JP6758309B2 - フォーカスエラー感応性が減少した光学的計測 - Google Patents

フォーカスエラー感応性が減少した光学的計測 Download PDF

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Publication number
JP6758309B2
JP6758309B2 JP2017544288A JP2017544288A JP6758309B2 JP 6758309 B2 JP6758309 B2 JP 6758309B2 JP 2017544288 A JP2017544288 A JP 2017544288A JP 2017544288 A JP2017544288 A JP 2017544288A JP 6758309 B2 JP6758309 B2 JP 6758309B2
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illumination
measurement
detector
sample
measurement system
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JP2018508995A5 (enExample
JP2018508995A (ja
Inventor
シャンカー クリシュナン
シャンカー クリシュナン
グオロン ベラ チュアン
グオロン ベラ チュアン
デイビッド ワイ ワン
デイビッド ワイ ワン
シュエフェン リウ
シュエフェン リウ
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KLA Corp
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KLA Corp
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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
    • G01J3/0208—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using focussing or collimating elements, e.g. lenses or mirrors; performing aberration correction
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12—Generating the spectrum; Monochromators
    • G01J3/18—Generating the spectrum; Monochromators using diffraction elements, e.g. grating
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/2803—Investigating the spectrum using photoelectric array detector
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/42—Absorption spectrometry; Double beam spectrometry; Flicker spectrometry; Reflection spectrometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/255—Details, e.g. use of specially adapted sources, lighting or optical systems
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55—Specular reflectivity
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/42—Absorption spectrometry; Double beam spectrometry; Flicker spectrometry; Reflection spectrometry
    • G01J2003/425—Reflectance
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G01N2021/213—Spectrometric ellipsometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/061—Sources
    • G01N2201/06113—Coherent sources; lasers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/068—Optics, miscellaneous

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Health & Medical Sciences (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Spectrometry And Color Measurement (AREA)
JP2017544288A 2015-02-22 2016-02-10 フォーカスエラー感応性が減少した光学的計測 Active JP6758309B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201562119243P 2015-02-22 2015-02-22
US62/119,243 2015-02-22
US14/833,370 US9970863B2 (en) 2015-02-22 2015-08-24 Optical metrology with reduced focus error sensitivity
US14/833,370 2015-08-24
PCT/US2016/017399 WO2016133765A1 (en) 2015-02-22 2016-02-10 Optical metrology with reduced focus error sensitivity

Publications (3)

Publication Number Publication Date
JP2018508995A JP2018508995A (ja) 2018-03-29
JP2018508995A5 JP2018508995A5 (enExample) 2019-03-22
JP6758309B2 true JP6758309B2 (ja) 2020-09-23

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017544288A Active JP6758309B2 (ja) 2015-02-22 2016-02-10 フォーカスエラー感応性が減少した光学的計測

Country Status (9)

