning liquid ejected in the self-purification mode may be, for example, about 100 ml.

ちなみに、自己浄化モードの開始前からシンク41内にはオゾンが継続的に供給されている。このため、シンク41内に付着している有機物等は、そのオゾンにより予め酸化分解された状態となっている。その結果、自己浄化モードで噴出された希釈次亜塩素酸水はシンク41内であまり撥水等せずに、直接的に細菌等へ作用する。従って、本実施例の自己浄化モードは高い除菌効果を発揮する。 By the way, ozone is continuously supplied to the sink 41 even before the start of the self-purification mode. Therefore, the organic substances and the like adhering to the sink 41 are in a state of being oxidatively decomposed in advance by the ozone. As a result, the diluted hypochlorous acid water ejected in the self-purification mode acts directly on bacteria and the like without much water repellency in the sink 41. Therefore, the self-purification mode of this example exhibits a high sterilization effect.

(3)乾燥モードでないときでも、オゾン発生器31で生成されたオゾンが、ファン32によって送気口411から送気されている。そのオゾンの一部は、上述したようにシンク41内に付着している有機物等の酸化分解に使用されるが、その大部分は洗浄乾燥装置Mの設置空間へ放出される。このため、少なくとも洗浄乾燥装置Mが設定されている近傍の設置空間は、そのオゾンによって空気清浄もなされる。 (3) Even when not in the drying mode, ozone generated by the ozone generator 31 is supplied from the air supply port 411 by the fan 32. A part of the ozone is used for oxidative decomposition of organic substances and the like adhering to the sink 41 as described above, but most of the ozone is released to the installation space of the washing / drying device M. Therefore, at least the installation space in the vicinity where the washing / drying device M is set is also air-cleaned by the ozone.

このように本実施例に係る洗浄乾燥装置Mは、手指等の洗浄・除菌・乾燥等のみならず、装置自体の自己浄化や装置を設定している空間の清浄等も併せてなし得る。 As described above, the washing / drying device M according to the present embodiment can perform not only washing / sterilization / drying of fingers and the like, but also self-cleaning of the device itself and cleaning of the space in which the device is set.

M 手指洗浄乾燥除菌装置(洗浄装置)
14 洗浄ノズル
40 筐体
41 シンク
411 送気口
M Hand cleaning and drying sterilization device (cleaning device)
14 Cleaning nozzle 40 Housing 41 Sink 411 Air supply port

Claims (12)

洗浄対象を出し入れする挿入口を有し該洗浄対象を収容できると共に使用した洗浄液を排出させる排出口を有するシンクと、
該シンク内へ洗浄液を吐出する洗浄手段と、
該シンク内へ送気する送気手段と、
を備える洗浄装置であって、
前記洗浄手段は高濃度次亜塩素酸水へ希釈水を混合し希釈次亜塩素酸水を前記洗浄液として吐出し、
前記高濃度次亜塩素酸水は、取替自在なカートリッジタンク内に収容されて供給される洗浄装置。
A sink that has an insertion port for inserting and removing the cleaning object, can accommodate the cleaning object, and has a discharge port for discharging the used cleaning liquid.
A cleaning means for discharging the cleaning liquid into the sink, and
An air supply means for supplying air into the sink and
It is a cleaning device equipped with
The cleaning means is to discharge dilution hypochlorous acid water mixed with dilution water to the high concentration hypochlorous acid water as the cleaning solution,
A cleaning device in which the high-concentration hypochlorous acid water is stored and supplied in a replaceable cartridge tank .
洗浄対象を出し入れする挿入口を有し該洗浄対象を収容できると共に使用した洗浄液を排出させる排出口を有するシンクと、A sink that has an insertion port for inserting and removing the cleaning object, can accommodate the cleaning object, and has a discharge port for discharging the used cleaning liquid.
該シンク内へ洗浄液を吐出する洗浄手段と、A cleaning means for discharging the cleaning liquid into the sink, and
該シンク内へ送気する送気手段と、An air supply means for supplying air into the sink and
少なくとも該洗浄手段の作動を制御する制御手段と、At least a control means for controlling the operation of the cleaning means and
を備える洗浄装置であって、It is a cleaning device equipped with
前記洗浄手段は、高濃度次亜塩素酸水へ希釈水を混合した希釈次亜塩素酸水を前記洗浄液として吐出し、In the cleaning means, diluted hypochlorous acid water obtained by mixing diluted water with high-concentration hypochlorous acid water is discharged as the cleaning liquid.
前記制御手段は、前記シンク内に前記洗浄対象が挿入されていない所定時期に、前記洗浄手段を所定時間作動させて前記シンクへ前記洗浄液を吐出する自己浄化モードを行う洗浄装置。The control means is a cleaning device that performs a self-purification mode in which the cleaning means is operated for a predetermined time to discharge the cleaning liquid to the sink at a predetermined time when the cleaning target is not inserted into the sink.
洗浄対象を出し入れする挿入口を有し該洗浄対象を収容できると共に使用した洗浄液を排出させる排出口を有するシンクと、A sink that has an insertion port for inserting and removing the cleaning object, can accommodate the cleaning object, and has a discharge port for discharging the used cleaning liquid.
該シンク内へ洗浄液を吐出する洗浄手段と、A cleaning means for discharging the cleaning liquid into the sink, and
該シンク内へ送気する送気手段と、An air supply means for supplying air into the sink and
該シンクへオゾンを供給するオゾン供給手段と、Ozone supply means for supplying ozone to the sink and
を備える洗浄装置であって、It is a cleaning device equipped with
前記洗浄手段は、高濃度次亜塩素酸水へ希釈水を混合した希釈次亜塩素酸水を前記洗浄液として吐出し、In the cleaning means, diluted hypochlorous acid water obtained by mixing diluted water with high-concentration hypochlorous acid water is discharged as the cleaning liquid.
前記オゾン供給手段は、前記洗浄対象が前記シンク内にないときに、該シンクへオゾンを供給する洗浄装置。The ozone supply means is a cleaning device that supplies ozone to the sink when the cleaning target is not in the sink.
前記高濃度次亜塩素酸水は、取替自在なカートリッジタンク内に収容されて供給される請求項2または3に記載の洗浄装置。 The cleaning device according to claim 2 or 3 , wherein the high-concentration hypochlorous acid water is stored and supplied in a replaceable cartridge tank. 前記洗浄手段は、一回の洗浄あたり前記洗浄液を150〜1000ml吐出する請求項1〜4のいずれかに記載の洗浄装置。 The cleaning device according to any one of claims 1 to 4, wherein the cleaning means discharges 150 to 1000 ml of the cleaning liquid per cleaning. 前記送気手段は、外気を導入するブロワーと、該ブロワーの上流側に配設される浄化フィルターとを有する請求項1〜のいずれかに記載の洗浄装置。 The cleaning device according to any one of claims 1 to 5 , wherein the air supply means has a blower for introducing outside air and a purification filter arranged on the upstream side of the blower. さらに、前記シンクへオゾンを供給するオゾン供給手段を備える請求項1または2に記載の洗浄装置。 The cleaning device according to claim 1 or 2 , further comprising an ozone supply means for supplying ozone to the sink. 前記オゾン供給手段は、前記送気手段による送気の下流側へオゾンを供給する請求項3または7に記載の洗浄装置。 The cleaning device according to claim 3 or 7 , wherein the ozone supply means supplies ozone to the downstream side of the air supplied by the air supply means. 前記オゾン供給手段は、前記洗浄対象が前記シンク内にないときに、該シンクへオゾンを供給する請求項に記載の洗浄装置。 The cleaning device according to claim 7 , wherein the ozone supply means supplies ozone to the sink when the cleaning target is not in the sink. さらに、少なくとも前記洗浄手段の作動を制御する制御手段を備え、
前記制御手段は、前記シンク内に前記洗浄対象が挿入されていない所定時期に、前記洗浄手段を所定時間作動させて前記シンクへ前記洗浄液を吐出する自己浄化モードを行う請求項1または3に記載の洗浄装置。
Further, at least a control means for controlling the operation of the cleaning means is provided.
The control means according to claim 1 or 3 , wherein the control means performs a self-purification mode in which the cleaning means is operated for a predetermined time to discharge the cleaning liquid to the sink at a predetermined time when the cleaning target is not inserted into the sink. Cleaning equipment.
前記高濃度次亜塩素酸水は、pH6〜7である請求項1〜10のいずれかに記載の洗浄装置。The cleaning device according to any one of claims 1 to 10, wherein the high-concentration hypochlorous acid water has a pH of 6 to 7. 前記希釈次亜塩素酸水は、pH4〜6である請求項1〜11のいずれかに記載の洗浄装置。The cleaning device according to any one of claims 1 to 11, wherein the diluted hypochlorous acid water has a pH of 4 to 6.
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