Country Link
US (1) US9970863B2 (enExample)
JP (1) JP6758309B2 (enExample)
KR (1) KR102296806B1 (enExample)
CN (1) CN107250766B (enExample)
DE (1) DE112016000853B4 (enExample)
IL (1) IL253670A0 (enExample)
SG (1) SG11201706232UA (enExample)
TW (1) TWI673487B (enExample)
WO (1) WO2016133765A1 (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9921152B2 (en) * 2016-01-15 2018-03-20 Kla-Tencor Corporation Systems and methods for extended infrared spectroscopic ellipsometry
US10215693B2 (en) * 2016-09-29 2019-02-26 Kla-Tencor Corporation Infrared spectroscopic reflectometer for measurement of high aspect ratio structures
US10444161B2 (en) * 2017-04-05 2019-10-15 Kla-Tencor Corporation Systems and methods for metrology with layer-specific illumination spectra
EP3470924A1 (en) 2017-10-11 2019-04-17 ASML Netherlands B.V. Method of optimizing the position and/or size of a measurement illumination spot relative to a target on a substrate, and associated apparatus
DE102018119171A1 (de) * 2018-08-07 2020-02-13 Wavelabs Solar Metrology Systems Gmbh Optoelektronisches Solarzellen-Testsystem für eine inline-Solarzellen-Produktionsanlage und Verfahren zum Optimieren der inline-Produktion von Solarzellen unter Einsatz eines solchen optoelektronischen Solarzellen-Testsystems
IL263106B2 (en) * 2018-11-19 2023-02-01 Nova Ltd Integrated measurement system
US11060982B2 (en) * 2019-03-17 2021-07-13 Kla Corporation Multi-dimensional model of optical dispersion
JP7682146B2 (ja) 2019-07-08 2025-05-23 エーエスエムエル ネザーランズ ビー．ブイ． メトロロジ方法及び関連のコンピュータプロダクト
US11385167B2 (en) * 2019-10-01 2022-07-12 Onto Innovation Inc. Beamsplitter based ellipsometer focusing system
KR20220103713A (ko) * 2019-11-28 2022-07-22 에베 그룹 에. 탈너 게엠베하 기판 측정 장치 및 방법
CN115540766B (zh) * 2021-06-30 2025-08-05 深圳中科飞测科技股份有限公司 光学设备的聚焦方法及聚焦系统、设备和存储介质
CN114660048B (zh) * 2022-05-18 2022-08-19 合肥金星智控科技股份有限公司 预测数值校正方法、光谱设备、计算机设备和存储介质
CN115096208A (zh) * 2022-06-06 2022-09-23 上海精测半导体技术有限公司 一种宽光谱椭偏测量设备
US12449352B2 (en) * 2023-06-15 2025-10-21 Kla Corporation Optics for measurement of thick films and high aspect ratio structures
US20250076185A1 (en) * 2023-08-31 2025-03-06 Kla Corporation Angle Of Incidence And Azimuth Angle Resolved Spectroscopic Ellipsometry For Semiconductor Metrology
US20250110042A1 (en) * 2023-10-03 2025-04-03 Kla Corporation Spectroscopic Ellipsometry With Detector Resolved Numerical Aperture For Deep Structure Metrology

Family Cites Families (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL96483A (en) * 1990-11-27 1995-07-31 Orbotech Ltd Optical inspection method and apparatus
US5608526A (en) 1995-01-19 1997-03-04 Tencor Instruments Focused beam spectroscopic ellipsometry method and system
US6734967B1 (en) 1995-01-19 2004-05-11 Kla-Tencor Technologies Corporation Focused beam spectroscopic ellipsometry method and system
US5859424A (en) 1997-04-08 1999-01-12 Kla-Tencor Corporation Apodizing filter system useful for reducing spot size in optical measurements and other applications
US6483580B1 (en) * 1998-03-06 2002-11-19 Kla-Tencor Technologies Corporation Spectroscopic scatterometer system
US6429943B1 (en) 2000-03-29 2002-08-06 Therma-Wave, Inc. Critical dimension analysis with simultaneous multiple angle of incidence measurements
US6829049B1 (en) * 2000-05-15 2004-12-07 Therma-Wave, Inc. Small spot spectroscopic ellipsometer with refractive focusing
US7099081B2 (en) 2000-08-18 2006-08-29 Tokyo Electron Limited Small-spot spectrometry instrument with reduced polarization and multiple-element depolarizer therefor
AU2001295060A1 (en) 2000-09-20 2002-04-02 Kla-Tencor-Inc. Methods and systems for semiconductor fabrication processes
US6895075B2 (en) 2003-02-12 2005-05-17 Jordan Valley Applied Radiation Ltd. X-ray reflectometry with small-angle scattering measurement
US7006221B2 (en) * 2001-07-13 2006-02-28 Rudolph Technologies, Inc. Metrology system with spectroscopic ellipsometer and photoacoustic measurements
US7061614B2 (en) * 2001-10-16 2006-06-13 Therma-Wave, Inc. Measurement system with separate optimized beam paths
WO2003054475A2 (en) 2001-12-19 2003-07-03 Kla-Tencor Technologies Corporation Parametric profiling using optical spectroscopic systems
US7050162B2 (en) 2002-01-16 2006-05-23 Therma-Wave, Inc. Optical metrology tool having improved contrast
US6816570B2 (en) 2002-03-07 2004-11-09 Kla-Tencor Corporation Multi-technique thin film analysis tool
US6775015B2 (en) * 2002-06-18 2004-08-10 Timbre Technologies, Inc. Optical metrology of single features
US20040207836A1 (en) 2002-09-27 2004-10-21 Rajeshwar Chhibber High dynamic range optical inspection system and method
US6891158B2 (en) * 2002-12-27 2005-05-10 Revera Incorporated Nondestructive characterization of thin films based on acquired spectrum
US9386241B2 (en) 2003-07-02 2016-07-05 Verity Instruments, Inc. Apparatus and method for enhancing dynamic range of charge coupled device-based spectrograph
US7478019B2 (en) 2005-01-26 2009-01-13 Kla-Tencor Corporation Multiple tool and structure analysis
US7567351B2 (en) 2006-02-02 2009-07-28 Kla-Tencor Corporation High resolution monitoring of CD variations
TWI428559B (zh) * 2006-07-21 2014-03-01 Zygo Corp 在低同調干涉下系統性效應之補償方法和系統
WO2008013909A2 (en) 2006-07-27 2008-01-31 Rudolph Technologies, Inc. Multiple measurement techniques including focused beam scatterometry for characterization of samples
HU229699B1 (hu) * 2007-05-23 2014-05-28 Mta Termeszettudomanyi Kutatokoezpont Mta Ttk Pinhole kamerát alkalmazó, leképzõ optikai vizsgálóberendezés (reflektométer, polariméter, ellipszométer)
US8699027B2 (en) * 2007-07-27 2014-04-15 Rudolph Technologies, Inc. Multiple measurement techniques including focused beam scatterometry for characterization of samples
NL1036123A1 (nl) 2007-11-13 2009-05-14 Asml Netherlands Bv Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method.
US7929667B1 (en) 2008-10-02 2011-04-19 Kla-Tencor Corporation High brightness X-ray metrology
JP2012104586A (ja) * 2010-11-09 2012-05-31 Elpida Memory Inc 半導体計測装置
US9228943B2 (en) * 2011-10-27 2016-01-05 Kla-Tencor Corporation Dynamically adjustable semiconductor metrology system
US8879073B2 (en) * 2012-02-24 2014-11-04 Kla-Tencor Corporation Optical metrology using targets with field enhancement elements
US9581430B2 (en) 2012-10-19 2017-02-28 Kla-Tencor Corporation Phase characterization of targets
US9217717B2 (en) * 2012-12-17 2015-12-22 Kla-Tencor Corporation Two dimensional optical detector with multiple shift registers
US10769320B2 (en) 2012-12-18 2020-09-08 Kla-Tencor Corporation Integrated use of model-based metrology and a process model
US9291554B2 (en) 2013-02-05 2016-03-22 Kla-Tencor Corporation Method of electromagnetic modeling of finite structures and finite illumination for metrology and inspection

Also Published As

Publication number Publication date
DE112016000853T5 (de) 2017-11-09
IL253670A0 (en) 2017-09-28
DE112016000853B4 (de) 2024-10-24
WO2016133765A1 (en) 2016-08-25
CN107250766A (zh) 2017-10-13
TWI673487B (zh) 2019-10-01
KR102296806B1 (ko) 2021-08-31
SG11201706232UA (en) 2017-09-28
US9970863B2 (en) 2018-05-15
TW201643405A (zh) 2016-12-16
KR20170118919A (ko) 2017-10-25
CN107250766B (zh) 2020-11-06
US20160245741A1 (en) 2016-08-25
JP2018508995A (ja) 2018-03-29

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